JP2016179458A - Coating applicator and coating method - Google Patents

Coating applicator and coating method Download PDF

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JP2016179458A
JP2016179458A JP2015062256A JP2015062256A JP2016179458A JP 2016179458 A JP2016179458 A JP 2016179458A JP 2015062256 A JP2015062256 A JP 2015062256A JP 2015062256 A JP2015062256 A JP 2015062256A JP 2016179458 A JP2016179458 A JP 2016179458A
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coating
electrode
film thickness
film
substrate
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雄一郎 篠原
Yuichiro Shinohara
雄一郎 篠原
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a coating applicator capable of flattening a coating film stably without applying mechanical vibration thereto, in order to remove dispersion of a film thickness distribution such as ribbing irregularity or step irregularity in high-speed coating.SOLUTION: A coating applicator 10 for forming a coating film on a substrate 1, by coating out a coating body 2 from a coating head 3, includes a film thickness fluctuation detector 4 for measuring the thickness of a coating film just after being formed, an electrode 5 in parallel with a coated surface arranged in the non-contact state with the coated surface, and a voltage source 6 connected to the electrode 5, for applying a voltage in accordance with film thickness fluctuation.SELECTED DRAWING: Figure 1

Description

本発明は、カラーフィルタや光学フィルムなどの、均一な膜厚分布が求められる部材の製造や、高速・大量生産が要求されるバリアフィルムなどの製造において使用され、塗膜を、均一かつ高速に形成する塗布装置および塗布方法に関する。   The present invention is used in the manufacture of members that require a uniform film thickness distribution, such as color filters and optical films, and in the manufacture of barrier films that require high speed and mass production. The present invention relates to a coating apparatus and a coating method to be formed.

近年、ディスプレイデバイスの部材製造においては、塗布・印刷技術の適用が盛んに行われている。例えばカラーフィルタでは、ダイコーター等を用い、基材上にカラーレジストを均一に塗布し、フォトリソグラフィーによって所望のRGBパターンを形成する。   In recent years, application of a coating / printing technique has been actively performed in the manufacture of display device components. For example, in a color filter, a color coater is uniformly applied on a substrate using a die coater or the like, and a desired RGB pattern is formed by photolithography.

厚み1μmを下回る膜厚で形成されるカラーレジストは、厚さによって色濃度が変化するため、サブμmレベルでの膜厚均一性が求められる。   A color resist formed with a film thickness of less than 1 μm has a color density that varies depending on the thickness, and therefore requires a uniform film thickness at the sub-μm level.

また、反射防止フィルム等の光学フィルムの製造においては、グラビアコーター等を用いて厚み数μmの塗膜を基材上に形成するが、膜厚の均一性に加え、製造効率を上げるため、さらなる高速塗布が要求される。   Moreover, in the production of optical films such as antireflection films, a coating film having a thickness of several μm is formed on a substrate using a gravure coater or the like. High speed application is required.

また、食品の保存性向上や意匠性向上などで我々の生活に欠かせない存在となってきたバリアフィルムの製造においては、光学フィルムの一桁上の高速塗布が求められるようになっている。   In addition, in the production of barrier films that have become indispensable for our daily lives by improving the storage stability and designability of foods, high-speed coating one order of magnitude on optical films is required.

しかし、高速塗布においては、一般的にリビングと呼ばれる塗布幅方向に周期的な膜厚分布が生じやすいことが知られており、問題となっている。   However, in high-speed coating, it is known that a periodic film thickness distribution is generally likely to occur in the coating width direction, which is generally called “living”.

図6は、従来の塗布装置における、リビングムラ発生を示した正面概念図(a)側面概念図(b)である。   FIG. 6 is a front conceptual view (a) and a side conceptual view (b) showing the occurrence of living unevenness in a conventional coating apparatus.

図6は代表的な塗布装置としてダイコーターを例として塗布プロセスを示すが、塗布速度が上昇するにしたがって、基材1に塗布される塗液2の幅方向の膜厚を見ると基材1の幅方向に周期的な厚みの分布を生じる(図(b))。   FIG. 6 shows a coating process using a die coater as an example of a typical coating apparatus. When the coating film 2 applied to the substrate 1 is seen in the width direction as the coating speed increases, the substrate 1 is shown in FIG. A periodic thickness distribution is generated in the width direction (FIG. 2B).

これは、塗膜が形成される塗布ビードの内部において圧力分布が生じることが主要な原因とされており、この現象(リビング)による膜厚分布をリビングムラ9と呼ぶ。   This is mainly caused by the pressure distribution occurring inside the coating bead on which the coating film is formed. The film thickness distribution due to this phenomenon (living) is called living unevenness 9.

図7は、従来の塗布装置における段ムラ発生を示した正面概念図(a)と側面概念図(b)であり、基材幅方向に均一で、進行方向に厚みの分布が生じることがあり、これを段ムラ11と呼ぶ。   FIG. 7 is a front conceptual view (a) and a side conceptual view (b) showing the occurrence of step unevenness in a conventional coating apparatus, which may be uniform in the substrate width direction and have a thickness distribution in the traveling direction. This is called step unevenness 11.

この段ムラ11は、ダイコーターの塗出口と基材1との間隔が、塗布装置の振動により変化することや、基材搬送路の搬送速度の変動などが原因で変化することや、塗液2を送り出すポンプの脈動により液量の変動によって生じる現象である。   This step unevenness 11 is caused by a change in the distance between the coating outlet of the die coater and the base material 1 due to vibration of the coating apparatus, a change in the transport speed of the base material transport path, and the like. 2 is a phenomenon caused by fluctuations in the amount of liquid due to the pulsation of the pump that feeds 2.

これらの膜厚分布は、上述したカラーフィルタや光学フィルムにおいては、ムラ欠陥となり、バリアフィルムにおいてはバリア性の低下につながる。   These film thickness distributions cause uneven defects in the above-described color filter and optical film, and lead to a decrease in barrier properties in the barrier film.

リビングムラ9を抑制しながら高速に塗布するために、塗布ビードの上流側に減圧機構を設け塗工ヘッド先端部の圧力分布を均一化する方法や、段ムラの抑制のために塗布装置の制振や無脈動のポンプを使用することが実施されている。   In order to apply the coating at a high speed while suppressing the living unevenness 9, a pressure reducing mechanism is provided on the upstream side of the application bead to equalize the pressure distribution at the tip of the coating head, and to control the unevenness of the coating apparatus. The use of vibration or pulsating pumps has been implemented.

しかし、塗布の高速化によって装置の振動や制御が不安定になり易く、膜厚分布の発生を抑制することは困難になっている。   However, the vibration and control of the apparatus are likely to become unstable due to the high-speed coating, and it is difficult to suppress the occurrence of the film thickness distribution.

また、膜厚分布を解消する方法として、塗布装置を改良し、塗布後の基材に機械的に振動を加え、基材上塗膜の流動性を向上させて、レベリングにより平坦化させる方法が考案されている(特許文献1)。   Also, as a method of eliminating the film thickness distribution, there is a method of improving the coating apparatus, mechanically vibrating the substrate after coating, improving the fluidity of the coating film on the substrate, and leveling by leveling. It has been devised (Patent Document 1).

しかしながら、この方法ではリビングやその他のムラ、構造欠陥等に対して有効であるが、塗布装置の一部を振動機能を持つ部材に置き換えるなどするため、塗布装置に振動源が加わってしまい、不安定化してしまうという問題がある。   However, this method is effective for living and other unevenness, structural defects, etc. However, since a part of the coating apparatus is replaced with a member having a vibration function, a vibration source is added to the coating apparatus, which is not effective. There is a problem of stabilization.

特開2005−144414号公報JP 2005-144414 A

本発明は、前記の問題点に鑑みて提案するものであり、高速塗布において発生するリビングムラや段ムラといった、膜厚分布のばらつきを解消するため、機械的に振動を加えることなく、安定して塗膜を平坦化させることのできる塗布装置を提供することにある。   The present invention is proposed in view of the above-mentioned problems, and is stable without mechanical vibrations in order to eliminate variations in film thickness distribution such as living unevenness and step unevenness that occur in high-speed coating. An object of the present invention is to provide a coating apparatus capable of flattening a coating film.

上記の課題を解決するための手段として、請求項1に記載の発明は、基材に、塗工ヘッドから塗液を塗出して、塗膜を形成する塗布装置であって、
前記塗膜の、形成直後の膜厚を測定する膜厚変動検出機と、
塗布面と非接触で配置される塗布面と平行な電極と、
電極に接続し、前記膜厚変動に合わせ電圧を印加する電圧源と、を具備したことを特徴とする塗布装置である。
As means for solving the above-mentioned problems, the invention according to claim 1 is a coating apparatus for coating a substrate with a coating liquid from a coating head to form a coating film,
A film thickness variation detector for measuring the film thickness immediately after formation of the coating film,
An electrode parallel to the coating surface arranged in non-contact with the coating surface;
And a voltage source for applying a voltage in accordance with the film thickness variation.

また、請求項2に記載の発明は、前記電極の形状が、板状あるいは刃状で、塗布面と対向する辺が、鋭角な先端を有していることを特徴とする請求項1に記載の塗布装置である。   The invention according to claim 2 is characterized in that the shape of the electrode is plate-like or blade-like, and the side facing the application surface has a sharp tip. It is a coating device.

また、請求項3に記載の発明は、前記電極の形状が、線状であることを特徴とする請求項1に記載の塗布装置である。   The invention according to claim 3 is the coating apparatus according to claim 1, wherein the electrode has a linear shape.

また、請求項4に記載の発明は、基材あるいは塗工ヘッドの搬送方向に対する、前記電極の角度を調整する角度調節機構を具備したことを特徴とする請求項1〜3のいずれか一項に記載の塗布装置である。   The invention according to claim 4 further comprises an angle adjusting mechanism for adjusting the angle of the electrode with respect to the transport direction of the substrate or the coating head. It is a coating device as described in above.

また、請求項5に記載の発明は、請求項1〜4のいずれか一項に記載の塗布装置を用い、電極に電圧を印加し、電極直下の塗膜を盛り上げ、塗布直後に存在する膜厚の分布を解消することを特徴とする塗布方法である。   In addition, the invention described in claim 5 is a film that exists immediately after coating by applying a voltage to the electrode using the coating apparatus according to any one of claims 1 to 4 to swell the coating film directly under the electrode. This coating method is characterized in that the thickness distribution is eliminated.

本発明は、所望の基材に液体を塗布する塗布装置であって、基材に塗膜を形成する塗布機構と、塗布機構において被塗布基材に液体が塗布される塗布部から下流側において、膜厚変動に合わせ、電極に電圧を印加することで、機械的に振動を加えることなく、高速塗
布で生じるリビングムラや段ムラによる膜厚分布不良を解消することを可能とした。
The present invention is a coating apparatus that applies a liquid to a desired base material, and includes a coating mechanism that forms a coating film on the base material, and a downstream side from a coating portion where the liquid is applied to the base material to be coated in the coating mechanism. By applying a voltage to the electrode in accordance with the film thickness variation, it was possible to eliminate film thickness distribution defects due to living unevenness and step unevenness caused by high-speed coating without mechanically applying vibration.

本発明の、塗布装置の構成を示した正面概念図(a)側面概念図(b)である。It is the front conceptual diagram (a) and side conceptual diagram (b) which showed the structure of the coating device of this invention. 本発明の塗布装置における、電場の作用による塗液の変化を示した正面概念図(a)側面概念図(b)である。It is the front conceptual diagram (a) side conceptual diagram (b) which showed the change of the coating liquid by the effect | action of an electric field in the coating device of this invention. 本発明の塗布装置における、発生したリビングムラに対応する電極の配置を示した概念図(a)と電極に電圧を印加し、電極直下を通過させた前後の膜厚分布を示した概念図(b)である。The conceptual diagram (a) which showed arrangement | positioning of the electrode corresponding to the generated living nonuniformity in the coating device of this invention, and the conceptual diagram which showed the film thickness distribution before and after letting a voltage be applied to an electrode and let it pass directly under an electrode ( b). 本発明の塗布装置における、発生した段ムラに対応する電極の配置を示した概念図(a)と電極に電圧を印加し、電極直下を通過させた前後の膜厚分布を示した概念図(b)である。The conceptual diagram (a) which showed arrangement | positioning of the electrode corresponding to the generated step nonuniformity in the coating apparatus of this invention, and the conceptual diagram which showed the film thickness distribution before and after letting a voltage be applied to an electrode and let it pass directly under an electrode ( b). 本発明の塗布装置における、電圧を印加によるムラの解消機構を示した概念図である。It is the conceptual diagram which showed the elimination mechanism of the nonuniformity by the application of a voltage in the coating device of this invention. 従来の塗布装置における、リビングムラ発生を示した正面概念図(a)側面概念図(b)である。It is the front conceptual diagram (a) and side conceptual diagram (b) which showed living nonuniformity generation | occurrence | production in the conventional coating device. 従来の塗布装置における、段ムラ発生を示した正面概念図(a)側面概念図(b)である。It is the front conceptual diagram (a) and side conceptual diagram (b) which showed generation | occurrence | production of the step unevenness in the conventional coating device.

以下本発明を実施するための形態を、図面を用いて詳細に説明する。図1は、本発明の塗布装置の構成を、正面図(a)側面図(b)として示している。   DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings. FIG. 1 shows the configuration of the coating apparatus of the present invention as a front view (a) and a side view (b).

本発明の塗布装置10は、塗工ヘッド3、膜厚変動検出機4、電極5、電圧源6から構成されており、基材1上に、塗膜を形成するため、塗工ヘッド3から塗液2は塗出され、塗布される。   The coating apparatus 10 of the present invention includes a coating head 3, a film thickness variation detector 4, an electrode 5, and a voltage source 6, and forms a coating film on the substrate 1. The coating liquid 2 is applied and applied.

塗工ヘッド3から下流側に向かう、基材1上に形成された塗液2の膜厚変動を検出する膜厚変動検出機4が設けられおり、電極5は、基材1の幅方向に広がりを持ち、塗液2の塗布面側に塗布面と非接触で配置され、電圧を印加するため電圧源6と接続されている。   A film thickness variation detector 4 that detects the film thickness variation of the coating liquid 2 formed on the base material 1 is provided downstream from the coating head 3, and the electrode 5 extends in the width direction of the base material 1. It has a spread, is disposed on the application surface side of the coating liquid 2 without contact with the application surface, and is connected to a voltage source 6 for applying a voltage.

また、電極5と基材1の進行方向との角度θを、電極5を動かすことによって調整する、電極角度調節機構8を具備している。   In addition, an electrode angle adjusting mechanism 8 that adjusts an angle θ between the electrode 5 and the traveling direction of the substrate 1 by moving the electrode 5 is provided.

塗工ヘッド3は塗布装置10の塗工部であり、ダイコーター、グラビアコーター、リバースロールコーター、ナイフコーター、コンマコーターなど挙げることができ、基材1と塗工ヘッド3との間にビードが形成され、連続的に塗液を供給し続けるような塗布装置が好適であり、インクジェットのような断続的に液滴を射出して塗膜を形成するようなものでもよい。   The coating head 3 is a coating part of the coating apparatus 10, and examples thereof include a die coater, a gravure coater, a reverse roll coater, a knife coater, and a comma coater. A bead is formed between the substrate 1 and the coating head 3. A coating apparatus that is formed and continuously supplies the coating liquid is suitable, and a coating film may be formed by intermittently ejecting liquid droplets such as inkjet.

基材1はガラス基板や、光学フィルム、包装材等で使用される可堯性のある樹脂フィルムなどが該当する。   The base material 1 corresponds to a flexible resin film used in a glass substrate, an optical film, a packaging material, or the like.

電極5は金属で構成された平板あるいは線材である。平板の場合、電場の分布が電極直下に集中するように塗膜と対向する長辺が鋭角に加工されている方が良い。   The electrode 5 is a flat plate or a wire made of metal. In the case of a flat plate, it is better that the long side facing the coating film is processed at an acute angle so that the electric field distribution is concentrated directly under the electrode.

線材の場合、線材を基材の幅方向に張り渡らせるように設置する。線材と基材との間隔は、平板電極の場合の平板先端と基材との間隔と同じ距離とする。線材の径はできるだけ細い方が電場の分布が電極直下に集中し易い。   In the case of a wire, it is installed so that the wire is stretched in the width direction of the substrate. The distance between the wire and the base material is the same as the distance between the flat plate tip and the base material in the case of the flat electrode. When the wire diameter is as thin as possible, the electric field distribution tends to concentrate directly under the electrode.

線材としては、例えば金属細線で数10μm程度のものが利用可能であり、線径10μm以下の極細ばね用線トスミクロンNANO(トクセン工業社製)が好適である。   As the wire, for example, a thin metal wire of about several tens of μm can be used, and a wire tosmicron NANO (manufactured by Toxen Industries) having a wire diameter of 10 μm or less is suitable.

電圧源6はファンクションジェネレータやパルスジェネレータの電圧を高圧アンプで増幅したものを用いることができる。   As the voltage source 6, a voltage generated by a function generator or a pulse generator amplified by a high-voltage amplifier can be used.

膜厚変動検出機4は、ライン上を高速で搬送される基材1上に塗布された塗膜の、膜厚変動を検出するものであり、高速度カメラに偏光レンズを装着して基材を観察し、基材に白色光を照射したときの明暗の差を画像処理して分布を検出するものや、分光干渉式膜厚計で膜厚の変動を直接検出するものが好適である。   The film thickness variation detector 4 detects the film thickness variation of the coating film applied on the substrate 1 conveyed at high speed on the line. The substrate is obtained by attaching a polarizing lens to a high-speed camera. And detecting the distribution by image processing the difference in brightness when the substrate is irradiated with white light, or detecting the film thickness directly with a spectral interference film thickness meter is preferred.

電極の角度調節機構7は、膜厚変動検出機4によって検出される膜厚分布の状態に応じて、基材1の幅方向に広がる電極5の軸が基材の進行方向との間になす角度θを調節するものである。   The electrode angle adjustment mechanism 7 is formed between the axis of the electrode 5 extending in the width direction of the base material 1 and the direction of travel of the base material according to the state of the film thickness distribution detected by the film thickness variation detector 4. The angle θ is adjusted.

角度調節機構7としては、例えば、電極5の被塗布基材幅方向の一端や、基材幅方向の中央部を把持し、把持部を中心として基材1と電極5の水平を保ったまま回転させる機構でもよい。   As the angle adjusting mechanism 7, for example, one end of the electrode 5 in the width direction of the substrate to be coated and the center in the width direction of the substrate are held, and the substrate 1 and the electrode 5 are kept horizontal with the holding portion as the center. A rotating mechanism may be used.

次に本発明の塗布装置10により、膜厚ムラを解消する方法について説明する。図2は本発明の塗布装置10において電場の作用による液面の変化を示したものである。塗工ヘッド3から塗出された塗液2は基材1上で塗膜を形成し、下流側に搬送される。   Next, a method for eliminating film thickness unevenness using the coating apparatus 10 of the present invention will be described. FIG. 2 shows changes in the liquid level due to the action of an electric field in the coating apparatus 10 of the present invention. The coating liquid 2 applied from the coating head 3 forms a coating film on the substrate 1 and is conveyed downstream.

塗液2が電極5の下を通過するとき、電極5に接続された電圧源6より電圧を印加することで該電極5から生じる電場の作用により空気層と該塗液2の界面にマクスウェル応力を働かせ、電極5直下の塗液2を電場で持ち上げる。マクスウェル応力は電極5直下で生じるため、電極5の下流側では持ち上げられた塗膜は重力や表面張力の作用によって平坦化される。   When the coating liquid 2 passes under the electrode 5, Maxwell stress is applied to the interface between the air layer and the coating liquid 2 by the action of an electric field generated from the electrode 5 by applying a voltage from the voltage source 6 connected to the electrode 5. And the coating liquid 2 just below the electrode 5 is lifted by an electric field. Since Maxwell stress is generated directly under the electrode 5, the lifted coating film is flattened by the action of gravity and surface tension on the downstream side of the electrode 5.

高速塗布において生じる膜厚ムラとしては図3に示すリビングムラ9と図4に示す段ムラ11がある。図3のリビングムラ9は塗布部から下流において基材1の幅方向に膜の厚い部分12と薄い部分が周期的に現れる現象である。図4の段ムラ11は基材1の幅方向に対して均一で、基材1の進行方向に断続的に膜の厚い部分12と薄い部分が周期的に現れる現象である。   As the film thickness unevenness caused by high-speed application, there are a living unevenness 9 shown in FIG. 3 and a step unevenness 11 shown in FIG. 3 is a phenomenon in which a thick portion 12 and a thin portion of the film periodically appear in the width direction of the substrate 1 downstream from the application portion. 4 is a phenomenon that is uniform with respect to the width direction of the substrate 1 and that a thick portion 12 and a thin portion of the film appear periodically in the traveling direction of the substrate 1.

前記ムラの発生を膜厚変動検出機4によって検出する。膜厚変動検出機4によってムラが発生したと判定された場合、ムラの種別がリビングムラ9か段ムラ11によって電極5角度調節機構7により電極5の軸A−Bと基材1との示す角度を調節し、電極5に接続された電圧源6より電圧を印加する。   The occurrence of the unevenness is detected by the film thickness fluctuation detector 4. When it is determined by the film thickness variation detector 4 that unevenness has occurred, the type of unevenness is the living unevenness 9 or the step unevenness 11, and the electrode 5 angle adjustment mechanism 7 indicates the axis AB of the electrode 5 and the substrate 1. The angle is adjusted and a voltage is applied from a voltage source 6 connected to the electrode 5.

電極5の角度は、リビングムラ9であれば、図3に示すように電極5の軸A−Bが基材1の幅方向と平行となるようにする。段ムラ11であれば、図4に示すように、電極5の軸A−Bが基材1の幅方向と非平行かつ非垂直となる範囲で角度を調節する。   If the angle of the electrode 5 is the living unevenness 9, the axis AB of the electrode 5 is made parallel to the width direction of the substrate 1 as shown in FIG. In the case of the step unevenness 11, as shown in FIG. 4, the angle is adjusted in a range in which the axis AB of the electrode 5 is non-parallel and non-perpendicular to the width direction of the substrate 1.

前記したそれぞれのムラが発生する状態において電圧源6によって電圧を印加しないときの塗液2の断面図を図5に示す。膜厚のムラが発生した場合(図5(a))、電極5の軸A−Bでの塗液2の断面では、塗液2の厚い部分と薄い部分が周期的に現れている。   FIG. 5 shows a cross-sectional view of the coating liquid 2 when no voltage is applied by the voltage source 6 in a state where each of the above unevenness occurs. When unevenness of the film thickness occurs (FIG. 5A), thick and thin portions of the coating liquid 2 appear periodically in the cross section of the coating liquid 2 along the axis AB of the electrode 5.

電極5に電圧源6の電圧を印加すると(図5(b))、電極5の直下では、マクスウェル応力と、表面張力と、重力とが均衡する形状になるまで塗液2が持ち上がる。このとき、電極5の軸A−B方向に生じていた周期的な膜厚の分布が解消される。   When the voltage of the voltage source 6 is applied to the electrode 5 (FIG. 5B), the coating liquid 2 is lifted just below the electrode 5 until the Maxwell stress, the surface tension, and the gravity are balanced. At this time, the periodic film thickness distribution that has occurred in the direction of the axis AB of the electrode 5 is eliminated.

本発明では、薄いところのみを引きあげるのではなく、厚いところも薄いところも全部引き上げ、最終的には、マクスウェル応力と表面張力の均衡に至る高さになったところで塗膜の変形が停止することを利用している。   In the present invention, not only the thin part is lifted, but the thick part and the thin part are all pulled up, and finally the deformation of the coating stops when the height reaches the balance between Maxwell stress and surface tension. I use that.

基材1が下流側に進んでマクスウェル応力の効力範囲から遠ざかると、持ち上げられた塗液2が重力と表面張力の作用によって緩和し、破線Z部の断面のように平坦化する。説明のため電極5の幅を狭く記述しているが、実際は基材1の幅よりも広くすることで基材1上の塗液2は幅方向全域が平坦化される(c)。   When the substrate 1 moves downstream and moves away from the effective range of Maxwell stress, the lifted coating liquid 2 is relaxed by the action of gravity and surface tension, and is flattened as shown by the cross section of the broken line Z part. For the sake of explanation, the width of the electrode 5 is narrowly described, but actually, the coating liquid 2 on the substrate 1 is flattened in the entire width direction by making it wider than the width of the substrate 1 (c).

塗液2が持ち上がる高さは、該塗液の比誘電率が空気と比べて大きいほど狭い範囲で高くなり、また電場の強度に依存する。そのため、該塗液の物性によって電極5と該塗液の間隔や印加する電圧の大きさ、周波数を調整する必要がある。   The height at which the coating liquid 2 is lifted becomes higher in a narrower range as the relative dielectric constant of the coating liquid is larger than that of air, and depends on the strength of the electric field. Therefore, it is necessary to adjust the distance between the electrode 5 and the coating liquid, the magnitude of the applied voltage, and the frequency depending on the physical properties of the coating liquid.

また、塗液2が帯電しやすい液体である場合は、正、または負の単極性の波形電圧だと液面がうまく盛り上がらないことがあるため、その場合は正負の極性が反転するバースト波形電圧を印加するとよい。   In addition, when the coating liquid 2 is a liquid that is easily charged, the liquid level may not rise well if the waveform voltage is positive or negative unipolar. In this case, the burst waveform voltage that reverses the positive and negative polarities. May be applied.

また、塗液2の粘性が高いほど液面が盛り上がる速度が遅いため、電極5が1点だけでは十分に液面が盛り上がらず、平坦化の効果が得られないことがある。すなわち、搬送速度が速い場合や、塗液の粘度が高い場合など、持ち上げる速度が不十分な場合は、電極5の下流側に、さらに、電極5と同様の、補助電極を複数段設けることで効果を補うことができる。   Further, the higher the viscosity of the coating liquid 2 is, the slower the liquid surface rises, so that the liquid surface does not sufficiently rise when only one electrode 5 is provided, and the flattening effect may not be obtained. That is, when the speed of lifting is insufficient, such as when the conveyance speed is high or the viscosity of the coating liquid is high, a plurality of auxiliary electrodes similar to the electrode 5 are further provided on the downstream side of the electrode 5. The effect can be supplemented.

大よそ100mPa・sの粘度の液体に、電極5の先端と該塗液の間隔100μmとして、数100Vの振幅のバースト波形を印加すると、数ミリ秒で頂点数10μm、幅1mm程度の液面の盛り上がりが形成される。   When a burst waveform with an amplitude of several hundred volts is applied to a liquid having a viscosity of about 100 mPa · s and the gap between the tip of the electrode 5 and the coating liquid is 100 μm, the liquid surface having a vertex number of 10 μm and a width of about 1 mm in several milliseconds. A swell is formed.

100m/minの塗布速度では、1mmの移動に約600μs掛かるので、1個の電極につき数μmの盛り上がりができる計算となる。   At a coating speed of 100 m / min, the movement of 1 mm takes about 600 μs, so that a calculation of several μm per electrode is possible.

粘度によって変形量は大よそリニアに変化するので、上記のような見積もりにより、平坦化したい膜の厚みに合わせて必要な補助電極の個数が決定できる。   Since the amount of deformation changes approximately linearly depending on the viscosity, the number of auxiliary electrodes required can be determined according to the thickness of the film to be flattened by the above estimation.

本発明は一般的に産業用途で用いられる有機系溶媒に高分子樹脂などの溶質を混合した液体や、水に水溶性の高分子を混合した塗液、それらに微小粒子が混合されたもの等、様々な塗液に対して適用可能である。   The present invention generally includes a liquid in which a solute such as a polymer resin is mixed with an organic solvent generally used for industrial use, a coating liquid in which a water-soluble polymer is mixed in water, and a mixture of microparticles therein. It can be applied to various coating liquids.

1・・・基材
2・・・塗液
3・・・塗工ヘッド
4・・・膜厚変動検出機
5・・・電極
6・・・電圧源
7・・・電極の角度調節機構
8・・・角度調節機構の制御装置
9・・・リビングムラ
10・・・塗布装置
11・・・段ムラ
12・・・膜の厚い部分
13・・・電場により持ち上げられた塗液
DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Coating liquid 3 ... Coating head 4 ... Film thickness variation detector 5 ... Electrode 6 ... Voltage source 7 ... Angle adjustment mechanism 8 of an electrode ..Control device 9 for angle adjustment mechanism ... Living unevenness 10 ... Coating device 11 ... Step unevenness 12 ... Thick portion 13 of film ... Coating liquid lifted by electric field

Claims (5)

基材に、塗工ヘッドから塗液を塗出して、塗膜を形成する塗布装置であって、
前記塗膜の、形成直後の膜厚を測定する膜厚変動検出機と、
塗布面と非接触で配置される塗布面と平行な電極と、
電極に接続し、前記膜厚変動に合わせ電圧を印加する電圧源と、を具備したことを特徴とする塗布装置。
A coating device that coats a substrate with a coating liquid from a coating head to form a coating film,
A film thickness variation detector for measuring the film thickness immediately after formation of the coating film,
An electrode parallel to the coating surface arranged in non-contact with the coating surface;
And a voltage source that is connected to an electrode and applies a voltage in accordance with the film thickness variation.
前記電極の形状が、板状あるいは刃状で、塗布面と対向する辺が、鋭角な先端を有していることを特徴とする請求項1に記載の塗布装置。   The coating apparatus according to claim 1, wherein the electrode has a plate shape or a blade shape, and a side facing the coating surface has a sharp tip. 前記電極の形状が、線状であることを特徴とする請求項1に記載の塗布装置。   The coating apparatus according to claim 1, wherein the electrode has a linear shape. 基材あるいは塗工ヘッドの搬送方向に対する、前記電極の角度を調整する角度調節機構を具備したことを特徴とする請求項1〜3のいずれか一項に記載の塗布装置。   The coating apparatus according to any one of claims 1 to 3, further comprising an angle adjusting mechanism that adjusts an angle of the electrode with respect to a conveyance direction of the substrate or the coating head. 請求項1〜4のいずれか一項に記載の塗布装置を用い、電極に電圧を印加し、電極直下の塗膜を盛り上げ、塗布直後に存在する膜厚の分布を解消することを特徴とする塗布方法。   Using the coating apparatus according to any one of claims 1 to 4, a voltage is applied to the electrode, the coating film directly under the electrode is raised, and the distribution of the film thickness existing immediately after coating is eliminated. Application method.
JP2015062256A 2015-03-25 2015-03-25 Coating applicator and coating method Pending JP2016179458A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018207417A1 (en) * 2017-05-11 2018-11-15 東レエンジニアリング株式会社 Color filter and method for manufacturing color filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018207417A1 (en) * 2017-05-11 2018-11-15 東レエンジニアリング株式会社 Color filter and method for manufacturing color filter

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