JP2017055131A - 厚い金属層を有する半導体発光デバイス - Google Patents
厚い金属層を有する半導体発光デバイス Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 57
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- 238000000034 method Methods 0.000 claims description 39
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- 229910052802 copper Inorganic materials 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 158
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- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 229920001296 polysiloxane Polymers 0.000 description 6
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
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- 239000012790 adhesive layer Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
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- 238000000227 grinding Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002096 quantum dot Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
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- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
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- 238000005229 chemical vapour deposition Methods 0.000 description 1
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- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
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- 238000003379 elimination reaction Methods 0.000 description 1
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- 239000000945 filler Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
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- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- 230000003287 optical effect Effects 0.000 description 1
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- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910002059 quaternary alloy Inorganic materials 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
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- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0066—Processes relating to semiconductor body packages relating to arrangements for conducting electric current to or from the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
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Abstract
【解決手段】半導体構造体12は、n型領域とp型領域との間に挟まれた発光層と、n型領域に直接接触する第1金属コンタクト及びp型領域に直接接触する第2金属コンタクトとを含む。第1及び第2金属コンタクト上には、第1金属層26及び第2金属層28がそれぞれ配置される。第1及び第2金属層は、半導体構造体を機械的に支持するのに十分な厚さを有する。第1又は第2金属層の側壁は、立体形体を有する。
【選択図】図4
Description
Claims (19)
- n型領域とp型領域との間に挟まれた発光層を含む半導体構造体と、
前記n型領域と直接接触する第1金属コンタクト、及び前記p型領域と直接接触する第2金属コンタクトと、
前記第1及び第2金属コンタクト上にそれぞれ配置された第1及び第2金属層と
を有し、
前記第1及び第2金属層は、前記半導体構造体を機械的に支持するのに十分な厚さを有し、前記第2金属層のエッジが、前記半導体構造体のエッジと揃えられ、前記第2金属層は、前記第1金属層を取り囲んでいる、
デバイス。 - 前記第1金属層と前記第2金属層との間に配置され且つ前記第2金属層を取り囲む絶縁層、を更に有する請求項1に記載のデバイス。
- 前記第1及び第2金属層のうちの一方の側壁が、前記絶縁層を固定する立体形体を有する、請求項2に記載のデバイス。
- 前記立体形体は、それ以外は平坦な側壁から突出した凸部を含む、請求項3に記載のデバイス。
- 前記立体形体は、それ以外は平坦な側壁内に形成された凹部を含む、請求項3に記載のデバイス。
- 前記立体形体は、一連の凸部を含む、請求項3に記載のデバイス。
- 前記絶縁層は、前記立体形体、前記立体形体よりも上の前記側壁の領域、及び前記立体形体よりも下の前記側壁の領域と直接接触するよう配置された、電気絶縁体の一様な連続層を有する、請求項3に記載のデバイス。
- 前記第1及び第2金属層は銅層である、請求項1に記載のデバイス。
- 前記第1及び第2金属層は50μmよりも厚い、請求項1に記載のデバイス。
- 半導体デバイスウェハを提供するステップであって、前記ウェハは、
n型領域とp型領域との間に挟まれた発光層を含む半導体構造体と、
半導体デバイスごとの第1及び第2金属コンタクトであって、各第1金属コンタクトは前記n型領域と直接接触し、各第2金属コンタクトは前記p型領域と直接接触する、第1及び第2金属コンタクトとを含む、ステップと、
前記ウェハ上の各半導体デバイスの前記第1及び第2金属コンタクト上にそれぞれ第1及び第2金属層を形成するステップであって、前記第1及び第2金属層は、後の処理中に前記半導体構造体を支持するのに十分な厚さを有し、前記第2金属層のエッジが、各半導体デバイスの前記半導体構造体のエッジと揃えられ、各半導体デバイスに関し前記第2金属層が前記第1金属層を取り囲む、ステップと
を含む、方法。 - 前記第1及び第2金属層を形成するステップの後に、前記第1金属層と前記第2金属層との間の空間を充填する電気絶縁層を形成するステップ、を更に含む請求項10に記載の方法。
- 前記第1及び第2金属層を形成するステップは、前記第1及び第2金属層のうちの一方の側壁に立体形体を形成するステップを含む、請求項11に記載の方法。
- 前記第1及び第2金属層を形成する前記ステップは、前記ウェハ上に前記第1及び第2金属層をめっきするステップを含む、請求項12に記載の方法。
- 前記立体形体を形成する前記ステップは、
前記第1及び第2金属層の第1部分をめっきするステップと、
前記第1及び第2金属層の前記第1部分の上に、前記第1部分とは異なる水平方向の広がりを有する前記第1及び第2金属層の第2部分をめっきするステップと、
前記第1及び第2金属層の前記第2部分の上に、前記第2部分とは異なる水平方向の広がりを有する前記第1及び第2金属層の第3部分をめっきするステップと
を含む、請求項13に記載の方法。 - 前記第1部分をめっきした後、前記第1及び第2金属層の前記第1部分上に前記電気絶縁層の第1部分を成型するステップと、
前記第2部分をめっきした後、前記第1及び第2金属層の前記第2部分上に前記電気絶縁層の第2部分を成型するステップと、
前記第3部分をめっきした後、前記第1及び第2金属層の前記第3部分上に前記電気絶縁層の第3部分を成型するステップと
をさらに含む、請求項14に記載の方法。 - 前記電気絶縁層は、第1電気絶縁層であり、
当該方法はさらに、
前記ウェハ上に第2電気絶縁層を設けるステップと、
前記第2電気絶縁層内に、前記第1金属層と位置合わせされた第1開口部、及び前記第2金属層と位置合わせされた第2開口部を形成するステップと、
前記第1開口部と位置合わせされた第1金属接合パッド、及び前記第2開口部と位置合わせされた第2金属接合パッドを形成するステップと
を含む、請求項11に記載の方法。 - 前記半導体構造体は成長基板上に成長され、当該方法はさらに、前記第1及び第2金属層を形成する前記ステップの後に前記成長基板を除去するステップを含む、請求項10に記載の方法。
- 前記第1及び第2金属層を形成する前記ステップの後に、前記ウェハを個別の半導体デバイス又は半導体デバイスのグループにダイシングするステップをさらに含む、請求項10に記載の方法。
- 前記第1及び第2金属層は50μmよりも厚い、請求項10に記載の方法。
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US9324927B2 (en) | 2011-12-08 | 2016-04-26 | Koninklijke Philips N.V. | Semiconductor light emitting device with thick metal layers |
US9608016B2 (en) * | 2012-05-17 | 2017-03-28 | Koninklijke Philips N.V. | Method of separating a wafer of semiconductor devices |
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EP2748866B1 (en) | 2019-03-27 |
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EP2748866A1 (en) | 2014-07-02 |
JP6193254B2 (ja) | 2017-09-06 |
TW201332168A (zh) | 2013-08-01 |
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US9324927B2 (en) | 2016-04-26 |
CN103959486A (zh) | 2014-07-30 |
US20140339597A1 (en) | 2014-11-20 |
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US9484513B2 (en) | 2016-11-01 |
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