JP2017002094A - Fluorooxyalkylene group-containing polymer modified phosphonic acid derivative and surface treatment agent containing the derivative, article and optical article treated by the surface treatment agent - Google Patents

Fluorooxyalkylene group-containing polymer modified phosphonic acid derivative and surface treatment agent containing the derivative, article and optical article treated by the surface treatment agent Download PDF

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JP2017002094A
JP2017002094A JP2015113735A JP2015113735A JP2017002094A JP 2017002094 A JP2017002094 A JP 2017002094A JP 2015113735 A JP2015113735 A JP 2015113735A JP 2015113735 A JP2015113735 A JP 2015113735A JP 2017002094 A JP2017002094 A JP 2017002094A
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phosphonic acid
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JP6520419B2 (en
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祐治 山根
Yuji Yamane
祐治 山根
隆介 酒匂
Ryusuke Sako
隆介 酒匂
松田 高至
Takashi Matsuda
高至 松田
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Shin Etsu Chemical Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a compound forming a coated film excellent in water repellent and oil repellent, low dynamic friction, wiping of stain, releasability, abrasion resistance and adhesion to a substrate, a surface treatment agent capable of maintaining performance over long time and having durability containing the same, an article and an optical article treated by the surface treatment agent.SOLUTION: There is provided a fluorooxyalkylene group-containing polymer modified phosphonic acid derivative represented by the formula (1), where A is a monovalent fluorine-containing group with terminal of a -CFgroup or the same group as a group connecting to Rf, B is H, an acyl group or a silyl group, Q is a bivalent connecting group having a silicon atom on both terminals, X is each independently H, an alkali metal atom, an unsubstituted/substituted C1 to 5 alkyl group, aryl group or a monovalent group expressed by JSi-, where J is each independently an unsubstituted/substituted C1 to 5 alkyl group or aryl group and a and b are each independently an integer of 2 to 20.SELECTED DRAWING: None

Description

本発明は、フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤に関し、詳細には、撥水撥油性、指紋拭き取り性に優れ、該表面処理剤で処理された物品及び光学物品に関する。   The present invention relates to a fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative and a surface treatment agent containing the derivative. Specifically, the article has excellent water and oil repellency and fingerprint wiping properties, and is treated with the surface treatment agent and optical It relates to goods.

一般に、パーフルオロオキシアルキレン基含有化合物は、その表面自由エネルギーが非常に小さいために、撥水撥油性、耐薬品性、潤滑性、離型性、防汚性などの特性を有し、その特性を利用して、工業的には紙・繊維などの撥水撥油防汚剤、磁気記録媒体の滑剤、精密機器の防油剤、離型剤、化粧料、保護膜などに幅広く利用されている。   Generally, perfluorooxyalkylene group-containing compounds have characteristics such as water and oil repellency, chemical resistance, lubricity, releasability, and antifouling properties because their surface free energy is very small. Is widely used industrially for water and oil repellent and antifouling agents such as paper and textiles, lubricants for magnetic recording media, oil proofing agents for precision equipment, mold release agents, cosmetics, and protective films. .

しかし、その性質は同時に他の基材に対して非粘着性、非密着性であることを意味しており、パーフルオロオキシアルキレン基含有化合物を基材表面に塗布することはできても、その被膜を基材表面に直接的に密着させることは困難であった。   However, its properties mean that it is non-adhesive and non-adhesive to other substrates at the same time, and even if a perfluorooxyalkylene group-containing compound can be applied to the substrate surface, It was difficult to make the coating directly adhere to the substrate surface.

一方、ガラスや布などの基材表面と有機化合物とを結合させる材料として、シランカップリング剤がよく知られており、各種基材表面のコーティング剤として幅広く利用されている。シランカップリング剤は、1分子中に有機官能基と反応性シリル基(特には加水分解性シリル基)を有する。加水分解性シリル基は、空気中の水分などによって自己縮合反応を起こして被膜を形成する。該被膜は、加水分解性シリル基がガラスや布などの表面と化学的及び/又は物理的に結合することによって耐久性を有する強固な被膜となる。   On the other hand, a silane coupling agent is well known as a material for bonding a substrate surface such as glass or cloth and an organic compound, and is widely used as a coating agent for various substrate surfaces. The silane coupling agent has an organic functional group and a reactive silyl group (particularly a hydrolyzable silyl group) in one molecule. The hydrolyzable silyl group causes a self-condensation reaction with moisture in the air and forms a film. The coating becomes a strong coating having durability by chemically and / or physically bonding the hydrolyzable silyl group to the surface of glass or cloth.

特許文献1では、下記式(I)で示されるフルオロオキシアルキレン基含有ポリマー変性シランが提案されている。   In Patent Document 1, a fluorooxyalkylene group-containing polymer-modified silane represented by the following formula (I) is proposed.

(式(I)中、Rf1は−Cd2dO−の繰り返し単位を5〜100個含む2価の直鎖型フルオロオキシアルキレン基(dは1〜6の整数であり、繰り返し単位ごとに異なっていてよい)であり、A及びBは、互いに独立に、Rf2基又は下記式(II)で示される基であり、Rf2はF、H、及び末端が−CF3基又は−CF2H基である1価のフッ素含有基のいずれかであり、Qは2価の有機基であり、Zはシルアルキレン構造又はシルアリーレン構造を含み、かつシロキサン結合を含まない2〜7価の連結基であり、Rは炭素数1〜4のアルキル基又はフェニル基であり、Xは加水分解性基であり、aは2又は3、bは1〜6、cは1〜5の整数である。) (In the formula (I), Rf 1 is a divalent linear fluorooxyalkylene group containing 5 to 100 repeating units of —C d F 2d O— (d is an integer of 1 to 6, each repeating unit And A and B are independently of each other an Rf 2 group or a group represented by the following formula (II), and Rf 2 is F, H, and a terminal is a —CF 3 group or — Any one of monovalent fluorine-containing groups which are CF 2 H groups, Q is a divalent organic group, Z contains a silalkylene structure or a silarylene structure, and does not contain a siloxane bond. R is an alkyl group having 1 to 4 carbon atoms or a phenyl group, X is a hydrolyzable group, a is 2 or 3, b is 1 to 6, and c is an integer of 1 to 5. .)

該フルオロオキシアルキレン基含有シランで処理したガラスは、汚れ拭き取り性に優れ、密着性に優れた材料を得ることができるが、ガラスや二酸化ケイ素(シリカ)以外の表面に直接的に密着させることは困難であった。   The glass treated with the fluorooxyalkylene group-containing silane has excellent dirt wiping properties and can provide a material with excellent adhesion, but it can be directly adhered to a surface other than glass or silicon dioxide (silica). It was difficult.

最近では、外観や視認性をよくするためにディスプレイの表面や電子機器等の筐体に指紋を付きにくくする技術や、汚れを落とし易くする技術の要求が年々高まってきており、ガラスや二酸化ケイ素(シリカ)以外の表面にも密着可能な材料の開発が望まれている。   Recently, in order to improve the appearance and visibility, there is an increasing demand for technology that makes it difficult to attach fingerprints to the display surface and the housing of electronic devices, and technology that makes it easier to remove dirt. Development of materials that can adhere to surfaces other than (silica) is also desired.

また、電子機器が設置型から携帯型へ、信号入力方式がボタン方式からタッチパネル方式へ移行するのに伴って、電子機器に直接触れる機会が増えているため、指紋を付きにくくする処理又は汚れを拭き取り易くする処理が必要な基板の種類が多様化してきている。この基板としては、ガラス以外では、金属酸化物や樹脂が挙げられる。また、タッチパネルディスプレイやウェアラブル端末の表面に被覆する撥水撥油層は、傷付き防止性及び指紋拭き取り性の観点から動摩擦係数が低いことが望ましい。そのため動摩擦係数が低い撥水撥油層の開発も要求されている。さらに、それらの端末は汚れ拭き取り作業を実施することが多いため、耐摩耗性が必要となる。   In addition, as electronic devices change from stationary to portable, and the signal input method shifts from the button method to the touch panel method, the opportunity to directly touch the electronic device is increasing. The types of substrates that need to be easily wiped are diversifying. Examples of the substrate include metal oxides and resins other than glass. Further, the water / oil repellent layer coated on the surface of the touch panel display or wearable terminal preferably has a low coefficient of dynamic friction from the viewpoint of scratch resistance and fingerprint wiping. Therefore, development of a water / oil repellent layer having a low dynamic friction coefficient is also required. Furthermore, since these terminals often perform a dirt wiping operation, wear resistance is required.

特開2013−117012号公報JP 2013-1117012 A

従って、本発明の目的は、撥水撥油性、低動摩擦性、汚れの拭き取り性、離型性、耐摩耗性、及び、基材への密着性に優れた被膜を形成するフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体、及びこれを含み、性能を長期にわたって保持可能な耐久性を備えた表面処理剤、該表面処理剤で処理された物品及び光学物品を提供することにある。   Accordingly, an object of the present invention is to contain a fluorooxyalkylene group that forms a film excellent in water and oil repellency, low dynamic friction, dirt wiping, mold release, abrasion resistance, and adhesion to a substrate. It is an object of the present invention to provide a polymer-modified phosphonic acid derivative, a surface treatment agent comprising the same and having durability capable of maintaining performance over a long period of time, an article treated with the surface treatment agent, and an optical article.

本発明者らは、上記課題を解決するため鋭意研究を重ねた結果、フルオロオキシアルキレン基含有ポリマーを主鎖構造に有し、ホスホン酸基を末端基に有する下記化合物が金属酸化物へ密着し、塗布後、汚れ拭き取り性、低動摩擦性に優れ、金属酸化物に対して、耐摩耗性に優れた撥水撥油層を形成できることを見出し、本発明を完成した。   As a result of intensive studies to solve the above problems, the present inventors have found that the following compound having a fluorooxyalkylene group-containing polymer in the main chain structure and having a phosphonic acid group as a terminal group adheres to the metal oxide. After application, the present inventors have found that a water- and oil-repellent layer excellent in dirt wiping property and low dynamic friction property and excellent in wear resistance can be formed on a metal oxide, thereby completing the present invention.

即ち、本発明は、下記のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤、該表面処理剤で処理された物品、光学物品及びタッチパネルディスプレイを提供するものである。   That is, the present invention provides the following fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative, a surface treatment agent containing the derivative, an article treated with the surface treatment agent, an optical article, and a touch panel display.

〔1〕
下記式(1)で示されるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。
[1]
A fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative represented by the following formula (1):

(式(1)中、Aは末端が−CF3基である1価のフッ素含有基又は下記式(2)で示される基であり、Rf1は−(CF2d−(OCF2p(OCF2CF2q(OCF2CF2CF2r(OCF2CF2CF2CF2s(OCF(CF3)CF2t−O(CF2d−であり、dはそれぞれ独立に0〜5の整数であり、p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。Bは水素原子、アシル基又はシリル基であり、Qは両末端にケイ素原子を有する2価の連結基であり、Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であり、a、bはそれぞれ独立に2〜20の整数である。) (In the formula (1), A is a monovalent fluorine-containing group whose terminal is a —CF 3 group or a group represented by the following formula (2), and Rf 1 is — (CF 2 ) d — (OCF 2 ). p (OCF 2 CF 2) q (OCF 2 CF 2 CF 2) r (OCF 2 CF 2 CF 2 CF 2) s (OCF (CF 3) CF 2) t -O (CF 2) d - a and, d Each independently represents an integer of 0 to 5, p, q, r, s and t each independently represents an integer of 0 to 200, and p + q + r + s + t is 3 to 200, and each unit shown in parentheses May be bonded randomly, B is a hydrogen atom, acyl group or silyl group, Q is a divalent linking group having silicon atoms at both ends, and X is independently a hydrogen atom or an alkali metal atom. , Unsubstituted or substituted alkyl group having 1 to 5 carbon atoms, aryl group, or J 3 Si— (J is independently an unsubstituted or substituted alkyl group or aryl group having 1 to 5 carbon atoms.), And a and b are each independently an integer of 2 to 20. )

〔2〕
前記Rf1が下記式(3)で示される2価の直鎖型フルオロオキシアルキレン基である〔1〕に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。
[2]
The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative according to [1], wherein Rf 1 is a divalent linear fluorooxyalkylene group represented by the following formula (3).

(式(3)中、dはそれぞれ独立に0〜5の整数であり、p=1〜80、q=1〜80、r=0〜10、s=0〜10、p+q=5〜100を満たす整数であり、かつ、p+q+r+s+tは10〜100であり、括弧内に示される各単位はランダムに結合されていてよい。) (In Formula (3), d is an integer of 0-5 each independently, p = 1-80, q = 1-80, r = 0-10, s = 0-10, p + q = 5-100. (It is an integer satisfying, and p + q + r + s + t is 10 to 100, and each unit shown in parentheses may be combined randomly.)

〔3〕
前記Qが、下記式(4−1)〜(4−4)からなる群から選択される、両末端にケイ素原子を有する2価の連結基である〔1〕又は〔2〕に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。
[3]
The fluoro according to [1] or [2], wherein Q is a divalent linking group having a silicon atom at both ends, selected from the group consisting of the following formulas (4-1) to (4-4): An oxyalkylene group-containing polymer-modified phosphonic acid derivative.

(式(4−1)〜(4−4)中、hは2〜10の整数であり、iは1〜100の整数であり、Rはそれぞれ独立に非置換又は置換の炭素数1〜5のアルキル基又はアリール基である。) (In the formulas (4-1) to (4-4), h is an integer of 2 to 10, i is an integer of 1 to 100, and each R is independently an unsubstituted or substituted carbon number of 1 to 5. An alkyl group or an aryl group.)

〔4〕
〔1〕〜〔3〕のいずれか1に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸エステル誘導体の少なくとも1種以上を含む表面処理剤。
[4]
[1] A surface treating agent comprising at least one of the fluorooxyalkylene group-containing polymer-modified phosphonic acid ester derivatives according to any one of [1] to [3].

〔5〕
〔4〕に記載の表面処理剤で表面処理された物品。
〔6〕
〔4〕に記載の表面処理剤で表面処理された光学物品。
〔7〕
〔4〕に記載の表面処理剤で処理されたタッチパネルディスプレイ。
[5]
Articles surface-treated with the surface treating agent according to [4].
[6]
Optical article surface-treated with the surface treating agent according to [4].
[7]
A touch panel display treated with the surface treatment agent according to [4].

本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、基材への密着性に優れ、撥水撥油性、低動摩擦性、汚れの拭き取り性に優れた被膜を与えることができ、種々のコーティング用途に長期に渡って有効に使用することができる。   The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention is excellent in adhesion to a substrate, can give a film excellent in water and oil repellency, low dynamic friction, and dirt wiping, and has various coatings. It can be used effectively for a long period of time.

以下に、本発明をより詳細に説明する。   Hereinafter, the present invention will be described in more detail.

本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、下記式(1)で示されるものである。   The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention is represented by the following formula (1).

(式(1)中、Aは末端が−CF3基である1価のフッ素含有基又は下記式(2)で示される基であり、Rf1は−(CF2d−(OCF2p(OCF2CF2q(OCF2CF2CF2r(OCF2CF2CF2CF2s(OCF(CF3)CF2t−O(CF2d−であり、dはそれぞれ独立に0〜5の整数であり、p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。Bは水素原子、アシル基又はシリル基であり、Qは両末端にケイ素原子を有する2価の連結基であり、Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であり、a、bはそれぞれ独立に2〜20の整数である。) (In the formula (1), A is a monovalent fluorine-containing group whose terminal is a —CF 3 group or a group represented by the following formula (2), and Rf 1 is — (CF 2 ) d — (OCF 2 ). p (OCF 2 CF 2) q (OCF 2 CF 2 CF 2) r (OCF 2 CF 2 CF 2 CF 2) s (OCF (CF 3) CF 2) t -O (CF 2) d - a and, d Each independently represents an integer of 0 to 5, p, q, r, s and t each independently represents an integer of 0 to 200, and p + q + r + s + t is 3 to 200, and each unit shown in parentheses May be bonded randomly, B is a hydrogen atom, acyl group or silyl group, Q is a divalent linking group having silicon atoms at both ends, and X is independently a hydrogen atom or an alkali metal atom. , Unsubstituted or substituted alkyl group having 1 to 5 carbon atoms, aryl group, or J 3 Si— (J is independently an unsubstituted or substituted alkyl group or aryl group having 1 to 5 carbon atoms.), And a and b are each independently an integer of 2 to 20. )

本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、1価のフルオロオキシアルキレン基又は2価のフルオロオキシアルキレン基含有ポリマー残基(Rf1)と、ホスホン酸基(−(CH2a−PO(OH)2)が、ジメチルシリレン基、ジエチルシリレン基、ジフェニルシリレン基等のジオルガノシリレン基、ジメチルポリシロキサン基、ジエチルポリシロキサン基、ジフェニルポリシロキサン基等のジオルガノポリシロキサン基のいずれかを含む2価の連結基を介して結合した構造であり、ホスホン酸基を末端に2つ有する。 The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention comprises a monovalent fluorooxyalkylene group or a divalent fluorooxyalkylene group-containing polymer residue (Rf 1 ) and a phosphonic acid group (— (CH 2 ) a. -PO (OH) 2 ) is a diorganosilylene group such as a dimethylsilylene group, a diethylsilylene group or a diphenylsilylene group, or a diorganopolysiloxane group such as a dimethylpolysiloxane group, a diethylpolysiloxane group or a diphenylpolysiloxane group. It has a structure bonded via a divalent linking group containing a phosphonic acid group at the end.

上記式(1)において、Rf1は下記式で示されるものである。 In the above formula (1), Rf 1 is represented by the following formula.

式中、dはそれぞれ独立に0〜5の整数、p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。該フルオロオキシアルキレン基の繰り返し単位の合計(p+q+r+s+t)は3〜200であり、10〜150が好ましく、15〜80がより好ましい。
上記繰り返し単位を含むRf1として、具体的には、下記のものが例示できる。
In the formula, d is each independently an integer of 0 to 5, p, q, r, s, and t are each independently an integer of 0 to 200, and p + q + r + s + t is 3 to 200, and is shown in parentheses. Each unit may be combined at random. The total (p + q + r + s + t) of repeating units of the fluorooxyalkylene group is 3 to 200, preferably 10 to 150, and more preferably 15 to 80.
Specific examples of Rf 1 containing the repeating unit include the following.

(式中、d’は上記dと同一であり、p’は上記pと同一であり、q’は上記qと同一であり、r’、s’、t’はそれぞれ1以上の整数であり、その上限は上記r、s、tの上限と同一である。) (Wherein d ′ is the same as d, p ′ is the same as p, q ′ is the same as q, and r ′, s ′ and t ′ are each an integer of 1 or more. The upper limit is the same as the upper limit of r, s, t.)

中でも、Rf1は下記式(3)で示される2価の直鎖型フルオロオキシアルキレン基が低動摩擦性の観点から、タッチパネル等の滑り性を重視する用途には好ましい。 Among them, Rf 1 is preferably a divalent linear fluorooxyalkylene group represented by the following formula (3) from the viewpoint of low dynamic friction, for applications where importance is attached to slipperiness such as a touch panel.

(式(3)中、dはそれぞれ独立に0〜5の整数であり、p=1〜80、q=1〜80、r=0〜10、s=0〜10、p+q=5〜100を満たす整数であり、かつ、p+q+r+s+tは10〜100であり、括弧内に示される各単位はランダムに結合されていてよい。) (In Formula (3), d is an integer of 0-5 each independently, p = 1-80, q = 1-80, r = 0-10, s = 0-10, p + q = 5-100. (It is an integer satisfying, and p + q + r + s + t is 10 to 100, and each unit shown in parentheses may be combined randomly.)

上記式(1)において、Aは末端が−CF3基である1価のフッ素含有基又は下記式(2)で示される基であり、Aがフッ素含有基の場合には、炭素数1〜6のパーフルオロ基が好ましく、中でも−CF3基、−CF2CF3基がより好ましい。 In the above formula (1), A is a monovalent fluorine-containing group whose terminal is a —CF 3 group or a group represented by the following formula (2), and when A is a fluorine-containing group, 6 perfluoro groups are preferred, and —CF 3 groups and —CF 2 CF 3 groups are more preferred.

上記式(1)及び(2)において、a及びbは1〜20の整数であるが、2〜10の整数が好ましい。   In said formula (1) and (2), a and b are the integers of 1-20, However, The integer of 2-10 is preferable.

上記式(1)及び(2)において、Qは−(CH2)a−基と−(CH2b−基との連結基であり、非置換又は置換の炭素数2〜40の2価の有機基が好ましく、該有機基は、ジメチルシリレン基、ジエチルシリレン基、ジフェニルシリレン基等のジオルガノシリレン基、ジメチルポリシロキサン基、ジエチルポリシロキサン基、ジフェニルポリシロキサン基等のジオルガノポリシロキサン基からなる群から選択される1種又は2種以上の基を含む。 In the above formula (1) and (2), Q is - (CH 2) a- group and - (CH 2) b - is a linking group of the group, an unsubstituted or substituted divalent number from 2 to 40 carbons The organic group is preferably a diorganosilylene group such as a dimethylsilylene group, a diethylsilylene group or a diphenylsilylene group, a diorganopolysiloxane group such as a dimethylpolysiloxane group, a diethylpolysiloxane group or a diphenylpolysiloxane group. 1 type or 2 or more types of groups selected from the group which consists of.

ここで、非置換又は置換の炭素数1〜12の2価の炭化水素基としては、メチレン基、エチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等のアルキレン基、フェニレン基等のアリーレン基、又はこれらの基の2種以上の組み合わせ(アルキレン・アリーレン基等)で示される2価の基が挙げられ、これらの基の水素原子の一部又は全部をフッ素、塩素、臭素、ヨウ素等のハロゲン原子で置換したものであってもよく、中でも非置換又は置換の炭素数1〜3のアルキル基又はフェニル基が好ましい。   Here, as the unsubstituted or substituted divalent hydrocarbon group having 1 to 12 carbon atoms, methylene group, ethylene group, propylene group (trimethylene group, methylethylene group), butylene group (tetramethylene group, methylpropylene group) ), An alkylene group such as a hexamethylene group and an octamethylene group, an arylene group such as a phenylene group, or a divalent group represented by a combination of two or more of these groups (such as an alkylene / arylene group). A part or all of the hydrogen atoms in the group may be substituted with halogen atoms such as fluorine, chlorine, bromine, iodine, etc. Among them, an unsubstituted or substituted alkyl group having 1 to 3 carbon atoms or a phenyl group may be used. preferable.

例えば、Qとしては下記の基が挙げられる。   For example, Q includes the following groups.

(式中、hは1〜10の整数であり、iは2〜20の整数であり、Meはメチル基であり、Phはフェニル基である。) (In the formula, h is an integer of 1 to 10, i is an integer of 2 to 20, Me is a methyl group, and Ph is a phenyl group.)

上記式(1)及び(2)において、Bは、水素原子、アシル基又はシリル基である。アシル基の例としては、アセチル基、アセトイミドイル基、チオアセチル基、ベンゼンスルホニル基が挙げられる。シリル基の例としては、トリメチルシリル基、トリエチルシリル基、トリイソプロリルシリル基、トリフェニルシリル基、tert−ブチルジメチルシリル基、tert−ブチルジフェニルシリル基が挙げられる。Bは、水素原子又はトリメチルシリル基であることが好ましい。   In the above formulas (1) and (2), B is a hydrogen atom, an acyl group or a silyl group. Examples of the acyl group include an acetyl group, an acetimidoyl group, a thioacetyl group, and a benzenesulfonyl group. Examples of the silyl group include a trimethylsilyl group, a triethylsilyl group, a triisopropylylsilyl group, a triphenylsilyl group, a tert-butyldimethylsilyl group, and a tert-butyldiphenylsilyl group. B is preferably a hydrogen atom or a trimethylsilyl group.

本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、上記式(1)で示される化合物であり、Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であるが、ここで、アルカリ金属としては、例えばナトリウム、カリウムなどが挙げられる。 The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention is a compound represented by the above formula (1), and each X is independently a hydrogen atom, an alkali metal atom, an unsubstituted or substituted carbon atom having 1 to 5 carbon atoms. An alkyl group, an aryl group, or a monovalent group represented by J 3 Si— (J is independently an unsubstituted or substituted alkyl group having 1 to 5 carbon atoms or an aryl group), Examples of the alkali metal include sodium and potassium.

本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、基材への密着性、撥水撥油性、低動摩擦性、離型性、汚れの拭き取り性、耐摩耗性に優れた硬化皮膜を与えることができ、種々のコーティング用途に長期に渡って有効に使用し得る。また、汚れを拭き取り易く、眼鏡レンズ、反射防止膜、偏光板、TV、タッチパネルディスプレイ、ウェラブル端末、タブレットPC、時計、携帯電話、装飾品、精密金型の被膜として好適である。   The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention provides a cured film excellent in adhesion to a substrate, water and oil repellency, low dynamic friction, releasability, dirt wiping, and abrasion resistance. Can be used effectively for a long time in various coating applications. Further, it is easy to wipe off dirt, and is suitable as a film for spectacle lenses, antireflection films, polarizing plates, TVs, touch panel displays, wearable terminals, tablet PCs, watches, mobile phones, ornaments, and precision molds.

上記式(1)で示されるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、例えば、次の方法により製造することができる。
まず、公知の方法によりパーフルオロオキシアルキレン基含有ポリマーの末端ヒドロキシル基に末端不飽和基を付加した化合物を得る。
次に末端に不飽和結合基を2つ有するフルオロオキシアルキレン基含有ポリマーと、SiH結合を2つ有する有機ケイ素化合物とを、フッ素系溶剤中、付加反応触媒、例えば塩化白金酸/ビニルシロキサン錯体存在下で、40〜120℃、好ましくは60〜100℃で、1〜72時間、好ましくは3〜24時間熟成させ、その後、溶剤及び未反応物を80〜150℃、好ましくは90℃〜120℃で減圧留去することで、末端にSiH基を有するフルオロオキシアルキレン基含有ポリマーを得ることができる。次いで、該ポリマーと末端に不飽和結合基を有するホスホン酸とをフッ素系溶剤中、付加反応触媒、例えば塩化白金酸/ビニルシロキサン錯体存在下、40〜120℃、好ましくは60〜100℃で、1〜72時間、好ましくは3〜24時間熟成させ、その後、溶剤及び未反応物を80〜150℃、好ましくは90℃〜120℃で減圧留去することで、フルオロオキシアルキレン基含有ポリマー変性ホスホン酸エステルを得ることができる。さらに、該エステルを加水分解することによりフルオロオキシアルキレン基含有ポリマー変性ホスホン酸を得ることができる。加水分解は、塩酸や硫酸等の酸の存在下、大量の水分と反応させることにより行うことができ、還流状態で3時間以上反応させると良い。また、エステル基がトリメチルシリルエステル基の場合には、室温で水と撹拌するのみでもフルオロオキシアルキレン基含有ポリマー変性ホスホン酸を得ることができる。
The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative represented by the above formula (1) can be produced, for example, by the following method.
First, a compound in which a terminal unsaturated group is added to a terminal hydroxyl group of a perfluorooxyalkylene group-containing polymer is obtained by a known method.
Next, a fluorooxyalkylene group-containing polymer having two unsaturated bond groups and an organosilicon compound having two SiH bonds are added in a fluorine-based solvent, such as a chloroplatinic acid / vinylsiloxane complex. Under 40-120 ° C., preferably 60-100 ° C., for 1-72 hours, preferably 3-24 hours, after which the solvent and unreacted material are 80-150 ° C., preferably 90 ° C.-120 ° C. By distilling off under reduced pressure, a fluorooxyalkylene group-containing polymer having a SiH group at the end can be obtained. Next, the polymer and a phosphonic acid having an unsaturated bond group at the terminal are added in a fluorine-based solvent at 40 to 120 ° C., preferably 60 to 100 ° C. in the presence of an addition reaction catalyst such as a chloroplatinic acid / vinylsiloxane complex, It is aged for 1 to 72 hours, preferably 3 to 24 hours, and then the solvent and unreacted substances are distilled off under reduced pressure at 80 to 150 ° C., preferably 90 to 120 ° C. Acid esters can be obtained. Furthermore, a fluorooxyalkylene group-containing polymer-modified phosphonic acid can be obtained by hydrolyzing the ester. Hydrolysis can be performed by reacting with a large amount of water in the presence of an acid such as hydrochloric acid or sulfuric acid, and it is preferable to react for 3 hours or more in a reflux state. When the ester group is a trimethylsilyl ester group, a fluorooxyalkylene group-containing polymer-modified phosphonic acid can be obtained only by stirring with water at room temperature.

分子鎖末端に不飽和結合基を2つ有するフルオロオキシアルキレン基としては、例えば、以下に示すものが例示できる。   Examples of the fluorooxyalkylene group having two unsaturated bond groups at the molecular chain terminal include those shown below.

さらに、上記上げた構造の水酸基をシリル基又はアシル基で保護された構造も例示できる。シリル化やアシル化は公知の方法で実施すればよく、例えばトリメチルシリル基は、トリメチルシランをトリス(ペンタフルオロフェニル)ボラン存在下、室温(25℃)で撹拌することで導入できる。例えばアセチル基の保護は、無水酢酸を、トリエチルアミン、ピリジンの存在下、60度で24時間撹拌することで導入できる。   Furthermore, the structure which protected the hydroxyl group of the said structure with the silyl group or the acyl group can be illustrated. Silylation or acylation may be carried out by a known method. For example, a trimethylsilyl group can be introduced by stirring trimethylsilane in the presence of tris (pentafluorophenyl) borane at room temperature (25 ° C.). For example, protection of the acetyl group can be introduced by stirring acetic anhydride at 60 ° C. for 24 hours in the presence of triethylamine and pyridine.

上記式中のRf1としては、例えば、以下の構造が例示できる。 Examples of Rf 1 in the above formula include the following structures.

本発明の表面処理剤は、本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体を主成分とするものである。   The surface treating agent of the present invention is mainly composed of the fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention.

本発明の表面処理剤は、片末端にホスホン酸基を有するタイプと、両末端にホスホン酸基を有するタイプとを混合しても良い。片末端にホスホン酸基を有するタイプは、両末端にホスホン酸基を有するタイプと比較して、撥水撥油性が高く、動摩擦係数が低く、耐摩耗性にも優れる。一方、両末端にホスホン酸基を有するタイプは、片末端にホスホン酸基を有するタイプと比較して、薄膜塗工でも表面改質が可能である点で優れる。そのため、用途に合わせて、片末端にホスホン酸基を有するタイプと、両末端にホスホン酸基を有するタイプとを混合して、表面処理剤として使用することが好ましい。   The surface treating agent of the present invention may be a mixture of a type having a phosphonic acid group at one end and a type having a phosphonic acid group at both ends. A type having a phosphonic acid group at one end has higher water and oil repellency, a lower dynamic friction coefficient, and excellent wear resistance than a type having a phosphonic acid group at both ends. On the other hand, the type having a phosphonic acid group at both ends is superior to the type having a phosphonic acid group at one end in that the surface can be modified even by thin film coating. Therefore, it is preferable to use as a surface treatment agent by mixing a type having a phosphonic acid group at one end and a type having a phosphonic acid group at both ends in accordance with the application.

また、本発明の表面処理剤は無官能性フルオロオキシアルキレン基含有ポリマーを含んでもよく、片末端加水分解性ポリマーと両末端加水分解性ポリマー100質量部に対して5〜120質量部、好ましくは10〜60質量部含まれることが低い動摩擦係数と耐久性を両立するうえで有利である。   The surface treatment agent of the present invention may contain a non-functional fluorooxyalkylene group-containing polymer, preferably 5 to 120 parts by mass, preferably 100 parts by mass of the one-end hydrolyzable polymer and the both-end hydrolyzable polymer, The inclusion of 10 to 60 parts by mass is advantageous in achieving both a low dynamic friction coefficient and durability.

また、該表面処理剤は、適当な溶媒に溶解させてから塗工することが好ましい。このような溶剤としては、フッ素変性脂肪族炭化水素系溶剤(ペンタフルオロブタン、パーフルオロヘキサン、パーフルオロヘプタン、パーフルオロオクタン、パーフルオロシクロヘキサン、パーフルオロ1,3−ジメチルシクロヘキサンなど)、フッ素変性芳香族炭化水素系溶剤(m−キシレンヘキサフルオライド、ベンゾトリフルオライド、1,3−トリフルオロメチルベンゼンなど)、フッ素変性エーテル系溶剤(メチルパーフルオロプロピルエーテル、メチルパーフルオロブチルエーテル、エチルパーフルオロブチルエーテル、パーフルオロ(2−ブチルテトラヒドロフラン)など)、フッ素変性アルキルアミン系溶剤(パーフルオロトリブチルアミン、パーフルオロトリペンチルアミンなど)、炭化水素系溶剤(石油ベンジン、ミネラルスピリッツ、トルエン、キシレンなど)、ケトン系溶剤(アセトン、メチルエチルケトン、メチルイソブチルケトンなど)、エーテル系溶剤(テトラヒドロフラン、ジエチルエーテルなど)、エステル系溶剤(酢酸エチルなど)、アルコール系溶剤(イソプロピルアルコールなど)を例示することができる。これらの中では、溶解性、濡れ性などの点で、フッ素変性された溶剤が好ましく、メチルパーフルオロブチルエーテル、エチルパーフルオロブチルエーテル、メトキシパーフルオロエプテン、デカフルオロペンタン、ペンタフルオロブタン、パーフルオロヘキサン、ヘキサフルオロメタキシレンがより好ましく、エチルパーフルオロブチルエーテルやデカフルオロペンタン、ペンタフルオロブタン、パーフルオロヘキサンが特に好ましい。   The surface treatment agent is preferably applied after being dissolved in a suitable solvent. Such solvents include fluorine-modified aliphatic hydrocarbon solvents (pentafluorobutane, perfluorohexane, perfluoroheptane, perfluorooctane, perfluorocyclohexane, perfluoro1,3-dimethylcyclohexane, etc.), fluorine-modified aromatics Group hydrocarbon solvents (m-xylene hexafluoride, benzotrifluoride, 1,3-trifluoromethylbenzene, etc.), fluorine-modified ether solvents (methyl perfluoropropyl ether, methyl perfluorobutyl ether, ethyl perfluorobutyl ether, Perfluoro (2-butyltetrahydrofuran), etc.), fluorine-modified alkylamine solvents (perfluorotributylamine, perfluorotripentylamine, etc.), hydrocarbon solvents (petroleum benzine, Ral spirits, toluene, xylene, etc.), ketone solvents (acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.), ether solvents (tetrahydrofuran, diethyl ether, etc.), ester solvents (ethyl acetate, etc.), alcohol solvents (isopropyl alcohol, etc.) ). Among these, fluorine-modified solvents are preferable in terms of solubility, wettability, and the like. Methyl perfluorobutyl ether, ethyl perfluorobutyl ether, methoxyperfluoroeptene, decafluoropentane, pentafluorobutane, perfluorohexane Hexafluorometaxylene is more preferable, and ethyl perfluorobutyl ether, decafluoropentane, pentafluorobutane, and perfluorohexane are particularly preferable.

上記溶媒はその2種以上を混合してもよく、溶媒に溶解させるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体の最適濃度は、処理方法により異なるが0.01〜50質量%、特に0.03〜25質量%であることが好ましい。   Two or more of these solvents may be mixed. The optimum concentration of the fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative dissolved in the solvent varies depending on the treatment method, but is 0.01 to 50% by mass, particularly 0.03. It is preferably ˜25% by mass.

表面処理剤は、ウェット塗工法(刷毛塗り、ディッピング、スプレー、インクジェット)、蒸着法など公知の方法で基材に施与することができる。また、硬化温度は、硬化方法によって異なるが、80℃から200℃までの範囲が好ましい。硬化湿度としては、加湿下で行うことが反応を促進する上で好ましい。   The surface treatment agent can be applied to the substrate by a known method such as a wet coating method (brush coating, dipping, spraying, ink jetting) or a vapor deposition method. The curing temperature varies depending on the curing method, but is preferably in the range from 80 ° C to 200 ° C. The curing humidity is preferably performed under humidification in order to accelerate the reaction.

また、硬化被膜(フッ素層)の膜厚は、50nm以下が好ましく、特に2〜20nmが好ましく、さらに4〜15nmが好ましい。   The film thickness of the cured coating (fluorine layer) is preferably 50 nm or less, particularly preferably 2 to 20 nm, and more preferably 4 to 15 nm.

上記表面処理剤で処理される基材は、特に制限されず、紙、布、金属及びその酸化物、ガラス、プラスチック、セラミック、石英、サファイヤなど各種材質のものであってよく、サファイヤ、金属酸化物であることが好ましく、これらに撥水撥油性、低動摩擦性、防汚性を付与することができる。   The substrate to be treated with the surface treatment agent is not particularly limited, and may be of various materials such as paper, cloth, metal and oxide thereof, glass, plastic, ceramic, quartz, sapphire, sapphire, metal oxide It is preferable that these are imparted with water and oil repellency, low dynamic friction and antifouling properties.

基板の表面がハードコート処理や反射防止処理されていてもよい。密着性を更に向上させるためには、プライマー層として、金属酸化物層(TiO2、Al23、ZrO2、Ta25、ITO、AgO、CuO等)処理、真空プラズマ処理、大気圧プラズマ処理、イトロ処理、UV処理、VUV(真空紫外線)処理、アルカリ処理、酸処理等の公知の処理方法を用いてもよい。 The surface of the substrate may be subjected to a hard coat treatment or an antireflection treatment. In order to further improve the adhesion, as a primer layer, a metal oxide layer (TiO 2 , Al 2 O 3 , ZrO 2 , Ta 2 O 5 , ITO, AgO, CuO, etc.) treatment, vacuum plasma treatment, atmospheric pressure Known treatment methods such as plasma treatment, itro treatment, UV treatment, VUV (vacuum ultraviolet) treatment, alkali treatment, and acid treatment may be used.

本発明の表面処理剤で処理される物品としては、カーナビゲーション、カーオーディオ、タブレットPC、スマートフォン、ウェラブル端末、携帯電話、デジタルカメラ、デジタルビデオカメラ、PDA、ポータブルオーディオプレーヤー、ゲーム機器、各種操作パネル、電子公告等に使用される液晶ディスプレイ、有機ELディスプレイ、プラズマディスプレイ、タッチパネルディスプレイや、メガネレンズ、カメラレンズ、レンズフィルター、サングラス、胃カメラ等の医療用器機、複写機、保護フィルム、反射防止フィルム等の光学物品が挙げられる。本発明の表面処理剤は、前記物品に指紋及び皮脂が付着するのを防止し、汚れを容易に拭き取ることができるため、特にメガネレンズ、スマートフォン、PC、スマートウォッチ等のタッチパネルディスプレイや輸送用機器のインパネの撥水撥油層として有用である。   Articles to be treated with the surface treatment agent of the present invention include car navigation, car audio, tablet PC, smartphone, wearable terminal, mobile phone, digital camera, digital video camera, PDA, portable audio player, game machine, various operation panels Liquid crystal displays, organic EL displays, plasma displays, touch panel displays, medical equipment such as eyeglass lenses, camera lenses, lens filters, sunglasses, stomach cameras, photocopiers, protective films, antireflection films An optical article such as Since the surface treatment agent of the present invention can prevent fingerprints and sebum from adhering to the article and easily wipe off dirt, touch panel displays such as eyeglass lenses, smartphones, PCs, smart watches, etc., and transportation equipment It is useful as a water and oil repellent layer for instrument panels.

以下に、実施例及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に限定されるものではない。   Hereinafter, the present invention will be specifically described with reference to examples and comparative examples, but the present invention is not limited to the following examples.

実施例及び比較例において使用した試験方法は、以下のとおりである。   The test methods used in Examples and Comparative Examples are as follows.

[撥水撥油性の評価方法]
接触角計(協和界面科学社製DropMaster)を用いて、硬化被膜の水接触角及びオレイン酸に対する接触角を25℃、湿度40%で測定した。なお、水接触角は、2μlの液滴をサンプル表面に着滴させた後、1秒後に測定した。オレイン酸接触角は、4μlの液滴をサンプル表面に着滴させた後、1秒後に測定した。
[Evaluation method of water and oil repellency]
Using a contact angle meter (DropMaster manufactured by Kyowa Interface Science Co., Ltd.), the water contact angle of the cured coating and the contact angle with respect to oleic acid were measured at 25 ° C. and humidity of 40%. The water contact angle was measured 1 second after a 2 μl droplet was deposited on the sample surface. The oleic acid contact angle was measured 1 second after a 4 μl droplet was deposited on the sample surface.

[動摩擦係数]
ベンコット(旭化成社製)に対する動摩擦係数を、表面性試験機(新東科学社製 HEIDON 14FW)を用いて下記条件で測定した。
接触面積:10mm×30mm
荷重:100g
[Dynamic friction coefficient]
The dynamic friction coefficient for Bencott (Asahi Kasei Co., Ltd.) was measured under the following conditions using a surface property tester (HEIDON 14FW manufactured by Shinto Kagaku Co.).
Contact area: 10mm x 30mm
Load: 100g

[マジックインク拭取り性]
上記にて作製したフィルムを用い、処理表面に油性マジック(ゼブラ株式会社製『ハイマッキー』)を塗り、ラビングテスター(新東科学社製)により下記条件で拭いた後のマジックインクの拭取り性を、下記指標を用い、目視により評価した。
試験環境条件:25℃、湿度40%
拭取り材:試料と接触するテスターの先端部にティッシュペーパー(カミ商事株式会社製エルモア)を固定したもの。
移動距離(片道)20mm
移動速度1800mm/min
接触面積:10mm×30mm
荷重:500g
◎:1往復の拭取り操作で簡単に完全に拭取れる。
○:1往復の拭取り操作では少しインクが残る。
△:1往復の拭取り操作では半分ほど残る。
×:全く拭きとれない。
[Magic ink wiping properties]
Using the film produced above, oil-based magic (“Hi-Mackey” manufactured by Zebra Co., Ltd.) is applied to the treated surface, and the wiping performance of magic ink after wiping under the following conditions with a rubbing tester (manufactured by Shinto Kagaku) Was visually evaluated using the following indices.
Test environment conditions: 25 ° C, humidity 40%
Wiping material: A tissue paper (Elmore manufactured by Kami Shoji Co., Ltd.) fixed to the tip of the tester that comes into contact with the sample.
Travel distance (one way) 20mm
Movement speed 1800mm / min
Contact area: 10mm x 30mm
Load: 500g
A: It can be wiped off easily and completely by a reciprocating wiping operation.
○: A small amount of ink remains in the reciprocating wiping operation.
Δ: About half of the wiping operation is performed once.
X: It cannot wipe off at all.

[耐摩耗試験]
往復摩耗試験機(新東科学社製HEIDON 30S)を用いて、下記条件で硬化被膜の耐摩耗試験を実施した。
評価環境条件:25℃、湿度40%
擦り材:試料と接触するテスターの先端部(10mm×30mm)に不織布を8枚重ねて固定した。
荷重:500g
擦り距離(片道):40mm
擦り速度:4,800mm/min
往復回数:1000往復
[Abrasion resistance test]
Using a reciprocating abrasion tester (HEIDON 30S manufactured by Shinto Kagaku Co., Ltd.), the abrasion resistance test of the cured coating was performed under the following conditions.
Evaluation environmental conditions: 25 ° C, humidity 40%
Rubbing material: 8 sheets of nonwoven fabric were stacked and fixed on the tip (10 mm × 30 mm) of the tester that was in contact with the sample.
Load: 500g
Rubbing distance (one way): 40mm
Rubbing speed: 4,800 mm / min
Number of round trips: 1000 round trips

実施例1
工程(1i)
反応容器に、テトラヒドロフラン150g、1,3−ビストリフルオロメチルベンゼン300gを混合し、0.7Mのアリルマグネシウムブロミド160mlを適化した。続いて、下記式(1a)で示される化合物300gをゆっくりと適化した後、60℃で4時間加熱した。
Example 1
Step (1i)
In a reaction vessel, 150 g of tetrahydrofuran and 300 g of 1,3-bistrifluoromethylbenzene were mixed, and 160 ml of 0.7 M allylmagnesium bromide was optimized. Subsequently, 300 g of the compound represented by the following formula (1a) was slowly optimized and then heated at 60 ° C. for 4 hours.

加熱終了後、室温まで冷却し、1.2M塩酸水溶液300g中へ溶液を適化し、反応を停止させた。分液操作により、下層であるフッ素化合物層を回収後、アセトンで洗浄した。洗浄後、の下層であるフッ素化合物を再び回収し、溶剤及び未反応物を留去することで、下記式(1b)を290g得た。   After the heating, the solution was cooled to room temperature, and the solution was optimized in 300 g of 1.2 M hydrochloric acid aqueous solution to stop the reaction. The lower fluorine compound layer was recovered by a liquid separation operation and then washed with acetone. After washing, the lower fluorine compound was recovered again, and the solvent and unreacted substances were distilled off to obtain 290 g of the following formula (1b).

工程(1ii)
次に、上記工程(1i)で得られた化合物(式(1b))20g、1,3−トリフルオロメチルベンゼン30g、1,2−ビス(ジメチルシリル)エタン7.6g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10-9モルを含有)を混合し、80℃で3時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物20gを得た。得られた化合物を1H−NMRにより測定し、下記式(1c)であることを確認した。
Step (1ii)
Next, 20 g of the compound (formula (1b)) obtained in the above step (1i), 30 g of 1,3-trifluoromethylbenzene, 7.6 g of 1,2-bis (dimethylsilyl) ethane, chloroplatinic acid / vinyl 0.005 g of a toluene solution of a siloxane complex (containing 1.25 × 10 −9 mol as Pt alone) was mixed and aged at 80 ° C. for 3 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained compound was measured by 1 H-NMR and confirmed to be the following formula (1c).

工程(1iii)
次に、上記工程(1ii)で得られた化合物(式(1c))20g、1,3−トリフルオロメチルベンゼン30g、アリルホスホンサンジエチル3.4g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10-9モルを含有)を混合し、90℃で48時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物20gを得た。得られた混合物を1H−NMRにより測定し、下記式(1d)であることを確認した。
Step (1iii)
Next, 20 g of the compound (formula (1c)) obtained in the above step (1ii), 30 g of 1,3-trifluoromethylbenzene, 3.4 g of allylphosphonesanediethyl, toluene solution of chloroplatinic acid / vinylsiloxane complex 0 0.005 g (containing 1.25 × 10 −9 mol as a simple substance of Pt) was mixed and aged at 90 ° C. for 48 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained mixture was measured by 1 H-NMR and confirmed to be the following formula (1d).

工程(1iv)
次に、上記工程(1iii)で得られた化合物(式(1d))20g、1,3−トリフルオロメチルベンゼン30g、ジエチルエーテル10g、ブロモトリメチルシラン2.9gを混合し、70℃で24時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物21gを得た。得られた混合物を1H−NMRにより測定し、下記式(1e)であることを確認した。
Step (1iv)
Next, 20 g of the compound (formula (1d)) obtained in the above step (1iii), 30 g of 1,3-trifluoromethylbenzene, 10 g of diethyl ether, and 2.9 g of bromotrimethylsilane are mixed and mixed at 70 ° C. for 24 hours. Aged. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 21 g of a liquid product. The obtained mixture was measured by 1 H-NMR and confirmed to be the following formula (1e).

上記式(1e)の化合物(以下、「化合物1」という)の1H−NMR(TMS基準、ppm)データを次に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (1e) (hereinafter referred to as “compound 1”) are shown below.

工程(1v)
次に、上記式(1e)の化合物1 20gを水100gとアセトン50gを混合した溶液に適化し、20℃で3時間撹拌し1時間静置した。その後、下層を取り出し、溶剤を減圧溜去したところ液状の生成物17gを得た。得られた混合物を1H−NMRにより、下記式(1f)であることを確認した。
Step (1v)
Next, 20 g of the compound 1 of the above formula (1e) was optimized to a solution in which 100 g of water and 50 g of acetone were mixed, stirred at 20 ° C. for 3 hours, and allowed to stand for 1 hour. Thereafter, the lower layer was taken out and the solvent was distilled off under reduced pressure to obtain 17 g of a liquid product. It was confirmed by 1 H-NMR that the obtained mixture was the following formula (1f).

上記式(1f)の化合物(以下、「化合物2」という)の1H−NMR(TMS基準、ppm)データを以下に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (1f) (hereinafter referred to as “compound 2”) are shown below.

実施例2
実施例1で得られた化合物(式(1d))20g、1,3−トリフルオロメチルベンゼン30g、ジエチルエーテル10g、ブロモトリメチルシラン3.250gを混合し、70℃で24時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物20gを得た。得られた混合物を1H−NMRにより測定し、下記式(2e)であることを確認した。
Example 2
20 g of the compound obtained by Example 1 (formula (1d)), 30 g of 1,3-trifluoromethylbenzene, 10 g of diethyl ether and 3.250 g of bromotrimethylsilane were mixed and aged at 70 ° C. for 24 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained mixture was measured by 1 H-NMR and confirmed to be the following formula (2e).

式(2e)中、XはCH2CH3又はSi(CH33である。
CH2CH3:Si(CH33 = 59:41
(p/q=0.9、p+q≒45)
In the formula (2e), X is CH 2 CH 3 or Si (CH 3 ) 3 .
CH 2 CH 3: Si (CH 3) 3 = 59:41
(P / q = 0.9, p + q≈45)

上記式(2e)の化合物(以下、「化合物3」という)の1H−NMR(TMS基準、ppm)データを以下に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (2e) (hereinafter referred to as “compound 3”) are shown below.

実施例3
工程(3i)
実施例1で得られた化合物(式(1b))20g、1,3−トリフルオロメチルベンゼン30g、1,4−ビス(ジメチルシリル)ベンゼン30g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10-9モルを含有)を混合し、80℃で5時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物21gを得た。得られた化合物を1H−NMRにより測定し、下記式(3c)であることを確認した。
Example 3
Step (3i)
20 g of the compound (formula (1b)) obtained in Example 1, 30 g of 1,3-trifluoromethylbenzene, 30 g of 1,4-bis (dimethylsilyl) benzene, toluene solution of chloroplatinic acid / vinylsiloxane complex 005 g (containing 1.25 × 10 −9 mol as a simple substance of Pt) was mixed and aged at 80 ° C. for 5 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 21 g of a liquid product. The obtained compound was measured by 1 H-NMR and confirmed to be the following formula (3c).

工程(3ii)
次に、上記工程(3i)で得られた化合物(式(3c))20g、1,3−トリフルオロメチルベンゼン30g、アリルホスホンサンジエチル4.0g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10-9モルを含有)を混合し、90℃で48時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物20gを得た。得られた混合物を1H−NMRにより測定し、下記式(3d)であることを確認した。
Step (3ii)
Next, 20 g of the compound (formula (3c)) obtained in the above step (3i), 30 g of 1,3-trifluoromethylbenzene, 4.0 g of allyl phosphonesanediethyl, toluene solution of chloroplatinic acid / vinylsiloxane complex 0 0.005 g (containing 1.25 × 10 −9 mol as a simple substance of Pt) was mixed and aged at 90 ° C. for 48 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained mixture was measured by 1 H-NMR and confirmed to be the following formula (3d).

工程(3iii)
次に、上記工程(3ii)で得られた化合物(式(3d))20g、1,3トリフルオロメチルベンゼン30g、ジエチルエーテル10g、ブロモトリメチルシラン2.90gを混合し、70℃で24時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物21gを得た。得られた混合物を1H−NMRにより測定し、下記式(3e)であることを確認した。
Step (3iii)
Next, 20 g of the compound (formula (3d)) obtained in the above step (3ii), 30 g of 1,3 trifluoromethylbenzene, 10 g of diethyl ether and 2.90 g of bromotrimethylsilane are mixed and aged at 70 ° C. for 24 hours. I let you. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 21 g of a liquid product. The obtained mixture was measured by 1 H-NMR and confirmed to be the following formula (3e).

上記式(3e)の化合物(以下、「化合物4」という)の1H−NMR(TMS基準、ppm)データを以下に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (3e) (hereinafter referred to as “compound 4”) are shown below.

さらに、上記化合物4を超臨界精製することにより、主鎖の数平均分子量が異なるサンプルを調製した。なお、19F−NMRにより、化合物4の数平均分子量は4,380であった。   Furthermore, samples with different main chain number average molecular weights were prepared by supercritical purification of the compound 4. In addition, the number average molecular weight of the compound 4 was 4,380 by 19F-NMR.

化合物4 20gを、25mLの高圧容器に入れ、70℃に昇温した。その後、液化炭酸ガスを導入することにより、高圧容器の圧力を15MPaまで上げ、30分間超臨界状態を保った。二酸化炭素を2ml/minで2分間流し、流出したサンプルを回収した。この操作を10MPaから22MPaまで実施したところ、表1に示すサンプル(化合物5〜12)を分取することができた。   20 g of compound 4 was put in a 25 mL high pressure vessel and heated to 70 ° C. Thereafter, by introducing liquefied carbon dioxide gas, the pressure of the high-pressure vessel was increased to 15 MPa, and the supercritical state was maintained for 30 minutes. Carbon dioxide was flowed at 2 ml / min for 2 minutes, and the sample that flowed out was collected. When this operation was performed from 10 MPa to 22 MPa, the samples (compounds 5 to 12) shown in Table 1 could be collected.

工程(3iv)
次に、上記化合物4 20gを水100gとアセトン50gを混合した溶液に適化し、20℃で3時間撹拌し1時間静置した。その後、下層を取り出し、溶剤を減圧溜去したところ液状の生成物17gを得た。得られた混合物を1H−NMRにより、下記式(3f)であることを確認した。
Step (3iv)
Next, 20 g of the above compound 4 was optimized to a solution in which 100 g of water and 50 g of acetone were mixed, stirred at 20 ° C. for 3 hours and allowed to stand for 1 hour. Thereafter, the lower layer was taken out and the solvent was distilled off under reduced pressure to obtain 17 g of a liquid product. The obtained mixture was confirmed by 1 H-NMR to be the following formula (3f).

上記式(3f)の化合物(以下、「化合物13」という)の1H−NMR(TMS基準、ppm)データを以下に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (3f) (hereinafter referred to as “compound 13”) are shown below.

さらに、上記化合物13を超臨界精製することにより、主鎖の数平均分子量が異なるサンプルを調製した。なお、19F−NMRにより、化合物13の数平均分子量は4,230であった。   Furthermore, samples having different main chain number average molecular weights were prepared by supercritical purification of the compound 13. In addition, the number average molecular weight of the compound 13 was 4,230 by 19F-NMR.

化合物13 20gを、25mLの高圧容器に入れ、70℃に昇温した。その後、液化炭酸ガスを導入することにより、高圧容器の圧力を15MPaまで上げ、30分間超臨界状態を保った。二酸化炭素を2ml/minで2分間流し、流出したサンプルを回収した。この操作を10MPaから22MPaまで実施したところ、表2に示すサンプル(化合物14〜20)を分取することができた。   20 g of compound 13 was put in a 25 mL high pressure vessel and heated to 70 ° C. Thereafter, by introducing liquefied carbon dioxide gas, the pressure of the high-pressure vessel was increased to 15 MPa, and the supercritical state was maintained for 30 minutes. Carbon dioxide was flowed at 2 ml / min for 2 minutes, and the sample that flowed out was collected. When this operation was performed from 10 MPa to 22 MPa, samples (compounds 14 to 20) shown in Table 2 could be collected.

実施例4
工程(4i)
反応容器に、テトラヒドロフラン150g、1,3−ビストリフルオロメチルベンゼン300gを混合し、0.8Mのアリルマグネシウムブロミド160mlを適化した。続いて、下記式(4a)で示される化合物300gをゆっくりと適化した後、60℃で4時間加熱した。
Example 4
Step (4i)
In a reaction vessel, 150 g of tetrahydrofuran and 300 g of 1,3-bistrifluoromethylbenzene were mixed, and 160 ml of 0.8 M allylmagnesium bromide was optimized. Subsequently, 300 g of the compound represented by the following formula (4a) was slowly optimized and then heated at 60 ° C. for 4 hours.

加熱終了後、室温まで冷却し、1.2M塩酸水溶液300g中へ溶液を適化し、反応を停止させた。分液操作により、下層であるフッ素化合物層を回収後、アセトンで洗浄した。洗浄後、下層であるフッ素化合物を再び回収し、溶剤及び未反応物を留去することで、下記式(4b)を295g得た。   After the heating, the solution was cooled to room temperature, and the solution was optimized in 300 g of 1.2 M hydrochloric acid aqueous solution to stop the reaction. The lower fluorine compound layer was recovered by a liquid separation operation and then washed with acetone. After washing, the lower layer fluorine compound was recovered again, and the solvent and unreacted substances were distilled off to obtain 295 g of the following formula (4b).

工程(4ii)
次に、上記工程(4i)で得られた化合物(式(4b))20g、1,3−トリフルオロメチルベンゼン30g、1,2−ビス(ジメチルシリル)エタン11.0g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10-9モルを含有)を混合し、80℃で3時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物20gを得た。得られた化合物を1H−NMRにより測定し、下記式(4c)であることを確認した。
Step (4ii)
Next, 20 g of the compound (formula (4b)) obtained in the step (4i), 30 g of 1,3-trifluoromethylbenzene, 11.0 g of 1,2-bis (dimethylsilyl) ethane, chloroplatinic acid / vinyl 0.005 g of a toluene solution of a siloxane complex (containing 1.25 × 10 −9 mol as Pt alone) was mixed and aged at 80 ° C. for 3 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained compound was measured by 1 H-NMR and confirmed to be the following formula (4c).

工程(4iii)
次に、上記工程(4ii)で得られた化合物(式(4c))20g、1,3トリフルオロメチルベンゼン30g、アリルホスホンサンジエチル4.76g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10-9モルを含有)を混合し、90℃で48時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物20gを得た。得られた混合物を1H−NMRにより測定し、下記式(4d)であることを確認した。
Step (4iii)
Next, 20 g of the compound (formula (4c)) obtained in the above step (4ii), 30 g of 1,3 trifluoromethylbenzene, 4.76 g of allylphosphonesanediethyl, and a toluene solution of a chloroplatinic acid / vinylsiloxane complex, 0.8 g. 005 g (containing 1.25 × 10 −9 mol as Pt alone) was mixed and aged at 90 ° C. for 48 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained mixture was measured by 1 H-NMR and confirmed to be the following formula (4d).

工程(4iv)
次に、上記工程(4iii)で得られた化合物(式(4d))20g、1,3トリフルオロメチルベンゼン30g、ジエチルエーテル10g、ブロモトリメチルシラン5.0gを混合し、70℃で24時間熟成させた。その後、溶剤及び未反応物を減圧溜去したところ液状の生成物21gを得た。得られた混合物を1H−NMRにより測定し、下記式(4e)であることを確認した。
Step (4iv)
Next, 20 g of the compound (formula (4d)) obtained in the above step (4iii), 30 g of 1,3 trifluoromethylbenzene, 10 g of diethyl ether and 5.0 g of bromotrimethylsilane are mixed and aged at 70 ° C. for 24 hours. I let you. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 21 g of a liquid product. The obtained mixture was measured by 1 H-NMR and confirmed to be the following formula (4e).

上記式(4e)の化合物(以下、「化合物21」という)の1H−NMR(TMS基準、ppm)データを以下に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (4e) (hereinafter referred to as “compound 21”) are shown below.

工程(4v)
次に、上記工程(4iv)で得られた化合物(式(4e))20gを水100gとアセトン50gを混合した溶液に適化し、20℃で3時間撹拌し1時間静置した。その後、下層を取り出し、溶剤を減圧溜去したところ液状の生成物18gを得た。得られた混合物を1H−NMRにより、下記式(4f)であることを確認した。
Step (4v)
Next, 20 g of the compound (formula (4e)) obtained in the above step (4iv) was optimized to a solution in which 100 g of water and 50 g of acetone were mixed, stirred at 20 ° C. for 3 hours, and allowed to stand for 1 hour. Thereafter, the lower layer was taken out and the solvent was distilled off under reduced pressure to obtain 18 g of a liquid product. The obtained mixture was confirmed by 1 H-NMR to be the following formula (4f).

上記式(4f)の化合物(以下、「化合物22」という)の1H−NMR(TMS基準、ppm)データを以下に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (4f) (hereinafter referred to as “compound 22”) are shown below.

表面処理剤及び硬化被膜の調製
実施例1〜4で得たパーフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体を、濃度10質量%になるように、フッ素系溶剤Novec7200(3M社製)に溶解させて、処理剤を得た。サファイヤガラスの表面をプラズマ処理後に、上記各表面処理剤を下記条件及び装置で真空蒸着塗工した。80℃、湿度80%の雰囲気下で1時間硬化させた後、150℃で3時間硬化させ、被膜を形成した。
Preparation of surface treatment agent and cured coating The perfluorooxyalkylene group-containing polymer-modified phosphonic acid derivative obtained in Examples 1 to 4 was dissolved in a fluorine-based solvent Novec7200 (manufactured by 3M) so as to have a concentration of 10% by mass. Thus, a treatment agent was obtained. After plasma treatment of the surface of the sapphire glass, each of the above surface treatment agents was vacuum-deposited by the following conditions and apparatus. After curing for 1 hour in an atmosphere of 80 ° C. and 80% humidity, the coating was cured at 150 ° C. for 3 hours.

[プラズマ処理の条件]
・装置:プラズマドライ洗浄装置PDC210
・ガス:O2ガス80cc、Arガス10cc
・出力:250W
・時間:30秒
[Plasma treatment conditions]
-Equipment: Plasma dry cleaning equipment PDC210
・ Gas: O2 gas 80cc, Ar gas 10cc
・ Output: 250W
・ Time: 30 seconds

[真空蒸着による塗工条件及び装置]
・測定装置:小型真空蒸着装置VPC−250F
・圧力:2.0×10-3Pa〜3.0×10-2Pa
・蒸着温度(ボートの到達温度):500℃
・蒸着距離:20mm
・処理剤の仕込量:50mg
・蒸着量:50mg
[Coating conditions and equipment by vacuum deposition]
・ Measuring device: Small vacuum evaporation system VPC-250F
・ Pressure: 2.0 × 10 −3 Pa to 3.0 × 10 −2 Pa
・ Vapor deposition temperature (attainment temperature of boat): 500 ℃
・ Vapor deposition distance: 20mm
・ Processing agent charge: 50mg
・ Deposition amount: 50mg

比較例1〜3の表面処理剤及び硬化被膜は、化合物1及び2に代えて下記の化合物23〜25を用いた他は実施例と同様の方法で調製し、評価試験を実施した。   The surface treatment agents and cured coatings of Comparative Examples 1 to 3 were prepared in the same manner as in Examples except that the following compounds 23 to 25 were used instead of the compounds 1 and 2, and evaluation tests were performed.

(比較例1)化合物23 Comparative Example 1 Compound 23

(比較例2)化合物24 Comparative Example 2 Compound 24

(比較例3)化合物25 Comparative Example 3 Compound 25

得られた硬化被膜を下記の方法により評価した。   The obtained cured film was evaluated by the following method.

評価結果を表3(初期性能)及び表4(耐摩耗性)に示す。   The evaluation results are shown in Table 3 (initial performance) and Table 4 (wear resistance).

表3及び4より、実施例のパーフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体から形成された被膜によって、撥水撥油性が高く、動摩擦係数が低く、かつ、マジックインクの拭き取り性が優れていた。一方、ホスホン酸基又はホスホン酸エステル基を有さない比較例では、撥水撥油性、動摩擦係数は許容範囲内であったが、マジックインクの拭き取り性が悪かった。さらに、実施例のパーフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体から形成された被膜は、布で摩擦後においても水接触角100度以上、オレイン酸接触角60度以上という高い撥水撥油性を示した。一方、ホスホン酸基又はホスホン酸エステル基を有さない比較例では、撥水撥油性が大きく低下した。即ち、本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、撥水撥油性、低動摩擦性、汚れの拭き取り性、耐摩耗性、及び、基材への密着性に優れた硬化被膜を提供できる。   From Tables 3 and 4, the film formed from the perfluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the example showed high water and oil repellency, low dynamic friction coefficient, and excellent wiping performance of magic ink. . On the other hand, in the comparative example having no phosphonic acid group or phosphonic acid ester group, the water and oil repellency and the dynamic friction coefficient were within the allowable ranges, but the wiping property of the magic ink was poor. Furthermore, the film formed from the perfluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the examples has a high water and oil repellency such as a water contact angle of 100 degrees or more and an oleic acid contact angle of 60 degrees or more even after rubbing with a cloth. Indicated. On the other hand, in the comparative example having no phosphonic acid group or phosphonic acid ester group, the water / oil repellency was greatly reduced. That is, the fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention provides a cured film excellent in water / oil repellency, low dynamic friction, dirt wiping, abrasion resistance, and adhesion to a substrate. it can.

なお、本発明は、上記実施形態に限定されるものではない。上記実施形態は例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に含有される。   The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. It is contained in the technical range.

Claims (7)

下記式(1)で示されるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。
(式(1)中、Aは末端が−CF3基である1価のフッ素含有基又は下記式(2)で示される基であり、Rf1は−(CF2d−(OCF2p(OCF2CF2q(OCF2CF2CF2r(OCF2CF2CF2CF2s(OCF(CF3)CF2t−O(CF2d−であり、dはそれぞれ独立に0〜5の整数であり、p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。Bは水素原子、アシル基又はシリル基であり、Qは両末端にケイ素原子を有する2価の連結基であり、Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であり、a、bはそれぞれ独立に2〜20の整数である。)

A fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative represented by the following formula (1):
(In the formula (1), A is a monovalent fluorine-containing group whose terminal is a —CF 3 group or a group represented by the following formula (2), and Rf 1 is — (CF 2 ) d — (OCF 2 ). p (OCF 2 CF 2) q (OCF 2 CF 2 CF 2) r (OCF 2 CF 2 CF 2 CF 2) s (OCF (CF 3) CF 2) t -O (CF 2) d - a and, d Each independently represents an integer of 0 to 5, p, q, r, s and t each independently represents an integer of 0 to 200, and p + q + r + s + t is 3 to 200, and each unit shown in parentheses May be bonded randomly, B is a hydrogen atom, acyl group or silyl group, Q is a divalent linking group having silicon atoms at both ends, and X is independently a hydrogen atom or an alkali metal atom. , Unsubstituted or substituted alkyl group having 1 to 5 carbon atoms, aryl group, or J 3 Si— (J is independently an unsubstituted or substituted alkyl group or aryl group having 1 to 5 carbon atoms.), And a and b are each independently an integer of 2 to 20. )

前記Rf1が下記式(3)で示される2価の直鎖型フルオロオキシアルキレン基である請求項1に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。
(式(3)中、dはそれぞれ独立に0〜5の整数であり、p=1〜80、q=1〜80、r=0〜10、s=0〜10、p+q=5〜100を満たす整数であり、かつ、p+q+r+s+tは10〜100であり、括弧内に示される各単位はランダムに結合されていてよい。)
Divalent fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative according to claim 1 is a straight-chain fluorooxyalkylene group represented by Rf 1 is represented by the following formula (3).
(In Formula (3), d is an integer of 0-5 each independently, p = 1-80, q = 1-80, r = 0-10, s = 0-10, p + q = 5-100. (It is an integer satisfying, and p + q + r + s + t is 10 to 100, and each unit shown in parentheses may be combined randomly.)
前記Qが、下記式(4−1)〜(4−4)からなる群から選択される、両末端にケイ素原子を有する2価の連結基である請求項1又は2に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。
(式(4−1)〜(4−4)中、hは1〜10の整数であり、iは1〜100の整数であり、Rはそれぞれ独立に非置換又は置換の炭素数1〜5のアルキル基又はアリール基である。)
The fluorooxyalkylene according to claim 1 or 2, wherein Q is a divalent linking group having a silicon atom at both ends, selected from the group consisting of the following formulas (4-1) to (4-4). Group-containing polymer-modified phosphonic acid derivative.
(In Formulas (4-1) to (4-4), h is an integer of 1 to 10, i is an integer of 1 to 100, and R is independently an unsubstituted or substituted carbon number of 1 to 5. An alkyl group or an aryl group.)
請求項1〜3のいずれか1項に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸エステル誘導体の少なくとも1種以上を含む表面処理剤。   The surface treating agent containing at least 1 sort (s) or more of the fluorooxyalkylene group containing polymer modified phosphonic acid ester derivative of any one of Claims 1-3. 請求項4に記載の表面処理剤で表面処理された物品。   An article surface-treated with the surface treatment agent according to claim 4. 請求項4に記載の表面処理剤で表面処理された光学物品。   An optical article surface-treated with the surface treatment agent according to claim 4. 請求項4に記載の表面処理剤で処理されたタッチパネルディスプレイ。   A touch panel display treated with the surface treatment agent according to claim 4.
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