JP2017146202A5 - - Google Patents
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- JP2017146202A5 JP2017146202A5 JP2016028169A JP2016028169A JP2017146202A5 JP 2017146202 A5 JP2017146202 A5 JP 2017146202A5 JP 2016028169 A JP2016028169 A JP 2016028169A JP 2016028169 A JP2016028169 A JP 2016028169A JP 2017146202 A5 JP2017146202 A5 JP 2017146202A5
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- 238000005259 measurement Methods 0.000 claims description 18
- 238000006073 displacement reaction Methods 0.000 claims 34
- 238000003384 imaging method Methods 0.000 claims 4
- 238000005070 sampling Methods 0.000 claims 2
- 238000000926 separation method Methods 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 description 1
Description
1.3 高速走査モアレ法による変形計測感度
高速走査モアレ法ではT0間隔の基本走査線に相対的なピッチpの試料格子のひずみは式、ε(n)=(p−T0)/T0で表される。
この数式と数式(7)とを比較すれば、T(n)<npの場合には式、ε(n)=T0/(d−T0)で得られ、T(n)>npの場合には式、ε(n)=−T0/(d+T0)で得られる。
モアレ間隔は通常y方向には基本走査線間隔よりはるかに大きいことから相対ひずみは式、|ε(n)|≒T0/d=T(n)/(nd)で簡素化される。
1.3 Deformation measurement sensitivity by the high-speed scanning moire method In the high-speed scanning moire method, the strain of the sample lattice with the pitch p relative to the basic scanning line at the interval T 0 is expressed by the equation: ε (n) = (p−T 0 ) / T It is represented by 0 .
Comparing this equation with equation (7), if T (n) <np, the following equation is obtained: ε (n) = T 0 / (d−T 0 ), and T (n)> np In the case, it is obtained by the equation, ε (n) = − T 0 / (d + T 0 ).
Since the moire interval is usually much larger than the basic scanning line interval in the y direction, the relative distortion is simplified by the equation | ε (n) | ≈T 0 / d = T (n) / (nd).
Claims (12)
試料台に載置されその表面に一方向にピッチp(pはT0に近接する)の規則格子が生成された試料の表面を前記走査型顕微鏡の走査線により走査して前記試料の表面のモアレ縞画像を取得し、
取得した前記モアレ縞画像の走査点の輝度情報から前記試料の変位ひずみ量を計算し、
計算した前記試料の変位ひずみ量を表示する、
走査モアレ方法による変位ひずみ分布測定システムであって、
前記走査型顕微鏡の走査点間隔Tを前記ピッチpの2以上の整数倍またはその近傍とし前記規則格子と前記走査点が不一致またはずれが生じるようにしたことを特徴とする、変位ひずみ分布測定システム。 A scanning microscope having scanning lines that are composed of vertical and horizontal scanning points and can be scanned at an interval T (an integer is 1 or more ) that is an integral multiple of the basic scanning line interval T 0 ;
The surface of the sample placed on the sample stage and having a regular lattice having a pitch p (p is close to T 0 ) in one direction on the surface is scanned by the scanning line of the scanning microscope, and the surface of the sample is scanned. Get moire fringe images,
Calculate the displacement strain amount of the sample from the luminance information of the scanning point of the acquired moire fringe image,
Displaying the calculated displacement amount of strain the sample,
A displacement strain distribution measuring system using a scanning moire method,
Wherein the two or more integral multiple or the scanning point and the superlattice and its vicinity of the pitch p of the scanning point interval T of the scanning microscope is as mismatch or shift occurs, the displacement strain distribution measurement system.
試料台に載置されその表面に直交する二方向にピッチp(pはT0に近接する)の規則交差格子が生成された試料の表面を前記走査型顕微鏡の走査線により走査して前記試料表面の2次元モアレ縞画像を取得し、
取得した前記モアレ縞画像の走査点の輝度情報から前記試料の変位ひずみ量を計算し、
計算した前記試料の変位ひずみ量を表示する、
走査モアレ方法による変位ひずみ分布測定システムであって、
前記規則交差格子と前記基本走査線間隔T0の走査点とを近接して配置し前記規則交差格子と前記走査点が不一致またはずれが生じるようにしたことを特徴とする、変位ひずみ分布測定システム。 A scanning microscope having scanning lines that are composed of vertical and horizontal scanning points and can be scanned at an interval T (an integer is 1 or more ) that is an integral multiple of the basic scanning line interval T 0 ;
The surface of the sample placed on the sample stage and on which a regular crossing lattice having a pitch p (p is close to T 0 ) is generated in two directions perpendicular to the surface of the sample is scanned by the scanning line of the scanning microscope. Obtain a 2D moire fringe image of the surface,
Calculate the displacement strain amount of the sample from the luminance information of the scanning point of the acquired moire fringe image,
Displaying the calculated displacement amount of strain the sample,
A displacement strain distribution measuring system using a scanning moire method,
Wherein the scanning point and the scanning point and the rule intersecting grid disposed in close proximity to the rules intersecting grid and the basic scanning line interval T 0 is as mismatch or shift occurs, the displacement strain distribution measurement system.
試料台に載置されその表面に直交する二方向にピッチp(pはT0に近接する)の規則交差格子が生成された試料の表面を前記走査型顕微鏡の走査線により走査して前記試料表面の2次元モアレ縞画像を取得し、
取得した前記2次元モアレ縞画像の走査点の輝度情報から前記試料の変位ひずみ量を計算し、
計算した前記試料の変位ひずみ量を表示する、
走査モアレ方法による変位ひずみ分布測定システムであって、
前記走査型顕微鏡の直交する二方向の走査線間隔Tx、Tyを前記ピッチpの整数倍(整数は1以上)またはその近傍となるようにし、かつ、
少なくとも前記二方向の走査線間隔の一つは前記ピッチpの2以上の整数倍またはその近傍とし、
前記規則交差格子と前記走査線間隔Tx、Tyの走査点とを近接して配置し前記規則交差格子と前記走査点が不一致またはずれが生じるようにしたことを特徴とする、変位ひずみ分布測定システム。 A scanning microscope having a scanning line consisting of scanning points that can be scanned at an interval T (an integer is 1 or more ) that is an integral multiple of the basic scanning line interval T 0 vertically and horizontally;
The surface of the sample placed on the sample stage and on which a regular crossing lattice having a pitch p (p is close to T 0 ) is generated in two directions perpendicular to the surface of the sample is scanned by the scanning line of the scanning microscope. Obtain a 2D moire fringe image of the surface,
The displacement strain amount of the sample is calculated from the luminance information of the scanning point of the acquired two-dimensional moire fringe image,
Display the calculated displacement strain of the sample,
A displacement strain distribution measuring system using a scanning moire method,
A scanning line interval T x , T y in two orthogonal directions of the scanning microscope is an integer multiple of the pitch p (an integer is 1 or more ) or the vicinity thereof; and
At least one of the scanning line intervals in the two directions is an integer multiple of 2 or more of the pitch p or the vicinity thereof,
Characterized in that as said regular cross grating and the scanning line interval T x, the scanning point and the scanning point and the rule intersecting grid disposed in close proximity to the T y is the mismatch or misalignment occurs, the displacement strain Distribution measurement system.
取得した前記モアレ縞画像の撮像素子に記憶された輝度情報から前記測定物の変位ひずみ量を計算し、
計算した前記測定物の変位ひずみ量を表示する、
サンプリングモアレ方法による変位ひずみ分布測定システムであって、
前記一方向の前記ピッチPの前記イメージセンサにおけるピッチpの整数倍(整数は1以上)またはその近傍にある前記一方向の撮像素子列に前記モアレ縞画像を記憶し、
前記記録された輝度情報から前記測定物の変位ひずみ量を計算することを特徴とする、変位ひずみ分布測定システム。 At least an objective lens, by using the imaging apparatus comprising a Louis Mejisensa such from the imaging element aligned in two directions, by photographing the surface of the measured object ordered lattice pitch p is generated in one direction on the surface thereof Get moire fringe images,
Calculate the displacement strain amount of the measurement object from the luminance information stored in the image sensor of the acquired moire fringe image,
Display the calculated displacement strain of the measured object,
Displacement strain distribution measurement system by sampling moire method,
Storing the moire fringe image in the image sensor array in the one direction which is an integer multiple of the pitch p in the image sensor of the pitch P in the one direction (an integer is 1 or more ) or in the vicinity thereof;
And calculates the displacement amount of strain said measured object from said recorded luminance information, the displacement strain distribution measurement system.
取得した前記2次元モアレ縞画像の撮像素子に記憶された輝度情報から前記測定物の変位ひずみ量を計算し、
計算した前記測定物の変位ひずみ量を表示する、
サンプリングモアレ方法による変位ひずみ分布測定システムであって、
前記二方向の前記ピッチPの前記イメージセンサにおけるピッチpの整数倍(整数は1以上)またはその近傍にある撮像素子列であって、かつ、
少なくとも前記一方向の撮像素子列は前記ピッチpの2以上の整数倍またはその近傍にあり、
前記二方向の撮像素子列に前記モアレ縞画像を記録し、
前記記録された輝度情報から前記測定物の変位ひずみ量を計算することを特徴とする、変位ひずみ分布測定システム。 At least an objective lens, by using an imaging device that includes a Louis Mejisensa such from the imaging element aligned in two directions, the surface of the measured object rule intersecting lattice pitch P is generated in the two directions on the surface of shooting To obtain a 2D moire fringe image,
Calculating the displacement strain amount of the measurement object from the luminance information stored in the image sensor of the acquired two-dimensional moire fringe image;
Displaying the calculated displacement amount of strain the measurement was,
Displacement strain distribution measurement system by sampling moire method,
An image sensor array in an integer multiple of the pitch p in the image sensor of the pitch P in the two directions (an integer is 1 or more ) or in the vicinity thereof, and
At least one direction of the image pickup element column are two or more integral multiple or near near its said pitch p,
The moire fringe image is recorded in the two-direction image sensor array,
And calculates the displacement amount of strain said measured object from said recorded luminance information, the displacement strain distribution measurement system.
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JP2017146202A5 true JP2017146202A5 (en) | 2019-03-07 |
JP6813162B2 JP6813162B2 (en) | 2021-01-13 |
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Families Citing this family (7)
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JP6583761B2 (en) | 2016-09-27 | 2019-10-02 | 国立研究開発法人産業技術総合研究所 | Three-dimensional shape / displacement / strain measuring device, method and program using periodic pattern |
CN108196091B (en) * | 2018-03-30 | 2024-01-26 | 南京邮电大学 | Photoelectric acceleration sensor based on CMOS |
CN108469443A (en) * | 2018-04-18 | 2018-08-31 | 北京航空航天大学 | X-ray grating differential phase contrast imaging method and device based on two dimension dislocation absorption grating |
CN110068284B (en) * | 2019-05-20 | 2020-10-30 | 北京建筑大学 | Method for monitoring tower crane by using high-speed photogrammetry technology |
CN110398201B (en) * | 2019-08-06 | 2021-08-06 | 湖南大学 | Displacement measuring method combining digital image correlation technique and Moire sampling method |
CN111325718B (en) * | 2020-01-23 | 2023-07-25 | 深圳大学 | Strain modal analysis method and related device |
CN113720268B (en) * | 2021-08-03 | 2022-10-25 | 西安交通大学 | Digital moire method, system, equipment and storage medium for measuring strain based on light intensity principle |
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