JP2015153795A - Substrate suction separation mechanism and vacuum device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technique that prevents damage of a substrate due to local concentration of stress to a substrate when the substrate is separated in a vacuum device or the like for holding the substrate with adhesion force, and prevents a device portion on the substrate from being adversely affected by static electricity occurring when the substrate is separated.SOLUTION: In a substrate suction separation mechanism 1, a feeding pedestal 3 for feeding a substrate 20 while the substrate 20 is disposed on a pedestal surface 4 is provided with a suction separation member 6 for sucking and separating the substrate 20. A suction area 61 and a non-suction area 62 are provided in proximity with each other in a curved surface area of the surface of the suction separation member 6. The suction separation member 6 is configured to be rotatable in the curving direction of the curved surface area so as to be disposed at a suction position where the surface of the suction area 61 is on the same plane as the pedestal surface 4 and at a non-suction position where the surface of the non-suction area 62 is separated from the pedestal surface 4.

Description

  The present invention relates to a technique for adsorbing and releasing a substrate by an adhesive force when the substrate is transported, for example, in a semiconductor manufacturing process, a liquid crystal display manufacturing process, a plasma display manufacturing process, and the like.

2. Description of the Related Art Conventionally, as this type of apparatus, for example, an apparatus that performs various processing by adsorbing a substrate to a holding portion with an adhesive force in a vacuum chamber is known.
For example, while adsorbing and holding a substrate with a ring-shaped adhesive surface, a device that deforms and presses against the substrate when peeling the substrate from the adhesive surface, or a device that presses the rigid body against the substrate is proposed (For example, see Patent Documents 1 and 2).
There has also been proposed a technique in which a pressure-sensitive adhesive pad made of flexible rubber is pressed against a substrate to hold the substrate, while the pressure-sensitive adhesive pad is pressure-expanded and peeled from the substrate (for example, see Patent Document 3).

However, such a conventional technique has a problem that when the substrate is peeled off from the adhesive surface, the substrate is damaged due to local stress concentration on the substrate.
Another problem is that static electricity generated when the substrate is peeled from the adhesive surface adversely affects the device portion on the substrate.

Japanese Patent No. 3882004 Japanese Patent No. 3917651 JP 2012-204709 A

  The present invention has been made to solve the above-described problems of the prior art, and the object of the present invention is to provide a local apparatus with respect to the substrate when the substrate is detached in a vacuum apparatus or the like that holds the substrate with adhesive force. It is an object of the present invention to provide a technique for preventing damage to a substrate due to a stress concentration and preventing an adverse effect on a device portion on the substrate due to static electricity generated when the substrate is detached.

The present invention made in order to achieve the above object has a transport pedestal for transporting the substrate disposed on the pedestal surface, and a suction detachment member provided on the transport pedestal for sucking and detaching the substrate, The adsorption / detachment member has a curved surface area having a curved surface, and the adsorption area and the non-adsorption area are provided adjacent to the curved area, and the surface of the adsorption area is on the pedestal surface. The suction / removal member is curved in the curved region so that the suction position is flush with the non-suction position where the surface of the non-suction region is spaced from the pedestal surface. 1 is a substrate adsorption / desorption mechanism configured to be rotatable.
The present invention is also effective when a plurality of openings are provided on the pedestal surface of the transport pedestal, and the adsorption / desorption member is provided inside each opening.
In the present invention, the adsorption / desorption member is also effective when the cross-section is formed in a perfect circle shape and the adsorption / desorption member is configured to move in a direction intersecting the pedestal surface of the transfer pedestal. It is.
In the present invention, the adsorption / detachment member may be configured so that the cross section is formed in a perfect circle shape and is rotated about a rotation shaft portion provided eccentrically from the rotation center axis of the perfect circle. It is effective.
In the present invention, the adsorption / desorption member is also effective when the cross section is formed in an oval shape and is configured to rotate around a rotation shaft portion provided at the position of the rotation center axis of the oval. It is.
On the other hand, the present invention includes a vacuum chamber and any one of the substrate adsorption / desorption mechanisms disposed in the vacuum chamber, and operates the adsorption / desorption member by a driving mechanism provided in the vacuum chamber. It is the vacuum device comprised.

  In the case of the substrate adsorption / desorption mechanism of the present invention, in the adsorption position where the surface of the adsorption region of the adsorption / desorption member is flush with the pedestal surface, when the substrate is placed on the pedestal surface of the transfer pedestal, the back side of the substrate Since the substrate is in contact with the surface, by pressing the substrate against the surface of the adsorption area of the adsorption / desorption member at this position, the substrate is placed by the adhesive force of the adsorption area of the adsorption / desorption member in a state where the substrate is arranged on the pedestal surface of the conveyance base. Adsorption can be held.

  On the other hand, when the suction / removal member is rotated from the suction position in the curved direction of the curved surface region, the suction portion on the front side of the substrate moving direction of the suction portion between the surface of the suction region and the back side surface of the substrate starts to rotate the suction / removal member After the peeling, the substrate moves as if rolling on the surface of the curved adsorption area as the adsorption / desorption member rotates, so that during the rotation operation, the substrate moves away from the adsorption area surface of the adsorption / desorption member. The shearing force applied to the surface of the substrate is very small as compared with the case where the planar adsorption surface adsorbed on the back side surface of the substrate is peeled in the direction perpendicular to the back side surface of the substrate.

  Furthermore, if the adsorption / desorption member continues to rotate in the curved direction, the contact portion between the back side surface of the substrate and the surface of the adsorption region of the adsorption / desorption member moves from the adsorption region toward the adjacent non-adsorption region. As a result, the adhesive force between the substrate and the adsorption / desorption member disappears.

  In this non-adsorption position, the non-adsorption region of the adsorption / removal member is separated from the pedestal surface, so that the substrate can be easily detached from the conveyance pedestal by using a conveyance mechanism such as a lift pin or an arm, for example. .

According to the present invention described above, when the substrate adsorbed on the surface of the adsorption region of the adsorption / desorption member is separated from the adsorption / desorption member, the shear applied from the surface of the adsorption region of the adsorption / desorption member to the back side surface of the substrate The force is very small compared to the conventional technology in which the flat suction surface adsorbed on the back side of the substrate is peeled in the direction orthogonal to the back side of the substrate, and the back side of the substrate and each adsorption / desorption member When the contact portion with the surface of the substrate moves to the surface of the non-adsorption region, the adhesive force between the substrate and each adsorption / desorption member has disappeared (or almost does not exist). Thus, local stress concentration from the adsorption / desorption member to the substrate does not occur, and as a result, damage to the substrate can be prevented.
Further, since the frictional force when the substrate is detached from the transport base is very small as compared with the prior art, almost no static electricity is generated, so that the device portion on the substrate is not adversely affected.

  In the present invention, when a plurality of openings are provided on the pedestal surface of the transport pedestal, and a suction / removal member is provided inside each opening, the plurality of suction / removal members hold the substrate in a balanced manner. In addition, it is possible to reduce the size of the substrate adsorption / desorption mechanism by accommodating each adsorption / desorption member in the transport base.

  In the present invention, the adsorption / desorption member is formed in a circular shape in cross section, and when the adsorption / desorption member is configured to move in a direction intersecting the pedestal surface of the conveyance pedestal, for example, a cylindrical shape By adhering an adhesive sheet and a non-adhesive or weakly adhesive sheet to this member, the adsorption / desorption member used in the present invention can be easily prepared.

  In the present invention, when the cross section of the adsorption / detachment member is formed in a perfect circle shape and is configured to rotate around a rotation shaft portion provided eccentric from the rotation center axis of the perfect circle, or the adsorption When the section of the detachment member is formed in an oval shape and is configured to rotate around the rotation shaft provided at the position of the rotation center axis of the ellipse, the adsorption detachment member is By simply rotating as the center, the surface of the adsorption / desorption member can be moved in a direction intersecting the pedestal surface (for example, the vertical direction), and the contact between the adsorption region and the non-adsorption region can be switched with respect to the substrate. Therefore, the mechanism for driving the adsorption / desorption member can be made simpler.

  And it has a vacuum chamber and one of the above-mentioned substrate adsorption / desorption mechanisms arranged in the vacuum chamber, and is configured to operate the adsorption / desorption member by a drive mechanism provided in the vacuum chamber. When the substrate is removed, the vacuum apparatus can prevent damage to the substrate due to local stress concentration on the substrate and prevent adverse effects on the device portion on the substrate due to static electricity generated when removing the substrate. Can be provided.

(A): Plan view showing the external configuration of the embodiment of the substrate adsorption / desorption mechanism according to the present invention (b): Partial sectional view showing the internal configuration of the substrate adsorption / desorption mechanism (c): Perspective view of adsorption / detachment member (A) (b): Explanatory drawing which shows the movement range of the adsorption | suction separation member in this Embodiment (A)-(c): Explanatory drawing which shows the board | substrate adsorption | suction operation | movement in this Embodiment. (A)-(d): Explanatory drawing which shows the board | substrate removal operation | movement in this Embodiment. (A)-(c): Side view which shows the other example of the adsorption | suction separation member used for this invention. (A)-(c): Side view which shows the other example of the adsorption | suction separation member used for this invention.

Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.
FIG. 1A is a plan view showing an external configuration of an embodiment of a substrate adsorption / desorption mechanism according to the present invention, FIG. 1B is a partial cross-sectional view showing an internal configuration of the substrate adsorption / desorption mechanism, and FIG. (C) is a perspective view of an adsorption / desorption member of the substrate adsorption / desorption mechanism.
2 (a) and 2 (b) are explanatory diagrams showing the movement range of the adsorption / desorption member in the present embodiment.

As shown in FIGS. 1A and 1B, a substrate adsorption / desorption mechanism 1 according to the present embodiment is used in a vacuum chamber 2, for example, and has a transport base 3 for transporting a substrate 20. Yes.
In addition, the conveyance pedestal 3 is usually arranged in the horizontal direction. In this specification, when referring to the vertical relationship of members and the like, it is based on the positional relationship of FIG. 1 (b) and FIGS. 2 (a) and 2 (b).

  The transfer pedestal 3 is formed, for example, in the shape of a rectangular plate corresponding to the shape of the substrate 20, and the substrate 20 is placed on the flat pedestal surface 4 formed on one side (here, the front side). It is comprised so that mounting may be carried out.

A plurality of (six in this embodiment) hole portions 3a are provided through the transport base 3, and lift pins 21 for raising and lowering the substrate 20 are inserted into the hole portions 3a. ing.
A plurality (four in this embodiment) of operation openings 5 are provided on the pedestal surface 4 of the transport pedestal 3.

  The operation opening 5 of the present embodiment is formed in, for example, a rectangular shape, and is formed so as to penetrate, for example, the operation opening 5 on the side opposite to the pedestal surface 4 (here, the back side surface) of the transport pedestal 3. A housing part 50 is provided.

In the accommodating part 50, the adsorption | suction removal member 6 is provided, respectively.
The adsorption / desorption member 6 has a curved surface area whose surface is formed in a curved surface shape. In the present embodiment, the cross section is formed in a perfect circle shape (for example, a cylindrical shape).

On the surface of each adsorption / desorption member 6, an adsorption region 61 for adsorbing the substrate 20 and a non-adsorption region 62 for separating the substrate 20 are provided.
The adsorption region 61 is configured by, for example, a sheet-like member made of an elastic material having adhesiveness (for example, silicone rubber).

  In the present specification, “adhesiveness” refers to an intermolecular relationship between the adhesive substance and the surface of the member such as the substrate when the adhesive substance contacts the surface of the member such as the substrate. This is caused by power.

In the present embodiment, the adsorption region 61 is provided along the longitudinal direction of the adsorption / desorption member 6 so that the central angle of the cross-sectional circle of the adsorption / desorption member 6 is, for example, about 90 degrees.
And the two adsorption | suction area | regions 61 are arrange | positioned so that it may become rotationally symmetrical centering | focusing on the rotation center axis line of the cylinder of the adsorption | suction removal member 6. FIG.

On the other hand, the non-adsorption region 62 is configured by, for example, a sheet-like member made of a material having no adhesiveness or a material having a lower adhesiveness than the adsorption region 61 (for example, a fluororesin).
The non-adsorption region 62 is provided along the longitudinal direction of the adsorption / desorption member 6 so that the central angle of the cross-sectional circle of the adsorption / desorption member 6 is about 90 degrees, for example.
Two non-adsorption regions 62 are arranged so as to be rotationally symmetric about the rotation center axis of the adsorption / desorption member 6.
With such a configuration, in the present embodiment, the adsorption areas 61 and the non-adsorption areas 62 are alternately arranged adjacent to each other on the surface of the adsorption / desorption member 6.

Each adsorption / desorption member 6 has a rotation shaft portion 63 provided at the position of the rotation center axis, and is attached in the accommodating portion 50 of the transport base 3 so as to be rotatable around the rotation shaft portion 63. .
Here, each adsorption | suction separation member 6 is arrange | positioned toward the same direction (arrow Y direction shown to Fig.1 (a)), and the rotating shaft part 63 is parallel to the base surface 4 (XY plane) of the conveyance base 3. FIG. Has been.

  Further, as shown in FIGS. 2A and 2B, each adsorption / desorption member 6 intersects the pedestal surface 4 of the conveyance pedestal 3 along a guide (not shown) in the accommodating portion 50 of the conveyance pedestal 3, for example, orthogonally. It is provided to be movable in the direction of movement (arrow Z direction).

  In this case, each adsorption / desorption member 6 is positioned such that the top on the upper side is below the operation opening 5 (the pedestal surface 4) of the transport pedestal 3 due to the driving force of the drive mechanism 22 described later (FIG. 2 ( a)) to a position (see FIG. 2B) that is above the operation opening 5 (base surface 4) of the transport base 3.

Further, the length of each adsorption / detachment member 6 is set so that the rotation shafts 63 a on both sides of the transport pedestal 3 protrude from both sides of the transport pedestal 3.
Furthermore, a power transmission mechanism 64 is provided at the tip of the rotation shaft 63a of each adsorption / detachment member 6.

These power transmission mechanisms 64 are configured such that, for example, rotational power and power in a direction perpendicular to the pedestal surface 4 of the transport base 3 are transmitted from the drive mechanism 22 provided in the vacuum chamber 2.
As the drive mechanism 22 and the power transmission mechanism 64, for example, a gear train, a permanent magnet, or an electromagnet can be used.

FIGS. 3A to 3C are explanatory views showing the substrate suction operation in the present embodiment.
In the present embodiment, when the substrate 20 is sucked, for example, the transport pedestal 3 is carried into the vacuum chamber 2 and placed at a predetermined position.

  Then, the drive mechanism 22 in the vacuum chamber 2 is connected to the power transmission mechanism 64 of each adsorption / desorption member 6 so that the power from the drive mechanism 22 is transmitted to each adsorption / desorption member 6 via the power transmission mechanism 64. (See FIG. 1 (a)).

  Further, the drive mechanism 22 is operated so that the suction region 61 of the suction / removal member 6 is directed toward the pedestal surface 4 side of the transport base 3 and the suction / removal member 6 is moved in a direction orthogonal to the base surface 4 of the transport base 3. As shown in FIG. 3A, the central portion (top) of the surface of the suction region 61 of the suction / removal member 6 is flush with the pedestal surface 4 inside the operation opening 5 of the transport pedestal 3 (in practice) Is set to a position slightly above the pedestal surface 4 (suction position).

  In this state, using a transfer robot (not shown), the substrate 20 is placed at a predetermined position on the pedestal surface 4 of the transfer pedestal 3 as shown in FIG. Thereby, the back side surface of the substrate 20 contacts the surface of the suction region 61 of each suction / detachment member 6.

  Next, for example, by evacuating the vacuum chamber 2 from below the transfer pedestal 3, a downward force is applied to the substrate 20, and as shown in FIG. The back side surface of the substrate 20 is pressed against the surface of the suction region 61.

As a result, the suction region 61 of each suction / detachment member 6 is elastically deformed and crushed, and the reaction force causes the back side surface of the substrate 20 to be adhered and held on the surface of the suction region 61 of each suction / detachment member 6. Further, the back side surface of the substrate 20 is in close contact with the pedestal surface 4 of the transfer pedestal 3.
In this state, the substrate adsorption / desorption mechanism 1 is moved into a processing chamber (not shown), and a predetermined process such as vapor deposition is performed on the front side surface of the substrate 20.

  In addition, even if the front and back of the substrate adsorption / desorption mechanism 1 are reversed, the substrate 20 is not separated from each adsorption / desorption member 6 between the back side surface of the substrate 20 and the adsorption region 61 of each adsorption / desorption member 6. It is preferable to set the adhesive strength.

4 (a) to 4 (d) are explanatory views showing the substrate separation operation in the present embodiment.
In the present embodiment, when the substrate 20 is detached from the substrate adsorption / desorption mechanism 1, the substrate adsorption / desorption mechanism 1 in the state where the substrate 20 is adsorbed (the state shown in FIG. 3 (c)) is used, for example, in the vacuum chamber described above. 2 is carried in and arranged at a predetermined position.

  Then, the drive mechanism 22 in the vacuum chamber 2 is connected to the power transmission mechanism 64 of each adsorption / desorption member 6 so that the power from the drive mechanism 22 is transmitted to each adsorption / desorption member 6 via the power transmission mechanism 64. (See FIG. 1 (a)).

  In this state, due to the driving force of the drive mechanism 22, each suction / detachment member 6 is moved from the suction position shown in FIG. 3C to, for example, the same height position above, as shown in FIG. The back side surface of the substrate 20 is separated from the base surface 4 of the transport base 3.

And each adsorption | suction separation member 6 is rotated to the same direction (for example, clockwise direction in a figure) centering on the rotating shaft part 63. As shown in FIG.
As a result, the back side surface of the substrate 20 moves horizontally to the rotation direction side of the adsorption / desorption member 6 while contacting the surface of the adsorption region 61 of each adsorption / desorption member 6.

  In this case, since the surface of the suction region 61 of each suction / detachment member 6 is formed in a curved surface (convex surface), the front end side in the substrate movement direction of the suction portion between the surface of the suction region 61 and the back side surface of the substrate 20. The substrate 20 moves as if it rolls on the surface of the curved suction region 61 as the suction / removal member 6 rotates after the suction portion of the suction / removal member 6 starts to rotate. The shearing force applied to the back side surface of the substrate 20 from the surface of the suction region 61 of the suction / detachment member 6 is perpendicular to the back side surface of the substrate 20 with the planar suction surface adsorbed on the back side surface of the substrate 20. It is very small compared with the case where it peels in the direction.

Further, the rotation of each adsorption / desorption member 6 causes the contact portion between the back side surface of the substrate 20 and the surface of the adsorption region 61 of each adsorption / desorption member 6 to move from the adsorption region 61 toward the adjacent non-adsorption region 62. When the contact portion between the back side surface of the substrate 20 and the surface of each adsorption / desorption member 6 moves from the surface of the adsorption region 61 to the surface of the non-adsorption region 62 (see FIG. 4B), each adsorption / desorption member 6. Stops rotating (non-adsorption position).
In this state, since the back side surface of the substrate 20 is in contact with the non-adsorption region 62 of each adsorption / desorption member 6, the adhesive force between the substrate 20 and each adsorption / desorption member 6 has disappeared (or almost disappeared). ).

Thereafter, as shown in FIG. 4C, the lift pins 21 are raised through the holes 3 a of the transport base 3, and the substrate 20 is lifted and separated from the suction / detachment members 6.
Further, using a transfer robot (not shown), as shown in FIG. 4D, the substrate 20 is moved away from the lift pins and retracted, for example, from the vacuum chamber 2.

According to the present embodiment described above, when the substrate 20 adsorbed on the surface of the adsorption region 61 of the adsorption / desorption member 6 is desorbed from the adsorption / desorption member 6, the substrate 20 is removed from the surface of the adsorption region 61 of the adsorption / desorption member 6. The shearing force applied to the back side surface of the substrate 20 is very small compared to the case where the planar suction surface adsorbed on the back side surface of the substrate 20 is peeled in a direction perpendicular to the back side surface of the substrate 20, and In a state where the contact portion between the back side surface of the substrate 20 and the surface of each adsorption / desorption member 6 has moved to the surface of the non-adsorption region 62, the adhesive force between the substrate 20 and each adsorption / desorption member 6 disappears. Therefore, when the substrate 20 is detached from the transport pedestal 3, local stress concentration from the adsorption / desorption member 6 to the substrate 20 does not occur, and as a result, the substrate 20 can be prevented from being damaged.
In addition, since the friction force when the substrate 20 is detached from the transport base 3 is very small as compared with the prior art, almost no static electricity is generated, and the device portion on the substrate 20 is not adversely affected.

5 (a) to 5 (c) and FIGS. 6 (a) to 6 (c) are side views showing other examples of the adsorption / desorption member used in the present invention. The same reference numerals are assigned and detailed description thereof is omitted.
As shown in FIGS. 5A to 5C, the adsorption / desorption member 6A of the present example has a cross-sectional shape that is the same as that of the above-described embodiment, and the rotation shaft portion 63 extends from the rotation center axis O of the cylinder. It is provided eccentrically.

In this example having such a configuration, the distance between the rotation shaft portion 63 that is the center of rotation and the surface of the adsorption / desorption member 6A changes as the adsorption / desorption member 6A rotates.
Therefore, in this example, as shown in FIG. 5A, for example, the suction region 61 is arranged so that the distance between, for example, the central portion of the surface of the suction region 61 of the suction / detachment member 6A and the rotation shaft portion 63 is the smallest. In addition, the non-adsorption region 62 is arranged adjacent to the adsorption region 61.

Then, the suction position is set so that the surface of, for example, the central portion of the suction region 61 of the suction / removal member 6A is flush with the base surface 4 of the transport base 3 (actually a position slightly above the base surface 4).
In this state, the board | substrate 20 is arrange | positioned on the base surface 4 of the conveyance base 3, and the back side surface of the board | substrate 20 is made to contact the adsorption | suction area | region 61 of 6 A of adsorption | suction removal members.

  Then, as described above, the back side surface of the substrate 20 is pressed against the suction region 61 of the suction / detachment member 6 </ b> A, for example, by evacuating the vacuum chamber 2 from below the transport base 3. Is adhered and held in the suction region 61 of the suction / detachment member 6A.

  On the other hand, when the substrate 20 is detached from the adsorption / desorption member 6A, the drive mechanism 22 described above is connected to the power transmission mechanism 64 of the adsorption / desorption member 6A (see FIG. 1A), and the adsorption / desorption member 6A is, for example, Rotate clockwise in the figure.

As a result, as shown in FIG. 5B, the top of the surface moves away from the pedestal surface 4 of the transport pedestal 3, that is, upward, as the adsorption / desorption member 6 </ b> A rotates.
As a result, the substrate 20 moves obliquely upward in the rotation direction of the adsorption / desorption member 6A while its back side surface is in contact with the adsorption region 61 of the adsorption / desorption member 6A.
Then, when the contact portion with the back side surface of the substrate 20 shifts from the adsorption region 61 of the adsorption / desorption member 6A to the non-adsorption region 62 (see FIG. 5C), the rotation of the adsorption / desorption member 6A is stopped (non-existence). Adsorption position).

In this state, the back side surface of the substrate 20 is in contact with the non-adsorption region 62 of the adsorption / desorption member 6A, and the substrate 20 is not adsorbed by the adsorption / desorption member 6A. It is made to detach | leave from the adsorption | suction separation member 6A.
Thereafter, the suction / removal member 6A is rotated counterclockwise, for example, to return to the suction position shown in FIG.

  According to this example having such a configuration, in addition to the same effects as in the above embodiment, the surface of the adsorption / desorption member 6A is moved in the vertical direction only by rotating around the rotation shaft portion 63, and Since the contact between the adsorption region 61 and the non-adsorption region 62 can be switched with respect to the substrate 20, the mechanism for driving the adsorption / removal member 6A can be simplified.

On the other hand, the adsorption / desorption member 6B shown in FIGS. 6 (a) to 6 (c) has an oval (for example, elliptical) cross-sectional shape of the main body. In this case, the rotation center of the rotation shaft portion 63 is made to coincide with the ellipse rotation center axis O.
Also in this example having such a configuration, as in the example shown in FIGS. 5A to 5C, the rotation shaft 63 and the adsorption / desorption member 6 </ b> B, which are the rotation centers, are rotated along with the rotation of the adsorption / desorption member 6 </ b> B. The distance to the surface changes.

In this example, for example, as shown in FIG. 6A, the suction region 61 is arranged so that the distance between, for example, the central portion of the surface of the suction region 61 of the suction / detachment member 6B and the rotation shaft portion 63 is minimized. The non-adsorption region 62 is arranged adjacent to the adsorption region 61.
Then, the suction position is set so that the surface of, for example, the central portion of the suction region 61 of the suction / removal member 6B is flush with the base surface 4 of the transport base 3 (actually slightly above the base surface 4).

In such a configuration, when the substrate 20 is held on the transport pedestal 3, the substrate 20 is disposed on the pedestal surface 4 of the transport pedestal 3, and the back side surface of the substrate 20 is in contact with the suction region 61 of the suction detachment member 6B. Let
Then, as described above, for example, by performing vacuum evacuation from below the transport base 3, the back side surface of the substrate 20 is pressed against the suction region 61 of the suction / removal member 6B, and the back side surface of the substrate 20 is pressed against the suction / removal member 6B. The adsorption area 61 is adhered and held.

  On the other hand, when the substrate 20 is detached from the adsorption / desorption member 6B, the drive mechanism 22 described above is connected to the power transmission mechanism 64 of the adsorption / desorption member 6B (see FIG. 1A), and the adsorption / desorption member 6B is, for example, Rotate clockwise in the figure.

As a result, as shown in FIG. 6B, the top of the surface moves away from the pedestal surface 4 of the transport pedestal 3, that is, upward, as the adsorption / desorption member 6 </ b> B rotates.
As a result, the substrate 20 moves obliquely upward in the rotation direction of the adsorption / desorption member 6B while its back side surface is in contact with the adsorption region 61 of the adsorption / desorption member 6B.
Then, when the contact portion with the back side surface of the substrate 20 shifts from the adsorption region 61 of the adsorption / desorption member 6B to the non-adsorption region 62 (see FIG. 6C), the rotation of the adsorption / desorption member 6B is stopped (non-extraction). Adsorption position).

In this state, the back side surface of the substrate 20 is in contact with the non-adsorption region 62 of the adsorption / desorption member 6B, and the substrate 20 is not adsorbed by the adsorption / desorption member 6B. It is made to detach | leave from the adsorption | suction separation member 6B.
Thereafter, the suction / removal member 6B is rotated counterclockwise, for example, to return to the suction position shown in FIG.

  According to this example having such a configuration, in addition to the same effects as those of the above embodiment, the surface of the adsorption / desorption member 6B can be moved in the vertical direction only by rotating the adsorption / desorption member 6B around the rotation shaft 63. Further, since the contact between the adsorption region 61 and the non-adsorption region 62 can be switched with respect to the substrate 20, the mechanism for driving the adsorption / desorption member 6B can be made simpler.

The present invention is not limited to the above-described embodiment, and various changes can be made.
For example, in the above-described embodiment, the cross-sectional shape of the adsorption / desorption member is a perfect circle or an ellipse, but the present invention is not limited to this, and has a curved region in which the surface of the adsorption / desorption member is formed in a curved shape. For example, a semicircular cross-sectional shape or a spherical adsorption / desorption member may be used.

Moreover, the example shown to Fig.5 (a)-(c) and the example shown to Fig.6 (a)-(c) can also be combined. That is, the cross-sectional shape of the adsorption / desorption member may be an oval shape, and the rotation shaft portion may be provided eccentric from the oval rotation center axis.
Further, the number of adsorption / desorption members, and the number and shape of adsorption regions and non-adsorption regions provided in the adsorption / desorption member are not limited to those in the above-described embodiment, and can be appropriately changed according to the size and shape of the substrate. .

Furthermore, the present invention can be used not only in a vacuum, but also in the atmosphere and gas.
In this case, a mechanical pressing mechanism may be used to press the substrate against the suction area of the suction / removal member.

DESCRIPTION OF SYMBOLS 1 ... Substrate adsorption | suction removal mechanism 2 ... Vacuum tank 3 ... Conveyance base 4 ... Base surface 5 ... Operation | movement opening part 6 ... Adsorption / detachment member 20 ... Substrate 21 ... Lift pin 22 ... Drive mechanism 50 ... Storage part 61 ... Adsorption area | region 62 ... Non-adsorption Area 63 ... Rotating shaft 64 ... Power transmission mechanism

Claims (6)

A transport pedestal for placing and transporting the substrate on the pedestal surface;
An adsorption / detachment member that is provided on the transfer pedestal and that adsorbs and detaches the substrate;
The adsorption / detachment member has a curved surface area having a curved surface, and the adsorption area and the non-adsorption area are provided adjacent to the curved area, and the surface of the adsorption area is on the pedestal surface. The suction / removal member is curved in the curved region so that the suction position is flush with the non-suction position where the surface of the non-suction region is spaced from the pedestal surface. A substrate adsorption / desorption mechanism configured to be rotatable.   The substrate adsorption / desorption mechanism according to claim 1, wherein a plurality of openings are provided on a pedestal surface of the transfer pedestal, and the adsorption / desorption member is provided inside each opening.   The said adsorption | suction separation member is formed so that a cross section may be formed in a perfect circle shape, and the said adsorption | suction separation member may be moved in the direction which cross | intersects the base surface of the said conveyance base. 4. A substrate adsorption / desorption mechanism according to the item.   4. The adsorption / detachment member according to claim 1, wherein the adsorption / detachment member is formed in a perfect circle shape and is configured to rotate around a rotation shaft portion that is eccentric from a rotation center axis of the perfect circle. A substrate adsorption / desorption mechanism according to claim 1.   The adsorption / detachment member has an elliptical cross section, and is configured to rotate around a rotation shaft provided at a position of a rotation center axis of the ellipse. 4. A substrate adsorption / desorption mechanism according to the item. A vacuum chamber;
The substrate adsorption / desorption mechanism according to any one of claims 1 to 5, which is disposed in the vacuum chamber,
The vacuum apparatus comprised so that the said adsorption | suction separation member may be operated with the drive mechanism provided in the said vacuum chamber.

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