JP2015184053A - Surface monitoring device, cleaning device, and transport device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a surface monitoring device which is capable of appropriately monitoring a contamination state of an object surface to be monitored and of informing of a proper timing for maintenance work.SOLUTION: A surface monitoring device 1 for monitoring a contamination state of a surface of a cleaning roller 51 includes light-emitting elements 2A and 2B which emit light toward the surface of the cleaning roller 51, a light receiving element 3 which outputs an electric signal corresponding to the amount of received light, a signal processing unit 4 which processes the signal outputted from the light receiving element 3, a determination processing unit 5 which determines the contamination state of the surface of the cleaning roller 51 on the basis of the signal processed by the signal processing unit 4, and an output unit 6 which outputs a notification signal of the contamination state determined by the determination processing unit 5. The light receiving element 3 is disposed in such a position that it does not receive regularly reflected light SR from the surface of the cleaning roller 51, which results from the light emitted from the light-emitting elements 2A and 2B, but receives irregularly reflected light DR from deposits on the surface of the cleaning roller 51.

Description

  The present invention relates to a surface monitoring device, a cleaning device, and a conveyance device, and more specifically, a surface monitoring device capable of monitoring a contamination state due to an adhering substance such as dust existing on the surface of an object to be monitored. The present invention relates to a cleaning device having a cleaning device and a transport device having the surface monitoring device.

  In a manufacturing process of a display device such as a liquid crystal display, an electronic component, a printed circuit board, or an optical device, it is necessary to take measures to remove dust in order to suppress generation of defective products and improve product quality.

  In the manufacturing process described above, in order to remove dust attached to thin members used in devices and equipment, such as film members, sheet members, substrates, plastic plates, etc., dust on the surface of these thin members is removed with a roller. A cleaning device that is used and removed is used. In such a cleaning apparatus, maintenance work such as cleaning of the rollers is performed at regular time intervals or every predetermined number of times subjected to the cleaning process in order to prevent a decrease in cleaning capability due to continuous use of the rollers.

  However, if regular maintenance is performed, contamination of the roller proceeds earlier than expected, and if a product failure occurs due to insufficient dust removal before the next maintenance work, Since the product defect is discovered in another inspection process after the cleaning process, a time lag occurs until the discovery, and the product defect may continuously occur during this time.

  Since the conventional cleaning device is not equipped with a function for monitoring the contamination state of the roller surface in real time, the contamination state of the roller surface cannot be properly grasped in the cleaning process. Therefore, in order to prevent the occurrence of product defects due to insufficient dust removal as described above, roller maintenance work is performed more frequently than necessary. There was a problem that it was difficult to perform maintenance work.

  On the other hand, in the scanner device, the printer device, or the sheet manufacturing device, techniques for detecting foreign matters attached to the rollers constituting the device are described in Patent Documents 1 to 3 below.

  Japanese Patent Application Laid-Open No. 2004-228561 discloses a technique for monitoring the surface of a roller using a CCD sensor and notifying the cleaning time by comparing the output value from the CCD sensor with a cleaning time detection threshold value. In Patent Document 2, the surface of an object to be inspected is irradiated with light from a light guide lens to the object to be inspected (roller), and the reflected light from the object to be inspected is picked up and imaged by a linear CCD camera. Techniques for inspection are disclosed. In Patent Document 3, light is emitted from a light source to a roller, reflected light from the roller is received by a line camera (imaging means), an image of the roller is captured, and a foreign object is obtained based on luminance data of the captured image. A technique for determining the adhesion of a liquid is disclosed.

  However, in the techniques described in Patent Documents 1 to 3, regular reflection light from the object to be inspected (roller) is received to determine foreign matter and the like, and irregularly reflected light from foreign matter and the like can be efficiently detected. In addition, there is a problem that it is difficult to accurately detect a contamination state due to an adhering substance such as dust existing on the surface of a roller or the like.

JP 2004-12130 A Utility Model Registration No. 3082755 JP 2007-57488 A

Means for solving the problems and their effects

  The present invention has been made in view of the above-described problems, and can appropriately monitor the contamination state due to the deposits on the surface of the monitoring object, and can notify the appropriate timing for performing the maintenance work and the preparation thereof. It is an object of the present invention to provide a surface monitoring device that can be used, a cleaning device that includes the device, and a transfer device that includes the surface monitoring device.

  In order to achieve the above object, a surface monitoring apparatus (1) according to the present invention is a surface monitoring apparatus that monitors the contamination state of the surface of a monitoring object, and irradiates light toward the surface of the monitoring object. The light irradiation means, the light receiving means for outputting a signal corresponding to the amount of received light, the signal processing means for processing the output signal from the light receiving means, and the adherent based on the signal processed by the signal processing means A determination processing unit that determines a contamination state of the surface of the monitoring object; and an output unit that outputs a signal notifying the contamination state determined by the determination processing unit, wherein the light receiving unit is connected to the light irradiation unit. It is arranged so as not to receive regular reflection light from the surface of the monitoring object generated by the irradiated light, but to receive irregular reflection light from the deposit on the surface of the monitoring object. That.

  According to the surface monitoring device (1), the light receiving means receives irregularly reflected light from the deposit on the surface of the monitoring object without receiving regular reflection light from the surface of the monitoring object. The amount of irregularly reflected light received from the deposit can be selectively increased. Further, it is possible to appropriately determine the contamination state of the monitoring target object due to the adhering matter based on the received amount of the irregularly reflected light, and according to the determined contamination state, for example, the contamination level or the contamination level. A signal for notifying the maintenance time can be output. Therefore, it is possible to appropriately monitor the contamination state of the surface of the monitoring object due to the attached matter, and it is possible to promptly notify the outside of the contamination state through the output means.

  Further, the surface monitoring device (2) according to the present invention is the surface monitoring device (1), wherein the size of the light path irradiated from the light irradiation means and / or the light path received by the light receiving means is the same. An optical path limiting means for limiting the size is provided.

  According to the surface monitoring device (2), the size of the light path irradiated from the light irradiation means and / or the size of the light path received by the light receiving means is limited by the light path limiting means. Therefore, it is possible to suppress erroneous detection due to specularly reflected light from the surface of the monitoring target object or miscellaneous light that is reflected by the specularly reflected light at various locations, and more selectively diffused light from the attached object. The light receiving sensitivity from the deposit on the surface of the monitoring object can be increased.

  The surface monitoring device (3) according to the present invention is characterized in that, in the surface monitoring device (2), the light irradiation means and the light receiving means are housed in a housing having the optical path limiting means. Yes.

  According to the surface monitoring device (3), the size of the light path irradiated from the light irradiating means and / or the size of the light path received by the light receiving means is the optical path provided in the housing. It can be easily restricted by the restricting means, and it is possible to suppress the irradiation of light unnecessary for the detection of the irregularly reflected light from the adhering matter and the reception of extraneous light, and the light receiving sensitivity of the irregularly reflected light can be increased. The optical path limiting means provided in the housing includes, for example, an irradiation path and an irradiation window formed so as to limit the size of a light path irradiated from the light irradiation means, and / or the light receiving means. A light receiving path, a light receiving window, or the like formed so as to limit the size of the path of the light received by the can be adopted.

  In the surface monitoring device (4) according to the present invention, in any one of the surface monitoring devices (1) to (3), the light irradiation unit irradiates light on the surface of the monitoring object from an oblique direction. The light receiving means is located closer to the light irradiating means than the intersection of the optical axis of the light emitted from the light irradiating means and the surface of the monitoring object, and the monitoring object It is characterized by being arranged at a position for receiving the irregularly reflected light from an oblique direction with respect to the surface of the object.

  According to the surface monitoring device (4), the light irradiating means irradiates light on the surface of the monitoring object from an oblique direction, and the light receiving means irradiates the optical axis of the light emitted from the light irradiating means. Since it is disposed closer to the light irradiation means than the intersection of the surface of the monitoring object and the surface of the monitoring object, it is disposed at a position for receiving the irregularly reflected light from an oblique direction. The irregular reflection light from the surface of the monitoring object can be suppressed, and the light receiving means selectively receives the irregular reflection light from the deposit without being affected by the regular reflection light from the surface of the monitoring object. Even when only one light emitting element is used, the accuracy of detecting irregularly reflected light from the deposit can be improved.

  In the surface monitoring device (5) according to the present invention, in any one of the surface monitoring devices (1) to (3), the light irradiation means is the same point from two oblique directions with respect to the surface of the monitoring object. The light receiving means is disposed in a linear direction that passes through the same point and is perpendicular to the surface of the monitoring object.

  According to the surface monitoring device (5), the light irradiating means irradiates light from the two oblique directions toward the same point on the surface of the monitoring object, and the light receiving means passes through the same point. Since the light receiving means is arranged in a linear direction perpendicular to the surface of the monitoring target object, the light receiving means is adapted to influence the regular reflection light from the surface of the monitoring target object caused by the light irradiated from the two oblique directions. It is possible to selectively receive the irregularly reflected light from the adhering material among the light irradiated from the two oblique directions with little reception, and to increase the amount of light received by the irregularly reflected light from the adhering material.

  In the surface monitoring device (6) according to the present invention, in any one of the surface monitoring devices (1) to (3), the monitoring object is a roller, and the light irradiation means is on the outer periphery of the roller. The light receiving means is disposed on a normal line passing through the contact point, and the light receiving means is disposed on a tangent line having a point as a contact point with the contact point interposed therebetween.

  According to the surface monitoring device (6), since the light irradiation means is disposed on the tangent line so as to face the contact, the surface of the roller by the light irradiated from the light irradiation means. The effect which suppresses the irregular reflection light from can be heightened. Therefore, the light receiving means is irradiated from the light irradiating means with almost no influence of regular reflection light from the surface of the roller and almost no influence of irregular reflection light from the surface of the roller. It is possible to selectively receive diffusely reflected light from the attached matter in the light, and to increase the amount of the irregularly reflected light received by the attached matter.

  Further, the surface monitoring device (7) according to the present invention includes the function of the light irradiation means in any one of the surface monitoring devices (1) to (6) that irradiates light intermittently at a predetermined period, The signal processing means has a function of amplifying the signal intermittently received by the light receiving means, filtering the signal, and demodulating the filtered signal.

  According to the surface monitoring device (7), light is intermittently emitted by the light irradiating means, light is intermittently received by the receiving means, and the intermittently received signal is received by the signal processing means. After amplification, filtering is performed and the filtered signal is demodulated. Therefore, even when noise is mixed in the received light signal, the signal is proportional to the received light signal (amount of received light) from which the noise has been cut. And the accuracy of determining the contamination state can be improved.

  In the surface monitoring device (8) according to the present invention, in any one of the surface monitoring devices (1) to (7), the light irradiation means is an infrared light emitting diode, and the light receiving means is an infrared photodiode. It is characterized by being.

  According to the surface monitoring device (8), erroneous detection due to disturbance light in the visible light region can be suppressed, and by using infrared light having a wavelength longer than that of visible light, It is possible to suppress irregular reflection and generation of irregular reflection light from a very small deposit that does not need to be detected, and unnecessary detection can be suppressed. Moreover, since infrared rays do not have a possibility of degrading the monitoring object by irradiation, unlike ultraviolet rays, it is possible to provide an apparatus with excellent handling properties.

  Moreover, the surface monitoring apparatus (9) according to the present invention is the surface monitoring apparatus (1) to (8), wherein the first polarizing means provided in the irradiation light path of the light irradiation means, and / or the A second polarizing means provided in a light receiving optical path of the light receiving means is further provided, and the first polarizing means and the second polarizing means can emphasize irregularly reflected light from the deposit on the surface of the monitoring object. Thus, it has a function of polarizing.

  According to the surface monitoring apparatus (9), the first polarizing means and / or the second polarizing means is provided in the light receiving optical path of the light receiving means. The means can receive the diffusely reflected light from the attached substance in an emphasized state, and when the surface condition of the monitoring object is rough or the surface has a bright color tone, that is, diffusely reflected light from the surface. Even when there are many, the detection sensitivity of the irregularly reflected light from the said deposit | attachment can be improved.

  In the surface monitoring device (10) according to the present invention, in any one of the surface monitoring devices (1) to (9), the determination processing unit determines the level of the output signal of the signal processing unit and the contamination state. It has a function of determining a contamination level by comparing with one or more thresholds for determination, and the output means has a function of outputting a notification signal corresponding to the contamination level.

  According to the surface monitoring device (10), the level of the output signal of the signal processing means is compared with one or more threshold values for determining the contamination state, and the contamination level is determined. A notification signal corresponding to the contamination level can be output, and the contamination state of the surface of the monitoring object can be more accurately notified.

  In the surface monitoring device (11) according to the present invention, in any of the surface monitoring devices (1) to (9), the determination processing unit averages or semi-integrates the output signal of the signal processing unit, It has a function of determining a contamination state of the entire inspection surface of the monitoring object based on the averaged or semi-integrated signal.

  According to the surface monitoring device (11), it is possible to determine the contamination state of the entire inspection surface of the monitoring object, and to notify the state of contamination of the entire inspection surface of the monitoring object through the output means. It becomes possible to do.

  In the surface monitoring device (12) according to the present invention, in any of the surface monitoring devices (1) to (9), the determination processing unit detects a peak of the output signal of the signal processing unit, and the peak It is characterized in that it has a function of judging the contamination state due to large deposits based on the signal.

  According to the surface monitoring device (12), it is possible to determine a state in which large deposits are attached to the surface of the monitoring object, and large deposits adhere to the surface of the monitoring object through the output means. It is possible to notify the status that is being performed.

  Further, the surface monitoring device (13) according to the present invention is the determination device according to any one of the surface monitoring devices (1) to (9), wherein the signal processing unit has a function of differentiating an output signal of the light receiving unit. The processing means has a function of counting the pulsed signal output from the signal processing means and determining a contamination state based on the count value.

  According to the surface monitoring device (13), by counting the pulse-like signal output after being differentiated by the signal processing means, the number of deposits on the surface of the monitoring object can be counted, It is possible to determine the contamination state based on the count and notify the contamination state.

  Moreover, the surface monitoring apparatus (14) according to the present invention is the surface monitoring apparatus (1) to (9), wherein the determination processing means has a maximum value and a minimum value of the signal processed by the signal processing means. Based on the above, it has a function of determining whether or not the surface of the monitoring object is in a spotted state due to the attached matter.

  According to the surface monitoring device (14), it is possible to determine whether or not the surface of the monitoring target is in a spotted state due to the deposit, and the surface of the monitoring target is put into a spotted state due to the deposit. It is possible to notify the contamination status.

  Further, the surface monitoring device (15) according to the present invention is the cleaning roller according to any one of the surface monitoring devices (1) to (14), wherein the monitoring object removes dust existing on the surface of the object to be cleaned, And / or a transfer roller that rotates while contacting the surface of the cleaning roller.

  According to the surface monitoring device (15), the monitoring object is a cleaning roller that removes dust existing on the surface of the object to be cleaned and / or a transfer roller that rotates while contacting the surface of the cleaning roller. Therefore, the contamination state of the surface of the cleaning roller and / or the transfer roller can be managed in real time, and depending on the contamination state of the cleaning roller and / or the transfer roller, the cleaning roller, and / or Appropriate maintenance of the transfer roller can be performed at an appropriate time, and the occurrence of defective cleaning of the object to be cleaned can be suppressed.

  Further, the cleaning device (1) according to the present invention is a cleaning device that removes dust existing on the surface of the object to be cleaned by using a roller, and the surface monitoring devices (1) to (1) are disposed near the surface of the roller. Any one of (14) is provided.

  According to the cleaning device (1), since any one of the surface monitoring devices (1) to (14) is disposed in the vicinity of the surface of the roller, in the cleaning process of the object to be cleaned, The contamination state of the roller can be appropriately managed in real time, and appropriate maintenance of the roller can be performed at an appropriate time according to the contamination state of the roller. Therefore, it is possible to eliminate the time lag from when the roller is contaminated until the roller is noticed, and to suppress the occurrence of a product defect due to a defective cleaning of the object to be cleaned.

  Moreover, the conveying apparatus (1) according to the present invention is a conveying apparatus that conveys a workpiece by a roller or a belt, and is provided with any one of the surface monitoring apparatuses (1) to (14) at a position near the surface of the roller or belt. Is provided.

  According to the transport device (1), since any one of the surface monitoring devices (1) to (14) is disposed in the vicinity of the surface of the roller or belt, the workpiece such as the object to be cleaned is disposed. In the conveying step, the contamination state of the roller or belt can be appropriately managed in real time, and appropriate maintenance of the roller or belt can be performed at an appropriate time according to the contamination state of the roller or belt. It becomes possible. Therefore, it is possible to eliminate a time lag from when the roller or belt is contaminated until the contamination is noticed, and secondary contamination such that the workpiece is contaminated by adhering matter such as dust adhering to the roller or belt. Generation | occurrence | production of the product defect etc. resulting from this secondary contamination can be suppressed.

It is a schematic block diagram of the surface monitoring apparatus which concerns on embodiment (1) of this invention. It is the side view which showed typically the principal part layout of the cleaning apparatus by which the surface monitoring apparatus which concerns on embodiment (1) was employ | adopted. It is an external view of the surface monitoring apparatus which concerns on embodiment (1), (a) is a top view, (b) is the figure which showed the roller opposing surface. It is a functional block diagram of the signal processing part of the surface monitoring apparatus which concerns on embodiment (1). It is the figure which showed the signal waveform output from the light receiving element of the surface monitoring apparatus which concerns on embodiment (1), (a) is a case where dust is not detected, (b) is a case where large dust is detected, (c ) Shows a case where dust adheres to the entire inspection surface. It is a schematic block diagram of the surface monitoring apparatus which concerns on another embodiment. It is a functional block diagram for demonstrating the signal processing part of the surface monitoring apparatus which concerns on embodiment (2). In the surface monitoring apparatus which concerns on embodiment (1), it is a wave form diagram for demonstrating the signal processing state when power supply noise is superimposed. In the surface monitoring apparatus which concerns on embodiment (2), it is a wave form diagram for demonstrating the signal processing state when power supply noise is superimposed. In the surface monitoring apparatus concerning another embodiment, it is a wave form chart for explaining the signal processing state when noise is superimposed. It is the elements on larger scale which showed the structure of the light emitting element and light receiving element vicinity of the surface monitoring apparatus which concerns on embodiment (3). It is a schematic block diagram of the surface monitoring apparatus which concerns on embodiment (4). It is an external view of the surface monitoring apparatus which concerns on embodiment (4), (a) is a side view, (b) is the figure which showed the roller opposing surface. It is the side view which showed typically the principal part layout of the cleaning apparatus which concerns on another embodiment. It is the figure which showed embodiment of the conveying apparatus which has a surface monitoring apparatus.

  Hereinafter, embodiments of a surface monitoring device, a cleaning device, and a transport device according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic configuration diagram of a surface monitoring apparatus according to Embodiment (1) of the present invention. FIG. 2 is a side view schematically showing a main part layout of the cleaning device employing the surface monitoring device according to the embodiment (1). 3A and 3B are external views of the surface monitoring apparatus according to the embodiment (1), where FIG. 3A is a plan view and FIG. 3B is a diagram illustrating a roller facing surface. FIG. 4 is a functional block diagram of a signal processing unit of the surface monitoring apparatus according to the embodiment (1).

  As shown in FIG. 1, the surface monitoring device 1 is a device that monitors the contamination state of the surface of the cleaning roller 51 (monitoring object) that constitutes the cleaning device 50 shown in FIG. , The light receiving element 3, the signal processing unit 4, the determination processing unit 5, and the output unit 6.

  The light emitting elements 2 </ b> A and 2 </ b> B (light irradiating means) are disposed at positions where light is irradiated toward the same point P from two oblique directions with respect to the surface of the cleaning roller 51. The light emitting elements 2A and 2B are composed of infrared light emitting diodes (infrared LEDs), and emit light based on signals from a drive unit (not shown). The directions of the light emitting elements 2A and 2B are adjusted so that the same point P is located on or near the surface of the cleaning roller 51. As the light emitting elements 2A and 2B, those having sharp directivities can be suitably employed.

  The light receiving element 3 (light receiving means) outputs an electrical signal corresponding to the amount of received light, and does not receive the specularly reflected light SR from the surface of the cleaning roller 51 generated by the light emitted from the light emitting elements 2A and 2B. The position of the surface (near point P) of the cleaning roller 51 that receives diffusely reflected light (scattered light) DR from an adhering matter such as dust, in this case, a straight line L that passes through the same point P and is perpendicular to the surface of the cleaning roller 51 It is arranged at a position in the direction. As the light receiving element 3, an infrared photodiode having a sharp directivity can be suitably used.

  The incident angle θ of light applied to the surface of the cleaning roller 51 from the light emitting elements 2A and 2B is preferably set to 20 ° or less from the viewpoint of suppressing irregular reflection light from the surface of the cleaning roller 51. When the surface roughness is relatively rough, or when the surface color is relatively bright, the angle is preferably set to 10 ° or less in order to suppress irregularly reflected light from the roller surface.

  The signal processing unit 4 has a function of processing an output signal from the light receiving element 3, that is, a process of extracting a signal corresponding to the amount of received light, etc. As shown in FIG. A low-pass filter 42 and a secondary amplifier circuit 43 are included.

  The determination processing unit 5 has a processing function for determining the contamination state of the surface of the cleaning roller 51 due to an adhering substance such as dust based on an output signal from the signal processing unit 4, and performs calculation / comparison processing and the like. It consists of an analog arithmetic circuit or a microcomputer that performs digital arithmetic.

  The output unit 6 has a function of outputting a signal for notifying the contamination state determined by the determination processing unit 5, and in this embodiment, a signal for lighting or blinking the notification lamp 9 shown in FIG. 3 in a predetermined color. It is configured to output.

  As shown in FIG. 2, the cleaning device 50 equipped with the surface monitoring device 1 is brought into contact with the surface (upper surface) of the cleaning object S while rotating the cleaning roller 51 and adheres to the upper surface of the cleaning object S. The dust d (for example, dust such as a conductor or a dielectric) is removed by using an electrostatic force applied to the cleaning roller 51.

  The cleaning device 50 rotates while contacting the cleaning roller 51 that contacts the upper surface of the object to be cleaned S, the brush roller 52 that contacts the cleaning roller 51 to remove dust on the surface of the cleaning roller 51, and the brush roller 52. A metal roller 53 that receives dust from the brush roller 52, a blade 54 that removes dust adhering to the metal roller 53, and a dust receiver 55 that collects dust scraped from the metal roller 53 by the blade 54, The surface monitoring device 1 is disposed at a position for monitoring the contamination state of the surface of the cleaning roller 51 after dust is removed by the brush roller 52.

  The cleaning roller 51 can charge on the surface a charge (plus or minus charge) that adsorbs dust adhering to the upper surface of the object to be cleaned S by using electrostatic force. The dust is adsorbed by electrostatic force by using the property. The cleaning roller 51 includes a cored bar (core bar) 51a, a cylindrical inner layer part 51b that covers the cored bar 51a, and a thin-film cylindrical outer layer part 51c that covers the inner layer part 51b. For the inner layer portion 51b, a conductive elastic member (for example, polyester urethane containing carbon (conductive material)) is used. Examples of the material constituting the outer layer portion 51c include polyurethane resin, for example, acrylic mixed urethane or fluorine mixed urethane, and can charge a charge that adsorbs dust adhering to the surface of the object to be cleaned S due to static electricity. ing.

  The brush roller 52 is configured to be applied with a potential having the same sign as the charge to be charged on the surface of the cleaning roller 51 during cleaning so as to generate a potential difference with the cleaning roller 51. The brush roller 52 has a brush part (hair part) 52b made of synthetic resin on a cored bar 52a.

  The metal roller 53 has a function of receiving dust from the brush roller 52 by using static electricity, and the metal roller 53 also has a function of generating a predetermined potential difference between the cleaning roller 51 and the cleaning roller 51 so that the cleaning roller 51 has a predetermined potential difference. A potential having the same sign as the charge to be charged on the surface is applied.

  The surface monitoring device 1 disposed in the vicinity of the surface of the cleaning roller 51 has a laterally long and thin rectangular parallelepiped external shape as shown in FIG. 3, and the light emitting elements 2A and 2B and the light receiving element 3 are accommodated therein. A housing 7 is formed. In the housing 7, there are formed irradiation paths 7a for the light emitting elements 2A and 2B, a light receiving path 7c for the light receiving element 3, and the like. The housing 7 is a color member that hardly reflects light, for example, a black resin. It is formed of a member or the like.

  In addition, a pair of irradiation windows 7b for irradiating light from the light emitting elements 2A and 2B are formed on the surface facing the cleaning roller 51, and a light receiving window 7d is formed between the irradiation windows 7b. . A part of the irradiation window 7b is covered with an optical path limiting member 8 (black blindfold film) that limits the optical path of the light emitting elements 2A and 2B. By adjusting the mounting position of the optical path limiting member 8, it is possible to adjust (limit) the size of the light path irradiated from the irradiation window 7b.

  In addition, the surface monitoring device 1 is provided with a notification lamp 9, and based on a signal from the output unit 6, a lamp of a color corresponding to the contamination state is lit or blinked. As the arrangement form of the surface monitoring device 1, a form arranged in parallel with the rotation axis direction of the cleaning roller 51, a form arranged in a manner movable (or scanned) in the rotation axis direction of the cleaning roller 51, and the like can be adopted.

  As shown in FIG. 4, the signal processing unit 4 of the surface monitoring device 1 includes a primary amplification circuit 41, a low-pass filter 42, and a secondary amplification circuit 43. The primary amplifier circuit 41 is an electronic circuit having a function of amplifying a light reception signal from the light receiving element 3 and has a function of finely adjusting a light receiving / emitting error. The low-pass filter 42 is for removing an unnecessary signal such as a noise signal mixed in the light reception signal from the light receiving element 3 and detecting a signal corresponding to the amount of received light, and a component having a frequency higher than a predetermined cutoff frequency. It is composed of a filter circuit that gradually decreases. The secondary amplifier circuit 43 is an electronic circuit having a function of amplifying a signal that has passed through the low-pass filter 42, and has a function of adjusting amplification sensitivity. The signal amplified by the secondary amplifier circuit 43 is output to the determination processing unit 5 at the subsequent stage.

  The signal processing unit 4 shown in FIG. 4 includes, as an amplifier circuit, a primary amplifier circuit 41 that performs a constant signal amplification by correcting errors due to instrumental differences between the light emitting elements 2A and 2B and the light receiving element 3, and a free amplifier. However, it is not always necessary to provide two amplifier circuits (multiple stages), and it is also possible to configure the amplifier circuit with a single stage.

  The relationship between the amount of light received by the light receiving element 3 and the output signal level of the signal processing unit 4 is normally proportional until the amount of received light exceeds a predetermined value, but the amount of received light exceeds the predetermined value, and the signal processing unit 4 When the output signal amplified in step S3 reaches the proportional limit (measurement limit), the output signal linearity collapses and becomes saturated, so there is a possibility that a signal corresponding to the amount of received light cannot be output.

  Therefore, as a method of expanding the measurement range (dynamic range) of the received light amount, a method of logarithmically amplifying the output signal (received light amount) from the light receiving element 3 can be applied. That is, a logarithmic amplifier is used for the primary amplifier circuit 41, and the signal output from the light receiving element 3 is logarithmically amplified. Thereby, the amount of light received until the measurement limit is reached can be increased. In addition, the output signal with a low level of received light amount is emphasized, the measurement range (dynamic range) of the identifiable signal can be expanded, and the contamination level determination range can be expanded.

  FIG. 5 shows a signal waveform (oscilloscope image) output from the light receiving element 3 of the surface monitoring apparatus 1 according to the embodiment (1). FIG. 5A shows a signal waveform when no dust is detected. FIG. 5B shows a signal waveform when large dust is detected. When large dust is attached, a large peak that rises sharply is detected. FIG. 5 (c) shows a signal waveform when dust adheres to the entire inspection surface of the cleaning roller 51. Although a large peak as in (b) is not detected, the signal level is higher than that in (a). Rises as a whole, and a signal having a larger amplitude than (a) is detected.

The determination processing unit 5 of the surface monitoring apparatus 1 according to Embodiment (1) can perform the following determination processing based on the output signal of the signal processing unit 4.
1. A state in which the cleaning capability is deteriorated due to the overall contamination of the surface of the cleaning roller 51 is determined.
(1) A process of averaging the output signal of the signal processing unit 4, for example, a process of obtaining an average value (average value of received light amount) of the output signal by calculation, and comparing the obtained average value with a predetermined threshold value Then, a process for determining whether or not the entire inspection surface is contaminated is performed. Alternatively, a semi-integrating circuit is provided to integrate the signal and perform arithmetic processing such as obtaining a contamination level according to the integrated value.
(2) As the threshold value, two threshold values having different levels (first threshold value <second threshold value) are provided, and the average value is higher than the first threshold value and lower than the second threshold value. It is determined that the entire inspection surface is contaminated.
(3) A plurality of thresholds having different levels are set, the output signal is compared with these thresholds, the contamination level according to the contamination state is determined, and a signal for notifying the determination result (contamination level, etc.) is output to the output unit 6 is output. For example, the following notification (announcement) processing is performed.

In the case of a normal level (a level at which necessary cleaning capability can be maintained), a signal for turning on the green lamp 9a of the notification lamp 9 is output.
In the case of a caution level (a level that prompts preparation to perform maintenance of the cleaning roller 51 when the line is stopped in a convenient production process or the like), a signal for turning on the yellow lamp 9b of the notification lamp 9 is output.
In the case of a warning level (level at which the cleaning capability is reduced and the maintenance of the cleaning roller 51 is necessary when the next line stops), a signal for turning on the red lamp 9c of the notification lamp 9 is output.
A signal that causes the red lamp 9c of the notification lamp 9 to blink in the case of a dangerous level (the cleaning capability is greatly reduced and the cleaning roller 51 may contaminate the object to be cleaned S and requires immediate maintenance). Is output.

  In the above determination, a case has been described in which a plurality of threshold values of different levels are set, and the output signal is compared with these threshold values. However, the threshold value to be set does not necessarily have to be plural, and may be singular. . For example, a configuration may be adopted in which one threshold value for determining a warning level or a danger level is set, the output signal is compared with the threshold value, and a signal for notifying the comparison determination result is output from the output unit 6. .

2. A state in which large dust (including dust particles) is attached to the surface of the cleaning roller 51 is determined.
The light reception signal when large dust is pinpointed on the surface of the cleaning roller 51 or when a dust lump is pinpointed is detected as a large peak as shown in FIG. Accordingly, a threshold value for determining large dust or dust particles is set in advance, it is determined whether or not the peak value of the output signal of the signal processing unit 4 exceeds the threshold value. When it is determined that a large dust or dust lump has been detected, a signal for notifying these states is output from the output unit 6. For example, a signal for blinking the yellow lamp 9b of the notification lamp 9 is output.

3. The number of dust adhering to the surface of the cleaning roller 51 is detected, and the contamination state is determined from the detected number of dust.
The signal processing unit 4 differentially amplifies (calculates) the output signal from the light receiving element 3, counts the pulsed signal obtained by the calculation, and determines the contamination level based on the count value (number of detected dust). The signal for notifying the determination result is output from the output unit 6. For example, the flashing signal is output by changing the flashing interval of the yellow lamp 9b of the notification lamp 9 according to the contamination level.

4). A state in which dust is attached to the surface of the cleaning roller 51 is determined.
The maximum value and the minimum value of the signal output from the signal processing unit 4 are detected, the difference between the detected maximum value and the minimum value is compared with a predetermined threshold value for determining the spot state, and the cleaning roller 51 The presence or absence of a spot state due to dust on the surface is determined, and a signal for notifying the determination result is output from the output unit 6.

  In the present embodiment, notification by the notification lamp 9 is performed. However, the notification mode is not limited to this, and for example, notification by voice from a separately provided speaker unit (not shown). Notification of contents, a form of displaying notification contents on a separate display unit (not shown), a form combining these, and the like may be employed.

  Further, as an output form of the notification (notification) signal, peripheral devices such as a control device that manages the cleaning device 50 and a control device (such as a programmable controller) that manages a production line including the cleaning device 50 (see FIG. (Not shown) An ON / OFF electric signal indicating the state determined by the determination processing unit 5 or an electric signal obtained by amplifying and signal processing the light detected by the light receiving element 3 by the signal processing unit 4 is wired or wirelessly communicated. The structure to perform etc. may be employ | adopted.

  According to the surface monitoring apparatus 1 according to the embodiment (1), the light emitting elements 2A and 2B irradiate the surface of the cleaning roller 51 with light from two diagonal directions toward the same point P, and the light receiving element 3 However, the light receiving element 3 is hardly affected by the specularly reflected light SR from the surface of the cleaning roller 51 because it is disposed in the direction of the straight line L perpendicular to the surface of the cleaning roller 51 through the same point P. The diffusely reflected light DR from the dust can be selectively received.

  Further, the size of the light path irradiated from the light emitting elements 2A and 2B by the irradiation path 7a, the irradiation window 7b, the light receiving path 7b, the light receiving window 7d, and the optical path limiting member 8 formed in the housing 7, and the light receiving element 3 Since the size of the path of the light received at is limited, it is possible to suppress false detection due to specularly reflected light SR from the surface of the cleaning roller 51 and miscellaneous light reflected by the specularly reflected light at various locations. Thus, the irregularly reflected light DR from the attached substance can be received more selectively, and the light receiving sensitivity of the irregularly reflected light DR can be further increased.

  Further, it is possible to appropriately determine the contamination state of the cleaning roller 51 due to dust based on the amount of light received by the irregularly reflected light DR. The determined contamination state, for example, the contamination level and the maintenance time according to the contamination level, etc. Can be output. Therefore, it is possible to monitor in real time the contamination state of the surface of the cleaning roller 51 due to adhering substances such as dust, and the notification lamp 9 can promptly notify the outside of the contamination state of the cleaning roller 51.

  Further, by using an infrared light emitting diode (infrared LED) as the light emitting elements 2A and 2B and using an infrared photodiode as the light receiving element 3, erroneous detection due to disturbance light in the visible light region can be suppressed. Further, by using infrared rays having a wavelength longer than that of visible light, it is possible to suppress irregular reflection from the surface of the cleaning roller 51 and irregular reflection light from extremely small deposits that do not need to be detected. Detection can be suppressed. Moreover, since infrared rays do not have a possibility of deteriorating the cleaning roller 51 by irradiation unlike ultraviolet rays, an apparatus having excellent handling properties can be obtained.

  Further, according to the surface monitoring device 1, the calculation processing function of the determination processing unit 5 is in a state where the entire inspection surface of the cleaning roller 51 is contaminated, and a large amount of deposits are attached to the surface of the cleaning roller 51. It is determined whether the cleaning roller 51 is in a contaminated state based on the count value of dust adhering to the surface of the cleaning roller 51, a state in which the surface of the cleaning roller 51 is contaminated with dust, etc. The contamination state can be determined from various viewpoints, and appropriate notification according to the contamination state can be performed.

  Further, according to the cleaning device 50 employing the surface monitoring device 1 according to the above embodiment (1), the surface monitoring device 1 is disposed near the surface of the cleaning roller 51. In the cleaning process S, the contamination state of the cleaning roller 51 can be appropriately managed in real time, and appropriate maintenance of the cleaning roller 51 can be performed at an appropriate time according to the contamination state of the cleaning roller 51. become. Therefore, it is possible to eliminate a time lag from when the cleaning roller 51 is contaminated until it is noticed, and to suppress the occurrence of a product defect due to a defective cleaning of the cleaning target S.

  In the above embodiment (1), the case where the surface monitoring device 1 is applied to the cleaning device 50 provided with the cleaning roller 51 that removes dust by electrostatic force has been described. The present invention can also be applied to a cleaning device provided with a cleaning roller of the type, and the same effect as described above can be obtained.

  Further, in the surface monitoring apparatus 1 according to the above embodiment (1), the light emitting elements 2A and 2B are disposed at positions where light is irradiated from the two oblique directions toward the same point P with respect to the surface of the cleaning roller 51. The light receiving element 3 is arranged in the direction of the straight line L passing through the same point P and perpendicular to the surface of the cleaning roller 51. However, two light emitting elements 2A and 2B are not necessarily required.

  As shown in FIG. 6, in the surface monitoring apparatus 1A according to another embodiment, one light emitting element 2C is arranged in the housing 7A at a position where light is irradiated from an oblique direction to the surface of the cleaning roller 51. The light receiving element 3 is located closer to the light emitting element 2C than the intersection P1 between the optical axis OP of the light emitted from the light emitting element 2C and the surface of the cleaning roller 51, and with respect to the surface of the cleaning roller 51. A configuration may be employed in which the irregularly reflected light DR is received from an oblique direction (a position where the light receiving angle θ1 of the light receiving element 3 is greater than the incident angle θ and less than 90 °).

  Note that the incident angle θ of the light emitted from the light emitting element 2C to the surface of the cleaning roller 51 is preferably set to 20 ° or less from the viewpoint of suppressing irregularly reflected light from the surface of the cleaning roller 51. When the surface of the roller 51 is rough, or when the surface has a relatively bright tone, it is more preferable to set it to 10 ° or less in order to suppress irregular reflection light from the surface of the cleaning roller 51. preferable.

  Next, the surface monitoring apparatus according to Embodiment (2) will be described. The surface monitoring device 1B according to the embodiment (2) differs from the surface monitoring device 1 according to the embodiment (1) shown in FIG. 1 mainly in the function of the light emitting element and the function of the signal processing unit. Therefore, components having different functions are denoted by different reference numerals, components having the same function are denoted by the same reference numerals, and description thereof is omitted.

  The arrangement form of the light emitting elements 2D and 2E and the light receiving element 3 in the surface monitoring apparatus 1B according to the embodiment (2) is substantially the same as that of the surface monitoring apparatus 1 according to the embodiment (1) shown in FIGS. On the other hand, in the surface monitoring apparatus 1B according to the embodiment (2), infrared light emitting diodes that emit light intermittently at a constant cycle are used as the light emitting elements 2D and 2E, and are based on signals from a drive unit (not shown). Thus, light emission is intermittently performed at a frequency sufficiently higher than the frequency of the signal to be detected. As the light receiving element 3, an infrared photodiode capable of intermittently receiving irregularly reflected light DR from dust in response to intermittent light emission of the light emitting elements 2D and 2E is used.

  FIG. 7 is a functional block diagram of the signal processing unit 4A of the surface monitoring apparatus 1B according to the embodiment (2). The signal processing unit 4A of the surface monitoring device 1B includes a primary amplification circuit 41, a high-pass filter (HPF) 44, a demodulation (detection) circuit 45, and a secondary amplification circuit 43.

  The primary amplifying circuit 41 is an electronic circuit having a function of amplifying a light reception signal intermittently output from the light receiving element 3, and calculates a difference between a light emitting signal received by the light receiving element 3 and a light extinction signal. And a function for amplifying light receiving and emitting errors.

  The high-pass filter 44 is for removing unnecessary signals such as noise signals mixed in the light receiving signal from the light receiving element 3 and detecting a signal corresponding to the amount of received light, and almost all components having a frequency higher than the cutoff frequency are detected. The filter circuit is configured to reduce the frequency component lower than the cut-off frequency without attenuation.

  The demodulation circuit 45 is a circuit having a function of restoring the original signal wave from the signal (amplitude modulation signal) that has passed through the high-pass filter 44, and includes an envelope detection circuit and the like. The signal demodulated (detected) by the demodulating circuit 45 is output to the secondary amplifying circuit 43.

  The secondary amplifier circuit 43 is an electronic circuit having a function of amplifying the signal demodulated (detected) by the demodulator circuit 45, and has an amplification sensitivity adjustment function. The signal amplified by the secondary amplifier circuit 43 is output to the determination processing unit 5 at the subsequent stage.

  In an environment where the surface monitoring device 1B is used, one of external factors affecting the reception and detection of irregularly reflected light from dust is power supply noise (50 Hz, 60 Hz noise). The surface monitoring apparatus 1B according to the embodiment (2) is configured to be able to detect the received light signal in an area overlapping with the frequency area of the power supply noise without attenuating the power supply noise.

Hereinafter, the difference in signal processing between the surface monitoring device 1B according to the embodiment (2) and the surface monitoring device 1 according to the embodiment (1) will be described.
FIG. 8 is a waveform diagram for explaining a signal processing state when power supply noise is superimposed in the surface monitoring apparatus 1 according to the embodiment (1), where (a) is a waveform of a received light signal, and (b). Is a waveform of the power supply noise, (c) is a waveform in which the power supply noise is superimposed on the received light signal, and (d) is an output waveform of the LPF.

  FIG. 9 is a waveform diagram for explaining a signal processing state when power supply noise is superimposed in the surface monitoring apparatus 1B according to the embodiment (2), where (a) is a waveform of a received light signal, and (b). Is a waveform of power supply noise, (c) is a waveform in which power supply noise is superimposed on a received light signal, (d) is an output waveform of HPF 44, (e) is an output waveform of demodulation (detection) circuit 45, and (f) is secondary amplification. The output waveform of the circuit 43 is shown.

  In the surface monitoring apparatus 1 according to the embodiment (1), when power supply noise is mixed in the light reception signal (signal output from the light receiving element 3), the primary amplification circuit 41 amplifies the light reception signal in a state where the power supply noise is mixed. Is done. When the amplified signal is passed through the LPF 42, as shown in FIG. 8D, the peak light receiving signal s1 that suddenly increases or decreases is partially cut, so that it is difficult to detect the peak signal by dust detection.

  That is, when the power supply noise is removed through the LPF 42, a part of the frequency that needs to be detected as the received light signal is cut. In particular, when the rotation speed of the cleaning roller 51 is high, the contamination state of the entire surface of the cleaning roller 51 can be detected, but it is difficult to detect large dust and dust particles.

  Therefore, in the surface monitoring device 1B according to the embodiment (2), infrared light emitting diodes that emit light intermittently (emits pulse-modulated light) at predetermined intervals are used as the light emitting elements 2D and 2E. The carrier frequency of the pulse modulated light is set to a frequency sufficiently higher than the frequency detected as the light reception signal. At this frequency, the light emitting elements 2D and 2E are repeatedly turned on and off. In the light receiving element 3, since the light emitting elements 2D and 2E emit light intermittently, light is received intermittently at the carrier frequency of pulse modulation.

  The power supply noise is mixed in the received light signal at the time of input of the primary amplifier circuit 41 and amplified in the form shown in (c). The high-pass filter 44 is configured to pass the carrier frequency while cutting low frequencies such as power supply noise, and the output signal of the high-pass filter 44 is in the AC state shown in (d). When the output signal of the high-pass filter 44 is demodulated (detected), a signal proportional to the contamination state of the surface of the cleaning roller 51 is extracted as shown in (e). This detection output is amplified (amplified twice) by the secondary amplifier circuit 43 and output to the determination processing unit 5.

  In the determination processing unit 5 of the surface monitoring device 1B according to the embodiment (2), based on the output signal of the signal processing unit 4A, the determination processing unit 5 of the surface monitoring device 1 according to the above embodiment (1) and Similar various determination processes are possible.

  According to the surface monitoring device 1B according to the above embodiment (2), it is possible to obtain substantially the same effect as the surface monitoring device 1 according to the above embodiment (1), and further, power reception noise is generated in the light reception signal. Even if it is mixed, it is possible to extract a signal proportional to the received light signal (received light amount) from which power supply noise has been cut, and the contamination state determination accuracy can be further improved.

  In the surface monitoring apparatus 1B according to the above embodiment (2), the case where the HPF 44 is provided in the signal processing unit 4A has been described. However, in the surface monitoring apparatus according to another embodiment, instead of the HPF 44 illustrated in FIG. In addition, a configuration in which a band-pass filter (BPF) (not shown) is provided may be employed. The bandpass filter is configured by a filter circuit that passes a signal having a frequency in a specific range and attenuates a signal having a frequency in the other range. By using a band pass filter, not only low frequency noise but also high frequency noise can be removed.

  FIG. 10 is a waveform diagram for explaining a signal processing state when noise is superimposed in a surface monitoring apparatus using a bandpass filter, where (a) is a waveform of a received light signal, and (b) is noise. (C) is a waveform in which noise is superimposed on the received light signal, (d) is an output waveform of the BPF, (e) is an output waveform of the demodulation (detection) circuit, and (f) is an output waveform of the secondary amplification circuit. Show.

  Noise including a low frequency component and a high frequency component is mixed in the received light signal at the time of input to the primary amplifier circuit 41 and amplified in the form shown in (c). The band-pass filter is configured to pass a carrier frequency while removing low-frequency components such as power supply noise and high-frequency component noise. The output signal of the band-pass filter is in the AC state shown in (d). It becomes. When the output signal of the bandpass filter is demodulated (detected), a signal proportional to the contamination state of the surface of the cleaning roller 51 is extracted as shown in (e). This detection output is amplified (doubled) by the secondary amplifier circuit 43 and output to the determination processing unit 5 as shown in (f).

  According to the surface monitoring apparatus according to the another embodiment, even when low-frequency component noise such as power supply noise and other high-frequency component noise are mixed in the received light signal, these noises are cut. Thus, a signal proportional to the received light signal (amount of received light) can be extracted, and the contamination state determination accuracy can be further improved.

  Note that the above-described filter means (LPF, HPF, or BPF) is preferably composed of a plurality of stages of filter circuits from the viewpoint of appropriately removing low-frequency and / or high-frequency noise.

  FIG. 11 is a partial enlarged view showing the structure in the vicinity of the light emitting element and the light receiving element of the surface monitoring apparatus according to the embodiment (3). In the surface monitoring apparatus 1C according to the embodiment (3) shown in FIG. 10, the polarizing filters 10A and 10B are respectively provided in the irradiation light paths of the light emitting elements 2A (or 2D) and 2B (or 2E) in the housing 7B. A polarizing filter 10 </ b> C is provided in the light receiving path 7 c of the light receiving element 3.

  Since the polarizing filters 10A and 10B irradiate the surface of the cleaning roller 51 with a component of a specific polarization plane (a component that is difficult to be reflected on the roller surface) of the irradiation light, the direction of vibration is a specific direction (vertical or horizontal). Direction) light. In addition, the polarizing filter 10C supplies a specific polarization plane component of the irregularly reflected light DR from the deposit on the surface of the cleaning roller 51 to the light receiving element 3, so that the vibration direction is a specific direction (vertical direction or horizontal direction). ) To pass only light. By these polarizing filters 10A, 10B, and 10C, irregularly reflected light DR from an adhering substance such as dust on the surface of the cleaning roller 51 is emphasized.

  According to the surface monitoring apparatus 1C according to the above embodiment (3), when the polarizing filters 10A, 10B, and 10C are provided, the surface structure of the cleaning roller 51 is relatively rough and the reflected light increases, or the cleaning roller 51 When the reflected light increases due to the bright color, the sensitivity of the irregularly reflected light DR from the dust can be selectively increased.

  In the above-described embodiment (3), the polarizing filters 10A, 10B, and 10C are provided in the irradiation path 7a of the light emitting elements 2A and 2B and the light receiving path 7c of the light receiving element 3, respectively. You may provide only.

  FIG. 12 is a schematic configuration diagram of a surface monitoring apparatus according to Embodiment (4). FIGS. 13A and 13B are external views of the surface monitoring apparatus according to the embodiment (4), where FIG. 13A is a side view and FIG. 13B is a diagram illustrating a roller facing surface. Components having the same functions as those of the surface monitoring apparatus 1 shown in FIGS. 1 and 3 are denoted by the same reference numerals, and description thereof is omitted.

  As shown in FIG. 12, the surface monitoring device 1D is a device that monitors the contamination state of the surface of the cleaning roller 51 constituting the cleaning device 50 shown in FIG. 2, and is a light emitting element 2A, 2B (or 2D, 2E). ), The light receiving element 3, the signal processing unit 4 (or 4A), the determination processing unit 5 and the output unit 6.

  The light emitting elements 2A, 2B (or 2D, 2E) are configured by infrared light emitting diodes (infrared LEDs), and are opposed to each other with a contact point P2 on a tangent line L1 having a contact point P2 on the outer periphery of the cleaning roller 51 as a contact point. Arranged.

  The light receiving element 3 is composed of an infrared photodiode that outputs an electric signal corresponding to the amount of received light, and is specularly reflected from the surface of the cleaning roller 51 generated by light emitted from the light emitting elements 2A, 2B (or 2D, 2E). It is disposed at a position where it does not receive SR and receives diffusely reflected light DR from an adherent such as dust on the surface of the cleaning roller 51, in this case, on the normal M passing through the contact P2.

  The signal processing unit 4 (or 4A) has a function of performing a process of extracting a signal corresponding to the amount of received light from the electrical signal output from the light receiving element 3, and is shown in FIG. 4 (or FIG. 7). The configuration is the same as the configuration.

The determination processing unit 5 has a processing function for determining the contamination state of the surface of the cleaning roller 51 due to adhering substances such as dust, based on the output signal of the signal processing unit 4 (or 4A). It is configured by an analog arithmetic circuit that performs the above or a microcomputer that performs digital arithmetic. The determination processing unit 5 can perform the same process as the determination processing unit 5 of the surface monitoring device 1 described above.
The output unit 6 has a function of outputting a signal notifying the contamination state determined by the determination processing unit 5 and outputs a signal for turning on / flashing the notification lamp 9 shown in FIG.

  The surface monitoring device 1D according to the embodiment (4) is disposed in the vicinity of the surface of the cleaning roller 51 and has an appearance of a vertically long and thin substantially rectangular parallelepiped as shown in FIG. 13, and the light emitting elements 2A and 2B. (Or 2D, 2E) and the housing 7C in which the light receiving element 3 is accommodated are formed. In the housing 7C, an irradiation path 7a for the light emitting elements 2A, 2B (or 2D, 2E), a light receiving path 7c for the light receiving element 3, and the like are formed.

  Further, an arc-shaped recess 7e along the outer peripheral surface of the cleaning roller 51 is formed on the surface facing the cleaning roller 51, and light from the light emitting elements 2A, 2B (or 2D, 2E) is formed in the arc-shaped recess 7e. A pair of irradiation windows 7b is formed on the tangent line L1, and an irradiation path 7a is formed on the tangent line L1 in the housing 7C from the irradiation window 7b. In addition, a light receiving window 7d and a light receiving path 7c for the light receiving element 3 are formed on the normal line M passing through the contact P2 in the arc-shaped recess 7e. The optical path is limited by the positions and sizes of the irradiation path 7a, the irradiation window 7b, the light receiving path 7c, and the light receiving window 7d.

  Further, the surface monitoring device 1D is provided with a notification lamp 9, and a lamp having a color corresponding to the contamination state is turned on. The housing 7C is formed of a member (resin member) of a color (for example, black) that does not easily reflect light.

  As the arrangement form of the surface monitoring device 1D, a form arranged in parallel with the rotation axis direction of the cleaning roller 51, a form arranged in a manner movable (or scanned) in the rotation axis direction of the cleaning roller 51, and the like can be adopted.

  For example, two guide rails (not shown) are provided above and below the surface monitoring device 1D in the direction of the rotation axis of the cleaning roller 51, and can be slid in a state of being spanned between the upper and lower guide rails. (Not shown) may be attached, and a structure in which the surface monitoring device 1D is attached to the connecting plate may be employed. The connecting plate can be fixed to a desired position of the upper and lower guide rails by a screw member or the like. Alternatively, a linear motion mechanism may be provided on the upper and lower guide rails so that the connecting plate can slide (or scan) on the guide rails.

  According to the surface monitoring apparatus 1D according to the embodiment (4), substantially the same effects as those of the surface monitoring apparatuses 1 and 1B can be obtained, and the light emitting elements 2A and 2B (or 2D and 2E) can be cleaned. Since the contact point P2 is disposed on the tangent line L1 of the roller 51 so as to face each other, the irregularly reflected light from the surface of the cleaning roller 51 due to the light emitted from the light emitting elements 2A, 2B (or 2D, 2E) is suppressed. Can enhance the effect. Therefore, in the light receiving element 3, the light emitting elements 2 </ b> A, 2 </ b> B () are hardly affected by regular reflection light from the surface of the cleaning roller 51 and hardly affected by diffuse reflection light from the surface of the cleaning roller 51. Alternatively, it is possible to selectively receive the irregularly reflected light DR from the deposit such as dust among the light irradiated from 2D and 2E), and to increase the amount of received irregularly reflected light DR by the deposit.

  In the above embodiment, the surface monitoring devices 1, 1A, 1B, 1C, and 1D have been described as having a horizontally long thin substantially rectangular parallelepiped shape or a vertically long thin substantially rectangular parallelepiped shape, but the appearance of the surface monitoring device according to the present invention is described. The shape, the arrangement form of the light emitting element and the light receiving element, and the like are not limited to these forms.

  For example, a light emitting unit (not shown) in which light emitting elements that irradiate light to the same point from two oblique directions or one point from one oblique direction with respect to the surface of the cleaning roller 51 are arranged at predetermined intervals. And a light receiving section (not shown) in which a plurality of light receiving elements are arranged in a straight line in the linear direction perpendicular to the surface of the cleaning roller 51 through the same point or the one point. can do.

  In this configuration, the irradiation direction of the plurality of light emitting elements constituting the light emitting unit is set to a direction orthogonal to the rotation axis of the cleaning roller 51 or a direction obliquely intersecting with the rotation axis. Can do. In the case where the irradiation direction of the plurality of light emitting elements is set in a direction obliquely intersecting with the rotation axis, the light emitting elements are installed more than when the light emitting elements are arranged in a direction orthogonal to the rotation axis. The interval can be widened. If the light emitting part and the light receiving part are provided, the entire roller surface can be monitored efficiently.

  Moreover, in the said embodiment, although the infrared light emitting diode was used as the light emitting elements 2A, 2B, 2C, 2D, and 2E and the infrared photodiode was used as the light receiving element 3, the surface which concerns on this invention was demonstrated. The light emitting element (light irradiation means) and the light receiving element constituting the monitoring device are not limited to this. For example, various light emitting diodes such as visible light emitting diodes and ultraviolet light emitting diodes, semiconductor lasers such as infrared laser diodes, or phototubes may be employed as the light emitting elements. The light receiving element may be a phototransistor, an imaging element such as a CCD (Charge Coupled Devices) image sensor or a CMOS (Complementary Metal Oxide Semiconductor) image sensor, or a photoelectric conducting element such as a cadmium sulfide (CdS) cell. . When an image sensor such as a CCD image sensor or a CMOS image sensor is used, a lens (objective lens) is disposed so as to focus on the image sensor, and image processing of the captured signal (light reception signal) is performed. As a result, the shape, size, color, etc. of the detected object (dust) can be detected clearly.

  Moreover, although the said embodiment demonstrated the case where the monitoring target object by the surface monitoring apparatus 1, 1A, 1B, 1C, 1D was the cleaning roller 51, the monitoring target object of the surface monitoring apparatus which concerns on this invention is cleaning. The roller 51 is not limited. For example, other rollers (such as the metal roller 53) constituting the cleaning device 50 can be monitored.

  Further, the cleaning device to which the surface monitoring device according to the present invention is applied is not limited to the cleaning device 50 having the structure shown in FIG. 2, but can also be applied to cleaning devices having other different structures. .

  The surface monitoring device according to the present invention can be applied to, for example, the cleaning device 50A shown in FIG. In addition, the same code | symbol is attached | subjected to the component which has the function similar to the cleaning apparatus 50 shown in FIG. 2, and the description is abbreviate | omitted.

  In the cleaning device 50 </ b> A, a transfer roller 56 is disposed between the cleaning roller 51 and the brush roller 52. The transfer roller 56 is formed of a material that can charge the surface with a charge that adsorbs dust adhering to the surface of the cleaning roller 51 by electrostatic force. By rotating the transfer roller 56 in contact with the surface of the cleaning roller 51, a potential difference is generated between the cleaning roller 51 and the cleaning roller 51 according to the difference in surface characteristics between the cleaning roller 51 and the transfer roller 56. The dust adhering to the surface is attracted (transferred) to the transfer roller 56. The dust transferred to the transfer roller 56 is removed from the transfer roller 56 by the brush roller 52.

  Then, the surface monitoring device 1 (or 1A, 1B, 1C, 1D) detects the position near the surface of the transfer roller 56, for example, the transfer roller 56 after the dust is removed by the brush roller 52 as shown in FIG. It is arranged at a position where the surface contamination state can be monitored.

  According to such a cleaning device 50A, since the surface monitoring device 1 (or 1A, 1B, 1C, 1D) is disposed near the surface of the transfer roller 56, the transfer roller 56 is contaminated in the cleaning process. The state can be appropriately managed in real time, and appropriate maintenance of the transfer roller 56 can be performed at an appropriate time according to the contamination state of the transfer roller 52. The surface monitoring device 1 (or 1A, 1B, 1C, 1D) can be disposed not only at a position near the surface of the transfer roller 56 but also at a position near the surface of the cleaning roller 51.

  Further, the surface monitoring device 1 (or 1A, 1B, 1C) is disposed before and after the cleaning devices 50, 50A, and dust or the like adhering to the surface of the cleaning material S conveyed to the cleaning device 50 is disposed. It can also be set as the system configuration which monitors a deposit. According to such a configuration, the contamination state of the surface of the cleaning target S before and after the cleaning process performed by the cleaning device 50 can be monitored, and it can be determined whether or not the cleaning target S is properly cleaned. it can.

  Further, since the cleaning devices 50 and 50A described above are usually arranged in the middle of a product production line, a transport belt and a transport roller for transporting the object to be cleaned S are provided before and after the cleaning devices 50 and 50A. Is installed.

FIG. 15 shows an embodiment of a transport apparatus having the surface monitoring apparatus 1 (1A, 1B, 1C, or 1D) described above.
The transport device 60 includes a transport roller 61 and a transport belt 62 installed before and after the cleaning device 50 (or 50A) and a predetermined device 70 used in a process before cleaning, and the transport roller 61 and the transport belt 62 are provided. The surface monitoring device 1 (1A, 1B, 1C, or 1D) described above is arranged at a position in the vicinity of the surface.

  According to such a conveyance device 60, in the conveyance process of the workpiece such as the object to be cleaned S, the contamination state of the conveyance roller 61 and the conveyance belt 62 can be appropriately managed in real time, and the conveyance roller 61 and the conveyance belt 62 can be managed. According to the contamination state, appropriate maintenance of the transport roller 61 or the transport belt 62 can be performed at an appropriate time. Accordingly, it is possible to eliminate a time lag from when the conveying roller 61 or the conveying belt 62 is contaminated until the contamination is noticed, and the workpiece is contaminated by the adhering matter such as dust adhered to the conveying roller 61 or the conveying belt 62. It is possible to suppress the occurrence of secondary contamination such as product defects and product defects caused by the secondary contamination.

  The embodiments of the present invention have been described above. However, the present invention is not limited to the above-described embodiments, and various parts constituting the present invention can be used without departing from the spirit of the present invention. It can be changed.

1, 1A, 1B, 1C, 1D Surface monitoring device 2A, 2B, 2C, 2D, 2E Light emitting element 3 Light receiving element 4, 4A Signal processing unit 5 Determination processing unit 6 Output unit 7, 7A, 7B, 7C Housing 7a Irradiation path 7b Irradiation window 7c Light receiving path 7d Light receiving window 8 Optical path limiting member 9 Notification lamp 10 Polarizing filter 50, 50A Cleaning device 51 Cleaning roller 52 Brush roller 53 Metal roller 54 Blade 55 Dust receiving part 56 Transfer roller

Claims (17)

A surface monitoring device for monitoring the contamination state of the surface of a monitoring object,
Light irradiation means for irradiating light toward the surface of the monitoring object;
A light receiving means for outputting a signal corresponding to the amount of received light;
Signal processing means for processing an output signal from the light receiving means;
Determination processing means for determining a contamination state of the surface of the monitoring object due to the attached matter based on the signal processed by the signal processing means;
Output means for outputting a signal for notifying the contamination state determined by the determination processing means,
The light receiving means does not receive regular reflection light from the surface of the monitoring object generated by the light irradiated from the light irradiation means, but receives irregular reflection light from the deposit on the surface of the monitoring object. A surface monitoring device characterized by being arranged.   2. The optical path limiting means for limiting a size of a light path irradiated from the light irradiation means and / or a size of a light path received by the light receiving means. Surface monitoring device.   3. The surface monitoring apparatus according to claim 2, wherein the light irradiation means and the light receiving means are accommodated in a housing having the optical path limiting means. The light irradiation means is disposed at a position where light is irradiated from an oblique direction with respect to the surface of the monitoring object,
The light receiving means is at a position closer to the light irradiating means than the intersection of the optical axis of the light emitted from the light irradiating means and the surface of the monitoring object, and oblique to the surface of the monitoring object The surface monitoring device according to claim 1, wherein the surface monitoring device is disposed at a position where the irregularly reflected light is received from a direction. The light irradiating means is disposed at a position for irradiating light from two oblique directions toward the same point with respect to the surface of the monitoring object;
The surface monitoring device according to any one of claims 1 to 3, wherein the light receiving means is arranged in a linear direction passing through the same point and perpendicular to the surface of the monitoring object. The monitored object is a roller;
The light irradiating means is disposed oppositely across a contact on a tangent line with a certain point on the outer periphery of the roller as a contact,
The surface monitoring apparatus according to claim 1, wherein the light receiving unit is disposed on a normal line passing through the contact point. The light irradiation means has a function of irradiating light intermittently at a predetermined period,
7. The signal processing unit according to claim 1, further comprising a function of amplifying the signal intermittently received by the light receiving unit, filtering the signal, and demodulating the filtered signal. The surface monitoring apparatus according to any one of the items. The light irradiation means is an infrared light emitting diode;
The surface monitoring apparatus according to claim 1, wherein the light receiving means is an infrared photodiode. A first polarizing means provided in the irradiation optical path of the light irradiation means, and / or a second polarizing means provided in the light receiving optical path of the light receiving means,
The first polarizing means and the second polarizing means are:
The surface monitoring apparatus according to any one of claims 1 to 8, wherein the surface monitoring apparatus has a function of polarizing so that diffusely reflected light from a deposit on the surface of the monitoring target can be emphasized. The determination processing unit includes a function of determining a contamination level by comparing a level of an output signal of the signal processing unit with one or more threshold values for determining the contamination state;
The surface monitoring apparatus according to claim 1, wherein the output unit has a function of outputting a notification signal corresponding to the contamination level.   The determination processing unit has a function of averaging or semi-integrating the output signal of the signal processing unit, and determining a contamination state of the entire inspection surface of the monitoring target based on the averaged or semi-integrated signal. The surface monitoring device according to any one of claims 1 to 9, wherein   The said determination processing means is equipped with the function to detect the peak of the output signal of the said signal processing means, and to determine the contamination state by a big deposit | attachment based on this peak signal. The surface monitoring apparatus according to any one of the items. The signal processing means has a function of differentiating the output signal of the light receiving means,
The determination processing means has a function of counting a pulse-like signal output from the signal processing means and determining a contamination state based on the count value. The surface monitoring apparatus according to any one of the items.   The determination processing unit has a function of determining whether or not the surface of the monitoring target object is in a spotted state due to the deposit based on the maximum value and the minimum value of the signal processed by the signal processing unit. The surface monitoring device according to any one of claims 1 to 9, wherein   15. The monitoring object according to claim 1, wherein the object to be monitored is a cleaning roller that removes dust existing on the surface of the object to be cleaned and / or a transfer roller that rotates while contacting the surface of the cleaning roller. The surface monitoring apparatus according to any one of the items. A cleaning device that removes dust existing on the surface of an object to be cleaned using a roller,
A cleaning device, wherein the surface monitoring device according to any one of claims 1 to 14 is disposed near a surface of the roller. A conveying device that conveys a workpiece by a roller or a belt,
15. A transport apparatus comprising the surface monitoring device according to claim 1 disposed at a position near the surface of the roller or belt.

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