JP2016540248A5 - - Google Patents

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Publication number
JP2016540248A5
JP2016540248A5 JP2016534714A JP2016534714A JP2016540248A5 JP 2016540248 A5 JP2016540248 A5 JP 2016540248A5 JP 2016534714 A JP2016534714 A JP 2016534714A JP 2016534714 A JP2016534714 A JP 2016534714A JP 2016540248 A5 JP2016540248 A5 JP 2016540248A5
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JP
Japan
Prior art keywords
electroactive
conductive layer
substrate
layers
layer
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Application number
JP2016534714A
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English (en)
Japanese (ja)
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JP2016540248A (ja
JP6340079B2 (ja
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Publication date
Priority claimed from US14/095,308 external-priority patent/US20150153622A1/en
Application filed filed Critical
Publication of JP2016540248A publication Critical patent/JP2016540248A/ja
Publication of JP2016540248A5 publication Critical patent/JP2016540248A5/ja
Application granted granted Critical
Publication of JP6340079B2 publication Critical patent/JP6340079B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016534714A 2013-12-03 2014-12-03 電気活性素子および電気活性素子の作製方法 Expired - Fee Related JP6340079B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/095,308 US20150153622A1 (en) 2013-12-03 2013-12-03 Methods for producing lower electrical isolation in electrochromic films
US14/095,308 2013-12-03
PCT/US2014/068357 WO2015084952A1 (en) 2013-12-03 2014-12-03 Electroactive device and a method of fabricating the same

Publications (3)

Publication Number Publication Date
JP2016540248A JP2016540248A (ja) 2016-12-22
JP2016540248A5 true JP2016540248A5 (enExample) 2017-02-02
JP6340079B2 JP6340079B2 (ja) 2018-06-06

Family

ID=53265206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016534714A Expired - Fee Related JP6340079B2 (ja) 2013-12-03 2014-12-03 電気活性素子および電気活性素子の作製方法

Country Status (6)

Country Link
US (3) US20150153622A1 (enExample)
EP (1) EP3078056B1 (enExample)
JP (1) JP6340079B2 (enExample)
CN (2) CN113093445A (enExample)
DK (1) DK3078056T3 (enExample)
WO (1) WO2015084952A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12496809B2 (en) 2010-11-08 2025-12-16 View Operating Corporation Electrochromic window fabrication methods
US9958750B2 (en) 2010-11-08 2018-05-01 View, Inc. Electrochromic window fabrication methods
US10802371B2 (en) 2011-12-12 2020-10-13 View, Inc. Thin-film devices and fabrication
US10295880B2 (en) 2011-12-12 2019-05-21 View, Inc. Narrow pre-deposition laser deletion
CA2859023C (en) 2011-12-12 2023-08-22 View, Inc. Thin-film devices and fabrication
US12403676B2 (en) 2011-12-12 2025-09-02 View Operating Corporation Thin-film devices and fabrication
US12061402B2 (en) 2011-12-12 2024-08-13 View, Inc. Narrow pre-deposition laser deletion
US11865632B2 (en) 2011-12-12 2024-01-09 View, Inc. Thin-film devices and fabrication
US20150153622A1 (en) 2013-12-03 2015-06-04 Sage Electrochromics, Inc. Methods for producing lower electrical isolation in electrochromic films
US12235560B2 (en) 2014-11-25 2025-02-25 View, Inc. Faster switching electrochromic devices
WO2016154064A1 (en) 2015-03-20 2016-09-29 View, Inc. Faster switching low-defect electrochromic windows
CN110337716A (zh) 2017-02-27 2019-10-15 Sage电致变色显示有限公司 包括基板和透明导电层的电气设备及形成电气设备的方法
CN112654907A (zh) * 2018-09-26 2021-04-13 Sage电致变色显示有限公司 电活性器件及方法
EP3942360A4 (en) * 2019-03-20 2022-11-16 Sage Electrochromics, Inc. PATTERNED CLEAR CONDUCTIVE LAYER IN STOCK
CN116457721A (zh) * 2020-12-21 2023-07-18 Sage电致变色显示有限公司 用于制造包括一个或多个电致变色装置的母板的设备和方法
EP4609674A1 (en) * 2022-11-10 2025-09-03 Energy Materials Corporation Photovoltaic modules and methods of making same

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5724177A (en) 1991-09-04 1998-03-03 Sun Active Glass Electrochromics, Inc. Electrochromic devices and methods
US5321544A (en) 1991-09-04 1994-06-14 Sun Active Glass Electrochromics, Inc. Electrochromic structures and methods
US5404244A (en) 1992-04-10 1995-04-04 Sun Active Glass Electrochromics, Inc. Electrochromic structures and methods
US5370775A (en) 1992-04-10 1994-12-06 Sun Active Glass Electrochromics, Inc. Formation of chemically reduced electrode layers
EP0725944B1 (en) 1992-04-10 2002-09-25 Sun Active Glass Electrochromics, Inc. Electrochromic structures and methods
US5724175A (en) * 1997-01-02 1998-03-03 Optical Coating Laboratory, Inc. Electrochromic device manufacturing process
US6700692B2 (en) * 1997-04-02 2004-03-02 Gentex Corporation Electrochromic rearview mirror assembly incorporating a display/signal light
US6515787B1 (en) * 2000-03-07 2003-02-04 Eclipse Energy Systems, Inc. Electrochromic layer
JP4171166B2 (ja) * 2000-08-31 2008-10-22 三洋電機株式会社 光起電力装置及びその製造方法
US7255451B2 (en) * 2002-09-20 2007-08-14 Donnelly Corporation Electro-optic mirror cell
FR2833107B1 (fr) 2001-12-05 2004-02-20 Saint Gobain Electrode de dispositifs electrochimiques/electrocommandables
US6838157B2 (en) * 2002-09-23 2005-01-04 Siemens Westinghouse Power Corporation Method and apparatus for instrumenting a gas turbine component having a barrier coating
JP2004198966A (ja) * 2002-12-20 2004-07-15 Tokai Rika Co Ltd 反射鏡
AU2004208241B2 (en) 2003-01-31 2009-06-11 Ntera Limited Electrochromic display device
US6885033B2 (en) * 2003-03-10 2005-04-26 Cree, Inc. Light emitting devices for light conversion and methods and semiconductor chips for fabricating the same
DE10333764B3 (de) 2003-07-23 2004-12-30 Outokumpu Oy Verfahren zum Chargieren von feinkörnigen Metallen in einen Elektrolichtbogenofen
EP1557875A1 (en) * 2003-12-29 2005-07-27 STMicroelectronics S.r.l. Process for forming tapered trenches in a dielectric material
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
US7593154B2 (en) * 2005-10-11 2009-09-22 Sage Electrochromics, Inc. Electrochromic devices having improved ion conducting layers
US7483454B2 (en) * 2006-05-26 2009-01-27 Hauck James P Laser system architecture and method of using the same
US7749907B2 (en) 2006-08-25 2010-07-06 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US8148259B2 (en) 2006-08-30 2012-04-03 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
JP5205042B2 (ja) 2006-12-20 2013-06-05 株式会社半導体エネルギー研究所 半導体装置の作製方法
US8168265B2 (en) * 2008-06-06 2012-05-01 Applied Materials, Inc. Method for manufacturing electrochromic devices
WO2010089681A1 (en) 2009-02-05 2010-08-12 Philips Intellectual Property & Standards Gmbh Electroluminescent device
US8432603B2 (en) * 2009-03-31 2013-04-30 View, Inc. Electrochromic devices
FR2944610B1 (fr) 2009-04-16 2011-06-24 Saint Gobain Dispositif electrochrome a transparence controlee
JP5111450B2 (ja) * 2009-06-23 2013-01-09 三菱電機株式会社 薄膜太陽電池およびその製造方法
US20120318776A1 (en) * 2009-09-24 2012-12-20 Electro Scientific Industries, Inc. Method and apparatus for machining a workpiece
US8493646B2 (en) * 2010-04-22 2013-07-23 Sage Electrochromics, Inc. Series connected electrochromic devices
FR2962818B1 (fr) 2010-07-13 2013-03-08 Saint Gobain Dispositif electrochimique a proprietes de transmission optique et/ou energetique electrocommandables.
KR101172178B1 (ko) 2010-09-01 2012-08-07 엘지이노텍 주식회사 태양광 발전장치 및 이의 제조방법
US8134067B1 (en) * 2011-01-21 2012-03-13 Chin-Yao Tsai Thin film photovoltaic device
US10429712B2 (en) * 2012-04-20 2019-10-01 View, Inc. Angled bus bar
JP2012243864A (ja) * 2011-05-17 2012-12-10 Mitsubishi Electric Corp 集積型薄膜太陽電池とその製造方法及びそのレーザ加工方法
JP6228915B2 (ja) * 2011-06-17 2017-11-08 シオン・パワー・コーポレーション 電極用プレーティング技術
CA2859023C (en) * 2011-12-12 2023-08-22 View, Inc. Thin-film devices and fabrication
US8652940B2 (en) * 2012-04-10 2014-02-18 Applied Materials, Inc. Wafer dicing used hybrid multi-step laser scribing process with plasma etch
WO2013163107A1 (en) * 2012-04-25 2013-10-31 View, Inc. Electrochromic window fabrication methods
US9013778B2 (en) * 2013-03-06 2015-04-21 Sage Electrochromics, Inc. Laser cuts to reduce electrical leakage
US9152001B2 (en) 2013-07-25 2015-10-06 Sage Electrochromics, Inc. Electrochromic devices having improved structure for reducing current leakage across lower transparent conductor layers
US20150153622A1 (en) 2013-12-03 2015-06-04 Sage Electrochromics, Inc. Methods for producing lower electrical isolation in electrochromic films

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