JP2017116776A - Near-infrared absorbent composition and filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a near-infrared absorbent composition which has high near-infrared absorption performance with little absorption in a visible light range (400 nm to 700 nm) and high durability in terms of light and heat resistance, and to provide a near-infrared cutoff filter using the near-infrared absorbent composition.SOLUTION: A near-infrared absorbent composition contains: a near-infrared photosensitive dye [A] having a specific configuration expressed by a general formula (1); and a resin-type dispersant.SELECTED DRAWING: None

Description

  The present invention includes a near-infrared absorbing composition containing a specific near-infrared absorbing dye and a resin-type dispersant, and a near-infrared cut filter comprising the near-infrared absorbing composition. It is about.

  The main applications of near-infrared absorbing materials are near-infrared absorbing films and near-infrared absorbing plates that block heat rays for energy conservation, agricultural near-infrared absorbing films for selective use of sunlight, and near-infrared absorbing heat. Recording media, near-infrared cut filter for electronic equipment, near-infrared filter for photography, protective glasses, sunglasses, heat ray blocking film, optical recording dye, optical character reading recording, confidential document copy prevention, electrophotographic photoreceptor, Examples include laser fusion.

  As typical near-infrared absorbing dyes, phthalocyanine-based materials, cyanine-based materials, and diimonium-based materials are known. As the phthalocyanine-based material, a phthalocyanine compound or naphthalocyanine compound having a substituent (for example, see Patent Document 1), a phthalocyanine compound having an amino group (for example, see Patent Documents 2 to 6), a phthalocyanine compound having an aryloxy group (for example, Patent Document 7), fluorine-containing phthalocyanine compounds (for example, see Patent Documents 8 and 9) and the like are known. However, since there is an absorption band peculiar to phthalocyanine in the visible light region (400 nm to 700 nm), the transparency of visible light is insufficient. Also, heat resistance and light resistance are not always satisfactory.

  On the other hand, cyanine-based materials and diimonium-based materials are materials having excellent near-infrared absorption ability and extremely good transparency of visible light, and various materials are known (see, for example, Patent Documents 10 to 14). . Furthermore, these dyes also have high solubility and resin compatibility. However, the stability as a pigment is extremely low, and the heat resistance and light resistance are not satisfied.

JP-A-10-78509 JP 2004-18561 A JP 2001-106869 A JP 2000-63691 A Japanese Patent Laid-Open No. 06-025548 Japanese Patent Laid-Open No. 2000-026748 JP 2013-241563 A JP 05-078364 A Japanese Patent Laid-Open No. 06-107663 JP 2007-219114 A JP 2010-072575 A Japanese Patent Laid-Open No. 05-247437 JP 2005-325292 A JP 2003-096040 A

  The problem to be solved by the present invention is a near-infrared absorptive composition that absorbs little in the visible region (400 nm to 700 nm), has excellent near-infrared absorptivity, and has high durability, and the near-infrared absorptive composition. It is providing the near-infrared cut off filter containing.

As a result of intensive studies to solve the above problems, the present inventors have reached the present invention.
That is, this invention relates to the near-infrared absorptive composition characterized by including the near-infrared absorption pigment | dye [A] represented by following General formula (1), and a resin type dispersing agent.

  The present invention further relates to the near-infrared absorbing composition comprising a photopolymerizable monomer.

  The present invention also relates to a near-infrared cut filter comprising the near-infrared absorbing composition.

  Furthermore, this invention is a manufacturing method of the near-infrared absorptive dye [A] represented by the following general formula (1), and the near-infrared absorptive composition containing a resin type dispersing agent, and a near-infrared absorptive dye [A]. Is dispersed with a resin-type dispersant.

General formula (1)

(In General Formula (1), R ₁ represents an alkyl group which may have a substituent. R _{2 to} R ₅ each independently represents a hydrogen atom, an alkyl group which may have a substituent, An alkenyl group which may have a substituent, an aryl group which may have a substituent, an aralkyl group which may have a substituent, an alkoxy group which may have a substituent, and a substituent And may represent an aryloxy group, an amino group, a substituted amino group, a nitro group, a cyano group, or a halogen atom, and X ⁻ represents an inorganic or organic anion.)

  According to the present invention, it is possible to obtain a near-infrared absorptive composition that has little absorption in the visible region (400 nm to 700 nm), is excellent in near-infrared absorption ability, and is excellent in durability such as heat resistance and light resistance. Moreover, the near-infrared cut filter containing the near-infrared absorptive composition which has the said outstanding characteristic can be provided by this invention.

Hereinafter, the present invention will be described in detail.
<Near-infrared absorbing dye [A]>
The near-infrared absorbing dye [A] represented by the general formula (1) of the present invention will be described in detail.

General formula (1)

In general formula (1), R ₁ represents an alkyl group which may have a substituent. R _{2 to} R ₅ each independently represents a hydrogen atom, an alkyl group that may have a substituent, an alkenyl group that may have a substituent, an aryl group that may have a substituent, or a substituent. It represents an aralkyl group which may have, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an amino group, a substituted amino group, a nitro group, a cyano group, or a halogen atom. X ⁻ represents an inorganic or organic anion.

As the “alkyl group optionally having substituent (s)” in R _{1 to} R ₅ , a methyl group, an ethyl group, an n-propyl group, an isopropyl group, a tert-butyl group, a tert-amyl group, a 2-ethylhexyl group, Stearyl group, chloromethyl group, trichloromethyl group, trifluoromethyl group, 2-methoxyethyl group, 2-chloroethyl group, 2-nitroethyl group, cyclopentyl group, cyclohexyl group, dimethylcyclohexyl group, etc. Among these, a methyl group, an ethyl group, and an n-propyl group are preferable from the viewpoints of imparting durability and difficulty in synthesis.

In R _{2 to} R ₅ , the “optionally substituted alkenyl group” includes a vinyl group, 1-propenyl group, allyl group, 2-butenyl group, 3-butenyl group, isopropenyl group, isobutenyl group, 1 -Pentenyl group, 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group, etc. Among these, a vinyl group and an allyl group are preferable from the viewpoint of imparting durability and difficulty in synthesis.

In R _{2 to} R ₅ , as the “aryl group optionally having substituent (s)”, phenyl group, naphthyl group, 4-methylphenyl group, 3,5-dimethylphenyl group, pentafluorophenyl group, 4-bromophenyl Group, 2-methoxyphenyl group, 4-diethylaminophenyl group, 3-nitrophenyl group, 4-cyanophenyl group and the like, among which phenyl group and 4-methylphenyl group are used for durability and synthesis. It is preferable from the viewpoint of difficulty.

Examples of the “aralkyl group which may have a substituent” in R _{2 to} R ₅ include a benzyl group, a phenethyl group, a phenylpropyl group, and a naphthylmethyl group. Among these, a benzyl group is a durable group. It is preferable from the viewpoint of imparting and synthesis difficulty.

In R _{2 to} R ₅ , the “alkoxy group having a substituent” includes a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an n-octyloxy group, and 2-ethylhexyloxy. Group, trifluoromethoxy group, cyclohexyloxy group, stearyloxy group and the like. Among these, a methoxy group, an ethoxy group, and a trifluoromethoxy group are preferable from the viewpoint of imparting durability and difficulty in synthesis.

In R _{2 to} R ₅ , the “aryloxy group which may have a substituent” includes a phenoxy group, a naphthyloxy group, a 4-methylphenyloxy group, a 3,5-chlorophenyloxy group, and 4-chloro-2- Examples thereof include methylphenyloxy group, 4-tert-butylphenyloxy group, 4-methoxyphenyloxy group, 4-diethylaminophenyloxy group, 4-nitrophenyloxy group, and among these, phenoxy group, naphthyloxy group Is preferable from the viewpoint of imparting durability and difficulty in synthesis.

As the “substituted amino group” in R _{2 to} R ₅ , the methylamino group, ethylamino group, isopropylamino group, n-butylamino group, cyclohexylamino group, stearylamino group, dimethylamino group, diethylamino group, dibutylamino group N, N-di (2-hydroxyethyl) amino group, phenylamino group, naphthylamino group, 4-tert-butylphenylamino group, diphenylamino group, N-phenyl-N-ethylamino group, and the like. Among these, a dimethylamino group and a diethylamino group are preferable from the viewpoint of imparting durability and difficulty in synthesis.

Examples of the “halogen atom” in R _{2 to} R ₅ include fluorine, bromine, chlorine, and iodine.

The “inorganic or organic anion” of X ⁻ is an anion necessary for neutralizing the cation charge of the cyanine compound, and known ones such as an inorganic anion and an organic acid anion can be used without limitation. Specific examples include halogen ions such as fluorine ion, chlorine ion, bromine ion and iodine ion, perchlorate ion, periodate ion, tetrafluoroborate ion and hexafluorophosphate ion.

  Below, the example of the near-infrared absorption pigment | dye [A] shown by General formula (1) of this invention is shown.

<Near-infrared absorbing composition>
The near-infrared absorbing composition of the present invention comprises a near-infrared absorbing dye [A] represented by the general formula (1) and a resin-type dispersant as essential components, a photopolymerizable monomer and a photopolymerization initiator. , A binder resin, an organic solvent, a sensitizer, and other auxiliary components.

  The near-infrared-absorbing dye [A] in the near-infrared-absorbing composition of the present invention can be used alone or in combination of two or more at any ratio as required.

  The content of the near-infrared absorbing dye [A] of the present invention can be adjusted as necessary, but is preferably 0.01 to 50% by mass in the near-infrared absorbing composition. It is more preferable to contain -30 mass%. By setting it within this range, near-infrared absorptivity can be more suitably imparted, and invisibility can be imparted simultaneously.

  In the near-infrared absorbing composition of the present invention, the near-infrared absorbing dye [A] is desirably dispersed in a resin-type dispersant and used in a fine particle dispersed state. By using it in a fine particle dispersed state, there is an advantage that the durability of the compound is improved. The near-infrared absorbing dye [A] used in the present invention preferably has an average primary particle diameter of 1 to 500 nm at the time of dispersion, more preferably 10 to 200 nm, and particularly preferably 10 to 100 nm. If the average primary particle diameter of the fine particles is 1 nm or more, it is preferable because the surface energy of the particles is small and aggregation is difficult, so that the fine particles can be easily dispersed and the dispersion state can be easily kept stable. Moreover, it is preferable that the average primary particle diameter of the fine particles is 200 nm or less because the influence of particle scattering is reduced and the absorption spectrum becomes sharp.

  The average primary particle diameter of the near-infrared absorbing dye [A] was measured by a method of directly measuring the size of primary particles from an electron micrograph using a transmission electron microscope (TEM). Specifically, the minor axis diameter and major axis diameter of the primary particle of each pigment were measured, and the average was taken as the particle size of the pigment primary particle. Next, for 100 or more pigment particles, the volume (weight) of each particle was determined by approximating the obtained particle size cube, and the volume average particle size was defined as the average primary particle size.

(Method for producing near-infrared absorbing dye [A])
Near-infrared absorbing dyes [A] are described by FM Harmer, “Heterocyclic Compounds-Cyanine Dies and Related Compounds”, D. D. M. Sturmer, “Heterocyclic Compounds in Special Cyclics in Heterocyclic Chemistry”, reference 29 in Japanese Patent Publication No. 36 The near-infrared absorbing dye [A] used in the present invention can be produced by referring to the literature. The present invention is not limited Te.

<Resin type dispersant>
The near-infrared absorbing composition of the present invention contains a resin-type dispersant. The resin-type dispersant of the present invention has a pigment-affinity part having a property of adsorbing to a dye and a part compatible with the dye carrier, and adsorbs to the dye to stabilize dispersion in the colorant carrier. It works. In particular, a resin whose structure is controlled, such as a graft type (comb type) or a block type, is preferably used.
Specific examples of the main chain and / or side chain skeleton of the resin-type dispersant include polycarboxylic acid esters such as polyurethane and polyacrylate, unsaturated polyamide, polycarboxylic acid, polycarboxylic acid (partial) amine salt, and polycarboxylic acid Ammonium salts, polycarboxylic acid alkylamine salts, polysiloxanes, long-chain polyaminoamide phosphates, hydroxyl group-containing polycarboxylic acid esters, their modified products, poly (lower alkylene imines) and polyesters having free carboxyl groups Oil-based dispersants such as amides and salts thereof formed by the reaction, (meth) acrylic acid-styrene copolymer, (meth) acrylic acid- (meth) acrylic ester copolymer, styrene-maleic acid copolymer, Water-soluble resins such as polyvinyl alcohol and polyvinyl pyrrolidone and water-soluble polymer compounds , Polyester, modified polyacrylate, ethylene oxide / propylene oxide adduct, phosphoric ester or the like is used, it may be used alone or in combination. Especially, what has a (meth) acryl copolymer as a principal chain and / or a side chain is preferable.
Specific examples of the dye adsorbing group of the resin-type dispersant include acidic adsorbing groups such as aromatic carboxylic acid groups and phosphoric acid groups, primary amino groups, secondary amino groups, tertiary amino groups, 4 Basic type adsorbing groups such as quaternary ammonium salts can be mentioned. Among them, a resin-type dispersant having an aromatic carboxylic acid group, a tertiary amino group, or a quaternary ammonium salt as a dye adsorbing group is preferable from the viewpoint of near infrared absorption ability and durability. A resin type dispersant having an ammonium salt as a dye adsorbing group is particularly preferred.

  Commercially available resin-type dispersants include Disperbyk-101, 103, 107, 108, 110, 111, 116, 130, 140, 154, 161, 162, 163, 164, 165, 166, 167 manufactured by Big Chemie Japan. 168, 170, 171, 174, 180, 181, 182, 183, 184, 185, 190, 2000, 2001, 2009, 2010, 2020, 2025, 2050, 2070, 2095, 2150, 2155, 2163, 2164 or Anti -Terra-U, 203, 204, or BYK-P104, P104S, 220S, 6919, 21116, 21324 or LACTIMON, LACTIMON-WS, BYKUMEN, etc. 3000, 9000, 13000, 13240, 13650, 13940, 16000, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, EFKA-46, 47, 48, 452, 4008, 4009, 4010, 4015, 4020, 4047, 4050, 4055, 4060, 4080, 4400, 4401 manufactured by BASF, such as 41000, 41090, 5305, 55000, 56000, 76500 4402, 4403, 4406, 4408, 4300, 4310, 4320, 4330, 4340, 450, 451, 453, 4540, 550, 4560, 4800, 5010, 5065, 5066, 5070, 7500, 7554, 1101, 120, 150, 1501, 1502, 1503, etc., Ajinomoto Fine Techno Co., Ltd. Ajisper PA111, PB711, PB821, PB822, PB824 Can be mentioned.

  These resin type dispersants can be used alone or in combination of two or more at any ratio as required. These resin-type dispersants are preferably 5 to 200% by weight based on the total amount of the dye in the near-infrared absorbing composition (100% by weight), and 10 to 150 from the viewpoint of optical properties and durability. More preferably, it is% by weight.

<Photopolymerizable monomer>
Photopolymerizable monomers that can be used in the present invention include monomers or oligomers that are cured by ultraviolet rays or heat to produce transparent resins, and these may be used alone or in combination of two or more. Can do. The blending amount of the monomer is preferably 5 to 400 parts by weight with respect to 100 parts by weight of the dye, and more preferably 10 to 300 parts by weight from the viewpoint of photocurability and developability.

  Examples of monomers and oligomers that are cured by ultraviolet rays or heat to produce a transparent resin include methyl (meth) acrylate, ethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, and 2-hydroxypropyl (meth) acrylate. , Cyclohexyl (meth) acrylate, β-carboxyethyl (meth) acrylate, polyethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di ( (Meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, 1,6-hexanediol diglycy Luether di (meth) acrylate, bisphenol A diglycidyl ether di (meth) acrylate, neopentyl glycol diglycidyl ether di (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, tricyclodeca Nyl (meth) acrylate, ester acrylate, methylolated melamine (meth) acrylate ester, epoxy (meth) acrylate, urethane acrylate and other acrylic esters and methacrylate esters, (meth) acrylic acid, styrene, vinyl acetate, Hydroxyethyl vinyl ether, ethylene glycol divinyl ether, pentaerythritol trivinyl ether, (meth) acrylamide, N-hydroxymethyl Examples include, but are not necessarily limited to, til (meth) acrylamide, N-vinylformamide, acrylonitrile and the like.

<Photopolymerization initiator>
In the near-infrared absorbing composition of the present invention, when the composition is cured by ultraviolet irradiation and a filter segment is formed by a photolithographic method, a photopolymerization initiator or the like is added to a solvent developing type or alkali developing type coloring. It can be adjusted in the form of a resist material. The blending amount when using the photopolymerization initiator is preferably 5 to 200 parts by weight with respect to 100 parts by weight of the total amount of the dye, and 10 to 150 parts by weight from the viewpoint of photocurability and developability. Is more preferable.

  Examples of the photopolymerization initiator include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- Hydroxycyclohexyl phenyl ketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1 Acetophenone compounds such as-[4- (4-morpholinyl) phenyl] -1-butanone or 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one; benzoin, benzoin Methyl ether, benzoin ethyl ether, benzoin isopropyl ether, or Benzoin compounds such as benzyl dimethyl ketal; benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, or 3,3 ′, Benzophenone compounds such as 4,4′-tetra (t-butylperoxycarbonyl) benzophenone; thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diisopropylthioxanthone, or 2,4-diethylthioxanthone Thioxanthone compounds such as 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-meth) Cyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis (trichloro Methyl) -s-triazine, 2,4-bis (trichloromethyl) -6-styryl-s-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2 -(4-Methoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, or 2,4-trichloromethyl- Triazine compounds such as (4′-methoxystyryl) -6-triazine; 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxy) )], Or oxime ester compounds such as O- (acetyl) -N- (1-phenyl-2-oxo-2- (4′-methoxy-naphthyl) ethylidene) hydroxylamine; bis (2,4,6 Phosphine compounds such as trimethylbenzoyl) phenylphosphine oxide or 2,4,6-trimethylbenzoyldiphenylphosphine oxide; quinone compounds such as 9,10-phenanthrenequinone, camphorquinone and ethylanthraquinone; borate compounds; A carbazole compound; an imidazole compound; or a titanocene compound is used.

  These photopolymerization initiators can be used alone or in combination of two or more at any ratio as required. These photopolymerization initiators are preferably 5 to 200% by weight based on the total amount of the dye in the near-infrared absorbing composition (100% by weight), and 10 to 10% from the viewpoint of photocurability and developability. More preferably, it is 150% by weight.

<Binder resin>
The binder resin is preferably a resin having a spectral transmittance of preferably 80% or more, more preferably 95% or more in the entire wavelength region of 400 to 700 nm in the visible light region. Moreover, when using with the form of an alkali image development type resist material, it is preferable to use the alkali-soluble vinyl resin which copolymerized the acidic group containing ethylenically unsaturated monomer. Furthermore, an active energy ray-curable resin having an ethylenically unsaturated double bond can be used for the purpose of further improving photosensitivity and improving solvent resistance.

  In particular, by using an active energy ray-curable resin having an ethylenically unsaturated double bond in the side chain for an alkali developing resist, no coating foreign matter is generated after the application of the near-infrared absorbing composition of the present invention. The stability of the dye in the resist material is preferably improved. When a linear resin that does not have an ethylenically unsaturated double bond in the side chain is used, the dye is not easily trapped by the resin in the mixture of the resin and the dye, and the dye is free. The components tend to aggregate and precipitate, but by using an active energy ray-curable resin having an ethylenically unsaturated double bond in the side chain, the dye is easily trapped in the resin and dye mixture, In solvent resistance tests, pigments are difficult to elute, pigment components are less likely to aggregate and precipitate, and the pigment molecules are fixed by three-dimensional crosslinking of the resin when exposed to active energy rays to form a film. It is presumed that even if the solvent is removed in the subsequent development process, the colorant component is less likely to aggregate and precipitate.

  The weight average molecular weight (Mw) of the binder resin is preferably in the range of 10,000 to 100,000, more preferably in the range of 10,000 to 80,000. The number average molecular weight (Mn) is preferably in the range of 5,000 to 50,000, and the value of Mw / Mn is preferably 10 or less.

  When the binder resin is used as a near-infrared absorbing composition, from the viewpoints of penetrability, developability, and heat resistance of the near-infrared absorbing dye (A) of the present invention, a fat that functions as an alkali-soluble group during development. The balance of aliphatic groups and aromatic groups that act as affinity groups for aromatic carboxyl groups, dye carriers and solvents is important for the penetrability, developability, and durability of the near-infrared absorbing dye (A) of the present invention. It is preferable to use a resin having an acid value of 20 to 300 mgKOH / g. When the acid value is less than 20 mgKOH / g, the solubility in the developing solution is poor and it is difficult to form a fine pattern. When it exceeds 300 mgKOH / g, no fine pattern remains.

  Since the binder resin has good film formability and various resistances, it is preferably used in an amount of 30 parts by weight or more with respect to the total weight of 100 parts by weight of the dye, has a high dye concentration, and can exhibit good optical properties. Therefore, it is preferably used in an amount of 500 parts by weight or less.

(Thermoplastic resin)
Examples of the thermoplastic resin used for the binder resin include acrylic resin, butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate. , Polyurethane resins, polyester resins, vinyl resins, alkyd resins, polystyrene resins, polyamide resins, rubber resins, cyclized rubber resins, celluloses, polyethylene (HDPE, LDPE), polybutadiene, and polyimide resins. . Among them, it is preferable to use an acrylic resin.

  Examples of the vinyl alkali-soluble resin copolymerized with an acidic group-containing ethylenically unsaturated monomer include resins having acidic groups such as aliphatic carboxyl groups and sulfone groups. Specific examples of the alkali-soluble resin include an acrylic resin having an acidic group, an α-olefin / (anhydrous) maleic acid copolymer, a styrene / styrene sulfonic acid copolymer, an ethylene / (meth) acrylic acid copolymer, or Examples include isobutylene / (anhydrous) maleic acid copolymer. Among these, at least one resin selected from an acrylic resin having an acidic group and a styrene / styrene sulfonic acid copolymer, particularly an acrylic resin having an acidic group, is preferably used because of its high heat resistance and transparency.

  Examples of the active energy ray-curable resin having an ethylenically unsaturated double bond include resins having an unsaturated ethylenic double bond introduced by the following methods (a) and (b).

[Method (a)]
As the method (a), for example, a side chain epoxy group of a copolymer obtained by copolymerizing an unsaturated ethylenic monomer having an epoxy group and one or more other monomers is used. Then, the carboxyl group of the unsaturated monobasic acid having an unsaturated ethylenic double bond is subjected to an addition reaction, and the resulting hydroxyl group is reacted with a polybasic acid anhydride to convert the unsaturated ethylenic double bond and the carboxyl group into There is a way to introduce.

  Examples of the unsaturated ethylenic monomer having an epoxy group include glycidyl (meth) acrylate, methyl glycidyl (meth) acrylate, 2-glycidoxyethyl (meth) acrylate, 3,4 epoxybutyl (meth) acrylate, And 3,4 epoxy cyclohexyl (meth) acrylates, and these may be used alone or in combination of two or more. From the viewpoint of reactivity with the unsaturated monobasic acid in the next step, glycidyl (meth) acrylate is preferred.

  Examples of the unsaturated monobasic acid include (meth) acrylic acid, crotonic acid, (meth) acrylic acid α-position haloalkyl, alkoxyl, halogen, nitro, cyano-substituted monocarboxylic acid, and the like. It may be used in combination with two or more.

  Examples of the polybasic acid anhydride include succinic anhydride and maleic anhydride, and these may be used alone or in combination of two or more.

  As a method similar to the method (a), for example, a copolymer obtained by copolymerizing an unsaturated ethylenic monomer having an aliphatic carboxyl group and one or more other monomers is used. There is a method in which an unsaturated ethylenic monomer having an epoxy group is added to a part of the side chain aliphatic carboxyl group to introduce an unsaturated ethylenic double bond and an aliphatic carboxyl group.

[Method (b)]
As the method (b), an unsaturated ethylenic monomer having a hydroxyl group is used, and an unsaturated monobasic acid monomer having another aliphatic carboxyl group or another monomer is copolymerized. There is a method in which the isocyanate group of an unsaturated ethylenic monomer having an isocyanate group is reacted with the side chain hydroxyl group of the copolymer obtained.

  Examples of the unsaturated ethylenic monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2- or 3-hydroxypropyl (meth) acrylate, 2- or 3- or 4-hydroxybutyl (meth) acrylate, and glycerol Examples thereof include hydroxyalkyl (meth) acrylates such as (meth) acrylate or cyclohexanedimethanol mono (meth) acrylate, and these may be used alone or in combination of two or more. Further, polyether mono (meth) acrylate obtained by addition polymerization of ethylene oxide, propylene oxide, and / or butylene oxide to the above hydroxyalkyl (meth) acrylate, (poly) γ-valerolactone, (poly) ε-caprolactone And / or (poly) 12-hydroxystearic acid added (poly) ester mono (meth) acrylate can also be used. From the viewpoint of suppressing foreign matter on the coating film, 2-hydroxyethyl (meth) acrylate or glycerol (meth) acrylate is preferable.

  Examples of the unsaturated ethylenic monomer having an isocyanate group include 2- (meth) acryloyloxyethyl isocyanate, 1,1-bis [(meth) acryloyloxy] ethyl isocyanate, and the like. In addition, two or more types can be used in combination.

(Thermosetting resin)
Examples of the thermosetting resin used for the binder resin include epoxy resins, benzoguanamine resins, rosin-modified maleic acid resins, rosin-modified fumaric acid resins, melamine resins, urea resins, cardo resins, and phenol resins.

The thermosetting resin may be, for example, a low-molecular compound such as an epoxy compound, a benzoguanamine compound, a rosin-modified maleic acid compound, a rosin-modified fumaric acid compound, a melamine compound, a urea compound, a cardo compound, and a phenol compound. It is not limited to this. By including such a thermosetting resin, the resin reacts at the time of firing the filter segment, the cross-linking density of the coating film is increased, the heat resistance is improved, and the effect of suppressing pigment aggregation at the time of firing the filter segment is obtained. It is done.
Among these, an epoxy resin, a cardo resin, or a melamine resin is preferable.

<Organic solvent>
In the near-infrared absorbing composition of the present invention, the dye is sufficiently dissolved in a monomer, a resin, and the like, and applied to a glass substrate or the like so that the dry film thickness is 0.2 to 5 μm. A solvent can be included to facilitate formation.

  Examples of the organic solvent include ethyl lactate, benzyl alcohol, 1,2,3-trichloropropane, 1,3-butanediol, 1,3-butylene glycol, 1,3-butylene glycol diacetate, 1,4-dioxane, 2-heptanone, 2-methyl-1,3-propanediol, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, ethyl 3-ethoxypropionate, 3-methyl -1,3-butanediol, 3-methoxy-3-methyl-1-butanol, 3-methoxy-3-methylbutyl acetate, 3-methoxybutanol, 3-methoxybutyl acetate, 4-heptanone, m-xylene, m -Diethylbenzene, m-dichlorobenzene, N, N-dimethylacetamide, N, N- Methylformamide, n-butyl alcohol, n-butylbenzene, n-propyl acetate, o-xylene, o-chlorotoluene, o-diethylbenzene, o-dichlorobenzene, p-chlorotoluene, p-diethylbenzene, sec-butylbenzene, tert-butylbenzene, γ-butyrolactone, isobutyl alcohol, isophorone, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monotertiary butyl ether, Ethylene glycol monobutyl ether, ethylene glycol monobutyl ether acetate, ethylene glycol Monopropyl ether, ethylene glycol monohexyl ether, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, diisobutyl ketone, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate , Diethylene glycol monomethyl ether, cyclohexanol, cyclohexanol acetate, cyclohexanone, dipropylene glycol dimethyl ether, dipropylene glycol methyl ether acetate, dipropylene glycol monoethyl ether Dipropylene glycol monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, diacetone alcohol, triacetin, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol diacetate, propylene glycol phenyl ether, propylene glycol mono Ethyl ether, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, benzyl alcohol, Louis Seo ketone, methyl cyclohexanol, acetic acid n- amyl acetate n- butyl, isoamyl acetate, isobutyl acetate, propyl acetate, and dibasic acid esters.

  Among them, alkyl lactates such as ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, glycol acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, aromatic alcohols such as benzyl alcohol, It is preferable to use ketones such as cyclohexanone.

These organic solvents can be used individually by 1 type or in mixture of 2 or more types. When it is set as 2 or more types of mixed solvents, it is preferable that said preferable organic solvent is contained 65 to 95 weight% in 100 weight part of the whole organic solvent. In particular, it is preferable that propylene glycol monomethyl ether acetate is a main component, and it is preferable that 65 to 100% by weight is contained in all organic solvents.
Moreover, since the organic solvent can adjust the near-infrared absorbing composition to an appropriate viscosity and can form a filter segment having a desired uniform film thickness, it is 500 to 4000 parts by weight with respect to 100 parts by weight of the total weight of the dye. It is preferable to use it in the quantity.

<Sensitizer>
Furthermore, the near infrared ray absorbing composition of the present invention can contain a sensitizer. Sensitizers include chalcone derivatives, unsaturated ketones such as dibenzalacetone, 1,2-diketone derivatives such as benzyl and camphorquinone, benzoin derivatives, fluorene derivatives, naphthoquinone derivatives, anthraquinone derivatives , Xanthene derivatives, thioxanthene derivatives, xanthone derivatives, thioxanthone derivatives, coumarin derivatives, ketocoumarin derivatives, cyanine derivatives, merocyanine derivatives, oxonol derivatives, and other polymethine dyes, acridine derivatives, azine derivatives, thiazine derivatives, oxazine derivatives, indoline derivatives, Azulene derivatives, azurenium derivatives, squarylium derivatives, porphyrin derivatives, tetraphenylporphyrin derivatives, triarylmethane derivatives, tetrabenzoporphyrin derivatives, Trapirazinoporphyrazine derivatives, phthalocyanine derivatives, tetraazaporphyrazine derivatives, tetraquinoxalyloporphyrazine derivatives, naphthalocyanine derivatives, subphthalocyanine derivatives, pyrylium derivatives, thiopyrylium derivatives, tetraphylline derivatives, annulene derivatives, spiropyran derivatives, spirooxazine Derivatives, thiospiropyran derivatives, metal arene complexes, organoruthenium complexes, or Michler's ketone derivatives, biimidazole derivatives, α-acyloxy esters, acylphosphine oxides, methylphenylglyoxylate, benzyl, 9,10-phenanthrenequinone, Camphorquinone, ethylanthraquinone, 4,4'-diethylisophthalophenone, 3,3 'or 4,4'-tetra (t-butylperoxy Carbonyl) benzophenone, 4,4′-diethylaminobenzophenone, and the like.

  More specifically, edited by Shin Okawara et al., “Dye Handbook” (1986, Kodansha), edited by Shin Okawara et al., “Chemistry of Functional Dye” (1981, CMC), edited by Tadasaburo Ikemori et al. Examples include, but are not limited to, sensitizers described in "Special Functional Materials" (1986, CMC). In addition, a sensitizer that absorbs light from the ultraviolet region to the near infrared region can also be contained.

  Two or more kinds of sensitizers may be used in any ratio as required. The blending amount when using the sensitizer is preferably 3 to 60 parts by weight with respect to 100 parts by weight of the total weight of the photopolymerization initiator contained in the near-infrared absorbing composition. From the viewpoint of developability, it is more preferably 5 to 50 parts by weight.

<Multifunctional thiol>
The near-infrared absorbing composition of the present invention can contain a polyfunctional thiol that functions as a chain transfer agent.
The polyfunctional thiol may be a compound having two or more thiol groups. For example, hexanedithiol, decanedithiol, 1,4-butanediol bisthiopropionate, 1,4-butanediol bisthioglycolate, ethylene Glycol bisthioglycolate, ethylene glycol bisthiopropionate, trimethylolpropane tristhioglycolate, trimethylolpropane tristhiopropionate, trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakisthioglycolate, Pentaerythritol tetrakisthiopropionate, trimercaptopropionic acid tris (2-hydroxyethyl) isocyanurate, 1,4-dimethylmercaptobenzene, 2,4,6-trimercap -s- triazine, 2- (N, N- dibutylamino) -4,6-dimercapto -s- triazine.
These polyfunctional thiols can be used singly or in combination of two or more in any ratio as necessary.

  The content of the functional thiol is preferably 0.1 to 30% by weight, more preferably 1 to 20% by weight based on the weight (100% by weight) of the total solid content of the near-infrared absorbing composition. If the content of the polyfunctional thiol is less than 0.1% by weight, the effect of adding the polyfunctional thiol is insufficient, and if it exceeds 30% by weight, the sensitivity is too high and the resolution is lowered.

<Antioxidant>
The near-infrared absorptive composition of this invention can contain antioxidant. Antioxidants are used to prevent the photopolymerization initiators and thermosetting compounds contained in the near-infrared absorbing composition from oxidizing and yellowing due to thermal processes during thermal curing and ITO annealing. Can be high. Therefore, by including an antioxidant, yellowing due to oxidation during the heating step can be prevented, and a high coating film transmittance can be obtained.
The “antioxidant” in the present invention may be a compound having an ultraviolet absorbing function, a radical scavenging function, or a peroxide decomposing function. Specifically, as an antioxidant, a hindered phenol type, a hindered amine type are used. , Phosphorus-based, sulfur-based, benzotriazole-based, benzophenone-based, hydroxylamine-based, salicylate-based, and triazine-based compounds, and known ultraviolet absorbers, antioxidants, and the like can be used.
Among these antioxidants, a hindered phenol antioxidant, a hindered amine antioxidant, a phosphorus antioxidant, or a sulfur antioxidant is preferable from the viewpoint of achieving both transmittance and sensitivity of the coating film. Agents. More preferably, they are hindered phenolic antioxidants, hindered amine antioxidants, or phosphorus antioxidants.
These antioxidants can be used singly or in combination of two or more at any ratio as required. When the content of the antioxidant is 0.5 to 5.0% by weight based on the solid content weight of the near-infrared absorbing composition (100% by weight), the sensitivity is more preferable.

<Amine compound>
Moreover, the near-infrared absorptive composition of this invention can be made to contain the amine type compound which has the function which reduces the dissolved oxygen. Such amine compounds include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminobenzoate. Examples include ethyl, 2-ethylhexyl 4-dimethylaminobenzoate, and N, N-dimethylparatoluidine.

<Leveling agent>
In order to improve the leveling property of the composition on the transparent substrate, it is preferable to add a leveling agent to the near infrared ray absorbing composition of the present invention. As the leveling agent, dimethylsiloxane having a polyether structure or a polyester structure in the main chain is preferable. Specific examples of dimethylsiloxane having a polyether structure in the main chain include FZ-2122 manufactured by Toray Dow Corning, BYK-333 manufactured by Big Chemie. Specific examples of dimethylsiloxane having a polyester structure in the main chain include BYK-310 and BYK-370 manufactured by BYK Chemie. Dimethylsiloxane having a polyether structure in the main chain and dimethylsiloxane having a polyester structure in the main chain can be used in combination. In general, the leveling agent is preferably used in an amount of 0.003 to 0.5% by weight in a total of 100% by weight of the near-infrared absorbing composition.

  Particularly preferred as a leveling agent is a kind of so-called surfactant having a hydrophobic group and a hydrophilic group in the molecule, having a hydrophilic group but low solubility in water, and when added to a coloring composition, It has the characteristics of low surface tension reduction ability, and it is useful to have good wettability to the glass plate despite its low surface tension reduction ability. Those that can sufficiently suppress the chargeability can be preferably used. As a leveling agent having such preferable characteristics, dimethylpolysiloxane having a polyalkylene oxide unit can be preferably used. Examples of the polyalkylene oxide unit include a polyethylene oxide unit and a polypropylene oxide unit, and dimethylpolysiloxane may have both a polyethylene oxide unit and a polypropylene oxide unit.

  In addition, the bonding form of the polyalkylene oxide unit with dimethylpolysiloxane includes a pendant type in which the polyalkylene oxide unit is bonded in the repeating unit of dimethylpolysiloxane, a terminal-modified type in which the end of dimethylpolysiloxane is bonded, and dimethylpolysiloxane. Any of linear block copolymer types in which they are alternately and repeatedly bonded may be used. Dimethylpolysiloxane having a polyalkylene oxide unit is commercially available from Toray Dow Corning Co., Ltd., for example, FZ-2110, FZ-2122, FZ-2130, FZ-2166, FZ-2191, FZ-2203, FZ. -2207, but is not limited thereto.

  An anionic, cationic, nonionic or amphoteric surfactant can be supplementarily added to the leveling agent. Two or more kinds of surfactants may be mixed and used.

  Anionic surfactants added to the leveling agent as auxiliary agents include polyoxyethylene alkyl ether sulfate, sodium dodecylbenzene sulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkyl naphthalene sulfonate, alkyl diphenyl ether disulfonic acid Sodium, lauryl sulfate monoethanolamine, lauryl sulfate triethanolamine, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate Examples include esters.

  Examples of the chaotic surfactant that is supplementarily added to the leveling agent include alkyl quaternary ammonium salts and their ethylene oxide adducts. Nonionic surfactants added to the leveling agent as auxiliary agents include polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene alkyl ether phosphate ester, polyoxyethylene sorbitan monostearate And amphoteric surfactants such as alkyl dimethylamino acetic acid betaine and alkylimidazolines, and fluorine-based and silicone-based surfactants.

<Curing agent, curing accelerator>
Moreover, in order to assist hardening of a thermosetting resin, the near-infrared absorptive composition of this invention may contain the hardening | curing agent, the hardening accelerator, etc. as needed. As the curing agent, phenolic resins, amine compounds, acid anhydrides, active esters, carboxylic acid compounds, sulfonic acid compounds and the like are effective, but are not particularly limited to these, and thermosetting resins. Any curing agent may be used as long as it can react with the. Among these, a compound having two or more phenolic hydroxyl groups in one molecule and an amine curing agent are preferable. Examples of the curing accelerator include amine compounds (for example, dicyandiamide, benzyldimethylamine, 4- (dimethylamino) -N, N-dimethylbenzylamine, 4-methoxy-N, N-dimethylbenzylamine, 4-methyl). -N, N-dimethylbenzylamine etc.), quaternary ammonium salt compounds (eg triethylbenzylammonium chloride etc.), blocked isocyanate compounds (eg dimethylamine etc.), imidazole derivative bicyclic amidine compounds and salts thereof (eg Imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 4-phenylimidazole, 1-cyanoethyl-2-phenylimidazole, 1- (2-cyanoethyl) -2- D Ru-4-methylimidazole, etc.), phosphorus compounds (eg, triphenylphosphine, etc.), guanamine compounds (eg, melamine, guanamine, acetoguanamine, benzoguanamine, etc.), S-triazine derivatives (eg, 2,4-diamino-6) -Methacryloyloxyethyl-S-triazine, 2-vinyl-2,4-diamino-S-triazine, 2-vinyl-4,6-diamino-S-triazine isocyanuric acid adduct, 2,4-diamino-6 Methacryloyloxyethyl-S-triazine / isocyanuric acid adduct, etc.) can be used. These may be used alone or in combination of two or more. As content of the said hardening accelerator, 0.01-15 weight part is preferable with respect to 100 weight part of thermosetting resins.

<Other near infrared absorbing dyes>
The near-infrared absorbing composition of the present invention can contain a near-infrared absorbing dye in addition to the near-infrared absorbing dye [A] of the present invention. Examples of near-infrared absorbing dyes other than the near-infrared absorbing dye [A] that can be used in the near-infrared absorbing composition of the present invention include cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, aminium compounds, diimmonium compounds, and croconium compounds. Azo compounds, quinoid type complex compounds, dithiol metal complex compounds, and the like, but are not limited thereto.

<Other additive components>
The near-infrared absorbing composition of the present invention can contain a storage stabilizer in order to stabilize the viscosity with time of the composition. Moreover, in order to improve adhesiveness with a transparent substrate, adhesion improving agents, such as a silane coupling agent, can also be contained.

  Examples of storage stabilizers include quaternary ammonium chlorides such as benzyltrimethyl chloride and diethylhydroxyamine, organic acids such as lactic acid and oxalic acid, and methyl ethers thereof, t-butylpyrocatechol, tetraethylphosphine, and tetraphenylphosphine. Organic phosphines, phosphites and the like can be mentioned. The storage stabilizer can be used in an amount of 0.1 to 10 parts by weight with respect to 100 parts by weight of the total amount of the colorant.

  Examples of the adhesion improver include vinyl silanes such as vinyltris (β-methoxyethoxy) silane, vinylethoxysilane and vinyltrimethoxysilane, (meth) acrylsilanes such as γ-methacryloxypropyltrimethoxysilane, β- (3, 4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) methyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3,4-epoxycyclohexyl) Epoxysilanes such as methyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β (amino Ethyl) γ-aminopropyltrie Xisilane, N-β (aminoethyl) γ-aminopropylmethyldiethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N-phenyl Examples include silane coupling agents such as aminosilanes such as -γ-aminopropyltriethoxysilane, and thiosilanes such as γ-mercaptopropyltrimethoxysilane and γ-mercaptopropyltriethoxysilane. The adhesion improver can be used in an amount of 0.01 to 10 parts by weight, preferably 0.05 to 5 parts by weight, based on 100 parts by weight of the total amount of the colorant in the coloring composition.

<The manufacturing method of a near-infrared absorptive composition>
The near-infrared absorbing composition of the present invention can be obtained by dispersing the near-infrared absorbing dye [A] in a resin using a resin-type dispersant. As the resin, a resin-type dispersant itself or a binder resin may be used. As a specific method for producing the near-infrared absorbing composition of the present invention, a near-infrared absorbing dye [A] is mixed with a resin-type dispersant and, if necessary, a binder resin, an organic solvent, and other dispersion aids. Then, it can be produced by finely dispersing using various dispersing means such as a kneader, a two-roll mill, a three-roll mill, a ball mill, a horizontal sand mill, a vertical sand mill, an annular bead mill, or an attritor.

<Removal of coarse particles>
The near-infrared absorbing composition of the present invention is a coarse particle having a size of 5 μm or more, preferably a coarse particle having a size of 1 μm or more, more preferably a coarse particle having a size of 0.5 μm or more. It is preferable to remove the mixed dust. Thus, it is preferable that a coloring composition does not contain a particle | grain of 0.5 micrometer or more substantially. More preferably, it is 0.3 μm or less.

<Method for manufacturing near-infrared cut filter>
The near infrared cut filter of the present invention can be produced by a printing method or a photolithography method. The filter segment can be formed by printing by simply printing and drying the near-infrared absorbing composition prepared as a printing ink, making it a low-cost and mass-productive filter production method. Are better. Furthermore, it is possible to print a fine pattern having high dimensional accuracy and smoothness by the development of printing technology. In order to perform printing, it is preferable that the ink does not dry and solidify on the printing plate or on the blanket. Further, it is important to control the fluidity of the ink on the printing press, and the viscosity of the ink can be adjusted with a dispersant or extender pigment.

  When forming a filter segment by photolithography, the near-infrared absorbing composition prepared as the solvent development type or alkali development type resist material is spray coated, spin coated, slit coated, roll coated, etc. on a transparent substrate. The coating method is applied so that the dry film thickness is 0.2 to 5 μm. If necessary, the dried film is exposed to ultraviolet light through a mask having a predetermined pattern provided in contact with or non-contact with the film. Thereafter, the filter is immersed in a solvent or alkali developer or sprayed with a developer to remove the uncured portion to form a desired pattern, and then the same operation is repeated for other colors to produce a filter. Can do. Furthermore, in order to accelerate the polymerization of the resist material, heating can be performed as necessary. According to the photolithography method, a filter with higher accuracy than the printing method can be manufactured.

  Although it does not specifically limit as a transparent substrate, As a shape, a sheet-like, film-like, or plate-like transparent base material can be used. Colors are also colorless and colored, and are not particularly limited. Examples of the material of the transparent substrate include polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), and triacetyl cellulose (TAC). Examples include acrylic resins such as methyl methacrylate copolymers, styrene resins, polysulfone resins, polyether sulfone resins, polycarbonate resins, vinyl chloride resins, polymethacrylimide resins, and glass plates.

  In development, an aqueous solution such as sodium carbonate or sodium hydroxide is used as an alkali developer, and an organic alkali such as dimethylbenzylamine or triethanolamine can also be used. Moreover, an antifoamer and surfactant can also be added to a developing solution. In order to increase the UV exposure sensitivity, after coating and drying the colored resist material, a water-soluble or alkaline water-soluble resin such as polyvinyl alcohol or water-soluble acrylic resin is applied and dried to form a film that prevents polymerization inhibition by oxygen. Then, ultraviolet exposure can be performed.

  The near-infrared cut filter of the present invention can be produced by an electrodeposition method, a transfer method, an ink-jet method, etc. in addition to the above method, but the near-infrared absorbing composition of the present invention can be used in any method. it can.

<Applications of near-infrared cut filter>
The near-infrared cut filter of the present invention has little absorption in the visible region (400 nm to 700 nm), is excellent in near-infrared absorption ability, and is excellent in durability such as heat resistance and light resistance. Therefore, near-infrared absorbing film and near-infrared absorbing plate for blocking heat rays for energy saving, agricultural near-infrared absorbing film for selective use of sunlight, near-infrared cut filter for electronic equipment, wavelength selective filter, etc. Can be used for a wide range of purposes

EXAMPLES The present invention will be described more specifically with reference to the following examples. However, the present invention is not limited to the following examples unless it exceeds the gist. In Examples and Comparative Examples, “part” and “%” mean “part by mass” and “% by mass”, respectively.
“PGMAc” is propylene glycol monomethyl ether acetate, “Aronix M-402”) is dipentaerythritol hexaacrylate, “OXE-02”) is ethanone, 1- [9-ethyl-6- (2-methyl). Benzoyl) -9H-carbazol-3-yl]-, 1- (0-acetyloxime).

(Acid value of resin-type dispersant and binder resin)
The acid values of the resin-type dispersant and the binder resin were determined by potentiometric titration using a 0.1N potassium hydroxide / ethanol solution. The acid value of the resin and the resin-type dispersant indicates the acid value of the solid content.

(Weight average molecular weight (Mw) of resin type dispersant and binder resin)
The weight average molecular weight (Mw) of the resin-type dispersant and binder resin is GPC (manufactured by Tosoh Corporation, HLC-8120GPC) equipped with a RI detector using TSKgel column (manufactured by Tosoh Corporation), and THF is used as a developing solvent. It is the weight average molecular weight (Mw) in terms of polystyrene measured.

(Amine number of resin-type dispersant)
The amine value of the resin-type dispersant was determined by potentiometric titration using a 0.1N hydrochloric acid aqueous solution, and then converted to an equivalent of potassium hydroxide. The amine value of the resin-type dispersant indicates the amine value of the solid content.

<Method for producing binder resin solution>
(Preparation of binder resin solution): Random copolymer 70.0 parts of cyclohexanone was charged into a reaction vessel equipped with a separable four-necked flask equipped with a thermometer, a cooling tube, a nitrogen gas introduction tube, and a stirring device, and the temperature was raised to 80 ° C. After the inside of the reaction vessel was purged with nitrogen, 13.3 parts of n-butyl methacrylate, 4.6 parts of 2-hydroxyethyl methacrylate, 4.3 parts of methacrylic acid, paracumylphenol ethylene oxide modified acrylate (Toagosei Co., Ltd.) A mixture of 7.4 parts of “Aronix M110” manufactured by company and 0.4 part of 2,2′-azobisisobutyronitrile was added dropwise over 2 hours. After completion of the dropwise addition, the reaction was continued for 3 hours to obtain an acrylic resin solution having a weight average molecular weight (Mw) of 26000. After cooling to room temperature, about 2 g of the resin solution was sampled and heated and dried at 180 ° C. for 20 minutes to measure the nonvolatile content. Propylene glycol monoethyl was added to the previously synthesized resin solution so that the nonvolatile content was 20% by weight. Ether ether was added to prepare a binder resin solution.

<Method for producing resin-type dispersant>
(Resin type dispersant 1 solution): Graft copolymer A reactor equipped with a gas introduction tube, a thermometer, a condenser, and a stirrer was charged with 150 parts of PGMAc and 100 parts of n-butyl tacrylate, and replaced with nitrogen gas. . The inside of the reaction vessel was heated to 80 ° C., and a solution in which 0.5 part of 2,2′-azobisisobutyronitrile was dissolved in 4 parts of 2-mercaptoethanol was reacted for 10 hours. It was confirmed that 95% had reacted by solid content measurement, and a reaction product (dispersant 1a) having a number average molecular weight of 3900 and a weight average molecular weight of 7900 was obtained.
To the above reaction product, 7.9 parts of 2-methacryloyloxyethyl isocyanate, 0.05 part of methyldibutyltin dilaurate and 0.05 part of methylhydroquinone were added, and the reaction vessel was heated to 100 ° C. and reacted for 4 hours. . Thereafter, the mixture was cooled to 40 ° C. to obtain a reaction product (resin-type dispersant 1b solution).
A reaction vessel equipped with a gas introduction tube, a condenser, a stirring blade, and a thermometer was charged with 122 parts of PGMAc and heated to 100 ° C. while purging with nitrogen. In the dropping tank, the reaction product, 150 parts of pentamethylpiperidyl methacrylate (manufactured by ADEKA, Adeka Stub LA-82), 10 parts of hydroxyethyl methacrylate, and 2,2′-azobis (2,4-dimethylbutyronitrile) After charging 4 parts and stirring until uniform, it was added dropwise to the reaction vessel over 2 hours, and then the reaction was continued for 3 hours at the same temperature. Thus, a resin type having a tertiary amino group, which is a poly (meth) acrylate skeleton having an amine value per solid content of 42 mgKOH / g, a weight average molecular weight of 23,500 (Mw) and a nonvolatile content of 40% by weight. Dispersant 1 solution was obtained.

(Resin Type Dispersant 2 Solution): Block Copolymer A reaction apparatus equipped with a gas introduction tube, a condenser, a stirring blade, and a thermometer, 60 parts methyl methacrylate, 20 parts n-butyl methacrylate, 13.2 tetramethylethylenediamine. Then, the system was stirred at 50 ° C. for 1 hour while flowing nitrogen, and the system was purged with nitrogen. Next, 9.3 parts of ethyl bromoisobutyrate, 5.6 parts of cuprous chloride, and 133 parts of PGMAc were charged, and the temperature was raised to 110 ° C. under a nitrogen stream to start polymerization of the first block. After polymerization for 4 hours, the polymerization solution was sampled and the solid content was measured, and it was confirmed that the polymerization conversion was 98% or more in terms of non-volatile content.
Next, 61 parts of PGMAc and 20 parts of dimethylaminoethyl methacrylate (hereinafter referred to as DM) as the second block monomer were added to this reaction apparatus, and the reaction was continued while maintaining a nitrogen atmosphere at 110 ° C. to continue the reaction. After 2 hours from the addition of dimethylaminoethyl methacrylate, the polymerization solution is sampled to measure the solid content, and converted from the nonvolatile content to confirm that the polymerization conversion rate of the second block is 98% or more. The polymerization was stopped by cooling.
Propylene glycol monomethyl ether acetate was added to the previously synthesized block copolymer solution so that the nonvolatile content was 40% by weight. Thus, a resin type having a tertiary amino group, which is a poly (meth) acrylate skeleton having an amine value per solid content of 71.4 mgKOH / g, a weight average molecular weight of 9900 (Mw), and a nonvolatile content of 40% by weight. Dispersant 2 solution was obtained.

(Resin Type Dispersant 3 Solution): Block Copolymer In a reaction apparatus equipped with a gas introduction tube, a condenser, a stirring blade, and a thermometer, 60 parts of methyl methacrylate, 20 parts of n-butyl methacrylate, 13.2 tetramethylethylenediamine. Then, the system was stirred at 50 ° C. for 1 hour while flowing nitrogen, and the system was purged with nitrogen. Next, 9.3 parts of ethyl bromoisobutyrate, 5.6 parts of cuprous chloride, and 133 parts of PGMAc were charged, and the temperature was raised to 110 ° C. under a nitrogen stream to start polymerization of the first block. After polymerization for 4 hours, the polymerization solution was sampled and the solid content was measured, and it was confirmed that the polymerization conversion was 98% or more in terms of non-volatile content.
Next, 61 parts of PGMAc and 25.6 parts of methacryloyloxyethyltrimethylammonium chloride aqueous solution (“Acryester DMC78” manufactured by Mitsubishi Rayon Co., Ltd.) as the second block monomer were charged into this reactor and maintained at 110 ° C. under a nitrogen atmosphere. The reaction was continued with stirring. After 2 hours from charging methacryloyloxyethyltrimethylammonium chloride, the polymerization solution is sampled to measure the solid content, and converted from the nonvolatile content to confirm that the polymerization conversion rate of the second block is 98% or more. The polymerization was stopped by cooling to room temperature.
Propylene glycol monomethyl ether acetate was added to the previously synthesized block copolymer solution so that the nonvolatile content was 40% by weight. Thus, a resin type having a poly (meth) acrylate skeleton having an amine value per solid content of 29.4 mgKOH / g, a weight average molecular weight of 9800 (Mw) and a nonvolatile content of 40% by weight, and having a quaternary ammonium base. Dispersant 3 solution was obtained.

(Resin type dispersant 4 solution)
A reaction vessel equipped with a gas introduction tube, a thermometer, a condenser, and a stirrer was charged with 50 parts of methyl methacrylate, 50 parts of n-butyl methacrylate, and 45.4 parts of PGMAc and replaced with nitrogen gas. The inside of the reaction vessel was heated to 70 ° C., 6 parts of 3-mercapto-1,2-propanediol was added, 0.12 part of AIBN (azobisisobutyronitrile) was further added, and the reaction was carried out for 12 hours. It was confirmed that 95% had reacted by solid content measurement. Next, 9.7 parts of pyromellitic anhydride, 70.3 parts of PGMAc, and 0.20 part of DBU (1,8-diazabicyclo- [5.4.0] -7-undecene) as a catalyst were added at 120 ° C. For 7 hours. The reaction was terminated after confirming that 98% or more of the acid anhydride had been half-esterified by measuring the acid value. PGMAc was added to adjust the non-volatile content to 50%. In this way, a resin type dispersant 4 solution having an acid value of 43, a weight average molecular weight of 9000, a poly (meth) acrylate skeleton, and having an aromatic carboxyl group was obtained.

(Resin type dispersant 5 solution)
In a reaction vessel equipped with a gas introduction tube, a thermometer, a condenser and a stirrer, 6 parts of 3-mercapto-1,2-propanediol, 9.7 parts of pyromellitic anhydride, 0.01 part of monobutyltin oxide, PGMAc88. Nine parts were charged and replaced with nitrogen gas. The inside of the reaction vessel was heated to 100 ° C. and reacted for 7 hours. After confirming that 98% or more of the acid anhydride was half-esterified by measuring the acid value, the temperature in the system was cooled to 70 ° C., 50 parts of methyl methacrylate, 30 parts of n-butyl methacrylate, and hydroxymethyl 20 parts of methacrylate was charged, 0.12 part of AIBN and 26.8 parts of PGMAc were added, and the reaction was performed for 10 hours. The solid content measurement confirmed that the polymerization had progressed 95%, and the reaction was completed. PGMAc was added to adjust the non-volatile content to 50%, and a resin type dispersant 5 solution having an acid value of 43, a weight average molecular weight of 9000, a poly (meth) acrylate skeleton, and having an aromatic carboxyl group was obtained.

(Resin type dispersant 6 solution)
Disperbyk-168 (by Big Chemie Japan: non-volatile content 30%)

(Resin type dispersant 7 solution)
BYK-P104 (Made by Big Chemie Japan: Non-volatile content 50%)

(Resin type dispersant 8 solution)
Disperbyk-171 (manufactured by Big Chemie Japan: nonvolatile content 39.5%)

(Resin type dispersant 9 solution)
Disperbyk-142 (by Big Chemie Japan: nonvolatile content 60%)

(Resin type dispersant 10 solution)
Non-volatile 20% PGMAc solution of the following copolymer

<Near-infrared absorbing dye [A]>
The near-infrared absorbing dyes [A-1] to [A-24] described above were used.

<Production of near-infrared absorbing composition>
[Example 1]
(Near-infrared absorbing composition (D-1))
A mixture having the following composition was uniformly stirred and mixed, and then dispersed with an Eiger mill for 3 hours using zirconia beads having a diameter of 0.5 mm, followed by filtration with a 0.5 μm filter to prepare a near-infrared absorbing composition. .
Near-infrared absorbing dye [A-1]: 10.0 parts Resin-type dispersant 2 solution: 7.5 parts Binder resin solution: 35.0 parts Propylene glycol monomethyl ether acetate: 47.5 parts

[Examples 2 to 24]
(Near-infrared absorbing composition (D-2 to 42))
Hereinafter, near-infrared absorption is performed in the same manner as the near-infrared absorbing composition (D-1) except that the near-infrared absorbing dye, the resin-type dispersant solution, the binder resin solution, and the solvent are changed to the compositions and amounts shown in Table 1. Sex compositions (D-2 to 42) were prepared.

[Comparative Example 1]
(Near-infrared absorbing composition (D-43))
A mixture having the following composition was uniformly stirred and mixed, and then dispersed with an Eiger mill for 3 hours using zirconia beads having a diameter of 0.5 mm, followed by filtration with a 0.5 μm filter to prepare a near-infrared absorbing composition. .
Near-infrared absorbing dye [A-3]: 10.0 parts Binder resin solution: 50.0 parts Propylene glycol monomethyl ether acetate: 40.0 parts

[Comparative Example 2]
(Near-infrared absorbing composition (D-44))
The near-infrared absorbing composition (D-44) is the same as the near-infrared absorbing composition (D-43) except that the near-infrared absorbing dye [A-3] is changed to the near-infrared absorbing dye [A-5]. ) Was prepared.

<Evaluation of near-infrared absorbing composition>
About the near-infrared absorptive composition (D-1 to 44) obtained by the Example and the comparative example, the test regarding an average primary particle diameter, a spectral characteristic, and tolerance (light resistance, heat resistance) was done with the following method. In addition, (double-circle) is a very good level, (circle) is a favorable level, and x is a level unsuitable for practical use. The results are shown in Table 2.

(Average primary particle diameter when the near-infrared absorbing dye [A] is dispersed)
The average primary particle diameter of the near-infrared absorbing dye [A] was measured by a method of directly measuring the size of primary particles from an electron micrograph using a transmission electron microscope (TEM). Specifically, the minor axis diameter and major axis diameter of the primary particle of each pigment were measured, and the average was taken as the particle size of the pigment primary particle. Next, for 100 or more pigment particles, the volume (weight) of each particle was determined by approximating the obtained particle size cube, and the volume average particle size was defined as the average primary particle size.

(Evaluation of spectral characteristics)
The obtained near-infrared absorbing composition was spin-coated on a 1.1 mm thick glass substrate using a spin coater so as to have a film thickness of 1.0 μm, dried at 60 ° C. for 5 minutes, and then at 230 ° C. The substrate was produced by heating for 5 minutes. The absorption spectrum of the wavelength range of 300-900 nm was measured for the spectrum of the obtained substrate using the spectrophotometer (U-4100 Hitachi High-Technologies company make). The “average absorbance at 400 to 700 nm” when the absorbance at the maximum absorption wavelength was 1, was evaluated according to the following criteria. The maximum absorption wavelength of the near-infrared absorbing dye [A] coating film of the present invention exists in the near-infrared region (700 to 1000 nm). When this absorbance is 1, it can be said that the smaller the absorbance at 400 to 700 nm, the better the absorption ability in the near infrared region, and the higher the coloring power and the steep spectrum.
◎: Less than 0.05 ○: 0.05 or more, less than 0.075 ×: 0.1 or more

(Light resistance test)
A test substrate was prepared in the same procedure as the spectral characteristic evaluation, placed in a light resistance tester (“SUNTEST CPS +” manufactured by TOYOSEIKI), and left for 24 hours. The absorbance at the spectral maximum absorption wavelength of the near-infrared absorbing film was measured, the residual ratio to that before light irradiation was determined, and the light resistance was evaluated according to the following criteria. The residual rate was calculated using the following formula.
Residual rate = (absorbance after irradiation) ÷ (absorbance before irradiation) × 100
◎: Residual rate is 95% or more ○: Residual rate is 90% or more, less than 95% ×: Residual rate is less than 90%

(Heat resistance test)
A test substrate was prepared in the same procedure as the spectral characteristic evaluation, and was additionally heated at 210 ° C. for 20 minutes as a heat resistance test. The absorbance at the spectral maximum absorption wavelength of the near-infrared absorbing film was measured, the residual ratio to that before the heat resistance test was determined, and the heat resistance was evaluated according to the following criteria. The residual rate was calculated using the following formula.
Residual rate = (absorbance after heat resistance test) / (absorbance before heat resistance test) × 100
◎: Residual rate is 95% or more ○: Residual rate is 90% or more, less than 95% ×: Residual rate is less than 90%

A near-infrared absorbing composition prepared by dispersing a near-infrared absorbing dye using a resin-type dispersant having a dye-adsorbing group was very excellent in spectral characteristics. In particular, there is little absorption in the visible region (400 nm to 700 nm), excellent near-infrared absorption ability, good spectral characteristics, and excellent light resistance and heat resistance.
In particular, a near-infrared absorbing composition in which a near-infrared absorbing dye was dispersed with a resin-type dispersant having an amine moiety as a dye adsorbing group and a basic skeleton of acrylic was a good result. (Examples 1-5, 13-16, 24-42)
A near-infrared absorbing composition prepared by dispersing a near-infrared absorbing dye with a binder resin having no dye adsorbing group has deteriorated heat resistance and light resistance. (Comparative Examples 1 and 2)

<Production of photosensitive near-infrared absorbing composition>
[Example 43]
(Photosensitive near infrared ray absorbing composition (R-1))
After stirring and mixing the following mixture uniformly, 1. The mixture was filtered through a 0 μm filter to obtain a photosensitive near-infrared absorbing composition (R-1).
Near-infrared absorbing composition (D-4): 50.0 parts binder resin solution: 7.5 parts photopolymerizable monomer (“Aronix M-402” manufactured by Toagosei Co., Ltd.): 2.0 parts photopolymerization started Agent ("OXE-02" manufactured by BASF): 1.5 parts propylene glycol monomethyl ether acetate: 39.0 parts

[Examples 43 to 48 and Comparative Examples 3 to 4]
(Photosensitive near infrared ray absorbing composition (R-2 to 8))
Hereinafter, the photosensitive near-infrared absorbing composition was the same as the photosensitive near-infrared absorbing composition (R-1) except that the near-infrared absorbing composition was changed to the type of the near-infrared absorbing composition shown in Table 3. The thing (R-2-8) was obtained.

<Evaluation of photosensitive near infrared ray absorbing composition>
About the photosensitive near-infrared absorptive composition (R-1-8) obtained by the Example and the comparative example, the test regarding a spectral characteristic and tolerance (heat resistance, light resistance) was done with the following method. In addition, (double-circle) is a very good level, (circle) is a favorable level, and x is a level unsuitable for practical use. The results are shown in Table 4.

(Spectral characteristic evaluation)
The obtained photosensitive near-infrared absorbing composition was applied on a 100 mm × 100 mm, 1.1 mm thick glass substrate to a thickness of 1.0 μm using a spin coater, and then at 70 ° C. for 20 minutes. It was dried, exposed to ultraviolet light with an integrated light amount of 150 mJ / cm ² using an ultrahigh pressure mercury lamp, and developed with an alkaline developer at 23 ° C. to obtain a coated substrate. Subsequently, after heating at 210 ° C. for 5 minutes and allowing to cool, the spectrum of the obtained substrate was measured for an absorption spectrum in a wavelength range of 300 to 900 nm using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Corporation). The “average absorbance at 400 to 700 nm” when the absorbance at the maximum absorption wavelength was 1, was evaluated according to the following criteria. The maximum absorption wavelength of the near-infrared absorbing dye [A] coating film of the present invention exists in the near-infrared region (700 to 1000 nm). When this absorbance is 1, it can be said that the smaller the absorbance at 400 to 700 nm, the better the absorption ability in the near infrared region, and the higher the coloring power and the steep spectrum.
◎: Less than 0.05 ○: 0.05 or more, less than 0.075 ×: 0.1 or more

(Light resistance test)
A test substrate was prepared in the same procedure as the spectral characteristic evaluation, placed in a light resistance tester (“SUNTEST CPS +” manufactured by TOYOSEIKI), and left for 24 hours. The absorbance at the spectral maximum absorption wavelength of the near-infrared absorbing film was measured, the residual ratio to that before light irradiation was determined, and the light resistance was evaluated according to the following criteria. The residual rate was calculated using the following formula.
Residual rate = (absorbance after irradiation) ÷ (absorbance before irradiation) × 100
◎: Residual rate is 95% or more ○: Residual rate is 90% or more, less than 95% ×: Residual rate is less than 90%

(Heat resistance test)
A test substrate was prepared in the same procedure as the spectral characteristic evaluation, and was additionally heated at 210 ° C. for 20 minutes as a heat resistance test. The absorbance at the spectral maximum absorption wavelength of the near-infrared absorbing film was measured, the residual ratio to that before the heat resistance test was determined, and the heat resistance was evaluated according to the following criteria. The residual rate was calculated using the following formula.
Residual rate = (absorbance after heat resistance test) / (absorbance before heat resistance test) × 100
◎: Residual rate is 95% or more ○: Residual rate is 90% or more, less than 95% ×: Residual rate is less than 90%

In the case of the photosensitive near-infrared absorbing composition, the result is the same as that of the near-infrared absorbing composition, and the photosensitive near-infrared absorbing composition prepared by dispersing the near-infrared absorbing dye using a resin-type dispersant having a dye-adsorbing group. The infrared absorbing composition was very excellent in spectral characteristics. In particular, there is little absorption in the visible region (400 nm to 700 nm), excellent near-infrared absorption ability, good spectral characteristics, and excellent light resistance and heat resistance.
In particular, a near-infrared absorbing composition in which a near-infrared absorbing dye was dispersed with a resin-type dispersant having an amine moiety as a dye adsorbing group and a basic skeleton of acrylic was a good result. (Examples 43, 44, 48)
The photosensitive near-infrared absorptive composition containing the near-infrared absorptive composition produced by disperse | distributing a near-infrared absorptive pigment | dye with binder resin without a pigment | dye adsorption group has the spectral characteristics deteriorated. (Comparative Examples 3 and 4)

<Manufacture of near-infrared cut filter>
[Examples 49 to 51]
The photosensitive near-infrared absorbing composition (R-2) of the present invention was applied onto a 1.1 mm thick glass substrate with a spin coater and heat-treated with a 100 ° C. hot plate for 1 minute.
Next, using an ultrahigh pressure mercury lamp USH-200DP (USHIO INC.), Pattern exposure was performed at a dose of 1000 mJ / cm ² through a photomask to form a near infrared absorption cut filter of 100 μm square. .
Using the 0.2 wt% sodium carbonate aqueous solution as the developer after the exposure, the uncured portion of the coating was removed by a shower development method at a developer pressure of 0.1 mPa to form a 400 μm × 400 μm pattern. It was. Then, it heated at 100 degreeC for 120 minutes. The film thickness of the near infrared absorption cut filter (F-1) after the heat treatment was 1.0 μm.
About the photosensitive near-infrared absorptive composition (R-4, 6) of this invention, the near-infrared cut filter (F-2, 3) was obtained similarly to the near-infrared absorption cut filter (F-1). .

<Evaluation of near-infrared cut filter>
About the near-infrared cut filter (F-1 to 3), the test regarding a spectral characteristic and durability (heat resistance, light resistance) was performed by the method similar to photosensitive near-infrared absorptive composition evaluation. The results are shown in Table 5.

  The near-infrared cut filter produced in this way was very excellent in spectral characteristics. In particular, there was little absorption in the visible region (400 nm to 700 nm), excellent near-infrared absorption ability, and good spectral characteristics. Furthermore, it is excellent in light resistance and heat resistance. Therefore, it can be said that it has excellent performance as a near infrared cut filter.

Claims (4)

The near-infrared absorptive composition characterized by including the near-infrared absorption pigment | dye [A] represented by following General formula (1), and a resin type dispersing agent.
General formula (1)

(In General Formula (1), R ₁ represents an alkyl group which may have a substituent. R _{2 to} R ₅ each independently represents a hydrogen atom, an alkyl group which may have a substituent, An alkenyl group which may have a substituent, an aryl group which may have a substituent, an aralkyl group which may have a substituent, an alkoxy group which may have a substituent, and a substituent And may represent an aryloxy group, an amino group, a substituted amino group, a nitro group, a cyano group, or a halogen atom, and X ⁻ represents an inorganic or organic anion.)   Furthermore, the near-infrared absorptive composition of Claim 1 containing a photopolymerizable monomer.   A near-infrared cut filter comprising the near-infrared absorbing composition according to claim 1. It is a manufacturing method of the near-infrared absorptive composition containing the near-infrared absorptive dye [A] represented by following General formula (1), and a resin type dispersing agent, A near-infrared absorptive dye [A] is made into resin-type dispersing agent. The manufacturing method of the near-infrared absorptive composition characterized by the above-mentioned.
General formula (1)

(In General Formula (1), R ₁ represents an alkyl group which may have a substituent. R _{2 to} R ₅ each independently represents a hydrogen atom, an alkyl group which may have a substituent, An alkenyl group which may have a substituent, an aryl group which may have a substituent, an aralkyl group which may have a substituent, an alkoxy group which may have a substituent, and a substituent And may represent an aryloxy group, an amino group, a substituted amino group, a nitro group, a cyano group, or a halogen atom, and X ⁻ represents an inorganic or organic anion.)