JP2015220393A - Support substrate for circuit formation, printed wiring board using the same, and method of manufacturing the same - Google Patents

Support substrate for circuit formation, printed wiring board using the same, and method of manufacturing the same Download PDF

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JP2015220393A
JP2015220393A JP2014104258A JP2014104258A JP2015220393A JP 2015220393 A JP2015220393 A JP 2015220393A JP 2014104258 A JP2014104258 A JP 2014104258A JP 2014104258 A JP2014104258 A JP 2014104258A JP 2015220393 A JP2015220393 A JP 2015220393A
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resin layer
substrate
support
copper foil
copper
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幸司 細谷
Koji Hosoya
幸司 細谷
堀江 聡
Satoshi Horie
聡 堀江
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a support substrate the end of which is bonded sufficiently, and to provide a printed wiring board using the same, and a method of manufacturing the same.SOLUTION: An insulating resin layer 5 is bonded to an adhesive resin layer 3 arranged on a support 2, via a copper foil 4 with a carrier having a size smaller than that of the support 2 and adhesive resin layer 3, in a support substrate 1 for circuit formation. Alternatively, an insulating resin layer 5 is bonded to an adhesive resin layer 3 arranged on a support 2, via more than one metal foil 8 having a size smaller than that of the support 2 and adhesive resin layer 3, in a support substrate 1 for circuit formation. A printed wiring board using the same, and a method of manufacturing the same are also provided.

Description

本発明は、回路形成用支持基板、それを用いたプリント配線板、及びその製造方法に関する。   The present invention relates to a circuit-forming support substrate, a printed wiring board using the same, and a method for manufacturing the same.

近年、電子機器の小型化、軽量化、多機能化が一段と進み、これに伴い、配線の高集積化と小型化が急速に進み、プリント配線板の薄型化が進んでいる。これに対応するため、従来では、仮基板の上に剥離できる状態で、配線層を形成した後に、仮基板から分離してプリント配線板を得るコアレス工法がある。   In recent years, electronic devices have been further reduced in size, weight, and multifunction, and accordingly, higher integration and miniaturization of wiring are rapidly progressing, and printed wiring boards are becoming thinner. In order to cope with this, conventionally, there is a coreless method in which a printed wiring board is obtained by separating from a temporary substrate after forming a wiring layer in a state where it can be peeled off from the temporary substrate.

特許文献1には、銅張積層板と、該銅張積層板の両面の銅箔上に直接配置され、前記銅張積層板及び銅張積層板の銅箔より一回り小さいサイズの銅箔と、該銅箔より大きいサイズとなる絶縁樹脂層とを有する回路形成用支持基板(コアレス工法用基板)を用いてプリント配線板を得る方法が記載されている。
特許第5029911号公報
In Patent Document 1, a copper-clad laminate, a copper foil that is directly disposed on the copper foils on both sides of the copper-clad laminate, and a size smaller than the copper foil of the copper-clad laminate and the copper-clad laminate, A method of obtaining a printed wiring board using a circuit-forming support substrate (substrate for coreless method) having an insulating resin layer having a size larger than the copper foil is described.
Japanese Patent No. 5029911

しかし、特許文献1に記載の回路形成用支持基板において、より薄いプリント配線板を製造するために絶縁樹脂層に使用するプリプレグを薄くした場合や、使用するプリプレグの樹脂分を少なくした場合、接着部分の絶縁樹脂が不足し、銅張積層板と絶縁樹脂層(プリプレグ)とが十分に接着されないことがある。そうすると、プリント配線板の製造工程で、接着が不足した端部からめっき液やエッチング液が浸み込んでしまう場合がある。   However, in the support substrate for circuit formation described in Patent Document 1, when the prepreg used for the insulating resin layer is made thin in order to produce a thinner printed wiring board, or when the resin content of the prepreg used is reduced, The insulating resin in the portion is insufficient, and the copper-clad laminate and the insulating resin layer (prepreg) may not be sufficiently bonded. If it does so, in the manufacturing process of a printed wiring board, a plating solution and an etching solution may permeate from an end portion where adhesion is insufficient.

また、絶縁樹脂層と銅張積層板との間に配置する一回り小さいサイズの銅箔の厚みが、絶縁樹脂層に使用するプリプレグより厚くなった場合、絶縁樹脂層の樹脂が不足するため、銅箔の高さを埋め込むことが困難となり、一回り小さいサイズの銅箔の端部が十分に保護されなくなることがある。   Also, if the thickness of the slightly smaller copper foil placed between the insulating resin layer and the copper clad laminate is thicker than the prepreg used for the insulating resin layer, the resin of the insulating resin layer is insufficient, It becomes difficult to embed the height of the copper foil, and the end portion of the copper foil having a slightly smaller size may not be sufficiently protected.

本発明は、このような事情に鑑み為されたものであり、その目的は、端部が十分に接着された回路形成用支持基板、それを用いたプリント配線板、及びその製造方法を提供することにある。   The present invention has been made in view of such circumstances, and an object of the present invention is to provide a support substrate for forming a circuit in which ends are sufficiently bonded, a printed wiring board using the same, and a method for manufacturing the same. There is.

本発明者らは上記の課題を解決すべく検討を進めた結果、下記本発明により当該課題を解決できることを見出した。
すなわち、本発明は、次の[1]〜[5]を提供する。
[1]絶縁樹脂層が、支持体上に配置された接着樹脂層に、該支持体及び接着樹脂層より小さいサイズのキャリア付銅箔を介して接着された回路形成用支持基板。
[2]絶縁樹脂層が、支持体上に配置された接着樹脂層に、該支持体及び接着樹脂層より小さいサイズの金属箔を2枚以上介して接着された回路形成用支持基板。
[3]前記支持体が金属張積層板である[1]又は[2]の回路形成用支持基板。
[4]前記支持体が金属箔である[1]又は[2]の回路形成用支持基板。
[5]上記[1]〜[4]の回路形成用支持基板を用いて製造されるプリント配線板。
As a result of investigations to solve the above problems, the present inventors have found that the problems can be solved by the present invention described below.
That is, the present invention provides the following [1] to [5].
[1] A circuit-forming support substrate in which an insulating resin layer is bonded to an adhesive resin layer disposed on a support via a carrier-attached copper foil having a smaller size than the support and the adhesive resin layer.
[2] A circuit-forming support substrate in which an insulating resin layer is bonded to an adhesive resin layer disposed on a support via two or more metal foils having a size smaller than that of the support and the adhesive resin layer.
[3] The circuit-forming support substrate according to [1] or [2], wherein the support is a metal-clad laminate.
[4] The circuit-forming support substrate according to [1] or [2], wherein the support is a metal foil.
[5] A printed wiring board manufactured using the circuit-forming support substrate of the above [1] to [4].

本発明によれば、端部が十分に接着された回路形成用支持基板、それを用いたプリント配線板、及びその製造方法を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the support substrate for circuit formation to which the edge part was fully adhere | attached, a printed wiring board using the same, and its manufacturing method can be provided.

以下、本発明の実施形態について詳細に記載する。
本発明の回路形成用支持基板の第1の形態は、絶縁樹脂層が、支持体上に配置された接着樹脂層に、該支持体及び接着樹脂層より小さいキャリア付銅体を介して接着されたものである。
図1には、本発明の回路形成用支持基板の第1の形態の一例を示す。本発明の回路形成用支持基板の第1の形態としては、例えば、支持体2に銅張積層板を使用し、その両側に、接着樹脂層3としてプリプレグを配置し、さらに支持体2及び接着樹脂層3よりも小さいサイズの銅箔4(キャリア付銅箔)を配し、絶縁樹脂層5としてプリプレグと、外層に相当する銅箔6を配置し、加熱加圧により接着積層することで製造できる。
Hereinafter, embodiments of the present invention will be described in detail.
In the first form of the circuit-forming support substrate of the present invention, the insulating resin layer is bonded to the adhesive resin layer disposed on the support via a copper body with a carrier smaller than the support and the adhesive resin layer. It is a thing.
In FIG. 1, an example of the 1st form of the support substrate for circuit formation of this invention is shown. As the first form of the circuit-forming support substrate of the present invention, for example, a copper-clad laminate is used for the support 2, prepregs are disposed as adhesive resin layers 3 on both sides thereof, and the support 2 and the adhesive are bonded. Manufactured by placing copper foil 4 (copper foil with carrier) smaller than resin layer 3, placing prepreg as insulating resin layer 5 and copper foil 6 corresponding to the outer layer, and adhesively laminating by heating and pressing. it can.

支持体2、接着樹脂層3及び絶縁樹脂層5が銅箔4の4辺の端部で接着されるように、銅箔4は支持体2、接着樹脂層3及び絶縁樹脂層5の中心近傍へ配置することが好ましい。また、銅箔4のサイズは、支持体2のサイズより縦横方向とも10mm以上小さいことが好ましい。接着樹脂層3、絶縁樹脂層5及び銅箔6のサイズは、支持体2よりも大きいことが好ましい。   The copper foil 4 is near the center of the support 2, the adhesive resin layer 3, and the insulating resin layer 5 so that the support 2, the adhesive resin layer 3, and the insulating resin layer 5 are bonded at the ends of the four sides of the copper foil 4. It is preferable to arrange to. Further, the size of the copper foil 4 is preferably smaller than the size of the support 2 by 10 mm or more in both the vertical and horizontal directions. The sizes of the adhesive resin layer 3, the insulating resin layer 5, and the copper foil 6 are preferably larger than the support 2.

回路形成用支持基板の加熱加圧による接着積層後、回路形成用支持基板の端面を裁断する際は、銅箔4の端面よりも1辺当たり5mm以上外側で裁断されることが好ましい。   When the end surface of the circuit forming support substrate is cut after the adhesive lamination by heating and pressing the circuit forming support substrate, it is preferably cut outside the end surface of the copper foil 4 by 5 mm or more per side.

絶縁樹脂層と銅箔との良好なピール強度を得る観点からは、銅箔4の粗化面が絶縁樹脂層5へ接着するように配置することが好ましい。また、支持体2と接着樹脂層3との接着強度を高めるため、支持体2の銅箔表面にこぶ状の電着物層(浴にやけめっきといわれる)を形成する処理や、酸化処理、還元処理、及びエッチング等を行ってもよい。   From the viewpoint of obtaining a good peel strength between the insulating resin layer and the copper foil, it is preferable to arrange the roughened surface of the copper foil 4 so as to adhere to the insulating resin layer 5. In addition, in order to increase the adhesive strength between the support 2 and the adhesive resin layer 3, a treatment for forming a bumpy electrodeposit layer (called “bathing plating on bath”) on the copper foil surface of the support 2, oxidation treatment, reduction Processing, etching, and the like may be performed.

支持体2として使用する基板としては、特に限定されるものではないが、樹脂基板、金属張積層板、金属板、金属箔等の基板を使用することができる。これらの中でも銅張積層板を用いることが好ましい。銅張積層板も特に限定されるものではないが、例えば、プリプレグ、フィルム材、及び金属板の両面に接着剤を配置した基材等の両面に、銅箔を配置し、加熱加圧接着した銅張積層板が挙げられる。   Although it does not specifically limit as a board | substrate used as the support body 2, Substrates, such as a resin substrate, a metal-clad laminated board, a metal plate, metal foil, can be used. Among these, it is preferable to use a copper clad laminate. Although the copper clad laminate is not particularly limited, for example, a copper foil is disposed on both surfaces of a prepreg, a film material, and a base material in which an adhesive is disposed on both surfaces of the metal plate, and heat and pressure bonding is performed. A copper clad laminated board is mentioned.

支持体2、接着樹脂層3、及び絶縁樹脂層5に使用されるプリプレグは、絶縁樹脂組成物を基材に含浸又は塗工してなるものである。
基材としては、各種の電気絶縁材料用積層板に用いられる公知のものが使用できる。基材としては、例えば、Eガラス、Dガラス、Sガラス、及びQガラス等の無機物繊維、ポリイミド、ポリエステル、及びテトラフルオロエチレン等の有機繊維、並びにそれらの混合物などが挙げられる。これらの基材の形状は、例えば、織布、不織布、ロービンク、チョップドストランドマット、サーフェシングマット等の形状が挙げられる。
基材の材質及び形状は、目的とする成形物の用途や性能により選択することができる。また、必要に応じて、単独又は2種類以上の材質及び形状を組み合わせて使用してもよい。
基材の厚みは特に限定されるものではないが、通常0.03〜0.5mm程度のものを使用することができる。また、シランカップリング剤等で表面処理したものや機械的に開繊処理を施したものは、耐熱性、耐湿性、及び加工性の面から好適である。
The prepreg used for the support 2, the adhesive resin layer 3, and the insulating resin layer 5 is formed by impregnating or coating an insulating resin composition on a base material.
As a base material, the well-known thing used for the laminated board for various electrical insulation materials can be used. Examples of the substrate include inorganic fibers such as E glass, D glass, S glass, and Q glass, organic fibers such as polyimide, polyester, and tetrafluoroethylene, and mixtures thereof. Examples of the shape of these base materials include woven fabrics, non-woven fabrics, robinks, chopped strand mats, and surfacing mats.
The material and shape of the substrate can be selected depending on the intended use and performance of the molded product. Moreover, you may use it individually or in combination of 2 or more types of materials and shapes as needed.
Although the thickness of a base material is not specifically limited, The thing of about 0.03-0.5 mm can be used normally. In addition, those surface-treated with a silane coupling agent or the like or mechanically subjected to a fiber opening treatment are preferable from the viewpoints of heat resistance, moisture resistance, and workability.

プリプレグに用いられる絶縁樹脂組成物としては、特に限定されるものではなく、プリント配線板の絶縁材料として用いられる公知の樹脂組成物を用いることができる。絶縁樹脂組成物に配合される樹脂成分としては、例えば、耐熱性、及び耐薬品性の良好な熱硬化性樹脂が挙げられる。熱硬化性樹脂としては、特に限定されるものではなく、例えば、フェノール樹脂、エポキシ樹脂、シアネート樹脂、マレイミド樹脂、イソシアネート樹脂、ベンゾシクロブテン樹脂、ビニール樹脂等が挙げられる。これらは、1種類を単独で用いても、2種類以上を混合して用いてもよい。
さらに、絶縁樹脂組成物には、必要応じて、無機充填剤、有機充填剤、硬化剤、硬化促進剤、着色剤、紫外線不透過剤、酸化防止剤、及び還元剤等の各種添加剤を配合してもよい。
基材に対する絶縁樹脂組成物の付着量が、乾燥後のプリプレグの樹脂含有率で20〜90%となるように基材に含浸又は塗工した後、通常100〜200℃の温度で1〜30分加熱乾燥し、半硬化状態(Bステージ状態)のプリプレグを得ることができる。
The insulating resin composition used for the prepreg is not particularly limited, and a known resin composition used as an insulating material for a printed wiring board can be used. As a resin component mix | blended with an insulating resin composition, thermosetting resin with favorable heat resistance and chemical resistance is mentioned, for example. The thermosetting resin is not particularly limited, and examples thereof include phenol resin, epoxy resin, cyanate resin, maleimide resin, isocyanate resin, benzocyclobutene resin, and vinyl resin. These may be used alone or in combination of two or more.
Furthermore, the insulating resin composition is blended with various additives such as inorganic fillers, organic fillers, curing agents, curing accelerators, colorants, UV opaquers, antioxidants, and reducing agents as necessary. May be.
After impregnating or coating the base material so that the amount of the insulating resin composition attached to the base material is 20 to 90% in terms of the resin content of the prepreg after drying, it is usually 1 to 30 at a temperature of 100 to 200 ° C. A prepreg in a semi-cured state (B stage state) can be obtained by heat drying for a few minutes.

銅箔4は、銅箔厚みが1μm以上のキャリア付銅箔を用いることが好ましい。キャリア付銅箔とは、キャリアを有する銅箔であり、キャリアが引き剥がし可能な銅箔である。キャリア付銅箔は、例えば、厚さ10〜50μmのキャリア上に剥離層となる金属酸化膜又は有機物層を形成し、その上に硫酸銅浴であれば硫酸50〜100g/L、銅30〜100g/L、液温20〜80℃、電流密度0.5〜100A/dmの条件、ピロリン酸銅浴の場合、ピロリン酸カリウム100〜700g/L、銅10〜50g/L、液温30〜60℃、pH8〜12、電流密度0.5〜10A/dmの条件で厚さ0.1〜3.0μmの銅箔を形成し製造することができる。
穴明け性の観点からは、キャリアは銅、ニッケル、錫、亜鉛、クロム、モリブデン、コバルト、又はそれらの合金を用いることが好ましい。
The copper foil 4 is preferably a copper foil with a carrier having a copper foil thickness of 1 μm or more. The copper foil with a carrier is a copper foil having a carrier and is a copper foil that can be peeled off by the carrier. The copper foil with a carrier, for example, forms a metal oxide film or an organic layer as a peeling layer on a carrier having a thickness of 10 to 50 μm, and a copper sulfate bath on the metal oxide film or an organic substance layer, the sulfuric acid 50 to 100 g / L, copper 30 to In the case of 100 g / L, liquid temperature 20-80 ° C., current density 0.5-100 A / dm 2 , copper pyrophosphate bath, potassium pyrophosphate 100-700 g / L, copper 10-50 g / L, liquid temperature 30 A copper foil having a thickness of 0.1 to 3.0 μm can be formed and produced under the conditions of ˜60 ° C., pH 8 to 12, and current density of 0.5 to 10 A / dm 2 .
From the viewpoint of punchability, it is preferable to use copper, nickel, tin, zinc, chromium, molybdenum, cobalt, or an alloy thereof for the carrier.

銅箔6としては、特に限定されるものではないが、前述のキャリア付銅箔やJISB0601に示す10点の平均粗さ(Rz)が2.0μ〜5.0μmのものを用いることが好ましい。銅箔の製造条件としては、例えば、硫酸銅浴の場合、硫酸50〜100g/L、銅30〜100g/L、液温20〜80℃、電流密度0.5〜100A/dmの条件、ピロリン酸銅浴の場合、ピロリン酸カリウム100〜700g/L、銅10〜50g/L、液温30〜60℃、pH8〜12、電流密度0.5〜10A/dmの条件で製造することができる。また、銅の物性や平滑性を考慮して各種添加剤を用いてもよい。 Although it does not specifically limit as the copper foil 6, It is preferable to use the above-mentioned copper foil with a carrier and the average roughness (Rz) of 10 points | pieces shown to JISB0601 2.0-5.0 micrometers. As the production conditions of the copper foil, for example, in the case of a copper sulfate bath, sulfuric acid 50-100 g / L, copper 30-100 g / L, liquid temperature 20-80 ° C., current density 0.5-100 A / dm 2 , In the case of a copper pyrophosphate bath, it is manufactured under the conditions of potassium pyrophosphate 100 to 700 g / L, copper 10 to 50 g / L, liquid temperature 30 to 60 ° C., pH 8 to 12, and current density 0.5 to 10 A / dm 2. Can do. Various additives may be used in consideration of the physical properties and smoothness of copper.

次に、本発明の回路形成用支持基板の第2の形態について説明する。
本発明の回路形成用支持基板の第2の形態は、絶縁樹脂層が、支持体上に配置された接着樹脂層に、該支持体及び接着樹脂層より小さいサイズの金属箔を2枚以上介して接着されたものである。
図2には、本発明の回路形成用支持基板の第2の形態の一例を示す。本発明の回路形成用支持基板の第2の形態としては、例えば、支持体7に両面粗化銅箔を使用し、その両側に、接着樹脂層3としてプリプレグを配置し、さらに支持体7及び接着樹脂層3よりも小さいサイズの銅箔8をそれぞれの光沢面が向かい合うように2枚配し、絶縁樹脂層5としてプリプレグと、外層に相当する銅箔6を配置し、加熱加圧により接着積層することで製造することができる。
Next, a second embodiment of the circuit forming support substrate of the present invention will be described.
According to a second embodiment of the circuit-forming support substrate of the present invention, the insulating resin layer has two or more metal foils smaller in size than the support and the adhesive resin layer interposed in the adhesive resin layer disposed on the support. Are glued together.
In FIG. 2, an example of the 2nd form of the support substrate for circuit formation of this invention is shown. As a second form of the circuit-forming support substrate of the present invention, for example, a double-sided roughened copper foil is used for the support 7, prepregs are disposed as adhesive resin layers 3 on both sides thereof, and the support 7 and Two copper foils 8 having a size smaller than that of the adhesive resin layer 3 are arranged so that the glossy surfaces thereof face each other, a prepreg as the insulating resin layer 5 and the copper foil 6 corresponding to the outer layer are arranged, and bonded by heating and pressing. It can be manufactured by laminating.

支持体7、接着樹脂層3及び絶縁樹脂層5が銅箔8の4辺の端部で接着されるように、銅箔8は支持体7、接着樹脂層3及び絶縁樹脂層5の中心近傍へ配置することが好ましい。また、銅箔8のサイズは、支持体7のサイズより縦横方向とも10mm以上小さいことが好ましい。また、接着樹脂層3、絶縁樹脂層5及び銅箔6のサイズは、支持体7よりも大きいことが好ましい。   The copper foil 8 is near the center of the support 7, the adhesive resin layer 3, and the insulating resin layer 5 so that the support 7, the adhesive resin layer 3, and the insulating resin layer 5 are bonded at the ends of the four sides of the copper foil 8. It is preferable to arrange to. The size of the copper foil 8 is preferably smaller than the size of the support 7 by 10 mm or more in both the vertical and horizontal directions. The sizes of the adhesive resin layer 3, the insulating resin layer 5, and the copper foil 6 are preferably larger than the support 7.

回路形成用支持基板の加熱加圧による接着積層後、回路形成用支持基板の端面を裁断する際は、銅箔8の端面よりも1辺当たり5mm以上外側で裁断されることが好ましい。   When the end surface of the circuit forming support substrate is cut after the adhesion and lamination of the circuit forming support substrate by heating and pressing, it is preferably cut outside the end surface of the copper foil 8 by 5 mm or more per side.

絶縁樹脂層と銅箔との良好なピール強度を得る観点から、銅箔8の粗化面が絶縁樹脂層5及び接着樹脂層3へ各々接着するように配置することが好ましい。また、支持体7と接着樹脂層3の接着強度を高めるため、支持体7の表面は、両面とも粗化処理を施すことが好ましい。   From the viewpoint of obtaining a good peel strength between the insulating resin layer and the copper foil, the roughened surface of the copper foil 8 is preferably disposed so as to adhere to the insulating resin layer 5 and the adhesive resin layer 3, respectively. In order to increase the adhesive strength between the support 7 and the adhesive resin layer 3, the surface of the support 7 is preferably subjected to a roughening treatment on both sides.

支持体7は、特に限定されるものではなく、樹脂基板、金属張積層板、金属板、金属箔等の基板を使用することができる。   The support 7 is not particularly limited, and a substrate such as a resin substrate, a metal-clad laminate, a metal plate, or a metal foil can be used.

銅箔8は、JISB0601に示す10点の平均粗さ(Rz)が2.0μm〜5.0μmのものを用いるのが好ましい。このような銅箔の製造条件としては、例えば、硫酸銅浴の場合、硫酸50〜100g/L、銅30〜100g/L、液温20〜80℃、電流密度0.5〜100A/dmの条件、ピロリン酸銅浴の場合、ピロリン酸カリウム100〜700g/L、銅10〜50g/L、液温30〜60℃、pH8〜12、電流密度0.5〜10A/dmの条件で製造することができる。また、銅の物性や平滑性を考慮して各種添加剤を用いてもよい。 The copper foil 8 preferably has an average roughness (Rz) at 10 points shown in JISB0601 of 2.0 μm to 5.0 μm. As a manufacturing condition of such a copper foil, for example, in the case of a copper sulfate bath, sulfuric acid 50-100 g / L, copper 30-100 g / L, liquid temperature 20-80 ° C., current density 0.5-100 A / dm 2 In the case of a copper pyrophosphate bath, potassium pyrophosphate 100-700 g / L, copper 10-50 g / L, liquid temperature 30-60 ° C., pH 8-12, current density 0.5-10 A / dm 2 Can be manufactured. Various additives may be used in consideration of the physical properties and smoothness of copper.

以下、図3、図4に示す実施例により本発明を説明するが、これらの実施例は本発明を制限するものではない。
第1の実施例として図3では、両面に厚さ18μmの銅箔を有する公称厚み0.1mm、サイズ614×514mmの支持体2(銅張積層板)の両面に、公称厚み0.1mm、サイズ625×525mmの接着樹脂層3(プリプレグ)を1枚、支持体2の中心近傍に配置し基板10とした。
Hereinafter, the present invention will be described with reference to the embodiments shown in FIGS. 3 and 4, but these embodiments do not limit the present invention.
In FIG. 3 as a first example, the nominal thickness of 0.1 mm having a copper foil with a thickness of 18 μm on both sides, the nominal thickness of 0.1 mm on both sides of the support 2 (copper-clad laminate) of size 614 × 514 mm, One adhesive resin layer 3 (prepreg) having a size of 625 × 525 mm was disposed in the vicinity of the center of the support 2 to form a substrate 10.

基板10の両面に、厚さ5μmの極薄銅箔に厚さ18μmのキャリア銅箔が貼り合わされた、サイズ580×480mmの銅箔4(キャリア付銅箔)を、基板10の中心近傍に、且つ銅箔4のキャリア銅箔面が接着樹脂層3に対向するよう配置し、基板20とした。   A copper foil 4 having a size of 580 × 480 mm (copper foil with a carrier) in which a carrier copper foil having a thickness of 18 μm is bonded to an ultrathin copper foil having a thickness of 5 μm on both surfaces of the substrate 10 is disposed in the vicinity of the center of the substrate 10. In addition, the carrier copper foil surface of the copper foil 4 was disposed so as to face the adhesive resin layer 3, thereby forming a substrate 20.

基板20の両面に、公称厚み0.02mm、サイズ625×525mmの絶縁樹脂層5を重ね、さらに銅箔6として、厚さ5μmの極薄銅箔に厚さ18μmのキャリア銅箔が貼り合わされた、サイズ650×550mmのキャリア付銅箔を、厚さ5μmの極薄銅箔が絶縁樹脂層5と接着するように構成し、真空プレスを実施した。プレス後、607×508mmのサイズとなるよう端部を裁断し、基板30(回路形成用支持基板)とした。   An insulating resin layer 5 having a nominal thickness of 0.02 mm and a size of 625 × 525 mm was superimposed on both surfaces of the substrate 20, and a carrier copper foil having a thickness of 18 μm was bonded to an ultrathin copper foil having a thickness of 5 μm as a copper foil 6. A copper foil with a carrier having a size of 650 × 550 mm was constructed such that an ultrathin copper foil having a thickness of 5 μm was adhered to the insulating resin layer 5, and vacuum pressing was performed. After the pressing, the end portion was cut to a size of 607 × 508 mm to obtain a substrate 30 (support substrate for circuit formation).

基板30に、基板20との接続をとるための非貫通孔設置場所となる部分にコンフォーマルマスクを形成し、基板40とした。   A conformal mask was formed on the substrate 30 at a portion to be a non-through hole installation place for connection to the substrate 20, and the substrate 40 was obtained.

基板40の両面に、炭酸ガスレーザー加工機によって、1穴ずつ非貫通穴を形成し、基板50とした。   Non-through holes were formed on both surfaces of the substrate 40 one by one with a carbon dioxide laser processing machine to form a substrate 50.

基板50にデスミア処理を施し、無電解銅めっきにて厚み0.4〜0.8μmのめっきをした後、電解銅めっきにて厚み15〜20μmのめっきを実施し、基板60とした。これにより、基板20(銅箔4)と基板30(銅箔6)とが、非貫通孔によって電気的に接続されたことになる。   The substrate 50 was subjected to desmear treatment, plated with a thickness of 0.4 to 0.8 μm by electroless copper plating, and then plated with a thickness of 15 to 20 μm by electrolytic copper plating to obtain a substrate 60. Thereby, the board | substrate 20 (copper foil 4) and the board | substrate 30 (copper foil 6) were electrically connected by the non-through-hole.

基板60において、基板20における銅箔4の配置範囲内において、サイズ540×440mmとなるようにルータ加工機にて裁断し、基板10から分離し、層間接続された絶縁樹脂基板(基板70)を得た。   In the substrate 60, within the arrangement range of the copper foil 4 in the substrate 20, a size of 540 × 440 mm is cut by a router processing machine, separated from the substrate 10, and an insulating resin substrate (substrate 70) connected between the layers is obtained. Obtained.

基板70の表面の整面を実施し、ドライフィルムレジストをラミネートした。その後、回路パターンを焼付け、レジスト現像、エッチング、レジスト除去によって配線パターンを形成し、基板80とした。   The surface of the substrate 70 was adjusted and a dry film resist was laminated. Thereafter, a circuit pattern was baked, a resist pattern, a resist pattern, a wiring pattern was formed by etching and resist removal, and a substrate 80 was obtained.

基板80に対しソルダーレジスト形成、金めっき仕上げを行い、パターンサイズに切断加工を施すことにより、基板90を得た。   A substrate 90 was obtained by performing solder resist formation and gold plating on the substrate 80 and cutting the pattern size.

第2の実施例として図4では、厚さ35μm、サイズ614×514mmの支持体7(両面粗化銅箔)の両面に、公称厚み0.1mm、サイズ625×525mmの接着樹脂層3(プリプレグ)を1枚、支持体7の両面に配置し基板15とした。   As a second embodiment, in FIG. 4, the adhesive resin layer 3 (prepreg) having a nominal thickness of 0.1 mm and a size of 625 × 525 mm is formed on both surfaces of a support 7 (double-side roughened copper foil) having a thickness of 35 μm and a size of 614 × 514 mm. ) On one side of the support 7 to form a substrate 15.

基板15の両面に、厚さ12μm、サイズ580×480mmの銅箔8をそれぞれの光沢面を向かい合わせた状態で2枚、基板10の中心近傍に配置し、基板25とした。   Two copper foils 8 having a thickness of 12 μm and a size of 580 × 480 mm were placed on both sides of the substrate 15 in the vicinity of the center of the substrate 10 with the respective glossy surfaces facing each other.

基板25の両面に、公称厚み0.02mm、サイズ625×525mmの絶縁樹脂層5(プリプレグ)を配置し、さらに銅箔6として、厚さ5μmの極薄銅箔に厚さ18μmのキャリア銅箔が貼り合わされた、サイズ650×550mmのキャリア付銅箔を、5μmの極薄銅箔が絶縁樹脂層5と接着するように構成し、真空プレスを実施した。プレス後、607×508mmのサイズとなるよう端部を裁断し、基板35(回路形成用支持基板)とした。   An insulating resin layer 5 (prepreg) having a nominal thickness of 0.02 mm and a size of 625 × 525 mm is disposed on both surfaces of the substrate 25, and further, as a copper foil 6, an ultrathin copper foil having a thickness of 5 μm and a carrier copper foil having a thickness of 18 μm. A copper foil with a carrier having a size of 650 × 550 mm was configured such that a 5 μm ultrathin copper foil was bonded to the insulating resin layer 5, and vacuum pressing was performed. After pressing, the end portion was cut to a size of 607 × 508 mm to obtain a substrate 35 (circuit forming support substrate).

基板35に、基板25との接続をとるための非貫通孔設置場所となる部分にコンフォーマルマスクを形成し、基板45とした。   A conformal mask was formed on a portion of the substrate 35 where a non-through hole was placed for connection with the substrate 25 to form a substrate 45.

基板45の両面に、炭酸ガスレーザー加工機によって、1穴ずつ非貫通穴を形成し、基板55とした。   Non-through holes were formed on both surfaces of the substrate 45 one by one with a carbon dioxide laser processing machine to form a substrate 55.

基板55にデスミア処理を施し、無電解銅めっきにて厚さ0.4〜0.8μmのめっきをした後、電解銅めっきにて厚さ15〜20μmのめっきを実施し、基板65とした。これにより、基板25(銅箔8)と基板35(銅箔6)とが、非貫通孔によって電気的に接続されたことになる。   The substrate 55 was subjected to desmear treatment, plated with a thickness of 0.4 to 0.8 μm by electroless copper plating, and then plated with a thickness of 15 to 20 μm by electrolytic copper plating to obtain a substrate 65. Thereby, the board | substrate 25 (copper foil 8) and the board | substrate 35 (copper foil 6) were electrically connected by the non-through-hole.

基板65において、基板20における銅箔8の配置範囲内において、サイズ540×440mmとなるよう、ルータ加工機にて裁断することにより、基板15から分離し、層間接続された絶縁樹脂基板を、基板75とした。   In the substrate 65, the insulating resin substrate separated from the substrate 15 and connected between the layers by cutting with a router processing machine so as to have a size of 540 × 440 mm within the arrangement range of the copper foil 8 in the substrate 20 75.

基板75の表面の整面を実施し、ドライフィルムレジストをラミネートした。その後、回路パターンを焼付け、レジスト現像、エッチング、レジスト除去によって配線パターンを形成し、基板85とした。   Surface conditioning of the substrate 75 was performed, and a dry film resist was laminated. Thereafter, the circuit pattern was baked, a resist pattern was developed, etched, and a resist pattern was formed to form a substrate 85.

基板85に対しソルダーレジスト形成、金めっき仕上げを行い、パターンサイズに切断加工を施すことにより、基板95を得た。   The board | substrate 95 was obtained by performing soldering resist formation and gold plating finishing with respect to the board | substrate 85, and giving a cutting process to pattern size.

本発明の第1及び2の実施例で製造した回路形成用支持基板は、いずれも端部が十分に接着されており、めっき液やエッチング液の浸み込みを防止することができた。   The end portions of the circuit-forming support substrates produced in the first and second embodiments of the present invention were sufficiently bonded, and the penetration of the plating solution and the etching solution could be prevented.

本発明の回路形成用支持基板の第1の形態の説明図Explanatory drawing of the 1st form of the support substrate for circuit formation of this invention 本発明の回路形成用支持基板の第2の形態の説明図Explanatory drawing of the 2nd form of the support substrate for circuit formation of this invention 第1の実施例の説明図Explanatory drawing of the first embodiment 第2の実施例の説明図Explanatory drawing of 2nd Example

1 回路形成用支持基板
2 支持体(銅張積層板)
3 接着樹脂層
4 銅箔(キャリア付銅箔)
5 絶縁樹脂層
6 銅箔
7 支持体(銅箔両面粗化)
8 銅箔
1 Support substrate for circuit formation 2 Support (copper-clad laminate)
3 Adhesive resin layer 4 Copper foil (copper foil with carrier)
5 Insulating resin layer 6 Copper foil 7 Support (Roughening of copper foil on both sides)
8 Copper foil

Claims (5)

絶縁樹脂層が、支持体上に配置された接着樹脂層に、該支持体及び接着樹脂層より小さいサイズのキャリア付銅箔を介して接着された回路形成用支持基板。   A circuit-forming support substrate in which an insulating resin layer is bonded to an adhesive resin layer disposed on a support via a copper foil with a carrier having a size smaller than that of the support and the adhesive resin layer. 絶縁樹脂層が、支持体上に配置された接着樹脂層に、該支持体及び接着樹脂層より小さいサイズの金属箔を2枚以上介して接着された回路形成用支持基板。   A circuit-forming support substrate in which an insulating resin layer is bonded to an adhesive resin layer disposed on a support via two or more metal foils having a size smaller than that of the support and the adhesive resin layer. 前記支持体が金属張積層板である請求項1又は2に記載の回路形成用支持基板。   The circuit-forming support substrate according to claim 1, wherein the support is a metal-clad laminate. 前記支持体が金属箔である請求項1又は2に記載の回路形成用支持基板。   The circuit-forming support substrate according to claim 1, wherein the support is a metal foil. 請求項1〜4に記載の回路形成用支持基板を用いて製造されるプリント配線板   A printed wiring board manufactured using the circuit-forming support substrate according to claim 1.
JP2014104258A 2014-05-20 2014-05-20 Support substrate for circuit formation, printed wiring board using the same, and method of manufacturing the same Pending JP2015220393A (en)

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