JP2015511667A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015511667A5 JP2015511667A5 JP2014561293A JP2014561293A JP2015511667A5 JP 2015511667 A5 JP2015511667 A5 JP 2015511667A5 JP 2014561293 A JP2014561293 A JP 2014561293A JP 2014561293 A JP2014561293 A JP 2014561293A JP 2015511667 A5 JP2015511667 A5 JP 2015511667A5
- Authority
- JP
- Japan
- Prior art keywords
- sputter device
- rotatable
- sputter
- deposition apparatus
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008021 deposition Effects 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims 22
- 238000004544 sputter deposition Methods 0.000 claims 10
- 239000011248 coating agent Substances 0.000 claims 7
- 238000000576 coating method Methods 0.000 claims 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2012/054261 WO2013135265A1 (en) | 2012-03-12 | 2012-03-12 | Mini rotatable sputter devices for sputter deposition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015511667A JP2015511667A (ja) | 2015-04-20 |
| JP2015511667A5 true JP2015511667A5 (https=) | 2015-05-28 |
| JP6073383B2 JP6073383B2 (ja) | 2017-02-01 |
Family
ID=45852532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014561293A Expired - Fee Related JP6073383B2 (ja) | 2012-03-12 | 2012-03-12 | スパッタ堆積用の小型の回転可能なスパッタデバイス |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20160189939A1 (https=) |
| EP (1) | EP2826057B1 (https=) |
| JP (1) | JP6073383B2 (https=) |
| KR (1) | KR101780466B1 (https=) |
| CN (1) | CN104160471B (https=) |
| TW (1) | TWI567216B (https=) |
| WO (1) | WO2013135265A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018517846A (ja) * | 2015-06-05 | 2018-07-05 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | スパッタ堆積源、スパッタリング装置およびそれらを動作させる方法 |
| WO2016202468A1 (de) * | 2015-06-16 | 2016-12-22 | Schneider Gmbh & Co. Kg | Vorrichtung, verfahren und verwendung zur beschichtung von linsen |
| KR102407392B1 (ko) * | 2015-07-03 | 2022-06-13 | 삼성디스플레이 주식회사 | 스퍼터링 장치 및 이를 이용한 스퍼터링 방법 |
| US12057297B2 (en) * | 2015-10-22 | 2024-08-06 | Richard DeVito | Deposition system with integrated cooling on a rotating drum |
| DE102016125273A1 (de) | 2016-12-14 | 2018-06-14 | Schneider Gmbh & Co. Kg | Anlage, Verfahren und Träger zur Beschichtung von Brillengläsern |
| CN107354443B (zh) * | 2017-07-26 | 2019-10-11 | 中国电子科技集团公司第五十五研究所 | 一种调节磁控溅射镀膜均匀性的装置 |
| CN109487225A (zh) * | 2019-01-07 | 2019-03-19 | 成都中电熊猫显示科技有限公司 | 磁控溅射成膜装置及方法 |
| BE1027427B1 (nl) | 2019-07-14 | 2021-02-08 | Soleras Advanced Coatings Bv | Bewegingssystemen voor sputter coaten van niet-vlakke substraten |
| EP4270444A1 (en) * | 2022-04-27 | 2023-11-01 | Bühler Alzenau GmbH | Magnetron sputtering system with tubular sputter cathode and method for controlling a layer thickness |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19610253C2 (de) * | 1996-03-15 | 1999-01-14 | Fraunhofer Ges Forschung | Zerstäubungseinrichtung |
| WO2000028104A1 (en) * | 1998-11-06 | 2000-05-18 | Scivac | Sputtering apparatus and process for high rate coatings |
| DE10145201C1 (de) * | 2001-09-13 | 2002-11-21 | Fraunhofer Ges Forschung | Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron-Zerstäuben |
| CA2594751A1 (en) * | 2005-01-13 | 2006-07-20 | Cardinal Cg Company | Reduced maintenance sputtering chambers |
| JP2008038192A (ja) * | 2006-08-04 | 2008-02-21 | Optorun Co Ltd | スパッタ源、スパッタ成膜装置およびスパッタ成膜方法 |
| JP2009024230A (ja) * | 2007-07-20 | 2009-02-05 | Kobe Steel Ltd | スパッタリング装置 |
| KR20110137331A (ko) * | 2009-03-20 | 2011-12-22 | 어플라이드 머티어리얼스, 인코포레이티드 | 고온의 회전가능한 타겟을 가진 증착 장치와 그 작동 방법 |
| JP5240782B2 (ja) * | 2009-05-18 | 2013-07-17 | 株式会社神戸製鋼所 | 連続成膜装置 |
| EP2306489A1 (en) * | 2009-10-02 | 2011-04-06 | Applied Materials, Inc. | Method for coating a substrate and coater |
| EP2640865B1 (en) * | 2010-11-17 | 2020-05-13 | Soleras Advanced Coatings bvba | Soft sputtering magnetron system |
-
2012
- 2012-03-12 JP JP2014561293A patent/JP6073383B2/ja not_active Expired - Fee Related
- 2012-03-12 CN CN201280071216.6A patent/CN104160471B/zh not_active Expired - Fee Related
- 2012-03-12 EP EP12709309.4A patent/EP2826057B1/en not_active Not-in-force
- 2012-03-12 US US14/384,287 patent/US20160189939A1/en not_active Abandoned
- 2012-03-12 KR KR1020147028546A patent/KR101780466B1/ko not_active Expired - Fee Related
- 2012-03-12 WO PCT/EP2012/054261 patent/WO2013135265A1/en not_active Ceased
-
2013
- 2013-03-12 TW TW102108667A patent/TWI567216B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015511667A5 (https=) | ||
| JP6073383B2 (ja) | スパッタ堆積用の小型の回転可能なスパッタデバイス | |
| JP2013167353A5 (https=) | ||
| TWI680882B (zh) | 積層體及阻氣薄膜 | |
| WO2012142439A8 (en) | Method and apparatus for ion-assisted atomic layer deposition | |
| GB2563520A (en) | Method providing for a storage element | |
| WO2010065966A3 (en) | High rate deposition of thin films with improved barrier layer properties | |
| Zhang et al. | Thin film encapsulation for organic light-emitting diodes using inorganic/organic hybrid layers by atomic layer deposition | |
| Franz et al. | Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbO x film growth | |
| EP3929326A3 (en) | Compositions and processes for depositing carbon-doped silicon-containing films | |
| Han et al. | Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation | |
| TW201319288A (zh) | 用於濺射沉積裝置之陰極組件與在濺射沉積裝置中沉積薄膜於基板上之方法 | |
| Ding et al. | An XPS study on the chemical bond structure at the interface between SiOxNy and N doped polyethylene terephthalate | |
| Yong-Qiang et al. | Optimization of Al2O3 films deposited by ALD at low temperatures for OLED encapsulation | |
| KR20120079716A (ko) | 내지문 코팅 방법 및 장치 | |
| US20140001037A1 (en) | Windpipe for vacuum coating device and vacuum coating device using the windpipe | |
| CN104775102B (zh) | 卷对卷磁控溅射阴极与柱状多弧源相结合的真空镀膜系统 | |
| Szelwicka et al. | High‐Performance Thermochromic VO2‐Based Coatings Deposited by Roll‐to‐Roll High‐Power Impulse Magnetron Sputtering | |
| CN106460153B (zh) | 透明导电性膜及其制造方法 | |
| TW201714318A (en) | Solar cell structure and method for manufacturing the same | |
| TW201614726A (en) | Method of depositing a layer in a via or trench, method of manufacturing a transistor, layer stack for an electronic device, and an electronic device | |
| Pokorný et al. | Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al: Zn target by ion mass spectrometry | |
| GB2485494A (en) | Method of controlling the composition of a photovoltaic thin film | |
| JP6396367B2 (ja) | Ｐｖｄアレイ用の多方向レーストラック回転カソード | |
| JP2016212941A5 (https=) |