JP2016057419A - Sunlight reflection mirror and reflection device for solar thermal power generation - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a sunlight reflection mirror and reflection device for solar thermal power generation, which offer superior scratch resistance and weather resistance even through prolonged exposure to outdoor environments.SOLUTION: A sunlight reflection mirror comprises a functional layer 5, light reflective layer 3, and resin base material 1 containing at least one type of acrylic resin or silicone resin in order from a light incident sides, or comprises the functional layer 5, resin base material 1, and light reflective layer 3 in order from the light incident side. The functional layer contains a resin material, fluorine compound, and ionic liquid and is a hard coat layer.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a sunlight reflecting mirror and a solar power generation reflecting device.

In recent years, utilization of natural energy has been studied as an alternative energy to fossil fuel energy such as oil and natural gas. Among them, solar energy, which is the most stable alternative energy for fossil fuels and has a large amount of energy, is attracting attention.
As a method for converting sunlight into energy, solar thermal power generation has been attracting attention, which generates electricity using heat obtained by reflecting and condensing sunlight by a reflecting mirror. If this method is used, it is possible to generate power regardless of day and night, and it is considered that the power generation efficiency is higher than that of solar power generation (solar cell) from a long-term viewpoint, and therefore it is considered that sunlight can be used effectively.
A condensing device in solar thermal power generation is exposed to ultraviolet rays, heat, wind and rain, sandstorms, and the like, and conventionally, a glass mirror having good weather resistance has been used. The glass mirror is highly durable against the environment, but it is damaged during transportation, and because it is heavy, it requires the strength of the frame on which the mirror is installed, which increases the construction cost of the plant. There was a problem.
In order to solve the above problem, it has been considered to replace a glass mirror with a resin reflecting mirror.

However, when a metal such as silver is used for the light reflecting layer of the resin reflecting mirror, there is a problem that silver is corroded when oxygen, water vapor, hydrogen sulfide or the like passes through the resin layer. In addition, as an installation place of the resin-made reflection mirror, there is an area where oil field mining is performed nearby in recent years. In such an environment, the rain, sandstorm and oil storm contain oil, so the dirt is viscous and the reflective mirror will be exposed to the outdoors for a long time in a harsh environment than before. It was very difficult.
In order to maintain the reflectance, the mirror surface is periodically cleaned. However, the hard coat layer is not only deteriorated by cleaning, but the hard coat layer is deteriorated by being exposed to sunlight for a long time. In addition, due to physical collisions such as dust, problems such as reduced reflectivity occur due to corrosion of silver by permeation of hydrogen sulfide, etc. from dirt adhesion and cracks on the hard coat layer, and so on. It has been difficult to apply a resin reflecting mirror to the apparatus.

  For example, a reflection mirror in which a silver reflection layer is covered with a resin film layer such as a polyester film layer or an acrylic film layer is known for the problem of such a resin reflection mirror. However, since the polyester film layer and the acrylic film layer were damaged, there was a problem that the reflectance was lowered in a short period of time.

With respect to the problem that the reflectance decreases in a short period of time, Patent Document 1 describes a composite film (reflective film) that is a cured product of a curable composition containing polysilazane and a siloxane compound.
In Patent Document 2, the hard coat layer (a) a leveling agent comprising a fluorine-containing polymer having a specific structure, (b) a carbonate ester solvent, (c) a compound having an unsaturated double bond, and (d) light An optical film containing a polymerization initiator is described.
On the other hand, in Patent Document 3, an ionic liquid as a surfactant is utilized, and an electrolyte having antistatic properties includes a ionic liquid that is liquid at room temperature and a monomer, oligomer, or prepolymer that has hard coat properties. Compositions containing are described.

The present inventor examined the film mirror described in Patent Document 1, and by adding polysilazane and a siloxane compound to the outermost surface layer, the crack resistance of the outermost surface layer can be improved. Due to its low nature, it has been clarified that many long-term outdoor exposures cause cracks due to physical collisions such as dust.
The film mirror described in Patent Document 2 contains a water-repellent fluoropolymer, so that the adhesion of dirt can be suppressed. However, the resin material of the hard coat layer is deteriorated in long-term exposure, and the hardness gradually decreases. It became clear.
In addition, the composition and the hard coat layer described in Patent Document 3 are mainly applied to the display or monitor surface, and the reflection mirror is not studied.

JP 2013-230561 A JP 2011-225846 A JP 2008-274266 A

  Therefore, the present invention has been made in view of the above problems and situations, and the problem to be solved is a solar reflection mirror and a solar power generation reflector that are excellent in scratch resistance and weather resistance even during long-term outdoor exposure. Is to provide. In particular, sunlight that is highly irradiated and exposed to the sun, such as in the Middle East, Africa, and the southwestern United States, is excellent in the above-mentioned properties even when exposed outdoors in dry areas or areas where oil fields are mined nearby. It is to provide a reflection mirror and a solar power generation reflection device.

In order to solve the above-mentioned problems, the present inventor has included a resin material, a fluorine compound, and an ionic liquid in the functional layer of the solar reflective mirror in the process of examining the cause of the above-described problem, thereby The present inventors have found that excellent scratch resistance and weather resistance and high reflectance can be maintained in outdoor exposure, and have reached the present invention.
That is, the said subject which concerns on this invention is solved by the following means.

1. From the light incident side, a functional layer, a light reflecting layer and a resin base material, or a solar light reflecting mirror provided in the order of a functional layer, a resin base material and a light reflecting layer,
The functional layer contains a resin material, a fluorine compound, and an ionic liquid.

  2. The solar reflective mirror according to item 1, wherein the functional layer is a hard coat layer.

  3. The solar reflective mirror according to claim 1 or 2, wherein the resin material includes at least one of an acrylic resin and a silicone resin.

  4). The solar reflective mirror according to any one of Items 1 to 3, wherein the fluorine compound is a compound having a fluorine-containing polyether group.

  5. The solar reflective mirror according to any one of Items 1 to 4, wherein the cation component of the ionic liquid is a compound containing imidazolium.

  6). The content of the ionic liquid is in the range of 0.005 to 5% by mass with respect to the solid content of the functional layer, wherein the content of the ionic liquid is any one of items 1 to 5. Sun reflection mirror.

  7). A solar power generation reflecting device comprising the solar light reflecting mirror according to any one of items 1 to 6.

Provided by the above means of the present invention is a solar reflective mirror that maintains excellent scratch resistance and weather resistance and high reflectance in long-term outdoor exposure, and a solar power generation reflector having the solar reflective mirror. Is possible. In addition, it is possible to provide excellent economic efficiency by reducing the number of periodic cleaning of the surface of the solar reflective mirror.
The expression mechanism or action mechanism of the effect of the present invention is not clear, but is presumed as follows.
In the solar reflection mirror, the following factors are considered as factors that cause the functional layer, particularly the hard coat layer, to deteriorate due to long-term exposure. That is, normally, the hard coat layer is located upstream of the incidence of sunlight, and the light reflection layer is located downstream. In that case, since the hard coat layer has a unique environment in which reflected light from the light reflecting layer passes in addition to the incident light of the sun, it is assumed that the resin material is likely to be decomposed. As a result of investigations, the present inventors believe that by adopting the above means, decomposition of the resin material could be suppressed. Surprisingly, not only the photodecomposition of the resin material was suppressed, but also the hardness of the hard coat layer could be improved. This is presumed to be because the fluorine compound and the ionic liquid itself formed a strong network in the hard coat layer due to the intermolecular interaction by containing the highly polar fluorine compound and the ionic liquid.

Schematic sectional view showing an example of the configuration of the sunlight reflecting mirror of the present invention

  The solar reflective mirror of the present invention is a solar reflective mirror that is provided in the order of the functional layer, the light reflective layer, and the resin base material, or the functional layer, the resin base material, and the light reflective layer from the light incident side. The functional layer contains a resin material, a fluorine compound, and an ionic liquid. This feature is a technical feature common to the inventions according to claims 1 to 7.

As an embodiment of the present invention, it is preferable that the functional layer is a hard coat layer from the viewpoint of manifesting the effects of the present invention in terms of excellent scratch resistance and weather resistance.
Moreover, it is preferable that the said resin material contains at least 1 sort (s) of acrylic resin and silicone type resin at the point which can obtain hardness and durability.
Moreover, it is preferable from the point of antifouling property that the said fluorine compound is a compound which has a fluorine-containing polyether group.
Moreover, it is preferable that the cation component of the ionic liquid is a compound containing imidazolium in that it is excellent in scratch resistance and weather resistance due to long-term exposure and high reflectance can be obtained.
Furthermore, the content of the ionic liquid is within the range of 0.005 to 5% by mass with respect to the solid content of the functional layer, the decomposition of the resin material can be suppressed, and the reflectance is hardly lowered. It is preferable in that the generation of scratches due to cleaning can be suppressed.

  The reflective apparatus for solar power generation of this invention has the said sunlight reflective mirror. This maintains excellent scratch and weather resistance and high reflectivity during long-term outdoor exposure, and also reduces economics by reducing the number of regular cleaning of the surface of the solar reflective mirror. It can be set as the reflector for solar power generation excellent.

Hereinafter, the present invention, its components, and modes and modes for carrying out the present invention will be described in detail. In addition, "-" shown in this invention is used in the meaning which includes the numerical value described before and behind that as a lower limit and an upper limit.
《Outline of solar reflection mirror configuration》
As a configuration of the present invention, (i) a solar reflective mirror having a functional layer, a light reflecting layer, and a resin base material in order from the light incident side, or (ii) a functional layer, a resin base material in order from the light incident side. And a sunlight reflecting mirror having a light reflecting layer (hereinafter also simply referred to as “reflecting mirror”).
Regarding the configuration (i), the light reflecting layer is preferably positioned on the light incident side of the resin base material, from the viewpoint of suppressing deterioration of the resin base material due to long-term exposure. Regarding the configuration (ii), it is preferable that the resin base material is located closer to the light incident side than the light reflecting layer, from the viewpoint of suppressing cracking of the functional layer due to curing shrinkage and ensuring adhesion of the functional layer.
Further, another constituent layer may be provided between the constituent layers or on the constituent layer, or the respective layers may be adjacent to each other.
For example, an anchor layer may be provided between the resin base material and the light reflection layer, or a corrosion prevention layer may be provided adjacent to the light incident side of the light reflection layer. Further, a gas barrier layer and / or a translucent resin layer may be provided on the light incident side or the opposite side of the light reflecting layer.

The translucent resin layer is preferably a translucent resin layer containing an ultraviolet absorber. The light-transmitting resin layer is preferably provided by coating because it is not necessary to bond the layers through an adhesive layer, and air bubbles and foreign substances are not mixed between the layers, thereby preventing a decrease in light reflectivity.
And although there is no restriction | limiting in particular in the thickness of the reflection mirror whole which concerns on this invention, when using a film for a resin base material from viewpoints, such as bending prevention, favorable regular reflectance, and handleability, 80-300 micrometers is sufficient. More preferably, it is 80-200 micrometers, More preferably, it is 80-170 micrometers.
Further, the center line average roughness (Ra) of the outermost surface layer on the light incident side of the reflecting mirror is preferably 3 to 20 nm from the viewpoint of preventing the scattering of the reflected light and increasing the light collection efficiency.

As an example of the configuration of the present invention, as shown in FIG. 1, an anchor layer 2, a light reflection layer 3, a translucent resin layer 4, and a functional layer (hard coat layer) 5 are sequentially laminated on a resin substrate 1. Is provided. An adhesive layer 6 is provided on the opposite surface of the resin substrate 1 on the light incident side.
In the present invention, in the reflection mirror of FIG. 1, light enters from the functional layer 5 side, is reflected by the light reflecting layer 3, and is emitted to the functional layer 5 again. Here, in the reflection mirror, the surface of the functional layer 5 is also referred to as a light reflection surface, and the surface of the adhesive layer 6 is also referred to as the other surface, and the light reflection surface is a surface formed for the purpose of reflecting light.
The solar power generation reflection device is a reflection device in which the adhesive layer 6 in the reflection mirror is bonded to a support base material, and the reflection mirror and the support base material are bonded together.

Details of each constituent layer will be described below.
<Functional layer>
The functional layer of the present invention only needs to contain a resin material, a fluorine compound and an ionic liquid, and is a layer located on the light incident side from the light reflecting layer or the resin substrate in the above configuration (i) or (ii), For example, any layer such as an anchor layer, a corrosion prevention layer, a gas barrier layer, and / or a translucent resin layer may be used. As described above, in order to suppress a decrease in reflectance during cleaning, the functional layer is preferably located on the light reflecting surface side, and since it exhibits excellent scratch resistance and weather resistance, the functional layer is a hard coat layer. Is preferred.

  Note that the functional layer in the reflection mirror of the present invention can effectively suppress and prevent the reflection mirror surface from being scratched and soiled due to physical cleaning such as periodic cleaning of the reflection mirror and dust. For this reason, reflecting mirrors are used in solar power generation reflectors, and even when exposed to ultraviolet rays, heat, wind and rain, sandstorms, oil, etc. from sunlight for a long time, the high reflectivity of the reflecting mirror can be exhibited and maintained more effectively. .

The hard coat layer preferably has weather resistance, scratch resistance, and antifouling properties, and the pencil height of the surface of the hard coat layer is 30 to less than 6H, or 30 scratches in a steel wool test with a weight of 500 g / cm ^2. It is preferable that it is below this.
The hard coat layer is preferably the outermost layer on the light incident side, the second layer or the third layer from the light incident side. Another layer (preferably 1 μm or less) may be provided on the hard coat layer.

  Examples of a method for producing the hard coat layer include conventionally known coating methods such as a gravure coating method, a reverse coating method, and a die coating method. In addition to applying and coating a predetermined material, various surface treatments and the like may be combined.

  The thickness of the hard coat layer is preferably 0.05 to 10 μm from the viewpoint of preventing the film mirror from warping while obtaining sufficient scratch resistance. More preferably, it is 1-10 micrometers.

The hard coat layer may contain an ultraviolet absorber or an antioxidant. As the ultraviolet absorber or antioxidant, the ultraviolet absorber or antioxidant used in the translucent resin layer described later can be used.
Although it does not restrict | limit especially as antioxidant used for a hard-coat layer, It is preferable to use a phenolic antioxidant, a thiol antioxidant, and a phosphite antioxidant.
Here, as the phenol-based antioxidant, the thiol-based antioxidant, and the phosphite-based antioxidant, known antioxidants described in International Publication No. 2012/165460, respectively, can be used.
In addition, you may use antioxidant and a light stabilizer together for a hard-coat layer. Here, the light stabilizer is not particularly limited, but a hindered amine-based light stabilizer is preferably used, and known light stabilizers described in US Pat. Nos. 4,699,956 and 4,839,405, etc. The agent can be used.

In addition, it is preferable that the usage-amount of the ultraviolet absorber in a hard-coat layer is 0.1-20 mass% in order to make a weather resistance favorable, keeping adhesiveness favorable. More preferably, it is 0.25-15 mass%, More preferably, it is 0.5-10 mass%.
In the hard coat layer, various additives can be further blended as necessary. For example, a surfactant, a leveling agent, an antistatic agent, and the like can be used.

  The leveling agent is effective in reducing surface irregularities. As the leveling agent, for example, a dimethylpolysiloxane-polyoxyalkylene copolymer (for example, SH190 manufactured by Toray Dow Corning Co., Ltd.) is suitable as the silicone leveling agent.

(Resin material)
The resin material for forming the hard coat layer is not particularly limited as long as transparency, weather resistance, hardness, mechanical strength, and the like can be obtained.
The hard coat layer can be composed of an acrylic resin, urethane resin, melamine resin, epoxy resin, organic silicate compound, silicone resin, or the like. In particular, silicone resins and acrylic resins are preferable in terms of hardness and durability. Furthermore, a thermosetting resin or an active energy type resin is preferable in terms of curability, flexibility, and productivity.
For example, a thermosetting silicone hard coat made of a partially hydrolyzed oligomer of an alkoxysilane compound, a hard coat made of a thermosetting polysiloxane resin, and an ultraviolet curable acrylic hard coat made of an acrylic compound having an unsaturated group A thermosetting inorganic material is preferable.

  As materials that can be used for the hard coat layer, an aqueous colloidal silica-containing acrylic resin (Japanese Patent Laid-Open No. 2005-66824), a polyurethane-based resin composition (Japanese Patent Laid-Open No. 2005-110918), and an aqueous silicone compound as a binder. Resin film used (Japanese Patent Laid-Open No. 2004-142161), silica film containing photocatalytic oxide such as titanium oxide or alumina, photocatalytic film such as titanium oxide or niobium oxide having a high aspect ratio (Japanese Patent Laid-Open No. 2009-62216), photocatalyst A fluorine-containing resin coating (Pierex Technologies), an organic / inorganic polysilazane film, a film using a hydrophilic accelerator (AZ Electronics) in organic / inorganic polysilazane, and the like may be used.

  Furthermore, an active energy ray-curable acrylic resin or a thermosetting acrylic resin has a group that reacts with a polyfunctional acrylate, an acrylic oligomer, or a monofunctional or polyfunctional acrylic oligomer as a polymerization curing component. And a composition containing a copolymer component of the coating film. In addition, you may contain a photoinitiator, a photosensitizer, a thermal-polymerization initiator, a modifier, etc. as needed.

  Acrylic oligomers include polyester acrylates, urethane acrylates, epoxy acrylates, polyether acrylates, and the like including those in which a reactive acrylic group is bonded to an acrylic resin skeleton. Moreover, what combined the acrylic group to rigid skeletons, such as a melamine and an isocyanuric acid, can be used.

  Commercially available active energy ray curable acrylic resins or thermosetting acrylic resins include Mitsubishi Rayon Co., Ltd. (trade name “Diabeam (registered trademark)” series, etc.), Nagase Sangyo Co., Ltd .; (Product name "Denacol (registered trademark)" series, etc.), Shin-Nakamura Co., Ltd. (product name "NK ester" series, etc.), DIC Corporation (product name "UNIDIC (registered trademark)" series, etc.), Toagosei Co., Ltd. (Product name “Aronix (registered trademark)” series, etc.), Nippon Oil & Fats Co., Ltd .; (Product name “Blemmer (registered trademark)” series, etc.), Nippon Kayaku Co., Ltd .; (product name “KAYARAD (registered trademark)) "Keieisha Chemical Co., Ltd .;" It can be utilized.

  For the ultraviolet curable acrylic hard coat layer, for example, an acrylic compound having an unsaturated group, such as pentaerythritol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethyloltetra A polyfunctional (meth) acrylate mixture such as (meth) acrylate can be used, and a photopolymerization initiator such as benzoin, benzoin methyl ether, or benzophenone is blended and used.

A partially hydrolyzed oligomer of an alkoxysilane compound synthesized by a known method can be used for the thermosetting silicone hard coat layer. An example of the synthesis method is as follows.
First, tetramethoxysilane or tetraethoxysilane is used as an alkoxysilane compound, and a predetermined amount of water is added in the presence of an acid catalyst such as hydrochloric acid and nitric acid to remove by-produced alcohol from room temperature to 80 ° C. React at ℃. The alkoxysilane is hydrolyzed by this reaction, and further, a partially hydrolyzed oligomer of an alkoxysilane compound having an average polymerization degree of 4 to 8 having two or more silanol groups or alkoxy groups in one molecule is obtained by a condensation reaction.
Next, a curing catalyst such as acetic acid or maleic acid is added thereto and dissolved in an alcohol or glycol ether organic solvent to obtain a thermosetting silicone hard coat solution.

  By using di (alkyl or aryl) dialkoxysilane and / or mono (alkyl or aryl) trialkoxysilane instead of tetraalkoxysilane, a polysiloxane hard coat layer can be produced in the same manner. Is possible.

  Specific examples of thermosetting silicones are commercially available, SURQUAT NP730, SURCOAT NP720, SURCOAT BP-16 (manufactured by DOKEN Co., Ltd.), SHC9000 (Momentive Performance Materials Japan GK), OCD T7, OCD. T11, OCD T12 (manufactured by Tokyo Ohka Kogyo Co., Ltd.), SR2441 (Toray Dow Corning), KF-86 (Shin-Etsu Silicone), Perma-New (registered trademark) 6000 (California Hardcoating Company), etc. can be used.

Moreover, as a particularly preferable example of the hard coat layer, a hard coat layer containing a polyfunctional acrylic monomer and a silicone resin can be given. Here, as one form of the hard coat layer, for example, there is a metalloxane-based hard coat layer. The polyfunctional acrylic monomer is hereinafter referred to as “A” component, and the silicone resin is hereinafter referred to as “B” component.
The polyfunctional acrylic monomer “A” component preferably has an unsaturated group, particularly an active energy ray-reactive unsaturated group. In addition, the active energy ray as used in this specification means an electron beam or an ultraviolet-ray.

As the polyfunctional acrylic monomer having an active energy ray-reactive unsaturated group, a radical polymerization monomer is used, preferably a bifunctional or higher polyfunctional monomer having an α, β-unsaturated double bond in the molecule. A certain polyfunctional acrylate type or polyfunctional methacrylate type monomer may be mentioned. In addition, you may have a vinyl type monomer, an aryl type monomer, and a monofunctional monomer.
Further, the radical polymerization monomer can be used alone or in combination of two or more kinds of monomers in order to adjust the crosslinking density.
As the “A” component, in addition to these relatively low molecular weight compounds, for example, so-called narrowly-defined monomers having a molecular weight of less than 1000, oligomers and prepolymers having a somewhat high molecular weight, for example, a weight average molecular weight of 1000 or more and less than 10,000 may be used. Is possible.

As a commercial item of "A" component, Toagosei Co., Ltd. Aronix M-400, M-408, M-450, M-305, M-309, M-310, M-315, M-320, for example M-350, M-360, M-208, M-210, M-215, M-220, M-225, M-233, M-240, M-245, M-260, M-270, M -1100, M-1200, M-1210, M-1310, M-1600, M-221, M-203, TO-924, TO-1270, TO-1231, TO-595, TO-756, TO-1343 , TO-902, TO-904, TO-905, TO-1330, KAYARAD D-310, D-330, DPHA, DPCA-20, DPCA-30, DPCA-60, DPCA manufactured by Nippon Kayaku Co., Ltd. -120, DN-0075, DN-2475, SR-295, SR-355, SR-399E, SR-494, SR-9041, SR-368, SR-415, SR-444, SR-454, SR-492 SR-499, SR-502, SR-9020, SR-9035, SR-111, SR-212, SR-213, SR-230, SR-259, SR-268, SR-272, SR-344, SR -349, SR-601, SR-602, SR-610, SR-9003, PET-30, T-1420, GPO-303, TC-120S, HDDA, NPGDA, TPGDA, PEG400DA, MANDA, HX-220, HX -620, R-551, R-712, R-167, R-526, R-551, R-712, R-604, -684, TMPTA, THE-330, TPA-320, TPA-330, KS-HDDA, KS-TPGDA, KS-TMPTA, Kyoeisha Chemical Co., Ltd. light acrylate PE-4A, DPE-6A, DTMP-4A, etc. Can be mentioned.
The content of the polyfunctional acrylic monomer “A” component is 10 to 90 masses based on the total solid content of “A” + “B” being 100 mass% from the viewpoint of improving antifouling properties and light resistance. %, Preferably 15 to 80% by mass.

The silicone resin “B” component is preferably a silicone resin having an active energy ray-reactive unsaturated group.
The silicone resin contains a polyorganosiloxane, and is preferably a compound having a polyorganosiloxane chain having an active energy ray-curable unsaturated bond in the molecule. In particular, the silicone resin is a monomer (a) having a radically polymerizable double bond and a polyorganosiloxane chain (1) to 50% by mass, and other than (a) having a radically polymerizable double bond and a reactive functional group. A monomer containing 10 to 95% by mass of the monomer (b) and 0 to 89% by mass of the monomer (c) having a radical polymerizable double bond other than (a) and (b) is polymerized. A vinyl copolymer having a number average molecular weight of 5,000 to 100,000, which is obtained by reacting the above-described polymer (α) with a functional group capable of reacting with the reactive functional group and a compound (β) having a radical polymerizable double bond. An active energy ray-curable resin that is a coalescence is preferable.

  As the monomer (a) having a radical polymerizable double bond and a polyorganosiloxane chain, specifically, for example, one end (eg, Silaplane FM-0711, FM-0721, FM-0725 manufactured by JNC Corporation) Examples thereof include meth) acryloxy group-containing polyorganosiloxane compounds, AC-SQ SI-20 manufactured by Toagosei Co., Ltd., POSS (Polyhydrogen Oligomeric Silsesquioxane) series acrylates and methacrylate-containing compounds manufactured by Hybrid Plastics.

  "B" component can be used 1 type or in mixture of 2 or more types according to required performance. The polymerization ratio is preferably such that the monomer (a) is 1 to 50% by mass, more preferably 10 to 35% by mass, based on the total mass of monomers constituting the polymer. %. When the copolymerization ratio of the “B” component is 1% by mass or more, antifouling properties and weather resistance can be imparted to the upper surface of the cured product, and when it is 50% by mass or less, scratch resistance is obtained. And compatibility with other components contained in the active energy ray-curable composition, adhesion to a substrate, toughness, and the like can also be imparted. An appropriate amount of polysiloxane can also be contained in the above components, and depending on the chemical structure and quantitative ratio of the “B” component, the durability can be improved by adding polysiloxane.

  It is preferable that the hard coat layer containing the active energy ray-curable resin contains an initiator for initiating polymerization. Photoinitiators of active energy ray-curable resins such as ultraviolet rays are preferably used. Examples include benzoin and derivatives thereof, acetophenone, benzophenone, hydroxybenzophenone, Michler's ketone, α-amyloxime ester, thioxanthone, and the like.

Moreover, you may use an initiator with a photosensitizer. The above initiator can also be used as a photosensitizer.
In addition, when using an epoxy acrylate initiator, a photosensitizer such as n-butylamine, triethylamine, or tri-n-butylphosphine can be used. An initiator and a photosensitizer are 0.1-15 mass% with respect to 100 mass% of this composition, Preferably it is 1-10 mass%, More preferably, it is 2-5 mass%.
Two types of initiators can be used in combination. In particular, in the case of radical initiators, at least two types of initiators, preferably radical initiators that absorb different wavelengths, are used. More preferably, two kinds of initiators having different ultraviolet absorption wavelengths are used. For example, with only an initiator that absorbs a shorter wavelength, the polymerization reaction of all the monomers may not be performed by the initiator. On the other hand, only an initiator that absorbs longer wavelengths improves the reactivity, but the initiator may be colored during long-term use. In view of this, it is preferable to use radical initiators that absorb different wavelengths in order to improve weather resistance and color polymerization reactivity without coloring even during long-term use.

(Fluorine compound)
The fluorine compound used in the present invention may be a compound that is considered to interact with the ionic liquid in the hard coat layer, and examples thereof include a compound that modifies surface wettability. For example, a surfactant containing fluorine may be mentioned, and it may be a polymer (including an oligomer) composed of a fluorine-containing polymerizable monomer or a copolymer thereof, and any of cationic type, anionic type, cationic type, etc. May be the type.
Examples of surfactants containing fluorine include OM-NOVA PolyFox PF-151N, PF-636, PF-6320, PF-656, PF-6520, PF-3320, PF-651, PF-652; Neos Fategent FTX-220P, FTX-208G, FTX-209F, FTX-212P, FTX-215M, FTX-222F, FTX-602A; DIC's MegaFuck F-477, F-553, F-554, F- 555, F-556, TF-1367; Sumitomo 3M Novec FC-430, FC-4430, FC-4432; AGC Seimi Chemical Corp. Surflon KH-40. In addition, the surfactant containing a fluorine may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

The fluorine compound of the present invention may be a compound having a fluorine-containing alkyl group and an alkoxysilyl group represented by the following general formula (1).
General formula (1): CF ₃ (CF ₂ ) _k (CH ₂ ) ₁ Si (OA) ₃
(In the formula, A represents an alkyl group, k represents an integer of 0 to 1000, l represents an integer of 1 to 1000, A represents an alkyl group having 3 or less carbon atoms, and consisting of only carbon and hydrogen, for example, (Methyl group, ethyl group, isopropyl group and the like are preferred.)

Examples of the compound represented by the above general formula include the following.
CF ₃ (CH ₂ ) ₂ Si (OCH ₃ ) ₃ , CF ₃ (CH ₂ ) ₂ SiCH ₃ (OC ₂ H ₅ ) ₂ , CF ₃ (CH ₂ ) ₂ Si (OC ₂ H ₅ ) ₃ , CF ₃ ( _{CH 2) 2 Si (CH 3} ) (OC 3 H 7) 2, CF 3 (CH 2) 2 Si (OC 3 H 7) 3, CF 3 (CH 2) 2 Si (OC 4 H 9) 3, CF ₃ (CF ₂ ) ₅ (CH ₂ ) ₂ Si (OCH ₃ ) ₃ , CF ₃ (CF ₂ ) ₅ (CH ₂ ) ₂ Si (OC ₂ H ₅ ) ₃ , CF ₃ (CF ₂ ) ₅ (CH ₂ ) ₂ Si (OC ₃ H ₇ ) ₃ , CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ Si (OCH ₃ ) ₃ , CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ Si (OC ₂ H ₅ ) ₃ , _{CF 3 (CF 2) 7 (} CH 2) 2 Si (OC 3 H 7 _{3, CF 3 (CF 2)} 7 (CH 2) 2 Si (OCH 3) (OC 3 H 7) 2, CF 3 (CF 2) 7 (CH 2) 2 Si (OCH 3) 2 OC 3 H 7, CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ SiCH ₃ (OCH ₃ ) ₂ , CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ SiCH ₃ (OC ₂ H ₅ ) ₂ , CF ₃ (CF ₂ ) ₇ ( _{CH 2) 2 SiCH 3 (OC} 3 H 7) 2, (CF 3) 2 CF (CF 2) 8 (CH 2) 2 Si (OCH 3) 3, CF 3 (CF 2) 7 (CH 2) 2 Si (CH ₃ ) (OC ₃ H ₇ ) ₂ , CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ Si (C ₂ H ₅ ) (OCH ₃ ) ₂ , CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ SiC ₂ H ₅ (OC ₃ H ₇ ) ₂ , CF ₃ (CH ₂ ) ₂ SiCH ₃ (OCH ₃ ) ₂ , CF ₃ (CF ₂ ) ₅ (CH ₂ ) ₂ Si (CH ₃ ) (OCH ₃ ) ₂ , CF ₃ (CF ₂ ) ₅ (CH ₂ ) ₂ Si (CH ₃ ) ) (OC ₃ H ₇ ) ₂
Examples of commercially available compounds represented by the general formula (1) include KBM7803 (heptadecatrifluorodecyltrimethoxysilane) and KBM7103 (trifluoropropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Co., Ltd. Can do.

The fluorine compound of the present invention may be a compound having a fluorine-containing polyether group.
Commercially available compounds having a fluorine-containing polyether group include Daikin Industries' OPTOOL DSX, OPTOOL DAC, OPTOOL DAC-HP; Examples include SUA1900L10 and SUA1900L6 manufactured by Shin-Nakamura Chemical; UT3971 manufactured by Nihon Gosei, KF-6011, KF-6012 and KF-6013 manufactured by Shin-Etsu Silicone Co., Ltd., and the like. Moreover, you may use these individually or in mixture of 2 or more types.
Moreover, it is preferable that it is the range of 0.1-10 mass% with respect to solid content of the functional layer formed as addition amount of the fluorine compound which concerns on this invention.

(Ionic liquid)
An ionic liquid is a liquid composed of a cation component and an anion component.
The ionic liquid according to the present invention is preferably 100 ° C. or lower, preferably 60 ° C. or lower, more preferably 40 ° C. or lower, and further preferably 25 ° C. or lower, and a liquid ionic liquid is preferably used. The viscosity (25 ° C.) is not particularly limited as long as it is a melt at normal temperature, but is preferably 1 to 200 mPa · s.

  The addition amount of the ionic liquid according to the present invention is preferably in the range of 0.005 to 5% by mass, more preferably 0.01 to 1% by mass with respect to the solid content of the functional layer to be formed. Preferably there is. When the addition amount of the ionic liquid is 0.005% by mass or more, decomposition of the resin material can be suppressed and the reflectance is hardly lowered, and when the addition amount of the ionic liquid is 5% by mass or less, scratches caused by cleaning can be prevented. Occurrence is less likely to occur.

  Examples of the cation component of the ionic liquid include pyrazolium, pyrimidinium, piperidinium, trialkylsulfonium, pyrrolidinium, virazolinium, tetraalkylammonium, imidazolium, pyridinium, tetraalkylphosphonium, and preferably pyrrolidinium, pyrazolinium, tetra Examples include alkyl ammonium, imidazolium, pyridinium, and tetraalkylphosphonium.

The anionic component of the ionic liquid includes Cl ⁻ , Br ⁻ , I ⁻ , NCO ₃ ⁻ , CH ₃ COO ⁻ , BF ₄ ⁻ , PF ₆ ⁻ , AlCl ₄ ⁻ , Al ₂ Cl ₇ ⁻ , ClO _4. ⁻ , NO ₃ ⁻ , CF ₃ COO ⁻ , CH ₃ SO ₃ ⁻ , CF ₃ SO ₃ ⁻ , (CF ₃ SO ₂ ) ₂ N ⁻ , (CF ₃ SO ₂ ) ₃ C ⁻ , AsF ₆ ⁻ , SbF ₆ ⁻ NbF ₆ ⁻ , C ₄ F ₉ SO ₃ ⁻ , (C ₂ F ₅ SO ₂ ) ₂ N ⁻ , (CF ₃ SO ₂ ) (CF ₃ CO) N ^{− and the} like can be used.

Specific examples of the ionic liquid that can be used in the present invention are listed below, but the present invention is not limited thereto.
Specific examples of the ionic liquid containing pyrrolidinium include 1-butyl-1-methylpyrrolidinium tetrafluoroborate, 1-butyl-1-methylpyrrolidinium bis (trifluoromethanesulfonyl) imide, 1-methyl-1 -Propylpyrrolidinium bis (trifluoromethanesulfonyl) imide, 1-ethyl-1-methylpyrrolidinium bis (trifluoromethanesulfonyl) imide and the like.

Specific examples of ionic liquids containing pyrazolium include
1-ethyl-2,3,5-trimethylpyrazolium bis (trifluoromethanesulfonyl) imide, 1-propyl-2,3,5-trimethylpyrazolium bis (trifluoromethanesulfonyl) imide, 1-butyl-2, 3,5-trimethylpyrazolium bis (trifluoromethanesulfonyl) imide and the like.

As a specific example of the ionic liquid containing tetraalkylammonium,
Triethylpentylammonium bis (trifluoromethanesulfonyl) imide, tetrabutylammonium bromide, tetrabutylammonium chloride, methyltrioctylammonium bis (trifluoromethanesulfonyl) imide, butyltrimethylammonium bis (trifluoromethanesulfonyl) imide, ethyldimethylpropylammonium bis ( Trifluoromethanesulfonyl) imide, tetraethylammonium trifluoromethanesulfonate, trimethylpropyl bis (trifluoromethanesulfonyl) imide, diethylmethyl (2-methoxyethyl) ammonium hexafluorophosphate, diethylmethyl (2-methoxyethyl) ammonium bis (trifluoromethane) Sulfonyl) imide and the like That.

As a specific example of an ionic liquid containing imidazolium,
1-methyl-3-octylimidazolium hexafluorophosphate, 1-methyl-3-octylimidazolium tetrafluoroborate, 1,3-dimethylimidazolium chloride, 1,3-dimethylimidazolium dimethylphosphate, 1- Ethyl-3-methylimidazolium chloride, 1-ethyl-3-methylimidazolium bromide, 1-ethyl-3-methylimidazolium iodide, 1-ethyl-3-methylimidazolium trifluoromethanesulfonate, 1-ethyl-3 -Methylimidazolium p-toluenesulfonate, 1-ethyl-3-methylimidazolium ethyl sulfate, 1-ethyl-3-methylimidazolium 2- (2-methoxyethoxy) ethyl sulfate, 1-ethyl-3- Methylimidazo Um dicyanamide, 1-ethyl-3-methylimidazolium tetrafluoroborate, 1-ethyl-3-methylimidazolium hexafluorophosphate, 1-ethyl-3-methylimidazolium bis (trifluoromethanesulfonyl) imide, 1- Methyl-3-propylimidazolium iodide, 1-butyl-3-methylimidazolium chloride, 1-butyl-3-methylimidazolium bromide, 1-butyl-3-methylimidazolium iodide, 1-butyl-3-methylimidazole Trifluoromethanesulfonate, 1-butyl-3-methylimidazolium hexafluorophosphate, 1-butyl-3-methylimidazolium bis (trifluoromethanesulfonyl) imide, 1-butyl-3-methylimidazolium Trachloroferrate, 1-hexyl-3-methylimidazolium chloride, 1-hexyl-3-methylimidazolium hexafluorophosphate, 1-hexyl-3-methylimidazolium tetrafluoroborate, 1-ethyl-2, 3-methylimidazolium bis (trifluoromethanesulfonyl) imide, 1-butyl-2,3-dimethylimidazolium chloride, 1-butyl-2,3-dimethylimidazolium tetrafluoroborate, 1-butyl-2,3- Examples thereof include dimethylimidazolium hexafluorophosphate.

Specific examples of ionic liquids containing pyridinium include
1-ethylpyridinium chloride, 1-ethylpyridinium bromide, 1-butylpyridinium chloride, 1-butylpyridinium bromide, 1-butylpyridinium hexafluorophosphate, 1-butyl-3-methylpyridinium ethylsulfate, 1-butyl-4 -Methylpyridinium hexafluorophosphate, 1-ethyl-3- (hydroxymethyl) pyridinium ethyl sulfate and the like.

As a specific example of the ionic liquid containing tetraalkylphosphonium,
Trihexyltetradecylphosphonium bis (trifluoromethanesulfonyl) imide, trihexyltetradecylphosphonium chloride, trihexyltetradecylphosphonium bromide, tributylhexadecylphosphonium bromide, tetrabutylphosphonium bromide, tributyl (2-methoxyethyl) phosphonium bis (trifluoromethane) Sulfonyl) imide and the like.

The ionic liquids described above are commercially available and can be used in Tokyo Chemical Industry Co., Ltd., Sigma Aldrich Japan Co., Ltd., Kanto Chemical Co., Ltd., Nippon Synthetic Chemical Co., Ltd., Guangei Chemical Industry Co., Ltd., etc. .
Further, page 11 of JP 9-507334 (International Publication No. 95/18456), paragraphs 0013 to 0020 of JP-A-8-259543, paragraphs 0028 to 0048 of JP-A-2001-243955, European Patent No. 718288, pages 3 to 4, Electrochemical Vol. 65, No. 11, page 923 (1997); Electrochem. Soc. , Vol. 143, no. 10, 3099 (1996), Inorg. Chem. The pyridinium salts, imidazolium salts, triazolium salts, and the like described in 1996, 35, 1168 to 1178 can also be used.

<< Translucent resin layer >>
The translucent resin layer includes a resin having light transmissivity for the purpose of preventing deterioration of the resin base material of the reflection mirror due to sunlight or ultraviolet rays, and is preferably a resin layer containing an ultraviolet absorber.
The translucent resin layer is preferably provided on the light incident side of the resin base material, and the functional layer, particularly the hard coat layer, is preferably provided on the light incident side of the translucent resin layer.

  The resin used for the translucent resin layer is not particularly limited, and various conventionally known synthetic resins that can maintain transparency when a thin film is formed can be used. For example, polyesters such as polyethylene terephthalate and polyethylene naphthalate, polyethylene esters, polypropylene, cellophane, and cellulose esters such as cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, cellulose acetate propionate, cellulose acetate phthalate, and cellulose nitrate. Derivatives thereof, polyvinylidene chloride, polyvinyl alcohol, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyetherketone, polyimide, polyethersulfone, polysulfones, polyetherketoneimide, polyamide, fluorine Resin, nylon, polymethyl methacrylate, acrylic Polyarylate, urethane modified acrylic, Arton (trade name manufactured by JSR Corporation) or APEL (trade name manufactured by Mitsui Chemicals, Inc.) such cycloolefin resins.

  Although the formation method in particular of this translucent resin layer is not restrict | limited, For example, the method by application | coating can be mentioned. When a coating film that becomes a translucent resin layer is applied by a coating method, various conventionally used coating methods such as spray coating, spin coating, and bar coating can be used.

  The thickness (dry film thickness) of the translucent resin layer is not particularly limited, but is preferably 5 to 150 μm, more preferably 10 to 100 μm, and particularly preferably 20 to 80 μm. With such a thickness, sufficient translucency is ensured, and the solvent can be sufficiently evaporated by drying during film formation, which is preferable in terms of productivity.

Among the resins exemplified above, a (meth) acrylic material is preferably used because of its high translucency as the resin for forming the translucent resin layer. When the translucent resin layer is formed of a (meth) acrylic material, since the (meth) acrylic material is hard, the plasticizer fine particles are added for the purpose of obtaining an acrylic translucent resin layer that is soft and difficult to break. You may make it contain.
Preferable examples of the plasticizer include acrylic rubber, butyl rubber and butyl acrylate. Here, the addition amount of the plasticizer is not particularly limited, but is preferably about 10 to 25% by mass with respect to the solid content of the translucent resin layer in consideration of desired flexibility and the like.

More preferably, the translucent resin layer is formed with a methacrylic resin as a main component.
The methacrylic resin is a polymer mainly composed of a methacrylic acid ester, and may be a homopolymer of a methacrylic acid ester. The methacrylic acid ester is 50% by mass or more and the other monomer is 50% by mass or less. A copolymer may also be used. Here, as the methacrylic acid ester, an alkyl ester of methacrylic acid is usually used. A particularly preferred methacrylic resin is a polymethyl methacrylate resin.

A preferable monomer composition of the methacrylic resin is 50 to 100% by mass of methacrylic acid ester, 0 to 50% by mass of acrylic acid ester, and 0 to 49% by mass of other monomers based on all monomers. More preferably, the methacrylic acid ester is 50 to 99.9% by mass, the acrylic acid ester is 0.1 to 50% by mass, and the other monomers are 0 to 49% by mass.
Here, examples of the alkyl methacrylate include methyl methacrylate, ethyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, and the like. The alkyl group usually has 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms. It is. Of these, methyl methacrylate is preferably used.
Examples of alkyl acrylates include methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, and the like. The alkyl group usually has 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms. is there.

The monomer other than alkyl methacrylate and alkyl acrylate may be a monofunctional monomer, that is, a compound having one polymerizable carbon-carbon double bond in the molecule, or a polyfunctional monofunctional monomer. Although it may be a monomer, that is, a compound having at least two polymerizable carbon-carbon double bonds in the molecule, a monofunctional monomer is preferably used.
Examples of this monofunctional monomer include aromatic alkenyl compounds such as styrene, α-methylstyrene and vinyltoluene, and alkenyl cyan compounds such as acrylonitrile and methacrylonitrile.
Examples of polyfunctional monomers include polyunsaturated carboxylic acid esters of polyhydric alcohols such as ethylene glycol dimethacrylate, butanediol dimethacrylate, trimethylolpropane triacrylate, allyl acrylate, allyl methacrylate, and cinnamon. Alkenyl esters of unsaturated carboxylic acids such as allyl acids, polyalkenyl esters of polybasic acids such as diallyl phthalate, diallyl maleate, triallyl cyanurate, triallyl isocyanurate, aromatic polyalkenyl compounds such as divinylbenzene, etc. Can be mentioned. Or the resin material used for translucent resin layers, such as a methacryl resin, may use a commercial item.

Although there is no restriction | limiting in particular in the ultraviolet absorber contained in a translucent resin layer, For example, organic, such as a thiazolidone type, a benzotriazole type, an acrylonitrile type, a benzophenone type, an aminobutadiene type, a triazine type, a phenyl salicylate, a benzoate type Type ultraviolet absorbers, fine powder type ultraviolet blocking agents such as cerium oxide and magnesium oxide, titanium oxide, zinc oxide, iron oxide and the like, and organic ultraviolet absorbers are particularly preferable.
Examples of organic ultraviolet absorbers include JP-A Nos. 46-3335, 55-15276, JP-A Nos. 5-197774, Nos. 5-232630, Nos. 5-307232, Nos. 6-211813, and Nos. 8-8. -53427, 8-234364, 8-239368, 9-310667, 10-115898, 10-147777, 10-182621, German Patent No. 19739797A, Europe Japanese Patent No. 711804A and Japanese Patent Publication No. 8-501291, U.S. Pat. Nos. 10,23859, 2685512, 2739888, 2784087, 2748021, 3004896, 3052636 No. 3215530, No. 3253921, No. 3533794, No. 3 No. 92525, the No. 3,705,805, the No. 3,707,375, the No. 3,738,837, can be used the same No. 3,754,919, British compounds described in Japanese Patent No. 1321355 Pat like.

In addition to the above, as the ultraviolet absorber, a compound having a function of converting the energy held by ultraviolet rays into vibrational energy in the molecule and releasing the vibrational energy as thermal energy can also be used.
Furthermore, those that exhibit an effect when used in combination with an antioxidant or a colorant, or light stabilizers that act as light energy conversion agents, called quenchers, can be used in combination. However, when using the above-described ultraviolet absorber, it is necessary to select a material in which the light absorption wavelength of the ultraviolet absorber does not overlap with the effective wavelength of the photopolymerization initiator. When a normal ultraviolet absorber is used, it is effective to use a photopolymerization initiator that generates radicals with visible light.
In addition, the said ultraviolet absorber can also respectively use those 2 or more types as needed. Further, if necessary, an ultraviolet absorber other than the above-described ultraviolet absorber, for example, a salicylic acid derivative, a substituted acrylonitrile, a nickel complex, or the like can be contained.
Although content (in solid content conversion) of the ultraviolet absorber in the translucent resin layer is not particularly limited, it is preferably 0.1 to 25% by mass, more preferably based on the translucent resin layer. It is 0.5-20 mass%, More preferably, it is 1-15 mass%. By making the content of the ultraviolet absorber in the above range, it is possible to prevent the haze of the roll and the film from increasing due to the bleeding out of the ultraviolet absorber while exhibiting sufficient weather resistance.
The translucent resin layer may further contain the aforementioned antioxidant in order to prevent deterioration.

《Light reflection layer》
The light reflecting layer is a layer having a function of reflecting light. In particular, a layer made of metal or the like is preferable. The surface reflectance of the light reflection layer is preferably 80% or more, more preferably 90% or more. This light reflecting layer is preferably formed of a material containing any element selected from the group consisting of Al, Ag, Cr, Cu, Ni, Ti, Mg, Rh, Pt and Au. Among them, it is preferable that Al or Ag is a main component from the viewpoints of reflectance and corrosion resistance, and two or more such metal thin films may be formed. In the present invention, a light reflecting layer mainly containing silver is particularly preferable.
The thickness of the light reflection layer is preferably 10 to 200 nm, more preferably 30 to 150 nm, from the viewpoint of reflectance and the like.
Moreover, a layer made of a metal oxide such as SiO ₂ or TiO ₂ may be provided on the light reflecting layer to further improve the reflectance.

As a method for forming the light reflecting layer, either a wet method or a dry method can be used.
The wet method is a general term for a plating method, and is a method of forming a film by depositing a metal from a solution. Specific examples include silver mirror reaction.
On the other hand, the dry method is a general term for a vacuum film-forming method. Specific examples include a resistance heating vacuum deposition method, an electron beam heating vacuum deposition method, an ion plating method, and an ion beam assisted vacuum deposition method. And sputtering method. In particular, a vapor deposition method capable of a roll-to-roll method for continuously forming a film is preferably used in the present invention. For example, in the manufacturing method of a solar reflective mirror, it is preferable that it is a manufacturing method which forms a light reflection layer by silver vapor deposition (especially vacuum vapor deposition).

<Resin substrate>
The resin base material in the present invention has a larger area than the glass base material from the viewpoint of making a light and difficult-to-break reflective mirror to facilitate handling during transportation and installation, and ensuring light collection. Enable.
There are resin plates and resin films as resin base materials. If a reflection mirror is formed on the resin plate, a reflection mirror device can be manufactured without using a support substrate. If a reflection mirror is formed on a resin film, mass production is possible. It is possible to obtain a flexible reflection mirror that can match the shape of the installation place and the shape of the mirror.
The thickness of the resin base material is not particularly limited, but is preferably an appropriate thickness depending on the type and purpose of the resin. For example, the thickness of the resin plate is preferably 1 to 10 mm, and more preferably 2 to 5 mm. The thickness of the resin film is preferably in the range of 10 to 250 μm, for example, and more preferably 20 to 200 μm.

As the resin base material, various conventionally known resin films described below can be used, and similarly, the resin substrate can be used. For example, cellulose ester film, polyester film, polycarbonate film, polyarylate film, polysulfone (including polyethersulfone) film, polyethylene terephthalate film, polyester film such as polyethylene naphthalate, polyethylene film, polypropylene Film, cellophane film, cellulose diacetate film, cellulose triacetate film, cellulose acetate propionate film, cellulose acetate butyrate film, polyvinylidene chloride film, polyvinyl alcohol film, ethylene vinyl alcohol film, Syndiotactic polystyrene film, polycarbonate film, norvo Examples of the film include a ene film, a polymethylpentene film, a polyether ketone film, a polyether ketone imide film, a polyamide film, a fluorine film, a nylon film, a polymethyl methacrylate film, and an acrylic film. . Among these, polycarbonate films, polyester films such as polyethylene terephthalate, norbornene resin films, cellulose ester films, and acrylic films are preferable. Of these, a polyester film such as polyethylene terephthalate or an acrylic film is preferably used, and a polyester film such as polyethylene terephthalate is particularly preferable.
Here, the resin substrate may be manufactured by any method, for example, a substrate manufactured by melt casting film formation, or a substrate manufactured by solution casting film formation. May be.

<Adhesive layer>
The adhesive layer has adhesiveness that enables the reflection mirror to be attached to the support base material, and the reflective mirror is joined to the support base material by this adhesive layer to form a solar power generation reflection device. It is a constituent layer.
The adhesive layer is not particularly limited, and for example, any of a dry laminating agent, a wet laminating agent, an adhesive, a heat seal agent, a hot melt agent, and the like is used.
As the adhesive, for example, a polyester resin, a urethane resin, a polyvinyl acetate resin, an acrylic resin, a silicone resin, a nitrile rubber, or the like is used. The laminating method is not particularly limited, and for example, it is preferable to carry out the roll method continuously from the viewpoint of economy and productivity.
Moreover, it is preferable that the thickness of an adhesion layer is the range of about 1-100 micrometers normally from viewpoints, such as an adhesion effect and a drying rate.

Note that the reflection mirror may include a release sheet on the other surface. When the reflection mirror has a release sheet, the release mirror can be attached to the support substrate via the adhesive layer after the release sheet is released from the adhesive layer.
A peeling sheet is a member which covers the surface on the opposite side to the light-incidence side of the adhesion layer in a reflective mirror.
For example, when the reflecting mirror is shipped, the release sheet is attached to the adhesive layer, and after that, the release sheet is peeled off from the adhesive layer of the reflecting mirror, and the reflecting mirror is bonded to the supporting base material to reflect the solar power generation reflecting device. Can be formed.

The release sheet may be any sheet that can protect the adhesiveness of the adhesive layer. For example, an acrylic film or sheet, a polycarbonate film or sheet, a polyarylate film or sheet, a polyethylene naphthalate film or sheet, a polyethylene terephthalate film Or a plastic film or sheet such as a sheet, a fluorine film, a resin film or sheet kneaded with titanium oxide, silica, aluminum powder, copper powder, etc., coating a resin kneaded with these, or a metal such as aluminum A resin film or sheet subjected to surface processing such as metal vapor deposition is used.
The thickness of the release sheet is not particularly limited, but is usually preferably in the range of 12 to 250 μm.

Hereinafter, it describes about other than the said structural layer.
(Anchor layer)
The anchor layer can be disposed between the resin substrate and the light reflecting layer. The anchor layer is made of a resin material and adheres the resin base material and the light reflection layer. Therefore, the anchor layer has an adhesion property that allows the resin base material and the light reflection layer to adhere to each other, heat resistance that can withstand heat when the light reflection layer is formed by a vacuum deposition method, and the high reflection that the light reflection layer originally has. Smoothness is required to bring out performance.
The material (resin material) used for the anchor layer and the method for forming the anchor layer are not particularly limited. For example, known materials such as International Publication No. 2012/165460 (particularly, paragraphs “0209” to “0212”) are known. Materials and methods similar to those described in the literature can be used.

(Corrosion prevention layer)
The corrosion prevention layer is a resin layer containing a corrosion inhibitor and is preferably adjacent to the light reflection layer. For example, it can be provided between the light reflecting layer and the adhesive layer.
The corrosion prevention layer may consist of only one layer or may consist of a plurality of layers. The thickness of the corrosion prevention layer is preferably 1 to 10 μm, more preferably 2 to 8 μm.
The resin used for the corrosion prevention layer and the corrosion inhibitor are not particularly limited, but are described in known documents such as International Publication No. 2012/165460 (particularly, paragraphs “0079” to “0095”). Similar materials can be used.
The corrosion prevention layer can be formed by applying and applying the material (binder) of the above document on the light reflection layer or the like.
The corrosion inhibitor preferably has an adsorptive group for silver. Here, “corrosion” refers to a phenomenon in which a metal (silver) is chemically or electrochemically eroded or deteriorated by an environmental material surrounding it (see JIS Z0103-2004).
The optimum content of the corrosion inhibitor varies depending on the compound used, but is generally preferably in the range of 0.1 to 1.0 g / m ² .

(Gas barrier layer)
The gas barrier layer is preferably provided on the light incident side with respect to the light reflecting layer. In particular, it is preferable to provide a gas barrier layer between the resin substrate and the light reflecting layer.
The gas barrier layer is intended to prevent the deterioration of humidity, especially the deterioration of the resin base material and each component layer supported by the resin base material due to high humidity, but with special functions and applications. As long as it has a function of preventing deterioration, a gas barrier layer of various modes can be provided.
As the moisture resistance of the gas barrier layer, the water vapor permeability at 40 ° C. and 90% RH is preferably 1 g / m ² · day or less, more preferably 0.5 g / m ² · day or less, still more preferably It is 0.2 g / m ² · day or less.
In addition, the oxygen permeability of the gas barrier layer is preferably 0.6 ml / m ² / day / atm or less under the conditions of a measurement temperature of 23 ° C. and a humidity of 90% RH.
The material used for the gas barrier layer and the method for forming the gas barrier layer are not particularly limited. For example, it is disclosed in known documents such as International Publication No. 2012/165460 (particularly, paragraphs “0188” to “0209”). Similar materials and methods as described can be used.

<< Production Method of Sunlight Reflection Mirror >>
A reflection mirror (solar reflection mirror) for solar thermal power generation can be manufactured by appropriately laminating the above-described constituent layers.
Here, the reflection mirror shown in FIG. 1 will be described as an example.
For example, the anchor layer 2 is formed by applying a predetermined resin material on a polyethylene terephthalate film that is the resin base material 1 manufactured by melt film formation.
Next, a silver light reflecting layer 3 is formed on the anchor layer 2 by vacuum deposition.
Next, a translucent resin layer 4 is formed on the silver light reflecting layer 3 by applying a resin material containing an ultraviolet absorber.
Next, a hard coat layer 5 is formed on the translucent resin layer 4 by applying a hard coat material.

Here, the solvent that can be used for the preparation of the hard coat layer forming liquid is not particularly limited as long as it can dissolve the hard coat material, and is appropriately selected depending on the type of the hard coat material to be used. For example, methyl ethyl ketone (MEK), toluene, xylene, methylene chloride, 1,2-dichloroethane, cyclohexane, ethyl acetate, t-butyl acetate, methanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, t-butyl Examples include, but are not limited to, alcohol, sec-butyl alcohol butanol, methyl cellosolve, 4-methoxy-4-methyl-2-pentanone, ethyl cellosolve, tetrahydrofuran, 1-dioxane, 1,3-dioxolane, pyridine, and diethylamine. Is not to be done. These solvents can be used singly or in combination of two or more.
The concentration of the hard coat material in the hard coat layer forming liquid is not particularly limited, but is preferably 20 to 40% by mass, more preferably in consideration of ease of application, ease of adjusting a desired thickness, and the like. It is 25-35 mass%.
The coating method is not particularly limited, and is a roll coating method, bar coating method, dip coating method, spin coating method, casting method, die coating method, blade coating method, bar coating method, gravure coating method, curtain coating method. A method such as spray coating or doctor coating can be used.
After applying the hard coat layer forming liquid on the translucent resin layer 4, the drying condition when drying is a condition in which a sufficient amount of solvent can be evaporated from the coating film (the hard coat layer 5 can be formed). Not limited. Furthermore, a reflective mirror is manufactured by coating the adhesive material on the back side of the resin base material 1 to form the adhesive layer 6 and covering the adhesive layer 6 with a release sheet.

When manufacturing a reflecting mirror having a layer other than the above-described configuration, a desired reflecting mirror is manufactured by laminating constituent layers necessary for each light reflecting mirror in a predetermined order on the resin base material or the light reflecting layer. be able to.
For example, when a corrosion prevention layer is formed between a light reflection layer and an adhesive layer, a resin material containing a corrosion inhibitor on the light reflection layer (if necessary, a predetermined resin material and a corrosion inhibitor) It is possible to form a corrosion prevention layer by applying a (corrosion prevention layer-forming liquid containing) (after application, drying if necessary). Here, the solvent, the drying conditions, and the like that can be used for the preparation of the corrosion-preventing layer forming liquid are not limited. For example, the same description as above can be applied, and thus the description thereof is omitted here.
When the reflection mirror has a gas barrier layer, the gas barrier layer can be formed by subjecting a predetermined layer to a sol-gel method and heating / UV treatment.
In the reflection mirror of the present invention, a predetermined constituent layer is laminated by sequentially repeating film formation by applying, coating, or vapor-depositing the material of each constituent layer on a resin base material produced by melt film formation or the like. Thus, it is preferable to manufacture the reflection mirror.

<Reflector for solar power generation>
If the resin base material is a resin film, the solar power generation reflection device has a reflection mirror and a self-supporting support base material, and the reflection mirror is bonded to the support base material through an adhesive layer. It is a mirror. Moreover, if a resin base material is a resin board, you may use a support base material suitably.
In addition, the "self-supporting property" referred to here is a state in which the supporting base material supports the edge portion of the reflecting mirror in a state where the supporting base material is cut into a size used as a supporting base material for the solar power generation reflecting device. This means that the reflector has rigidity enough to support the reflecting mirror. The support base material of the solar power generation reflecting device has self-supporting properties, so that it is easy to handle when installing the solar power generation reflecting device, and the holding member for holding the solar power generation reflecting device has a simple configuration. Therefore, it is possible to reduce the weight of the reflection device itself, and it is possible to suppress power consumption during solar tracking.

(Supporting substrate)
As a self-supporting support base material, there are one having a pair of metal flat plates and an intermediate layer interposed between the metal flat plates (type A), or one made of a resin material having a hollow structure (type B). It is preferable. For a specific configuration, self-supporting substrates A and B described in International Publication No. 11/162154 or US Patent Application Publication No. 2013/0114155 can be employed.

(Holding member)
The solar power generation reflection device has a holding member that holds the reflection device itself.
The holding member preferably holds the reflecting surface (reflecting mirror) in the solar power generation reflecting device in a state where the sun can be tracked. The form of the holding member is not particularly limited, but for example, a plurality of places on the support base on the back side of the solar power generation reflecting device are formed in a bar shape so that the solar power generating reflection device can hold a desired shape and posture. The form held by a columnar member or a beam-like member is preferable.
The holding member has a configuration for holding the solar power generation reflecting device in a state in which the sun can be tracked. However, in the case of solar tracking, the holding member may be driven manually, or a separate driving device may be provided to automatically track the sun. It is good also as composition to do.

  Hereinafter, the present invention will be specifically described with reference to examples and comparative examples. The film mirror of a present Example is the embodiment shown in FIG. EXAMPLES The present invention will be specifically described with reference to examples, but the present invention is not limited to these. In the examples, unless otherwise specified, the operation was performed at room temperature (25 ° C.). Unless otherwise specified, “%” and “part” mean “% by mass” and “part by mass”, respectively.

[Production of reflection mirror]
(Production of reflection mirror [1])
As the resin substrate 1, a biaxially stretched polyester film (polyethylene terephthalate film, thickness 25 μm) was used as the film. Polyester resin (Polyester SP-181, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), melamine resin (Super Becamine J-820 manufactured by DIC Corporation), TDI isocyanate (2,4- Tolylene diisocyanate) and HDMI (registered trademark) -based isocyanate (1,6-hexamethylene diisocyanate) were mixed in toluene at a resin solid content ratio of 20: 1: 1: 2 to a solid content of 10% by mass. Resin is coated by a gravure coating method to form an anchor layer 2 having a thickness of 0.1 μm, and a light reflecting layer 3 having a thickness of 100 nm is formed on the anchor layer 2 by a vacuum deposition method as a light reflecting layer. Formed.
Furthermore, acrylic resin (Acrypet VH, manufactured by Mitsubishi Rayon Co., Ltd.) and UV absorber (Tinvin 477, manufactured by BASF Japan Co., Ltd.) are dissolved in methyl ethyl ketone (MEK) at a solid content ratio of 95: 5 at a solid content of 20% by mass. After that, the light-transmitting resin layer 4 was formed by applying and drying (90 ° C., 1 minute) to a film thickness of 30 μm on the light reflecting layer 3 with an extrusion coater.
Furthermore, dipentaerythritol hexaacrylate, trimethylolpropane triacrylate (all manufactured by Mitsubishi Rayon Co., Ltd.), and photoreaction initiator (Irgacure 184, manufactured by BASF Japan Co., Ltd.) in a solid content ratio of 67: 29: 4. Then, ethyl acetate and propylene glycol monomethyl ether were mixed at a ratio of 1: 1 to obtain a mixed solution, which was diluted to 25% by mass with the mixed solution to prepare a hard coat layer forming solution [1]. This hard coat layer forming liquid [1] was applied onto the translucent resin layer 4 using a microgravure coater so that the film thickness after curing was 3 μm, and after evaporating and drying the solvent, a high-pressure mercury lamp The hard coat layer 5 was formed by curing with UV irradiation of 0.2 J / cm ² .
Next, 100 parts of an addition reaction type silicone pressure-sensitive adhesive having a weight average molecular weight of 500,000 was added with 1 part of a platinum-based catalyst to form a 35 mass% toluene solution on one side of a 25 μm thick polyester separate film. Then, after heating at 120 ° C. for 5 minutes to form an adhesive layer 6 having a thickness of 25 μm, it is laminated on the side of the resin substrate 1 opposite to the light reflecting layer 3 to obtain a reflective mirror [1] of a comparative example. It was.

(Production of reflection mirror [2])
Instead of the hard coat layer forming liquid [1] used in the reflection mirror [1], acrylic resin dipentaerythritol hexaacrylate, trimethylolpropane triacrylate (both manufactured by Mitsubishi Rayon Co., Ltd.), photoreaction initiator (Irgacure 184, manufactured by BASF Japan Ltd.), fluorine compound F1 (compound having a fluorine-containing polyether group: OPTOOL DSX solid content 20 mass%, manufactured by Daikin Industries, Ltd.) at a solid content ratio of 63.9: 27.4 : 3.7: 5, ethyl acetate and propylene glycol monomethyl ether were mixed at 1: 1 to form a mixed solution, and diluted to 25% by mass with the mixed solution to form a hard coat layer obtained. A reflective mirror [2] of a comparative example was obtained in the same manner as the reflective mirror [1] except that the liquid [2] was used.

(Production of reflection mirror [3])
Instead of the hard coat layer forming liquid [1] used in the reflection mirror [1], acrylic resin dipentaerythritol hexaacrylate, trimethylolpropane triacrylate (both manufactured by Mitsubishi Rayon Co., Ltd.), photoreaction initiator (Irgacure 184, manufactured by BASF Japan Ltd.), ionic liquid A (1-ethyl-3-methylimidazolium bromide, manufactured by Tokyo Chemical Industry Co., Ltd.) at a solid content ratio of 65.6: 28.2: 3.7 : 2.5, ethyl acetate and propylene glycol monomethyl ether were mixed 1: 1 to make a mixed solution, diluted to 25% by mass with the mixed solution, and the resulting hard coat layer forming solution [ The reflective mirror [3] of the comparative example was obtained in the same manner as the reflective mirror [1] except that 3] was used.

(Production of reflection mirror [4])
Instead of the hard coat layer forming liquid [1] used in the reflection mirror [1], urethane resin (Unidic RC29-124, manufactured by DIC Corporation), fluorine compound F2 (fluorine-containing surfactant: FC-4430, Sumitomo 3M Co., Ltd.), ionic liquid A (1-ethyl-3-methylimidazolium bromide, Tokyo Chemical Industry Co., Ltd.) in a solid content ratio of 92.5: 5: 2.5, methyl ethyl ketone (MEK) Was diluted to 30% by mass to prepare a hard coat layer forming liquid [4]. This hard coat layer forming liquid [4] is applied on the translucent resin layer 4 formed as above using a microgravure coater so that the film thickness after curing is 3 μm, and the solvent is evaporated and dried. Thereafter, the reflective mirror [4] of the present invention was formed in the same manner as the reflective mirror [1] except that it was cured by ultraviolet irradiation at 0.5 J / cm ² using a high-pressure mercury lamp.

(Production of reflection mirror [5])
Instead of the hard coat layer forming liquid [1] used in the reflection mirror [1], acrylic resin dipentaerythritol hexaacrylate, trimethylolpropane triacrylate (both manufactured by Mitsubishi Rayon Co., Ltd.), photoreaction initiator (Irgacure 184, manufactured by BASF Japan Ltd.), fluorine compound F2 (fluorine-containing surfactant: FC-4430, manufactured by Sumitomo 3M Ltd.), ionic liquid A (1-ethyl-3-methylimidazolium bromide, Tokyo) Made by Kasei Kogyo Co., Ltd.) at a solid content ratio of 62.2: 26.6: 3.7: 5: 2.5, and ethyl acetate and propylene glycol monomethyl ether were mixed 1: 1 to form a mixture, Except for using the obtained hard coat layer forming liquid [5] after being diluted to 25% by mass with a mixed liquid, reflection The reflective mirror [5] of the present invention was obtained in the same manner as the mirror [1].

(Production of reflection mirror [6])
Instead of the hard coat layer forming liquid [1] used in the reflection mirror [1], acrylic resin dipentaerythritol hexaacrylate, trimethylolpropane triacrylate (both manufactured by Mitsubishi Rayon Co., Ltd.), photoreaction initiator (Irgacure 184, manufactured by BASF Japan Ltd.), fluorine compound F3 (compound having fluorine-containing alkyl group and alkoxysilyl group: KBM7803, manufactured by Shin-Etsu Chemical Co., Ltd.), ionic liquid A (1-ethyl-3-methylimidazo (Lium bromide, manufactured by Tokyo Chemical Industry Co., Ltd.) with a solid content ratio of 62.2: 26.6: 3.7: 5: 2.5, and ethyl acetate and propylene glycol monomethyl ether mixed at 1: 1. And a hard coat layer obtained by diluting to 25% by mass with the above mixture A reflective mirror [6] of the present invention was obtained in the same manner as the reflective mirror [1] except that the component liquid [6] was used.

(Preparation of reflection mirror [7])
The resin base material used in the reflective mirror [5] is the same as the reflective mirror [5] except that a resin plate obtained by injection molding of norbornene resin (Appel, Mitsui Chemicals) is used as the base material. Thus, the reflection mirror [7] of the present invention was obtained.

(Production of reflection mirror [8])
Instead of the hard coat layer forming liquid [1] used in the reflective mirror [1], a metalloxane-based silicone liquid (BP-16N resin solid content 40% by mass, manufactured by Doken Co., Ltd.), fluorine compound F2 (fluorine-containing) Surfactant: FC-4430, manufactured by Sumitomo 3M Limited), ionic liquid A (1-ethyl-3-methylimidazolium bromide, manufactured by Tokyo Chemical Industry Co., Ltd.) in a solid content ratio of 92.5: 5: The solution was diluted to 2.5 and diluted with methyl ethyl ketone (MEK) to a concentration of 30% by mass to prepare a hard coat layer forming liquid [8]. This hard coat layer forming liquid [8] is applied on the translucent resin layer 4 formed as described above by gravure coating so that the thickness (dry film thickness) becomes 3 μm, and 1 at 85 ° C. The reflective mirror [8] of the present invention was obtained in the same manner as the reflective mirror [1] except that the hard coat layer 5 having a thickness of 3 μm was formed by drying / curing for a minute.

(Production of reflection mirror [9])
Instead of the hard coat layer forming liquid [8] used in the reflection mirror [8], a metalloxane-based silicone liquid (BP-16N resin solid content 40% by mass, manufactured by Doken Co., Ltd.), fluorine compound F1 (fluorine-containing poly Compound having ether group: Optool DSX 20 mass% solid content, manufactured by Daikin Industries, Ltd.), ionic liquid A (1-ethyl-3-methylimidazolium bromide, manufactured by Tokyo Chemical Industry Co., Ltd.) in a solid content ratio of 92 5: 5: 2.5 and diluted with methyl ethyl ketone (MEK) to a concentration of 30% by mass to prepare a hard coat layer forming liquid [9]. A reflective mirror [9] of the present invention was obtained in the same manner as the reflective mirror [8] except that the obtained hard coat layer forming liquid [9] was used.

(Production of reflection mirror [10])
Instead of the hard coat layer forming liquid [8] used in the reflection mirror [8], a metalloxane-based silicone liquid (BP-16N resin solid content 40% by mass, manufactured by Doken Co., Ltd.), fluorine compound F4 (fluorine-containing poly Compound having ether group: KF-6012 manufactured by Shin-Etsu Silicone Co., Ltd.) and ionic liquid A (1-ethyl-3-methylimidazolium bromide, manufactured by Tokyo Chemical Industry Co., Ltd.) in a solid content ratio of 92.5: 5: 2.5 and diluted with methyl ethyl ketone (MEK) to a concentration of 30% by mass to prepare a hard coat layer forming liquid [10]. A reflective mirror [10] of the present invention was obtained in the same manner as the reflective mirror [8] except that the obtained hard coat layer forming liquid [10] was used.

(Preparation of reflection mirror [11])
The reflective mirror [11] of the present invention is the same as the reflective mirror [10] except that the solid content ratio of the hard coat layer forming solution prepared by the reflective mirror [10] is 90.2: 5: 4.8. Got.

(Preparation of reflection mirror [12])
The reflective mirror [12] of the present invention is the same as the reflective mirror [10] except that the solid content ratio of the hard coat layer forming liquid prepared by the reflective mirror [10] is 89.5: 5: 5.5. Got.

(Production of reflection mirror [13])
The reflective mirror [13] of the present invention is the same as the reflective mirror [10] except that the solid content ratio of the hard coat layer forming solution prepared by the reflective mirror [10] is 94.994: 5: 0.006. Got.

(Production of reflection mirror [14])
The reflective mirror [14] of the present invention is the same as the reflective mirror [10] except that the solid content ratio of the hard coat layer forming solution prepared by the reflective mirror [10] is 94.998: 5: 0.002. Got.

(Preparation of reflection mirror [15])
The reflective mirror [15] of the present invention is the same as the reflective mirror [10] except that the solid content ratio of the hard coat layer forming solution prepared by the reflective mirror [10] is 94.05: 5: 0.95. Got.

(Preparation of reflection mirror [16])
The reflective mirror [16] of the present invention is the same as the reflective mirror [10] except that the solid content ratio of the hard coat layer forming solution prepared by the reflective mirror [10] is 94.85: 5: 0.15. Got.

(Preparation of reflection mirror [17])
The reflective mirror [17] of the present invention is the same as the reflective mirror [10] except that the solid content ratio of the hard coat layer forming solution prepared by the reflective mirror [10] is 94.5: 5: 0.5. Got.

(Preparation of reflection mirror [18])
Except that the ionic liquid A of the hard coat layer forming liquid prepared by the reflection mirror [17] was changed to ionic liquid B (1-ethyl-3-methylimidazolium trifluoromethanesulfonate, manufactured by Tokyo Chemical Industry Co., Ltd.) Obtained the reflective mirror [18] of the present invention in the same manner as the reflective mirror [17].

(Preparation of reflection mirror [19])
The ionic liquid A of the hard coat layer forming liquid prepared by the reflection mirror [17] was changed to ionic liquid C (1-ethyl-3-methylimidazolium tetrafluoroborate, manufactured by Tokyo Chemical Industry Co., Ltd.). Obtained the reflective mirror [19] of the present invention in the same manner as the reflective mirror [17].

(Preparation of reflection mirror [20])
Except that the ionic liquid A of the hard coat layer forming liquid prepared by the reflection mirror [17] is changed to ionic liquid D (1-hexyl-3-methylimidazolium hexafluorophosphate, manufactured by Tokyo Chemical Industry Co., Ltd.) Obtained the reflective mirror [20] of the present invention in the same manner as the reflective mirror [17].

(Production of reflection mirror [21])
The ionic liquid A of the hard coat layer forming liquid prepared by the reflection mirror [17] is used as the ionic liquid E (1-methyl-1-propylpyrrolidinium bis (trifluoromethanesulfonyl) imide, manufactured by Tokyo Chemical Industry Co., Ltd. The reflective mirror [21] of the present invention was obtained in the same manner as the reflective mirror [17] except for the above.

(Production of reflection mirror [22])
The ionic liquid A of the hard coat layer forming liquid prepared by the reflection mirror [17] was used as the ionic liquid F (1-propyl-2,3,5-trimethylpyrazolium bis (trifluoromethanesulfonyl) imide, Nippon Carlit. The reflective mirror [22] of the present invention was obtained in the same manner as the reflective mirror [17] except that the product was made by Kogyo Co., Ltd.

(Production of reflection mirror [23])
The ionic liquid A of the hard coat layer forming liquid prepared by the reflection mirror [17] is used as the ionic liquid G (diethylmethyl (2-methoxyethyl) ammonium bis (trifluoromethanesulfonyl) imide, manufactured by Kanto Chemical Co., Inc.). A reflection mirror [23] of the present invention was obtained in the same manner as the reflection mirror [17] except that.

(Preparation of reflection mirror [24])
Reflective mirror [17] except that the ionic liquid A of the hard coat layer forming liquid prepared by the reflective mirror [17] was changed to an ionic liquid H (1-butylpyridinium hexafluorophosphate, manufactured by Tokyo Chemical Industry Co., Ltd.). ] In the same manner as above, the reflection mirror [24] of the present invention was obtained.

(Production of reflection mirror [25])
Reflective mirror [17] except that the ionic liquid A of the hard coat layer forming liquid prepared by the reflective mirror [17] was changed to ionic liquid I (trihexyltetradecylphosphonium bromide, Sigma Aldrich Japan GK) Similarly, the reflection mirror [25] of the present invention was obtained.

(Preparation of reflection mirror [26])
As the resin base material 1, a biaxially stretched polyester film (polyethylene terephthalate film, having a thickness of 25 μm, a polyester resin (Polyester SP-181, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), a melamine resin (Super Becamine J-820). DIC Corporation), TDI-based isocyanate (2,4-tolylene diisocyanate), HDMI-based isocyanate (1,6-hexamethylene diisocyanate) at a resin solid content ratio of 20: 1: 1: 2 and a solid content of 10 mass. %, A resin mixed in toluene is coated by a gravure coating method to form an anchor layer 2 having a thickness of 0.1 μm, and a light reflection layer is formed on the anchor layer 2 by a vacuum deposition method. A silver light reflection layer 3 having a thickness of 100 nm was formed.
Furthermore, an acrylic resin (ACRYPET VH, manufactured by Mitsubishi Rayon Co., Ltd.) and an ultraviolet absorber (Tinvin 477, manufactured by BASF Japan Co., Ltd.) are applied to the reverse side of the resin base material 1 on which the light reflecting layer 3 is formed. : 5, dissolved in methyl ethyl ketone (MEK) at a solid content of 20% by mass, and then coated and dried (90 ° C., 1 minute) to a film thickness of 30 μm with an extrusion coater. Formed.
Further, the hard coat layer forming liquid [3] used in the reflection mirror [3] is applied on the translucent resin layer 4 using a microgravure coater so that the film thickness after curing is 3 μm. After evaporating and drying the solvent, the hard coat layer 5 was formed by curing with 0.2 J / cm ² ultraviolet irradiation using a high-pressure mercury lamp.
Next, 100 parts of an addition reaction type silicone pressure-sensitive adhesive having a weight average molecular weight of 500,000 was added with 1 part of a platinum-based catalyst to form a 35 mass% toluene solution on one side of a 25 μm thick polyester separate film. And after heating at 120 degreeC for 5 minute (s) and forming the 25-micrometer-thick adhesion layer 6, it laminated on the light reflection layer 3, and obtained the reflective mirror [26] of the comparative example.

(Preparation of reflection mirror [27])
Instead of the hard coat layer forming liquid [3] used in the reflective mirror [26], the hard coat layer forming liquid [9] used in the reflective mirror [9] is applied on the translucent resin layer 4 by gravure coating. The reflective mirror [26] except that the hard coat layer 5 having a thickness of 3 μm was formed by applying the film to a thickness (dry film thickness) of 3 μm and drying / curing at 85 ° C. for 1 minute. Similarly, a reflection mirror [27] of the present invention was obtained.
Table 1 shows the contents of the produced reflection mirrors.

[Evaluation of reflection mirror]
(N-hexadecane contact angle test)
Based on JIS-R3257, 3 μl of n-hexadecane was dropped on the surface of the reflecting mirror in an atmosphere at a temperature of 23 ° C. and a relative humidity of 55%, and the contact angle one minute after the dropping of the water droplet was measured with a contact angle meter DM300 ( (Kyowa Interface Chemistry).

(Steel wool test)
As a scratch resistance test, steel wool (# 0000) was attached as a wear material to a reciprocating wear tester (HEIDON-14DR manufactured by Shinto Kagaku Co., Ltd.), and a hard coat layer of a reflective mirror was applied under a load of 500 g / cm ^2. It was reciprocated 10 times at a speed of 10 mm / sec. The number of scratches at that time was measured and evaluated.

(Measurement of regular reflectance)
Using a spectrophotometer “U-4100” manufactured by Hitachi High-Technologies Corporation, the regular reflectance at an incident angle of incident light of 5 ° was measured with respect to the normal line of the reflecting surface. Evaluation was measured as an average reflectance from 250 nm to 2500 nm.

(Indoor exposure test)
The aluminum base material was cut out to 60 mm × 120 mm, and the reflection mirror sample in Table 1 was cut out and pasted to the same size. The sample was irradiated with a xenon lamp (UV irradiation) for 2 months under the conditions of a temperature of 75 ° C. and a humidity of 85% RH, and the sample taken out was subjected to the following dirt adhesion (A) and cleaning (B) (1 cycle). ). The cycle was repeated three times, and after completion, the steel wool test was performed on the reflective mirror sample, and the hexadecane contact angle and the regular reflectance were also measured.
(A) Adhering dirt The contaminated water is 0.18 g of silica sand, which is a test powder described in JIS Z 8901, 0.12 g of Kanto loam, 0.02 g of heavy calcium carbonate, and 0.18 g of heavy calcium carbonate. In addition, 0.3 g of Na ₂ SO ₄ , 0.06 g of MgCl ₂ and 0.3 g of NaCl were added and stirred for adjustment.
The cut sample was inclined at 40 °, and the contaminated water was sprayed 60 times from a height of about 60 cm, and then left in a 65 ° C.-Dry environment for 30 minutes to fix the dirt.
(B) Cleaning After immersing a nylon brush (by BYK) in accordance with ASTM D2486 in pure water for 24 hours before use, it is fixed to a jig of a surface property tester 1550 (manufactured by Imoto Seisakusho Co., Ltd.) 5 ml of pure water was included. A load was applied to the brush at 200 g / cm ² , and the reflecting mirror was reciprocated 400 times at a speed of 10 mm / sec.

(Outdoor exposure test)
The reflection mirror sample of Table 1 was affixed on the aluminum base material, the solar power generation reflective apparatus was produced, and it installed in the desert of Saudi Arabia. After that, when the reflectance was significantly lowered due to dirt, the surface was washed with ion-exchanged water, and after continuing for one year, the regular reflectance was measured under the same conditions as described above. Moreover, the regular reflectance after wash | cleaning the reflective outermost surface with a nylon brush (made by BKY) and water was measured similarly.
Table 2 shows the evaluation results for each item.

As is apparent from the evaluation results shown in Table 2, even when the hard coat layer contains the resin material, the fluorine compound and the ionic liquid according to the present invention, a washing process is further added to the severe durability conditions. It can be seen that high reflectance is obtained because of excellent scratch resistance and weather resistance.
Therefore, it can also be seen that by using the reflection mirror according to the present invention, it is possible to provide excellent economic efficiency by reducing the number of periodic cleaning of the surface of the reflection mirror.

DESCRIPTION OF SYMBOLS 1 Resin base material 2 Anchor layer 3 Light reflection layer 4 Translucent resin layer 5 Functional layer (hard-coat layer)
6 Adhesive layer

Claims (7)

From the light incident side, a functional layer, a light reflecting layer and a resin base material, or a solar light reflecting mirror provided in the order of a functional layer, a resin base material and a light reflecting layer,
The functional layer contains a resin material, a fluorine compound, and an ionic liquid.   The solar reflective mirror according to claim 1, wherein the functional layer is a hard coat layer.   The solar reflective mirror according to claim 1, wherein the resin material includes at least one of an acrylic resin and a silicone resin.   The solar reflective mirror according to any one of claims 1 to 3, wherein the fluorine compound is a compound having a fluorine-containing polyether group.   The solar light reflecting mirror according to any one of claims 1 to 4, wherein the cation component of the ionic liquid is a compound containing imidazolium.   The content of the ionic liquid is in the range of 0.005 to 5 mass% with respect to the solid content of the functional layer, and the content of the ionic liquid is any one of claims 1 to 5. Sun reflection mirror.   A solar power generation reflecting device comprising the solar light reflecting mirror according to any one of claims 1 to 6.

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