JP2017010934A5

JP2017010934A5 -

Info

Publication number: JP2017010934A5
Application number: JP2016119642A
Authority: JP
Filing date: 2016-06-16
Publication date: 2019-07-04
Anticipated expiration: 2036-06-16

Description

さらに、柱体の外側に、酸素貯蔵器ならびにオゾン発生器が配置されており、このオゾン発生器を介して、酸素貯蔵器からオゾンが光解離可能なガスとして発生可能でありかつ柱体にガス供給システムを介して供給可能であり、その際に光源から放出されるビームとオゾンの間の相互作用により、酸素ラジカルが光解離生成物として結果として生じ、これらの光解離生成物が汚染物と反応してポンプで排出可能な分解生成物になることが可能である。 Furthermore, an oxygen storage as well as an ozone generator are arranged outside the column, through which ozone can be generated as a photocleavable gas from the oxygen storage and through the ozone generator, and the gas in the column can be generated. The interaction between the beam emitted from the light source and the ozone, which can be supplied via the supply system, results in oxygen radicals as photodissociation products, which are associated with contaminants and It is possible to react and become a pumpable dischargeable decomposition product.

荷電粒子ビーム光学系を介して露光モードにおいて、真空試料室内で所望のパターンを露光するために、荷電粒子ビーム光学系を有する柱体を用いて荷電粒子ビーム機器を運転するための本発明による方法は、
−柱体および／または真空試料室を洗浄するために、洗浄モードにおいて、光解離可能なガスを備えた調節可能なガス流が、ガス供給システムを介して柱体および／または真空試料室に供給され、
−個々の光源がそれと接続された制御ユニットを介して時間上選択的にスイッチを入り切りされることにより、
洗浄モードにおいて、供給されるガスが、柱体および／または真空試料室内で空間的に分散された状態で配置された複数の光源を用いて光解離されることが意図される。 Method according to the invention for operating a charged particle beam instrument using a column with charged particle beam optics to expose a desired pattern in a vacuum sample chamber in exposure mode through charged particle beam optics Is
-In wash mode, an adjustable gas flow with a photocleavable gas is supplied to the column and / or vacuum sample chamber via the gas supply system in order to clean the column and / or vacuum sample chamber And
By selectively switching on and off each light source temporally via a control unit connected to it,
In the cleaning mode, it is intended that the supplied gas be photodissociated using a plurality of light sources arranged in a spatially dispersed manner in the column and / or vacuum sample chamber.

Claims

In charged particle beam equipment,
-A column (10; 110), which in order to expose the desired pattern in the vacuum sample chamber (20; 120) in exposure mode via charged particle beam optics, A cylinder with charged particle beam optics to make
A gas supply system, adjustable via the gas supply system to the column (10; 110) and / or the vacuum sample chamber (20; 120) with a photocleavable gas in cleaning mode A gas supply system for supplying a gas flow,
A plurality of light sources (15.1-15.5; 115.1-115.5) with spatially separated rods (10; 110) and / or vacuum sample chambers A light source arranged in (20; 120) and connected to the light source (15.1-15.5; 115.1-115.5) which brings about the photodissociation of the gas supplied in the cleaning mode A unit (30; 130), the control unit being able to selectively select the individual light sources (15. 1 to 15.5; 115.1 to 115.5) in time in the wash mode via the control unit to comprise a control unit which is configured to be switching on and off the switch,
-An oxygen reservoir (1; 101) and an ozone generator (2; 102) are arranged outside the column (10; 110), and the oxygen reservoir (1; 101) is disposed via the ozonator. ) Can be generated as a photocleavable gas and can be supplied to the column (10; 110) via a gas supply system, with a light source (15.1-15.5; 115.1). The interaction between the beam emitted from 〜115.5) and ozone generates oxygen radicals as photodissociation products, which react with the contamination and are pumpable decomposition products ( A charged particle beam apparatus characterized in that it becomes CO ₂ ; H ₂ O) .

A control unit (30; 130) is also in operative connection with the inlet valve of the gas supply system and by acting on the inlet valve (3; 103), the column (10; 110) and / or the vacuum sample in the cleaning mode Charged particle beam device according to claim 1, characterized in that the gas pressure in the chamber (20; 120) is designed to be adjustable in a targeted manner.

For the defined spatial area of the column (10; 110) and / or the vacuum sample chamber (20; 120), in the control unit (30; 130), each parameter set is placed, which parameter set is Selection of at least one or more specific light sources (15.1-15.5; 115.1-115.5), switch of light sources, including the necessary parameters for optimal cleaning of the area Charged particle beam device according to claim 2, characterized in that it comprises a filling time and a specific gas pressure in the column (10; 110) and / or the vacuum sample chamber (20; 120).

The vacuum sample chamber (20; 120) is in operative connection with the vacuum pump (5; 105) in order to pump out the decomposition products (CO ₂ ; H ₂ O) resulting from the reaction of contaminants and photodissociation products. And a conversion unit (4; 104) is disposed between the vacuum sample chamber (20; 120) and the vacuum pump (5; 105), which is still in the pump exhaust gas stream. Charged particle beam device according to claim 1, characterized in that it decomposes possible gas residues.

The charged particle beam apparatus comprises a charged particle beam source (11; 111) arranged in a column (10; 110), the charged particle beam source comprising a charged particle beam source (11; 111) Charged particle beam device according to claim 1, characterized in that a protective shield (12; 112) is provided in front to protect against back diffusion of the photodissociation products .

Light sources (15.1 to 15.5; 115.1 to 115.5) for elements susceptible to organic contamination, respectively in the column (10; 110) and / or in the vacuum sample chamber (20; 120) The charged particle beam apparatus according to any one of claims 1 to 5, which is disposed adjacent to one another.

7. The light source according to claim 1, wherein the light sources (15.1-15.5) are each configured as LEDs, which emit in the band of the UV spectrum between 200 nm and 300 nm. Charged particle beam equipment described in 1).

A plurality of light sources (115.1 to 115.5) are configured as outlet faces of a fiber bundle comprising a plurality of optical fibers, and in a spatially dispersed state the column (110) and / or the vacuum sample chamber A light source (150) is arranged at (120) and at the other end of the fiber bundle via which light coupling of the fiber bundle into the individual optical fibers takes place And at the same time, at least one switchgear (140) is arranged between the light source (150) and the optical fiber, which switches on and off the individual optical fibers in time. Charged particle beam device according to any of the preceding claims, characterized in that it is operable via the control unit (130) of

Charged particles using a column (10; 110) with charged particle beam optics to expose the desired pattern in the vacuum sample chamber (20; 120) in exposure mode via charged particle beam optics A method for operating a beam device,
In the cleaning mode, an adjustable gas flow with a photocleavable gas via the gas supply system in order to clean the column (10; 110) and / or the vacuum sample chamber (20; 120) Supplied to the column (10; 110) and / or the vacuum sample chamber (20; 120),
Washing by selectively switching on and off individual light sources (15.1-15.5; 115.1-115.5) via a control unit (30; 130) connected thereto In the mode, a plurality of light sources (15.1 to 15.5) are disposed with the supplied gas being spatially dispersed in the column (10; 110) and / or the vacuum sample chamber (20; 120) Photodissociated using 115.1 to 115.5),
-An oxygen reservoir (1; 101) and an ozone generator (2; 102) are arranged outside the column (10; 110), and the oxygen reservoir (1; 101) is disposed via the ozonator. ) Can be generated as a photocleavable gas and can be supplied to the column (10; 110) via a gas supply system, with a light source (15.1-15.5; 115.1). The interaction between the beam emitted from 〜115.5) and ozone generates oxygen radicals as photodissociation products, which react with the contamination and are pumpable decomposition products ( CO ₂ ; H ₂ O) .

The control unit (30; 130) is further in operative connection with the inlet valve (3; 103) of the gas supply system, and in the cleaning mode the gas pressure is in the column (10; 110) and / or the vacuum sample chamber (20; The method according to claim 9 , characterized in that it acts on the intake valve (3; 103) so as to be adjusted in a defined manner in 120).

In the wash mode via the control unit (30; 130), the temporal activation of the individual light sources (15. 1 to 15.5; 115.1 to 115.5) corresponds to the respective light source (15.1 to 15). 10. Method according to claim 9 , characterized in that it takes place depending on the surrounding contamination of .5; 115.1 to 115.5).

The method according to claim 9 , characterized in that the charged particle beam is switched on during the cleaning mode.

The method of claim 9, wherein the degradation products resulting from the reaction of contaminants and light dissociation products (CO _{2, H} 2 _O) is discharged through a vacuum pump.

The method according to claim 13 , characterized in that the remainder of the photocleavable gas still in the pumped gas stream is decomposed.