JP2015079887A5 - - Google Patents
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- JP2015079887A5 JP2015079887A5 JP2013216754A JP2013216754A JP2015079887A5 JP 2015079887 A5 JP2015079887 A5 JP 2015079887A5 JP 2013216754 A JP2013216754 A JP 2013216754A JP 2013216754 A JP2013216754 A JP 2013216754A JP 2015079887 A5 JP2015079887 A5 JP 2015079887A5
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- heating
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- 238000010438 heat treatment Methods 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 4
- 230000000875 corresponding Effects 0.000 claims 2
- 238000011156 evaluation Methods 0.000 claims 2
- 230000001678 irradiating Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Description
上記目的を達成するために、本発明の一側面としてのインプリント装置は、モールドを用いてインプリント材のパターンを基板上に形成するインプリント処理を行うインプリント装置であって、前記インプリント処理を行う対象の前記基板上の領域を加熱して当該領域を変形させる加熱部と、前記インプリント処理を行う対象の前記基板上の第1領域および第2領域のうち一方の領域を前記インプリント処理を先に行う領域として決定し、他方の領域を前記インプリント処理を後に行う領域として決定する処理部と、を含み、前記処理部は、前記基板上の領域を目標形状に近づくように前記一方の領域を前記加熱部で変形させた場合に前記他方の領域が受ける影響が、目標形状に近づくように前記他方の領域を前記加熱部で変形させた場合に前記一方の領域が受ける影響より小さくなるように前記一方の領域と前記他方の領域とを決定する、ことを特徴とする。 To achieve the above object, an imprint apparatus according to one aspect of the present invention is an imprint apparatus performs the imprint process that forms on the substrate a pattern of the imprint material using Mo Rudo, the in- A heating unit that heats an area on the substrate to be printed and deforms the area, and one of the first area and the second area on the substrate to be imprinted is the area . A processing unit that determines an area to be subjected to imprint processing first, and determines the other region as a region to be subjected to imprint processing later, and the processing unit approximates the region on the substrate to a target shape. when the said other region and the one of the regions to a modified version in said heating unit is influence received has the other area so as to approach the target shape is deformed by the heating unit to Determining the one region to the impact from small Kunar so that serial one region undergoes a and the other region, and wherein the.
Claims (13)
前記インプリント処理を行う対象の前記基板上の領域を加熱して当該領域を変形させる加熱部と、
前記インプリント処理を行う対象の前記基板上の第1領域および第2領域のうち一方の領域を前記インプリント処理を先に行う領域として決定し、他方の領域を前記インプリント処理を後に行う領域として決定する処理部と、
を含み、
前記処理部は、前記基板上の領域を目標形状に近づくように前記一方の領域を前記加熱部で変形させた場合に前記他方の領域が受ける影響が、目標形状に近づくように前記他方の領域を前記加熱部で変形させた場合に前記一方の領域が受ける影響より小さくなるように前記一方の領域と前記他方の領域とを決定する、ことを特徴とするインプリント装置。 A imprint apparatus performs the imprint process that forms on the substrate a pattern of the imprint material using Mo Rudo,
A heating unit that heats a region on the substrate to be subjected to the imprint process and deforms the region;
Region for determining the one region of the first region and the second region on the substrate target of the imprint process as an area for performing the previously said imprinting process, the other area after the imprint process A processing unit determined as:
Including
Wherein the processing unit, the other area will be affected regions on the substrate when the one region so as to approach the target shape is deformed by the heating unit, the other area so as to approach the target shape the determining and said one region the more smaller Kunar so influence one region is subjected to a modified version of the heating unit and of the other region, the imprint apparatus, characterized in that.
前記インプリント処理を行う対象の前記基板上の領域を加熱して当該領域を変形させる加熱部と、
前記インプリント処理のなされた第1領域に隣り合う複数の領域のうち、前記第1領域に対する前記加熱部での加熱の影響が最も小さい領域を、前記第1領域の次に前記インプリント処理を行う第2領域として決定する処理部と、
を含むことを特徴とするインプリント装置。 A imprint apparatus performs the imprint process that forms on the substrate a pattern of the imprint material using Mo Rudo,
A heating unit that heats a region on the substrate to be subjected to the imprint process and deforms the region;
Of the plurality of regions adjacent to the first region subjected to the imprint process, the region having the smallest influence of heating by the heating unit on the first region is selected, and the imprint process is performed next to the first region. A processing unit that determines the second region to be performed
An imprint apparatus comprising:
前記インプリント処理を行う対象の前記基板上の領域を加熱して当該領域を変形させる加熱部と、
前記基板上の各領域列について、前記インプリント処理を行う順番を、前記インプリント処理を行う対象の各領域の形状に基づいて、第1方向に従った順番および前記第1方向とは反対の第2方向に従った順番のうち一方に決定する処理部と、
を含む、ことを特徴とするインプリント装置。 A imprint apparatus performs the imprint process that forms on the substrate a pattern of the imprint material using Mo Rudo,
A heating unit that heats a region on the substrate to be subjected to the imprint process and deforms the region;
For each region row on the substrate, the order in which the imprint process is performed is opposite to the order according to the first direction and the first direction based on the shape of each region to be subjected to the imprint process. A processing unit for determining one of the orders according to the second direction;
An imprint apparatus comprising:
前記工程でパターンを形成された前記基板を加工する工程と、
を含むことを特徴とする物品の製造方法。 Forming a pattern on a substrate using the imprint apparatus according to any one of claims 1 to 12 , and
Processing the substrate on which the pattern has been formed in the step;
A method for producing an article comprising:
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013216754A JP6178694B2 (en) | 2013-10-17 | 2013-10-17 | Imprint apparatus and article manufacturing method |
KR1020140139682A KR101777905B1 (en) | 2013-10-17 | 2014-10-16 | Imprint apparatus, and method of manufacturing article |
US14/515,927 US10359696B2 (en) | 2013-10-17 | 2014-10-16 | Imprint apparatus, and method of manufacturing article |
CN201410551185.5A CN104570594B (en) | 2013-10-17 | 2014-10-17 | The method of Embosser and article of manufacture |
KR1020160126650A KR20160119024A (en) | 2013-10-17 | 2016-09-30 | Imprint apparatus, and method of manufacturing article |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013216754A JP6178694B2 (en) | 2013-10-17 | 2013-10-17 | Imprint apparatus and article manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015079887A JP2015079887A (en) | 2015-04-23 |
JP2015079887A5 true JP2015079887A5 (en) | 2016-12-01 |
JP6178694B2 JP6178694B2 (en) | 2017-08-09 |
Family
ID=53011075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013216754A Active JP6178694B2 (en) | 2013-10-17 | 2013-10-17 | Imprint apparatus and article manufacturing method |
Country Status (1)
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JP (1) | JP6178694B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6282298B2 (en) * | 2015-06-10 | 2018-02-21 | キヤノン株式会社 | Imprint apparatus, imprint method, and article manufacturing method |
JP6821387B2 (en) * | 2016-10-24 | 2021-01-27 | キヤノン株式会社 | Imprint method, imprint device, and manufacturing method of goods |
JP6993799B2 (en) * | 2017-06-27 | 2022-01-14 | キヤノン株式会社 | Imprinting equipment and article manufacturing method |
JP2021114505A (en) * | 2020-01-16 | 2021-08-05 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US7854877B2 (en) * | 2007-08-14 | 2010-12-21 | Asml Netherlands B.V. | Lithography meandering order |
US8628712B2 (en) * | 2008-10-27 | 2014-01-14 | Molecular Imprints, Inc. | Misalignment management |
JP2010239118A (en) * | 2009-03-11 | 2010-10-21 | Canon Inc | Imprint apparatus and method |
JP5875250B2 (en) * | 2011-04-28 | 2016-03-02 | キヤノン株式会社 | Imprint apparatus, imprint method, and device manufacturing method |
JP5932286B2 (en) * | 2011-10-14 | 2016-06-08 | キヤノン株式会社 | Imprint apparatus and article manufacturing method using the same |
JP6045363B2 (en) * | 2012-01-27 | 2016-12-14 | キヤノン株式会社 | Imprint apparatus and article manufacturing method using the same |
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2013
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