JP2015185207A - Lighting fixture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a lighting fixture having a high light distribution control property.SOLUTION: A lighting fixture is provided which includes: a light source for emitting light; an electrodeposition element including a plurality of pixels capable of switching between a transparent state and a mirror state independently, and arranged on an optical path of the light emitted from the light source so that a normal direction of a pixel surface and an optical axis direction of incident light become non-parallel; a first optical system where light which has transmitted the pixels of the electrodeposition element in a transparent state enters and which emits first illumination light; and a second optical system where light reflected at the pixels of the electrodeposition element in a mirror state enters and which emits second illumination light.

Description

  The present invention relates to a lamp provided with an electrodeposition element.

  An invention of a vehicle lighting device that efficiently notifies the driver of the presence of an illumination target such as a pedestrian has been made (see Patent Document 1).

  The headlamp used in the vehicle illumination device described in Patent Document 1 is configured using, for example, a DMD (Digital Micromirror Device). The DMD is a device that includes a plurality of micromirrors and can control the rotation of each micromirror. Since the rotation of the micromirror is performed using mechanical means, the headlamp described in Patent Document 1 has problems such as weakness against vibration, low durability, and difficulty in downsizing and thinning. . Further, since the headlamp described in Patent Document 1 uses a complete reflection optical system, the light loss due to reflection and the light loss due to the aperture ratio are large. In the headlamp described in Patent Document 1, it is considered that the substantial light use efficiency is less than 70%.

  An electrochromic element is known as a non-light-emitting element utilizing a color change phenomenon of a substance caused by an electrochemical reversible reaction (electrolytic oxidation-reduction reaction) by applying a voltage.

  Among electrochromic materials (materials that undergo an electrochemical oxidation or reduction reaction when a voltage is applied, thereby causing a color change such as coloring or decoloring), a part of the material is caused by oxidation or reduction reaction, for example, A material deposited or deposited on the electrode (electrodeposition) or disappears from the electrode is called an electrodeposition material. An element using an electrodeposition material is called an electrodeposition element.

  An invention of an electrodeposition element having a high-quality mirror surface state is disclosed (see Patent Document 2). The electrodeposition element includes an electrolyte layer containing, for example, a silver complex, and realizes a mirror state by applying a voltage to deposit silver on the electrode. The electrolyte layer further includes, for example, copper. The electrodeposition element realizes a transparent state when no voltage is applied.

JP 2008-120162 A JP 2012-181389 A

  The objective of this invention is providing the lamp provided with high light distribution controllability.

  According to one aspect of the present invention, a light source that emits light and a plurality of pixels that can be switched between a transparent state and a mirror state independently, and a normal direction of a pixel surface on an optical path of the light emitted from the light source And the electrodeposition element arranged so that the optical axis direction of the incident light is non-parallel, and the light transmitted through the pixels in the transparent state of the electrodeposition element are incident, and the first illumination light is emitted. There is provided a lamp having a first optical system that performs the above operation and a second optical system that receives the light reflected by the pixel in the mirror state of the electrodeposition element and emits the second illumination light.

  ADVANTAGE OF THE INVENTION According to this invention, a lamp provided with high light distribution controllability can be provided.

1A is a schematic cross-sectional view showing the electrodeposition element 2, FIG. 1B is a schematic plan view showing the upper substrate 10a, and FIG. 1C is a schematic plan view showing the lower substrate 10b. FIG. 1D is a schematic plan view showing the electrodeposition element 2. FIG. 2 is a schematic view showing an arrangement mode of the electrodeposition element 2 at the time of measuring optical characteristics. 3A and 3B are graphs showing the transmittance characteristics and the reflectance characteristics of the electrodeposition element 2, respectively. FIG. 4A is a schematic view showing the lamp according to the first embodiment, and FIG. 4B is a photograph showing the experimental optical system actually assembled. 5A and 5B are schematic diagrams illustrating examples of light distribution patterns obtained using the lamp according to the embodiment. FIG. 6 is a schematic view showing a lamp according to the second embodiment.

  FIG. 1A is a schematic cross-sectional view showing an electrodeposition element 2 used in a lamp according to an embodiment.

  The electrodeposition element 2 includes, for example, an upper substrate (segment substrate) 10a, a lower substrate (common substrate) 10b, and an electrolyte layer 14 disposed between the substrates 10a and 10b. It is comprised including.

  The upper substrate 10a and the lower substrate 10b are respectively an upper transparent substrate 11a, a lower transparent substrate 11b, an upper transparent electrode (segment electrode) 12a formed on each of the transparent substrates 11a and 11b, and a lower transparent electrode (common Electrode) 12b. The transparent electrodes 12a and 12b are electrodes having a smooth surface. The upper transparent substrate 11a and the lower transparent substrate 11b are, for example, glass substrates, and the upper transparent electrode 12a and the lower transparent electrode 12b are made of, for example, ITO.

The electrolyte layer 14 is disposed in an inner region of the seal portion 13 between the upper substrate 10a and the lower substrate 10b, and includes an electrodeposition material (for example, AgNO ₃ ) containing silver.

FIG. 1B shows a schematic plan view of the upper substrate 10a. The upper transparent electrode 12a is a patterning electrode formed on the upper transparent substrate 11a. Upper transparent electrode 12a are mutually made of electrically independent eight transparent electrodes _12a 1 _{~12a 8.} Electrode width of the respective transparent electrodes _12a 1 _{~12a 8} is, for example, 1.5 mm, the distance between the transparent electrodes _12a 1 _{~12a 8} is, for example, 50 [mu] m. The electrode width and the distance between the electrodes are not limited to this.

  FIG. 1C shows a schematic plan view of the lower substrate 10b. The lower transparent electrode 12b is formed on the lower transparent substrate 11b and has a long electrode pattern in one direction. The electrode width is 1.5 mm, for example.

FIG. 1D shows a schematic plan view of the electrodeposition element 2. Substrate 10a, when viewed from 10b the normal direction, the pixel is defined in a region where the electrode _12a 1 _{~12a 8} and the electrode 12b overlap. In this figure, the pixels are shown with diagonal lines. The electrodeposition element 2 includes eight pixels arranged at a distance of 50 μm between pixels in one direction. Each pixel has a square shape (dot shape) of 1.5 mm × 1.5 mm. The pixels are arranged in the inner area of the seal portion 13.

  The electrodeposition element 2 can electrically switch between a transparent state and a non-transparent state (mirror state) of each pixel by a DC voltage applied to the electrodes 12a and 12b.

  When no voltage is applied, light incident on the electrodeposition element 2 is transmitted therethrough.

  When the voltage is applied, for example, when the lower transparent electrode 12b is grounded and a DC voltage of −2.5 V is applied to the upper transparent electrode 12a, the silver ions contained in the electrolyte layer 14 are reduced, and the upper transparent electrode 12a ( In the vicinity of the electrode on the negative voltage side), it changes to metallic silver and is deposited and deposited on the electrode 12a to form a silver thin film. The silver thin film acts as a mirror surface and regularly reflects light incident on the electrodeposition element 2 (pixel). Although depending on the area of the pixel and the material used, for example, a silver thin film can be formed by providing a potential difference of 1.5 V to 8 V between the upper transparent electrode 12a and the lower transparent electrode 12b.

  The silver thin film disappears from the upper transparent electrode 12a by turning off the voltage (0 V or an open state) or applying a reverse bias (for example, +1 V). When the reverse bias is applied, silver can disappear more quickly and the electrodeposition element 2 can be made transparent.

  The electrodeposition element 2 can be used as a mirror device that realizes a transparent state and a mirror state (reflection state) of a pixel position interchangeably by applying and applying a DC voltage.

A voltage can be applied independently to each pixel (each electrode 12a _{1 to} 12a ₈ ) of the electrodeposition element 2. Therefore, the electrodeposition element 2 can arbitrarily switch between the transparent state and the mirror state in units of pixels.

  The electrodeposition element 2 was produced as follows, for example.

  A pair of glass substrates with transparent electrode patterns (substrates 10a and 10b) is prepared. For the transparent electrode on the glass substrate, a smooth transparent conductive film, for example, an ITO film is used. The transparent conductive film can be formed by sputtering, CVD, vapor deposition, or the like. Further, a reflective film such as a metal thin film (Al, Ag, etc.) or an optical multilayer film may be formed on a part of the substrate on one side by vapor deposition, sputtering, CVD, plating, or the like. It may be formed on the same side as the ITO film or on the opposite side (outside of the cell). It is desirable to form a pattern on the lower part of the eight square (dot) pixels in FIG. 1D. Examples of the pattern forming method include mask deposition (sputtering) using photolithography, a SUS mask, etc., and electrolytic plating.

  A pair of glass substrates was placed into a cell by placing the ITO films so as to face each other.

For example, a gap control agent having a diameter of 20 μm to several hundred μm, and in the embodiment, a 500 μm diameter is spread on one of a pair of substrates so as to be 1 to 3 / mm ² as an example. Depending on the diameter of the gap control agent, it is desirable to use a spray amount that does not affect the function of the lamp. In addition, in the electrodeposition element 2 used for the lamp according to the embodiment, even if there is some gap unevenness, the influence is small, and therefore the importance of the application amount of the gap control agent is not high. In the embodiment, gap control using a gap control agent is performed, but it is also possible to perform gap control using protrusions such as ribs. Further, in the case of a small cell, a gap may be controlled by arranging a film-like spacer having a predetermined thickness at the seal portion.

  A main seal pattern was formed on the other of the pair of substrates. In the examples, an ultraviolet ray + thermosetting type sealing material was used. As the sealing material, a photocuring type or a thermosetting type may be used. The gap control agent spraying and the main seal pattern may be formed on the same substrate side.

  Next, an electrolytic solution containing an electrodeposition material was sealed between a pair of substrates.

  In the examples, the ODF method was used. An appropriate amount of an electrolytic solution containing an electrodeposition material is dropped on one of the pair of substrates. As a dropping method, various printing methods including a dispenser and an ink jet can be applied. Here, a dispenser was used. In addition, it is preferable that the above-mentioned sealing material is a sealing material (sealing material that does not corrode) that can withstand the electrolytic solution used.

  In a vacuum, a pair of substrates were superposed. You may carry out in air | atmosphere or nitrogen atmosphere.

The sealing material was formed by irradiating the sealing material with ultraviolet rays with an energy density of, for example, 6 J / cm ² to cure the sealing material. A SUS mask was used so that only the sealing material was irradiated with ultraviolet rays.

Electrodeposition materials containing electrodeposition materials include electrodeposition materials (AgNO ₃ etc.), electrolytes (TBABr etc.), mediators (CuCl ₂ etc.), supporting electrolytes (LiBr etc.), solvents (DMSO; dimethyl sulfoxide etc.), gels It is comprised by the polymer for conversion (PVB; polyvinyl butyral etc.) etc. In Examples, 50 mM AgNO ₃ was added as an electrodeposition material, DMBr was added as a 250 mM supporting electrolyte, and 10 mM CuCl ₂ was added as a mediator in DMSO as a solvent. Then, 10 wt% of PVB was added as a host polymer to form a gel (jelly-like) electrolyte layer 14.

As the electrodeposition material, for example, AgNO ₃ containing silver, AgClO ₄ , AgBr, or the like can be used.

The supporting electrolyte is not limited as long as it promotes the redox reaction or the like of the electrodeposition material. For example, lithium salt (LiCl, LiBr, LiI, LiBF ₄ , LiClO ₄ etc.), potassium salt (KCl, KBr, KI) Etc.) and sodium salts (NaCl, NaBr, NaI, etc.) can be preferably used. The concentration of the supporting electrolyte is preferably 10 mM or more and 1 M or less, but is not particularly limited.

  The solvent is not limited as long as it can stably hold the electrodeposition material and the like. Polar solvents such as water and propylene carbonate, non-polar organic solvents, ionic liquids, ionic conductive polymers, polymer electrolytes, and the like can be used. Specifically, in addition to DMSO, propylene carbonate, N, N-dimethylformamide, tetrahydrofuran, acetonitrile, polyvinyl sulfate, polystyrene sulfonic acid, polyacrylic acid, and the like can be suitably used.

When the produced electrodeposition element 2 was observed, it was almost transparent in the initial state. Although slightly visible even yellowish, this is believed to be the color of the CuCl ₂ is a mediator. By using a different material as the mediator, or by reducing the cell thickness, the colorless and transparent electrolyte layer 14 can be obtained.

  The inventor of the present application measured the optical characteristics (transmittance characteristics and reflectance characteristics) of the produced electrodeposition element 2.

  In FIG. 2, the arrangement | positioning aspect of the electrodeposition element 2 at the time of a measurement is shown. In the measurement, light was incident from the substrate normal direction on the substrate 10a side. Further, a DC voltage was applied so that the substrate 10a side was a negative voltage side. That is, the measurement light enters the electrodeposition element 2 from the side of the substrate on which silver is deposited.

  3A and 3B are graphs showing the transmittance characteristics and the reflectance characteristics of the electrodeposition element 2, respectively. The horizontal axis of the graph of FIG. 3A represents the wavelength in the unit “nm”, and the vertical axis represents the transmittance in “%”. In addition, the horizontal axis of the graph of FIG. 3B represents the wavelength in the unit “nm”, and the vertical axis represents the reflectance in “%”. In each graph, the curve indicated by the solid line indicates the transmittance and the reflectance when no voltage is applied, and the curve indicated by the dotted line indicates the transmittance and reflectance when a DC voltage of −2.5 V is applied to the substrate 10a. The transmittance and reflectance are values when the amount of light transmission in air is 100%. In addition, when the electrodeposition element 2 was observed at the time of voltage application, it was confirmed that mirror reflection was shown.

Reference is made to the curve indicated by the solid line in FIG. It can be seen that the transmittance when no voltage is applied has some wavelength dependence, and that the transmittance is low when the wavelength is short, but on average 80% or more of the light is transmitted. Further, it is understood from the transmittance curve that the element is yellowed when no voltage is applied. Since it seems to be the color of CuCl ₂ that is a mediator, it can be improved by reducing the cell thickness, for example. Moreover, it is also possible to achieve flat transmittance by using different materials.

  Referring to the curve shown by the dotted line in FIG. 3A, it can be seen that even when a voltage is applied (mirror surface state), light of about 20% or less is transmitted (light is lost) regardless of the wavelength. This point can be improved, for example, by examining the driving conditions and the configuration of the electrolyte layer.

  Reference is made to the curve indicated by the dotted line in FIG. 3B. It can be seen that when the voltage is applied (mirror state), a high reflectance over a wide wavelength region, that is, an average reflectance of 80% or more can be obtained.

  Referring to the curve shown by the solid line in FIG. 3B, it can be seen that even when no voltage is applied, light of about 10% to over 20% is reflected by surface reflection or the like regardless of the wavelength. This reflection can be kept low, for example, by forming an antireflection film.

  FIG. 4A is a schematic diagram showing a lamp (vehicle headlamp) according to the first embodiment. The lamp according to the first embodiment includes a light source 1, an electrodeposition element 2, a reflecting plate 3, a shade 4, and projector lenses 5a and 5b. A low beam optical system is configured including the reflector 3, the shade 4, and the lens 5b, and a high beam optical system is formed including the lens 5a. For example, the upward direction in the figure corresponds to the vertically upward direction, and the downward direction corresponds to the vertically downward direction. Further, the direction perpendicular to the plane of the drawing and the left direction in FIG.

  Light is emitted from one light source 1. The optical axis direction of the emitted light is, for example, the left-right direction in the figure. The light emitted from the light source 1 enters the electrodeposition element 2.

The electrodeposition element 2 includes eight square (dot) pixels arranged along one direction, and can be arbitrarily switched between a transparent state and a mirror state in units of pixels (see FIG. 1D). Here, the electrodeposition element 2 has eight square (dot-like) pixels on the upper side and a reflective surface deposited on the lower side. The electrodeposition element 2 is configured so that the light emitted from the light source 1 enters the arrangement position of the eight pixels, the normal direction of the pixel surface (electrode surface, substrate surface), and the optical axis of the incident light. It arrange | positions so that a direction may become non-parallel. With different application aspects of a voltage applied between the segment electrode 12a ₁ ~12a ₈ and the common electrode 12b, by switching the transparent state and the mirror state independently for each pixel, transmissive or reflection of incident light in units of pixels ( Transmitted light or reflected light).

Incidentally, electrodeposition element 2, the light emitted from the light source 1 is arranged to be incident, for example, from the segment electrode 12a ₁ ~12a ₈ side (the substrate side to precipitate silver). You may arrange | position so that it may inject from the common electrode 12b side (the board | substrate side which does not deposit silver). Write is incident from the segment electrode 12a ₁ ~12a ₈ side can be increased light reflectance in electrodeposition element 2.

  The light transmitted through the transparent pixel of the electrodeposition element 2 enters the high beam optical system, and the light reflected by the mirror pixel enters the low beam optical system. The high beam optical system and the low beam optical system each emit illumination light. A plurality of light distribution patterns are formed using illumination light emitted from both optical systems.

  Specifically, the light emitted from the light source 1 and transmitted through the transparent pixel of the electrodeposition element 2 is further transmitted through the lens 5a, and is directed to the front of the vehicle (left direction in the drawing) as illumination light (high beam). Emitted. The lens 5a reversely projects an image at the position of the electrodeposition element 2 (pixel formation position). For this reason, it is desirable that the eight pixels have a size that fits in the size of the focal portion of the lens 5a.

  The light emitted from the light source 1 and reflected by the pixels in the mirror state of the electrodeposition element 2 and the deposited reflecting surface is further reflected by, for example, a flat plate mirror disposed facing the pixels of the electrodeposition element 2. Reflected by a certain reflector 3. The pixels of the electrodeposition element 2 and the deposited reflecting surface are arranged so as to be inclined from the direction perpendicular to the optical axis of the light source 1 so that the reflected light is deviated from the light source 1 and directed toward the reflecting plate 3. The light reflected by the reflecting plate 3 enters the lens 5b, passes through the lens 5b, and is emitted forward of the vehicle as illumination light (low beam). A shade 4 is disposed on the optical path between the reflector 3 and the lens 5b. The shade 4 includes a light-shielding portion having a predetermined shape (cut-off pattern), and forms a cut-off pattern (cut-off line) of illumination light emitted from the lens 5b. The lens 5b reversely projects the image at the position of the shade 4 (the position of the light shielding portion).

  FIG. 4B shows a photograph of an experimental optical system actually assembled (an optical system corresponding to the lamp according to the first example).

  5A and 5B show examples of light distribution patterns obtained using the lamp (vehicle headlamp) according to the first embodiment. In both figures, the vehicle situation visually recognized from the driver's seat of the automobile and the light distribution pattern (projection state) of the headlamp are schematically shown.

  FIG. 5A is a light distribution pattern when all the pixels of the electrodeposition element 2 are in a mirror state. When all the pixels are in the mirror state, almost all the light passes through the low beam optical system to form the light distribution pattern shown in the figure.

FIG. 5B shows a light distribution pattern when some of the pixels of the electrodeposition element 2 are in a transparent state and the remaining pixels are in a mirror state. Specifically, for example, in FIG. 1D, a negative voltage is applied to the segment electrodes 12a ₂ , 12a ₃ , 12a ₄ , 12a ₆ and a potential difference is provided between the common electrode 12b. In this case, pixels serving as transmission regions are formed corresponding to the electrodes 12a ₁ , 12a ₅ , 12a ₇ , 12a ₈ , and pixels serving as reflection regions corresponding to the electrodes 12a ₂ , 12a ₃ , 12a ₄ , 12a ₆ are formed. It is formed. The light incident on the pixel that becomes the transmission region passes through the high beam optical system, and the light that enters the pixel that becomes the reflection region forms the light distribution pattern shown in the figure via the low beam optical system.

In the light distribution pattern of FIG. 5B, a region (light distribution region) in which light transmitted through the pixels corresponding to the electrodes 12a ₁ , 12a ₅ , 12a ₇ , and 12a ₈ is illuminated as illumination light (light distribution region) is added to the light distribution pattern of FIG. Yes. The added light distribution area reflects the position and shape of the pixel that becomes the transmission area. That is, the illumination light emitted from the high beam optical system illuminates a region having a position and a shape corresponding to the pixel serving as a transmission region. On the other hand, the illumination light emitted from the low beam optical system illuminates a certain area. This is because the lens 5 a projects an image of the pixel formation position of the electrodeposition element 2, and the lens 5 b projects an image of the position of the light shielding portion of the shade 4. Lamp according to the first embodiment, by changing the voltage applied mode of the segment electrodes 12a ₁ ~12a _8, it is possible to change the high beam light distribution area (projected image pattern).

The added light distribution region (voltage application mode to the segment electrodes 12a ₁ ~12a _8), for example may be determined according to the vehicle condition such as a position of the forward vehicle or an oncoming vehicle. In the example shown in FIG. 5B, the pixel that becomes the transmission region is selected so that the far region at the position where there is no forward traveling vehicle or oncoming vehicle is illuminated. The light distribution pattern of FIG. 5B enables confirmation of a distant state in the front direction and a roadside state, for example. This is an example of a light distribution pattern that secures a good field of view, improves driving safety, and realizes a state in which a driver of a forward traveling vehicle or an oncoming vehicle is not dazzled.

  The driver determines the light distribution area to be added (selection of a pixel to be a transmission area), for example. A sensor that senses the position of a forward vehicle or oncoming vehicle is mounted on the vehicle, and the pixel state (transparent state / mirror state) of the electrodeposition element 2 is electrically controlled based on information obtained by the sensor. You may perform light distribution control automatically using a control apparatus. In this case, a light distribution state that realizes high safety can always be obtained.

  Here, a low beam is formed regardless of the pixel state of the electrodeposition element 2 because the deposited reflecting surface is a region that always reflects. However, the present invention is not limited thereto, and the pixel electrodes may be arranged on the entire surface of the electrodeposition element 2.

  The lamp according to the first embodiment is a variable light distribution headlight (Adaptive Driving Beam; ADB) having a high light distribution controllability capable of forming a light distribution pattern according to a vehicle situation, for example. A high level of safety is achieved for all drivers of the host vehicle, forward vehicles, and oncoming vehicles.

  Further, ADB can be realized without using a movable part (mechanical means), and for example, it is possible to reduce the size, thickness, and weight. Furthermore, a highly reliable ADB that is resistant to vibration can be realized at low cost.

  Note that, as described with reference to FIGS. 3A and 3B, the electrodeposition element 2 has both a transmittance when no voltage is applied and a reflectance when a voltage is applied, of 80% or more. For this reason, the lamp according to the first embodiment has high utilization efficiency of light emitted from the light source 1.

  FIG. 6 is a schematic view showing a lamp (vehicle headlamp) according to the second embodiment. In the first embodiment, the light transmitted through the electrodeposition element 2 is incident on the high beam optical system, and the reflected light is incident on the low beam optical system. In the second embodiment, the light is transmitted by the electrodeposition element 2. The reflected light enters the high beam optical system, and the transmitted light enters the low beam optical system. Here, the electrodeposition element 2 has eight square (dot) pixels on the lower side, and no pattern is formed on the upper side. Other configurations are the same as those of the first embodiment.

  Also in the second embodiment, similarly to the first embodiment, the light emitted from the light source 1 enters the arrangement positions of the eight pixels of the electrodeposition element 2, and the state of each pixel (transparent state / mirror state) ) Or transmitted or reflected to form a plurality of light distribution patterns.

  The light emitted from the light source 1 and transmitted through the transparent electrode of the electrodeposition element 2 and the region where the pattern is not formed is reflected by the reflector 3 and enters the lens 5b via the shade 4, It is emitted to the front of the vehicle as illumination light (low beam). The lens 5b reversely projects the image at the position of the shade 4 (the position of the light shielding portion).

  The light emitted from the light source 1 and reflected by the pixels in the mirror state of the electrodeposition element 2 is transmitted through the lens 5a and emitted to the front of the vehicle as illumination light (high beam). The lens 5a reversely projects an image at the position of the electrodeposition element 2 (pixel formation position).

  When the lamp according to the second embodiment is used, by making all the pixels of the electrodeposition element 2 transparent, almost all light can enter the low beam optical system, and the light distribution pattern of FIG. 5A can be obtained. .

5B can be obtained by applying a negative voltage to the segment electrodes 12a ₁ , 12a ₅ , 12a ₇ , 12a ₈ , for example.

  The lamp according to the second embodiment can achieve the same effects as the lamp according to the first embodiment.

  Furthermore, in the second embodiment, it is only necessary to apply a voltage to the electrodeposition element 2 when forming a high beam with relatively few use opportunities. Therefore, when forming a low beam with relatively many use opportunities, the electrodeposition element 2 is used. Compared to the first embodiment in which a voltage is applied to the capacitor, troubles such as failure are less likely to occur, and power consumption is small. Further, since the electrodeposition element 2 becomes transparent at the time of failure, it is preferable to employ an optical system that forms a low beam in a transparent state. Also in this respect, the lamp according to the second embodiment is more desirable than the first embodiment. .

  Here, a pattern is not formed, and a transparent region is always provided so that a low beam is formed regardless of the pixel state of the electrodeposition element 2. However, the present invention is not limited to this, and pixels may be formed on the entire surface of the electrodeposition element 2.

  As mentioned above, although this invention was demonstrated along the Example, this invention is not limited to these.

  For example, although the gel electrolyte layer is used in the examples, a liquid electrolyte solution containing a silver complex may be used. The electrolyte layer includes, for example, an electrolyte solution containing an electrodeposition material and an electrolyte membrane.

  Moreover, although the case where 8 pixels are arranged along one direction has been described, the number of pixels (segment electrodes) and the arrangement of the pixels are not limited thereto. For example, a larger number of dot-like pixels may be formed. A configuration in which not only the segment electrodes but also a plurality of common electrodes are used can be employed.

  Furthermore, although the illumination light cut-off pattern (cut-off line) is formed using the shade 4, the shade 4 can be omitted if a reflector having the cut-off pattern (light distribution pattern) is used. In this case, the optical system is configured such that the lens 5b reversely projects the image at the position of the reflecting plate.

  Moreover, although the low beam optical system is configured using the reflector (flat mirror) 3, the shade 4, and the lens 5b, for example, a non-flat reflector that forms the light distribution pattern shown in FIG. 5A may be used instead. it can.

  Further, in the embodiment, the light emitted from the light source 1 is arranged so as to be incident on the electrodeposition element 2. If a pixel electrode is formed on the entire surface of the electrodeposition element 2 without providing a reflective surface by vapor deposition as in the first embodiment or a region having no pattern as in the second embodiment, the optical system arrangement of the first embodiment By making all the pixels transparent, in the optical system arrangement of the second embodiment, it is possible to emit only the high beam by making all the pixels reflective. Even when all the light incident on the pixel position is emitted as a high beam, it is preferable that the vehicle headlamp has some illumination light emitted as a low beam. For this reason, the electrodeposition element 2 may be arranged so that the light emitted from the light source 1 is incident on a slightly wider range than the electrodeposition element 2 including the arrangement positions of the eight pixels. In that case, for example, in the configuration of the first embodiment, a reflection surface is formed in a region irradiated with light deviated from the pixel of the electrodeposition element 2 and the light emitted from the light source 1 is reflected. In the configuration of the second embodiment, the region irradiated with light deviated from the pixels of the electrodeposition element 2 is made transparent, and the light emitted from the light source 1 is transmitted. In the case where the range of the incident light to the electrodeposition element 2 is set in this way, in the first embodiment, it is necessary to form a reflecting surface, whereas in the second embodiment, an area surrounding eight pixels. Is transparent, so no special addition is required. Also in this respect, the configuration of the second embodiment is preferable.

  The optical system is not limited to the one shown in the figure, and for example, a lens, a prism, an enlargement / reduction reflector, or the like can be inserted on the optical path.

Further, in the embodiment, although silver was precipitated on the segment substrate 10a side, for example, a positive voltage is applied to the segment substrate 10a side, a silver position on the common substrate 10b opposite to the segment electrode 12a ₁ ~12a ₈ It may be deposited.

    It will be apparent to those skilled in the art that other various modifications, improvements, combinations, and the like are possible.

  It can be suitably used for vehicle lamps such as four wheels and two wheels, for example, vehicle headlamps (headlights), fog lamps, tail lamps, rear combination lamps, and the like.

DESCRIPTION OF SYMBOLS 1 Light source 2 Electrodeposition element 3 Reflector 4 Shade 5a, 5b Lens 10a Upper side board | substrate (segment board | substrate)
10b Lower board (common board)
11a Upper transparent substrate 11b Lower transparent substrate 12a, 12a _{1 to} 12a ₈ Upper transparent electrode (segment electrode)
12b Lower transparent electrode (common electrode)
13 Sealing part 14 Electrolyte layer

Claims (9)

A light source that emits light;
Provided with a plurality of pixels that can be switched between a transparent state and a mirror state independently, the normal direction of the pixel surface and the optical axis direction of the incident light are non-parallel on the optical path of the light emitted from the light source An electrodeposition element arranged in
A first optical system in which light transmitted through a pixel in a transparent state of the electrodeposition element enters and emits first illumination light;
A lamp having a second optical system that receives light reflected by a pixel in a mirror state of the electrodeposition element and emits second illumination light. The first optical system includes a first lens that receives light transmitted through a pixel in a transparent state of the electrodeposition element and emits the first illumination light.
The lamp according to claim 1, wherein the first lens projects an image of a pixel position of the electrodeposition element.   The lamp according to claim 2, wherein the second optical system emits the second illumination light that illuminates a certain region. The second optical system includes a reflector on which light reflected by a pixel in a mirror state of the electrodeposition element is incident;
A second lens that receives the light reflected by the reflector and emits the second illumination light;
The reflector includes a cut-off pattern, or a cut-off pattern is disposed on an optical path between the reflector and the second lens,
The lamp according to claim 3, wherein the second lens projects an image of a cut-off pattern forming position. The electrodeposition element is arranged such that light emitted from the light source is incident on a wider range including the arrangement positions of the plurality of pixels.
The lamp according to claim 2, wherein a reflection surface is formed in a region surrounding the plurality of pixels of the electrodeposition element. The second optical system includes a second lens that receives light reflected by a pixel in a mirror state of the electrodeposition element and emits the second illumination light,
The lamp according to claim 1, wherein the second lens projects an image of a pixel position of the electrodeposition element.   The lamp according to claim 6, wherein the first optical system emits the first illumination light that illuminates a certain region. The first optical system includes a reflector on which light transmitted through a pixel in a transparent state of the electrodeposition element is incident;
A first lens that receives the light reflected by the reflector and emits the first illumination light;
The reflector includes a cut-off pattern, or a cut-off pattern is disposed on an optical path between the reflector and the first lens,
The lamp according to claim 7, wherein the first lens projects an image of a cut-off pattern forming position. The electrodeposition element is arranged such that light emitted from the light source is incident on a wider range including the arrangement positions of the plurality of pixels.
The lamp according to any one of claims 6 to 8, wherein a region surrounding the plurality of pixels of the electrodeposition element is transparent.