JP2017132917A - Aromatic polyketone having alkylene group in main chain, aromatic polyketone varnish, aromatic polyketone film, and method for producing aromatic polyketone - Google Patents
Aromatic polyketone having alkylene group in main chain, aromatic polyketone varnish, aromatic polyketone film, and method for producing aromatic polyketone Download PDFInfo
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- JP2017132917A JP2017132917A JP2016014441A JP2016014441A JP2017132917A JP 2017132917 A JP2017132917 A JP 2017132917A JP 2016014441 A JP2016014441 A JP 2016014441A JP 2016014441 A JP2016014441 A JP 2016014441A JP 2017132917 A JP2017132917 A JP 2017132917A
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- hydrocarbon group
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- 229920001470 polyketone Polymers 0.000 title claims abstract description 153
- 125000003118 aryl group Chemical group 0.000 title claims abstract description 111
- 239000002966 varnish Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 125000002947 alkylene group Chemical group 0.000 title claims description 12
- 125000001424 substituent group Chemical group 0.000 claims description 58
- 125000004432 carbon atom Chemical group C* 0.000 claims description 54
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 42
- 239000000178 monomer Substances 0.000 claims description 29
- 239000002904 solvent Substances 0.000 claims description 23
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 20
- 125000002723 alicyclic group Chemical group 0.000 claims description 15
- 230000002378 acidificating effect Effects 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 8
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 15
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract 3
- 235000010290 biphenyl Nutrition 0.000 abstract 2
- 239000004305 biphenyl Substances 0.000 abstract 2
- ZCILODAAHLISPY-UHFFFAOYSA-N biphenyl ether Natural products C1=C(CC=C)C(O)=CC(OC=2C(=CC(CC=C)=CC=2)O)=C1 ZCILODAAHLISPY-UHFFFAOYSA-N 0.000 abstract 1
- 125000001033 ether group Chemical group 0.000 abstract 1
- 150000002430 hydrocarbons Chemical group 0.000 description 40
- 238000000034 method Methods 0.000 description 18
- 239000000758 substrate Substances 0.000 description 15
- 238000006482 condensation reaction Methods 0.000 description 14
- -1 n-octyl group Chemical group 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- TVIDDXQYHWJXFK-UHFFFAOYSA-N dodecanedioic acid Chemical compound OC(=O)CCCCCCCCCCC(O)=O TVIDDXQYHWJXFK-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- PAVQGHWQOQZQEH-UHFFFAOYSA-N adamantane-1,3-dicarboxylic acid Chemical compound C1C(C2)CC3CC1(C(=O)O)CC2(C(O)=O)C3 PAVQGHWQOQZQEH-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- VGMKUVCDINAAFC-UHFFFAOYSA-N 1-methoxy-2-(2-methoxyphenyl)benzene Chemical group COC1=CC=CC=C1C1=CC=CC=C1OC VGMKUVCDINAAFC-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- LLNAMUJRIZIXHF-CLFYSBASSA-N (z)-2-methyl-3-phenylprop-2-en-1-ol Chemical compound OCC(/C)=C\C1=CC=CC=C1 LLNAMUJRIZIXHF-CLFYSBASSA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229960002255 azelaic acid Drugs 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 210000002858 crystal cell Anatomy 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- 239000003480 eluent Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 230000000474 nursing effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920001643 poly(ether ketone) Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 2
- LWBHHRRTOZQPDM-UHFFFAOYSA-N undecanedioic acid Chemical compound OC(=O)CCCCCCCCCC(O)=O LWBHHRRTOZQPDM-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- OKIRBHVFJGXOIS-UHFFFAOYSA-N 1,2-di(propan-2-yl)benzene Chemical compound CC(C)C1=CC=CC=C1C(C)C OKIRBHVFJGXOIS-UHFFFAOYSA-N 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- GVSTYPOYHNVKHY-UHFFFAOYSA-N 2-methoxybutanoic acid Chemical compound CCC(OC)C(O)=O GVSTYPOYHNVKHY-UHFFFAOYSA-N 0.000 description 1
- MHNNAWXXUZQSNM-UHFFFAOYSA-N 2-methylbut-1-ene Chemical group CCC(C)=C MHNNAWXXUZQSNM-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 238000005863 Friedel-Crafts acylation reaction Methods 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- XTHLMMQPSUSPPS-UHFFFAOYSA-N bicyclo[2.2.1]heptane-1,4-dicarboxylic acid Chemical compound C1CC2(C(O)=O)CCC1(C(=O)O)C2 XTHLMMQPSUSPPS-UHFFFAOYSA-N 0.000 description 1
- IVVOCRBADNIWDM-UHFFFAOYSA-N bicyclo[2.2.1]heptane-2,3-dicarboxylic acid Chemical compound C1CC2C(C(O)=O)C(C(=O)O)C1C2 IVVOCRBADNIWDM-UHFFFAOYSA-N 0.000 description 1
- TYOIRTKMCCIKFR-UHFFFAOYSA-N bicyclo[2.2.1]heptane-2,4-dicarboxylic acid Chemical compound C1CC2C(C(=O)O)CC1(C(O)=O)C2 TYOIRTKMCCIKFR-UHFFFAOYSA-N 0.000 description 1
- GPRLTFBKWDERLU-UHFFFAOYSA-N bicyclo[2.2.2]octane Chemical group C1CC2CCC1CC2 GPRLTFBKWDERLU-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- TXWRERCHRDBNLG-UHFFFAOYSA-N cubane Chemical group C12C3C4C1C1C4C3C12 TXWRERCHRDBNLG-UHFFFAOYSA-N 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- XBZSBBLNHFMTEB-UHFFFAOYSA-N cyclohexane-1,3-dicarboxylic acid Chemical compound OC(=O)C1CCCC(C(O)=O)C1 XBZSBBLNHFMTEB-UHFFFAOYSA-N 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical group CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- ZICQBHNGXDOVJF-UHFFFAOYSA-N diamantane Chemical group C1C2C3CC(C4)CC2C2C4C3CC1C2 ZICQBHNGXDOVJF-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000011416 infrared curing Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 238000011415 microwave curing Methods 0.000 description 1
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Abstract
Description
本発明は、芳香族ポリケトン、芳香族ポリケトンワニス、芳香族ポリケトン膜及び芳香族ポリケトンの製造方法に関する。 The present invention relates to an aromatic polyketone, an aromatic polyketone varnish, an aromatic polyketone film, and a method for producing an aromatic polyketone.
主鎖に芳香環とカルボニル基を有する芳香族ポリケトンは、優れた耐熱性と機械特性を有しており、エンジニアリングプラスチックとして利用されている。芳香族ポリケトンに属する高分子のほとんどは、求核芳香族置換反応を利用して重合された芳香族ポリエーテルケトンであり、主鎖にエーテル結合も有している。これに対し、主鎖にエーテル結合を有していない芳香族ポリケトンは、芳香族ポリエーテルケトンよりも更に優れた耐熱性及び耐薬品性を発揮しうる(例えば、特許文献1及び特許文献2参照)。 An aromatic polyketone having an aromatic ring and a carbonyl group in the main chain has excellent heat resistance and mechanical properties, and is used as an engineering plastic. Most of the polymers belonging to the aromatic polyketone are aromatic polyether ketones polymerized using a nucleophilic aromatic substitution reaction, and have an ether bond in the main chain. On the other hand, an aromatic polyketone that does not have an ether bond in the main chain can exhibit better heat resistance and chemical resistance than aromatic polyether ketone (see, for example, Patent Document 1 and Patent Document 2). ).
近年、脂環式ジカルボン酸と2,2’−ジアルコキシビフェニル化合物をFriedel−Craftsアシル化により直接重合することで、高い透明性と耐熱性とを両立した芳香族ポリケトンを得ることができることが報告され、光学部品への応用が期待されている(例えば、特許文献3参照)。 In recent years, it has been reported that an aromatic polyketone having both high transparency and heat resistance can be obtained by directly polymerizing an alicyclic dicarboxylic acid and a 2,2′-dialkoxybiphenyl compound by Friedel-Crafts acylation. Therefore, application to optical components is expected (see, for example, Patent Document 3).
樹脂材料を光学部品に応用する場合には、無機材料では得られない特性が期待され、そのような特性としては、例えば、軽量性及び柔軟性が挙げられる。軽量性を活かした適用例としては、ポータブルデバイスのガラス代替材及びコート材が挙げられ、柔軟さを活かした適用例としては、フレキシブルディスプレイ等が挙げられる。なかでも、フレキシブルディスプレイへの樹脂材料の適用は、近年特に注目されている。 When a resin material is applied to an optical component, properties that cannot be obtained with an inorganic material are expected. Examples of such properties include lightness and flexibility. Examples of applications that take advantage of lightness include glass substitutes and coating materials for portable devices, and examples of applications that take advantage of flexibility include flexible displays. Among these, application of resin materials to flexible displays has attracted particular attention in recent years.
しかし、特許文献3に記載の脂環式ジカルボン酸と2,2’−ジアルコキシビフェニル化合物から重合される芳香族ポリケトンは、優れた耐熱性と透明性を有する一方で、成形品が硬くなりやすい。このことにより、折り曲げ可能な柔軟な膜を得ることが難しい。 However, the aromatic polyketone polymerized from the alicyclic dicarboxylic acid and the 2,2′-dialkoxybiphenyl compound described in Patent Document 3 has excellent heat resistance and transparency, but the molded product tends to be hard. . This makes it difficult to obtain a flexible film that can be bent.
本発明は上記状況に鑑みなされたものであり、優れた耐熱性と透明性を有し、柔軟な膜を形成可能な芳香族ポリケトン、芳香族ポリケトンワニス及び芳香族ポリケトンの製造方法、並びに優れた耐熱性と透明性と柔軟性とを有する芳香族ポリケトン膜を提供する。 The present invention has been made in view of the above circumstances, and has an excellent heat resistance and transparency, and an aromatic polyketone capable of forming a flexible film, an aromatic polyketone varnish, a method for producing an aromatic polyketone, and an excellent An aromatic polyketone film having heat resistance, transparency and flexibility is provided.
本発明は、下記<1>〜<7>の態様を含む。 The present invention includes the following aspects <1> to <7>.
<1> 下記一般式(1)、下記一般式(2)及び下記一般式(4)からなる群より選択される少なくとも1種の構造単位と、下記一般式(5−1)で表される少なくとも1種の構造単位と、下記一般式(5−2)で表される少なくとも1種の構造単位と、を有する芳香族ポリケトン。 <1> Represented by the following general formula (5-1), at least one structural unit selected from the group consisting of the following general formula (1), the following general formula (2), and the following general formula (4) An aromatic polyketone having at least one structural unit and at least one structural unit represented by the following general formula (5-2).
一般式(1)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In general formula (1), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and R 2 each independently represents a hydrogen atom or a substituent. The C1-C30 hydrocarbon group which may have is shown.
一般式(2)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、Xは酸素原子又は下記一般式(3)で表される2価の基を示す。 In General Formula (2), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and X represents an oxygen atom or the following General Formula (3) The divalent group represented is shown.
一般式(3)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (3), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
一般式(4)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (4), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
一般式(5−1)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。 In General Formula (5-1), Y 1 represents a C 3-30 divalent alicyclic hydrocarbon group which may have a substituent. In General Formula (5-2), Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent.
<2> 下記一般式(1’)、下記一般式(2’)及び下記一般式(4’)からなる群より選択される少なくとも1種の芳香族モノマと、下記一般式(5−1’)で表される少なくとも1種のジカルボン酸モノマと、下記一般式(5−2’)で表される少なくとも1種のジカルボン酸モノマとを、酸性媒体中で縮合反応させることで得た芳香族ポリケトン。 <2> At least one aromatic monomer selected from the group consisting of the following general formula (1 ′), the following general formula (2 ′) and the following general formula (4 ′), and the following general formula (5-1 ′) ) And an aromatic obtained by subjecting at least one dicarboxylic acid monomer represented by the following general formula (5-2 ′) to a condensation reaction in an acidic medium. Polyketone.
一般式(1’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (1 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and each R 2 independently represents a hydrogen atom or a substituent. The C1-C30 hydrocarbon group which may have a group is shown.
一般式(2’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、Xは酸素原子又は下記一般式(3’)で表される2価の基を示す。 In General Formula (2 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and X represents an oxygen atom or the following General Formula (3 ′) ) Is a divalent group represented by:
一般式(3’)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (3 ′), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
一般式(4’)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (4 ′), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
一般式(5−1’)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2’)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。 In General Formula (5-1 ′), Y 1 represents a C 3-30 divalent alicyclic hydrocarbon group which may have a substituent. In General Formula (5-2 ′), Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent.
<3> 前記Y1とY2のモル比(Y1:Y2)が、9:1〜3:7である、<1>又は<2>に記載の芳香族ポリケトン。 <3> The aromatic polyketone according to <1> or <2>, wherein the molar ratio of Y 1 and Y 2 (Y 1 : Y 2 ) is 9: 1 to 3: 7.
<4> <1>〜<3>のいずれか1項に記載の芳香族ポリケトンと、溶媒と、を含有する、芳香族ポリケトンワニス。 <4> An aromatic polyketone varnish containing the aromatic polyketone according to any one of <1> to <3> and a solvent.
<5> <1>〜<3>のいずれか1項に記載の芳香族ポリケトンを含有する芳香族ポリケトン膜。 <5> An aromatic polyketone film containing the aromatic polyketone according to any one of <1> to <3>.
<6> <5>に記載の芳香族ポリケトン膜を有する表示素子。 <6> A display element having the aromatic polyketone film according to <5>.
<7> 下記一般式(1’)、下記一般式(2’)及び下記一般式(4’)からなる群より選択される少なくとも1種の芳香族モノマと、下記一般式(5−1’)で表される少なくとも1種のジカルボン酸モノマと、下記一般式(5−2)で表される少なくとも1種のジカルボン酸モノマとを、酸性媒体中で縮合反応させる、芳香族ポリケトンの製造方法。 <7> At least one aromatic monomer selected from the group consisting of the following general formula (1 ′), the following general formula (2 ′) and the following general formula (4 ′), and the following general formula (5-1 ′) ) And at least one dicarboxylic acid monomer represented by the following general formula (5-2) are subjected to a condensation reaction in an acidic medium. .
一般式(1’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (1 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and each R 2 independently represents a hydrogen atom or a substituent. The C1-C30 hydrocarbon group which may have a group is shown.
一般式(2’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、Xは酸素原子又は下記一般式(3’)で表される2価の基を示す。 In General Formula (2 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and X represents an oxygen atom or the following General Formula (3 ′) ) Is a divalent group represented by:
一般式(3’)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (3 ′), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
一般式(4’)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。 In General Formula (4 ′), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
一般式(5−1’)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2’)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。 In General Formula (5-1 ′), Y 1 represents a C 3-30 divalent alicyclic hydrocarbon group which may have a substituent. In General Formula (5-2 ′), Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent.
本発明によれば、優れた耐熱性と透明性を有し、柔軟な膜を形成可能な芳香族ポリケトン、芳香族ポリケトンワニス及び芳香族ポリケトンの製造方法、並びに優れた耐熱性と透明性と柔軟性とを有する芳香族ポリケトン膜を提供することができる。 According to the present invention, the aromatic polyketone, the aromatic polyketone varnish and the aromatic polyketone, which have excellent heat resistance and transparency and capable of forming a flexible film, and excellent heat resistance, transparency and flexibility An aromatic polyketone film having properties can be provided.
以下、本発明について詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。
本明細書において「〜」を用いて示された数値範囲は、「〜」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。
本明細書において「膜」とは、平面図として観察したときに、全面に形成されている形状の構成に加え、一部に形成されている形状の構成も包含される。
本明細書において「工程」とは、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の作用が達成されれば、本用語に含まれる。
本明細書において「透明性」とは、可視光の透過性、少なくとも波長400nmの可視光の透過性が80%以上(膜厚1μm換算)であることを意味する。
本明細書において「耐熱性」とは、芳香族ポリケトンを含有する部材において、加熱によるクラックの発生が抑制されていることを意味する。
本明細書において「柔軟性」とは、芳香族ポリケトン膜についてマンドレル試験を行なったときに、心棒の直径を小さくした場合にクラックの発生が抑制されていることを意味する。
Hereinafter, the present invention will be described in detail. However, the present invention is not limited to the following embodiments.
In the present specification, a numerical range indicated using “to” indicates a range including the numerical values described before and after “to” as the minimum value and the maximum value, respectively.
In the present specification, the “film” includes a configuration formed in a part in addition to a configuration formed over the entire surface when observed as a plan view.
In this specification, the “step” is not limited to an independent step, and is included in the term if the intended action of the step is achieved even when it cannot be clearly distinguished from other steps.
In the present specification, “transparency” means that the transmittance of visible light and the transmittance of visible light having a wavelength of at least 400 nm are 80% or more (in terms of film thickness 1 μm).
In the present specification, “heat resistance” means that the occurrence of cracks due to heating is suppressed in a member containing an aromatic polyketone.
In this specification, “flexibility” means that the occurrence of cracks is suppressed when the mandrel test is performed on the aromatic polyketone film and the diameter of the mandrel is reduced.
<芳香族ポリケトン>
芳香族ポリケトンは、下記一般式(1)、下記一般式(2)及び下記一般式(4)からなる群より選択される少なくとも1種の構造単位と、下記一般式(5−1)で表される少なくとも1種の構造単位と、下記一般式(5−2)で表される少なくとも1種の構造単位と、を有する。この芳香族ポリケトンを、「特定芳香族ポリケトン」とも称する。
<Aromatic polyketone>
The aromatic polyketone is represented by the following general formula (5-1), at least one structural unit selected from the group consisting of the following general formula (1), the following general formula (2), and the following general formula (4). And at least one structural unit represented by the following general formula (5-2). This aromatic polyketone is also referred to as “specific aromatic polyketone”.
特定芳香族ポリケトンが、芳香族モノマに由来する構造単位として、一般式(1)、(2)及び(4)からなる群より選択される少なくとも1種の構造単位を有し、且つジカルボン酸モノマに由来する構造単位として一般式(5−1)で表される少なくとも1種の構造単位と下記一般式(5−2)で表される少なくとも1種の構造単位の両方を有することで、耐熱性、透明性及び柔軟性に優れる芳香族ポリケトン膜を形成することができる。この理由は明らかではないが、以下のように考えることができる。 The specific aromatic polyketone has at least one structural unit selected from the group consisting of the general formulas (1), (2) and (4) as a structural unit derived from an aromatic monomer, and a dicarboxylic acid monomer Having at least one structural unit represented by the general formula (5-1) and at least one structural unit represented by the following general formula (5-2) as a structural unit derived from An aromatic polyketone film having excellent properties, transparency and flexibility can be formed. The reason for this is not clear, but can be considered as follows.
特定芳香族ポリケトンがY1で表される脂環式炭化水素基を有することで、優れた耐熱性と透明性が奏される。また、特定芳香族ポリケトンがY2で表されるアルキレン基を有することで、膜としたときに優れた柔軟性が奏される。 By having an alicyclic hydrocarbon group that certain aromatic polyketones represented by Y 1, are exhibited excellent heat resistance and transparency. Moreover, when the specific aromatic polyketone has an alkylene group represented by Y 2 , excellent flexibility is obtained when a film is formed.
一般式(1)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。尚、波線を付した部分は、結合手を意味する。以降、化学式中の波線については同様である。 In general formula (1), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and R 2 each independently represents a hydrogen atom or a substituent. The C1-C30 hydrocarbon group which may have is shown. In addition, the part which attached | subjected the wavy line means a joint. Hereinafter, the same applies to the wavy line in the chemical formula.
耐熱性の観点から、R1はそれぞれ独立に、炭素数1〜10の炭化水素基であることが好ましく、反応制御の観点から、炭素数1〜5の炭化水素基であることがより好ましい。 From the viewpoint of heat resistance, each R 1 is preferably independently a hydrocarbon group having 1 to 10 carbon atoms, and more preferably a hydrocarbon group having 1 to 5 carbon atoms from the viewpoint of reaction control.
R1における置換基としては、ハロゲン原子、炭素数1〜5のアルコキシ基、炭素数2〜5のアシル基等が挙げられる。尚、炭化水素基が置換基を有する場合、炭化水素基の炭素数には、置換基の炭素数を含めないものとする。以降、同様である。 Examples of the substituent for R 1 include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms. When the hydrocarbon group has a substituent, the carbon number of the hydrocarbon group does not include the carbon number of the substituent. The same applies thereafter.
R1で示される炭化水素基としては、飽和脂肪族炭化水素基、不飽和脂肪族炭化水素基、脂環式炭化水素基等が挙げられる。また、これらの炭化水素基を組み合わせたものでもよい。 Examples of the hydrocarbon group represented by R 1 include a saturated aliphatic hydrocarbon group, an unsaturated aliphatic hydrocarbon group, and an alicyclic hydrocarbon group. Moreover, what combined these hydrocarbon groups may be used.
R1で示される飽和脂肪族炭化水素基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、イソペンチル基、sec−ペンチル基、neo−ペンチル基、t−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基、n−イコサニル基、n−トリアコンタニル基等が挙げられる。 Examples of the saturated aliphatic hydrocarbon group represented by R 1 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, and n-pentyl group. , Isopentyl group, sec-pentyl group, neo-pentyl group, t-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-icosanyl group, n -A triacontanyl group etc. are mentioned.
R1で示される不飽和脂肪族炭化水素基としては、ビニル基、アリル基等のアルケニル基、エチニル基等のアルキニル基などが挙げられる。 Examples of the unsaturated aliphatic hydrocarbon group represented by R 1 include alkenyl groups such as vinyl groups and allyl groups, and alkynyl groups such as ethynyl groups.
R1で示される脂環式炭化水素基としては、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、ノルボルニル基等のシクロアルキル基、シクロヘキセニル基等のシクロアルケニル基などが挙げられる。 Examples of the alicyclic hydrocarbon group represented by R 1 include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cycloalkyl group such as a norbornyl group, and a cycloalkenyl group such as a cyclohexenyl group. Group and the like.
一般式(1)中、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。耐熱性の観点から、R2としては、水素原子又は炭素数1〜5の炭化水素基が好ましい。このような炭化水素基としては、R1で例示したものと同様のものが挙げられる。また、置換基としては、ハロゲン原子、炭素数1〜5のアルコキシ基、炭素数2〜5のアシル基等が挙げられる。 In General Formula (1), each R 2 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. From the viewpoint of heat resistance, R 2 is preferably a hydrogen atom or a hydrocarbon group having 1 to 5 carbon atoms. Examples of such a hydrocarbon group include the same groups as those exemplified for R 1 . Moreover, as a substituent, a halogen atom, a C1-C5 alkoxy group, a C2-C5 acyl group, etc. are mentioned.
一般式(2)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。一般式(2)中のR1の詳細は、一般式(1)中のR1と同様である。 In General Formula (2), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. The general formula (2) R 1 in detail, is the same as R 1 in general formula (1).
一般式(2)中、Xは、酸素原子又は下記一般式(3)で表される2価の基を示す。 In the general formula (2), X represents an oxygen atom or a divalent group represented by the following general formula (3).
一般式(3)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。耐熱性の観点から、R3及びR4としては、それぞれ独立に、炭素数1〜10の炭化水素基であることが好ましく、炭素数1〜5の炭化水素基であることがより好ましい。このような炭化水素基としては、一般式(1)中のR1で例示したものと同様のものが挙げられる。また、置換基としては、ハロゲン原子、炭素数1〜5のアルコキシ基、炭素数2〜5のアシル基等が挙げられる。 In General Formula (3), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. From the viewpoint of heat resistance, R 3 and R 4 are each independently preferably a hydrocarbon group having 1 to 10 carbon atoms, and more preferably a hydrocarbon group having 1 to 5 carbon atoms. As such a hydrocarbon group, the thing similar to what was illustrated by R < 1 > in General formula (1) is mentioned. Moreover, as a substituent, a halogen atom, a C1-C5 alkoxy group, a C2-C5 acyl group, etc. are mentioned.
一般式(4)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。耐熱性の観点から、R5としては、それぞれ独立に、炭素数1〜10の炭化水素基であることが好ましく、炭素数1〜5の炭化水素基であることがより好ましい。このような炭化水素基としては、一般式(1)中のR1で例示したものと同様のものが挙げられる。また、置換基としては、ハロゲン原子、炭素数1〜5のアルコキシ基、炭素数2〜5のアシル基等が挙げられる。 In General Formula (4), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. From the viewpoint of heat resistance, R 5 is preferably each independently a hydrocarbon group having 1 to 10 carbon atoms, and more preferably a hydrocarbon group having 1 to 5 carbon atoms. As such a hydrocarbon group, the thing similar to what was illustrated by R < 1 > in General formula (1) is mentioned. Moreover, as a substituent, a halogen atom, a C1-C5 alkoxy group, a C2-C5 acyl group, etc. are mentioned.
一般式(5−1)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。 In General Formula (5-1), Y 1 represents a C 3-30 divalent alicyclic hydrocarbon group which may have a substituent. In General Formula (5-2), Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent.
Y1で示される脂環式炭化水素基の炭素数は、3〜30であり、耐熱性の観点から、5〜20であることが好ましい。 Y carbon atoms in the alicyclic hydrocarbon group represented by 1, 3 to 30, from the viewpoint of heat resistance, it is preferably from 5 to 20.
Y1で示される脂環式炭化水素基としては、シクロプロパン骨格、シクロブタン骨格、シクロペンタン骨格、シクロヘキサン骨格、シクロヘプタン骨格、シクロオクタン骨格、キュバン骨格、ノルボルナン骨格、トリシクロ[5.2.1.0]デカン骨格、アダマンタン骨格、ジアダマンタン骨格、ビシクロ[2.2.2]オクタン骨格等を有する2価の基が挙げられる。溶解性の観点から、アダマンタン骨格を有する2価の基が好ましい。 Examples of the alicyclic hydrocarbon group represented by Y 1 include a cyclopropane skeleton, a cyclobutane skeleton, a cyclopentane skeleton, a cyclohexane skeleton, a cycloheptane skeleton, a cyclooctane skeleton, a cubane skeleton, a norbornane skeleton, and tricyclo [5.2.1. 0] a divalent group having a decane skeleton, an adamantane skeleton, a diadamantane skeleton, a bicyclo [2.2.2] octane skeleton, or the like. From the viewpoint of solubility, a divalent group having an adamantane skeleton is preferable.
Y2で示されるアルキレン基の炭素数は、1〜30であり、耐熱性及び透明性の観点から、3〜30であることが好ましい。 The alkylene group represented by Y 2 is 1 to 30, in view of heat resistance and transparency, is preferably 3 to 30.
Y2で示されるアルキレン基としては、メチレン基、エチレン基、トリメチレン基、メチルエチレン基、テトラメチレン基、n−メチルトリメチレン基、エチルエチレン基、ジメチルエチレン基、ペンチレン基、n−メチルテトラメチレン基、n−エチルトリメチレン基、n,n−ジメチルトリメチレン基、プロピルエチレン基、エチルメチルエチレン基、ヘキシレン基、n−メチルペンチレン基、n−エチルテトラメチレン基、n−プロピルトリメチレン基、ブチルエチレン基、n,n−ジメチルテトラメチレン基、トリメチルトリメチレン基、n,n−エチルメチルトリメチレン基、ヘプチレン基、オクチレン基、ノニレン基、デシレン基、イコサニレン基、トリアコンタニレン基等が挙げられる。 Examples of the alkylene group represented by Y 2 include methylene group, ethylene group, trimethylene group, methylethylene group, tetramethylene group, n-methyltrimethylene group, ethylethylene group, dimethylethylene group, pentylene group, and n-methyltetramethylene. Group, n-ethyltrimethylene group, n, n-dimethyltrimethylene group, propylethylene group, ethylmethylethylene group, hexylene group, n-methylpentylene group, n-ethyltetramethylene group, n-propyltrimethylene group Butylethylene group, n, n-dimethyltetramethylene group, trimethyltrimethylene group, n, n-ethylmethyltrimethylene group, heptylene group, octylene group, nonylene group, decylene group, icosanylene group, triacontanilene group, etc. Can be mentioned.
Y1とY2のモル比は、求める物性に応じて調整することができる。耐熱性と柔軟性の観点から、Y1とY2のモル比は、Y1:Y2=9:1〜3:7であることが好ましく、Y1:Y2=8:2〜3:7であることが更に好ましい。 The molar ratio of Y 1 and Y 2 can be adjusted according to the desired physical properties. From the viewpoint of heat resistance and flexibility, the molar ratio of Y 1 and Y 2 is preferably Y 1 : Y 2 = 9: 1 to 3: 7, and Y 1 : Y 2 = 8: 2 to 3: 7 is more preferable.
耐熱性の観点からは、芳香族ポリケトンの重量平均分子量(Mw)は、10000以上であることが好ましく、20000以上であることがより好ましい。また、数平均分子量(Mn)は1000以上であることが好ましく、2000以上であることがより好ましい。
溶解性の観点からは、芳香族ポリケトンの重量平均分子量(Mw)は、350000以下であることが好ましく、300000以下であることがより好ましい。また、数平均分子量(Mn)は、200000以下であることが好ましく、100000以下であることがより好ましい。
From the viewpoint of heat resistance, the aromatic polyketone preferably has a weight average molecular weight (Mw) of 10,000 or more, more preferably 20,000 or more. Further, the number average molecular weight (Mn) is preferably 1000 or more, and more preferably 2000 or more.
From the viewpoint of solubility, the weight average molecular weight (Mw) of the aromatic polyketone is preferably 350,000 or less, and more preferably 300,000 or less. The number average molecular weight (Mn) is preferably 200000 or less, and more preferably 100000 or less.
<芳香族ポリケトンの製造方法>
特定芳香族ポリケトンは、上記一般式(1)、(2)及び(4)からなる群より選択される少なくとも1種の構造単位と、上記一般式(5−1)で表される少なくとも1種の構造単位と、上記一般式(5−2)で表される少なくとも1種の構造単位と、を有してさえいれば、製造方法は特に限定されない。例えば、下記一般式(1’)、(2’)及び(4’)からなる群より選択される少なくとも1種の芳香族モノマと、下記一般式(5−1’)で表される少なくとも1種のジカルボン酸モノマと、下記一般式(5−2’)で表される少なくとも1種のジカルボン酸モノマとを、酸性媒体中で縮合反応させて得ることができる。
<Method for producing aromatic polyketone>
The specific aromatic polyketone is at least one structural unit selected from the group consisting of the general formulas (1), (2) and (4), and at least one kind represented by the general formula (5-1). As long as it has at least one kind of structural unit represented by the general formula (5-2), the production method is not particularly limited. For example, at least one aromatic monomer selected from the group consisting of the following general formulas (1 ′), (2 ′) and (4 ′), and at least 1 represented by the following general formula (5-1 ′) A dicarboxylic acid monomer of a kind and at least one dicarboxylic acid monomer represented by the following general formula (5-2 ′) can be obtained by a condensation reaction in an acidic medium.
一般式(1’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。一般式(1’)中のR1及びR2の詳細は、一般式(1)中のR1及びR2とそれぞれ同様である。 In General Formula (1 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and each R 2 independently represents a hydrogen atom or a substituent. The C1-C30 hydrocarbon group which may have a group is shown. The general formula (1 ') of R 1 and R 2 in detail, is the general formula (1) and R 1 and R 2 in the same respectively.
一般式(2’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、Xは酸素原子又は下記一般式(3’)で表される2価の基を示す。一般式(2’)中のR1の詳細は、一般式(2)中のR1と同様である。 In General Formula (2 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and X represents an oxygen atom or the following General Formula (3 ′) ) Is a divalent group represented by: The general formula (2 ') of R 1 in detail, the same as R 1 in the general formula (2).
一般式(3’)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。一般式(3’)中のR3又はR4の詳細は、一般式(3)中のR3又はR4とそれぞれ同様である。 In General Formula (3 ′), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. The more general formula (3 ') in R 3 or R 4, are each similar to the general formula (3) R 3 or R 4 in.
一般式(4’)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。一般式(4’)中のR5の詳細は、一般式(4)中のR5と同様である。 In General Formula (4 ′), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. Details of the general formula (4 ') in R 5, is the same as R 5 in the general formula (4).
一般式(5−1’)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2’)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。一般式(5−1’)中のY1の詳細は、一般式(5−1)中のY1と同様である。一般式(5−2’)中のY2の詳細は、一般式(5−2)中のY2と同様である。 In General Formula (5-1 ′), Y 1 represents a C 3-30 divalent alicyclic hydrocarbon group which may have a substituent. In General Formula (5-2 ′), Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent. The general formula (5-1 ') of Y 1 in detail, the same as Y 1 in the general formula (5-1). The general formula (5-2 ') of Y 2 in detail, the same as Y 2 in the general formula (5-2) in.
一般式(5−1’)で表されるジカルボン酸モノマとしては、1,3−アダマンタンジカルボン酸、1,3−シクロへキサンジカルボン酸、1,4−シクロヘキサンジカルボン酸、2,3−シクロヘキサンジカルボン酸、1,3−ノルボルナンジカルボン酸、1,4−ノルボルナンジカルボン酸、2,3−ノルボルナンジカルボン酸、1,4−デカヒドロナフタレンジカルボン酸、2,3−デカヒドロナフタレンジカルボン酸等が挙げられる。反応性の観点からは、1,3−位、又は2,3−位でカルボキシル基と結合した脂環式カルボン酸が好ましい。
一般式(5−2’)で表されるジカルボン酸モノマとしては、ドデカン二酸、ウンデカン二酸、デカン二酸、ノナン二酸、オクタン二酸、ヘプタン二酸、ノナン二酸、アジピン酸、グルタル酸、コハク酸、マロン酸等が挙げられる。
Examples of the dicarboxylic acid monomer represented by the general formula (5-1 ′) include 1,3-adamantane dicarboxylic acid, 1,3-cyclohexane dicarboxylic acid, 1,4-cyclohexane dicarboxylic acid, and 2,3-cyclohexane dicarboxylic acid. Examples include acid, 1,3-norbornane dicarboxylic acid, 1,4-norbornane dicarboxylic acid, 2,3-norbornane dicarboxylic acid, 1,4-decahydronaphthalenedicarboxylic acid, 2,3-decahydronaphthalenedicarboxylic acid, and the like. From the viewpoint of reactivity, an alicyclic carboxylic acid bonded to a carboxyl group at the 1,3-position or the 2,3-position is preferable.
Examples of the dicarboxylic acid monomer represented by the general formula (5-2 ′) include dodecanedioic acid, undecanedioic acid, decanedioic acid, nonanedioic acid, octanedioic acid, heptanedioic acid, nonanedioic acid, adipic acid, and glutar. An acid, a succinic acid, malonic acid, etc. are mentioned.
一般式(5−1’)で表されるジカルボン酸モノマと一般式(5−2’)で表されるジカルボン酸モノマの仕込む割合を変えることで、縮合反応によって得られる特定芳香族ポリケトン中のY1とY2の比率を調整することができる。 By changing the proportion of the dicarboxylic acid monomer represented by the general formula (5-1 ′) and the dicarboxylic acid monomer represented by the general formula (5-2 ′), in the specific aromatic polyketone obtained by the condensation reaction it is possible to adjust the ratio of Y 1 and Y 2.
縮合反応は酸性媒体中で行う。酸性媒体は特に限定されず、塩化アルミニウムの有機溶媒溶液、トリフルオロアルカンスルホン酸の有機溶媒溶液、ポリリン酸、五酸化二リンと有機スルホン酸との混合物等を用いることができる。反応性と取り扱い性の観点から、酸性媒体としては、五酸化二リンと有機スルホン酸との混合物を用いることが好ましく、更に、有機スルホン酸としてはメタンスルホン酸が好ましい。 The condensation reaction is carried out in an acidic medium. The acidic medium is not particularly limited, and an organic solvent solution of aluminum chloride, an organic solvent solution of trifluoroalkanesulfonic acid, polyphosphoric acid, a mixture of diphosphorus pentoxide and organic sulfonic acid, or the like can be used. From the viewpoint of reactivity and handling, it is preferable to use a mixture of diphosphorus pentoxide and organic sulfonic acid as the acidic medium, and methanesulfonic acid is preferable as the organic sulfonic acid.
五酸化二リンと有機スルホン酸との混合物中で、五酸化二リンが少なすぎると、反応性に劣る傾向にある。五酸化二リンと有機スルホン酸との混合比は、反応の制御性及び促進性の観点から、質量比で五酸化二リン:有機スルホン酸=1:5〜1:20であることが好ましく、1:5〜1:10であることがより好ましい。 In the mixture of diphosphorus pentoxide and organic sulfonic acid, if the amount of diphosphorus pentoxide is too small, the reactivity tends to be poor. The mixing ratio of diphosphorus pentoxide and organic sulfonic acid is preferably diphosphorus pentoxide: organic sulfonic acid = 1: 5 to 1:20 in terms of mass ratio from the viewpoint of controllability and acceleration of the reaction. It is more preferable that it is 1: 5 to 1:10.
縮合反応における五酸化二リンと有機スルホン酸の使用量は、芳香族モノマとジカルボン酸モノマとを溶解し得る量であれば特に限定されず、いわゆる触媒量から溶媒量までの範囲で用いることができる。反応性と扱いやすさの観点から、ジカルボン酸モノマ1質量部に対して、五酸化二リンと有機スルホン酸との混合物を50質量部〜100質量部の範囲で使用することが好ましい。 The amount of diphosphorus pentoxide and organic sulfonic acid used in the condensation reaction is not particularly limited as long as it is an amount capable of dissolving the aromatic monomer and the dicarboxylic acid monomer, and may be used in a range from a so-called catalyst amount to a solvent amount. it can. From the viewpoint of reactivity and ease of handling, it is preferable to use a mixture of diphosphorus pentoxide and organic sulfonic acid in a range of 50 to 100 parts by mass with respect to 1 part by mass of the dicarboxylic acid monomer.
縮合反応の温度は、反応生成物の着色及び副反応を防ぐ観点からは、10℃〜100℃に設定することが好ましく、反応速度を上げて生産性を向上させる観点からは、20℃〜100℃に設定することがより好ましい。 The temperature of the condensation reaction is preferably set to 10 ° C. to 100 ° C. from the viewpoint of preventing coloration and side reaction of the reaction product, and from the viewpoint of increasing the reaction rate and improving the productivity, 20 ° C. to 100 ° C. It is more preferable to set to ° C.
縮合反応の雰囲気は特に限定されず、開放系で行うこともできる。しかし、水分の存在により酸性媒体の反応性が低下するため、乾燥空気、窒素、アルゴン等の雰囲気下で行なうことが好ましい。想定外の副反応を防ぐ観点からは、窒素又はアルゴンの雰囲気下で行なうことが更に好ましい。 The atmosphere of the condensation reaction is not particularly limited, and can be performed in an open system. However, since the reactivity of the acidic medium is reduced due to the presence of moisture, it is preferably carried out in an atmosphere of dry air, nitrogen, argon or the like. From the viewpoint of preventing an unexpected side reaction, it is more preferable to carry out in an atmosphere of nitrogen or argon.
反応液を撹拌することで、縮合反応を促進することができる。撹拌方法は特に限定されず、マグネチックスターラ、メカニカルスターラ等を用いることができる。 The condensation reaction can be promoted by stirring the reaction solution. The stirring method is not particularly limited, and a magnetic stirrer, a mechanical stirrer, or the like can be used.
縮合反応の反応時間は、反応温度、目標とする特定芳香族ポリケトンの分子量、反応に用いるモノマの種類等によって適宜設定することが好ましい。十分に分子量の高いポリケトンを得る観点からは、反応時間は1時間〜120時間とすることが好ましく、生産性の観点からは、1時間〜72時間とすることがより好ましい。 The reaction time of the condensation reaction is preferably set as appropriate depending on the reaction temperature, the molecular weight of the target specific aromatic polyketone, the type of monomer used in the reaction, and the like. From the viewpoint of obtaining a polyketone having a sufficiently high molecular weight, the reaction time is preferably 1 hour to 120 hours, and more preferably 1 hour to 72 hours from the viewpoint of productivity.
縮合反応での反応系の圧力は特に限定されず、常圧下、加圧下、又は減圧下のいずれで行ってもよい。コストの観点から、常圧下で縮合反応を行うことが好ましい。 The pressure of the reaction system in the condensation reaction is not particularly limited, and the reaction may be performed under normal pressure, increased pressure, or reduced pressure. From the viewpoint of cost, it is preferable to perform the condensation reaction under normal pressure.
芳香族モノマとジカルボン酸モノマとの縮合反応を終えた後、特定芳香族ポリケトンを含有する液(例えば、縮合反応液、又は特定芳香族ポリケトンを溶解した溶液)と貧溶媒とを接触させて特定芳香族ポリケトンを析出させ、不純物を貧溶媒層に抽出し、析出した特定芳香族ポリケトンを濾過、デカンテーション、遠心分離等の方法で液体から分離する。更にこの後、分離した特定芳香族ポリケトンを再度、良溶媒に溶解させ、再び貧溶媒と接触させて特定芳香族ポリケトンを析出させ、不純物を貧溶媒層に抽出し、析出した特定芳香族ポリケトンを濾過、デカンテーション、遠心分離等の方法で液体から分離してもよい。この操作を繰り返すことで、特定芳香族ポリケトンから不純物をより十分に取り除くことができる。 After the condensation reaction between the aromatic monomer and the dicarboxylic acid monomer is completed, the liquid containing the specific aromatic polyketone (for example, the condensation reaction liquid or the solution in which the specific aromatic polyketone is dissolved) is contacted with the poor solvent and specified. Aromatic polyketone is precipitated, impurities are extracted into the poor solvent layer, and the deposited specific aromatic polyketone is separated from the liquid by a method such as filtration, decantation, and centrifugation. Thereafter, the separated specific aromatic polyketone is dissolved again in a good solvent, and again contacted with a poor solvent to precipitate the specific aromatic polyketone, and impurities are extracted into the poor solvent layer. You may isolate | separate from a liquid by methods, such as filtration, a decantation, and centrifugation. By repeating this operation, impurities can be more sufficiently removed from the specific aromatic polyketone.
本明細書において「貧溶媒」とは、芳香族ポリケトンに対して貧溶媒であることを意味し、具体的には、溶媒100g中に芳香族ポリケトンが0.01g以下しか溶解しない溶媒を意味する。そして、「良溶媒」とは、芳香族ポリケトンに対して良溶媒であることを意味し、具体的には、溶媒100g中に芳香族ポリケトンが1g以上溶解する溶媒を意味する。 In the present specification, the “poor solvent” means a poor solvent for the aromatic polyketone, and specifically means a solvent in which the aromatic polyketone dissolves in an amount of 0.01 g or less in 100 g of the solvent. . The “good solvent” means that it is a good solvent for the aromatic polyketone, and specifically means a solvent in which 1 g or more of the aromatic polyketone is dissolved in 100 g of the solvent.
特定芳香族ポリケトンは、透明性、耐熱性及び柔軟性に優れる芳香族ポリケトン膜を得ることができ、フレキシブルな透明耐熱材として用いることができる。 The specific aromatic polyketone can obtain an aromatic polyketone film excellent in transparency, heat resistance and flexibility, and can be used as a flexible transparent heat-resistant material.
<芳香族ポリケトンワニス>
芳香族ポリケトンワニスは、特定芳香族ポリケトンと、溶媒と、を含有する。芳香族ポリケトンワニスは、特定芳香族ポリケトンを溶媒に溶解させる等により得ることができる。特定芳香族ポリケトンを溶媒に溶解させる方法は特に限定されず、当該技術分野で既知の方法を用いることができる。また、必要に応じて、溶解後に、不溶成分を濾別してもよい。
<Aromatic polyketone varnish>
The aromatic polyketone varnish contains a specific aromatic polyketone and a solvent. The aromatic polyketone varnish can be obtained by dissolving a specific aromatic polyketone in a solvent. A method for dissolving the specific aromatic polyketone in the solvent is not particularly limited, and a method known in the art can be used. Moreover, you may filter an insoluble component after melt | dissolution as needed.
ワニスに含有される溶媒は、特定芳香族ポリケトンを溶解するものであれば特に制限されない。溶媒の例としては、γ−ブチロラクトン、乳酸エチル、プロピレングリコールモノメチルエーテルアセテート、酢酸ブチル、酢酸ベンジル、エトキシエチルプロピオネート、3−メチルメトキシプロピオネート、N−メチル−2−ピロリドン、N−シクロヘキシル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド、ヘキサメチルホスホリルアミド、テトラメチレンスルホン、ジエチルケトン、ジイソブチルケトン、メチルアミルケトン、シクロヘキサノン、プロピレングリコールモノメチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、ジプロピレングリコールモノメチルエーテル、キシレン、メシチレン、エチルベンゼン、プロピルベンゼン、クメン、ジイソプロピルベンゼン、ヘキシルベンゼン、アニソール、ジグライム、ジメチルスルホキシド、クロロホルム、ジクロロメタン、ジクロロエタン、クロロベンゼン、テトラヒドロフラン等が挙げられる。これらの溶媒は1種単独で又は2種以上を組み合わせて用いることができる。 The solvent contained in the varnish is not particularly limited as long as it dissolves the specific aromatic polyketone. Examples of solvents include γ-butyrolactone, ethyl lactate, propylene glycol monomethyl ether acetate, butyl acetate, benzyl acetate, ethoxyethyl propionate, 3-methylmethoxypropionate, N-methyl-2-pyrrolidone, N-cyclohexyl -2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, hexamethylphosphorylamide, tetramethylene sulfone, diethyl ketone, diisobutyl ketone, methyl amyl ketone, cyclohexanone, propylene glycol monomethyl ether, propylene glycol Monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, xylene, mesitylene, ethylbenzene, Ropirubenzen, cumene, diisopropylbenzene, hexyl benzene, anisole, diglyme, dimethyl sulfoxide, chloroform, dichloromethane, dichloroethane, chlorobenzene and tetrahydrofuran. These solvents can be used alone or in combination of two or more.
芳香族ポリケトンワニスは、特定芳香族ポリケトン及び溶媒以外に、添加剤等を更に含んでいてもよい。添加剤としては、接着助剤、界面活性剤、レベリング剤、酸化防止剤、紫外線劣化防止剤等が挙げられる。 The aromatic polyketone varnish may further contain additives and the like in addition to the specific aromatic polyketone and the solvent. Examples of the additive include an adhesion assistant, a surfactant, a leveling agent, an antioxidant, and an ultraviolet deterioration preventing agent.
<芳香族ポリケトン膜>
芳香族ポリケトン膜は、特定芳香族ポリケトンを含有する。芳香族ポリケトン膜は、芳香族ポリケトンワニスを用いて形成することができる。芳香族ポリケトン膜は、原料として脂環式ジカルボン酸及び2,2’−ジアルコキシビフェニル化合物以外のものを用いずに重合される従来の芳香族ポリケトンを含有する芳香族ポリケトン膜よりも柔軟である。
<Aromatic polyketone membrane>
The aromatic polyketone film contains a specific aromatic polyketone. The aromatic polyketone film can be formed using an aromatic polyketone varnish. Aromatic polyketone membranes are more flexible than aromatic polyketone membranes containing conventional aromatic polyketones that are polymerized without using anything other than alicyclic dicarboxylic acids and 2,2′-dialkoxybiphenyl compounds as raw materials .
特定芳香族ポリケトン膜の製造方法は、特に限定されない。例えば、以下の方法によって得ることができる。
本実施形態の芳香族ポリケトンワニスを基材の表面の少なくとも一部に付与してワニス層を形成する。ワニスを付与する方法としては、ワニス層を基材上の任意の場所に任意の形状で形成可能な手法であれば特に限定されない。例えば、付与方法としては、浸漬塗布法、スプレー塗布法、スクリーン印刷法、回転塗布法等が好適に用いられる。
The method for producing the specific aromatic polyketone film is not particularly limited. For example, it can be obtained by the following method.
The aromatic polyketone varnish of this embodiment is applied to at least a part of the surface of the substrate to form a varnish layer. The method for applying the varnish is not particularly limited as long as the varnish layer can be formed in an arbitrary shape on an arbitrary place on the substrate. For example, as the application method, a dip coating method, a spray coating method, a screen printing method, a spin coating method or the like is preferably used.
芳香族ポリケトンワニスを付与する基材は特に限定されず、ガラス基材、半導体基材、金属酸化物絶縁体基材(例えば、酸化チタン基材及び酸化ケイ素基材)、窒化ケイ素基材、トリアセチルセルロース、透明ポリイミド、ポリカーボネート、アクリル系ポリマー、シクロオレフィン樹脂等の透明樹脂基材などを例示することができる。基板の形状は特に限定されず、板状又はフィルム状であってもよい。 The base material to which the aromatic polyketone varnish is applied is not particularly limited, and a glass base material, a semiconductor base material, a metal oxide insulator base material (for example, a titanium oxide base material and a silicon oxide base material), a silicon nitride base material, Examples thereof include transparent resin base materials such as acetyl cellulose, transparent polyimide, polycarbonate, acrylic polymer, and cycloolefin resin. The shape of the substrate is not particularly limited, and may be a plate shape or a film shape.
ワニス層を形成した後、乾燥工程においてワニス層を乾燥させる。乾燥する方法は特に限定されず、例えば、ホットプレート、オーブン等を用いた加熱により乾燥することができる。必要に応じて、乾燥した芳香族ポリケトン膜を、基板から剥がして用いることもできる。 After forming the varnish layer, the varnish layer is dried in a drying step. The drying method is not particularly limited, and for example, the drying can be performed by heating using a hot plate, an oven, or the like. If necessary, the dried aromatic polyketone film can be peeled off from the substrate.
また、必要に応じて、乾燥した芳香族ポリケトン膜を更に熱処理してもよい。熱処理の方法は特に限定されず、例えば、箱型乾燥機、熱風式コンベアー型乾燥機、石英チューブ炉、ホットプレート、ラピッドサーマルアニール、縦型拡散炉、赤外線硬化炉、マイクロ波硬化炉等のオーブンを用いて行なうことができる。また、熱処理工程における雰囲気条件としては、大気、又は窒素等の不活性ガスのいずれであってもよい。 Moreover, you may heat-process the dried aromatic polyketone film | membrane further as needed. The heat treatment method is not particularly limited. For example, ovens such as box dryers, hot air conveyor dryers, quartz tube furnaces, hot plates, rapid thermal annealing, vertical diffusion furnaces, infrared curing furnaces, microwave curing furnaces, etc. Can be used. Moreover, as atmospheric conditions in a heat treatment process, either air | atmosphere or inert gas, such as nitrogen, may be sufficient.
<表示素子>
表示素子は、本実施形態の芳香族ポリケトン膜を有する。
表示装置は、例えば、芳香族ポリケトン膜を、粘着剤、接着剤等を介してLCD(液晶ディスプレイ)、ELD(エレクトロルミネッセンスディスプレイ)等の構成部材に貼り合せて、得ることができる。芳香族ポリケトン膜を貼り付ける構成部材としては、偏光板等の各種光学素子等が挙げられる。
<Display element>
The display element has the aromatic polyketone film of this embodiment.
The display device can be obtained, for example, by attaching an aromatic polyketone film to a constituent member such as an LCD (liquid crystal display) or an ELD (electroluminescence display) via an adhesive, an adhesive, or the like. Examples of the constituent member to which the aromatic polyketone film is attached include various optical elements such as a polarizing plate.
本実施形態の表示装置は、芳香族ポリケトン膜を有すること以外は、従来の表示装置と同様の構成であってもよい。例えば、表示装置が液晶表示装置である場合は、液晶セル、偏光板等の光学素子、及び必要に応じ照明システム(バックライト等)などの各構成部材を常法により組み立てて、駆動回路を組み込むこと等により製造できる。液晶セルとしては、特に制限されず、TN型、STN型、π型等の様々なタイプを使用できる。 The display device of this embodiment may have the same configuration as that of a conventional display device except that the display device has an aromatic polyketone film. For example, when the display device is a liquid crystal display device, a liquid crystal cell, an optical element such as a polarizing plate, and various components such as a lighting system (backlight etc.) are assembled by a conventional method and a drive circuit is incorporated. It can manufacture by. The liquid crystal cell is not particularly limited, and various types such as a TN type, an STN type, and a π type can be used.
表示装置は、任意の適切な用途に使用される。その用途は、例えば、デスクトップパソコン、ノートパソコン、コピー機等のOA機器、携帯電話、時計、デジタルカメラ、携帯情報端末(PDA)、携帯ゲーム機等の携帯機器、ビデオカメラ、テレビ、電子レンジ等の家庭用電気機器、バックモニター、カーナビゲーションシステム用モニター、カーオーディオ等の車載用機器、商業店舗用インフォメーション用モニター等の展示機器、監視用モニター等の警備機器、介護用モニター等の介護機器、医療用モニター等の医療機器などが挙げられる。 The display device is used for any suitable application. Applications include, for example, OA equipment such as desktop personal computers, notebook personal computers, and copiers, mobile phones, watches, digital cameras, personal digital assistants (PDAs), portable devices such as portable game machines, video cameras, televisions, microwave ovens, etc. Household electrical equipment, back monitors, car navigation system monitors, in-car equipment such as car audio, display equipment such as information monitors for commercial stores, security equipment such as monitoring monitors, nursing equipment such as nursing monitors, Examples thereof include medical equipment such as a medical monitor.
以下、実施例を挙げて本発明を更に具体的に説明する。ただし、本発明は、その要旨を逸脱しない限り、これら実施例に限定されるものではない。尚、特に断りのない限り、「部」及び「%」は質量基準である。 Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to these examples without departing from the gist thereof. Unless otherwise specified, “part” and “%” are based on mass.
(実施例1)ポリケトンPK1の合成
モノマとして、2,2’−ジメトキシビフェニル10mmolと1,3−アダマンタンジカルボン酸5mmolとドデカン二酸5mmolが入ったフラスコに、五酸化二リンとメタンスルホン酸の混合液物(質量比1:10)を30ml加え、窒素風船をつけて60℃で40時間撹拌した。反応後、反応液をメタノール500ml中に投じ、生成した析出物を濾取した。得られた固体を蒸留水とメタノールで洗浄した後、乾燥し、ポリケトンPK1を得た。得られたポリケトンPK1の13C−NMRスペクトルを図1に示す。また、重量平均分子量は30,000、数平均分子量は5,000であった。
(Example 1) Synthesis of polyketone PK1 As a monomer, a mixture of 2,2'-dimethoxybiphenyl 10 mmol, 1,3-adamantane dicarboxylic acid 5 mmol and dodecanedioic acid 5 mmol was mixed with diphosphorus pentoxide and methanesulfonic acid. 30 ml of a liquid (mass ratio 1:10) was added, and a nitrogen balloon was attached, followed by stirring at 60 ° C. for 40 hours. After the reaction, the reaction solution was poured into 500 ml of methanol, and the produced precipitate was collected by filtration. The obtained solid was washed with distilled water and methanol and then dried to obtain polyketone PK1. A 13 C-NMR spectrum of the resulting polyketone PK1 is shown in FIG. Moreover, the weight average molecular weight was 30,000 and the number average molecular weight was 5,000.
(実施例2)ポリケトンPK2の合成
モノマとして、2,2’−ジメトキシビフェニル10mmolと1,3−アダマンタンジカルボン酸7.5mmolとドデカン二酸2.5mmolを用いた以外は実施例1と同様にして、ポリケトンPK2を得た。得られたポリケトンPK2の13C−NMRを図2に示す。また、重量平均分子量は180,000、数平均分子量は3,000であった。
(Example 2) Synthesis of polyketone PK2 As Example 1, except that 10 mmol of 2,2'-dimethoxybiphenyl, 7.5 mmol of 1,3-adamantane dicarboxylic acid and 2.5 mmol of dodecanedioic acid were used as monomers. Polyketone PK2 was obtained. The 13 C-NMR of the resulting polyketone PK2 is shown in FIG. Moreover, the weight average molecular weight was 180,000 and the number average molecular weight was 3,000.
(実施例3)ポリケトンPK3の合成
モノマとして、2,2’−ジメトキシビフェニル10mmolと1,3−アダマンタンジカルボン酸9.0mmolとドデカン二酸1.0mmolを用いた以外は実施例1と同様にして、ポリケトンPK3を得た。得られたポリケトンPK3の13C−NMRを図3に示す。また、重量平均分子量は250,000、数平均分子量は5,000であった。
(Example 3) Synthesis of polyketone PK3 As Example 1, except that 10 mmol of 2,2'-dimethoxybiphenyl, 9.0 mmol of 1,3-adamantane dicarboxylic acid and 1.0 mmol of dodecanedioic acid were used as monomers. Polyketone PK3 was obtained. The 13 C-NMR of the resulting polyketone PK3 is shown in FIG. Moreover, the weight average molecular weight was 250,000 and the number average molecular weight was 5,000.
(実施例4)ポリケトンPK1を含有するワニス
実施例1で得たポリケトンPK1を、N−メチル−2−ピロリドン(NMP)に濃度が20%となるように溶解し、ポリテトラフルオロエチレン製のメンブレンフィルター(孔径5μm)で濾過して、ポリケトンPK1のワニスを得た。
(Example 4) Varnish containing polyketone PK1 The polyketone PK1 obtained in Example 1 was dissolved in N-methyl-2-pyrrolidone (NMP) to a concentration of 20%, and a membrane made of polytetrafluoroethylene Filtration through a filter (pore size: 5 μm) gave a varnish of polyketone PK1.
(実施例5)ポリケトンPK2を含有するワニス
ポリケトンPK1の代わりにポリケトンPK2を用いた以外は実施例4と同様にして、ポリケトンPK2のワニスを得た。
(Example 5) Varnish containing polyketone PK2 A varnish of polyketone PK2 was obtained in the same manner as in Example 4 except that polyketone PK2 was used instead of polyketone PK1.
(実施例6)ポリケトンPK3を含有するワニス
ポリケトンPK1の代わりにポリケトンPK3を用いた以外は実施例4と同様にして、ポリケトンPK3のワニスを得た。
(Example 6) Varnish containing polyketone PK3 A varnish of polyketone PK3 was obtained in the same manner as in Example 4 except that polyketone PK3 was used instead of polyketone PK1.
(実施例7)ポリケトンPK1を含有する膜
実施例4で得られたポリケトンPK1のワニスを、バーコート法によりガラス基板上及びカプトンフィルム上にそれぞれ塗布し、120℃に加熱したホットプレート上で3分間乾燥して、ポリケトンPK1の膜付きガラス基板及びポリケトンPK1の膜付きカプトンフィルム(以降、これらを総称して「膜付き基板」ともいう)を得た。得られた膜付き基板について、透明性、耐熱性、及び柔軟性(耐屈曲性)を、後述の手法で評価した。
(Example 7) Film containing polyketone PK1 The varnish of polyketone PK1 obtained in Example 4 was applied on a glass substrate and a Kapton film by a bar coating method, and heated on a hot plate heated to 120 ° C. After drying for a minute, a glass substrate with a film of polyketone PK1 and a Kapton film with a film of polyketone PK1 (hereinafter collectively referred to as “substrate with film”) were obtained. About the obtained board | substrate with a film | membrane, transparency, heat resistance, and a softness | flexibility (flexibility) were evaluated by the below-mentioned method.
(実施例8)ポリケトンPK2を含有する膜
ポリケトンPK1のワニスの代わりに、実施例5で得られたポリケトンPK2のワニスを用いた以外は実施例7と同様にして、ポリケトンPK2の膜付き基板を得て、評価を行った。
(Example 8) Film containing polyketone PK2 A substrate with a film of polyketone PK2 was prepared in the same manner as in Example 7 except that the varnish of polyketone PK2 obtained in Example 5 was used instead of the varnish of polyketone PK1. Obtained and evaluated.
(実施例9)ポリケトンPK3を含有する膜
ポリケトンPK1のワニスの代わりに、実施例6で得られたポリケトンPK3のワニスを用いた以外は実施例7と同様にして、ポリケトンPK3の膜付き基板を得て、評価を行った。
(Example 9) Film containing polyketone PK3 A substrate with a film of polyketone PK3 was prepared in the same manner as in Example 7 except that the varnish of polyketone PK3 obtained in Example 6 was used instead of the varnish of polyketone PK1. Obtained and evaluated.
(比較合成例)ポリケトンPK4の合成
モノマとして、2,2’−ジメトキシビフェニル10mmolと1,3−アダマンタンジカルボン酸10mmolを用いるように変更した以外は実施例1と同様にして、ポリケトンPK4を得た。得られたポリケトンPK4の重量平均分子量は60,000、数平均分子量は4,000であった。
(Comparative Synthesis Example) Synthesis of Polyketone PK4 Polyketone PK4 was obtained in the same manner as in Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl and 10 mmol of 1,3-adamantanedicarboxylic acid were used as monomers. . The resulting polyketone PK4 had a weight average molecular weight of 60,000 and a number average molecular weight of 4,000.
(比較製造例)ポリケトンPK4を用いたワニス
ポリケトンPK1の代わりにポリケトンPK4を用いた以外は実施例4と同様にして、ポリケトンPK4を含有するワニスを得た。
(Comparative Production Example) Varnish Using Polyketone PK4 A varnish containing polyketone PK4 was obtained in the same manner as in Example 4 except that polyketone PK4 was used instead of polyketone PK1.
(比較例)ポリケトンPK4のワニスを用いた膜
ポリケトンPK1のワニスの代わりにポリケトンPK4のワニスを用いた以外は実施例7と同様にして、ポリケトンPK4の膜付き基板を得て、評価を行った。
(Comparative Example) Film Using Polyketone PK4 Varnish A polyketone PK4 film-coated substrate was obtained and evaluated in the same manner as in Example 7 except that the polyketone PK4 varnish was used instead of the polyketone PK1 varnish. .
(分子量の測定)
分子量は、溶離液として、硝酸テトラブチルアンモニウム(TBA・NO3)を0.1%溶解させたテトラヒドロフラン(THF)を用いて、ガスパーミエーションクロマトグラフィー(GPC)法によって測定し、標準ポリスチレン換算にて求めた。詳細は次のとおりである。
(Measurement of molecular weight)
The molecular weight was measured by gas permeation chromatography (GPC) method using tetrahydrofuran (THF) in which 0.1% of tetrabutylammonium nitrate (TBA · NO 3 ) was dissolved as an eluent, and converted to standard polystyrene. Asked. Details are as follows.
・装置名:RI−8020(検出器)、DP−8020(ポンプ)、SD−8022(デガッサ)(東ソー株式会社)
・カラム:Gelpack GL−A150、GL−A160、GL−A170(製品名、日立化成株式会社)
・検出器:RI検出器
・溶離液:硝酸テトラブチルアンモニウム(TBA・NO3)を0.1質量%溶解させたテトラヒドロフラン(THF)
・流速:1ml/min
-Device names: RI-8020 (detector), DP-8020 (pump), SD-8022 (degasser) (Tosoh Corporation)
Column: Gelpack GL-A150, GL-A160, GL-A170 (product name, Hitachi Chemical Co., Ltd.)
Detector: RI detector Eluent: Tetrabutylammonium nitrate (TBA / NO 3 ) 0.1% by mass tetrahydrofuran (THF)
・ Flow rate: 1 ml / min
(透明性の評価)
実施例7〜9又は比較例で得たポリケトン膜付きガラス基板の400nmにおける紫外光の透過率を、紫外可視吸収スペクトル法によって測定した。測定には、紫外可視分光光度計(「U−3310Spectrophotometer」日立ハイテク株式会社)を用いた。ポリケトン膜の付いていないガラス基板をリファレンスとして、膜厚1μmに換算した透過率を表1に示す。
(Evaluation of transparency)
The ultraviolet light transmittance at 400 nm of the glass substrate with the polyketone film obtained in Examples 7 to 9 or Comparative Example was measured by an ultraviolet-visible absorption spectrum method. An ultraviolet-visible spectrophotometer (“U-3310 Spectrophotometer”, Hitachi High-Tech Co., Ltd.) was used for the measurement. Table 1 shows the transmittance in terms of a film thickness of 1 μm, using a glass substrate without a polyketone film as a reference.
(耐熱性の評価)
実施例7〜9又は比較例で得たポリケトン膜付きガラス基板を200℃のオーブンに24時間静置して加熱し、400nmにおける紫外光の透過率を、紫外可視吸収スペクトル法によって測定した。測定には、紫外可視分光光度計(「U−3310Spectrophotometer」日立ハイテク株式会社)を用いた。また、加熱後のポリケトン膜のクラックの有無を目視で確認した。ポリケトン膜の付いていないガラス基板をリファレンスとして、膜厚1μmに換算した透過率と、膜のクラックの有無を表1に示す。
(Evaluation of heat resistance)
The glass substrate with a polyketone film obtained in Examples 7 to 9 or Comparative Example was left standing in an oven at 200 ° C. for 24 hours and heated, and the transmittance of ultraviolet light at 400 nm was measured by an ultraviolet-visible absorption spectrum method. An ultraviolet-visible spectrophotometer (“U-3310 Spectrophotometer”, Hitachi High-Tech Co., Ltd.) was used for the measurement. Moreover, the presence or absence of the crack of the polyketone film | membrane after a heating was confirmed visually. Table 1 shows the transmittance converted to a film thickness of 1 μm and the presence or absence of cracks in the film, using a glass substrate without a polyketone film as a reference.
(柔軟性の評価)
実施例7〜9又は比較例で得たポリケトン膜付きカプトンフィルムを、マンドレル試験(円筒形マンドレル法)により評価した。試験はJIS K5600−5−1:1999に従って行った。心棒直径は25mmから3mmまで変え、クラックの発生有無を目視で確認した。クラックの発生しない心棒の最小直径を表1に示す。
(Evaluation of flexibility)
The Kapton film with a polyketone film obtained in Examples 7 to 9 or Comparative Example was evaluated by a mandrel test (cylindrical mandrel method). The test was conducted according to JIS K5600-5-1: 1999. The mandrel diameter was changed from 25 mm to 3 mm, and the presence or absence of cracks was confirmed visually. Table 1 shows the minimum diameter of the mandrel that does not crack.
表1に示すとおり、特定芳香族ポリケトンは、従来の芳香族ポリケトンと同等の透過率及び耐熱性を発揮し、更に耐屈曲性に優れる。 As shown in Table 1, the specific aromatic polyketone exhibits the same transmittance and heat resistance as the conventional aromatic polyketone, and is further excellent in bending resistance.
Claims (7)
(一般式(1)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(2)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、Xは酸素原子又は下記一般式(3)で表される2価の基を示す。)
(一般式(3)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(4)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(5−1)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。) At least one structural unit selected from the group consisting of the following general formula (1), the following general formula (2) and the following general formula (4), and at least one type represented by the following general formula (5-1) An aromatic polyketone having the following structural unit and at least one structural unit represented by the following general formula (5-2).
(In General Formula (1), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and each R 2 independently represents a hydrogen atom or a substituent. (The C1-C30 hydrocarbon group which may have a group is shown.)
(In General Formula (2), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and X represents an oxygen atom or the following General Formula (3). A divalent group represented by:
(In General Formula (3), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.)
(In General Formula (4), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.)
(In General Formula (5-1), Y 1 represents a divalent alicyclic hydrocarbon group having 3 to 30 carbon atoms which may have a substituent. In General Formula (5-2), Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent.
(一般式(1’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(2’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、Xは酸素原子又は下記一般式(3’)で表される2価の基を示す。)
(一般式(3’)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(4’)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(5−1’)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2’)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。) The following general formula (1 ′), at least one aromatic monomer selected from the group consisting of the following general formula (2 ′) and the following general formula (4 ′), and the following general formula (5-1 ′) An aromatic polyketone obtained by subjecting at least one dicarboxylic acid monomer to be condensed with at least one dicarboxylic acid monomer represented by the following general formula (5-2 ′) in an acidic medium.
(In General Formula (1 ′), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents a hydrogen atom or (The C1-C30 hydrocarbon group which may have a substituent is shown.)
(In the general formula (2 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and X represents an oxygen atom or the following general formula (3 ') Represents a divalent group represented by
(In general formula (3 ′), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.)
(In General Formula (4 ′), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.)
(In General Formula (5-1 ′), Y 1 represents an optionally substituted divalent alicyclic hydrocarbon group having 3 to 30 carbon atoms. General Formula (5-2 ′) Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent.
(一般式(1’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、R2はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(2’)中、R1はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示し、Xは酸素原子又は下記一般式(3’)で表される2価の基を示す。)
(一般式(3’)中、R3及びR4はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(4’)中、R5はそれぞれ独立に、水素原子又は置換基を有していてもよい炭素数1〜30の炭化水素基を示す。)
(一般式(5−1’)中、Y1は、置換基を有していてもよい炭素数3〜30の2価の脂環式炭化水素基を示す。一般式(5−2’)中、Y2は、置換基を有していてもよい炭素数1〜30の直鎖状又は分岐鎖状アルキレン基を示す。) The following general formula (1 ′), at least one aromatic monomer selected from the group consisting of the following general formula (2 ′) and the following general formula (4 ′), and the following general formula (5-1 ′) A method for producing an aromatic polyketone, comprising subjecting at least one dicarboxylic acid monomer to be condensed with at least one dicarboxylic acid monomer represented by the following general formula (5-2) in an acidic medium.
(In General Formula (1 ′), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents a hydrogen atom or (The C1-C30 hydrocarbon group which may have a substituent is shown.)
(In the general formula (2 ′), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and X represents an oxygen atom or the following general formula (3 ') Represents a divalent group represented by
(In general formula (3 ′), R 3 and R 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.)
(In General Formula (4 ′), each R 5 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.)
(In General Formula (5-1 ′), Y 1 represents an optionally substituted divalent alicyclic hydrocarbon group having 3 to 30 carbon atoms. General Formula (5-2 ′) Y 2 represents a linear or branched alkylene group having 1 to 30 carbon atoms which may have a substituent.
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