JP2012238674A5 - - Google Patents
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- JP2012238674A5 JP2012238674A5 JP2011105653A JP2011105653A JP2012238674A5 JP 2012238674 A5 JP2012238674 A5 JP 2012238674A5 JP 2011105653 A JP2011105653 A JP 2011105653A JP 2011105653 A JP2011105653 A JP 2011105653A JP 2012238674 A5 JP2012238674 A5 JP 2012238674A5
- Authority
- JP
- Japan
- Prior art keywords
- imprint
- imprint material
- substrate
- supply
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
上記目的を達成するために、本発明の一側面としてのインプリント装置は、基部と該基部から突出した型部とを含むモールドで基板上の第1インプリント材を成形して硬化させ、さらに離型して、前記基板上にパターンを形成するインプリント処理を行うインプリント装置であって、前記基板上にインプリント材を供給する供給部と、制御部と、を有し、前記供給部は、前記第1インプリント材と第2インプリント材とを供給可能に構成され、前記制御部は、前記型部に隣接する前記基部に前記第2インプリント材が供給されるように前記供給部による基板に対する前記供給の動作を制御し、且つ、前記制御により該基板上に供給された前記第2インプリント材を前記モールドで成形して硬化させ、さらに離型する処理を実行させる、ことを特徴とする。 In order to achieve the above object, an imprint apparatus according to one aspect of the present invention forms and cures a first imprint material on a substrate with a mold including a base and a mold protruding from the base. An imprint apparatus that performs imprint processing for releasing a mold and forming a pattern on the substrate, the supply unit supplying an imprint material on the substrate, and a control unit, the supply unit Is configured to be capable of supplying the first imprint material and the second imprint material, and the control unit supplies the second imprint material to the base adjacent to the mold portion. controls the operation of the supply to the substrate by parts, and, the said supplied onto the substrate a second imprint material is cured by molding in the mold, to execute processing for further release by the control, it The And butterflies.
Claims (10)
前記基板上にインプリント材を供給する供給部と、
制御部と、
を有し、
前記供給部は、前記第1インプリント材と第2インプリント材とを供給可能に構成され、
前記制御部は、前記型部に隣接する前記基部に前記第2インプリント材が供給されるように前記供給部による基板に対する前記供給の動作を制御し、且つ、前記制御により該基板上に供給された前記第2インプリント材を前記モールドで成形して硬化させ、さらに離型する処理を実行させる、ことを特徴とするインプリント装置。 An imprint for performing an imprint process in which a first imprint material on a substrate is molded and cured with a mold including a base portion and a mold portion protruding from the base portion, and is further released to form a pattern on the substrate. A device,
A supply unit for supplying an imprint material onto the substrate;
A control unit;
Have
The supply unit is configured to be able to supply the first imprint material and the second imprint material,
Wherein the control unit, the type unit controls the operation of the supply to the substrate by the supplying unit to the second imprint material is supplied to the base adjacent to, and, provided on the substrate by the control by curing the second imprint material by molding in the mold, to execute processing for further release, imprint apparatus according to claim.
前記基板上にインプリント材を供給する供給部と、
制御部と、
を有し、
前記供給部は、第1インプリント材と第2インプリント材とを供給可能に構成され、
前記制御部は、前記基板上のショット領域内の第1領域と第2領域との間で前記第1インプリント材と前記第2インプリント材との比率が互いに異なるように、前記供給部による前記供給の動作を制御し、且つ、前記制御により前記ショット領域内に供給された前記第1インプリント材及び前記第2インプリント材に対して前記インプリント処理を実行させる、ことを特徴とするインプリント装置。 An imprint apparatus for forming an imprint material on a substrate with a mold including a mold portion and curing, further releasing the mold, and performing an imprint process for forming a pattern on the substrate,
A supply unit for supplying an imprint material onto the substrate;
A control unit;
Have
The supply unit is configured to be able to supply the first imprint material and the second imprint material,
The control unit is configured to control the supply unit so that a ratio of the first imprint material and the second imprint material is different between the first region and the second region in the shot region on the substrate. The supply operation is controlled, and the imprint process is executed on the first imprint material and the second imprint material supplied into the shot area by the control. Imprint device.
前記ステップで前記パターンを形成された前記基板を加工するステップと、
を有することを特徴とする物品の製造方法。 Forming a pattern on a substrate using the imprint apparatus according to any one of claims 1 to 9,
Processing the substrate on which the pattern has been formed in the step;
A method for producing an article comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011105653A JP5806501B2 (en) | 2011-05-10 | 2011-05-10 | Imprint apparatus and article manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011105653A JP5806501B2 (en) | 2011-05-10 | 2011-05-10 | Imprint apparatus and article manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012238674A JP2012238674A (en) | 2012-12-06 |
JP2012238674A5 true JP2012238674A5 (en) | 2014-06-26 |
JP5806501B2 JP5806501B2 (en) | 2015-11-10 |
Family
ID=47461341
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011105653A Active JP5806501B2 (en) | 2011-05-10 | 2011-05-10 | Imprint apparatus and article manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5806501B2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6333039B2 (en) | 2013-05-16 | 2018-05-30 | キヤノン株式会社 | Imprint apparatus, device manufacturing method, and imprint method |
JP6315904B2 (en) * | 2013-06-28 | 2018-04-25 | キヤノン株式会社 | Imprint method, imprint apparatus, and device manufacturing method |
JP5909210B2 (en) * | 2013-07-11 | 2016-04-26 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
JP6234207B2 (en) * | 2013-12-18 | 2017-11-22 | キヤノン株式会社 | Imprint method, imprint apparatus, and article manufacturing method |
JP2015167203A (en) * | 2014-03-04 | 2015-09-24 | 富士フイルム株式会社 | Pattern forming method and patterned substrate manufacturing method |
JP7043199B2 (en) * | 2017-08-03 | 2022-03-29 | キヤノン株式会社 | Imprint method, program, imprint device and manufacturing method of goods |
US10725375B2 (en) | 2018-12-04 | 2020-07-28 | Canon Kabushiki Kaisha | Using non-linear fluid dispensers for forming thick films |
US11261267B1 (en) | 2020-12-17 | 2022-03-01 | Canon Kabushiki Kaisha | Photocurable composition |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5182470B2 (en) * | 2007-07-17 | 2013-04-17 | 大日本印刷株式会社 | Imprint mold |
JP4609562B2 (en) * | 2008-09-10 | 2011-01-12 | 日立電線株式会社 | Stamper for fine structure transfer and manufacturing method thereof |
US20100096764A1 (en) * | 2008-10-20 | 2010-04-22 | Molecular Imprints, Inc. | Gas Environment for Imprint Lithography |
JP2011009641A (en) * | 2009-06-29 | 2011-01-13 | Toshiba Corp | Method of manufacturing semiconductor device, and template for imprint |
NL2005007A (en) * | 2009-08-28 | 2011-03-01 | Asml Netherlands Bv | Imprint lithography method and apparatus. |
JP2012114158A (en) * | 2010-11-22 | 2012-06-14 | Toshiba Corp | Imprinting method and imprinting apparatus |
-
2011
- 2011-05-10 JP JP2011105653A patent/JP5806501B2/en active Active
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