JP6627880B2 - Fluoroxyoxyalkylene group-containing polymer-modified phosphonic acid derivative, surface treatment agent containing the derivative, and surface treatment method using the surface treatment agent - Google Patents
Fluoroxyoxyalkylene group-containing polymer-modified phosphonic acid derivative, surface treatment agent containing the derivative, and surface treatment method using the surface treatment agent Download PDFInfo
- Publication number
- JP6627880B2 JP6627880B2 JP2017544428A JP2017544428A JP6627880B2 JP 6627880 B2 JP6627880 B2 JP 6627880B2 JP 2017544428 A JP2017544428 A JP 2017544428A JP 2017544428 A JP2017544428 A JP 2017544428A JP 6627880 B2 JP6627880 B2 JP 6627880B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- integer
- surface treatment
- independently
- phosphonic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 150000003007 phosphonic acid derivatives Chemical class 0.000 title claims description 26
- 239000012756 surface treatment agent Chemical class 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 19
- 238000004381 surface treatment Methods 0.000 title claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 24
- -1 fluorooxy Chemical group 0.000 claims description 24
- 125000005647 linker group Chemical group 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 229910052783 alkali metal Inorganic materials 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 125000002947 alkylene group Chemical group 0.000 claims description 7
- 150000001721 carbon Chemical group 0.000 claims description 7
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 7
- 150000001340 alkali metals Chemical group 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 3
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 description 31
- 239000002904 solvent Substances 0.000 description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 238000000576 coating method Methods 0.000 description 17
- 239000010408 film Substances 0.000 description 17
- 239000000203 mixture Substances 0.000 description 17
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 17
- 239000003921 oil Substances 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 16
- 238000005160 1H NMR spectroscopy Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 13
- 239000000126 substance Substances 0.000 description 12
- 239000012263 liquid product Substances 0.000 description 10
- 239000005871 repellent Substances 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000005299 abrasion Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 150000002222 fluorine compounds Chemical class 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 238000009832 plasma treatment Methods 0.000 description 4
- 230000002940 repellent Effects 0.000 description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 3
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 3
- RIQRGMUSBYGDBL-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoropentane Chemical compound FC(F)(F)C(F)C(F)C(F)(F)C(F)(F)F RIQRGMUSBYGDBL-UHFFFAOYSA-N 0.000 description 3
- NVSXSBBVEDNGPY-UHFFFAOYSA-N 1,1,1,2,2-pentafluorobutane Chemical compound CCC(F)(F)C(F)(F)F NVSXSBBVEDNGPY-UHFFFAOYSA-N 0.000 description 3
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 3
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 3
- YPJHXRAHMUKXAE-UHFFFAOYSA-N 3-diethoxyphosphorylprop-1-ene Chemical compound CCOP(=O)(CC=C)OCC YPJHXRAHMUKXAE-UHFFFAOYSA-N 0.000 description 3
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000005642 Oleic acid Substances 0.000 description 3
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- IYYIVELXUANFED-UHFFFAOYSA-N bromo(trimethyl)silane Chemical compound C[Si](C)(C)Br IYYIVELXUANFED-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229960004624 perflexane Drugs 0.000 description 3
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- UHXCHUWSQRLZJS-UHFFFAOYSA-N (4-dimethylsilylidenecyclohexa-2,5-dien-1-ylidene)-dimethylsilane Chemical compound C[Si](C)C1=CC=C([Si](C)C)C=C1 UHXCHUWSQRLZJS-UHFFFAOYSA-N 0.000 description 2
- OKIYQFLILPKULA-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-methoxybutane Chemical compound COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F OKIYQFLILPKULA-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 150000007860 aryl ester derivatives Chemical class 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- 229920005645 diorganopolysiloxane polymer Polymers 0.000 description 2
- 229940042400 direct acting antivirals phosphonic acid derivative Drugs 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229940104873 methyl perfluorobutyl ether Drugs 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000001918 phosphonic acid ester group Chemical group 0.000 description 2
- 150000003009 phosphonic acids Polymers 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- RKIMETXDACNTIE-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6-dodecafluorocyclohexane Chemical compound FC1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F RKIMETXDACNTIE-UHFFFAOYSA-N 0.000 description 1
- YZJSARUCMYJHNV-UHFFFAOYSA-N 2-dimethylsilylethyl(dimethyl)silane Chemical compound C[SiH](C)CC[SiH](C)C YZJSARUCMYJHNV-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 241000283070 Equus zebra Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000002496 gastric effect Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- DQEUYIQDSMINEY-UHFFFAOYSA-M magnesium;prop-1-ene;bromide Chemical compound [Mg+2].[Br-].[CH2-]C=C DQEUYIQDSMINEY-UHFFFAOYSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- LOQGSOTUHASIHI-UHFFFAOYSA-N perfluoro-1,3-dimethylcyclohexane Chemical compound FC(F)(F)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(C(F)(F)F)C1(F)F LOQGSOTUHASIHI-UHFFFAOYSA-N 0.000 description 1
- FYJQJMIEZVMYSD-UHFFFAOYSA-N perfluoro-2-butyltetrahydrofuran Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)OC(F)(F)C(F)(F)C1(F)F FYJQJMIEZVMYSD-UHFFFAOYSA-N 0.000 description 1
- LGUZHRODIJCVOC-UHFFFAOYSA-N perfluoroheptane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F LGUZHRODIJCVOC-UHFFFAOYSA-N 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 150000003008 phosphonic acid esters Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 210000002374 sebum Anatomy 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Polymers 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000005156 substituted alkylene group Chemical group 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/335—Polymers modified by chemical after-treatment with organic compounds containing phosphorus
- C08G65/3353—Polymers modified by chemical after-treatment with organic compounds containing phosphorus containing oxygen in addition to phosphorus
- C08G65/3355—Polymers modified by chemical after-treatment with organic compounds containing phosphorus containing oxygen in addition to phosphorus having phosphorus bound to carbon and oxygen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/40—Esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
- C09D171/02—Polyalkylene oxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Wood Science & Technology (AREA)
- Combustion & Propulsion (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Polyethers (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Paints Or Removers (AREA)
Description
本発明は、フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤並びに該表面処理剤を用いた表面処理方法に関し、詳細には、撥水撥油性、指紋拭き取り性に優れた処理表面を与えることのできるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤、並びに該表面処理剤を用いて物品及び光学物品等の表面を処理する方法に関する。 The present invention relates to a fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative, a surface treatment agent containing the derivative, and a surface treatment method using the surface treatment agent, and in particular, has excellent water / oil repellency and fingerprint wiping property. The present invention relates to a fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative capable of providing a treated surface, a surface treating agent containing the derivative, and a method for treating a surface of an article or an optical article using the surface treating agent.
一般に、パーフルオロオキシアルキレン基含有化合物は、その表面自由エネルギーが非常に小さいために、撥水撥油性、耐薬品性、潤滑性、離型性、防汚性などの特性を有し、その特性を生かして、工業的には紙・繊維などの撥水撥油防汚剤、磁気記録媒体の滑剤、精密機器の防油剤、離型剤、化粧料、保護膜などに幅広く利用されている。 In general, perfluorooxyalkylene group-containing compounds have properties such as water and oil repellency, chemical resistance, lubricity, mold release, and antifouling properties because their surface free energy is very small. Utilizing this, it is industrially widely used as a water / oil repellent / soil repellent for paper / fiber, a lubricant for magnetic recording media, an oil repellent for precision equipment, a release agent, a cosmetic, a protective film, and the like.
しかし、その性質は同時に他の基材に対して非粘着性、非密着性であることを意味しており、パーフルオロオキシアルキレン基含有化合物を基材表面に塗布することはできても、その被膜を基材表面に直接的に密着させることは困難であった。 However, its properties mean that it is non-adhesive and non-adhesive to other substrates at the same time, and even if a perfluorooxyalkylene group-containing compound can be applied to the substrate surface, It was difficult to make the coating adhere directly to the substrate surface.
一方、ガラスや布などの基材表面と有機化合物とを結合させる材料として、シランカップリング剤がよく知られており、各種基材表面のコーティング剤として幅広く利用されている。シランカップリング剤は、1分子中に有機官能基と反応性シリル基(特には加水分解性シリル基)を有する。加水分解性シリル基は、空気中の水分などによって自己縮合反応を起こして被膜を形成する。該被膜は、加水分解性シリル基がガラスや布などの表面と化学的及び/又は物理的に結合することによって耐久性を有する強固な被膜となる。 On the other hand, a silane coupling agent is well known as a material for bonding an organic compound to the surface of a substrate such as glass or cloth, and is widely used as a coating agent for various substrate surfaces. The silane coupling agent has an organic functional group and a reactive silyl group (in particular, a hydrolyzable silyl group) in one molecule. The hydrolyzable silyl group causes a self-condensation reaction due to moisture in the air or the like to form a film. The coating becomes a durable and strong coating by the chemical and / or physical bonding of the hydrolyzable silyl group to the surface of glass or cloth.
特許文献1では、下記式(I)で示されるフルオロオキシアルキレン基含有ポリマー変性シランが提案されている。 Patent Literature 1 proposes a fluorooxyalkylene group-containing polymer-modified silane represented by the following formula (I).
(式(I)中、Rf1は−CdF2dO−の繰り返し単位を5〜100個含む2価の直鎖型フルオロオキシアルキレン基(dは1〜6の整数であり、繰り返し単位ごとに異なっていてよい)であり、A及びBは、互いに独立に、Rf2基又は下記式(II)で示される基であり、Rf2はF、H、及び末端が−CF3基又は−CF2H基である1価のフッ素含有基のいずれかである。下記式(II)において、Qは2価の有機基であり、Zはシルアルキレン構造又はシルアリーレン構造を含み、かつシロキサン結合を含まない2〜7価の連結基であり、Rは炭素数1〜4のアルキル基又はフェニル基であり、Xは加水分解性基であり、aは2又は3、bは1〜6、cは1〜5の整数である。)(In the formula (I), Rf 1 is a divalent linear fluorooxyalkylene group containing 5 to 100 repeating units of —C d F 2d O— (d is an integer of 1 to 6, and each repeating unit is A and B are, independently of each other, an Rf 2 group or a group represented by the following formula (II), wherein Rf 2 is F, H, and the terminal is a —CF 3 group or — A monovalent fluorine-containing group which is a CF 2 H group, wherein in the following formula (II), Q is a divalent organic group, Z is a silalkylene structure or a silarylene structure, and a siloxane bond. Wherein R is an alkyl group having 1 to 4 carbon atoms or a phenyl group, X is a hydrolyzable group, a is 2 or 3, b is 1 to 6, c is an integer of 1 to 5.)
該フルオロオキシアルキレン基含有シランで処理したガラスは、汚れ拭き取り性に優れ、密着性に優れた材料を得ることができるが、ガラスや二酸化ケイ素(シリカ)以外の表面に直接的に密着させることは困難であった。 Glass treated with the fluorooxyalkylene group-containing silane is excellent in wiping dirt and can provide a material having excellent adhesion, but it is difficult to directly adhere to a surface other than glass or silicon dioxide (silica). It was difficult.
最近では、外観や視認性をよくするためにディスプレイの表面や電子機器等の筐体に指紋を付きにくくする技術や、汚れを落とし易くする技術の要求が年々高まってきており、ガラスや二酸化ケイ素(シリカ)以外の表面にも密着可能な材料の開発が望まれている。 Recently, there has been an increasing demand for technologies that make it difficult for fingerprints to be attached to the surface of displays and housings of electronic devices and the like to improve appearance and visibility, and technologies that make it easier to remove dirt. Development of a material that can adhere to surfaces other than (silica) is desired.
また、電子機器が設置型から携帯型へ、信号入力方式がボタン方式からタッチパネル方式へ移行するのに伴って、電子機器に直接触れる機会が増えているため、指紋を付きにくくする処理又は汚れを拭き取り易くする処理が必要な基板の種類が多様化してきている。この基板としては、ガラス以外では、金属酸化物や樹脂が挙げられる。また、タッチパネルディスプレイやウェアラブル端末の表面に被覆する撥水撥油層は、傷付き防止性及び指紋拭き取り性の観点から動摩擦係数が低いことが望ましい。そのため動摩擦係数が低い撥水撥油層の開発も要求されている。さらに、それらの端末は汚れ拭き取り作業を実施することが多いため、耐摩耗性が必要となる。 In addition, with the shift of electronic devices from stationary type to portable type and signal input type from button type to touch panel type, the number of opportunities to directly touch the electronic device is increasing. The types of substrates that need to be easily wiped have been diversified. Examples of the substrate include metal oxides and resins other than glass. In addition, it is desirable that the water- and oil-repellent layer covering the surface of the touch panel display or the wearable terminal has a low dynamic friction coefficient from the viewpoint of preventing scratches and wiping off fingerprints. Therefore, development of a water- and oil-repellent layer having a low dynamic friction coefficient is also required. In addition, these terminals often perform dirt wiping work, and thus require wear resistance.
従って、本発明の目的は、撥水撥油性、低動摩擦性、汚れの拭き取り性、離型性、耐摩耗性、及び、基材への密着性に優れた被膜を形成するフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体、及びこれを含み、性能を長期にわたって保持可能な耐久性を備えた表面処理剤、該表面処理剤で物品及び光学物品等の表面を処理する方法を提供することにある。 Therefore, an object of the present invention is to provide a water-repellent oil-repellent property, low dynamic friction property, dirt wiping property, mold release property, abrasion resistance, and a fluorooxyalkylene group-containing film which forms a film excellent in adhesion to a substrate. It is an object of the present invention to provide a polymer-modified phosphonic acid derivative, a surface treatment agent containing the same and having durability capable of maintaining performance for a long period of time, and a method of treating the surface of an article or an optical article with the surface treatment agent.
本発明者らは、上記課題を解決するため鋭意研究を重ねた結果、フルオロオキシアルキレン基含有ポリマーを主鎖構造に有し、ホスホン酸基類(ホスホン酸アルカリ金属塩基及びホスホン酸エステル基)を末端に3個有する下記化合物が、金属酸化物へ密着し、塗布後、汚れ拭き取り性、低動摩擦性に優れ、金属酸化物に対して、耐摩耗性に優れた撥水撥油層を形成できることを見出し、本発明を完成した。 The present inventors have conducted intensive studies to solve the above problems, and as a result, have a fluorooxyalkylene group-containing polymer in the main chain structure, and have phosphonic acid groups (alkali metal phosphonate groups and phosphonate ester groups). The following compounds having three at the terminal are capable of forming a water- and oil-repellent layer having excellent abrasion resistance to metal oxides by adhering to the metal oxide, and having excellent wiping properties and low dynamic friction after application. Heading, the present invention has been completed.
即ち、本発明は、下記のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤、該表面処理剤を用いて、物品、光学物品及びタッチパネルディスプレイ等の表面を処理する工程を含む表面処理方法を提供するものである。なお、本発明において「ホスホン酸誘導体」とは、前記変性基を有するホスホン酸及び該ホスホン酸のアルカリ金属塩、アルキルエステル、アリールエステル及びトリオルガノシリルエステルから選ばれる少なくとも1種であることを意味する。 That is, the present invention provides the following fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative and a surface treatment agent containing the derivative, and a step of treating the surface of an article, an optical article, a touch panel display, or the like using the surface treatment agent. Including a surface treatment method. In the present invention, the “phosphonic acid derivative” means that it is at least one selected from phosphonic acid having the modifying group and an alkali metal salt, an alkyl ester, an aryl ester, and a triorganosilyl ester of the phosphonic acid. I do.
〔1〕
下記式(1)で示されるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。[1]
A fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative represented by the following formula (1):
(式(1)中、Aは末端が−CF3基である1価のフッ素含有基であり、Rf1は−(CF2)d−(OCF2)p(OCF2CF2)q(OCF2CF2CF2)r(OCF2CF2CF2CF2)s(OCF(CF3)CF2)t−O(CF2)d−で示されるフルオロオキシアルキレン基であり、dはそれぞれ独立に0〜5の整数であり、p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。Bは単結合、又は下記式(4−1)〜(4−8)からなる群から選択される2価の連結基であり、Dは炭素原子またはケイ素原子、Eはそれぞれ独立に単結合、酸素原子、ジオルガノシロキサン基の何れかであり、Qは下記式(5−1)〜(5−4)からなる群から選択される両末端にケイ素原子を有する2価の連結基であり、Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であり、a、bはそれぞれ独立に2〜20の整数である。)
(In the formula (1), A is a monovalent fluorine-containing group whose terminal is a —CF 3 group, and Rf 1 is — (CF 2 ) d — (OCF 2 ) p (OCF 2 CF 2 ) q (OCF 2 CF 2 CF 2) r ( OCF 2 CF 2 CF 2 CF 2) s (OCF (CF 3) CF 2) t -O (CF 2) d - fluoro oxyalkylene group represented by, d are each independently Is an integer of 0 to 5, p, q, r, s, and t are each independently an integer of 0 to 200, and p + q + r + s + t is 3 to 200, and each unit shown in parentheses is randomly B is a single bond or a divalent linking group selected from the group consisting of the following formulas (4-1) to (4-8) , D is a carbon atom or a silicon atom, and E is each independently a single bond, an oxygen atom, either diorganosiloxane group, Q is formula X is a divalent linking group having silicon atoms at both terminals selected from the group consisting of (5-1) to (5-4) , and X is each independently a hydrogen atom, an alkali metal atom, an unsubstituted or substituted alkyl group having 1 to 5 carbon atoms, an aryl group, or J 3 Si- (J is an unsubstituted or substituted 1 to 5 carbon atoms alkyl or aryl group independently.) in a monovalent group represented by And a and b are each independently an integer of 2 to 20.)
〔2〕[2]
前記Aが炭素数1〜6のパーフルオロアルキル基であり、A is a perfluoroalkyl group having 1 to 6 carbon atoms,
Bが単結合又は式(4−1)、(4−2)及び(4−3)からなる群から選択される2価の連結基であり、B is a single bond or a divalent linking group selected from the group consisting of formulas (4-1), (4-2) and (4-3);
Qが式(5−1)、(5−2)及び(5−4)からなる群から選択される両末端にケイ素原子を有する2価の連結基である、〔1〕に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。The fluorooxy according to [1], wherein Q is a divalent linking group having silicon atoms at both terminals selected from the group consisting of formulas (5-1), (5-2) and (5-4). An alkylene group-containing polymer-modified phosphonic acid derivative.
〔3〕
前記Rf1が下記式(3)で示される2価の直鎖型フルオロオキシアルキレン基である〔1〕又は〔2〕に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。
[ 3 ]
The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative according to [1] or [2] , wherein Rf 1 is a divalent linear fluorooxyalkylene group represented by the following formula (3).
〔4〕
〔1〕〜〔3〕のいずれか1に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体の少なくとも1種以上を含む表面処理剤。
[ 4 ]
[1] to a surface treatment agent containing at least one of the fluorooxyalkylene group-containing polymer-modified phosphonic San誘 conductor according to any one of [3].
〔5〕
〔4〕に記載の表面処理剤を用いて物品の表面を処理する工程を含む物品の表面処理方法。
〔6〕
〔4〕に記載の表面処理剤を用いて光学物品の表面を処理する工程を含む光学物品の表面処理方法。
〔7〕
〔4〕に記載の表面処理剤を用いてタッチパネルディスプレイの表面を処理する工程を含むタッチパネルディスプレイの表面処理方法。
[ 5 ]
A method for treating the surface of an article, comprising a step of treating the surface of the article using the surface treating agent according to [ 4 ].
[ 6 ]
A surface treatment method for an optical article, comprising a step of treating the surface of the optical article using the surface treatment agent according to [ 4 ].
[ 7 ]
A surface treatment method for a touch panel display, comprising a step of treating the surface of the touch panel display using the surface treatment agent according to [ 4 ].
本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、基材への密着性に優れ、撥水撥油性、低動摩擦性、汚れの拭き取り性に優れた被膜を与えることができ、種々のコーティング用途に長期に渡って有効に使用することができる。 The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention has excellent adhesion to a substrate, and can provide a coating excellent in water / oil repellency, low dynamic friction, and dirt wiping properties, and can be used for various coatings. It can be used effectively for a long period of time.
以下に、本発明をより詳細に説明する。 Hereinafter, the present invention will be described in more detail.
本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、下記式(1)で示されるものである。 The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention is represented by the following formula (1).
(式(1)中、Aは末端が−CF3基である1価のフッ素含有基又は下記式(2)で示される基であり、Rf1は−(CF2)d−(OCF2)p(OCF2CF2)q(OCF2CF2CF2)r(OCF2CF2CF2CF2)s(OCF(CF3)CF2)t−O(CF2)d−で示されるフルオロオキシアルキレン基であり、dはそれぞれ独立に0〜5の整数であり、p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。Bは単結合、又はいずれかの末端に非置換又は置換のアルキレン構造を有する2価の連結基であり、Dは炭素原子またはケイ素原子、Eはそれぞれ独立に単結合、酸素原子、ジオルガノシロキサン基の何れかであり、Qは両末端にケイ素原子を有する2価の連結基であり、Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であり、a、bはそれぞれ独立に2〜20の整数である。)(In the formula (1), A is a monovalent fluorine-containing group whose terminal is a —CF 3 group or a group represented by the following formula (2), and Rf 1 is — (CF 2 ) d — (OCF 2 ) p (OCF 2 CF 2) q (OCF 2 CF 2 CF 2) r (OCF 2 CF 2 CF 2 CF 2) s (OCF (CF 3) CF 2) t -O (CF 2) d - fluoro represented by An oxyalkylene group, d is each independently an integer of 0 to 5, p, q, r, s, and t are each independently an integer of 0 to 200, and p + q + r + s + t is 3 to 200; Each unit shown in parentheses may be randomly bonded, B is a single bond or a divalent linking group having an unsubstituted or substituted alkylene structure at any terminal, and D is a carbon atom or a silicon atom. Atom and E are independently connected , An oxygen atom, or a diorganosiloxane group, Q is a divalent linking group having silicon atoms at both ends, and X is each independently a hydrogen atom, an alkali metal atom, an unsubstituted or substituted carbon number. 1-5 alkyl group, a monovalent group represented by aryl group, or J 3 Si- (J is an unsubstituted or substituted alkyl or aryl group of 1 to 5 carbon atoms independently.), a and b are each independently an integer of 2 to 20.)
(式(2)中、B、D、E、Q、X、a、bは、それぞれ式(1)と同じ意味を示す。) (In the formula (2), B, D, E, Q, X, a and b each have the same meaning as the formula (1).)
本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、末端が−CF3基で封鎖された1価のフルオロオキシアルキレン基含有ポリマー残基(A−Rf1)、又は2価のフルオロオキシアルキレン基含有ポリマー残基(Rf1)と、ホスホン酸基類((−(CH2)b−PO(OH)2)又は(−(CH2)b−PO(OX)2))が、ジメチルシリレン基、ジエチルシリレン基、ジフェニルシリレン基等のジオルガノシリレン基、ジメチルポリシロキサン基、ジエチルポリシロキサン基、ジフェニルポリシロキサン基等のジオルガノポリシロキサン基のいずれかを含む2価の連結基を介して結合した構造であり、ホスホン酸基類を分子鎖の片末端に3個有するか、あるいは分子鎖両末端にそれぞれ3個ずつ(即ち、1分子中に合計6個)有するホスホン酸又はその誘導体(該ホスホン酸のアルカリ金属塩、アルキルエステル、アリールエステル及びトリオルガノシリルエステルから選ばれる少なくとも1種)である。The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention may be a monovalent fluorooxyalkylene group-containing polymer residue (A-Rf 1 ) whose terminal is blocked with a —CF 3 group, or a divalent fluorooxyalkylene. The group-containing polymer residue (Rf 1 ) and the phosphonic acid group ((— (CH 2 ) b —PO (OH) 2 ) or (— (CH 2 ) b —PO (OX) 2 ) are converted to dimethylsilylene Group, a diorganosilylene group such as a diethylsilylene group or a diphenylsilylene group, or a divalent linking group containing any one of a diorganopolysiloxane group such as a dimethylpolysiloxane group, a diethylpolysiloxane group, and a diphenylpolysiloxane group. It has a bonded structure, and has three phosphonic acid groups at one end of the molecular chain, or three at each end of the molecular chain. Is (i.e., a total of six in one molecule) having phosphonic acid or a derivative thereof (an alkali metal salt of said phosphonic acid, alkyl esters, aryl esters and at least one selected from the triorganosilyl ester).
上記式(1)において、Rf1は下記式で示される直鎖型又は分岐型のフルオロオキシアルキレン基である。In the above formula (1), Rf 1 is a linear or branched fluorooxyalkylene group represented by the following formula.
式中、dはそれぞれ独立に0〜5の整数、p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。該フルオロオキシアルキレン基の繰り返し単位の合計(p+q+r+s+t)は3〜200であり、10〜150が好ましく、15〜80がより好ましい。
上記繰り返し単位を含むRf1として、具体的には、下記のものが例示できる。In the formula, d is each independently an integer of 0 to 5, p, q, r, s, and t are each independently an integer of 0 to 200, and p + q + r + s + t is 3 to 200, and is shown in parentheses. Each unit may be linked randomly. The total (p + q + r + s + t) of the repeating units of the fluorooxyalkylene group is from 3 to 200, preferably from 10 to 150, more preferably from 15 to 80.
Specific examples of Rf 1 containing the above repeating unit include the following.
(式中、d’は上記dと同一であり、p’は上記pと同一であり、q’は上記qと同一であり、r’、s’、t’はそれぞれ1以上の整数であり、その上限は上記r、s、tの上限と同一である。) (Wherein, d 'is the same as d, p' is the same as p, q 'is the same as q, and r', s ', and t' are each an integer of 1 or more. , And the upper limit is the same as the upper limit of r, s, and t.)
中でも、タッチパネル等の滑り性を重視する用途には、低動摩擦性の観点から、Rf1は下記式(3)で示される2価の直鎖型フルオロオキシアルキレン基が好ましい。Above all, for applications where importance is placed on slipperiness, such as touch panels, Rf 1 is preferably a divalent linear fluorooxyalkylene group represented by the following formula (3) from the viewpoint of low dynamic friction.
(式(3)中、dはそれぞれ独立に0〜5の整数であり、p=1〜80、q=1〜80、r=0〜10、s=0〜10、p+q=5〜100を満たす整数であり、かつ、p+q+r+sは10〜100であり、括弧内に示される各単位はランダムに結合されていてよい。) (In the formula (3), d is each independently an integer of 0 to 5, p = 1 to 80, q = 1 to 80, r = 0 to 10, s = 0 to 10, and p + q = 5 to 100. It is an integer that satisfies, p + q + r + s is 10 to 100, and each unit shown in parentheses may be randomly bonded.)
上記式(1)において、Aは末端が−CF3基である1価のフッ素含有基であるか、又は上記式(2)で示される基であり、Aがフッ素含有基の場合(即ち、A−Rf1が末端CF3基封鎖の1価のフルオロオキシアルキレン基含有ポリマー残基である場合)には、Aは炭素数1〜6、特には炭素数1〜4のパーフルオロアルキル基が好ましく、中でも−CF3基、−CF2CF3基がより好ましい。In the above formula (1), A is a monovalent fluorine-containing group whose terminal is a —CF 3 group or a group represented by the above formula (2), and when A is a fluorine-containing group (that is, In the case where A-Rf 1 is a monovalent fluorooxyalkylene group-containing polymer residue having a terminal CF 3 group blocked, A is a perfluoroalkyl group having 1 to 6 carbon atoms, particularly 1 to 4 carbon atoms. Among them, a —CF 3 group and a —CF 2 CF 3 group are more preferable.
上記式(1)及び(2)において、a及びbは2〜20の整数であり、2〜10の整数が好ましい。 In the above formulas (1) and (2), a and b are integers of 2 to 20, preferably 2 to 10.
上記式(1)及び(2)において、Qは両末端にケイ素原子を有する2価のケイ素含有連結基であって、−(CH2)a−基と−(CH2)b−基との連結基であり、炭素数4〜120、特には炭素数6〜80、とりわけ炭素数6〜40の、2価のケイ素含有有機基であることが好ましい。該有機基は、ジメチルポリシロキサン基、ジエチルポリシロキサン基、ジフェニルポリシロキサン基、メチルフェニルポリシロキサン基、等のジオルガノポリシロキサン基であるか、あるいは、非置換又は置換の炭素数1〜12の2価の炭化水素基の両末端が、ジメチルシリレン基、ジエチルシリレン基、ジフェニルシリレン基等のジオルガノシリレン基でそれぞれ封鎖された2価のケイ素含有有機基からなる群から選択される1種又は2種以上であることが好ましい。In the above formula (1) and (2), Q is a divalent silicon-containing linking group having a silicon atom at both terminals, - (CH 2) a - group and - (CH 2) b - the base It is a linking group, and is preferably a divalent silicon-containing organic group having 4 to 120 carbon atoms, particularly 6 to 80 carbon atoms, particularly 6 to 40 carbon atoms. The organic group is a diorganopolysiloxane group such as a dimethylpolysiloxane group, a diethylpolysiloxane group, a diphenylpolysiloxane group, a methylphenylpolysiloxane group, or an unsubstituted or substituted C1-C12 group. One type selected from the group consisting of divalent silicon-containing organic groups each of which is terminated with a diorganosilylene group such as a dimethylsilylene group, a diethylsilylene group, or a diphenylsilylene group at both terminals of the divalent hydrocarbon group, or It is preferable to use two or more types.
ここで、両末端がジオルガノシリレン基で封鎖された非置換又は置換の炭素数1〜12の2価の炭化水素基における炭化水素基としては、メチレン基、エチレン基、プロピレン基(トリメチレン基、メチルエチレン基)、ブチレン基(テトラメチレン基、メチルプロピレン基)、ヘキサメチレン基、オクタメチレン基等のアルキレン基、フェニレン基等のアリーレン基、ノルボルニル基又はこれらの基の2種以上の組み合わせ(アルキレン・アリーレン基、ノルボルニル・アルキレン基等)で示される2価の基などが挙げられ、これらの基の水素原子の一部又は全部をフッ素、塩素、臭素、ヨウ素等のハロゲン原子で置換したものであってもよく、中でも非置換又は置換の炭素数1〜3のアルキレン基又はフェニレン基が好ましい。 Here, as the hydrocarbon group in the unsubstituted or substituted divalent hydrocarbon group having 1 to 12 carbon atoms, both ends of which are blocked with a diorganosilylene group, methylene group, ethylene group, propylene group (trimethylene group, Methylene group), butylene group (tetramethylene group, methylpropylene group), alkylene group such as hexamethylene group, octamethylene group, arylene group such as phenylene group, norbornyl group, or a combination of two or more of these groups (alkylene group) An arylene group, a norbornyl-alkylene group, etc.), in which some or all of the hydrogen atoms of these groups are substituted with halogen atoms such as fluorine, chlorine, bromine, and iodine. It may be present, and among them, an unsubstituted or substituted alkylene group having 1 to 3 carbon atoms or a phenylene group is preferable.
上記式(1)及び(2)において、Bは単結合又はいずれかの末端に非置換又は置換のアルキレン構造を有する2価の連結基であり、前記フルオロオキシアルキレン基含有ポリマー残基(Rf1)と炭素原子またはケイ素原子(D)とを連結する2価の連結基である。この2価の連結基は、その構造中に、例えば、炭素数1〜20、好適には2〜12の、非置換又はハロゲン置換のアルキレン構造を含むものであるが、酸素原子(エーテル結合)、アミド基、N−メチル置換アミド基、N−フェニル置換アミド基、フェニレン基、ジオルガノシリレン基、トリオルガノシリル基、シラノール基等のヘテロ原子を含有する構造の1種又は2種以上を含むものであってもよい。このBとして具体的には、例えば、単結合、又は下記に示される2価の連結基などが挙げられる。In the above formulas (1) and (2), B is a single bond or a divalent linking group having an unsubstituted or substituted alkylene structure at either end, and the fluorooxyalkylene group-containing polymer residue (Rf 1 ) And a carbon or silicon atom (D). The divalent linking group includes, for example, an unsubstituted or halogen-substituted alkylene structure having 1 to 20, preferably 2 to 12 carbon atoms in its structure, and includes an oxygen atom (ether bond), an amide Containing one or more heteroatom-containing structures such as a group, an N-methyl-substituted amide group, an N-phenyl-substituted amide group, a phenylene group, a diorganosilylene group, a triorganosilyl group, and a silanol group. There may be. Specific examples of B include a single bond or a divalent linking group shown below.
(式中、hは2〜10の整数であり、Meはメチル基である。) (In the formula, h is an integer of 2 to 10, and Me is a methyl group.)
(式中、hは2〜10の整数であり、Meはメチル基である。) (In the formula, h is an integer of 2 to 10, and Me is a methyl group.)
例えば、Qとしては下記の基が挙げられる。 For example, Q includes the following groups.
(式中、iは1〜10の整数であり、jは1〜100の整数であり、Meはメチル基であり、Phはフェニル基である。) (In the formula, i is an integer of 1 to 10, j is an integer of 1 to 100, Me is a methyl group, and Ph is a phenyl group.)
本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、上記式(1)で示される化合物であり、Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であるが、ここで、アルカリ金属としては、例えばナトリウム、カリウムなどが挙げられる。The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention is a compound represented by the above formula (1), wherein X is each independently a hydrogen atom, an alkali metal atom, an unsubstituted or substituted carbon atom having 1 to 5 carbon atoms. alkyl group, an aryl group, or J 3 Si- (J is independently an unsubstituted or substituted alkyl or aryl group having 1 to 5 carbon atoms.) is a monovalent group represented by, where Examples of the alkali metal include sodium and potassium.
本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、基材への密着性、撥水撥油性、低動摩擦性、離型性、汚れの拭き取り性、耐摩耗性に優れた硬化被膜を与えることができ、種々のコーティング用途に長期に渡って有効に使用し得る。また、汚れを拭き取り易く、眼鏡レンズ、反射防止膜、偏光板、TV、タッチパネルディスプレイ、ウェアラブル端末、タブレットPC、時計、携帯電話、装飾品、精密金型の被膜として好適である。 The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention provides a cured film having excellent adhesion to a substrate, water / oil repellency, low dynamic friction, mold release, dirt wiping, and abrasion resistance. And can be effectively used for a long time in various coating applications. Also, it is easy to wipe off dirt, and is suitable as a coating for spectacle lenses, antireflection films, polarizing plates, TVs, touch panel displays, wearable terminals, tablet PCs, watches, mobile phones, decorative articles, and precision molds.
上記式(1)で示されるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、例えば、次の方法により製造することができる。
まず、公知の方法によりパーフルオロオキシアルキレン基含有ポリマーの末端に不飽和結合基を3つ付加した化合物を得る。
次に末端に不飽和結合基を3つ有するフルオロオキシアルキレン基含有ポリマーと、SiH結合を2つ有する有機ケイ素化合物とを、フッ素系溶剤中、付加反応触媒、例えば塩化白金酸/ビニルシロキサン錯体存在下で、40〜120℃、好ましくは60〜100℃で、1〜72時間、好ましくは3〜24時間反応させ、その後、溶剤及び未反応物を80〜150℃、好ましくは90℃〜120℃で減圧留去することで、末端にSiH基を有するフルオロオキシアルキレン基含有ポリマーを得ることができる。
次いで、該ポリマーと末端に不飽和結合基を有するホスホン酸エステルとをフッ素系溶剤中、付加反応触媒、例えば塩化白金酸/ビニルシロキサン錯体存在下、40〜120℃、好ましくは60〜100℃で、1〜72時間、好ましくは3〜24時間反応させ、その後、溶剤及び未反応物を80〜150℃、好ましくは90℃〜120℃で減圧留去することで、フルオロオキシアルキレン基含有ポリマー変性ホスホン酸エステルを得ることができる。
さらに、該エステルを加水分解することによりフルオロオキシアルキレン基含有ポリマー変性ホスホン酸を得ることができる。加水分解は、塩酸や硫酸等の酸の存在下、大量の水分と反応させることにより行うことができ、還流状態で3時間以上反応させると良い。また、エステル基がトリメチルシリルエステル基の場合には、室温で水と撹拌するのみでもフルオロオキシアルキレン基含有ポリマー変性ホスホン酸を得ることができる。The fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative represented by the above formula (1) can be produced, for example, by the following method.
First, a compound having three unsaturated bonding groups added to the terminal of a perfluorooxyalkylene group-containing polymer is obtained by a known method.
Next, a fluorooxyalkylene group-containing polymer having three unsaturated bond groups at the terminal and an organosilicon compound having two SiH bonds are added in a fluorine-based solvent to an addition reaction catalyst such as a chloroplatinic acid / vinylsiloxane complex. Under a temperature of 40 to 120 ° C., preferably 60 to 100 ° C., for 1 to 72 hours, preferably 3 to 24 hours, after which the solvent and unreacted materials are reacted at 80 to 150 ° C., preferably 90 to 120 ° C. By distilling off under reduced pressure, a fluorooxyalkylene group-containing polymer having a terminal SiH group can be obtained.
Next, the polymer and a phosphonic acid ester having an unsaturated bond group at a terminal thereof are reacted at 40 to 120 ° C., preferably 60 to 100 ° C. in a fluorine-based solvent in the presence of an addition reaction catalyst such as a chloroplatinic acid / vinylsiloxane complex. , For 1 to 72 hours, preferably 3 to 24 hours, and thereafter, the solvent and unreacted substances are distilled off under reduced pressure at 80 to 150 ° C, preferably 90 to 120 ° C, to thereby modify the fluorooxyalkylene group-containing polymer. A phosphonate ester can be obtained.
Furthermore, a fluorooxyalkylene group-containing polymer-modified phosphonic acid can be obtained by hydrolyzing the ester. The hydrolysis can be carried out by reacting with a large amount of water in the presence of an acid such as hydrochloric acid or sulfuric acid. Further, when the ester group is a trimethylsilyl ester group, a fluorooxyalkylene group-containing polymer-modified phosphonic acid can be obtained only by stirring with water at room temperature.
分子鎖末端に不飽和結合基を3つ有するフルオロオキシアルキレン基含有ポリマーとしては、例えば、以下に示すものが例示できる。 Examples of the fluorooxyalkylene group-containing polymer having three unsaturated bonding groups at the molecular chain terminals include the following.
上記式中のRf1としては、例えば、以下の構造が例示できる。Examples of Rf 1 in the above formula include the following structures.
本発明の表面処理剤は、本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体を主成分とするものである。 The surface treating agent of the present invention contains the fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention as a main component.
本発明の表面処理剤は、片末端にホスホン酸基類を有するタイプと、両末端にホスホン酸基類を有するタイプとを混合しても良い。片末端にホスホン酸基類を有するタイプは、両末端にホスホン酸基類を有するタイプと比較して、撥水撥油性が高く、動摩擦係数が低く、耐摩耗性にも優れる。一方、両末端にホスホン酸基類を有するタイプは、片末端にホスホン酸基類を有するタイプと比較して、薄膜塗工でも表面改質が可能である点で優れる。そのため、用途に合わせて、片末端にホスホン酸基類を有するタイプと、両末端にホスホン酸基類を有するタイプとを混合して、表面処理剤として使用することが好ましい。 In the surface treatment agent of the present invention, a type having a phosphonic acid group at one end and a type having a phosphonic acid group at both ends may be mixed. The type having a phosphonic acid group at one end has higher water / oil repellency, a lower dynamic friction coefficient, and is superior in abrasion resistance as compared with the type having a phosphonic acid group at both ends. On the other hand, the type having phosphonic acid groups at both ends is superior to the type having phosphonic acid groups at one end in that surface modification is possible even in thin film coating. Therefore, it is preferable to mix a type having a phosphonic acid group at one end with a type having a phosphonic acid group at both ends and use it as a surface treatment agent according to the application.
また、本発明の表面処理剤は無官能性フルオロオキシアルキレン基含有ポリマーを含んでもよく、この無官能性フルオロオキシアルキレン基含有ポリマーは、片末端加水分解性ポリマーと両末端加水分解性ポリマーの合計100質量部に対して、通常、5〜120質量部、好ましくは10〜60質量部含まれることが低い動摩擦係数と耐久性を両立するうえで有利である。 Further, the surface treatment agent of the present invention may contain a non-functional fluorooxyalkylene group-containing polymer, and the non-functional fluorooxyalkylene group-containing polymer is a total of one-terminal hydrolyzable polymer and both-terminal hydrolysable polymer. It is advantageous to include 5 to 120 parts by mass, preferably 10 to 60 parts by mass with respect to 100 parts by mass in order to achieve both a low dynamic friction coefficient and durability.
また、該表面処理剤は、上記の無官能性フルオロオキシアルキレン基含有ポリマー以外に、溶媒を含んでいてもよく、適当な溶剤に溶解させてから塗工することが好ましい。このような溶剤としては、フッ素変性脂肪族炭化水素系溶剤(ペンタフルオロブタン、デカフルオロペンタン、パーフルオロヘキサン、パーフルオロヘプタン、メトキシパーフルオロヘプテン、パーフルオロオクタン、パーフルオロシクロヘキサン、パーフルオロ1,3−ジメチルシクロヘキサンなど)、フッ素変性芳香族炭化水素系溶剤(m−キシレンヘキサフルオライド、ベンゾトリフルオライド、1,3−トリフルオロメチルベンゼンなど)、フッ素変性エーテル系溶剤(メチルパーフルオロプロピルエーテル、メチルパーフルオロブチルエーテル、エチルパーフルオロブチルエーテル、パーフルオロ(2−ブチルテトラヒドロフラン)など)、フッ素変性アルキルアミン系溶剤(パーフルオロトリブチルアミン、パーフルオロトリペンチルアミンなど)、炭化水素系溶剤(石油ベンジン、ミネラルスピリッツ、トルエン、キシレンなど)、ケトン系溶剤(アセトン、メチルエチルケトン、メチルイソブチルケトンなど)、エーテル系溶剤(テトラヒドロフラン、ジエチルエーテルなど)、エステル系溶剤(酢酸エチルなど)、アルコール系溶剤(イソプロピルアルコールなど)を例示することができる。これらの中では、溶解性、濡れ性などの点で、フッ素変性された溶剤が好ましく、メチルパーフルオロブチルエーテル、エチルパーフルオロブチルエーテル、メトキシパーフルオロヘプテン、デカフルオロペンタン、ペンタフルオロブタン、パーフルオロヘキサン、m−キシレンヘキサフルオライドがより好ましく、エチルパーフルオロブチルエーテルやデカフルオロペンタン、ペンタフルオロブタン、パーフルオロヘキサンが特に好ましい。 In addition, the surface treatment agent may contain a solvent in addition to the non-functional fluorooxyalkylene group-containing polymer, and it is preferable that the surface treatment agent is dissolved in an appropriate solvent before coating. Examples of such a solvent include fluorine-modified aliphatic hydrocarbon solvents (pentafluorobutane, decafluoropentane, perfluorohexane, perfluoroheptane, methoxyperfluoroheptene, perfluorooctane, perfluorocyclohexane, perfluoro1, 3-dimethylcyclohexane, etc.), fluorine-modified aromatic hydrocarbon solvents (m-xylenehexafluoride, benzotrifluoride, 1,3-trifluoromethylbenzene, etc.), fluorine-modified ether solvents (methyl perfluoropropyl ether, Methyl perfluorobutyl ether, ethyl perfluorobutyl ether, perfluoro (2-butyltetrahydrofuran), etc., fluorine-modified alkylamine solvents (perfluorotributylamine, perfluorotripe) Butylamine, petroleum benzene, mineral spirits, toluene, xylene, etc., ketone solvents (acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.), ether solvents (tetrahydrofuran, diethyl ether, etc.), ester solvents ( Examples thereof include ethyl acetate and the like, and alcohol solvents (such as isopropyl alcohol). Of these, fluorine-modified solvents are preferable in terms of solubility, wettability, etc., and methyl perfluorobutyl ether, ethyl perfluorobutyl ether, methoxyperfluoroheptene, decafluoropentane, pentafluorobutane, and perfluorohexane are preferred. And m-xylene hexafluoride are more preferable, and ethyl perfluorobutyl ether, decafluoropentane, pentafluorobutane and perfluorohexane are particularly preferable.
上記溶媒はその2種以上を混合してもよく、溶媒に溶解させるフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体の最適濃度は、処理方法により異なるが0.01〜50質量%、特に0.03〜25質量%であることが好ましい。 The solvent may be a mixture of two or more kinds thereof. The optimum concentration of the fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative to be dissolved in the solvent varies depending on the treatment method, but is 0.01 to 50% by mass, particularly 0.03% by mass. It is preferably about 25% by mass.
表面処理剤は、ウェット塗工法(刷毛塗り、ディッピング、スプレー、インクジェット)、蒸着法など公知の方法で基材に施与することができる。また、硬化温度は、硬化方法によって異なるが、80℃から200℃までの範囲が好ましい。硬化湿度としては、加湿下で行うことが反応を促進する上で好ましい。 The surface treating agent can be applied to the substrate by a known method such as a wet coating method (brush coating, dipping, spraying, inkjet), a vapor deposition method, and the like. The curing temperature varies depending on the curing method, but is preferably in the range of 80 ° C to 200 ° C. The curing humidity is preferably performed under humidification in order to accelerate the reaction.
また、硬化被膜(フッ素層)の膜厚は、50nm以下が好ましく、特に2〜20nmが好ましく、さらに4〜15nmが好ましい。 The thickness of the cured film (fluorine layer) is preferably 50 nm or less, particularly preferably 2 to 20 nm, and more preferably 4 to 15 nm.
上記表面処理剤で処理される基材は、特に制限されず、紙、布、金属及びその酸化物、ガラス、プラスチック、セラミック、石英、サファイヤなど各種材質のものであってよく、サファイヤ、金属酸化物であることが好ましく、これらに撥水撥油性、低動摩擦性、防汚性を付与することができる。 The substrate treated with the surface treatment agent is not particularly limited, and may be of various materials such as paper, cloth, metal and oxides thereof, glass, plastic, ceramic, quartz, and sapphire. It is preferable that they have water and oil repellency, low dynamic friction properties, and antifouling properties.
基板の表面がハードコート処理や反射防止処理されていてもよい。密着性を更に向上させるためには、プライマー層として、金属酸化物層(TiO2、Al2O3、ZrO2、Ta2O5、ITO、AgO、CuO等)処理、真空プラズマ処理、大気圧プラズマ処理、イトロ処理、UV処理、VUV(真空紫外線)処理、アルカリ処理、酸処理等の公知の処理方法を用いてもよい。The surface of the substrate may be subjected to a hard coat treatment or an antireflection treatment. In order to further improve the adhesion, as a primer layer, a metal oxide layer (TiO 2 , Al 2 O 3 , ZrO 2 , Ta 2 O 5 , ITO, AgO, CuO, etc.) treatment, vacuum plasma treatment, atmospheric pressure Known treatment methods such as plasma treatment, itro treatment, UV treatment, VUV (vacuum ultraviolet) treatment, alkali treatment, and acid treatment may be used.
本発明の表面処理剤で処理される物品としては、カーナビゲーション、カーオーディオ、タブレットPC、スマートフォン、ウェアラブル端末、携帯電話、デジタルカメラ、デジタルビデオカメラ、PDA、ポータブルオーディオプレーヤー、ゲーム機器、各種操作パネル、電子公告等に使用される液晶ディスプレイ、有機ELディスプレイ、プラズマディスプレイ、タッチパネルディスプレイや、メガネレンズ、カメラレンズ、レンズフィルター、サングラス、胃カメラ等の医療用器機、複写機、保護フィルム、反射防止フィルム等の光学物品が挙げられる。さらに、インクジェットプリンターやスプレー装置等のノズル、レジストの撥液剤としても使用できる。本発明の表面処理剤は、前記物品に指紋、皮脂、油が付着するのを防止し、汚れを容易に拭き取ることができるため、特にメガネレンズ、スマートフォン、PC、スマートウォッチ等のタッチパネルディスプレイや輸送用機器のインパネの撥水撥油層として特に有用である。 Articles treated with the surface treatment agent of the present invention include car navigation, car audio, tablet PC, smartphone, wearable terminal, mobile phone, digital camera, digital video camera, PDA, portable audio player, game machine, various operation panels Liquid crystal display, organic EL display, plasma display, touch panel display, medical equipment such as spectacle lens, camera lens, lens filter, sunglasses, gastric camera, copier, protective film, anti-reflection film And other optical articles. Further, it can be used as a nozzle for an ink jet printer or a spray device, or as a liquid repellent for resist. Since the surface treatment agent of the present invention prevents fingerprints, sebum, and oil from adhering to the article and can easily wipe off dirt, it is particularly useful for eyeglass lenses, smartphones, PCs, touch panel displays such as smart watches, and transportation. It is particularly useful as a water- and oil-repellent layer of an instrument panel of a device.
以下に、実施例及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に限定されるものではない。 Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples.
実施例及び比較例において使用した試験方法は、以下のとおりである。 The test methods used in the examples and comparative examples are as follows.
[撥水撥油性の評価方法]
接触角計(協和界面科学社製DropMaster)を用いて、硬化被膜の水接触角及びオレイン酸に対する接触角を25℃、湿度40%で測定した。なお、水接触角は、2μlの液滴をサンプル表面に着滴させた後、1秒後に測定した。オレイン酸接触角は、4μlの液滴をサンプル表面に着滴させた後、1秒後に測定した。[Method of evaluating water / oil repellency]
Using a contact angle meter (DropMaster manufactured by Kyowa Interface Science Co., Ltd.), the water contact angle of the cured film and the contact angle with oleic acid were measured at 25 ° C. and 40% humidity. The water contact angle was measured one second after a 2 μl droplet was deposited on the sample surface. The oleic acid contact angle was measured one second after a 4 μl droplet was deposited on the sample surface.
[動摩擦係数]
ベンコット(旭化成社製)に対する動摩擦係数を、表面性試験機(新東科学社製 HEIDON 14FW)を用いて下記条件で測定した。
接触面積:10mm×30mm
荷重:100g[Dynamic friction coefficient]
The dynamic friction coefficient with respect to Bencott (made by Asahi Kasei Corporation) was measured using a surface property tester (HEIDON 14FW manufactured by Shinto Kagaku Co., Ltd.) under the following conditions.
Contact area: 10 mm x 30 mm
Load: 100g
[マジックインク拭き取り性]
下記にて作製した硬化被膜を用い、処理表面に油性マジック(ゼブラ株式会社製『ハイマッキー』)を塗り、ラビングテスター(新東科学社製)により下記条件で拭いた後のマジックインクの拭き取り性を、下記指標を用い、目視により評価した。
試験環境条件:25℃、湿度40%
拭き取り材:試料と接触するテスターの先端部にティッシュペーパー(カミ商事株式会社製エルモア)を固定したもの。
移動距離(片道):20mm
移動速度:1800mm/min
接触面積:10mm×30mm
荷重:500g
◎:1往復の拭き取り操作で簡単に完全に拭き取れる。
○:1往復の拭き取り操作では少しインクが残る。
△:1往復の拭き取り操作では半分ほどインクが残る。
×:全く拭きとれない。[Magic ink wiping properties]
Using the cured film prepared below, apply an oil-based magic ("Hi Mackey" manufactured by Zebra Corporation) to the treated surface, and wipe off the magic ink after wiping with a rubbing tester (manufactured by Shinto Kagaku) under the following conditions. Was visually evaluated using the following indices.
Test environment conditions: 25 ° C, humidity 40%
Wipe material: Tissue paper (Kami Shoji Co., Ltd. Elmore) fixed to the tip of the tester that comes in contact with the sample.
Travel distance (one way): 20mm
Moving speed: 1800mm / min
Contact area: 10 mm x 30 mm
Load: 500g
◎: It can be easily and completely wiped off by one round trip wiping operation.
: 1: A small amount of ink remains in the reciprocating wiping operation.
Δ: About half the ink remains in the reciprocating wiping operation.
X: It cannot be wiped off at all.
[耐摩耗試験]
往復摩耗試験機(新東科学社製HEIDON 30S)を用いて、下記条件で硬化被膜の耐摩耗試験を実施した。
評価環境条件:25℃、湿度40%
擦り材:試料と接触するテスターの先端部(10mm×30mm)に不織布を8枚重ねて固定した。
荷重:1kg
擦り距離(片道):40mm
擦り速度:4,800mm/min
往復回数:3000往復[Wear resistance test]
Using a reciprocating abrasion tester (HEIDON 30S manufactured by Shinto Kagaku Co., Ltd.), an abrasion resistance test of the cured film was performed under the following conditions.
Evaluation environment conditions: 25 ° C, humidity 40%
Abrasive material: Eight nonwoven fabrics were stacked and fixed on the tip (10 mm × 30 mm) of a tester that was in contact with the sample.
Load: 1kg
Rubbing distance (one way): 40mm
Rubbing speed: 4,800 mm / min
Number of round trips: 3000 round trips
実施例1
工程(1i)
反応容器に、テトラヒドロフラン150g、1,3−ビストリフルオロメチルベンゼン300gを混合し、0.7M(モル濃度)のアリルマグネシウムブロミド溶液160mlを滴下した。続いて、下記式(1a)で示される化合物300gをゆっくりと添加した後、60℃で4時間加熱した。Example 1
Step (1i)
150 g of tetrahydrofuran and 300 g of 1,3-bistrifluoromethylbenzene were mixed into a reaction vessel, and 160 ml of a 0.7 M (molar concentration) allylmagnesium bromide solution was added dropwise. Subsequently, after slowly adding 300 g of the compound represented by the following formula (1a), the mixture was heated at 60 ° C. for 4 hours.
加熱終了後、室温まで冷却し、1.2M塩酸水溶液300g中へ溶液を滴下し、反応を停止させた。分液操作により、下層であるフッ素化合物層を回収後、アセトンで洗浄した。洗浄後の下層であるフッ素化合物層を再び回収し、溶剤及び未反応物を留去することで、下記式(1b)を301g得た。 After completion of the heating, the mixture was cooled to room temperature, and the solution was dropped into 300 g of a 1.2 M aqueous hydrochloric acid solution to stop the reaction. After the lower layer of the fluorine compound layer was recovered by a liquid separation operation, the layer was washed with acetone. The lower fluorine compound layer after the washing was recovered again, and the solvent and unreacted materials were distilled off to obtain 301 g of the following formula (1b).
化合物(1b)を300g、臭化アリル50g、テトラブチルアンモニウムヨージド0.6gを混合した。続いて水酸化ナトリウム23gを添加した後、70℃で6時間加熱した。加熱終了後、室温まで冷却し、塩酸水溶液を滴下した。分液操作により、下層であるフッ素化合物層を回収後、アセトンで洗浄した。洗浄後の下層であるフッ素化合物層を再び回収し、減圧下、残存溶剤を留去した。上記操作を再度行うことで、下記式(1c)を295g得た。 300 g of the compound (1b), 50 g of allyl bromide, and 0.6 g of tetrabutylammonium iodide were mixed. Subsequently, after adding 23 g of sodium hydroxide, the mixture was heated at 70 ° C. for 6 hours. After completion of the heating, the mixture was cooled to room temperature, and an aqueous hydrochloric acid solution was added dropwise. After the lower layer of the fluorine compound layer was recovered by a liquid separation operation, the layer was washed with acetone. The lower fluorine compound layer after the washing was recovered again, and the remaining solvent was distilled off under reduced pressure. By repeating the above operation, 295 g of the following formula (1c) was obtained.
工程(1ii)
次に、上記工程(1i)で得られた化合物(式(1c))20g、1,3−トリフルオロメチルベンゼン30g、1,2−ビス(ジメチルシリル)エタン7.6g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10−9モルを含有)を混合し、80℃で3時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物20gを得た。得られた化合物を1H−NMRにより測定し、下記式(1d)であることを確認した。Step (1ii)
Next, 20 g of the compound (formula (1c)) obtained in the above step (1i), 30 g of 1,3-trifluoromethylbenzene, 7.6 g of 1,2-bis (dimethylsilyl) ethane, and chloroplatinic acid / vinyl 0.005 g of a toluene solution of a siloxane complex (containing 1.25 × 10 −9 mol as Pt alone) was mixed and reacted at 80 ° C. for 3 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained compound was measured by 1 H-NMR, and it was confirmed that the compound represented by the following formula (1d).
工程(1iii)
次に、上記工程(1ii)で得られた化合物(式(1d))20g、1,3−トリフルオロメチルベンゼン30g、アリルホスホン酸ジエチル5.1g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10−9モルを含有)を混合し、90℃で48時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物21gを得た。得られた混合物を1H−NMRにより測定し、下記式(1e)であることを確認した。Step (1iii)
Next, 20 g of the compound (formula (1d)) obtained in the above step (1ii), 30 g of 1,3-trifluoromethylbenzene, 5.1 g of diethyl allylphosphonate, and a toluene solution of chloroplatinic acid / vinylsiloxane complex 0 0.005 g (containing 1.25 × 10 −9 mol as Pt alone) was reacted at 90 ° C. for 48 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 21 g of a liquid product. The obtained mixture was measured by 1 H-NMR, and was confirmed to be the following formula (1e).
工程(1iv)
次に、上記工程(1iii)で得られた化合物(式(1e))20g、1,3−トリフルオロメチルベンゼン30g、ジエチルエーテル10g、ブロモトリメチルシラン4.4gを混合し、70℃で24時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物20gを得た。得られた混合物を1H−NMRにより測定し、下記式(1f)であることを確認した。Step (1iv)
Next, 20 g of the compound (formula (1e)) obtained in the above step (1iii), 30 g of 1,3-trifluoromethylbenzene, 10 g of diethyl ether and 4.4 g of bromotrimethylsilane were mixed, and the mixture was mixed at 70 ° C. for 24 hours. Reacted. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 20 g of a liquid product. The obtained mixture was measured by 1 H-NMR, and was confirmed to be the following formula (1f).
上記式(1f)の化合物(以下、「化合物1」という)の1H−NMR(TMS基準、ppm)データを次に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (1f) (hereinafter, referred to as “compound 1”) is shown below.
工程(1v)
次に、上記式(1f)の化合物1 20gを水100gとアセトン50gを混合した溶液に添加し、20℃で3時間撹拌し1時間静置した。その後、下層を取り出し、溶剤を減圧留去したところ液状の生成物15gを得た。得られた混合物を1H−NMRにより、下記式(1g)であることを確認した。Step (1v)
Next, 20 g of the compound 1 of the formula (1f) was added to a solution obtained by mixing 100 g of water and 50 g of acetone, and the mixture was stirred at 20 ° C. for 3 hours and allowed to stand for 1 hour. Thereafter, the lower layer was taken out and the solvent was distilled off under reduced pressure to obtain 15 g of a liquid product. The obtained mixture was confirmed to be the following formula (1 g) by 1 H-NMR.
上記式(1g)の化合物(以下、「化合物2」という)の1H−NMR(TMS基準、ppm)データを以下に示す。The 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (1 g) (hereinafter, referred to as “compound 2”) is shown below.
実施例2
工程(2i)
実施例1で得られた化合物(式(1c))20g、1,3−トリフルオロメチルベンゼン30g、1,4−ビス(ジメチルシリル)ベンゼン45g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10−9モルを含有)を混合し、80℃で5時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物23gを得た。得られた化合物を1H−NMRにより測定し、下記式(2c)であることを確認した。Example 2
Step (2i)
20 g of the compound (formula (1c)) obtained in Example 1, 30 g of 1,3-trifluoromethylbenzene, 45 g of 1,4-bis (dimethylsilyl) benzene, and a toluene solution of a chloroplatinic acid / vinylsiloxane complex were added. 005 g (containing 1.25 × 10 −9 mol as Pt alone) were reacted at 80 ° C. for 5 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 23 g of a liquid product. The obtained compound was measured by 1 H-NMR, and it was confirmed that the compound represented by the following formula (2c).
工程(2ii)
次に、上記工程(2i)で得られた化合物(式(2c))20g、1,3−トリフルオロメチルベンゼン30g、アリルホスホン酸ジエチル6.0g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10−9モルを含有)を混合し、90℃で48時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物25gを得た。得られた混合物を1H−NMRにより測定し、下記式(2d)であることを確認した。Step (2ii)
Next, 20 g of the compound (formula (2c)) obtained in the above step (2i), 30 g of 1,3-trifluoromethylbenzene, 6.0 g of diethyl allylphosphonate, and a toluene solution of chloroplatinic acid / vinylsiloxane complex 0 0.005 g (containing 1.25 × 10 −9 mol as Pt alone) was reacted at 90 ° C. for 48 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 25 g of a liquid product. The obtained mixture was measured by 1 H-NMR, and it was confirmed that the mixture represented by the following formula (2d).
工程(2iii)
次に、上記工程(2ii)で得られた化合物(式(2d))20g、1,3トリフルオロメチルベンゼン30g、ジエチルエーテル10g、ブロモトリメチルシラン5.5gを混合し、70℃で24時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物21gを得た。得られた混合物を1H−NMRにより測定し、下記式(2e)であることを確認した。Step (2iii)
Next, 20 g of the compound (formula (2d)) obtained in the above step (2ii), 30 g of 1,3 trifluoromethylbenzene, 10 g of diethyl ether and 5.5 g of bromotrimethylsilane were mixed, and reacted at 70 ° C. for 24 hours. I let it. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 21 g of a liquid product. The obtained mixture was measured by 1 H-NMR, and was confirmed to be the following formula (2e).
上記式(2e)の化合物(以下、「化合物3」という)の1H−NMR(TMS基準、ppm)データを以下に示す。 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (2e) (hereinafter, referred to as “compound 3”) is shown below.
実施例3
工程(3i)Example 3
Step (3i)
上記式(3b)で表わされる化合物20g、1,3−トリフルオロメチルベンゼン30g、1,4−ビス(ジメチルシリル)ベンゼン45g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10−9モルを含有)を混合し、80℃で5時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物22gを得た。得られた化合物を1H−NMRにより測定し、下記式(3c)であることを確認した。20 g of the compound represented by the above formula (3b), 30 g of 1,3-trifluoromethylbenzene, 45 g of 1,4-bis (dimethylsilyl) benzene, 0.005 g of a toluene solution of chloroplatinic acid / vinylsiloxane complex (as Pt alone) 1.25 × 10 −9 mol) and reacted at 80 ° C. for 5 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 22 g of a liquid product. The obtained compound was measured by 1 H-NMR, and it was confirmed to be the following formula (3c).
工程(3ii)
次に、上記工程(3i)で得られた化合物(式(3c))20g、1,3−トリフルオロメチルベンゼン30g、アリルホスホン酸ジエチル7.0g、塩化白金酸/ビニルシロキサン錯体のトルエン溶液0.005g(Pt単体として1.25×10−9モルを含有)を混合し、90℃で48時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物28gを得た。得られた混合物を1H−NMRにより測定し、下記式(3d)であることを確認した。Step (3ii)
Next, 20 g of the compound (formula (3c)) obtained in the above step (3i), 30 g of 1,3-trifluoromethylbenzene, 7.0 g of diethyl allylphosphonate, and a toluene solution of chloroplatinic acid / vinylsiloxane complex 0 0.005 g (containing 1.25 × 10 −9 mol as Pt alone) was reacted at 90 ° C. for 48 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 28 g of a liquid product. The obtained mixture was measured by 1 H-NMR, and it was confirmed that the mixture represented by the following formula (3d).
工程(3iii)
次に、上記工程(3ii)で得られた化合物(式(3d))20g、1,3トリフルオロメチルベンゼン30g、ジエチルエーテル10g、ブロモトリメチルシラン6.0gを混合し、70℃で24時間反応させた。その後、溶剤及び未反応物を減圧留去したところ液状の生成物21gを得た。得られた混合物を1H−NMRにより測定し、下記式(3e)であることを確認した。Step (3iii)
Next, 20 g of the compound (formula (3d)) obtained in the above step (3ii), 30 g of 1,3 trifluoromethylbenzene, 10 g of diethyl ether, and 6.0 g of bromotrimethylsilane were mixed, and reacted at 70 ° C. for 24 hours. I let it. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 21 g of a liquid product. The obtained mixture was measured by 1 H-NMR, and it was confirmed that the mixture represented by the following formula (3e).
上記式(3e)の化合物(以下、「化合物4」という)の1H−NMR(TMS基準、ppm)データを以下に示す。The 1 H-NMR (TMS standard, ppm) data of the compound of the above formula (3e) (hereinafter, referred to as “compound 4”) is shown below.
表面処理剤及び硬化被膜の調製
実施例1〜3で得たパーフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体化合物1〜4を、濃度10質量%になるように、フッ素系溶剤Novec7200(3M社製)に溶解させて、処理剤を得た。サファイヤガラスの表面をプラズマ処理後に、上記各表面処理剤を下記条件及び装置で真空蒸着塗工した。80℃、湿度80%の雰囲気下で1時間硬化させた後、150℃で3時間硬化させ、被膜を形成した。Preparation of Surface Treatment Agent and Cured Coating The perfluorooxyalkylene group-containing polymer-modified phosphonic acid derivative compounds 1 to 4 obtained in Examples 1 to 3 were mixed with a fluorine-based solvent Novec7200 (manufactured by 3M) so that the concentration became 10% by mass. ) To give a treating agent. After the surface of the sapphire glass was subjected to the plasma treatment, each of the above surface treatment agents was applied by vacuum deposition under the following conditions and apparatus. After curing for 1 hour in an atmosphere of 80 ° C. and 80% humidity, the coating was cured at 150 ° C. for 3 hours to form a coating.
[プラズマ処理の条件]
・装置:プラズマドライ洗浄装置PDC210
・ガス:O2ガス80cc、Arガス10cc
・出力:250W
・時間:30秒[Plasma treatment conditions]
-Equipment: Plasma dry cleaning equipment PDC210
Gas: O 2 gas 80cc, Ar gas 10cc
・ Output: 250W
・ Time: 30 seconds
[真空蒸着による塗工条件及び装置]
・測定装置:小型真空蒸着装置VPC−250F
・圧力:2.0×10−3Pa〜3.0×10−2Pa
・蒸着温度(ボートの到達温度):500℃
・蒸着距離:20mm
・処理剤の仕込量:50mg
・蒸着量:50mg[Coating conditions and equipment by vacuum deposition]
・ Measuring device: Small vacuum evaporation system VPC-250F
・ Pressure: 2.0 × 10 −3 Pa to 3.0 × 10 −2 Pa
・ Evaporation temperature (attainable temperature of boat): 500 ° C
・ Evaporation distance: 20mm
・ Amount of treatment agent: 50mg
・ Evaporation amount: 50mg
比較例1及び2の表面処理剤及び硬化被膜は、化合物1〜4に代えて下記の化合物5及び6を用いた他は実施例と同様の方法で調製し、評価試験を実施した。 The surface treatment agents and the cured films of Comparative Examples 1 and 2 were prepared in the same manner as in the Examples except that the following Compounds 5 and 6 were used instead of Compounds 1 to 4, and evaluation tests were performed.
(比較例1)化合物5 (Comparative Example 1) Compound 5
(比較例2)化合物6 (Comparative Example 2) Compound 6
得られた硬化被膜を上記の方法により評価した。 The obtained cured film was evaluated by the above method.
評価結果を表1(初期性能)及び表2(耐摩耗性)に示す。 The evaluation results are shown in Table 1 (initial performance) and Table 2 (wear resistance).
表1及び2より、実施例1〜4のパーフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体から形成された被膜は、撥水撥油性が高く、動摩擦係数が低く、かつ、マジックインクの拭き取り性が優れていた。一方、ホスホン酸基又はホスホン酸エステル基を有さない化合物から形成された比較例1、2の被膜では、撥水撥油性、動摩擦係数は許容範囲内であったが、マジックインクの拭き取り性が悪かった。さらに、実施例1〜4のパーフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体から形成された被膜は、布で摩擦後においても水接触角100度以上、オレイン酸接触角60度以上という高い撥水撥油性を示した。一方、ホスホン酸基又はホスホン酸エステル基を有さない化合物から形成された比較例1、2の被膜では、撥水撥油性が大きく低下した。即ち、本発明のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体は、撥水撥油性、低動摩擦性、汚れの拭き取り性、耐摩耗性、及び、基材への密着性に優れた硬化被膜を提供できることが分かった。 From Tables 1 and 2, the films formed from the perfluorooxyalkylene group-containing polymer-modified phosphonic acid derivatives of Examples 1 to 4 have high water / oil repellency, low dynamic friction coefficient, and low wiping properties of magic ink. It was excellent. On the other hand, in the coatings of Comparative Examples 1 and 2 formed from a compound having no phosphonic acid group or phosphonic acid ester group, the water and oil repellency and the dynamic friction coefficient were within the allowable range, but the wiping property of the magic ink was poor. It was bad. Furthermore, the coatings formed from the perfluorooxyalkylene group-containing polymer-modified phosphonic acid derivatives of Examples 1 to 4 have high water repellency, such as a water contact angle of 100 degrees or more and an oleic acid contact angle of 60 degrees or more even after rubbing with a cloth. It showed oil repellency. On the other hand, in the coating films of Comparative Examples 1 and 2 formed from compounds having no phosphonic acid group or phosphonic acid ester group, the water / oil repellency was significantly reduced. That is, the fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative of the present invention provides a cured film having excellent water / oil repellency, low dynamic friction, dirt wiping, abrasion resistance, and adhesion to a substrate. I knew I could do it.
なお、本発明は、上記実施形態に限定されるものではない。上記実施形態は例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に含有される。 Note that the present invention is not limited to the above embodiment. The above embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and has the same effect. It is included in the technical range.
Claims (7)
Aは末端が−CF3基である1価のフッ素含有基であり、
Rf1は−(CF2)d−(OCF2)p(OCF2CF2)q(OCF2CF2CF2)r(OCF2CF2CF2CF2)s(OCF(CF3)CF2)t−O(CF2)d−で示されるフルオロオキシアルキレン基であり、
dはそれぞれ独立に0〜5の整数であり、
p、q、r、s、tはそれぞれ独立に0〜200の整数であり、かつ、p+q+r+s+tは3〜200であり、括弧内に示される各単位はランダムに結合されていてよい。
Bは単結合、又は下記式(4−1)〜(4−8)からなる群から選択される2価の連結基であり、
Dは炭素原子またはケイ素原子、
Eはそれぞれ独立に単結合、酸素原子、ジオルガノシロキサン基の何れかであり、
Qは下記式(5−1)〜(5−4)からなる群から選択される両末端にケイ素原子を有する2価の連結基であり、
Xはそれぞれ独立に水素原子、アルカリ金属原子、非置換若しくは置換の炭素数1〜5のアルキル基、アリール基、又はJ3Si−(Jは独立に非置換若しくは置換の炭素数1〜5のアルキル基又はアリール基である。)で示される1価の基であり、
a、bはそれぞれ独立に2〜20の整数である。)
A is a monovalent fluorine-containing group whose terminal is a —CF 3 group,
Rf 1 is - (CF 2) d - ( OCF 2) p (OCF 2 CF 2) q (OCF 2 CF 2 CF 2) r (OCF 2 CF 2 CF 2 CF 2) s (OCF (CF 3) CF 2 ) t -O (CF 2) d - fluoro oxyalkylene group represented by,
d is each independently an integer of 0 to 5,
p, q, r, s, and t are each independently an integer of 0 to 200, and p + q + r + s + t is 3 to 200, and the units shown in parentheses may be randomly bonded.
B is a single bond or a divalent linking group selected from the group consisting of the following formulas (4-1) to (4-8) ;
D is a carbon atom or a silicon atom,
E is each independently a single bond, an oxygen atom, or a diorganosiloxane group;
Q is a divalent linking group having silicon atoms at both ends selected from the group consisting of the following formulas (5-1) to (5-4) ;
X is each independently a hydrogen atom, an alkali metal atom, an unsubstituted or substituted alkyl group having 1 to 5 carbon atoms, an aryl group, or J 3 Si— (J is independently an unsubstituted or substituted An alkyl group or an aryl group.)
a and b are each independently an integer of 2 to 20; )
Bが単結合又は式(4−1)、(4−2)及び(4−3)からなる群から選択される2価の連結基であり、B is a single bond or a divalent linking group selected from the group consisting of formulas (4-1), (4-2) and (4-3);
Qが式(5−1)、(5−2)及び(5−4)からなる群から選択される両末端にケイ素原子を有する2価の連結基である、請求項1に記載のフルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体。The fluorooxy according to claim 1, wherein Q is a divalent linking group having silicon atoms at both terminals selected from the group consisting of formulas (5-1), (5-2) and (5-4). An alkylene group-containing polymer-modified phosphonic acid derivative.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015201257 | 2015-10-09 | ||
JP2015201257 | 2015-10-09 | ||
PCT/JP2016/076646 WO2017061235A1 (en) | 2015-10-09 | 2016-09-09 | Fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative, surface treatment agent containing said derivative, and surface treatment method using said surface treatment agent |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017061235A1 JPWO2017061235A1 (en) | 2018-08-09 |
JP6627880B2 true JP6627880B2 (en) | 2020-01-08 |
Family
ID=58487502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017544428A Active JP6627880B2 (en) | 2015-10-09 | 2016-09-09 | Fluoroxyoxyalkylene group-containing polymer-modified phosphonic acid derivative, surface treatment agent containing the derivative, and surface treatment method using the surface treatment agent |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6627880B2 (en) |
KR (1) | KR102522324B1 (en) |
CN (1) | CN108137798B (en) |
TW (1) | TWI707862B (en) |
WO (1) | WO2017061235A1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017137271A (en) * | 2016-02-05 | 2017-08-10 | 共栄社化学株式会社 | (meth)allylsilyl modified resin component, resin component composition for molded resin containing the same and resin molded body using the same |
CN109790443B (en) * | 2016-10-06 | 2022-03-29 | 信越化学工业株式会社 | Surface treatment agent, article having cured product of surface treatment agent, and method for forming cured coating on surface of article |
JP6711489B2 (en) * | 2017-05-26 | 2020-06-17 | 株式会社フロロテクノロジー | Coating agent |
US11352378B2 (en) * | 2017-10-26 | 2022-06-07 | Shin-Etsu Chemical Co., Ltd. | Lipophilic group-containing organosilane compound, surface treatment agent and article |
WO2019142516A1 (en) * | 2018-01-22 | 2019-07-25 | 信越化学工業株式会社 | Coating composition, surface treatment agent containing said composition, and article which is surface-treated with said surface treatment agent |
WO2020026729A1 (en) * | 2018-07-31 | 2020-02-06 | 信越化学工業株式会社 | Organosilane compound containing lipophilic group, surface treatment agent and article |
JP7276464B2 (en) * | 2019-08-09 | 2023-05-18 | 信越化学工業株式会社 | Fluoropolyether group-containing polymer, surface treatment agent and article |
JP7456499B2 (en) * | 2020-04-14 | 2024-03-27 | 信越化学工業株式会社 | Surface treatment agents and articles containing fluoropolyether group-containing polymers and/or partial (hydrolyzed) condensates thereof |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1656385B1 (en) * | 2003-08-21 | 2006-11-29 | 3M Innovative Properties Company | Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
FR2862651B1 (en) * | 2003-11-24 | 2006-03-31 | Rhodia Cons Spec Ltd | NOVEL DENDRIMERS WITH BISPHOSPHONIC AND DERIVED TERMINATIONS, PROCESS FOR PREPARING SAME AND USE THEREOF |
JP4711011B2 (en) * | 2009-09-11 | 2011-06-29 | ユニマテック株式会社 | Polyfluoroalkylphosphonic acid oxyalkylene ester and process for producing the same |
EP2476687B1 (en) * | 2009-09-11 | 2013-12-25 | Unimatec Co., Ltd. | Polyfluoroalkylphosphonic acid oxyalkylene ester, method for producing same and release agent containing same as active ingredient |
EP2497566B1 (en) * | 2009-11-04 | 2019-01-30 | Unimatec Co., Ltd. | Polyfluoroalkyl phosphonate salt emulsifying agent and mold release agent comprising same as active ingredient |
JP5830848B2 (en) | 2010-10-29 | 2015-12-09 | ダイキン工業株式会社 | Surface treatment agent and composition, processed product |
JP5826282B2 (en) * | 2010-11-04 | 2015-12-02 | スリーエム イノベイティブ プロパティズ カンパニー | Fluorinated compositions containing phosphorus-containing acid groups and alkoxysilane groups |
WO2012074027A1 (en) * | 2010-11-30 | 2012-06-07 | 株式会社日本触媒 | Phosphorus-containing (poly)alkylene glycol compound and polymer |
JP5956143B2 (en) | 2010-11-30 | 2016-07-27 | 株式会社日本触媒 | Phosphorus atom-containing (poly) alkylene glycol compounds |
JP5788852B2 (en) | 2011-11-01 | 2015-10-07 | 信越化学工業株式会社 | Fluorooxyalkylene group-containing polymer composition, surface treatment agent containing the composition, article treated with the surface treatment agent, and optical article |
JP6520419B2 (en) | 2015-06-04 | 2019-05-29 | 信越化学工業株式会社 | Fluorooxyalkylene group-containing polymer-modified phosphonic acid derivative and surface treatment agent containing the derivative, article treated with the surface treatment agent, and optical article |
-
2016
- 2016-09-09 JP JP2017544428A patent/JP6627880B2/en active Active
- 2016-09-09 KR KR1020187012650A patent/KR102522324B1/en active IP Right Grant
- 2016-09-09 CN CN201680059023.7A patent/CN108137798B/en active Active
- 2016-09-09 WO PCT/JP2016/076646 patent/WO2017061235A1/en active Application Filing
- 2016-09-30 TW TW105131541A patent/TWI707862B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI707862B (en) | 2020-10-21 |
CN108137798A (en) | 2018-06-08 |
TW201731857A (en) | 2017-09-16 |
KR20180067570A (en) | 2018-06-20 |
KR102522324B1 (en) | 2023-04-18 |
WO2017061235A1 (en) | 2017-04-13 |
CN108137798B (en) | 2020-06-09 |
JPWO2017061235A1 (en) | 2018-08-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6627880B2 (en) | Fluoroxyoxyalkylene group-containing polymer-modified phosphonic acid derivative, surface treatment agent containing the derivative, and surface treatment method using the surface treatment agent | |
JP6248858B2 (en) | Fluorine-based surface treatment agent and article surface-treated with the surface treatment agent | |
JP6524955B2 (en) | Fluoropolyether group-containing polymer modified silane, surface treating agent and article | |
JP5235026B2 (en) | Fluorooxyalkylene group-containing polymer composition, surface treatment agent containing the composition, and article surface-treated with the surface treatment agent | |
KR101745723B1 (en) | Polymer composition containing fluoroxyalkylene group, surface treatment agent comprising said composition, and articles treated with said surface treatment agent | |
JP5788852B2 (en) | Fluorooxyalkylene group-containing polymer composition, surface treatment agent containing the composition, article treated with the surface treatment agent, and optical article | |
JP5747699B2 (en) | Fluorooxyalkylene group-containing polymer-modified silane, surface treatment agent containing the silane, and article surface-treated with the surface treatment agent | |
KR20150113883A (en) | Fluorochemical coating composition and article treated therewith | |
TWI693261B (en) | Fluorine-containing coating agent and articles treated with the coating agent | |
JPWO2017141707A1 (en) | Fluoropolyether group-containing polymer-modified silane, surface treatment agent and article | |
JP2022059417A (en) | Fluoropolyether group-containing polymer composition, coating agent and article | |
JP7004010B2 (en) | A coating agent composition, a surface treatment agent containing the composition, and an article surface-treated with the surface treatment agent. | |
WO2017104249A1 (en) | Silane modified with polymer containing fluoropolyether group, surface-treating agent, and article | |
WO2023140177A1 (en) | Fluoropolyether-group-containing polymer composition, coating agent, article, and method for modifying surface of article | |
KR102504014B1 (en) | Fluorooxyalkylene group-containing polymer modified phosphonic acid derivative, surface treatment agent comprising said derivative, and product and optical product treated with said surface treatment agent | |
KR102587594B1 (en) | Fluorooxyalkylene group-containing polymer modified phosphonic acid derivative, surface treatment agent comprising said derivative, and product and optical product treated with said surface treatment agent | |
CN109790443B (en) | Surface treatment agent, article having cured product of surface treatment agent, and method for forming cured coating on surface of article | |
TWI787264B (en) | Polymer-modified organosilicon compounds, surface treatment agents and articles containing fluoropolyether groups |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180312 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180312 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190507 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190610 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20191105 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191118 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6627880 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |