JP2016003181A5 - - Google Patents
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- Publication number
- JP2016003181A5 JP2016003181A5 JP2015117569A JP2015117569A JP2016003181A5 JP 2016003181 A5 JP2016003181 A5 JP 2016003181A5 JP 2015117569 A JP2015117569 A JP 2015117569A JP 2015117569 A JP2015117569 A JP 2015117569A JP 2016003181 A5 JP2016003181 A5 JP 2016003181A5
- Authority
- JP
- Japan
- Prior art keywords
- brittle material
- material substrate
- scribe
- scribing method
- scribe line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 17
- 239000000463 material Substances 0.000 claims 16
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
Claims (10)
(A)少なくとも第1の方向及び前記第1の方向と平行でない第2の方向のそれぞれに沿って延伸する複数の分断予定線を、前記脆性材料基板の前記第1の表面に設定する工程と、
(B)スクライブユニットにより、設定された複数の分断予定線に沿ってスクライブし、前記スクライブユニットに可変荷重をかけることにより、前記第1の方向において少なくとも1本の第1のスクライブラインを形成し、及び前記第1のスクライブラインと交差する第2の方向において少なくとも一本の第2のスクライブラインを形成する工程と、を含み、
前記少なくとも一本の第1のスクライブラインと前記少なくとも一本の第2のスクライブラインは交差して少なくとも1つの交点を形成し、
(C)前記少なくとも一本の第1のスクライブラインを形成する際に前記スクライブユニットにかかる荷重は、前記スクライブユニットが前記少なくとも1つの交点の近辺領域にない時の荷重がP1で、前記スクライブユニットが前記少なくとも1つの交点の近辺領域にある時の荷重がM1であり、
(D)前記少なくとも一本の第2のスクライブラインをスクライブする際に前記スクライブユニットにかかる荷重は、前記スクライブユニットが前記少なくとも1つの交点の近辺領域にない時の荷重がP2で、前記スクライブユニットが前記少なくとも1つの交点の近辺領域にある時の荷重がM2であり、かつ、
(E)M1、M2は共に、少なくともP1とP2よりも小さく、かつ、0ではない、脆性材料基板のスクライブ方法。 A scribing method for forming a scribe line on a brittle material substrate including a first surface and a second surface relative to the first surface, wherein the scribing method comprises:
(A) setting a plurality of planned dividing lines extending along each of at least a first direction and a second direction not parallel to the first direction on the first surface of the brittle material substrate; ,
(B) The scribing unit scribes along a plurality of planned dividing lines and applies a variable load to the scribe unit, thereby forming at least one first scribe line in the first direction. And forming at least one second scribe line in a second direction intersecting the first scribe line, and
The at least one first scribe line and the at least one second scribe line intersect to form at least one intersection;
(C) The load applied to the scribe unit when forming the at least one first scribe line is P1 when the scribe unit is not in the vicinity of the at least one intersection, and the scribe unit Is in the vicinity of the at least one intersection, the load is M1;
(D) The load applied to the scribe unit when scribing the at least one second scribe line is P2 when the scribe unit is not in the vicinity of the at least one intersection, and the scribe unit And the load when M is in the vicinity of the at least one intersection is M2, and
(E) A scribing method for a brittle material substrate in which both M1 and M2 are at least smaller than P1 and P2 and not 0.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW103121259A TWI527674B (en) | 2014-06-19 | 2014-06-19 | Method and apparatus for scribing brittle material substrate |
TW103121259 | 2014-06-19 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016003181A JP2016003181A (en) | 2016-01-12 |
JP2016003181A5 true JP2016003181A5 (en) | 2018-07-05 |
JP6551661B2 JP6551661B2 (en) | 2019-07-31 |
Family
ID=54944545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015117569A Expired - Fee Related JP6551661B2 (en) | 2014-06-19 | 2015-06-10 | Method and apparatus for scribing brittle material substrate |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6551661B2 (en) |
KR (1) | KR20150145711A (en) |
CN (1) | CN105196423B (en) |
TW (1) | TWI527674B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3361839A1 (en) * | 2017-02-14 | 2018-08-15 | Infineon Technologies AG | Multiple substrate and method for its fabrication |
CN107538630A (en) * | 2017-07-14 | 2018-01-05 | 合肥文胜新能源科技有限公司 | A kind of device for silicon chip cutting |
CN107379292B (en) * | 2017-09-15 | 2019-07-02 | 京东方科技集团股份有限公司 | Cutting method, system and the storage medium of display panel |
TWI774883B (en) * | 2017-12-26 | 2022-08-21 | 日商三星鑽石工業股份有限公司 | Scribing method and scribing device for bonding substrates |
JP2021154502A (en) * | 2020-03-25 | 2021-10-07 | 三星ダイヤモンド工業株式会社 | Breaking method of brittle material substrate and substrate processing device |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000280234A (en) * | 1999-01-28 | 2000-10-10 | Canon Inc | Method for cutting of substrate |
CN1863740B (en) * | 2001-07-18 | 2012-04-25 | 三星钻石工业股份有限公司 | Scribe head, scribe apparatus and scribe method using the scribe head |
JP2003212579A (en) * | 2002-01-24 | 2003-07-30 | Nakamura Tome Precision Ind Co Ltd | Cross-scribing method of hard brittle plate and apparatus thereof |
JP5076662B2 (en) * | 2007-06-13 | 2012-11-21 | 澁谷工業株式会社 | Method and apparatus for cleaving brittle materials |
JP5139852B2 (en) * | 2008-03-17 | 2013-02-06 | 三星ダイヤモンド工業株式会社 | Scribing apparatus and scribing method |
JP2011088382A (en) * | 2009-10-23 | 2011-05-06 | Mitsuboshi Diamond Industrial Co Ltd | Breaking device and breaking method |
JP2011155151A (en) * | 2010-01-27 | 2011-08-11 | Mitsuboshi Diamond Industrial Co Ltd | Scribing apparatus for thin-film solar cell |
JP2011178054A (en) * | 2010-03-02 | 2011-09-15 | Ihi Corp | Brittle material cutting device and cutting method |
JP5156080B2 (en) * | 2010-11-05 | 2013-03-06 | 三星ダイヤモンド工業株式会社 | Method for scribing bonded substrates |
JP5479424B2 (en) * | 2011-09-30 | 2014-04-23 | 三星ダイヤモンド工業株式会社 | Scribing wheel for brittle material, scribing device and scribing tool for brittle material substrate using the same |
JP2013159540A (en) * | 2012-02-08 | 2013-08-19 | Mitsuboshi Diamond Industrial Co Ltd | Scribing device |
-
2014
- 2014-06-19 TW TW103121259A patent/TWI527674B/en not_active IP Right Cessation
-
2015
- 2015-06-10 CN CN201510315124.3A patent/CN105196423B/en not_active Expired - Fee Related
- 2015-06-10 JP JP2015117569A patent/JP6551661B2/en not_active Expired - Fee Related
- 2015-06-18 KR KR1020150086271A patent/KR20150145711A/en active Search and Examination
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