JP2015175024A - Thin film deposition apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus capable of securely preventing a film base material from having a flaw even when a thin film is formed on the film base material differing in width by securely preventing a thin film material such as flying particles from being deposited on a carrying roll.SOLUTION: A thin film deposition apparatus includes: a carrying roll which is provided rotatably on its center axis, and rotates on the center axis to carry a film base material wound around its outer peripheral surface; a thin film material supply device which supplies a thin film material for forming a thin film toward the film base material being wound around the carrying roll; and a mask member which is fixed detachably to respective regions, adjoining both sides of a winding region wound with the film base material when viewed from the axial direction, of the outer peripheral surface of the carrying roll.

Description

  The present invention relates to a thin film forming apparatus for forming a thin film on a film substrate.

  In recent years, touch sensors have been widely adopted as input interfaces for mobile terminal devices (mobile devices) such as mobile phones. As a touch sensor for mobile devices, a light and thin touch sensor is desired. As a touch sensor that satisfies the demand, there is a film touch sensor in which a touch sensor is formed on a film base material.

  As a method of forming a film touch sensor, a film substrate is formed by using a translucent conductive film made of indium tin oxide (ITO) or the like and an optical film made of silica or the like with a film thickness of several tens to several hundreds of nm. A method of forming by laminating and patterning each film as necessary is conventionally known. Each of the aforementioned films is generally formed by vacuum deposition, CVD, sputtering, or the like.

  For example, Patent Document 1 (Japanese Patent Laid-Open No. 5-182192) discloses a sputtering apparatus for forming a protective film as a thin film on a metal magnetic thin film such as a vapor deposition tape.

  This sputtering apparatus includes a vacuum chamber and a transport roll provided in the vacuum chamber so as to be rotatable around its central axis. A conveyance roll conveys the film base material wound by the outer peripheral surface by rotating around the central axis.

  The inside of the vacuum chamber is divided into a first chamber and a second chamber by a partition plate. The transport roll is provided so as to straddle the first chamber and the second chamber, and the outer peripheral surface thereof faces each of the first chamber and the second chamber. A vacuum exhaust unit is provided in each of the first chamber and the second chamber.

  The first chamber is provided with a supply roll for supplying the film base to the transport roll, and a take-up roll for winding up the film base fed after being fed to the transport roll. It has been. Further, the first chamber has a guide roll for guiding the film base fed from the supply roll to the transport roll, and a guide roll for guiding the film base fed from the transport roll to the take-up roll. Is provided.

  On the other hand, a target, which is a thin film material, is provided in the second chamber so as to face the transport roll. And in the 2nd chamber, the can mask is arrange | positioned in the position by the side of the target of each both-ends edge of a conveyance roll. Further, a mask having an opening for defining a deposition region of flying particles (thin film material) based on sputtering is arranged on the target side of the can mask.

  In such a sputtering apparatus, when the flying particles from the target are deposited on the film substrate, the flying particles are deposited on the film substrate by the above-described can mask and the mask disposed on the target side of the above-described mask. Adhesion to a region other than the region can be suppressed.

JP-A-5-182192

  However, in the sputtering apparatus disclosed in Patent Document 1, since a space exists between the transport roll and the can mask, the flying particles enter the space and the flying particles accumulate on the transport roll. There is. In this case, after a thin film is formed on a film substrate having a small width by the sputtering apparatus, when a film substrate having a width larger than the film substrate having a small width is wound around a transport roll, the film having a large width. The substrate comes into contact with flying particles deposited on the transport roll. Thereby, there exists a possibility that a crack may arise in the film base material with the said width | variety.

  The present invention has been created based on the above findings. The object of the present invention is to prevent the thin film material such as flying particles from being deposited on the transport roll, so that even if the thin film is formed on a film base having a different width, the film base is scratched. It is an object of the present invention to provide a thin film forming apparatus capable of reliably preventing the occurrence of the above.

  The present invention is provided so as to be rotatable around its central axis, and transports a film substrate wound around its outer peripheral surface by rotating around the central axis, and wound around the transport roll. The thin film material supply device for supplying a thin film material for forming a thin film toward the film base in the state of being formed, and the film base is wound as viewed in the axial direction of the outer peripheral surface of the transport roll A thin film forming apparatus comprising: a mask member that is detachably fixed to each region adjacent to both sides of the wound region.

  According to the present invention, the mask member is removably fixed to each region adjacent to both sides of the winding region of the transport roll on which the film base material is wound, and is supplied from the thin film material supply device. A thin film material such as flying particles is not deposited on the area of the transport roll where the mask member is fixed. Therefore, after that, the mask member was removed from the transport roll and resized, and even when a wide film base material was wound around the transport roll, the wide film base material was deposited on the transport roll. There is no contact with the thin film material. That is, by reliably preventing thin film materials such as flying particles from being deposited on the transport roll, the film base material may be scratched even when a thin film is formed on a film base material having a different width. Can be reliably prevented.

  The mask member is formed to have a cylindrical portion, for example. In this case, it is preferable that an end portion of the cylindrical portion of the mask member on the winding region side is formed in a tapered shape whose diameter increases as the distance from the winding region side increases along the axial direction. In this case, even if the film base material is thermally expanded, the film base material smoothly runs over the edge of the mask member. It is possible to prevent wrinkles from occurring.

  The mask member may be fixed to the transport roll by a fastening member. The mask member may be fixed to the transport roll with an adhesive material.

  Further, the present invention is provided so as to be rotatable around the central axis thereof, and is provided on the conveying roll for conveying the film base material wound around the outer peripheral surface thereof by rotating around the central axis. A thin film material supply device that supplies a thin film material for forming a thin film toward the film base in a wound state, and is disposed on the outer peripheral side of the transport roll, And a mask material application device for continuously applying a mask material to each region adjacent to both sides of each of the winding regions around which the film base material is wound as viewed in the axial direction. A thin film forming apparatus.

  According to the present invention, the mask material is continuously applied to each region adjacent to both sides of the winding region of the transport roll on which the film base material is wound by the mask material application device, thereby providing a thin film material supply device. The thin film material supplied from is not deposited in the area of the transport roll where the mask material is applied. Therefore, after that, the mask material is removed from the transport roll, the size is changed, and the wide film base material is wound on the transport roll even if the wide film base material is wound around the transport roll. There is no contact with the thin film material. That is, by reliably preventing thin film materials such as flying particles from being deposited on the transport roll, the film base material may be scratched even when a thin film is formed on a film base material having a different width. Can be reliably prevented.

  Preferably, the mask material applicator is disposed at a position upstream of the position where the thin film material is supplied from the thin film material supply device when viewed in the rotation direction of the transport roll, and the outer peripheral side of the transport roll In contact with the respective regions adjacent to both sides of the winding region at a position downstream of the position where the thin film material is supplied from the thin film material supply device as viewed in the rotation direction of the transport roll. A mask material removing device for removing the mask material applied by the mask material applying device is disposed.

  In this case, the mask material applied by the mask material application device and deposited with the thin film material is removed by the mask material removal device, and a new mask material is applied to the area of the transport roll from which the mask material has been removed. This prevents the periphery of the mask material from being contaminated by the deposition of the thin film material on the mask material.

  According to the present invention, even when a thin film is formed on a film base having a different width by reliably preventing a thin film material such as flying particles from being deposited on the transport roll, the film base is scratched. Can be reliably prevented.

It is a schematic block diagram of the thin film forming apparatus of the 1st Embodiment of this invention. It is a perspective view of the conveyance roll and mask member which were provided in the thin film forming apparatus shown in FIG. It is a schematic sectional drawing of the conveyance roll and mask member which were provided in the thin film forming apparatus shown in FIG. It is a principal part enlarged view of FIG. It is a schematic sectional drawing of the conveyance roll and mask member which were provided in the thin film forming apparatus of the 2nd Embodiment of this invention. It is a schematic block diagram of the thin film forming apparatus of the 3rd Embodiment of this invention. It is a perspective view of the conveyance roll and mask member which were provided in the thin film forming apparatus shown in FIG. It is a principal part enlarged view of the thin film forming apparatus shown in FIG.

  Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.

(First embodiment)
FIG. 1 is a schematic configuration diagram of a thin film forming apparatus 1 according to a first embodiment of the present invention. In the present embodiment, an example in which the thin film forming apparatus 1 is configured as a vacuum deposition apparatus will be described, but the thin film forming apparatus of the present invention may be configured as a sputtering apparatus or a CVD apparatus. .

  As shown in FIG. 1, the thin film forming apparatus 1 according to the present embodiment includes a vacuum chamber 2 and a transport roll 10 provided in the vacuum chamber 2 so as to be rotatable around the central axis C <b> 1. Yes. The transport roll 10 is configured to transport a film substrate W that is fed out from a supply roll 11 described later and wound around the outer peripheral surface thereof by rotating around the central axis C1.

  The transport roll 10 has a shaft portion 10A that protrudes from both ends in the axial direction, and is rotatably supported by the wall portion of the vacuum chamber 2 by the shaft portion 10A. In FIG. 1, an arrow α indicates the rotation direction of the transport roll 10. Since the transport roll 10 is exposed to a high temperature atmosphere during the vacuum deposition process, the transport roll 10 is formed of a metal material such as a stainless material or an aluminum material having excellent heat resistance. Moreover, in order to improve the abrasion resistance regarding the film base material W wound, surface treatment may be given to the outer peripheral surface of the conveyance roll 10.

  The inside of the vacuum chamber 1 is divided into an upper first chamber 2A and a lower second chamber 2B by a partition plate 3, and in this embodiment, a transport roll 10 is provided in the second chamber 2B. ing. Vacuum exhaust pumps 4A and 4B are provided in the first chamber 2A and the second chamber 2B, respectively. The evacuation pumps 4A and 4B are configured to exhaust the air in the first chamber 2A or the second chamber 2B through a pipe (not shown).

  In the first chamber 2A, a supply roll 11 for supplying the film base W to the transport roll 10 and a film base W fed out after being fed to the transport roll 10 and wound up are wound up. A winding roll 12 is provided. The film substrate W is a light-transmitting film such as polyethylene (PE), polyethylene terephthalate (PET), polyethersulfone (PES), polyethylene naphthalate (PEN).

  In the present embodiment, openings 3 </ b> A and 3 </ b> B are formed in the partition plate 3. A supply-side guide roll 13 for guiding the film base W fed from the supply roll 11 to the transport roll 10 is disposed in the opening 3A. A winding-side guide roll 14 for guiding the film base W fed from the transport roll 10 to the winding roll 12 is disposed in the opening 3B. Thereby, in this Embodiment, the film base material W is supplied one by one to the conveyance roll 10 from the supply roll 11 through the supply side guide roll 13, and after that, it winds up from the conveyance roll 10 through the winding side guide roll 14 12, the film base W is wound up sequentially.

  On the other hand, the second chamber 2 </ b> B is provided with a thin film material supply device 20 that supplies a thin film material for forming a thin film toward the film substrate W wound around the transport roll 10. In the present embodiment, since the thin film forming apparatus 1 is a vacuum vapor deposition apparatus, the thin film material supply apparatus 20 supplies the thin film material to the film substrate W in a state where the thin film material is heated and evaporated. The thin film material in this case is, for example, indium tin oxide (ITO), zinc oxide (ZnO), or the like.

  FIG. 2 is a perspective view of the transport roll 10 and the mask member 30 provided in the thin film forming apparatus 1, and FIG. 3 is a schematic cross-sectional view of the transport roll 10 and the mask member 30.

  As shown in FIGS. 2 and 3, the thin film forming apparatus 1 according to the present embodiment has the film base W wound around the outer peripheral surface of the transport roll 10 as viewed in the axial direction (C1 direction in FIG. 2). Each of the regions A2 and A3 adjacent to both sides of the wound region A1 is provided with a mask member 30 that is detachably fixed.

  In the present embodiment, each mask member 30 is formed to have a cylindrical portion. More specifically, the mask member 30 includes a cylindrical main body 30A that covers the area A2 or the area A3 in contact with the gap A2, and a covering that extends radially inward from one end of the cylindrical main body 30A and covers the end of the transport roll 10. Part 30B.

  As shown in FIG. 3, in the present embodiment, the mask member 30 is relative to the transport roll 10 by fixing a fastening member 31 such as a bolt that penetrates the cylindrical main body 30 </ b> A to the transport roll 10. It is fixed so that it cannot rotate. However, in addition to or instead of fixing the mask member 30 to the transport roll 10 by the fastening member 31 penetrating the cylindrical main body 30A, the mask member 30 is transported by the fastening member 31 penetrating the covering portion 30B. It may be fixed to the roll 10.

  In the present embodiment, the mask member 30 can move relative to the transport roll 10 in the C1 direction when the fastening member 31 is removed or loosened. Then, the position of the mask member 30 can be changed within a predetermined range in the C1 direction when the fastening member 31 is removed or loosened, and thereafter, the mask member 30 is re-fixed to the transport roll 10 by the fastening member 31. To be able to be. Specifically, for example, a long hole in the C1 direction is formed in the cylindrical main body 30A of the mask member 30, and the fastening member 31 passed through the long hole can be fixed and loosened with respect to the transport roll 10. As a result, the position of the mask member 30 can be changed within the dimension range of the elongated hole in the C1 direction, and then can be re-fixed to the transport roll 10. In this case, the mask member 30 can be moved relative to the transport roll 10 in the C1 direction, that is, the position thereof can be changed by removing or loosening the fastening member 31, and therefore the mask member 30 can be changed in accordance with the width of the film substrate W. Fine adjustment of the position is possible. Thereby, it is not necessary to prepare many different mask members 30, and it is possible to cope with different widths of the film substrate W by one mask member 30.

  Next, FIG. 4 is an enlarged view of the main part of FIG. 3, and shows an end 30 </ b> C on the winding area A <b> 1 side of the cylindrical main body 30 </ b> A of the mask member 30. As shown in FIG. 4, in the present embodiment, the diameter of the end 30C on the winding area A1 side of the cylindrical main body 30A of the mask member 30 increases as the distance from the winding area A1 increases along the axial direction. It is formed in a taper shape. In this case, even if the film base W is thermally expanded, the film base W smoothly runs on the end 30C as shown by a two-dot chain line in FIG.

  The mask member 30 is formed of a material that is not deformed or deteriorated in a high-temperature atmosphere when forming a thin film. In the present embodiment, mask member 30 is formed of a metal material such as a stainless material. However, the mask member 30 is also preferably formed of a polymer material such as polyimide. Stainless steel is excellent in plasma resistance and plasma stability (plasma is stabilized), and polyimide has relatively high plasma stability. Therefore, even when the thin film forming apparatus is configured as a plasma CVD apparatus, Suitable as a material. As for the fastening member 31, similarly to the mask member 30, a metal material such as a stainless material or a polymer material such as polyimide is suitable.

  Further, although a thin film material is deposited on the mask member 30 when the thin film is formed, it is preferable that the deposited thin film material is not peeled off. Therefore, a Cr film or the like is formed on the surface of the mask member 30 of the present embodiment in order to prevent peeling of the thin film material. However, it is also preferable that the mask member 30 has an uneven shape.

  Next, the operation of the thin film forming apparatus 1 of the present embodiment will be described.

  When a thin film is formed on the film substrate W by the thin film forming apparatus 1, first, as shown in FIG. 2, the mask members 30 are attached to the regions A2 and A3 of the transport roll 10, respectively.

  Next, the film substrate W is wound around the winding area A1 located between the areas A2 and A3 where the two mask members 30 are installed. At this time, the film base W is wound so that no gap is generated between the end of the film base W and the end of the mask member 30 (end 30C of the cylindrical main body 30A). Here, as shown by a two-dot chain line in FIG. 4, the film member W may be wound in a state of riding on the end portion of the mask member 30.

  Next, the evacuation pumps 4A and 4B are driven, so that the first chamber 2A and the second chamber 2B are each in a vacuum state.

  Thereafter, the transport roll 10 starts rotating, and the thin film material is supplied from the thin film material supply device 20 to the film substrate W. As a result, thin films are sequentially formed on the film substrate W.

  Then, after the desired thin film is formed on the film base W, when the width of the film base W is changed, the mask member 30 is removed from the transport roll 10 and the size is changed.

  According to the thin film forming apparatus 1 of the present embodiment as described above, each of the regions A2 and A3 adjacent to both sides of the winding region A1 of the transport roll 10 around which the film base W is wound can be detached. When the mask member 30 is fixed, the thin film material supplied from the thin film material supply device 20 does not accumulate in the region of the transport roll 10 where the mask member 30 is fixed. Therefore, even if the mask member 30 is subsequently removed from the transport roll 10 and the size is changed, and the film base having a width larger than the original film base W is wound around the transport roll 10, the width is large. The film substrate does not come into contact with the thin film material deposited on the transport roll 10.

  In this way, since the thin film material is reliably prevented from being deposited on the transport roll 10, it is ensured that the film base material is scratched even when the thin film is formed on the film base material having a different width. Can be prevented.

  Moreover, according to the thin film forming apparatus 1 of the present embodiment, there is no gap between the mask member 30 and the outer peripheral surface of the transport roll 10. This feature also has an effect that abnormal discharge due to plasma hardly occurs when a process using plasma such as plasma CVD is employed instead of the vacuum deposition process.

  Further, in the thin film forming apparatus 1 according to the present embodiment, as the end of the mask member 30 on the winding area A1 side (the end 30C of the cylindrical body 30A) moves away from the winding area A1 along the axial direction. It is formed in a tapered shape that expands in diameter. Thereby, even if the film base material W is thermally expanded, the film base material W rides smoothly on the end portion of the mask member 30 (end portion 30C of the cylindrical main body portion 30A). For this reason, it is possible to prevent the film base material W from interfering with the end portion of the mask member 30 so that stress is generated in the film base material W and wrinkles are generated.

(Second Embodiment)
FIG. 5 is a schematic cross-sectional view of a transport roll and a mask member provided in the thin film forming apparatus according to the second embodiment of the present invention. In the present embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

  As shown in FIG. 5, in the present embodiment, a mask member 30 is fixed to the transport roll 10 with an adhesive material 32 instead of the fastening member 31. Specifically, the mask member 30 is fixed to the transport roll 10 by an adhesive material 32 disposed between the inner peripheral surface of the cylindrical main body 30 </ b> A and the outer peripheral surface of the transport roll 10. As the adhesive material 32, an adhesive tape, a coating material, or the like can be used. Also in this embodiment, the same effect as that of the first embodiment can be obtained.

(Third embodiment)
FIG. 6 is a schematic configuration diagram of a thin film forming apparatus according to a third embodiment of the present invention. FIG. 7 is a perspective view of a transport roll and a mask member provided in the thin film forming apparatus shown in FIG. FIG. 8 is an enlarged view of a main part of the thin film forming apparatus shown in FIG. In the present embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

  As shown in FIG. 6, in the thin film forming apparatus 1 ′ of the present embodiment, the positional relationship between the supply roll 11 and the winding roll 12 and the positional relationship between the supply side guide roll 13 and the winding side guide roll 14. However, the positional relationship of the first embodiment is opposite. Thereby, as shown by the arrow β in FIG. 6, the rotation direction of the transport roll 10 is opposite to that in the first embodiment.

  Moreover, as shown in FIGS. 6 and 7, the thin film forming apparatus 1 ′ is disposed on the outer peripheral side of the transport roll 10, and the film base W is viewed in the axial direction on the outer peripheral surface of the transport roll 10. Is provided with a mask material application device 40 for continuously applying the mask material M to each of the areas A2 and A3 adjacent to both sides of the winding area A1. The mask material application device 40 is located upstream of the position where the thin film material is supplied from the thin film material supply device 20 as viewed in the rotation direction of the transport roll 10 (arrow β direction), that is, the upper right of the central axis C1 in FIG. It is arranged on the side.

  As shown in FIGS. 7 and 8, in the present embodiment, the mask material application device 40 receives an injection device 41 for injecting the mask material M and the mask material M injected from the injection device 41 on its outer peripheral surface. A coating roll 42, a coating roll 43 that contacts the coating roll 42 and receives the mask material M received by the coating roll 42 at the outer peripheral surface thereof, and applies the received mask material M to the transport roll 10; ,have.

  When the thin film is formed by the thin film forming apparatus 1 ′, the spray device 41 is supplied with the mask material M through a pipe (not shown), and continuously sprays the mask material M onto the coating roll 42. The mask material M is a fluorine-based oil having a low vapor pressure even in a vacuum. As the oil of the mask material M, for example, Fomblin oil (such as Y-VAC2 for high vacuum manufactured by Canon Anelva Co., Ltd.) can be used. Further, the center axis of the coating roll 42 and the coating roll 43 are arranged in parallel to the center axis C <b> 1 of the transport roll 10. In addition, the injection device 41, the coating roll 42, and the application roll 43 are arrange | positioned according to the width | variety of the film base material W so that the axial direction position of the conveyance roll 10 can be adjusted.

  Further, in the present embodiment, the position on the outer peripheral side of the transport roll 10 and downstream of the position where the thin film material is supplied from the thin film material supply device 20 as viewed in the rotation direction of the transport roll 10, that is, FIG. The mask material removing device 50 is disposed on the upper left side of the central axis C1 in FIG. 5, and the mask material removing device 50 contacts the areas A2 and A3 and removes the mask material M applied by the mask material applying device 40.

  As shown in FIG. 8, the mask material removing apparatus 50 according to the present embodiment includes a mask material recovery bar 51 such as a doctor blade, and a mask material receiving portion 52 that recovers the mask material recovered by the mask material recovery bar 51. And have.

  Other configurations of the present embodiment are the same as those of the first embodiment described above.

  When a thin film is formed on the film substrate W by the thin film forming apparatus 1 ′ of this embodiment, first, the film substrate W is wound around the winding region A <b> 1.

  Next, the evacuation pumps 4A and 4B are driven, so that the first chamber 2A and the second chamber 2B are each in a vacuum state.

  Thereafter, the transport roll 10 starts rotating, and the thin film material is supplied from the thin film material supply device 20 to the film substrate W. As a result, thin films are sequentially formed on the film substrate W.

  Here, when the transport roll 10 rotates, the coating roll 43 rotates, and when the coating roll 43 rotates, the coating roll 42 rotates. Thereby, the application roll 43 continuously receives the mask material M received by the coating roll 42 on the outer peripheral surface thereof, and continuously applies the received mask material M to the transport roll 10. Thereafter, the mask material M applied to the transport roll 10 is removed by the mask material removing device 50, and a new mask material M is applied to the regions A2 and A3 of the transport roll 20 from which the mask material M has been removed. .

  Then, after the desired thin film is formed on the film substrate W, when the width of the film substrate W is changed, the mask material M is removed from the transport roll 10, and a new film substrate is formed. According to the width, the axial position of the transport roll 10 of the spray device 41, the coating roll 42, and the coating roll 43 is adjusted.

  According to the thin film forming apparatus 1 ′ of the present embodiment as described above, each area adjacent to both sides of the winding area A1 of the transport roll 10 on which the film base W is wound by the mask material coating apparatus 40. By continuously applying the mask material M to A2 and A3, the thin film material supplied from the thin film material supply device 20 is not deposited in the region of the transport roll 10 where the mask material M is applied. Therefore, even if the mask material M is subsequently removed from the transport roll 10 and the size is changed, and the film base having a width larger than the original film base W is wound around the transport roll 10, the width is large. The film substrate does not come into contact with the thin film material deposited on the transport roll 10.

  In this way, since the thin film material is reliably prevented from being deposited on the transport roll 10, it is ensured that the film base material is scratched even when the thin film is formed on the film base material having a different width. Can be prevented.

  Further, in the thin film forming apparatus 1 ′ of the present embodiment, the mask material M applied by the mask material applying apparatus 40 and deposited with the thin film material is removed by the mask material removing apparatus 50, and the mask material M is removed. A new mask material M is applied to the areas A2 and A3 of the transport roll 20. Thereby, the periphery of the mask material M is not contaminated by the continuous deposition of the thin film material on the mask material M.

  In each of the above embodiments, the thin film forming apparatus 1 is a vacuum vapor deposition apparatus, but the thin film forming apparatus of the present invention may be configured as a sputtering apparatus. In this case, the thin film material supply device is configured as a target for supplying the thin film material by collision of ions. Moreover, the thin film forming apparatus of the present invention may be configured as a CVD apparatus.

DESCRIPTION OF SYMBOLS 1 Thin film forming apparatus 2 Vacuum chamber 2A 1st chamber 2B 2nd chamber 3 Partition plate 3A, 3B Opening 4A, 4B Vacuum exhaust pump 10 Conveyance roll 10A Shaft part 11 Supply roll 12 Winding roll 13 Supply side guide roll 14 Winding side Guide roll 20 Thin film material supply device 30 Mask member 30A Cylindrical body portion 30B Cover portion 31 Fastening member 40 Mask material application device 41 Injection device 42 Coating roll 43 Application roll 50 Mask material removal device 51 Mask material recovery bar 52 Mask material receiving portion C1 Center axis W Film base M Mask material

Claims (7)

A transport roll that is rotatably provided around the central axis, and that transports the film substrate wound around the outer peripheral surface by rotating around the central axis;
A thin film material supply device for supplying a thin film material for forming a thin film toward the film substrate wound around the transport roll;
A mask member detachably fixed to each region adjacent to both sides of the winding region around which the film base material is wound, as seen in the axial direction, of the outer peripheral surface of the transport roll. A thin film forming apparatus. The thin film forming apparatus according to claim 1, wherein the mask member has a cylindrical portion. The end of the cylindrical portion of the mask member on the side of the winding region is formed in a taper shape that increases in diameter as the distance from the winding region increases along the axial direction. The thin film forming apparatus described. The thin film forming apparatus according to claim 1, wherein the mask member is fixed to the transport roll by a fastening member. The thin film forming apparatus according to claim 1, wherein the mask member is fixed to the transport roll with an adhesive material. A transport roll that is rotatably provided around the central axis, and that transports the film substrate wound around the outer peripheral surface by rotating around the central axis;
A thin film material supply device for supplying a thin film material for forming a thin film toward the film substrate wound around the transport roll;
A mask material that is disposed on the outer peripheral side of the transport roll and is adjacent to each side of each of the winding regions on which the film base material is wound, as viewed in the axial direction, on the outer peripheral surface of the transport roll. A thin film forming apparatus comprising: a mask material coating apparatus that continuously coats a mask material. The mask material application device is disposed at a position upstream of the position where the thin film material is supplied from the thin film material supply device as viewed in the rotation direction of the transport roll,
The outer peripheral side of the transport roll is adjacent to each of both sides of the winding region at a position downstream of the position where the thin film material supply device is supplied as viewed in the rotation direction of the transport roll. The thin film forming apparatus according to claim 6, wherein a mask material removing device that contacts each region and removes the mask material applied by the mask material applying device is arranged.

Images