JP2015168880A5 - Crucible - Google Patents
Crucible Download PDFInfo
- Publication number
- JP2015168880A5 JP2015168880A5 JP2014047207A JP2014047207A JP2015168880A5 JP 2015168880 A5 JP2015168880 A5 JP 2015168880A5 JP 2014047207 A JP2014047207 A JP 2014047207A JP 2014047207 A JP2014047207 A JP 2014047207A JP 2015168880 A5 JP2015168880 A5 JP 2015168880A5
- Authority
- JP
- Japan
- Prior art keywords
- lid
- metal
- film
- cylindrical cell
- deposition material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052751 metal Inorganic materials 0.000 claims 8
- 239000002184 metal Substances 0.000 claims 8
- 239000000463 material Substances 0.000 claims 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 238000007740 vapor deposition Methods 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 230000009257 reactivity Effects 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
Claims (4)
前記筒状セルは、蒸着材料を収納することができ、
前記蓋は、前記蒸着材料を噴出することができる開口部を有し、
前記筒状セル及び前記蓋は、金属と前記金属を覆うように内壁に設けられた第１の膜との２層構造であり、
前記第１の膜は、前記金属に比べて酸素又は窒素との反応性が低い材料を有することを特徴とするるつぼ。 A cylindrical cell and a lid,
The cylindrical cell can store a vapor deposition material,
The lid has an opening through which the vapor deposition material can be ejected,
The cylindrical cell and the lid have a two-layer structure of a metal and a first film provided on an inner wall so as to cover the metal,
The first film, crucible characterized in that it has a low reactivity material with oxygen or nitrogen than the metal.
前記筒状セルは、蒸着材料を収納することができ、
前記蓋は、前記蒸着材料を噴出することができる第１の開口部を有し、
前記中蓋は、前記蒸着材料を噴出することができる複数の第２の開口部を有し、
前記筒状セル、前記蓋、及び前記中蓋は、金属と第１の膜との２層構造であり、
前記筒状セル及び前記蓋において、前記第１の膜は、内壁側に前記金属を覆うように設けられ、
前記中蓋において、前記第１の膜は、前記金属の全表面を覆うように設けられ、
前記第１の膜は、前記金属に比べて酸素又は窒素との反応性が低い材料を有することを特徴とするるつぼ。 A cylindrical cell, a lid, and an inner lid;
The cylindrical cell can store a vapor deposition material,
The lid has a first opening through which the deposition material can be ejected,
The inner lid has a plurality of second openings through which the vapor deposition material can be ejected,
The cylindrical cell, the lid, and the inner lid have a two-layer structure of a metal and a first film,
In the cylindrical cell and the lid, the first film is provided on the inner wall side so as to cover the metal,
In the inner lid, the first film is provided so as to cover the entire surface of the metal,
The first film, crucible characterized in that it has a low reactivity material with oxygen or nitrogen than the metal.
前記金属は、チタンであることを特徴とするるつぼ。 In claim 1 or 2,
The crucible, wherein the metal is titanium.
前記第１の膜は、酸化アルミニウムを有することを特徴とするるつぼ。 In any one of Claims 1 thru | or 3,
The first film, crucible characterized in that it has an aluminum oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014047207A JP2015168880A (en) | 2014-03-11 | 2014-03-11 | crucible and vapor deposition apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014047207A JP2015168880A (en) | 2014-03-11 | 2014-03-11 | crucible and vapor deposition apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015168880A JP2015168880A (en) | 2015-09-28 |
| JP2015168880A5 true JP2015168880A5 (en) | 2017-04-13 |
Family
ID=54201895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014047207A Withdrawn JP2015168880A (en) | 2014-03-11 | 2014-03-11 | crucible and vapor deposition apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2015168880A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109972096B (en) * | 2017-12-28 | 2021-04-13 | 核工业西南物理研究院 | Method for depositing metal coating on surface of material boat |
| WO2020049608A1 (en) * | 2018-09-03 | 2020-03-12 | シャープ株式会社 | Deposition apparatus and production method |
| FR3088078B1 (en) * | 2018-11-06 | 2021-02-26 | Riber | EVAPORATION DEVICE FOR VACUUM EVAPORATION SYSTEM, APPARATUS AND METHOD FOR DEPOSITING A FILM OF MATERIAL |
| WO2020178924A1 (en) * | 2019-03-01 | 2020-09-10 | シャープ株式会社 | Vapor deposition device and display apparatus manufacturing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07157868A (en) * | 1993-12-03 | 1995-06-20 | Canon Inc | Resistance-heated vaporization source and formation of thin film |
| JP4439894B2 (en) * | 2003-12-01 | 2010-03-24 | 株式会社半導体エネルギー研究所 | Vapor deposition crucible and vapor deposition apparatus |
| JP5798452B2 (en) * | 2011-11-16 | 2015-10-21 | 株式会社半導体エネルギー研究所 | Evaporation source |
| JP5921955B2 (en) * | 2012-05-25 | 2016-05-24 | 株式会社半導体エネルギー研究所 | Method for producing crucible for vapor deposition |
-
2014
- 2014-03-11 JP JP2014047207A patent/JP2015168880A/en not_active Withdrawn
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