JP2017106778A - Observation optical system-attached working device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an observation optical system-attached fluid ejection device that finely moves an ejection nozzle in a two-axis direction with high precision in a fine observation field by an observation optical system, and efficiently conducts an ejection operation of a fine droplet.SOLUTION: A fluid ejection device 1 is configured to have an ejection nozzle 11 and objective optical system 21 of an observation optical system 20 coaxially arranged; obtain an enlargement observation image of an ejection object portion with a tip end opening 11a of the ejection nozzle 11 as a center; enable working as checking a fluid droplet ejection status by the ejection nozzle 11, and a state of landed fluid droplets. Separate from a focus adjustment mechanism 32 of the observation optical system 20, the fluid ejection device 1 includes a three-axis stage mechanism 35 that includes a position deviation prevention mechanism 80 moving a nozzle unit 10. Accordingly, a fluid ejection operation and the like with respect to different portions can be efficiently conducted as checking the fluid ejection operation and the like therewith with the enlargement observation image.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a liquid ejection apparatus having a liquid ejection nozzle for ejecting a liquid material to the surface of a work, an inspection apparatus having a probe for performing a continuity test on a wiring formed on the surface of the work, and a fine surface on the surface of the work. The present invention relates to a working device that performs a predetermined work on a work target portion on the surface of a workpiece, such as a processing device provided with a processing tool that performs drilling. More specifically, the present invention relates to a working apparatus with an observation optical system that includes an observation optical system that can perform work using work tools such as a liquid discharge nozzle, a probe, and a processing tool while magnifying and observing a work target site.

  As such a working device, there is a substrate pattern defect correcting device. A color filter substrate for a liquid crystal panel and a semiconductor substrate for an integrated circuit have fine electrode patterns and wiring patterns formed on the surfaces thereof. Such a substrate may be deficient in the pattern during manufacture. A substrate having a defective portion becomes a defective product, which causes a decrease in yield. In view of this, defective products are reduced by repairing defective portions using a defect correction device. Patent Document 1 discloses a defect correction apparatus for performing such repair work.

  The defect correction apparatus of Patent Document 1 includes a stage on which a substrate is placed, an objective optical system that is disposed to face the substrate on the stage, and a discharge nozzle for discharging a repair material. The discharge nozzle is disposed along the optical axis of the objective optical system, and extends through the central part of the convex reflecting mirror and the concave reflecting mirror constituting the objective optical system. When repairing a defect in the resist pattern formed on the substrate surface, the work stage on which the substrate is placed is moved in the horizontal direction, and the repair location is positioned directly below the discharge nozzle. As a result, an observation image centered on the repair location can be obtained from the objective optical system, and thus the repair material can be discharged while displaying the obtained image on the monitor and checking the enlarged image of the repair location. .

JP 2008-170605 A

  In the configuration of Patent Document 1, the objective optical system and the discharge nozzle are integrated, and a mechanism for moving these up and down with respect to the work stage is not provided. When the thickness of the substrate is changed, the focus on the pattern on the surface of the substrate is not achieved, and a clear observation image cannot be obtained, and workability may be deteriorated.

  In addition, although the discharge nozzle can be positioned directly above the repair location by moving the work stage on which the substrate is placed, the objective optical system and the discharge nozzle are integrated, so only the discharge nozzle can be freely viewed within the field of view. I can't move it. Therefore, it cannot be said that workability is good when repairing a plurality of locations while moving the nozzle intermittently, or repairing continuous defective portions while moving the nozzle continuously.

Here, in a repair work of a minute wiring pattern, a continuity inspection of a minute wiring pattern, etc., the work target part is very small, and a work with a discharge nozzle, a probe, etc. is performed while displaying an enlarged observation image of the work target part. Is done. When moving the discharge nozzle etc. horizontally, if the movement cannot be controlled with high accuracy, the discharged nozzle after moving from the minute field of view by the objective optical system will come off and the enlarged observation image of the nozzle from the observation field of the observation optical system The situation that disappears frequently occurs. As a result, workability is greatly reduced.

  For example, when the xy stage mechanism is used to move the tip of a work tool such as a discharge nozzle minutely with respect to the work target part of the workpiece with high precision and stop the work tool at the moved position, the power of the stage mechanism There may be a slight displacement due to play of the transmission component. Similarly, when the stage mechanism in the stopped state is moved, there is a possibility that a slight misalignment may occur. Due to such a slight misalignment, the subsequent control accuracy of positioning and movement of the work tool may be lowered.

  In view of these points, an object of the present invention is a working device with an observation optical system that includes an observation optical system for magnifying and observing a work target site using a work tool such as a liquid discharge nozzle and a probe. With the observation optical system, the work tool can be moved minutely with high accuracy so that it does not deviate from the minute observation field of view by the observation optical system. It is to provide a working device.

In order to solve the above problems, the working device with an observation optical system of the present invention,
A work unit with work tools for performing predetermined work;
A work table on which a work object is placed by the work tool;
An observation optical system for magnifying and observing a work target portion that is disposed opposite to a tip of the work tool in the work target placed on the work table;
A focal position adjustment mechanism for adjusting the focal position of the observation optical system by moving the objective optical system of the observation optical system in the optical axis direction;
When the optical axis direction of the objective optical system is the z-axis direction and the two orthogonal directions on the orthogonal plane orthogonal to the z-axis direction are the x-axis direction and the y-axis direction, the work tool is used as the work object. In contrast, a triaxial stage mechanism for relative movement in the x-axis direction, the y-axis direction, and the z-axis direction;
Have
The working tool is characterized in that it is arranged coaxially with respect to the objective optical system between the work table and the objective optical system.

  In the present invention, the work tool and the objective optical system are arranged coaxially, and an enlarged observation image of the work target portion with the tip of the work tool as the center is obtained. Work while confirming the work status of the work tool, for example, in the case of a liquid discharge nozzle, the state of the liquid droplets discharged, the amount and shape of the liquid droplets discharged and landed at the discharge position that is the work target site It can be carried out.

  In addition to the focus position adjustment mechanism of the observation optical system, a three-axis stage mechanism that moves the working tool in the optical axis direction and the orthogonal plane direction orthogonal to the optical axis direction is provided. Therefore, the work tool can be freely moved in the direction perpendicular to the optical axis (x-axis direction, y-axis direction) within the field of view while the observation field range of the observation optical system is fixed. For this reason, when performing work such as droplet discharge work, wiring pattern continuity inspection work, drilling, marking, etc., to a plurality of work target parts separated in the x-axis direction and y-axis direction, The workability in the case of performing continuous discharge work, inspection work, processing work, and the like can be improved. In addition, since the work tool can be retracted from within the field of view, only the work target part can be observed, and the focusing operation on the work target part is facilitated.

Here, when the tip of the work tool is accurately positioned with respect to the target work target portion by the three-axis stage mechanism, or when the work tool is finely moved with respect to the work target with high accuracy, the movement is performed. When the working tool is stopped at a later position, there is a possibility that a slight displacement occurs due to play of the power transmission component of the three-axis stage mechanism. Similarly, a slight misalignment may occur when moving the three-axis stage mechanism in a stopped state. Due to such a slight misalignment, the subsequent control accuracy of positioning and movement of the work tool may be lowered.

  In particular, in such a small liquid droplet ejection operation and micro hole processing operation, when such a slight misalignment occurs, from within the observation visual field range of the observation optical system observing a minute work target site, The tip of the working tool may come off and the magnified observation image may disappear. If such a situation occurs frequently, it is necessary to repeatedly perform an adjustment operation for returning the tip of the working tool within the observation visual field range, so that the workability is significantly reduced.

  In order to avoid such adverse effects, in the present invention, a z-axis stage mechanism that moves the z-axis stage on which the working tool is mounted in the z-axis direction, and a y-axis on which the z-axis stage mechanism is mounted. In the three-axis stage mechanism comprising: a y-axis stage mechanism that moves the stage in the y-axis direction; and an x-axis stage mechanism that moves the x-axis stage on which the y-axis stage is mounted in the x-axis direction, A misalignment prevention mechanism is provided that clamps the axial stage and the y-axis stage from the z-axis direction, and prevents misalignment of the x-axis stage and the y-axis stage in the x-axis direction and the y-axis direction. .

  In this case, the x-axis stage includes an x-axis side slide surface parallel to an orthogonal plane orthogonal to the z-axis, the y-axis stage includes a y-axis side slide surface parallel to the orthogonal plane, and the x-axis side It is desirable that the slide surface and the y-axis side slide surface are in surface contact so as to be slidable from the z-axis direction. By moving the x-axis stage and the y-axis stage in a surface contact state, the work tool can be stably finely moved in the x-axis direction and the y-axis direction even when a large load is applied from the z-axis direction. . For example, even if a large load such as a z-axis stage mechanism on which a work tool is mounted is applied, a minute movement can be performed stably and accurately, and positional deviation can be reliably prevented.

The misalignment prevention mechanism includes a clamp mechanism that can be switched between a clamped state in which the x-axis stage and the y-axis stage are clamped by a predetermined elastic clamping force, and a clamp release state in which the elastic clamping force is reduced to a predetermined value. Can be used. This clamping mechanism
A through hole extending through each of the x-axis stage and the y-axis stage in the z-axis direction;
The x-axis stage and the y-axis stage are sandwiched between the nut disposed on one side thereof, and disposed on the other side so as to pass through the through hole with play and screwed into the nut. A bolt having a bolt leg,
Mounted between the bolt head of the bolt and the x-axis stage or the y-axis stage located on the side where the bolt is inserted, and compressed by screwing the bolt to increase the elastic clamping force. A compression coil spring;
It is desirable to have.

  In the misalignment prevention mechanism having this configuration, the x-axis stage and the y-axis stage can be moved minutely within a range within the gap between the through hole and the bolt leg. Further, when the bolt is screwed in, the compression coil spring is compressed, and the elastic clamping force for damping the x-axis stage and the y-axis stage from the z-axis direction increases, so that the x-axis stage and the y-axis stage can be fixed so as not to move. When the bolt is loosened, the elastic clamping force is reduced, and the x-axis stage and the y-axis stage are relatively slidable. Therefore, by applying a large elastic clamping force, both stages can be fixed without positional displacement. Further, even in the clamp release state, a predetermined elastic clamping force acts between the x-axis stage and the y-axis stage from the z-axis direction, so that it is possible to prevent these stages from being displaced when the clamp is released.

  In the present invention, for irradiating the work target portion of the work target with light other than the observation illumination light used for magnifying the work target using the optical path of the objective optical system. An irradiation part can be provided. For example, an irradiation unit that irradiates process light such as ultraviolet rays for curing the ultraviolet curable resin can be provided.

  In this way, by simultaneously irradiating the work target part with such observation light together with the observation illumination light, the work target part can be observed with sufficient brightness, and workability is improved. In addition, since work with a work tool and work with process light can be performed simultaneously on a work target part, work efficiency can be improved.

Next, the work device with an observation optical system of the present invention has a control unit that controls the drive of the work unit, the focus position adjustment mechanism, and the stage mechanism,
The controller is
A function of performing a first focusing operation for driving and controlling the focal position adjusting mechanism to align the focal position of the objective optical system with the tip of the working tool or a mirror image thereof;
A function of performing a second focusing operation for driving and controlling the focal position adjusting mechanism to align the focal position of the objective optical system with the work target portion of the work target;
A distance calculating function for calculating a distance from the tip of the working tool to the work target site based on the results of the first and second focusing operations; and
It is desirable that a tool position adjustment function is provided that adjusts the relative position of the work tool with respect to the work object in the z-axis direction by driving and controlling the stage mechanism based on the calculated distance.

  Using the focus position adjustment mechanism of the objective optical system, focusing is performed on each of the work target part of the work target and the tip of the work tool, and the result of the focus (the focus position at the completion of each focus operation or this) The distance from the tip of the working tool to the work target part is calculated based on the position of each part of the objective optical system corresponding to the above or the driving amount of the focus position adjusting mechanism that can be converted to these positions. Since the distance is optically calculated using the focal position adjustment mechanism, the distance can be calculated more accurately with a simple configuration than when the distance is measured using a mechanical measurement mechanism or the like. Further, since the work tool can be accurately positioned and moved based on the accurately calculated distance, the work on the work target part can be performed with high precision.

  Here, in the case where the mirror disposed opposite to the tip of the working tool is provided, the tip position of the working tool can be grasped based on the mirror image reflected on the mirror. In this case, the control unit drives and controls the focus position adjustment mechanism, and performs a third focus operation for adjusting the focus position of the objective optical system to a predetermined pattern formed on the surface of the mirror. Add functionality. In this case, the function of performing the first focusing operation is a function of performing an operation of aligning the focal position of the objective optical system with a mirror image of the tip of the working tool reflected on the mirror, The distance calculation function is a function for calculating the distance from the tip of the working tool to the work target part based on the execution results of the first, second, and third focusing operations.

When trying to grasp the tip position of the working tool based on the mirror image reflected on the mirror, the position of the mirror surface (relative position of the mirror surface with respect to the work target part) is grasped in advance, or some method This position needs to be calculated. In the present invention, since the third focusing operation as described above (focusing on the pattern formed on the surface of the mirror) is performed, by using the implementation result and the implementation result of the first focusing operation, The distance from the tip of the working tool to the surface of the mirror can be calculated. Therefore, even if the position of the mirror surface is unknown, the distance from the tip of the work tool to the work target site can be calculated.

It is a schematic block diagram of the principal part of the liquid discharge apparatus to which this invention is applied. It is a block diagram which shows the control system of a liquid discharge apparatus. It is explanatory drawing which shows a triaxial stage mechanism, and explanatory drawing which shows the cross-sectional structure. It is explanatory drawing which abbreviate | omits and shows some components of the triaxial stage mechanism of FIG. FIG. 5 is an explanatory diagram in which some components are further omitted from the triaxial stage mechanism of FIG. 4. It is explanatory drawing of the gap calculation method. It is explanatory drawing which shows another example of the gap calculation method.

  Embodiments of a working device with an observation optical system to which the present invention is applied will be described below with reference to the drawings.

(overall structure)
FIG. 1 is a schematic configuration diagram of a main part of a liquid ejection apparatus which is a working apparatus with an observation optical system to which the present invention is applied. The liquid discharge apparatus 1 is used to repair defects such as a wiring pattern formed on the surface of a substrate 2 (discharge target) such as a color filter substrate or a semiconductor substrate. ), An optical system for observation 20 disposed on the back side of the nozzle unit 10 (the side opposite to the nozzle ejection direction), the nozzle unit 10 and the observation unit A support mechanism 30 that supports the optical system 20 and a control unit 40 that controls driving of each unit are provided. Further, the liquid ejection apparatus 1 includes a horizontal work table 3 on which a work target substrate 2 is placed. The work table 3 is installed so as not to move to a position determined by a support mechanism 30.

  When performing the defect repair work of the substrate 2 by the liquid ejection device 1, the liquid ejection nozzle 11 of the nozzle unit 10 (hereinafter, simply referred to as the nozzle 11 may be referred to as the substrate 2 placed on the mounting surface 3 a of the work table 3. ). An observation optical system 20 is coaxially arranged on the upper side of the nozzle 11. In the liquid ejection apparatus 1 of this example, as will be described later, the work table 3 is fixed and the nozzle unit 10 side is moved in three axial directions. Instead of this, the work table 3 may be movable in the vertical direction and the horizontal direction, for example, as a three-axis work stage mechanism. In any case, the discharge target portion (work target portion) facing the nozzle 11 on the substrate surface of the substrate 2 placed on the mounting surface 3 a of the work table 3 can be moved relative to the nozzle 11.

  The nozzle unit 10 includes a nozzle 11 having a small diameter and a liquid material supply path 12 for supplying a liquid material to the liquid discharge nozzle 11. The nozzle 11 is arranged in such a posture that its central axis A is perpendicular to the mounting surface 3 a of the work table 3 and the tip opening 11 a is directed downward. A liquid material supply path 12 extending laterally from the rear end of the nozzle 11 communicates with a liquid material supply source (not shown). In addition, the nozzle unit 10 includes a nozzle-side electrode 13 and a high-voltage amplifier 14 (see FIG. 2) for applying a high-voltage pulse voltage to the nozzle 11, and a ground electrode 15 disposed so as to face the tip opening 11a of the nozzle 11. I have. The ground electrode 15 is disposed at a portion of the work table 3 that faces the tip opening 11a. Of course, nozzles based on different liquid ejection principles can also be used.

  The observation optical system 20 includes an objective optical system 21, an imaging optical system 22, and a CCD camera unit 23, which are coaxially arranged from the bottom to the top. The objective optical system 21 is a unit in which an objective lens (not shown) is held inside a cylindrical lens tube, and the imaging optical system 22 is an imaging lens (not shown) inside the cylindrical lens barrel. ) Are held units.

  In this example, the observation optical system 20 is attached to the support mechanism 30 so that the optical axis B thereof is perpendicular to the mounting surface 3 a of the work table 3. Further, the work table 3 and the observation optical system 20 are attached to the support mechanism 30 so that the optical axis B has a positional relationship passing through the center of the placement surface 3a. Therefore, when the central axis A of the nozzle 11 is made coincident with the optical axis B, the tip opening 11a of the nozzle 11 is positioned at the center of the observation field range by the objective optical system 21.

  In a state where the nozzle 11 is positioned in the observation visual field range of the objective optical system 21, light incident on the objective lens of the objective optical system 21 from the work table 3 and the nozzle 11 side passes through an optical path in the objective optical system 21. After entering the imaging optical system 22, an optical image is formed on the light receiving surface (not shown) of the CCD camera unit 23 by the imaging lens. When an optical image is input to the image sensor array of the CCD camera unit 23, an analog signal from the image sensor array is converted into a digital signal by an A / D conversion circuit (not shown) of the CCD camera unit 23. The image data of the optical image thus obtained is displayed on the display screen (not shown) of the CCD camera unit 23 as an enlarged observation image.

  The support mechanism 30 includes a main frame 31, and the work table 3, the imaging optical system 22 of the observation optical system 20, and the CCD camera unit 23 are fixed to the main frame 31. Further, the support mechanism 30 moves the objective optical system 21 up and down in the direction of the optical axis B to move the nozzle unit 10 in the triaxial direction, and a focus position adjusting mechanism 32 for focusing the objective optical system 21. And a three-axis stage mechanism 35. For example, the objective optical system 21 and the triaxial stage mechanism 35 (therefore, the nozzle unit 10) are integrally moved up and down in the direction of the optical axis B by the focal position adjusting mechanism 32.

  The focal position adjusting mechanism 32 is, for example, a guide shaft 33 supported by the main frame 31 so as to extend parallel to the optical axis B, and is slidably attached to the guide shaft 33 and holds the objective optical system 21. The lifting / lowering frame 34, a driving mechanism for moving the lifting / lowering frame 34 along the guide shaft 33, a drive motor (not shown), and the like can be used. By such a focal position adjusting mechanism 32, the objective optical system 21 can be moved up and down with respect to the work table 3, and the objective optical system 21 can be focused.

  A triaxial stage mechanism 35 for moving the nozzle unit 10 in the triaxial direction is mounted on the frame 34 of the focal position adjusting mechanism 32. The three-axis stage mechanism 35 includes an x-axis stage mechanism 50 and y for moving the nozzle unit 10 in the x-axis direction and the y-axis direction orthogonal to each other on an orthogonal plane orthogonal to the optical axis B (in this example, on a horizontal plane). An axis stage mechanism 60 and a z-axis stage mechanism 70 for moving the nozzle unit 10 in the z-axis direction that is the direction of the optical axis B are provided.

  In the liquid discharging operation, first, the objective optical system 21 of the observation optical system 20 is moved up and down by the focal position adjusting mechanism 32 to perform focusing, and a minute discharge target on the surface of the substrate 2 placed on the mounting surface 3a. An enlarged observation image of the part is displayed clearly in the observation visual field. After focusing, the nozzle unit 10 is moved up and down with respect to the mounting surface 3a of the work table 3 independently of the objective optical system 21 by the three-axis stage mechanism 35, so that the surface of the nozzle 11 and the substrate 2 is moved. The distance (gap) to the discharge target part is adjusted. Thereafter, a liquid is discharged from the nozzle 11. The operation can be performed while confirming the discharge state of the liquid from the tip opening 11a of the nozzle 11 and the landing state of the discharged fine droplets on the substrate by the enlarged observation image. Further, the nozzle 11 is slightly moved in the horizontal direction by the triaxial stage mechanism 35, for example, within a minute range of about 2 mm at the maximum, and the liquid discharge operation is performed at different positions on the substrate. Alternatively, the liquid discharge operation is performed while continuously moving the discharge nozzle 11 within a minute range.

(Controller unit)
FIG. 2 is a functional block diagram showing the control unit 40 of the liquid ejection apparatus 1. A control unit 40 that performs overall control of each part of the liquid ejection apparatus 1 outputs a control signal for controlling the driving of the focal position adjustment mechanism 32 and the three-axis stage mechanism 35 based on a command from the host apparatus or the like, and performs observation. The optical system 20 is focused and the nozzle 11 is positioned in the vertical direction (z-axis direction). Further, the control unit 40 controls the liquid discharge operation from the nozzle 11 of the nozzle unit 10 based on a command from the host device or the like.

  In the focusing operation, the control unit 40 takes in the optical image of the observation object obtained from the objective optical system 21, that is, the image data photographed by the CCD camera unit 23, and the focal position adjustment mechanism 32 based on this image data. Are controlled to automatically focus the objective optical system 21. For example, the control unit 40 determines the level of contrast of each part of the image data. Then, the objective optical system 21 is moved in the direction of the optical axis B until the contrast of the target part (for example, the wiring pattern on the surface of the substrate 2) becomes the highest, in other words, until the target part is focused. This makes it possible to focus on the target site. Alternatively, a mechanism for irradiating the CCD camera unit 23 with autofocus light is provided, and the autofocus light is applied to the observation object such as the substrate 2 using the optical paths in the imaging optical system 22 and the objective optical system 21. Irradiation and automatic focusing can also be performed.

(Triaxial stage mechanism)
FIG. 3A is an explanatory diagram showing a configuration example of a triaxial stage mechanism 35 for positioning the nozzle unit 10 in the triaxial direction, and FIG. 3B is an explanatory diagram showing a sectional configuration thereof. FIG. 4 is an explanatory diagram showing a state in which a part of the three-axis stage mechanism is omitted and a part of the y-axis stage mechanism is shown, and FIG. 5 is a part of the x-axis stage mechanism in which parts are further omitted. It is explanatory drawing of the state represented.

  The three-axis stage mechanism 35 of this example includes an x-axis stage mechanism 50, a y-axis stage mechanism 60, and a z-axis stage mechanism 70. First, the z-axis stage mechanism 70 includes a z-axis stage 71 on which the nozzle unit 10 is mounted, a z-axis slide guide 72 that supports the z-axis stage 71 so as to be slidable in the z-axis direction, and a z-axis slide guide. And a z-axis drive unit 73 for sliding the z-axis stage 71 along 72.

  As shown in FIG. 4, the y-axis stage mechanism 60 includes a y-axis stage 61 and a manually operated y-axis stage drive unit 62 for minutely moving the y-axis stage 61 in the y-axis direction. The y-axis stage driving unit 62 may be driven and controlled via the control unit 40 as an electric driving unit including a servo motor. A z-axis stage mechanism 70 is mounted on the y-axis stage 61. That is, the z-axis slide guide 72 to which the components are attached is fixed to the side surface of the y-axis stage 61.

  As shown in FIG. 5, the x-axis stage mechanism 50 includes an x-axis stage 51 that is mounted in a surface contact state in which the y-axis stage 61 is slidable, and a slight movement of the x-axis stage 51 in the x-axis direction. And a manually operated x-axis stage drive unit 52. The x-axis stage drive unit 52 may be driven and controlled via the control unit 40 as an electric drive unit including a servo motor.

Here, in the three-axis stage mechanism 35, the x-axis stage 51 and the y-axis stage 61 are clamped from the z-axis direction, and the x-axis stage 51 and the y-axis stage 61 are positioned in the x-axis direction and the y-axis direction. A misalignment prevention mechanism 80 is provided to prevent misalignment. The displacement prevention mechanism 80 is a clamp mechanism that can be switched between a clamped state in which the x-axis stage 51 and the y-axis stage 61 are clamped by a predetermined elastic clamping force, and a clamp-released state in which the elastic clamping force is reduced to a predetermined value. It is composed of

  The clamping mechanism of this example includes an x-axis stage 51 and a y-axis stage 61, a nut 81 arranged on the y-axis stage 61 side, a bolt 82 arranged on the other x-axis stage 51 side, A compressed coil spring 83 mounted between the bolt head 82a of the bolt 82 and the x-axis stage 51, and a manually operated bolt drive 84 for turning the bolt 82 are provided. The compression coil spring 83 is mounted in a compressed state between the bolt head portion 82 a and a spring receiver 85 disposed on the back surface of the x-axis stage 51. The nut 81 is fixed to a mechanism frame (not shown) mounted on the frame 34 (see FIG. 1).

  As shown in FIGS. 4 and 5, the bolt leg portion 82 b of the bolt 82 has through holes 53 and 63 formed in the x-axis stage 51 and the y-axis stage 61 and extending in the z-axis direction. It extends through in the z-axis direction and is screwed and fixed to the upper nut 81. The compression coil spring 83 is compressed by screwing a bolt, and the elastic clamping force that clamps the x-axis stage 51 and the y-axis stage 61 from the z-axis direction increases.

  Here, on the upper surface of the x-axis stage 51, an x-axis side slide surface 54 parallel to an orthogonal surface orthogonal to the z-axis direction is formed. On the back surface of the y-axis stage 61, a y-axis side slide surface 64 parallel to the orthogonal surface is formed. As shown in FIG. 3B, the x-axis side slide surface 54 and the y-axis side slide surface 64 are in surface contact in a slidable state from the z-axis direction.

  Since the x-axis stage 51 and the y-axis stage 61 slide in the surface contact state, even if a large load is applied to the z-axis stage mechanism 70, the x-axis stage 51 and the y-axis are stably provided in the x-axis direction and the y-axis direction. The stage 61 can be finely moved smoothly, and the fine movement of the discharge nozzle 11 in the x-axis direction and the y-axis direction can be performed stably and accurately.

  As shown in FIG. 4, the y-axis stage drive unit 62 of the y-axis stage mechanism 60 in this example is a drive y-axis screw 65 attached to a mechanism frame (not shown) so as to be able to project and retract in the x-axis direction. It has. The y-axis screw 65 is in contact with one arm of the L-shaped arm 66 from the x-axis direction, and the z-axis direction is fixed to the upper surface of the y-axis stage 61 by the movement of the y-axis screw 65. It pivots about a shaft 67 extending to the center. The other arm of the L-shaped arm 66 is in contact with one side surface of the connecting block 68 from the y-axis direction. The other side surface of the connecting block 68 is in contact with the y-axis stage 61 from the opposite side in the y-axis direction. The connection block 68 is fixed to the upper surface of the x-axis stage 51. The contact state of the y-axis screw 65, the L-shaped arm 66, the connection block 68, and the y-axis stage 61 is held by a spring mechanism (not shown).

  By adjusting the screwing amount of the y-axis screw 65, the position of the y-axis stage 61 in the y-axis direction can be finely adjusted. The range in which the position in the y-axis direction can be finely adjusted is determined by the gap size between the through hole 63 and the bolt leg portion 82b.

  As shown in FIG. 5, the x-axis stage drive unit 52 of the x-axis stage mechanism 50 includes an x-axis screw 55 that contacts the side surface of the x-axis stage 51 from the x-axis direction. The x-axis screw 55 is attached to a mechanism frame (not shown) so as to protrude and retract in the x-axis direction. By adjusting the screwing amount of the x-axis screw 55, the position of the x-axis stage 51 in the x-axis direction can be finely adjusted. The adjustment range in the x-axis direction is determined by the gap size between the through hole 53 and the bolt leg 82b.

The misalignment prevention mechanism 80 having this configuration moves the x-axis stage 51 and the y-axis stage 61 in the x-axis direction and the y-axis direction within a minute range within the gap between the through holes 53 and 63 and the bolt leg portion 82b. Both the stages 51 and 61 are clamped from the z-axis direction with a small elastic clamping force in a state in which micro movement is possible. When the bolt 82 is screwed in, the compression coil spring 83 is compressed, and the elastic clamping force for damping the x-axis stage 51 and the y-axis stage 61 from the z-axis direction increases, and the x-axis stage 51 and the y-axis stage 61 are moved in the x-axis direction. , And can be fixed so as not to move in the y-axis direction. When the bolt 82 is loosened by a predetermined amount, the elastic clamping force is reduced, and the x-axis stage 51 and the y-axis stage 61 return to a slidable state.

  Therefore, by applying a large elastic clamping force, it is possible to form a clamped state in which both stages 51 and 61 are fixed without being displaced. Further, even in the clamp release state, a predetermined elastic clamping force acts between the x-axis stage 51 and the y-axis stage 61 from the z-axis direction, so that it is possible to prevent these stages 51 and 61 from being displaced when the clamp is released. .

(Calculation of gap between discharge nozzle and substrate)
The control unit 40 of the liquid ejection apparatus 1 can calculate a gap (distance) between the surface of the substrate 2 and the ejection nozzle 11 when performing a liquid ejection operation on the substrate 2. In calculating the gap, first, the substrate 2 on the work table 3 and the discharge nozzle 11 of the nozzle unit 10 are confronted, and the discharge nozzle 11 and the objective optical system 21 are moved in the direction of the optical axis B and the central axis A. Position to the initial position. The initial position may be set in advance or may be a standby position after the end of the previous machining.

  FIG. 6 is an explanatory diagram of the gap calculation method, FIG. 6A is an explanatory diagram of the first focusing operation, and FIG. 6B is an explanatory diagram of the second focusing operation. In the distance measuring method, the first focusing operation for focusing the objective optical system 21 on the mirror image of the tip opening 11 a of the nozzle 11 without moving the nozzle 11 and the liquid ejection target site 2 a on the surface of the substrate 2 are focused. A second focusing operation is performed, and each focus position when each focusing operation is completed is determined based on the initial position of the objective optical system 21 and the adjustment amount of the focus position adjustment mechanism 32, and based on this, the gap is determined. D is calculated.

  As shown in FIG. 6A, since the nozzle 11 and the objective optical system 21 are arranged coaxially, the tip opening 11a of the nozzle 11 is projected on a thin mirror 4 placed on the substrate 2, and the mirror 4 A focusing operation (first focusing operation) is performed on the mirror image of the tip opening 11a shown in FIG. In this case, the focal position F1 of the objective optical system 21 when the focusing is completed is symmetrical with respect to the actual tip position F0 (the position of the tip opening 11a) of the nozzle 11 with respect to the mirror 4. It has become.

  On the other hand, as shown in FIG. 6B, since the surface of the substrate 2 can be directly observed by the objective optical system 21, a focusing operation (second focusing) is performed on the surface of the substrate 2 without using the mirror 4. Operation). Accordingly, the focal position F2 of the objective optical system 21 when the focusing operation is completed is the surface of the substrate 2 (liquid ejection target part 2a).

The control unit 40 performs these two focusing operations, and based on the initial position of the objective optical system 21 and the driving amount of the focal position adjusting mechanism 32 in each focusing operation, the coordinates of the focal positions F1 and F2 (objectives). The coordinates in the direction of the optical axis B of the optical system 21 are calculated. Based on the obtained focal positions F1 and F2 and the thickness d of the mirror 4 measured in advance, the gap D between the surface of the substrate 2 and the tip opening 11a of the nozzle 11 is expressed by the following equation (1 ). It should be noted that the result of each focusing operation is converted into the initial position of each part (objective lens, etc.) of the objective optical system 21 and the amount of movement by the focusing operation without converting the results of each focusing operation into the coordinate values of the focal positions F1, F2. Based on this, the gap D may be calculated.
D = F1-F2 + 2d (1)

In the example of FIG. 6A, the mirror 4 is overlapped on the substrate 2 and the focal position F1 is measured. However, the mirror 4 having the same thickness as the substrate 2 is prepared, and the substrate 2 is attached to the mirror 4. The focal position F1 can also be obtained by exchanging with the above. In this case, the gap D can be calculated by the following equation (2).
D = F1-F2 (2)

  Based on the calculated gap D, the control unit 40 can determine whether or not the position of the nozzle 11 needs to be adjusted, that is, whether or not the gap between the tip opening 11 a of the nozzle 11 and the surface of the substrate 2 needs to be adjusted. For example, a comparison determination between a preset reference gap and the calculated gap D is performed. If the reference gap and the gap D do not match, the triaxial stage mechanism 35 is driven and controlled so that the gap D matches the reference gap.

(Another example of gap measurement method)
Next, in the above embodiment, in order to calculate the gap between the tip opening 11 a of the nozzle 11 and the surface of the substrate 2 based on the result of focusing on the mirror image reflected on the mirror 4, the mirror 4 in advance. It is necessary to determine the thickness d of the mirror 4 or to prepare the mirror 4 having the same thickness as the substrate 2. However, if the following method is used, the thickness of the mirror 4 and the thickness of the substrate 2 are unknown. Even so, the gap D between the nozzle tip and the surface of the substrate 2 can be accurately calculated.

  FIG. 7 is an explanatory diagram showing a gap calculation method in this case. In this gap calculation method, a patterned mirror 4A having a predetermined pattern C formed on the surface is used. For example, a vapor deposition film having a mirror surface is formed on the surface of the plate material, and only the pattern C portion is peeled off.

  7A is an explanatory diagram of the third focusing operation, FIG. 7B is an explanatory diagram of the first focusing operation, FIG. 7C is an explanatory diagram of the second focusing operation, and FIG. (D) is a top view of a mirror with a pattern. Since the first and second focusing operations shown in FIGS. 7B and 7C can be performed in the same manner as in the case of FIGS. 6A and 6B in the above embodiment, the description thereof is omitted. To do.

In the third focusing operation shown in FIG. 7A, focusing is performed on the pattern C that appears on the surface of the patterned mirror 4A. The control unit 40 performs these three focusing operations, and coordinates of the focal positions F3, F1, and F2 based on the initial position of the objective optical system 21 and the driving amount of the focal position adjusting mechanism 32 in each focusing operation. (Coordinates in the direction of the optical axis B of the objective optical system 21) are calculated. Based on the focal positions F3 and F1 obtained by the third and first focusing operations, the gap D ′ between the surface of the patterned mirror 4A and the tip opening 11a of the nozzle 11 is calculated by the following equation (3). To do.
D '= F1-F3 (3)

Subsequently, the control unit 40 sets the gap D between the surface of the substrate 2 and the tip opening 11a of the nozzle 11 based on the obtained gap D ′ and the focal position F2 obtained by the second focusing operation. It calculates with the following formula | equation (4) (5). Expression (5) is obtained by substituting the right term of Expression (3) into D ′ of Expression (4).
D = D '+ (F2-F3) (4)
D = F1 + F2-2F3 (5)

  In the example shown in FIGS. 7A and 7B, the patterned mirror 4A is placed on the substrate 2 placed on the work table 3, and the focal point for obtaining the focal positions F1 and F3 in this state. However, the patterned mirror 4A is placed directly on the work table 3 without placing the substrate 2, and the first and third focusing are performed. Thereafter, the patterned mirror 4A is placed on the substrate 2. Alternatively, the second focusing may be performed.

(Modification example)
(1) In the above embodiment, the work table 3 is fixed, and the nozzle unit 10 is moved in the triaxial direction by the triaxial stage mechanism 35. Conversely, the nozzle unit 10 can be adjusted only in the z-axis direction by the z-axis stage mechanism 70, and the work table 3 can be adjusted by the stage mechanism including the x-axis stage mechanism 50, the y-axis stage mechanism 60, and the misalignment prevention mechanism 80. It is also possible to move in two axial directions, the x-axis direction and the y-axis direction.

(2) In the observation optical unit 20 in the above-described embodiment, the illumination light is irradiated on the optical path from the objective optical system 21 toward the CCD camera unit 23 toward the observation object (substrate 2 or the like) by the objective optical system 21. It can be used as an optical path for

  For example, a light source and a member for allowing light from the light source to enter the optical path can be mounted on the CCD camera unit 23, and illumination light can be irradiated during photographing. Or a half mirror etc. can be provided in the middle of this optical path, and the illumination light from another light source can be merged.

  Further, the process light can be irradiated using this optical path. For example, the substrate 2 can be irradiated with infrared light for drying the liquid material, or can be irradiated with UV light for curing the UV curable liquid material. Furthermore, various measurement lights including the above-described autofocus light can be irradiated toward the substrate 2.

(3) In the above embodiment, a program for automatically analyzing an image photographed by the CCD camera unit 23 is stored in the control unit 40, and the nozzle unit 10, the focus position adjusting mechanism 32, and the three axes are based on the analysis result. The stage mechanism 35 and the like can be controlled. Further, the curing state and drying state of the liquid material by the process light can be determined by image analysis, and the irradiation intensity and irradiation time of the process light can be automatically controlled based on the determination result.

(Other embodiments)
The above embodiment is an example in which the working device of the present invention is applied to a liquid ejection device. The present invention can also be applied to a processing apparatus that performs operations other than liquid discharge, for example, fine processing such as fine groove processing or drilling. Further, the present invention can be applied to an inspection apparatus provided with a fine probe for inspecting an energized state (disconnected state) of a fine wiring pattern on the substrate surface.

DESCRIPTION OF SYMBOLS 1 Liquid discharge apparatus 2 Substrate 2a Discharge object part 3 Work stand 3a Mounting surface 4 Mirror 4A Patterned mirror 10 Nozzle unit 11 Liquid discharge nozzle (nozzle)
20 Observation optical system 21 Objective optical system 22 Imaging optical system 23 CCD camera unit 30 Support mechanism 31 Main frame 32 Focus position adjustment mechanism 33 Guide shaft 34 Elevating frame 35 Triaxial stage mechanism 40 Control unit 50 X axis stage mechanism 51 x Axis stage 52 x-axis stage drive unit 53 through-hole 54 x-axis side slide surface 55 x-axis screw 60 y-axis stage mechanism 61 y-axis stage 62 y-axis stage drive unit 63 through-hole 64 y-axis side slide surface 65 y-axis screw 66 L-type arm 67 Shaft 68 Connecting block 70 z-axis stage mechanism 71 z-axis stage 72 z-axis slide guide 73 z-axis drive unit 80 misalignment prevention mechanism 81 nut 82 bolt 82a bolt head 82b bolt leg 83 compression coil spring 84 bolt Drive unit 85 Spring receiver A Center axis B Optical axis C Pattern D 'Gap (distance)
F0 Tip position F1, F2, F3 Focus position d Mirror thickness

Claims (7)

A work unit with work tools for performing predetermined work;
A work table on which a work object is placed by the work tool;
An observation optical system for magnifying and observing a work target portion that is disposed opposite to a tip of the work tool in the work target placed on the work table;
A focal position adjustment mechanism for adjusting the focal position of the observation optical system by moving the objective optical system of the observation optical system in the optical axis direction;
When the optical axis direction of the objective optical system is the z-axis direction and the two orthogonal directions on the orthogonal plane orthogonal to the z-axis direction are the x-axis direction and the y-axis direction, the work tool is used as the work object. In contrast, a triaxial stage mechanism for relative movement in the x-axis direction, the y-axis direction, and the z-axis direction;
Have
The working tool is a working device with an observation optical system arranged coaxially with respect to the objective optical system between the work table and the objective optical system. In claim 1,
The three-axis stage mechanism is
A z-axis stage mechanism for moving a z-axis stage on which the working tool is mounted in the z-axis direction;
A y-axis stage mechanism that moves a y-axis stage on which the z-axis stage mechanism is mounted in the y-axis direction;
An x-axis stage mechanism for moving the x-axis stage on which the y-axis stage is mounted in the x-axis direction;
A displacement prevention mechanism that clamps the x-axis stage and the y-axis stage from the z-axis direction and prevents the displacement of the x-axis stage and the y-axis stage in the x-axis direction and the y-axis direction;
A working device with an optical system for observation. In claim 2,
The x-axis stage includes an x-axis side slide surface parallel to an orthogonal plane orthogonal to the z-axis,
The y-axis stage includes a y-axis side slide surface parallel to the orthogonal plane,
The work apparatus with an observation optical system in which the x-axis side slide surface and the y-axis side slide surface are in surface contact with each other in a slidable state from the z-axis direction. In claim 3,
The positional deviation prevention mechanism is
A clamp mechanism capable of switching between a clamped state in which the x-axis stage and the y-axis stage are clamped with a predetermined elastic clamping force, and a clamp release state in which the elastic clamping force is reduced to a predetermined value;
The clamping mechanism is
A through hole extending through each of the x-axis stage and the y-axis stage in the z-axis direction;
The x-axis stage and the y-axis stage are sandwiched between the nut disposed on one side thereof, and disposed on the other side so as to pass through the through hole with play and screwed into the nut. With the bolts
Compression that is mounted between the bolt head of the bolt and the x-axis stage or the y-axis stage located on the side where the bolt is inserted, and is compressed when the bolt is screwed to increase the elastic clamping force. A coil spring;
A working device with an optical system for observation. In any one of claims 1 to 4,
Observation having an irradiation unit for irradiating at least one of illumination light, measurement light, and process light with respect to a work target portion of the work target using an optical path of the objective optical system Working system with optical system. In any one of claims 1 to 5,
A control unit that controls driving of the work unit, the focus position adjustment mechanism, and the three-axis stage mechanism;
The controller is
A function of performing a first focusing operation for driving and controlling the focal position adjusting mechanism to align the focal position of the objective optical system with the tip of the working tool or a mirror image thereof;
A function of performing a second focusing operation for driving and controlling the focal position adjusting mechanism to align the focal position of the objective optical system with the work target portion of the work target;
A distance calculating function for calculating a distance from the tip of the working tool to the work target site based on the results of the first and second focusing operations; and
An observation optical having a tool position adjustment function for adjusting the relative position of the work tool with respect to the work object in the z-axis direction by driving and controlling the triaxial stage mechanism based on the calculated distance. Work equipment with system. In claim 6,
Having a mirror disposed opposite the tip of the working tool;
The controller has a function of driving and controlling the focal position adjusting mechanism to perform a third focusing operation for aligning the focal position of the objective optical system with a predetermined pattern formed on the surface of the mirror. ,
The function of performing the first focusing operation is a function of performing an operation of aligning the focal position of the objective optical system with a mirror image of the tip of the working tool reflected on the mirror.
The distance calculating function is a function for calculating the distance from the tip of the working tool to the work target site based on the execution results of the first, second, and third focusing operations. Work equipment with.