JP2017147277A - Imprint apparatus, imprint method, and article manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an imprint apparatus advantageous in suppressing the occurrence of pattern defects.SOLUTION: The imprint apparatus for performing an imprint process for forming an imprint material supplied onto a substrate 2 to form a pattern on a substrate includes: a supply unit 12 for supplying the imprint material; an air flow forming unit 31 that forms an air flow 30 that intersects the supply path of the imprint material from the supply unit 12 to the substrate 2 and comes into contact with the imprint material at the supply path; and a control unit 20 that controls the airflow forming unit 31 on the basis of the order of imprint processing.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an imprint apparatus, an imprint method, and an article manufacturing method.

  There is a fine processing technique for forming a pattern by bringing a mold into contact with an imprint material on a substrate. As a method for supplying the imprint material onto the substrate, an ink jet method may be mentioned. In this method, a droplet of the imprint material is dropped onto the substrate from a nozzle that discharges the imprint material. At the time of dropping, the droplet is divided into a main droplet (main droplet) and a sub droplet (satellite liquid), and the satellite droplet may adhere to a region other than a desired dropping position. When satellite droplets adhere to a pattern-formed region, a pattern defect may occur due to a bridge formed between the patterns.

  Patent Document 1 discloses a technique for preventing satellite droplets from adhering to locations other than a desired position by focusing satellite droplets on main droplets by an air flow in an inkjet printer.

JP 2002-337339 A

  However, the technique of Patent Document 1 does not recognize that a satellite droplet adheres to a printed region as a problem. Therefore, the ink jet printer of Patent Document 1 generates an air flow that allows satellite droplets to adhere to a printed region.

  An object of the present invention is to provide an imprint apparatus that is advantageous in that, for example, generation of pattern defects is suppressed.

  In order to solve the above problems, the present invention provides an imprint apparatus that performs an imprint process for forming a pattern on a substrate by forming the imprint material supplied on the substrate, and supplying the imprint material An imprinting material supply path that crosses the supply path of the imprint material from the supply section to the substrate and forms an airflow that contacts the imprint material in the supply path; And a control unit that controls the airflow forming unit.

  According to the present invention, for example, it is possible to provide an imprint apparatus that is advantageous in that the occurrence of pattern defects is suppressed.

It is the schematic which shows the structure of the imprint apparatus which concerns on 1st Embodiment. It is a figure which shows the relationship between the order of the imprint process of each shot area | region on a board | substrate, and the direction of airflow. It is a figure which shows the case where the direction of an airflow is adjusted diagonally. It is a flowchart of the imprint process which concerns on 2nd Embodiment. It is a flowchart explaining the setting method of airflow. It is a flowchart of the imprint process which concerns on 3rd Embodiment. It is a flowchart explaining the setting method of the airflow corresponding to each shot area | region.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.

(First embodiment)
FIG. 1 is a schematic diagram showing the configuration of an imprint apparatus according to the first embodiment of the present invention. Here, as an imprint apparatus using a photocuring method, an ultraviolet curable imprint apparatus that cures an uncured imprint material on a substrate by irradiation with ultraviolet rays was used. However, as a method for curing the imprint material, a method using light irradiation in another wavelength region or a method using other energy (for example, heat) may be used. In the following figure, the Z axis is taken in parallel to the optical axis of the ultraviolet rays irradiated to the imprint material on the substrate, and the X axis and the Y axis perpendicular to each other are taken in a plane perpendicular to the Z axis. ing. The imprint apparatus 1 includes a substrate stage (substrate holding unit) 3, a mold unit (mold) 11 that presses a mold (mold) 10 having a pattern surface against an imprint material, and a supply unit (dispenser) 12. And a control unit 20 and an airflow forming unit 31.

  The substrate stage 3 holds the substrate 2 by mechanical holding means (not shown), for example, a vacuum suction pad, and aligns the substrate 2. The alignment is performed by a stage drive mechanism (not shown) that allows the substrate stage 3 to move in the X-axis or Y-axis direction. The stage drive mechanism may be composed of a plurality of drive mechanisms such as a coarse drive mechanism and a fine drive mechanism. Further, it may include a position adjustment function in the X-axis, Y-axis, Z-axis, or θ direction, a tilt function for correcting tilt, and the like. The substrate 2 is a substrate to be processed, and examples thereof include a single crystal silicon substrate and an SOI (Silicon on Insulator) substrate.

  The pressing part 11 holds the mold 10 and drives it in the Z-axis direction to transfer (mold) the concave / convex pattern of the mold 10 onto the substrate 2 held on the substrate stage 3. The pressing part 11 includes a mold holding mechanism, a mold shape correction mechanism (magnification correction mechanism), and a mold stage (all not shown). The mold holding mechanism is, for example, a vacuum suction pad, and holds and fixes the mold 10. The mold shape correction mechanism corrects the shape of the mold 10 by a compressive force, for example. The mold stage is driven in the Z-axis direction in order to bring the mold 10 into contact with the imprint material supplied on the substrate 2 (pressing mold). In addition, after the imprint material is cured by irradiation of ultraviolet rays by a projection optical system (not shown), it is driven in the Z-axis direction in order to release the mold 10 (release). The mold stage is driven by a drive mechanism that can be composed of a plurality of drive mechanisms such as a coarse motion drive mechanism and a fine motion drive system. The drive mechanism may have a configuration having a position adjusting function in the X axis, Y axis, Z axis, or θ direction, a tilt function for correcting tilt, and the like. The mold 10 is, for example, a mold having a rectangular outer peripheral portion and a predetermined uneven pattern formed in a three-dimensional shape, and is a material that can transmit ultraviolet rays, such as quartz glass.

  The supply unit 12 has a nozzle (not shown) that discharges the imprint material and supplies the imprint material onto the substrate 2. At the time of supply, the droplet of the imprint material is usually separated into a main droplet (main droplet) and a sub droplet (satellite droplet). Satellite drops are often misty mists. The amount of the imprint material to be discharged is determined by the required thickness of the imprint material, the pattern density to be transferred, and the like. In addition, the supply is performed for the shot area where the mold 10 is brought into contact immediately after.

  The control unit 20 controls each component of the imprint apparatus 1. For example, the imprint material is supplied by controlling the supply unit 12, alignment is performed by controlling the substrate stage 3, or the air flow 30 is formed by controlling the air flow forming unit 31. Further, the control unit 20 may perform imprint processing by controlling each component based on a preset order of shot areas for performing imprint processing. Here, the imprint process includes a series of operations of supplying an imprint material, pressing and releasing. Pattern formation by imprint material supply, pressing and release is performed on a certain shot area, and pattern formation by imprint material supply, pressing and release is similarly performed on the next shot area. The control unit 20 may further include a storage unit inside or outside, and can store the above order and the strength (wind speed, gas flow rate) and direction of the airflow 30 determined thereby. In the present embodiment, the storage unit 21 is provided outside the control unit 20. The control unit 20 may control the airflow 30 by the airflow forming unit 31 based on the stored information.

  The air flow forming unit 31 forms the air flow 30 in a direction orthogonal to the supply path of the imprint material from the supply unit 12 to the substrate 2. This direction may be a direction that intersects the supply path even if it is not orthogonal. The airflow 30 contacts the imprint material in the supply path. The airflow forming unit 31 of the present embodiment includes an air supply unit 31a and an intake unit 31b. The air supply unit 31a is connected to a positive pressure source (not shown) through a pipe, a duct, and the like. The intake portion 31b is connected to a negative pressure source (not shown) via a pipe, a duct, and the like. As the positive pressure source, for example, a fan can be used, and as the negative pressure source, for example, a vacuum pump can be used. The negative pressure source and the positive pressure source can be configured inside or outside the clean chamber 7. When configured outside the clean chamber 7, a connection port is configured in the clean chamber 7, and a negative pressure source or a positive pressure source configured outside the clean chamber 7 is connected using a pipe or a duct. In addition, the airflow formation part 31 should just contain any one of the air supply part 31a and the intake part 31b, and may consist of four components instead of two components like this embodiment, for example.

  The airflow forming unit 31 is desirably disposed at a position adjacent to the supply unit 12, but is not limited thereto. In the present embodiment, the air supply unit 31a and the air intake unit 31b are arranged so as to sandwich the supply unit 12. Moreover, you may move the airflow formation part 31 with a drive mechanism not shown. For example, the drive mechanism may rotate the airflow forming unit 31 about the supply unit 12 with the Z-axis direction as a rotation axis, and linearly drive the airflow forming unit 31 in the X-axis direction or the Y-axis direction. May be. Thereby, the relative position of the airflow formation part 31 and the supply part 12 can be changed arbitrarily, and the direction of the airflow 30 can be adjusted. For example, a motor or the like can be used as the drive mechanism.

  Adjustment of the direction of the air flow 30 can also be performed by supplying or stopping negative pressure or positive pressure by a pressure control unit (not shown). For example, an electromagnetic valve or an air operated valve may be used as the pressure control unit. When a fan is used as the positive pressure source, an inverter that changes the rotation speed of the fan may be used as the pressure control unit. The pressure control is preferably a method that is appropriately adjusted and changed depending on the amount of imprint material dripped when the pressure is supplied.

  The wind speed of the airflow 30 is also an important factor for preventing mist from adhering to the imprinted shot area. Depending on the height of the air velocity of the air flow 30, the main droplets are also caused to flow by the air flow 30, and it may be difficult to supply the imprint material to a desired location. For this reason, it is necessary to adjust the wind speed so that the landing position of the main droplet on the shot area has little influence and the mist does not land on the imprinted shot area. The wind speed is appropriately adjusted and changed according to the amount of imprint material dripped at the time of supply, the uniformity when the imprint material is supplied onto the substrate, the mist scattering distance in the leeward direction of the airflow 30 and the like. The method is desirable.

  Adjustment of the wind speed of the airflow 30 can be performed by a wind speed control unit (not shown). As the wind speed control unit, for example, a butterfly valve that blocks the flow of the air flow 30 and a pulse motor for controlling the opening of the butterfly valve can be used. When a fan is used as the positive pressure source, an inverter that changes the rotation speed of the fan may be used as the wind speed control unit. Further, the wind speed can be adjusted by controlling the negative pressure and the positive pressure by the pressure control unit. The wind speed control unit can also be used to adjust the direction of the airflow 30.

  As described above, the direction of the airflow 30 can be adjusted by moving the airflow forming unit 31, adjusting the gas supply or suction pressure, and adjusting the wind speed. Further, the adjustment of the air velocity of the air flow 30 can also be performed by adjusting the pressure of gas supply or suction. Based on the information stored in the storage unit, the control unit 20 controls the drive mechanism, the pressure control unit, and the wind speed control unit that drive the airflow forming unit 31, and performs the above movement and adjustment.

  The imprint apparatus 1 is disposed in the housing of the clean chamber 7. The clean chamber 7 is provided with an air supply mechanism 41 and an exhaust mechanism 51. In this embodiment, it arrange | positions in the position which mutually opposes. The air supply mechanism 41 supplies clean gas such as clean dry air into the clean chamber 7 in a predetermined direction at a predetermined flow rate. For example, the air supply mechanism 41 takes in external air with a blower (not shown), removes chemical substances and dust in the taken-in air with a filter (chemical filter or particle filter), and enters from the air outlet (not shown) to the inside. Supply clean gas.

  The exhaust mechanism 51 exhausts heat, dust and the like generated from the imprint apparatus 1. The exhaust mechanism 41 includes a vacuum generation mechanism (not shown). For example, a vacuum pump can be used as the vacuum generation mechanism. The vacuum generation mechanism may be configured inside the clean chamber 7. When configured outside the clean chamber 7, the exhaust port may be configured inside the clean chamber 7 and connected to a vacuum generation mechanism configured outside the clean chamber 7 using a duct or the like.

  In addition, the imprint apparatus 1 may include a substrate transport unit (not shown) for transporting the substrate 2 to the substrate stage 3 and a mold transport unit (not shown) for transporting the mold 10 to the pressing part 11. Further, an illumination unit (not shown) for irradiating the imprint material with ultraviolet rays, a base surface plate 4 for holding the substrate stage 3, a stamping portion 11, a supply portion 12, and a bridge surface plate for holding the airflow forming portion 31. 6. You may have the support | pillar 5 for supporting the bridge surface plate 6. FIG.

  2A and 2B are diagrams showing the relationship between the order of imprint processing of each shot area on the substrate and the direction of the airflow 30. FIG. 2A and 2B are views of the substrate 2 viewed from the + Z direction. Imprint processing is performed on the shot region 50 on the substrate 2 in the order indicated by the arrows. The shot area 50 includes a plurality of sections that are regularly arranged. The progress direction of the imprint process may be a constant direction or a direction may change during the processing of one substrate. 2A is an example in the case where the direction is always constant, and FIG. 2B is a case where the direction changes.

  The imprint process shown in FIG. 2A always proceeds in the + X direction for adjacent shot areas, and the movement from line to line composed of a plurality of shot areas always proceeds in the -Y direction. To do. Therefore, the direction of the airflow 30 is adjusted to be, for example, the + X direction (the direction in which the imprint process proceeds) so that mist does not adhere to the imprinted shot area. In this case, the mist does not adhere to the imprinted shot area even if the direction of the airflow 30 is adjusted to be in the −Y direction (the direction in which the imprint process proceeds). In the case of FIG. 2A, the direction of the airflow 30 is adjusted to be constant from the start to the end of the imprint process. In the case of FIG. 2A, the direction of the airflow 30 is adjusted in the −X direction or the −Y direction. The direction of the airflow 30 can be performed by moving the airflow forming unit 31 as described above. In addition to the direction of the airflow 30, the strength is adjusted as necessary.

  The imprint process shown in FIG. 2B proceeds to adjacent shot regions while changing the direction alternately in the + Y direction and the -Y direction. Further, movement from column to column composed of a plurality of shot areas always proceeds in the -X direction. In this case, the direction of the airflow 30 is adjusted to be, for example, the direction of the −X direction (the direction in which the imprint process proceeds). Further, when traveling in the + Y direction, the direction of the airflow 30 may be adjusted in the + Y direction, and when traveling in the −Y direction, the direction of the airflow 30 may be adjusted in the −Y direction (any direction). Is the direction in which the imprint process proceeds). Note that, as in the case of FIG. 2A, the strength of the airflow 30 is adjusted as necessary.

  The imprint process normally proceeds by moving to an adjacent shot region or moving (transition) from a column (or row) composed of a plurality of shot regions to a column (or row) adjacent to the column. . The direction of the airflow 30 is adjusted to a direction that does not include the direction in which the shot area that has been imprinted is present, based on the shape, classification, and imprint order of the shot area 50. The adjusted direction is a direction in which the imprint process proceeds. That is, the moving direction to the adjacent shot area or the same direction as the transition direction to the adjacent column (or row).

  In the above description, the direction of the air flow 30 is the direction along the X axis or the Y axis, but it may be adjusted in a direction (an oblique direction) across each axis. FIG. 3 is a diagram illustrating a case where the direction of the airflow 30 is adjusted obliquely. The imprinted shot area 50c is indicated by shading. The unshaded area is an unprocessed shot area 50u. In FIG. 3, the supply unit 12 is located immediately above one of the shot areas 50u before imprint processing. In the imprint process shown in FIG. 3, the process always proceeds in the + X direction, and the line transitions in the −Y direction. In this case, it is possible to prevent mist from adhering to the imprinted shot region 50c by adjusting in an oblique direction having a component in the -Y direction (a direction having a component in the direction in which the imprint process proceeds). As shown in FIG. 2B, when the direction is changed alternately between the + Y direction and the -Y direction, and the process proceeds while the column transitions to the -X direction, the component in the -X direction is changed. Adjust the diagonal direction. The strength of the airflow 30 is also adjusted as necessary.

  As described above, the imprint apparatus 1 according to the present embodiment adjusts the direction and strength of the airflow 30 for the mist generated when the imprint material is supplied, so that the area before the imprint process (unprocessed area). Can be skipped to. Therefore, according to the present embodiment, it is possible to provide an imprint apparatus that is advantageous in that the occurrence of pattern defects is suppressed.

(Second Embodiment)
FIG. 4 is a flowchart of the imprint process in the second embodiment of the present invention. In step S <b> 1, the control unit 20 controls the substrate transport unit to carry the substrate 2 into the substrate stage 3. In step S <b> 2, the control unit 20 controls the air flow forming unit 31 to set the direction and strength of the air flow 30.

  FIG. 5 is a flowchart for explaining the details of the method regarding the setting of the airflow 30 in step S2. In step S <b> 201, the user determines the layout of imprint processing for the substrate 2. Here, the layout refers to the shape and section of the shot area 50. In step S202, the user determines the order of imprint processing for each shot area. In step S203, the shape and the like of the shot area 50 determined in step S201 and the order determined in step S202 are stored in the storage unit. In step S204, the control unit 20 determines the direction and strength of the airflow 30 based on the information stored in the storage unit, controls the airflow forming unit 31, and sets the direction and strength of the airflow 30. This control means that any one of a drive mechanism, a pressure control unit, and a wind speed control unit that drives the airflow forming unit 31 is controlled.

  After step S2, the direction and strength of the airflow 30 are fixed. In step S <b> 3, the control unit 20 moves the substrate stage 3 so that the imprint material is supplied to a predetermined shot area based on the information stored in the storage unit. In step S <b> 4, the control unit 20 controls the supply unit 12 to supply the imprint material to a predetermined shot area of the substrate 2. Step S2 may be performed before step S4, for example, may be performed before step S1. In step S <b> 5, the control unit 20 moves the substrate stage 3 so that the shot area to which the imprint material is supplied is positioned directly below the mold 10. Thereafter, the control unit 20 controls the pressing part 11 to perform the pressing (step S6), controls the projection optical system, cures the imprint material (step S7), controls the pressing part 11, and releases the mold (step S8) is performed. Here, in the pressing and releasing, in addition to the pressing portion 11, the substrate stage 3 may be driven, or both of them may be driven. In step S9, the control unit 20 determines whether or not the imprint process for all shot areas has been completed. If completed (Yes), the control unit 20 controls the substrate transport unit to unload the substrate 2 from the substrate stage 3 (step S10). If not completed (No), Step S3 and subsequent steps are repeated. As shown in FIG. 2A, the method of the present embodiment moves to an adjacent shot area, or a column (or row) adjacent to the column from a column (or row) composed of a plurality of shot regions. It is possible to cope with the case where the direction of movement (transition) to () is constant. The imprint method according to the present embodiment also has the same effect as that of the first embodiment.

(Third embodiment)
FIG. 6 is a flowchart of an imprint process in the third embodiment of the present invention. In the second embodiment, the direction of the airflow is determined for each substrate, and the direction is constant until the imprint process for all shot areas is determined. In the present embodiment, the direction and strength of the airflow are determined for each of a plurality of shot areas (or for each column or row of shot areas). According to this method, it is possible to cope with a case where the moving direction to the adjacent shot region changes as shown in FIG. Steps different from the second embodiment are Step S20 and Step S21. In step S2 ′, the control unit 20 controls the air flow forming unit 31 to set the direction and strength of the air flow 30 corresponding to each shot region.

  FIG. 7 is a flowchart for explaining the details of the method regarding the setting of the airflow 30 in step S20. Steps S201 to S203 are the same as in the second embodiment. In step S214, the control unit 20 determines the direction and strength of the airflow 30 corresponding to each shot area based on the information stored in the storage unit. In step S215, the control unit 20 stores the determined information in the storage unit.

  In step S21, the control unit 20 refers to the information stored in step S20, controls the airflow forming unit 31, and sets the direction and strength of the airflow 30 corresponding to each shot region. This control means that any one of a drive mechanism, a pressure control unit, and a wind speed control unit that drives the airflow forming unit 31 is controlled. Subsequent steps S3 to S8 are the same as in the second embodiment. In step S9, the control unit 20 determines whether or not the imprint process for all shot areas has been completed. If completed (Yes), the control unit 20 controls the substrate transport unit to unload the substrate 2 from the substrate stage 3 (step S10). If not completed (No), steps S20 to S8 are repeated. Note that the order of step S21 is not limited as long as it is before step S4 and after step S20. Moreover, step S20 should just be performed before step S21.

  The method of the present embodiment can cope with a case where movement between shot areas is discontinuous or a case where a transition of a column (or row) in a shot area is discontinuous. The imprint method of this embodiment also has the same effect as that of the above embodiment.

  In the above embodiment, both the direction and strength of the airflow are controlled. However, only the direction control can be used. The air flow 30 may be formed only when the imprint material is supplied.

(Product manufacturing method)
A method for manufacturing a device (semiconductor integrated circuit element, liquid crystal display element, etc.) as an article includes a step of forming a pattern on a substrate (wafer, glass plate, film-like substrate) using the above-described imprint apparatus. Furthermore, the manufacturing method may include a step of etching the substrate on which the pattern is formed. When manufacturing other articles such as patterned media (recording media) and optical elements, the manufacturing method may include other processes for processing a substrate on which a pattern is formed instead of etching. The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

DESCRIPTION OF SYMBOLS 1 Imprint apparatus 2 Board | substrate 3 Board | substrate stage 10 Type | mold 11 Stamping part 12 Supply part 20 Control part 30 Airflow 31 Airflow formation part

Claims (13)

An imprint apparatus that performs an imprint process for forming a pattern on the substrate by forming an imprint material supplied on the substrate,
A supply unit for supplying the imprint material;
An airflow forming unit that forms an airflow that intersects the supply path of the imprint material from the supply unit to the substrate and contacts the imprint material in the supply path;
A control unit that controls the airflow forming unit based on the order of the imprint processing.   The control unit forms the airflow in a direction having a component in a direction in which the imprint process proceeds, and controls the airflow forming unit so that the imprint material contacts the airflow and travels in the direction. The imprint apparatus according to claim 1.   The imprint apparatus according to claim 1, wherein the control unit controls the airflow forming unit to adjust a speed of the airflow.   The said control part controls the said airflow formation part so that the direction of the said airflow may become constant until it complete | finishes after the said imprint process of one board | substrate is complete | finished. The imprint apparatus according to any one of the above.   The imprint apparatus according to claim 1, wherein the airflow forming unit is movable with respect to the supply unit.   The inflow according to any one of claims 1 to 5, wherein the air flow forming unit includes a positive pressure source or a negative pressure source, and includes a pressure control unit that controls at least one of them. Printing device.   The imprint apparatus according to any one of claims 1 to 6, wherein the air flow forming unit includes a wind speed control unit that adjusts a speed of the air flow.   The imprint apparatus according to claim 1, further comprising a storage unit that stores information regarding the airflow corresponding to the order.   The imprint apparatus according to claim 8, wherein the control unit controls the airflow forming unit based on the information stored in the storage unit.   The imprint apparatus according to any one of claims 1 to 9, wherein the imprint apparatus is housed in a housing in which an airflow is formed by an air supply mechanism and an exhaust mechanism. An imprint method for performing an imprint process for forming a pattern on the substrate by forming an imprint material supplied on the substrate,
Crossing the supply path of the imprint material and forming an air flow that contacts the imprint material in the supply path;
Supplying the imprint material onto the substrate after the air flow is formed, and
The imprint method is characterized in that the formation of the airflow is performed based on the order of the imprint processing.   The imprint method according to claim 11, wherein the formation of the airflow is performed for each of a plurality of shot regions included in the substrate. A step of performing pattern formation on a substrate using the imprint apparatus according to any one of claims 1 to 10 or the imprint method according to any one of claims 11 and 12.
Processing the substrate on which the pattern has been formed in the step;
A method for producing an article comprising:

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