JP2017127267A - Hydroponic method and hydroponic apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a hydroponic method and hydroponic apparatus capable of promoting the growth of a plant or fungi.SOLUTION: According to the present invention, a hydroponic apparatus for culturing a plant or fungi by supplying a nutrient solution to a culture medium comprises: a culture medium containing a substrate made of a dielectric substance and a plant or fungi to be cultivated; a culture solution-supplying tube for supplying the nutrient solution to the culture medium, a nutrient solution-discharging pipe for discharging the nutrient solution from the culture medium, and a plasma-generating device for generating plasma that stimulates the plant or fungi in the culture medium. The plasma-generating device generates plasma in a state that the nutrient solution is being discharged from the culture medium.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a method for producing plants or fungi by hydroponics (a hydroponic cultivation method) and a hydroponic cultivation apparatus, and more particularly to a hydroponic cultivation method and a hydroponic cultivation apparatus for mushrooms.

  Mushroom cultivation methods can be broadly classified into "raw wood cultivation" and "fungus bed cultivation" depending on the cultivation substrate on which mushrooms are grown. Raw wood cultivation is a method in which a tree itself (hoda tree) in which mushrooms occur in a natural state is used as a cultivation substrate. Bacterial bed cultivation is a method of using a mixture (medium) of woody base materials such as sawdust and chips, nutrients, additives, water and the like as a cultivation substrate, and is performed by cultivation of wood-rotting fungi. In Japan, fungus bed cultivation is the mainstream.

  Mycelium cultivation is a medium adjustment process in which medium materials are mixed and stirred, an inoculation culture process in which seeded bacteria are inoculated into the adjusted medium (bacterial bed) and cultured until the mycelium spreads throughout the mycelium, and the mycelium is spread It consists of a generation process in which the inoculum is removed (fungi mushroom), the fruit body (mushroom umbrella) is promoted (emergence), the fruit body is grown and harvested. It is necessary to change environmental conditions such as temperature, humidity, oxygen concentration, carbon dioxide concentration, and light intensity in order to promote the formation of primordial bodies and growth of primordial bodies.

  By the way, in recent years, high-quality saws suitable for mushroom cultivation, especially hardwood saws, have been in short supply, and there is a need to supply medium materials that can replace woody materials. For this reason, instead of using a wooden base material, a non-wood base material such as resin or glass beads is used, and a fungus bed (medium) to which liquid fertilizer (nutrient solution) such as rice bran extract is added is used to cultivate mushrooms. (For example, refer to Patent Document 1).

  In addition, a method for promoting plant growth by stimulating the plant with high voltage or discharge plasma is known. For example, when a pulse voltage is applied to a mycelium of a mushroom, the mycelium is damaged such as rupture. This damage causes irritation to the mycelium and causes the formation of a primordium. For this reason, it is known that the formation of fruit bodies can be promoted by applying a pulse voltage to a hoda tree or fungus bed in which mycelia are sufficiently grown (see Non-Patent Document 1).

JP2015-33349A

Koichi Takagi, “Application of High Voltage / Plasma Technology to Agriculture / Food Field”, Heat Transfer, Japan Society of Heat Transfer, July 2012, Vol. 51, No. 216, p. 64-69

  However, when a pulse voltage is applied to the culture medium, there is a problem that a high voltage cannot be efficiently applied to the mycelium of plants and mushrooms because the nutrient solution has conductivity.

  The present invention is to provide a hydroponic cultivation method and a hydroponic cultivation apparatus that can promote the growth of plants or fungi in the hydroponic cultivation in which a nutrient solution is supplied to a medium to grow plants or fungi. .

In order to solve the above problems, the first aspect of the present invention is a nutrient solution cultivation apparatus for cultivating plants or fungi by supplying a nutrient solution to a medium,
A medium comprising a dielectric substrate and a plant or fungus to be cultivated;
A nutrient solution supply pipe for supplying a nutrient solution to the medium;
A nutrient solution discharge pipe for discharging the nutrient solution from the medium;
A plasma generator for generating plasma that stimulates plants or fungi in the medium;
With
The plasma generating apparatus generates plasma in a state where a nutrient solution is discharged from the culture medium.

The plasma generating apparatus includes:
A first electrode;
A second electrode disposed with the culture medium between the first electrode,
A voltage device for applying a voltage between the first electrode and the second electrode;
With
The base material is granular, and is disposed between the first electrode and the second electrode so that a gap is generated between the base materials,
The voltage device preferably generates plasma in the gap between the base materials by applying a voltage between the first electrode and the second electrode in a state where the nutrient solution is discharged from the culture medium. .

The first electrode has a semi-cylindrical shape;
The second electrode is preferably a rod-like electrode disposed at a position equidistant from the entire inner surface of the first electrode.

Alternatively, the plasma generation device is a plasma injection device that injects plasma to the culture medium,
It is preferable that the plasma injection device injects plasma to the culture medium in a state where the nutrient solution is discharged from the culture medium.

  The plasma spraying device preferably sprays nitrogen plasma onto the medium.

  It is preferable to provide a pump that stimulates plants or fungi in the medium by periodically varying the pressure of the nutrient solution supplied to the medium.

A second aspect of the present invention is a hydroponics method for cultivating plants or fungi by supplying a nutrient solution to a medium,
While supplying the nutrient solution intermittently to the medium containing the dielectric substrate and the plant or fungus to be cultivated, the nutrient solution is periodically discharged from the medium,
When the nutrient solution is discharged from the medium, the plants or fungi in the medium are stimulated by plasma.

The substrate is granular,
It is preferable to generate plasma in the gap between the substrates by applying a voltage to the medium.

  Alternatively, it is preferable to stimulate plants or fungi in the medium by spraying plasma onto the medium.

  Furthermore, it is preferable to stimulate plants or fungi in the medium by periodically changing the pressure of the nutrient solution in the medium.

  According to the present invention, plasma is generated in a state in which a nutrient solution is discharged from a dielectric substrate and a culture medium containing plants or fungi to be cultivated, thereby efficiently stimulating the plants or fungi in the culture medium by the plasma. And can promote the growth of plants or fungi.

It is a perspective view which shows 1 A of hydroponic cultivation apparatuses. It is II-II arrow sectional drawing of FIG. FIG. 3 is a cross-sectional view taken along the line III-III in FIG. 2. It is the schematic which shows the hydroponic cultivation apparatus 1B.

  Hereinafter, as an embodiment of the present invention, a mushroom hydroponic device and a method for producing mushrooms by hydroponic cultivation will be described. However, the present invention is not limited to this, and the present invention is not limited to this. The invention can be applied.

[First Embodiment]
FIG. 1 is a perspective view showing a hydroponic cultivation apparatus 1A according to the first embodiment of the present invention, FIG. 2 is a cross-sectional view taken along the line II-II in FIG. 1, and FIG. FIG. As shown in FIG. 1, the hydroponic device 1 </ b> A includes a container 10 </ b> A, a culture medium 2, and a plasma generation device 20. In the first embodiment, the plasma generator 20 stimulates the mycelium in the culture medium 2 to promote the formation of primordial and fruiting bodies.

The container 10A includes a nutrient solution storage tank 11, a nutrient solution supply pipe 12, a nutrient solution discharge pipe 13, and the like.
The nutrient solution supply pipe 12 is a pipe that supplies the nutrient solution 3 (see FIGS. 2 and 3) to the nutrient solution storage tank 11. The nutrient solution 3 is an aqueous solution containing a nutrient source such as a nitrogen source. For example, rice bran, bran, corn bran, soybean oil cake, peptone (protein hydrolyzate), yeast extract and the like can be used as a nutrient source.

As shown in FIG. 3, the nutrient solution supply pipe 12 may be provided with a supply valve 12a for opening and closing the nutrient solution supply pipe. The nutrient solution discharge pipe 13 is a pipe for discharging the nutrient solution 3 from the nutrient solution storage tank 11. The nutrient solution discharge pipe 13 may be provided with a discharge valve 13a for opening and closing the nutrient solution discharge pipe.
In addition, 1 A of nutrient solution cultivation apparatuses are the filtration apparatus 14 which filters the nutrient solution 3 discharged | emitted from the nutrient solution discharge piping 13, the piping 15 and pump for supplying the nutrient solution 3 after filtration to the nutrient solution supply piping 12 again 16 may be provided. Moreover, you may provide the replenishment apparatus 17 which replenishes a nutrient source to the nutrient solution 3 after filtration.

The plasma generation apparatus 20 includes a first electrode 21, a second electrode 22, a voltage device 25, and the like.
The first electrode 21 and the second electrode 22 are provided inside the nutrient solution storage tank 11. The side wall that supports at least the first electrode 21 and the second electrode 22 of the nutrient solution storage tank 11 is made of an insulator.
The first electrode 21 is a semi-cylindrical conductor extending in the horizontal direction (the direction perpendicular to the paper surface of FIG. 2 and the left-right direction of FIG. 3). The first electrode 21 is provided with a plurality of through holes 21a. The through-hole 21a is smaller than the particle size of the base material constituting the medium 2 described later. As shown in FIG. 3, the first electrode 21 is supported by the side walls of the nutrient solution storage tank 11 at both end portions in the extending direction (left and right end portions in FIG. 3). As shown in FIG. 3, the first electrode 21 is connected to the voltage device 25 at one end. In addition, as shown in FIG. 2, the portion excluding both ends in the extending direction of the first electrode 21 is disposed away from the nutrient solution storage tank 11. The first electrode 21 may be grounded.
As shown in FIG. 2, the gap between the upper end portion of the nutrient solution storage tank 11 and the upper end portion of the first electrode 21 may be closed by a spacer 23.

The second electrode 22 is a bar-like conductor extending in the horizontal direction (the direction perpendicular to the paper surface of FIG. 2 and the left-right direction of FIG. 3). As shown in FIG. 2, the second electrode 22 is preferably disposed at the position of the cylindrical central axis of the first electrode 21 so as to be equidistant from the entire inner surface of the first electrode 21. As shown in FIG. 3, the second electrode 22 is supported by the side walls of the nutrient solution storage tank 11 at both ends in the extending direction (left and right ends in FIG. 3). As shown in FIG. 3, the second electrode 22 is connected to the voltage device 25 at one end.
As shown in FIGS. 2 and 3, the second electrode 22 is preferably covered with a dielectric 24. As the dielectric 24, for example, a glass tube can be used.

  The voltage device 25 is a device that applies a voltage between the first electrode 21 and the second electrode 22. The voltage device 25 applies a pulse voltage of, for example, 10 kV to 30 kV between the first electrode 21 and the second electrode 22 so as to have a frequency of 1 kHz to 10 kHz. As the voltage device 25, for example, a pulse power supply device can be used.

As shown in FIGS. 1 to 3, the culture medium 2 is accommodated in the internal space of the first electrode 21.
Medium 2 is obtained by inoculating a base material made of a dielectric material with an inoculum of mushrooms and culturing until the mycelium spreads. The inoculum may be solid or liquid. In the case of using a solid inoculum, it is preferable that the inoculum is mixed with the base material and then accommodated in the internal space of the first electrode 21. In this case, the culture medium 2 may be stored in the internal space of the first electrode 21 after culturing until the mycelium spreads on the base material, or stored in the internal space of the first electrode 21 immediately after mixing the inoculum with the base material. Then, the culture may be performed in the internal space of the first electrode 21. On the other hand, when using a liquid inoculum, the inoculum may be mixed with the base material and then accommodated in the internal space of the first electrode 21, or after the base material is accommodated in the internal space of the first electrode 21 It may be spread on the surface of the material and then cultured in the internal space of the first electrode 21.

  The base material is made of a dielectric material that is difficult for the nutrient solution to penetrate inside and has a larger specific gravity than the nutrient solution. The dielectric serving as the base material is preferably a non-woody material that is not easily decomposed by mushrooms, and is preferably made of a material that is difficult to dissolve in the nutrient solution. For example, glass, resin, ceramic, hollow alumina balls, etc. can be used as the substrate.

The base material is granular, and a gap is formed between the base materials in the state of being accommodated in the internal space of the first electrode 21 as shown in FIGS. As shown in FIGS. 2 and 3, the nutrient solution 3 is supplied to the culture medium 2 in the container 10 </ b> A. It is preferable that the particle size of the substrate is about 1 mm to 10 mm so that the nutrient solution can sufficiently penetrate into the gaps between the substrates and the drainage of the nutrient solution becomes good.
The nutrient source similar to that contained in the nutrient solution 3 may be mixed in the medium 2 in advance.

  Hereinafter, a method of applying stimulation by voltage to the culture medium 2 will be described. First, the supply valve 12a is closed, and the discharge valve 13a is opened to discharge the nutrient solution 3 from the nutrient solution storage tank 11. Then, the nutrient solution 3 in the gap of the culture medium 2 is discharged from the through hole 21 a of the first electrode 21.

  After the nutrient solution 3 is discharged from the gap between the culture medium 2, a pulse voltage of, for example, 10 kV to 30 kV is set to a frequency of 1 kHz to 10 kHz, for example, 20 to 30 between the first electrode 21 and the second electrode 22. Apply for 2 seconds. Then, molecules in the air in the gap of the culture medium 2 are ionized, and plasma is generated. In particular, by using a hollow alumina ball as a base material, when an electric field is applied between the first electrode 21 and the second electrode 22, plasma is easily generated from the surface of the alumina ball.

  This plasma stimulates the mycelium in the culture medium 2 to cause the formation of a primordium. Further, when an electric field is applied, a force due to Coulomb force or dielectric polarization is applied to the hyphae, and a part of the hyphae is damaged due to shear stress or the like. This damage causes irritation to the mycelium and causes the formation of a primordium. At this time, since the entire inner surface of the first electrode 21 is arranged at an equal distance from the second electrode 22, an electric field is uniformly applied to the culture medium 2 between the first electrode 21 and the second electrode 22. Can be added. In addition, nitrogen oxides generated by discharge can be used as a nutrient source.

When the voltage application is completed, the supply valve 12 a is opened, and the nutrient solution 3 is supplied from the nutrient solution supply pipe 12 into the nutrient solution storage tank 11.
Generation | occurrence | production of a fruit body can be accelerated | stimulated by performing the stimulation to the culture medium 2 by said voltage about 2 to 3 times a day.

In the present embodiment, the mycelium on the surface of the substrate can be stimulated by the plasma generated from the surface of the substrate, and the formation of primordial and fruiting bodies can be promoted.
Note that the pressure of the nutrient solution 3 supplied to the culture medium 2 may be periodically changed by the pump 16. By periodically changing the pressure of the nutrient solution 3, the mycelium in the culture medium 2 can be stimulated and the formation of primordial and fruiting bodies can be promoted.

  Although only one nutrient solution storage tank 11, one set of the first electrode 21 and the second electrode 22 are shown in FIGS. 1 to 3, a plurality of nutrient solution storage tanks 11 are provided and a plurality of sets of the first electrode are provided. 21 and the second electrode 22 may be provided in parallel, and a voltage may be simultaneously applied to the culture medium 2 between the first electrode 21 and the second electrode 22 accommodated in the plurality of nutrient solution storage tanks 11.

[Second Embodiment]
FIG. 4 is a schematic view showing a hydroponic cultivation apparatus 1B according to the second embodiment of the present invention. In addition, about the structure similar to 1 A of nutrient solution cultivation apparatuses which concern on 1st Embodiment, the same code | symbol is attached | subjected and description is omitted.
A hydroponic cultivation apparatus 1B according to the second embodiment includes a plasma injection apparatus 30 instead of the voltage apparatus 25 according to the first embodiment. In 2nd Embodiment, the mycelia in the culture medium 2 are stimulated by the plasma injection apparatus 30, and formation of a primordial body and a fruiting body is accelerated | stimulated.

In the nutrient solution cultivation apparatus 1B according to the second embodiment, the first electrode 21 and the second electrode 22 are not provided inside the nutrient solution storage tank 11A. Instead, inside the nutrient solution storage tank 11A, an inner container 11B for storing the culture medium 2 is provided apart from the inner wall surface of the nutrient solution storage tank 11A.
The inner container 11B is provided with a plurality of through holes 11a. The through hole 11a is smaller than the particle diameter of the base material constituting the culture medium 2. The inner container 11B does not have to be a conductor and may be an insulator. There is no restriction | limiting in the shape of the inner side container 11B, and it can be set as arbitrary shapes, unless the discharge of the nutrient solution 3 is prevented.

The plasma injection device 30 includes gas cylinders 31A and 31B, a regulator (pressure regulator) 32, a dielectric tube 33, electrodes 34A and 34B, an AC power source 35, and the like.
The gas cylinder 31A stores a rare gas (helium, argon, or the like) that becomes plasma. The gas cylinder 31B stores nitrogen that is mixed with a rare gas. The rare gas and the nitrogen gas are mixed, adjusted to a predetermined pressure by the regulator 32, and then supplied to the dielectric tube 33.

  On the outside of the dielectric tube 33, electrodes 34A and 34B are provided at two locations apart in the length direction. The AC power supply 35 applies an AC high voltage of about 10 kHz, 5 kV to 20 kV, for example, between the electrodes 34A and 34B. While supplying a mixed gas of rare gas and nitrogen gas to the dielectric tube 33 and applying an alternating high voltage to the electrodes 34A and 34B, a plasma jet of rare gas and nitrogen is ejected from the tip of the dielectric tube 33. . The voltage applied between the electrodes 34A and 34B is changed by the mixing ratio of the rare gas and nitrogen.

  Hereinafter, a method for applying stimulation to the culture medium 2 by the plasma injection device 30 will be described. First, the supply valve 12a is closed and the discharge valve 13a is opened to discharge the nutrient solution 3 from the nutrient solution storage tank 11A. Then, the nutrient solution 3 in the gap of the culture medium 2 is discharged from the through hole 11a of the inner container 11B.

  After the nutrient solution 3 is discharged from the gap between the culture media 2, a plasma jet is jetted from the plasma jetting device 30 onto the surface of the culture media 2. This plasma jet stimulates the mycelium in the culture medium 2 to cause the formation of primordial groups. By discharging the nutrient solution 3 from the gap in the medium 2 and then injecting a plasma jet onto the surface of the medium 2, the plasma jet penetrates not only to the surface of the medium 2 but also into the gap in the medium 2 to stimulate the mycelium Can do.

  By injecting not only rare gas plasma but also nitrogen plasma into the culture medium by the plasma jet, the nitrogen plasma reacts with water or air to generate nitrate ions. Since this nitrate ion becomes a nitrogen source, the yield of the mushrooms obtained can be increased. The higher the ratio of nitrogen gas in the mixed gas of noble gas and nitrogen gas supplied to the dielectric tube 33, the higher the effect of increasing the yield, while the higher the nitrogen mixture ratio, the higher the ratio applied to the electrodes 34A, 34B. It is necessary to increase the voltage. For this reason, it is preferable that the ratio of the nitrogen gas in the mixed gas of noble gas and nitrogen gas shall be 5 to 20%.

  Also in the second embodiment, the pressure of the nutrient solution 3 supplied to the culture medium 2 may be periodically changed by the pump 16. By periodically changing the pressure of the nutrient solution 3, the mycelium in the culture medium 2 can be stimulated and the formation of primordial and fruiting bodies can be promoted.

  In the said embodiment, although the mushroom nourishing culture was demonstrated, this invention is not restricted to this, It can also apply to the nourishing cultivation of a plant.

1A, 1B Nutrient solution cultivation device 2 Medium 3 Nutrient solution 10A Container 11, 11A Nutrient solution storage tank 11B Inner vessel 11a Through hole 12 Nutrient solution supply pipe 12a Supply valve 13 Nutrient solution discharge pipe 13a Discharge valve 14 Filtration device 15 Pipe 16 Pump 17 Replenisher 20 Plasma generator 21 First electrode 21a Through hole 22 Second electrode 23 Spacer 24 Dielectric 25 Voltage device 30 Plasma injection device 31A, 31B Gas cylinder 32 Regulator 33 Dielectric tube 34A, 34B Electrode 35 AC power supply

Claims (10)

A nutrient solution cultivating apparatus for cultivating plants or fungi by supplying a nutrient solution to a medium,
A medium comprising a dielectric substrate and a plant or fungus to be cultivated;
A nutrient solution supply pipe for supplying a nutrient solution to the medium;
A nutrient solution discharge pipe for discharging the nutrient solution from the medium;
A plasma generator for generating plasma for stimulating plants or fungi in the medium;
With
The said plasma production | generation apparatus is a nutrient solution cultivation apparatus which produces | generates a plasma in the state by which the nutrient solution was discharged | emitted from the said culture medium. The plasma generating apparatus includes:
A first electrode;
A second electrode disposed with the culture medium between the first electrode,
A voltage device for applying a voltage between the first electrode and the second electrode;
With
The base material is granular, and is disposed between the first electrode and the second electrode so that a gap is generated between the base materials,
The voltage device generates a plasma in the gap between the base materials by applying a voltage between the first electrode and the second electrode while the nutrient solution is discharged from the culture medium. apparatus. The first electrode has a semi-cylindrical shape;
The hydroponic device according to claim 2, wherein the second electrode is a rod-like electrode disposed at a position equidistant from the entire inner surface of the first electrode. The plasma generation device is a plasma injection device for injecting plasma to the culture medium,
The said nutrient solution cultivation apparatus of Claim 1 with which the said plasma injection apparatus injects a plasma with respect to the said culture medium in the state by which the nutrient solution was discharged | emitted from the said culture medium.   The hydroponic cultivation apparatus according to claim 4, wherein the plasma spraying apparatus sprays nitrogen plasma onto the medium.   The hydroponic cultivation apparatus according to any one of claims 1 to 5, comprising a pump that stimulates plants or fungi in the culture medium by periodically changing the pressure of the nutrient solution supplied to the culture medium. A nutrient solution cultivation method for cultivating plants or fungi by supplying a nutrient solution to a medium,
While supplying the nutrient solution intermittently to the medium comprising the dielectric material and the plant or fungus to be cultivated, the nutrient solution is periodically discharged from the medium,
The nutrient solution cultivation method of stimulating plants or fungi in the medium with plasma when the nutrient solution is discharged from the medium. The substrate is granular,
The hydroponic cultivation method according to claim 7, wherein plasma is generated in a gap between the base materials by applying a voltage to the medium.   The hydroponics method of Claim 7 which stimulates the plant or fungi in the said culture medium by spraying a plasma with respect to the said culture medium. The hydroponic cultivation method according to any one of claims 7 to 9, wherein the plant or fungus in the medium is stimulated by periodically varying the pressure of the nutrient solution in the medium.

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