JP2016035999A5 - Light source device, illumination device, exposure device, and article manufacturing method - Google Patents

Description

The present invention relates to a light source device, an illumination device, an exposure device, and an article manufacturing method.

In order to solve the above problems, a light source apparatus according to one aspect of the present invention, there in a light source device comprising a light source for emitting light from the light emission region, a condensing section for emitting condensing light to the outside Te, condensed portion has a reflecting mirror having a reflecting surface for reflecting light emitted from the light-emitting region 4 or more, each reflector is formed to surround the axis, four or more reflector light source is disposed so as to surround the four or more reflective mirror comprises a elliptical reflecting mirror reflecting surface is ellipsoidal, a spherical reflecting mirror reflecting surface is spherical, ellipsoidal reflector and the spherical reflecting mirror and are arranged alternately in the direction of the axis, the light reflected by one of the spherical reflector, characterized in that it emits is reflected to the outside by one of the ellipsoidal reflector.

(Exposure equipment)
Next, an exposure apparatus according to an embodiment of the present invention will be described. The exposure apparatus according to the present embodiment includes the light source device according to each of the embodiments described above, and includes the light source device 110 according to the second embodiment as an example. FIG. 9 is a schematic view showing the arrangement of the exposure apparatus 400 according to this embodiment. The exposure apparatus 400 is used, for example, in a lithography process in a semiconductor device manufacturing process, and exposes an image of a pattern formed on a reticle R on a wafer W (on a substrate) by a scanning exposure method ( Transfer). In FIG. 9, the Z axis is parallel to the optical axis of the projection optical system 13, the X axis is taken in the scanning direction of the wafer W during exposure in the same plane perpendicular to the Z axis, and the non-axis perpendicular to the X axis is taken. The Y axis is taken in the scanning direction. The exposure apparatus 400 includes an illumination system 17, a reticle stage 11, a projection optical system 13 (exposure unit) , a wafer stage 16, and a control unit 18.

Claims (11)

A light source device comprising a light source for emitting light from the light emission region, a condensing section for emitting to the outside by focusing the light,
Before SL condensing unit has a reflecting mirror having a reflecting surface for reflecting the light emitted from the light-emitting region 4 or more, each reflector is formed to surround the shaft,
The four or more reflecting mirrors are installed so as to surround the light source ,
Before SL four or more reflectors may include a elliptical reflecting mirror wherein the reflective surface is elliptical surface and a spherical reflecting mirror wherein the reflective surface is a spherical surface,
Wherein the elliptic surface reflector and front Symbol spherical reflecting mirror, they are arranged alternately in the direction of said axis,
The light reflected by one of the spherical reflector, is reflected to emit to the outside by one of the ellipsoidal reflector,
A light source device characterized by that. The spherical reflector has a spherical center point in the light emitting region,
The ellipsoidal reflector has an ellipsoidal focal point in the light emitting region;
The light source device according to claim 1. In a plane containing said axis, said the range of the angle theta 'one spherical reflecting mirror for reflecting light from the light emitting region, said one of said that the light reflected anti Isa by the one spherical reflector 3. The light source device according to claim 1, wherein the angle θ of the range reflected by the ellipsoidal reflecting mirror satisfies a relationship of θ ≧ θ ′.   The light source device according to claim 1, wherein the light source includes a cathode and an anode that form the light emitting region. When the one ellipsoidal reflector and the one spherical reflector are adjacent to each other across the light emitting region,
Open end of the side adjacent to the spherical reflector in the ellipsoidal reflector, the side of the spherical reflector from the light emitting region, protrudes by 1/2 or more of the distance between the cathode and the anode The light source device according to claim 4. In a plane containing said axis, claim 4 wherein the light source and the angle for emitting the light to the side of the cathode, and the angle which the light source emits the light to the side of the anode, characterized in that equal Or the light source device of 5. The light source device according to any one of claims 1 to 6,
An optical integrator on which a light beam emitted from the light source device is incident;
A lighting device comprising: A cylindrical waveguide that is installed between the light collecting unit and the optical integrator and into which the light condensed by the light collecting unit is incident;
An optical system installed between the waveguide and the optical integrator for converting light emitted from the waveguide into parallel light ;
The lighting device according to claim 7, comprising: 9. The illumination device according to claim 8, further comprising a light beam conversion member that is detachably installed between the optical system and the optical integrator, and changes a shape of light incident on the optical integrator. An exposure apparatus comprising: the illumination apparatus according to claim 7; and an exposure unit that exposes a substrate using a mask illuminated by the illumination apparatus. Exposing the substrate using the exposure apparatus according to claim 10;
Processing the substrate exposed in the step;
Manufacture articles from processed substrates
Method of manufacturing an article, characterized and this.

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