JP2016011233A - Manufacturing method of glass substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce dispersion of thermal shrinkage of a glass substrate.SOLUTION: A manufacturing method of a glass substrate includes a step for sandwiching each of a plurality of prepared glass substrates between sheets and laminating them in the thickness direction to form a laminate of the glass substrates and a heat treatment step for reducing thermal shrinkage of the glass substrates by heat treatment of the laminate. In the heat treatment step, the laminate is sandwiched between a pair of heat insulation plates having a lower heat transfer coefficient than the glass substrate in the lamination direction and heated from the outside in the in-plane direction so as to make heat distribution of the plurality of glass substrates uniform.

Description

  The present invention relates to a method for producing a glass substrate including an annealing step for the produced glass substrate.

  In recent years, in the field of display panels, higher definition of pixels has progressed in order to improve image quality. With the progress of this high definition, it is desired that the glass substrate used for the display panel has high dimensional accuracy. For example, a glass substrate having a small thermal shrinkage is required so that the dimensions of the glass substrate are not easily changed during the manufacturing process of the display panel even if the glass substrate is heat-treated at a high temperature.

  In general, the thermal shrinkage rate of a glass substrate decreases as the strain point of the glass increases. Moreover, it is known that the thermal shrinkage rate of a glass substrate will become so small that the slow cooling rate in the manufacturing process of a glass substrate is made small. However, if the slow cooling rate is reduced, it is necessary to lengthen the slow cooling furnace that performs the slow cooling process of the glass substrate, but it is difficult to lengthen the slow cooling device on the production line.

  Therefore, the heat shrinkage rate is further lowered by performing heat treatment on a plurality of glass substrates manufactured on the production line over time. For example, a processing method of a glass plate is known that reduces a thermal shrinkage rate by holding a laminated body in which paper is sandwiched between a plurality of glass plates at a predetermined temperature for a required time (Patent Document 1).

JP-A-8-151224

  When heat treatment is performed on a laminated body of a plurality of glass plates, the whole glass plate is heated or cooled from the outside in the surface direction in the outer glass plate in the laminating direction, whereas in the central glass plate in the laminating direction, the glass plate Heated or cooled from the peripheral part toward the central part. For this reason, there is a problem that the thermal history is different between the glass plate on the outer side in the stacking direction and the glass plate at the center in the stacking direction, and there is a difference in the thermal shrinkage rate among the plurality of glass plates constituting the same stack.

  Then, an object of this invention is to provide the manufacturing method of the glass substrate which can reduce the dispersion | variation in the thermal contraction rate of the glass substrate after the heat processing with respect to the laminated body of a several glass plate.

  One embodiment of the present invention is a method for manufacturing a glass substrate including an annealing step of the manufactured glass substrate. The annealing step includes a step of stacking a plurality of manufactured glass substrates in the thickness direction in a state of being sandwiched between sheet bodies, and manufacturing a stacked body of glass substrates, and heat-treating the manufactured stacked body. A heat treatment step for reducing the thermal shrinkage rate of the glass substrate, and in the heat treatment step, the laminated body is sandwiched in a laminating direction by a pair of heat insulating plates having a lower thermal conductivity than the glass substrate. The laminated body is heated from the outside in the in-plane direction of the glass substrate so that the heat distribution of the plurality of glass substrates is made uniform.

  In the heat treatment step, the strain distribution from the end region to the central region is uniform by uniformizing the heat distribution from the end region of the glass substrate to the central region surrounded by the end region. It is preferable to heat-treat the laminated body of glass substrates so that

  For example, in the step of manufacturing the laminated body of the glass substrates, a heating plate is selectively interposed between one end and the other end in the stacking direction, and the heat distribution between the plurality of glass substrates is equalized using the heating plate. It may be.

  The heat insulating plate is preferably made of one kind selected from ceramic, alumina, silica, and rock wool, or a combination thereof.

  The sheet body is preferably made of one or a combination selected from carbon graphite, alumina fiber, silica fiber, glass fiber, and porous ceramics.

  According to the above-described method for producing a glass substrate, the laminated body is placed in the in-plane direction outside of the glass substrate in a state where the laminated body of the glass substrate is sandwiched between the pair of heat insulating plates having lower thermal conductivity than the glass substrate in the laminating direction. The heat distribution between the plurality of glass substrates can be made uniform by heating from above. For this reason, the dispersion | variation in the thermal contraction rate of the glass substrate after heat processing can be reduced.

It is a flowchart which shows the flow of the manufacturing method of the glass plate of this embodiment. It is a side view which shows the pallet on which the laminated body of the glass substrate was mounted in the heat processing performed by this embodiment. (A) is the figure which showed the position on a glass substrate, (b) is a figure which shows the thermal history in each position on a glass substrate. It is a graph which shows the relationship between the area which shows the difference of a thermal history, and distortion.

Hereinafter, the manufacturing method of the glass substrate of this invention is demonstrated in detail.
FIG. 1 is a flowchart showing the flow of the glass plate manufacturing method of the present embodiment. Although the glass substrate manufactured is not specifically limited, For example, it is preferable that each of the vertical dimension and the horizontal dimension is 500 mm to 3500 mm. The glass substrate is preferably an extremely thin rectangular plate having a thickness of 0.1 to 1.1 (mm).
First, the melted glass is formed into a sheet glass, which is a strip glass having a predetermined thickness, by a known method such as a fusion method or a float method (step S1).
Next, the formed sheet glass is sampled on a glass substrate which is a base plate having a predetermined length (step S2). The glass substrate obtained by the plate-making is laminated alternately with a sheet body that protects the glass substrate to produce a laminated body of glass substrates (step S3). Next, heat treatment is performed on the laminated body of glass substrates (step S4). The process of step S3 and the process of step S4 are the annealing process of this embodiment. Details of the annealing step will be described later.

  The glass substrate after the heat treatment is conveyed to a cutting process, and is cut into a product size to obtain a glass substrate (step S5). The obtained glass substrate is subjected to end face processing including end face grinding, polishing and corner cutting, and then the glass substrate is washed (step S6). The cleaned glass substrate is optically inspected for scratches, dust, dirt, or scratches including optical defects (step S7). A glass substrate having a quality suitable by inspection is loaded on a pallet and packed as a laminated body alternately laminated with paper protecting the glass substrate (step S8). The packed glass substrate is shipped to a supplier.

As such a glass substrate, the glass substrate of the following glass compositions is illustrated. That is, the raw material of molten glass is prepared so that the glass substrate of the following glass compositions is manufactured.
SiO ₂ 55~80 mol%,
Al ₂ O ₃ 8-20 mol%,
B ₂ O ₃ 0 to 12 mol%,
RO 0 to 17 mol% (RO is the total amount of MgO, CaO, SrO and BaO).

SiO ₂ is preferably 60 to 75 mol%, and more preferably 63 to 72 mol%, from the viewpoint of reducing the heat shrinkage rate.
Among RO, it is preferable that MgO is 0-10 mol%, CaO is 0-10 mol%, SrO is 0-10%, and BaO is 0-10%.

Further, at least SiO ₂ , Al ₂ O ₃ , B ₂ O ₃ , and RO are included, and the molar ratio ((2 × SiO ₂ ) + Al ₂ O ₃ ) / ((2 × B ₂ O ₃ ) + RO) is 4. The glass which is 5 or more may be sufficient. In addition, it is preferable that at least one of MgO, CaO, SrO, and BaO is included, and the molar ratio (BaO + SrO) / RO is 0.1 or more.

The total content of 2-fold and mol% of RO for the content of mol% of B ₂ O ₃ is 30 mol% or less, it is preferred that preferably 10 to 30 mol%.
Moreover, 0 mol% or more and 0.4 mol% or less may be sufficient as the content rate of the alkali metal oxide in the glass substrate of the said glass composition.
Further, it contains 0.05 to 1.5 mol% of metal oxides (tin oxide and iron oxide) whose valence fluctuates in the glass, and substantially contains As ₂ O ₃ , Sb ₂ O ₃ and PbO. It is not essential but optional.

[Annealing process]
Next, the annealing process will be described in detail. First, a plurality of glass substrates 11 and a plurality of sheet bodies 12 sampled in step S2 are alternately laminated one by one to produce a glass substrate laminate 10 (step S3).

FIG. 2 is a side view showing a pallet 20 on which a glass substrate laminate 10 (hereinafter referred to as a laminate 10) is placed. Here, the left side of FIG. 2 is the front side of the pallet 20, and the right side of FIG. The stacked body 10 is placed on the pallet 20 with the stacking direction approximately in the front-rear direction. Here, the stacking direction of the stacked body 10 does not have to completely coincide with the front-rear direction. For example, as shown in FIG. 2, when the glass substrate 11 is tilted diagonally, the angle formed by the stacking direction and the front-rear direction is the angle formed by the vertical direction of the glass substrate 11.
The pallet 20 includes a base portion 21, a placement portion 22, a back plate 23, and the like.
The base part 21, the mounting part 22, and the back plate 23 are made of a metal such as steel, for example, and are integrally formed by welding or the like.
The base 21 has a substantially rectangular plate shape, and is provided with an opening 21a for inserting a forklift claw on the end face.
The mounting part 22 is fixed to the upper part of the base 21, and the glass substrate laminate 10 is placed on the mounting part 22. Here, the upper surface of the mounting portion 22 does not have to be completely horizontal. For example, as shown in FIG. 2, when the glass substrate 11 is leaned diagonally, the upper surface of the mounting portion 22 may be inclined according to the leaning angle of the glass substrate 11.
The back plate 23 has a substantially rectangular plate shape, and is fixed to the rear end of the mounting portion 22 substantially perpendicularly to the mounting portion 22 at the upper portion of the base 21. The back plate 23 supports the rear end portion in the stacking direction of the stacked body 10 placed on the mounting portion 22. Here, the back plate 23 does not have to be completely vertical. For example, as shown in FIG. 2, when the glass substrate 11 is leaned diagonally, the back plate 23 may be inclined according to the leaning angle of the glass substrate 11.

  Next, the laminate 10 will be described. The laminated body 10 includes a plurality of glass substrates 11 and a plurality of sheet bodies 12.

The sheet body 12 is sandwiched between the glass substrates 11. The sheet body 12 plays a role of preventing adhesion between the laminated glass substrates 11. For the sheet body 12, a material having heat resistance that can withstand the temperature when the laminated body 10 is heat-treated can be used. The sheet body 12 preferably has a higher thermal conductivity than the glass substrate 11.
As a material of such a sheet body 12, for example, one selected from carbon graphite, alumina fiber, silica fiber, glass fiber, and porous ceramics, or a combination thereof can be selected.
The thickness of the sheet body 12 is preferably thick in order to increase the thermal conductivity in the in-plane direction of the glass substrate 11. On the other hand, in order to reduce the volume of the laminated body 10, it is preferable that the thickness of the sheet body 12 is thin. For this reason, it is preferable that the thickness of the sheet | seat body 12 is about 0.02 mm-3 mm. The area of the sheet body 12 is preferably about the same as or larger than that of the glass substrate 11 in order to prevent adhesion between the glass substrates 11.

  In addition, you may interpose the heating plate for heating the laminated body 10 instead of the sheet body 12 or with the sheet body 12 between some arbitrary glass substrates 11. FIG. As the heating plate, for example, an electrode plate that generates heat when a current is passed can be used. In this case, since the resistance value of the electrode plate changes according to the temperature of the electrode plate, the amount of current flowing through the electrode plate changes according to the temperature of the electrode plate. For this reason, the temperature of the heating plate can be controlled based on the amount of current flowing through the electrode plate. Thereby, the heat distribution among the plurality of glass substrates 11 can be adjusted uniformly.

In the present embodiment, heat treatment is performed on the laminated body 10 in a state where the laminated body 10 is sandwiched between the pair of heat insulating plates 15a and 15b.
The pair of heat insulating plates 15 a and 15 b are disposed at both ends of the stacked body 10 in the stacking direction. In FIG. 2, the heat insulation board 15a is arrange | positioned at the rear-end part, and the heat insulation board 15b is arrange | positioned at the front-end part. The heat insulating materials 15a and 15b are made of a material having a lower thermal conductivity than the glass substrate. As the material having a lower thermal conductivity than the glass substrate, for example, one kind selected from ceramic, alumina, silica, and rock wool, or a combination thereof can be selected.
The thermal resistance of the heat insulating plates 15a and 15b is preferably 0.1 ° C./W or higher in order to maintain the heat insulating performance. On the other hand, the thermal resistance of the heat insulating plates 15a and 15b is preferably 10 ° C./W or less so as not to hinder the heating and cooling of the glass substrate 11 disposed at the end of the laminate 10. The heat insulating plates 15a and 15b are preferably thick in order to maintain heat insulating performance. On the other hand, the thickness of the heat insulating plates 15 a and 15 b is preferably thin in order to reduce the volume of the laminate 10. For this reason, it is preferable that the thickness of the heat insulating plates 15a and 15b is about 10 to 50 mm. The area of the heat insulating plates 15a and 15b is preferably about the same as or larger than that of the glass substrate 11 in order to prevent the end portions of the laminated body from adhering to the glass substrate 11 from the outside in the stacking direction.

Next, the heat treatment in step S4 will be described.
A heat treatment is performed off-line off the production line on the laminate 10 produced by the process of step S3. In this heat treatment, the laminated body of the glass substrate is allowed to stand in an atmosphere of a predetermined temperature for a predetermined time, and the heat distribution from the end region of the glass substrate to the central region surrounded by the end region is made uniform, Adjustment is made so that the strain distribution from the end region to the central region is uniform.

Specifically, the pallet 20 on which the laminate 10 is placed is loaded into a furnace for heat treatment, and the glass substrate 11 is heat-treated by heating the air in the furnace and leaving it for a predetermined time. Further, when a heating plate is interposed between the glass substrates 11, the air in the furnace is heated, and the laminate 10 is heated from the inside by the heating plate.
The temperature of the heat treatment is preferably in a temperature range from a strain point of the glass substrate 11 of −400 ° C. to a strain point from the viewpoint of reducing the thermal shrinkage rate and making the strain distribution of the glass substrate uniform. The heat treatment time is, for example, 1 to 120 hours. The time history of the temperature in the atmosphere in the heat treatment is not particularly limited, and it is preferable that the temperature of the atmosphere is in the temperature range from the strain point of −400 ° C. to the strain point for at least 1 hour. If it is less than 1 hour, the heat shrinkage rate is not sufficiently reduced, and if it is longer than 120 hours, the heat shrinkage rate is sufficiently reduced, but the production efficiency of the glass substrate 11 is lowered.
The strain point of the glass substrate 11 is preferably 600 ° C. to 760 ° C. in order to obtain a glass substrate for a high definition display. For example, the strain point is 661 ° C. Even a glass substrate having a low strain point can achieve a thermal contraction rate comparable to that of a glass substrate having a high strain point by heat treatment. In this case, the minimum temperature of the heat treatment temperature is 200 ° C. (= 600 ° C.-400 ° C.) or more.
The high temperature atmosphere to which the laminate of the glass substrate is exposed is not particularly limited, and may be an atmosphere having an oxygen content of 5 to 50%, for example, an air atmosphere composed of air.

  FIG. 3A is a diagram showing the positions of points A and B on the glass substrate 11, and FIG. 3B is a diagram showing points A and B on the glass substrate 11 in FIG. It is a figure which shows the heat history in a position. Here, the thermal history indicates a history of the temperature of the glass substrate 11 that changes due to heat treatment. When the laminated body 10 of the glass substrate 11 is sandwiched in the laminating direction and the laminated body 10 is carried into a furnace for heat treatment and the temperature of the atmosphere in the furnace is raised, the heat of the atmosphere is increased in the laminating direction of the laminated body 10. It is transmitted to the glass substrate 11 from the outside. The edge region 11 a including the edge of the glass substrate 11 receives heat conduction from a high-temperature atmosphere and heats up faster than the central region 11 b surrounded by the edge region 11 a of the glass substrate 11. Further, the temperature is lowered, the edge region 11a of the glass substrate 11 in the high temperature state is exposed to the atmosphere that has become low temperature, and heat is dissipated, so that the temperature is lowered faster than the central region 11b of the glass substrate 11. For this reason, as shown in FIG.3 (b), on the glass substrate 11, the temperature around the point A rises and falls faster than the area around the point B. When there is a difference in the thermal history in this way, the thermal contraction rate is different from the edge region 11a to the central region 11b (from the periphery of the point A to the periphery of the point B), and distortion occurs because tensile and compressive stress are generated. In order to make the thermal shrinkage rate uniform within the surface of the glass substrate 11 and suppress the occurrence of distortion, the difference in temperature change from the edge region 11a to the central region 11b of the glass substrate 11 is eliminated, that is, the thermal history. It is necessary to reduce the difference.

  Here, the temperature at which the semiconductor layer composed of LTPS and IGZO is formed on the glass substrate 11 is 400 ° C. to 600 ° C. (when the strain point is 661 ° C., the temperature is 60 ° C. to 260 ° C. lower than the strain point). Therefore, it is only necessary to reduce the thermal contraction rate of the glass substrate 11 in this temperature range. For this reason, in this embodiment, heat treatment is performed so that the temperature around the points A and B of the glass substrate 11 is in the temperature range of 400 ° C. to 500 ° C. The thermal shrinkage rate changes not only with the maximum temperature when the glass substrate 11 is heat-treated, but also with the heat history. In particular, as shown in FIG. 3 (b), the heat history from the maximum temperature of the heat treatment temperature (for example, 500 ° C.) to the temperature 50 ° C. to 300 ° C. lower than the maximum temperature (for example, 450 ° C. to 200 ° C.) The heat shrinkage rate is greatly affected. The thermal shrinkage rate is a temperature at which the thermal shrinkage rate is evaluated, here, a temperature at which a semiconductor layer composed of LTPS and IGZO is formed on the glass substrate 11, for example, at a temperature range of 400 ° C. to 500 ° C. The heat shrinkage rate decreases. Further, thermal shrinkage is reduced even in the temperature range of 400 ° C. to 500 ° C. or less. That is, at a temperature close to the temperature at which the thermal shrinkage rate is evaluated, the thermal shrinkage rate is greatly affected, and the influence on the thermal shrinkage rate becomes smaller as the temperature is further away. For this reason, in the present embodiment, the heat treatment is performed so that the difference in thermal history in the surface direction of the glass substrate 11 is suppressed in the temperature range from the highest heat treatment temperature to a temperature lower by 50 ° C. to 300 ° C. In FIG.3 (b), the difference of the thermal history in the temperature range of 300 to 500 degreeC is shown. By reducing the difference in thermal history (area S in FIG. 3B) between the edge region 11a (around point A) and the central region 11b (around point B) of the glass substrate 11, the heat on the surface of the glass substrate 11 is reduced. Variations in shrinkage rate are suppressed, and the occurrence of distortion can be suppressed.

The smaller the area S formed by the difference between the thermal history at point A and the thermal history at point B, the smaller the strain value. FIG. 4 is a graph showing the relationship between the area indicating the difference in thermal history and the strain. As shown in the figure, when the strain is set to 2 kgf / cm ² or less, the glass substrate 11 is heat-treated so that the area is S1 or less. Further, the glass substrate 11 is heat-treated so that the area is S2 or less when the strain is 4 kgf / cm ² or less, and the area is S3 or less when the strain is 9 kgf / cm ² or less. The values of the areas S1 to S3 are time × temperature, that is, the amount of heat. The values of the areas S1 to S3 can be arbitrarily changed depending on the size, thickness, composition, and the like of the glass substrate 11. Thereby, the temperature and time in the heat treatment of the glass substrate 11 can be appropriately changed according to the allowable strain value required when manufacturing the panel of the high-definition display.

  Further, heat treatment is performed so that the temperature of the central region 11b (around point B) of the glass substrate 11 reaches the same maximum temperature as the temperature of the edge region 11a (around point A). When the temperature of the central region 11b (around the point B) of the glass substrate 11 reaches the maximum temperature, the difference in thermal shrinkage between the edge region 11a (around the point A) and the central region 11b (around the point B) becomes small. Generation of distortion can be reduced. The time for which the temperature of the central region 11b (around the point B) continues (maintains) the maximum temperature is arbitrary, and is, for example, 1 hour to 4 hours, and more preferably 1 hour to 2 hours. In order to achieve a predetermined heat shrinkage rate, heat treatment is performed so that the temperature of the glass substrate 11 from the edge region 11a (around the point A) to the central region 11b (around the point B) reaches the maximum temperature, thereby generating distortion. In order to suppress the heat treatment, the glass substrate 11 is heat-treated so that the difference in thermal history in the surface direction becomes small.

  By such heat treatment, the thermal shrinkage rate of the glass substrate 11 can be set to 0 to 15 ppm. The thermal contraction rate of the glass substrate 11 is preferably 0 to 12 ppm, and more preferably 0 to 6 ppm. Such a thermal contraction rate can be achieved by adjusting the glass composition of the glass substrate, the temperature of the heat treatment, and the heat treatment time.

In the present embodiment, the laminated body 10 is carried into a furnace for heat treatment in a state where the laminated body 10 of the glass substrate 11 is sandwiched between the pair of heat insulating plates 15a and 15b having lower thermal conductivity than the glass substrate 11 in the laminating direction. And since the temperature of the atmosphere in a furnace is raised, it can suppress by the heat insulation board 15a, 15b that the heat of an atmosphere is transmitted to the glass substrate 11 from the outer side of the lamination direction of the laminated body 10. FIG. For this reason, all the glass substrates 11 which comprise the laminated body 10 will be heated only from the outer side of an in-plane direction, and the heat distribution between the several glass substrates 11 can be made uniform. Therefore, variation in the thermal shrinkage rate of each glass substrate 11 after the heat treatment can be reduced.
Here, a heating plate may be disposed at an arbitrary position in the stacking direction of the stacked body 10, and the stacked body 10 may be heated by the heating plate so that the heat distribution between the plurality of glass substrates 11 is uniform.
Furthermore, by using a material having a higher thermal conductivity than the glass substrate 11 as the sheet body 12, heat transfer in the in-plane direction of the glass substrate 11 is promoted, and heat between the end region and the central region of the glass substrate 11 is promoted. The distribution can be made uniform. For this reason, the strain distribution of the glass substrate can be made uniform.

  The glass substrate manufactured by this embodiment is suitable as a glass substrate for flat panel displays, for example, a glass substrate for liquid crystal displays or a glass substrate for organic EL displays. Furthermore, the glass substrate manufactured in this embodiment is particularly suitable as a glass substrate for LTPS (Low-temperature poly silicon) TFT display used for high-definition displays, or a glass substrate for oxide semiconductor TFT displays. .

  As a method for forming sheet glass from molten glass in the present embodiment, a float method, a fusion method, or the like is used. In the method for manufacturing a glass substrate including offline heat treatment of the glass substrate in the present embodiment, the fusion method (overdown The draw method is suitable for the fusion method because it is difficult to lengthen the slow cooling device on the production line.

(Experimental example)
A plurality of glass substrates having the following glass composition were produced by an overdown draw method which is one of fusion methods. The strain point of the glass substrate was 660 ° C.

(Glass composition)
SiO ₂ 67.0 mol%,
Al ₂ O ₃ 10.6 mol%,
B ₂ O ₃ 11.0 mol%,
RO 11.4 mol% (RO is the total amount of MgO, CaO, SrO and BaO).

〔annealing〕
The glass substrate was annealed. In the examples, a glass substrate was laminated, a laminate was formed between a pair of heat insulating materials, and heat treatment was performed. In the comparative example, a glass substrate was laminated, a laminated body was formed without being sandwiched between heat insulating materials, and heat treatment was performed (conventional example). In the heat treatment, the ambient temperature was 500 ° C., and the standing time was 8 hours.

(Measurement of heat shrinkage rate)
Before heat treatment, a glass substrate is cut into a rectangle of a predetermined size, a marking line is put on both ends of the long side, and cut in half at the center of the short side to obtain two glass samples. One of the glass samples is heat-treated (temperature rising rate is 10 ° C./min, left at 450 ° C. for 1 hour). Measure the length of the other glass sample without heat treatment. Further, the heat-treated glass sample and the untreated glass sample are put together to measure the deviation amount of the marking line with a laser microscope or the like, and the difference in the length of the glass sample is obtained to obtain the thermal contraction amount of the sample. be able to. Using the difference as the amount of heat shrinkage and the length of the glass sample before the heat treatment, the heat shrinkage rate is obtained by the following equation. The thermal shrinkage rate of this glass sample was taken as the thermal shrinkage rate of the glass substrate.
Thermal contraction rate (ppm) = (difference) / (length of glass sample before heat treatment) × 10 ⁶

When the thermal shrinkage rate of the glass substrate before annealing was examined, it was 50 ppm.
When the thermal shrinkage rate of the glass substrate after annealing was examined, in the example, the thermal shrinkage rate of the glass substrate at the end portion in the stacking direction was 2 ppm, and the thermal shrinkage rate of the glass substrate in the center portion in the stacking direction was 3 ppm. . On the other hand, in the conventional example, the thermal contraction rate of the glass substrate at the end in the stacking direction was 10 ppm, and the thermal contraction rate of the glass substrate at the center in the stacking direction was 18 ppm.
In this way, by heating the laminate from the outside in the in-plane direction of the glass substrate with a pair of heat insulating plates sandwiching the laminate of the glass substrates in the laminating direction, the heat distribution between the plurality of glass substrates is evenly distributed. Can be. For this reason, the dispersion | variation in the thermal contraction rate of each glass substrate after heat processing can be reduced.

  As mentioned above, although the manufacturing method of the glass substrate of this invention was demonstrated in detail, this invention is not limited to the said embodiment, an Example, etc., In the range which does not deviate from the main point of this invention, various improvement and a change are carried out. Of course it is also good.

DESCRIPTION OF SYMBOLS 10 Laminated body 11 Glass substrate 12 Sheet body 15a, 15b Thermal insulation board 20 Pallet 21 Base part 22 Mounting part 23 Back board

Claims (5)

A method for producing a glass substrate including an annealing step of the produced glass substrate,
The annealing step includes
A step of laminating a plurality of produced glass substrates in a thickness direction in a state of being sandwiched between sheet bodies, and producing a laminated body of glass substrates;
A heat treatment step of reducing the thermal shrinkage rate of the glass substrate by heat-treating the produced laminate, and
In the heat treatment step, the laminated body is arranged so that the heat distribution of the plurality of glass substrates is made uniform in a state where the laminated body is sandwiched in a laminating direction by a pair of heat insulating plates having a thermal conductivity lower than that of the glass substrate. A method for producing a glass substrate, comprising heating from the outside in the in-plane direction of the glass substrate.   In the heat treatment step, the strain distribution from the end region to the central region is uniform by uniformizing the heat distribution from the end region of the glass substrate to the central region surrounded by the end region. The manufacturing method of the glass substrate of Claim 1 which heat-processes the laminated body of the said glass substrate so that it may become.   The manufacturing method of the glass substrate of Claim 1 or 2 which selectively interposes a heating plate between the other ends in the said lamination direction in the process of producing the laminated body of the said glass substrate.   The said heat insulation board is a manufacturing method of the glass substrate as described in any one of Claims 1-3 which consists of 1 type chosen from a ceramic, an alumina, a silica, and rock wool, or those combination. The glass according to any one of claims 1 to 4, wherein the sheet body is composed of one kind selected from carbon graphite, alumina fiber, silica fiber, glass fiber, and porous ceramics, or a combination thereof. A method for manufacturing a substrate.

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