JP2015160764A - Heating regeneration treatment apparatus and treatment method for waste gypsum - Google Patents

Heating regeneration treatment apparatus and treatment method for waste gypsum Download PDF

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JP2015160764A
JP2015160764A JP2014035744A JP2014035744A JP2015160764A JP 2015160764 A JP2015160764 A JP 2015160764A JP 2014035744 A JP2014035744 A JP 2014035744A JP 2014035744 A JP2014035744 A JP 2014035744A JP 2015160764 A JP2015160764 A JP 2015160764A
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gypsum
kiln
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regeneration
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JP6253095B2 (en
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秀人 蓬莱
Hideto Horai
秀人 蓬莱
沙織 米田
Saori Yoneda
沙織 米田
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Nikko Co Ltd
Nikko KK
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Abstract

PROBLEM TO BE SOLVED: To provide a heating regeneration treatment apparatus for waste gypsum which is capable of a heating regeneration treatment to obtain both hemihydrate gypsum and II-type anhydrous gypsum appropriately from waste gypsum in a state of dihydrate gypsum state.SOLUTION: In a heating regeneration treatment apparatus for waste gypsum, a kiln 2 for anhydrous gypsum regeneration which heat-treats waste gypsum to regenerate to II-type anhydrous gypsum and a kiln 3 for hemihydrate gypsum regeneration which regenerates to hemihydrate gypsum are arranged in series and connected together. The kiln 2 for anhydrous gypsum regeneration is provided with a burner 12 for supply of hot air and a hemihydrate gypsum charge part 13 in one end part and with an anhydrous gypsum discharge part 14 in the other end part, and the kiln 3 for hemihydrate gypsum regeneration is provided with a waste gypsum charge part 15 in one end part and with the hemihydrate gypsum discharge part 17 in the other end. On the lower side of the hemihydrate gypsum discharge part 17, there are provided dampers 36 and 37 serving as discharge destination switching means capable of switching the discharge destination between a storage bottle and the hemihydrate gypsum charge part 13 of the kiln 2 for anhydrous gypsum generation.

Description

本発明は、建築廃材である廃石膏ボードを破砕・分別処理して得られる二水石膏の状態にある廃石膏を加熱処理して無水石膏、または半水石膏として再生する廃石膏の加熱再生処理装置に関する。   The present invention is a heat regeneration treatment of waste gypsum which is regenerated as anhydrous gypsum or hemihydrate gypsum by heat treatment of waste gypsum in the state of dihydrate gypsum obtained by crushing and separating waste gypsum board which is building waste material Relates to the device.

従来、建築物の解体などに伴って多量に発生する廃石膏ボードは、その大半が埋め立てなどによって廃棄処分されていたが、廃棄物処理法の改正によって廃石膏ボードが安定型産業廃棄物から管理型産業廃棄物へ移行したことに伴う処理コストの高騰や、埋め立て処分場の不足、資源の有効活用という観点からも、廃石膏ボードから石膏を分離回収して再利用することが望まれている。   Conventionally, most of the waste gypsum board that is generated in large quantities due to the dismantling of buildings has been disposed of by landfill, etc., but the waste gypsum board is managed from stable industrial waste by the revision of the Waste Disposal Law. From the viewpoints of soaring treatment costs due to the shift to industrial waste, lack of landfill sites, and effective use of resources, it is desirable to separate and recover gypsum from waste gypsum board .

ところで、石膏は結晶水の相違により二水石膏(CaSO・2HO)、半水石膏(CaSO・1/2HO)、及び無水石膏(CaSO)の三種類におおよそ分類され、二水石膏を約130〜180℃程度に加熱すれば半水石膏に転位し、更に約350〜800℃程度に加熱するとII型の無水石膏に転位することが判明している。なお、半水石膏に加水処理を行うと速やかに水和反応が進んで二水石膏に転位して短時間で硬化するため、例えば土壌固化材などとして有効に再利用できると考えられる一方、比較的ゆっくりと硬化するII型無水石膏は、例えばセメントの原材料などとして再利用できる可能性を有している。 By the way, gypsum is roughly classified into three types, dihydrate gypsum (CaSO 4 · 2H 2 O), hemihydrate gypsum (CaSO 4 · 1 / 2H 2 O), and anhydrous gypsum (CaSO 4 ), depending on the difference in crystal water. It has been found that when dihydrate gypsum is heated to about 130 to 180 ° C., it is rearranged to hemihydrate gypsum, and further heated to about 350 to 800 ° C., it is rearranged to type II anhydrous gypsum. In addition, when hydration treatment is performed on hemihydrate gypsum, the hydration reaction proceeds quickly, and it is transferred to dihydrate gypsum and hardens in a short time. Type II anhydrous gypsum that cures slowly has the potential to be reused, for example, as a raw material for cement.

石膏ボードなどの石膏は二水石膏の状態にあり、これに加水処理を行っても水和反応は起こらず硬化するようなことはないが、加熱処理によって半水石膏やII型無水石膏の状態に転位させれば上記のような再利用の用途が広がると考えられ、例えば、本出願人も特許文献1(特許第5081379号公報)や特許文献2(特許第5081396号公報)にて開示しているように、回収した廃石膏を内周部に複数の掻き上げ羽根を周設したロータリーキルンに投入し、該キルン内を転動流下させながらバーナからの熱風に晒すことで効率よく加熱処理し、半水石膏として再生する再生処理装置を提案している。   Gypsum such as gypsum board is in the form of dihydrate gypsum, and even if it is subjected to water treatment, hydration reaction will not occur and it will not harden, but heat treatment will cause hemihydrate gypsum and type II anhydrous gypsum It is considered that the applications of reuse as described above will be expanded if it is rearranged, for example, the present applicant also disclosed in Patent Document 1 (Patent No. 5081379) and Patent Document 2 (Patent No. 5081396). As shown in the figure, the collected waste gypsum is put into a rotary kiln with a plurality of scraping blades around the inner periphery, and exposed to the hot air from the burner while rolling down the kiln. A reprocessing device that regenerates as hemihydrate gypsum is proposed.

特許第5081379号公報Japanese Patent No. 5081379 特許第5081396号公報Japanese Patent No. 5081396

ところで、上記従来装置は何れも二水石膏の状態にある廃石膏を専ら半水石膏として再生する装置であるが、半水石膏とII型無水石膏の両方を再生可能な兼用の装置となれば、需要に応じて何れかを選択的に再生するといったこともできてより使い勝手のよい装置となる。しかしながら、二水石膏が半水石膏に転位する温度と、II型無水石膏に転位する温度とは大きな差があるため、両方の石膏を不具合なく適当に加熱処理して再生するには何らかの工夫が必要となる。例えば、上記従来装置においては、加熱効率を高めるためにキルン内に多数の掻き上げ羽根を周設しているが、II型無水石膏に再生しようとすれば比較的高温での加熱処理を要するため、前記掻き上げ羽根に代えて耐熱性のキャスター等での保護が必須となり、そうすると加熱効率の低下を招いてエネルギーロスが大きくなる懸念がある。   By the way, each of the above conventional devices is a device that regenerates waste gypsum in the form of dihydrate gypsum exclusively as hemihydrate gypsum, but if it becomes a combined device that can regenerate both hemihydrate gypsum and type II anhydrous gypsum Any one of them can be selectively reproduced according to demand, and the apparatus becomes more convenient. However, there is a big difference between the temperature at which dihydrate gypsum rearranges into hemihydrate gypsum and the temperature at which it rearranges into type II anhydrous gypsum. Necessary. For example, in the above-mentioned conventional apparatus, a number of scraping blades are provided in the kiln in order to increase the heating efficiency, but if it is to be regenerated to type II anhydrous gypsum, a heat treatment at a relatively high temperature is required. Further, protection with a heat-resistant caster or the like is essential instead of the scraping blade, and there is a concern that the heating efficiency is lowered and the energy loss is increased.

本発明は上記の点に鑑み、二水石膏の状態にある廃石膏から半水石膏とII型無水石膏の両方を適当に加熱再生処理可能な廃石膏の加熱再生処理装置を提供することを課題とする。   In view of the above points, the present invention is to provide a heat regeneration treatment apparatus for waste gypsum that can appropriately heat and regenerate both hemihydrate gypsum and type II anhydrous gypsum from waste gypsum in the form of dihydrate gypsum. And

上記課題を解決するために、本発明に係る請求項1記載の廃石膏の加熱再生処理装置では、廃石膏ボードを破砕・分別処理して得られる二水石膏の状態にある廃石膏を加熱処理してII型無水石膏または半水石膏として再生する廃石膏の加熱再生処理装置であって、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルンと、半水石膏に再生する半水石膏再生用キルンとを直列に配置して連結し、前記無水石膏再生用キルンの一端部には熱風供給用のバーナと半水石膏投入用の半水石膏投入部とを、他端部には加熱処理したII型無水石膏排出用の無水石膏排出部をそれぞれ備える一方、前記半水石膏再生用キルンの一端部には廃石膏投入用の廃石膏投入部を、他端部には加熱処理した半水石膏排出用の半水石膏排出部をそれぞれ備えると共に、該半水石膏排出部の下位には半水石膏の排出先を半水石膏貯蔵用の貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えたことを特徴としている。   In order to solve the above-mentioned problems, the waste gypsum heat regeneration treatment apparatus according to claim 1 according to the present invention heat-treats waste gypsum in the state of dihydrate gypsum obtained by crushing and separating waste gypsum board. Recycled waste gypsum heat regeneration equipment that regenerates as type II anhydrous gypsum or hemihydrate gypsum, and recycles it into hemihydrate gypsum, which is an anhydrous gypsum regeneration kiln that heats waste gypsum to regenerate into type II anhydrous gypsum. A half-water gypsum recycle kiln is connected in series, and one end of the anhydrous gypsum recycle kiln has a burner for supplying hot air and a half-water gypsum throw-in portion for feeding half-water gypsum at the other end. Each part is equipped with a heat-treated type II anhydrous gypsum discharging gypsum discharging part, while one end of the hemihydrate gypsum recycling kiln has a waste gypsum charging part for the other gypsum, Equipped with a semi-water gypsum discharge section for discharging heat-treated half-water gypsum In addition, at the lower part of the hemihydrate gypsum discharge section, the discharge destination switching that can switch the discharge destination of the hemihydrate gypsum to either a storage bin for storing hemihydrate gypsum or a half water gypsum input section of a kiln for regenerating anhydrous gypsum It is characterized by having means.

また、請求項2記載の廃石膏の加熱再生処理装置では、前記無水石膏再生用キルンの内周部には耐熱性のキャスターを周設する一方、半水石膏再生用キルンの内周部には複数の掻き上げ羽根を周設したことを特徴としている。   In the heat treatment apparatus for waste gypsum according to claim 2, a heat-resistant caster is provided around the inner periphery of the anhydrous gypsum regeneration kiln, while It is characterized by a plurality of scraping blades.

また、請求項3記載の廃石膏の加熱再生処理装置では、前記半水石膏再生用キルンの排気ダクト下流に備えた集塵機にて捕集される石膏微粒分の排出先を半水石膏貯蔵用の貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えたことを特徴としている。   The waste gypsum heat regeneration processing apparatus according to claim 3, wherein a discharge destination of gypsum fine particles collected by a dust collector provided downstream of the exhaust duct of the half water gypsum regeneration kiln is used for storing the half water gypsum. Discharge destination switching means that can be switched to either a storage bottle or a half-water gypsum charging part of an anhydrous gypsum regeneration kiln is provided.

また、請求項4記載の廃石膏の加熱再生処理方法では、廃石膏ボードを破砕・分別処理して得られる二水石膏の状態にある廃石膏を加熱処理してII型無水石膏または半水石膏として再生する廃石膏の加熱再生処理方法であって、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルンと、半水石膏に再生する半水石膏再生用キルンとを直列に配置して連結すると共に、前記無水石膏再生用キルンの一端部には熱風供給用のバーナを備え、廃石膏を半水石膏に再生するときには、半水石膏再生用キルン内の温度を廃石膏が半水石膏に転位する温度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を半水石膏再生用キルンに投入し加熱処理して半水石膏として回収する一方、廃石膏をII型無水石膏に再生するときには、無水石膏再生用キルン内の温度を廃石膏がII型無水石膏に転位する温度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を半水石膏再生用キルンに投入して予熱処理した後、無水石膏再生用キルンに投入し加熱処理してII型無水石膏として回収するようにしたことを特徴としている。   Further, in the method for heat regeneration treatment of waste gypsum according to claim 4, type II anhydrous gypsum or hemihydrate gypsum is obtained by heat treating waste gypsum in the form of dihydrate gypsum obtained by crushing and separating waste gypsum board. A waste gypsum heat regeneration treatment method that recycles waste gypsum into a type II anhydrous gypsum and an anhydrous gypsum recycle kiln that regenerates into half water gypsum in series. In addition, the one end of the anhydrous gypsum regeneration kiln is equipped with a hot air supply burner, and when the waste gypsum is regenerated into semi-water gypsum, the temperature in the semi-water gypsum recycle kiln is While controlling the burner combustion amount so that it is maintained at a temperature at which it is rearranged into hemihydrate gypsum, waste gypsum is put into a hemihydrate gypsum kiln and heat treated to recover it as hemihydrate gypsum. When regenerating to type anhydrous gypsum, While controlling the burner combustion amount so that the temperature in the raw kiln is maintained at the temperature at which the waste gypsum is rearranged into type II anhydrous gypsum, the waste gypsum is put into the semi-water gypsum kiln and preheated, It is characterized by being put into an anhydrous gypsum regeneration kiln and heat treated to recover as type II anhydrous gypsum.

本発明に係る請求項1記載の廃石膏の加熱再生処理装置によれば、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルンと、半水石膏に再生する半水石膏再生用キルンとを直列に配置して連結し、前記無水石膏再生用キルンの一端部には熱風供給用のバーナと半水石膏投入部とを、他端部には無水石膏排出部をそれぞれ備える一方、前記半水石膏再生用キルンの一端部には廃石膏投入部を、他端部には半水石膏排出部をそれぞれ備えると共に、該半水石膏排出部の下位には半水石膏の排出先を貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えたので、廃石膏を半水石膏に再生する場合には半水石膏再生用キルンにて加熱処理して回収する一方、II型無水石膏に再生する場合には半水石膏再生用キルンにて加熱処理したものを無水石膏再生用キルンに投入させて再度加熱処理することによりII型無水石膏として回収することができ、需要に応じた石膏を適宜選択して再生することが可能となって使い勝手の良いものとなる。また、II型無水石膏を再生する際には無水石膏再生用キルンから導出される高温の排ガスを半水石膏再生用キルンに導入させることで廃石膏の予熱処理に利用でき、エネルギーの有効活用が可能となる。   According to the waste gypsum heat regeneration treatment apparatus according to claim 1 of the present invention, an anhydrous gypsum regeneration kiln that regenerates waste gypsum to regenerate it into type II anhydrous gypsum, and hemihydrate gypsum that regenerates to hemihydrate gypsum. A regeneration kiln is arranged and connected in series, and one end of the anhydrous gypsum regeneration kiln is provided with a hot air supply burner and a half-water gypsum input part, and the other end is provided with an anhydrous gypsum discharge part. On the other hand, one end of the hemihydrate gypsum regeneration kiln is provided with a waste gypsum charging portion, and the other end is provided with a half water gypsum discharge portion. Discharge destination switching means that can be switched to either a storage bottle or a half-water gypsum input part of an anhydrous gypsum-regenerating kiln, so when reusing waste gypsum to semi-water gypsum Where it is recovered by heating in a kiln and reclaimed into type II anhydrous gypsum In this case, the heat treated with a hemihydrate gypsum recycle kiln can be collected in the anhydrous gypsum recycle kiln and reheated to recover as type II anhydrous gypsum. And can be played back, making it easy to use. In addition, when regenerating Type II anhydrous gypsum, high-temperature exhaust gas derived from the anhydrous gypsum recycling kiln can be introduced into the hemihydrate gypsum recycling kiln, which can be used for pre-heat treatment of waste gypsum. It becomes possible.

また、請求項2記載の廃石膏の加熱再生処理装置によれば、前記無水石膏再生用キルンの内周部には耐熱性のキャスターを周設する一方、半水石膏再生用キルンの内周部には複数の掻き上げ羽根を周設したので、II型無水石膏を再生する際の高温での加熱処理にも対応可能としながらも、掻き上げ羽根を有した半水石膏再生用キルンでは排ガス熱を有効に活用しながら効率よく加熱処理でき、エネルギーロスを抑制することが可能となる。   According to the waste gypsum heat regeneration treatment apparatus according to claim 2, a heat-resistant caster is provided around the inner peripheral portion of the anhydrous gypsum regeneration kiln, while the inner peripheral portion of the hemihydrate gypsum regeneration kiln. Since there are a number of scraping blades around, it is possible to handle heat treatment at high temperatures when regenerating type II anhydrous gypsum, but in a semi-water gypsum recycling kiln with scraping blades, exhaust gas heat The heat treatment can be efficiently performed while effectively utilizing the energy loss, and the energy loss can be suppressed.

また、請求項3記載の廃石膏の加熱再生処理装置によれば、排気ダクト下流の集塵機にて捕集される石膏微粒分の排出先を半水石膏貯蔵用の貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えたので、集塵機にて捕集された石膏微粒分を半水石膏またはII型無水石膏として適当に処理・回収でき、再生する石膏の収率を向上させることが可能となる。   In addition, according to the waste gypsum heat regeneration processing apparatus according to claim 3, the discharge destination of gypsum fine particles collected by the dust collector downstream of the exhaust duct is used as a storage bin for storing semi-water gypsum, or for regenerating anhydrous gypsum. Because it is equipped with a destination switching means that can be switched to any one of the half water gypsum input parts of the kiln, the gypsum fine particles collected by the dust collector can be appropriately treated and recovered as hemihydrate gypsum or type II anhydrous gypsum, It becomes possible to improve the yield of the gypsum to regenerate.

また、請求項4記載の廃石膏の加熱再生処理方法によれば、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルンと、半水石膏に再生する半水石膏再生用キルンとを直列に配置して連結すると共に、前記無水石膏再生用キルンの一端部には熱風供給用のバーナを備え、廃石膏を半水石膏に再生するときには、半水石膏再生用キルン内の温度を廃石膏が半水石膏に転位する温度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を半水石膏再生用キルンに投入し加熱処理して半水石膏として回収する一方、廃石膏をII型無水石膏に再生するときには、無水石膏再生用キルン内の温度を廃石膏がII型無水石膏に転位する温度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を半水石膏再生用キルンに投入して予熱処理した後、無水石膏再生用キルンに投入し加熱処理してII型無水石膏として回収するようにしたので、廃石膏を需要に応じて半水石膏とII型無水石膏とに適宜再生処理でき、使い勝手の良いものとなる。また、II型無水石膏を再生する際に無水石膏再生用キルンから導出される高温の排ガスを半水石膏再生用キルンでの予熱処理に利用でき、エネルギーの有効活用が可能となる。   Further, according to the method for heat regeneration treatment of waste gypsum according to claim 4, the kiln for reclaiming anhydrous gypsum which heat-treats waste gypsum to regenerate to type II anhydrous gypsum, and the recycle for hemihydrate gypsum regenerated to hemihydrate gypsum. A kiln and a kiln are arranged and connected in series, and one end of the anhydrous gypsum recycling kiln is provided with a hot air supply burner, and when regenerating waste gypsum into semi-water gypsum, While controlling the burner combustion amount so that the temperature is maintained at the temperature at which the waste gypsum is transferred to hemihydrate gypsum, the waste gypsum is put into a hemihydrate gypsum kiln and heat treated to recover it as hemihydrate gypsum, When reclaiming waste gypsum to type II anhydrous gypsum, while controlling the burner combustion amount so that the temperature in the anhydrous gypsum regeneration kiln is maintained at the temperature at which waste gypsum is transferred to type II anhydrous gypsum, Preheated by putting in a water gypsum kiln Since it was put into an anhydrous gypsum recycle kiln and heat treated to recover as type II anhydrous gypsum, waste gypsum can be appropriately recycled into hemihydrate gypsum and type II anhydrous gypsum according to demand, making it easy to use It will be a thing. Further, when regenerating type II anhydrous gypsum, high-temperature exhaust gas derived from the anhydrous gypsum regeneration kiln can be used for pre-heat treatment in the hemihydrate gypsum regeneration kiln, so that energy can be effectively utilized.

本発明に係る廃石膏の加熱再生処理装置及び処理方法の一実施例を示す概略説明図である。It is a schematic explanatory drawing which shows one Example of the heat reproduction processing apparatus and processing method of waste gypsum concerning this invention.

本発明に係る廃石膏の加熱再生処理装置及び処理方法にあっては、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルンと、半水石膏に再生する半水石膏再生用キルンとを直列に配置して連結しており、無水石膏再生用キルンの内周部には耐熱性のキャスターを周設している一方、半水石膏再生用キルンの内周部には複数の掻き上げ羽根を周設している。また、前記無水石膏再生用キルンの一端部には熱風供給用のバーナと半水石膏投入部とを、他端部には加熱処理したII型無水石膏排出用の無水石膏排出部をそれぞれ備えている一方、半水石膏再生用キルンの一端部には廃石膏投入部を、他端部には加熱処理した半水石膏排出用の半水石膏排出部をそれぞれ備えている。   In the waste gypsum heat regeneration treatment apparatus and treatment method according to the present invention, the anhydrous gypsum regeneration kiln for regenerating waste gypsum by heat treatment to regenerate to type II anhydrous gypsum, and hemihydrate gypsum regeneration for regenerating to half water gypsum The kiln for recycling is connected in series, and heat-resistant casters are provided around the inner circumference of the anhydrous gypsum recycling kiln, while there are several There is a scraping blade around. In addition, one end of the anhydrous gypsum regeneration kiln is equipped with a hot air supply burner and a half-water gypsum charging section, and the other end is equipped with a heat-treated type II anhydrous gypsum discharging gypsum discharging section. On the other hand, one end of the half water gypsum regeneration kiln is provided with a waste gypsum charging portion, and the other end is provided with a heat treated half water gypsum discharge portion.

また、前記半水石膏再生用キルンの半水石膏排出部下位には、加熱処理した半水石膏の排出先を近傍に備えた半水石膏貯蔵用の貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えている一方、半水石膏再生用キルンの排気ダクト下流に備えた集塵機の下位にも、該集塵機にて捕集した石膏微粒分の排出先を半水石膏貯蔵用の前記貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えている。   In addition, in the lower half of the half-water gypsum discharge section of the hemihydrate gypsum recycle kiln, a storage bottle for storing a half-water gypsum with a discharge destination of the heat-treated half-water gypsum nearby, or a half of the anhydrous gypsum recycle kiln While equipped with a destination switching means that can be switched to any one of the water gypsum input parts, the gypsum fine particles collected by the dust collector are also provided below the dust collector provided downstream of the exhaust duct of the half water gypsum regeneration kiln. A discharge destination switching means capable of switching the discharge destination to either the storage bin for storing hemihydrate gypsum or the half water gypsum charging portion of the anhydrous gypsum regeneration kiln.

そして、上記構成の装置を使用して、廃石膏ボードを破砕・分別処理して得られる二水石膏の状態にある廃石膏を加熱処理して半水石膏に再生するときには、バーナの熱風下流側に位置する半水石膏再生用キルン内の温度を廃石膏が半水石膏に転位する温度、例えば約130〜180℃程度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を前記半水石膏再生用キルンに投入する。半水石膏再生用キルンに投入した廃石膏は、複数の掻き上げ羽根によって掻き上げられながらキルン内を転動流下しつつ、バーナから供給される熱風に晒されて効率よく加熱処理されて半水石膏として回収される。なお、排気ダクト下流の集塵機にて捕集される石膏微粒分についても気流乾燥によって半水石膏に転位する温度まで加熱されており、前記キルンより排出される半水石膏と一緒に回収することができる。   And when the waste gypsum in the state of dihydrate gypsum obtained by crushing and separating waste gypsum board using the apparatus configured as described above is heat-treated and regenerated into semi-water gypsum, the hot air downstream side of the burner While controlling the burner combustion amount so that the temperature in the kiln for reclaiming gypsum located at a temperature where the gypsum is transferred to hemihydrate gypsum, for example, about 130 to 180 ° C., is controlled. It is put into a water plaster recycling kiln. The waste gypsum introduced into the semi-water gypsum kiln is efficiently heated by being exposed to the hot air supplied from the burner while rolling down the kiln while being scraped up by a plurality of scraping blades. Collected as gypsum. The gypsum fine particles collected by the dust collector downstream of the exhaust duct are also heated to a temperature at which they are transferred to hemihydrate gypsum by airflow drying, and can be collected together with the hemihydrate gypsum discharged from the kiln. it can.

一方、廃石膏を加熱処理してII型無水石膏に再生するときには、バーナの熱風上流側に位置する無水石膏再生用キルン内の温度を廃石膏がII型無水石膏に転位する温度、例えば約350〜800℃程度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を、先ず熱風下流側の半水石膏再生用キルンに投入する。半水石膏再生用キルンに投入した廃石膏は、前記同様に、複数の掻き上げ羽根によって掻き上げられながらキルン内を転動流下しつつ、バーナからの熱風によって予熱処理されて略半水石膏の状態で排出される。なお、前記半水石膏再生用キルンでの加熱処理は石膏の予熱・乾燥を目的としており、排出時に必ずしも半水石膏の状態になっている必要はなく、二水石膏や無水石膏が混在している状態であっても問題はない。   On the other hand, when reclaiming waste gypsum by heat treatment to regenerate type II anhydrous gypsum, the temperature in the anhydrous gypsum regeneration kiln located upstream of the hot air of the burner is the temperature at which the waste gypsum rearranges to type II anhydrous gypsum, for example, about 350 The waste gypsum is first charged into the hemihydrate gypsum kiln on the downstream side of the hot air while controlling the burner combustion amount so as to be maintained at about ˜800 ° C. As described above, the waste gypsum introduced into the hemihydrate gypsum recycle kiln is preheated by hot air from the burner while rolling down in the kiln while being scraped up by a plurality of scraping blades, Discharged in a state. The heat treatment in the kiln for regenerating the gypsum is for the purpose of preheating and drying gypsum, and it is not always necessary to be in the state of gypsum at the time of discharge. Dihydrate gypsum and anhydrous gypsum are mixed. There is no problem even if it is.

次いで、半水石膏再生用キルンの半水石膏排出部下位の排出先切替手段を操作して、キルンより排出される半水石膏を、例えばエア圧送装置等の搬送手段を介して熱風上流側の無水石膏再生用キルンに投入させる。無水石膏再生用キルンに投入した半水石膏は、キルン内周部に周設した耐熱性のキャスター上を掻き上げられることなく流下しつつ、直近のバーナから供給される高温の熱風に晒されながら加熱処理されてII型無水石膏として回収される。   Next, by operating the discharge destination switching means below the half water gypsum discharge part of the half water gypsum regeneration kiln, the half water gypsum discharged from the kiln is transferred to the upstream side of the hot air via a conveying means such as an air pressure feeder. Put in anhydrous gypsum kiln. The hemihydrate gypsum thrown into the anhydrous gypsum recycle kiln flows down without being scraped up on a heat-resistant caster around the inner periphery of the kiln, while being exposed to high-temperature hot air supplied from the nearest burner. It is heat treated and recovered as type II anhydrous gypsum.

このとき、無水石膏再生用キルンに投入される石膏は半水石膏再生用キルンにてある程度予熱・乾燥処理してあるため、比較的高温での加熱処理を要するII型無水石膏への再生を効率よく行うことができる。なお、排気ダクト下流の集塵機にて捕集される石膏微粒分には、掻き上げ羽根を有する半水石膏再生用キルンでの予熱処理に伴って飛散する略半水石膏の状態のものが多く含まれるものの、集塵機下位に備えた排出先切替手段を適宜操作して、捕集した石膏微粒分を、例えばエア圧送装置等の搬送手段を介して無水石膏再生用キルンに投入させ、半水石膏再生用キルンより供給される半水石膏と共に加熱処理することにより、II型無水石膏として回収することができる。   At this time, since the gypsum put into the anhydrous gypsum regeneration kiln has been preheated and dried to some extent in the hemihydrate gypsum regeneration kiln, it is efficient to regenerate to type II anhydrous gypsum requiring heat treatment at a relatively high temperature. Can be done well. In addition, the gypsum fine particles collected by the dust collector downstream of the exhaust duct contain a large amount of gypsum in the form of almost half water gypsum that is scattered by the pre-heat treatment in the kiln for reclaiming gypsum with scraped blades. However, by appropriately operating the discharge destination switching means provided in the lower part of the dust collector, the collected gypsum fine particles are introduced into the anhydrous gypsum recycling kiln via the conveying means such as an air pressure feeding device, etc. It can be recovered as type II anhydrous gypsum by heat treatment with hemihydrate gypsum supplied from the kiln.

このように、本装置によれば二水石膏の状態にある廃石膏を需要に応じて半水石膏、またはII型無水石膏の何れかへ選択的に再生処理することができて使い勝手の良いものとなる。また、熱風上流側の無水石膏再生用キルンの内周部には耐熱性のキャスターを、熱風下流側の半水石膏再生用キルンの内周部には複数の掻き上げ羽根をそれぞれ周設するようにしたので、高温での加熱処理を要するII型無水石膏の再生にも対応可能としつつ、導出される高温の排ガス熱を予熱・乾燥処理に有効にかつ効率よく利用することができる。更に、集塵機にて捕集される石膏微粒分を半水石膏またはII型無水石膏として適宜処理・回収することができ、再生する石膏の収率を向上させることも可能となる。   In this way, according to this device, waste gypsum in the form of dihydrate gypsum can be selectively recycled to either hemihydrate gypsum or type II anhydrous gypsum according to demand, making it easy to use It becomes. Also, heat-resistant casters should be installed around the inner periphery of the anhydrous gypsum regeneration kiln on the upstream side of the hot air, and a plurality of scraping blades should be installed around the inner periphery of the half-water gypsum regeneration kiln on the downstream side of the hot air. Therefore, while being able to cope with the regeneration of type II anhydrous gypsum that requires heat treatment at high temperature, the derived high-temperature exhaust gas heat can be effectively and efficiently used for preheating and drying treatment. Furthermore, the gypsum fine particles collected by the dust collector can be appropriately treated and recovered as hemihydrate gypsum or type II anhydrous gypsum, and the yield of reclaimed gypsum can be improved.

以下、本発明の一実施例を図面に基づいて説明する。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

図中の1は廃石膏ボードを破砕・分別処理して得られる二水石膏の状態にある廃石膏を加熱再生処理する加熱再生処理装置であって、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルン2と、半水石膏に再生する半水石膏再生用キルン3とを、図に示すように、直列に配置して中間ホッパ4を介して連結している。   In the figure, reference numeral 1 denotes a heat regeneration processing apparatus for heat recycling treatment of waste gypsum in the form of dihydrate gypsum obtained by crushing and separating waste gypsum board. Type II anhydrous gypsum by heat treatment of waste gypsum The anhydrous gypsum recycling kiln 2 to be regenerated and the half water gypsum recycling kiln 3 to be regenerated to half water gypsum are arranged in series and connected via an intermediate hopper 4 as shown in the figure.

前記無水石膏再生用キルン2は、機台5上に傾斜支持した円筒状のドラム6を駆動用モータ(図示せず)にて所定速度にて回転駆動させるようにしたロータリーキルンであると共に、その内周部には耐火レンガやセラミックス等の耐熱性のキャスター7を周設して保護している一方、半水石膏再生用キルン3も同様に、機台8上に傾斜支持した円筒状のドラム9を駆動用モータ(図示せず)にて所定速度にて回転駆動させるようにしたロータリーキルンであると共に、その内周部には多数の掻き上げ羽根10を周設して加熱効率を高めている。   The anhydrous gypsum regeneration kiln 2 is a rotary kiln in which a cylindrical drum 6 inclinedly supported on a machine base 5 is rotationally driven at a predetermined speed by a driving motor (not shown). A heat-resistant caster 7 such as refractory bricks and ceramics is provided around the periphery to protect it, while a semi-water gypsum kiln 3 is similarly supported by a cylindrical drum 9 inclined and supported on a machine base 8. The rotary kiln is driven to rotate at a predetermined speed by a drive motor (not shown), and a number of scraping blades 10 are provided around the inner peripheral portion to increase the heating efficiency.

また、前記無水石膏再生用キルン2の一端部(熱風上流側)に配設したホットホッパ11には、熱風供給用のバーナ12と半水石膏投入用の半水石膏投入部13とを備えている一方、他端部(熱風下流側)の中間ホッパ4下端部には加熱処理したII型無水石膏排出用の無水石膏排出部14を備えている。また、半水石膏再生用キルン3の一端部(熱風上流側)に位置する前記中間ホッパ4上端部には廃石膏投入用の廃石膏投入部15を備えている一方、他端部(熱風下流側)に配設したコールドホッパ16下端部には加熱処理した半水石膏排出用の半水石膏排出部17を備えている。   The hot hopper 11 disposed at one end (on the upstream side of hot air) of the anhydrous gypsum regeneration kiln 2 is provided with a burner 12 for supplying hot air and a half-water gypsum charging portion 13 for charging half-water gypsum. On the other hand, the lower end portion of the intermediate hopper 4 at the other end portion (on the downstream side of the hot air) is provided with a heat-treated type II anhydrous gypsum discharging portion 14 for discharging anhydrous gypsum. Further, an upper end portion of the intermediate hopper 4 positioned at one end portion (hot air upstream side) of the half water gypsum regeneration kiln 3 is provided with a waste gypsum throwing portion 15 for throwing out waste gypsum, while the other end portion (hot air downstream). At the lower end of the cold hopper 16 disposed on the side), a heat-treated hemihydrate gypsum discharge portion 17 for discharging the hemihydrate gypsum is provided.

前記コールドホッパ16上端部には排ガス導出用の排気ダクト18を連結しており、該排気ダクト18の下流にはキルンより導出される高温の排ガスを冷却処理する冷却装置19や、集塵機であるバグフィルタ20、排風量調整用のメインダンパー21、排風機22、及び煙突23を配設している。なお、前記冷却装置19では、排ガス温度に応じて稼働/停止させるようにしてもよく、例えば、半水石膏を再生処理する際の排ガス温度(約130〜180℃程度)のように、そのまま下流のバグフィルタ20へ送っても特に支障がない程度であれば停止させる一方、無水石膏を再生処理する際の排ガス温度(約350〜800℃程度)のように、そのまま下流のバグフィルタ20へ送ると焼損のおそれがあるときには稼働させて冷却処理を行うとよい。   An exhaust duct 18 for exhaust gas exhaust is connected to the upper end portion of the cold hopper 16, and a cooling device 19 for cooling the high temperature exhaust gas derived from the kiln or a bug that is a dust collector is disposed downstream of the exhaust duct 18. A filter 20, a main damper 21 for adjusting the amount of exhaust air, an air exhauster 22, and a chimney 23 are provided. The cooling device 19 may be operated / stopped according to the exhaust gas temperature. For example, as in the exhaust gas temperature (about 130 to 180 ° C.) when regenerating the hemihydrate gypsum, it is directly downstream. While it is stopped to the extent that there is no problem even if it is sent to the bag filter 20, it is sent to the downstream bag filter 20 as it is, such as the exhaust gas temperature (about 350 to 800 ° C.) when regenerating the anhydrous gypsum. When there is a risk of burning, it is recommended to operate and perform the cooling process.

また、前記排気ダクト18の基端部付近には半水石膏再生用キルン3より導出される排ガスの温度を検出する温度センサ24を、中間ホッパ4には無水石膏再生用キルン2より導出される排ガスの温度を検出する温度センサ25をそれぞれ備えている。26は前記各温度センサ24、25にて検出される排ガス温度を取り込み、予め設定した排ガス温度設定値と比較してその差値量に基づいてバーナ12燃焼量を制御するバーナ燃焼制御器であって、半水石膏を再生処理する場合には、排ガス温度を二水石膏の状態にある廃石膏が効率よく半水石膏に転位する温度、即ち約130〜180℃程度に設定し、排気ダクト18に備えた温度センサ24にて検出される排ガス温度が前記設定温度に維持されるようにバーナ12燃焼量を制御する一方、II型無水石膏を再生処理する場合には、排ガス温度を半水石膏が効率よくII型無水石膏に転位する温度、即ち約350〜800℃程度に設定し、中間ホッパ4に備えた温度センサ25にて検出される排ガス温度が前記設定温度に維持されるようにバーナ12燃焼量を制御するようにしている。   Further, a temperature sensor 24 for detecting the temperature of the exhaust gas derived from the hemihydrate gypsum regeneration kiln 3 is provided near the base end portion of the exhaust duct 18, and the intermediate hopper 4 is derived from the anhydrous gypsum regeneration kiln 2. A temperature sensor 25 for detecting the temperature of the exhaust gas is provided. Reference numeral 26 denotes a burner combustion controller that takes in the exhaust gas temperatures detected by the temperature sensors 24 and 25, and controls the burner 12 combustion amount based on the difference value amount compared with a preset exhaust gas temperature set value. In the case of reprocessing the hemihydrate gypsum, the exhaust gas temperature is set to a temperature at which the waste gypsum in the dihydrate gypsum state is efficiently transferred to the hemihydrate gypsum, that is, about 130 to 180 ° C. When the burner 12 combustion amount is controlled so that the exhaust gas temperature detected by the temperature sensor 24 provided in the above is maintained at the set temperature, when regenerating the type II anhydrous gypsum, the exhaust gas temperature is changed to hemihydrate gypsum. Is set to about 350 to 800 ° C., and the exhaust gas temperature detected by the temperature sensor 25 provided in the intermediate hopper 4 is maintained at the set temperature. 12 Combustion amount is controlled.

なお、上記実施例においては、排ガス温度に基づいてバーナ12燃焼量を制御するようにしたが、必ずしもこれに限定されるものではなく、例えば、半水石膏再生用キルン3下流側のコールドホッパ16下端部の半水石膏排出部17より排出される半水石膏の温度や、無水石膏再生用キルン2下流側の中間ホッパ4下端部の無水石膏排出部14より排出されるII型無水石膏の温度を検出し、これらの温度に基づいてバーナ12燃焼量を制御するようにしてもよい。   In the above embodiment, the burner 12 combustion amount is controlled based on the exhaust gas temperature. However, the present invention is not necessarily limited to this. For example, the cold hopper 16 on the downstream side of the hemihydrate gypsum regeneration kiln 3 is used. Temperature of hemihydrate gypsum discharged from the hemihydrate gypsum discharge section 17 at the lower end, and temperature of type II anhydrous gypsum discharged from the anhydrous gypsum discharge section 14 at the lower end of the intermediate hopper 4 downstream of the anhydrous gypsum regeneration kiln 2 May be detected, and the burner 12 combustion amount may be controlled based on these temperatures.

また、前記無水石膏再生用キルン2一端部のホットホッパ11の隅部には、キルン内部の静圧を検出する静圧センサ27を備えている。28は前記静圧センサ27にて検出される静圧値に基づいて排気ダクト18のメインダンパー21の開度(または排風機22の回転数)を調整して排風量を可変制御する静圧/排風量制御器であって、キルン内部の静圧が外気圧に対してほぼ同じか、或いは若干負圧になるように排風量を制御しており、各キルン端部の隙間からの噴き出しを防止すると共に、外気の侵入を抑制して省エネの向上を図っている。   A static pressure sensor 27 for detecting the static pressure inside the kiln is provided at the corner of the hot hopper 11 at one end of the anhydrous gypsum regeneration kiln 2. 28 is a static pressure / variable control for adjusting the amount of exhaust air by adjusting the opening of the main damper 21 of the exhaust duct 18 (or the rotational speed of the exhaust fan 22) based on the static pressure value detected by the static pressure sensor 27. This is an exhaust air volume controller that controls the exhaust air volume so that the static pressure inside the kiln is almost the same as or slightly negative with respect to the outside air pressure, preventing ejection from the gaps at the ends of each kiln. At the same time, the intrusion of outside air is suppressed to improve energy saving.

また、前記中間ホッパ4下端部の無水石膏排出部14の下位にはロータリーバルブ29を備え、該ロータリーバルブ29より排出されるII型無水石膏をその下位のエア圧送装置30にて、エア配管31を介して近傍に備えたII型無水石膏貯蔵用の貯蔵ビン(図示せず)へ搬送可能なようにしている一方、コールドホッパ16下端部の半水石膏排出部17の下位にもロータリーバルブ32を備え、該ロータリーバルブ32より排出される半水石膏をその下位のエア圧送装置33にて、エア配管34を介して近傍に備えた半水石膏貯蔵用の貯蔵ビン(図示せず)、或いは前記エア配管34より分岐させたエア配管35を介して無水石膏再生用キルン2の半水石膏投入部13の何れかへ搬送可能なようにしている。   Further, a rotary valve 29 is provided below the anhydrous gypsum discharge portion 14 at the lower end of the intermediate hopper 4, and type II anhydrous gypsum discharged from the rotary valve 29 is supplied to an air pipe 31 by an air pressure feeder 30 below the rotary valve 29. It can be conveyed to a storage bin (not shown) for storing type II anhydrous gypsum provided in the vicinity, while a rotary valve 32 is also provided below the semi-water gypsum discharge part 17 at the lower end of the cold hopper 16. A storage bin (not shown) for storing hemihydrate gypsum provided in the vicinity thereof via an air pipe 34 in the lower air pressure feeding device 33. It can be transported to any one of the half-water gypsum charging portions 13 of the anhydrous gypsum regeneration kiln 2 through an air pipe 35 branched from the air pipe 34.

36、37は前記半水石膏排出部17より排出される半水石膏の排出先をエア配管34側(半水石膏貯蔵ビン側)か、エア配管35側(無水石膏再生用キルン2の半水石膏投入部13側)かに切り替える排出先切替手段のダンパーであって、該ダンパー36、37をエア配管34、35の分岐部付近にそれぞれ開閉自在に備え、例えば、半水石膏をエア配管34側(半水石膏貯蔵ビン側)へ搬送する場合には、ダンパー36を開放しかつダンパー37を閉鎖した上でエア圧送装置33にて圧送させる一方、半水石膏をエア配管35側(無水石膏再生用キルン2の半水石膏投入部13側)へ搬送する場合には、ダンパー36を閉鎖しかつダンパー37を開放した上でエア圧送装置33にて圧送させる。   Reference numerals 36 and 37 denote the discharge destination of the semi-water gypsum discharged from the semi-water gypsum discharge unit 17 or the air pipe 34 side (half-water gypsum storage bottle side) or the air pipe 35 side (half-water of the anhydrous gypsum regeneration kiln 2). Damper of the discharge destination switching means for switching to the gypsum charging unit 13 side), and the dampers 36 and 37 are provided in the vicinity of the branch portions of the air pipes 34 and 35, respectively. When transporting to the side (half-water gypsum storage bin side), the damper 36 is opened and the damper 37 is closed, and the air-pressure feeding device 33 is used to pump the half-water gypsum, while the half-water gypsum is fed to the air pipe 35 side (anhydrous gypsum). When transporting to the hemihydrate gypsum charging unit 13 side of the regeneration kiln 2, the damper 36 is closed and the damper 37 is opened, and then the air is fed by the air pressure feeding device 33.

前記エア配管35の終端部にはサイクロン式の回収機38を備えており、エア圧送によって搬送される搬送物から半水石膏を回収し、下位のロータリーバルブ39にて半水石膏投入部13へ定量供給可能なようにしている。なお、前記回収機38にて半水石膏が回収された後の空気は、例えば前記バグフィルタ20手前の排気ダクト18へ合流させるようにするとよい。   A cyclone-type recovery machine 38 is provided at the terminal end of the air pipe 35, and hemihydrate gypsum is collected from the conveyed product conveyed by air pressure feeding, and the lower rotary valve 39 returns to the hemihydrate gypsum input unit 13. A fixed amount can be supplied. Note that the air after the hemihydrate gypsum has been collected by the collection machine 38 may be merged into the exhaust duct 18 in front of the bag filter 20, for example.

また、前記バグフィルタ20にて捕集された石膏微粒分はスクリュコンベア40にて順次送り出し、その終端部の下位に備えたロータリーバルブ41より排出し、下位のエア圧送装置42にてエア配管43を介して半水石膏貯蔵ビン、或いは前記エア配管43より分岐させたエア配管44を介して無水石膏再生用キルン2の半水石膏投入部13の何れかへ搬送可能なようにしている。なお、バグフィルタ20にて捕集される石膏微粒分は、半水石膏再生用キルン3の掻き上げ羽根10による掻き上げに伴って舞い上がる微粒分が主であるものの、気流乾燥によって半水石膏に転位する温度まで加熱されており、半水石膏再生用キルン3の半水石膏排出部17より回収される半水石膏と略同等に扱うことができる。   Further, the gypsum fine particles collected by the bag filter 20 are sequentially sent out by a screw conveyor 40, discharged from a rotary valve 41 provided at the lower part of the terminal portion, and air piping 43 by a lower air pressure feeding device 42. It can be conveyed to either the semi-water gypsum storage bin of the anhydrous gypsum regeneration kiln 2 via the semi-water gypsum storage bin or the air pipe 44 branched from the air pipe 43. The gypsum fine particles collected by the bag filter 20 are mainly fine particles that rise with the scraping blades 10 of the semi-water gypsum regenerating kiln 3, but the gypsum fine particles are collected into the semi-hydrate gypsum by airflow drying. It is heated to the dislocation temperature, and can be handled in substantially the same manner as the half-water gypsum recovered from the half-water gypsum discharge part 17 of the half-water gypsum regeneration kiln 3.

45、46は前記スクリュコンベア40より排出される石膏微粒分(半水石膏)の排出先をエア配管43側(半水石膏貯蔵ビン側)か、エア配管44側(無水石膏再生用キルン2の半水石膏投入部13側)かに切り替える排出先切替手段のダンパーであって、該ダンパー45、46を、前記同様に、エア配管43、44の分岐部付近にそれぞれ開閉自在に備え、例えば、石膏微粒分(半水石膏)をエア配管43側(半水石膏貯蔵ビン側)へ搬送する場合には、ダンパー45を開放しかつダンパー46を閉鎖した上でエア圧送装置42にて圧送させる一方、石膏微粒分(半水石膏)をエア配管44側(無水石膏再生用キルン2の半水石膏投入部13側)へ搬送する場合には、ダンパー45を閉鎖しかつダンパー46を開放した上でエア圧送装置42にて圧送させる。   45 and 46, the discharge destination of the gypsum fine particles (half-water gypsum) discharged from the screw conveyor 40 is the air pipe 43 side (half-water gypsum storage bottle side) or the air pipe 44 side (anhydrous gypsum recycling kiln 2). Damper of the discharge destination switching means for switching to the hemihydrate gypsum charging unit 13 side), and the dampers 45 and 46 are provided in the vicinity of the branch portions of the air pipes 43 and 44, respectively, in the same manner as described above. When the gypsum fine particles (half-water gypsum) are transported to the air pipe 43 side (half-water gypsum storage bottle side), the damper 45 is opened and the damper 46 is closed, and the pressure is fed by the air pressure feeding device 42. When the gypsum fine particles (half water gypsum) are transported to the air pipe 44 side (the half water gypsum charging part 13 side of the anhydrous gypsum regenerating kiln 2), the damper 45 is closed and the damper 46 is opened. Air pressure feeder 2 to be pumped in.

そして、上記構成の装置を使用して二水石膏の状態にある廃石膏を加熱処理して半水石膏に再生するときには、バーナ燃焼制御器26の排ガス温度設定値を廃石膏が効率よく半水石膏に転位する温度である、例えば130〜180℃に設定すると共に、制御の基準となる排ガス温度として半水石膏再生用キルン3下流側の排気ダクト18に備えた温度センサ24にて検出される排ガス温度を取り込むようにする。そして、バーナ12からの熱風を上流側の無水石膏再生用キルン2を通過させて下流側の半水石膏再生用キルン3に送り込む一方、中間ホッパ4に備えた廃石膏投入部15より廃石膏を半水石膏再生用キルン3内へ投入する。半水石膏再生用キルン3に投入した廃石膏は、キルン内周部に備えた多数の掻き上げ羽根10によって掻き上げられながらキルン内を転動流下しつつ、上記温度範囲に制御されたバーナ12からの熱風に晒されて効率よく加熱処理され、半水石膏へと再生されて半水石膏排出部17より順次排出されていく。そして、半水石膏排出部17下位の排出先切替手段であるダンパー36を開放しかつダンパー37を閉鎖した上でエア圧送装置33を稼働させ、半水石膏排出部17より排出される半水石膏を近傍に備えた半水石膏貯蔵ビンへ搬送・貯蔵させる。   When the waste gypsum in the dihydrate gypsum state is heat-treated and regenerated into half-water gypsum using the apparatus having the above-described configuration, the waste gypsum efficiently sets the exhaust gas temperature setting value of the burner combustion controller 26 to the half-water gypsum. The temperature is set to, for example, 130 to 180 ° C., which is a temperature at which the gypsum is transferred to the gypsum, and is detected by the temperature sensor 24 provided in the exhaust duct 18 on the downstream side of the half water gypsum regeneration kiln 3 as the control exhaust gas temperature. Take in the exhaust gas temperature. The hot air from the burner 12 passes through the upstream anhydrous gypsum regeneration kiln 2 and is sent to the downstream half water gypsum regeneration kiln 3, while the waste gypsum is supplied from the waste gypsum charging unit 15 provided in the intermediate hopper 4. It puts in the kiln 3 for hemihydrate gypsum regeneration. The waste gypsum introduced into the kiln 3 for regenerating the semi-water gypsum is tumbled down in the kiln while being scooped up by a number of scooping blades 10 provided in the inner periphery of the kiln, and controlled to the above temperature range. It is exposed to hot air from the water and efficiently heat-treated, is regenerated into hemihydrate gypsum, and is sequentially discharged from the hemihydrate gypsum discharge section 17. Then, the damper 36 which is the lower discharge destination switching means of the hemihydrate gypsum discharge section 17 is opened and the damper 37 is closed, and then the air pressure feeding device 33 is operated, and the hemihydrate gypsum discharged from the hemihydrate gypsum discharge section 17. Is transported and stored in a semi-water gypsum storage bottle provided nearby.

また、掻き上げ羽根10によって掻き上げられる際に舞い上がる石膏微粒分は排ガスに随伴して排気ダクト18へ流下していき、該排気ダクト18下流のバグフィルタ20にて捕集される。このとき、捕集される石膏微粒分は気流乾燥によって半水石膏に転位する温度程度まで加熱されており、半水石膏再生用キルン3より排出される半水石膏と略同等に扱え、スクリュコンベア40下位の排出先切替手段であるダンパー45を開放しかつダンパー46を閉鎖した上でエア圧送装置42を稼働させ、捕集した石膏微粒分(半水石膏)も一緒に前記半水石膏貯蔵ビンへ搬送・貯蔵させる。   Also, the gypsum fine particles that rise when they are scraped up by the scraping blades 10 flow down to the exhaust duct 18 along with the exhaust gas, and are collected by the bag filter 20 downstream of the exhaust duct 18. At this time, the collected gypsum fine particles are heated to about the temperature at which they are transferred to hemihydrate gypsum by airflow drying, and can be handled almost the same as the hemihydrate gypsum discharged from the kiln 3 for regenerating gypsum, and a screw conveyor. 40. The damper 45, which is a lower discharge destination switching means, is opened and the damper 46 is closed, and then the air pressure feeding device 42 is operated. The collected gypsum fine particles (half-water gypsum) are also collected together with the half-water gypsum storage bottle. To be transported and stored.

一方、廃石膏を加熱処理してII型無水石膏に再生するときには、バーナ燃焼制御器26の排ガス温度設定値を廃石膏が効率よくII型無水石膏に転位する温度である、例えば350〜800℃に設定すると共に、制御の基準となる排ガス温度として無水石膏再生用キルン2下流側の中間ホッパ4に備えた温度センサ25にて検出される排ガス温度を取り込むようにする。そして、バーナ12からの熱風を上流側の無水石膏再生用キルン2、及び下流側の半水石膏再生用キルン3に順次送り込む一方、半水石膏を再生する場合と同様に、先ず、中間ホッパ4に備えた廃石膏投入部15より廃石膏を半水石膏再生用キルン3内へ投入する。半水石膏再生用キルン3に投入した廃石膏は、多数の掻き上げ羽根10によって掻き上げられながら転動流下しつつ、バーナ12からの熱風に晒されて効率よく加熱処理され、略半水石膏へと再生されて半水石膏排出部17より順次排出されていく。   On the other hand, when waste gypsum is heat-treated to regenerate to type II anhydrous gypsum, the exhaust gas temperature set value of the burner combustion controller 26 is a temperature at which the waste gypsum is efficiently transferred to type II anhydrous gypsum, for example, 350 to 800 ° C. In addition, the exhaust gas temperature detected by the temperature sensor 25 provided in the intermediate hopper 4 downstream of the anhydrous gypsum regeneration kiln 2 is taken in as the exhaust gas temperature serving as a reference for control. Then, while the hot air from the burner 12 is sequentially sent to the upstream anhydrous gypsum regeneration kiln 2 and the downstream half water gypsum regeneration kiln 3, the intermediate hopper 4 is first used in the same manner as when regenerating the half water gypsum. Waste gypsum is fed into the kiln 3 for regenerating gypsum from the waste gypsum throwing section 15 provided for the above. The waste gypsum thrown into the kiln 3 for regenerating the half water gypsum is exposed to the hot air from the burner 12 while being tumbled down while being swung up by a large number of scraping blades 10, and is effectively heat-treated. It is regenerated and discharged sequentially from the hemihydrate gypsum discharge part 17.

このとき、熱風(排ガス)温度は無水石膏再生用キルン2内部の温度を基準としており、下流側の半水石膏再生用キルン3内部には上記設定温度から若干低下した温度の排ガスが供給されるものの、廃石膏をII型無水石膏に再生する際の予熱・乾燥処理としては十分に有効利用することができる。また、前記半水石膏排出部17より排出される石膏は、上記の通り予熱・乾燥を目的に処理されており、必ずしも半水石膏に再生されている必要はなく、二水石膏や無水石膏等が混在している状態であっても問題はない。   At this time, the hot air (exhaust gas) temperature is based on the temperature inside the anhydrous gypsum regeneration kiln 2, and the exhaust gas at a temperature slightly lower than the set temperature is supplied into the downstream half water gypsum regeneration kiln 3. However, it can be used effectively as a preheating / drying treatment when reclaiming waste gypsum to type II anhydrous gypsum. The gypsum discharged from the hemihydrate gypsum discharge unit 17 is processed for the purpose of preheating and drying as described above, and is not necessarily regenerated into hemihydrate gypsum, such as dihydrate gypsum and anhydrous gypsum. There is no problem even if there is a mixed state.

次いで、前記半水石膏排出部17下位の排出先切替手段であるダンパー36を閉鎖しかつダンパー37を開放した上でエア圧送装置33を稼働させ、半水石膏排出部17より排出される半水石膏を上流側の無水石膏再生用キルン2へ搬送させ、回収機38にて分離回収された半水石膏を下位の半水石膏投入部13より無水石膏再生用キルン2内へ投入させる。無水石膏再生用キルン2に投入した半水石膏は、キルン内周部に周設した耐熱性のキャスター7上を掻き上げられることなく流下しつつ、直近のバーナ12から供給される高温の熱風と、蓄熱されたキャスター7とによって加熱処理され、II型無水石膏へと再生されて無水石膏排出部14より順次排出されていく。このとき、無水石膏再生用キルン2へ投入される石膏は、半水石膏再生用キルン3にてある程度予熱・乾燥処理してあるため、比較的高温での加熱処理を要するII型無水石膏への再生を効率よく行うことができる。そして、エア圧送装置30を稼働させ、無水石膏排出部14より排出されるII型無水石膏を近傍に備えたII型無水石膏貯蔵ビンへ搬送・貯蔵させる。   Next, the damper 36 which is the lower discharge destination switching means of the hemihydrate gypsum discharge part 17 is closed and the damper 37 is opened, and then the air pressure feeding device 33 is operated, and the half water discharged from the hemihydrate gypsum discharge part 17 The gypsum is conveyed to the upstream anhydrous gypsum recycling kiln 2, and the hemihydrate gypsum separated and recovered by the recovery machine 38 is input into the anhydrous gypsum recycling kiln 2 from the lower half water gypsum charging unit 13. The hemihydrate gypsum thrown into the anhydrous gypsum regeneration kiln 2 flows down on the heat-resistant caster 7 provided around the inner periphery of the kiln without being scraped, and the hot hot air supplied from the latest burner 12 The heat-treated caster 7 heat-processes, regenerates to type II anhydrous gypsum, and sequentially discharges from the anhydrous gypsum discharge unit 14. At this time, the gypsum charged into the anhydrous gypsum regeneration kiln 2 has been preheated and dried to some extent in the half water gypsum regeneration kiln 3, so that it can be applied to type II anhydrous gypsum that requires heat treatment at a relatively high temperature. Regeneration can be performed efficiently. Then, the air pressure feeding device 30 is operated, and the type II anhydrous gypsum discharged from the anhydrous gypsum discharging unit 14 is conveyed and stored in a type II anhydrous gypsum storage bottle provided nearby.

なお、排気ダクト18下流のバグフィルタ20にて捕集される石膏微粒分には、掻き上げ羽根を有さない無水石膏再生用キルン2から飛散する石膏よりも掻き上げ羽根10を有した半水石膏再生用キルン3での予熱・乾燥処理に伴って飛散する略半水石膏の状態にある石膏が多く含まれるため、スクリュコンベア40下位の排出先切替手段であるダンパー45を閉鎖しかつダンパー46を開放した上でエア圧送装置42を稼働させ、無水石膏再生用キルン2の半水石膏投入部13へ搬送し、半水石膏再生用キルン3より搬送される半水石膏と共に再度加熱処理することによってII型無水石膏に再生して前記II型無水石膏貯蔵ビンに搬送・貯蔵させる。   It should be noted that the gypsum fine particles collected by the bag filter 20 downstream of the exhaust duct 18 are semi-water having a scraping blade 10 rather than gypsum scattered from the anhydrous gypsum recycling kiln 2 that does not have a scraping blade. Since a large amount of gypsum in the state of substantially semi-water gypsum that is scattered with the preheating / drying process in the kiln 3 for regenerating gypsum is contained, the damper 45 that is the discharge destination switching means below the screw conveyor 40 is closed and the damper 46 is closed. The air pressure feeding device 42 is operated after being opened, transported to the half-water gypsum charging part 13 of the anhydrous gypsum regeneration kiln 2, and heat-treated again with the half-water gypsum transported from the half-water gypsum regeneration kiln 3. Is regenerated into type II anhydrous gypsum and transported and stored in the type II anhydrous gypsum storage bottle.

なお、本実施例においては、無水石膏再生用キルン2と半水石膏再生用キルン3には、バーナ12からの熱風と石膏の供給方向が同じとなる並流加熱方式のキルンを採用しているが、熱風と石膏の供給方向が向かい合う、いわゆる向流加熱方式のキルンを採用することもできる。   In this embodiment, the anhydrous gypsum regeneration kiln 2 and the semi-water gypsum regeneration kiln 3 employ a cocurrent heating type kiln in which the hot air from the burner 12 and the gypsum supply direction are the same. However, it is also possible to employ a so-called countercurrent heating kiln in which hot air and gypsum supply directions face each other.

1…廃石膏の加熱再生処理装置
2…無水石膏再生用キルン 3…半水石膏再生用キルン
4…中間ホッパ 6、9…ドラム
7…キャスター 10…掻き上げ羽根
11…ホットホッパ 12…バーナ
13…半水石膏投入部 14…無水石膏排出部
15…廃石膏投入部 16…コールドホッパ
17…半水石膏排出部 18…排気ダクト
20…バグフィルタ(集塵機) 24、25…温度センサ
26…バーナ燃焼制御器 27…静圧センサ
28…静圧/排風量制御器 30、33、42…エア圧送装置
31、34、35、43、44…エア配管
36、37、45、46…ダンパー(排出先切替手段)
1 ... Heat regeneration processing equipment for waste gypsum
2 ... Kiln for regenerating anhydrous gypsum 3 ... Kiln for regenerating semi-water gypsum 4 ... Intermediate hopper 6, 9 ... Drum 7 ... Caster 10 ... Scooping blades 11 ... Hot hopper 12 ... Burner 13 ... Semi-water gypsum charging unit 14 ... Anhydrous gypsum Discharge unit 15 ... Waste gypsum input unit 16 ... Cold hopper 17 ... Semi-water gypsum discharge unit 18 ... Exhaust duct 20 ... Bag filter (dust collector) 24, 25 ... Temperature sensor 26 ... Burner combustion controller 27 ... Static pressure sensor 28 ... Static pressure Pressure / exhaust air volume controller 30, 33, 42 ... Air pressure feeding device 31, 34, 35, 43, 44 ... Air piping 36, 37, 45, 46 ... Damper (discharge destination switching means)

Claims (4)

廃石膏ボードを破砕・分別処理して得られる二水石膏の状態にある廃石膏を加熱処理してII型無水石膏または半水石膏として再生する廃石膏の加熱再生処理装置であって、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルンと、半水石膏に再生する半水石膏再生用キルンとを直列に配置して連結し、前記無水石膏再生用キルンの一端部には熱風供給用のバーナと半水石膏投入用の半水石膏投入部とを、他端部には加熱処理したII型無水石膏排出用の無水石膏排出部をそれぞれ備える一方、前記半水石膏再生用キルンの一端部には廃石膏投入用の廃石膏投入部を、他端部には加熱処理した半水石膏排出用の半水石膏排出部をそれぞれ備えると共に、該半水石膏排出部の下位には半水石膏の排出先を半水石膏貯蔵用の貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えたことを特徴とする廃石膏の加熱再生処理装置。   A waste gypsum heat regeneration device that regenerates waste gypsum in the form of dihydrate gypsum obtained by crushing and separating waste gypsum board to regenerate it as type II anhydrous gypsum or hemihydrate gypsum. An anhydrous gypsum regeneration kiln that regenerates to type II anhydrous gypsum and a half water gypsum regeneration kiln that regenerates to half water gypsum are arranged in series and connected, and one end of the anhydrous gypsum regeneration kiln Is provided with a burner for supplying hot air and a half-water gypsum charging part for charging hemihydrate gypsum, and at the other end a heat-treated type II anhydrous gypsum discharging part for discharging gypsum, One end of the regeneration kiln is provided with a waste gypsum input portion for inputting waste gypsum, and the other end is provided with a half-water gypsum discharge portion for discharging heat-treated half-water gypsum. In the lower half, the discharge destination of hemihydrate gypsum is the storage bin for storing hemihydrate gypsum. Thermal regeneration treatment apparatus of a waste gypsum, characterized in that a discharge destination switching means capable of switching to either hemihydrate gypsum feeding section of anhydrite reproducing kiln. 前記無水石膏再生用キルンの内周部には耐熱性のキャスターを周設する一方、半水石膏再生用キルンの内周部には複数の掻き上げ羽根を周設したことを特徴とする請求項1記載の廃石膏の加熱再生処理装置。   A heat-resistant caster is provided around the inner periphery of the anhydrous gypsum regeneration kiln, while a plurality of scraping blades are provided around the inner periphery of the half-water gypsum regeneration kiln. The heat regeneration processing apparatus for waste gypsum according to 1. 前記半水石膏再生用キルンの排気ダクト下流に備えた集塵機にて捕集される石膏微粒分の排出先を半水石膏貯蔵用の貯蔵ビン、または無水石膏再生用キルンの半水石膏投入部の何れかに切り替え可能な排出先切替手段を備えたことを特徴とする請求項1または2記載の廃石膏の加熱再生処理装置。   The discharge destination of the gypsum fine particles collected by the dust collector provided downstream of the exhaust duct of the hemihydrate gypsum regeneration kiln is a storage bin for storing hemihydrate gypsum, or the half water gypsum input part of the anhydrous gypsum regeneration kiln. 3. The waste gypsum heat regeneration processing apparatus according to claim 1, further comprising a discharge destination switching means that can be switched to either one. 廃石膏ボードを破砕・分別処理して得られる二水石膏の状態にある廃石膏を加熱処理してII型無水石膏または半水石膏として再生する廃石膏の加熱再生処理方法であって、廃石膏を加熱処理してII型無水石膏に再生する無水石膏再生用キルンと、半水石膏に再生する半水石膏再生用キルンとを直列に配置して連結すると共に、前記無水石膏再生用キルンの一端部には熱風供給用のバーナを備え、廃石膏を半水石膏に再生するときには、半水石膏再生用キルン内の温度を廃石膏が半水石膏に転位する温度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を半水石膏再生用キルンに投入し加熱処理して半水石膏として回収する一方、廃石膏をII型無水石膏に再生するときには、無水石膏再生用キルン内の温度を廃石膏がII型無水石膏に転位する温度に維持されるようにバーナ燃焼量を制御しつつ、廃石膏を半水石膏再生用キルンに投入して予熱処理した後、無水石膏再生用キルンに投入し加熱処理してII型無水石膏として回収するようにしたことを特徴とする廃石膏の加熱再生処理方法。   A waste gypsum heat regeneration treatment method in which waste gypsum in the state of dihydrate gypsum obtained by crushing and separating waste gypsum board is heat treated to regenerate as type II anhydrous gypsum or hemihydrate gypsum. An anhydrous gypsum regeneration kiln that regenerates to type II anhydrous gypsum and a half water gypsum regeneration kiln that regenerates to half water gypsum are arranged in series and connected, and one end of the anhydrous gypsum regeneration kiln The unit is equipped with a burner for supplying hot air, and when reclaiming waste gypsum to half-water gypsum, burner combustion is performed so that the temperature in the half-water gypsum regeneration kiln is maintained at the temperature at which waste gypsum is transferred to half-water gypsum. While controlling the amount, throw the waste gypsum into the hemihydrate gypsum kiln and heat it to recover it as hemihydrate gypsum, while reclaiming waste gypsum to type II anhydrous gypsum, the temperature inside the anhydrous gypsum regeneration kiln Waste gypsum translocates to type II anhydrous gypsum While controlling the burner combustion amount so as to maintain the temperature, throw the waste gypsum into the hemihydrate gypsum recycle kiln and preheat it, then put it into the anhydrous gypsum recycle kiln and heat-treat it as type II anhydrous gypsum A method for heating and recycling waste gypsum characterized by being collected.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017149620A (en) * 2016-02-25 2017-08-31 宇部興産株式会社 Apparatus for reforming waste gypsum and method for operating the same

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JPS5595653A (en) * 1979-01-02 1980-07-21 Kloeckner Humboldt Deutz Ag Method and apparatus for heat treating mineral substance * especially sintering gypsum
JP2010127607A (en) * 2008-12-01 2010-06-10 Nikko Co Ltd Rotary kiln
JP2013167423A (en) * 2012-02-16 2013-08-29 Kyudenko Corp Heat treatment device of dihydrate gypsum, and method for producing mixed gypsum

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5595653A (en) * 1979-01-02 1980-07-21 Kloeckner Humboldt Deutz Ag Method and apparatus for heat treating mineral substance * especially sintering gypsum
JP2010127607A (en) * 2008-12-01 2010-06-10 Nikko Co Ltd Rotary kiln
JP2013167423A (en) * 2012-02-16 2013-08-29 Kyudenko Corp Heat treatment device of dihydrate gypsum, and method for producing mixed gypsum

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017149620A (en) * 2016-02-25 2017-08-31 宇部興産株式会社 Apparatus for reforming waste gypsum and method for operating the same

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