JP2016143869A - Exposure device, and method of manufacturing article - Google Patents

Exposure device, and method of manufacturing article Download PDF

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JP2016143869A
JP2016143869A JP2015021487A JP2015021487A JP2016143869A JP 2016143869 A JP2016143869 A JP 2016143869A JP 2015021487 A JP2015021487 A JP 2015021487A JP 2015021487 A JP2015021487 A JP 2015021487A JP 2016143869 A JP2016143869 A JP 2016143869A
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reflection surface
gas
exposure light
exposure apparatus
substrate
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亮介 福岡
Ryosuke Fukuoka
亮介 福岡
春名 川島
Haruna Kawashima
春名 川島
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Canon Inc
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Canon Inc
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Abstract

PROBLEM TO BE SOLVED: To provide an exposure device advantageous for transferring the pattern of an original accurately to a substrate.SOLUTION: An exposure device for transferring the pattern of an original to a substrate by using exposure light includes a projection optical system including an optical element having a reflection surface for reflecting the exposure light, and projecting the pattern of the original to the substrate, and a supply section for supplying gas along the reflection surface, by ejecting the gas for the optical element along the reflection surface. The supply section supplies the gas so that the direction of the gas flow along the reflection surface intersects a plane including the incident direction of the exposure light to the reflection surface, and the direction of the exposure light reflected on the reflection surface.SELECTED DRAWING: Figure 1

Description

本発明は、露光装置、および物品の製造方法に関する。   The present invention relates to an exposure apparatus and a method for manufacturing an article.

フラットパネルディスプレイや半導体デバイスの製造には、マスクなどの原版のパターンを、レジストが塗布されたガラスプレートやウェハなどの基板に転写する露光装置が用いられる。このような露光装置には、例えば、凹面鏡、凸面鏡、および台形ミラーなどの光学素子を有し、原版のパターンを基板に投影するオフナー型の投影光学系が用いられる。   For the manufacture of flat panel displays and semiconductor devices, an exposure apparatus is used that transfers an original pattern such as a mask to a substrate such as a glass plate or wafer coated with a resist. In such an exposure apparatus, for example, an Offner type projection optical system that has optical elements such as a concave mirror, a convex mirror, and a trapezoidal mirror and projects an original pattern onto a substrate is used.

投影光学系では、凹面鏡などの光学素子が露光光の一部を吸収して発熱することにより、投影光学系の内部において温度分布が形成され、光路上に屈折率の分布が生じることがある。この場合、原版のパターンを基板に精度よく転写することが困難になりうる。特許文献１には、投影光学系の内部に気体を供給して、投影光学系の内部の温度を制御する方法が提案されている。   In the projection optical system, an optical element such as a concave mirror absorbs part of the exposure light and generates heat, so that a temperature distribution is formed inside the projection optical system, and a refractive index distribution may occur on the optical path. In this case, it may be difficult to accurately transfer the pattern of the original plate to the substrate. Patent Document 1 proposes a method of controlling the temperature inside the projection optical system by supplying gas into the projection optical system.

特開２０１２−５８４４０号公報JP 2012-58440 A

特許文献１には、投影光学系の内部において基板側から原版側に向かう方向に沿った気体の流れが生じるように、投影光学系の内部に気体を供給する方法が記載されている。しかしながら、特許文献１に記載されたように気体を供給してしまうと、例えば、台形ミラーの原版側の反射面に対し、当該反射面の温度の上昇を抑制するように気体を供給することが困難になることがある。また、台形ミラーの基板側の反射面に吹き付けられた気体によって投影光学系の内部において乱流が生じることがある。その結果、投影光学系の光路上に屈折率の分布が生じ、原版のパターンを基板に精度よく転写することが不十分になりうる。   Patent Document 1 describes a method of supplying a gas into the projection optical system so that a gas flow along the direction from the substrate side to the original plate side occurs in the projection optical system. However, if the gas is supplied as described in Patent Document 1, for example, the gas may be supplied to the reflecting surface on the master side of the trapezoidal mirror so as to suppress the temperature rise of the reflecting surface. It can be difficult. Further, turbulent flow may occur inside the projection optical system due to the gas blown to the reflecting surface on the substrate side of the trapezoidal mirror. As a result, a refractive index distribution occurs on the optical path of the projection optical system, and it may be insufficient to accurately transfer the original pattern onto the substrate.

そこで、本発明は、原版のパターンを基板に精度よく転写するために有利な露光装置を提供することを目的とする。   Therefore, an object of the present invention is to provide an exposure apparatus that is advantageous for accurately transferring a pattern of an original to a substrate.

上記目的を達成するために、本発明の一側面としての露光装置は、露光光を用いて、原版のパターンを基板に転写する露光装置であって、前記露光光を反射する反射面を有する光学素子を含み、前記原版の前記パターンを前記基板に投影する投影光学系と、前記光学素子に対して、前記反射面に沿った方向に気体を噴出して、前記反射面に沿うように気体を供給する供給部と、を含み、前記供給部は、前記反射面に沿った気体の流れの方向が、前記露光光が前記反射面に入射する方向および前記露光光が前記反射面で反射される方向を含む面に交差する方向になるように気体を供給する、ことを特徴とする。   In order to achieve the above object, an exposure apparatus according to one aspect of the present invention is an exposure apparatus that transfers an original pattern to a substrate using exposure light, and has an optical surface that reflects the exposure light. A projection optical system that includes an element and projects the pattern of the original plate onto the substrate; and a gas is ejected to the optical element in a direction along the reflection surface, and the gas is aligned along the reflection surface. A supply unit that supplies gas, and the supply unit reflects the direction of gas flow along the reflection surface, the direction in which the exposure light is incident on the reflection surface, and the exposure light is reflected by the reflection surface. A gas is supplied so as to be in a direction crossing a plane including the direction.

本発明の更なる目的又はその他の側面は、以下、添付図面を参照して説明される好ましい実施形態によって明らかにされるであろう。   Further objects and other aspects of the present invention will become apparent from the preferred embodiments described below with reference to the accompanying drawings.

本発明によれば、例えば、原版のパターンを基板に精度よく転写するために有利な露光装置を提供することができる。   According to the present invention, for example, it is possible to provide an exposure apparatus that is advantageous for accurately transferring an original pattern onto a substrate.

第１実施形態の露光装置を示す概略図である。It is the schematic which shows the exposure apparatus of 1st Embodiment. 投影光学系をＺ方向から見たときの図である。It is a figure when the projection optical system is seen from the Z direction. 凹面鏡側から凸面鏡および台形ミラーを見たときの図である。It is a figure when a convex mirror and a trapezoid mirror are seen from the concave mirror side. 凹面鏡側から凸面鏡および台形ミラーを見たときの図である。It is a figure when a convex mirror and a trapezoid mirror are seen from the concave mirror side.

以下、添付図面を参照して、本発明の好適な実施の形態について説明する。なお、各図において、同一の部材ないし要素については同一の参照番号を付し、重複する説明は省略する。   DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described with reference to the accompanying drawings. In addition, in each figure, the same reference number is attached | subjected about the same member thru | or element, and the overlapping description is abbreviate | omitted.

＜第１実施形態＞
本発明に係る第１実施形態の露光装置１００について説明する。図１は、第１実施形態の露光装置１００を示す概略図である。第１実施形態の露光装置１００は、例えば、スリット光を用いて基板６を走査露光する露光装置であり、照明光学系１と、アライメントスコープ２と、原版ステージ４と、投影光学系５と、基板ステージ７と、制御部８とを含みうる。制御部８は、例えばＣＰＵやメモリなどを含み、露光装置１００の各部を制御する（基板６の走査露光を制御する）。 <First Embodiment>
An exposure apparatus 100 according to the first embodiment of the present invention will be described. FIG. 1 is a schematic view showing an exposure apparatus 100 according to the first embodiment. An exposure apparatus 100 according to the first embodiment is an exposure apparatus that scans and exposes a substrate 6 using, for example, slit light. The illumination optical system 1, the alignment scope 2, the original stage 4, the projection optical system 5, and the like. A substrate stage 7 and a control unit 8 can be included. The control unit 8 includes, for example, a CPU and a memory, and controls each unit of the exposure apparatus 100 (controls scanning exposure of the substrate 6).

照明光学系１は、例えばＨｇランプなどの光源から射出された光（露光光）で原版３（例えばマスク）を照明する。原版３および基板６は、原版ステージ４および基板ステージ７によってそれぞれ保持されており、投影光学系５を介して光学的にほぼ共役な位置（投影光学系５の物体面および像面の位置）に配置される。投影光学系５は、所定の投影倍率（例えば１倍）を有し、原版３に形成されたパターンを基板６に投影する。そして、原版ステージ４および基板ステージ７を投影光学系５の物体面と平行な方向（例えばＹ方向）に、投影光学系５の投影倍率に応じた速度比で走査させる。これにより、原版３に形成されたパターンを基板６に転写することができる。また、アライメントスコープ２は、原版３のアライメントマークと基板６のアライメントマークとを、投影光学系５を介して同時に検出することができるように構成されている。   The illumination optical system 1 illuminates the original 3 (for example, a mask) with light (exposure light) emitted from a light source such as an Hg lamp. The original 3 and the substrate 6 are respectively held by the original stage 4 and the substrate stage 7, and are optically conjugate positions (positions of the object plane and the image plane of the projection optical system 5) via the projection optical system 5. Be placed. The projection optical system 5 has a predetermined projection magnification (for example, 1 time), and projects the pattern formed on the original 3 onto the substrate 6. Then, the original stage 4 and the substrate stage 7 are scanned in a direction parallel to the object plane of the projection optical system 5 (for example, the Y direction) at a speed ratio corresponding to the projection magnification of the projection optical system 5. Thereby, the pattern formed on the original 3 can be transferred to the substrate 6. The alignment scope 2 is configured to be able to simultaneously detect the alignment mark on the original plate 3 and the alignment mark on the substrate 6 via the projection optical system 5.

このような露光装置１００では、例えば、図１に示すように、凹面鏡５ａ、凸面鏡５ｂ、台形ミラー５ｃ、第１透過素子５ｄ１および第２透過素子５ｄ２などの光学素子を鏡筒５ｅの内部に有し、原版３のパターンを基板６に投影する投影光学系５が用いられる。光学素子の１つとしての台形ミラー５ｃは、原版３を介して投影光学系５に入射した光（露光光９）を凹面鏡５ａに向けて反射する第１反射面５ｃ１と、凹面鏡５ａで反射された露光光９を基板６に向けて反射する第２反射面５ｃ２とを含む複数の反射面を有する。凹面鏡５ａ、凸面鏡５ｂおよび台形ミラー５ｃはそれぞれ、線膨張係数の比較的小さい硝材によって形成されることが好ましい。また、第１透過素子５ｄ１は、原版３と台形ミラー５ｃの第１反射面５ｃ１との間における光路上に配置され、第２透過素子５ｄ２は、台形ミラー５ｃの第２反射面５ｃ２と基板６との間における光路上に配置されうる。第１透過素子５ｄ１および第２透過素子５ｄ２はそれぞれ、例えば平行平板ガラスなどによって構成され、露光光９の光軸に対して傾けることにより投影光学系５の結像性能を変化させることができる。第１透過素子５ｄ１および第２透過素子５ｄ２はそれぞれ、露光光９に対しする吸収率が零に近い材質（例えば石英ガラス）によって形成されることが好ましい。ここで、図１に示す台形ミラー５ｃは、第１反射面５ｃ１および第２反射面５ｃ２が１つの部材に形成されるように構成されているが、それに限られるものではない。例えば、第１反射面５ｃ１および第２反射面５ｃ２がそれぞれ異なる部材に形成されるように構成されていてもよい。また、第１反射面５ｃ１および第２反射面５ｃ２は、平面であることが好ましい。 In such an exposure apparatus 100, for example, as shown in FIG. 1, the interior of the concave mirror 5a, convex mirror 5b, trapezoidal mirror 5c, the first transmission element 5d 1 and the second optical element, such as a transmissive element 5d 2 barrel 5e The projection optical system 5 for projecting the pattern of the original 3 onto the substrate 6 is used. Trapezoidal mirror 5c as one of the optical element, a first reflecting surface 5c 1 for reflecting the light incident on the projection optical system 5 via the original 3 (exposure light 9) concave mirror 5a, reflected by the concave mirror 5a A plurality of reflecting surfaces including a second reflecting surface 5 c 2 that reflects the exposed exposure light 9 toward the substrate 6. The concave mirror 5a, the convex mirror 5b, and the trapezoidal mirror 5c are each preferably formed of a glass material having a relatively small linear expansion coefficient. The first transmission element 5d 1 is disposed on the optical path between the original plate 3 and the first reflection surface 5c 1 of the trapezoidal mirror 5c, and the second transmission element 5d 2 is the second reflection surface 5c of the trapezoidal mirror 5c. 2 and the substrate 6 can be disposed on the optical path. Each of the first transmissive element 5d 1 and the second transmissive element 5d 2 is made of, for example, parallel flat glass, and can change the imaging performance of the projection optical system 5 by being inclined with respect to the optical axis of the exposure light 9. it can. Each of the first transmission element 5d 1 and the second transmission element 5d 2, the absorption rate of relative exposure light 9 are preferably formed by the material close to zero (e.g., quartz glass). Here, trapezoidal mirror 5c shown in FIG. 1, the first reflecting surface 5c 1 and the second reflection surface 5c 2 is configured to be formed into a single member, not limited thereto. For example, the first reflecting surface 5c 1 and the second reflection surface 5c 2 may be configured to be formed in different members. The first reflecting surface 5c 1 and the second reflection surface 5c 2 is preferably flat.

照明光学系１から射出し、原版３および第１透過素子５ｄ１を透過した露光光９は、台形ミラー５ｃの第１反射面５ｃ１で反射され、凹面鏡５ａの第１面５ａ１（＋Ｚ方向側の面）に入射する。凹面鏡５ａの第１面５ａ１で反射した露光光９は、凸面鏡５ｂで反射し、凹面鏡５ａの第２面５ａ２（−Ｚ方向側の面）に入射する。凹面鏡５ａの第２面５ａ２で反射した露光光は、台形ミラー５ｃの第２反射面５ｃ２で反射され、第２透過素子５ｄ２を通過して基板上に結像する。 The exposure light 9 emitted from the illumination optical system 1 and transmitted through the original 3 and the first transmission element 5d 1 is reflected by the first reflection surface 5c 1 of the trapezoidal mirror 5c, and the first surface 5a 1 (+ Z direction) of the concave mirror 5a. Incident on the side surface). Exposure light 9 reflected by the first surface 5a 1 of the concave mirror 5a is reflected by the convex mirror 5b, and enters the second surface 5a of the concave mirror 5a 2 (surface on the -Z direction side). The exposure light reflected by the second surface 5a 2 of the concave mirror 5a is reflected by the second reflection surface 5c 2 of the trapezoidal mirror 5c, passes through the second transmission element 5d 2 and forms an image on the substrate.

投影光学系５は、例えば、露光光９が凸面鏡５ｂに入射する方向および露光光９が凸面鏡５ｂで反射される方向を含む面に垂直であり、かつ光学的な瞳となる凸面鏡５ｂの中心を通る面１０に対し、露光光９の光路が面対称になるように構成されている。このような構成では、一般的には、ディストーションなどの非対称収差が発生しにくい。しかしながら、投影光学系５では、凹面鏡５ａや凸面鏡５ｂ、台形ミラー５ｃなどの光学素子が露光光９の一部を吸収して発熱するため、発熱した光学素子によって投影光学系５の内部の気体が温められ、投影光学系５の内部において温度分布が形成されうる。例えば、凹面鏡５ａおよび凸面鏡５ｂが露光光９の一部を吸収して発熱した場合、凹面鏡５ａや凸面鏡５ｂの表面で暖められた気体が上方に移動し、投影光学系５の内部において温度分布が形成される。その結果、投影光学系５の内部における光路上に屈折率の分布が生じて非対称収差が発生してしまい、原版３のパターンを基板６に精度よく転写することが困難になりうる。そのため、第１実施形態の露光装置１００には、投影光学系５における凹面鏡５ａなどの光学素子の温度が上昇することを抑制するように、投影光学系５の内部に気体を供給する第１供給部１１ａおよび第２供給部１１ｂが設けられている。   The projection optical system 5 is, for example, perpendicular to a plane including the direction in which the exposure light 9 is incident on the convex mirror 5b and the direction in which the exposure light 9 is reflected by the convex mirror 5b, and the center of the convex mirror 5b serving as an optical pupil. The optical path of the exposure light 9 is configured to be plane-symmetric with respect to the plane 10 through which it passes. In such a configuration, in general, asymmetric aberration such as distortion hardly occurs. However, in the projection optical system 5, the optical elements such as the concave mirror 5a, the convex mirror 5b, and the trapezoidal mirror 5c absorb a part of the exposure light 9 and generate heat. As a result, the temperature distribution can be formed inside the projection optical system 5. For example, when the concave mirror 5a and the convex mirror 5b absorb a part of the exposure light 9 and generate heat, the gas heated on the surfaces of the concave mirror 5a and the convex mirror 5b moves upward, and the temperature distribution in the projection optical system 5 is increased. It is formed. As a result, a refractive index distribution is generated on the optical path inside the projection optical system 5 and asymmetrical aberration is generated, which makes it difficult to accurately transfer the pattern of the original 3 to the substrate 6. Therefore, the exposure apparatus 100 according to the first embodiment supplies a gas to the inside of the projection optical system 5 so as to suppress the temperature of optical elements such as the concave mirror 5a in the projection optical system 5 from rising. A part 11a and a second supply part 11b are provided.

まず、第２供給部１１ｂの構成から説明する。第２供給部１１ｂは、例えば、少なくとも凹面鏡５ａと凸面鏡５ｂの間に気体を供給する。図１に示す投影光学系５の構成では、凹面鏡５ａや凸面鏡５ｂなどの光学素子で暖められた気体は上方に移動するため、面１０と平行な方向に気体を供給すると、投影光学系５の内部に熱だまりが生じることがある。そのため、第２供給部１１ｂは、図１の矢印１３ａで示すように、凹面鏡５ａと凸面鏡５ｂとの間において、基板側から原版側に向かう方向に気体の流れが生じるように、少なくとも凹面鏡５ａと凸面鏡５ｂとの間に気体を供給する構成となっている。例えば、第２供給部１１ｂは、凹面鏡５ａと凸面鏡５ｂとの間における気体の流れの方向が、露光光が凸面鏡５ｂに入射する方向および露光光が凸面鏡５ｂで反射される方向を含む面に平行な方向（面１０に垂直な方向）になるように気体を供給するとよい。また、露光装置１００は、第２供給部１１ｂから射出され、少なくとも凹面鏡５ａと凸面鏡５ｂとの間を流れた気体を回収する第２回収部１２ｂを含みうる。   First, the configuration of the second supply unit 11b will be described. For example, the second supply unit 11b supplies gas between at least the concave mirror 5a and the convex mirror 5b. In the configuration of the projection optical system 5 shown in FIG. 1, the gas heated by the optical elements such as the concave mirror 5 a and the convex mirror 5 b moves upward, and therefore when the gas is supplied in a direction parallel to the surface 10, Heat accumulation may occur inside. Therefore, as shown by the arrow 13a in FIG. 1, the second supply unit 11b includes at least the concave mirror 5a so that a gas flow is generated in the direction from the substrate side to the original plate side between the concave mirror 5a and the convex mirror 5b. Gas is supplied between the convex mirror 5b. For example, in the second supply unit 11b, the direction of the gas flow between the concave mirror 5a and the convex mirror 5b is parallel to a plane including the direction in which the exposure light is incident on the convex mirror 5b and the direction in which the exposure light is reflected by the convex mirror 5b. The gas may be supplied so as to be in a certain direction (a direction perpendicular to the surface 10). In addition, the exposure apparatus 100 can include a second recovery unit 12b that recovers at least the gas emitted from the second supply unit 11b and flowing between the concave mirror 5a and the convex mirror 5b.

ここで、第２供給部１１ｂによって上述のように投影光学系５の内部に気体を供給してしまうと、例えば、台形ミラー５ｃの第１反射面５ｃ１に対し、第１反射面５ｃ１の温度の上昇を抑制するように気体を供給することが困難になることがある。また、台形ミラー５ｃの第２反射面５ｃ２に吹き付けられた気体によって投影光学系５の内部において乱流が生じることがある。その結果、投影光学系５の光路上に屈折率の分布が生じ、原版３のパターンを基板６に精度よく転写することが不十分になりうる。さらに、台形ミラー５ｃの第１反射面５ｃ１と第２反射面５ｃ２とに供給される気体の温度や量が互いに異なると、第１反射面５ｃ１および第２反射面５ｃ２に形成される温度分布が互いに異なる。この場合においても、原版３のパターンを基板６に精度よく転写することが不十分になりうる。 Here, thereby supplying gas to the inside of the projection optical system 5 as described above by the second supply unit 11b, for example, with respect to the first reflecting surface 5c 1 of the trapezoidal mirror 5c, the first reflecting surface 5c 1 It may be difficult to supply gas so as to suppress an increase in temperature. Further, it may turbulence in the interior of the projection optical system 5 by the gas which is blown to the second reflecting surface 5c 2 of the trapezoidal mirror 5c occur. As a result, a refractive index distribution occurs on the optical path of the projection optical system 5, and it may be insufficient to accurately transfer the pattern of the original 3 to the substrate 6. Furthermore, the temperature and amount of gas supplied to the first reflecting surface 5c 1 of the trapezoidal mirror 5c and the second reflecting surface 5c 2 are different from each other, are formed on the first reflecting surface 5c 1 and the second reflection surface 5c 2 Different temperature distributions. Even in this case, it may be insufficient to accurately transfer the pattern of the original 3 to the substrate 6.

したがって、第１実施形態の露光装置１００は、図２に示すように、台形ミラー５ｃに対して、台形ミラー５ｃの反射面に沿った方向に気体を噴出して、当該反射面に沿うように気体を供給する第１供給部１１ａを含みうる。図２は、投影光学系５をＺ方向から見たときの図であり、凹面鏡５ａ、凸面鏡５ｂおよび台形ミラー５ｃの第１反射面５ｃ１が図示されている。図２における矢印１４ａは、図１における二重丸１３ａ（◎）と同様に、第１供給部１１ａによって投影光学系５の内部に供給された気体の流れの方向（例えば、−Ｙ方向）を示している。また、図２における二重丸１４ｂ（◎）は、図１における矢印１３ｂと同様に、第２供給部１１ｂによって投影光学系５の内部に供給された気体の流れの方向（例えば、＋Ｚ方向）を示している。 Therefore, as shown in FIG. 2, the exposure apparatus 100 according to the first embodiment ejects gas in a direction along the reflection surface of the trapezoidal mirror 5c and follows the reflection surface. The 1st supply part 11a which supplies gas can be included. Figure 2 is a diagram when the projection optical system 5 viewed from the Z direction, the concave mirror 5a, the first reflecting surface 5c 1 of the convex mirror 5b and trapezoidal mirror 5c is shown. The arrow 14a in FIG. 2 indicates the flow direction (for example, −Y direction) of the gas supplied to the inside of the projection optical system 5 by the first supply unit 11a, similarly to the double circle 13a (◎) in FIG. Show. Also, the double circle 14b (◎) in FIG. 2 indicates the direction of the flow of gas supplied into the projection optical system 5 by the second supply unit 11b (for example, the + Z direction) in the same manner as the arrow 13b in FIG. Is shown.

第１供給部１１ａは、台形ミラー５ｃの反射面に沿った気体の流れの方向が、露光光９が当該反射面に入射する方向および露光光９が当該反射面で反射される方向を含む面と交差する方向になるように、台形ミラー５ｃに対して気体を供給する。例えば、第１供給部１１ａは、台形ミラー５ｃの反射面に沿った気体の流れの方向と、露光光９が当該反射面に入射する方向および露光光９が当該反射面で反射される方向を含む面との間の角度が８０度から１００度の範囲に収まるように気体を供給するとよい。特に、台形ミラー５ｃの反射面に沿った気体の流れの方向が、露光光９の入射方向および反射方向を含む面に垂直な方向であることが好ましい。このとき、台形ミラー５ｃの反射面に沿うように第１供給部１１ａによって供給された気体の流れの方向と、第２供給部１１ｂによって供給された凹面鏡５ａと凸面鏡５ｂとの間における気体の流れの方向とが異なりうる。また、露光装置１００は、第１供給部１１ａから射出され、台形ミラー５ｃの反射面を沿って流れた気体を回収する第１回収部１２ａを含みうる。   The first supply unit 11a includes a surface in which the direction of gas flow along the reflection surface of the trapezoidal mirror 5c includes a direction in which the exposure light 9 is incident on the reflection surface and a direction in which the exposure light 9 is reflected on the reflection surface. A gas is supplied to the trapezoidal mirror 5c so as to cross the direction. For example, the first supply unit 11a determines the direction of the gas flow along the reflection surface of the trapezoidal mirror 5c, the direction in which the exposure light 9 is incident on the reflection surface, and the direction in which the exposure light 9 is reflected on the reflection surface. The gas may be supplied so that the angle between the surface and the surface to be included is within a range of 80 degrees to 100 degrees. In particular, the direction of the gas flow along the reflecting surface of the trapezoidal mirror 5c is preferably a direction perpendicular to the plane including the incident direction of the exposure light 9 and the reflecting direction. At this time, the flow direction of the gas supplied by the first supply unit 11a along the reflecting surface of the trapezoidal mirror 5c and the gas flow between the concave mirror 5a and the convex mirror 5b supplied by the second supply unit 11b. The direction may be different. In addition, the exposure apparatus 100 can include a first collection unit 12a that collects gas emitted from the first supply unit 11a and flowing along the reflection surface of the trapezoidal mirror 5c.

次に、台形ミラー５ｃにおいて、第１反射面５ｃ１に沿った気体の流れの方向と、第２反射面５ｃ２に沿った気体の流れの方向との関係について、図３を参照しながら説明する。図３は、凹面鏡５ａ側から凸面鏡５ｂおよび台形ミラー５ｃを見たときの図である。台形ミラー５ｃの反射面に沿うように気体を供給すると、当該反射面には、気体の上流から下流に向かって温度が高くなるような温度分布が形成される。そのため、第１供給部１１ａは、基板６に投影される原版３のパターンの像に対して第１反射面５ｃ１の温度分布が与える影響（例えば歪み）が、第２反射面５ｃ２の温度分布によって低減されるように気体を供給することが好ましい。 Then, the trapezoidal mirror 5c, the direction of flow of gas along the first reflecting surface 5c 1, the relationship between the direction of flow of gas along the second reflecting surface 5c 2, with reference to FIG. 3 described To do. FIG. 3 is a view of the convex mirror 5b and the trapezoidal mirror 5c when viewed from the concave mirror 5a side. When the gas is supplied along the reflecting surface of the trapezoidal mirror 5c, a temperature distribution is formed on the reflecting surface so that the temperature increases from the upstream side to the downstream side of the gas. Therefore, the first supply unit 11a, the temperature distribution Influence of the first reflecting surface 5c 1 relative to the image of the pattern of the original 3 is projected onto the substrate 6 (e.g. distortion), the second temperature of the reflecting surface 5c 2 It is preferable to supply gas so that it may be reduced by distribution.

例えば、第１実施形態における投影光学系５の構成では、図３に示すように、第１反射面５ｃ１における原版３のパターンの像と、第２反射面５ｃ２における原版３のパターンの像とが反転する。図３では、説明をわかり易くするため、原版３には「Ｒ」型のパターンが形成されているものとする。この場合、第１反射面５ｃ１に沿った気体の流れの方向と第２反射面５ｃ２に沿った気体の流れの方向とが同じになるように、第１供給部１１ａによって台形ミラー５ｃに対して気体を供給するとよい。このように台形ミラー５ｃに対して気体を供給することで、基板６に投影される原版３のパターンの像に対して第１反射面５ｃ１の温度分布が与える影響を、第２反射面５ｃ２の温度分布によって低減させることができる。一方、例えば、第１反射面５ｃ１と第２反射面５ｃ２との間の光路中にレンズなどが配置されることにより、図４に示すように、第１反射面５ｃ１における原版３のパターンの像と第２反射面５ｃ２における原版３のパターンの像とが反転されない場合を想定する。この場合では、第１反射面５ｃ１に沿った気体の流れの方向と第２反射面５ｃ２に沿った気体の流れの方向とが反対になるように、第１供給部１１ａによって台形ミラー５ｃに対して気体を供給するとよい。 For example, in the configuration of the projection optical system 5 in the first embodiment, as shown in FIG. 3, an image of the pattern of the original 3 on the first reflecting surface 5c 1 and an image of the pattern of the original 3 on the second reflecting surface 5c 2 are used. And reverse. In FIG. 3, it is assumed that an “R” type pattern is formed on the original 3 for easy understanding. In this case, as the direction of flow of gas along the first reflecting surface 5c 1 and the direction of flow of gas along the second reflection surface 5c 2 are the same, the trapezoidal mirror 5c by the first supply unit 11a In contrast, gas may be supplied. By thus supplying gas against trapezoidal mirror 5c, the temperature distribution gives influence of the first reflecting surface 5c 1 relative to the image of the pattern of the original 3 is projected onto the substrate 6, the second reflecting surface 5c 2 temperature distribution. On the other hand, for example, by arranging a lens or the like in the optical path between the first reflecting surface 5c 1 and the second reflecting surface 5c 2 , as shown in FIG. 4, the original 3 on the first reflecting surface 5c 1 Assume that the pattern image and the pattern image of the original 3 on the second reflecting surface 5c 2 are not reversed. In this case, as the direction of flow of gas along the first reflecting surface 5c 1 and the direction of flow of gas along the second reflection surface 5c 2 is reversed, trapezoidal mirror 5c by the first supply unit 11a It is good to supply gas with respect to.

ここで、露光装置１００では、台形ミラー５ｃの反射面に沿って流れる気体の周りに存在する気体の入れ替えを行うため、台形ミラー５ｃに対する気体の供給を、第１供給部１１ａに加えて、例えば第２供給部１１ｂによって行ってもよい。この場合、台形ミラー５ｃの反射面に沿った気体の流れを妨げないように、第２供給部１１ｂにより台形ミラー５ｃに対して供給される気体の流量が、第１供給部１１ａにより台形ミラー５ｃに対して供給される気体の流量より小さいことが好ましい。また、投影光学系５（鏡筒５ｅ）の内部の圧力が、外部の圧力に対して小さいと、投影光学系５の光学素子がくもる原因となる物質を、投影光学系５の内部に引き込んでしまうことがある。そのため、第１供給部１１ａおよび第２供給部１１ｂは、第１回収部１２ａおよび第２回収部１２ｂが投影光学系５の内部から回収する気体の総量より多い量の気体を投影光学系５の内部に供給するとよい。これにより、投影光学系５の内部の圧力が外部の圧力より小さくなることを抑制することができる、
さらに、第１供給部１１ａおよび第２供給部１１ｂはそれぞれ、投影光学系５の光学素子の温度がそれぞれ目標温度になるように、投影光学系５の内部に供給される気体の流量および温度の少なくとも一方を制御する構成であってもよい。例えば、第１供給部１１ａは、台形ミラー５ｃの反射面の温度が目標温度になるように、台形ミラー５ｃに対して供給する気体の流量および温度の少なくとも一方を制御する。目標温度は、例えば、露光装置１００の性能が許容範囲に収まるような温度に設定されるとよい。 Here, in the exposure apparatus 100, in order to replace the gas existing around the gas flowing along the reflecting surface of the trapezoidal mirror 5c, the gas supply to the trapezoidal mirror 5c is added to the first supply unit 11a, for example, You may carry out by the 2nd supply part 11b. In this case, the flow rate of the gas supplied to the trapezoidal mirror 5c by the second supply unit 11b is changed by the first supply unit 11a so that the gas flow along the reflecting surface of the trapezoidal mirror 5c is not hindered. Is preferably smaller than the flow rate of the gas supplied to. If the internal pressure of the projection optical system 5 (lens barrel 5e) is smaller than the external pressure, a substance that causes clouding of the optical elements of the projection optical system 5 is drawn into the projection optical system 5. May end up. Therefore, the first supply unit 11a and the second supply unit 11b are configured so that the first collection unit 12a and the second collection unit 12b generate a larger amount of gas than the total amount of gas collected from the projection optical system 5 by the projection optical system 5. It is good to supply inside. Thereby, it can suppress that the pressure inside the projection optical system 5 becomes smaller than external pressure.
Further, each of the first supply unit 11a and the second supply unit 11b has the flow rate and temperature of the gas supplied into the projection optical system 5 so that the temperature of the optical element of the projection optical system 5 becomes the target temperature. The structure which controls at least one may be sufficient. For example, the first supply unit 11a controls at least one of the flow rate and temperature of the gas supplied to the trapezoidal mirror 5c so that the temperature of the reflecting surface of the trapezoidal mirror 5c becomes the target temperature. For example, the target temperature may be set to a temperature at which the performance of the exposure apparatus 100 falls within an allowable range.

上述したように、第１実施形態の露光装置１００では、投影光学系５における台形ミラー５ｃの第１反射面５ｃ１および第２反射面５ｃ２のそれぞれに沿うように気体を供給する第１供給部１１ａが設けられる。これにより、露光装置１００は、第１反射面５ｃ１および第２反射面５ｃ２のそれぞれに生じる温度分布を制御して、原版３のパターンを基板６に精度よく転写することができる。ここで、第１実施形態において、第１供給部１１ｂは、台形ミラー５ｃの第１反射面５ｃ１および第２反射面５ｃ２のそれぞれに沿うように気体を供給したが、第１反射面５ｃ１および第２反射面５ｃ２の一方のみに沿うように気体を供給してもよい。 As described above, in the exposure apparatus 100 according to the first embodiment, the first supply that supplies gas along each of the first reflecting surface 5c 1 and the second reflecting surface 5c 2 of the trapezoidal mirror 5c in the projection optical system 5 is provided. A portion 11a is provided. Thus, the exposure apparatus 100 can control the temperature distribution generated in each of the first reflecting surface 5c 1 and the second reflection surface 5c 2, to accurately transferred a pattern of an original 3 in the substrate 6. Here, in the first embodiment, the first supply portion 11b has been supplying gas along the first respectively the reflecting surfaces 5c 1 and the second reflection surface 5c 2 of the trapezoidal mirror 5c, the first reflecting surface 5c the gas may be supplied along only one of the first and second reflecting surfaces 5c 2.

＜物品の製造方法の実施形態＞
本発明の実施形態に係る物品の製造方法は、例えば、半導体デバイス等の電子デバイスや微細構造を有する素子等の物品を製造するのに好適である。本実施形態の物品の製造方法は、基板に塗布された感光剤に上記の露光装置を用いて潜像パターンを形成する工程（基板を露光する工程）と、かかる工程で潜像パターンが形成された基板を現像する工程とを含む。更に、かかる製造方法は、他の周知の工程（酸化、成膜、蒸着、ドーピング、平坦化、エッチング、レジスト剥離、ダイシング、ボンディング、パッケージング等）を含む。本実施形態の物品の製造方法は、従来の方法に比べて、物品の性能・品質・生産性・生産コストの少なくとも１つにおいて有利である。 <Embodiment of Method for Manufacturing Article>
The method for manufacturing an article according to the embodiment of the present invention is suitable for manufacturing an article such as an electronic device such as a semiconductor device or an element having a fine structure. In the method for manufacturing an article according to the present embodiment, a latent image pattern is formed on the photosensitive agent applied to the substrate using the above-described exposure apparatus (a step of exposing the substrate), and the latent image pattern is formed in this step. Developing the substrate. Further, the manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

以上、本発明の好ましい実施形態について説明したが、本発明はこれらの実施形態に限定されないことはいうまでもなく、その要旨の範囲内で種々の変形および変更が可能である。   As mentioned above, although preferred embodiment of this invention was described, it cannot be overemphasized that this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

１：照明光学系、２：アライメントスコープ、３：原版、４：原版ステージ、５：投影光学系、６：基板、７：基板ステージ、８：制御部 1: illumination optical system, 2: alignment scope, 3: original plate, 4: original plate stage, 5: projection optical system, 6: substrate, 7: substrate stage, 8: control unit

Claims (13)

露光光を用いて、原版のパターンを基板に転写する露光装置であって、
前記露光光を反射する反射面を有する光学素子を含み、前記原版の前記パターンを前記基板に投影する投影光学系と、
前記光学素子に対して、前記反射面に沿った方向に気体を噴出して、前記反射面に沿うように気体を供給する供給部と、
を含み、
前記供給部は、前記反射面に沿った気体の流れの方向が、前記露光光が前記反射面に入射する方向および前記露光光が前記反射面で反射される方向を含む面に交差する方向になるように気体を供給する、ことを特徴とする露光装置。 An exposure apparatus for transferring a pattern of an original to a substrate using exposure light,
A projection optical system that includes an optical element having a reflecting surface that reflects the exposure light, and that projects the pattern of the original onto the substrate;
A supply unit that ejects gas in a direction along the reflection surface and supplies the gas along the reflection surface with respect to the optical element;
Including
In the supply unit, the direction of the gas flow along the reflection surface intersects a plane including a direction in which the exposure light is incident on the reflection surface and a direction in which the exposure light is reflected by the reflection surface. An exposure apparatus characterized by supplying a gas so as to become. 前記光学素子は、前記原版を介して前記投影光学系に入射した前記露光光を反射する第１反射面と、前記基板に向けて前記露光光を反射する第２反射面とを含む複数の前記反射面を有し、
前記供給部は、前記第１反射面および前記第２反射面のそれぞれに沿うように気体を供給する、ことを特徴とする請求項１に記載の露光装置。 The optical element includes a plurality of the first reflection surfaces that reflect the exposure light incident on the projection optical system via the original plate, and a second reflection surface that reflects the exposure light toward the substrate. Having a reflective surface,
The exposure apparatus according to claim 1, wherein the supply unit supplies a gas along each of the first reflection surface and the second reflection surface. 前記供給部は、前記基板に投影される前記パターンの像に対して前記第１反射面の温度分布が与える影響が、前記第２反射面の温度分布によって低減されるように気体を供給する、ことを特徴とする請求項２に記載の露光装置。   The supply unit supplies gas so that the influence of the temperature distribution of the first reflection surface on the image of the pattern projected on the substrate is reduced by the temperature distribution of the second reflection surface. The exposure apparatus according to claim 2, wherein: 前記供給部は、前記第１反射面に沿った気体の流れの方向と前記第２反射面に沿った気体の流れの方向とが同じになるように気体を供給する、ことを特徴とする請求項２又は３に記載の露光装置。   The said supply part supplies gas so that the direction of the gas flow along the said 1st reflective surface and the direction of the gas flow along the said 2nd reflective surface may become the same. Item 4. The exposure apparatus according to Item 2 or 3. 前記投影光学系は、凸面鏡と、前記第１反射面で反射された前記露光光を前記凸面鏡に向けて反射するとともに前記凸面鏡で反射された前記露光光を前記第２反射面に向けて反射する凹面鏡とを更に含み、
前記露光装置は、前記凸面鏡と前記凹面鏡との間における気体の流れの方向が、前記反射面に沿った気体の流れの方向と異なるように、前記凸面鏡と前記凹面鏡との間に気体を供給する第２供給部を更に含む、ことを特徴とする請求項２乃至４のうちいずれか１項に記載の露光装置。 The projection optical system reflects the exposure light reflected by the convex mirror and the first reflecting surface toward the convex mirror and reflects the exposure light reflected by the convex mirror toward the second reflecting surface. Further including a concave mirror,
The exposure apparatus supplies gas between the convex mirror and the concave mirror so that a gas flow direction between the convex mirror and the concave mirror is different from a gas flow direction along the reflective surface. The exposure apparatus according to claim 2, further comprising a second supply unit. 前記第２供給部は、前記凸面鏡と前記凹面鏡との間における気体の流れの方向が、前記露光光が前記凸面鏡に入射する方向および前記露光光が前記凸面鏡で反射される方向を含む面に平行な方向になるように、前記凸面鏡と前記凹面鏡との間に気体を供給する、ことを特徴とする請求項５に記載の露光装置。   In the second supply unit, the direction of gas flow between the convex mirror and the concave mirror is parallel to a plane including a direction in which the exposure light is incident on the convex mirror and a direction in which the exposure light is reflected by the convex mirror. 6. The exposure apparatus according to claim 5, wherein gas is supplied between the convex mirror and the concave mirror so as to be in a proper direction. 前記供給部は、前記反射面に沿った気体の流れの方向と、前記露光光が前記反射面に入射する方向および前記露光光が前記反射面で反射される方向を含む面との間の角度が８０度から１００度の範囲に収まるように気体を供給する、ことを特徴とする請求項１乃至６のうちいずれか１項に記載の露光装置。   The supply unit includes an angle between a gas flow direction along the reflection surface and a plane including a direction in which the exposure light is incident on the reflection surface and a direction in which the exposure light is reflected on the reflection surface. The exposure apparatus according to claim 1, wherein the gas is supplied so that the angle is within a range of 80 degrees to 100 degrees. 前記供給部は、前記反射面に沿った気体の流れの方向が、前記露光光が前記反射面に入射する方向および前記露光光が前記反射面で反射される方向を含む面に垂直な方向になるように気体を供給する、ことを特徴とする請求項１乃至７のうちいずれか１項に記載の露光装置。   The supply unit has a gas flow direction along the reflection surface in a direction perpendicular to a plane including a direction in which the exposure light is incident on the reflection surface and a direction in which the exposure light is reflected on the reflection surface. The exposure apparatus according to claim 1, wherein a gas is supplied in such a manner. 前記供給部は、前記反射面の温度が目標温度になるように、前記光学素子に対して供給する気体の流量および温度の少なくとも一方を制御する、ことを特徴とする請求項１乃至８のうちいずれか１項に記載の露光装置。   The said supply part controls at least one of the flow volume and temperature of the gas supplied with respect to the said optical element so that the temperature of the said reflective surface may turn into target temperature, The Claim 1 thru | or 8 characterized by the above-mentioned. The exposure apparatus according to any one of the above. 前記反射面に沿って流れた気体を回収する回収部を更に含む、ことを特徴とする請求項１乃至９のうちいずれか１項に記載の露光装置。   The exposure apparatus according to claim 1, further comprising a recovery unit that recovers gas flowing along the reflection surface. 前記反射面は平面である、ことを特徴とする請求項１乃至１０のうちいずれか１項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the reflecting surface is a flat surface. 露光光を用いて、原版のパターンを基板上に転写する露光装置であって、
前記原版を介して入射した前記露光光を反射する第１反射面と、前記基板に向けて前記露光光を反射する第２反射面とを有する光学素子を含み、前記原版の前記パターンを前記基板上に投影する投影光学系と、
前記光学素子に対して、前記第１反射面および第２反射面のそれぞれに沿うように気体を供給する供給部と、
を含み、
前記供給部は、前記基板に投影される前記パターンの像に対して前記第１反射面の温度分布が与える影響が、前記第２反射面の温度分布によって低減されるように気体を供給する、ことを特徴とする露光装置。 An exposure apparatus for transferring an original pattern onto a substrate using exposure light,
An optical element having a first reflection surface that reflects the exposure light incident through the original plate and a second reflection surface that reflects the exposure light toward the substrate, wherein the pattern of the original plate is the substrate. A projection optical system for projecting on top,
A supply unit for supplying a gas along each of the first reflection surface and the second reflection surface to the optical element;
Including
The supply unit supplies gas so that the influence of the temperature distribution of the first reflection surface on the image of the pattern projected on the substrate is reduced by the temperature distribution of the second reflection surface. An exposure apparatus characterized by that. 請求項１乃至１２のうちいずれか１項に記載の露光装置を用いて基板を露光する工程と、
前記工程で露光された前記基板を現像する工程と、
を含むことを特徴とする物品の製造方法。 A step of exposing the substrate using the exposure apparatus according to any one of claims 1 to 12,
Developing the substrate exposed in the step;
A method for producing an article comprising:
JP2015021487A 2015-02-05 2015-02-05 Exposure device, and method of manufacturing article Pending JP2016143869A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190039873A (en) * 2017-10-06 2019-04-16 캐논 가부시끼가이샤 Exposure apparatus and method of manufacturing article
CN113759672A (en) * 2021-09-07 2021-12-07 昆山龙腾光电股份有限公司 Exposure system and exposure method
JP7425991B2 (en) 2019-05-24 2024-02-01 三菱ケミカル株式会社 Block copolymer and its manufacturing method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190039873A (en) * 2017-10-06 2019-04-16 캐논 가부시끼가이샤 Exposure apparatus and method of manufacturing article
JP2019070724A (en) * 2017-10-06 2019-05-09 キヤノン株式会社 Exposure apparatus and method for manufacturing article
JP7016661B2 (en) 2017-10-06 2022-02-07 キヤノン株式会社 Method of manufacturing exposure equipment and articles
KR102393140B1 (en) * 2017-10-06 2022-05-02 캐논 가부시끼가이샤 Exposure apparatus and method of manufacturing article
JP7425991B2 (en) 2019-05-24 2024-02-01 三菱ケミカル株式会社 Block copolymer and its manufacturing method
CN113759672A (en) * 2021-09-07 2021-12-07 昆山龙腾光电股份有限公司 Exposure system and exposure method
CN113759672B (en) * 2021-09-07 2024-06-11 昆山龙腾光电股份有限公司 Exposure system and exposure method

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