JP2016175033A - Film cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning device which reduces deterioration of cleaning capacity caused by accumulation of dirt on a cleaning material.SOLUTION: A cleaning device cleans a film surface by abutting a film abutting surface of a cleaning material on the film surface, applying a cleaning liquid on the film surface from the film abutting surface, and relatively sliding the film abutting surface with respect to the film surface. The cleaning device is provided with cleaning material holding means having a cleaning material arrangement surface for arranging the cleaning material, and cleaning liquid flow forming means which forms a cleaning liquid flow which is supplied from a part except for the film abutting surface of the cleaning material into the cleaning material held on the cleaning material arrangement surface, and is discharged from the film abutting surface of the cleaning material.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a film cleaning apparatus.

  As processing of the film surface, for example, when printing on the film surface, a method of printing using UV curable ink, so-called UV printing, is widely used. At this time, if printing is performed while oil such as an anti-oxidant bleed out from dirt, dust, or film adheres to the surface of the film, printing blur and unevenness may occur, which may affect the quality. Therefore, it is necessary to clean the film surface before printing, and a method of passing the film through a cleaning tank (see Patent Document 1) is used.

JP 2002-316116 A

According to the study by the present inventors, it has been found that according to the cleaning method as in Patent Document 1, dirt accumulates in the cleaning liquid tank and the cleaning ability may be reduced. Further, in the cleaning method as in Patent Document 1, if it is intended to prevent accumulation of dirt in the cleaning liquid tank, cleaning of the cleaning liquid tank itself and frequent replacement of the cleaning liquid are required, which increases the number of cleaning processing steps. The specification is not suitable for mass production. On the other hand, by increasing the size of the cleaning liquid tank and increasing the amount of cleaning processing until the cleaning capacity of the cleaning liquid is reduced, the number of times the cleaning liquid tank is cleaned and the replacement of the cleaning liquid can be reduced, but a large cleaning device must be installed. It becomes.
An object of the present invention is to provide a film cleaning apparatus capable of suppressing a decrease in cleaning ability due to accumulation of dirt in a cleaning liquid with a simple configuration using a cleaning material.

  The film cleaning apparatus according to the present invention is configured such that the film contact surface of the cleaning material contacts the film surface, and the film contact surface is applied to the film surface while the cleaning liquid is applied to the film surface from the film contact surface. A cleaning apparatus for cleaning the film surface by sliding relative to the cleaning material, the cleaning material holding means having a cleaning material arrangement surface for arranging the cleaning material, and the cleaning material held on the cleaning material arrangement surface And a cleaning liquid flow forming means for forming a cleaning liquid flow supplied from a portion other than the film contact surface of the cleaning material and discharged from the film contact surface of the cleaning material.

  According to the present invention, the cleaning liquid supplied in the cleaning material is cleaned with the cleaning material on the film surface while forming a cleaning liquid flow discharged from the cleaning material to the outside, and a fresh cleaning liquid is always supplied, and Accumulation of dirt in the cleaning material can be reduced. As a result, it is possible to clean the surface of the film with a simple configuration using a cleaning material continuously for a long time while suppressing a decrease in the cleaning ability of the cleaning liquid.

It is a figure which shows the structure of a film cleaning apparatus. It is a figure which shows the structure of the washing | cleaning liquid application part block which the washing | cleaning apparatus of a film has.

The film cleaning apparatus according to the present invention is an apparatus for cleaning by sliding the film surface against the cleaning material while applying the cleaning liquid by contacting the cleaning material containing the cleaning liquid on the film surface, and the cleaning material holding means; And a cleaning liquid flow forming means. The cleaning material holding means has a cleaning material arrangement surface on which the cleaning material is arranged, and is provided so as to be relatively movable, that is, relatively movable with respect to the film surface that is the surface to be cleaned. Sliding with the surface (film contact surface) of the cleaning material that comes into contact with the film becomes possible.
The relative movement of the cleaning material holding means with respect to the film surface may be a configuration in which the film is fixed and the cleaning material holding means is moved, a configuration in which the cleaning material holding means is fixed and the film is moved by the conveying means, or these This can be done by a configuration in which both are moved.
The cleaning liquid flow forming means supplies cleaning liquid from a portion other than the film contact surface of the cleaning material into the cleaning material held on the cleaning material arrangement surface of the cleaning material holding means, and the film contact surface of the cleaning material A flow of cleaning liquid discharged from the water is formed.
The cleaning liquid flow forming means may include a cleaning liquid supply hole that opens in the cleaning material arrangement surface of the cleaning material holding means, and a liquid path that supplies the cleaning liquid to the supply hole provided in the cleaning material holding means. it can. A plurality of supply holes can be provided in the cleaning material arrangement surface.
The cleaning liquid supplied from the supply hole is held in the cleaning material, oozes out from the film contact surface of the cleaning material, and is applied to the film surface. In the presence of the applied cleaning solution, the film surface is rubbed against the film contact surface of the cleaning material, and the film contact surface is slid relative to the film surface, so that effective cleaning is performed.
Further, the cleaning liquid is supplied into the cleaning material so that a flow of the cleaning liquid discharged to the outside of the cleaning material is always formed, whereby a fresh cleaning liquid having a high cleaning capability is continuously supplied. Moreover, the removal of dirt from the cleaning material is effectively performed, and accumulation of dirt in the cleaning material is reduced.
The cleaning material placement surface of the cleaning material holding means may be made of a material and a shape that can place and hold the cleaning material and can press the film contact surface of the cleaning material against the film surface.

From the viewpoint of contact between the film contact surface on the cleaning material side and the film surface, and the formation of a discharge flow of the cleaning liquid, the cleaning material arrangement surface is a convex curved surface shape that protrudes in the direction of the film surface that faces the cleaning material. It is preferable that it has. By arranging the cleaning material that can form the convex curved surface shape following the shape of the convex curved surface of the cleaning material arrangement surface, the film contact surface of the cleaning material can be a convex curved surface. Further, the cleaning material holding means is arranged so that the convex curved surface protrudes in a direction intersecting the vertical direction, a supply hole is provided in the upper part of the convex curved surface, and the film is formed from the lower side to the upper side of the convex curved surface. It is preferable to have a structure for moving the surface.
The shape of the film to be washed is not particularly limited. When a long film is processed, the long film can be stretched by a film stretching means and washed. Further, the tension of the long film is adjusted by the film stretching means, and the discharge pressure of the cleaning liquid from the supply hole is adjusted by the discharge pressure adjusting means, so that the cleaning material from the film contact surface is adjusted. The amount of the cleaning liquid that oozes out can be controlled. In addition, the cleaning material that is in contact with the film surface by the tension of the film stretching means is pressed by the film surface and is appropriately crushed, thereby promoting the bleeding of the cleaning liquid from the film contact surface of the cleaning material. Can do. Furthermore, the pressing by the film surface can be adjusted by the cleaning liquid discharge pressure from the supply hole. As a result, the flow rate of the cleaning liquid flow discharged from the cleaning material can be controlled. It is necessary that the cleaning liquid flows down from the film contact surface of the cleaning material, and the supply amount of the cleaning liquid is preferably set based on the width of the film, the size of the cleaning material, and the like.
The film cleaning apparatus can be provided with a cleaning liquid removing means for removing the cleaning liquid remaining on the film surface after cleaning with the cleaning material. The cleaning liquid removing unit may include a cleaning liquid scraping unit such as a wiper. Further, it is possible to provide a means for drying the film surface after washing, such as an air drying means.

Below, the embodiment of the film cleaning apparatus concerning this invention is described using drawing.
The film cleaning apparatus shown in FIG. 1 includes a film transport unit, a cleaning liquid application unit that performs a cleaning liquid application step a, a cleaning liquid removal processing unit that performs a cleaning liquid scraping step b, and a film drying processing unit that performs a film drying step c. Have.
This film cleaning apparatus has a film stretching means comprising a roller system having a feed-out side tension roller 4, a take-up side tension roller 5, and a guide roller 3. A roll driving means (not shown) is connected to the feed-out roll film 1 and the take-up roll film 6. These film stretching means and roll driving means constitute a film conveying means. The film 2 is drawn out from the feed-side roll film 1 and the film 2 is conveyed while being turned over the guide roller 3.
The film transport tension is managed by using the feeding side tension roller 4 and the winding side tension roller 5. The film can be conveyed from the feed-out roll film 1 to the take-up roll film 6 while applying a tension necessary for the cleaning process to the long film 2.
In the cleaning liquid application section, a cleaning liquid application block 8 as a cleaning material holding means, a cleaning liquid supply pump 9, and a cleaning liquid supply system for connecting them are arranged. The cleaning material 7 is arranged on the cleaning material arrangement surface of the cleaning liquid application block 8. The cleaning liquid is supplied to the back surface of the cleaning material 7 through the flow path in the cleaning liquid application block 8 connected to the cleaning liquid supply system including the cleaning liquid supply pump 9, and is supplied to the film surface through the cleaning material 7. . A cleaning liquid storage tank (not shown) is connected to the cleaning liquid supply pump 9.
In the film drying processing section, an air blow 13 is arranged as blower drying means.

  In the cleaning step a, the cleaning liquid is applied to the surface of the traveling film, and at the same time, the surface of the traveling film is rubbed with the cleaning material 7 to promote dissolution of dirt. In the cleaning liquid scraping process b, the cleaning liquid applied in the cleaning process a and dirt dissolved in the cleaning liquid are scraped with the wiper 11. In the drying step c, the air blow 13 dries the surface of the traveling film. The film that has passed through the drying step c is taken up and stored in the take-up roll film 6.

Further, details of each step will be described below.
The cleaning liquid application unit that performs the cleaning liquid application step a includes a cleaning material 7 for dissolving dirt while applying the cleaning liquid to the film 2, a cleaning liquid application block 8 for continuously supplying the cleaning liquid to the cleaning material 7, and a cleaning liquid. It has a supply pump 9 and a waste liquid drain 10 for collecting the generated waste liquid.
The cleaning liquid can be selected depending on the type of the film 2 and the type of contaminants to be cleaned. For example, a cleaning solution that can obtain the desired cleaning effect without changing the deformation and quality of the film is used. As the cleaning solution for the resin film, for example, an alcohol-based cleaning solution such as ethanol or IPA (isopropyl alcohol) can be used.
The cleaning material 7 does not damage the surface of the film 2 and preferably has abrasion resistance. The cleaning material 7 is preferably made of a material that has a porosity that allows the cleaning liquid flow to ooze out from the film contact surface and that is not affected by the cleaning liquid. For example, the cleaning material 7 can be formed from a porous material or a fiber material made of a resin material selected according to the material of the cleaning liquid and the film. As the fiber material, a nonwoven fabric is preferable.
The surface of the porous material is formed from the openings of the pores and the edges of the material constituting the pore walls, and is not a smooth surface, but can be provided as a rough surface with surface irregularities having crests and troughs. is there. By using such a porous material surface as the film contact surface of the cleaning material, the film contact surface contacts the film surface via each convex portion, and the concave portion is left as a minute space. Mainly, the flow of the cleaning liquid downward in the vertical direction is formed using this minute space.
Further, since the cleaning material 7 is formed from the porous material having the permeability of the cleaning liquid, the cleaning liquid that has penetrated into the cleaning material 7 also moves downward in the cleaning material 7 and moves to the lower region of the cleaning surface. The cleaning liquid can be effectively supplied.

Next, the cleaning liquid application block 8 will be described with reference to FIG.
The cleaning liquid application block 8 has a cleaning liquid intake 14 for taking in the cleaning liquid from the cleaning liquid supply pump 9 and a supply hole 15 for supplying the cleaning liquid taken in from the cleaning liquid intake 14 to the cleaning material. The supply hole 15 is an opening in the installation surface of the cleaning material 7 in the flow path provided through the cleaning liquid application block 8. In the configuration shown in the front view of FIG. 2A and the side view of FIG. 2B, a cleaning liquid inlet 14 is provided on the side surface of the cleaning liquid application block 8, and the front view of FIG. 2C and FIG. In the configuration shown in the side view, a cleaning liquid inlet 14 is provided on the back surface of the cleaning liquid application block 8, and a plurality of supply holes 15 are provided on the installation surface of the cleaning material 7. In the configuration using the cleaning liquid application block 8 shown in FIG. 2, the cleaning liquid flow forming means includes a cleaning liquid supply system including the cleaning liquid supply pump 9, a cleaning liquid inlet 14 provided in the cleaning liquid application block 8, and a supply hole 15. And it has the flow path which connects these.
A required number of supply holes 15 can be provided at positions where the cleaning liquid can be supplied uniformly from the back side of the cleaning material 7 and a flow of the target cleaning liquid can be formed. For example, the arrangement position of the supply hole 15 can be determined according to the width of the film so that the cleaning liquid can be applied to the film 2 without unevenness. In the present invention, it is important to wash away dirt accumulated in the cleaning material by supplying the cleaning liquid from other than the film contact surface of the cleaning material 7 and dripping the cleaning liquid from the film contact surface of the cleaning material. From this point of view, the supply hole 15 is preferably provided in the upper part of the cleaning liquid application block 8. When the cleaning liquid is directly supplied to the film contact surface of the cleaning material, the cleaning liquid only flows on the film contact surface of the cleaning material, and it is difficult to wash away dirt accumulated in the cleaning material.

  The shape and size of the cleaning liquid application block 8 can be selected depending on the material and size (for example, width) of the film. The force for rubbing the film 2 with the cleaning material 7 is managed by the conveyance tension of the film 2. Therefore, in order to prevent damage to the film surface due to rubbing with the cleaning material 7 due to the conveyance tension, the cleaning material 7 having a convex curved surface shape protruding in the film surface direction is suitable for rubbing the film 2. ing. Therefore, it is preferable that the installation surface of the cleaning material 7 of the cleaning liquid application block 8 is formed as a convex curved surface capable of imparting such a convex curved surface to the cleaning material 7. The cleaning liquid application block 8 shown in FIG. 2 has a flat back surface extending in the vertical direction and an installation surface for the cleaning material 7 facing the back surface and forming a convex curved surface in the film surface direction. This convex curved surface forms a continuous convex curved surface in the running direction of the film. A cross section orthogonal to the back surface of the cleaning liquid application block 8 and extending in the vertical direction (that is, a cross section parallel to the side surface of the cleaning liquid application block 8) has the same kamaboko shape.

  On the other hand, the conveyance tension of the film 2 is excessively resistant to the cleaning material, is less likely to cause problems such as meandering of the running film and damage to the film, and can sufficiently obtain the dissolution effect of dirt. It is preferable to set.

In the cleaning liquid application process, it is important to promote the dissolution of dirt by rubbing the cleaning material 7 and the film 2 at the same time as applying the cleaning liquid. In order to rub the cleaning material 7 against the film 2 while the film 2 is being conveyed, the shape of the surface on which the cleaning material 7 is disposed in the cleaning liquid application block 8 is suitable for the convex curved surface shape described above. If the cleaning liquid application block 8 has a rectangular shape, the pressing force to the film differs between the corner portion and the surface portion, and it may not be possible to rub with an equal force. From this point of view, the cleaning liquid application block The above-mentioned convex curved surface shape is suitable for the shape of the arrangement surface of the cleaning material 7.
When the dirt adhering to the film is stubborn, it is possible to easily remove the dirt by attaching a groove like a washing board to the film cleaning surface of the cleaning material 7. An effect can be obtained regardless of whether the washing plate-like groove is provided on the cleaning liquid application block 8 or the cleaning material 7. There are preferably a plurality of grooves. The direction of the groove can be provided regardless of the horizontal direction, the vertical direction, the oblique direction, or the like, and a pattern in which a plurality of grooves intersect can also be used. The depth of the groove can be set so that a desired cleaning effect can be obtained.

In the example of FIG. 2, the supply hole 15 is provided in the vicinity of the upper end of the cleaning liquid application block 8 in a region above the central portion in the vertical direction of the installation surface of the cleaning material 7 of the cleaning liquid application block 8. Due to the arrangement of the supply holes 15, the cleaning liquid supplied from the supply holes 15 to the back surface of the cleaning material 7 penetrates into the cleaning material 7, and the flow of the cleaning liquid downward is easily formed by the addition of gravity, and the traveling film Securing the coated surface with respect to the film becomes even easier.
The cleaning liquid is required to be supplied to the cleaning material 7 in an amount equal to or more than the minimum amount at which the cleaning liquid hangs down from the cleaning material 7. The supplied cleaning liquid is used for two purposes of applying to the traveling film and dripping from the cleaning material 7. By supplying the cleaning liquid in such an amount, a cleaning liquid flow discharged from the cleaning material 7 to the outside can be formed together with the cleaning liquid flow in the cleaning material 7. The cleaning liquid is applied to the traveling film from the cleaning liquid supply pump 9 through the cleaning liquid application block 8 and the cleaning material 7. The dirt on the film is dissolved in the applied cleaning liquid, and the cleaning material 7 and the film 2 are rubbed together by the film transport tension to promote the dissolution of the dirt. The cleaning liquid left on the film is transported along with the film to the next cleaning liquid scraping step.

On the other hand, of the supplied cleaning liquid, the amount discharged from the cleaning material 7 other than that applied to the film surface and moved to the cleaning liquid scraping process drips from the cleaning material 7 as waste liquid 17-a. This waste liquid 17-a has the effect of washing away dirt accumulated in the cleaning material. By forming such a continuous cleaning liquid flow, accumulation of dirt on the cleaning material 7 is reduced, and it is possible to perform continuous cleaning for a long time without deteriorating the cleaning capability.
The cleaning liquid scraping process b is a process in which the cleaning liquid applied to the film 2 in the cleaning liquid application process a is scraped with the wiper 11. The cleaning liquid removal processing unit that performs the cleaning liquid scraping step b includes a wiper 11 and a waste liquid drain 12. The material of the wiper 11 is preferably one that is not affected by the cleaning liquid and has wear resistance. As a method for applying the wiper, an application method in which the edge is brought into close contact with the film 2 and the cleaning liquid can be scraped off is preferable. The cleaning liquid scraped off by the wiper 11 is recovered as the waste liquid 17-b by the waste liquid drain 12 and processed as the waste liquid.
In the drying step c, the air blow 13 is used to dry the cleaning liquid that could not be scraped off the surface of the film 2. When the cleaning liquid contains a vaporizing solvent such as alcohol, it is preferable to exhaust the exhaust through the exhaust duct 16.

Example 1
Cleaning was performed using the apparatus shown in FIG.
As the film 2, a PET (polyethylene terephthalate) film having a thickness of 0.1 mm and a width of 10 mm was used. The conveyance speed of the film was 800 mm / sec.
(1) Cleaning liquid application process a:
As the cleaning liquid, an alcohol-based cleaning liquid for cleaning PET film was used. The cleaning material 7 is made of acrylic fiber and polyester fiber, and can be impregnated with cleaning liquid, and can be washed out on the film cleaning surface (product name: class 1,000 nano waste, source: Tanimura) Co., Ltd.) was used.
The cleaning liquid application block 8, a semicylindrical shape of the vertical length 120mm in the direction, width 40 mm, a convex curved surface shape in the form of a film cleaning surface R120 when installed in the apparatus of FIG 1, FIG. 2 (a) and used was a structure with a cleaning liquid inlet 14 and the supply hole 15 shown in (b). In the present embodiment, holes having a diameter of 1.5 mm are horizontally arranged in the upper part of the cleaning liquid application block 8 with a pitch of 5 mm and a total of 6 holes as supply holes.
The cleaning material 7 and the film 2 were brought into contact with each other with a tension of 3.3 N to apply the cleaning liquid. The cleaning liquid supply pump 9 was used to control the flow rate to a constant flow rate of 2.35 g / min, and the amount of waste liquid discharged from the cleaning material 7 to the waste liquid drain 10 was set to about 0.8 g / min.
(2) Cleaning liquid scraping step b:
As the wiper 11, silicon rubber having a thickness of 3 mm and a hardness of 50 ° was used. The angle between the wiper 11 and the film 2 was set to 35 °.
(3) Drying step c:
Drying was performed by applying an air blow at a flow rate of 760 L / min vertically from a distance of 25 mm from the film 2. Further, since an alcohol-based solvent was used as the cleaning liquid, exhaust of 70 m ³ / h was performed.
Characters, solids, barcodes, and two-dimensional barcodes as QR codes (registered trademark) were printed on the obtained washed and unwashed films with a UV printer, and the quality was visually confirmed. The unwashed film had streaks and unevenness, but the cleaned film did not show streaks and unevenness, and a high-quality printing result was obtained. It was confirmed that barcodes and QR codes (registered trademark) can also be read. Further, the cleaning ability was confirmed by continuously washing the film for 21000 m and performing UV printing. It was confirmed that the printing quality was high after 21000 m cleaning, and the deterioration of the cleaning ability due to accumulation of dirt could be suppressed.

DESCRIPTION OF SYMBOLS 1 Feeding side roll film 2 Film 3 Guide roller 4 Feeding side tension roller 5 Winding side tension roller 6 Winding side roll film 7 Cleaning material 8 Cleaning liquid application block 9 Cleaning liquid supply pump 14 Cleaning liquid intake 15 Supply hole

Claims (12)

While the film contact surface of the cleaning material is in contact with the film surface and the cleaning liquid is applied to the film surface from the film contact surface, the film contact surface is slid relative to the film surface. A cleaning device for cleaning the film surface,
A cleaning material holding means having a cleaning material arrangement surface for arranging the cleaning material;
Cleaning liquid flow forming means for forming a cleaning liquid flow supplied from a portion other than the film contact surface of the cleaning material into the cleaning material held on the cleaning material arrangement surface and discharged from the film contact surface of the cleaning material; ,
A film cleaning apparatus comprising:   The cleaning liquid flow forming means has a cleaning liquid supply hole that opens in the cleaning material arrangement surface, and a liquid path that supplies the cleaning liquid to the supply hole provided in the cleaning material holding means. Film cleaning equipment.   The cleaning material arrangement surface has a convex curved surface projecting in the direction of the film surface arranged opposite to the cleaning material arrangement surface, and the convex material can hold the cleaning material in a convex curved surface shape. The film cleaning apparatus according to claim 1 or 2.   The film cleaning apparatus according to claim 3, wherein the convex curved surface is disposed so as to protrude in a direction intersecting the vertical direction, and the supply hole is provided in an upper portion of the convex curved surface.   The film cleaning apparatus according to claim 2, wherein the cleaning material arrangement surface has a plurality of the supply holes.   A film stretching means for stretching the film; and a discharge pressure adjusting means for adjusting a discharge pressure of the cleaning liquid from the supply hole. The cleaning liquid is adjusted by adjusting the tension of the film and the discharge pressure of the cleaning liquid. The film cleaning apparatus according to claim 2, wherein a flow is formed.   The film cleaning apparatus according to claim 1, further comprising a film transport unit that enables relative movement between the cleaning material and the film.   The film cleaning apparatus according to any one of claims 1 to 7, further comprising a cleaning liquid removing unit that removes a cleaning liquid remaining on the film surface after cleaning with the cleaning material.   The film cleaning apparatus according to claim 8, wherein the cleaning liquid removing unit includes a cleaning liquid scraping unit.   The film cleaning apparatus according to claim 9, wherein the cleaning liquid scraping means is a wiper.   The film cleaning apparatus according to claim 8, wherein the cleaning liquid removing unit includes a film surface drying unit.   The film cleaning apparatus according to claim 11, wherein the drying unit is an air drying unit.

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