JP2015191001A - Uv-shielding material and optical treatment method for substrate of display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide such a material that easily gives a light-shielding film in a portion where UV irradiation is undesirable upon subjecting an alignment layer or the like to an optical treatment, and that can be easily removed as required.SOLUTION: A UV-shielding material is provided, which comprises an aqueous solution containing a water-soluble or water-dispersible resin and a water-soluble dye, and which gives a light-shielding degree of 1 or more to UV rays at a wavelength in the range from 240 to 370 nm when a light-shielding film having a thickness of 5 μm or less is formed from the aqueous solution. An optical treatment method is provided for a photo-alignment treatment with UV rays on a substrate constituting a display device or an electronic apparatus; and in the method, the above water-soluble light-shielding material is applied and dried to selectively form a light-shielding film on a transistor, a wiring line, and/or a thin film already mounted on the substrate and to be protected against exposure to UV rays, and after carrying out the optical treatment using UV rays, the light-shielding film is removed from the substrate.

Description

  The present invention relates to a display device such as a liquid crystal device and an electronic apparatus. Specifically, the present invention relates to an ultraviolet light shielding material useful for performing optical processing using ultraviolet rays on a substrate having a portion that deteriorates when exposed to ultraviolet rays. In an optical processing method of a display device using the ultraviolet light shielding material, more specifically, in the process of irradiating a substrate having a photo-alignment film constituting the liquid crystal display device by irradiating the substrate with ultraviolet rays. The present invention provides a suitable light-shielding material for shielding a part deteriorated by ultraviolet rays of a substrate and a photo-alignment processing method using the same.

  In the liquid crystal device, the state of the molecular arrangement of the liquid crystal is changed by the action of an electric field or the like, and this change is optically used for display. In order to align the liquid crystal in a specific direction, alignment treatment is performed. However, the conventional rubbing method has a problem that fine dust and static electricity are generated. A photo-alignment process for performing the process has been proposed and implemented (Patent Documents 1 and 2).

  On the other hand, a thin film transistor substrate, a color filter substrate, or the like constituting a display device has a portion that is deteriorated by strong ultraviolet rays. For example, switching circuits arranged on each pixel of a thin film transistor substrate and logic circuits arranged outside an effective display area employed when using an oxide semiconductor such as low-temperature polysilicon or IGZO are irradiated with ultraviolet rays. If this happens, the element will deteriorate and cause malfunction. Further, it has been pointed out that the overcoat layer of the color filter substrate is deteriorated by ultraviolet rays, allowing moisture to enter the liquid crystal layer from the deteriorated overcoat layer, thereby impairing the reliability of the product. For this reason, in the photo-alignment processing step, processing is performed using a mask that shields a portion that is not desired to be irradiated with ultraviolet rays. However, it is difficult to irradiate the mask in close contact with the substrate to be processed, and there is inevitably a gap of 0.1 mm inside and outside, and ultraviolet rays wrap around where you do not want to irradiate ultraviolet rays, and the characteristics deteriorate. There was a problem that a problem occurred.

  Referring to FIG. 7, a mask 13 is used to shield a portion (light shielding portion) 12 to be shielded on the substrate 11 from ultraviolet rays UV. The mask 13 is placed above the substrate 11 and has a pattern that blocks ultraviolet rays. In general, quartz glass or Pyrex (registered trademark) glass is used, and the pattern is formed of metallic chromium. When such a mask is used, there arises a problem that a gap with the substrate becomes a problem, light wraps around, and a desired light shielding portion 12 cannot be increased. In particular, when the substrate is a fifth generation substrate (1100 × 1300 nm) or more, the mask also becomes large, and the deflection of the mask cannot be ignored, and the accuracy of the light shielding portion is deteriorated.

JP 2012-181447 A JP-A-10-221700

  An object of the present invention is to provide a display device and an electronic apparatus that prevent a problem in which ultraviolet rays wrap around a portion that is not desired to be exposed to ultraviolet rays by light shielding by a conventional mask in a process of optical processing such as photo-alignment treatment. It is to provide a new process and a material enabling it.

In order to solve the above problems, the present invention provides the following.
(1) In a process of irradiating a substrate that constitutes a display device or an electronic device by irradiating with ultraviolet rays, a constituent material or a component part that is deteriorated by ultraviolet rays is coated and shielded from light, and is water-soluble or A light-shielding film made of an aqueous solution containing a water-dispersible resin and a water-soluble dye, and a light-shielding film made of the aqueous solution having a thickness of 5 μm or less, shields against ultraviolet rays having a wavelength in the range of 240 to 370 nm. An ultraviolet light shielding material having a degree of 1 or more.

  (2) The water-soluble light-shielding material according to claim 1, further comprising a water-soluble ultraviolet absorber.

  (3) The water-soluble light-shielding material according to (1) or (2), further comprising an organic solvent.

  (4) Applying and drying the water-soluble light-shielding material described in the above (1) to (3) directly on the constituent material or component part that causes deterioration by ultraviolet rays of the substrate constituting the display device or electronic device. An optical processing method for a display device or an electronic apparatus, wherein a light shielding film is selectively formed and protected, and the light shielding film is removed from the substrate after the substrate is irradiated with ultraviolet rays.

  (5) The substrate constituting the display device or electronic device is a liquid crystal alignment film of a liquid crystal display device, and before the photo-alignment treatment using ultraviolet light for the liquid crystal alignment film, the substrate is subjected to ultraviolet light. Applying and drying the water-soluble light-shielding material directly on the transistor, wiring and / or thin film to prevent exposure, and selectively forming a light-shielding film for protection, and photo-alignment using ultraviolet light for the photo-alignment film The display device or electronic apparatus optical processing method according to (4), wherein the light-shielding film is removed from the substrate after the processing.

  (6) The optical processing method for a display device or electronic device according to (4) or (5), wherein the water-soluble light shielding material is applied by a printing method.

  According to the present invention, a portion of the substrate constituting the display device or the electronic device that is not desired to be irradiated with ultraviolet rays comprises a solution selected from the group consisting of a water-soluble resin, a water-soluble dye, and a water-soluble ultraviolet absorber, By applying a light shielding material with a light shielding degree of 1 or more when the light shielding film made of the solution is 5 μm or less, the portion coated with the light shielding material is observed to be deteriorated by ultraviolet rays even in the treatment process by ultraviolet irradiation. In addition, since ultraviolet rays can be cut with high accuracy, a highly reliable high-definition display device can be provided. The light-shielding film of the present invention and the optical processing method using the same are not limited to the liquid crystal display device, and are clearly useful for optical processing of a substrate of a display device or an electronic device including a portion deteriorated by the optical processing. is there.

It is a schematic top view which shows an example (TFT board | substrate for optical alignment material application | coating which comprises a liquid crystal display device) of the board | substrate which should apply | coat the light-shielding material of this invention. It is a schematic cross section along A-A 'of the substrate of FIG. It is a schematic cross section which shows an example of the TFT substrate after light-shielding material application | coating obtained in Example 1 of this invention. FIG. 4 is a schematic cross-sectional view along B-B ′ of the substrate of FIG. 3. It is a schematic plan view which shows the color filter substrate after light-shielding material application | coating obtained in Example 1 of this invention. FIG. 6 is a schematic cross-sectional view taken along C-C ′ of the color filter substrate of FIG. 5. It is a schematic cross section which shows the relationship between the conventional mask and a target board | substrate. It is a figure which shows the correspondence of the color of a UV label, and irradiation amount. It is a figure which shows the relationship between the condition of the UV label after ultraviolet irradiation, an irradiation amount, and a film thickness. It is a figure which shows the relationship between the color of a UV label, and irradiation amount. It is a figure which shows the condition (coat liquid: CLB4) of the UV label after ultraviolet irradiation. It is a figure which shows the condition (coat liquid: CLB5) of the UV label after ultraviolet irradiation. It is a graph which shows the relationship (coat liquid: CLB4) of a ultraviolet-ray transmittance and a film thickness. It is a graph which shows the relationship (coat liquid: CLB4) of a ultraviolet-ray transmittance and a film thickness.

(Prior art and the present invention)
The present invention solves the problems associated with the light-shielding technology using a mask described in the background art section, and according to the present invention, a process of irradiating a substrate constituting a display device or an electronic apparatus with ultraviolet irradiation. And a material for covering and shielding a component material or part portion that is deteriorated by ultraviolet rays, comprising an aqueous solution containing a water-soluble or water-dispersible resin and a water-soluble dye. Provided is an ultraviolet light shielding material characterized in that when the produced light shielding film has a thickness of 5 μm or less, the degree of light shielding with respect to ultraviolet rays having any wavelength within the range of wavelengths of 240 to 370 nm is 1 or more.

According to the present invention, by using a water-soluble resin and optionally a water-soluble ultraviolet absorber in a water-soluble resin in a water-soluble light-shielding material, the degree of light-shielding of ultraviolet rays is preferably 1 or more, preferably at a thickness of 5 μm or less of the light-shielding film. 1.3 or more, and further 2 or more. Here, the light shielding degree is synonymous with absorbance (Absorbance), and the light shielding degree is the absorbance of the medium at a desired wavelength (for example, a wavelength within a range of 240 to 370 nm such as 254 nm, 313 nm, 360 nm, etc.). = -Log (T / 100) [where T is transmittance (unit%)]. The method for measuring the degree of shading or absorbance can be measured with a spectrophotometer (for example, manufactured by Shimadzu Corporation). A spectral spectrum of a light shielding material coated and dried on a quartz substrate as a sample is taken. As a result, the transmittance T is 10% or less and the absorbance (light shielding degree) is 1 or more at a wavelength in the ultraviolet region (for example, 254 nm). It will be. In the measurement of the light shielding degree, the ultraviolet ray is not affected by the irradiation intensity when it is about 1000 mJ / cm ² which is usually used for light processing.

(Aqueous solvent)
The ultraviolet light shielding material of the present invention is an aqueous solution, and the solvent is aqueous, that is, only water or a mixed solvent of water and an organic solvent is used. Since there is a load as a working environment when using an organic solvent, only water is preferable as the solvent, and the ultraviolet light shielding material of the present invention is characterized by only water as a solvent. Also good. The mixing ratio of the organic solvent is less than 50% by mass, preferably 20% by mass or less, more preferably 10% by mass or less.

  Examples of organic solvents that can be used by mixing with water include alcohols, acetic acid, tetrahydrofuran (THF), 1,4-dioxane, acetone, acrylonitrile, dimethylformamide (DMF), pyridine, and N-methylpyrrolidone (NMP). be able to.

  Such a water-soluble solvent is not particularly limited, but from the viewpoint of influence on the environment, the water-soluble solvent is preferably an alcohol. Examples of alcohols that can be used in the present invention include methanol, ethanol, propanol, isopropyl alcohol, butanol, and ethylene glycol. In the present invention, among alcohols, isopropyl alcohol and ethanol can be suitably used from the viewpoint of the solubility of “solute” such as safety, volatile property, and water-soluble polymer. That is, in the present invention, a mixture of water and alcohol in various proportions can be suitably used as the solvent.

(Water-soluble resin)
The water-soluble light-shielding material of the present invention contains a water-soluble polymer (water-soluble resin) as a solid content in the aqueous solvent.

  The water-soluble polymer (water-soluble resin) serves as a base material for the light-shielding material, and can be dissolved in water or an organic solvent such as alcohol and applied and dried to form a film. , Not particularly limited, for example, polyethylene glycol, polyacrylic acid, methyl cellulose, ethyl cellulose, polyvinyl alcohol, polyvinyl pyrrolidone, polyglycerin, other starches, gum arabic, gelatin, methyl vinyl ether / maleic anhydride copolymer, sucrose octaacetate, Examples include ammonium alginate, sodium alginate, polyvinylamine polyethylene oxide, polystyrene sulfonic acid, and the like. These may be used alone or in combination.

  Further, in the present invention, the ultraviolet light shielding film is removed by washing with water after optical treatment such as photo-alignment treatment. If water washability is taken into consideration, polyethylene glycol can be used as a water-soluble resin. Preferably, the (average) degree of polymerization is preferably about 100 to 500, more preferably about 200 to 400, and particularly preferably about 250 to 300 (for example, 300).

  In the water-soluble light-shielding material of the present invention, the blending amount of the water-soluble polymer (water-soluble resin) is preferably 30% by mass to 70% by mass, and more preferably 30% by mass to 70% by mass based on the solid content. The solid content of the ultraviolet light-shielding material of the present invention is typically a water-soluble polymer (water-soluble resin), a water-soluble dye, and a water-soluble ultraviolet absorber that is optionally blended, based on the total of these. It can be.

(Water-soluble dye)
In the water-soluble light-shielding material of the present invention, a water-soluble dye is used in combination with the water-soluble resin described above. The pigment may contaminate the substrate of the display device or the electronic device, and the organic solvent-based dye has an inconvenience that an explosion-proof device is required in the workplace. That is, the water-soluble light-shielding material of the present invention is characterized by not using a pigment and an organic solvent-based dye, but may contain a pigment and an organic solvent-based dye as long as the present invention is not inhibited. The blending amount is at most less than 5% by mass and further 2% by mass or less based on the solid content.

  Water-soluble dyes include azo dyes, acridine dyes, azine dyes, anthraquinone dyes, indigoid dyes, oxyketone dyes, quinophthalone dyes, quinoline dyes, quinoneimine dyes, stilbene dyes, triphenylmethane dyes, hydrazone dyes, phthalocyanine dyes, polymethine dyes, Known dyes such as pyrazone dyes can be used, and azo dyes are preferred.

  In the water-soluble light-shielding material of the present invention, the blending amount of the water-soluble dye is preferably 30% by mass to 70% by mass, more preferably 30% by mass to 70% by mass based on the solid content.

(Water-soluble UV absorber)
Examples of water-soluble ultraviolet absorbers used in combination with the above-described water-soluble resins as needed include 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2tetrahydroxybenzophenone, tilherperidine, diethanolamine p-methoxycinna. Mate, sodium 2-hydroxy-4-methoxybenzophenone-5-sulfonate, and the like can be used, and 2- (2′-hydroxy-5′-methylphenyl) benzotriazole is preferable.

  The blending amount of the water-soluble UV absorber arbitrarily blended in the water-soluble light-shielding material of the present invention is preferably 0.001% by mass to 1.00% by mass, and 0.01% by mass to 0% based on the solid content. More preferable is 5% by mass.

(Light irradiation treatment process and method)
According to the present invention, in a process of manufacturing a display device or an electronic device, a function addition processing step to a substrate by irradiating ultraviolet rays is performed. Select directly on the part where the function deteriorates by irradiating with ultraviolet rays on the substrate using an aqueous solution containing a water-soluble resin, a water-soluble dye, and optionally a water-soluble UV absorber. A function-adding treatment method is provided, in which a protective film is formed and a light-shielding material having a light-shielding degree of 2 or more is applied when the light-shielding film made of the aqueous solution has a thickness of 5 μm or less. The

  In the process of irradiating a substrate constituting a display device or electronic device with ultraviolet rays when manufacturing the display device or electronic device, the present invention does not use a conventional light-shielding mask but wants to irradiate with ultraviolet rays. By directly applying the following light-shielding material to the unexposed part of the substrate, the harm of ultraviolet irradiation is prevented with high accuracy.

  The light shielding material is composed of an aqueous solution containing a water-soluble resin, a water-soluble dye, and optionally a water-soluble ultraviolet absorber, and the light shielding film made of the solution has a light shielding degree of 1 or more when the thickness is 5 μm or less. It is characterized by that.

  The direct coating method of these light-shielding materials is preferably a printing method because it is applied to a portion that is not desired to be irradiated with ultraviolet rays, and a method such as intaglio printing, letterpress printing, ink jet printing, screen printing, and stamping can be used. By creating the pattern of the light shielding part by direct printing, the pattern correction design considering the deflection of the conventional light shielding mask is not required.

After coating at a solid content concentration of 11.2% with a film thickness of 13.7 μm and baking and drying at 80 ° C. for 3 minutes, the solvent evaporates and a film thickness of about 1.1 μm can be obtained. It has been confirmed that this light-shielding film can shield light even when exposed to 1000 mJ / cm ² . On the other hand, after coating at a solid content concentration of 16% and a film thickness of 30 μm and baking and drying at 80 ° C. for 3 minutes, the solvent evaporates and a film thickness of about 4.1 μm can be obtained. This light-shielding film has been confirmed to shield light even when irradiated with 2000 μmJ / cm ² .

  Furthermore, the light-shielding film thus prepared could be completely removed from the substrate without residue by washing with water. That is, it was confirmed that the light-shielding film can be peeled in a few seconds by shower cleaning or ultrasonic cleaning.

  In particular, the present invention relates to a transistor, wiring, and thin film (overflow of color filters) that should be prevented from being exposed to ultraviolet light when the liquid crystal alignment film is subjected to photo-alignment treatment using ultraviolet light on a substrate having a liquid crystal alignment film of a liquid crystal display device. Particularly useful for protecting components such as coats). After applying a water-soluble light-shielding material directly on components such as transistors, wiring, and thin films to form a light-shielding film by protecting the part, and then performing photo-alignment treatment with ultraviolet rays. By removing the light shielding film, it is possible to prevent light from wrapping around in the case of a conventional mask. An exposure method may be used to form a light-shielding film on a portion such as a transistor, wiring, or thin film that should be prevented from being exposed to ultraviolet rays, but an exposure process for forming the light-shielding film by using a printing method is also possible. It becomes unnecessary, and the adverse effect on the alignment film can also be prevented.

  Optical processing such as optical alignment processing for the substrate of the display device can be a known optical processing.

<Measurement of extinction coefficient>
Absorbance (abs): The absorbance of the sample solution at a wavelength of 254 nm was measured with an ultraviolet spectrophotometer (Shimadzu UV-3150).

  Absorption coefficient: The absorption coefficient of the sample solution was determined from the measured absorbance.

(Example 1)
1 to 6, one of the two substrates constituting the liquid crystal display device is a TFT substrate 1 using low-temperature polysilicon, and the other is a color filter substrate 1 ′. The TFT substrate 1 is formed with the pixels 2 formed in the effective display area, the logic circuit forming portion 3, and the color filter substrate 1 ′ with the color filter forming portion 6. A photo-alignment material RN-2467 (trade name: manufactured by Nissan Chemical Co., Ltd.) is printed on the two substrates 1 and 1 'by a flexographic printing method in a pattern that covers the effective display area and is in contact with the peripheral sealing material. The photo-alignment film 4 having a thickness of 1000 mm was formed by baking in an oven.

  In addition, the mass ratio is 10% of polyvinyl alcohol 500 (Kanto Chemical), water-soluble dye black ink KAYACION BLACK P-GS (Nippon Kayaku) 6%, UV absorber Adekastab LA-46 (Adeka) 0.1%, isopropyl alcohol A coating solution comprising 5% and water 78.9% and having a solid concentration of 16% was prepared.

  The coating solution obtained as described above is applied so as to completely cover the logic circuit part 3 (FIGS. 1 and 2) formed outside the effective display area of the TFT substrate, dried at 80 ° C. for 3 minutes, A light-shielding film 5 having a thickness of 1 μm was prepared (FIGS. 3 and 4).

  In addition, as the light transmittance (light shielding degree) of the light shielding film 5, a material formed by applying the coating liquid onto the quartz substrate and drying it in the same manner is used. When the spectrum was taken and the transmittance of ultraviolet rays was measured, the ultraviolet transmittance at 254 nm was 1% or less. That is, the transmittance T was 1% or less at a wavelength in the UV region (254 nm), and the absorbance (light shielding degree) was 2 or more.

  Similarly, on the color filter substrate 1 ′, a light shielding film 5 similar to that formed on the TFT substrate was formed in a portion where the photo-alignment material 4 was not applied (FIGS. 5 and 6).

The two substrates 1 and 1 ′ thus treated were irradiated with ultraviolet rays having a main wavelength of 254 nm from a high pressure mercury lamp lamp through a wire grid polarizing plate having a wavelength of at least 254 nm as polarized light. The irradiation amount was 1000 mJ / cm ² .

  Thereafter, when the two substrates were allowed to flow for 30 seconds in a pure water shower, the light shielding film 5 was dissolved in pure water and could be completely removed.

  Through the subsequent steps, a liquid crystal display device composed of the two substrates 1 and 1 'was prepared and the display characteristics were evaluated.

  It was confirmed that the liquid crystal molecules are aligned in the polarization direction of the photo-alignment film and operate normally without any display malfunction.

  Further, when the liquid crystal display device thus prepared was subjected to a high temperature and high humidity test at 80 ° C. and 90%, it could withstand the test for 1000 hours. Thereby, it was confirmed that the life of the apparatus of this example was extended. At this time, no problem occurred in the light shielding mask.

(Example 2)
In the same manner as in Example 1, polyvinyl alcohol 500 (Kanto Chemical), water-soluble dye black ink KAYACION BLACK P-GS (Nippon Kayaku), ultraviolet absorber Adeka Stub LA-46 (Adeka), isopropyl alcohol, and water are listed in Table 1. The ultraviolet light shielding coating agent CLB2 containing the mass ratio and the solid content concentration described in 1 was prepared. CLB3 in Table 1 is that of Example 1.

  First, the UV irradiation amount was changed, the state of the UV label was confirmed, and the UV transmission amount of the light shielding film was measured.

  Using a cover glass (MATUNAMI copy) with dimensions of 30 x 40 mm and thickness of 0.12-0.17 mm, this cover glass is not coated with an ultraviolet light shielding coating agent (unprocessed product), and an ultraviolet light shielding coating agent Mask Liquid CLB2 A processed product in which (solid content concentration 11.2%, viscosity 17.2 cp (15 ° C.), pH 8.1) and Mask Liquid CLB3 (solid content concentration 16.0%) were applied to a predetermined film thickness was prepared.

  When an ultraviolet light shielding coating agent is applied to the cover glass, a bar coater (manufactured by Tester Sangyo Co., Ltd., product name: SA-203) is applied to a bar coater (manufactured by Tester Sangyo Co., Ltd.) # 6 (film thickness 13.72), # 9 ( Using a film thickness of 20.61 μm) and # 13 (film thickness of 29.77 μm), coating and drying were performed under the following conditions.

    The cover glass not coated with the ultraviolet cut coating agent and the coated cover glass were irradiated with ultraviolet light having a wavelength of 254 nm for a certain period of time using a UV lamp (As One SLUV-4: wavelength 254 nm) (see Table 3).

At this time, a commercially available “UV label” (UV-H manufactured by NOF Corporation, ultra-high sensitivity (0 to 2000 mj / cm ² )) was used to measure the amount of ultraviolet light transmitted through the test product. The relationship between the color of the UV label and the dose at this time is shown in FIG. 8 (hereinafter, the color of the UV label shown in FIGS. 8 to 12 is monochrome display, but is actually lightly colored). Moreover, the state of the UV label after ultraviolet irradiation is shown in FIG. Regarding the details of the relationship between the color of the UV label and the irradiation amount, the following URL (Nippon Giken Kogyo UV Indicator UV Label site) can be referred to as necessary.

URL: http://ondolab.com/product/seal/thermolabel/uv.html
Table 3 shows the obtained test results (relationship between the film thickness and the UV irradiation amount).

(Examples 3 to 4)
In the same manner as in Example 1, polyvinyl alcohol 500 (Kanto Chemical), water-soluble dye black ink KAYACION BLACK P-GS (Nippon Kayaku), ultraviolet absorber Adeka Stub LA-46 (Adeka), isopropyl alcohol, and water are listed in Table 1. Ultraviolet light shielding coating agents CLB4 and CLB5 containing the mass ratio and the solid content concentration described in the above were prepared.

  Example 2 using Mask Liquid CLB4: (form concentration 20%) and Mask Liquid CLB5 (solid content concentration 30% (thickening type)) as an ultraviolet light shielding coating agent (UV-H manufactured by NOF Corporation) The test was conducted in the same manner as in Example 2 except that the coating was applied under the conditions of film thicknesses of 0.5 μm, 0.7 μm, and 1.0 μm and dried (80 ° C., 3 minutes).

  The cover glass coated with the ultraviolet cut coating agent was irradiated with ultraviolet rays having a wavelength of 254 nm for a certain time using a UV lamp, and the amount of ultraviolet rays transmitted through the test article was measured using the UV label at this time. FIG. 10 shows the relationship between the color of the UV label and the irradiation amount when the ultraviolet transmittance is calculated from the irradiated ultraviolet ray amount and the transmitted ultraviolet ray amount.

    FIG. 11 (Status of UV label after UV irradiation; CLB4) and FIG. 12 (Status of UV label after UV irradiation; CLB5) for each coating solution obtained above after UV irradiation are shown. Show.

    The amount of transmission was visually confirmed by the change in the color of the label. Based on this result, the ultraviolet transmittance of the light shielding film was calculated, and the results are shown in FIG. 13 and FIG.

DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Pixel formed in effective display area 3 Logic circuit formation part 4 Photo-alignment material 5 Light-shielding film 6 Color filter formation part

Claims (6)

  In the process of irradiating the substrate constituting the display device by irradiating the substrate with ultraviolet rays, the component material or component part that is deteriorated by the ultraviolet rays is coated and shielded from light, and includes a water-soluble or water-dispersible resin, It consists of an aqueous solution containing a water-soluble dye, and when the light-shielding film made of the aqueous solution has a thickness of 5 μm or less, the light-shielding degree with respect to ultraviolet rays having any wavelength within the wavelength range of 240 to 370 nm is 1 or more. An ultraviolet light shielding material characterized by that.   The water-soluble light-shielding material according to claim 1, further comprising a water-soluble ultraviolet absorber.   The water-soluble light-shielding material according to claim 1 or 2, further comprising an organic solvent.   The water-soluble light-shielding material according to any one of claims 1 to 3 is applied and dried directly on a constituent material or component part that is deteriorated by ultraviolet rays of a substrate constituting a display device or an electronic device, thereby selectively forming a light-shielding film. An optical processing method for a display device or an electronic apparatus, comprising: forming and protecting the substrate; and irradiating the substrate with ultraviolet rays, and then removing the light-shielding film from the substrate.   The substrate constituting the display device or the electronic device is a liquid crystal alignment film of a liquid crystal display device, and exposure to ultraviolet rays included in the substrate is prevented before the liquid crystal alignment process using ultraviolet rays for the liquid crystal alignment film. The water-soluble light-shielding material is applied and dried directly on the power transistor, wiring and / or thin film to selectively form and protect the light-shielding film, and the photo-alignment film is subjected to photo-alignment treatment using ultraviolet rays. 5. The optical processing method according to claim 4, wherein the light shielding film is removed from the substrate.   6. The optical processing method for a display device or an electronic apparatus according to claim 4, wherein the water-soluble light shielding material is applied by a printing method.