JP2015204320A - Exposure device and method for fixing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device capable of achieving high exposure accuracy.SOLUTION: An exposure device includes: an array element in which optical elements are two-dimensionally arrayed; a holder for holding the array element; a projection optical system in which light via the array element is imaged on a photoreceptive material; a fixed part to which a position to the projection optical system is fixed and to which a holder is fixed; a fixture to which the holder is fixed to the fixed part; and a recess which is for holding the holder by being adsorbed into the fixed part and is provided in at least one of the holder and the fixed part.

Description

  The present invention relates to an exposure apparatus used in, for example, photolithography, and more particularly, to an exposure apparatus that passes light modulated by a spatial light modulation element through a projection optical system and forms an image of the light on a predetermined surface. About.

In recent years, light modulated using a spatial light modulator such as DMD (Digital Mirror Device: registered trademark) is passed through a projection optical system, and an image of this light is formed on a photosensitive material (resist) and exposed. An exposure apparatus has been proposed. Thus, an exposure apparatus using a spatial light modulator is called a DI (direct image) exposure apparatus.
The exposure head of the DI exposure apparatus includes a “spatial light modulator (DMD)”, a “first projection optical system (projection lens)”, a “microlens array (MLA)”, and a “second projection optical system (projection). Lens) ”. Such a DI exposure apparatus enlarges and projects light modulated by DMD onto the MLA by the first projection lens, and projects light that has passed through the MLA onto a predetermined light irradiation surface by the second projection lens. It has a configuration. Here, the MLA is a lens in which microlenses corresponding to the respective pixel portions of the DMD are arranged in an array in accordance with the positions of the respective pixels of the DMD.

  As such a DI exposure apparatus, for example, there are techniques described in Patent Document 1 and Patent Document 2. These techniques relate to an exposure apparatus including components such as a DMD, a first projection lens, an MLA, and a second projection lens, and guides light that has passed through each pixel portion (mirror) of the DMD to each microlens of the MLA. Is.

Japanese Patent No. 4510429 JP 2005-189403 A

  By the way, in the DI exposure apparatus, the exchange frequency of the DMD is relatively high, and it is necessary to align the DMD mirror and the corresponding MLA lens each time. Although less frequent than DMD, it is also necessary to align the MLA in order to set the projected image on the light irradiation surface to a desired position and direction. And after such alignment, it is preferable to fix the position of DMD or MLA.

However, since high accuracy is required for alignment, high exposure accuracy cannot be realized if misalignment that cannot be ignored occurs in the work for fixing the position of DMD or MLA (for example, screw tightening). The above-mentioned Patent Document 1 and Patent Document 2 do not propose any configuration or method for fixing such a position of DMD or MLA by suppressing such positional deviation.
Therefore, an object of the present invention is to provide an exposure apparatus that can realize high exposure accuracy. Another object of the present invention is to provide a fixing method that can be applied to the exposure apparatus.

In order to solve the above-described problems, an aspect of the exposure apparatus according to the present invention includes an array element in which optical elements are arrayed two-dimensionally, a holder that holds the array element, and light that passes through the array element. A projection optical system that forms an image on a photosensitive material, a fixed part that is fixed in position relative to the projection optical system and to which the holder is fixed, a fixture that fixes the holder to the fixed part, and the holder And a recessed portion provided in at least one of the holder and the fixed portion for holding the fixed portion by suction.
According to such an exposure apparatus, since the holder can be sucked and fixed using the concave portion and then fixed with the fixing tool, the holder is displaced due to the fixing operation (and thus the arrangement element is displaced). Can be suppressed. As a result, high exposure accuracy can be realized by the array elements aligned with high accuracy.

In the exposure apparatus, the array element is an array of reflective or transmissive optical elements, and the projection optical system forms an image of light reflected or transmitted by the array element. Preferably there is.
If the array element is of a reflective type or a transmissive type, the misalignment of the array element has a large effect on the exposure accuracy of the exposure apparatus via the projection optical system at the subsequent stage. Accuracy is effectively improved.

Furthermore, in order to solve the above-described problem, one aspect of the fixing method according to the present invention is an array element in which optical elements are arrayed two-dimensionally, a holder that holds the array element, and light that passes through the array element. An exposure apparatus comprising a projection optical system that forms an image on a photosensitive material, wherein the holder is fixed to a fixed part whose position relative to the projection optical system is fixed. And a second step of fixing the holder held in the first step to the fixed portion with a fixing tool.
According to such a fixing method, it is possible to suppress the positional deviation of the holder (and consequently the positional deviation of the array element) accompanying the fixing operation in the second step, and high exposure by the array element aligned with high accuracy. Accuracy can be achieved.

  In the exposure apparatus and the fixing method of the present invention, it is possible to suppress the positional deviation of the holder accompanying the fixing operation, so that high exposure accuracy can be realized.

It is a schematic block diagram which shows the exposure apparatus of this embodiment. It is a figure which shows the specific structure of an exposure head. It is sectional drawing which shows the structure of MLA. It is a top view which shows the structure of MLA. It is a figure which shows the image formation area by an exposure head. It is a figure which shows notionally the fixing method of the projection optical system with respect to a base plate. It is a figure which shows the fixed position of a DMD holder and an MLA holder. It is sectional drawing which shows an example of the detailed structure of a DMD holder. It is a perspective view which shows an example of the detailed structure of a DMD holder. It is a figure which shows an example of the jig | tool for adjustment of a DMD holder. It is a figure which shows an example of the arm of the jig for adjustment. It is sectional drawing which shows an example of the detailed structure of an MLA holder. It is a perspective view which shows an example of the detailed structure of an MLA holder. It is a figure which shows an example of the jig for adjustment of the upper holder. It is a figure which shows the MLA holder of a modification. It is a figure showing the relationship between the generation pattern of a crosstalk, and an adjustment direction.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic block diagram that shows the exposure apparatus of the present embodiment.
The exposure apparatus 1 exposes light modulated by a spatial light modulator through a projection optical system and forms an image of this light on a photosensitive material (resist). Since such an exposure apparatus directly forms an image with a spatial light modulation element, no mask (or reticle) is required, and it is called a DI (direct image) exposure apparatus.
The exposure apparatus 1 includes an exposure head unit 10, a transport system 20 that transports a substrate (workpiece) W to be exposed, and an installation table 30 on which the exposure head unit 10 and the transport system 20 are installed. Here, the workpiece W is, for example, a resin printed board coated with a resist.

  The exposure head unit 10 includes a plurality of exposure heads (optical engines) 11 and a light source not shown here. The exposure head 11 incorporates the spatial light modulator described above, is supplied with light from a light source, and irradiates light with a preset pattern. The plurality of exposure heads 11 are supported by a common base plate 12. The base plate 12 is fixed to a gate-like gantry 31 provided so as to straddle the installation table 30, and each end portion (leg part) of the gantry 31 is fixed to a side surface of the installation table 30.

  Here, the base plate 12 is directly mounted on a horizontal beam portion connecting the two legs of the gantry 31. A through hole (not shown) through which the exposure head 11 passes is formed in the beam portion of the gantry 31, and the base plate 12 straddles the through hole and has both end portions (here, the end portion in the X direction) at the gantry. The structure is fixed to 31 beam portions. That is, the base plate 12 is fixed to the gantry 31 in a doubly supported beam shape.

  Note that the fixing method of the base plate 12 to the gantry 31 can be appropriately applied as long as the method can secure rigidity. For example, when the exposure head unit 10 includes an outer frame frame and the outer frame frame and the gantry 31 are fixed, the base plate 12 is fixed to the gantry 31 via the outer frame frame of the exposure head unit 10. You can also. In this case, the base plate 12 is fixed to the outer frame frame in a doubly supported beam shape.

In addition, the transport system 20 takes as an example a flat plate-like stage 21 that sucks and holds the workpiece W by a method such as vacuum suction, two guides 22 that extend along the moving direction of the stage 21, and a moving mechanism of the stage 21. The electromagnet 23 is provided.
Here, an example in which a linear motor stage is employed as the moving mechanism will be described. In this case, the linear motor stage moves by moving the movable body (stage) by air on a flat platen with a ferromagnetic convex pole in a grid pattern and applying magnetic force to the movable body. This is a mechanism for moving the moving body (stage) by changing the magnetic force between the body and the convex pole of the platen.

The stage 21 is arranged so that its longitudinal direction is directed to the stage moving direction, and is supported by the guide 22 so as to be able to reciprocate in a state where straightness is compensated.
In this specification, the moving direction of the stage 21 is defined as the X direction, the horizontal direction perpendicular to the X direction is defined as the Y direction, and the vertical direction is defined as the Z direction. The workpiece W has a square shape and is held on the stage 21 in a posture in which one side is directed in the X direction and the other side is directed in the Y direction. In the following description, the X direction may be referred to as the length direction of the workpiece W, and the Y direction may be referred to as the width direction of the workpiece W.
The moving path of the stage 21 is designed to pass directly under the exposure head unit 10, and the transport system 20 transports the workpiece W to a light irradiation position by each exposure head 11 and passes the irradiation position. It is configured as follows. In the course of this passage, the pattern of the image formed by each exposure head 11 is exposed on the workpiece W.

Next, the optical configuration of the exposure head 11 will be described.
FIG. 2 is a diagram conceptually showing the optical configuration of the exposure head 11. As shown in FIG. 2, the exposure head 11 includes an incident optical system 14, a spatial light modulator 15, a first projection lens 16, a microlens array (MLA) 17, and a second projection lens 18. Is provided.
The incident optical system 14 causes the output light of the light source 13 to enter the spatial light variable element 15, and includes an optical fiber 14a, a collimating lens 14b, and a mirror 14c. Here, the light source 13 is a lamp or laser diode that emits a wavelength of 405 nm or 365 nm, and for example, a quartz fiber is used as the optical fiber 14a.

The output light of the light source 13 is guided by the optical fiber 14a and is incident on the collimator lens 14b. The collimator lens 14b converts the light emitted from the optical fiber 14a and spreads into parallel light and emits it. The light that has passed through the collimator lens 14b is reflected by the mirror 14c and enters the spatial light modulator 15 at an angle θ.
A digital mirror device (DMD) is used as the spatial light modulator 15. The DMD is an array element in which minute mirrors (pixel mirrors) of about 13.68 μm square, for example, are two-dimensionally arranged. The number of arrays is, for example, 1024 × 768, and the overall size of the spatial light modulator (DMD) 15 is, for example, about 14 mm × 10.5 mm.

The angle of each pixel mirror of the DMD 15 is controlled by a control unit (not shown). The control unit outputs a control signal for controlling the angle of each pixel mirror of the DMD 15 so that only the reflected light that forms a desired pattern is incident on the first projection lens 16.
That is, the angle of each pixel mirror of the DMD 15 is selectively controlled according to the pattern of the image to be formed. Specifically, according to the pattern to be formed, the pixel mirror at the position where the light should reach the workpiece W is an angle at which the light reflected by the pixel mirror enters the first projection lens 16 (first angle). The other pixel mirrors are controlled to an angle (second angle) at which the light reflected by the pixel mirror does not enter the first projection lens 16.
Thus, only the light reflected by the pixel mirror at the first angle reaches the surface of the workpiece W, and the light reflected by the pixel mirror at the second angle does not reach the workpiece W.
The first projection lens 16 is an enlargement projection lens that projects the image from the DMD 15 on the MLA 17 by enlarging the image from the DMD 15 by 2 to 5 times, for example.

  Further, the MLA 17 is an optical component (array element) in which a large number of minute lenses (hereinafter referred to as lens elements) 17a are arrayed two-dimensionally as shown in a sectional view in FIG. 3A and a plan view in FIG. 3B. Each lens element 17a corresponds to each pixel mirror of the DMD 15 on a one-to-one basis. That is, each lens element 17a forms an image of one pixel mirror on the surface of the workpiece W.

Further, the second projection lens 18 is an equal-magnification projection lens or a reduction lens that reduces the light collected in a spot shape by the MLA 17 to, for example, about 1 time (equal magnification) to about 1/2 time and projects it onto the workpiece W. Projection lens.
As described above, in the DI exposure apparatus 1, the first projection lens 16 and the second projection lens 18 are arranged at the front stage (light incident side) and the rear stage (light emission side) of the MLA 17, respectively. The first projection lens 16, the MLA 17, and the second projection lens 18 constitute a projection optical system for the DMD 15. Further, the second projection lens 18 constitutes a projection optical system for the MLA 17.

FIG. 4 is a schematic perspective view showing an image forming area by the exposure head 11.
In FIG. 4, the image forming area by each exposure head 11 is indicated by a square frame (reference numeral E) on the surface of the workpiece W. An image by one exposure head 11 is formed in the image forming area E indicated by this frame.
As shown in FIG. 4, the exposure heads 11 are provided in two rows in the X direction, and each of the exposure heads 11 in the rear group with respect to the moving direction of the workpiece W is Y of each exposure head 11 in the front group. It is arranged at a position between the directions.
By arranging the exposure heads 11 in this way, when the work W is exposed while moving in the X direction, a portion that cannot be exposed in the image forming area E by the exposure heads 11 of the front group is exposed to the rear side exposures. Exposure can be performed in the image forming area E by the head 11. A desired pattern is formed by the entire exposure head 11.

That is, a control unit (not shown) stores digital data (original data) of an image (exposure pattern) to be formed, sends a control signal to the transport system 20, and sets the stage 21 on which the workpiece W is placed to a predetermined level. Move at speed. At the same time, the control unit sends a control signal to the DMD 15 to control the angle of each pixel mirror at a predetermined timing and sequence so that an exposure pattern based on the original data is formed on the workpiece W.
As a result, the workpiece W coated with the resist passes through the image forming area E, and an exposure pattern based on the original data is formed on the workpiece W.

Here, the structure which fixes each component of a projection optical system with respect to the baseplate 12 is demonstrated.
FIG. 5 is a diagram conceptually showing a method of fixing the projection optical system to the base plate 12. In FIG. 5, the gantry 31 is not shown.
The base plate 12 is formed with a through hole 12a through which light reflected by the DMD 15 passes.

A microlens array holder (MLA holder) 17b holding the MLA 17 is fixed on the upper surface of the base plate 12 so that the MLA 17 is disposed above the through hole 12a. The MLA holder 17b is screwed to the base plate 12 with screws 17c.
Furthermore, a first projection lens holder 16 a that holds the first projection lens 16 is fixed on the upper surface of the base plate 12 so that the first projection lens 16 is disposed above the MLA 17. Here, the first projection lens 16 is held by the first projection lens holder 16a by, for example, screwing. The first projection lens holder 16a is screwed to the base plate 12 with screws 16b.
Further, the incident optical system 14 is fixed to the upper portion of the first projection lens 16 by, for example, screwing, and a DMD holder 15 a holding the DMD 15 is fixed to the incident optical system 14.

  On the other hand, a second projection lens holder 18a that holds the second projection lens 18 is fixed to the lower surface of the base plate 12 so that the second projection lens 18 is disposed below the through hole 12a. Here, the second projection lens 18 is held by the second projection lens holder 18a, for example, by screwing. The second projection lens holder 18a is screwed to the base plate 12 with screws 18b.

  In this way, each element constituting the exposure head 11 is fixed directly or indirectly to the base plate 12, but the incident optical system 14, the first projection lens 16, and the second projection lens 18 are As compared with the DMD 15 (and the DMD holder 15a) and the MLA 17 (and the MLA holder 17b), high-precision alignment is not required. Therefore, when the screw and the screw hole are simply aligned, they can be fixed by screwing. On the other hand, the MLA 17 (and the MLA holder 17b) needs to be aligned with a specific angle with a specific angle based on the moving direction of the workpiece W, and the DMD 15 (and the DMD holder 15a) High-precision alignment that matches the angle is required. Then, after such highly accurate alignment, it is required to fix the alignment accuracy without disturbing it.

Hereinafter, a specific fixing method of the DMD 15 (and the DMD holder 15a) and the MLA 17 (and the MLA holder 17b) in the present embodiment will be described in detail.
FIG. 6 is a diagram illustrating a fixing position of the DMD holder and the MLA holder.
FIG. 6 specifically shows the fixing positions of the DMD holder and the MLA holder conceptually shown in FIG.
The MLA holder 17b is fixed to the base plate 12 so as to be substantially covered with the first projection lens holder 16a, and an adjustment arm, which will be described in detail later, projects outward from the first projection lens holder 16a. .
As described above, the first projection lens holder 16a is screwed to the base plate 12, and the first projection lens 16 is screwed to the upper part of the first projection lens holder 16a. The incident optical system 14 is screwed to the upper part of the first projection lens 16, and the DMD holder 15 a is fixed to the upper part of the incident optical system 14.

FIG. 7 is a cross-sectional view showing an example of the detailed structure of the DMD holder, and FIG. 8 is a perspective view showing an example of the detailed structure of the DMD holder.
In FIG. 7, the DMD holder 15 a includes three presser fittings 151, 152, 153 and a base plate 158. The DMD 15 that is a semiconductor chip is mounted on the substrate 15b, and the three pressing metal parts 151, 152, and 153 are integrated by sandwiching the DMD 15 together with the substrate 15b and screwing each other. The presser fittings 151, 152, and 153 integrated in this way are fixed to the base plate 158 with screws 156 with a tilt adjusting shim (stainless steel thin plate) 155 interposed therebetween. The shim 155 is sandwiched by an appropriately selected number so that the reflecting surface of the DMD 15 is parallel to the upper surface of the incident optical system 14 to which the DMD holder 15a is fixed. By such tilt adjustment by the shim 155, the direction of light traveling from the DMD 15 to the first projection lens 16 is parallel to the optical axis of the first projection lens 16 (that is, the direction of the Z axis shown in FIG. 1). It becomes.

  With this structure, the DMD holder 15a is integrated with the DMD 15 and holds the DMD 15. The DMD holder 15a integrated with the DMD 15 is fixed to the upper part of the incident optical system 14 which is a fixed portion with respect to the DMD holder 15a. A hole 141 for vacuum-sucking the DMD holder 15a and a joint 142 for suction are provided above the incident optical system 14. One end of the hole 141 extends in a groove shape along the upper surface facing the DMD holder 15 a, and the DMD holder 15 a is placed on the upper portion of the incident optical system 14 by vacuum suction through the hole 141 extending in this groove shape. Strongly held. In addition, as long as sufficient holding force is obtained, the end of the hole 141 does not need to have a groove shape, and may be, for example, a round hole.

  The DMD holder 15a is temporarily held on the upper part of the incident optical system 14 which is a fixed portion by vacuum suction after highly accurate position adjustment. Suction holding represented by vacuum suction can hold the DMD holder 15a on the upper portion (fixed portion) of the incident optical system 14 without disturbing the position of the precisely adjusted DMD holder 15a. The DMD holder 15a held in this way may be firmly fixed to the upper part of the incident optical system 14 by the screw 15c, and then the vacuum suction may be released. Since the DMD holder 15a is held by vacuum suction during the fixing operation with the screw 15c, the positional deviation of the DMD holder 15a accompanying the fixing operation is suppressed. With such a fixing method, the DMD holder 15a (and DMD 15) is fixed to the fixed portion precisely and firmly. In this example, the suction joint 142 and the hole 141 are provided on the fixed portion side. However, even in a mode in which the joint 142 and the hole 141 are provided on the DMD holder 15a side, the suction action can be obtained similarly. It is natural.

As the position adjustment of the DMD holder 15a, the vertical and horizontal positions and angles are adjusted in a plane perpendicular to the optical axis of the first projection lens 16 (that is, an XY plane perpendicular to the Z axis shown in FIG. 1). . Since this position adjustment is a precise adjustment, an adjustment jig is used.
FIG. 9 is a diagram illustrating an example of an adjustment jig for the DMD holder, and FIG. 10 is a diagram illustrating an example of an arm of the adjustment jig.
The adjustment jig 40 is temporarily attached when the position of the DMD holder 15a is adjusted, and is removed when the DMD holder 15a is fixed after the position adjustment.

  9 and 10, the adjustment jig 40 includes three arms 41, 42, and 43, and the first and second arms 41 and 42 are in the arm length direction (X in the XY plane). The third arm 43 advances and retreats in the Y direction in the XY plane. The DMD holder 15a moves in the X direction when the first and second arms 41 and 42 advance and retract in the same direction, and the DMD holder 15a moves in the Y direction when the third arm 43 advances and retracts. Further, the DMD holder 15a rotates in the XY plane as the first and second arms 41 and 42 advance and retreat in opposite directions. Since each arm 41, 42, 43 advances and retreats with high accuracy according to the operation of the operator, the operator can align the DMD holder 15a with a desired position and angle with high accuracy. This desired position and angle is based on the position and angle of the MLA 17.

Next, a specific fixing method of the MLA 17 (and the MLA holder 17b) will be described.
FIG. 11 is a cross-sectional view showing an example of the detailed structure of the MLA holder, and FIG. 12 is a perspective view showing an example of the detailed structure of the MLA holder.
The MLA holder 17 b includes an upper holder 171 and a lower holder 172, and the upper holder 171 can be precisely rotated with respect to the lower holder 172. The MLA 17 is integrated with the upper holder 171 by being bonded to the upper holder 171 with an adhesive. The upper holder 171 is provided with an angle adjusting arm 177.

  The lower holder 172 is fixed to the base plate 12 with screws 174 with a tilt adjusting shim 173 interposed therebetween. The shim 173 is appropriately set so that the direction of the optical axis of the MLA 17 is parallel to the optical axis of the first projection lens 16 and the optical axis of the second projection lens 18 (that is, the Z-axis direction shown in FIG. 1). The selected number is sandwiched. The lower holder 172 that is tilt-adjusted and fixed to the base plate 12 in this way is a fixed portion to which the upper holder 171 is fixed. The lower holder 172 is provided with a hole 175 for vacuum suction of the upper holder 171 and a joint 176 for suction. One end of the hole 175 extends in a groove shape along the upper surface facing the upper holder 171, and the upper holder 171 is strongly held by the lower holder 172 by vacuum suction through the hole 175 extending in this way. The The hole 175 may be a round hole or the like instead of a groove as long as a sufficient holding force is obtained.

  The upper holder 171 is temporarily held by the lower holder 172 as a fixed portion by vacuum suction after precise angle adjustment in the XY plane perpendicular to the Z axis shown in FIG. Since this holding is also holding by suction, the upper holder 171 can be held without disturbing the precisely adjusted angular position. The upper holder 171 held in this way is firmly fixed to the lower holder 172 by the screw 17c, and then the vacuum suction is released. Since the upper holder 171 is held by the lower holder 172 by vacuum suction during the fixing work with the screw 17c, the positional deviation of the upper holder 171 (for example, the positional deviation due to the tightening force of the screw) accompanying the fixing work is suppressed. By such a fixing method, the upper holder 171 is fixed to the lower holder 172 precisely and firmly, and as a result, the MLA 17 is fixed to the base plate 12 precisely and firmly. Also in this example, the suction joint 176 and the hole 175 are provided on the lower holder 172 side which is a fixed portion. However, even in an embodiment in which the joint 176 and the hole 175 are provided on the upper holder 171 side, the suction action is the same It is natural that you can get to.

Since the angle adjustment of the upper holder 171 is also a precise adjustment, an adjustment jig is used.
FIG. 13 is a diagram illustrating an example of an adjustment jig for the upper holder 171.
Since the adjustment jig 50 can press the arm 177 of the upper holder 171 with high accuracy in accordance with the operation of the operator, the operator can adjust the upper holder 171 and the MLA 17 to a desired angle with high accuracy. This desired angle is a specific angle based on the moving direction of the workpiece W by the stage 21 shown in FIG.
As for the position of the MLA 17 in the XY plane (that is, the position of the lower holder 172), the number of lens elements arranged in the MLA 17 is larger than the number of pixel mirrors arranged in the DMD 15. Therefore, high-precision positioning is not required as compared with the angle adjustment of the MLA 17, and when the screw and the screw hole are simply aligned, they are fixed by screwing as they are.

Here, a modified example of the MLA holder that can be used in place of the MLA holder 17b shown in FIGS.
FIG. 14 is a view showing a modified example of the MLA holder.
In the MLA holder 117b of this modified example, the upper holder 171 and the lower holder 172 are provided with fixing extension plates 178 and 179, respectively, and these extension plates 178 and 179 are fixed to each other by the adhesive 60. Thus, the upper holder 171 is fixed to the lower holder 172. Even with the adhesive 60, the upper holder 171 is fixed sufficiently firmly to the lower holder 172.
In the case of this modification, for example, the positional deviation of the upper holder 171 due to stress or the like when applying the adhesive 60 is suppressed, and the upper holder 171 is fixed to the lower holder 172 precisely and firmly.
This is the end of the description of the modification.

  Next, alignment of the DMD 15 with reference to the MLA 17 will be described. As described above, the position of the DMD 15 is adjusted by using the adjustment jig 40. The desired position and angle of the DMD holder 15a in the position adjustment (that is, the desired position and angle of the DMD 15) are set in this embodiment. In this case, the position and angle of the MLA 17 are used as a reference, and specifically, the position and angle at which the light emitted from each pixel mirror of the DMD 15 enters each lens element corresponding to the MLA 17. When the DMD 15 is aligned at a desired position and angle, the light emitted from each pixel mirror of the DMD 15 passes through the corresponding lens elements, and finally becomes a dot at the light irradiation position of the exposure head 11. Imaged. However, if the position and angle of the DMD 15 are deviated from the desired position and angle, an extra light spot called crosstalk is generated and the exposure accuracy is lowered. Accordingly, the position of the DMD 15 is adjusted so that the occurrence of crosstalk is reduced while the occurrence state of such crosstalk is confirmed by the camera and the monitor.

FIG. 15 is a diagram illustrating the relationship between the occurrence pattern of crosstalk and the adjustment direction.
In FIG. 15, light spots that are normally imaged are indicated by hatching, and light spots of crosstalk are indicated by white lines. Further, in FIG. 15, the pattern 1 in which the X-direction position of the DMD 15 is deviated from the desired position, the pattern 2 in which the Y-direction position of the DMD 15 is deviated from the desired position, and the angle of the DMD 15 from the desired angle. A shifted pattern 3 is shown. In any pattern, the DMD 15 uses the adjustment jig shown in FIG. 9 so that the crosstalk light spot approaches the normally spotted light spot as indicated by the arrow in the figure. The position is adjusted.
By such position adjustment, the DMD 15 is precisely aligned with the MLA 17, and high-accuracy exposure with little crosstalk is realized.

  DESCRIPTION OF SYMBOLS 1 ... Exposure apparatus, 10 ... Exposure head unit, 11 ... Exposure head, 12 ... Base plate, 13 ... Light source, 14 ... Incident optical system, 15 ... Spatial light modulation element (DMD), 15a ... DMD holder, 155 ... For vacuum suction 16 ... first projection lens, 17 ... micro lens array (MLA), 17a ... lens element, 17b ... MLA holder, 17c ... screw, 18 ... second projection lens, 171 ... upper holder, 172 ... lower Holder, 175 ... Hole for vacuum suction

Claims (3)

An exposure apparatus that modulates light from a light source for each pixel and forms an image on a photosensitive material,
An array element in which optical elements are two-dimensionally arranged;
A holder for holding the array element;
A projection optical system that forms an image of light through the array element on the photosensitive material;
A fixed part to which the position of the projection optical system is fixed and the holder is fixed;
A fixture for fixing the holder to the fixed part;
A recess provided in at least one of the holder and the fixed part for holding the holder by suction to the fixed part;
An exposure apparatus comprising: The array element is an array of reflective or transmissive optical elements,
2. An exposure apparatus according to claim 1, wherein the projection optical system forms an image of light reflected or transmitted by the array element. An exposure apparatus that modulates light from a light source for each pixel to form an image on a photosensitive material, an array element in which optical elements are arrayed two-dimensionally, a holder that holds the array element, and the array element In a fixing method for fixing the holder to a fixed part in which the position relative to the projection optical system is fixed.
A first step of holding the holder to the fixed part by suction;
A second step of fixing the holder held in the first step to the fixed portion with a fixture;
The fixing method characterized by having.

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