JP2015225113A - Optical element, molding type, manufacturing method and optical device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an optical element that suppresses collapse of patterns due to contraction when a material is hardened while facilitating increase in size, and is excellent in accuracy.SOLUTION: An optical element 200 comprises: a structured body 20 in which a concavity groove 21 whose width is shorter than a wavelength of a light flux supposed to transmit and a convexity groove 22 whose width is shorter than the wavelength are periodically arranged; and an isolation preventive part 30 that is arranged adjacent to the concavity groove 21 and the convexity groove 22. The isolation preventive part 30 has an isolation preventive concavity part 31 that is a concavity with a height corresponding to the concavity groove 21, and a columnar isolation preventive convexity part 22 with a height corresponding to the convexity groove 22, in which the concavity groove 21 and the convexity groove 22 are arranged to abut on the isolation preventive concavity part 31 and the isolation preventive convexity part 32.

Description

The present invention relates to a technical field of an optical element manufactured by curing a resin, a mold used for manufacturing the optical element, a method for manufacturing the optical element, and an optical device using the optical element.

As a polarizing plate used for a liquid crystal display or the like, or a wave plate of an optical measuring instrument, an optical element having a surface with an uneven shape with a width narrower than the wavelength of incident light is known (for example, Patent Documents 1 to 4). reference).
As a method for forming such a sub-wavelength level fine structure on the surface, an original plate previously provided with a pattern by a laser, an electron beam or the like is used as a mold, and is brought into close contact with a material such as a photo-curing resin, and the surface is pressed by pressing A technique for transferring a pattern to a molded product is known (see, for example, Patent Document 2).
Further, since it is difficult to process and increase the size of the original due to time and cost problems, a method of easily increasing the size by using a primary transfer product to which the original has been transferred as a forming die is also conceivable.
When such a material is cured, a volume decrease of 3 to 10% generally occurs, so that the pattern shrinks when the material is cured and a phenomenon called “sink” occurs, resulting in deterioration of the accuracy of the uneven shape. There is.
In order to solve such a problem, `` sink marks '' are generated by curing the material by sequentially exposing light in a line parallel to the pattern and curing the material while supplying the material from the uncured part. There is known a method for suppressing the temperature (see, for example, Patent Document 5).
However, even with such a method, for example, when the pattern direction is divided into multiple directions, the pattern is isolated and the material is not supplied, and it is difficult to suppress the occurrence of “sinking”. was there.

In order to solve such a problem, a method of preventing the isolation of the pattern by forming a material supply pattern for supplying a material such as a photo-curing resin in the gap in which the patterns are arranged can be considered.
However, by simply providing a pattern for supplying the material, if the primary transfer product to which the original plate is transferred is used as a molding die, the unevenness will be reversed, preventing isolation. I can't.

  The present invention has been made in view of the above problems, and an object of the present invention is to suppress pattern collapse due to shrinkage during curing of a material while facilitating an increase in size.

  In order to solve the above-described problems, an optical element according to the present invention includes a structure in which concave stripes having a width shorter than the wavelength of a light beam to be transmitted and convex stripes having a width shorter than the wavelength are periodically arranged. And an isolation preventing portion disposed adjacent to the recess and the protrusion, and the isolation preventing portion is an isolation preventing recess that is a recess having a height corresponding to the recess. A columnar isolation prevention protrusion having a height corresponding to the protrusion, and both the recess and the protrusion are disposed in contact with the isolation prevention recess and the isolation prevention protrusion. Is done.

  According to the present invention, it is possible to manufacture a high-precision optical element while facilitating an increase in size while suppressing collapse of a pattern due to shrinkage during curing of a material.

It is a figure which shows an example of a structure of the optical apparatus in embodiment of this invention. It is a figure which shows an example of a structure of the optical element in the 1st Embodiment of this invention. It is sectional drawing of the optical element shown in FIG. It is a figure which shows an example of the process of the manufacturing method of the optical element in this invention. FIG. 3 is a diagram showing an example of a primary transfer product transferred using the optical element shown in FIG. 2 as a mold. It is a figure which shows an example of a structure of the optical element in the 2nd Embodiment of this invention. It is a figure which shows an example of a structure of the optical element in the 3rd Embodiment of this invention. It is a figure which shows an example of a structure of the optical element in the 4th Embodiment of this invention. It is a figure which shows an example of a structure of the optical element in the 5th Embodiment of this invention. It is a figure which shows an example of a structure of the optical element in a prior art. It is a figure which shows an example of the primary transfer product transcribe | transferred using the optical element shown in FIG. 10 as a type | mold.

FIG. 1 shows, as an example of an optical device using the optical element according to the first embodiment of the present invention, an optical scanning device in an image forming apparatus such as a printer, a copying machine, a facsimile alone, or a composite machine thereof. A schematic configuration is shown.
The optical scanning device 100 includes a light source 101 that emits a light beam as scanning light, a collimator lens 102 that makes the incident light beam substantially parallel, and an optical element that emits the light beam incident from the light source 101 as a light beam having a random polarization state. 200.
The optical scanning device 100 also includes a polygon scanner 103 which has a reflecting mirror on each side of a regular polygonal prism and serves as a deflecting unit that deflects and scans a light beam by high-speed rotation.
The optical scanning device 100 is also a scanning lens that changes the equiangular motion of the deflected scanning light into a uniform linear motion, and has an fθ lens 104 that is an imaging optical system that forms an image on the photoconductor 105. doing.

  The light source 101 is a semiconductor laser that emits laser light that is a light beam that is scanning light. Here, the light source 101 may be a light source such as an LED.

The optical element 200 is a depolarizing element provided on the optical path from the collimator lens 102 to the polygon scanner 103.
As shown in FIG. 2, the optical element 200 includes a plurality of concave strips 21 having a width shorter than the wavelength of the light beam to be transmitted and convex strips 22 having a width shorter than the wavelength of the light beam. It has the structure 20, and the isolation | separation prevention part 30 arrange | positioned adjacent to the concave strip 21 and the convex strip 22. FIG.
The structural body 20 is structured birefringent by forming concave and convex shapes, which are fine structure patterns having a sub-wavelength pitch, on the surface by periodically arranging the concave stripes 21 and the convex stripes 22 substantially in parallel with each other. It has a function.
In FIG. 2, a line displayed with a black thick line is a convex part that is a part with a high height from the substrate, and a line displayed with a white line is a concave part with a low height from the board as compared with the convex part. It will be displayed. The same applies to FIGS. 6 to 12 below.

In order to describe the structural birefringence in more detail, FIG. 3 shows a cross section taken along the line AA ′ of the optical element 200 shown in FIG. Here, the longitudinal direction of the concave stripes 21 and the convex stripes 22 is the X direction, and is on the plane parallel to the optical element 200 and perpendicular to the X direction, that is, irregularities in which the concave stripes 21 and the convex stripes 22 are alternately arranged. A forming direction is a Y direction, and a direction perpendicular to the X direction and the Y direction is a Z direction.
Structural birefringence means that when two types of media having different refractive indexes are alternately arranged in a stripe pattern with a period shorter than the wavelength of light, the polarization component TE in the X direction parallel to the stripe and the perpendicular to the stripe This means an action in which the refractive index is different from that of the polarization component TM in the Y direction.
Here, when the structure 20 is formed of a medium having a relative refractive index n with respect to air, the ridge 22 having a refractive index n, a width L, and a height d, and a refractive index 1, a width S, and a height d. Since the stripes 21 are alternately and periodically arranged to form a stripe structure, the structure 20 causes structural birefringence.
The structure 20 has a polarization direction limiting function that limits the polarization direction of the transmitted light beam to the concave / convex formation direction, which is the direction in which the concave stripes 21 and the convex stripes 22 are arranged, by the structural birefringence function.
The optical element 200 places a plurality of such structures 20 in the same plane so that the unevenness forming directions are different from each other, thereby limiting the polarization direction of the transmitted light beam to the unevenness forming direction of each structure 20. .
With this configuration, the optical element 200 has a function as a depolarizing element that emits a non-polarized light beam having no specific polarization direction as a whole even when the incident light beam is polarized in a specific direction. doing.

As shown in FIG. 2 or FIG. 3, the isolation preventing portion 30 is disposed on the peripheral portion of the structure 20, and corresponds to the isolation preventing recess 31 that is a dent having a height corresponding to the recess 21 and the protrusion 22. And a columnar isolation preventing protrusion 32 having a height.
The isolation preventing part 30 prevents the isolation state in which the recess 21 is disconnected from the outside of the structure 20 in an exposure process to be described later, with the isolation preventing recess 31 in contact with the recess 21.
The isolation preventing unit 30 also prevents an isolation state in which the projection 22 is disconnected from the outside of the structure 20 in the exposure process by the contact of the isolation preventing projection 32 with the projection 22.
With this configuration, the isolation preventing unit 30 has a function as isolation preventing means in the exposure process.
The isolation preventing concave portion 31 and the isolation preventing convex portion 32 are periodically arranged so as to be symmetric with respect to the diagonal line of the optical element 200 as the symmetry axis 33.

  The concave strip 21 and the convex strip 22 are both disposed in contact with both the isolation preventing concave portion 31 and the isolation preventing convex portion 32.

  The polygon scanner 103 is a rotating polygon mirror that is rotated in a direction indicated by direction A in FIG. 1 by a driving source (not shown).

The photoconductor 105 is a rotating body that is a drum-shaped image carrier having a photosensitive layer that is a scanning surface of scanning light (not shown) on the surface.
The photosensitive member 105 is irradiated with scanning light by the optical scanning device 100 to form a latent image on the photosensitive layer.

The operation when forming a latent image on the photosensitive layer in the optical scanning device 100 having such a configuration will be described.
The light beam emitted from the light source 101 passes through the collimator lens 102 and changes to substantially parallel light.
Here, the light beam emitted from the light source 101 is a light beam polarized in a specific direction.
The light beam that has passed through the collimator lens 102 is not polarized in a specific direction by passing through the optical element 200, changes to a non-polarized light beam, and is deflected by the polygon scanner 103 to become scanning light. To form a latent image.
Here, driving means such as a motor (not shown) may be connected to the optical element 200 to rotate the optical element 200 in a direction perpendicular to the light beam with the optical axis of the light beam as the rotation center. By having such a driving means, the optical element 200 can cancel the temporal polarization of the incident light beam and emit a so-called incoherent light beam.

An example of a method for manufacturing the optical element 200 will be described with reference to FIG.
Prior to the manufacture of the optical element 200, a mother mold, which is a mold for forming a fine structure pattern of the optical element 200, is manufactured (step S1).
Step S1, which is a mold creation process, will be described.
First, a resist is applied to the surface of a quartz mold substrate and then irradiated with an electron beam to form a fine resist pattern having a width shorter than the wavelength of a light beam to be processed. Next, metal deposition is performed using the resist pattern as a mask, and finally dry etching is performed using the metal deposition film as a mask. Step S1 is electron beam lithography including these steps.
By this method, a fine structure pattern as shown in FIG. 5 is formed on the surface of the quartz mold substrate, which is provided with a concavo-convex shape similar to the optical element 200 shown in FIG. Is done. That is, the mother type has a structure 20 in which concave stripes 21 having a width shorter than the wavelength of the light beam to be processed and convex stripes 22 having a width shorter than the wavelength are periodically arranged, and the concave stripes 21. And the isolation preventing part 30 disposed adjacent to the ridges 22.
In addition, since the mother-type configuration is the same as that of the optical element 200, description thereof is omitted.

Next, the optical element 200 is manufactured using such a mother mold.
A photocurable resin is filled between the quartz substrate and the mother mold, and the mother mold is pressed to adhere to the photocurable resin (step S2).
In step S2, which is such an adhesion process, the photocurable resin is still in a fluid state.
By setting the photocurable resin in close contact with the mother mold, the concave stripes 21, the convex stripes 22, and the isolation preventing portions 30, which are fine structure patterns on the mother mold surface, are temporarily attached to the surface of the photocurable resin. It is formed.
At this time, the isolation preventing portion 30 was temporarily formed with an isolation preventing recess 31 having a height corresponding to the recess 21 and a columnar isolation preventing projection 32 having a height corresponding to the protrusion 22. State.

  By exposing the photocurable resin on which the fine structure pattern is formed in this way, the photocurable resin is cured, and the fine structure pattern on the mother surface is transferred to the photocurable resin (step S3). . Here, step S3 is an exposure process for exposing the photocurable resin and a curing process for curing the photocurable resin.

  The optical element 200 made of the photocurable resin can be obtained through a separation step of separating the photocurable resin cured through the step S3 and the mother mold (step S4).

In the manufacturing method of the optical element 200 as described above, the optical element 200 obtained in steps S1 to S4 may be used as a sister mold as a molding die that is a primary transfer plate instead of the mother mold. .
As shown in FIG. 4, the primary transfer plate on which the original plate is transferred is further used as a forming mold, and the steps S2 to S4 are repeated as a sister forming process, thereby increasing the cost and size as in electron beam lithography. A large-sized sister type is formed without performing difficult processing.
By using the sister mold, the steps S2 to S4 are performed, so that the optical element 200 is manufactured repeatedly and inexpensively while being easily enlarged.

By the way, in step S3 which is the hardening process of hardening photocurable resin of the manufacturing method of this optical element 200, when the photocurable resin hardens | cures, the volume reduces about 3 to 10% normally.
Such a decrease in volume may cause a problem called “sink” in which the fine structure pattern formed on the photo-curable resin collapses, particularly in the production of the optical element 200 that requires a fine structure pattern with a width shorter than the wavelength. There is.

In order to solve such a problem, in the exposure in step S3, the mother mold and the photocurable resin are in close contact with each other in the X direction parallel to the longitudinal direction of the concave stripes 21 and the convex stripes 22. A method of sequentially exposing and curing can be considered.
However, even with such a method, for example, as shown in FIG. 2, when the direction of the fine structure pattern of the structure 20 is divided in multiple directions, the concave stripes 21 or the convex stripes 22 are isolated and made of material. There is concern that it will be difficult to control the occurrence of “sinks” due to the lack of supply.
Alternatively, there is a method for preventing isolation between the concave stripes 21 and the convex stripes 22 by forming an isolation preventing portion 30 for supplying a photocurable resin in a gap in which the concave stripes 21 and the convex stripes 22 are arranged. Conceivable.
However, as in the conventional example shown in FIG. 11, the isolation preventing unit 30 shown in FIG. 12 is used when the optical element 200 is manufactured using a sister type simply by providing the isolation preventing unit 30 around the structure 20. As shown in FIG. 30, the unevenness is reversed, and isolation cannot be prevented.
Therefore, in the optical element 200, both the concave stripe 21 and the convex stripe 22 are disposed in contact with the isolation prevention concave portion 31 and the isolation prevention convex portion 32.
With such a configuration, in step S3, uncured photocurable resin flows from the isolation prevention recess 31 into the recess 21, so that the pattern is not collapsed due to shrinkage when the material is cured while facilitating an increase in size. Suppressing and manufacturing an accurate optical element.

  Further, with this configuration, as shown in FIG. 5, even when the unevenness is reversed in the sister type, the photocurable resin flows from the isolation prevention recess 31 into the recess 21 even if the recesses and projections are reversed, and the size of the material can be easily increased. An optical element with high accuracy is manufactured by preventing pattern collapse due to shrinkage during curing.

  Further, the isolation preventing unit 30 is disposed at the peripheral edge of the structure 20. With such a configuration, the light beam transmitted through the structure 20 is suppressed or prevented from passing through the isolation preventing unit 30, and the effective use rate that is the degree of opening of the optical element 200 is improved, but the shrinkage at the time of curing of the material is achieved. The optical element with high accuracy is manufactured by suppressing the collapse of the pattern.

FIG. 6 shows a second embodiment of the present invention.
In the following drawings, the same configurations as those in the drawings of the other embodiments will be omitted as appropriate, or the description thereof will be omitted as appropriate by giving the same reference numerals.
In the present embodiment, the isolation preventing concave portion 31 and the isolation preventing convex portion 32 of the optical element 200 are arranged symmetrically with respect to the symmetry axis 33 that is a diagonal line of the optical element 200.
With such a configuration, an optical element with high accuracy can be manufactured by suppressing the collapse of the pattern due to the shrinkage at the time of curing the material while facilitating an increase in size.
Other configurations in the second embodiment are the same as those in the first embodiment, and thus description thereof will be omitted as appropriate.

FIG. 7 shows a third embodiment of the present invention.
In the third embodiment, the isolation preventing protrusions 32 are disposed overlapping the inside of the structure 20.
With this configuration, the arrangement of the isolation preventing unit 30 can be freely designed, and while improving the design freedom of the optical element 200, the collapse of the pattern due to shrinkage at the time of curing of the material is suppressed, and a high-precision optical element Manufacturing.
Further, since the isolation preventing convex portion 32 is disposed in the structure 20 through which the light beam is transmitted, that is, in a region that affects the optical characteristics, the isolation preventing convex portion 32 is more isolated when the light beam is transmitted. It contributes to the light transmittance more than the prevention recess 31.
Since it is arranged in the region that affects the optical characteristics in this way, the isolation preventing convex portion 32 in the third embodiment has a width that can be optically ignored. That is, the isolation preventing convex part 32 has a width narrower than that of the convex line 22 or the concave line 21, and preferably has a width equal to or less than ½ of the wavelength of the light beam to be transmitted.
The isolation preventing protrusion 32 may have any width that can be ignored optically, and the width may not be constant.
With such a configuration, while further improving the effective usage rate that is the degree of opening of the optical element 200, the collapse of the pattern due to shrinkage during curing of the material is suppressed, and a highly accurate optical element is manufactured.
Other configurations in the third embodiment are the same as those in the first embodiment, and thus description thereof will be omitted as appropriate.

FIG. 8 shows a fourth embodiment of the present invention.
FIG. 8 is an enlarged view of the structure 20 of the optical element 200. In the fourth embodiment, the ridges 22 and the ridges 21 are formed so as to be alternately arranged concentrically. ing.
In such a configuration, as shown in FIG. 2, it is not possible to prevent the ridges 22 or the ridges from being isolated during exposure only by disposing the isolation preventing portion 30 outside the structure 20.
Therefore, both the isolation prevention convex part 32 and the isolation prevention concave part 31 are disposed overlappingly inside the structure 20.
With this configuration, while further improving the degree of freedom of design of the optical element 200, the collapse of the pattern due to shrinkage during the curing of the material is suppressed, and an accurate optical element is manufactured.
Further, if the isolation preventing portion 30 having a width larger than the ridge 22 is formed in the structure 20, the transmitted light flux is greatly affected, and the aperture of the optical element 200 may change. .
Therefore, both the isolation preventing convex portion 32 and the isolation preventing concave portion 31 in the fourth embodiment have a width that can be optically ignored. That is, the isolation prevention convex part 32 and the isolation prevention recessed part 31 are narrower than the ridge 22 and the recess 21, and desirably have a width equal to or less than ½ of the wavelength of the light beam to be transmitted.
With such a configuration, while improving the aperture of the optical element 200, it is possible to suppress the collapse of the pattern due to shrinkage during curing of the material, and to manufacture an optical element with high accuracy.
In the fourth embodiment, the optical element 200 may be a structure in which a plurality of the structures 20 shown in FIG. 8 are arranged, or a single structure 20 may be used as the optical element 200. good.
Other configurations in the fourth embodiment are the same as those in the third embodiment, and thus the description thereof is omitted as appropriate.

FIG. 9 shows a fifth embodiment of the present invention.
FIG. 9 is an enlarged view of the structure 20 of the optical element 200. In the fifth embodiment, the structure 20 is divided into a plurality of radially divided regions 25. Further, in each divided region 25, the concave stripes 21 and the convex stripes 22 are periodically arranged in parallel.
Here, the concave stripes 21 and the convex stripes 22 are arranged at equal intervals in one divided region 25, but the intervals may be different in each divided region 25.
That is, the concave stripes 21 and the convex stripes 22 may have different predetermined intervals in the respective divided regions 25.
Further, the isolation preventing protrusions 32 are arranged on the peripheral edge of the structure 20 and the inside of the structure 20. Similarly, the isolation preventing concaves 31 are formed on the peripheral edge of the structure 20 and the inside of the structure 20. Is arranged. Further, the isolation preventing convex portion 32 and the isolation preventing concave portion 31 arranged in the structure 20 are arranged at a boundary portion that is a boundary where the divided regions 25 are adjacent to each other.
The isolation preventing convex part 32 and the isolation preventing concave part 31 arranged inside the structure 20 both have optically negligible widths, and both the concave line 21 and the convex line 22 are isolated prevention concave parts 31. And is arranged in contact with the isolation preventing projection 32.
With such a configuration, in step S3, the uncured photocurable resin flows from the isolation preventing portion 30 into the ridges 22 or the ridges 21, so that the size can be easily increased, but the material is contracted at the time of curing. An optical element with high accuracy is manufactured by suppressing the collapse of the pattern.
In addition, with this configuration, while improving the aperture of the optical element 200, the collapse of the pattern due to shrinkage during the curing of the material is suppressed, and an optical element with high accuracy is manufactured.
In the fifth embodiment, the optical element 200 may be one in which a plurality of the structures 20 shown in FIG. 9 are arranged, or the structure 20 as shown in FIG. It may be used.
Other configurations in the fifth embodiment are the same as those in the first embodiment, and thus the description thereof is omitted as appropriate.

  The preferred embodiments of the present invention have been described above. However, the present invention is not limited to the specific embodiments, and the present invention described in the claims is not specifically limited by the above description. Various modifications and changes are possible within the scope of the above.

  For example, in the first to fifth embodiments, the optical element 200 is a depolarizing element used in the optical scanning device 100. However, the optical element 200 is not limited to this. For example, the arrangement of the structures 20 is in the same direction. It may be arranged as above and used as a polarizing element.

In addition, the optical element 200 may be used as a region dividing filter that separates the S-polarized component and the P-polarized component by arranging the structures 20 so that the arrangement of the structures 20 is orthogonal to each other.
The optical device having the optical element 200 is an optical device such as a stereo camera that calculates three-dimensional position information from the image information of the S-polarized component and the P-polarized component using such a region dividing filter. May be.

  The optical element 200 is used in the optical scanning device 100. However, the optical element 200 may be used in an optical fiber amplifier, an optical pickup device, a liquid crystal display, or the like, and generates or cancels polarization to obtain desired optical characteristics. In order to obtain the above, it may be used for various optical devices.

  The effects described in the embodiments of the present invention are only the most preferable effects resulting from the present invention, and the effects of the present invention are limited to those described in the embodiments of the present invention. is not.

20 Structure 21 Concave strip 22 Convex strip 25 Divided region 30 Isolation prevention part 31 Isolation prevention recessed part 32 Isolation prevention convex part 33 Axis (axis of symmetry)
DESCRIPTION OF SYMBOLS 100 Optical scanning device 101 Light source 102 Collimator lens 103 Polygon scanner 105 Photoconductor 200 Optical element S1 Mold production process S2 Contact | adherence process S3 Curing process (exposure process)
S4 Separation process

JP 2008-298869 A Japanese Patent No. 4192597 JP 2004-341453 A JP 2011-180581 A JP 2003-291159 A

Claims (11)

A structure in which concave stripes having a width shorter than the wavelength of the light beam to be transmitted and convex stripes having a width shorter than the wavelength are periodically arranged;
An isolation preventing portion disposed adjacent to the concave stripe and the convex stripe,
The isolation prevention part has an isolation prevention concave part that is a recess having a height corresponding to the concave line, and a columnar isolation prevention convex part having a height corresponding to the convex line,
Each of the concave stripe and the convex stripe is an optical element that is disposed in contact with the isolation prevention concave portion and the isolation prevention convex portion.   The optical element according to claim 1, wherein the isolation preventing concave portion and the isolation preventing convex portion are arranged symmetrically with respect to a predetermined axis. The optical element according to claim 1 or 2,
An optical element comprising a plurality of the structures arranged periodically. The optical element according to any one of claims 1 to 3,
Of the isolation prevention convex part and the isolation prevention concave part, at least the isolation prevention convex part has an optically negligible width. The optical element according to any one of claims 1 to 4,
The isolation element is disposed at a peripheral edge of the structure. The optical element according to any one of claims 1 to 4,
The optical element according to claim 1, wherein the isolation preventing portion is disposed overlapping the structure. A structure in which concave stripes having a width shorter than the wavelength of the light flux to be processed and convex stripes having a width shorter than the wavelength are periodically arranged;
An isolation preventing portion disposed adjacent to the concave stripe and the convex stripe,
The isolation prevention part has an isolation prevention concave part that is a recess having a height corresponding to the concave line, and a columnar isolation prevention convex part having a height corresponding to the convex line,
The concave ridge and the convex ridge are both formed in contact with the isolation preventing recess and the isolation preventing projection. Using the mold according to claim 7, comprising a curing step of sequentially exposing and curing the mold and the photocurable resin in a close contact state,
In the curing step, the uncured photocurable resin flows from the isolation preventing portion into the ridges or the ridges.   An optical element manufactured using the method for manufacturing an optical element according to claim 8.   An optical element manufactured using the mold according to claim 7.   An optical device comprising the optical element according to claim 1.

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