JP2017191200A - Hologram structure - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a hologram structure excellent in forgery preventing property and designing property.SOLUTION: The hologram structure of the present invention has: a hologram layer having a reflective hologram formation region where a phase type Fourier-transform hologram is recorded for converting light that is emitted from a point light source and enters the region into a desired optical image; and a vapor deposition layer formed in contact with a rugged surface of the reflective hologram formation region of the hologram layer. The optical image includes: a first image that can be observed when the light from the point light source enters the reflective hologram formation region; and a second image that cannot be observed when the light from the point light source enters the reflective hologram formation region but that can be observed when laser light enters the region.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a hologram structure having excellent anti-counterfeiting properties and design properties.

A hologram is the one where the wavefront of object light is recorded on the photosensitive material as interference fringes by interfering two lights with the same wavelength (object light and reference light), and the same wavelength as the reference light at the time of interference fringe recording When the light is applied, a diffraction phenomenon occurs due to interference fringes, and the same wavefront as the original object light can be reproduced. Holograms are widely used for anti-counterfeiting and the like because they have advantages such as beautiful appearance and relatively difficult replication.
As a method of using a hologram, a method of reproducing as a light image by transmitting or reflecting reference light to the hologram is known.
For example, Patent Document 1 describes that authentication is performed using an optical image reproduced by projecting diffracted light reflected by a laser reflection hologram onto a screen.

Japanese Patent No. 487964

  However, there is a problem that it is difficult to impart a high level of anti-counterfeiting effect and a design with only a light image projected on a screen as described in Patent Document 1.

In order to solve such a problem, the present inventors have converted a light incident from a point light source into a desired optical image, and have a hologram layer having a hologram layer having a hologram forming region in which a phase type Fourier transform hologram is recorded. Has proposed.
According to such a hologram structure, for example, when the hologram forming area is observed in a state where the point light source is arranged on the hologram forming area, an optical image can be observed in the hologram forming area. For this reason, the hologram structure is excellent in anti-counterfeiting and design properties, for example, only a person who knows that a light image can be observed only when a point light source is arranged. It will be.
On the other hand, like the conventional hologram, the hologram structure is easy to understand the existence of the hologram forming region, so that the anti-counterfeiting property may be insufficient or the design property may be insufficient.

  The present invention has been made in view of the above problems, and has as its main object to provide a hologram structure excellent in forgery prevention and design.

  In order to achieve the above object, the present invention provides a hologram layer having a reflection hologram forming region in which a phase Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image, and the hologram layer. And a vapor deposition layer formed so as to be in contact with the concavo-convex surface of the reflective hologram forming region, and the light image is observed when light from a point light source is incident on the reflective hologram forming region. A first image that is possible, and a second image that is not observable when light from a point light source is incident on the reflective hologram forming region and is observable when laser light is incident. A hologram structure is provided.

According to the present invention, a reflection hologram forming area (hereinafter, simply referred to as a hologram forming area) in which a phase Fourier transform hologram is recorded that converts light incident from a point light source into a desired optical image is recorded. By using the hologram layer which has, the said hologram structure can reproduce | regenerate an optical image in a hologram formation area | region by planar view with a point light source.
In addition, the optical image includes a first image that can be observed when light from a point light source is incident on the reflective hologram forming region, and light from the point light source is incident on the reflective hologram forming region. And the second image that is observable when laser light is incident thereon, the hologram structure of the present invention has, for example, one hologram forming region, By authenticating in two stages using the first image and the second image obtained when the light from the point light source is incident and when the laser light is incident, and by observing the second image in addition to the first image It is possible to provide unexpectedness to the observer. For this reason, the hologram structure of the present invention has excellent anti-counterfeiting properties and design properties.

  In the present invention, the second image is preferably a negative image. This is because it is easy to form the second image because the second image is a negative image.

  In the present invention, it is preferable that the second image is displayed at a position overlapping the first image in plan view. This is because the hologram structure is excellent in anti-counterfeiting properties and design properties.

  In the present invention, the reflective hologram forming region of the hologram layer is formed on the same plane as the hologram cell capable of converting light incident from a point light source into the optical image, and in plan view. It is preferable that a diffraction grating cell that draws a diffraction grating pattern by being arranged in a pattern is arranged. This is because the hologram structure is superior in anti-counterfeiting and design properties by using an optical image and a diffraction grating pattern.

  In the present invention, the diffraction grating pattern is preferably a planar diffraction grating pattern that can reproduce the pattern in a planar manner. This is because the hologram structure is excellent in anti-counterfeiting and design properties by being able to combine a plane diffraction grating pattern and an optical image. Moreover, it is easy to make the plane diffraction grating pattern high in brightness, and a diffraction grating pattern with excellent visibility can be reproduced.

  In the present invention, the diffraction grating pattern is preferably a three-dimensional diffraction grating pattern that can be reproduced three-dimensionally. This is because it becomes possible to combine a three-dimensional diffraction grating pattern and an optical image, so that the hologram structure has excellent anti-counterfeiting properties and design properties.

  In the present invention, a heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer, an easily peelable layer formed on the surface of the hologram layer opposite to the vapor deposition layer, and the above And a peeling substrate formed on the surface of the easy peeling layer opposite to the hologram layer, and is preferably used as a hologram transfer foil. This is because the hologram structure can easily impart anti-counterfeiting and design properties to the adherend by being used as a hologram transfer foil. For example, the hologram structure can easily obtain a label excellent in anti-counterfeiting and design properties by transferring the hologram structure to the surface of the paper substrate having a bonding layer and a release sheet on the back surface of the paper substrate. .

  In the present invention, a heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer, a paper base material formed on the surface of the heat seal layer opposite to the vapor deposition layer, An adhesive layer formed on the surface of the paper base opposite to the heat seal layer, and a release sheet formed on the surface of the adhesive base opposite to the paper base, and a label It is preferable to be used as This is because the hologram structure can easily impart anti-counterfeiting and design properties to the adherend by being used as a label.

  The present invention has an effect that a hologram structure excellent in forgery prevention and design properties can be provided.

It is a schematic plan view which shows an example of the hologram structure of this invention. It is the sectional view on the AA line of FIG. It is explanatory drawing explaining the reproducing method of the optical image using a hologram structure. It is explanatory drawing explaining the reproducing method of the optical image using a hologram structure. It is explanatory drawing explaining the optical image in this invention. It is explanatory drawing explaining the optical image in this invention. It is explanatory drawing explaining the optical image in this invention. It is explanatory drawing explaining the optical image in this invention. It is explanatory drawing explaining the optical image in this invention. It is explanatory drawing explaining the optical image in this invention. It is explanatory drawing explaining the optical image in this invention. It is explanatory drawing explaining the hologram formation area in this invention. It is explanatory drawing explaining the surface asperity of the hologram cell in this invention. It is explanatory drawing explaining the hologram cell in this invention. It is the schematic plan view and schematic sectional drawing which show the other example of the hologram structure of this invention. It is explanatory drawing explaining the diffraction grating pattern in this invention. It is explanatory drawing explaining the diffraction grating cell in this invention. It is explanatory drawing explaining the image display layer in this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention. It is a schematic plan view which shows the other example of the hologram structure of this invention.

Hereinafter, the hologram structure of the present invention will be described in detail.
The hologram structure of the present invention includes a hologram layer having a reflection hologram forming region in which a phase Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image, and the reflection type of the hologram layer. A vapor deposition layer formed so as to be in contact with the concavo-convex surface of the hologram forming region, and the first optical image is observable when light from a point light source is incident on the reflective hologram forming region. An image and a second image that is not observable when light from a point light source is incident on the reflective hologram forming region and is observable when laser light is incident thereon. To do.

Such a hologram structure of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic plan view showing an example of a hologram structure of the present invention, and FIG. 2 is a cross-sectional view taken along line AA of FIG. As shown in FIGS. 1 and 2, the hologram structure 10 of the present invention includes a reflection hologram forming region 11 in which a phase Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image. And a vapor deposition layer 2 formed so as to be in contact with the concavo-convex surface 1a of the reflective hologram forming region 11 of the hologram layer 1, and the optical image is formed on the reflective hologram forming region. On the other hand, the first image that can be observed when the light from the point light source is incident, and the laser beam that is not observable when the light from the point light source is incident on the reflective hologram forming region. And a second image that can be observed in this case.
In this example, the transparent substrate 3 is laminated on the surface of the hologram layer 1 opposite to the vapor deposition layer 2.
Further, FIG. 1 omits the description of the transparent base material for easy explanation. In FIG. 1, a region surrounded by a broken line is a hologram forming region 11.

According to the present invention, by using a hologram layer having a hologram forming region in which a phase-type Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image, the hologram structure is a point light source Thus, an optical image can be reproduced in the hologram forming area in plan view.
The optical image includes a first image that can be observed when light from a point light source is incident on the reflective hologram forming region, and light from the point light source is incident on the reflective hologram forming region. And a second image that is not observable and is observable when a laser beam is incident.
For example, as illustrated in FIG. 3A, when the point light source 21 is disposed on the observation surface side opposite to the vapor deposition layer 2 of the hologram layer 1, no light enters the hologram forming region 11. A first image 13 including an “OK” character 13a and a frame-shaped figure 13b surrounding the “OK” character 13a can be observed as the image 12 (FIG. 3B).
Further, as illustrated in FIG. 4A, when the hologram forming region 11 is irradiated with the laser beam 22 a from the laser beam irradiation device 22, for example, as a light image 12 on the screen 23 by light from a point light source. “1”, “1”, “1”, “1”, “1”, “1”, “1”, “1”, “1”, “1”, “1”, “1” The second image 14 including four numbers “2”, “3”, and “4” can be observed in a frame-shaped figure (FIG. 4B).

For this reason, the hologram structure of the present invention has, for example, a first image obtained when light from a point light source and laser light are incident on one hologram forming region, respectively. It is possible to provide two-step authenticity determination using the second image and to provide an unexpectedness to the observer by observing the second image in addition to the first image. For this reason, the hologram structure of the present invention has excellent anti-counterfeiting properties and design properties.
Therefore, the hologram structure of the present invention has excellent anti-counterfeiting properties and design properties.

The hologram structure of the present invention has a hologram layer and a vapor deposition layer.
Hereinafter, each configuration in the hologram structure of the present invention will be described.

1. Hologram Layer The hologram layer in the present invention has a reflection hologram forming area in which a phase Fourier transform hologram is recorded that converts light incident from a point light source into a desired optical image.

(1) Optical Image The optical image includes a first image that can be observed when light from a point light source is incident on the reflective hologram forming region, and a point image from the point light source. A second image that is not observable when light is incident and that is observable when laser light is incident.

(A) First image The first image is observable when light from a point light source is incident on the reflective hologram forming region, and is a hologram when the point light source is arranged on the observation surface side. It can be observed from the optical image reproduced in the formation region. The first image can be observed from, for example, a light image reproduced on a screen other than the hologram forming area when laser light is incident on the hologram forming area.
Here, the first image is drawn by a line (hereinafter sometimes referred to as a drawing line) indicated by the reproduced optical image.
As such a first image, for example, as a drawing line for drawing the first image, a drawing line for drawing the second image, that is, a narrow image that cannot be observed from a light image reproduced in the hologram forming area by a point light source. It can be drawn using a drawing line having a width wider than a drawing line having a width (hereinafter sometimes referred to as a limit width line).

By the way, the reason why an image drawn using a drawing line having a narrow width such as a limit width line becomes unobservable from a light image reproduced in the hologram forming area by light from a point light source is as follows. Inferred.
That is, when a point light source reproduces an optical image because the point light source irradiates light so as to spread over a certain range as compared with laser light, or the diameter of the light source is large, for example, The image is reproduced thicker than the original image.
In addition, as a point light source, a light source including multi-wavelength light such as white light is known. When a point light source that irradiates such multi-wavelength light is used, the light image is an original image. Plays thicker than images.
For this reason, when the width of the drawing line is narrow, for example, when the drawing line is a positive line, the positive lines reproduced thickly by the point light source overlap each other, and the drawing line cannot be observed as a line. .
Further, when the drawing line is a negative line, the diffraction image reproduced thickly by the point light source covers the non-diffracted image region, and the drawing line cannot be observed as a line.
As described above, because the drawing line is narrower than the predetermined width, when the optical image is reproduced with a point light source, the optical image is thickly reproduced and the drawing line cannot be observed as a line. The image cannot be observed.
Therefore, for example, “1”, “2”, “3”, “4” drawn with narrow lines in a frame-shaped figure as an original image before Fourier transform shown in FIG. When a hologram forming region is formed by Fourier transforming this original image using a material including these four numbers, a light image 12 is reproduced in the hologram forming region 11 by a point light source, and this is illustrated in FIG. As described above, as a result of reproducing the optical image thickly, the above four numbers are buried in a frame-shaped figure and cannot be observed.
On the other hand, laser light is a monochromatic light that has directivity and is less spread than a point light source, and has a light source with a small diameter and a narrow wavelength range. it can.
Therefore, when an optical image is reproduced on the screen by laser light, the above four numbers can be recognized in a frame-shaped figure as in the original image, as illustrated in FIG. 5C. It can be done.
5A shows the original image, FIG. 5B shows the optical image 12 reproduced in the hologram forming area 11 by the point light source, and FIG. 5C shows the screen 23 by laser light. The reproduced optical image 12 is shown.

When the first image is a negative image drawn with a line (hereinafter sometimes referred to as a negative line) that appears as a non-diffracted image region in the diffraction image of the optical image, a drawing line for drawing the first image The width varies depending on the use of the hologram structure of the present invention, the size of the hologram forming region, etc., and specifically, the width is in the range of 1.0 mm to 10.0 mm during laser reproduction. In particular, it is preferably within the range of 2.0 mm to 10.0 mm, and particularly preferably within the range of 3.0 mm to 5.0 mm. This is because the first image reproduced in the hologram forming area by the point light source is easily observed because the width is within the above-described range, and particularly when the lower limit is within the above-described range.
In addition, when the first image is a positive image drawn with a line appearing as a diffraction image of the optical image (hereinafter sometimes referred to as a positive line), the width of the drawing line for drawing the first image is: Although it differs depending on the application of the hologram structure of the present invention, the size of the hologram forming region, and the like, specifically, it may be in the range of 0.1 mm to 10.0 mm during laser reproduction. In particular, it is preferably within the range of 0.5 mm to 5.0 mm, and particularly preferably within the range of 1.0 mm to 3.0 mm. This is because the first image reproduced in the hologram forming area by the point light source is easily observed because the width is within the above-described range, and particularly when the lower limit is within the above-described range.

In addition, the drawing line at the time of laser reproduction is an angle at which the incident angle (angle formed with the normal direction X of the hologram forming region 11) c is 45 ° with respect to the hologram forming region 11 as illustrated in FIG. Observation is performed when a laser beam having a wavelength of 550 nm is incident on the screen 23 and the optical image is reproduced on the screen 23 arranged in parallel with the laser beam incident direction at a position where the shortest distance h from the laser beam incident point d is 50 mm. This is a drawing line.
Further, the width of the drawing line at the time of laser reproduction refers to the width in the short direction, which is a direction orthogonal to the longitudinal direction of the drawing line. For example, when the drawing line is a negative line, FIG. ) And a width indicated by e1 in (c), and in the case of a positive line, it can be a width indicated by e2 in FIGS. 6B and 6C.
Note that the drawing line is not limited to a rectangular shape, and includes a dot shape such as a square or a circle. The width in this case can be, for example, the length of one side for a square and the diameter for a circle.
FIG. 6B is an enlarged view around the number “2” displayed in FIG. 4C already described. FIG. 6C shows an example in which the negative / positive in FIG. 6B is reversed.
The screen is not particularly limited as long as it has a light-shielding property to the extent that an optical image can be reproduced by laser light. For example, paper, cloth, a colored resin sheet, or the like can be used.

The image displayed as the first image only needs to be drawn by a drawing line, and can be, for example, a character, a symbol, a number, a figure, or the like.
Further, the type of the image is not limited to one type and may be a combination of two or more types.
For example, FIG. 3B and FIG. 5B described above show an example in which the first image 13 includes two types of images, that is, the character 13a of “OK” and the frame-shaped figure 13b. It is.
FIG. 7B shows that the first image 13 includes an “OK” character 13a, a frame-shaped graphic 13b, and an elliptical graphic 13c arranged in the frame-shaped graphic 13b. It shows an example including three types of images.
Further, FIG. 8B shows an example in which the first image 13 includes one type of image of the character “DNP”.
7 to 8, (a) is an original image, (b) shows an optical image 12 reproduced in a hologram forming area 11 by a point light source, and (c) is a laser beam. The light image 12 reproduced on the screen 23 is shown.

The first image may be either a negative image in which the drawing line is a negative line or a positive image in which the drawing line is a positive line, or may include both.
For example, FIGS. 3B and 5B described above show an example in which both the “OK” character 13a and the frame-shaped figure 13b included in the first image 13 are positive images. Is.
In FIG. 7B, both the “OK” character 13a and the frame-shaped graphic 13b included in the first image 13 are negative images and are arranged in the graphic of the frame-shaped graphic 13b. An elliptical figure 13c is an example of a positive image.
Further, FIG. 8B shows an example in which the characters “DNP” included in the first image 13 are positive images.

(B) Second image The second image is not observable when light from a point light source is incident on the reflection hologram forming region, and is observable when laser light is incident. Yes, it cannot be observed from the optical image reproduced in the hologram forming area when the point light source is arranged on the observation surface side, but a laser beam is incident on the hologram forming area, for example, a screen other than the hologram forming area. It is observable from the optical image reconstructed.
As such a 2nd image, it can be drawn with the said limit width line as a drawing line which draws a 2nd image, for example.
When the second image is a negative image drawn with a negative line, the width of the drawing line for drawing the second image differs depending on the application of the hologram structure of the present invention, the size of the hologram forming area, and the like. Specifically, it can be within the range of 0.5 mm to 4.0 mm during laser reproduction, and in particular, within the range of 0.7 mm to 3.0 mm. Is preferable, and it is particularly preferable that the thickness is in the range of 0.8 mm to 2.0 mm. This is because, when the width is within the above-described range, the second image cannot be stably observed when a light image is reproduced in the hologram forming region by a point light source. Further, for example, when the optical image is reproduced on the screen by the laser light, the second image becomes easy to observe.
In addition, when the second image is a negative image, the width of the drawing line is assumed to be that the second image cannot be observed more stably when the light image is reproduced in the hologram forming area by the point light source. From this point of view, the upper limit of the width is preferably less than 1.0 mm, and more preferably 0.9 mm or less.
When the second image is a positive image drawn with positive lines, the width of the drawing line for drawing the second image varies depending on the use of the hologram structure of the present invention, the size of the hologram forming area, and the like. Specifically, it can be in the range of 0.05 mm to 3.0 mm during laser reproduction, and in particular, in the range of 0.07 mm to 1.0 mm. It is preferable that it is within a range of 0.08 mm to 0.5 mm. This is because, when the width is in the above-described range, the second image cannot be stably visually recognized when a light image is reproduced in the hologram forming region by a point light source. Further, for example, when the optical image is reproduced on the screen by the laser light, the second image becomes easy to observe.
In addition, when the second image is a positive image, the width of the drawing line is that the second image cannot be observed more stably when a light image is reproduced in the hologram forming area by a point light source. From this viewpoint, the upper limit of the width is preferably less than 0.1 mm, and more preferably 0.09 mm or less.

The image displayed as the second image only needs to be drawn with a drawing line, and can be the same as the content described in the section “(a) First image”.
For example, in FIGS. 4B, 5C, 7C, 8C, and 9C, the second image 14 is “1”, “2”, “3”. , “4” is shown as an example including four numerical images.
FIG. 10C shows an example in which the second image 14 includes a plurality of line graphic images drawn in parallel at equal intervals in a stripe shape within the frame shape.
Furthermore, FIG.11 (c) shows the example in which the 2nd image 14 contains the image of the some square-shaped figure drawn within the frame shape.
In FIGS. 9 to 11, (a) is an original image, (b) shows an optical image 12 reproduced in the hologram forming region 11 by a point light source, and (c) is a laser beam. The light image 12 reproduced on the screen 23 is shown.

The second image may include either a positive image or a negative image, or both.
In the present invention, it is particularly preferable that the second image is a negative image. The negative line can be easily made unobservable by covering the non-diffracted image area constituting the negative line with a thick reproduced diffraction image when the optical image is reproduced in the hologram forming area by the point light source. is there. Therefore, since the second image is a negative image, it becomes easy to form a second image that is not observed when the negative image is reproduced in the hologram forming area by a point light source.
In addition, the second image, which is a negative image, is formed at a position that overlaps the first image of the positive image in plan view, so that when the first image is observed by reproducing the optical image in the hologram formation region by the point light source This is because the presence of the second image can be effectively concealed. For this reason, the hologram structure is excellent in anti-counterfeiting properties and design properties.
4 (b), FIG. 5 (c), FIG. 8 (c), FIG. 9 (c), FIG. 10 (c) and FIG. 11 (c) already described, the second image 14 is a negative image. An example is shown.
FIG. 7C shows an example in which the second image 14 is a positive image.

The location where the second image is formed may be a location that does not overlap the first image in plan view, but is preferably a location that overlaps. When the first image is observed by reproducing the optical image in the hologram forming area by the point light source, the second image overlaps the first image in plan view, thereby effectively hiding the presence of the second image. it can. For this reason, the hologram structure is excellent in anti-counterfeiting properties and design properties.
When the first image and the second image overlap in a plan view, the first image and the second image are usually images having negative and positive opposites.
5, FIG. 7, FIG. 8, FIG. 10, and FIG. 11 described above show examples in which the formation position of the second image overlaps the first image in plan view. 5, FIG. 8, FIG. 10 and FIG. 11 show examples in which the first image of the positive image and the second image of the negative image overlap in plan view, and FIG. An example in which the first image and the second image of the positive image overlap in plan view is shown.
FIG. 9 already described shows an example in which the formation position of the second image is a position that does not overlap the first image in plan view.

(2) Reflective hologram forming area The reflective hologram forming area is an area where a phase Fourier transform hologram that records light incident from a point light source into a desired optical image is recorded.

Here, the recording of the phase type Fourier transform hologram means that the phase information of the Fourier transform image obtained through the Fourier transform of the original image is multi-valued and recorded as the depth. Therefore, a concavo-convex surface is formed in the hologram forming region of the hologram layer in which the phase Fourier transform hologram is recorded.
The hologram layer converts light incident from the point light source into a desired optical image, that is, functions as a Fourier transform lens, by the difference in height of the uneven shape constituting the uneven surface of the hologram forming region. With such a function, light incident from an arbitrary point light source is diffracted in a plurality of predetermined directions, and a predetermined image is formed as an optical image. The above function may be referred to as a “Fourier transform lens function”.
The hologram forming area is a reflection type, and when the point light source is arranged on the observation surface side opposite to the vapor deposition layer of the hologram layer, the hologram layer is viewed in plan view from the observation surface side. The optical image can be reproduced in the formation region.

  The hologram forming area refers to an area in which light incident from a point light source can be converted into a desired optical image, and specifically, a minimum that can include all of the hologram cells that can be converted into the optical image. It is a region surrounded by a rectangle of area.

The size of the hologram forming region in plan view may be any size as long as an optical image can be observed in the hologram forming region.
The size in plan view can be, for example, 2 mm square or more from the viewpoint of facilitating observation of a light image by an observer holding a hologram structure or an article having the hologram structure, and in particular, 5 mm square or more. It is preferably within a range of 30 mm square or less, and particularly preferably within a range of 10 mm square or more and 20 mm square or less. This is because when the lower limit of the size in plan view is within the above-described range, the hologram structure can easily view the first image included in the optical image in the hologram forming region. As a result, the anti-counterfeiting property and the design property are excellent.
In addition, since the upper limit of the size in plan view is within the above-described range, the hologram structure can be reduced in cost, and an image display layer or the like for displaying an image used in combination with an optical image or the like can be formed. This is because it becomes easy.
In addition, the planar view size of the hologram forming region being 5 mm square or more means that the hologram forming region has a planar view shape including at least a 5 mm square range. Therefore, when the hologram forming region is rectangular, the short side is 5 mm or longer, and when the hologram forming region is square, the length of one side thereof. Is 5 mm or more.

In the present invention, as shown in FIG. 12 (a), the hologram forming region has one hologram cell 11a on which a phase-type Fourier transform hologram is recorded that converts light incident from a point light source into a desired optical image. Although it may be a hologram forming region 11 (hereinafter, simply referred to as a hologram cell) (hereinafter, sometimes simply referred to as a single hologram region), it is generally shown in FIG. A hologram forming region 11 (hereinafter sometimes referred to as a large hologram region) in which a plurality of hologram cells 11a are arranged and enlarged as shown in FIG.
Note that “1” in FIG. 12 is an image of the first image 13 included in the optical image 12 expressed in a single or large hologram region.

When the hologram forming area is a large hologram area, the size of each hologram cell constituting the hologram forming area in plan view may be any size as long as the hologram forming area can be formed with high accuracy.
The size in plan view is preferably in the range of 0.25 mm square to 5 mm square. This is because, when the size in plan view is within the above range, the hologram structure can easily reproduce an optical image into the hologram forming region.
The size in plan view refers to the size of the smallest square that can contain the hologram cell. Accordingly, when the hologram cell is a square having a side of 1 mm, the size in plan view is 1 mm square. In addition, the planar view size when the planar view shape of the hologram cell is a circle having a diameter of 1 mm is 1 mm square.

  The ratio of the area in plan view in the hologram forming region of the hologram cell is not particularly limited as long as a desired optical image can be reproduced, but is preferably 25% or more, Especially, it is desirable that it is 50% or more. This is because, since the area ratio is in the above-described range, the hologram structure can clearly reproduce an optical image.

  The shape of the hologram cell in plan view may be any shape as long as it can form a hologram formation region having a desired plan view shape. Specifically, the shape in plan view is a square shape such as a square shape, a rectangular shape, a trapezoidal shape, a triangular shape, a polygonal shape such as a pentagonal shape, a hexagonal shape, a circular shape, an elliptical shape, a star shape, or a heart shape. However, from the viewpoint of easy formation of the hologram forming region, a rectangular shape is usually used.

In the present invention, the concavo-convex shape on the concavo-convex surface of the hologram forming region is a plurality of multi-valued Fourier transform images formed based on the image data of the original image to be displayed as a light image up to a desired range in the vertical and horizontal directions. This corresponds to the pattern of the Fourier transform image when arranged.
As a method for forming such a concavo-convex surface on a hologram forming region, any method can be used as long as it can form a concavo-convex surface capable of converting light incident from a point light source into a desired light image. The method can be used.
Specifically, the above forming method forms a master original having an uneven pattern corresponding to a Fourier transform image, and the unevenness of the original is applied to a coating film of a resin material such as an ultraviolet curable resin formed on a substrate such as PET. A method of forming a concavo-convex surface in a hologram forming region by transferring a pattern can be mentioned.
Further, by transferring the concave / convex pattern of the master original only once, a single hologram area composed of one hologram cell can be formed as the hologram formation area. Then, by transferring the concavo-convex pattern of the master original plate a plurality of times, a hologram layer having a large hologram forming region of a desired size in which a plurality of hologram cells are arranged can be formed as the hologram forming region.

As a method for forming a master original plate, a Fourier transform image is formed by calculation based on image data of an original image to be displayed. Next, the data obtained by converting the Fourier transform image data into a binary value or more is converted into electron beam drawing data, and the electron beam drawing data is arranged in a desired range. For example, 10 pieces of electron beam drawing data are arranged in the vertical and horizontal directions. Next, a method of creating a master original with an electron beam drawing apparatus based on the arranged data for electron beam drawing can be used.
When the data obtained by binarizing the data after the Fourier transform is used as the electron beam drawing data, the uneven shape of the uneven surface is a two-step uneven shape as shown in FIG. In the case of using a valuated one, a four-step uneven shape is obtained as shown in FIG.
In the present invention, it is preferable that the data of the Fourier transform image is multivalued to four or more values, that is, the concavo-convex shape is a concavo-convex shape having four or more steps. This is because an optical image having a complicated shape can be reproduced. In addition, the first image can be displayed in a large area within the hologram forming region.

The lattice pitch on the uneven surface may be any as long as it can convert light incident from a point light source into a desired light image.
Specifically, the lattice pitch is preferably in the range of 1.0 μm to 80.0 μm. This is because, when the grating pitch is within the above range, the hologram structure can easily reproduce an optical image into the hologram forming region.
Note that the lattice pitch refers to, for example, the width indicated by P in FIG.

Here, as illustrated in FIG. 14, the light source 21 is disposed at a predetermined distance L <b> 1 with respect to the hologram forming area 11 of the hologram structure 10, and the observer is positioned at a predetermined distance L <b> 2 from the hologram forming area 11. When the observer 20 observes the hologram forming area 11, the following expression (1) holds for the grating pitch so that the observer 20 can observe the entire image of the optical image in the entire area of the hologram forming area 11. Can do.
Λ is the wavelength of the diffracted light, P is the grating pitch of the concavo-convex surface, θ1 is the incident angle for reaching from the light source to the end of the hologram forming region, and θ2 is the diffracted light from the end of the hologram forming region. The diffraction angle for reaching, n is the order of diffraction.
P = nλ / (sin θ1 + sin θ2) (1)

As a specific calculation example of the grating pitch, when the hologram forming region is a square shape having a side of 15 mm, L1 is 50 mm, L2 is 300 mm, and light has a wavelength of 550 nm, sin θ2 = 0.025. Yes, sin θ1 = 0.148, and the grating pitch P necessary for the observer to observe the entire image of the optical image in the entire hologram forming area is calculated to be 3179 nm at the shortest.
In addition, when the hologram forming area is a square shape with one side of 15 mm, L1 is 1990 mm, L2 is 2000 mm, and light has a wavelength of 550 nm, sin θ2 = 0.00374 and sin θ1 = 0.00377 is calculated. The lattice pitch P is calculated to be 73236 nm at the shortest.
Furthermore, when the hologram forming area is a square shape with a side of 10 mm, L1 is 60 mm, L2 is 60 mm, and light has a wavelength of 550 nm, sin θ2 = 0.083 and sin θ1 = 0.083 is calculated. The lattice pitch P is calculated to be 3313 nm at the shortest.

The depth of the uneven shape can be about 0.01 μm.
For example, the depth is indicated by D in FIG.

In the hologram formation region, the wavelength of the point light source capable of exhibiting the above-described Fourier transform lens function is not particularly limited, and a desired wavelength can be targeted. Further, the wavelength of the point light source is not limited to monochromatic light of one wavelength, but may be light including multiple wavelengths, and may be white light.
Further, the wavelength of the laser beam capable of exhibiting the above-described Fourier transform lens function is not particularly limited, and a desired wavelength can be targeted. The wavelength of the laser light is usually monochromatic light of one wavelength.

(3) Diffraction grating cell In the hologram forming region, only the hologram cell capable of converting the light incident from the point light source into the optical image may be arranged. A hologram cell that can be converted into an image, and a diffraction grating cell that is formed on the same plane as the hologram cell and draws a diffraction grating pattern by arranging the hologram cell in a plan view. May be.
A hologram cell in which a phase-type Fourier transform hologram is recorded that converts light incident from a point light source into a desired light image and a diffraction grating cell that draws a diffraction grating pattern are disposed in the hologram formation region. Both the optical image and the diffraction grating pattern can be reproduced in the hologram forming area.
For example, when the reflective hologram forming region has a reflective cell and a diffraction grating cell, both the optical image and the diffraction grating pattern can be reproduced in the reflective hologram forming region.
The hologram structure can reproduce the diffraction grating pattern in the hologram forming area before the light from the point light source is incident, and can reproduce the optical image when the light from the point light source is incident. For this reason, the hologram structure can be assumed to have a diffraction grating pattern recorded in the hologram formation region and no optical image is recorded, and can be excellent in information confidentiality. .
Therefore, by combining the optical image and the diffraction grating pattern, the hologram structure is excellent in anti-counterfeiting and design properties.

A hologram structure in which hologram cells and diffraction grating cells are arranged in the hologram forming region will be described with reference to the drawings.
FIG. 15A is a schematic plan view showing an example of a hologram structure when the hologram forming region 11 has both the hologram cell 11a and the diffraction grating cell 15a, and FIG. It is a BB line sectional view of).
FIG. 15 shows an example in which the diffraction grating pattern 15 is a letter “F”.

  Here, being formed on the same plane means that the hologram cell and the diffraction grating cell are formed on the same surface of the hologram layer. That is, both the uneven surface of the hologram cell and the uneven surface of the diffraction grating cell are formed on the same surface of the hologram layer.

The diffraction grating pattern is one in which a pattern having a diffraction grating cell is reproduced by irradiating visible light as reference light.
Here, the diffraction grating pattern is a pattern drawn by the diffraction grating cells arranged in a pattern in plan view. It is drawn by replacing with a cell.
FIG. 15 which has already been described shows an example in which the diffraction grating pattern 15 is drawn by arranging the diffraction grating cells 15a in the pattern of the letter “F”. , The letter “F” is reproduced as the diffraction grating pattern 15 in the hologram forming region 11.

  Specifically, the design can be appropriately set according to the application of the hologram structure of the present invention. For example, “(a) First image” of “(1) Optical image” The content can be the same as the content of the image described in the section.

In addition, as a pattern that can improve the anti-counterfeiting property and the design property in comparison with the case of the light image alone, in combination with the above-described light image, specifically, examples shown in FIGS. As shown in FIG. 16C, an arrow indicating the reproduction position of the optical image, a frame surrounding the reproduction area of the optical image, a symbol used to recognize the optical image such as a character indicating the reproduction position of the optical image, When the optical image represents a part of the graphic as illustrated in (d), the optical image as illustrated in FIGS. 16 (e) and 16 (f), which represents another part of the graphic. Is an image representing a part of a character string or a number sequence, a pattern representing another part of the character string or the number sequence, a cloud arranged around the sun when the light image is an image representing the sun, Reproduced in the hologram formation area, such as a design representing the background of the sky, etc. It can be given a design such as to form an image with one unity in combination with the light image.
FIGS. 16A, 16C and 16E show the state before the optical image reproduction, and FIGS. 16B, 16D and 16F show the state when the optical image is reproduced. Is shown. More specifically, FIGS. 16B, 16 </ b> D, and 16 </ b> F show a state in which the first image 13 is displayed by the optical image 12.
Further, in FIGS. 16A and 16B, the diffraction grating pattern 15 is an arrow indicating the reproduction position of the optical image in the hologram forming region 11. 16C and 16D, the diffraction grating pattern 15 is a part of an ellipse, and can display one ellipse in combination with other parts of the ellipse indicated by the optical image. In FIGS. 16E and 16F, the diffraction grating pattern 15 is a part of the character string “real” and has one meaning in combination with other parts of the character string “real” indicated by the optical image. The character string “real” can be displayed.

The diffraction grating symbol may be a planar diffraction grating symbol that can reproduce the symbol in plan, or a three-dimensional diffraction grating symbol that can reproduce the symbol in three dimensions.
Since the diffraction grating pattern is a plane diffraction grating pattern, it becomes possible to combine the plane diffraction grating pattern and the optical image, so that the hologram structure has excellent anti-counterfeiting and design properties. It is. Moreover, it is easy to make the plane diffraction grating pattern high in brightness, and a diffraction grating pattern with excellent visibility can be reproduced.
Since the above-mentioned diffraction grating pattern is a three-dimensional diffraction grating pattern, it becomes possible to combine a three-dimensional diffraction grating pattern and an optical image, so that the hologram structure has excellent anti-counterfeiting and design properties. is there.
The diffraction grating design may be a planar diffraction grating design, a three-dimensional diffraction grating design, or a combination of both.

As a method for forming the above-mentioned plane diffraction grating pattern, a method can be used in which the diffraction grating pattern is drawn using diffraction grating cells having the same amplitude of diffracted light.
Further, as a method for making the amplitude of the diffracted light to be approximately the same, as described in Japanese Patent No. 4998438, a region where the diffraction grating of the diffraction grating cell is formed (hereinafter simply referred to as a diffraction grating formation region). In the same area). That is, the plane diffraction grating pattern can be drawn by spreading diffraction grating cells having the same area of the diffraction grating formation region. In addition, as for the area of the diffraction grating forming region, the diffraction grating cell having the same area as the diffraction grating forming region may be used as long as the plane diffraction grating pattern can be reproduced. It is appropriately set according to the size of the diffraction grating pattern, the presence or absence of color display, and the like.

Examples of a method for forming the three-dimensional diffraction grating pattern include a method in which a diffraction grating cell having a large amplitude of diffracted light is arranged closer to the center than to the end of the diffraction grating.
More specifically, in FIG. 15A, the letter “F” is drawn by drawing lines in which three diffraction grating cells are arranged in the width direction (for example, 15a1, 15a2, and 15a3). In this case, by making the diffraction grating cell 15a2 disposed on the central side closer to the diffraction grating cells 15a1 and 15a3 disposed on the end side in the width direction of the drawing line, the diffraction grating cell having a larger amplitude of diffracted light, When the reference light is irradiated, it is possible to reproduce the character “F” so that it appears three-dimensionally.
Further, as a method of increasing the amplitude of the diffracted light from the end side to the center side, as described in Japanese Patent No. 498494938, the diffraction grating forming region has a wide area from the end side to the center side. A method of arranging lattice cells can be mentioned. In other words, the three-dimensional diffraction grating pattern may have a diffraction grating cell in which the area of the diffraction grating forming region is larger than the end part side of the diffraction grating pattern.
For example, as illustrated in FIG. 17 which is an enlarged view of the diffraction grating cells 15a1 to 15a3 in FIG. 15A, the diffraction grating cells 15a1 and 15a3 arranged on the end side in the width direction of the drawing line are centered. The diffraction grating cell 15a2 arranged on the part side can be a diffraction grating cell having a large area of the diffraction grating formation region 15b.

The ratio of the area of the diffraction grating cell in the hologram forming region in plan view is not particularly limited as long as a desired diffraction grating pattern can be drawn.
The ratio of the total area of the diffraction grating cells to the total area of the hologram cells in the hologram forming area (total area of the diffraction grating cells / total area of the hologram cells) clearly reproduces both the optical image and the diffraction grating pattern. Although it is not particularly limited as long as it is possible, when the diffraction grating pattern is a plane diffraction grating pattern, it is preferably within a range of 1/4 to 3/2. It is preferably within the range of 2-1 and particularly preferably within the range of 5/8 to 7/8. This is because, when the area ratio is within the above range, the hologram structure has excellent visibility of both the optical image and the planar diffraction grating pattern.
The total area ratio is preferably in the range of 1/3 to 4 when the diffraction grating pattern is a three-dimensional diffraction grating pattern, and more preferably in the range of 2/3 to 3. It is preferable that it is in the range of 1-2 especially. This is because, when the area ratio is within the above-described range, the hologram structure has excellent visibility of both the optical image and the three-dimensional diffraction grating pattern.

The grating pitch, grating angle, and grating density (area ratio of the grating cell occupied by the diffraction grating cell with respect to the pattern) of the diffraction grating cell are appropriately set according to the pattern reproduced when the reference light is irradiated. Is.
For example, by setting the grating pitch to about 1.2 μm, about 1.0 μm, and about 0.8 μm, respectively, the light for wavelengths of 600 nm (for red), 500 nm (for green), and 400 nm (for blue) is diffracted, respectively. The color image can be reproduced.
Further, various symbols can be expressed by the lattice angle and the lattice density.

  The size of the diffraction grating cell in plan view can be appropriately set according to the diffraction grating pattern to be reproduced, and can be set to, for example, 5 μm square or more and 100 μm square or less. This is because a high-definition diffraction grating pattern can be drawn with the size in plan view. In addition, it is possible to conceal the existence of individual diffraction grating cells for drawing a diffraction grating pattern.

  The shape of the diffraction grating cell in plan view can be set as appropriate according to the diffraction grating pattern to be reproduced, but can be the same as that of the hologram cell, for example.

  The method of forming the concavo-convex surface of the diffraction grating cell in the hologram forming region can be the same as the general diffraction grating pattern forming method.

The reference light used for reproducing the diffraction grating pattern is not particularly limited, and those used for general holograms can be used.
Specifically, light including visible light can be used as the reference light.
For example, the reference light can be the same as the point light source used for reproducing the optical image recorded in the hologram cell of the hologram layer.
The light source of the reference light is not limited to a point light source, and may be parallel light such as sunlight.
For example, the hologram structure can be reproduced in a bright place where reference light from a light source other than the point light source is irradiated. The optical image can also be reproduced by arranging in the position.

(4) Others The material constituting the hologram layer is not particularly limited as long as it can form an uneven shape for exhibiting the above-described Fourier transform lens function in the hologram forming region and exhibits a predetermined refractive index. . The refractive index of the material constituting the hologram layer is not particularly limited, and can be appropriately set according to the use of the hologram structure of the present invention.
Moreover, the wavelength used as the reference | standard of the said refractive index is not specifically limited, What is necessary is just to select suitably from the range of 400 nm-750 nm. In particular, in the present invention, the refractive index at a wavelength of 555 nm is preferably in the range of 1.3 to 2.0, and particularly preferably in the range of 1.33 to 1.8. Here, the refractive index can be measured by a spectroscopic ellipsometer.

  As a material of the hologram layer, resin materials conventionally used for forming relief holograms, for example, cured products of curable resins such as thermosetting resins, ultraviolet curable resins, ionizing radiation curable resins, A thermoplastic resin or the like can be used.

  Examples of the thermosetting resin include unsaturated polyester resins, acrylic modified urethane resins, epoxy modified acrylic resins, epoxy modified unsaturated polyester resins, alkyd resins, and phenol resins. Examples of the thermoplastic resin include acrylate resin, acrylamide resin, nitrocellulose resin, polystyrene resin, and the like. These resins may be homopolymers or copolymers composed of two or more components. Moreover, these resin may be used independently and may use 2 or more types together.

  The thermosetting resin or thermoplastic resin described above includes various isocyanate compounds, metal soaps such as cobalt naphthenate and zinc naphthenate, organic peroxides such as benzoyl peroxide and methyl ethyl ketone peroxide, benzophenone, acetophenone, anthraquinone, naphthoquinone, A thermal or ultraviolet curing agent such as azobisisobutyronitrile or diphenyl sulfide may be included.

  Examples of the ionizing radiation curable resin include an epoxy-modified acrylate resin, a urethane-modified acrylate resin, an acrylic-modified polyester resin, and the like. Among them, a urethane-modified acrylate resin is preferable, and particularly shown in JP-A-2007-017643. A urethane-modified acrylic resin represented by the following chemical formula is preferred.

  When the ionizing radiation curable resin is cured, a monofunctional or polyfunctional monomer, oligomer, or the like can be used in combination for the purpose of adjusting the cross-linked structure and viscosity. Examples of the monofunctional monomer include mono (meth) acrylates such as tetrahydrofurfuryl (meth) acrylate, hydroxyethyl (meth) acrylate, vinylpyrrolidone, (meth) acryloyloxyethyl succinate, and (meth) acryloyloxyethyl phthalate. Etc. In addition, as a bifunctional or higher monomer, classified according to a skeleton structure, polyol (meth) acrylate (for example, epoxy-modified polyol (meth) acrylate, lactone-modified polyol (meth) acrylate, etc.), polyester (meth) acrylate, epoxy (meth) ) Acrylate, urethane (meth) acrylate, other polybutadiene, isocyanuric acid, hydantoin, melamine, phosphoric acid, imide, phosphazene, and other poly (meth) acrylates. Furthermore, various monomers, oligomers, and polymers that are ultraviolet and electron beam curable can be used.

  More specifically, examples of the bifunctional monomer and oligomer include polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and 1,6-hexanediol di (meth). An acrylate etc. are mentioned. Examples of the trifunctional monomer, oligomer, and polymer include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, and aliphatic tri (meth) acrylate. Examples of tetrafunctional monomers and oligomers include pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, and aliphatic tetra (meth) acrylate. Examples of pentafunctional or higher functional monomers and oligomers include dipentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate. Moreover, the (meth) acrylate etc. which have a polyester frame | skeleton, a urethane frame | skeleton, and a phosphazene frame | skeleton are mentioned. The number of functional groups is not particularly limited, but if the number of functional groups is less than 3, the heat resistance tends to decrease, and if it exceeds 20, the flexibility tends to decrease. The thing within the range of 3-20 is preferable.

  The content of the monofunctional or polyfunctional monomer and oligomer as described above can be appropriately adjusted, but it is usually preferably 50 parts by weight or less with respect to 100 parts by weight of the ionizing radiation curable resin. The range of 0.5 to 20 parts by weight is preferable.

  In addition, the hologram layer may be a photopolymerization initiator, a polymerization inhibitor, an anti-degradation agent, a plasticizer, a lubricant, a colorant such as a dye or pigment, a surfactant, an antifoaming agent, a leveling agent, a thixotropic property, if necessary. You may add additives, such as an imparting agent, suitably.

The film thickness of the hologram layer is preferably in the range of 0.05 mm to 5 mm, more preferably in the range of 0.1 mm to 3 mm, when the hologram layer has self-supporting properties. On the other hand, when the hologram layer does not have a self-supporting property and is formed on a transparent substrate to be described later, the film thickness of the hologram layer is preferably within a range of 0.1 μm to 50 μm, particularly 2 μm to 20 μm. It is preferable to be within the range.
The film thickness of the hologram layer is specifically the distance indicated by a in FIG.
The size of the hologram layer in plan view can be appropriately set according to the use of the hologram structure of the present invention.

The hologram layer in the present invention has at least a hologram forming region, but may have a region where a concavo-convex shape is not formed (non-hologram forming region) in addition to the hologram forming region.
The proportion of each region in the hologram layer is not particularly limited and can be appropriately selected depending on the application.

2. Vapor deposition layer The vapor deposition layer in this invention is formed so that the uneven | corrugated surface of the hologram formation area of a hologram layer may be touched.

The said vapor deposition layer may have transparency and may have reflectivity.
When the said vapor deposition layer is a transparent vapor deposition layer which has transparency, when a hologram structure is planarly viewed, a hologram formation area will not be glossy. For this reason, the hologram structure is one in which the hologram forming region is concealed, and the hologram structure is excellent in anti-counterfeiting and design properties.
On the other hand, when the vapor deposition layer is a reflective vapor deposition layer having reflectivity, the hologram structure can reproduce a light image clearly in the hologram formation region. For this reason, the hologram structure is excellent in anti-counterfeiting and design properties.

The transparent vapor-deposited layer preferably has a total light transmittance (hereinafter sometimes simply referred to as light transmittance) of 80% or more, and more preferably 90% or more. This is because the hologram structure is such that the hologram forming region is more concealed due to the light transmittance.
In addition, the said light transmittance is the value measured by JISK7361-1 (the test method of the total light transmittance of a plastic-transparent material).

The material constituting the vapor deposition layer is not particularly limited as long as it is a material that produces a refractive index difference with the hologram layer. Examples of the material capable of forming the reflective deposition layer include Mg, Al, Ti, Cr, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Rb, Pd, Ag, Cd, In, and Sn. , Sb, Te, Au, Pb, or Bi.
Moreover, as a material which can form the said transparent vapor deposition layer, the said metal oxide can be mentioned, for example.
The said material can also use what combined single or 2 or more materials.

The thickness of the vapor deposition layer can be appropriately set from the viewpoints of desired reflectivity, color tone, design, application, etc., for example, preferably in the range of 50 to 1 μm, and more preferably in the range of 100 to 1000 μm. It is preferable.
In addition, the thickness of the said vapor deposition layer is specifically the distance shown by b of FIG. 2 already demonstrated.

  The formation position of the vapor deposition layer only needs to overlap at least all the uneven surfaces in the hologram forming region in plan view, and may cover the entire surface on the uneven surface side of the hologram layer.

  As a formation method of the said vapor deposition layer, the formation method of a general vapor deposition layer can be used, A vacuum vapor deposition method, sputtering method, an ion plating method etc. can be mentioned.

3. Other Configurations The hologram structure of the present invention has a hologram layer and a vapor deposition layer, but may have other configurations as necessary.

(1) Transparent substrate The hologram structure of the present invention may have a transparent substrate formed on the surface of the hologram layer opposite to the vapor deposition layer. It is because the thermal or mechanical strength of the hologram structure of the present invention can be increased by having a transparent substrate.

The transparent substrate may be formed so as to be in direct contact with the hologram layer, or may be formed via another layer.
For example, the transparent substrate can be bonded to the hologram layer surface via an interlayer adhesive layer described later.

  The light transmittance of the transparent substrate is preferably 80% or more, and more preferably 90% or more. This is because by making the light transmittance of the transparent substrate within the above-mentioned range, the hologram structure becomes easy to visually recognize the optical image.

  Moreover, the said transparent base material is so preferable that a haze value is low, Specifically, the thing whose haze value is in the range of 0.01%-5% is preferable, and in particular within the range of 0.01%-3%. Some are preferred, especially those in the range of 0.01% to 1.5%. This is because by setting the haze value of the transparent substrate within the above range, it is possible to display an optical image that appears in the hologram forming region without impairing the visibility. In addition, the haze value of the said transparent base material shall be the value measured based on JISK7136.

  The constituent material of the transparent substrate is not particularly limited as long as it exhibits the above light transmittance and haze value. For example, polyethylene terephthalate, polycarbonate, acrylic resin, cycloolefin resin, polyester resin, polystyrene resin A glass such as a resin film such as an acrylic styrene resin, quartz glass, Pyrex (registered trademark), or a synthetic quartz plate can be used. Among these, as the transparent substrate, it is preferable to use a resin film from the viewpoint of light weight and less risk of breakage and the like, and polycarbonate is optimal from the viewpoint of birefringence.

The transparent substrate may contain an additive as necessary.
Examples of the additive include a dispersant, a filler, a plasticizer, and an antistatic agent.

  The film thickness of the transparent substrate may be any thickness that can provide rigidity and strength for supporting the hologram layer and the like, and is preferably about 0.005 mm to 5 mm, for example. It is preferably within a range of 02 mm to 1 mm. Further, the shape of the transparent substrate is not particularly limited, and can be appropriately selected according to the usage form of the hologram structure of the present invention.

  In order to improve the adhesiveness with the other layers, for example, the surface of the transparent substrate may be subjected to corona treatment or the like.

(2) Image Display Layer The hologram structure of the present invention preferably has an image display layer that displays an image used in combination with the optical image.
This is because an image displayed by the image display layer and an optical image reproduced in the hologram forming region can be combined, and the hologram structure has excellent anti-counterfeiting and design properties. .

Here, the image is not particularly limited as long as it can improve anti-counterfeiting and design properties by combining with an optical image.
Specifically, the image can be set as appropriate according to the application of the hologram structure of the present invention. For example, not only patterns, line drawings, characters, figures, symbols, but also the entire surface is colored. This embodiment is also included.
Moreover, as an image that can further improve anti-counterfeiting and design properties by combining with the optical image, for example, as illustrated in FIGS. 18 (a) and (b), an arrow indicating the formation location of the hologram formation region, A frame surrounding the formation location, an image used for recognizing a hologram formation region such as a character indicating the formation location, and the optical image is a part of a figure as illustrated in FIGS. 18C and 18D , An image representing another part of the figure, and when the optical image is an image representing a part of a character string or a number sequence as illustrated in FIGS. 18 (e) and (f), An image representing another part of a character string or number sequence, and when the light image is an image representing the sun, it is reproduced in the hologram forming area such as an image representing a background such as a cloud or sky arranged around the sun. Light image Images with a single unity in combination can be given image or the like to form a.
18 (a), (c) and (e) respectively show the state before the optical image reproduction, and FIGS. 18 (b), (d) and (f) respectively show the state during the optical image reproduction. Is shown. More specifically, FIGS. 18B, 18 </ b> D, and 18 </ b> F show a state in which the first image 13 is displayed by the optical image 12.
In FIGS. 18A and 18B, the image 16 is an arrow indicating the formation location of the hologram formation region 11, and a character string representing “real” can be reproduced as an optical image in the hologram formation region 11. Is. In FIGS. 18C and 18D, the image 16 is a part of an ellipse, and one ellipse can be displayed in combination with other parts of the ellipse indicated by the optical image. In FIGS. 18E and 18F, the image 16 is a part of the character string “real”, and one meaningful character in combination with the other part of the character string “real” shown by the optical image 12. The column “real” can be displayed.

The image display layer is not particularly limited as long as it can display a desired image. Examples thereof include a second hologram layer.
The printed layer can easily draw images of various colors and patterns. The second hologram layer can display an image only when irradiated with reference light. For this reason, it is because the said printed layer etc. can form easily the hologram structure excellent in forgery prevention property and design property.
The image display layer may be only one type or may be a combination of two or more types. For example, the image display layer may include a plurality of print layers, a print layer, and a second hologram layer.
Hereinafter, the print layer and the second hologram layer will be described.

(A) Print layer The print layer has a colorant and a resin material.
Examples of the resin material include polycarbonates, polyesters, cellulose derivatives, norbornene resins, polyvinyl chlorides, polyvinyl acetates, acrylic resins, urethane resins, polypropylenes, polyethylenes, styrenes, and the like. These resins can be used.
As the coloring material, those generally used as a printing layer can be used, pigments such as inorganic pigments and organic pigments, acidic dyes, direct dyes, disperse dyes, oil-soluble dyes, metal-containing oil-soluble dyes, and sublimation properties. And dyes such as pigments.
In addition, as the coloring material, a fluorescent light emitting material such as an ultraviolet light emitting material and an infrared light emitting material that emits fluorescence by absorbing ultraviolet light or infrared light, particles that become a reflecting mirror such as a polarized cholesteric polymer liquid crystal pigment, glass beads, and the like are also used. Can do.
As the printing layer forming method, that is, the printing method, a method similar to a general printing layer forming method can be used. Specific examples of the printing method include various printing methods such as inkjet printing, screen printing, offset printing, gravure printing, and flexographic printing.
Moreover, as an ink used for the said printing layer, what is used for formation of a general printing layer can be used, and what dispersed or melt | dissolved the said resin material and the coloring material in the solvent can be used.

The formation position of the printing layer is not particularly limited as long as it does not hinder the reproduction and visual recognition of the optical image in the hologram formation region. The hologram layer has a hologram on the surface opposite to the vapor deposition layer. It can be on the same plane as the layer, on the surface of the vapor deposition layer opposite to the hologram layer, or the like.
The printed layer may overlap the hologram forming region in plan view, but usually does not overlap.
FIG. 19A shows an example in which the print layer 4 is formed on the surface of the transparent substrate 3 opposite to the hologram layer 1.

(B) Second hologram layer The second hologram layer has a diffraction grating pattern drawn by a diffraction grating cell arranged in a pattern in plan view, and the diffraction grating cell is arranged by irradiating reference light. The pattern having the pattern shape is reproduced.
Such a diffraction grating pattern, diffraction grating cell, and reference light can be the same as the contents described in the above-mentioned “1. Hologram layer”, and thus description thereof is omitted here.

The material constituting the second hologram layer is not particularly limited as long as it can form an uneven shape functioning as a diffraction grating included in the diffraction grating cell.
Such a material can be the same as the constituent material of the hologram layer described in the section “1. Hologram layer”.

  The film thickness of the second hologram layer is not particularly limited as long as it can stably form the concavo-convex shape of the diffraction grating, and can be the same as the hologram layer described in the section “1. Hologram layer”. .

The formation position of the second hologram layer is not particularly limited as long as it does not hinder the reproduction and visual recognition of the optical image in the hologram formation region, and is on the surface opposite to the concavo-convex surface of the hologram layer. It can be on the same plane as the hologram layer, on the uneven surface of the hologram layer, or the like.
FIG. 19B shows the second hologram layer 6 and the second vapor deposition layer 7 formed so as to be in contact with the uneven surface of the diffraction grating pattern of the second hologram layer 6 on the uneven surface of the hologram layer 1. An example in which the region 11 is formed so as not to overlap with the region 11 is shown, and is formed through the vapor deposition layer 2 and the interlayer adhesive layer 5.
FIG. 19C shows an example in which the second hologram layer 6 is arranged on the same plane as the hologram layer 1. In FIG. 19C, the second hologram layer 6 and the hologram layer 1 are integrally formed, and the concave / convex shape forming surface of the diffraction grating of the second hologram layer 6 is the formation surface of the concave / convex surface of the hologram layer 1. An example that is identical to

The hologram structure of the present invention may have a second vapor deposition layer formed so as to be in contact with the uneven surface of the diffraction grating pattern of the second hologram layer.
The second vapor deposition layer is not particularly limited as long as the second hologram layer can function as a reflection type, and is generally used for a reflection hologram. Can do. Specifically, the second vapor deposition layer can be the same as the content described in the section “2. Vapor deposition layer”.
In FIG. 19B described above, the second hologram layer 10 is formed on the surface of the second hologram layer 6 opposite to the hologram layer 1 so as to be in contact with the uneven surface of the second hologram layer. The example which has the vapor deposition layer 7 is shown. FIG. 19C shows an example in which the second vapor deposition layer 7 formed so as to be in contact with the uneven surface of the diffraction grating pattern of the second hologram layer 6 is formed integrally with the vapor deposition layer 2. .

(3) Interlayer Adhesive Layer The hologram structure of the present invention may have an interlayer adhesive layer that adheres the components.
In addition, about an interlayer contact bonding layer, what is generally used for a hologram structure can be used, and it is suitably selected according to the material which comprises the said transparent base material, a hologram layer, etc.
As the interlayer adhesive layer, for example, a known adhesive layer such as a two-component curable adhesive layer, an ultraviolet curable adhesive layer, a thermosetting adhesive layer, or a hot melt adhesive layer can be used.
About the thickness of the said interlayer contact bonding layer, it sets suitably by the magnitude | size etc. of the structure to adhere | attach.

(4) Adhesive layer The hologram structure of the present invention may have an adhesive layer formed on the surface of the vapor deposition layer opposite to the hologram layer. This is because the hologram structure can be easily attached to an adherend by having an adhesive layer.

  The adhesive layer may have transparency or may have light shielding properties.

The adhesive layer may be a pressure-sensitive adhesive layer, or a re-peeling adhesive layer having both adhesion and re-peeling properties.
The adhesive layer is an adhesive layer such as a two-component curable adhesive layer, an ultraviolet curable adhesive layer, a thermosetting adhesive layer, or a hot-melt adhesive layer similar to the interlayer adhesive layer. Also good.
When the adhesive layer is a pressure-sensitive adhesive layer, the hologram structure of the present invention can be firmly attached to a desired member, and the hologram structure can be hardly peeled off from the adherend.
Further, when the adhesive layer is a re-peeling adhesive layer, the hologram structure of the present invention is bonded to a desired member by adhering so that air does not enter between the re-peeling adhesive layer and the adherend. Can do. Such a re-peeling adhesion layer can easily perform adhesion and peeling repeatedly without leaving a mark due to an adhesive or the like on the adherend, and can suppress damage to the adherend.

  When the adhesive layer is a pressure-sensitive adhesive layer, examples of the resin used for the pressure-sensitive adhesive layer include acrylic resins, ester resins, urethane resins, ethylene vinyl acetate resins, latex resins, epoxy resins, and polyurethanes. Examples thereof include ester resins, fluorine resins such as vinylidene fluoride resin (PVDF) and vinyl fluoride resin (PVF), and polyimide resins such as polyimide, polyamideimide, and polyetherimide. The resin is preferably an acrylic resin, a urethane resin, an ethylene vinyl acetate resin, or a latex resin.

  When the adhesive layer is a re-peeling adhesive layer, examples of the resin used for the re-peeling adhesive layer include acrylic resins, acrylic ester resins, copolymers thereof, styrene-butadiene copolymers, Examples include natural rubber, casein, gelatin, rosin ester, terpene resin, phenolic resin, styrene resin, coumarone indene resin, polyvinyl ether, and silicone resin. The resin is preferably an acrylic resin or a silicone resin. This is because the acrylic resin can be bonded even when the surface of the adherend has some unevenness. In addition, the silicone resin is less likely to decrease in adhesive strength even when adhesion and peeling are repeated.

  The thickness of the adhesive layer is appropriately selected according to the type and use of the hologram structure of the present invention, but is usually preferably in the range of 1 μm to 500 μm, and more preferably in the range of 2 μm to 50 μm. It is preferable. This is because the adhesive layer is excellent in adhesiveness when the thickness is within the above-described range.

(5) Release sheet Moreover, as for the hologram structure of this invention, the release sheet may be arrange | positioned on the contact bonding layer mentioned above. Immediately before the hologram structure of the present invention is bonded to a desired adherend via the adhesive layer, the release sheet and the adhesive layer can be peeled off and used. Thereby, it can prevent that a foreign material adheres between a contact bonding layer and a to-be-adhered body.

The release sheet is not particularly limited as long as it can protect the adhesive layer and can be easily released from the adhesive layer. As such a release sheet, for example, a layer made of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS) or the like can be used.
The thickness of the release sheet is appropriately selected according to the type and application of the hologram structure of the present invention.

  Moreover, it is preferable that the surface of the release sheet on the side in contact with the adhesive layer is subjected to a release treatment in order to facilitate the release operation with the adhesive layer. Examples of such treatment methods include silicone treatment and alkyd treatment, but are not particularly limited.

(6) Arbitrary member Furthermore, the hologram structure of the present invention may have an ultraviolet absorbing layer, an infrared absorbing layer, an antireflection layer or the like on the transparent substrate or on the non-hologram forming region of the hologram layer. Good. By having such a layer, the hologram structure can be given an ultraviolet absorption function, an infrared absorption function, an antireflection function, etc., and the hologram structure of the present invention can be used as various filters. Become.
Since these layers can be the same as those generally used, description thereof is omitted here.

4). Hologram Structure The hologram structure of the present invention may be used by adhering the hologram structure to an adherend or may be used without adhering to the adherend.

The embodiment to be used by adhering to the adherend is not particularly limited as long as it has an adhesive layer used for adhesion to the adherend, and the opposite side of the vapor deposition layer from the hologram layer. A mode (first usage mode) used as a hologram seal, having an adhesive layer formed on the surface, a heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and the hologram layer A peeling layer formed on the surface opposite to the vapor deposition layer, and a peeling base formed on the surface of the peeling layer opposite to the hologram layer, and a hologram transfer foil. A mode (second usage mode) used as a heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and a surface of the heat seal layer opposite to the vapor deposition layer. Paper base and An adhesive layer formed on the surface of the paper base opposite to the heat seal layer, and a release sheet formed on the surface of the adhesive base opposite to the paper base, and a label Examples (third usage mode) used as the above can be mentioned.
Moreover, as an aspect used without adhere | attaching on the said adherend, the aspect (4th usage aspect) etc. which the said hologram structure is used as an information recording medium can be mentioned.

(1) First Usage Mode A first usage mode of the hologram structure of the present invention has an adhesive layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and is used as a hologram seal. is there.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 20A is a schematic cross-sectional view showing an example of the hologram structure according to this aspect. As illustrated in FIG. 20A, the hologram structure 10 of this embodiment includes an adhesive layer 31 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1 and is used as a hologram seal. It is what
Note that the reference numerals in FIG. 20A indicate the same members as those in FIGS. 1 and 2, and a description thereof will be omitted here.
In this example, the hologram structure 10 has a release sheet 32 on the surface of the adhesive layer 31 opposite to the vapor deposition layer 2.

According to this aspect, by having the adhesive layer, it is easy to adhere the hologram structure to the adherend using the adhesive layer, and the hologram structure is easily forged against the adherend. And design properties can be imparted.
As a specific application of the hologram structure of this embodiment, a point light source is placed on the hologram forming area by attaching it to a ticket, a branded product, a product quality control number label, etc. Examples thereof include applications for determining authenticity using a light image reproduced on a screen and a light image reproduced on a screen or the like by irradiating laser light, applications for imparting design properties, and the like.

The hologram structure of this aspect has an adhesive layer.
The adhesive layer can be the same as that described in the section “3. Other Configurations”.
Further, the hologram structure according to this aspect may have other configurations described in the above-mentioned section “3. Other configurations” as necessary.

(2) Second usage mode A second usage mode of the hologram structure of the present invention includes a heat seal layer formed on a surface of the vapor deposition layer opposite to the hologram layer, and the vapor deposition layer of the hologram layer. Has an easy peeling layer formed on the surface on the opposite side, and a peeling substrate formed on the surface of the easy peeling layer on the side opposite to the hologram layer, and is used as a hologram transfer foil. is there.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 20B is a schematic cross-sectional view showing an example of the hologram structure according to this aspect. As illustrated in FIG. 20B, the hologram structure 10 according to this aspect includes a heat seal layer 33 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1, and the hologram layer 1. A peelable layer 34 formed on the surface opposite to the vapor deposition layer 2, and a peelable substrate 35 formed on the surface of the peelable layer 34 opposite to the hologram layer 1. It is used as a hologram transfer foil.
In addition, about the code | symbol in FIG.20 (b), since it shows the member same as the thing of FIG. 1 and FIG. 2, description here is abbreviate | omitted.
In this example, the hologram structure 10 has a release sheet 32 on the surface of the heat seal layer 33 opposite to the vapor deposition layer 2.

According to this aspect, it is easy to adhere the hologram structure to an adherend using a heat seal layer, and the hologram structure can easily impart anti-counterfeiting and design properties to the adherend. .
Further, since the peeling base material is formed on the opposite side of the hologram layer from the vapor deposition layer via the peeling layer, it is possible to prevent the hologram structure from being damaged before being attached to the adherend.
As a specific application of the hologram structure of this embodiment, a point light source is placed on a hologram forming region by transferring it in a desired pattern shape onto a ticket, a branded product, a product quality control number label, or the like. And the use of performing authenticity determination using the light image reproduced in the hologram forming region and the light image reproduced on the screen or the like by irradiating the laser beam, the use of imparting design properties, and the like.

The hologram structure of this embodiment has a heat seal layer, a peelable layer and a peeling substrate.
Hereafter, each structure of the hologram structure of this aspect is demonstrated in detail.

  The heat seal layer has a function of bonding the hologram layer and the vapor deposition layer to the adherend.

Such a heat seal layer is not particularly limited as long as it can adhere the hologram layer and the adherend, and the adherend onto which the hologram layer and the vapor deposition layer are transferred from the hologram structure of the present embodiment. It is appropriately set according to the type of the above.
As the heat seal layer, for example, a heat seal layer containing a thermoplastic resin described in JP 2014-16422 A can be used.

The peeling substrate supports the hologram layer, the vapor deposition layer, and the like.
The peeling substrate is peeled from the hologram structure after the hologram structure of this aspect is bonded to the adherend.
Such a substrate for peeling may have transparency or light shielding properties.
As a material and film thickness which comprise the said base material for peeling, since it can be the same as that of the transparent base material as described in the term of said "3. other structure", description here is abbreviate | omitted.

The easy-peeling layer is provided to easily separate the base material for peeling and the hologram layer after the hologram layer is bonded to the adherend via the adhesive layer.
As such an easy-peeling layer, the re-peeling adhesive layer described in the above section “3. Other configuration” can be used.

  The formation position of the easy-peeling layer in plan view is not particularly limited as long as the base material for peeling can be easily peeled from the hologram layer.

  The hologram structure according to this aspect may have other configurations described in the above section “3. Other configurations” as necessary.

(3) Third usage mode A third usage mode of the hologram structure of the present invention includes a heat seal layer formed on a surface of the vapor deposition layer opposite to the hologram layer, and the vapor deposition layer of the heat seal layer. A paper substrate formed on the surface opposite to the paper substrate, an adhesive layer formed on the surface of the paper substrate opposite to the heat seal layer, and the adhesive layer opposite to the paper substrate And a release sheet formed on the surface of the sheet, and used as a label.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG.20 (c) is a schematic sectional drawing which shows an example of the hologram structure of this aspect. As illustrated in FIG. 20C, the hologram structure 10 of this aspect includes a heat seal layer 33 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1, and the heat seal layer 33. The paper base 36 formed on the surface opposite to the vapor deposition layer 2, the adhesive layer 31 formed on the surface of the paper base 36 opposite to the heat seal layer 33, and the adhesive layer 31 and a release sheet 32 formed on the surface opposite to the paper base material 36, and is used as a label.
In addition, about the code | symbol in FIG.20 (c), since it shows the same member as the thing of FIG. 1 and FIG. 2, description here is abbreviate | omitted.

According to this aspect, since the hologram layer and the vapor deposition layer are provided, a label having excellent anti-counterfeiting properties and design properties can be obtained.
In addition, by having a paper base on the opposite side of the vapor deposition layer from the hologram layer, the hologram structure of the present aspect is formed on the surface of the paper base on which the vapor deposition layer and the hologram layer are formed, for example, a printing layer or the like. Can be easily formed.
As a specific application of the hologram structure of this embodiment, a quality control number label of an industrial product can be cited, and the screen is irradiated with a light image and laser light reproduced in the hologram forming region. For example, it is possible to use an authenticity determination using an optical image reproduced in a similar manner, an application that imparts designability, or the like.

The hologram structure of this embodiment has a heat seal layer, a paper substrate, an adhesive layer, and a release sheet.
Hereafter, each structure of the hologram structure of this aspect is demonstrated in detail.
In addition, about a heat seal layer, since it can be the same as that of the heat seal layer as described in the above-mentioned "(2) 2nd usage mode", description here is abbreviate | omitted.
The adhesive layer and the release sheet can be the same as those described in the section “3.

As the paper constituting the paper substrate, those generally used for forming a printing layer can be used. For example, fine paper, pure white roll paper, kraft paper, imitation paper, coated paper, aluminum vapor-deposited paper, synthetic paper Paperboard such as water-resistant paper, coated balls, and Manila balls, card paper, ivory paper, milk carton paper, cup base paper, and the like can be used.
As thickness of the said paper base material, it can be in the range of 50 micrometers-200 micrometers, for example.

  The hologram structure may be formed in a long shape and can be wound up (reel shape). By making the hologram structure into a reel-like label or the like, a necessary length can be appropriately cut out and used when affixed to an adherend.

When the hologram structure is in the form of a reel, the laminate of the hologram layer, the vapor deposition layer, and the heat seal layer may be disposed so as to cover the entire surface of the paper substrate. It is preferable that they are arranged so as to partially cover them. In particular, as illustrated in FIG. 21, along the longitudinal direction Y of the reel, the end in the width direction X of the laminate is a paper base. It is preferably formed so as to be in contact with the width direction end of the material 36. By disposing the laminate in this way, it is possible to prevent the hologram layer from being displaced. More specifically, the hologram structure of the above-mentioned “(2) Second usage mode” is applied to the surface of the paper substrate of the label having the adhesive layer and the release sheet on the back surface of the paper substrate. When manufacturing by transferring, it is possible to prevent the positional deviation of the hologram structure of the second usage mode to be transferred.
FIG. 21 is a schematic plan view showing a part of a label having the hologram structure formed in a reel shape. In FIG. 21, the X direction is the width direction of the hologram structure, and the Y direction is the longitudinal direction (winding direction) of the hologram structure.

The paper substrate may have a printed layer formed at an exposed portion where the hologram layer is not arranged, that is, printed on the paper substrate surface.
In addition, about such a printing layer, it can be made to be the same as that of the content as described in the above-mentioned "3. Other structure."

  The hologram structure according to this aspect may have other configurations described in the above section “3. Other configurations” as necessary.

(4) Fourth usage mode In a fourth usage mode of the hologram structure of the present invention, the hologram structure is used as an information recording medium.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 20D is a schematic cross-sectional view showing an example of the hologram structure according to this aspect. As illustrated in FIG. 20 (d), the hologram structure 10 of this aspect includes a back-side protective layer 37 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1, and the vapor deposition layer of the hologram layer 1. 2 having a surface-side protective layer 38 formed on the surface opposite to the surface 2 and an intermediate substrate 39 formed between the hologram layer 1 and the surface-side protective layer 38, and used as an information recording medium It is.
Note that the reference numerals in FIG. 20 (d) indicate the same members as those in FIGS. 1 and 2, and a description thereof will be omitted here.

According to this aspect, by being used as an information recording medium, an information recording medium excellent in anti-counterfeiting properties and design properties can be obtained.
Specific examples of the use of the hologram structure of the present aspect include cards such as credit cards, cash cards and point cards, employee ID cards, ID cards such as driver's licenses, passbooks, passports and the like.

  The hologram structure of this aspect has a hologram layer and a vapor deposition layer, but may have other configurations depending on the type for the information recording medium.

Such other configurations include, for example, a back side protective layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and a surface side protection formed on the surface of the hologram layer opposite to the vapor deposition layer. And an intermediate substrate formed between the hologram layer and the surface-side protective layer.
The surface-side protective layer is formed on the surface of the hologram layer opposite to the vapor deposition layer and protects the hologram layer, and at least a region overlapping the hologram forming region in plan view is transparent Used.
The said back surface side protective layer is formed in the surface on the opposite side to the hologram layer of a vapor deposition layer, and protects a hologram layer and a vapor deposition layer.
The intermediate substrate is formed between the hologram layer and the front surface side protective layer, and supports the hologram layer, the front surface side protective layer, and the back surface side protective layer, and at least overlaps the hologram forming region in plan view. Those having transparency are used. The intermediate base material may be used also as a transparent base material.
About the constituent material and film thickness of such a surface side protective layer, a back surface side protective layer, and an intermediate | middle base material, it can be made to be the same as that of the transparent base material as described in the above-mentioned "3. Other structure", for example. . More specifically, polycarbonate can be used as the constituent material of the front surface side protective layer and the back surface side protective layer, and polyethylene terephthalate can be used as the constituent material of the intermediate substrate.
Moreover, as a formation location of a surface side protective layer, a back surface side protective layer, and an intermediate | middle base material, what is necessary is just to be able to protect a hologram layer etc., but the whole surface of a hologram layer and a vapor deposition layer can be covered.

Examples of the other configuration include an information recording layer for recording information.
Examples of the information recording layer include a printed layer on which information is recorded by printing, a magnetic layer on which information is recorded by magnetism, an IC chip layer including an integrated circuit (IC) chip, and the like.
As said other structure, functional layers, such as an antenna layer containing an antenna, can be included.
The formation location of these information recording layer and functional layer is not particularly limited as long as it does not hinder the reproduction and visual recognition of the optical image in the hologram formation region. May be on the opposite surface, on the same plane as the hologram layer, on the opposite surface of the vapor deposition layer from the hologram layer, or the like.

5. Manufacturing Method The manufacturing method of the hologram structure of the present invention is not particularly limited as long as it can accurately manufacture the hologram structure including each of the above-described configurations, and is the same as the general hologram structure forming method. The method can be used.
Specific examples of the production method include a method of preparing a transparent substrate and forming a hologram layer and a vapor deposition layer in this order.

6). Applications Applications of the hologram structure of the present invention can be used for anti-counterfeit applications, and include information recording media including cards such as credit cards and cash cards.
Further, the hologram structure may have an adhesive layer that can be bonded to another adherend, and may be used as a hologram structure seal that can be attached to the adherend.
Further, the hologram structure may have a heat seal layer and may be used as a hologram structure transfer foil that can be transferred to an adherend.
Furthermore, the hologram structure may have a paper base material and an adhesive layer, and may be used as a label that can be attached to an adherend.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  The following examples illustrate the present invention in more detail.

[Example 1]
<Formation of original plate and hologram structure>
A dry etching resist was spin-coated with a spinner on a chromium thin film of a photomask blank plate in which a surface low-reflection chromium thin film was laminated on a synthetic quartz substrate. As a resist for dry etching, ZEP7000 manufactured by Nippon Zeon Co., Ltd. was used and formed to have a thickness of 400 nm. For this resist layer, an electron beam drawing apparatus (MEBES4500: manufactured by ETEC) is used to expose a pattern that has been quaternized by calculating the original image of FIG. The exposed portion of the resist resin was easily dissolved. Thereafter, the developer was sprayed (spray development) to remove the easily soluble portion, and a resist pattern was formed.
Note that the minimum lattice pitch of the pattern was 3313 nm.
The pattern depth was 140 nm.
Subsequently, by using the formed resist pattern, a portion of the chromium thin film not covered with the resist was etched away by dry etching to expose the quartz substrate. Next, the exposed quartz substrate was etched to form a recess in the quartz substrate. Thereafter, the resist thin film was dissolved and removed to obtain an original plate having a concave portion formed by etching the quartz substrate and a convex portion in which the quartz substrate and the chromium thin film remained without being etched. Further, the size of the original plate, that is, the size of the hologram cell was set to 0.25 mm.
A composition for forming a hologram layer (UV curable acrylate resin: refractive index 1.52, measurement wavelength: 633 nm) was dropped onto a polycarbonate sheet (transparent substrate) having a thickness of 0.5 mm to form a coating film of the above composition. Next, an original plate having irregularities was placed on the coating film and pressed. Next, after irradiating actinic radiation and hardening the said coating film, it was made to peel and the hologram cell which has the uneven surface which reversed the uneven | corrugated type | mold of the original was formed. After that, the original plate was placed, pressed, cured, and peeled repeatedly to form a hologram layer having a thickness of 2 μm having a 10 mm square hologram forming region in which hologram cells were spread.

  Next, an Al layer having a film thickness of 100 nm was formed on the entire surface of the hologram layer on the uneven surface side by a sputtering method to obtain a hologram structure.

<Evaluation>
When a point light source is arranged at a position 60 mm from the surface of the hologram layer of the hologram structure and observed from the direction of the point light source 60 mm away from the surface of the hologram layer, a positive image is obtained by Fourier transform into a 10 mm square hologram forming region. It was possible to observe the first image 13 including two types of images, an “OK” character 13a as an image and a frame-shaped figure 13b as a positive image with high visibility.
However, the four numbers “1”, “2”, “3”, and “4” included in the frame-shaped figure included in the original image could not be observed.
Moreover, when a laser beam having a wavelength of 550 nm is irradiated at an incident angle of 45 ° with respect to the hologram forming region, and an optical image is reproduced on a screen arranged in parallel to the incident direction of the laser beam at a position 50 mm from the incident position, Along with the first image 13 including two types of images, that is, a positive image “OK” character 13a and a positive frame image 13b, the frame shape graphic 13b includes “1” and “2”. , “3”, “4”, the second image 14 that is a negative image including four numbers could be observed.
The line width of the drawing line for drawing the character “OK” that is the positive image reproduced on the screen is 1.2 mm, and the line width of the drawing line for drawing the frame-shaped figure that is the positive image is The line width of the drawing lines of the four numbers “1”, “2”, “3”, and “4” as negative images was 0.9 mm.

[Example 2]
A hologram structure was obtained in the same manner as in Example 1 except that the original image was changed from the original image shown in FIG. 5A to the original image shown in FIG. 9A.

<Evaluation>
When a point light source is arranged at a position 60 mm from the hologram layer surface of the hologram structure and observed from the point light source direction 60 mm away from the hologram layer surface, an optical image Fourier transformed into a 10 mm square hologram forming region As illustrated in FIG. 9B, the first image 13 including two types of images, that is, a negative image “OK” character 13 a and a negative frame image 13 b is observed with high visibility. I was able to.
However, the four numbers “1”, “2”, “3”, and “4” included in the area around the frame-shaped figure included in the original image could not be observed.
Moreover, when a laser beam having a wavelength of 550 nm is irradiated at an incident angle of 45 ° with respect to the hologram forming region, and an optical image is reproduced on a screen arranged in parallel to the incident direction of the laser beam at a position 50 mm from the incident position, Along with the first image 13 including two types of images, a negative image “OK” character 13a and a frame-shaped graphic 13b, which is a negative image, “1” in the area around the frame-shaped graphic 13b. , “2”, “3”, and “4”, a second image 14 that is a positive image including four numbers could be observed.
The line width of the drawing line for drawing the character “OK” that is the negative image reproduced on the screen is 1.2 mm, and the line width of the drawing line for drawing the frame-shaped figure that is the negative image is The line width of the drawing lines of the four numbers “1”, “2”, “3”, and “4”, which are 5 mm, was 0.6 mm.

DESCRIPTION OF SYMBOLS 1 ... Hologram layer 1a ... Uneven surface 2 ... Deposition layer 3 ... Transparent base material 4 ... Print layer 5 ... Interlayer adhesion layer 6 ... 2nd hologram layer 7 ... 2nd vapor deposition layer 10 ... Hologram structure 11 ... Hologram formation area 11a ... Hologram cell 12 ... Optical image 13 ... First image 14 ... Second image 15 ... Diffraction grating pattern 15a ... Diffraction grating cell 32 ... Peeling sheet 33 ... Heat seal layer 34 ... Peeling easy layer 35 ... Peeling substrate 36 ... Paper base Material 37 ... Back side protective layer 38 ... Front side protective layer

Claims (8)

A hologram layer having a reflection hologram forming region in which a phase Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image;
A vapor deposition layer formed so as to be in contact with the concavo-convex surface of the reflective hologram forming region of the hologram layer;
Have
The light image is
A first image that can be observed when light from a point light source is incident on the reflective hologram forming region;
And a second image that is not observable when light from a point light source is incident on the reflective hologram forming region and is observable when laser light is incident. body.   The hologram structure according to claim 1, wherein the second image is a negative image.   The hologram structure according to claim 1, wherein the second image is displayed at a position overlapping the first image in plan view.   In the reflection hologram forming region of the hologram layer, a hologram cell capable of converting light incident from a point light source into the optical image, and the hologram cell are formed on the same plane and arranged in a pattern in plan view. The hologram structure according to any one of claims 1 to 3, wherein a diffraction grating cell for drawing a diffraction grating pattern is arranged.   5. The hologram structure according to claim 4, wherein the diffraction grating design is a planar diffraction grating design capable of reproducing the design in a planar manner.   The hologram structure according to claim 4, wherein the diffraction grating design is a three-dimensional diffraction grating design capable of reproducing the design three-dimensionally. A heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer;
An easy peeling layer formed on the surface of the hologram layer opposite to the vapor deposition layer;
A peeling base material formed on the surface of the peelable layer opposite to the hologram layer;
Have
The hologram structure according to any one of claims 1 to 6, wherein the hologram structure is used as a hologram transfer foil. A heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer;
A paper base formed on the surface of the heat seal layer opposite to the vapor deposition layer;
An adhesive layer formed on the surface of the paper base opposite to the heat seal layer;
A release sheet formed on the surface of the adhesive layer opposite to the paper substrate;
Have
The hologram structure according to any one of claims 1 to 6, wherein the hologram structure is used as a label.