JP6759600B2 - Hologram structure - Google Patents

Description

The present invention relates to a hologram structure having excellent anti-counterfeiting property and designability.

A hologram is one in which the wave surface of an object light is recorded on a photosensitive material as interference fringes by interfering two lights having the same wavelength (object light and reference light), and has the same wavelength as the reference light at the time of recording the interference fringes. When the light of the above is applied, a diffraction phenomenon occurs due to the interference fringes, and it is possible to reproduce the same wave surface as the original object light. Holograms are often used for anti-counterfeiting applications because they have advantages such as a beautiful appearance and relatively difficult duplication.
As a method of using the hologram, a method of reproducing the hologram as an optical image by transmitting or reflecting reference light to the hologram is known.
For example, Patent Document 1 describes that authenticity determination is performed using an optical image reproduced by projecting diffracted light reflected by a laser-reflecting hologram onto a screen.

Japanese Patent No. 4872964

However, there are problems that it is difficult to give a high degree of anti-counterfeiting effect and a design only by the light image projected on the screen as described in Patent Document 1.

In response to such a problem, the present inventors have made a hologram structure having a hologram layer having a hologram forming region in which a phase-type Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image. Is proposing.
According to such a hologram structure, for example, when a point light source is arranged on the hologram forming region and the hologram forming region is viewed in a plan view from the front, an optical image can be observed in the hologram forming region. .. Therefore, the hologram structure is excellent in anti-counterfeiting property and design property, for example, it can be observed only by a person who knows that an optical image can be observed only when a point light source is arranged. It becomes a thing.
Further, in the hologram structure, by arranging a point light source on the hologram forming region, an optical image observable from the front of the hologram forming region can be reproduced in the hologram forming region. Therefore, the hologram structure can easily determine the authenticity and express the design without separately preparing a screen or the like for projecting an optical image.
On the other hand, in the hologram structure, the light image can be easily observed by viewing the hologram forming region from the front in a plan view, so that the anti-counterfeiting property is insufficient or the design property is insufficient. In some cases.

The present invention has been made in view of the above problems, and an object of the present invention is to provide a hologram structure having excellent anti-counterfeiting property and designability.

In order to achieve the above object, the present invention comprises a hologram layer having a reflective hologram forming region in which a phased Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image, and the hologram layer. It has a vapor-deposited layer formed so as to be in contact with the uneven surface of the reflective hologram forming region, and the optical image can be observed only from a direction different from the point light source with respect to the reflective hologram forming region. Provided is a hologram structure characterized by containing a first light image.

According to the present invention, a reflective hologram forming region (hereinafter, may be simply referred to as a hologram forming region) in which a phase Fourier transform hologram that converts light incident from a point light source into a desired optical image is recorded. By using the included hologram layer, the hologram structure can reproduce an optical image in the hologram forming region in a plan view by a point light source.
Further, since the optical image includes a first optical image that can be observed only from a direction different from that of the point light source with respect to the reflective hologram forming region, it is excellent in anti-counterfeiting property and designability.

In the present invention, it is preferable that the optical image includes a second optical image that can be observed from the same direction as the point light source with respect to the reflective hologram forming region. This is because the hologram structure becomes more excellent in anti-counterfeiting property and design property by using the first light image and the second light image.

In the present invention, in the reflective hologram forming region of the hologram layer, a hologram cell capable of converting light incident from a point light source into the optical image and a hologram cell formed on the same plane as the hologram cell are formed in a plan view. It is preferable that the diffraction grating cells that draw the diffraction grating pattern by being arranged in a pattern are arranged. This is because the hologram structure is more excellent in anti-counterfeiting property and design property by using the first optical image and the diffraction grating pattern.

In the present invention, it is preferable that the diffraction grating design is a plane diffraction grating design that can reproduce the design in a plane. This is because the hologram structure is excellent in anti-counterfeiting property and design property by being able to combine the planar diffraction grating pattern and the optical image. Further, it is easy to make the plane diffraction grating symbol have high brightness, and it is possible to reproduce the diffraction grating symbol having excellent visibility.

In the present invention, it is preferable that the diffraction grating symbol is a three-dimensional diffraction grating symbol that can reproduce the symbol three-dimensionally. This is because the hologram structure is excellent in anti-counterfeiting property and design property by being able to combine the three-dimensional diffraction grating pattern and the optical image.

In the present invention, the heat-sealing layer formed on the surface of the hologram layer opposite to the hologram layer, the easily peelable layer formed on the surface of the hologram layer opposite to the hologram layer, and the above. It is preferable that the easily peelable layer has a peeling base material formed on the surface opposite to the hologram layer and is used as a hologram transfer foil. This is because the hologram structure can easily impart anti-counterfeiting property and design property to the adherend by being used as the hologram transfer foil. For example, by transferring the hologram structure to the surface of a label having an adhesive layer and a release sheet on the back surface of the paper substrate, a label having excellent anti-counterfeiting property and designability can be easily obtained. ..

In the present invention, the heat-sealing layer formed on the surface of the vapor-deposited layer opposite to the hologram layer, and the paper base material formed on the surface of the heat-sealing layer opposite to the vapor-deposited layer. It has an adhesive layer formed on the surface of the paper substrate opposite to the heat seal layer, and a release sheet formed on the surface of the adhesive layer opposite to the paper substrate, and has a label. It is preferable to be used as. This is because the hologram structure can easily impart anti-counterfeiting property and design property to the adherend by being used as a label.

The present invention has an effect of being able to provide a hologram structure having excellent anti-counterfeiting property and designability.

It is a schematic plan view which shows an example of the hologram structure of this invention. FIG. 1 is a cross-sectional view taken along the line AA of FIG. It is explanatory drawing explaining the reproduction method of the light image using the hologram structure. It is explanatory drawing explaining the reproduction method of the light image using the hologram structure. It is explanatory drawing explaining the reproduction method of the light image using the hologram structure. It is explanatory drawing explaining the reproduction method of the light image using the hologram structure. It is explanatory drawing explaining the formation method of the hologram formation region. It is explanatory drawing explaining the reproduction method of the light image using the hologram structure. It is explanatory drawing explaining the formation method of the hologram formation region. It is explanatory drawing explaining the reproduction method of the light image using the hologram structure. It is explanatory drawing explaining the hologram formation region in this invention. It is explanatory drawing explaining the hologram formation region in this invention. FIG. 3 is a schematic plan view and a schematic sectional view showing another example of the hologram structure of the present invention. It is explanatory drawing explaining the diffraction grating symbol in this invention. It is explanatory drawing explaining the diffraction grating cell in this invention. It is explanatory drawing explaining the image display layer in this invention. It is the schematic sectional drawing which shows another example of the hologram structure of this invention. It is the schematic sectional drawing which shows another example of the hologram structure of this invention. It is a schematic plan view which shows another example of the hologram structure of this invention.

Hereinafter, the hologram structure of the present invention will be described in detail.
The hologram structure of the present invention includes a hologram layer having a reflective hologram forming region in which a phase-type Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image, and the reflective type of the hologram layer. A first optical image having a vapor-deposited layer formed so as to be in contact with the uneven surface of the hologram forming region, and the optical image can be observed only from a direction different from that of a point light source with respect to the reflective hologram forming region. It is characterized by including.

Such a hologram structure of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic plan view showing an example of the hologram structure of the present invention, and FIG. 2 is a sectional view taken along line AA of FIG. As shown in FIGS. 1 and 2, the hologram structure 10 of the present invention has a reflective hologram forming region 11 in which a phase-type Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image. The hologram layer 1 has the hologram layer 1 and the vapor-deposited layer 2 formed so as to be in contact with the uneven surface 1a of the reflective hologram forming region 11 of the hologram layer 1, and the optical image is the reflective hologram forming region 11. On the other hand, it includes a first light image that can be observed only from a direction different from that of the point light source.
In this example, the transparent base material 3 is laminated on the surface of the hologram layer 1 opposite to the vapor deposition layer 2.
Further, in FIG. 1, the description of the transparent base material is omitted for the sake of simplicity. Further, in FIG. 1, the region surrounded by the broken line is the hologram forming region 11.

According to the present invention, the hologram structure can be a point light source by using a hologram layer having a hologram forming region in which a phased Fourier transform hologram is recorded, which converts light incident from a point light source into a desired optical image. Therefore, the optical image can be reproduced in the hologram forming region in a plan view.
Further, the optical image includes a first optical image that can be observed only from a direction different from that of the point light source with respect to the hologram forming region.
For example, as illustrated in FIG. 3A, when the point light source 21 is arranged in the direction perpendicular to the center point of the hologram forming region 11, the observer 31a observes the hologram forming region 11 from the same direction as the point light source 21. Cannot observe an optical image in the hologram forming region 11 (FIG. 3 (b)), but the observer 31b who observes the hologram forming region 11 from a direction different from the point light source in FIG. 3 (a) The image "1" of the first optical image 12 can be observed in the hologram forming region 11 (FIG. 3 (c)).
Further, when the light image has a second light image that can be observed from the same direction as the point light source with respect to the reflective hologram forming region, the point light source is illustrated as shown in FIG. 4 (a). When the 21 is arranged in the direction perpendicular to the center point of the hologram forming region 11, the observer 31a observing the hologram forming region 11 from the same direction as the point light source 21 sees the image of the second light image 13 in the hologram forming region 11. Only "OK" can be observed (FIG. 4B), and the observer 31b who observes the hologram forming region 11 from a direction different from that of the point light source 21 in FIG. 4A can observe the hologram forming region 11. Only "1", which is an image of the first optical image 12, can be observed inside (FIG. 4 (c)).

As described above, since the first light image can be observed only from a predetermined direction different from that of the point light source, the hologram structure can be used only by a person who knows that the first light image is recorded, for example. , The first optical image can be made observable. Therefore, the hologram structure is excellent in anti-counterfeiting property.
Further, the hologram structure can give the observer unexpectedness by the first light image that can be observed only from a direction different from that of the point light source. Therefore, the hologram structure is excellent in design.
Further, since the optical image can be reproduced only when it is irradiated with light from a point light source, the hologram structure is excellent in anti-counterfeiting property and design property.

Further, the first light image that can be observed only from a direction different from the point light source as described above has a larger area than the hologram forming region, and the first light is generated in the virtual hologram forming region formed outside the hologram forming region. It can be obtained by designing the image of the image to be reproduced. That is, the first light image is a first light that can be observed only from a direction different from that of a point light source by recording an optical image that can be reproduced in a hologram forming region having a large area in a hologram forming region having a small area. The image will be reproduced.
Therefore, for example, even when the hologram forming region is small, the optical image can be effectively reproduced through the hologram layer, and the anti-counterfeiting property and the design property can be improved.

The hologram structure of the present invention has a hologram layer and a thin-film deposition layer.
Hereinafter, each configuration in the hologram structure of the present invention will be described.

1. 1. Hologram layer The hologram layer in the present invention has a reflective hologram forming region in which a phase Fourier transform hologram is recorded, which converts light incident from a point source into a desired optical image.

(1) Optical image The optical image includes at least a first optical image.

(A) First light image The first light image can be observed only from a direction different from that of a point light source with respect to the reflective hologram forming region.
Here, the direction different from the point light source is that the direction connecting the center point of the hologram forming region and the direction in which the first optical image can be observed is the direction connecting the center point of the hologram forming region and the point light source (hereinafter, It is different from the same direction as the point light source or the direction of the point light source).
Therefore, it can be observed only from a direction different from that of the point light source with respect to the reflection type hologram forming region. For example, when the point light source is arranged in the direction perpendicular to the center point of the hologram forming region, the hologram forming region is observed. Although it can be observed only from a direction different from the vertical direction from the center point of the hologram forming region, it can be observed from a direction perpendicular to the center point of the hologram forming region.
That is, in the first optical image, when the point light source is arranged in the vertical direction from the center point of the hologram forming region, the point light source and the observer do not overlap when the reflective hologram forming region is viewed in a plane. Only observed.
Further, the direction different from the point light source direction can be specifically a direction in which the elevation angle with respect to the reflective hologram forming region differs from the point light source direction at the center point of the hologram forming region by 1 ° or more. ..
That is, when the point light source is arranged in the direction perpendicular to the center point of the hologram forming region, the elevation angle with respect to the reflective hologram forming region in the direction in which the first light image passing through the center point of the hologram forming region can be observed (hereinafter, The elevation angle of the first light image may be simply referred to as an elevation angle) of 89 ° or less, preferably in the range of 15 ° to 85 °, and in particular, in the range of 25 ° to 80 °. Is preferable. When the elevation angle of the first light image is within the above range, the hologram structure of the present invention can observe the first light image in the reflective hologram forming region only from a direction different from the point light source direction, for example. This is because it becomes easy to do. Further, the hologram structure of the present invention facilitates the formation of, for example, an uneven surface of a hologram forming region, for example, a lattice pitch or the like.
Placing the point light source in the vertical direction from the center point of the hologram forming region means an elevation angle (for example, FIG. 3) which is an angle between the straight line connecting the point light source and the center point of the hologram forming region and the surface of the hologram forming region. It means that the arrangement is made so that θ0) in (a) is 90 °.
Further, in FIG. 3A already described, the elevation angle of the first optical image refers to, for example, θ1 in FIG. 3A already described.
Further, the center point of the hologram forming region is an intersection of two diagonal lines when the hologram forming region is a rectangle such as a square or a rectangle.

The number of the first optical images may be at least one, but is two or more, that is, two or more that the optical images can be observed from different directions at least one of the elevation angle and the azimuth angle. It may include a first light image different from each other. When the optical image includes two or more different first optical images, the hologram structure of the present invention can observe images of different first optical images from two or more directions different from the point light source. As a result, the hologram structure becomes more excellent in anti-counterfeiting property and design property.
Note that observable from different directions means that only the images of the first optical images can be observed from different directions.

Here, as an example in which the light image includes two or more first light images that can be observed from different azimuth angles, for example, as illustrated in FIGS. 5A and 5B, a point light source is used in the hologram forming region. The first light shown in FIG. 5C shows a first observer 31b who observes from a direction different from the vertical direction from the center point of the hologram forming region which is the point light source direction when arranged in the vertical direction from the center point. Only "1" which is an image of the image 12a can be observed, and in FIGS. 5A and 5B, the second to fourth observations are made from an azimuth angle different from that of the first observer 31b by 90 ° or 180 °. Observers 31c to 31e can observe only the images "2", "3" and "4" of the first optical images 12b to 12d, respectively, as shown in FIGS. 5D to 5F, respectively. Can be assumed to be.
Further, as an example in which the light images include two or more first light images that can be observed from different elevation angles, for example, as illustrated in FIG. 6A, the point light source is set in the direction perpendicular to the center point of the hologram forming region. When arranged, the first observer 31b observing from a direction different from the vertical direction from the center point of the hologram forming region which is the point light source direction is the image of the first light image 12a shown in FIG. 6 (b). Only "1" can be observed, and in FIG. 6A, the second observer 31c, which has the same azimuth angle as the first observer 31b and observes from a different elevation angle, is shown in FIG. 6 (c). ), Only the image “2” of the first optical image 12b can be observed.
Note that FIG. 5B shows a schematic cross-sectional view in the direction of passing through the first observer 31b and the third observer 31d in FIG. 5A. Further, in FIG. 5, the first to fourth observers 31b to e are all observing from a direction in which a predetermined elevation angle is taken with respect to the hologram forming region 11.
The azimuth is, for example, on the surface of a linear hologram forming region connecting the center point of the hologram forming region and the position where the observer and the hologram layer overlap in the plane view when the hologram forming region is viewed in a plane. It refers to the direction from the center point.
For example, assuming that the azimuth angle of the first observer 31b is 0 °, the azimuth angles of the second to fourth observers 31c to 31e in FIGS. 5A and 5B are 90 ° and 180 °, respectively. It becomes 270 °.

When the light image contains two or more different first light images that can be observed from different azimuth angles, the difference in azimuth angles at which only the image of each first light image can be observed is, for example, 30 ° or more. It is preferable that the temperature is in the range of 45 ° to 180 °, and particularly preferably in the range of 90 ° to 180 °. This is because when the difference in azimuth angles is within the above range, the hologram structure of the present invention makes it easy to observe only each first optical image at a different angle.
The difference in azimuths at which only each image can be observed refers to the minimum value of the difference in azimuths. For example, when the hologram forming region is viewed in a plane, when an arbitrary azimuth passing through the point light source position in the hologram forming region is set to 0 °, the azimuth in which only the first first optical image can be observed is If the azimuth is within the range of 30 ° to 60 ° and only the second first optical image can be observed within the range of 90 ° to 150 °, the minimum value of the difference between the azimuths is 30 °. It becomes.

When the optical images include two or more different first optical images that can be observed from different elevation angles, the difference in elevation angles that allows only the images of the respective first optical images to be observed can be, for example, 10 ° or more. In particular, it is preferably in the range of 15 ° to 80 °, and particularly preferably in the range of 20 ° to 45 °. This is because when the difference in elevation angle is within the above range, the hologram structure of the present invention makes it easy to observe only each first optical image at a different angle.
The difference in elevation angle at which only each image can be observed refers to the minimum value of the difference in elevation angle. For example, the elevation angle at which only the first first optical image can be observed is within the range of 60 ° to 80 °, and the elevation angle at which only the second first optical image can be observed is within the range of 30 ° to 50 °. In some cases, the minimum value of the difference in elevation is 10 °.

Specifically, the image displayed by the first light image can be appropriately set according to the use of the hologram structure of the present invention, for example, a pattern, a line drawing, a character, a figure, a symbol, or the like. Can be mentioned.

(B) Second light image The light image may include at least the first light image, but includes a second light image that can be observed from the same direction as the point light source with respect to the reflection hologram forming region. It is preferable that the light source is used. This is because the hologram structure becomes more excellent in anti-counterfeiting property and design property by using the first light image and the second light image.
Examples of the hologram structure in which such a second light image can be observed include FIGS. 4 and 6 already described. 4 and 6 show an example in which the hologram structure 10 can observe “OK”, which is an image of the second light image 13, by an observer 31a observing from the direction of a point light source (FIG. 4 (b). ) And FIG. 6 (d)).
Here, the fact that the reflection type hologram forming region can be observed from the same direction as the point light source means that, for example, when the point light source is arranged in the direction perpendicular to the center point of the hologram forming region, it is in the point light source direction. It means that it can be observed from the direction perpendicular to the center point of a certain hologram forming region.
Further, observable from the direction of the point light source means that it can be observed from at least the direction of the point light source, as long as only the first light image and only the second light image can be observed from different directions. It may be observable from a direction different from the point light source direction.
The elevation angle with respect to the reflective hologram forming region in the direction in which only the second light image can be observed, that is, in the direction in which the first light image cannot be observed at the same time as the second light image, is preferably 60 ° or more, for example. Above all, it is preferably 70 ° or more, and particularly preferably 80 ° or more. This is because when the elevation angle is within the above range, the hologram structure of the present invention makes it easy to observe the first light image and the second light image at different angles.
The elevation angle with respect to the reflective hologram forming region in the direction in which only the second light image can be observed can be, for example, θ2 in FIG. 3A already described.

The image displayed by the second light image can be the same as the image displayed by the first light image.

(C) Method for Forming First Light Image As a method for forming a first light image, that is, a method for forming a hologram forming region in which a light image including the first light image can be reproduced, for example, a hologram of the hologram structure of the present invention. The lattice pitch is designed so that the entire original image can be observed from the point light source direction in the virtual hologram formation area having a larger area than the formation area, and then the hologram having the lattice pitch obtained by the design and having a smaller area than the virtual hologram formation area. A method of forming a forming region can be mentioned.

More specifically, in the above forming method, as shown in FIG. 4 described above, only the image of "OK" is observed from the direction of the point light source, and only the image of "1" is observed from the direction different from the direction of the point light source. When observing, the image of "OK" is arranged in the central part in the virtual hologram formation region when observed from the direction of the point light source, and the image of "1" is arranged on the outside on the right side of the central part. The lattice pitch for which the following equation (1) holds is designed so that the entire original image can be reproduced.
More specifically, as illustrated in FIG. 7A, a point light source is located at a predetermined distance L3 in the direction perpendicular to the center point of the virtual hologram forming region 22 with respect to the virtual hologram forming region 22 having a width L2. When 21 is arranged and the virtual hologram forming region 22 is observed from a position of a predetermined distance L4 in the vertical direction from the center point of the virtual hologram forming region 22, the observer 31a virtualizes as illustrated in FIG. 7 (b). A lattice pitch for which the following equation (1) holds is designed so that the entire original image can be observed in the hologram forming region 22.
Next, a hologram forming region having a width L1 narrower than the width L2 is formed with the lattice pitch obtained by the design. More specifically, as shown in FIG. 7B, a method of forming a hologram forming region with a width L1 such that only the image of "OK" is observed and the image of "1" is not included. Can be mentioned.
P = nλ / (sinθa + sinθb) (1)
Λ is the wavelength of the diffracted light, P is the lattice pitch of the uneven surface, θa is the incident angle for reaching the end of the hologram forming region from the light source, and θb is the diffracted light from the end of the hologram forming region. The diffraction angle for reaching, n is the order of diffraction.

As illustrated in FIG. 8A, when the hologram forming region 11 having the same width L2 as the virtual hologram forming region is formed with the lattice pitch obtained by the design, the observer 31a observing from the point light source direction As illustrated in FIG. 8B, the entire original image including both the “OK” image and the “1” image can be observed in the hologram forming region 11.
On the other hand, as shown in FIG. 8A, the observer 31b observing from a direction different from the point light source direction observes the optical image in the hologram forming region 11 as illustrated in FIG. 8C. Can't be.

Further, for example, the original image illustrated in FIG. 9A is formed with a hologram forming region having a width L1 after designing a lattice pitch so that the entire image is displayed in a virtual hologram forming region 22 having a width L2. In this case, as shown in FIG. 5 described above, the images of the first optical image "1", "2", "3" and "4" can be observed from different azimuth angles by 90 °, respectively. be able to.
Further, for example, the original image illustrated in FIG. 9B is formed with a hologram forming region having a width L1 after designing a lattice pitch so that the entire image is displayed in the virtual hologram forming region 22 having a width L2. In this case, as shown in FIG. 6 described above, the images “1” and “2” of the first optical image can be observed from different elevation angles, respectively.

(D) Method of observing an optical image The above optical image is observed by arranging a point light source on the surface of the hologram layer opposite to the vapor deposition layer.
The distance of such a point light source from the reflective hologram forming region can be appropriately set according to the type and application of the hologram structure of the present invention.
The distance of the point light source from the reflective hologram forming region is, for example, 1 cm to 50 cm from the viewpoint that the observer can easily observe the first optical image by grasping the hologram structure or an article having the hologram structure by hand. It can be within the range, preferably within the range of 5 cm to 30 cm, and more preferably within the range of 5 cm to 20 cm.
The distance of the first light image from the observer's reflective hologram forming region can be appropriately set according to the type and use of the hologram structure of the present invention.
The distance of the first light image from the reflective hologram forming region is, for example, from the viewpoint that the observer can easily observe the first light image by grasping the hologram structure or an article having the hologram structure by hand. It can be in the range of 5 cm to 70 cm, preferably in the range of 10 cm to 50 cm, and more preferably in the range of 20 cm to 50 cm.
The distance between the point light source and the reflective hologram forming region and the distance between the observer of the first light image and the reflective hologram forming region are the point light source and the observer and the center point of the reflective hologram forming region, respectively. It can be a distance, and specifically, it can be a distance of L3 and L4 in FIGS. 3 and 7.

Further, the hologram structure of the present invention includes a first light image that can be observed only from a direction different from that of a point light source as a light image.
Such a method of observing the first light image is not limited to a method of arranging a point light source in the vertical direction from the center point of the hologram forming region and observing the first light image, and the elevation angle with respect to the hologram forming region in the point light source direction (hereinafter, simply It may be referred to as an elevation angle in the direction of the point light source).
For example, as illustrated in FIG. 10A, when the point light source 21 is arranged in the direction perpendicular to the center point of the hologram forming region 11 as in the hologram structure 10 of FIG. 4 described above, the point light source direction That is, with respect to the hologram structure 10 in which the first optical image 12 can be observed only from a direction different from the vertical direction from the center point of the hologram forming region 11, the direction in which the elevation angle of the point light source 21 in the point light source direction is less than 90 °. The observer 31b who observes the hologram forming region 11 from the same direction as the point light source 21 observes only "OK" which is an image of the second light image 13 in the hologram forming region 11. (FIG. 10 (b)), the observer 31a observing the hologram forming region 11 from a direction different from that of the point light source 21 in FIG. 10 (a) can see the image of the first light image 12 in the hologram forming region 11. Only a certain "1" can be observed (FIG. 10 (c)).
Note that FIG. 10A shows an example in which the observer 31a observing the image of the first optical image 12 observes from the direction perpendicular to the center point of the hologram forming region 11 (θ1 is 90 °). ..
Further, the observer 31b observing the image of the second light image 13 in FIG. 10A has a 180 ° azimuth angle different from that of the observer 31b observing the image of the first light image 12 in FIG. 4 described above. It shows an example of observing from the direction.

(2) Reflective Hologram Forming Region The reflective hologram forming region is a region in which a phase Fourier transform hologram that converts light incident from a point light source into a desired optical image is recorded.

Here, recording a phase-type Fourier transform hologram means that the phase information of the Fourier transform image obtained through the Fourier transform of the original image is multi-valued and recorded as the depth. Therefore, an uneven surface is formed in the hologram forming region of the hologram layer on which the phase Fourier transform hologram is recorded.
The hologram layer converts the light incident from the point light source into a desired light image by the height difference of the uneven shape forming the uneven surface of the hologram forming region, that is, functions as a Fourier transform lens. With such a function, light incident from an arbitrary point light source is diffracted in a plurality of predetermined directions to form a predetermined image as an optical image. The above-mentioned function may be referred to as a "Fourier transform lens function".
The hologram forming region is a reflection type, and when a point light source is arranged on the observation surface side, which is the surface side opposite to the vapor deposition layer of the hologram layer, and the hologram layer is viewed in a plan view from the observation surface side, the hologram is formed. The optical image can be reproduced in the formed region.

The hologram forming region refers to a region capable of converting light incident from a point light source into a desired light image, and specifically, a minimum that can include all of the hologram cells that can be converted into the light image. It is an area surrounded by a rectangle of area.

The size of the hologram forming region in a plan view may be such that the first light image can be observed only from a direction different from that of the point light source.
The plan view size can be, for example, 2 mm square or more from the viewpoint of making it easy for the observer to grasp the hologram structure or an article having the hologram structure by hand and observe the first optical image, and in particular, 5 mm. The angle is preferably within the range of 30 mm square or less, and particularly preferably within the range of 10 mm square or more and 20 mm square or less. This is because the hologram structure of the present invention can easily observe the first light image, for example, the first light image can be observed with a small movement of the viewpoint because the plan view size is the above size.
The fact that the hologram forming region has a plan view size of 5 mm square or more means that the hologram forming region has a plan view shape that includes at least a square range of 5 mm square. Therefore, when the hologram forming region is rectangular, it means that the length of the short side thereof is 5 mm or more, and when the hologram forming region is square, the length of one side thereof is long. Is 5 mm or more.

The shape of the hologram forming region in a plan view may be, for example, a square shape or a rectangular shape, but a rectangular shape is preferable. For example, by setting the observable azimuth angle of the first optical image from the center point of the hologram forming region to a direction parallel to the short side of the rectangle, the first optical image can be observed with a slight movement of the viewpoint. Because it can be done.
Further, for example, by setting the observable azimuth angle of the first light image to be a direction parallel to the long side of the rectangle from the center point of the hologram forming region, the first light image must be moved significantly. This is because it is easy for only those who know that they cannot observe the first optical image to be able to observe it.

In the present invention, as shown in FIG. 11A, the hologram forming region is one hologram cell 11a in which a phase type Fourier transform hologram that converts light incident from a point light source into a desired optical image is recorded. It may be a hologram forming region 11 (hereinafter, may be simply referred to as a single hologram region) composed of (hereinafter, may be simply referred to as a hologram cell), but is usually shown in FIG. 11 (b). This is a hologram forming region 11 (hereinafter, may be referred to as a large-format hologram region) in which a plurality of hologram cells 11a are arranged and enlarged as shown by.
Note that "1" in FIG. 11 is an image of the first optical image 12 expressed in a single or large-format hologram region, respectively.

When the hologram forming region is a large-format hologram region, the size of each hologram cell constituting the hologram forming region in a plan view may be such that the hologram forming region can be formed with high accuracy.
The plan view size is preferably in the range of 0.25 mm square or more and 5 mm square or less. This is because when the plan view size is within the above range, the hologram structure facilitates reproduction of an optical image into the hologram forming region.
The plan view size refers to the size of the smallest square that can include the hologram cell. Therefore, when the hologram cell is a square with a side of 1 mm, the plan view size is 1 mm square. Further, when the hologram cell has a circular shape with a diameter of 1 mm, the plan-view size is 1 mm square.

The ratio of the area of the hologram cell to the hologram forming region in a plan view is not particularly limited as long as it can reproduce a desired optical image, but is preferably 25% or more. Above all, it is desirable that it is 50% or more. This is because the hologram structure can clearly reproduce an optical image because the area ratio is within the above range.

The planar view shape of the hologram cell may be any shape as long as it can form a hologram forming region having a desired planar view shape. Specifically, the holographic shape includes a rectangular shape such as a square shape and a rectangular shape, a trapezoidal shape, a triangular shape, a pentagonal shape, a polygonal shape such as a hexagonal shape, a circular shape, an elliptical shape, a star shape, and a heart shape. However, from the viewpoint of easy formation of the hologram forming region, a rectangular shape is usually used.

In the present invention, the uneven shape of the uneven surface of the hologram forming region is formed by forming a plurality of multi-valued Fourier transform images formed based on the image data of the original image to be displayed as an optical image up to a desired range in the vertical and horizontal directions. It corresponds to the pattern of the Fourier transform image when arranged.
The method for forming the hologram forming region on the uneven surface may be any method capable of forming the uneven surface capable of converting the light incident from the point light source into a desired optical image, and forming a general Fourier transform hologram. The method can be used.
Specifically, the above-mentioned forming method forms a master original plate having an unevenness pattern corresponding to the Fourier transform image, and the unevenness of the original plate is formed on a coating film of a resin material such as an ultraviolet curable resin formed on a substrate such as PET. A method of forming an uneven surface of a hologram forming region by transferring a pattern can be mentioned.
Further, by transferring the uneven pattern of the master original plate only once, a single hologram region composed of one hologram cell can be formed as the hologram forming region. Then, by transferring the uneven pattern of the master original plate a plurality of times, it is possible to form a hologram layer having a large-format hologram forming region having a desired size in which a plurality of hologram cells are arranged as the hologram forming region.

As a method of forming the master original plate, a Fourier transform image is formed by calculation based on the image data of the original image to be displayed. Next, the data of the Fourier transform image is multivalued to two or more values and converted into electron beam drawing data, and the electron beam drawing data is arranged to a desired range. For example, 10 electron beam drawing data are arranged vertically and 10 horizontally. Next, a method of creating a master original plate with an electron beam drawing apparatus based on the arranged electron beam drawing data can be used.
When the binarized data after the Fourier transform is used as the electron beam drawing data, the uneven shape of the uneven surface becomes a two-step uneven shape as shown in FIG. 12 (a). When a valued product is used, it has a four-stage uneven shape as shown in FIG. 12 (b).
In the present invention, it is preferable that the multi-valued data of the Fourier transform image is multi-valued to four or more values, that is, the uneven shape has four or more steps. This is because it is possible to reproduce an optical image having a complicated shape. Further, it is possible to display the first optical image in a large area in the hologram forming region.

The lattice pitch of the uneven surface may be any as long as it can convert the light incident from the point light source into a desired light image.
Specifically, the lattice pitch is preferably in the range of 1.0 μm to 80.0 μm. This is because when the lattice pitch is within the above range, the hologram structure facilitates reproduction of an optical image into the hologram forming region.
The lattice pitch refers to, for example, the width indicated by P in FIG.

Here, as for the method of designing the lattice pitch, as described in the section of "(c) Method of forming the first optical image" of the above "(1) Optical image", as shown in FIG. 7 described above, the hologram structure A light source is arranged at a predetermined distance L3 with respect to the virtual hologram forming region 22 having a larger area than the hologram forming region of the body, and the observer 31a visits the hologram forming region 22 at a predetermined distance L4 from the virtual hologram forming region 22. When observing, the above equation (1) shall hold for the lattice pitch so that the observer 31a can observe the entire image of the optical image including the first optical image in the entire area of the virtual hologram forming region 22. Can be done.

As a specific calculation example of the lattice pitch, when the virtual hologram forming region has a square shape with a side width L2 of 15 mm, L3 is 50 mm, L4 is 300 mm, and the light has a wavelength of 550 nm, sinθb = It is 0.025, and it is calculated that sinθa = 0.148, and the lattice pitch P required for the observer to observe the entire image of the optical image in the entire virtual hologram formation region is calculated to be 3179 nm at the shortest. ..
Further, when the virtual hologram forming region has a square shape with a side width L2 of 15 mm, L3 is 1990 mm, L4 is 2000 mm, and the light has a wavelength of 550 nm, sinθb = 0.00374 and sinθa = 0. It is calculated as 00377, and the lattice pitch P is calculated to be 73236 nm at the shortest.
Further, when the virtual hologram forming region has a square shape with a side width L2 of 10 mm, L3 is 60 mm, L4 is 60 mm, and the light has a wavelength of 550 nm, sinθb = 0.083 and sinθa = 0. It is calculated as 083, and the lattice pitch P is calculated as 3313 nm at the shortest.

The area ratio of the hologram forming region to the virtual hologram forming region (area of the hologram forming region of the hologram structure / area of the virtual hologram forming region) is appropriately set according to the elevation angle of the first optical image, the size of the image, and the like. be able to.
The area ratio may be less than 1, for example, 1/3 or more.

The depth of the uneven shape can be in the range of 0.1 μm to 0.3 μm in the case of a four-stage uneven structure.
The depth is, for example, indicated by D in FIG.

In the hologram forming region, the wavelength of the point light source capable of exhibiting the above-mentioned Fourier transform lens function is not particularly limited, and a desired wavelength can be targeted. The wavelength of the point light source is not limited to monochromatic light having one wavelength, and may be light including multiple wavelengths, or may be white light.

(3) Diffraction Grating Cell The hologram forming region may include only a hologram cell capable of converting light incident from a point light source into the optical image, but light incident from a point light source may be used as the light. A hologram cell that can be converted into an image and a diffraction grating cell that is formed on the same plane as the hologram cell and is arranged in a pattern in a plan view to draw a diffraction grating pattern are arranged. You may.
By arranging a hologram cell in which a phased Fourier transform hologram that converts light incident from a point light source into a desired optical image and a diffraction grating cell that draws a diffraction grating pattern are arranged in the hologram forming region. , Both the optical image and the diffraction grating pattern can be reproduced in the hologram forming region.
For example, when the reflective hologram forming region has a reflective cell and a diffraction grating cell, both the optical image and the diffraction grating symbol can be reproduced in the reflective hologram forming region.
Further, the hologram structure can reproduce the diffraction grating pattern in the hologram forming region before the light from the point light source is incident, and can reproduce the optical image when the light from the point light source is incident. Therefore, the hologram structure can be pretended to have a diffraction grating pattern recorded in the hologram forming region and no optical image recorded, and can be made excellent in information confidentiality. ..
Therefore, by combining the light image and the diffraction grating pattern, the hologram structure becomes excellent in anti-counterfeiting property and design property.

A hologram structure in which a hologram cell and a diffraction grating cell are arranged in a hologram forming region will be described with reference to the drawings.
FIG. 13A is a schematic plan view showing an example of a hologram structure when both the hologram cell 11a and the diffraction grating cell 15a are provided in the hologram forming region 11, and FIG. 13B is FIG. 13A. ) Is a sectional view taken along line BB.
FIG. 13 shows an example in which the diffraction grating symbol 15 is the letter “F”.

Here, the term "formed on the same plane" means that the hologram cell and the diffraction grating cell are formed on the same surface of the hologram layer. That is, it means that both the uneven surface of the hologram cell and the uneven surface of the diffraction grating cell are formed on the same surface of the hologram layer.

The above-mentioned diffraction grating symbol is one in which a pattern-shaped symbol in which the diffraction grating cells are arranged is reproduced by irradiating visible light as reference light.
Here, the diffraction grating pattern is a pattern drawn by diffraction grating cells arranged in a pattern in a plan view. The original design is divided into, for example, grid-shaped fine cells, and the divided fine cells are divided into diffraction gratings. It is drawn by replacing it with a cell.
FIG. 13 described above shows an example in which the diffraction grating pattern 15 is drawn by arranging the diffraction grating cells 15a in the pattern of the letter “F”, and the reference light with respect to the diffraction grating symbol 15. By irradiating with, the letter "F" is reproduced as the diffraction grating pattern 15 in the hologram forming region 11.

Specifically, the design can be appropriately set according to the use of the hologram structure of the present invention, and examples thereof include patterns, line drawings, characters, figures, and symbols.

Further, as a symbol capable of particularly improving the anti-counterfeiting property and the design property as compared with the case of the light image alone by combining with the above-mentioned light image, specific examples are shown in FIGS. 14 (a) and 14 (b). A symbol used for recognizing an optical image such as an arrow pointing to a reproduction location of the optical image, a frame surrounding the reproduction portion of the optical image, and characters indicating the reproduction location of the optical image, FIG. 14 (c) and When the light image represents a part of the figure as illustrated in (d), the symbol representing the other part of the figure, the light image as illustrated in FIGS. 14 (e) and 14 (f). When is an image representing a part of a character string or a number string, a symbol representing another part of the character string or the number string, and when the above light image is an image representing the sun, a cloud or a cloud arranged around the sun Examples thereof include a symbol that forms a unified image in combination with an optical image reproduced in the hologram forming region, such as a symbol that represents a background such as the sky.
14 (a), (c) and (e) show the states before the optical image reproduction, and FIGS. 14 (b), (d) and (f) show the states at the time of optical image reproduction, respectively. Is shown. More specifically, FIGS. 14 (b), 14 (d) and (f) show the state of the first light image 12 at the time of reproduction as a light image.
Further, in FIGS. 14A and 14B, the diffraction grating pattern 15 is an arrow indicating a reproduction location of an optical image in the hologram forming region 11. In FIGS. 14 (c) and 14 (d), the diffraction grating symbol 15 is a part of an ellipse and can display one ellipse in combination with other parts of the ellipse shown by the optical image. In FIGS. 14 (e) and 14 (f), the diffraction grating symbol 15 is a part of the character string "real thing", and has one meaning in combination with other parts of the character string "real thing" shown by an optical image. The character string "real" can be displayed.

The diffraction grating symbol may be a plane diffraction grating symbol that can reproduce the symbol in a plane, or may be a three-dimensional diffraction grating symbol that can reproduce the symbol in three dimensions.
Since the diffraction grating symbol is a planar diffraction grating symbol, the planar diffraction grating symbol and the optical image can be combined, so that the hologram structure is excellent in anti-counterfeiting property and designability. Is. Further, it is easy to make the plane diffraction grating symbol have high brightness, and it is possible to reproduce the diffraction grating symbol having excellent visibility.
Since the diffraction grating design is a three-dimensional diffraction grating design, it is possible to combine the three-dimensional diffraction grating design and the optical image, so that the hologram structure is excellent in anti-counterfeiting property and designability. is there.
The diffraction grating symbol may be a plane diffraction grating symbol or a three-dimensional diffraction grating symbol, or may be a combination of both.

As a method of forming the plane diffraction grating pattern, a method of drawing the diffraction grating pattern using a diffraction grating cell having the same amplitude of the diffracted light can be mentioned.
Further, as a method of making the amplitude of the diffracted light about the same, as described in Japanese Patent No. 4948938, a region in which the diffraction grating of the diffraction grating cell is formed (hereinafter, simply referred to as a diffraction grating forming region). There is a method of making the area of) similar. That is, the planar diffraction grating pattern can be drawn by laying out diffraction grating cells having the same area of the diffraction grating forming region. As for the area of the diffraction grating forming region of the same degree, the area of the diffraction grating forming region of the diffraction grating cell may be determined as long as the plane diffraction grating design is reproducible. It is appropriately set according to the size of the diffraction grating pattern, the presence or absence of color display, and the like.

Examples of the method for forming the three-dimensional diffraction grating pattern include a method of arranging a diffraction grating cell having a large amplitude of diffracted light on the central portion side of the edge side of the diffraction grating symbol.
More specifically, in FIG. 13A, the letter "F" is drawn by drawing lines in which three diffraction grating cells are arranged in the width direction (for example, 15a1, 15a2, and 15a3). In this case, the diffraction grating cells 15a2 arranged on the central side of the diffraction grating cells 15a1 and 15a3 arranged on the end side in the width direction of the drawing line are used as the diffraction grating cells having a large amplitude of the diffracted light. When the reference light is irradiated, the letter "F" can be reproduced so as to appear three-dimensionally.
Further, as a method of increasing the amplitude of the diffracted light from the end side to the central portion side, as described in Japanese Patent No. 49844938, diffraction having a large area of the diffraction grating forming region from the end side to the central portion side. A method of arranging the grating cells can be mentioned. That is, the three-dimensional diffraction grating symbol can be such that a diffraction grating cell having a large area of the diffraction grating forming region is arranged on the central portion side from the end portion side of the diffraction grating symbol.
For example, as illustrated in FIG. 15, which is an enlarged view of the diffraction grating cells 15a1 to 15a3 in FIG. 13A, the center of the diffraction grating cells 15a1 and 15a3 arranged on the end side in the width direction of the drawing line. The diffraction grating cell 15a2 arranged on the portion side can be a diffraction grating cell having a large area of the diffraction grating forming region 15b.

The ratio of the area of the diffraction grating cell to the hologram forming region in a plan view is not particularly limited as long as a desired diffraction grating pattern can be drawn.
The ratio of the total area of the diffraction grating cells to the total area of the hologram cells in the hologram forming region (total area of the diffraction grating cells / total area of the hologram cells) clearly reproduces both the optical image and the diffraction grating pattern. It is not particularly limited as long as it can be made, but when the diffraction grating symbol is a plane diffraction grating symbol, it is preferably in the range of 1/4 to 3/2, and in particular, 1 /. It is preferably in the range of 2 to 1, and particularly preferably in the range of 5/8 to 7/8. This is because when the ratio of the area is within the above range, the hologram structure has excellent visibility of both the optical image and the planar diffraction grating pattern.
Further, when the diffraction grating symbol is a three-dimensional diffraction grating symbol, the total area ratio is preferably in the range of 1/3 to 4, and in particular, in the range of 2/3 to 3. It is preferable, and in particular, it is preferably in the range of 1 to 2. This is because when the ratio of the area is within the above range, the hologram structure has excellent visibility of both the optical image and the three-dimensional diffraction grating pattern.

The lattice pitch, lattice angle, and lattice density (ratio of the area of the diffraction grating cell in the plan view to the symbol) of the diffraction grating cell are appropriately set according to the symbol to be reproduced when the reference light is irradiated. It is a thing.
For example, by setting the lattice pitch to about 1.2 μm, about 1.0 μm, and about 0.8 μm, respectively, light of wavelengths of 600 nm (for red), 500 nm (for green), and 400 nm (for blue) is diffracted. It is possible to make a color image reproducible.
Further, various patterns can be expressed by the lattice angle and the lattice density.

The plan-view size of the diffraction grating cell can be appropriately set according to the diffraction grating pattern to be reproduced, and can be, for example, 5 μm square or more and 100 μm square or less. This is because a high-definition diffraction grating pattern can be drawn by the above-mentioned plan view size. In addition, the existence of individual diffraction grating cells for drawing the diffraction grating pattern can be hidden.

The shape of the diffraction grating cell in a plan view can be appropriately set according to the diffraction grating pattern to be reproduced, and can be, for example, the same as that of the hologram cell.

The method of forming the uneven surface of the diffraction grating cell on the hologram forming region can be the same as the method of forming a general diffraction grating pattern.

The reference light used for reproducing the diffraction grating pattern is not particularly limited, and one used for a general hologram can be used.
Specifically, as the reference light, light including visible light can be used.
For example, the reference light can be the same as the point light source used for reproducing the light image recorded in the hologram cell of the hologram layer.
The light source of the reference light is not limited to a point light source, and may be parallel light such as sunlight.
The hologram structure can reproduce the diffraction grating pattern by arranging the hologram structure in a bright place where reference light from a light source other than the point light source is irradiated, and further, in the bright place, the point light source is placed on the hologram forming region. The optical image can also be reproduced by arranging it in.

(4) Others The material constituting the hologram layer is not particularly limited as long as it can form a concave-convex shape for exhibiting the above-mentioned Fourier transform lens function in the hologram forming region and exhibits a predetermined refractive index. .. The refractive index exhibited by the material constituting the hologram layer is not particularly limited, and can be appropriately set according to the use of the hologram structure of the present invention.
Further, the wavelength that serves as a reference for the refractive index is not particularly limited, and may be appropriately selected from the range of 400 nm to 750 nm. Above all, in the present invention, the refractive index at a wavelength of 555 nm is preferably in the range of 1.3 to 2.0, and particularly preferably in the range of 1.33 to 1.8. Here, the refractive index can be measured by a spectroscopic ellipsometer.

As the material of the hologram layer, a resin material conventionally used for forming a relief type hologram or the like, for example, a cured product of a curable resin such as a thermosetting resin, an ultraviolet curable resin, or an ionizing radiation curable resin, Thermoplastic resin or the like can be used.

Examples of the thermosetting resin include unsaturated polyester resin, acrylic-modified urethane resin, epoxy-modified acrylic resin, epoxy-modified unsaturated polyester resin, alkyd resin, and phenol resin. Examples of the thermoplastic resin include acrylic acid ester resin, acrylamide resin, nitrocellulose resin, and polystyrene resin. These resins may be homopolymers or copolymers composed of two or more kinds of constituent components. Further, these resins may be used alone or in combination of two or more.

The above-mentioned thermosetting resin or thermoplastic resin includes various isocyanate compounds, metal soaps such as cobalt naphthenate and zinc naphthenate, organic peroxides such as benzoyl peroxide and methyl ethyl ketone peroxide, benzophenone, acetophenone, anthraquinone and naphthoquinone. It may contain a thermosetting agent such as azobisisobutyronitrile or diphenylsulfide.

Examples of the ionizing radiation curable resin include epoxy-modified acrylate resin, urethane-modified acrylate resin, acrylic-modified polyester resin, and the like. Among them, urethane-modified acrylate resin is preferable, and is particularly shown in JP-A-2007-017643. A urethane-modified acrylic resin represented by the above chemical formula is preferable.

When the ionizing radiation curable resin is cured, a monofunctional or polyfunctional monomer, an oligomer, or the like can be used in combination for the purpose of adjusting the crosslinked structure and viscosity. Examples of the monofunctional monomer include mono (meth) acrylates such as tetrahydrofurfuryl (meth) acrylate, hydroxyethyl (meth) acrylate, vinylpyrrolidone, (meth) acryloyloxyethyl succinate, and (meth) acryloyloxyethyl phthalate. And so on. The bifunctional or higher functional monomers are classified by skeletal structure and are classified into polyol (meth) acrylate (for example, epoxy-modified polyol (meth) acrylate, lactone-modified polyol (meth) acrylate, etc.), polyester (meth) acrylate, and epoxy (meth). ) Acrylate, urethane (meth) acrylate, other polybutadiene-based, isocyanuric acid-based, hydantin-based, melamine-based, phosphoric acid-based, imide-based, phosphazene-based poly (meth) acrylate and the like. In addition, various monomers, oligomers and polymers that are UV and electron beam curable are available.

More specifically, examples of the bifunctional monomer and oligomer include polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and 1,6-hexanediol di (meth). Examples include acrylate. Examples of the trifunctional monomer, oligomer, and polymer include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, and aliphatic tri (meth) acrylate. Examples of the tetrafunctional monomer and oligomer include pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, and aliphatic tetra (meth) acrylate. Examples of the pentafunctional or higher functional monomers and oligomers include dipentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate. Further, (meth) acrylate having a polyester skeleton, a urethane skeleton, and a phosphazene skeleton can be mentioned. The number of functional groups is not particularly limited, but if the number of functional groups is smaller than 3, the heat resistance tends to decrease, and if it exceeds 20, the flexibility tends to decrease, so that the number of functional groups is particularly high. Those in the range of 3 to 20 are preferable.

The content of the monofunctional or polyfunctional monomer or oligomer as described above can be appropriately adjusted, but is usually preferably 50 parts by weight or less with respect to 100 parts by weight of the ionizing radiation curable resin. It is preferably in the range of 0.5 parts by weight to 20 parts by weight.

Further, the hologram layer has, if necessary, a photopolymerization initiator, a polymerization inhibitor, a deterioration inhibitor, a plasticizer, a lubricant, a colorant such as a dye or a pigment, a surfactant, a defoaming agent, a leveling agent, and a thixotropic property. Additives such as a primer may be added as appropriate.

When the hologram layer has self-supporting property, the thickness of the hologram layer is preferably in the range of 0.05 mm to 5 mm, and more preferably in the range of 0.1 mm to 3 mm. On the other hand, when the hologram layer does not have self-supporting property and is formed on a transparent substrate described later, the film thickness of the hologram layer is preferably in the range of 0.1 μm to 50 μm, particularly 2 μm to 20 μm. It is preferably within the range of.
Specifically, the film thickness of the hologram layer is the distance shown by a in FIG. 2 already described.
Further, the size of the hologram layer in a plan view and the like can be appropriately set according to the use of the hologram structure of the present invention.

The hologram layer in the present invention has at least a hologram forming region, but may have a region (non-hologram forming region) in which an uneven shape is not formed in addition to the hologram forming region.
The ratio occupied by each of the above regions in the hologram layer is not particularly limited, and can be appropriately selected depending on the intended use.

2. 2. Thin-film deposition layer The thin-film deposition layer in the present invention is formed so as to be in contact with the uneven surface of the hologram-forming region of the hologram layer.

The vapor-deposited layer may have transparency or may have reflectivity.
When the thin-film deposition layer is a transparent thin-film deposition layer having transparency, the hologram-forming region of the hologram structure does not have gloss when viewed in a plan view. Therefore, the hologram structure is such that the hologram forming region is concealed, and the hologram structure is excellent in anti-counterfeiting property and design property.
On the other hand, when the vapor-deposited layer is a reflective vapor-deposited layer having reflectivity, the hologram structure can clearly reproduce an optical image in the hologram forming region. Therefore, the hologram structure is excellent in anti-counterfeiting property and design property.

The transparent vapor deposition layer preferably has a total light transmittance (hereinafter, may be simply referred to as light transmittance) of 80% or more, and more preferably 90% or more. This is because the light transmittance makes the hologram structure more concealed in the hologram forming region.
The light transmittance is a value measured by JIS K7361-1 (a test method for the total light transmittance of a plastic-transparent material).

The material constituting the vapor-deposited layer is not particularly limited as long as it is a material that causes a difference in refractive index from the hologram layer. Examples of the material capable of forming the reflective vapor deposition layer include Mg, Al, Ti, Cr, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Rb, Pd, Ag, Cd, In and Sn. , Sb, Te, Au, Pb, Bi, and the like.
Further, as a material capable of forming the transparent vapor deposition layer, for example, an oxide of the above metal can be mentioned.
The above materials may be used alone or in combination of two or more materials.

The thickness of the vapor-deposited layer can be appropriately set from the viewpoint of desired reflectivity, color tone, design, application, etc., and is preferably in the range of 50 Å to 1 μm, particularly in the range of 100 Å to 1000 Å. Is preferable.
The thickness of the thin-film deposition layer is specifically the distance shown in FIG. 2b, which has already been described.

The formed portion of the vapor-deposited layer may be at least overlapped with all the uneven surfaces in the hologram forming region in a plan view, and may cover the entire surface of the hologram layer on the uneven surface side.

As the method for forming the thin-film deposition layer, a general method for forming the thin-film deposition layer can be used, and examples thereof include a vacuum deposition method, a sputtering method, and an ion plating method.

3. 3. Other Structures The hologram structure of the present invention has a hologram layer and a vapor-deposited layer, but may have other structures if necessary.

(1) Transparent Base Material The hologram structure of the present invention may have a transparent base material formed on the surface of the hologram layer opposite to the vapor-deposited layer. This is because having a transparent substrate can increase the thermal or mechanical strength of the hologram structure of the present invention.

The transparent base material may be formed so as to be in direct contact with the hologram layer, or may be formed via another layer.
For example, the transparent base material may be adhered to the surface of the hologram layer via an interlayer adhesive layer described later.

The light transmittance of the transparent substrate is preferably 80% or more, and more preferably 90% or more. This is because by setting the light transmittance of the transparent base material within the above range, the hologram structure can easily visually recognize the light image.

Further, the transparent substrate preferably has a low haze value, specifically, a transparent substrate having a haze value in the range of 0.01% to 5%, particularly in the range of 0.01% to 3%. Some are preferable, and those in the range of 0.01% to 1.5% are particularly preferable. This is because by setting the haze value of the transparent substrate within the above range, it is possible to display the optical image expressed in the hologram forming region without impairing the visibility. The haze value of the transparent substrate is a value measured in accordance with JIS K7136.

The constituent material of the transparent base material is not particularly limited as long as it exhibits the above-mentioned light transmittance and haze value. For example, polyethylene terephthalate, polycarbonate, acrylic resin, cycloolefin resin, polyester resin, and polystyrene resin. , Resin film such as acrylic styrene resin, quartz glass, Pilex (registered trademark), synthetic quartz plate and other glass can be used. Among them, as the transparent base material, it is preferable to use a resin film from the viewpoint of light weight and less risk of breakage, and polycarbonate is most suitable from the viewpoint of birefringence.

The transparent substrate may contain additives, if necessary.
Examples of the additive include a dispersant, a filler, a plasticizer, an antistatic agent, and the like.

The film thickness of the transparent substrate may be any thickness that can have rigidity and strength to support the hologram layer and the like, and is preferably about 0.005 mm to 5 mm, and above all, 0. It is preferably in the range of 02 mm to 1 mm. Further, the shape of the transparent base material is not particularly limited, and can be appropriately selected depending on the usage pattern of the hologram structure of the present invention.

The surface of the transparent base material may be, for example, corona-treated in order to improve the adhesion to other layers.

(2) Image Display Layer The hologram structure of the present invention preferably has an image display layer for displaying an image used in combination with the above optical image.
This is because the image displayed by the image display layer can be combined with the light image reproduced in the hologram forming region, and the hologram structure is excellent in anti-counterfeiting property and designability. ..

Here, the above image is not particularly limited as long as it can improve the anti-counterfeiting property and the design property by combining with the optical image.
Specifically, the above image can be appropriately set according to the use of the hologram structure of the present invention. For example, not only patterns, line arts, characters, figures, symbols, etc., but also the entire surface is simply colored. It also includes the aspects described above.
Further, as an image whose anti-counterfeiting property and design property can be further improved by combining with the above-mentioned optical image, for example, as illustrated in FIGS. 16A and 16B, an arrow indicating the formation location of the hologram-forming region, An image used for recognizing a hologram forming region such as a frame surrounding the forming portion and a character indicating that the forming portion is formed, and as illustrated in FIGS. 16C and 16D, the optical image is a part of a figure. When the above-mentioned optical image is an image representing a part of a character string or a number string as illustrated in FIGS. 16 (e) and 16 (f), an image representing another part of the figure. Reproduced in the hologram forming region such as an image representing other parts of a character string or a number string, or an image representing a background such as a cloud or sky arranged around the sun when the optical image is an image representing the sun. An image or the like that forms one unified image in combination with the light image to be formed can be mentioned.
16 (a), (c) and (e) show the states before the optical image reproduction, and FIGS. 16 (b), (d) and 16 (f) show the states at the time of optical image reproduction, respectively. Is shown. More specifically, FIGS. 16 (b), 16 (d) and (f) show the state of the first optical image 12 at the time of reproduction as an optical image.
Further, in FIGS. 16A and 16B, the image 16 is an arrow indicating the formation location of the hologram forming region 11, and a character string representing “real” as an optical image can be reproduced in the hologram forming region 11. It is a thing. In FIGS. 16 (c) and 16 (d), image 16 is part of an ellipse that can display one ellipse in combination with other parts of the ellipse represented by the optical image. In FIGS. 16 (e) and 16 (f), the image 16 is a part of the character string "real" and is one meaningful character in combination with the other part of the character string "real" indicated by the optical image 16. It is possible to display the column "real".

The image display layer may be any one capable of displaying a desired image. For example, a printing layer having a coloring material and a resin material, and a diffraction grating pattern drawn by a diffraction grating cell arranged in a pattern in a plan view. A second hologram layer having a second hologram layer and the like can be mentioned.
The print layer can easily draw images of various colors and patterns. The second hologram layer can display an image only when it is irradiated with reference light. Therefore, the print layer or the like can easily form a hologram structure having excellent anti-counterfeiting property and design property.
The image display layer may be of only one type, or may be used in combination of two or more types. For example, the image display layer may include a plurality of print layers, a print layer, a second hologram layer, and the like.
Hereinafter, the print layer and the second hologram layer will be described.

(A) Print layer The print layer has a coloring material and a resin material.
Examples of the resin material include polycarbonates, polyesters, cellulose derivatives, norbornene resins, polyvinyl chlorides, polyvinyl acetates, acrylic resins, urethane resins, polypropylenes, polyethylenes, styrenes and the like. Resin can be used.
As the coloring material, those generally used as a printing layer can be used, and pigments such as inorganic pigments and organic pigments, acidic dyes, direct dyes, disperse dyes, oil-soluble dyes, metal-containing oil-soluble dyes, and sublimation properties Dyes such as dyes can be mentioned.
Further, as the coloring material, fluorescent light emitting materials such as ultraviolet light emitting materials and infrared light emitting materials that emit fluorescence by absorbing ultraviolet rays or infrared rays, polarized cholesteric polymer liquid crystal pigments, and particles that serve as reflectors such as glass beads are also used. Can be done.
As the method for forming the print layer, that is, the printing method, the same method as the general method for forming the print layer can be used. Specific examples of the printing method include various printing methods such as inkjet printing, screen printing, offset printing, gravure printing, and flexographic printing.
Further, as the ink used for the printing layer, an ink used for forming a general printing layer can be used, and an ink obtained by dispersing or dissolving the resin material and the coloring material in a solvent can be used.

The formation position of the print layer is not particularly limited as long as it does not interfere with the reproduction and visual recognition of the optical image in the hologram formation region, and the hologram is formed on the surface of the hologram layer opposite to the vapor deposition layer. It can be on the same plane as the layer and on the surface opposite to the hologram layer of the vapor deposition layer.
The print layer may overlap the hologram forming region in a plan view, but usually does not overlap.
FIG. 17A shows an example in which the print layer 4 is formed on the surface of the transparent base material 3 opposite to the hologram layer 1.

(B) Second Hologram Layer The second hologram layer has a diffraction grating pattern drawn by diffraction grating cells arranged in a pattern in a plan view, and the diffraction grating cells are arranged by irradiating with reference light. The pattern of the pattern shape that has been formed is reproduced.
Since such a diffraction grating pattern, a diffraction grating cell, and reference light can be the same as those described in "1. Hologram layer" above, the description thereof is omitted here.

The material constituting the second hologram layer is not particularly limited as long as it can form a concave-convex shape that functions as a diffraction grating included in the diffraction grating cell.
Such a material can be the same as the constituent material of the hologram layer described in the above section “1. Hologram layer”.

The film thickness of the second hologram layer may be the same as that of the hologram layer described in the above section "1. Hologram layer" as long as it can stably form the uneven shape of the diffraction grating. ..

The formation position of the second hologram layer is not particularly limited as long as it does not interfere with the reproduction and visual recognition of the optical image in the hologram formation region, and is on the surface opposite to the uneven surface of the hologram layer. , It can be on the same plane as the hologram layer, on the uneven surface of the hologram layer, or the like.
In FIG. 17B, the second thin-film deposition layer 7 formed so as to be in contact with the uneven surface of the diffraction grating pattern of the second hologram layer 6 and the second hologram layer 6 forms a hologram on the uneven surface of the hologram layer 1. It shows an example which is formed so that it does not overlap with a region 11 in a holographic view, and is formed through a vapor deposition layer 2 and an interlayer adhesive layer 5.
Further, FIG. 17C shows an example in which the second hologram layer 6 is arranged on the same plane as the hologram layer 1. Further, in FIG. 17C, the second hologram layer 6 and the hologram layer 1 are integrally formed, and the uneven shape forming surface of the diffraction grating of the second hologram layer 6 is the forming surface of the uneven surface of the hologram layer 1. It shows an example which is the same as.

The hologram structure of the present invention may have a second vapor-deposited layer formed so as to be in contact with the uneven surface of the diffraction grating pattern of the second hologram layer.
The second thin-film deposition layer is not particularly limited as long as the second hologram layer can function as a reflective hologram, and is generally used for a reflective hologram. Can be done. Specifically, the second vapor deposition layer can be the same as the content described in the section “2. Vapor deposition layer” above.
Note that FIG. 17B, which has already been described, shows a second hologram structure 10 formed so as to be in contact with the uneven surface of the second hologram layer on the surface of the second hologram layer 6 opposite to the hologram layer 1. The example which has the vapor deposition layer 7 is shown. Further, FIG. 17C shows an example in which the second vapor deposition layer 7 formed so as to be in contact with the uneven surface of the diffraction grating pattern of the second hologram layer 6 is formed integrally with the vapor deposition layer 2. ..

(3) Adhesive Layer The hologram structure of the present invention may have an interlayer adhesive layer for adhering between the configurations.
As the interlayer adhesive layer, a layer generally used for a hologram structure can be used, and the layer is appropriately selected according to the material constituting the transparent base material, the hologram layer and the like.
As the interlayer adhesive layer, for example, a known adhesive layer such as a two-component curable adhesive layer, an ultraviolet curable adhesive layer, a thermosetting adhesive layer, or a thermosetting adhesive layer can be used.
The thickness of the interlayer adhesive layer is appropriately set depending on the size of the structure to be bonded and the like.

(4) Adhesive Layer The hologram structure of the present invention may have an adhesive layer formed on the surface opposite to the hologram layer of the vapor deposition layer. This is because the hologram structure can be easily attached to the adherend by having the adhesive layer.

The adhesive layer may be transparent or may have light-shielding properties.

The adhesive layer may be an adhesive layer having adhesiveness, or may be a re-peelable adhesive layer having both adhesiveness and re-peelability characteristics.
The adhesive layer is an adhesive layer such as a two-component curable adhesive layer, an ultraviolet curable adhesive layer, a thermosetting adhesive layer, and a thermosetting adhesive layer, similarly to the interlayer adhesive layer. May be good.
When the adhesive layer is an adhesive layer, the hologram structure of the present invention can be firmly attached to a desired member, and the hologram structure can be made difficult to peel off from the adherend.
Further, when the adhesive layer is a re-peelable adhesive layer, the hologram structure of the present invention is attached to a desired member by adhering the re-peelable adhesive layer and the adherend so as not to allow air to enter. Can be done. Such a re-peelable adhesive layer can easily repeatedly adhere and peel without leaving a trace due to an adhesive or the like on the adherend, and damage to the adherend can be suppressed.

When the adhesive layer is an adhesive layer, examples of the resin used for the adhesive layer include acrylic resin, ester resin, urethane resin, ethylene vinyl acetate resin, latex resin, epoxy resin, and polyurethane. Examples thereof include ester-based resins, fluorine-based resins such as vinylidene fluoride-based resin (PVDF) and vinyl fluoride-based resin (PVF), and polyimide-based resins such as polyimide, polyamideimide, and polyetherimide. The resin is preferably an acrylic resin, a urethane resin, an ethylene vinyl acetate resin, or a latex resin.

When the adhesive layer is a re-peelable adhesive layer, the resin used for the re-peelable adhesive layer includes, for example, an acrylic resin, an acrylic acid ester resin, or a copolymer thereof, a styrene-butadiene copolymer, or the like. Examples thereof include natural rubber, casein, gelatin, rosin ester, terpene resin, phenol-based resin, styrene-based resin, Kumaron inden resin, polyvinyl ether, silicone resin and the like. The resin is preferably an acrylic resin or a silicone resin. This is because the acrylic resin can be adhered even when the surface of the adherend has some irregularities. In addition, the silicone resin is unlikely to lose its adhesive strength even after repeated adhesion and peeling.

The thickness of the adhesive layer is appropriately selected depending on the type and application of the hologram structure of the present invention, but is usually preferably in the range of 1 μm to 500 μm, and in particular, in the range of 2 μm to 50 μm. Is preferable. This is because when the thickness is within the above range, the adhesive layer has excellent adhesiveness.

(5) Release sheet In the hologram structure of the present invention, the release sheet may be arranged on the adhesive layer described above. Immediately before the hologram structure of the present invention is attached to a desired adherend via an adhesive layer, the release sheet and the adhesive layer can be peeled off and used. This makes it possible to prevent foreign matter from adhering between the adhesive layer and the adherend.

The release sheet is not particularly limited as long as it can protect the adhesive layer and can be easily peeled from the adhesive layer. As such a release sheet, for example, a layer made of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS) or the like can be used.
The thickness of the release sheet is appropriately selected according to the type and application of the hologram structure of the present invention.

Further, it is preferable that the surface of the release sheet on the side in contact with the adhesive layer is subjected to a release treatment in order to facilitate the operation of peeling from the adhesive layer. Examples of such a treatment method include silicone treatment, alkyd treatment, and the like, but are not particularly limited.

(6) Arbitrary member Further, even if the hologram structure of the present invention has an ultraviolet absorbing layer, an infrared absorbing layer, an antireflection layer, or the like on the transparent base material or the non-hologram forming region of the hologram layer. Good. By having such a layer, it is possible to impart an ultraviolet absorbing function, an infrared absorbing function, an antireflection function and the like to the hologram structure, and the hologram structure of the present invention can also be used as various filters and the like. Become.
Since these layers can be the same as those generally used, the description thereof is omitted here.

4. Hologram structure The hologram structure of the present invention may be used by adhering the hologram structure to the adherend, or may be used without adhering to the adherend.

The mode of use by adhering to the adherend is not particularly limited as long as it has an adhesive layer used for adhering to the adherend, and the side of the vapor deposition layer opposite to the hologram layer. A mode in which an adhesive layer is formed on the surface of the paper and is used as a hologram seal (first use mode), a heat seal layer formed on the surface of the vapor-deposited layer opposite to the hologram layer, and the hologram layer. The hologram transfer foil has an easy-to-peel layer formed on the surface opposite to the vapor-deposited layer and a peeling base material formed on the surface of the easy-to-peel layer opposite to the hologram layer. (Second use mode), the heat-sealed layer formed on the surface of the vapor-deposited layer opposite to the hologram layer, and the heat-sealed layer formed on the surface of the heat-sealed layer opposite to the vapor-deposited layer. A paper base material, an adhesive layer formed on the surface of the paper base material opposite to the heat seal layer, and a release sheet formed on the surface of the adhesive layer opposite to the paper base material. , And a mode used as a label (third use mode) and the like can be mentioned.
Moreover, as an embodiment which is used without adhering to the adherend, an embodiment in which the hologram structure is used as an information recording medium (fourth usage embodiment) and the like can be mentioned.

(1) First Usage Mode The first usage mode of the hologram structure of the present invention has an adhesive layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and is used as a hologram seal. is there.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 18A is a schematic cross-sectional view showing an example of the hologram structure of this embodiment. As illustrated in FIG. 18A, the hologram structure 10 of this embodiment has an adhesive layer 31 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1, and is used as a hologram seal. Is something that can be done.
The reference numerals in FIGS. 18A indicate the same members as those in FIGS. 1 and 2, and thus the description thereof will be omitted here.
Further, in this example, the hologram structure 10 has a release sheet 32 on the surface of the adhesive layer 31 opposite to the vapor deposition layer 2.

According to this aspect, by having the adhesive layer, it is easy to adhere the hologram structure to the adherend by using the adhesive layer, and the hologram structure is easily anti-counterfeiting to the adherend. And can give design.
As a specific application of such a hologram structure of this embodiment, it is attached to a ticket, a brand product, a quality control number label of a product, or the like, and a point light source is arranged on the hologram forming region in the hologram forming region. Examples include applications for determining authenticity using an optical image reproduced in a holographic image, and applications for imparting design.

The hologram structure of this embodiment has an adhesive layer.
The adhesive layer may be the same as the content described in the above section "3. Other configurations".
Further, if necessary, it may have other configurations described in the above-mentioned "3. Other configurations".

(2) Second Usage Mode The second usage mode of the hologram structure of the present invention includes a heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and the vapor deposition layer of the hologram layer. Has an easy-to-peel layer formed on the surface on the opposite side and a peeling base material formed on the surface on the opposite side of the easy-to-peel layer from the hologram layer, and is used as a hologram transfer foil. is there.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 18B is a schematic cross-sectional view showing an example of the hologram structure of this embodiment. As illustrated in FIG. 18B, the hologram structure 10 of this embodiment has a heat seal layer 33 formed on the surface of the vapor deposition layer 2 on the opposite side of the hologram layer 1 and the hologram layer 1. It has an easy-to-peel layer 34 formed on the surface opposite to the vapor-deposited layer 2, and a peeling base material 35 formed on the surface of the easy-to-peel layer 34 opposite to the hologram layer 1. , Used as a hologram transfer foil.
Since the reference numerals in FIG. 18B indicate the same members as those in FIGS. 1 and 2, the description thereof will be omitted here.
Further, in this example, the hologram structure 10 has a release sheet 32 on the surface of the heat seal layer 33 opposite to the vapor deposition layer 2.

According to this aspect, it is easy to adhere the hologram structure to the adherend by using the heat seal layer, and the hologram structure can easily impart anti-counterfeiting property and design property to the adherend. ..
Further, since the peeling base material is formed on the side of the hologram layer opposite to the vapor deposition layer via the peeling layer, it is possible to prevent the hologram structure from being damaged before being attached to the adherend.
As a specific application of such a hologram structure of this embodiment, a point light source is arranged on a hologram forming region by transferring it to a ticket, a brand product, a quality control number label of a product, or the like in a desired pattern shape. Examples include an application for determining authenticity using an optical image reproduced in the hologram forming region, an application for imparting design, and the like.

The hologram structure of this embodiment has a heat seal layer, a peelable layer, and a peeling base material.
Hereinafter, each configuration of the hologram structure of this embodiment will be described in detail.

The heat seal layer has a function of adhering the hologram layer and the vapor deposition layer to the adherend.

Such a heat seal layer is not particularly limited as long as the hologram layer and the adherend can be adhered to each other, and the adherend to which the hologram layer and the vapor deposition layer are transferred from the hologram structure of this embodiment. It is set as appropriate according to the type of.
As the heat seal layer, for example, a heat seal layer containing a thermoplastic resin described in Japanese Patent Application Laid-Open No. 2014-16422 can be used.

The peeling base material supports a hologram layer, a vapor deposition layer, and the like.
Further, the peeling base material is one in which the hologram structure of this embodiment is adhered to an adherend and then peeled from the hologram structure.
The peeling base material may be a transparent material or a light-shielding material.
The material and film thickness constituting the peeling base material can be, for example, the same as the transparent base material described in the section "3. Other configurations", and thus the description thereof is omitted here.

The easily peelable layer is provided to easily separate the peeling base material and the hologram layer after the hologram layer is adhered to the adherend via the adhesive layer.
As such an easily peelable layer, the re-peelable adhesion layer described in the above section "3. Other configurations" can be used.

The location of the easily peelable layer in a plan view is not particularly limited as long as the peeling base material can be easily peeled off from the hologram layer.

The hologram structure of this embodiment may have other configurations described in the above-mentioned "3. Other configurations", if necessary.

(3) Third Usage Mode The third usage mode of the hologram structure of the present invention is a heat-sealing layer formed on the surface of the vapor-deposited layer opposite to the hologram layer, and the vapor-deposited layer of the heat-sealing layer. The paper base material formed on the surface opposite to the above, the adhesive layer formed on the surface of the paper base material opposite to the heat seal layer, and the side of the adhesive layer opposite to the paper base material. It has a release sheet formed on the surface of the above and is used as a label.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 18C is a schematic cross-sectional view showing an example of the hologram structure of this embodiment. As illustrated in FIG. 18C, the hologram structure 10 of this embodiment has a heat-sealing layer 33 formed on the surface of the vapor-deposited layer 2 on the opposite side of the hologram layer 1 and the heat-sealing layer 33. A paper base material 36 formed on the surface of the paper base material 36 opposite to the vapor deposition layer 2, an adhesive layer 31 formed on the surface of the paper base material 36 opposite to the heat seal layer 33, and the adhesive layer. 31 has a release sheet 32 formed on the surface opposite to the paper base material 36, and is used as a label.
Since the reference numerals in FIGS. 18 (c) indicate the same members as those in FIGS. 1 and 2, the description thereof will be omitted here.

According to this aspect, by having the hologram layer and the vapor deposition layer, it is possible to obtain a label having excellent anti-counterfeiting property and designability.
Further, by having the paper base material on the side opposite to the hologram layer of the vapor deposition layer, the hologram structure of this embodiment can be formed on the surface of the paper base material on the side where the vapor deposition layer and the hologram layer are formed, for example, a printing layer or the like. Can be easily formed.
Specific uses of the hologram structure of this embodiment include quality control number labels for industrial products, and applications for determining authenticity using an optical image reproduced in the hologram forming region. Uses for imparting design can be mentioned.

The hologram structure of this embodiment has a heat seal layer, a paper base material, an adhesive layer, and a release sheet.
Hereinafter, each configuration of the hologram structure of this embodiment will be described in detail.
The heat-sealing layer can be the same as the heat-sealing layer described in the above-mentioned "(2) Second usage mode", and thus the description thereof is omitted here.
Further, the adhesive layer and the release sheet can be the same as those described in the above section "3. Other layers", and thus the description thereof will be omitted here.

As the paper constituting the paper base material, those generally used for forming a printing layer can be used, for example, high-quality paper, pure white roll paper, kraft paper, imitation paper, coated paper, aluminum vapor-deposited paper, synthetic paper. , Water resistant paper, coated ball, paperboard such as Manila ball, card paper, ivory paper, milk carton paper, cup base paper and the like can be used.
The thickness of the paper substrate can be, for example, in the range of 50 μm to 200 μm.

The hologram structure may be formed in a long shape and may be in a rewindable form (reel shape). By using the hologram structure as a reel-shaped label or the like, it is possible to cut out an appropriate length and use it when the hologram structure is attached to the adherend.

When the hologram structure is reel-shaped, the laminate of the hologram layer, the vapor deposition layer, and the heat seal layer may be arranged so as to cover the entire surface of the paper base material, but the paper base material may be used. It is preferable that the laminate is arranged so as to partially cover it, and among them, as illustrated in FIG. 19, the end portion of the laminate in the width direction X is a paper base along the reel-shaped longitudinal direction Y. It is preferably formed so as to be in contact with the widthwise end of the material. By arranging the laminate in this way, it is possible to prevent the hologram layer from being displaced. More specifically, the hologram structure of the present embodiment is applied to the surface of the paper substrate of the label having the adhesive layer and the release sheet on the back surface of the paper substrate, and the hologram structure of the above "(2) second usage mode" is applied to the surface of the paper substrate. In the case of manufacturing by transferring, it is possible to prevent the position shift of the hologram structure of the second usage mode to be transferred.
Note that FIG. 19 is a schematic plan view showing a part of the label having the hologram structure formed in a reel shape. In FIG. 19, the X direction is the width direction of the hologram structure, and the Y direction is the longitudinal direction (winding direction) of the hologram structure.

The paper base material may have a print layer formed in an exposed portion where the hologram layer is not arranged, that is, a paper base material printed on the surface of the paper base material.
It should be noted that such a print layer can be the same as the content described in the above section "3. Other configurations".

The hologram structure of this embodiment may have other configurations described in the above-mentioned "3. Other configurations", if necessary.

(4) Fourth Usage Mode In the fourth usage mode of the hologram structure of the present invention, the hologram structure is used as an information recording medium.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 18D is a schematic cross-sectional view showing an example of the hologram structure of this embodiment. As illustrated in FIG. 18D, the hologram structure 10 of this embodiment has a back surface side protective layer 37 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1 and a vapor deposition layer of the hologram layer 1. A surface-side protective layer 38 formed on the surface opposite to the hologram layer 1 and an intermediate base material 39 formed between the hologram layer 1 and the surface-side protective layer 38, which are used as an information recording medium. Is.
Note that the reference numerals in FIGS. 18D indicate the same members as those in FIGS. 1 and 2, and thus the description thereof will be omitted here.

According to this aspect, by using it as an information recording medium, it is possible to obtain an information recording medium having excellent anti-counterfeiting property and designability.
Specific uses of the hologram structure of this embodiment include, for example, cards such as credit cards, cash cards, and point cards, employee ID cards, identification cards such as driver's licenses, passbooks, passports, and the like.

The hologram structure of this embodiment has a hologram layer and a thin-film deposition layer, but may have other configurations depending on the type of information recording medium.

As such other configurations, for example, a back surface side protective layer formed on the surface of the hologram layer opposite to the hologram layer and a surface side protection formed on the surface of the hologram layer opposite to the hologram layer. Examples thereof include an intermediate base material formed between the layer and the hologram layer and the surface side protective layer.
The surface-side protective layer is formed on the surface opposite to the vapor-deposited layer of the hologram layer to protect the hologram layer, and at least a region that overlaps the hologram-forming region in a plan view is transparent. Used.
The back surface side protective layer is formed on the surface opposite to the hologram layer of the vapor deposition layer to protect the hologram layer and the vapor deposition layer.
The intermediate base material is formed between the hologram layer and the front surface side protective layer to support the hologram layer, the front surface side protective layer, and the back surface side protective layer, and at least a region that overlaps the hologram formation region in a plan view. Is used which is transparent. The intermediate base material may also be used as a transparent base material.
The constituent materials and film thickness of the front surface side protective layer, the back surface side protective layer, and the intermediate base material can be, for example, the same as those of the transparent base material described in the above section "3. Other configurations". .. More specifically, polycarbonate can be used as a constituent material of the front surface side protective layer and the back surface side protective layer, and polyethylene terephthalate can be used as a constituent material of the intermediate base material.
Further, the front surface side protective layer, the back surface side protective layer, and the intermediate base material may be formed as long as they can protect the hologram layer or the like, but can cover the entire surface of the hologram layer and the vapor deposition layer.

Examples of the other configuration include an information recording layer for recording information.
Examples of the information recording layer include a printing layer in which information is recorded by printing, a magnetic layer in which information is recorded by magnetism, an IC chip layer including an integrated circuit (IC) chip, and the like.
The other configuration may include a functional layer such as an antenna layer including an antenna.
The positions where these information recording layers and functional layers are formed are not particularly limited as long as they do not interfere with the reproduction and visibility of the optical image in the hologram forming region. For example, the vapor-deposited layer of the hologram layer. Can be on the surface on the opposite side, on the same plane as the hologram layer, on the surface on the side opposite to the hologram layer of the vapor deposition layer, and the like.

5. Manufacturing Method The manufacturing method of the hologram structure of the present invention is not particularly limited as long as it can accurately manufacture the hologram structure including each of the above configurations, and is the same as the general method for forming the hologram structure. The method can be used.
Specific examples of the manufacturing method include a method of preparing a transparent base material and forming a hologram layer and a thin-film deposition layer in this order.

6. Applications The hologram structure of the present invention can be used for anti-counterfeiting applications, and examples thereof include information recording media including cards such as credit cards and cash cards.
Further, the hologram structure may have an adhesive layer that can be adhered to another adherend, and may be used as a hologram structure seal or the like that can be attached to the adherend.
Further, the hologram structure may have a heat seal layer and may be used as a hologram structure transfer foil or the like that can be transferred to an adherend.
Furthermore, the hologram structure may have a paper base material and an adhesive layer, and may be used as a label or the like that can be attached to an adherend.

The present invention is not limited to the above embodiment. The above embodiment is an example, and any one having substantially the same configuration as the technical idea described in the claims of the present invention and exhibiting the same action and effect is the present invention. It is included in the technical scope of the invention.

Examples will be shown below, and the present invention will be described in more detail.

[Example 1]
<Formation of original plate and hologram structure>
A resist for dry etching was rotationally coated on the chromium thin film of the photomask blank plate in which the surface low-reflection chromium thin film was laminated on the synthetic quartz substrate by a spinner. ZEP7000 manufactured by Nippon Zeon Corporation was used as the resist for dry etching, and the resist was formed so as to have a thickness of 400 nm. For this resist layer, an electron beam drawing apparatus (MEBES4500: manufactured by ETEC) was used, and the size of the virtual hologram forming region was set to a region of 10 mm square, and in this virtual hologram forming region, FIG. A pattern prepared in advance by a computer was exposed so that the entire original image could be observed, and the exposed portion of the resist resin was easily dissolved. Then, the developing solution was sprayed (spray development) to remove the easily soluble portion, and a resist pattern was formed.
The grid pitch of the pattern was set to 3313 nm at the shortest.
Subsequently, using the formed resist pattern, the chromium thin film in the portion not covered with the resist was removed by etching by dry etching to expose the quartz substrate. The exposed quartz substrate was then etched to form recesses in the quartz substrate. Then, by dissolving and removing the resist thin film, an original plate having a recess formed by etching the quartz substrate and a convex portion remaining without etching the quartz substrate and the chromium thin film was obtained. Further, the size of the original plate, that is, the size of the hologram cell was set to 0.25 mm.
A composition for forming a hologram layer (UV curable acrylate resin: refractive index 1.52, measurement wavelength 633 nm) was added dropwise to a polycarbonate sheet (transparent substrate) having a thickness of 0.5 mm to form a coating film of the above composition. Next, an original plate having irregularities was placed on the coating film and pressed. Next, the coating film was cured by irradiating with active radiation and then peeled off to form a hologram cell having a concavo-convex surface in which the concavo-convex type of the original plate was inverted. After that, stacking, pressing, curing and peeling of the original plate were repeated to form a hologram layer having a thickness of 2 μm having a hologram forming region of 5 mm square in which hologram cells were spread.

Next, an Al layer having a film thickness of 100 nm was formed on the entire surface of the hologram layer on the uneven surface side by a sputtering method to obtain a hologram structure.

<Evaluation>
A point light source is placed at a position 60 mm from the surface of the hologram layer of the hologram structure and overlaps the center point of the hologram forming region in a plan view, and is observed from a point light source direction 60 mm away from the surface of the hologram layer. The image "OK" of the predetermined second light image subjected to the Fourier transform in the hologram forming region of No. 1 could be observed with good visibility.
Further, without changing the position of the point light source, the observer observes the hologram forming region at the same distance from the point light source position of the hologram forming region, and passes through the center point of the hologram forming region which is the point light source position. When observed from the direction in which the elevation angle with respect to the hologram forming region was 60 °, the image "OK" of the second light image was not observed, and only the image "1" of the first light image could be observed.

1 ... Hologram layer 1a ... Concavo-convex surface 2 ... Vapor deposition layer 3 ... Transparent substrate 4 ... Printing layer 5 ... Interlayer adhesive layer 6 ... Second hologram layer 7 ... Second vapor deposition layer 10 ... Hologram structure 11 ... Hologram formation area 11a ... Hologram cell 12 ... 1st light image 13 ... 2nd light image 15 ... Diffraction grating pattern 15a ... Diffraction grating cell 32 ... Peeling sheet 33 ... Heat seal layer 34 ... Easy peeling layer 35 ... Peeling base material 36 ... Paper base material 37 … Back side protective layer 38… Front side protective layer

Claims (7)

A hologram layer having a reflective hologram forming region in which a phase Fourier transform hologram is recorded, which converts the light incident from a point light source into a desired optical image, and
A vapor-deposited layer formed so as to be in contact with the uneven surface of the reflective hologram forming region of the hologram layer.
Have,
The light image includes a first light image that can be observed only from a direction different from that of a point light source with respect to the reflective hologram forming region.
In a virtual hologram forming region in which the reflective hologram forming region has a larger area than the reflective hologram forming region, the entire original image including the image of the first optical image outside the reflective hologram forming region is the point. The lattice pitch is designed so that it can be observed from the direction of the light source, and the hologram forming area having a width smaller than that of the virtual hologram forming area and not including the image of the first optical image is formed by the lattice pitch obtained by the design. A hologram structure characterized in that it is formed by forming . The light image includes a second light image that can be observed from the same direction as the point light source with respect to the reflective hologram forming region.
The hologram according to claim 1, wherein the second light image can be observed in the reflective hologram forming region when the reflective hologram forming region is observed from the same direction as the point light source. Structure. In the reflective hologram forming region of the hologram layer, a hologram cell capable of converting light incident from a point light source into the optical image and a hologram cell formed on the same plane as the hologram cell and arranged in a pattern in a plan view. The hologram structure according to claim 1 or 2, wherein a diffraction grating cell for drawing a diffraction grating pattern is arranged. The hologram structure according to claim 3, wherein the diffraction grating design is a plane diffraction grating design that can reproduce the design in a plane. The hologram structure according to claim 3, wherein the diffraction grating symbol is a three-dimensional diffraction grating symbol that can reproduce the symbol three-dimensionally. A heat-sealing layer formed on the surface of the vapor-deposited layer opposite to the hologram layer,
An easily peelable layer formed on the surface of the hologram layer opposite to the vapor-deposited layer,
A peeling base material formed on the surface of the easily peelable layer opposite to the hologram layer,
Have,
The hologram structure according to any one of claims 1 to 5, wherein the hologram structure is used as a hologram transfer foil. A heat-sealing layer formed on the surface of the vapor-deposited layer opposite to the hologram layer,
A paper base material formed on the surface of the heat seal layer opposite to the vapor deposition layer,
An adhesive layer formed on the surface of the paper substrate opposite to the heat seal layer,
A release sheet formed on the surface of the adhesive layer opposite to the paper substrate,
Have,
The hologram structure according to any one of claims 1 to 5, wherein the hologram structure is used as a label.