JP2016527501A5 - - Google Patents
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- Publication number
- JP2016527501A5 JP2016527501A5 JP2016527043A JP2016527043A JP2016527501A5 JP 2016527501 A5 JP2016527501 A5 JP 2016527501A5 JP 2016527043 A JP2016527043 A JP 2016527043A JP 2016527043 A JP2016527043 A JP 2016527043A JP 2016527501 A5 JP2016527501 A5 JP 2016527501A5
- Authority
- JP
- Japan
- Prior art keywords
- target
- illumination beam
- measurement system
- scatterometry
- illumination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361847883P | 2013-07-18 | 2013-07-18 | |
| US61/847,883 | 2013-07-18 | ||
| PCT/US2014/046724 WO2015009739A1 (en) | 2013-07-18 | 2014-07-15 | Illumination configurations for scatterometry measurements |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019028295A Division JP6745367B2 (ja) | 2013-07-18 | 2019-02-20 | スキャトロメトリ測定システム及び方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016527501A JP2016527501A (ja) | 2016-09-08 |
| JP2016527501A5 true JP2016527501A5 (cg-RX-API-DMAC7.html) | 2017-08-24 |
| JP6486917B2 JP6486917B2 (ja) | 2019-03-20 |
Family
ID=52346681
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016527043A Active JP6486917B2 (ja) | 2013-07-18 | 2014-07-15 | スキャトロメトリ測定のための照明配置 |
| JP2019028295A Active JP6745367B2 (ja) | 2013-07-18 | 2019-02-20 | スキャトロメトリ測定システム及び方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019028295A Active JP6745367B2 (ja) | 2013-07-18 | 2019-02-20 | スキャトロメトリ測定システム及び方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JP6486917B2 (cg-RX-API-DMAC7.html) |
| KR (2) | KR102069253B1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI640761B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2015009739A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105807573B (zh) * | 2014-12-31 | 2017-12-29 | 上海微电子装备（集团）股份有限公司 | 用于套刻误差检测的装置和方法 |
| US10732516B2 (en) * | 2017-03-01 | 2020-08-04 | Kla Tencor Corporation | Process robust overlay metrology based on optical scatterometry |
| US11112369B2 (en) * | 2017-06-19 | 2021-09-07 | Kla-Tencor Corporation | Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay |
| US11112691B2 (en) * | 2019-01-16 | 2021-09-07 | Kla Corporation | Inspection system with non-circular pupil |
| EP3876037A1 (en) * | 2020-03-06 | 2021-09-08 | ASML Netherlands B.V. | Metrology method and device for measuring a periodic structure on a substrate |
| CN115004113B (zh) * | 2020-01-29 | 2026-03-24 | Asml荷兰有限公司 | 量测方法和用于测量衬底上的周期性结构的装置 |
| US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
| CN114253065B (zh) * | 2021-12-20 | 2025-08-01 | 武汉天马微电子有限公司 | 掩膜版及其制备方法、显示面板、显示装置和光刻设备 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5859424A (en) * | 1997-04-08 | 1999-01-12 | Kla-Tencor Corporation | Apodizing filter system useful for reducing spot size in optical measurements and other applications |
| US6538730B2 (en) * | 2001-04-06 | 2003-03-25 | Kla-Tencor Technologies Corporation | Defect detection system |
| US7528953B2 (en) * | 2005-03-01 | 2009-05-05 | Kla-Tencor Technologies Corp. | Target acquisition and overlay metrology based on two diffracted orders imaging |
| US7589832B2 (en) * | 2006-08-10 | 2009-09-15 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method |
| US7573584B2 (en) * | 2006-09-25 | 2009-08-11 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| RU2446348C2 (ru) * | 2006-11-27 | 2012-03-27 | Филипс Солид-Стейт Лайтинг Солюшнз, Инк. | Способ и устройство для создания равномерного проекционного освещения |
| US7618163B2 (en) * | 2007-04-02 | 2009-11-17 | Ruud Lighting, Inc. | Light-directing LED apparatus |
| DE102008046362A1 (de) * | 2008-09-09 | 2010-03-18 | Diehl Bgt Defence Gmbh & Co. Kg | Gegenstandserfassungssystem mit einem Bilderfassungssystem |
| JP5277348B2 (ja) * | 2009-05-11 | 2013-08-28 | エーエスエムエル ネザーランズ ビー．ブイ． | オーバーレイエラーを決定する方法 |
| NL2004539A (en) * | 2009-06-22 | 2010-12-23 | Asml Netherlands Bv | Object inspection systems and methods. |
| US9223227B2 (en) * | 2011-02-11 | 2015-12-29 | Asml Netherlands B.V. | Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method |
| DE102011006468B4 (de) * | 2011-03-31 | 2014-08-28 | Carl Zeiss Smt Gmbh | Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern |
| NL2008936A (en) | 2011-07-28 | 2013-01-29 | Asml Netherlands Bv | Illumination source for use in inspection methods and/or lithography inspection and lithographic apparatus and inspection method. |
| US20130077086A1 (en) * | 2011-09-23 | 2013-03-28 | Kla-Tencor Corporation | Solid-State Laser And Inspection System Using 193nm Laser |
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2014
- 2014-07-15 WO PCT/US2014/046724 patent/WO2015009739A1/en not_active Ceased
- 2014-07-15 JP JP2016527043A patent/JP6486917B2/ja active Active
- 2014-07-15 KR KR1020167003924A patent/KR102069253B1/ko active Active
- 2014-07-15 KR KR1020207001237A patent/KR102202523B1/ko active Active
- 2014-07-16 TW TW103124411A patent/TWI640761B/zh active
-
2019
- 2019-02-20 JP JP2019028295A patent/JP6745367B2/ja active Active