JP2017118054A5 - - Google Patents

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JP2017118054A5
JP2017118054A5 JP2015254740A JP2015254740A JP2017118054A5 JP 2017118054 A5 JP2017118054 A5 JP 2017118054A5 JP 2015254740 A JP2015254740 A JP 2015254740A JP 2015254740 A JP2015254740 A JP 2015254740A JP 2017118054 A5 JP2017118054 A5 JP 2017118054A5
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Japan
Prior art keywords
region
imprint apparatus
holding member
imprint
processed
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JP2015254740A
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JP2017118054A (en
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Priority to JP2015254740A priority Critical patent/JP2017118054A/en
Priority claimed from JP2015254740A external-priority patent/JP2017118054A/en
Priority to PCT/JP2016/004859 priority patent/WO2017110032A1/en
Priority to KR1020187021163A priority patent/KR20180096770A/en
Priority to TW105138272A priority patent/TW201735105A/en
Publication of JP2017118054A publication Critical patent/JP2017118054A/en
Publication of JP2017118054A5 publication Critical patent/JP2017118054A5/ja
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Description

本発明は、型を用いて物体の被処理領域上にインプリント材のパターンを形成するインプリント装置であって、前記物体の前記被処理領域側とは反対側の面が対向するように前記物体を保持する保持部材と、前記保持部材が前記物体を保持した状態で、前記反対側の面側に配置された放熱部材と、前記型と前記物体を介して前記放熱部材に光を照射する光学系を有し、前記放熱部材は、前記光学系から照射された光を受けて放熱し、前記被処理領域を変形させることを特徴とする。 The present invention provides an imprint apparatus for forming a pattern of the imprint material onto a processing area of an object by using a mold such that said surface opposite faces and the treated region side of the object irradiating a holding member that holds the object, in a state where the holding member is holding the object, a front Symbol opposite heat radiating member arranged on the side of the light on the heat dissipation member via the type and the object And the heat radiating member receives and radiates light irradiated from the optical system to deform the region to be processed .

Claims (16)

型を用いて物体の被処理領域上にインプリント材のパターンを形成するインプリント装置であって、
前記物体の前記被処理領域側とは反対側の面が対向するように前記物体を保持する保持部材と、
前記保持部材が前記物体を保持した状態で、前記反対側の面側に配置された放熱部材と、
前記型と前記物体を介して前記放熱部材に光を照射する光学系を有し、
前記放熱部材は、前記光学系から照射された光を受けて放熱し、前記被処理領域を変形させることを特徴とするインプリント装置。
An imprint apparatus that forms a pattern of an imprint material on a processing area of an object using a mold,
A holding member that holds the object such that a surface of the object opposite to the processing region side faces,
In a state where the holding member is holding the object, a heat radiation member disposed on the side of the front Symbol opposite,
An optical system for irradiating light to the heat dissipation member through the mold and the object;
The imprinting apparatus , wherein the heat radiating member receives and radiates light irradiated from the optical system to deform the region to be processed .
記光学系が照射する光に対する吸収係数に関して、前記放熱部材における前記被処理領域の裏側の領域側の面の材料の前記吸収係数は、石英の前記吸収係数よりも大きいことを特徴とする請求項に記載のインプリント装置。 Respect absorption coefficient before Symbol optics to light you irradiation, the absorption coefficient of the material of the back side of the region side of the surface of the object to be processed region in the heat radiating member, and greater than the absorption coefficient of the quartz The imprint apparatus according to claim 1 . 前記放熱部材は、前記物体に設けられた凹部または前記保持部材に設けられた凹部に配置されていることを特徴とする請求項1または2に記載のインプリント装置。The imprint apparatus according to claim 1, wherein the heat radiating member is disposed in a recess provided in the object or a recess provided in the holding member. 前記保持部材に設けられた供給口を介して前記凹部に気体を供給する気体供給部を有することを特徴とする請求項3に記載のインプリント装置。 The imprint apparatus according to claim 3 , further comprising a gas supply unit configured to supply gas to the recess through a supply port provided in the holding member. 前記気体はヘリウムであることを特徴とする請求項4に記載のインプリント装置。   The imprint apparatus according to claim 4, wherein the gas is helium. 前記凹部は、前記被処理領域の裏側の領域と対向する位置に設けられていることを特徴とする請求項3乃至5のいずれか1項に記載のインプリント装置。The imprint apparatus according to claim 3, wherein the concave portion is provided at a position facing a region on the back side of the processing target region. 前記放熱部材において前記被処理領域の裏側の領域と対向する面には、前記被処理領域の裏側の領域と対向する面を複数の領域に分割する溝が設けられていることを特徴とする請求項1乃至のいずれか1項に記載のインプリント装置。 The surface of the heat radiating member that faces the region on the back side of the region to be processed is provided with a groove that divides the surface that faces the region on the back side of the region to be processed into a plurality of regions. Item 7. The imprint apparatus according to any one of Items 1 to 6 . 前記放熱部材は、前記保持部材の前記物体側に設けられた台上に設けられ、前記台の熱伝導率は前記放熱部材の熱伝導率よりも低いことを特徴とする請求項1乃至のいずれか1項に記載のインプリント装置。 The heat dissipation member is provided on a table provided on the object side of the holding member, according to claim 1 to 7 the thermal conductivity of the base is characterized by lower than the thermal conductivity of the heat radiating member The imprint apparatus of any one of these. 前記放熱部材は、前記被処理領域に対して空間的な分布のある熱エネルギーを付与することを特徴とする請求項1乃至のいずれか1項に記載のインプリント装置。 The heat radiation member, the imprint apparatus according to any one of claims 1 to 8, characterized in that said applying thermal energy with a spatial distribution relative to the treated area. 前記放熱部材と前記物体は非接触であることを特徴とする請求項1乃至のいずれか1項に記載のインプリント装置。 The heat dissipation member and the imprint apparatus according to any one of claims 1 to 9, characterized in that the object is non-contact. 型を用いて物体の被処理領域上にインプリント材のパターンを形成するインプリント装置であって、An imprint apparatus that forms a pattern of an imprint material on a processing area of an object using a mold,
前記物体の前記被処理領域側とは反対側の面が対向するように前記物体を保持する保持部材と、A holding member that holds the object such that a surface of the object opposite to the processing region side faces,
前記保持部材が前記物体を保持した状態で、前記反対側の面側に配置された発熱体を有し、In a state where the holding member holds the object, it has a heating element disposed on the opposite surface side,
前記発熱体は、前記被処理領域の裏側の領域に向けて熱エネルギーを放出することを特徴とするインプリント装置。The imprinting apparatus according to claim 1, wherein the heating element emits thermal energy toward a region on the back side of the processing target region.
前記発熱体は、前記物体に設けられた凹部または前記保持部材に設けられた凹部に配置されていることを特徴とする請求項11に記載のインプリント装置。The imprint apparatus according to claim 11, wherein the heating element is disposed in a recess provided in the object or a recess provided in the holding member. 前記保持部材に設けられた供給口を介して前記凹部に気体を供給する気体供給部を有することを特徴とする請求項12に記載のインプリント装置。The imprint apparatus according to claim 12, further comprising a gas supply unit configured to supply gas to the recess through a supply port provided in the holding member. 前記気体はヘリウムであることを特徴とする請求項13に記載のインプリント装置。The imprint apparatus according to claim 13, wherein the gas is helium. 型を用いて物体の被処理領域上にインプリント材のパターンを形成するインプリント装置であって、
前記物体前記被処理領域側とは反対側の面が対向するように前記物体を保持する保持部材と、
前記物体の前記被処理領域の形状を変形させる変形手段と、を有し、
前記変形手段は、前記保持部材が前記物体を保持している状態で前記物体と前記保持部材の間に生じる空間に位置し、前記型と前記物体を介して光が照射されることにより前記反対側の面における前記被処理領域の裏側の領域に向けて熱エネルギーを放出する放熱部材を有することを特徴とするインプリント装置。
An imprint apparatus that forms a pattern of an imprint material on a processing area of an object using a mold,
A holding member surface opposite holds the object so as to face the said treated region side of the object,
Deformation means for deforming the shape of the region to be processed of the object,
The deforming means is located in a space generated between the object and the holding member in a state where the holding member holds the object, and is opposite to the light by being irradiated with light through the mold and the object. An imprint apparatus comprising: a heat dissipating member that releases heat energy toward a region on the side surface behind the region to be processed.
請求項1乃至15のいずれか1項に記載のインプリント装置を用いて、前記物体の前記被処理領域上に硬化した前記インプリント材のパターンを形成する工程と、
ターン形成された前記物体を加工する工程と、
を有することを特徴とする物品の製造方法。
Using the imprint apparatus according to any one of claims 1 to 15 to form a cured pattern of the imprint material on the treated area of the object;
A step of processing the object pattern is formed,
A method for producing an article comprising:
JP2015254740A 2015-12-25 2015-12-25 Imprint device, imprint method, and method of manufacturing article Withdrawn JP2017118054A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015254740A JP2017118054A (en) 2015-12-25 2015-12-25 Imprint device, imprint method, and method of manufacturing article
PCT/JP2016/004859 WO2017110032A1 (en) 2015-12-25 2016-11-10 Imprint apparatus, method of imprinting, and method of fabricating product
KR1020187021163A KR20180096770A (en) 2015-12-25 2016-11-10 Imprint apparatus, imprint method and article manufacturing method
TW105138272A TW201735105A (en) 2015-12-25 2016-11-22 Imprint apparatus, method of imprinting, and method of fabricating product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015254740A JP2017118054A (en) 2015-12-25 2015-12-25 Imprint device, imprint method, and method of manufacturing article

Publications (2)

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JP2017118054A JP2017118054A (en) 2017-06-29
JP2017118054A5 true JP2017118054A5 (en) 2018-11-01

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KR (1) KR20180096770A (en)
TW (1) TW201735105A (en)
WO (1) WO2017110032A1 (en)

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KR102463923B1 (en) * 2017-09-18 2022-11-07 에스케이하이닉스 주식회사 Method of forming imprinted patterns and imprinting apparatus
JP7061895B2 (en) * 2018-02-27 2022-05-02 Hoya株式会社 Manufacturing method of imprint mold substrate, mask blank and imprint mold
TWI771623B (en) * 2018-11-08 2022-07-21 日商佳能股份有限公司 Imprint apparatus and product manufacturing method
JP7286391B2 (en) * 2019-04-16 2023-06-05 キヤノン株式会社 IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD

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JP2005045168A (en) * 2003-07-25 2005-02-17 Tokyo Electron Ltd In-print method and in-print device
TW200621527A (en) * 2004-12-20 2006-07-01 Komatsu Ind Corp Temperature conditioning plate and thermal transfer pressing machine
EP1795497B1 (en) * 2005-12-09 2012-03-14 Obducat AB Apparatus and method for transferring a pattern with intermediate stamp
JP5686779B2 (en) 2011-10-14 2015-03-18 キヤノン株式会社 Imprint apparatus and article manufacturing method using the same
JP5935385B2 (en) 2012-02-27 2016-06-15 大日本印刷株式会社 Method of manufacturing replica template for nanoimprint and replica template
US10359696B2 (en) * 2013-10-17 2019-07-23 Canon Kabushiki Kaisha Imprint apparatus, and method of manufacturing article

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