JP2016103592A - Coil component and manufacturing method of the same - Google Patents

Coil component and manufacturing method of the same Download PDF

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JP2016103592A
JP2016103592A JP2014241875A JP2014241875A JP2016103592A JP 2016103592 A JP2016103592 A JP 2016103592A JP 2014241875 A JP2014241875 A JP 2014241875A JP 2014241875 A JP2014241875 A JP 2014241875A JP 2016103592 A JP2016103592 A JP 2016103592A
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coil
resin
substrate
main surface
coil component
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JP6428203B2 (en
Inventor
大久保 等
Hitoshi Okubo
等 大久保
正純 荒田
Masazumi Arata
正純 荒田
太田 学
Manabu Ota
学 太田
奨 川田原
Sho Kawadahara
奨 川田原
佳宏 前田
Yoshihiro Maeda
佳宏 前田
崇宏 川原
Takahiro Kawahara
崇宏 川原
北斗 江田
Hokuto Eda
北斗 江田
佐藤 茂樹
Shigeki Sato
佐藤  茂樹
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TDK Corp
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TDK Corp
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Priority to JP2014241875A priority Critical patent/JP6428203B2/en
Priority to US14/951,004 priority patent/US10468184B2/en
Priority to CN201510843976.XA priority patent/CN105655101A/en
Priority to CN202010092124.2A priority patent/CN111210988A/en
Priority to CN202010092127.6A priority patent/CN111276316B/en
Priority to KR1020150166138A priority patent/KR101751224B1/en
Priority to TW104139764A priority patent/TWI581278B/en
Publication of JP2016103592A publication Critical patent/JP2016103592A/en
Priority to KR1020170007836A priority patent/KR20170010335A/en
Priority to KR1020170077127A priority patent/KR102264363B1/en
Application granted granted Critical
Publication of JP6428203B2 publication Critical patent/JP6428203B2/en
Priority to US16/555,169 priority patent/US10998130B2/en
Priority to US17/224,508 priority patent/US20210225588A1/en
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Abstract

PROBLEM TO BE SOLVED: To provide a coil component in which stress distortion is suppressed, and a manufacturing method of the same.SOLUTION: In a coil component 1 and a manufacturing method of the same, as a wound part 14 of a coil 13 is interposed between a plurality of resin walls 18 in a non-adhesive state, the wound part 14 of the coil 13 and the resin wall 18 can be displaced from each other. Even when a peripheral temperature is changed because use environment of the coil component 1 has a high temperature, for example, and stress is caused due to difference of thermal expansion coefficients between the wound part 14 of the coil 13 and the resin wall 18, the stress is alleviated by relative displacement of the wound part 14 of the coil 13 and the resin wall 18.SELECTED DRAWING: Figure 5

Description

本発明は、コイル部品およびその製造方法に関する。   The present invention relates to a coil component and a manufacturing method thereof.

従来、表面実装型の平面コイル素子等のコイル部品が、民生用機器、産業用機器等の電気製品に幅広く利用されている。中でも小型携帯機器においては、機能の充実化に伴い、各々のデバイスを駆動させるために単一の電源から複数の電圧を得る必要が生じてきている。そこで、このような電源用途等にも表面実装型の平面コイル素子が使用されている。   Conventionally, coil components such as surface-mount type planar coil elements have been widely used in electrical products such as consumer equipment and industrial equipment. In particular, in small portable devices, as functions are enhanced, it is necessary to obtain a plurality of voltages from a single power source in order to drive each device. Therefore, surface mount type planar coil elements are also used for such power supply applications.

このようなコイル部品は、たとえば、下記特許文献1〜3に開示されている。これらの文献に開示されたコイル部品は、基板の表裏面にそれぞれ平面渦巻き状の空芯コイルが設けられ、空芯コイルの磁芯部分において基板を貫くように設けられたスルーホール導体により空芯コイル同士が接続されている。   Such coil components are disclosed in, for example, the following Patent Documents 1 to 3. In the coil components disclosed in these documents, plane spiral air core coils are provided on the front and back surfaces of the substrate, respectively. The coils are connected.

特開2006−310716号公報JP 2006-310716 A 特開2012−089765号公報JP 2012-089765 A 特開2013−201375号公報JP 2013-201375 A

上述した空芯コイルは、基板上に設けられたシードパターンにCuなどの導体材料をめっき成長させることで形成されるが、めっき成長した後にコイルは絶縁樹脂で覆われて、絶縁樹脂が硬化される。絶縁樹脂で覆われたコイルは、絶縁樹脂と強固に接着される。周辺温度に変化があったとき(たとえば、高温環境になったとき)には、コイルと絶縁樹脂との間の熱膨張係数の差に起因する応力が生じるが、絶縁樹脂とコイルが強固に接着されている場合には、その応力が緩和されづらく応力歪みが生じ得る。   The above-described air-core coil is formed by plating and growing a conductor material such as Cu on a seed pattern provided on a substrate. After plating and growing, the coil is covered with an insulating resin and the insulating resin is cured. The The coil covered with the insulating resin is firmly bonded to the insulating resin. When the ambient temperature changes (for example, when the environment becomes high temperature), stress is generated due to the difference in thermal expansion coefficient between the coil and the insulating resin, but the insulating resin and the coil are firmly bonded. If it is, the stress is difficult to be relaxed and stress distortion may occur.

本発明は、上述の課題を解決するためになされたものであり、応力歪みの抑制が図られたコイル部品およびその製造方法を提供することを目的とする。   The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a coil component in which stress distortion is suppressed and a manufacturing method thereof.

本発明の一側面に係るコイル部品は、基板と、基板の主面上に、めっき成長で設けられたコイルと、基板の主面上に設けられ、コイルの巻回部が非接着状態で間に介在する複数の樹脂壁を有する樹脂体と、磁性粉含有樹脂からなり、基板の主面のコイルと樹脂体とを一体的に覆う被覆樹脂とを備える。   A coil component according to one aspect of the present invention is provided on a substrate, a coil provided by plating growth on the main surface of the substrate, and provided on the main surface of the substrate, and the winding portion of the coil is not bonded. A resin body having a plurality of resin walls interposed therebetween, and a coating resin made of a magnetic powder-containing resin and integrally covering the coil on the main surface of the substrate and the resin body.

このようなコイル部品においては、複数の樹脂壁の間にコイルの巻回部が非接着状態で介在するため、コイルの巻回部と樹脂壁とが互いに対して変位可能である。そのため、周辺温度に変化があり、コイルの巻回部と樹脂壁との間の熱膨張係数の差に起因する応力が生じた場合であっても、コイルの巻回部と樹脂壁とが相対移動することでその応力が緩和される。   In such a coil component, since the coil winding portion is interposed between the plurality of resin walls in a non-adhered state, the coil winding portion and the resin wall can be displaced with respect to each other. Therefore, even if there is a change in the ambient temperature and a stress is caused by the difference in thermal expansion coefficient between the coil winding portion and the resin wall, the coil winding portion and the resin wall are relatively The stress is relieved by moving.

また、樹脂体の樹脂壁の高さがコイルの巻回部の高さより高い態様であってもよい。この場合、巻回部は、高さ方向にわたって設計寸法どおりの厚さとなり得る。また、巻回部同士が樹脂壁を越えて接する事態が有意に回避される。   Moreover, the aspect whose resin wall height of a resin body is higher than the height of the winding part of a coil may be sufficient. In this case, the winding portion can have a thickness according to the design dimension over the height direction. Moreover, the situation where winding parts contact | connect over a resin wall is significantly avoided.

また、樹脂体の樹脂壁の断面形状が矩形状である態様であってもよい。このとき、樹脂体の樹脂壁のアスペクト比が1より大きく、該樹脂壁が基板の主面の法線方向に沿って長く延びている態様であってもよい。   Moreover, the aspect whose cross-sectional shape of the resin wall of a resin body is a rectangular shape may be sufficient. At this time, the aspect ratio of the resin wall of the resin body may be greater than 1, and the resin wall may extend long along the normal direction of the main surface of the substrate.

また、コイルの巻回部の断面形状が矩形状である態様であってもよい。このとき、コイルの巻回部の断面はアスペクト比が1より大きく、該巻回部の断面が基板の主面の法線方向に沿って長く延びている態様であってもよい。   Moreover, the aspect whose cross-sectional shape of the winding part of a coil is a rectangular shape may be sufficient. At this time, the cross section of the winding portion of the coil may have an aspect ratio greater than 1, and the cross section of the winding portion may extend long along the normal direction of the main surface of the substrate.

また、コイルの巻回部の上面に接するように設けられた絶縁体をさらに備える態様であってもよい。   Moreover, the aspect further provided with the insulator provided so that the upper surface of the winding part of a coil may be sufficient may be sufficient.

また、基板の主面上に複数並んだ樹脂壁のうち、最外に位置する樹脂壁の厚さが内側に位置する樹脂壁の厚さより厚い態様であってもよい。   Further, among the resin walls arranged on the main surface of the substrate, the outermost resin wall may be thicker than the resin wall located inside.

また、樹脂体の樹脂壁は、幅が5〜30μmの範囲であり、かつ、高さが30〜300μmの範囲である態様であってもよい。   Further, the resin wall of the resin body may have an aspect in which the width is in the range of 5 to 30 μm and the height is in the range of 30 to 300 μm.

本発明の一側面に係るコイル部品は、複数の樹脂壁を有する樹脂体が主面上に設けられた基板を準備する工程と、基板の主面上に、樹脂壁の間に巻回部が非接着状態で介在するように、コイルをめっき成長させる工程と、磁性粉含有樹脂からなる被覆樹脂で、基板の主面のコイルと樹脂体とを一体的に覆う工程とを含む。   A coil component according to one aspect of the present invention includes a step of preparing a substrate in which a resin body having a plurality of resin walls is provided on a main surface, and a winding portion between the resin walls on the main surface of the substrate. A step of plating and growing the coil so as to intervene in a non-adhered state, and a step of integrally covering the coil and the resin body on the main surface of the substrate with a coating resin made of a magnetic powder-containing resin.

本発明によれば、応力歪みの抑制が図られたコイル部品およびその製造方法が提供される。   According to the present invention, a coil component in which stress strain is suppressed and a method for manufacturing the same are provided.

図1は、本発明の実施形態に係るコイル部品の概略斜視図である。FIG. 1 is a schematic perspective view of a coil component according to an embodiment of the present invention. 図2は、図1に示すコイル部品の製造に用いられる基板を示した斜視図である。FIG. 2 is a perspective view showing a substrate used for manufacturing the coil component shown in FIG. 図3は、図2に示した基板のシードパターンを示した平面図である。FIG. 3 is a plan view showing a seed pattern of the substrate shown in FIG. 図4は、図1に示すコイル部品の製造方法の一工程を示した斜視図である。FIG. 4 is a perspective view showing one step of the method of manufacturing the coil component shown in FIG. 図5は、図4のV−V線断面図である。5 is a cross-sectional view taken along line VV in FIG. 図6は、コイルの巻回部上に設けられる絶縁体を示した断面図である。FIG. 6 is a cross-sectional view showing an insulator provided on the winding portion of the coil. 図7は、図1に示すコイル部品の製造方法の一工程を示した斜視図である。FIG. 7 is a perspective view showing one step of the method of manufacturing the coil component shown in FIG. 図8は、図1に示すコイル部品の製造方法の一工程を示した斜視図である。FIG. 8 is a perspective view showing one step of the method of manufacturing the coil component shown in FIG. 図9は、従来技術においてコイルをめっき成長させたときの様子を示した断面図である。FIG. 9 is a cross-sectional view showing a state in which a coil is grown by plating in the prior art.

以下、添付図面を参照して、本発明の実施形態について詳細に説明する。なお、説明において、同一要素又は同一機能を有する要素には、同一符号を用いることとし、重複する説明は省略する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the description, the same reference numerals are used for the same elements or elements having the same function, and redundant description is omitted.

まず、本発明の実施形態に係るコイル部品の構造について、図1〜4を参照しつつ説明する。説明の便宜上、図示のようにXYZ座標を設定する。すなわち、平面コイル素子の厚さ方向をZ方向、外部端子電極の対面方向をY方向、Z方向とY方向とに直交する方向をX方向と設定する。   First, the structure of the coil component according to the embodiment of the present invention will be described with reference to FIGS. For convenience of explanation, XYZ coordinates are set as shown. That is, the thickness direction of the planar coil element is set as the Z direction, the facing direction of the external terminal electrode is set as the Y direction, and the direction orthogonal to the Z direction and the Y direction is set as the X direction.

コイル部品1は、略直方体形状を呈する本体部10と、本体部10の対向する一対の端面を覆うようにして設けられた一対の外部端子電極30A、30Bとによって構成されている。コイル部品1は、一例として、長辺2.0mm、短辺1.6mm、高さ0.9mmの寸法で設計される。   The coil component 1 includes a main body portion 10 having a substantially rectangular parallelepiped shape and a pair of external terminal electrodes 30A and 30B provided so as to cover a pair of opposed end faces of the main body portion 10. As an example, the coil component 1 is designed with dimensions of a long side of 2.0 mm, a short side of 1.6 mm, and a height of 0.9 mm.

以下では、本体部10を作製する手順を示しつつ、併せて、コイル部品1の構造についても説明する。   Below, while showing the procedure of producing the main-body part 10, the structure of the coil component 1 is also demonstrated.

本体部10は、図2に示す基板11を含んでいる。基板11は、非磁性の絶縁材料で構成された平板矩形状の部材である。基板11の中央部分には、主面11a、11b間を繋ぐように貫通された略円形の開口12が設けられている。基板11としては、ガラスクロスにシアネート樹脂(BT(ビスマレイミド・トリアジン)レジン:登録商標)が含浸された基板で、板厚60μmのものを用いることができる。なお、BTレジンのほか、ポリイミド、アラミド等を用いることもできる。基板11の材料としては、セラミックやガラスを用いることもできる。基板11の材料としては、大量生産されているプリント基板材料が好ましく、特にBTプリント基板、FR4プリント基板、あるいはFR5プリント基板に用いられる樹脂材料が最も好ましい。   The main body 10 includes a substrate 11 shown in FIG. The substrate 11 is a flat rectangular member made of a nonmagnetic insulating material. A substantially circular opening 12 is provided in the center portion of the substrate 11 so as to pass through the main surfaces 11a and 11b. As the substrate 11, a substrate in which a glass cloth is impregnated with a cyanate resin (BT (bismaleimide / triazine) resin: registered trademark) having a plate thickness of 60 μm can be used. In addition to BT resin, polyimide, aramid, etc. can also be used. As the material of the substrate 11, ceramic or glass can be used. The material of the substrate 11 is preferably a mass-produced printed circuit board material, and most preferably a resin material used for a BT printed circuit board, FR4 printed circuit board, or FR5 printed circuit board.

基板11には、図3に示すように、それぞれの主面11a、11bに、後述するコイル13をめっき成長させるためのシードパターン13Aが形成されている。シードパターン13Aは、基板11の開口12の周りを回る螺旋パターン14Aと、基板11のY方向に関する端部に形成された端部パターン15Aとを有し、これらのパターン14A、15Aが連続的かつ一体的に形成されている。なお、一方の主面11a側に設けられるコイル13と他方の主面11b側に設けられるコイル13とでは電極引き出し方向が逆であり、そのため、一方の主面11a側の端部パターン15Aと他方の主面11b側の端部パターンとは、基板11のY方向に関する互いに異なる端部に形成されている。   As shown in FIG. 3, a seed pattern 13A for plating growth of a coil 13 described later is formed on the main surface 11a, 11b of the substrate 11, as shown in FIG. The seed pattern 13A has a spiral pattern 14A that turns around the opening 12 of the substrate 11, and an end pattern 15A that is formed at the end of the substrate 11 in the Y direction, and these patterns 14A, 15A are continuous and It is integrally formed. The coil 13 provided on the one main surface 11a side and the coil 13 provided on the other main surface 11b side have opposite electrode drawing directions, so that the end pattern 15A on the one main surface 11a side and the other The end pattern on the main surface 11b side is formed at different end portions of the substrate 11 in the Y direction.

各主面11a、11bには、シードパターン13Aに加えて、導通パターン16が設けられている。後述するコイル13をめっき成長させるとき、シードパターン13Aが形成された基板11はウエハ状態である。すなわち、基板ウエハの表面に、複数のシードパターン13Aが規則的に並んだ状態である。このような状態で、複数のシードパターン13Aそれぞれに電圧を印加するためには、隣り合うシードパターン13A同士を電気的に接続しておく必要がある。導通パターン16は、その電気的な接続をおこなうためのものであり、めっき成長の際には利用されるが、めっき成長後は不要となる。   In addition to the seed pattern 13A, a conductive pattern 16 is provided on each main surface 11a, 11b. When the later-described coil 13 is plated and grown, the substrate 11 on which the seed pattern 13A is formed is in a wafer state. That is, the plurality of seed patterns 13A are regularly arranged on the surface of the substrate wafer. In such a state, in order to apply a voltage to each of the plurality of seed patterns 13A, it is necessary to electrically connect adjacent seed patterns 13A. The conductive pattern 16 is for electrical connection and is used during plating growth, but is unnecessary after plating growth.

図2に戻って、基板11の各主面11a、11b上には、樹脂体17が設けられている。樹脂体17は、公知のフォトリソグラフィーによってパターニングされた厚膜レジストである。樹脂体17は、コイル13の巻回部14の成長領域を画定する樹脂壁18と、コイル13の引出電極部15の成長領域を画定する樹脂壁19とを有している。また、樹脂体17は、上述した導通パターン16上に配置され、導通パターン16におけるめっき成長を防止するための樹脂壁20も有している。   Returning to FIG. 2, a resin body 17 is provided on each main surface 11 a, 11 b of the substrate 11. The resin body 17 is a thick film resist patterned by known photolithography. The resin body 17 includes a resin wall 18 that defines the growth region of the winding portion 14 of the coil 13 and a resin wall 19 that defines the growth region of the extraction electrode portion 15 of the coil 13. The resin body 17 is also disposed on the conductive pattern 16 described above, and also has a resin wall 20 for preventing plating growth in the conductive pattern 16.

図4は、シードパターン13Aを用いてコイル13をめっき成長させたときの基板11の状態を示している。コイル13のめっき成長には、公知のめっき成長方法を採用することができる。   FIG. 4 shows the state of the substrate 11 when the coil 13 is grown by plating using the seed pattern 13A. For plating growth of the coil 13, a known plating growth method can be employed.

コイル13は、銅で構成されており、シードパターン13Aの螺旋パターン14A上に形成された巻回部14と、シードパターン13Aの端部パターン15A上に形成された引出電極部15とを有している。コイル13の形状は、平面視したときに、シードパターン13Aの形状と略同一である。すなわち、コイル13およびシードパターン13Aは、基板11の主面11a、11bに平行に延在する平面渦巻き状の空芯コイルの形状となっている。より詳しくは、基板上面11aの巻回部14は、上面側から見て外側に向かう方向に沿って左回転の渦巻きであり、基板下面11bの巻回部14は、下面側から見て、外側に向かう方向に沿って左回転の渦巻きである。開口12において端部同士が接続されたこのような両面のコイル13に一方向に電流を流したときには、両コイル13の電流の流れる回転方向が同一となるため、コイル13で発生する磁束が重畳して強め合う。   The coil 13 is made of copper, and has a winding portion 14 formed on the spiral pattern 14A of the seed pattern 13A and an extraction electrode portion 15 formed on the end pattern 15A of the seed pattern 13A. ing. The shape of the coil 13 is substantially the same as the shape of the seed pattern 13A when viewed in plan. That is, the coil 13 and the seed pattern 13 </ b> A have a shape of a plane spiral air-core coil that extends in parallel to the main surfaces 11 a and 11 b of the substrate 11. More specifically, the winding portion 14 of the substrate upper surface 11a is a spiral that rotates counterclockwise along the direction toward the outside when viewed from the upper surface side, and the winding portion 14 of the substrate lower surface 11b is the outer surface when viewed from the lower surface side. It is a swirl that rotates counterclockwise along the direction toward. When current flows in one direction through such a double-sided coil 13 whose ends are connected to each other in the opening 12, the rotational direction in which the current flows in both coils 13 is the same, so that the magnetic flux generated in the coil 13 is superimposed. And strengthen each other.

図5は、図4に示しためっき成長後の基板11の状態を示しており、図4のV−V線断面図である。なお、図5では、シードパターン13Aの図示は省略している。   FIG. 5 shows a state of the substrate 11 after the plating growth shown in FIG. 4, and is a cross-sectional view taken along the line VV of FIG. In FIG. 5, the seed pattern 13A is not shown.

図5に示すように、基板11上には、基板11の法線方向(Z方向)に沿って長く延びる矩形状断面の樹脂壁18が形成されており、これらの樹脂壁18の間においてコイル13の巻回部14がZ方向に成長する。コイル13の巻回部14は、その成長領域が、めっき成長前に基板11上に形成された樹脂壁18によって予め画定されている。そのため、コイル13の巻回部14は、隣り合う2つの樹脂壁18の間に画成された空間を充たすように成長して、樹脂壁18の間に画成された空間と同一の形状に形成され、基板11の法線方向(Z方向)に沿って長く延びる形状となる。すなわち、樹脂壁18の間に画成される空間の形状を調整することで、コイル13の巻回部14の形状が調整され、設計したとおりの形状にコイル13の巻回部14を形成することができる。コイル13の巻回部14の断面寸法は、一例として、高さ80〜260μm、幅(厚さ)40〜260μm、アスペクト比1〜5である。コイル13の巻回部14のアスペクト比は2〜5であってもよい。樹脂壁18の断面寸法は、一例として、高さ50〜300μm、幅(厚さ)5〜30μm、アスペクト比5〜30である。樹脂壁18の断面寸法は、高さ180〜300μm、幅(厚さ)5〜12μm、アスペクト比15〜30であってもよい。   As shown in FIG. 5, a resin wall 18 having a rectangular cross section that extends long along the normal direction (Z direction) of the substrate 11 is formed on the substrate 11, and a coil is interposed between these resin walls 18. Thirteen winding portions 14 grow in the Z direction. The growth region of the winding portion 14 of the coil 13 is defined in advance by a resin wall 18 formed on the substrate 11 before plating growth. Therefore, the winding portion 14 of the coil 13 grows so as to fill a space defined between two adjacent resin walls 18 and has the same shape as the space defined between the resin walls 18. It is formed and has a shape extending long along the normal direction (Z direction) of the substrate 11. That is, by adjusting the shape of the space defined between the resin walls 18, the shape of the winding portion 14 of the coil 13 is adjusted, and the winding portion 14 of the coil 13 is formed in the shape as designed. be able to. The cross-sectional dimensions of the winding part 14 of the coil 13 are, for example, a height of 80 to 260 μm, a width (thickness) of 40 to 260 μm, and an aspect ratio of 1 to 5. The aspect ratio of the winding part 14 of the coil 13 may be 2-5. The cross-sectional dimensions of the resin wall 18 are, for example, a height of 50 to 300 μm, a width (thickness) of 5 to 30 μm, and an aspect ratio of 5 to 30. The cross-sectional dimensions of the resin wall 18 may be a height of 180 to 300 μm, a width (thickness) of 5 to 12 μm, and an aspect ratio of 15 to 30.

コイル13の巻回部14は、隣り合う2つの樹脂壁18の間を成長する際、成長領域を画定する樹脂壁18の内側面に接しながら成長していく。このとき、コイル13の巻回部14と樹脂壁18との間には、機械的結合も化学的結合も生じない。すなわち、コイル13の巻回部14は、樹脂壁18と接着されないままめっき成長し、非接着状態で樹脂壁18の間に介在する。本明細書において「非接着状態」とは、アンカー効果等の機械的結合および共有結合等の化学的結合が生じていない状態をいう。   When the winding portion 14 of the coil 13 grows between two adjacent resin walls 18, it grows in contact with the inner surface of the resin wall 18 that defines the growth region. At this time, neither mechanical bonding nor chemical bonding occurs between the winding portion 14 of the coil 13 and the resin wall 18. That is, the winding part 14 of the coil 13 is plated and grown without being bonded to the resin wall 18 and is interposed between the resin walls 18 in a non-bonded state. In the present specification, the “non-adhesion state” refers to a state where no mechanical bond such as an anchor effect or chemical bond such as a covalent bond occurs.

図5に示すとおり、コイル13の巻回部14の高さhは、樹脂壁18の高さHよりも低いこと(h<H)が好ましい。すなわち、コイル13の巻回部14のめっき成長が樹脂壁18の高さHよりも低い位置で止まるように調整することが好ましい。コイル13の巻回部14の高さhが樹脂壁18の高さHよりも低いと、巻回部14は高さ方向にわたって設計寸法どおりの厚さとなる。また、コイル13の巻回部14の高さhが、樹脂壁18の高さHより高いと、隣り合う巻回部14同士が接触するなどしてコイル13の耐圧抵抗が低下するためである。   As shown in FIG. 5, the height h of the winding portion 14 of the coil 13 is preferably lower than the height H of the resin wall 18 (h <H). That is, it is preferable to adjust so that the plating growth of the winding portion 14 of the coil 13 stops at a position lower than the height H of the resin wall 18. When the height h of the winding part 14 of the coil 13 is lower than the height H of the resin wall 18, the winding part 14 has a thickness as designed across the height direction. Further, if the height h of the winding portion 14 of the coil 13 is higher than the height H of the resin wall 18, the adjacent winding portions 14 come into contact with each other, and the withstand voltage resistance of the coil 13 decreases. .

また、コイル13の巻回部14の厚さDは、高さ方向にわたって均一になっている。これは、隣り合う樹脂壁18の間隔が高さ方向にわたって均一になっているためである。   Moreover, the thickness D of the winding part 14 of the coil 13 is uniform over the height direction. This is because the interval between the adjacent resin walls 18 is uniform over the height direction.

さらに、コイル13の巻回部14の頂面14aは、基板11の主面11aに対して略平行になっている。これは、めっき成長のときに、頂面が基板11の主面11aに対して平行を保ったままコイル13の巻回部14が成長するためである。   Furthermore, the top surface 14 a of the winding portion 14 of the coil 13 is substantially parallel to the main surface 11 a of the substrate 11. This is because the winding portion 14 of the coil 13 grows while the top surface is kept parallel to the main surface 11a of the substrate 11 during plating growth.

なお、各樹脂壁18の厚さd1、d2も、コイル13の巻回部14同様、高さ方向にわたって均一となっている。その結果、隣り合うコイル13の巻回部14の間隔が、高さ方向にわたって均一になる。すなわち、コイル13の巻回部14は、高さ方向に関して局所的に薄くなっている箇所(つまり、局所的に耐圧抵抗が低下している箇所)が存在しない、または存在しにくい構造となっている。   It should be noted that the thicknesses d1 and d2 of the resin walls 18 are also uniform in the height direction, like the winding part 14 of the coil 13. As a result, the interval between the winding portions 14 of the adjacent coils 13 is uniform over the height direction. That is, the winding portion 14 of the coil 13 has a structure in which there is no or a portion that is locally thin in the height direction (that is, a portion where the withstand voltage resistance is locally reduced). Yes.

また、樹脂壁18によって画成された空間は、上端が開放されており、樹脂壁18の上端部が巻回部14の上側を覆うように回り込んでいないため、巻回部14の上側の設計自由度が高い。すなわち、巻回部14の上に任意の層を形成する態様も何の層も形成しない態様も選択し得る。   Moreover, since the upper end of the space defined by the resin wall 18 is open and the upper end portion of the resin wall 18 does not go around so as to cover the upper side of the winding portion 14, High design freedom. That is, an aspect in which an arbitrary layer is formed on the winding portion 14 or an aspect in which no layer is formed can be selected.

巻回部14の上に層を形成する場合には、各種の層形態や層材料を選択し得る。たとえば、図6に示すように、巻回部14の上に、後述する被覆樹脂21に含まれる金属磁性粉と巻回部14との間の絶縁性を高めるために、絶縁体40を設けることができる。絶縁体40は、絶縁樹脂または絶縁磁性材料で構成することができる。また、絶縁体40は、巻回部14の上面14aに直接的または間接的に接するとともに、巻回部14と樹脂壁18とを一体的に覆っている。なお、絶縁体40は、巻回部14のみを選択的に覆う構成にすることもできる。また、巻回部14と絶縁体40との間の接合性を高めるために、所定の接合層(たとえば、銅めっきの黒化層)41を設けることができる。   When forming a layer on the winding part 14, various layer forms and layer materials can be selected. For example, as shown in FIG. 6, an insulator 40 is provided on the winding portion 14 in order to improve the insulation between the metal magnetic powder contained in the coating resin 21 described later and the winding portion 14. Can do. The insulator 40 can be made of an insulating resin or an insulating magnetic material. The insulator 40 directly or indirectly contacts the upper surface 14a of the winding portion 14 and integrally covers the winding portion 14 and the resin wall 18. The insulator 40 may be configured to selectively cover only the winding part 14. In addition, a predetermined bonding layer (for example, a blackened layer of copper plating) 41 can be provided in order to improve the bonding property between the winding part 14 and the insulator 40.

さらに、図5に示すとおり、複数の樹脂壁18のうち、最外に位置する樹脂壁18の厚さd1が内側に位置する樹脂壁18の厚さd2より厚いこと(d1>d2)が好ましい。この場合、コイル部品1の作製時や使用時に受けるZ方向の圧力に対して剛性が付与される。厚さが厚い樹脂壁18を最外位置に配置することで、この部分において主に上記圧力を受け止める。剛性の観点からは、両端に位置する樹脂壁18の両方が、内側に位置する樹脂壁18の厚さより厚いことが好ましい。   Furthermore, as shown in FIG. 5, it is preferable that the thickness d1 of the outermost resin wall 18 among the plurality of resin walls 18 is thicker than the thickness d2 of the resin wall 18 positioned inside (d1> d2). . In this case, rigidity is imparted to the pressure in the Z direction that is received when the coil component 1 is produced or used. By placing the thick resin wall 18 at the outermost position, the pressure is mainly received at this portion. From the viewpoint of rigidity, it is preferable that both of the resin walls 18 located at both ends are thicker than the thickness of the resin wall 18 located inside.

なお、上述したコイル13のめっき成長は、基板11の両主面11a、11bにおいておこなわれる。両主面11a、11bのコイル13同士は、基板11の開口においてそれぞれの端部同士が接続されて導通される。   Note that the above-described plating growth of the coil 13 is performed on both main surfaces 11 a and 11 b of the substrate 11. The coils 13 on both main surfaces 11a and 11b are electrically connected to each other at their ends in the opening of the substrate 11.

基板11上にコイル13をめっき成長させた後、図7に示すように、基板11は被覆樹脂21で全体的に覆われる。すなわち、被覆樹脂21が、基板11の主面11a、11bのコイル13と樹脂体17とを一体的に覆う。樹脂体17は、被覆樹脂21内に残ったままコイル部品1の一部を構成する。被覆樹脂21は、金属磁性粉含有樹脂からなり、ウエハ状態の基板11の上に印刷され、その後、仮硬化されることにより形成される。そして、所定厚さまで被覆樹脂21を研磨した後、さらに被覆樹脂21の本硬化をおこなう。   After the coil 13 is plated and grown on the substrate 11, the substrate 11 is entirely covered with a coating resin 21 as shown in FIG. That is, the coating resin 21 integrally covers the coil 13 and the resin body 17 on the main surfaces 11 a and 11 b of the substrate 11. The resin body 17 constitutes a part of the coil component 1 while remaining in the coating resin 21. The coating resin 21 is made of a metal magnetic powder-containing resin, and is formed by printing on the substrate 11 in a wafer state and then temporarily curing. Then, after the coating resin 21 is polished to a predetermined thickness, the coating resin 21 is further cured.

被覆樹脂21を構成する金属磁性粉含有樹脂は、金属磁性粉が分散された樹脂で構成されている。金属磁性粉は、たとえば鉄ニッケル合金(パーマロイ合金)、カルボニル鉄、アモルファス、非晶質または結晶質のFeSiCr系合金、センダスト等で構成され得る。金属磁性粉含有樹脂に用いられる樹脂は、たとえば熱硬化性のエポキシ樹脂である。金属磁性粉含有樹脂に含まれる金属磁性粉の含有量は、一例として、90〜99wt%である。   The metal magnetic powder-containing resin constituting the coating resin 21 is composed of a resin in which metal magnetic powder is dispersed. The metal magnetic powder can be composed of, for example, iron-nickel alloy (permalloy alloy), carbonyl iron, amorphous, amorphous or crystalline FeSiCr alloy, sendust, and the like. The resin used for the metal magnetic powder-containing resin is, for example, a thermosetting epoxy resin. As an example, the content of the metal magnetic powder contained in the metal magnetic powder-containing resin is 90 to 99 wt%.

さらに、ウエハ状態の基板11を研磨等で所望の厚さにし、さらにダイシングしてチップ化することで、図8に示す本体部10が得られる。チップ化した後、必要に応じてバレル研磨等によりエッジの面取りをおこなってもよい。   Furthermore, the main body 10 shown in FIG. 8 is obtained by forming the wafer-like substrate 11 to a desired thickness by polishing or the like, and further dicing into chips. After forming the chip, the edge may be chamfered by barrel polishing or the like as necessary.

最後に、本体部10の端部パターン15Aが露出した端面(Y方向において対向する端面)に、端部パターン15Aと電気的に接続されるように外部端子電極30A、30Bを設けることで、コイル部品1が完成する。外部端子電極30A、30Bは、コイル部品を搭載する基板の回路に接続するための電極であり、複数層構造とすることができる。たとえば、外部端子電極30A、30Bは、端面に樹脂電極材料を塗布した後、その樹脂電極材料に金属めっきを施すことにより形成することができる。外部端子電極30A、30Bの金属めっきには、Cr、Cu、Ni、Sn、Au、はんだ等を用いることができる。   Finally, the external terminal electrodes 30A and 30B are provided on the end face (end face facing in the Y direction) from which the end pattern 15A of the main body part 10 is exposed so as to be electrically connected to the end pattern 15A. Part 1 is completed. The external terminal electrodes 30A and 30B are electrodes for connecting to a circuit of a substrate on which a coil component is mounted, and can have a multi-layer structure. For example, the external terminal electrodes 30 </ b> A and 30 </ b> B can be formed by applying a resin electrode material to the end surfaces and then performing metal plating on the resin electrode material. Cr, Cu, Ni, Sn, Au, solder, etc. can be used for metal plating of the external terminal electrodes 30A, 30B.

上述したコイル部品1およびその製造方法によれば、図5で示したとおり、コイル13がめっき成長される前に設けられた樹脂体17の樹脂壁18の間を延びるように、コイル13の巻回部14がめっき成長される。めっき成長時、コイル13の巻回部14の間には樹脂壁18が介在するため、コイル13の巻回部14同士が互いに接触する事態が回避され、コイル13における絶縁をより確実におこなうことができる。一方、上述した樹脂壁18が存在しない状態で、基板11上に巻回部114を成長させる場合には、図9に示すように、巻回部114の形状が定まらない。すなわち、巻回部114のめっき成長領域を画定するものが存在しないため、設計したとおりの形状になりにくい。この場合、巻回部114は、高さ方向に成長(縦成長)するだけでなく、基板11の面方向にも成長(横成長)する。そして、横成長することにより、隣り合う巻回部114同士が接触する等してコイルの耐圧抵抗の低下を招く。特に、高さの高い巻回部114を成長させようとする場合には、横成長により巻回部114の厚さが厚くなるため、耐圧抵抗の低下がより顕著になる。   According to the coil component 1 and the manufacturing method thereof described above, as shown in FIG. 5, the coil 13 is wound so as to extend between the resin walls 18 of the resin body 17 provided before the coil 13 is plated and grown. The turning part 14 is plated and grown. Since the resin wall 18 is interposed between the winding portions 14 of the coil 13 during plating growth, a situation where the winding portions 14 of the coil 13 are in contact with each other is avoided, and insulation in the coil 13 is more reliably performed. Can do. On the other hand, when the winding part 114 is grown on the substrate 11 without the resin wall 18 described above, the shape of the winding part 114 is not fixed as shown in FIG. That is, since there is no thing that defines the plating growth region of the winding part 114, it is difficult to obtain the shape as designed. In this case, the wound portion 114 not only grows in the height direction (vertical growth) but also grows in the plane direction of the substrate 11 (lateral growth). Then, by laterally growing, adjacent winding portions 114 come into contact with each other, and the breakdown voltage resistance of the coil is reduced. In particular, when trying to grow the winding part 114 having a high height, the thickness of the winding part 114 is increased due to the lateral growth, so that the breakdown voltage resistance is further reduced.

また、横成長することにより、隣り合う巻回部114同士の間隔は狭くなる。そのため、隣り合う巻回部114の間に、巻回部114の絶縁を確保するための樹脂を充填することが困難になる。もし、隣り合う巻回部114の間に樹脂をうまく充填できたとしても、充填の際に樹脂中に気泡が生じやすいため、必要十分な耐圧抵抗が得られない虞がある。   Moreover, the space | interval of adjacent winding parts 114 becomes narrow by laterally growing. Therefore, it becomes difficult to fill a resin between the adjacent winding portions 114 for ensuring insulation of the winding portions 114. Even if the resin can be satisfactorily filled between the adjacent winding portions 114, bubbles are likely to be generated in the resin at the time of filling, so that a necessary and sufficient withstand voltage resistance may not be obtained.

その上、高さ方向に関して、隣り合う巻回部114同士の間隔が異なるため、相対的に間隔が狭くなっている箇所において耐圧抵抗の低下が招かれる。   In addition, since the intervals between the adjacent winding portions 114 are different with respect to the height direction, the withstand voltage resistance is lowered at locations where the intervals are relatively narrow.

さらに、コイル部品1およびその製造方法によれば、複数の樹脂壁18の間にコイル13の巻回部14が非接着状態で介在するため、コイル13の巻回部14と樹脂壁18とが互いに対して変位可能である。そのため、コイル部品1の使用環境が高温になったときなどの周辺温度に変化があり、コイル13の巻回部14と樹脂壁18との間の熱膨張係数の差に起因する応力が生じた場合であっても、コイル13の巻回部14と樹脂壁18とが相対移動することでその応力が緩和される。   Furthermore, according to the coil component 1 and the manufacturing method thereof, since the winding part 14 of the coil 13 is interposed between the plurality of resin walls 18 in a non-adhered state, the winding part 14 of the coil 13 and the resin wall 18 are Displaceable relative to each other. Therefore, there is a change in the ambient temperature such as when the usage environment of the coil component 1 is high, and stress is generated due to the difference in the thermal expansion coefficient between the winding portion 14 of the coil 13 and the resin wall 18. Even if it is a case, the stress is relieved because the winding part 14 of the coil 13 and the resin wall 18 move relatively.

さらに、コイル部品1およびその製造方法によれば、樹脂体17の樹脂壁18の間に介在するように、コイル13の巻回部14がめっき成長されている。すなわち、被覆樹脂21でコイル13を覆う前に、コイル13の巻回部14間にはすでに樹脂壁18が介在している。そのため、コイル13の巻回部14間に樹脂を別途に充填する必要はなく、樹脂壁18によりコイル13の巻回部14間の樹脂の寸法精度の安定化が図られる。   Furthermore, according to the coil component 1 and the manufacturing method thereof, the winding portion 14 of the coil 13 is plated and grown so as to be interposed between the resin walls 18 of the resin body 17. That is, before covering the coil 13 with the coating resin 21, the resin wall 18 is already interposed between the winding portions 14 of the coil 13. Therefore, it is not necessary to separately fill the resin between the winding portions 14 of the coil 13, and the resin wall 18 stabilizes the dimensional accuracy of the resin between the winding portions 14 of the coil 13.

1…コイル部品、11…基板、13…コイル、14…巻回部、17…樹脂体、18…樹脂壁、21…被覆樹脂、30A、30B…外部端子電極、40…絶縁体。   DESCRIPTION OF SYMBOLS 1 ... Coil component, 11 ... Board | substrate, 13 ... Coil, 14 ... Winding part, 17 ... Resin body, 18 ... Resin wall, 21 ... Cover resin, 30A, 30B ... External terminal electrode, 40 ... Insulator.

Claims (10)

基板と、
前記基板の主面上に、めっき成長で設けられたコイルと、
前記基板の主面上に設けられ、前記コイルの巻回部が非接着状態で間に介在する複数の樹脂壁を有する樹脂体と、
磁性粉含有樹脂からなり、前記基板の主面の前記コイルと前記樹脂体とを一体的に覆う被覆樹脂と
を備えるコイル部品。
A substrate,
A coil provided by plating growth on the main surface of the substrate;
A resin body provided on the main surface of the substrate and having a plurality of resin walls interposed between the coil winding portions in a non-adhered state;
A coil component comprising a resin containing magnetic powder and comprising a coating resin that integrally covers the coil and the resin body on the main surface of the substrate.
前記樹脂体の樹脂壁の高さが前記コイルの巻回部の高さより高い、請求項1に記載のコイル部品。   The coil component according to claim 1, wherein a height of a resin wall of the resin body is higher than a height of a winding portion of the coil. 前記樹脂体の樹脂壁の断面形状が矩形状である請求項1または2に記載のコイル部品。   The coil component according to claim 1 or 2, wherein the resin wall of the resin body has a rectangular cross-sectional shape. 前記樹脂体の樹脂壁のアスペクト比が1より大きく、該樹脂壁が前記基板の主面の法線方向に沿って長く延びている請求項3に記載のコイル部品。   The coil component according to claim 3, wherein an aspect ratio of the resin wall of the resin body is greater than 1, and the resin wall extends long along a normal direction of the main surface of the substrate. 前記コイルの巻回部の断面形状が矩形状である請求項1〜4のいずれか一項に記載のコイル部品。   The coil component according to any one of claims 1 to 4, wherein a cross-sectional shape of a winding portion of the coil is a rectangular shape. 前記コイルの巻回部の断面はアスペクト比が1より大きく、該巻回部の断面が前記基板の主面の法線方向に沿って長く延びている請求項5に記載のコイル部品。   6. The coil component according to claim 5, wherein a cross-section of the winding portion of the coil has an aspect ratio larger than 1, and the cross-section of the winding portion extends long along the normal direction of the main surface of the substrate. 前記コイルの巻回部の上面に接するように設けられた絶縁体をさらに備える請求項1〜6のいずれか一項に記載のコイル部品。   The coil component as described in any one of Claims 1-6 further provided with the insulator provided so that the upper surface of the winding part of the said coil may be contact | connected. 前記基板の主面上に複数並んだ樹脂壁のうち、最外に位置する樹脂壁の厚さが内側に位置する樹脂壁の厚さより厚い請求項1〜7のいずれか一項に記載のコイル部品。   The coil according to any one of claims 1 to 7, wherein, among a plurality of resin walls arranged on the main surface of the substrate, the outermost resin wall is thicker than the resin wall located on the inner side. parts. 前記樹脂体の樹脂壁は、幅が5〜30μmの範囲であり、かつ、高さが50〜300μmの範囲である請求項1〜8のいずれか一項に記載のコイル部品。   The coil component according to any one of claims 1 to 8, wherein the resin wall of the resin body has a width in a range of 5 to 30 µm and a height in a range of 50 to 300 µm. 複数の樹脂壁を有する樹脂体が主面上に設けられた基板を準備する工程と、
前記基板の主面上に、前記樹脂壁の間に巻回部が非接着状態で介在するように、コイルをめっき成長させる工程と、
磁性粉含有樹脂からなる被覆樹脂で、前記基板の主面の前記コイルと前記樹脂体とを一体的に覆う工程と
を含むコイル部品の製造方法。
Preparing a substrate provided with a resin body having a plurality of resin walls on a main surface;
A step of plating and growing a coil on the main surface of the substrate such that a winding portion is interposed between the resin walls in a non-adhered state; and
A method of manufacturing a coil component, including a step of integrally covering the coil and the resin body on a main surface of the substrate with a coating resin made of a magnetic powder-containing resin.
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US14/951,004 US10468184B2 (en) 2014-11-28 2015-11-24 Coil component having resin walls and method for manufacturing the same
CN202010092124.2A CN111210988A (en) 2014-11-28 2015-11-26 Coil component and method for manufacturing same
CN202010092127.6A CN111276316B (en) 2014-11-28 2015-11-26 Coil component and method for manufacturing same
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US16/555,169 US10998130B2 (en) 2014-11-28 2019-08-29 Coil component having resin walls
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