TW201801896A - Exposure molding device and exposure molding method thereof - Google Patents

Abstract

An exposure molding device comprises an exposure tank, a working platform, and an optical system. The exposure tank has a first surface and a second surface, for containing photosensitive liquid, the working platform is disposed relative to the first surface, and the optical system is disposed relative to the second surface. The optical system comprises a light emitting element and an optical assembly, and the light emitting element emits light along the optical path. The optical assembly comprises a light transmitting element, a first optical element and a first transmission mechanism. The light transmitting element is disposed on the optical path, the first optical element is disposed behind the light transmitting element on the optical path, the first transmission mechanism is disposed along a first direction, and the first transmission mechanism is connected with the first optical element for driving the first optical element to move along the first direction. Therefore, the molding range is expanded, and the advantages of increasing the molding accuracy and velocity are achieved.

Description

Exposure molding device and exposure forming method thereof

The present invention relates to an exposure molding apparatus, and more particularly to an exposure molding apparatus which expands a molding range and an exposure molding method thereof.

In recent years, with 3D printing, also known as the popularization of additive manufacturing (AM), digital light processing (DLP) is widely used in many market machines. The main principle of this type of laminated manufacturing is to use a projection technique to sequentially project a layered image of an object onto a photocurable resin, such that the layers are stacked and formed.

Since the resolution and molding speed of this technology have a great relationship with the projection light source, the projection range of the commercially available machine will be reduced to a certain range to ensure the resolution and the optical power per unit area, so that the object can be smoothly formed. Therefore, although DLP's molding accuracy, resolution and speed are superior to other laminated manufacturing technologies, the molding range cannot be expanded, making DLP technology impossible to apply to large objects.

In the prior art, a large-area projection image is segmented into several sub-images, and by moving the projection light source, a large projection area is obtained by image patching to expand the molding range of the DLP technology. However, due to the large and heavy volume of the projection light source, the speed and accuracy of moving the projection light source are low, thereby affecting the molding speed and accuracy. Further, the projection light source is liable to cause an error in the image patching due to the movement of inertia and vibration, resulting in a decrease in the quality of the molding.

Therefore, how to develop a different exposure molding device and its exposure molding method to improve the problems and shortcomings in the prior art, expand the molding range, improve the precision and speed of molding, and improve the molding quality. It is a key topic in the current technical field.

The main object of the present invention is to provide an exposure forming apparatus and an exposure forming method thereof, which solve and ameliorate the problems and disadvantages of the aforementioned prior art.

Another object of the present invention is to provide an exposure forming apparatus and an exposure forming method thereof, which are provided with movable optical elements to expand the molding range while ensuring the precision, resolution and speed of molding.

Another object of the present invention is to provide an exposure forming apparatus and an exposure forming method thereof, by providing an optical compensation component to complement the optical path difference caused by the movement of the optical element, so that the projection area is not twisted or deformed to ensure the molding quality. .

Another object of the present invention is to provide an exposure forming apparatus and an exposure forming method thereof, which can improve the molding quality by moving the light optical component and calculating the moving speed and the moving path with the exposure time to improve the precision and speed of molding. efficacy.

In order to achieve the above object, a preferred embodiment of the present invention provides an exposure forming apparatus comprising: an exposure groove having a first surface and a second surface for accommodating a photosensitive liquid; and a working platform opposite to the a first surface disposed; and an optical system disposed relative to the second surface, comprising: a light emitting element that provides a light that travels along a light path; and an optical component that includes: a light transmissive element Provided on the light path; a first optical component disposed on the light path after the light transmissive element; and a first transmission mechanism disposed along a first direction and coupled to the first optical component Connecting to move the first optical element in the first direction; wherein the light is transmitted through the light transmissive element, reflected by the first optical element to the exposure groove, and the photosensitive liquid is exposed to the exposure The work platform. The first optical element is incident on the exposure groove, and the photosensitive liquid is exposed to the working platform.

In order to achieve the above object, another preferred embodiment of the present invention provides an exposure molding method comprising: (a) providing an exposure groove, a working platform, a light-emitting element, and an optical component, wherein the exposure groove accommodates a photosensitive And the optical component comprises a light transmitting component, a first optical component and a first transmission mechanism; (b) the light emitting component emits a light; (c) the light is transmitted through the light transmitting component, and The first optical component is reflected to one of the exposure grooves to be exposed; (d) exposing the photosensitive liquid located in the exposed area to the working platform after an exposure time; (e) determining whether to continue the exposure molding (f) the first transmission mechanism moves the first optical element in a first direction; and (g) completes the exposure forming operation; wherein, when the determination result of the step (e) is YES, the step is performed ( f), and repeating the step (b) to the step (e), and when the judgment result of the step (e) is NO, the step (g) is performed.

Some exemplary embodiments embodying the features and advantages of the present invention are described in detail in the following description. It is to be understood that the present invention is capable of various modifications in various aspects, and is not intended to limit the scope of the invention.

Please refer to FIG. 1 , FIG. 2 and FIG. 3 , wherein FIG. 1 is a schematic structural view of an exposure molding apparatus according to a preferred embodiment of the present invention, and FIG. 2 is a schematic structural view showing an exposure molding apparatus according to another embodiment of the present disclosure. And Fig. 3 is a schematic view showing the structure of the optical system of the exposure molding apparatus shown in Fig. 2. As shown in FIG. 1 , FIG. 2 and FIG. 3 , the exposure forming apparatus 1 of the present invention includes an exposure groove 2 , a work platform 3 , and an optical system 4 , wherein the exposure groove 2 has a first surface 21 and a second surface 22 . And is used to accommodate the photosensitive liquid 5, and the working platform 3 is disposed opposite to the first surface 21, and the optical system 4 is disposed opposite to the second surface 22.

The optical system 4 includes a light-emitting element 40 that provides light ray 400, and an optical component 41 that travels along a light path P, wherein the light-emitting element 40 is an array light source such as, but not limited to, a DLP, LED, or LCD. The optical component 41 includes a light transmissive element 410, a first optical element 411, and a first transmission mechanism 4110. The light transmitting element 410 is disposed on the light path P, the first optical element 411 is disposed on the light path P after the light transmitting element 410, the first transmission mechanism 4110 is disposed along the first direction d1, and the first transmission mechanism 4110 The first optical element 411 is coupled to move the first optical element 411 in the first direction d1. The light 400 is transmitted through the light transmitting element 410, and is reflected by the first optical element 411 to the exposure groove 2, so that the photosensitive liquid 5 is exposed and formed on the working platform 3. In other words, the optical system 4 of the present invention is constructed in the moving projection area A, and the photosensitive liquid 5 located in the area B to be exposed is exposed and formed on the work platform 3 (in the first figure, the projection area A is the same as the area B to be exposed).

In some embodiments, the optical assembly 41 further includes a second optical component 412 and a second transmission mechanism 4120. The second optical component 412 is disposed between the light transmissive element 410 and the first optical component 411 on the optical path P, and the second transmission mechanism 4120 is disposed along the second direction d2 and is connected to the second optical component 412. To move the second optical element 412 in the second direction d2. Thereby, the first transmission mechanism 4110 and the second transmission mechanism 4120 can transmit the first optical element 411 and the second optical element 412 to change the optical path P of the light 400.

According to the concept of the present invention, the exposure forming apparatus 1 further includes a third transmission mechanism 30 and a filling device 6. The third transmission mechanism 30 is coupled to the work platform 3 to drive the work platform 3 to move in the third direction d3. The filling device 6 is disposed in the exposure tank 2 for providing the photosensitive liquid 5. The first direction d1, the second direction d2, and the third direction d3 are perpendicular to each other, but are not limited thereto.

In some embodiments, the optical component 41 further includes a first optical compensation component 413 and a second optical compensation component 414. The first optical compensation component 413 and the second optical compensation component 414 are disposed on the light path P and disposed on the light transmissive component 410. Between the second optical element 412 and the first optical compensation element 413 is disposed in parallel with the first optical element 411, and the second optical compensation element 414 is disposed in parallel with the second optical element 411.

In other words, the light 400 travels along the light path P, penetrates the light transmissive element 410, and is reflected by the first optical compensation component 413 and the second optical compensation component 414 to the second optical component 412, and then by the second optical component 412. It is reflected to the first optical element 411, then reflected by the first optical element 411 to the exposure groove 2, and forms a projection area A for exposing the photosensitive liquid 5 to the work platform 3.

In some embodiments, the first transmission mechanism 4110, the second transmission mechanism 4120, and the third transmission mechanism 30 are, for example, but not limited to, using a screw, a belt, or a steel cord to achieve a moving motion. In other embodiments, the light transmissive element 410 is, for example, but not limited to, a focusing lens that allows the light rays 400 to be concentrated into parallel light, and the curvature of the light transmissive element 410 and the distance from the light emitting element 40 are related to the projection area A and the resolution. Degree related. Moreover, the first optical element 411, the second optical element 412, the first optical compensation element 413, and the second optical compensation element 414 are mirrors, but are not limited thereto.

In other words, the exposure molding apparatus of the present invention expands the molding range by providing movable optical elements while ensuring the precision, resolution and speed of molding. Moreover, by providing an optical compensation element to compensate for the optical path difference caused by the movement of the optical element, the projection area is not distorted or deformed to ensure the molding quality.

Please refer to FIG. 4 and FIG. 1 , wherein FIG. 4 is a flow chart showing the exposure molding method of the exposure molding apparatus of the preferred embodiment of the present invention. As shown in FIG. 1 and FIG. 4, the exposure molding method of the exposure molding apparatus 1 of the preferred embodiment of the present invention includes the following steps: First, as shown in step S10, the exposure groove 2, the work platform 3, the light-emitting element 40, and The optical component 41, wherein the exposure groove 2 accommodates the photosensitive liquid 5, and the optical component 41 includes a light transmitting element 410, a first optical element 411, and a first transmission mechanism 4110.

Next, as shown in step S20, the light-emitting element 40 emits light 400, wherein the light-emitting element 40 is an array light source such as, but not limited to, a DLP, an LED, or an LCD. Next, as shown in step S30, the light ray 400 penetrates the light transmitting element 410 and is reflected by the first optical element 411 to the area B to be exposed of the exposure groove 2. Then, as shown in step S40, the photosensitive liquid 5 located in the area B to be exposed is exposed to the work platform 3 after an exposure time Te.

Next, as shown in step S50, it is determined whether or not the exposure forming operation is continued. When the determined result at step S50 is YES, step S60 is performed, and steps S20 through S50 are re-executed. As shown in step S60, the first transmission mechanism 4110 moves the first optical element 411 in the first direction d1. When the result of the determination in the step S50 is NO, the step S70 is executed to complete the exposure forming operation.

Please refer to FIG. 5 and FIG. 6 and cooperate with FIG. 2, FIG. 3 and FIG. 4, wherein FIG. 5 is a detailed flowchart showing the step S30 of the exposure forming method shown in FIG. 4, and the sixth drawing. The figure shows a detailed flow chart of step S60 of the exposure forming method shown in Fig. 4. As shown in FIG. 2, FIG. 3, FIG. 4, FIG. 5 and FIG. 6, the optical component 41 of the exposure molding method of the preferred embodiment of the present invention further includes a second optical component 412 and a first optical compensation component 413. And the second optical compensation component 414, and the step S30 can further include the sub-step as follows: First, as shown in step S31, the light 400 is transmitted through the light-transmitting element 410. Next, as shown in step S32, the light ray 400 is reflected by the first optical compensation component 413 and the second optical compensation component 414 to the second optical component 412, and then reflected by the second optical component 412 to the first optical component 411. Next, as shown in step S33, the light ray 400 is reflected by the first optical element 411 to the area B to be exposed of the exposure bath 2.

In the exposure molding method of the preferred embodiment of the present invention, the optical component 41 further includes a control component (not shown) and a second transmission mechanism 4120, and the step S60 may further include the following sub-steps as follows: First, as shown in step S61, the control component The moving path and the moving speed are calculated according to the area B to be exposed. Next, as shown in step S62, the control element controls the first transmission mechanism 4110 to move the first optical element 411 in the first direction d1 according to the moving path and the moving speed, and controls the second transmission mechanism 4120 to follow the moving path and the moving speed along the second The direction d2 moves the second optical element 412, wherein the first direction d1 is perpendicular to the second direction d2.

Please refer to FIG. 7A, FIG. 7B, FIG. 7C and FIG. 7D, wherein FIG. 7A is a schematic view showing an embodiment of an exposure forming method of the present application, and FIG. 7B is another embodiment showing an exposure forming method of the present application. Fig. 7C is a schematic view showing still another embodiment of the exposure forming method of the present invention, and Fig. 7D is a view showing still another embodiment of the exposure forming method of the present application. As shown in FIGS. 7A, 7B, 7C, and 7D, the light ray 400 travels along the optical path P and is reflected by the second optical element 412 to the first optical element 411, followed by the first optical element 411. The reflection forms a projection area A in which the projection area A has a projection length L and a projection width W, and the molding area C is W*L. In some embodiments, the first optical element 411 is moved by the first transmission mechanism 4110 to move the first length L' in the first direction d1, so that the molding area C can be enlarged to W*L'. In other embodiments, the second optical member 412 is moved by the second transmission mechanism 4120 to move the second length W' in the second direction d2 to enlarge the molding region C to W'*L. In still other embodiments, the first optical component 411 is moved by the first transmission mechanism 4110 to move the first length L' along the first direction d1, and the second transmission mechanism 4120 drives the second optical component 412 along the second direction d2. Moving the second length W', the molding area C can be enlarged to W'*L'.

Please refer to FIG. 8A and FIG. 8B , wherein FIG. 8A is a schematic view showing the exposure forming apparatus of the preferred embodiment of the present invention in the exposure forming method of the present invention, and FIG. 8B is a view showing the exposure of the preferred embodiment of the present invention. Another schematic diagram of the molding apparatus performing exposure forming by the exposure molding method of the present invention. As shown in FIGS. 8A and 8B, when the area to be exposed B is smaller than the projection area A, that is, when the projection area A can completely cover the area B to be exposed, the first transmission mechanism 4110 or the second transmission mechanism 4120 may be stationary. The area to be exposed B is exposed and cured first. After curing, the first transmission mechanism 4110 or the second transmission mechanism 4120 will quickly move the first optical element 411 or the second optical element 412 to the next area to be exposed B, and expose the area until all areas to be exposed B are exposed. After the solidification is formed, the layer changing operation is performed, and the next layer of exposure molding is performed.

When the first transmission mechanism 4110 or the second transmission mechanism 4120 moves, the optical path length D changes, and the optical path length We will be affected by the medium to become smaller, so that the exposure time Te must be extended. Therefore, different exposure time B is required, and the required exposure time Te is different. It is assumed that the exposure time Te has a relationship F(D) with the exposure light power We, which is related to the projection frequency, the wavelength of the light source, and the medium conduction, where D is light. The length of the process is: Te=F(D)*We and Te∝1/We. According to this relationship, the control element calculates the exposure time Te required to be exposed under the different exposure area B.

Please refer to FIG. 9 , wherein FIG. 9 is a schematic view showing the exposure molding apparatus of the preferred embodiment of the present invention in the exposure molding method of the present invention. As shown in FIG. 9, if the area to be exposed B is larger than the projection area A, that is, the projection area A cannot completely cover the area B to be exposed, at this time, the first transmission mechanism 4110 or the second transmission mechanism 4120 matches the exposure time Te and exposure. The relationship between the optical power We: Te=F(D)*We and Te∝1/We, for the calculation of the moving path, the moving speed V, and the projection time Tep of each pixel, for continuous exposure, wherein the moving path is sliced by each layer Decide. Moreover, the positioning accuracy P _L needs to be the same as the resolution size R or an integer multiple or an integer, that is, P _L =R or P _L =N*R or P _L =R/N, where N is an integer.

The moving speed V is related to the update frequency f of the light-emitting element 40 and the exposure time Tep of each pixel, and the moving speed V needs to be an integral multiple of the projection period, that is, V=P*f /N, where N is an integer. In addition, when the projection area A moves, it is necessary to satisfy the exposure time Tep of each pixel. For example, the pixel p1 is a dot area on the area B to be exposed, and the projection width W is continuously moved and exposed at the moving speed V, at this time: V≦W/Tep. Moreover, since the projection area A is multi-pixel simultaneous exposure, the exposure time Tep of each pixel is different, so it is necessary to satisfy the longest time Tepl, that is, V≦W/Tepl and V=P*f/N, where N is an integer. In other words, the exposure time Te is inversely proportional to the optical path length D of the light ray 400, and the moving speed V is inversely proportional to the exposure time Te. According to the above relationship, the control component calculates the optimal moving path and the optimal speed according to the area B to be exposed, and exposes the area B to be exposed for a certain period of time, so that the photosensitive liquid 5 is smoothly cured until all the exposed areas B are exposed and formed. The layering operation will be carried out to perform the exposure molding of the next layer.

In other words, the exposure forming apparatus and the exposure forming method thereof of the present invention improve the molding speed and the speed by moving the light optical component and adjusting the moving speed and the moving path with the exposure time, thereby improving the molding quality.

In summary, the present invention provides an exposure forming apparatus and an exposure forming method thereof, which are provided with movable optical components to expand the molding range while ensuring the precision, resolution and speed of molding. Moreover, by providing an optical compensation element to compensate for the optical path difference caused by the movement of the optical element, the projection area is not distorted or deformed to ensure the molding quality. At the same time, by moving the light optical components and calculating the moving speed and moving path with the exposure time, the precision and speed of the molding can be improved, and the molding quality can be improved.

Even though the present invention has been described in detail by the above-described embodiments, it can be modified by those skilled in the art, and is not intended to be protected by the appended claims.

1‧‧‧Exposure forming device
2‧‧‧Exposure slot
21‧‧‧ first surface
22‧‧‧ second surface
3‧‧‧Working platform
30‧‧‧ Third transmission mechanism
4‧‧‧Optical system
40‧‧‧Lighting elements
400‧‧‧Light
41‧‧‧Optical components
410‧‧‧Lighting components
411‧‧‧First optical component
4110‧‧‧First transmission
412‧‧‧Second optical component
4120‧‧‧second transmission mechanism
413‧‧‧First optical compensation component
414‧‧‧Second optical compensation component
5‧‧‧Photosensitive liquid
6‧‧‧Filling device
A‧‧‧projection area
B‧‧‧Exposure area
C‧‧‧ molding area
L‧‧‧projection length
L'‧‧‧ first length
W‧‧‧projection width
W'‧‧‧second length
P‧‧‧Light path
D1‧‧‧ first direction
D2‧‧‧second direction
D3‧‧‧ third direction
P1‧‧ ‧ pixels
S10, S20, S30, S40, S50, S60‧‧ steps
S31, S32, S33‧‧‧ steps
S61, S62‧‧‧ steps

Fig. 1 is a schematic view showing the structure of an exposure molding apparatus of a preferred embodiment of the present invention. Fig. 2 is a schematic view showing the structure of an exposure molding apparatus according to another embodiment of the present invention. Fig. 3 is a view showing the structure of an optical system of the exposure molding apparatus shown in Fig. 2. Figure 4 is a flow chart showing the exposure molding method of the preferred embodiment of the present invention. Fig. 5 is a detailed flow chart showing the step S30 of the exposure molding method shown in Fig. 4. Fig. 6 is a detailed flow chart showing the step S60 of the exposure molding method shown in Fig. 4. Fig. 7A is a view showing an embodiment of an exposure forming method of the present application. Fig. 7B is a view showing another embodiment of the exposure forming method of the present application. Fig. 7C is a view showing still another embodiment of the exposure molding method of the present application. Fig. 7D is a schematic view showing still another embodiment of the exposure forming method of the present application. Fig. 8A is a schematic view showing the exposure molding apparatus of the preferred embodiment of the present invention in the exposure molding method of the present invention. Fig. 8B is another schematic view showing the exposure molding apparatus of the preferred embodiment of the present invention in the exposure molding method of the present invention. Fig. 9 is a view showing the exposure molding apparatus of another preferred embodiment of the present invention, which is subjected to exposure forming by the exposure molding method of the present invention.

1‧‧‧Exposure forming device

2‧‧‧Exposure slot

21‧‧‧ first surface

22‧‧‧ second surface

3‧‧‧Working platform

30‧‧‧ Third transmission mechanism

40‧‧‧Lighting elements

400‧‧‧Light

410‧‧‧Lighting components

411‧‧‧First optical component

4110‧‧‧First transmission

412‧‧‧Second optical component

4120‧‧‧second transmission mechanism

413‧‧‧First optical compensation component

414‧‧‧Second optical compensation component

5‧‧‧Photosensitive liquid

6‧‧‧Filling device

A‧‧‧projection area

B‧‧‧Exposure area

P‧‧‧Light path

D1‧‧‧ first direction

D2‧‧‧second direction

D3‧‧‧ third direction

Claims (10)

An exposure forming apparatus comprising: an exposure groove having a first surface and a second surface for accommodating a photosensitive liquid; a working platform disposed relative to the first surface; and an optical system opposite to the first The two surface arrangements include: a light emitting element that provides a light that travels along a light path; and an optical component that includes: a light transmissive element disposed on the light path; a first optical component Provided on the light path after the light transmissive element; and a first transmission mechanism disposed along a first direction and coupled to the first optical element to drive the first optical element along the first direction Moving, wherein the light is transmitted through the light transmissive element, reflected by the first optical element to the exposure groove, and the photosensitive liquid is exposed and formed on the working platform. The exposure molding apparatus of claim 1, wherein the optical component further comprises: a second optical component disposed between the light transmissive component and the first optical component in the light path; and a The second transmission mechanism is disposed along a second direction and coupled to the second optical component to drive the second optical component to move in the second direction. The exposure forming apparatus of claim 2, further comprising: a third transmission mechanism connected to the working platform to drive the working platform to move in a third direction; and a filling device The exposure tank is disposed to provide the photosensitive liquid. The exposure molding apparatus of claim 3, wherein the first direction, the second direction, and the third direction are perpendicular to each other. The exposure molding apparatus of claim 2, wherein the optical component further comprises a first optical compensation component and a second optical compensation component, wherein the first optical compensation component and the second optical compensation component are a light path is disposed between the light transmissive element and the second optical element, and the first optical compensation component is disposed in parallel with the first optical component, and the second optical compensation component is disposed in parallel with the second optical component . The exposure molding apparatus of claim 5, wherein the light transmissive element is a focus lens, and the first optical element, the second optical element, the first optical compensation element, and the second optical compensation element are reflective mirror. An exposure molding method comprising: (a) providing an exposure groove, a working platform, a light-emitting element, and an optical component, wherein the exposure groove receives a photosensitive liquid, and the optical component comprises a light-transmitting component, a first An optical component and a first transmission mechanism; (b) the light emitting component emits a light; (c) the light is transmitted through the light transmitting component, and is reflected by the first optical component to an exposed area of the exposure groove (d) exposing the photosensitive liquid located in the area to be exposed to the working platform after an exposure time; (e) determining whether to continue the exposure forming operation; (f) the first transmission mechanism is along a first direction Moving the first optical element; and (g) completing the exposure forming operation; wherein, when the determination result of the step (e) is YES, performing the step (f), and re-executing the step (b) to the step ( e), and when the judgment result of the step (e) is NO, the step (g) is performed. The exposure molding method of claim 7, wherein the optical component further comprises a second optical component, a first optical compensation component and a second optical compensation component, and the step (c) further comprises the substep (c1) passing the light through the light transmissive element; (c2) the light is reflected by the first optical compensating element and the second optical compensating element to the second optical element, and then reflected by the second optical element The first optical element; and (c3) the light is reflected by the first optical element to one of the exposure grooves to be exposed. The exposure molding method of claim 8, wherein the optical component further comprises a control component and a second transmission mechanism, and the step (f) further comprises the substep: (f1) the control component according to the desire The exposure area calculates a movement path and a movement speed; and (f2) the control element controls the first transmission mechanism to move the first optical element in a first direction according to the movement path and the movement speed, and control the second transmission The mechanism moves the second optical element in a second direction according to the moving path and the moving speed, wherein the first direction is perpendicular to the second direction. The exposure molding method of claim 9, wherein the exposure time is inversely proportional to an optical path length of the light, and the moving speed is inversely proportional to the exposure time.