JP2017157640A5 - - Google Patents

Download PDF

Info

Publication number
JP2017157640A5
JP2017157640A5 JP2016038129A JP2016038129A JP2017157640A5 JP 2017157640 A5 JP2017157640 A5 JP 2017157640A5 JP 2016038129 A JP2016038129 A JP 2016038129A JP 2016038129 A JP2016038129 A JP 2016038129A JP 2017157640 A5 JP2017157640 A5 JP 2017157640A5
Authority
JP
Japan
Prior art keywords
substrate
region
electrode
mold
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016038129A
Other languages
English (en)
Japanese (ja)
Other versions
JP6732475B2 (ja
JP2017157640A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2016038129A priority Critical patent/JP6732475B2/ja
Priority claimed from JP2016038129A external-priority patent/JP6732475B2/ja
Priority to US15/436,635 priority patent/US10889052B2/en
Publication of JP2017157640A publication Critical patent/JP2017157640A/ja
Publication of JP2017157640A5 publication Critical patent/JP2017157640A5/ja
Application granted granted Critical
Publication of JP6732475B2 publication Critical patent/JP6732475B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2016038129A 2016-02-29 2016-02-29 インプリント装置、物品の製造方法、保持装置および露光装置 Active JP6732475B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016038129A JP6732475B2 (ja) 2016-02-29 2016-02-29 インプリント装置、物品の製造方法、保持装置および露光装置
US15/436,635 US10889052B2 (en) 2016-02-29 2017-02-17 Imprint apparatus, method for manufacturing article, and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016038129A JP6732475B2 (ja) 2016-02-29 2016-02-29 インプリント装置、物品の製造方法、保持装置および露光装置

Publications (3)

Publication Number Publication Date
JP2017157640A JP2017157640A (ja) 2017-09-07
JP2017157640A5 true JP2017157640A5 (cg-RX-API-DMAC7.html) 2019-04-11
JP6732475B2 JP6732475B2 (ja) 2020-07-29

Family

ID=59679216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016038129A Active JP6732475B2 (ja) 2016-02-29 2016-02-29 インプリント装置、物品の製造方法、保持装置および露光装置

Country Status (2)

Country Link
US (1) US10889052B2 (cg-RX-API-DMAC7.html)
JP (1) JP6732475B2 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6735656B2 (ja) * 2016-11-18 2020-08-05 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP7644656B2 (ja) * 2021-05-12 2025-03-12 キヤノン株式会社 評価方法、基板処理装置、基板処理装置の製造方法及び物品の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60118669T2 (de) * 2000-08-25 2007-01-11 Asml Netherlands B.V. Lithographischer Projektionsapparat
JP2006120776A (ja) * 2004-10-20 2006-05-11 Canon Inc 露光装置
JP5647029B2 (ja) * 2011-02-18 2014-12-24 キヤノン株式会社 インプリント装置及び物品の製造方法
US9186709B2 (en) 2011-03-23 2015-11-17 Sri International Active electroadhesive cleaning
JP6171412B2 (ja) * 2013-03-06 2017-08-02 大日本印刷株式会社 インプリント方法、インプリント用のモールドおよびインプリント装置
JP6123396B2 (ja) * 2013-03-18 2017-05-10 大日本印刷株式会社 インプリント方法およびインプリント装置
JP6643135B2 (ja) * 2016-02-17 2020-02-12 キヤノン株式会社 リソグラフィ装置および物品製造方法

Similar Documents

Publication Publication Date Title
JP2016195183A5 (cg-RX-API-DMAC7.html)
US20120061875A1 (en) Template chuck, imprint apparatus, and pattern forming method
JP2013254938A5 (cg-RX-API-DMAC7.html)
EP3476616A4 (en) FLAT PRINCIPLE PLATE, METHOD FOR THE PRODUCTION OF A FLAT PRINTING PLATE AND PRINTING METHOD
JP2012142592A5 (ja) 露光装置、ステージの制御方法
MX2015008589A (es) Produccion de un objeto voluminoso mediante litografia, con resolucion espacial mejorada.
JP2014229883A5 (cg-RX-API-DMAC7.html)
EP4567936A3 (en) Film electrode, resin layer forming ink and electrode printing method
JP2013138175A5 (cg-RX-API-DMAC7.html)
JP2016010856A5 (cg-RX-API-DMAC7.html)
PH12016000471A1 (en) 3d printing device for producing a spatially extended product
JP2014203935A5 (cg-RX-API-DMAC7.html)
JP2015012034A5 (cg-RX-API-DMAC7.html)
JP2017501572A5 (cg-RX-API-DMAC7.html)
JP2018082127A5 (cg-RX-API-DMAC7.html)
JP2016201485A5 (cg-RX-API-DMAC7.html)
JP2017157640A5 (cg-RX-API-DMAC7.html)
TW201614388A (en) Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer
JP2017103313A5 (cg-RX-API-DMAC7.html)
JP2015149390A (ja) インプリント装置、型、および物品の製造方法
WO2015124457A8 (en) Lithographic apparatus and method
JP2009064841A5 (cg-RX-API-DMAC7.html)
TWI618116B (zh) Imprinting device and method of manufacturing the same
JP2017157821A5 (cg-RX-API-DMAC7.html)
JP2018099510A5 (cg-RX-API-DMAC7.html)