JP2015118219A - Light intensity distribution measuring device, drawing device, and light intensity distribution measuring method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To measure light intensity distribution of linear light repeatedly and accurately with a simple constitution.SOLUTION: A light intensity distribution measuring device 4 includes a mask unit 41 having a cylindrical irradiation surface 412 and a light intensity measurement unit 42 provided inside the mask unit 41. Linear light from a head unit 3 that emits the linear light irradiates the irradiation surface 412, and a linear irradiation region 415 parallel to the center axis J1 of the irradiation surface 412 is formed. The irradiation surface 412 continuously rotates about the center axis J1. The irradiation surface 412 is provided with a slit 414 inclined with respect to the center axis J1. If the slit 414, which is a linear transmission region, is interpreted as being an aggregation of a plurality of transmission region components arranged continuously in a line, the plurality of transmission region components pass through a plurality of different positions on the linear irradiation region 415 at different timings, and the light transmitted through the transmission region components is received by the light intensity measurement unit 42. Thus, light intensity distribution of linear light can be measured repeatedly and accurately with a simple constitution.

Description

  The present invention relates to a technique for measuring a light amount distribution of linear light, and a drawing apparatus using the technique.

  2. Description of the Related Art Conventionally, a drawing apparatus (direct drawing type pattern drawing apparatus) that draws a pattern by irradiating the surface of a substrate such as a semiconductor substrate or a glass substrate provided with a photosensitive material with a light beam has been used. In the drawing apparatus, for example, linear light is irradiated to a diffraction grating type spatial light modulator, and the spatially modulated light is guided onto the substrate.

  In order to draw a pattern on the substrate with high accuracy, it is necessary to make the light amount distribution of the light irradiated on the substrate a desired distribution. For example, in the image recording apparatus of Patent Document 1, the amount of signal light corresponding to each light modulation element of a light modulation device provided with a plurality of light modulation elements is acquired by a line sensor, and the output light amount of each light modulation element is calculated. Correction parameters for correction are corrected. The acquisition of the light amount of the signal light and the correction of the correction parameter are repeated until the variation in the light amount of the signal light is within the allowable range. Note that Patent Document 1 also discloses a method of acquiring the amount of signal light corresponding to each light modulation element while moving the slit.

JP 2003-140355 A

  Incidentally, in recent years, the pattern drawn on the substrate has been miniaturized, and the number of light modulation elements provided in the spatial light modulator has also increased (for example, in a diffraction grating type spatial light modulator, 8000). Therefore, when the line sensor is used when acquiring the light amount distribution of the linear light, it is not easy to position the linear light irradiation area and the line sensor. Further, when the area corresponding to one light modulation element is smaller than one detection element on the light receiving surface of the line sensor, the resolution in measuring the light amount distribution of the linear light becomes insufficient. In order to facilitate positioning with the irradiation area of the linear light, it may be possible to use an area sensor in which detection elements are arranged two-dimensionally instead of the line sensor, but to improve the resolution in measuring the light quantity distribution. It is difficult.

  When the light quantity distribution is measured by moving the slit and the light receiver in the longitudinal direction of the linear light, hysteresis occurs in the forward path and the return path, and there is a problem that the measurement accuracy during repeated measurement is lowered. Further, depending on the accuracy required for the measurement of the light amount distribution, a laser length measurement system is required to ensure the positional accuracy of the slit and the light receiver, and the manufacturing cost of the apparatus related to the measurement of the light amount distribution increases.

  The present invention has been made in view of the above problems, and an object thereof is to repeatedly and accurately measure the light amount distribution of linear light with a simple configuration.

  The invention according to claim 1 is a light amount distribution measuring device for measuring a light amount distribution of linear light, and has an irradiation surface to which the linear light from the head part that emits linear light is irradiated, The irradiation surface that is a plane is rotated around an axis perpendicular to the plane, or the irradiation surface that is at least a part of a rotation surface that is a cylindrical surface or a conical surface is centered on the central axis of the rotation surface A plurality of transmission region elements formed on the irradiation surface pass through a plurality of different positions of the linear irradiation region of the linear light on the irradiation surface at different timings, respectively. And a light quantity measuring unit that receives light transmitted through each transmission region element of the mask unit.

  A second aspect of the present invention is the light quantity distribution measuring device according to the first aspect, wherein the plurality of transmission region elements are included in the linear transmission region.

  A third aspect of the present invention is the light amount distribution measuring apparatus according to the second aspect, wherein the linear transmission region passes through all positions of the linear irradiation region.

  The invention according to claim 4 is the light quantity distribution measuring device according to claim 2 or 3, wherein another linear transmission region similar to the linear transmission region is formed on the irradiation surface, and the irradiation is performed. In the rotation angle of the surface, an angle range in which the linear transmission region passes through the linear irradiation region and an angular range in which the other linear transmission region passes through the linear irradiation region are different.

  A fifth aspect of the present invention is the light quantity distribution measuring device according to any one of the first to fourth aspects, wherein the linear light from another head unit that emits linear light is applied to the irradiation surface. It further includes another light quantity measurement unit that receives the light that has been irradiated and transmitted through each of the transmission region elements of the mask unit out of the linear light from the other head unit.

  The invention according to claim 6 is a drawing apparatus comprising: an emitting unit that emits linear light; a spatial light modulator that is irradiated with the linear light from the emitting unit; and the spatial light modulator. A projection optical system for guiding spatially modulated light onto an object, a moving mechanism for moving an irradiation position on the object of the spatially modulated light, and the movement of the irradiation position by the moving mechanism in synchronization with the movement The controller that controls the spatial light modulator and the linear light that has passed through the spatial light modulator and the projection optical system are incident when measuring the light amount distribution of the linear light on the object. The light quantity distribution measuring device according to any one of 1 to 5 is provided.

  The invention according to claim 7 is a light amount distribution measuring method for measuring a light amount distribution of linear light, wherein a) linear light is emitted from a head portion, and the linear light is irradiated on an irradiation surface of a mask portion. Irradiating; and b) rotating the irradiation surface that is a plane around an axis perpendicular to the plane, or the irradiation surface that is at least part of a rotation surface that is a cylindrical surface or a conical surface. By rotating about the central axis of the rotation surface, the plurality of transmission region elements formed on the irradiation surface are different from each other in a plurality of different positions of the linear irradiation region of the linear light on the irradiation surface. A step of passing at a timing; and a step of measuring the amount of light transmitted through each transmission region element of the mask portion in parallel with the step b).

  According to the present invention, it is possible to repeatedly and accurately measure the light amount distribution of linear light with a simple configuration.

It is a figure which shows the structure of the drawing apparatus which concerns on 1st Embodiment. It is a figure which shows the internal structure of a head part. It is a figure which shows a some head part and a some light quantity distribution measuring apparatus. It is a figure which shows a light quantity distribution measuring apparatus. It is a figure which shows the slit on an irradiation surface. It is a figure which shows the flow of the process which correct | amends the light quantity distribution of linear light. It is a figure which shows the other example of a light quantity distribution measuring apparatus. It is a perspective view which shows the light quantity distribution measuring apparatus which concerns on 2nd Embodiment. It is a top view which shows a mask part. It is a figure which shows the spiral of Archimedes. It is a perspective view which shows the other example of a light quantity distribution measuring apparatus. It is a top view which shows a mask part. It is a figure which shows the spiral of Archimedes. It is a figure which shows the other example of a drawing apparatus. It is a perspective view which shows a light quantity distribution measuring apparatus. It is a top view which shows a mask part. It is a figure which shows the some permeation | transmission area | region element on an irradiation surface. It is sectional drawing which shows the other example of a mask part. It is sectional drawing which shows the other example of a mask part.

  FIG. 1 is a diagram showing a configuration of a drawing apparatus 1 according to the first embodiment of the present invention. The drawing apparatus 1 is a direct drawing apparatus that draws a pattern by irradiating the surface of a substrate 9 such as a semiconductor substrate or a glass substrate, to which a photosensitive material is applied, with a light beam. In FIG. 1, the X, Y, and Z directions orthogonal to each other are indicated by arrows.

  The drawing apparatus 1 includes a stage 21, a moving mechanism 22, a plurality of head units 3, a plurality of light quantity distribution measuring devices 4, and a control unit 11. The stage 21 holds the substrate 9. The moving mechanism 22 is provided on the base 20 and includes an X-direction moving mechanism 221 and a Y-direction moving mechanism 222. The stage 21 is fixed to a moving body of the X direction moving mechanism 221, and the stage 21 moves in the X direction along the main surface of the substrate 9 by the X direction moving mechanism 221. The X direction moving mechanism 221 is fixed to the moving body of the Y direction moving mechanism 222, and the Y direction moving mechanism 222 moves the X direction moving mechanism 221 in the Y direction along the main surface of the substrate 9. The moving mechanism 22 may rotate the substrate 9 about an axis perpendicular to the main surface (an axis extending in the Z direction in FIG. 1).

  A support base 30 is provided on the base 20 so as to straddle the moving mechanism 22. The plurality of head portions 3 are fixed to the support base 30 and arranged in the X direction above the stage 21. On the (+ Y) side of the stage 21, the same number of light quantity distribution measuring devices 4 as the plurality of head units 3 are arranged in the X direction. The plurality of light quantity distribution measuring devices 4 are fixed to the moving body of the Y direction moving mechanism 222 and move in the Y direction together with the stage 21. With respect to the X direction, the plurality of light quantity distribution measuring devices 4 are arranged at the same positions as the plurality of head units 3. Details of the light quantity distribution measuring device 4 will be described later.

  FIG. 2 is a diagram illustrating an internal configuration of the head unit 3. The head unit 3 includes an emitting unit 31, a spatial light modulator 32, and a projection optical system 33. The emitting unit 31 emits linear light and irradiates the spatial light modulator 32 with the linear light via the mirror 39. The spatial light modulator 32 is, for example, a diffraction grating type and a reflection type, and is a diffraction grating capable of changing the depth of the grating. The spatial light modulator 32 is manufactured using a semiconductor device manufacturing technique. The diffraction grating type optical modulator used in the present embodiment is, for example, GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunnyvale, Calif.)). The spatial light modulator 32 has a plurality of grating elements (ribbon pairs) arranged in a line, and each grating element emits first-order diffracted light and zero-order diffracted light (0th-order light). Transition between states. In this way, the spatially modulated light is emitted from the spatial light modulator 32. In the following description, one grating element is referred to as “light modulation element”. Several lattice elements adjacent to each other may be regarded as one light modulation element.

  The projection optical system 33 includes a light shielding plate 331, a lens 332, a lens 333, a diaphragm plate 334, and a focusing lens 335. The light shielding plate 331 shields part of the ghost light and the high-order diffracted light and allows the light from the spatial light modulator 32 to pass through. The lenses 332 and 333 constitute a zoom unit. The diaphragm plate 334 shields the (± 1) order diffracted light (and higher order diffracted light) and allows the 0th order diffracted light to pass through. The light that has passed through the diaphragm plate 334 is guided onto the main surface of the substrate 9 by the focusing lens 335. In this way, the light spatially modulated by the spatial light modulator 32 is guided onto the substrate 9 by the projection optical system 33. The diaphragm plate 334 may block only the 0th order diffracted light and allow the (± 1) order diffracted light (and higher order diffracted light) to pass therethrough.

  The control unit 11 in FIG. 1 is connected to the plurality of head units 3, the moving mechanism 22, and the plurality of light quantity distribution measuring devices 4, and controls these configurations. In the drawing apparatus 1, when the moving mechanism 22 moves the stage 21, the irradiation position on the substrate 9 of the light from the spatial light modulator 32 moves. Further, the control unit 11 controls the spatial light modulator 32 in synchronization with the movement of the irradiation position by the moving mechanism 22. Thereby, a desired pattern is drawn on the photosensitive material on the substrate 9.

  FIG. 3 is a diagram illustrating a state in which the plurality of head units 3 and the plurality of light quantity distribution measuring devices 4 are viewed from the (−Y) side toward the (+ Y) direction. As described above, the plurality of light quantity distribution measuring devices 4 in the X direction are arranged at the same positions as the plurality of head units 3, respectively. When measuring the light amount distribution of the linear light emitted from the head unit 3, the plurality of light amount distribution measuring devices 4 are moved in the Y direction by the moving mechanism 22 and are respectively disposed directly below the plurality of head units 3. . As a result, the linear light that has passed through the spatial light modulator 32 and the projection optical system 33 in each head unit 3 is incident on the light amount distribution measuring device 4 that is disposed directly below the head unit 3.

  FIG. 4 is a diagram illustrating a state in which one light quantity distribution measuring device 4 is viewed from the (−X) side in the (+ X) direction. As shown in FIGS. 3 and 4, each light quantity distribution measuring device 4 includes a mask part 41, a light quantity measuring part 42, and a motor 43. The mask portion 41 has a cylindrical shape with a lid, and a shaft of a motor 43 that is a rotation mechanism is connected to the center of the lid portion 411. When the shaft of the motor 43 is rotated, the mask portion 41 is continuously rotated around the central axis J1 of the shaft extending in the X direction. The mask part 41 is made of metal, for example. The motors 43 of the plurality of light quantity distribution measuring devices 4 are fixed with respect to one support part 40. The support part 40 is fixed to the moving body of the Y-direction moving mechanism 222 described above.

  As shown in FIG. 4, the outer peripheral surface 412 of the mask part 41 is a cylindrical surface centering on the central axis J1. When measuring the light amount distribution of the linear light, the linear light from the head unit 3 is irradiated on the outer peripheral surface 412 along the optical axis J2 of the projection optical system 33 (see FIG. 2). In the following description, the outer peripheral surface 412 is referred to as an “irradiation surface 412”. The optical axis J2 and the central axis J1 are arranged on the same plane. A linear irradiation region 415 of linear light on the irradiation surface 412 is parallel to the central axis J1. 3 and 4, the linear irradiation region 415 is indicated by a thick solid line. The linear irradiation region 415 is formed at the uppermost portion 413 (the most (+ Z) side portion) of the irradiation surface 412. With respect to the Z direction, the uppermost part 413 of the irradiation surface 412 has the same height as the main surface of the substrate 9 which is the drawing surface. That is, the uppermost part 413 of the irradiation surface 412 is a position equivalent to the drawing surface in the drawing apparatus 1.

  As shown in FIG. 3, slits 414 that are linear through holes are formed on the irradiation surface 412. The slit 414 extends in a direction inclined with respect to the central axis J1 and the linear irradiation region 415. The light quantity measuring unit 42 is disposed inside the mask unit 41 between the head unit 3 and the central axis J1. That is, the light quantity measuring unit 42 is disposed between the uppermost part 413 of the irradiation surface 412 and the central axis J1. The light quantity measuring unit 42 is disposed close to the inner peripheral surface of the mask unit 41. Further, with respect to the X direction, the light quantity measuring unit 42 has a light receiving surface longer than the linear irradiation region 415, and if the mask unit 41 is omitted, almost the entire linear light is received by the light quantity measuring unit 42. Is incident on. The light quantity measurement unit 42 is supported with respect to the support unit 40 by a support member (not shown). A diffusion plate, a lens, or the like may be provided between the light amount measurement unit 42 and the mask unit 41 as necessary.

  FIG. 5 is a view showing the slit 414 in a state where the irradiation surface 412 is developed. In FIG. 5, the linear irradiation region 415 is also illustrated, and the linear irradiation region 415 is indicated by parallel oblique lines. The vertical direction in FIG. 5 corresponds to the circumferential direction centering on the central axis J1, and the horizontal direction in FIG. 5 is the X direction. In a state where the irradiation surface 412 is developed, the slit 414 is linear, and the position in the X direction changes as the position in the circumferential direction changes. When the slits 414 that are linear transmission regions are regarded as a set of a plurality of transmission region elements that are continuously arranged in a line, the plurality of transmission region elements are arranged at different positions in both the X direction and the circumferential direction. . Of the linear light irradiated on the irradiation surface 412, only the light passing through the slit 414 enters the mask portion 41 and is guided to the light amount measuring portion 42. In other words, the linear light is partially cut out by a part of the slit 414 that passes through the uppermost part 413, and the cut-out light is received by the light quantity measuring unit 42. In FIG. 5, a region 419 where the slit 414 and the linear irradiation region 415 overlap (hereinafter referred to as “cutout region 419”) is surrounded by a thick solid line and is internally cross-hatched. The shape of the cutout region 419 in FIG. 5 is a parallelogram.

  FIG. 6 is a diagram showing a flow of processing for correcting the light amount distribution of the linear light from the head unit 3 using the light amount distribution measuring device 4. In the following description, attention is paid only to one head unit 3 and one light quantity distribution measuring device 4, but the same processing is performed in other head units 3 and other light quantity distribution measuring devices 4. In the measurement of the light amount distribution, emission of linear light from the head unit 3 is started by setting all the light modulation elements to emit 0th-order diffracted light by the control unit 11 (step S11). Thereby, linear light is irradiated to the irradiation surface 412 of the mask part 41 of FIG. 3, and the linear irradiation area | region 415 extended in a X direction on the irradiation surface 412 is formed. That is, an image of the spatial light modulator 32 is formed on the uppermost part 413 of the irradiation surface 412. A plurality of positions in the X direction (longitudinal direction) in the linear irradiation region 415 correspond to a plurality of light modulation elements in the spatial light modulator 32, respectively. That is, light (0th-order diffracted light) that respectively passes through the plurality of light modulation elements of the spatial light modulator 32 is irradiated to a plurality of positions in the linear irradiation region 415. Actually, the correction parameter values are individually set for all the light modulation elements, and the output light amount from each light modulation element is adjusted according to the correction parameter values.

  Subsequently, the rotation of the mask unit 41 is started by driving the motor 43 (step S12). Thereby, the irradiation surface 412 which is a cylindrical surface rotates around the central axis J1 at a high speed (for example, at a rotation speed of several hundred rpm), and the irradiation surface 412 together with the slit 414 in the vertical direction (circumferential direction) in FIG. Move to. Therefore, the cutout region 419 moves continuously in the X direction in the linear irradiation region 415 according to the rotation angle of the irradiation surface 412. In parallel with the rotation of the mask unit 41, the light amount of the light transmitted through the slit 414 of the mask unit 41 is repeatedly measured by the light amount measuring unit 42 (step S13). In this manner, the light amounts output from the plurality of light modulation elements are sequentially acquired by the single light amount measuring unit 42 according to the rotation angle of the irradiation surface 412. In the following description, the light quantity acquired by the light quantity measuring unit 42 is referred to as “measured light quantity”.

  In the drawing apparatus 1, an ideal light amount distribution for accurately drawing a pattern on the substrate 9 is acquired in advance, and the measurement light amount corresponding to each light modulation element is irradiated with light from the light modulation element. Compared to an ideal light amount distribution at a certain position (hereinafter referred to as “ideal light amount”). Then, in the light modulation element in which the difference between the measurement light quantity and the ideal light quantity (absolute value of the difference) is larger than a predetermined threshold value, the value of the correction parameter for correcting the output light quantity of the light modulation element is corrected (step). S14, S15). For example, when the measured light amount is smaller than the ideal light amount, the correction parameter value is corrected to a larger value in order to increase the output light amount. When the measurement light quantity is larger than the ideal light quantity, the correction parameter value is corrected to a smaller value in order to reduce the output light quantity. When the correction parameter value is corrected, the amount of light (0th-order diffracted light) actually output from each light modulation element also changes according to the corrected correction parameter value. In the process of step S15, the value of the correction parameter is not corrected (may be corrected) in the light modulation element in which the difference between the measured light amount and the ideal light amount is equal to or less than the threshold value.

  Actually, as soon as the measurement light quantity of each light modulation element is acquired (without waiting for acquisition of the measurement light quantity of other light modulation elements), the measurement light quantity and the ideal light quantity are compared, and light is emitted as necessary. The value of the correction parameter of the modulation element is corrected. That is, the measurement light quantity acquisition in step S13 and the correction parameter value correction in step S15 are performed partially in parallel in the plurality of light modulation elements. Then, when the mask portion 41 rotates once and the cutout region 419 is arranged at the irradiation position of the light from the light modulation element, the measurement light quantity of the light modulation element is acquired (step S13). In the light modulation element in which the difference between the measured light amount and the ideal light amount is larger than the threshold value, the correction parameter value is corrected (steps S14 and S15).

  The processes in steps S13 and S15 are repeated until the difference between the measured light amount and the ideal light amount is less than or equal to the threshold value in all the light modulation elements (step S14). At this time, in the light quantity distribution measuring device 4, the mask unit 41 is continuously rotated, so that the measured light quantity is acquired in step S13 for each position of the linear irradiation region 415 in the immediately preceding step S13. It becomes possible to carry out in a short time from acquisition of the measurement light quantity.

  When the difference between the measured light amount and the ideal light amount is less than or equal to the threshold value in all the light modulation elements (step S14), the rotation of the mask unit 41 is stopped (step S16). Further, all the light modulation elements are in a state of emitting the first-order diffracted light, and the emission of the linear light from the head unit 3 is stopped (step S17). Thereby, the process which correct | amends the light quantity distribution of the linear light from the head part 3 is completed.

  Next, the length of the slit 414, the length of the irradiation surface 412 in the circumferential direction, and the area of the cutout region 419 will be described with reference to FIG. Here, the length of the linear irradiation region 415 in the longitudinal direction is L, the width in the circumferential direction (beam width) is W, the width of the slit 414 is S, and the inclination of the slit 414 with respect to the X direction is θ. In order to measure the light amount distribution in the entire linear irradiation region 415, any position of the slit 414 passes through each position of the linear irradiation region 415, that is, the length m of the slit 414 is (L / cos θ). It is necessary to do it above. Further, the length P of the slit 414 in the circumferential direction around the central axis J1 is expressed as (m · sin θ). Therefore, the length (circumference) of the irradiation surface 412 in the circumferential direction needs to be not less than (m · sin θ). Further, when the cutout region 419 is divided into two right triangles and one rectangle, the width k in the X direction of each right triangle is expressed as (W / tan θ), and the width n in the X direction of the rectangle is It is expressed as (−k + (S / sin θ)), and the area A of the cutout region 419 is expressed as ((k + n) · W).

  As described above, when the length of the irradiation surface 412 in the circumferential direction is set to (m · sin θ) or more and the slit 414 having a length m of (L / cos θ) or more is provided on the irradiation surface 412, the linear irradiation region 415 is provided. It is possible to measure the amount of light transmitted through the cut-out region 419 having an area A constant ((k + n) · W) at almost all positions.

  In an example of the drawing apparatus 1, 8000 light modulation elements are densely arranged in a predetermined arrangement direction in the spatial light modulator 32. The width of each light modulation element in the arrangement direction is 5 micrometers (μm), and linear light long in the arrangement direction is irradiated to the plurality of light modulation elements. On the spatial light modulator 32, the width of the linear light in the direction perpendicular to the arrangement direction is 15 μm. In the projection optical system 33, images of a plurality of light modulation elements are formed on the main surface of the substrate 9 by 0th-order diffracted light from the spatial light modulator 32 at a magnification of 0.2 times. Therefore, when all the light modulation elements emit 0th-order diffracted light, the length L in the X direction (longitudinal direction) of the linear irradiation region 415 on the drawing surface is 8000 μm, and the width W in the Y direction is 3 μm. The image of one light modulation element, that is, the width of one pixel is 1 μm.

The width S of the slit 414 in the mask portion 41 is 5 μm, and the inclination θ of the slit 414 with respect to the X direction is 60 degrees. In this case, by setting the length m of the slit 414 to 16000 μm or more, it is possible to measure the light amount distribution in the entire linear irradiation region 415. Note that the length P of the irradiation surface 412 in the circumferential direction needs to be 13856 μm or more. When the cutout region 419 is divided into two right triangles and one rectangle, the width k in the X direction of each right triangle is 1.73 μm, and the width n in the X direction of the rectangle is 4.04 μm. It is. Therefore, the area A of the cutout region 419 is 17.32 μm ² .

  In this example, one cut-out region 419 has a width corresponding to several pixels, and thus a measurement light quantity that exactly corresponds to one light modulation element is not acquired. Therefore, for example, the light amount acquired when the center of the cutout region 419 is located at the irradiation position corresponding to each light modulation element in the linear irradiation region 415 is treated as the measurement light amount of the light modulation element, and the light modulation is performed. The value of the measurement parameter of the element is modified. Further, the light amount distribution may be corrected using the same correction parameter value for several light modulation elements, and even in this case, the light amount distribution of the linear light can be corrected with a certain degree of accuracy. is there.

  As described above, the light quantity distribution measuring device 4 includes the mask part 41 having the irradiation surface 412 that is a cylindrical surface, and the light quantity measuring part 42 provided inside the mask part 41. The irradiation surface 412 is irradiated with linear light from the head unit 3 that emits linear light, and the irradiation surface 412 continuously rotates about the central axis J1. In addition, the irradiation surface 412 is provided with a slit 414 that is a linear transmission region inclined with respect to the central axis J1. In the slit 414, which is a set of a plurality of transmission region elements arranged in a row, the plurality of transmission region elements pass through a plurality of different positions of the linear irradiation region 415 at different timings, and transmitted through each transmission region element. Light is received by the light quantity measuring unit 42. Thereby, it becomes possible to measure the light amount distribution of the linear light accurately and repeatedly with a simple configuration, and the light amount distribution measuring device 4 that is compact and inexpensive to manufacture can be realized. Further, the drawing apparatus 1 having the light quantity distribution measuring device 4 can draw a pattern on the substrate 9 with high accuracy.

  In the light amount distribution measuring device 4, the slit 414 passes through all the positions of the linear irradiation region 415, whereby the light amount distribution of the linear light can be acquired in the entire linear irradiation region 415. Further, the drawing apparatus 1 is provided with a plurality of light quantity distribution measuring devices 4 respectively corresponding to the plurality of head units 3. Thereby, the correction of the light amount distribution of the linear light can be performed in parallel in the plurality of head units 3, and the productivity in the drawing apparatus 1 is improved.

  FIG. 7 is a diagram illustrating another example of the light amount distribution measuring apparatus 4. In the light quantity distribution measuring device 4 of FIG. 7, a plurality of slits 414 are formed on the irradiation surface 412 of the mask portion 41. In the state where the irradiation surface 412 is developed, the width and length of the plurality of slits 414 and the angle with respect to the central axis J1 are the same. The plurality of slits 414 are separated from each other in the circumferential direction with the central axis J1 as the center. In each slit 414, which is a set of a plurality of transmission region elements arranged continuously, the plurality of transmission region elements are arranged at different positions in both the direction of the central axis J1 and the circumferential direction.

  As described above, in the light amount distribution measuring apparatus 4 of FIG. 7, a plurality of slits 414 having the same shape are formed on the irradiation surface 412 as a plurality of linear transmission regions. In addition, in the rotation angle of the irradiation surface 412 around the central axis J1, an angle range in which one slit 414 passes through the linear irradiation region 415 and an angle in which the other slit 414 passes through the linear irradiation region 415. The range is different (that is, the plurality of slits 414 exist in different ranges in the circumferential direction). Thereby, the light quantity distribution of the linear light can be measured a plurality of times by one rotation of the mask unit 41, and the correction process of the light quantity distribution of the linear light can be completed in a short time. 4 and 7, the position where the linear irradiation region 415 is formed is not limited to the uppermost part 413 of the irradiation surface 412, and linear irradiation is performed at a position close to the uppermost part 413. Region 415 may be formed. For example, when the thickness of the substrate 9 changes, the stage 21 is moved slightly in the Y direction without moving in the Z direction, so that the linear irradiation region 415 is formed on the irradiation surface 412. Is aligned with the main surface of the substrate 9 which is the drawing surface, that is, the positional relationship between the drawing surface and the linear irradiation region 415 in the light quantity distribution measuring device 4 can be accurately adjusted. Note that the focus position of the linear light can be accurately adjusted by the focusing lens 335 of the projection optical system 33.

  FIG. 8 is a perspective view showing a light quantity distribution measuring device 4a according to the second embodiment of the present invention, and FIG. 9 is a plan view showing a mask portion 41a of the light quantity distribution measuring device 4a. In the light quantity distribution measuring device 4a, a disc-shaped mask portion 41a centering on the central axis J1 is provided, and the mask portion 41a is rotated about the central axis J1 by the motor 43. The central axis J1 is parallel to the optical axis J2 of the projection optical system 33 (see FIG. 2), and the linear light is linear on the irradiation surface 412 that is the upper surface (upper surface in FIG. 8) of the mask portion 41a. An irradiation region 415 is formed. The irradiation surface 412 is a plane extending perpendicular to the central axis J1 and the optical axis J2, and is disposed at a position equivalent to the drawing surface in the Z direction (the direction of the central axis J1). A light amount measurement unit 42 is provided below the mask unit 41a. When viewed in the (−Z) direction from the (+ Z) side, the entire linear irradiation region 415 overlaps the light receiving surface of the light quantity measuring unit 42. In the mask portion 41a, a spiral slit 414 is formed.

  FIG. 10 is a diagram illustrating Archimedean spirals. Archimedean spirals satisfy (r = aα), where α is the angle centered at the origin, which is the coordinate (0, 0) in the two-dimensional coordinate system, r is the distance from the origin, and a is a predetermined coefficient. The slit 414 of the mask portion 41a has a shape obtained by extracting a part of Archimedean spirals (parts continuous in an angle range slightly smaller than 360 degrees) indicated by a broken line in FIG. In FIG. 10, a portion corresponding to the slit 414 is indicated by a solid line.

  In the slit 414 shown in FIG. 9, the distance from the central axis J1 changes as the circumferential position around the central axis J1 changes. When the slit 414 that is a linear transmission region is regarded as a set of a plurality of transmission region elements arranged in a line continuously, a plurality of transmission region elements are provided in both the radial direction and the circumferential direction centering on the central axis J1. Are arranged at different positions. Of the linear light irradiated onto the irradiation surface 412, only the light passing through the slit 414 reaches the lower part of the mask part 41 and is guided to the light quantity measuring part 42. In other words, the linear light is partially cut out by the slit 414, and the cut-out light is received by the light quantity measuring unit 42. With respect to the radial direction, one end of the slit 414 is positioned slightly inside (center axis J1 side) from the linear irradiation region 415, and the other end is positioned slightly outside the linear irradiation region 415.

  When the light amount distribution of the linear light from the head unit 3 is corrected using the light amount distribution measuring device 4a, the emission of the linear light from the head unit 3 is started, so that the X direction on the irradiation surface 412 is started. The linear irradiation area | region 415 extended in (FIG. 6: step S11) is formed. Subsequently, the rotation of the mask portion 41a is started by driving the motor 43 (step S12). Thereby, the irradiation surface 412 which is a plane rotates around the central axis J1, and the cut-out region where the linear irradiation region 415 and the slit 414 overlap moves in the X direction according to the rotation angle of the irradiation surface 412. In parallel with the rotation of the mask part 41a, the light quantity of the light transmitted through the slit 414 is repeatedly measured by the light quantity measuring part 42 (step S13). That is, a plurality of measured light amounts respectively corresponding to a plurality of positions in the X direction in the linear irradiation region 415 are acquired. Then, in the light modulation element corresponding to the position where the difference between the measured light quantity and the ideal light quantity is larger than the predetermined threshold value, the correction parameter value of the light modulation element is corrected (steps S14 and S15).

  Similar to the above-described processing example, the acquisition of the measurement light quantity in step S13 and the correction parameter value correction in step S15 are performed partially in parallel in the plurality of light modulation elements. Further, the processes in steps S13 and S15 are repeated until the difference between the measured light amount and the ideal light amount is less than or equal to the threshold value in all the light modulation elements (step S14). At this time, in the light quantity distribution measuring device 4a, the mask part 41a is continuously rotated, so that the measured light quantity is obtained in step S13 for each position of the linear irradiation region 415 in the immediately preceding step S13. It becomes possible to carry out in a short time from acquisition of the measurement light quantity.

  When the difference between the measured light amount and the ideal light amount is less than or equal to the threshold value in all the light modulation elements (all positions in the linear irradiation region 415) (step S14), the rotation of the mask unit 41a is stopped and the head unit 3 The emission of the linear light is stopped (steps S16 and S17). The diameter of the mask portion 41a of the light amount distribution measuring device 4a is smaller than the arrangement pitch of the head portions 3, and when correcting the light amount distribution, a plurality of light amount distribution measuring devices 4a are provided below the plurality of head portions 3. Each is arranged. The light quantity distribution is corrected in parallel in the plurality of head units 3.

  As described above, in the light quantity distribution measuring device 4a, the mask part 41a having the irradiation surface 412 which is a plane is provided, and the irradiation surface 412 is provided with the spiral slit 414 which is a linear transmission region. . In the slit 414, which is a set of a plurality of transmission region elements arranged in a row, the plurality of transmission region elements pass through a plurality of different positions of the linear irradiation region 415 at different timings, and transmitted through each transmission region element. Light is received by the light quantity measuring unit 42. As a result, it is possible to accurately and repeatedly measure the light amount distribution of the linear light with a simple configuration. As a result, the drawing apparatus 1 having the light quantity distribution measuring device 4a can draw a pattern on the substrate 9 with high accuracy.

  FIG. 11 is a perspective view showing another example of the light quantity distribution measuring device 4a, and FIG. 12 is a plan view showing the mask portion 41a. In the mask portion 41 a shown in FIGS. 11 and 12, a plurality of slits 414 having the same shape are formed on the irradiation surface 412. The plurality of slits 414 have a spiral shape (spiral shape).

  FIG. 13 is a diagram illustrating Archimedean spirals. Each slit 414 of the mask portion 41a in FIG. 12 has a shape obtained by extracting a part of the Archimedean spiral shown by a broken line in FIG. 13 (a portion continuous in an angle range slightly smaller than 90 degrees). . The Archimedean spiral of FIG. 13 satisfies (r = aα) similarly to the spiral of FIG. 10, but has a larger coefficient a than the spiral of FIG. In FIG. 13, a portion corresponding to the slit 414 is indicated by a solid line. As shown in FIGS. 11 and 12, the plurality of slits 414 are separated from each other in the circumferential direction around the central axis J1. In each slit 414 that is a set of a plurality of transmission region elements arranged continuously, the plurality of transmission region elements are arranged at different positions in both the radial direction and the circumferential direction.

  As described above, in the light quantity distribution measuring device 4a of FIG. 11, a plurality of slits 414 having the same shape are formed on the irradiation surface 412 as a plurality of linear transmission regions. In addition, in the rotation angle of the irradiation surface 412 around the central axis J1, an angle range in which one slit 414 passes through the linear irradiation region 415 and an angle in which the other slit 414 passes through the linear irradiation region 415. The range is different. Thereby, the light quantity distribution of the linear light can be measured a plurality of times by one rotation of the mask portion 41a, and the correction process of the light quantity distribution of the linear light can be completed in a short time.

  FIG. 14 is a diagram illustrating another example of the drawing apparatus 1 and illustrates a state in which the plurality of head units 3 and the plurality of light amount distribution measuring apparatuses 4a are viewed from the (−Y) side in the (+ Y) direction. The diameter of the mask part 41a of the light quantity distribution measuring device 4a shown in FIG. 14 is larger than the arrangement pitch of the head parts 3 and smaller than twice the arrangement pitch. One light quantity distribution measuring device 4a is provided below the two head portions 3 adjacent to each other.

  FIG. 15 is a perspective view showing the light quantity distribution measuring device 4a, and FIG. 16 is a plan view showing the mask portion 41a. In the mask portion 41a shown in FIGS. 15 and 16, a plurality of slits 414 having the same shape are formed on the irradiation surface 412 as in the examples of FIGS. In the light quantity distribution measuring device 4 a, the linear light from the two head units 3 is irradiated onto the irradiation surface 412, and two linear irradiation regions 415 are formed on the irradiation surface 412. Further, two light quantity measuring units 42 are provided below the mask unit 41a with the central axis J1 interposed therebetween. As shown in FIG. 14, the two light quantity measuring units 42 are arranged apart from each other by the arrangement pitch of the head units 3. When viewed from the (+ Z) side in the (−Z) direction, the entire one linear irradiation region 415 overlaps the light receiving surface of one light quantity measurement unit 42, and the other linear irradiation region 415 It overlaps with the light receiving surface of the other light quantity measuring unit 42.

  As described above, in the light quantity distribution measuring device 4a in FIG. 15, the linear light from the two head portions 3 is irradiated onto the irradiation surface 412 to form the two linear irradiation regions 415. Also, two light quantity measuring units 42 are provided below the mask unit 41a at positions corresponding to the two linear irradiation regions 415, respectively. Then, when each slit 414 is regarded as a set of a plurality of transmission region elements arranged in a line continuously, the transmission region element of the mask portion 41a is transmitted through the linear light from one head portion 3. The light is received by one light quantity measurement unit 42, and the light transmitted through each transmission region element of the mask part 41 a among the linear light from the other head part 3 is received by the other light quantity measurement unit 42. Thereby, the light quantity distribution of the plurality of head units 3 can be measured using one mask unit 41a, and the manufacturing cost of the drawing apparatus 1 can be reduced. In the light amount distribution measuring device 4a provided with a plurality of light amount measuring units 42, only one slit 414 may be provided in the mask unit 41a.

  The drawing apparatus 1 and the light amount distribution measuring apparatuses 4 and 4a can be variously modified.

  The shape of the slit 414 that is the linear transmission region may be appropriately changed. For example, in the disk-shaped mask portion 41a, linear slits 414 having both ends arranged at different positions in the radial direction and the circumferential direction are provided. May be.

  In the mask portions 41 and 41a, a plurality of dot-like through holes may be formed as a plurality of transmission region elements. In the example of FIG. 17 in which the cylindrical irradiation surface 412 is developed, a plurality of transmission region elements 416 that are discretely arranged in a row are used as the element row 417, and the two element rows 417 are separated in the circumferential direction (vertical direction in FIG. 17). Formed. When focusing only on the X direction, in one element row 417, between two adjacent transmission region elements 416 (in the example of FIG. 17, at a position separated from the two transmission region elements 416 by the same distance D1). ), One transmissive region element 416 included in the other element row 417 is arranged. When the irradiation surface 412 that is a cylindrical surface rotates about the central axis J1, a plurality of transmission region elements 416 pass through a plurality of different positions of the linear irradiation region 415 on the irradiation surface 412 at different timings, respectively. The light that has passed through the transmission region element 416 is received by the light quantity measurement unit 42.

  Thus, even when a plurality of through holes are provided in the mask portions 41 and 41a, the light amount distribution of the linear light can be repeatedly measured with high accuracy. From the viewpoint of obtaining the light amount distribution with a certain degree of accuracy, it is preferably 1/20 or more, more preferably 1/10 or more of the number of light modulation elements included in the spatial light modulator 32 (for example, light modulation elements). Or less) of dot-like transmission region elements 416 are provided.

  On the other hand, when a plurality of transmission region elements are included in the linear transmission region like the slit 414, the light amount distribution of the linear light is measured with high resolution according to the sampling frequency in the light amount measurement unit 42. Is possible.

  Further, instead of the cylindrical mask portion 41, a conical (including a truncated cone) mask portion 41 may be provided. In this case, as shown in FIG. 18, the central axis J1 of the mask portion 41b is disposed on a plane including the optical axis J2 of the head portion 3 and parallel to the longitudinal direction of the linear light. Further, the central axis J1 of the mask portion 41b is inclined with respect to the X direction so that the upper portion of the cross section of the irradiation surface 412 of the mask portion 41b by the plane is orthogonal to the optical axis J2. Further, the light quantity distribution measuring device 4 may be provided with a semi-cylindrical mask part 41. Even in this case, when the irradiation surface 412 passes between the head part 3 and the light quantity measuring part 42, a linear shape is provided. The light quantity distribution of light can be measured.

  As described above, in the mask portion, the irradiation surface that is a plane rotates around an axis perpendicular to the plane, or the irradiation surface that is at least part of a rotation surface that is a cylindrical surface or a conical surface corresponds to the rotation surface. Rotate around the center axis. The plurality of transmission region elements formed on the irradiation surface pass through a plurality of different positions of the linear irradiation region of the linear light on the irradiation surface at different timings. This makes it possible to repeatedly measure the light amount distribution of the linear light with high accuracy.

  The mask portions 41 and 41a may be formed of a material that transmits light from the head portion 3 (for example, transparent glass). In this case, a film that shields the light is formed in the mask portions 41 and 41a, and a plurality of transmission region elements are formed by removing the film in a part of the region. Further, as shown in FIG. 19, in the mask portion 41, at a position facing the slit 414 across the central axis J1 (for example, at a position symmetrical to the slit 414 with respect to the central axis J1), in the circumferential direction. An opening 418 having a width larger than that of the slit 414 may be provided, and the light amount measurement unit 42 may be disposed below the mask unit 41. In this case, the light passing through the opening 418 and the slit 414 is received by the light quantity measuring unit 42. As described above, in the light amount distribution measuring device 4 in which the light amount measuring unit 42 is arranged outside the mask unit 41, the light amount measuring unit 42 is easily supported as compared with the case where the light amount measuring unit 42 is provided inside the mask unit 41. Is possible. Further, in the mask portion 41a having the irradiation surface 412 that is a plane, the central axis J1 may be inclined with respect to the optical axis J2 in a plane parallel to the YZ plane. Further, if the linear irradiation region 415 is formed on the irradiation surface 412, the central axis J1 may be slightly inclined in an arbitrary direction with respect to the optical axis J1.

  The cylindrical mask portion 41 of FIGS. 3 and 7 is elongated in the direction of the central axis J1, and a plurality of light quantity measuring portions 42 are arranged along the direction, thereby using a plurality of mask portions 41. The light quantity distribution of the head unit 3 may be measured. Moreover, the mask part 41 may rotate by providing the site | part engaged with a rotation mechanism in the outer peripheral surface of the cylindrical mask part 41. FIG. Furthermore, the mask portions 41 and 41a in the plurality of light quantity distribution measuring devices 4 and 4a may be rotated by one rotating mechanism.

  In the drawing apparatus 1, for example, a spatial light modulator 32 using an acousto-optic deflector (AOD) or a set of minute mirrors may be provided.

  In the drawing apparatus 1 of FIG. 1, a substrate 9 such as a semiconductor substrate, a glass substrate for a liquid crystal display device, or a printed wiring board is an object for pattern drawing. A pattern may be drawn.

  The configurations in the above-described embodiments and modifications may be combined as appropriate as long as they do not contradict each other.

DESCRIPTION OF SYMBOLS 1 Drawing apparatus 3 Head part 4, 4a Light quantity distribution measuring apparatus 9 Board | substrate 11 Control part 22 Movement mechanism 31 Output part 32 Spatial light modulator 33 Projection optical system 41, 41a, 41b Mask part 42 Light quantity measurement part 412 Irradiation surface 414 Slit 415 Linear irradiation area 416 Transmission area element J1 Central axis S11 to S17 Steps

Claims (7)

A light quantity distribution measuring device for measuring a light quantity distribution of linear light,
The irradiation surface is irradiated with the linear light from the head unit that emits linear light, and the irradiation surface, which is a plane, is rotated around an axis perpendicular to the plane, or a cylindrical surface or By rotating the irradiation surface that is at least part of the rotation surface that is a conical surface around the central axis of the rotation surface, a plurality of transmission region elements formed on the irradiation surface are formed on the irradiation surface. Mask portions that pass through different positions of the linear irradiation region of the linear light at different timings, and
A light amount measurement unit that receives light transmitted through each transmission region element of the mask unit;
A light quantity distribution measuring device comprising: The light quantity distribution measuring device according to claim 1,
The light quantity distribution measuring apparatus, wherein the plurality of transmission region elements are included in a linear transmission region. The light quantity distribution measuring device according to claim 2,
The light quantity distribution measuring apparatus, wherein the linear transmission region passes through all positions of the linear irradiation region. It is a light quantity distribution measuring apparatus of Claim 2 or 3,
Another linear transmission region similar to the linear transmission region is formed on the irradiation surface,
In the rotation angle of the irradiation surface, an angular range in which the linear transmission region passes through the linear irradiation region and an angular range in which the other linear transmission region passes through the linear irradiation region are different. A light quantity distribution measuring device characterized by The light quantity distribution measuring device according to any one of claims 1 to 4,
The irradiation surface is irradiated with the linear light from another head unit that emits linear light, and the transmission region elements of the mask unit are included in the linear light from the other head unit. A light quantity distribution measuring device, further comprising another light quantity measuring unit that receives the transmitted light. A drawing device,
An emission part for emitting linear light;
A spatial light modulator that is irradiated with the linear light from the emitting section;
A projection optical system for guiding light spatially modulated by the spatial light modulator onto an object;
A moving mechanism for moving an irradiation position on the object of the spatially modulated light;
A controller that controls the spatial light modulator in synchronization with the movement of the irradiation position by the moving mechanism;
The light quantity distribution according to any one of claims 1 to 5, wherein when the light quantity distribution of the linear light on an object is measured, the linear light incident through the spatial light modulator and the projection optical system is incident. A measuring device;
A drawing apparatus comprising: A light amount distribution measuring method for measuring a light amount distribution of linear light,
a) emitting linear light from the head portion and irradiating the irradiation surface of the mask portion with the linear light;
b) Rotating the irradiation surface, which is a plane, around an axis perpendicular to the plane, or setting the irradiation surface, which is at least a part of a rotation surface, which is a cylindrical surface or a conical surface, as the central axis of the rotation surface A plurality of transmission region elements formed on the irradiation surface to pass a plurality of different positions of the linear irradiation region of the linear light on the irradiation surface at different timings by rotating around the irradiation surface. When,
In parallel with the step b), measuring the amount of light transmitted through each transmission region element of the mask portion;
A light quantity distribution measuring method comprising:

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