JP2014229881A5 - - Google Patents

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JP2014229881A5
JP2014229881A5 JP2013111330A JP2013111330A JP2014229881A5 JP 2014229881 A5 JP2014229881 A5 JP 2014229881A5 JP 2013111330 A JP2013111330 A JP 2013111330A JP 2013111330 A JP2013111330 A JP 2013111330A JP 2014229881 A5 JP2014229881 A5 JP 2014229881A5
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substrate
heating
heating unit
pattern
region
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上記目的を達成するために、本発明の一側面としてのインプリント装置は、パターンが形成されたパターン領域を有するモールドと基板上のインプリント材とを接触させ、前記インプリント材を硬化させることにより前記基板上のショット領域に前記インプリント材のパターンを形成するインプリント装置であって、前記基板を加熱して前記ショット領域を変形させる加熱部と、前記基板の面に沿った面方向における前記パターン領域と前記ショット領域との位置ずれ量と、前記パターン領域の形状と前記ショット領域の形状との差を示す形状差とを計測する計測部と、記計測部の計測結果に基づいて、前記加熱部による加熱と記モールドおよび前記基板の少なくとも一方の駆動とを制御し、前記パターン領域と前記ショット領域との位置合わせを行う制御部と、を含み、前記制御部は、前記形状差が補正されるように前記基板を前記加熱部により加熱することで前記ショット領域が前記面方向にシフトする量を示すシフト量を、前記加熱部による加熱を制御するための情報に基づいて推定し、前記位置合わせにおいて、前記パターン領域と前記ショット領域との前記面方向における位置の差が許容範囲に収まるように前記位置ずれ量と前記シフト量とに基づいて前記駆動を制御する、ことを特徴とする。 In order to achieve the above object, an imprint apparatus according to one aspect of the present invention contacts a mold having a pattern region on which a pattern is formed with an imprint material on a substrate, and cures the imprint material. An imprint apparatus for forming a pattern of the imprint material on a shot region on the substrate by a heating unit that heats the substrate and deforms the shot region; and a surface direction along the surface of the substrate wherein the amount of positional deviation between the pattern area and the shot region, the a measuring unit for measuring the shape difference indicating a difference in shape of the pattern area and the shape of the shot area, based on the previous SL measurement portion of the measurement results to control at least one of the driving of the heating and before Symbol mold and the substrate by the heating unit, position between the pattern region and the shot area A control unit that performs alignment, and the control unit indicates an amount by which the shot region is shifted in the surface direction by heating the substrate by the heating unit so that the shape difference is corrected. Is estimated based on information for controlling heating by the heating unit, and in the alignment, the positional deviation is performed so that a difference in position in the plane direction between the pattern area and the shot area falls within an allowable range. The drive is controlled based on the amount and the shift amount.

Claims (9)

パターンが形成されたパターン領域を有するモールドと基板上のインプリント材とを接触させ、前記インプリント材を硬化させることにより前記基板上のショット領域に前記インプリント材のパターンを形成するインプリント装置であって、
前記基板を加熱して前記ショット領域を変形させる加熱部と、
前記基板の面に沿った面方向における前記パターン領域と前記ショット領域との位置ずれ量と、前記パターン領域の形状と前記ショット領域の形状との差を示す形状差とを計測する計測部と、
記計測部の計測結果に基づいて、前記加熱部による加熱と記モールドおよび前記基板の少なくとも一方の駆動とを制御し、前記パターン領域と前記ショット領域との位置合わせを行う制御部と、
を含み、
前記制御部は、前記形状差が補正されるように前記基板を前記加熱部により加熱することで前記ショット領域が前記面方向にシフトする量を示すシフト量を、前記加熱部による加熱を制御するための情報に基づいて推定し、
前記位置合わせにおいて、前記パターン領域と前記ショット領域との前記面方向における位置の差が許容範囲に収まるように前記位置ずれ量と前記シフト量とに基づいて前記駆動を制御する、ことを特徴とするインプリント装置。
An imprint apparatus that forms a pattern of the imprint material in a shot region on the substrate by bringing a mold having a pattern region on which the pattern is formed into contact with an imprint material on the substrate and curing the imprint material Because
A heating unit that heats the substrate and deforms the shot region;
A measurement unit that measures a positional deviation amount between the pattern region and the shot region in a surface direction along the surface of the substrate, and a shape difference indicating a difference between the shape of the pattern region and the shape of the shot region;
Based on the measurement results of the previous SL measurement unit, a control unit for controlling at least one of the driving of the heating and before Symbol mold and the substrate by the heating unit, to align the said pattern region and the shot area,
Including
The control unit controls heating by the heating unit with a shift amount indicating an amount by which the shot region is shifted in the surface direction by heating the substrate by the heating unit so that the shape difference is corrected. Based on information for estimation,
In the alignment, the driving is controlled based on the positional shift amount and the shift amount so that a difference in position in the plane direction between the pattern region and the shot region is within an allowable range. Imprint device to do.
前記基板における複数の部分の各々に加えられる保持力をそれぞれ変更可能な基板保持部を更に含み、
前記複数の部分は、前記位置合わせの対象とするショット領域を有する第1部分と、前記第1部分とは異なる第2部分とを含み、
前記制御部は、前記位置合わせにおいて、前記第1部分に加えられる保持力が、前記第2部分に加えられる保持力より小さくなるように前記基板保持部を制御する、ことを特徴とする請求項1に記載のインプリント装置。
A substrate holding part capable of changing holding force applied to each of the plurality of portions of the substrate;
The plurality of portions include a first portion having a shot region to be aligned, and a second portion different from the first portion,
The said control part controls the said board | substrate holding part so that the holding force applied to the said 1st part may become smaller than the holding force applied to the said 2nd part in the said alignment. 2. The imprint apparatus according to 1.
前記制御部は、前記加熱部による前記基板の加熱において前記第2部分が前記面方向にシフトしないと仮定し、前記加熱部により前記基板を加熱することで前記ショット領域における代表位置が前記第2部分を基準としてシフトする量を前記シフト量として推定する、ことを特徴とする請求項2に記載のインプリント装置。   The control unit assumes that the second portion does not shift in the surface direction in heating the substrate by the heating unit, and the representative position in the shot region is the second position by heating the substrate by the heating unit. The imprint apparatus according to claim 2, wherein an amount of shift based on a part is estimated as the shift amount. 前記制御部は、前記加熱部による前記基板の加熱量、前記加熱部により加熱される前記基板上の範囲、前記加熱部により加熱されるショット領域の前記基板上における位置、および前記基板の物性値のうち少なくとも1つを用いて前記シフト量を推定する、ことを特徴とする請求項1乃至3のうちいずれか1項に記載のインプリント装置。   The control unit includes: a heating amount of the substrate by the heating unit; a range on the substrate heated by the heating unit; a position on the substrate of a shot region heated by the heating unit; and a physical property value of the substrate 4. The imprint apparatus according to claim 1, wherein the shift amount is estimated using at least one of the plurality of shift parameters. 5. 前記加熱部は、光を射出する光源を含み、当該光源から射出された光を前記モールドを介して前記基板に照射することにより前記基板を加熱して前記ショット領域を変形させる、ことを特徴とする請求項1乃至4のうちいずれか1項に記載のインプリント装置。   The heating unit includes a light source that emits light, and the shot region is deformed by heating the substrate by irradiating the substrate with light emitted from the light source through the mold. The imprint apparatus according to any one of claims 1 to 4. 前記制御部は、前記位置合わせを行った後に前記計測部に計測を行わせ、前記形状差が許容範囲に収まっていることを確認する、ことを特徴とする請求項1乃至5のうちいずれか1項に記載のインプリント装置。 6. The control unit according to claim 1, wherein the control unit causes the measurement unit to perform measurement after performing the alignment, and confirms that the shape difference is within an allowable range. The imprint apparatus according to item 1. 前記加熱部による加熱を制御するための情報は、前記加熱部による前記基板の加熱量、前記加熱部により加熱される前記基板上の範囲、及び、前記加熱部により加熱されるショット領域の前記基板上における位置の少なくとも1つを含む、ことを特徴とする請求項1乃至6のうちいずれか1項に記載のインプリント装置。   The information for controlling the heating by the heating unit includes the amount of heating of the substrate by the heating unit, the range on the substrate heated by the heating unit, and the substrate in the shot region heated by the heating unit. The imprint apparatus according to claim 1, comprising at least one of the above positions. 請求項1乃至7のうちいずれか1項に記載のインプリント装置を用いてターンを基板に形成するステップと、
前記ステップでパターンが形成された前記基板を加工するステップと、
を含む、ことを特徴とする物品の製造方法。
Forming a pattern on a substrate using an imprint apparatus according to any one of claims 1 to 7,
Processing the substrate on which the pattern is formed in the step;
A method for producing an article comprising:
基板を加熱して前記基板上のショット領域を変形させる加熱部を含むインプリント装置において、パターンが形成されたパターン領域を有するモールドと前記基板上のインプリント材とを接触させ、前記インプリント材を硬化させることにより前記ショット領域に前記インプリント材のパターンを形成するインプリント方法であって、
前記基板の面に沿った面方向における前記パターン領域と前記ショット領域との位置ずれ量と、前記パターン領域の形状と前記ショット領域の形状との差を示す形状差とを計測する計測工程と、
前記形状差が補正されるように前記基板を前記加熱部により加熱することで前記ショット領域が前記面方向にシフトする量を示すシフト量を、前記加熱部による加熱を制御するための情報に基づいて推定する推定工程と、
記計測工程における計測結果に基づいて、前記加熱部による加熱と記モールドおよび前記基板の少なくとも一方の駆動とを制御し、前記パターン領域と前記ショット領域との位置合わせを行う位置合わせ工程と、
を含み、
前記位置合わせ工程では、前記パターン領域と前記ショット領域との前記面方向における位置の差が許容範囲に収まるように前記位置ずれ量と前記シフト量とに基づいて前記駆動を制御する、ことを特徴とするインプリント方法。
In an imprint apparatus including a heating unit that heats a substrate and deforms a shot region on the substrate, a mold having a pattern region on which a pattern is formed and an imprint material on the substrate are brought into contact with each other, and the imprint material An imprint method for forming a pattern of the imprint material in the shot region by curing,
A measurement step of measuring a positional deviation amount between the pattern region and the shot region in a plane direction along the surface of the substrate, and a shape difference indicating a difference between the shape of the pattern region and the shape of the shot region;
Based on the information for controlling the heating by the heating unit, the shift amount indicating the amount by which the shot region shifts in the plane direction by heating the substrate by the heating unit so that the shape difference is corrected. An estimation process to estimate
Based on the measurement results in the previous SL measuring step, by controlling the at least one drive of the heating and before Symbol mold and the substrate by the heating unit, an alignment process to align the said pattern region and the shot area ,
Including
In the alignment step, the driving is controlled based on the positional deviation amount and the shift amount so that a difference in position between the pattern region and the shot region in the surface direction is within an allowable range. And imprint method.
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JP6921600B2 (en) * 2017-04-20 2021-08-18 キヤノン株式会社 Imprint device, control data generation method, and article manufacturing method
US11175598B2 (en) * 2017-06-30 2021-11-16 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
JP7033994B2 (en) * 2018-04-11 2022-03-11 キヤノン株式会社 Molding equipment and manufacturing method of articles
JP7204457B2 (en) * 2018-12-06 2023-01-16 キヤノン株式会社 IMPRINT APPARATUS, IMPRINT METHOD, AND PRODUCT MANUFACTURING METHOD
JP7274431B2 (en) 2020-01-17 2023-05-16 三協立山株式会社 Setting block positioning jig

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