JP2016114400A5 - - Google Patents

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Publication number
JP2016114400A5
JP2016114400A5 JP2014251620A JP2014251620A JP2016114400A5 JP 2016114400 A5 JP2016114400 A5 JP 2016114400A5 JP 2014251620 A JP2014251620 A JP 2014251620A JP 2014251620 A JP2014251620 A JP 2014251620A JP 2016114400 A5 JP2016114400 A5 JP 2016114400A5
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JP
Japan
Prior art keywords
electrode plate
matrix
voltage
droplets
plate
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JP2014251620A
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English (en)
Japanese (ja)
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JP2016114400A (ja
JP6264275B2 (ja
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Priority to JP2014251620A priority Critical patent/JP6264275B2/ja
Priority claimed from JP2014251620A external-priority patent/JP6264275B2/ja
Priority to US14/798,691 priority patent/US9757745B2/en
Priority to US14/820,622 priority patent/US20160172174A1/en
Publication of JP2016114400A publication Critical patent/JP2016114400A/ja
Publication of JP2016114400A5 publication Critical patent/JP2016114400A5/ja
Application granted granted Critical
Publication of JP6264275B2 publication Critical patent/JP6264275B2/ja
Active legal-status Critical Current
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JP2014251620A 2014-12-12 2014-12-12 マトリックス膜形成装置 Active JP6264275B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014251620A JP6264275B2 (ja) 2014-12-12 2014-12-12 マトリックス膜形成装置
US14/798,691 US9757745B2 (en) 2014-12-12 2015-07-14 Matrix film deposition system
US14/820,622 US20160172174A1 (en) 2014-12-12 2015-08-07 Matrix film forming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014251620A JP6264275B2 (ja) 2014-12-12 2014-12-12 マトリックス膜形成装置

Publications (3)

Publication Number Publication Date
JP2016114400A JP2016114400A (ja) 2016-06-23
JP2016114400A5 true JP2016114400A5 (https=) 2017-06-22
JP6264275B2 JP6264275B2 (ja) 2018-01-24

Family

ID=56110227

Family Applications (1)

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JP2014251620A Active JP6264275B2 (ja) 2014-12-12 2014-12-12 マトリックス膜形成装置

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US (2) US9757745B2 (https=)
JP (1) JP6264275B2 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017154153A1 (ja) * 2016-03-09 2017-09-14 株式会社島津製作所 質量分析装置及び該装置を用いた生体試料の分析方法
JP6672575B2 (ja) * 2016-03-25 2020-03-25 アネスト岩田株式会社 静電噴霧装置
US11116006B2 (en) 2016-12-16 2021-09-07 Qualcomm Incorporated Uplink transmission parameter selection for random access initial message transmission and retransmission
KR102037910B1 (ko) 2017-03-27 2019-10-30 세메스 주식회사 코팅 장치 및 코팅 방법
KR102180624B1 (ko) 2017-10-11 2020-11-18 주식회사 엘지화학 Maldi 질량분석법을 이용한 고분자의 정량분석방법 및 고분자 정량분석을 위한 maldi 질량분석용 시편의 제조방법
US20200243318A1 (en) * 2017-11-30 2020-07-30 Shimadzu Corporation MATRlX FILM DEPOSITION SYSTEM
CN108254950B (zh) * 2018-02-09 2021-01-08 京东方科技集团股份有限公司 一种量子点小球喷洒设备
CN108580075A (zh) * 2018-05-18 2018-09-28 济南维优科技开发有限公司 一种在双电场作用下输送带传送固体粉末的静电涂覆装置
CN108704772B (zh) * 2018-07-13 2024-02-13 金华职业技术学院 一种大分子沉积装置
CN108739770A (zh) * 2018-08-01 2018-11-06 山东省农药科学研究院 一种电场偏转式省药静电喷雾装置及其使用方法
KR102362175B1 (ko) 2018-08-30 2022-02-11 주식회사 엘지화학 Maldi 질량 분석을 이용한 고분자의 상대적 정량분석방법
DE112019006947B4 (de) 2019-03-01 2023-09-28 Shimadzu Corporation Matrixschichtaufbringungssystem und Matrixschichtaufbringungsverfahren
KR102362170B1 (ko) * 2019-04-08 2022-02-11 주식회사 엘지화학 Maldi 질량분석을 이용한 고분자의 상대적 정량분석방법
CN110170413B (zh) * 2019-05-31 2020-11-24 唐山佐仑环保科技有限公司 一种光触媒杀菌玻璃的喷涂成膜系统
KR102691590B1 (ko) * 2020-01-21 2024-08-05 가부시키가이샤 니콘 미스트 성막 장치 및 미스트 성막 방법
CN111871634B (zh) * 2020-07-26 2021-07-16 上海交通大学 一种基于凸轮结构的高速液滴发生装置
KR102622119B1 (ko) * 2021-09-13 2024-01-09 주식회사 고산테크 오버코팅 방지형 전기분사식 코팅 장치 및 오버코팅 방지 시스템

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US3369252A (en) * 1964-06-10 1968-02-13 Dick Co Ab Ink drop printer
JPS5118747A (en) * 1974-08-06 1976-02-14 Matsushita Electric Industrial Co Ltd Seidenshikitosoki
US20040119010A1 (en) * 2002-11-01 2004-06-24 The Regents Of The University Of Colorado Quantitative analysis of protein isoforms using matrix-assisted laser desorption/ionization time of flight mass spectrometry
JP4074921B2 (ja) * 2003-03-14 2008-04-16 日本電気株式会社 質量分析システムおよび分析方法
WO2007089650A2 (en) * 2006-01-26 2007-08-09 Nanoselect, Inc. Electrospray deposition: devices and methods thereof
US20080067345A1 (en) * 2006-04-15 2008-03-20 Fenn John B Method for creating multiply charged ions for MALDI mass spectrometry (ESMALDI)
US7938516B2 (en) * 2008-08-07 2011-05-10 Eastman Kodak Company Continuous inkjet printing system and method for producing selective deflection of droplets formed during different phases of a common charge electrode
EP2582466B1 (en) * 2010-06-21 2014-04-30 Beneq OY Apparatus and method for coating glass substrate
CN102985593B (zh) * 2010-06-21 2015-04-01 Beneq有限公司 用于涂布玻璃基板的设备和方法
JP5949252B2 (ja) 2011-12-02 2016-07-06 株式会社島津製作所 Ｍａｌｄｉ用試料作成装置および試料作成方法

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