JP2017036171A - High intensity molding for manufacturing opaque silica glass - Google Patents
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Description
本発明は、赤外光遮光性に優れる高純度不透明シリカガラスを製造するのに適した物性を有する成形体及びその製造方法に関するものである。 The present invention relates to a molded article having physical properties suitable for producing a high-purity opaque silica glass excellent in infrared light shielding properties and a method for producing the same.
不透明シリカガラスは熱遮断性を要する用途に使用される。熱遮断性は赤外光の遮光性と関係があり、遮光性が高い不透明シリカガラスほど熱遮断性に優れている。 Opaque silica glass is used for applications that require heat barrier properties. The heat shielding property is related to the infrared light shielding property, and an opaque silica glass having a higher light shielding property is superior in heat shielding property.
従来、このような不透明シリカガラスの製造方法としては、結晶性シリカまたは非結晶性シリカに窒化珪素等の発泡剤を添加して溶融する方法(例えば、特許文献1、2参照)などが知られている。しかしながら、このような製造方法で製造された不透明シリカガラスでは、発泡剤が気化して気孔を形成するため気孔の平均径が大きく、実用に耐える強度を持つものでは気孔の含有個数密度が低くなり、赤外光の遮光性が低下するという問題があった。
Conventionally, as a method for producing such opaque silica glass, a method in which a foaming agent such as silicon nitride is added to crystalline silica or amorphous silica and melted (for example, see
本発明は、赤外光遮光性に優れる不透明シリカガラスを作製するための非結晶性酸化ケイ素粉末と無機カーボン粉末の混合粉末を加圧成形してなる成形体に関するもので、不純物混入を最小限に抑えた上で、成形体強度を大幅に向上した成形体を提供することにある。 The present invention relates to a molded body obtained by pressure-molding a mixed powder of an amorphous silicon oxide powder and an inorganic carbon powder for producing an opaque silica glass excellent in infrared light shielding properties, and mixing impurities is minimized. The object is to provide a molded body with significantly improved strength of the molded body.
本発明者らは、実質的に非結晶性酸化ケイ素粉末、無機カーボン粉末及び所定量の水のみを混合した後、これを加圧成形することで、良好な性質を有する不透明シリカガラスを作製可能な成形体を得ることができることを見出し、本発明を完成するに至った。 The present inventors can produce an opaque silica glass having good properties by mixing substantially non-crystalline silicon oxide powder, inorganic carbon powder and a predetermined amount of water, and then pressure-molding the mixture. The present inventors have found that a molded article can be obtained, and have completed the present invention.
すなわち、本発明は、非結晶性酸化ケイ素粉末、無機カーボン粉末及び水から実質的になる不透明シリカガラス用成形体であって、非結晶性酸化ケイ素粉末と無機カーボン粉末の合計重量に対する水の含有量が3〜12重量%であることを特徴とする。 That is, the present invention is a molded object for opaque silica glass substantially composed of an amorphous silicon oxide powder, an inorganic carbon powder and water, and contains water relative to the total weight of the amorphous silicon oxide powder and the inorganic carbon powder. The amount is 3 to 12% by weight.
以下、本発明をさらに詳しく説明する。 Hereinafter, the present invention will be described in more detail.
本発明の成形体は、電気炉等を用いて焼成することで良好な性質を有する不透明シリカガラスを作製するために用いられる。焼成加熱の際に成形体中に含まれる水分が蒸発除去され、さらに無機カーボン粉末は酸化燃焼することで消失する。その後、非結晶性酸化ケイ素粉末は焼結現象により結合が進み、一体化したガラスに変化するが、無機カーボン粉末のあった場所は空間が残ることとなり、ガラスの中に無数の気孔が生じる。その結果、ガラスの中に無数の気孔が分散した構造を有する不透明シリカガラスとなる。 The molded body of the present invention is used for producing an opaque silica glass having good properties by firing using an electric furnace or the like. During the baking and heating, water contained in the molded body is removed by evaporation, and the inorganic carbon powder disappears by oxidative combustion. Thereafter, the bonding of the amorphous silicon oxide powder proceeds due to the sintering phenomenon and changes to an integrated glass. However, a space remains in the place where the inorganic carbon powder was present, and innumerable pores are generated in the glass. As a result, an opaque silica glass having a structure in which countless pores are dispersed in the glass is obtained.
本発明の成形体は、非結晶性酸化ケイ素粉末、無機カーボン粉末及び水から実質的になり、有機バインダーを含まない。有機バインダーは含有している無機不純物が問題となるだけでなく、焼成前に脱バインダー処理を行う必要があるため、余分な工程が1つ必要となってしまう。 The molded body of the present invention consists essentially of amorphous silicon oxide powder, inorganic carbon powder and water, and does not contain an organic binder. The organic binder not only has a problem with the contained inorganic impurities, but also needs to be debindered before firing, so that one extra step is required.
また、成形体中のNa,Mg,Al,K,Ca,Cr,Fe,Cu,Znの各金属不純物量は10ppm以下であることが好ましく、5ppm以下であることがより好ましい。本成形体から作製される不透明シリカガラスが半導体製造等に用いられる場合、不純物の混入を防がなければならないためである。更に、前述の金属不純物の混入量が増えると、本成形体を焼成する際に、シリカガラス中にクリストバライトが発生し、クラックの原因となるおそれがある。 Further, the amount of each metal impurity of Na, Mg, Al, K, Ca, Cr, Fe, Cu, and Zn in the molded body is preferably 10 ppm or less, and more preferably 5 ppm or less. This is because when the opaque silica glass produced from the molded body is used for semiconductor production or the like, contamination of impurities must be prevented. Furthermore, when the amount of the above-mentioned metal impurities is increased, cristobalite is generated in the silica glass when the molded body is fired, which may cause cracks.
本発明の成形体は、非結晶性酸化ケイ素粉末と無機カーボン粉末の合計重量に対する水の含有量が3〜12重量%であることを特徴とする。水を添加することで、水を添加しない場合に比べ成形体強度が大幅に向上する。これは非結晶性酸化ケイ素粉末と無機カーボン粉末の表面を水が覆うことで、粉末同士が水を介して結合しやすくなるためと考えられる。水の添加量が3重量%よりも少ないと、成形体強度の増加量が小さくなり、好ましくない。また、12重量%以上の水を添加しても、成形体強度増加は殆ど見込めないか、逆に成形体強度が低下する傾向が認められる上、粉末の流動性が悪化するだけで利点がない。 The molded body of the present invention is characterized in that the water content is 3 to 12% by weight based on the total weight of the amorphous silicon oxide powder and the inorganic carbon powder. By adding water, the strength of the molded body is greatly improved as compared with the case where water is not added. This is presumably because the surfaces of the amorphous silicon oxide powder and the inorganic carbon powder are covered with water, so that the powders are easily bonded via water. If the amount of water added is less than 3% by weight, the amount of increase in the strength of the molded product becomes small, which is not preferable. Further, even when 12% by weight or more of water is added, there is almost no increase in the strength of the molded body, or on the contrary, there is a tendency that the strength of the molded body is decreased, and there is no advantage that only the fluidity of the powder is deteriorated. .
次に、本発明の製造方法について説明する。 Next, the manufacturing method of this invention is demonstrated.
本発明の製造方法は、非結晶性酸化ケイ素粉末と無機カーボン粉末を混合し、得られた混合粉末を撹拌する際に、水をスプレー噴霧により添加することを特徴とする。 The production method of the present invention is characterized in that when the amorphous silicon oxide powder and the inorganic carbon powder are mixed and the obtained mixed powder is stirred, water is added by spraying.
原料粉末である非結晶性酸化ケイ素粉末は、その平均粒径が20μm以下かつ比表面積が1m2/g以上であることが好ましい。平均粒径が20μmより大きい場合や、比表面積が1m2/gより小さい場合、焼結に高温・長時間を要するため、クリストバライト発生によるクラック発生の危険性増加の観点から好ましくない。各種製造法で作製された非結晶性酸化ケイ素粉末は、ジェットミル、ボールミル、ビーズミル等で粉砕、分級することで上記粒径に調整することができる。 The amorphous silicon oxide powder as the raw material powder preferably has an average particle size of 20 μm or less and a specific surface area of 1 m 2 / g or more. When the average particle size is larger than 20 μm or the specific surface area is smaller than 1 m 2 / g, sintering requires a high temperature and a long time, which is not preferable from the viewpoint of increasing the risk of cracking due to the occurrence of cristobalite. Amorphous silicon oxide powder produced by various production methods can be adjusted to the above particle size by pulverization and classification with a jet mill, ball mill, bead mill or the like.
原料粉末である無機カーボン粉末は、その平均粒径が5〜40μmであることが好ましく、非結晶性酸化ケイ素粉末との体積比で0.04〜0.35であることが好ましい。無機カーボン粉末の添加量が体積比で0.04未満だと、不透明シリカガラスに含まれる気孔量が少なくなり赤外光の遮光性が低下するため好ましくない。一方、体積比で0.35を超えると、不透明シリカガラスの密度が低くなりすぎるため好ましくない。無機カーボン粉末としてはグラファイトなどが例示できる。 The inorganic carbon powder that is a raw material powder preferably has an average particle size of 5 to 40 μm, and preferably 0.04 to 0.35 in volume ratio with the amorphous silicon oxide powder. If the added amount of the inorganic carbon powder is less than 0.04 in volume ratio, the amount of pores contained in the opaque silica glass is reduced, and the light shielding property of infrared light is lowered, which is not preferable. On the other hand, if the volume ratio exceeds 0.35, the density of the opaque silica glass becomes too low, which is not preferable. Examples of the inorganic carbon powder include graphite.
上述した原料粉末を混合し、得られた混合粉末に非結晶性酸化ケイ素粉末と無機カーボン粉末の合計重量に対して3〜12重量%の水を混合粉末の撹拌作業中にスプレー噴霧により添加する。 The above-mentioned raw material powder is mixed, and 3 to 12% by weight of water based on the total weight of the amorphous silicon oxide powder and the inorganic carbon powder is added to the obtained mixed powder by spraying during the mixed powder stirring operation. .
以下、混合粉末への水の添加方法について図1を用いて説明する。樹脂製容器1に混合粉末2と樹脂製ボール3を入れ、混合粉末2がこぼれないように容器1を回転攪拌しつつ、スプレーノズル4から噴霧で水を添加する。容器から混合粉末がこぼれないように、容器を斜めに傾けた状態で回転攪拌するか、中央部に最小限の大きさの穴を開けた蓋を容器に取り付け、その穴からスプレーノズルを挿入する方法が好ましい。なお、容器は金属製容器に樹脂コーティング等を行ったものであっても問題はなく、樹脂製ボールは特に鉄芯入りのナイロンボールが望ましい。
Hereinafter, a method of adding water to the mixed powder will be described with reference to FIG. The mixed
また、スプレーノズルは極力液滴を小さくできるものが望ましい。液滴が大きい場合、混合粉末に均一に水を添加することが難しいだけでなく、液滴の着地点で混合粉末が水により凝集し、混合粉末中にダマが生じ、最終的には成形体が不均質になる恐れがある。 Further, it is desirable that the spray nozzle can make droplets as small as possible. When the droplets are large, not only is it difficult to uniformly add water to the mixed powder, but the mixed powder agglomerates with water at the landing point of the droplets, causing lumps in the mixed powder, and finally the compact May become inhomogeneous.
このようにして作製した水添加後の混合粉末は、プレス成形やCIP成形により強度の高い成形体を得ることができる。 Thus, the mixed powder after water addition produced can obtain a molded object with high strength by press molding or CIP molding.
本発明は、赤外光遮光性に優れる不透明シリカガラスを作製するための成形体に関するもので、不純物混入を最小限に抑えた上で、成形体強度を大幅に向上することができる。 The present invention relates to a molded body for producing an opaque silica glass excellent in infrared light shielding properties, and can significantly improve the molded body strength while minimizing contamination of impurities.
以下に実施例によって本発明を具体的に説明するが、本発明は係る実施例に限定されるものではない。 EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to such examples.
実施例
非結晶性酸化ケイ素粉末として、合成非晶質シリカ粉末(日本化成株式会社製、商品名「MKCシリカPS200」)を、その平均粒径が6μmとなるようにジェットミル粉砕したものを用意した。この時、非結晶性酸化ケイ素粉末の比表面積は2.1 m2/gであった。次に、無機カーボン粉末として、平均粒径18μmの球状グラファイト粉末(日本カーボン株式会社製、商品名「ニカビーズ」)を用意し、非結晶性酸化ケイ素粉末に対する無機カーボン粉末の体積比が0.1になるように配合し、混合粉を作製した。
Example As an amorphous silicon oxide powder, a synthetic amorphous silica powder (manufactured by Nippon Kasei Co., Ltd., trade name “MKC silica PS200”) prepared by jet mill pulverization so as to have an average particle diameter of 6 μm is prepared. did. At this time, the specific surface area of the amorphous silicon oxide powder was 2.1 m 2 / g. Next, spherical graphite powder having an average particle diameter of 18 μm (trade name “Nikabeads” manufactured by Nippon Carbon Co., Ltd.) is prepared as the inorganic carbon powder, and the volume ratio of the inorganic carbon powder to the amorphous silicon oxide powder is 0.1. Were mixed to prepare a mixed powder.
次に、10Lナイロンポッドに前記混合粉2.0kg、鉄芯入りナイロンボール 1.4kgを入れ、ナイロンポッドを回転撹拌しながら、ポッド内部にスプレーを用いて純水を噴霧した。水の添加量は、混合粉末重量に対し3、6、8、12%となるよう調製した。 Next, 2.0 kg of the mixed powder and 1.4 kg of iron ball-containing nylon balls were placed in a 10 L nylon pod, and pure water was sprayed into the pod using a spray while rotating and stirring the nylon pod. The amount of water added was adjusted to 3, 6, 8, and 12% based on the weight of the mixed powder.
次のこの粉末を、内径φ22mmの一軸プレス用金型に5〜6g投入し、成形圧20MPaにてプレス成型を行い、高さ10mm前後の円柱状の成形体を3個ずつ作製した。次に、成形体の圧潰荷重測定を以下の手順で行った。 Next, 5-6 g of this powder was put into a uniaxial pressing die having an inner diameter of φ22 mm, and press molding was performed at a molding pressure of 20 MPa to produce three cylindrical molded bodies each having a height of around 10 mm. Next, the crush load measurement of the molded body was performed according to the following procedure.
抗折試験機AG−Xplus(島津社製)に500Nロードセルを取り付け、測定する成形体の円柱側面を下にして抗折試験機に置き、同じく円柱側面をφ35mm圧子で上から押し(圧子降下速度0.14mm/s)、成形体が破壊する際の荷重を測定した。結果を図2に示す。 Attach a 500N load cell to the bending test machine AG-Xplus (manufactured by Shimadzu Corporation), place it on the bending test machine with the cylindrical side of the molding to be measured facing down, and push the cylindrical side from above with a φ35mm indenter (indenter lowering speed) 0.14 mm / s), and the load when the molded body breaks was measured. The results are shown in FIG.
次に、前述の方法で作製した成形体の表面をSiC紙やすりで軽く除去した後、成形体をICP−AESにより分析したところ、Na,Mg,Al,K,Ca,Cr,Fe,Cu,Znの各金属不純物量は全て1ppm以下であった。 Next, after lightly removing the surface of the molded body produced by the above-described method with a SiC sandpaper, the molded body was analyzed by ICP-AES. As a result, Na, Mg, Al, K, Ca, Cr, Fe, Cu, The amount of each metal impurity of Zn was 1 ppm or less.
比較例
水の添加量を、混合粉末重量に対し0%、1%、18%となるよう調製した以外は実施例と同様の方法で成形体を作製した。次に、成形体の圧潰荷重測定を実施例と同様の方法で行った。結果を図2に示す。水の添加量が18%のものは、スラリーの兆候が見え始め、回転撹拌やプレス型への充填が極めて困難であった。
Comparative Example A molded body was produced in the same manner as in Example, except that the amount of water added was 0%, 1%, and 18% with respect to the mixed powder weight. Next, the crush load measurement of the molded body was performed in the same manner as in the example. The results are shown in FIG. When the amount of water added was 18%, signs of slurry began to appear, and it was extremely difficult to perform rotary stirring and filling into a press die.
本発明は、赤外光遮光性に優れる高純度不透明シリカガラスを作製するために技術であり、非結晶性酸化ケイ素粉末と無機カーボン粉末の混合粉末からなる成形体強度を大幅に向上した成形体を得ることで、安定的に不透明シリカガラスを作製することができる。 The present invention is a technique for producing a high-purity opaque silica glass excellent in infrared light shielding properties, and a molded body comprising a mixed powder of an amorphous silicon oxide powder and an inorganic carbon powder that has greatly improved strength. Thus, an opaque silica glass can be stably produced.
1.樹脂製容器
2.混合粉末
3.脂製ボール
4.スプレーノズル
1.
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JP2004500299A (en) * | 1999-12-22 | 2004-01-08 | ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフト | Method for producing opaque quartz glass, SiO2 particles suitable for the method, and opaque quartz glass article |
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JP2013116847A (en) * | 2011-11-04 | 2013-06-13 | Covalent Materials Corp | Crucible of silica sintered compact and method for producing the same, and crucible of silica sintered compact to be used for pulling single crystal |
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JPH08143329A (en) * | 1993-10-08 | 1996-06-04 | Tosoh Corp | High purity opaque quartz glass, its production and its use |
JPH0912325A (en) * | 1995-06-29 | 1997-01-14 | Nitto Chem Ind Co Ltd | High-purity opaque quartz glass and its production as well as its application |
JP2004500299A (en) * | 1999-12-22 | 2004-01-08 | ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフト | Method for producing opaque quartz glass, SiO2 particles suitable for the method, and opaque quartz glass article |
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JP2013095651A (en) * | 2011-11-04 | 2013-05-20 | Covalent Materials Corp | Silica sintered body crucible |
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JP2013116847A (en) * | 2011-11-04 | 2013-06-13 | Covalent Materials Corp | Crucible of silica sintered compact and method for producing the same, and crucible of silica sintered compact to be used for pulling single crystal |
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