JP2016540248A5 - - Google Patents

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Publication number
JP2016540248A5
JP2016540248A5 JP2016534714A JP2016534714A JP2016540248A5 JP 2016540248 A5 JP2016540248 A5 JP 2016540248A5 JP 2016534714 A JP2016534714 A JP 2016534714A JP 2016534714 A JP2016534714 A JP 2016534714A JP 2016540248 A5 JP2016540248 A5 JP 2016540248A5
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JP
Japan
Prior art keywords
electroactive
conductive layer
substrate
layers
layer
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Application number
JP2016534714A
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English (en)
Japanese (ja)
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JP2016540248A (ja
JP6340079B2 (ja
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Publication date
Priority claimed from US14/095,308 external-priority patent/US20150153622A1/en
Application filed filed Critical
Publication of JP2016540248A publication Critical patent/JP2016540248A/ja
Publication of JP2016540248A5 publication Critical patent/JP2016540248A5/ja
Application granted granted Critical
Publication of JP6340079B2 publication Critical patent/JP6340079B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016534714A 2013-12-03 2014-12-03 電気活性素子および電気活性素子の作製方法 Expired - Fee Related JP6340079B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/095,308 2013-12-03
US14/095,308 US20150153622A1 (en) 2013-12-03 2013-12-03 Methods for producing lower electrical isolation in electrochromic films
PCT/US2014/068357 WO2015084952A1 (en) 2013-12-03 2014-12-03 Electroactive device and a method of fabricating the same

Publications (3)

Publication Number Publication Date
JP2016540248A JP2016540248A (ja) 2016-12-22
JP2016540248A5 true JP2016540248A5 (enExample) 2017-02-02
JP6340079B2 JP6340079B2 (ja) 2018-06-06

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ID=53265206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016534714A Expired - Fee Related JP6340079B2 (ja) 2013-12-03 2014-12-03 電気活性素子および電気活性素子の作製方法

Country Status (6)

Country Link
US (3) US20150153622A1 (enExample)
EP (1) EP3078056B1 (enExample)
JP (1) JP6340079B2 (enExample)
CN (2) CN113093445A (enExample)
DK (1) DK3078056T3 (enExample)
WO (1) WO2015084952A1 (enExample)

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US12061402B2 (en) 2011-12-12 2024-08-13 View, Inc. Narrow pre-deposition laser deletion
US12403676B2 (en) 2011-12-12 2025-09-02 View Operating Corporation Thin-film devices and fabrication
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US10802371B2 (en) 2011-12-12 2020-10-13 View, Inc. Thin-film devices and fabrication
US11865632B2 (en) 2011-12-12 2024-01-09 View, Inc. Thin-film devices and fabrication
US10295880B2 (en) 2011-12-12 2019-05-21 View, Inc. Narrow pre-deposition laser deletion
US20150153622A1 (en) 2013-12-03 2015-06-04 Sage Electrochromics, Inc. Methods for producing lower electrical isolation in electrochromic films
US12235560B2 (en) 2014-11-25 2025-02-25 View, Inc. Faster switching electrochromic devices
WO2016154064A1 (en) 2015-03-20 2016-09-29 View, Inc. Faster switching low-defect electrochromic windows
JP2020508491A (ja) 2017-02-27 2020-03-19 セイジ・エレクトロクロミクス，インコーポレイテッド 基板および透明導電層を含む電気デバイスおよびその形成プロセス
JP7256871B2 (ja) * 2018-09-26 2023-04-12 セイジ・エレクトロクロミクス，インコーポレイテッド 電気活性デバイス及び方法
JP7254958B2 (ja) * 2019-03-20 2023-04-10 セイジ・エレクトロクロミクス，インコーポレイテッド 見込み生産のパターン化された透明導電層
CN116457721A (zh) * 2020-12-21 2023-07-18 Sage电致变色显示有限公司 用于制造包括一个或多个电致变色装置的母板的设备和方法
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