JP2016176105A - ELECTRONIC COMPONENT Cu-Ni-Co-Si ALLOY - Google Patents

ELECTRONIC COMPONENT Cu-Ni-Co-Si ALLOY Download PDF

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JP2016176105A
JP2016176105A JP2015056782A JP2015056782A JP2016176105A JP 2016176105 A JP2016176105 A JP 2016176105A JP 2015056782 A JP2015056782 A JP 2015056782A JP 2015056782 A JP2015056782 A JP 2015056782A JP 2016176105 A JP2016176105 A JP 2016176105A
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弘泰 堀江
Hiroyasu Horie
弘泰 堀江
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JX Nippon Mining and Metals Corp
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Abstract

PROBLEM TO BE SOLVED: To provide an electronic component Cu-Ni-Co-Si alloy with improved reliability in which, in addition to a high strength and a high conductivity, also a bendability, which is in general difficult to be compatible with the strength, are imparted to a Corson copper alloy.SOLUTION: Provided is an electronic component Cu-Ni-Co-Si alloy containing Ni by 3.0 to 4.5 mass% and Co by 0.1 to 1.0 mass%, and in which the concentration (mass%) ratio of Ni to Co, (Ni/Co), is adjusted so as to be 3.5 to 30, as well as in which Si is contained so that the (Ni+Co)/Si mass ratio becomes 3 to 5, and in which the balance is composed of Cu and inevitable impurities, and the coefficient of variation of the concentration ratio of Ni to Co, (Ni/Co), measured for at least 100 second-phase particles is 20% or less.SELECTED DRAWING: None

Description

本発明は、電子部品、特にコネクタ、バッテリー端子、ジャック、リレー、スイッチ、リードフレーム等に好適な電子部品用Cu−Ni−Co−Si合金に関する。   The present invention relates to a Cu—Ni—Co—Si alloy for electronic components suitable for electronic components, particularly connectors, battery terminals, jacks, relays, switches, lead frames and the like.

従来、一般的に電気・電子機器用材料としては、鉄系材料の他、電気伝導性および熱伝導性に優れるリン青銅、丹銅、黄銅等の銅系材料も広く用いられている。近年、電気・電子機器の小型化、軽量化、高機能化、さらにこれに伴う高密度実装化に対する要求が高まり、これらに適用される銅系材料にも種々の特性が求められている。   Conventionally, as materials for electrical / electronic devices, copper-based materials such as phosphor bronze, red brass, brass, etc., which are excellent in electrical conductivity and thermal conductivity, have been widely used as materials for electric / electronic devices. In recent years, there has been an increasing demand for miniaturization, weight reduction, high functionality, and high-density mounting associated therewith, and various characteristics are required for copper-based materials applied thereto.

部品の小型化に伴って材料の薄肉化が進行しており、材料強度の向上が求められている。リレーなどの用途では疲労特性の要求が高まっており、強度の向上が必要である。また、部品の小型化に伴って、曲げ加工される場合の条件が厳しくなっており、高い強度を持ちながら、なおかつ、曲げ加工性に優れていることが要求されている。   With the miniaturization of parts, the thinning of materials is progressing, and improvement in material strength is required. In applications such as relays, the demand for fatigue characteristics is increasing, and it is necessary to improve the strength. In addition, with the miniaturization of parts, the conditions for bending are becoming strict, and it is required to have excellent bending workability while having high strength.

特許文献1では、特に0.2%耐力が980MPa以上、あるいは1000MPa以上という非常に高い強度を有し、かつ導電率30%IACS以上、より好ましくは34%以上を有し、耐応力緩和特性およびプレス加工性も良好であるCu−Ni−Co−Si系銅合金板材が提案されている。特許文献1によれば、この銅合金板材は、鋳片を高温で加熱保持する熱処理1、熱間圧延、冷間圧延、固溶化熱処理と、時効時にCo−Si系化合物の析出を促すための前処理的な熱処理とを含む熱履歴を付与する熱処理2、および低温域で行う時効処理を経て製造される。   In Patent Document 1, in particular, 0.2% proof stress has a very high strength of 980 MPa or more, or 1000 MPa or more, and has a conductivity of 30% IACS or more, more preferably 34% or more. A Cu—Ni—Co—Si based copper alloy sheet with good press workability has been proposed. According to Patent Document 1, this copper alloy sheet material is used to promote heat treatment 1, hot rolling, cold rolling, solution heat treatment, and precipitation of a Co-Si based compound during aging. It is manufactured through heat treatment 2 that imparts a heat history including pretreatment heat treatment, and aging treatment performed in a low temperature range.

特開2014−156623号公報JP 2014-156623 A 特開2011−231393号公報JP 2011-231393 A 特開2009−007666号公報JP 2009-007666 A

ところで、特許文献1に記載によれば、Cu−Ni−Co−Si合金において、時効温度によってNi−Si系化合物、Co−Si系化合物の二種類の化合物による析出物が形成される旨記載されており、組成が異なると析出物が転位に与える影響が異なることが推定される。すなわち析出物の組成によって導入される転位量が異なると考えられる。転位が不均一になることで曲げ加工時の応力が集中し、曲げ加工性が損なわれている可能性がある。   By the way, according to the description in Patent Document 1, it is described that, in a Cu—Ni—Co—Si alloy, precipitates are formed by two kinds of compounds, Ni—Si based compounds and Co—Si based compounds, depending on the aging temperature. It is presumed that the influence of the precipitates on the dislocation differs depending on the composition. That is, it is considered that the amount of dislocation introduced depends on the composition of the precipitate. Since dislocations are non-uniform, stress during bending is concentrated, and bending workability may be impaired.

そこで、例えば特許文献2では、異方性の少ない{100}方位(Cube方位)とする結晶粒の割合を増大させることによって、曲げ加工性を向上できると同時に、曲げ加工性の異方性を顕著に改善できる旨記載され、具体的には、銅合金の原料を溶解して鋳造する溶解・鋳造工程と、この溶解・鋳造工程の後に行う熱間圧延工程と、この熱間圧延工程の後に圧延率70%以上で冷間圧延を行う第1の冷間圧延工程と、この第1の冷間圧延工程の後に加熱温度500〜650℃で熱処理を行う中間焼鈍工程と、この中間焼鈍工程の後に圧延率70%以上で冷間圧延を行う第2の冷間圧延工程と、この第2の冷間圧延工程の後に溶体化処理を行う溶体化処理工程と、この溶体化処理工程の後に400〜500℃で時効処理を行う時効処理工程を含む方法により実現している。   Therefore, in Patent Document 2, for example, by increasing the proportion of crystal grains having a {100} orientation (Cube orientation) with little anisotropy, the bending workability can be improved and the anisotropy of the bending workability can be improved. It is described that it can be remarkably improved, and specifically, a melting / casting process for melting and casting a copper alloy raw material, a hot rolling process performed after the melting / casting process, and after the hot rolling process A first cold rolling process in which cold rolling is performed at a rolling rate of 70% or more, an intermediate annealing process in which heat treatment is performed at a heating temperature of 500 to 650 ° C. after the first cold rolling process, and the intermediate annealing process. A second cold rolling process in which cold rolling is performed at a rolling rate of 70% or more later, a solution treatment process in which a solution treatment is performed after the second cold rolling process, and 400 after the solution treatment process. Aging treatment process for aging treatment at ~ 500 ° C It is realized by a method comprising.

また、例えば特許文献3では、板表面における{111}面からの回折強度をI{111}、{200}面からの回折強度をI{200}、{220}面からの回折強度をI{220}、{311}面からの回折強度をI{311}、これらの回折強度の中の{200}面からの回折強度の割合をR{200}=I{200}/(I{111}+I{200}+I{220}+I{311})とした場合に、R{200}を一定以上とすることにより、曲げ加工性を改善する技術が記載され、具体的には最終再結晶熱処理の前に、加工組織が完全に再結晶しない程度の中間焼鈍と、それに加えて中間圧延を導入することで実現している。   For example, in Patent Document 3, the diffraction intensity from the {111} plane on the plate surface is I {111}, the diffraction intensity from the {200} plane is I {200}, and the diffraction intensity from the {220} plane is I { 220}, the diffraction intensity from the {311} plane is I {311}, and the ratio of the diffraction intensity from the {200} plane among these diffraction intensities is R {200} = I {200} / (I {111} + I {200} + I {220} + I {311}), a technique for improving the bending workability by setting R {200} to a certain level or more is described. Specifically, the final recrystallization heat treatment Previously, it has been realized by introducing intermediate annealing to the extent that the work structure is not completely recrystallized, and in addition, intermediate rolling.

今後も、コルソン銅合金に高強度かつ高導電に加えて曲げ性も求められること、および一般に強度と曲げ性とは両立が困難であり、信頼性の向上の観点から改善の余地が残されている。   In the future, Corson copper alloy will be required to have high strength and high conductivity in addition to bendability, and generally it will be difficult to achieve both strength and bendability, leaving room for improvement from the viewpoint of improving reliability. Yes.

本発明者が鋭意研究した結果、Cu−Ni−Co−Si合金において、析出物の組成を統一させることができれば、転位が一様になり、曲げ加工時の応力が分散されることになり、曲げ加工性の向上が期待されるという観点から、最適な溶体化処理条件を見出し、本発明を完成した。   As a result of intensive research by the present inventors, in the Cu-Ni-Co-Si alloy, if the composition of precipitates can be unified, dislocations become uniform and stress during bending is dispersed, From the viewpoint that improvement in bending workability is expected, the optimum solution treatment conditions were found and the present invention was completed.

すなわち、本発明は、
(1)3.0〜4.5質量%のNi、および0.1〜1.0質量%のCoを含有し、Coに対するNiの濃度(質量%)比(Ni/Co)が3.5〜30になるように調整し、かつ、Siを(Ni+Co)/Si質量比が3〜5となるように含有し、ならびに残部がCuおよび不可避的不純物からなり、少なくとも100個の第二相粒子について測定したCoに対するNiの濃度比(Ni/Co)の変動係数が20%以下である電子部品用Cu−Ni−Co−Si合金。
(2)更にFe、Mg、Sn、Zn、B、P、Cr、Zr、Ti、AlおよびMnの群から選ばれる少なくとも1種を総計で最大2.5質量%含有する(1)に記載の合金。
(3)粒径が5〜30nmの第二相粒子の個数の平均が、0.5×109個/mm2以上である、(1)または(2)に記載の合金。
(4)圧延方向に平行な方向での0.2%耐力が900MPa以上であり、かつ、導電率が30%IACS以上である、(1)〜(3)のいずれかに記載の合金。
(5)曲げ半径(R)/板厚(t)=1.0としてBadway(曲げ軸が圧延方向と同一方向)でW曲げ試験したときの曲げ部表面の平均粗さRaが1.0μm以下である、(1)〜(4)のいずれかに記載の合金。
(6)−(1)または(2)に記載の組成をもつ銅合金のインゴットを溶解鋳造する工程1と、
−900℃以上1050℃以下で加熱後に熱間圧延を行って、室温まで急冷する工程2と
−冷間圧延後に1MPa以上10MPa以下の張力を付与した状態で900℃以上1050℃以下で30秒〜10分間加熱する溶体化処理を行い、この溶体化処理の前後で600℃〜700℃の間の温度範囲での昇温速度および冷却速度を50℃/秒以上とする工程3と、
−材料温度を400〜550℃として加熱する時効処理工程4と、
を順に行うことを含む銅合金の製造方法。
(7)(1)〜(5)のいずれかに記載の合金を備えた電子部品。
That is, the present invention
(1) It contains 3.0 to 4.5 mass% Ni and 0.1 to 1.0 mass% Co, and the Ni concentration (mass%) ratio (Ni / Co) to Co is 3.5. At least 100 second-phase particles that are adjusted to be ˜30, contain Si so that the mass ratio of (Ni + Co) / Si is 3˜5, and the balance consists of Cu and inevitable impurities A Cu—Ni—Co—Si alloy for electronic parts having a coefficient of variation of the Ni to Co concentration ratio (Ni / Co) of 20% or less.
(2) Further, at least one selected from the group consisting of Fe, Mg, Sn, Zn, B, P, Cr, Zr, Ti, Al, and Mn is contained in a total of up to 2.5% by mass in total (1) alloy.
(3) The alloy according to (1) or (2), wherein the average number of second phase particles having a particle size of 5 to 30 nm is 0.5 × 10 9 particles / mm 2 or more.
(4) The alloy according to any one of (1) to (3), wherein the 0.2% yield strength in a direction parallel to the rolling direction is 900 MPa or more and the conductivity is 30% IACS or more.
(5) Bending radius (R) / plate thickness (t) = 1.0, and the average roughness Ra of the bending portion surface when a W-bending test is performed in Badway (the bending axis is the same direction as the rolling direction) is 1.0 μm or less. The alloy according to any one of (1) to (4).
(6) -Step 1 of melt casting a copper alloy ingot having the composition according to (1) or (2);
Step 2 in which hot rolling is performed after heating at −900 ° C. or more and 1050 ° C. or less, and rapid cooling to room temperature is performed. Performing a solution treatment for heating for 10 minutes, and before and after the solution treatment, a step 3 in which a temperature rising rate and a cooling rate in a temperature range between 600 ° C. and 700 ° C. are 50 ° C./second or more;
An aging treatment step 4 of heating at a material temperature of 400 to 550 ° C .;
The manufacturing method of the copper alloy including performing sequentially.
(7) An electronic component comprising the alloy according to any one of (1) to (5).

本発明によれば、コルソン銅合金に高強度かつ高導電に加えて、一般に強度の両立が困難である曲げ性も付与された信頼性が向上した電子部品用Cu−Ni−Co−Si合金が提供される。   According to the present invention, there is provided a Cu-Ni-Co-Si alloy for electronic parts with improved reliability, in which, in addition to high strength and high conductivity, Corson copper alloy is also provided with bendability, which is generally difficult to achieve both strengths. Provided.

以下、本発明に係る電子部品用Cu−Ni−Co−Si合金の一実施形態について説明する。なお、本発明において%とは、特に断らない限り、質量%を示すものとする。   Hereinafter, an embodiment of a Cu—Ni—Co—Si alloy for electronic parts according to the present invention will be described. In the present invention, “%” means “% by mass” unless otherwise specified.

(1)基材の組成
先ず、合金組成について説明する。本発明の銅合金は、Cu−Ni−Co−Si合金である。なお、本明細書では、Cu−Ni−Co−Siの基本成分にFe、Mg、Sn、Zn、B、P、Cr、Zr、Ti、AlおよびMnなどのその他の合金元素を添加した銅合金も、包括的にCu−Ni−Co−Si合金と称する。
(1) Composition of base material First, the alloy composition will be described. The copper alloy of the present invention is a Cu-Ni-Co-Si alloy. In this specification, a copper alloy obtained by adding other alloy elements such as Fe, Mg, Sn, Zn, B, P, Cr, Zr, Ti, Al, and Mn to the basic component of Cu—Ni—Co—Si. Are also collectively referred to as Cu-Ni-Co-Si alloys.

Niは、後述のCo、Siとともに、Ni−Co−Si系析出物を形成して、銅合金板材の強度と導電性を向上させる効果を有する。Ni含有量が小さすぎる場合には、この効果を十分に発揮させるのが困難である。そのため、Ni含有量は、3.0質量%以上にするのが好ましく、3.2質量%以上にするのが更に好ましく、3.4質量%以上にするのが一層好ましい。一方、Ni含有量が大きすぎると、強度向上効果が飽和するうえ、導電率が低下する。また、粗大な析出物が生成し易く、曲げ加工時の割れの原因になる。そのため、Ni含有量は、4.5質量%以下にするのが好ましく、4.1質量%以下にするのが更に好ましい。   Ni forms an Ni—Co—Si based precipitate together with Co and Si described later, and has an effect of improving the strength and conductivity of the copper alloy sheet. If the Ni content is too small, it is difficult to sufficiently exhibit this effect. Therefore, the Ni content is preferably 3.0% by mass or more, more preferably 3.2% by mass or more, and still more preferably 3.4% by mass or more. On the other hand, if the Ni content is too large, the strength improving effect is saturated and the conductivity is lowered. In addition, coarse precipitates are easily generated and cause cracks during bending. Therefore, the Ni content is preferably 4.5% by mass or less, and more preferably 4.1% by mass or less.

Coは、Ni、Siとともに、Ni−Co−Si系析出物を形成して、銅合金板材の強度と導電性を向上させる効果を有する。Co含有量が小さすぎる場合には、この効果を十分に発揮させるのが困難である。そのため、Co含有量は、0.1質量%以上にするのが好ましく、0.2質量%以上にするのが更に好ましく、0.3質量%以上にするのが一層好ましい。一方、Coの融点はNiよりも高いので、Co含有量が大きすぎると、完全固溶は困難であり、未固溶の部分は強度に寄与しない。そのため、Co含有量は、1.0質量%以下にするのが好ましく、0.8質量%以下にするのが更に好ましい。   Co, together with Ni and Si, forms an Ni—Co—Si based precipitate and has the effect of improving the strength and conductivity of the copper alloy sheet. When the Co content is too small, it is difficult to sufficiently exhibit this effect. Therefore, the Co content is preferably 0.1% by mass or more, more preferably 0.2% by mass or more, and further preferably 0.3% by mass or more. On the other hand, since the melting point of Co is higher than that of Ni, if the Co content is too large, complete solid solution is difficult, and the undissolved portion does not contribute to the strength. Therefore, the Co content is preferably 1.0% by mass or less, and more preferably 0.8% by mass or less.

また、本発明ではNi−Co−Si系析出物を生成させて銅合金板材の強度と導電性をより高いレベルで向上させる効果を発揮させることを特徴としている。したがって、通常のCo−Si系析出物、およびNi−Si系析出物を生成させる場合とは異なり、個々の析出物の組成においてCoに対するNiの濃度比(Ni/Co)の変動係数をある程度小さくすることが求められる。この観点から、Coに対するNiの濃度比(Ni/Co)の変動係数、すなわち「標準偏差/平均値×100」を20%以下、好ましくは16%以下とする。なお、このNi/Coの変動係数は、析出物である第二相粒子100個以上について測定し、見積もることができる値である。
また、このような析出物中のNi/Co濃度比の変動係数を所定以下とするために、第二相粒子の析出前の合金材料中のNi/Co濃度(質量%)比が3.5〜30、好ましくは5〜15となるように調整しておくとよい。
In addition, the present invention is characterized in that Ni—Co—Si based precipitates are generated to exhibit the effect of improving the strength and conductivity of the copper alloy sheet at a higher level. Therefore, unlike the case of generating ordinary Co—Si based precipitates and Ni—Si based precipitates, the coefficient of variation of the Ni to Co concentration ratio (Ni / Co) in the composition of each precipitate is reduced to some extent. It is required to do. From this viewpoint, the coefficient of variation of the Ni concentration ratio (Ni / Co) to Co, that is, “standard deviation / average value × 100” is set to 20% or less, preferably 16% or less. The variation coefficient of Ni / Co is a value that can be measured and estimated for 100 or more second-phase particles that are precipitates.
Further, in order to set the coefficient of variation of the Ni / Co concentration ratio in such precipitates to a predetermined value or less, the Ni / Co concentration (mass%) ratio in the alloy material before precipitation of the second phase particles is 3.5. It is good to adjust so that it may become -30, Preferably it is 5-15.

Siは、Ni、Coとともに、Ni−Co−Si系析出物を生成する。但し、合金中のNi、CoおよびSiは、時効処理によって全てが析出物になるとは限らず、ある程度はCuマトリックス中に固溶した状態で存在する。固溶状態のNi、CoおよびSiは、銅合金板材の強度を若干向上させるが、析出状態と比べてその効果は小さく、また、導電率を低下させる要因になる。そのため、Siの含有量は、一般的には、できるだけ析出物(Ni+Co)2Siの組成比に近づけるのが好ましい。すなわち、(Ni+Co)/Si質量比を、約4.2を中心として3〜5に調整するのが一般的であり、Siは(Ni+Co)/Si質量比がこの範囲となるように添加される。 Si produces Ni—Co—Si based precipitates together with Ni and Co. However, Ni, Co, and Si in the alloy are not necessarily all precipitated by the aging treatment, and exist to some extent in a solid solution state in the Cu matrix. Ni, Co, and Si in the solid solution state slightly improve the strength of the copper alloy sheet, but the effect is smaller than that in the precipitated state, and causes a decrease in conductivity. Therefore, in general, the Si content is preferably as close to the composition ratio of precipitates (Ni + Co) 2 Si as possible. That is, the (Ni + Co) / Si mass ratio is generally adjusted to 3 to 5 around 4.2, and Si is added so that the (Ni + Co) / Si mass ratio falls within this range. .

本発明の銅合金板材には、必要に応じて、Fe、Mg、Sn、Zn、B、P、Cr、Zr、Ti、AlおよびMnなどを添加してもよい。例えば、SnとMgは耐応力緩和特性の向上効果があり、Znは銅合金板材のはんだ付け性および鋳造性を改善する効果があり、Fe、Cr、Mn、Ti、Zr、Alなどは強度を向上させる作用を有する。そのほかに、Pは脱酸効果を有し、Bは鋳造組織の微細化効果を有し、熱間加工性を向上させる効果を有する。ただし、これら添加元素の量が大きすぎると、製造性が大きく損なわれる。そこで、合計で0〜2.5質量%含有することができる。また、強度、導電率、曲げ性のバランスを考慮すると、上記元素の1種以上を総量で0.2〜1.0質量%含有させることが好ましい。なお、添加元素ごとには、耐応力緩和特性、強度、はんだ付け性、鋳造性、熱間加工性の向上などのバランスを考慮して、合計量を超えない範囲で、Znは0.1質量%以上2.0質量%以下含有させることができ、SnおよびCrは0.1質量%以上1.0質量%以下含有させることができ、Fe、MgおよびMnは0.1質量%以上0.5質量%以下含有させることができ、B、P、Zr、TiおよびAlは0.01質量%以上0.3質量%以下含有させることができる。   If necessary, Fe, Mg, Sn, Zn, B, P, Cr, Zr, Ti, Al and Mn may be added to the copper alloy sheet of the present invention. For example, Sn and Mg have the effect of improving the stress relaxation resistance, Zn has the effect of improving the solderability and castability of the copper alloy sheet, and Fe, Cr, Mn, Ti, Zr, Al, etc. have the strength. Has the effect of improving. In addition, P has a deoxidizing effect, B has an effect of refining a cast structure, and has an effect of improving hot workability. However, if the amount of these additive elements is too large, the productivity is greatly impaired. Therefore, 0 to 2.5% by mass can be contained in total. In consideration of the balance of strength, electrical conductivity, and bendability, it is preferable to contain one or more of the above elements in a total amount of 0.2 to 1.0% by mass. In addition, for each additive element, in consideration of the balance of stress relaxation resistance, strength, solderability, castability, hot workability, etc., Zn is 0.1 mass within a range not exceeding the total amount. % And 2.0 mass% or less, Sn and Cr can be contained 0.1 mass% or more and 1.0 mass% or less, and Fe, Mg and Mn are 0.1 mass% or more and 0.1 mass% or less. 5% by mass or less can be contained, and B, P, Zr, Ti and Al can be contained by 0.01% by mass to 0.3% by mass.

(2)強度および導電率
本発明の合金は、高強度であり、かつ、高導電率であり、電子部品、特にコネクタ、バッテリー端子、ジャック、リレー、スイッチ、リードフレーム等に好適である。
ここで、強度を、引張方向が圧延方向と平行になるように、プレス機を用いてJIS 13B号試験片を作製し、JIS−Z2241に従ってこの試験片の引張試験を行なうことで測定した圧延平行方向の0.2%耐力(YS)として評価する。上述した用途の観点から、0.2%耐力は、900MPa以上であることが好ましく、特に950MPa以上である。
また、導電率を、JIS H 0505に準拠し、4端子法にて測定した導電率(EC:%IACS)として評価する。上述した用途の観点から、この導電率は、30%IACS以上であることが好ましく、特に35%IACS以上である。
(2) Strength and conductivity The alloy of the present invention has high strength and high conductivity, and is suitable for electronic components, particularly connectors, battery terminals, jacks, relays, switches, lead frames and the like.
Here, the rolling parallelism was measured by preparing a JIS 13B test piece using a press so that the tensile direction was parallel to the rolling direction, and performing a tensile test of the test piece in accordance with JIS-Z2241. Evaluated as 0.2% proof stress (YS) in the direction. From the viewpoint of the use described above, the 0.2% proof stress is preferably 900 MPa or more, and particularly 950 MPa or more.
Moreover, electrical conductivity is evaluated as electrical conductivity (EC:% IACS) measured by the 4-terminal method in accordance with JIS H 0505. From the viewpoint of the above-mentioned application, this conductivity is preferably 30% IACS or more, particularly 35% IACS or more.

(3)曲げ性表面粗さ
本発明においては、曲げ性を、W曲げ試験したときの曲げ部表面の平均粗さRaとして評価する。
すなわち、曲げ半径(R)/板厚(t)=1.0としてBadway(曲げ軸が圧延方向と同一方向)でW曲げ試験したときの曲げ部表面の平均粗さRaが、小さいほど曲げ加工時の応力が分散され、曲げ加工性の向上が期待される。この観点から、この曲げ部表面の平均粗さRaは1.0μm以下であることが好ましい。
(4)析出物の個数濃度
本発明においては、析出物を制御することにより強度、導電率および曲げ性の改善を課題としている。そこで、その析出物の個数を評価することが好ましい。すなわち、析出物の個数濃度を、粒径が5〜30nmの第二相粒子の個数をカウントし、観察面積で除し、個数濃度(×109個/mm2)を算出し、同様に20視野(各視野1μm×1μm)について算出して、その平均値として評価する。
具体的には、圧延方向に平行な断面を集束イオンビーム(FIB)にて切断することで断面を露出させた後、走査型透過電子顕微鏡(日本電子株式会社 型式:JEM−2100F)を用いて測定される析出物の個数濃度を求める。この析出物の個数濃度は、十分な強度(0.2%耐力)の確保の観点から、0.5×109個/mm2以上であることが好ましく、さらに1.5×109個/mm2以上であることが好ましい。
ここで、第二相粒子とは、溶解鋳造の凝固過程に生ずる晶出物及びその後の冷却過程で生ずる析出物、熱間圧延後の冷却過程で生ずる析出物、溶体化処理後の冷却過程で生ずる析出物、及び時効処理過程で生ずる析出物のことを言い、通常はCo−Si系、またはNi−Si系の組成をもつが、本発明の場合Ni−Co−Si系の組成をもつことが典型的である。第二相粒子の大きさは、電子顕微鏡による観察で圧延方向に平行な断面を組織観察したとき、析出物に包囲されることのできる最大円の直径として定義される。
(3) Bendability surface roughness In this invention, bendability is evaluated as average roughness Ra of the surface of a bending part when W bending test is carried out.
That is, the smaller the average roughness Ra of the surface of the bent part when the B-bending test is performed with a badway (bending axis is the same direction as the rolling direction) with a bending radius (R) / plate thickness (t) = 1.0, the bending processing is performed. The stress at the time is dispersed and the bending workability is expected to be improved. From this viewpoint, the average roughness Ra of the surface of the bent portion is preferably 1.0 μm or less.
(4) Number Concentration of Precipitates In the present invention, improvement of strength, electrical conductivity, and bendability is an issue by controlling the precipitates. Therefore, it is preferable to evaluate the number of the precipitates. That is, the number concentration of the precipitates was counted by counting the number of second phase particles having a particle size of 5 to 30 nm and divided by the observation area to calculate the number concentration (× 10 9 particles / mm 2 ). It calculates about a visual field (each visual field 1 micrometer x 1 micrometer), and evaluates it as the average value.
Specifically, after exposing a cross section by cutting a cross section parallel to the rolling direction with a focused ion beam (FIB), a scanning transmission electron microscope (JEOL Ltd. model: JEM-2100F) is used. The number concentration of precipitates to be measured is determined. The number concentration of the precipitates is preferably 0.5 × 10 9 pieces / mm 2 or more from the viewpoint of ensuring sufficient strength (0.2% yield strength), and more preferably 1.5 × 10 9 pieces / mm 2. it is preferably mm 2 or more.
Here, the second phase particles are crystallized substances generated in the solidification process of melt casting, precipitates generated in the subsequent cooling process, precipitates generated in the cooling process after hot rolling, and cooling processes after the solution treatment. This refers to precipitates generated and precipitates generated during the aging treatment process. Usually, it has a Co-Si or Ni-Si composition, but in the present invention, it has a Ni-Co-Si composition. Is typical. The size of the second phase particles is defined as the diameter of the maximum circle that can be surrounded by precipitates when the cross section parallel to the rolling direction is observed with an electron microscope.

(5)用途
本発明に係るCu−Ni−Co−Si合金は、種々の伸銅品、例えば板、条、管、棒及び線に加工することができる。本発明の銅合金は、限定的ではないが、コネクタ、バッテリー端子、ジャック、リレー、スイッチ、リードフレーム等の電子部品材料として好適である。
(5) Applications The Cu-Ni-Co-Si alloy according to the present invention can be processed into various copper products, such as plates, strips, tubes, bars and wires. Although not limited, the copper alloy of the present invention is suitable as a material for electronic components such as connectors, battery terminals, jacks, relays, switches, lead frames and the like.

(6)製造方法
本発明の実施形態に係る電子部品用Cu−Ni−Co−Si合金は、インゴットの溶解鋳造(工程1)−均質焼鈍、熱間圧延、急冷(工程2)−冷間圧延、溶体化処理(工程3)−時効処理(工程4)を経て製造される。
(6) Manufacturing method Cu-Ni-Co-Si alloy for electronic parts according to an embodiment of the present invention is an ingot melt casting (step 1)-homogeneous annealing, hot rolling, rapid cooling (step 2)-cold rolling. It is manufactured through solution treatment (step 3) -aging treatment (step 4).

<インゴット製造>
大気溶解炉を用い、電気銅、Ni、Co、Si等の原料を溶解し、所望の組成の溶湯を得る。そして、この溶湯をインゴットに鋳造する。Ni、Co、Si以外の添加元素はFe、Mg、Sn、Zn、B、P、Cr、Zr、Ti、Al及びMnからなる群から1種または2種以上を合計で0〜2.5質量%含有するように添加する。
<Ingot manufacturing>
Using an atmospheric melting furnace, raw materials such as electrolytic copper, Ni, Co, and Si are melted to obtain a molten metal having a desired composition. Then, this molten metal is cast into an ingot. The additive elements other than Ni, Co, and Si are one or two or more from the group consisting of Fe, Mg, Sn, Zn, B, P, Cr, Zr, Ti, Al, and Mn in total 0 to 2.5 mass. % So that it is contained.

<均質化焼鈍及び熱間圧延>
インゴット製造時に生じる凝固偏析や晶出物は粗大なので均質化焼鈍でできるだけ母相に固溶させて小さくし、可能な限り無くすことが望ましい。これらは曲げ加工性に悪影響を与え、母相に固溶させることにより曲げ割れの防止に効果があるからである。
具体的には、インゴット製造工程後には、900〜1050℃に加熱して3〜24時間均質化焼鈍を行った後に、熱間圧延を実施する。元厚から全体の圧下率が90%までのパスは700℃以上とするのが好ましい。その後、水冷にて室温まで急速に冷却させる。
<Homogenization annealing and hot rolling>
Since solidified segregation and crystallized matter generated during the production of the ingot are coarse, it is desirable to make it as small as possible by dissolving it in the parent phase as much as possible by homogenization annealing. This is because they have an adverse effect on bending workability and are effective in preventing bending cracking by being dissolved in the matrix.
Specifically, after an ingot manufacturing process, after heating to 900-1050 degreeC and performing homogenization annealing for 3 to 24 hours, hot rolling is implemented. The pass from the original thickness to the overall rolling reduction of 90% is preferably 700 ° C. or higher. Thereafter, it is rapidly cooled to room temperature with water cooling.

<冷間圧延および溶体化処理>
その後、加工度(圧下率)50%以上、好ましくは70%以上の条件にて冷間圧延を行った後に、溶体化処理を行う。具体的には、900〜1050℃に加熱して30秒〜10分加熱する。溶体化処理ではNi、Co、Siをはじめとする添加元素を固溶させることを目的としている。そのため、加熱温度や加熱時間に加えて、昇温速度及び冷却速度も制御することが肝要である。溶体化処理前の昇温時において、Coを含有する第二相粒子の析出に影響する600〜700℃の昇温速度は50℃/秒以上に制御する。一方、溶体化処理の後の同温度範囲における冷却速度も50℃/秒以上に制御する。その他の温度領域についても昇温速度及び冷却速度は極力速くすることが好ましい。また、このとき材料に付与する張力を1MPa以上10MPa以下に調整することで、第二相粒子の析出をより都合よく制御することが可能になり、析出物中のNi/Co濃度比の変動係数を20%以下とし、粒径5〜30nmの析出物の個数濃度を十分に確保でき、十分な強度を付与することを可能にする。
<Cold rolling and solution treatment>
Thereafter, the solution is subjected to solution treatment after cold rolling under conditions of a working degree (rolling rate) of 50% or more, preferably 70% or more. Specifically, it is heated to 900 to 1050 ° C. and heated for 30 seconds to 10 minutes. The solution treatment is intended to solidify additive elements such as Ni, Co, and Si. Therefore, it is important to control the heating rate and the cooling rate in addition to the heating temperature and the heating time. At the time of temperature increase before the solution treatment, the temperature increase rate of 600 to 700 ° C. that affects the precipitation of the second phase particles containing Co is controlled to 50 ° C./second or more. On the other hand, the cooling rate in the same temperature range after the solution treatment is also controlled to 50 ° C./second or more. Also in other temperature regions, it is preferable to increase the heating rate and the cooling rate as much as possible. In addition, by adjusting the tension applied to the material to 1 MPa or more and 10 MPa or less, it becomes possible to more conveniently control the precipitation of the second phase particles, and the coefficient of variation of the Ni / Co concentration ratio in the precipitate. 20% or less, the number concentration of precipitates having a particle size of 5 to 30 nm can be sufficiently secured, and sufficient strength can be imparted.

このように、溶体化処理中の600〜700℃における昇温及び冷却速度を速くすることでCo−Si系化合物の析出が抑制され、結果としてNi−Co−Si系化合物の析出物が生成されたものと考えられる。また溶体化処理中の材料の張力を従来の20MPa程度よりも低くすることで高強度化した。このメカニズムは不明であるが、前工程にて冷間圧延を行った場合に導入された歪がこの昇温速度の制御により一様に解放されることで、その後の時効処理によって高強度化したのではないかと考えられる。   Thus, by increasing the temperature rise and cooling rate at 600 to 700 ° C. during the solution treatment, the precipitation of the Co—Si based compound is suppressed, and as a result, the precipitate of the Ni—Co—Si based compound is generated. It is thought that. Moreover, the strength was increased by lowering the tension of the material during the solution treatment to about 20 MPa. Although this mechanism is unknown, the strain introduced when cold rolling is performed in the previous process is released uniformly by controlling the temperature increase rate, and the strength is increased by the subsequent aging treatment. It is thought that.

<時効処理>
溶体化処理に引き続いて時効処理を行う。材料温度400〜550℃で5〜25時間加熱することが好ましく、材料温度420〜500℃で10〜20時間加熱することがより好ましい。時効処理は、酸化被膜の発生を抑制するためにAr、N2、H2等の不活性雰囲気で行うことが好ましい。
<Aging treatment>
An aging treatment is performed following the solution treatment. Heating at a material temperature of 400 to 550 ° C. for 5 to 25 hours is preferable, and heating at a material temperature of 420 to 500 ° C. for 10 to 20 hours is more preferable. The aging treatment is preferably performed in an inert atmosphere of Ar, N 2 , H 2 or the like in order to suppress the generation of an oxide film.

<最終の冷間圧延>
時効処理に引き続いて最終の冷間圧延を行う。最終の冷間加工によって強度を高めることができるが、本発明において意図されるような高強度および曲げ加工性の良好なバランスを得るためには圧下率を15〜45%、好ましくは20〜40%とすることが望ましい。
<Final cold rolling>
Following the aging treatment, the final cold rolling is performed. Although the strength can be increased by the final cold working, in order to obtain a good balance between high strength and bending workability as intended in the present invention, the rolling reduction is 15 to 45%, preferably 20 to 40%. % Is desirable.

<歪取焼鈍>
最終の冷間圧延に引き続いて、歪取焼鈍を行う。材料温度350〜650℃で1〜3600秒間加熱することが好ましく、材料温度350〜450℃で1500〜3600秒、材料温度450〜550℃で500〜1500秒、材料温度550〜650℃で1〜500秒間加熱することがより好ましい。
<Strain relief annealing>
Following the final cold rolling, strain relief annealing is performed. It is preferable to heat at a material temperature of 350 to 650 ° C. for 1 to 3600 seconds, a material temperature of 350 to 450 ° C. for 1500 to 3600 seconds, a material temperature of 450 to 550 ° C. for 500 to 1500 seconds, and a material temperature of 550 to 650 ° C. for 1 to 1. It is more preferable to heat for 500 seconds.

なお、当業者であれば、上記各工程の合間に適宜、表面の酸化スケール除去のための研削、研磨、ショットブラスト酸洗等の工程を行なうことができることは理解できるだろう。   A person skilled in the art will understand that steps such as grinding, polishing, and shot blast pickling for removing oxide scale on the surface can be appropriately performed between the above steps.

以下に本発明の実施例(発明例)を比較例と共に示すが、これらは本発明及びその利点をよりよく理解するために提供するものであり、発明が限定されることを意図するものではない。   EXAMPLES Examples (invention examples) of the present invention are shown below together with comparative examples, which are provided for better understanding of the present invention and its advantages, and are not intended to limit the invention. .

表1に記載の各添加元素を含有し、残部が銅及び不純物からなる銅合金を、高周波溶解炉にて1300℃で溶製し、厚さ30mmのインゴットに鋳造した。次いで、このインゴットを1000℃で3時間加熱後、板厚10mmまで熱間圧延し、熱間圧延終了後は速やかに冷却した。次いで、表面のスケール除去のため厚さ9mmまで面削を施した後、冷間圧延により厚さ0.120〜0.175mmの板とした。次に950℃で溶体化処理を120秒行った。このときの600〜700℃の温度範囲における昇温速度及び冷却速度、張力は表1の通りである。その後、表1の条件で時効処理、冷間圧延を加え、板厚0.1mmとした。最後に、材料温度400℃で2000秒間の歪取り焼鈍を加えた。   A copper alloy containing each additive element shown in Table 1 and the balance consisting of copper and impurities was melted at 1300 ° C. in a high frequency melting furnace and cast into a 30 mm thick ingot. Next, this ingot was heated at 1000 ° C. for 3 hours, and then hot-rolled to a plate thickness of 10 mm, and cooled rapidly after the hot rolling was completed. Next, after surface chamfering to a thickness of 9 mm for removing scale on the surface, a plate having a thickness of 0.120 to 0.175 mm was formed by cold rolling. Next, solution treatment was performed at 950 ° C. for 120 seconds. Table 1 shows the heating rate, cooling rate, and tension in the temperature range of 600 to 700 ° C. Thereafter, aging treatment and cold rolling were added under the conditions shown in Table 1 to obtain a plate thickness of 0.1 mm. Finally, strain relief annealing was applied at a material temperature of 400 ° C. for 2000 seconds.

Figure 2016176105
Figure 2016176105

作製した製品試料について、次の評価を行った。評価の結果を表2に示す。
(1)0.2%耐力
引張方向が圧延方向と平行になるように、プレス機を用いてJIS 13B号試験片を作製した。JIS−Z2241に従ってこの試験片の引張試験を行ない、圧延平行方向の0.2%耐力(YS)を測定した。
The following evaluation was performed about the produced product sample. The evaluation results are shown in Table 2.
(1) 0.2% yield strength A JIS No. 13B test piece was prepared using a press so that the tensile direction was parallel to the rolling direction. The specimen was subjected to a tensile test according to JIS-Z2241, and the 0.2% proof stress (YS) in the rolling parallel direction was measured.

(2)導電率
JIS H 0505に準拠し、4端子法で導電率(EC:%IACS)を測定した。
(2) Conductivity Based on JIS H 0505, the conductivity (EC:% IACS) was measured by the 4-terminal method.

(3)曲げ部の表面粗さ
JIS−H3130(2012)に従いW曲げ試験をBadway(曲げ軸が圧延方向と同一方向)、r/t=1.0(t=0.1mm)で実施し、この試験片の曲げ部の外周表面を観察した。観察方法はレーザーテック社製コンフォーカル顕微鏡HD100を用いて曲げ部の外周表面を撮影し、付属のソフトウェアを用いて平均粗さRa(JIS−B0601:2013に準拠)を測定し、比較した。なお、曲げ加工前の試料表面はコンフォーカル顕微鏡を用いて観察したところ凹凸は確認できず、平均粗さRaはいずれも0.2μm以下であった。
曲げ加工後の表面平均粗さRaが1.0μm以下の場合を○、Raが1.0μmを超える場合を×と評価した。
(3) Surface roughness of the bent portion In accordance with JIS-H3130 (2012), a W bending test was performed with Badway (bending axis is the same direction as the rolling direction), r / t = 1.0 (t = 0.1 mm), The outer peripheral surface of the bent part of this test piece was observed. As an observation method, the outer peripheral surface of the bent part was photographed using a laser tech confocal microscope HD100, and the average roughness Ra (conforming to JIS-B0601: 2013) was measured using the attached software and compared. In addition, when the sample surface before a bending process was observed using the confocal microscope, the unevenness | corrugation was not able to be confirmed but all average roughness Ra was 0.2 micrometer or less.
The case where the surface average roughness Ra after bending was 1.0 μm or less was evaluated as “◯”, and the case where Ra exceeded 1.0 μm was evaluated as “×”.

(4)粒径5〜30nmの析出物の個数濃度
圧延方向に平行な断面を集束イオンビーム(FIB)にて切断することで断面を露出させた後、走査型透過電子顕微鏡(日本電子株式会社、型式:JEM−2100F)を用いて析出物の個数濃度を測定した。
具体的には、加速電圧200kV、観察倍率100万倍とし、粒径が5〜30nmの第二相粒子の個数をカウントし、観察面積で除し、個数濃度(×109個/mm2)を算出した。同様に20視野について測定を行い、その平均値を個数濃度とした。
(4) Number concentration of precipitates with a particle size of 5 to 30 nm After exposing the cross section by cutting a cross section parallel to the rolling direction with a focused ion beam (FIB), a scanning transmission electron microscope (JEOL Ltd.) , Model: JEM-2100F), and the number concentration of the precipitates was measured.
Specifically, the acceleration voltage is 200 kV, the observation magnification is 1,000,000 times, the number of second phase particles having a particle size of 5 to 30 nm is counted, divided by the observation area, and the number concentration (× 10 9 particles / mm 2 ). Was calculated. Similarly, measurements were made for 20 fields of view, and the average value was taken as the number density.

(5)析出物中のNi/Co濃度比の変動係数
STEMの検出器としてエネルギー分散型X線分析計(EDX、日本電子社製、型式:JED−2300)を用いて析出物のNi/Co比を測定した。加速電圧及び観察倍率は上記条件と同様とし、電子線のスポット径は0.2nmとした。100個以上の第二相粒子についてNi/Co比をそれぞれ測定した。その後、平均値および標準偏差を算出し、変動係数(標準偏差/平均値×100)を求めた。
(5) Coefficient of variation of Ni / Co concentration ratio in precipitates Using an energy dispersive X-ray analyzer (EDX, manufactured by JEOL Ltd., model: JED-2300) as a STEM detector, Ni / Co in the precipitates The ratio was measured. The acceleration voltage and observation magnification were the same as those described above, and the electron beam spot diameter was 0.2 nm. The Ni / Co ratio was measured for 100 or more second phase particles. Thereafter, an average value and a standard deviation were calculated to obtain a coefficient of variation (standard deviation / average value × 100).

Figure 2016176105
Figure 2016176105

発明例1〜24は、いずれも0.2%耐力が900MPa以上であり、導電率が30%IACS以上であり、曲げ部の表面粗さが1.0μm以下と良好であり、析出物中のNi/Co濃度比の変動係数も20%以下とバランスがよかった。これらの銅合金材料は、高強度、高導電率、高い曲げ加工性のバランスに優れたものであるといえる。   In Invention Examples 1 to 24, 0.2% proof stress is 900 MPa or more, conductivity is 30% IACS or more, and the surface roughness of the bent portion is 1.0 μm or less, which is favorable in the precipitate. The coefficient of variation of the Ni / Co concentration ratio was also well balanced with 20% or less. It can be said that these copper alloy materials have an excellent balance of high strength, high conductivity, and high bending workability.

比較例1〜18は、それぞれ第二相粒子の析出を十分に制御できなかったと考えられる具体例である。
比較例1は、溶体化処理時の昇温速度が50℃/sよりも小さく、また、比較例2は、溶体化処理時の冷却速度が50℃/sより小さい具体例である。比較例1、2はいずれも、析出物中のNi/Co濃度比の変動係数が20%以上となり、十分な曲げ加工性を発揮させることが難しいことが分かった。
Comparative Examples 1 to 18 are specific examples where it is considered that the precipitation of the second phase particles could not be sufficiently controlled.
Comparative Example 1 is a specific example in which the rate of temperature increase during solution treatment is less than 50 ° C./s, and Comparative Example 2 is a specific example in which the cooling rate during solution treatment is less than 50 ° C./s. In Comparative Examples 1 and 2, the coefficient of variation of the Ni / Co concentration ratio in the precipitate was 20% or more, and it was found difficult to exhibit sufficient bending workability.

比較例3、4は、溶体化処理時に合金材料に付与する張力が小さすぎる具体例(比較例3)および大きすぎる具体例(比較例4)である。その結果、強度に寄与すると考えられる粒径5〜30nmの析出物の個数濃度において十分な量を確保できず、また析出物中のNi/Co濃度比の変動係数も20%以上となり、十分な強度を発揮させることが難しいことが分かった。   Comparative Examples 3 and 4 are a specific example (Comparative Example 3) and a specific example (Comparative Example 4) in which the tension applied to the alloy material during the solution treatment is too small. As a result, a sufficient amount cannot be secured in the number concentration of precipitates having a particle diameter of 5 to 30 nm which is considered to contribute to the strength, and the variation coefficient of the Ni / Co concentration ratio in the precipitates is 20% or more, which is sufficient. It was found that it was difficult to exert strength.

比較例5、6は、溶体化処理後の時効処理における加熱条件が、400〜550℃から外れる具体例である。その結果、強度に寄与すると考えられる粒径5〜30nmの析出物の個数濃度において十分な量を確保できず、十分な強度を発揮させることが難しく、さらに時効処理の温度が低すぎると十分な導電率を発揮させることも難しいことが分かった。   Comparative Examples 5 and 6 are specific examples in which the heating conditions in the aging treatment after the solution treatment are out of 400 to 550 ° C. As a result, it is difficult to ensure a sufficient amount in the number concentration of precipitates having a particle diameter of 5 to 30 nm, which is considered to contribute to the strength, it is difficult to exert sufficient strength, and it is sufficient that the temperature of the aging treatment is too low. It turned out that it was also difficult to exhibit electrical conductivity.

比較例7は、銅合金の成分中のNi含有量が3.0質量%よりも小さい具体例である。Ni含有量が小さいと、十分な強度を発揮させることが難しいことが分かった。
比較例8は、銅合金の成分中のNi含有量が4.5質量%を超える具体例である。Ni含有量が大きいと、熱間圧延時に割れが生じてしまい、製品が得られなかった。
Comparative Example 7 is a specific example in which the Ni content in the components of the copper alloy is smaller than 3.0% by mass. It has been found that it is difficult to exert sufficient strength when the Ni content is small.
Comparative Example 8 is a specific example in which the Ni content in the copper alloy components exceeds 4.5% by mass. When the Ni content was large, cracks occurred during hot rolling, and no product was obtained.

比較例9は、銅合金にCoが含有されない具体例であり、比較例10は、銅合金の成分中のCo含有量が1.0質量%を超える具体例である。Co含有量が適正な範囲にないと、十分な曲げ加工性を発揮させることが難しいことが分かった。   Comparative Example 9 is a specific example in which Co is not contained in the copper alloy, and Comparative Example 10 is a specific example in which the Co content in the components of the copper alloy exceeds 1.0 mass%. It has been found that it is difficult to exhibit sufficient bending workability if the Co content is not within an appropriate range.

比較例11、12は、銅合金中の(Ni+Co)/Si質量比が大きすぎる具体例(比較例11)、および小さすぎる具体例(比較例12)である。(Ni+Co)/Si質量比が適正な範囲にないと、粒径5〜30nmの析出物の個数濃度が十分なものとならず、強度および導電率の両方の面から劣るという結果となった。   Comparative Examples 11 and 12 are a specific example (Comparative Example 11) in which the (Ni + Co) / Si mass ratio in the copper alloy is too large and a specific example (Comparative Example 12) that is too small. If the (Ni + Co) / Si mass ratio was not in the proper range, the number concentration of precipitates having a particle size of 5 to 30 nm would not be sufficient, resulting in inferior strength and conductivity.

比較例13、14は、銅合金中の第二相粒子の析出前のNi/Co濃度比が小さすぎる具体例(比較例13)、および大きすぎる具体例(比較例14)である。比較例13、14はいずれも、析出物中のNi/Co濃度比の変動係数が20%以上となり、十分な曲げ加工性を発揮させることが難しいことが分かった。   Comparative Examples 13 and 14 are a specific example (Comparative Example 13) in which the Ni / Co concentration ratio before precipitation of the second phase particles in the copper alloy is too small and a specific example (Comparative Example 14) that is too large. In both Comparative Examples 13 and 14, the coefficient of variation of the Ni / Co concentration ratio in the precipitate was 20% or more, and it was found that it was difficult to exhibit sufficient bending workability.

比較例15は、Ni、Co、Si以外の第三の添加元素の総量が2.5を超える具体例である。第三の添加元素が多すぎると、析出物中のNi/Co濃度比の変動係数が20%以上となり、曲げ加工性および導電率において劣るという結果となった。   Comparative Example 15 is a specific example in which the total amount of the third additive element other than Ni, Co, and Si exceeds 2.5. When the third additive element was too much, the variation coefficient of the Ni / Co concentration ratio in the precipitate was 20% or more, which resulted in inferior bending workability and conductivity.

比較例16〜18は、溶体化処理時に合金材料に付与する張力が大きい具体例である。
比較例18は、特許文献3の態様を代表する具体例である。析出物中のNi/Co濃度比の変動係数が20%以上となり、かつ、粒径5〜30nmの析出物の個数濃度も小さく、十分な強度を発揮させることが難しいことが分かった。
比較例17は、さらに溶体化処理時の冷却速度を50℃/sより小さくし、特許文献2の態様を代表する具体例である。析出物中のNi/Co濃度比の変動係数が20%以上となり、十分な曲げ加工性を発揮させることが難しいことが分かった。
比較例16は、さらに溶体化処理時の冷却速度を50℃/sより小さくし、かつ、溶体化処理後の時効処理を所定の範囲よりも低い温度条件で行った、特許文献1の態様を代表する具体例である。この場合においても、析出物中のNi/Co濃度比の変動係数が20%以上となり、十分な曲げ加工性を発揮させることが難しいことが分かった。
Comparative Examples 16 to 18 are specific examples in which the tension applied to the alloy material during the solution treatment is large.
Comparative Example 18 is a specific example representing the aspect of Patent Document 3. It was found that the coefficient of variation of the Ni / Co concentration ratio in the precipitate was 20% or more, and the number concentration of the precipitate having a particle size of 5 to 30 nm was small, making it difficult to exhibit sufficient strength.
Comparative Example 17 is a specific example that represents the aspect of Patent Document 2 by further reducing the cooling rate during the solution treatment to less than 50 ° C./s. The variation coefficient of the Ni / Co concentration ratio in the precipitate was 20% or more, and it was found that it was difficult to exhibit sufficient bending workability.
The comparative example 16 further reduced the cooling rate during the solution treatment to less than 50 ° C./s, and performed the aging treatment after the solution treatment under a temperature condition lower than a predetermined range. This is a representative example. Even in this case, the variation coefficient of the Ni / Co concentration ratio in the precipitate was 20% or more, and it was found difficult to exhibit sufficient bending workability.

Claims (7)

3.0〜4.5質量%のNi、および0.1〜1.0質量%のCoを含有し、Coに対するNiの濃度(質量%)比(Ni/Co)が3.5〜30になるように調整し、かつ、Siを(Ni+Co)/Si質量比が3〜5となるように含有し、ならびに残部がCuおよび不可避的不純物からなり、少なくとも100個の第二相粒子について測定したCoに対するNiの濃度比(Ni/Co)の変動係数が20%以下である電子部品用Cu−Ni−Co−Si合金。   Containing 3.0 to 4.5% by mass of Ni and 0.1 to 1.0% by mass of Co, the concentration ratio (Ni / Co) of Ni to Co is 3.5 to 30 In addition, Si was contained so that the mass ratio of (Ni + Co) / Si was 3 to 5, and the balance was made of Cu and inevitable impurities, and at least 100 second phase particles were measured. A Cu—Ni—Co—Si alloy for electronic parts, wherein the coefficient of variation of the concentration ratio of Ni to Co (Ni / Co) is 20% or less. 更にFe、Mg、Sn、Zn、B、P、Cr、Zr、Ti、AlおよびMnの群から選ばれる少なくとも1種を総計で最大2.5質量%含有する請求項1に記載の合金。   The alloy according to claim 1, further comprising a total of at most 2.5 mass% of at least one selected from the group consisting of Fe, Mg, Sn, Zn, B, P, Cr, Zr, Ti, Al and Mn. 粒径が5〜30nmの第二相粒子の個数の平均が、0.5×109個/mm2以上である、請求項1または2に記載の合金。 The alloy according to claim 1 or 2, wherein the average number of second phase particles having a particle size of 5 to 30 nm is 0.5 x 10 9 particles / mm 2 or more. 圧延方向に平行な方向での0.2%耐力が900MPa以上であり、かつ、導電率が30%IACS以上である、請求項1〜3のいずれか一項に記載の合金。   The alloy as described in any one of Claims 1-3 whose 0.2% yield strength in the direction parallel to a rolling direction is 900 Mpa or more, and whose electrical conductivity is 30% IACS or more. 曲げ半径(R)/板厚(t)=1.0としてBadway(曲げ軸が圧延方向と同一方向)でW曲げ試験したときの曲げ部表面の平均粗さRaが1.0μm以下である、請求項1〜4のいずれか一項に記載の合金。   Bending radius (R) / plate thickness (t) = 1.0, the average roughness Ra of the bending portion surface when a W-bending test is performed in Badway (the bending axis is the same direction as the rolling direction) is 1.0 μm or less. The alloy according to any one of claims 1 to 4. −請求項1または2に記載の組成をもつ銅合金のインゴットを溶解鋳造する工程1と、
−900℃以上1050℃以下で加熱後に熱間圧延を行って、室温まで急冷する工程2と
−冷間圧延後に1MPa以上10MPa以下の張力を付与した状態で900℃以上1050℃以下で30秒〜10分間加熱する溶体化処理を行い、この溶体化処理の前後で600℃〜700℃の間の温度範囲での昇温速度および冷却速度を50℃/秒以上とする工程3と、
−材料温度を400〜550℃として加熱する時効処理工程4と、
を順に行うことを含む銅合金の製造方法。
-Melting and casting a copper alloy ingot having the composition according to claim 1 or 2;
Step 2 in which hot rolling is performed after heating at −900 ° C. or more and 1050 ° C. or less, and rapid cooling to room temperature is performed. Performing a solution treatment for heating for 10 minutes, and before and after the solution treatment, a step 3 in which a temperature rising rate and a cooling rate in a temperature range between 600 ° C. and 700 ° C. are 50 ° C./second or more;
An aging treatment step 4 of heating at a material temperature of 400 to 550 ° C .;
The manufacturing method of the copper alloy including performing sequentially.
請求項1〜5のいずれか一項に記載の合金を備えた電子部品。   The electronic component provided with the alloy as described in any one of Claims 1-5.
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