JP2016207850A - Manufacturing method for printed board - Google Patents

Manufacturing method for printed board Download PDF

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JP2016207850A
JP2016207850A JP2015088133A JP2015088133A JP2016207850A JP 2016207850 A JP2016207850 A JP 2016207850A JP 2015088133 A JP2015088133 A JP 2015088133A JP 2015088133 A JP2015088133 A JP 2015088133A JP 2016207850 A JP2016207850 A JP 2016207850A
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layer
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cured
resin
conductor
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勉 山内
Tsutomu Yamauchi
勉 山内
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Ibiden Co Ltd
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Ibiden Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To restrict peeling between a resin insulation layer, and a conductor layer and veer hole conductor.SOLUTION: A manufacturing method for a printed board comprises: the step of preparing an intermediate substrate having a lower-layer resin insulation layer and a lower-layer conductor layer on the lower-layer resin insulation layer; the step of forming an upper-layer resin insulation layer in a semi-cured state from semi-cured resin film by stacking the semi-cured resin film with a support film onto the intermediate substrate such that the lower-layer conductor layer and the semi-cured resin film are stacked opposite each other; the step of forming a veer hole on the upper-layer resin insulation layer in the semi-cured state via the support film; the step of roughing an exposed surface of the upper-layer resin insulation layer in the semi-cured state and the wall surface of the veer hole after removal of the support film; the step of completely curing the upper-layer resin insulation layer in the semi-cured state; and the step of forming in the veer hole a veer hole conductor conducting with the lower-layer conductor layer and also forming an upper-layer conductor layer on the upper-layer resin insulation layer in the completely cured state.SELECTED DRAWING: Figure 1

Description

本発明は、プリント配線板の製造方法に関する。   The present invention relates to a method for manufacturing a printed wiring board.

特許文献1は、プリント配線基板の製造方法を開示している。そして、特許文献1の第1の実施形態に係る配線基板の製造工程によれば、まず、コア基板上に、支持フィルムに支持された半硬化状態の樹脂絶縁層が積層される。その後、半硬化状態の樹脂絶縁層が硬化される。そして、硬化した樹脂絶縁層に支持フィルムを介してレーザが照射されることで樹脂絶縁層にビアホールが形成される。次いで、支持フィルムが除去され、樹脂絶縁層の表面およびビアホール壁面が粗化される。その後、粗化した樹脂絶縁層上およびビアホール内にセミアディティブ法で導体層およびビアホール導体が形成されてプリント配線基板が製造される。   Patent document 1 is disclosing the manufacturing method of a printed wiring board. And according to the manufacturing process of the wiring board which concerns on 1st Embodiment of patent document 1, first, the semi-hardened resin insulating layer supported by the support film is laminated | stacked on a core board | substrate. Thereafter, the semi-cured resin insulation layer is cured. And a via hole is formed in the resin insulation layer by irradiating the cured resin insulation layer with a laser through a support film. Next, the support film is removed, and the surface of the resin insulating layer and the wall surface of the via hole are roughened. Thereafter, a conductor layer and a via hole conductor are formed on the roughened resin insulating layer and in the via hole by a semi-additive method, and a printed wiring board is manufactured.

特開2009−099649号公報JP 2009-099649 A

特許文献1で開示された製造方法は、樹脂絶縁層の粗化の前に樹脂絶縁層が硬化される工程を有している。そのため、樹脂絶縁層の選択エッチングが困難となり、粗化時間を長くしても樹脂絶縁層の表面およびビアホール壁面の凹凸の粗度が大きくならなかった。従って、特許文献1で開示された製造方法では、樹脂絶縁層の表面およびビアホール壁面を十分に粗化することができず、樹脂絶縁層と導体層およびビアホール導体との密着強度が低くなり、ヒートサイクルなどで絶縁層と導体層およびビアホール導体との間の剥がれが発生していた。   The manufacturing method disclosed in Patent Document 1 includes a step in which the resin insulating layer is cured before the resin insulating layer is roughened. For this reason, selective etching of the resin insulating layer becomes difficult, and even if the roughening time is increased, the roughness of the unevenness of the surface of the resin insulating layer and the wall surface of the via hole does not increase. Therefore, in the manufacturing method disclosed in Patent Document 1, the surface of the resin insulating layer and the wall surface of the via hole cannot be sufficiently roughened, the adhesion strength between the resin insulating layer, the conductor layer, and the via hole conductor is lowered, and the heat Peeling between the insulating layer, the conductor layer, and the via-hole conductor occurred due to a cycle or the like.

本発明の目的は、樹脂絶縁層の表面およびビアホール壁面を十分に粗化することができ、樹脂絶縁層と導体層およびビアホール導体との高い密着強度を達成でき、樹脂絶縁層と導体層およびビアホール導体との間の剥がれが抑制されるプリント配線板の製造方法を提供することである。   The object of the present invention is to sufficiently roughen the surface of the resin insulation layer and the wall surface of the via hole, achieve high adhesion strength between the resin insulation layer, the conductor layer and the via hole conductor, and form the resin insulation layer, the conductor layer and the via hole. It is providing the manufacturing method of the printed wiring board by which peeling between conductors is suppressed.

本発明のプリント配線板の製造方法の第1の態様は、樹脂絶縁層と導体層とを交互に備えるプリント配線板の製造方法であって:下層の樹脂絶縁層とこの下層の樹脂絶縁層上の下層の導体層とを有する中間基板が準備される工程と;前記中間基板上に支持フィルム付きの半硬化樹脂フィルムが、前記下層の導体層と前記半硬化樹脂フィルムとが向かい合う向きで積層されて、前記半硬化樹脂フィルムにより半硬化状態の上層の樹脂絶縁層が形成される工程と;前記支持フィルムを介して前記半硬化状態の上層の樹脂絶縁層にビアホールが形成される工程と;前記支持フィルムの除去後、前記半硬化状態の上層の樹脂絶縁層の露出した表面およびビアホール壁面が粗化される工程と;前記半硬化状態の上層の樹脂絶縁層が本硬化される工程と;前記ビアホール内に前記下層の導体層と導通するビアホール導体が形成されるとともに、このビアホール導体および本硬化状態の前記上層の樹脂絶縁層上に上層の導体層が形成される工程と;を備えている。   A first aspect of the method for producing a printed wiring board according to the present invention is a method for producing a printed wiring board comprising a resin insulating layer and a conductor layer alternately: on the lower resin insulating layer and the lower resin insulating layer. An intermediate substrate having a lower conductive layer is prepared; and a semi-cured resin film with a support film is laminated on the intermediate substrate in a direction in which the lower conductive layer and the semi-cured resin film face each other. A step of forming a semi-cured upper resin insulating layer with the semi-cured resin film; a step of forming a via hole in the semi-cured upper resin insulating layer through the support film; After the support film is removed, the exposed surface of the upper resin insulating layer in the semi-cured state and the via hole wall surface are roughened; the upper resin insulating layer in the semi-cured state is fully cured; Forming a via hole conductor in conduction with the lower conductor layer in the via hole, and forming an upper conductor layer on the via hole conductor and the upper resin insulating layer in the fully cured state. Yes.

本発明のプリント配線板の製造方法の第2の態様は、樹脂絶縁層と導体層とを交互に備えるプリント配線板の製造方法であって:下層の樹脂絶縁層とこの下層の樹脂絶縁層上の下層の導体層とを有する中間基板が準備される工程と;前記中間基板上に支持フィルム付きの半硬化樹脂フィルムが、前記下層の導体層と前記半硬化樹脂フィルムとが向かい合う向きで積層されて、前記半硬化樹脂フィルムにより半硬化状態の上層の樹脂絶縁層が形成される工程と;前記支持フィルムを介して前記半硬化状態の上層の樹脂絶縁層にビアホールが形成される工程と;前記支持フィルムの除去後、前記半硬化状態の上層の樹脂絶縁層の露出した表面およびビアホール壁面が粗化される工程と;前記ビアホール内に前記下層の導体層と導通するビアホール導体が形成されるとともに、このビアホール導体および前記半硬化状態の上層の樹脂絶縁層上に上層の導体層が形成される工程と;前記半硬化状態の上層の樹脂絶縁層が本硬化される工程と;を備えている。   A second aspect of the method for producing a printed wiring board according to the present invention is a method for producing a printed wiring board comprising alternately a resin insulating layer and a conductor layer: on the lower resin insulating layer and on the lower resin insulating layer An intermediate substrate having a lower conductive layer is prepared; and a semi-cured resin film with a support film is laminated on the intermediate substrate in a direction in which the lower conductive layer and the semi-cured resin film face each other. A step of forming a semi-cured upper resin insulating layer with the semi-cured resin film; a step of forming a via hole in the semi-cured upper resin insulating layer through the support film; A step of roughening the exposed surface of the semi-cured upper resin insulation layer and the wall surface of the via hole after removing the support film; and a via hole that is electrically connected to the lower conductor layer in the via hole. A step of forming an upper conductor layer on the via-hole conductor and the semi-cured upper resin insulating layer; and a step of fully curing the semi-cured upper resin insulating layer. And have;

(a)〜(g)は、本発明のプリント配線板の製造方法の一実施形態を工程順に示す図である。(A)-(g) is a figure which shows one Embodiment of the manufacturing method of the printed wiring board of this invention in order of a process. (a)〜(g)は、本発明のプリント配線板の製造方法の他の一実施形態を工程順に示す図である。(A)-(g) is a figure which shows other one Embodiment of the manufacturing method of the printed wiring board of this invention to process order.

以下、本発明のプリント配線板の実施形態が図面に基づいて説明される。図1(a)〜(g)は、本発明のプリント配線板の製造方法の第1の態様に対応する一実施形態を工程順に示す図である。   Hereinafter, embodiments of a printed wiring board of the present invention will be described with reference to the drawings. FIGS. 1A to 1G are diagrams showing an embodiment corresponding to the first aspect of the method for producing a printed wiring board of the present invention in the order of steps.

本実施形態のプリント配線板の製造方法では先ず、図1(a)に示されるように、下層の樹脂絶縁層1とこの下層の樹脂絶縁層1上に形成された下層の導体層2とを有する中間基板3が準備される中間基板準備工程が行われる。ここで、下層の樹脂絶縁層1としては、例えばガラスクロスなどの芯材に含浸されたエポキシ樹脂が硬化されて形成されたものを用いることができる。   In the printed wiring board manufacturing method of the present embodiment, first, as shown in FIG. 1A, a lower resin insulating layer 1 and a lower conductor layer 2 formed on the lower resin insulating layer 1 are provided. An intermediate substrate preparation step in which the intermediate substrate 3 is prepared is performed. Here, as the lower resin insulating layer 1, for example, a layer formed by curing an epoxy resin impregnated in a core material such as glass cloth can be used.

次に、図1(b)に示されるように、中間基板3上に支持フィルム4付きの半硬化樹脂フィルム5が、下層の導体層2と半硬化樹脂フィルム5とが向かい合う向きで積層されて、この半硬化樹脂フィルム5により上層の樹脂絶縁層(半硬化樹脂フィルムと同じ符号で示す)5が半硬化状態で形成される樹脂フィルム積層工程が行われる。積層の際の中間基板3と半硬化樹脂フィルム5との接合には、例えば加熱加圧プレスなどの方法を用いることができる。支持フィルム4としては、例えばPET(ポリエチレンテレフタレート)などのフィルムを用いることができる。半硬化樹脂フィルム5としては、例えば熱硬化性を有するエポキシ樹脂フィルムなどを用いることができる。この樹脂フィルム積層工程により、図1(c)に示される積層体を得ることができる。   Next, as shown in FIG. 1B, a semi-cured resin film 5 with a support film 4 is laminated on the intermediate substrate 3 so that the lower conductor layer 2 and the semi-cured resin film 5 face each other. Then, a resin film laminating step is performed in which the semi-cured resin film 5 forms an upper resin insulating layer (indicated by the same reference numeral as the semi-cured resin film) 5 in a semi-cured state. For joining the intermediate substrate 3 and the semi-cured resin film 5 at the time of lamination, for example, a method such as a heating and pressing press can be used. As the support film 4, for example, a film such as PET (polyethylene terephthalate) can be used. As the semi-cured resin film 5, for example, an epoxy resin film having thermosetting properties can be used. By this resin film laminating step, the laminate shown in FIG. 1C can be obtained.

次に、図1(d)に示されるように、支持フィルム4を介して半硬化状態の上層の樹脂絶縁層5にビアホール6が形成されるビアホール形成工程が行われる。ビアホール6は、ビアホール6を形成すべき箇所にレーザ光を照射して支持フィルム4と半硬化状態の上層の樹脂絶縁層5とを一緒に溶融させることにより形成することができる。半硬化状態の上層の樹脂絶縁層5は、ビアホール壁面5aによりビアホール6を画成する。   Next, as shown in FIG. 1 (d), a via hole forming step is performed in which a via hole 6 is formed in the upper resin insulating layer 5 in a semi-cured state via the support film 4. The via hole 6 can be formed by irradiating a portion where the via hole 6 is to be formed with laser light to melt the support film 4 and the semi-cured upper resin insulating layer 5 together. The semi-cured upper resin insulating layer 5 defines a via hole 6 by a via hole wall surface 5a.

次に、図1(e)に示されるように、支持フィルム4が半硬化状態の上層の樹脂絶縁層5から例えば剥離されることにより除去された後、半硬化状態の上層の樹脂絶縁層5の表面5bおよびビアホール壁面5aが粗化される粗化工程が行われる。例えば半硬化樹脂フィルム5に分子量の異なるエポキシ樹脂が配合されて用いられ、相分離されることにより複合相構造を有する樹脂層が形成され、支持フィルム4の除去後の半硬化状態の上層の樹脂絶縁層5から特定相の樹脂が特定の薬品にて除去される、あるいは半硬化樹脂フィルム5の樹脂マトリックス中に例えばシリカや炭酸カルシウム等の無機質微粉末が分散され、支持フィルム4の除去後の半硬化状態の上層の樹脂絶縁層5からこの無機質微粉末が特定の薬品にて選択的に溶出される、といった既知の選択エッチングを利用して、半硬化状態の上層の樹脂絶縁層5の表面5bおよびビアホール壁面5aが粗化される。(例えば特開平7−154069号公報参照)。   Next, as shown in FIG. 1 (e), after the support film 4 is removed, for example, by peeling off the semi-cured upper resin insulation layer 5, the semi-cured upper resin insulation layer 5 is removed. A roughening step is performed in which the surface 5b and the via-hole wall surface 5a are roughened. For example, an epoxy resin having a different molecular weight is blended and used in the semi-cured resin film 5 to form a resin layer having a composite phase structure by phase separation, and the upper-layer resin in a semi-cured state after removal of the support film 4 The resin of a specific phase is removed from the insulating layer 5 with a specific chemical, or an inorganic fine powder such as silica or calcium carbonate is dispersed in the resin matrix of the semi-cured resin film 5, and the support film 4 is removed. The surface of the upper resin insulation layer 5 in the semi-cured state is utilized by using known selective etching such that the inorganic fine powder is selectively eluted with a specific chemical from the upper resin insulation layer 5 in the semi-cured state. 5b and via hole wall surface 5a are roughened. (For example, refer to Japanese Patent Laid-Open No. 7-154069).

次に、図1(f)に示されるように、半硬化状態の上層の樹脂絶縁層5が本硬化される本硬化工程が行われる。半硬化状態の上層の樹脂絶縁層5の本硬化は、上層の樹脂絶縁層5が例えば熱硬化性樹脂フィルムからなるものであれば、その半硬化状態の上層の樹脂絶縁層5を硬化温度よりも高い温度で所定時間加熱することにより行うことができる。また上層の樹脂絶縁層5が例えば光硬化性樹脂フィルムからなるものであれば、その半硬化状態の上層の樹脂絶縁層5を紫外線等の所定波長の光に所定時間露光させることにより行うことができる。   Next, as shown in FIG. 1 (f), a main curing step is performed in which the upper resin insulating layer 5 in a semi-cured state is finally cured. When the upper resin insulating layer 5 is made of, for example, a thermosetting resin film, the main curing of the upper resin insulating layer 5 in the semi-cured state is performed at the curing temperature of the upper resin insulating layer 5 in the semi-cured state. Can be performed by heating at a high temperature for a predetermined time. If the upper resin insulating layer 5 is made of, for example, a photocurable resin film, the upper resin insulating layer 5 in the semi-cured state is exposed to light of a predetermined wavelength such as ultraviolet rays for a predetermined time. it can.

最後に、図1(g)に示されるように、ビアホール6内に下層の導体層2と導通するビアホール導体7が形成されるとともに、このビアホール導体7上および本硬化後の上層の樹脂絶縁層5上に配線パターンを含む上層の導体層8が形成される導体層形成工程が行われる。ビアホール導体7および上層の導体層8の形成には、例えばセミアディティブ法などを利用することができる。   Finally, as shown in FIG. 1 (g), a via-hole conductor 7 is formed in the via-hole 6 to be electrically connected to the lower-layer conductor layer 2, and the upper-layer resin insulation layer on the via-hole conductor 7 and after the main curing. A conductor layer forming step is performed in which an upper conductor layer 8 including a wiring pattern is formed on 5. For example, a semi-additive method can be used to form the via-hole conductor 7 and the upper conductor layer 8.

上述した図1(a)〜(g)に示される実施形態によれば、上層の樹脂絶縁層5は粗化工程の前は半硬化状態であるため、粗化工程で選択エッチング可能であり、粗化時間(エッチング時間)を長くすることによって上層の樹脂絶縁層5の表面5bおよびビアホール壁面5aの凹凸の粗度を大きくすることができる。そのため、上層の樹脂絶縁層5の表面5bおよびビアホール壁面5aを十分に粗化することができ、上層の樹脂絶縁層5とビアホール導体7および上層の導体層8との高い密着強度を達成でき、上層の樹脂絶縁層5とビアホール導体7および上層の導体層8との間の剥がれが抑制される。   According to the embodiment shown in FIGS. 1A to 1G described above, the upper resin insulating layer 5 is in a semi-cured state before the roughening step, and thus can be selectively etched in the roughening step. By increasing the roughening time (etching time), the roughness of the unevenness of the surface 5b of the upper resin insulating layer 5 and the via hole wall surface 5a can be increased. Therefore, the surface 5b of the upper resin insulation layer 5 and the via hole wall surface 5a can be sufficiently roughened, and high adhesion strength between the upper resin insulation layer 5, the via hole conductor 7, and the upper conductor layer 8 can be achieved. Peeling between the upper resin insulating layer 5 and the via-hole conductor 7 and the upper conductor layer 8 is suppressed.

図2(a)〜(g)は、本発明のプリント配線板の製造方法の第2の態様に対応する他の一実施形態を工程順に示す図である。図2(a)〜(g)の各工程において、図1(a)〜(g)に示す工程で形成される部分と同様の方法で形成される部分は、それと同じ符号が付され、その説明が省略される。   FIGS. 2A to 2G are views showing another embodiment corresponding to the second aspect of the printed wiring board manufacturing method of the present invention in the order of steps. In each step of FIGS. 2 (a) to 2 (g), a portion formed by the same method as the portion formed in the steps shown in FIGS. 1 (a) to (g) is assigned the same reference numeral. Explanation is omitted.

図2(a)〜(g)に示される実施形態において、図1(a)〜(g)に示される実施形態と異なる点は、本硬化工程の順番である。すなわち、図1(a)〜(g)に示される実施形態では、図1(f)に示されるように、本硬化工程が粗化工程と導体層形成工程との間で行われているのに対し、図2(a)〜(g)に示される実施形態では、図2(g)に示されるように、本硬化工程が導体層形成工程の後に行われる点である。図2(a)〜(g)に示される実施形態においても、上層の樹脂絶縁層5は粗化工程の前は半硬化状態であるため、図1(a)〜(g)に示される例と同様に、粗化工程によって上層の樹脂絶縁層5の表面5bおよびビアホール壁面5aの凹凸の粗度を大きくすることができる。   In the embodiment shown in FIGS. 2A to 2G, the difference from the embodiment shown in FIGS. 1A to 1G is the order of the main curing step. That is, in the embodiment shown in FIGS. 1A to 1G, as shown in FIG. 1F, the main curing process is performed between the roughening process and the conductor layer forming process. On the other hand, in the embodiment shown in FIGS. 2A to 2G, the main curing step is performed after the conductor layer forming step as shown in FIG. 2G. Also in the embodiment shown in FIGS. 2A to 2G, the upper resin insulation layer 5 is in a semi-cured state before the roughening step, and therefore the example shown in FIGS. 1A to 1G. Similarly to the above, the roughness of the unevenness of the surface 5b of the upper resin insulation layer 5 and the via hole wall surface 5a can be increased by the roughening step.

本発明のプリント配線板の製造方法の好適例として、図1(a)〜(g)に示される実施形態および図2(a)〜(g)に示される実施形態のいずれにおいても、図1(c)および図2(c)に示される樹脂フィルム積層工程と、図1(d)および図2(d)に示されるビアホール形成工程との間に、半硬化状態の上層の樹脂絶縁層5が例えば指で軽く押されて凹まない程度に仮硬化される仮硬化工程を追加することができる。ビアホール形成工程の前に半硬化状態の上層の樹脂絶縁層5が仮硬化されると、製造中のプリント配線板の搬送などの際の変形が防止され、取扱いが容易になる。   As a suitable example of the method for producing a printed wiring board of the present invention, both the embodiment shown in FIGS. 1 (a) to (g) and the embodiment shown in FIGS. 2 (a) to (g) are shown in FIG. Between the resin film laminating step shown in FIG. 2C and FIG. 2C and the via hole forming step shown in FIG. 1D and FIG. However, for example, a temporary curing step can be added in which it is temporarily cured to such an extent that it is lightly pressed with a finger and does not dent. If the semi-cured upper resin insulation layer 5 is temporarily cured before the via hole forming step, deformation during transportation of the printed wiring board during manufacture is prevented, and handling becomes easy.

半硬化状態の上層の樹脂絶縁層5の仮硬化は、上層の樹脂絶縁層5が例えば熱硬化性樹脂フィルムからなるものであれば、その半硬化状態の上層の樹脂絶縁層5を硬化温度よりも高い温度で本硬化の場合よりも短時間加熱し、あるいは硬化温度よりも低い温度で加熱することにより行うことができる。また上層の樹脂絶縁層5が例えば光硬化性樹脂フィルムからなるものであれば、その半硬化状態の上層の樹脂絶縁層5を紫外線等の所定波長の光に本硬化の場合よりも短時間露光させることにより行うことができる。   If the upper resin insulation layer 5 is made of, for example, a thermosetting resin film, the semi-cured upper resin insulation layer 5 is temporarily cured from the curing temperature of the upper resin insulation layer 5 in the semi-cured state. The heating can be performed at a higher temperature for a shorter time than in the case of the main curing, or by heating at a temperature lower than the curing temperature. If the upper resin insulation layer 5 is made of, for example, a photocurable resin film, the semi-cured upper resin insulation layer 5 is exposed to light of a predetermined wavelength such as ultraviolet rays for a shorter time than in the case of main curing. Can be performed.

本発明のプリント配線板の製造方法においては、図1(a)〜(g)に示される実施形態および図2(a)〜(g)に示される実施形態のいずれにおいても、図1(b)〜(g)または図2(b)〜(g)に示される工程と同様にして、上層の樹脂絶縁層5および上層の導体層8の上にさらに上層の樹脂絶縁層5および上層の導体層8を1または複数層ずつ交互に積層して多層プリント配線板を製造しても良い。   In the method for producing a printed wiring board of the present invention, both the embodiment shown in FIGS. 1A to 1G and the embodiment shown in FIGS. ) To (g) or similar to the steps shown in FIGS. 2B to 2G, the upper resin insulation layer 5 and the upper conductor are further formed on the upper resin insulation layer 5 and the upper conductor layer 8. A multilayer printed wiring board may be manufactured by alternately laminating the layers 8 one by one or a plurality of layers.

1 下層の樹脂絶縁層
2 下層の導体層
3 中間基板
4 支持フィルム
5 上層の樹脂絶縁層(半硬化樹脂フィルム)
5a ビアホール壁面
5b 表面
6 ビアホール
7 ビアホール導体
8 上層の導体層
DESCRIPTION OF SYMBOLS 1 Lower resin insulation layer 2 Lower conductive layer 3 Intermediate substrate 4 Support film 5 Upper resin insulation layer (semi-cured resin film)
5a Via hole wall surface 5b Surface 6 Via hole 7 Via hole conductor 8 Upper conductor layer

Claims (3)

樹脂絶縁層と導体層とを交互に備えるプリント配線板の製造方法であって:
下層の樹脂絶縁層とこの下層の樹脂絶縁層上の下層の導体層とを有する中間基板が準備される工程と;
前記中間基板上に支持フィルム付きの半硬化樹脂フィルムが、前記下層の導体層と前記半硬化樹脂フィルムとが向かい合う向きで積層されて、前記半硬化樹脂フィルムにより半硬化状態の上層の樹脂絶縁層が形成される工程と;
前記支持フィルムを介して前記半硬化状態の上層の樹脂絶縁層にビアホールが形成される工程と;
前記支持フィルムの除去後、前記半硬化状態の上層の樹脂絶縁層の露出した表面およびビアホールの壁面が粗化される工程と;
前記半硬化状態の上層の樹脂絶縁層が本硬化される工程と;
前記ビアホール内に前記下層の導体層と導通するビアホール導体が形成されるとともに、このビアホール導体および本硬化状態の前記上層の樹脂絶縁層上に上層の導体層が形成される工程と;
を備えている。
A method for manufacturing a printed wiring board comprising alternating resin insulation layers and conductor layers, comprising:
A step of preparing an intermediate substrate having a lower resin insulation layer and a lower conductor layer on the lower resin insulation layer;
A semi-cured resin film with a support film is laminated on the intermediate substrate so that the lower conductor layer and the semi-cured resin film face each other, and the semi-cured resin upper layer is semi-cured by the semi-cured resin film. A step of forming
A step of forming a via hole in the semi-cured upper resin insulating layer through the support film;
A step of roughening the exposed surface of the semi-cured upper resin insulation layer and the wall surface of the via hole after removing the support film;
A step in which the upper resin insulating layer in the semi-cured state is fully cured;
A step of forming a via-hole conductor in conduction with the lower-layer conductor layer in the via-hole, and forming an upper conductor layer on the via-hole conductor and the upper resin insulating layer in the fully cured state;
It has.
樹脂絶縁層と導体層とを交互に備えるプリント配線板の製造方法であって:
下層の樹脂絶縁層とこの下層の樹脂絶縁層上の下層の導体層とを有する中間基板が準備される工程と;
前記中間基板上に支持フィルム付きの半硬化樹脂フィルムが、前記下層の導体層と前記半硬化樹脂フィルムとが向かい合う向きで積層されて、前記半硬化樹脂フィルムにより半硬化状態の上層の樹脂絶縁層が形成される工程と;
前記支持フィルムを介して前記半硬化状態の上層の樹脂絶縁層にビアホールが形成される工程と;
前記支持フィルムの除去後、前記半硬化状態の上層の樹脂絶縁層の露出した表面およびビアホールの壁面が粗化される工程と;
前記ビアホール内に前記下層の導体層と導通するビアホール導体が形成されるとともに、このビアホール導体および前記半硬化状態の上層の樹脂絶縁層上に上層の導体層が形成される工程と;
前記半硬化状態の上層の樹脂絶縁層が本硬化される工程と;
を備えている。
A method for manufacturing a printed wiring board comprising alternating resin insulation layers and conductor layers, comprising:
A step of preparing an intermediate substrate having a lower resin insulation layer and a lower conductor layer on the lower resin insulation layer;
A semi-cured resin film with a support film is laminated on the intermediate substrate so that the lower conductor layer and the semi-cured resin film face each other, and the semi-cured resin upper layer is semi-cured by the semi-cured resin film. A step of forming
A step of forming a via hole in the semi-cured upper resin insulating layer through the support film;
A step of roughening the exposed surface of the semi-cured upper resin insulation layer and the wall surface of the via hole after removing the support film;
Forming a via-hole conductor in conduction with the lower-layer conductor layer in the via-hole, and forming an upper conductor layer on the via-hole conductor and the semi-cured upper resin insulating layer;
A step in which the upper resin insulating layer in the semi-cured state is fully cured;
It has.
請求項1または2に記載のプリント配線板の製造方法であって、前記半硬化状態の上層の樹脂絶縁層が形成される工程と前記ビアホールが形成される工程との間に、前記半硬化状態の上層の樹脂絶縁層が仮硬化される工程を備えている。   It is a manufacturing method of the printed wiring board of Claim 1 or 2, Comprising: The said semi-hardened state between the process in which the upper resin insulation layer of the said semi-hardened state is formed, and the process in which the said via hole is formed. And a step of temporarily curing the upper resin insulation layer.
JP2015088133A 2015-04-23 2015-04-23 Manufacturing method for printed board Pending JP2016207850A (en)

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Country Link
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