JP2015063051A - Resin product and method of producing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a resin product improved to secure the adherence between a surface of resin base material and an undercoat layer.SOLUTION: A resin product has a structure in which a ground layer 18 comprising acrylic urethane resin, an undercoat layer 14 comprising polyurethane resin, and a top coat layer 16 comprising a silicon compound are put in this order on a surface of polycarbonate resin base material 12.

Description

  The present invention relates to a resin product and a method for producing the same, and more particularly to a resin product that can be suitably used as a resin glass (organic glass) and a method for advantageously producing such a resin product.

  Conventionally, resin products having both excellent moldability and light weight have been widely used as, for example, interior and exterior parts of vehicles such as automobiles, electrical, electronic parts, and building parts. Among these resin products, highly transparent resin products made of molded products made of polycarbonate are superior in lightness, impact resistance and workability compared to inorganic glass. As an alternative resin glass, it is used, for example, for window glass of vehicles such as automobiles, various displays, or covers for various instruments.

  As is generally known, such polycarbonate resin products have problems in weather resistance such as discoloration and strength reduction when exposed to ultraviolet rays, and are more resistant to abrasion than inorganic glass. It also has the disadvantage of being inferior (wear resistance and scratch resistance). Therefore, if the resin product made of polycarbonate is used outdoors, such as a window glass of an automobile, and the surface damage is a serious defect, such resin is used. It was necessary to take measures to improve the weather resistance and abrasion resistance of the product.

  Under such circumstances, for example, in Japanese Patent Application Laid-Open No. 2010-253683 (Patent Document 1), as a resin product (referred to as a plastic laminate in the above publication) applied to a window glass of an automobile, polycarbonate or the like is used. An undercoat layer made of an acrylic resin rich in weather resistance is laminated on the surface of a resin base material made of a resin molded body, and a plasma CVD layer of a silicon compound having excellent abrasion resistance on the undercoat layer A structure obtained by further laminating a top coat layer made of However, in such a resin product, the topcoat layer may be peeled off from the undercoat layer by a weather resistance test in which ultraviolet rays are irradiated. That is, it is difficult to say that such resin products have sufficient adhesion between the undercoat layer and the topcoat layer.

  On the other hand, in Japanese Patent Application Laid-Open No. 11-174205 (Patent Document 2), an undercoat layer made of a polyurethane resin having high weather resistance on the surface of a resin lens base material (described as a primer layer in the publication). The resin lens is formed in a laminated manner. And this gazette describes that the undercoat layer made of a polyurethane resin exhibits high adhesion to the topcoat layer made of a silicon compound. Therefore, in a resin product in which an undercoat layer and a topcoat layer made of a silicon compound are laminated on the surface of a polycarbonate resin base material, if the undercoat layer is made of polyurethane resin, excellent weather resistance In addition to the properties and abrasion resistance, it is expected that sufficient adhesion is exhibited between the undercoat layer and the topcoat layer.

  However, an undercoat layer made of a polyurethane resin has low adhesion to a polycarbonate resin substrate. In order to solve this problem, before the undercoat layer made of polyurethane resin is laminated on the surface of the resin base material, an argon plasma treatment is performed in a vacuum to irradiate the surface of the resin base material with argon plasma. It is conceivable to modify the surface of the resin base material.

  However, after the present inventor performed such argon plasma treatment, the resin product obtained by laminating and forming an undercoat layer made of a polyurethane resin on the surface of a polycarbonate resin base material is weather-resistant by ultraviolet irradiation. When the property test was performed, it was confirmed that the undercoat layer was peeled off from the resin base material by ultraviolet irradiation for about 50 hours. For this reason, simply performing argon plasma treatment on the surface of the polycarbonate resin substrate prevents the polyurethane resin undercoat layer from being peeled off from the surface of the resin substrate due to prolonged ultraviolet irradiation. Therefore, it has become clear that sufficient adhesion between the surface of the resin base material and the undercoat layer cannot be ensured.

JP 2010-253683 A JP-A-11-174205

  Here, the present invention was made in the background as described above, the place to be solved is an undercoat layer made of polyurethane resin on the surface of a polycarbonate resin substrate, In a resin product in which a top coat layer made of a silicon compound is laminated, an improved structure is provided so that sufficient adhesion between the surface of the resin substrate and the undercoat layer can be secured. is there. Another object of the present invention is to provide a method for advantageously producing a resin product having such a structure.

  In the present invention, in order to solve such a problem, an undercoat layer made of a polyurethane resin is laminated on the surface of a resin base material made of a polycarbonate resin molded product, and the undercoat is formed. A resin product in which a top coat layer made of a silicon compound is further laminated on the layer, and a base layer made of an acrylic urethane resin is formed between the undercoat layer and the resin base material. The gist is a resin product characterized by the above.

  In the present invention, in order to solve the above-described problem, an undercoat layer made of polyurethane resin is laminated on the surface of a resin base material made of a polycarbonate resin molded product, and the undercoat layer is formed. A method for producing a resin product, in which a top coat layer made of a silicon compound is further formed on a coat layer, comprising: (a) a step of preparing the resin substrate; and (b) a surface of the resin substrate. A step of forming an undercoat layer made of an acrylic urethane resin, (c) a step of forming an undercoat layer made of the polyurethane resin on the surface of the undercoat layer, and (d) a surface of the undercoat layer. The gist of the present invention is also a resin product manufacturing method including a step of forming a top coat layer made of the silicon compound.

  That is, in the resin product according to the present invention, the base layer made of an acrylic urethane resin that exhibits excellent adhesion to both the polycarbonate resin and the polyurethane resin is an underlayer made of the resin base material made of the polycarbonate resin and the polyurethane resin. It is interposed between the coat layer.

  Therefore, in such a resin product according to the present invention, the adhesion between the surface of the resin substrate and the undercoat layer can be sufficiently and effectively ensured.

  Further, according to the method for producing a resin product according to the present invention, a resin product having excellent adhesion between the surface of the resin substrate and the undercoat layer can be produced very advantageously without performing a special process. To get.

It is a fragmentary sectional view showing one embodiment of a resin product having a structure according to the present invention. FIG. 2 is a partially enlarged explanatory view of FIG. 1. It is explanatory drawing which shows an example of the process implemented when obtaining the resin product shown by FIG. 1, Comprising: On the surface of the resin base material, the base layer and the undercoat layer were laminated and formed, and the intermediate product was obtained. It is explanatory drawing which shows a state. It is explanatory drawing which shows the process implemented following the process shown by FIG. 3, Comprising: The state which has further laminated | stacked the topcoat layer on the undercoat layer laminated and formed on the resin base-material surface is shown. It is explanatory drawing.

  Hereinafter, in order to clarify the present invention more specifically, embodiments of the present invention will be described in detail with reference to the drawings.

  First, FIG. 1 shows a resin glass 10 for a rear window of an automobile in a partial cross-sectional form as an embodiment of a resin product having a structure according to the present invention. As is clear from FIG. 1, the resin glass 10 has a resin base material 12. And the undercoat layer 14 is laminated | stacked and formed on the surface and the back surface (upper surface and lower surface in FIG. 1) of this resin base material 12, respectively. Further, a top coat layer 16 is further laminated on the surface of each of the undercoat layers 14 and 14 opposite to the resin substrate 12 side. In the following, for convenience, the upper surface in FIG. 1 is referred to as the front surface, and the lower surface in FIG. 1 is referred to as the back surface.

  More specifically, the resin base material 12 has a transparent flat plate shape, and is formed of a resin molded product that is injection-molded using polycarbonate. The resin base material 12 may be molded by a method other than injection molding as long as it is a polycarbonate resin molded product. Moreover, the thickness of the resin base material 12 is not limited at all, and is appropriately determined according to the use and required characteristics of the resin glass 10. Here, the thickness is about 2 to 7 mm. Is done.

  The undercoat layer 14 covers the entire surface of the resin substrate 12 with respect to both the front surface and the back surface in order to provide the resin glass 10 with weather resistance based on ultraviolet resistance and the like. Each is directly laminated. And this undercoat layer 14 is comprised with the thin coating-film layer made from a polyurethane resin. In addition, since the undercoat layer 14 is made of a polyurethane resin, the adhesion between the undercoat layer 14 and the topcoat layer 16 made of a silicon compound described later is sufficiently enhanced, so that the high temperature environment is improved. The top coat layer 16 is prevented from peeling off from the undercoat layer 14 due to long-term use.

  The thickness of such an undercoat layer 14 is not particularly limited, but is generally about 1 to 40 μm. This is because if the thickness of the undercoat layer 14 is thinner than 1 μm, it is too thin and it may be difficult to impart sufficient weather resistance to the resin glass 10. On the other hand, even if the thickness of the undercoat layer 14 is thicker than 40 μm, it is difficult to further improve the weather resistance of the resin glass 10. On the other hand, material costs are wasted and the formation time of the undercoat layer 14 is This is because it may become long. The undercoat layer 14 may have a single layer structure or a multilayer structure in which a plurality of layers are stacked.

The top coat layer 16 is laminated and formed on the surface opposite to the substrate 12 side of the undercoat layer 14 so as to cover the entire surface in order to impart abrasion resistance to the resin glass 10. It takes the form of a thin film. Here, the top coat layer 16 is composed of a SiO ₂ plasma CVD layer that exhibits excellent abrasion resistance. The material for forming the top coat layer 16 is not particularly limited as long as it can provide sufficient abrasion resistance to the resin glass 10, but generally, in addition to SiO ₂ , SiON and Si A silicon compound such as ₃ N ₄ is used.

  The topcoat layer 16 may have a single layer structure or a multilayer structure in which a plurality of layers are laminated. And although the thickness of the topcoat layer 16 whole is not limited at all, Preferably, it is about 1-20 micrometers. Accordingly, it is possible to sufficiently impart abrasion resistance to the resin glass 10 without unnecessarily increasing the thickness of the top coat layer 16.

  And in the resin glass 10 of this embodiment, the undercoat laminated | stacked between the surface of the resin base material 12 and the undercoat layer 14 laminated | stacked on this surface, and the back surface of the resin base material 12, and this back surface. A base layer 18 for increasing the adhesion between the resin substrate 12 and the undercoat layer 14 is interposed between the coat layer 14 and the coating layer 14. Features exist.

  That is, in the resin glass 10, the base layer 18 is laminated on the front and back surfaces of the resin base material 12 so as to cover the entire surface, and the undercoat layer 14 is formed of the resin base material 12. The underlayer 18 on the front surface side and the back surface side is laminated and formed on the surface opposite to the resin base material 12 side so as to cover the entire surface thereof. And this base layer 18 is formed using acrylic urethane resin. Here, the underlayer 18 is formed of a thin coating layer.

  The thickness of the underlayer 18 is not particularly limited, but is generally about 5 to 25 μm. This is because if the thickness of the underlayer 18 is less than 5 μm, it is too thin and it may be difficult to sufficiently improve the adhesion between the resin glass 10 and the undercoat layer 14. is there. On the other hand, even if the thickness of the base layer 18 is greater than 25 μm, it is difficult to further improve the adhesion between the resin glass 10 and the undercoat layer 14. This is because the formation time of the formation 18 may become long.

  As shown in FIG. 2, the polycarbonate resin constituting the resin substrate 12 and the acrylic urethane resin constituting the base layer 18 both have —COO— bonds (parts indicated by broken lines in FIG. 2). doing. As a result, the adhesion between the resin substrate 12 made of polycarbonate resin and the base layer 18 made of acrylic urethane resin is sufficiently enhanced. In addition, in this embodiment, since the base layer 18 is constituted by a coating layer, when a paint made of an acrylic urethane resin is applied onto the resin base 12 made of polycarbonate resin, a part of the polycarbonate resin However, it dissolves in the solvent of the paint, whereby the polycarbonate resin and the acrylic urethane resin in the paint are mixed well. As a result, the adhesion between the resin substrate 12 and the base layer 18 is further advantageously improved.

  Moreover, both the acrylic urethane resin which comprises the base layer 18, and the polyurethane resin which comprises the undercoat layer 14 have a urethane bond (part shown by the dashed-two dotted line of FIG. 2). Thereby, the adhesion between the undercoat layer 14 made of polyurethane resin and the base layer 18 made of acrylic urethane resin is sufficiently enhanced. In addition, in this embodiment, since the undercoat layer 14 is composed of a coating layer, when a paint made of polyurethane resin is applied on the underlayer 18, a part of the acrylic urethane resin is applied to the paint. It dissolves in the solvent, and thereby the acrylic urethane resin and the polyurethane resin in the paint mix well. As a result, the adhesion between the underlayer 18 and the undercoat layer 14 is further advantageously improved.

  In this embodiment, the acrylic urethane resin constituting the underlayer 18 is made of a reaction product (polymer) of polyisocyanate and acrylic polyol (polyol having an acrylic structure). The structure of the acrylic urethane resin is not limited to this. The polyurethane resin constituting the undercoat layer 14 is made of a reaction product (polymer) of a diisocyanate isocyanurate and a polyol. Of course, such a polyurethane resin may be constituted by a reaction product of a general diisocyanate and a diol.

  Thus, in the resin glass 10 of the present embodiment, the base layer 18 that exhibits excellent adhesion to both the resin base material 12 and the undercoat layer 14 is between the resin base material 12 and the undercoat layer 14. Is intervened. Thereby, the adhesion between the resin base 12 and the undercoat layer 14 is effectively enhanced.

  By the way, the resin glass 10 having the structure as described above is manufactured, for example, according to the following procedure.

  That is, first, a flat resin substrate 12 is molded by performing injection molding using a polycarbonate resin or the like. Thereafter, the base layer 18 and the undercoat layer 14 are integrally laminated in that order on the front surface and the back surface of the resin base material 12 to obtain an intermediate product 20 as shown in FIG.

  When the base layer 18 is laminated on the front and back surfaces of the resin substrate 12, first, an acrylic polyol solution (for example, butyl acetate solution) and a polyisocyanate solution (for example, butyl acetate solution) are used. To obtain a liquid acrylic urethane paint. Alternatively, a commercially available liquid acrylic urethane paint is prepared. And after apply | coating this acrylic urethane coating to the whole surface and the whole back surface of the resin base material 12, it heats at the temperature within the range of about 70-90 degreeC, and the coating-film layer of acrylic urethane coating is hardened. Thus, the base layer 18 made of acrylic urethane resin is laminated and formed on the front surface and the back surface of the resin base material 12.

  The mixing ratio (mixing ratio) of the acrylic polyol solution and the polyisocyanate solution when obtaining a liquid acrylic urethane coating is not particularly limited, and is an acrylic polyol solution generally employed when forming an acrylic urethane resin. And a proportion similar to the mixing ratio of the polyisocyanate solution. Also, the method of applying the acrylic urethane paint is not limited in any way, and any conventionally known method such as a coating method using a roller, a dipping method, a spray method or the like may be employed.

  When the undercoat layer 14 is further laminated on the underlayer 18 laminated on the front and back surfaces of the resin substrate 12, first, a polyol solution (for example, butyl acetate solution) and a polyisocyanate solution are used. (For example, butyl acetate solution) and mixing them to obtain a liquid urethane paint. Alternatively, a commercially available liquid urethane paint is prepared. And after apply | coating this urethane coating to the whole surface of the resin base material 12 and the whole back surface, it heats at the temperature within the range of about 100-125 degreeC, and hardens the coating-film layer of urethane coating. As a result, the undercoat layer 14 made of urethane resin is laminated on each base layer 18.

  The mixing ratio (blending ratio) of the polyol solution and the polyisocyanate solution when obtaining a liquid urethane coating is not particularly limited, and the polyol solution and the polyisocyanate solution generally employed when forming the urethane resin are not limited. The mixing ratio is approximately the same. Also, the method of applying the urethane paint is not limited in any way. For example, any conventionally known methods such as a coating method using a roller, a dipping method, and a spray method are adopted.

  When the intermediate product 20 is manufactured, the top coat layer 16 is integrally laminated on the two undercoat layers 14 and 14 of the intermediate product 20. In forming the top coat layer 16, for example, a plasma CVD apparatus 22 having a structure as shown in FIG. 4 is used.

  As is clear from FIG. 4, the plasma CVD apparatus 22 used here has the same basic structure as a conventional plasma CVD apparatus employing a parallel plate method. That is, the plasma CVD apparatus 22 has a vacuum chamber 24 as a reaction chamber. The vacuum chamber 24 has a bottomed cylindrical or casing-shaped chamber body 26 that opens upward, and the chamber. It further includes a lid body 28 that covers the upper opening of the main body 26 and hermetically seals the inside of the chamber main body 26.

  In addition, a pair of upper holders 30 and 30 are integrally provided on the lower surface of the lid body 28 so as to face each other. Further, support protrusions 32 are integrally provided on the opposing surfaces of the upper holders 30. The cathode electrode 34 housed in the chamber body 26 is held in a state of being supported by the support protrusions 32 by the pair of upper holders 30 and 30. Further, the cathode electrode 34 is electrically connected to a high frequency power supply 36 installed outside the vacuum chamber 24.

  On the upper surface of the bottom wall portion of the chamber main body 26 positioned opposite to the lower surface of the lid body 28, lower holders 38, 38 are integrally provided upright. On these lower holders 38, 38, upper support projections 40, 40 and lower support projections 42, 42 are provided integrally and projecting apart from each other. Then, the anode electrode 44 accommodated in the chamber body 26 faces the lower support protrusions 42, 42 in a state of facing the cathode electrode 34 held by the upper holders 30, 30 with a predetermined distance in the vertical direction. Supported by the lower holders 38 and 38. The anode electrode 44 is grounded. Further, the upper support protrusions 40, 40 of the lower holders 38, 38 are configured to support the intermediate product 20.

  An exhaust pipe 46 is installed on the side wall portion of the chamber body 26 so as to penetrate the inside and outside of the chamber body 26. A vacuum pump 48 is provided on the exhaust pipe 46. By the operation of the vacuum pump 48, the gas in the chamber body 26 is discharged to the outside through the exhaust pipe 46, and the chamber body 26 is decompressed.

  Further, first and second introduction pipes 50 a and 50 b are installed in the side wall portion of the chamber main body 26 so as to penetrate the side wall portion and open into the chamber main body 26 at one end portion. And the 1st cylinder 52a which accommodates silicon compound gas by the pressure exceeding atmospheric pressure is connected to the other end part of the 1st introduction pipe 50a. A second cylinder 52b that stores oxygen gas at a pressure exceeding atmospheric pressure is connected to the other end of the second introduction pipe 50b. Further, first and second on-off valves 54a and 54b are provided at the connection portions of the first and second cylinders 52a and 52b with the first and second introduction pipes 50a and 50b, respectively. As will be described later, the silicon compound gas accommodated in the first cylinder 52a is used as a raw material gas for forming the topcoat layer 16, and is accommodated in the second cylinder 52b. The oxygen gas is used as a reaction gas for forming the top coat layer 16.

The silicon compound constituting the silicon compound gas accommodated in the first cylinder 52a is not particularly limited, and generally, an inorganic silicon compound such as monosilane (SiH ₄ ) or disilane (Si ₂ H ₆ ) is used. Each of them is used alone or in combination. Moreover, it is also possible to use an organosilicon compound as this silicon compound. And as this organosilicon compound, siloxanes such as tetramethyldisiloxane, hexamethyldisiloxane, hexamethylcyclotrisiloxane, methoxytrimethylsilane, ethoxytrimethylsilane, dimethoxydimethylsilane, dimethoxydiethylsilane, dimethoxydiphenylsilane, Trimethoxysilane, trimethoxymethylsilane, trimethoxyethylsilane, trimethoxypropylsilane, triethoxymethylsilane, triethoxydimethylsilane, triethoxyethylsilane, triethoxyphenylsilane, tetramethylsilane, tetramethoxysilane, tetraethoxysilane Examples thereof include silanes such as hexamethyldisilazane and silazanes such as tetramethyldisilazane. And one of them is used alone, or two or more of them are used in combination. When two or more kinds of silicon compound gases are used, the plural kinds of silicon compound gases may be mixed and accommodated in one first cylinder 52a, or two or more kinds of silicon compound gases may be contained. May be separately accommodated in the plurality of first cylinders 52a.

Then, using the plasma CVD apparatus 22 having such a structure, the top coat layer 16 is respectively formed on the undercoat layers 14 and 14 laminated on both surfaces of the resin base material 12 via the base layers 18 and 18. When forming the laminate, first, the intermediate product 20 obtained as described above is accommodated in the chamber body 26 and supported by the upper support protrusions 40, 40 of the lower holders 38, 38, The side holders 38 and 38 are held. Thereafter, the upper opening of the chamber body 26 is covered with a lid 28 and the inside of the vacuum chamber 24 is hermetically sealed, and then the vacuum pump 48 is operated. Thereby, the inside of the vacuum chamber 24 is depressurized so as to have a pressure of about 10 ⁻⁵ to 10 ⁻³ Pa, for example.

  Next, when the pressure in the vacuum chamber 24 is reduced to a predetermined value, the first opening / closing valve 54a of the first cylinder 52a and the second opening / closing valve 54b of the second cylinder 52b are operated while the vacuum pump 48 is operated. Open each. Thereby, the silicon compound gas in the first cylinder 52a is introduced into the vacuum chamber 24 through the first introduction pipe 50a, and the oxygen gas in the second cylinder 52b is introduced into the vacuum chamber 24 through the second introduction pipe 50b. Introduce. Thus, the vacuum chamber 24 is filled with the silicon compound gas and the oxygen gas.

  When the vacuum chamber 24 is filled with the silicon compound gas and the oxygen gas, and the internal pressure of the vacuum chamber 24 reaches a predetermined value, the high-frequency power source 36 is turned on and the cathode electrode disposed in the vacuum chamber 24 is turned on. A high frequency current is supplied to 34. As a result, a discharge phenomenon is caused between the cathode electrode 34 and the anode electrode 44, and the silicon compound gas and the oxygen gas filled in the vacuum chamber 24 are turned into plasma, respectively. Are generated in the vacuum chamber 24.

Then, a reaction between the plasma of the silicon compound gas and the plasma of the oxygen gas (reaction by the plasma CVD method of the silicon compound gas and the oxygen gas) is caused in the space in the vacuum chamber 24 and the surface of the intermediate product 20, so ₂ and deposit it on the entire surface of the intermediate product 20. Thereafter, when a preset time has elapsed from the opening operation of the first and second opening / closing valves 54a, 54b, the first and second opening / closing valves 54a, 54b are closed. Thereby, the top coat layer 16 made of SiO ₂ is formed on the undercoat layers 14 and 14 formed on both surfaces of the resin base material 12 with a thickness corresponding to the opening time of the first and second opening / closing valves 54a and 54b. In FIG. Thus, the intended resin glass 10 having the structure as shown in FIG. 1 is obtained.

  As is clear from the above description, in the resin glass 10 of the present embodiment, the base layer 18 is interposed between the resin base 12 and the undercoat layer 14, so that the resin base Adhesion between the surface of 12 and the undercoat layer 14 is sufficiently enhanced. Therefore, even if the ultraviolet ray is irradiated to the resin glass 10 for a long time, the undercoat layer 14 can be advantageously prevented from peeling off from the surface of the resin base material 12. Therefore, in this resin glass 10, the excellent weather resistance which cannot be obtained by conventional resin glass can be exhibited extremely effectively.

  In addition, in order to improve the adhesion between the resin base material 12 and the undercoat layer 14, this embodiment method is simply performed prior to the undercoat layer 14 being laminated on the resin base material 12. The base layer 18 is formed on the front and back surfaces of the resin substrate 12 by performing a simple operation that does not require a special device to apply and cure the acrylic urethane paint. Therefore, according to the method of this embodiment as described above, for example, before the undercoat layer 14 is laminated and formed on the resin base material 12, unlike the conventional method of performing the argon plasma treatment on the resin base material 12, The resin glass 10 having excellent adhesion between the resin substrate 12 and the undercoat layer 14 can be produced at a low cost by a simple operation and without using an expensive apparatus.

  The specific configuration of the present invention has been described in detail above. However, this is merely an example, and the present invention is not limited by the above description.

  For example, in the above-described embodiment, the base layer 18, the undercoat layer 14, and the topcoat layer 16 are laminated and formed on both the front and back surfaces of the resin base material 12. The underlayer 18, the undercoat layer 14, and the topcoat layer 16 may be laminated only on the surface.

  Moreover, as a formation method with respect to the resin base material 12 of the base layer 18 which consists of acrylic urethane resin, methods other than application | coating of the acrylic urethane coating with respect to the resin base material 12 are employable suitably.

  Furthermore, in the said embodiment, although the topcoat layer 16 was comprised by the plasma CVD layer of the silicon compound, if the topcoat layer 16 was comprised by the thin film layer of the silicon compound, the formation method is as follows. There is no particular limitation. Therefore, the topcoat layer 16 made of a silicon compound can be constituted by a thin film layer formed by a so-called PVD method such as vapor deposition or sputtering, or a thin film layer formed by a CVD method other than the plasma CVD method. is there.

  In addition, in the said embodiment, although the specific example of what applied this invention to resin glass and its manufacturing method was shown, this invention is the bottom which consists of acrylic urethane resin on the surface of the resin base material made from polycarbonate. The base layer, the undercoat layer made of polyurethane resin, and the topcoat layer made of silicon compound can be advantageously applied to any of the resin products in which the layers are laminated in that order and the manufacturing method thereof. Of course.

  In addition, although not enumerated one by one, the present invention can be carried out in a mode to which various changes, modifications, improvements, etc. are added based on the knowledge of those skilled in the art. It goes without saying that all are included in the scope of the present invention without departing from the spirit of the present invention.

  Hereinafter, representative examples of the present invention will be shown to clarify the present invention more specifically, but the present invention is not limited by the description of such examples. It goes without saying. In addition to the following examples, the present invention includes various changes and modifications based on the knowledge of those skilled in the art without departing from the spirit of the present invention, in addition to the specific description described above. It should be understood that improvements can be made.

  First, a known injection molding using a commercially available polycarbonate resin is performed, and three transparent resin base materials made of a rectangular flat plate having a length × width × thickness of 200 × 200 × 3.5 mm are prepared and prepared. did.

  Subsequently, a commercially available acrylic urethane coating was applied to the surface of one of the three resin substrates prepared, and then heated at a temperature of 80 ° C. for 30 minutes. Thereby, the base layer which consists of acrylic urethane resin was laminated | stacked and formed on the surface of one resin base material. The thickness of this underlayer was 20 μm.

  Next, after applying a commercially available urethane paint on the base layer formed on the surface of the resin substrate, it was heated at a temperature of 120 ° C. for 10 minutes. As a result, an undercoat layer made of urethane resin was laminated on the underlayer to obtain an intermediate product A in which the underlayer and the undercoat layer were integrally laminated on the surface of the resin base material. The thickness of the undercoat layer formed on the intermediate product A was 5 μm.

  Thereafter, using a plasma CVD apparatus having a structure as shown in FIG. 4, the intermediate product A obtained as described above is accommodated in a vacuum chamber of the plasma CVD apparatus, and monosilane gas and oxygen gas are introduced. Then, a plasma CVD method was performed. As a result, a topcoat layer made of a plasma CVD layer of a silicon compound was laminated on the undercoat layer of the intermediate product A. The thickness of the top coat layer was 3 μm.

  Thus, a resin in which a base layer made of an acrylic urethane resin, an undercoat layer made of a urethane resin, and a topcoat layer made of a silicon compound are integrally laminated in that order on the surface of a polycarbonate resin base material. Glass was obtained. This was designated as resin glass A.

  For comparison, a plasma CVD apparatus having a structure similar to the structure shown in FIG. 4 and containing argon gas in the first cylinder is used in the vacuum chamber of the plasma CVD apparatus. One of the remaining two of the previously prepared resin substrates was accommodated. Then, argon gas was introduced into the vacuum chamber in a vacuum state, plasma of the argon gas was generated, and the surface of the resin base material was irradiated with the plasma. Thereby, the argon plasma process was implemented with respect to the surface of a resin base material.

  Then, after apply | coating a commercially available urethane coating on the surface of the resin base material to which the argon plasma process was performed, this was heated at the temperature of 120 degreeC for 10 minutes. As a result, an intermediate product B was obtained by directly laminating and forming an undercoat layer made of a urethane resin on the surface of the resin base material that had been subjected to the argon plasma treatment. The thickness of the undercoat layer formed on the intermediate product B was 5 μm.

  Next, a topcoat layer layer made of a silicon compound was laminated on the undercoat layer of the intermediate product B by the same method as the method for forming the topcoat layer on the undercoat layer of the intermediate product A. The thickness of the top coat layer was 3 μm.

  Thus, an undercoat layer made of urethane resin and a topcoat layer made of silicon compound are integrally laminated in that order on the surface of the polycarbonate resin base material that has been subjected to the argon plasma treatment. A resin glass was obtained. This was designated as resin glass B.

  Furthermore, for another comparison, the remaining one resin base material is used, and an undercoat layer and a top coat are applied to the surface of the resin base material without any argon plasma treatment. The layers were integrally laminated in the same manner as in obtaining Test Example 2. Thus, a resin glass was obtained in which an undercoat layer made of a urethane resin and a topcoat layer made of a silicon compound were integrally laminated in that order on the surface of a polycarbonate resin substrate. This was designated as resin glass C. The thicknesses of the undercoat layer and the topcoat layer formed on the resin base material of the resin glass C are the same as the undercoat layers formed on the resin base materials of the resin glass A and the resin glass B. And the thickness of each of the topcoat layers.

  And the weather resistance test with respect to the resin glass A obtained as mentioned above, the resin glass B, and the resin glass C was implemented. In this weather resistance test, water is sprayed onto resin glass A, resin glass B, and resin glass C in accordance with the test conditions and test method in Method A (xenon arc lamp method) of the JIS L 0891 accelerated weather fastness test. At the same time, irradiation was performed by irradiating ultraviolet rays with a xenon lamp.

  As a result of the weather resistance test, the resin glass A having the structure according to the present invention was not observed to peel the undercoat layer from the resin base material even after the ultraviolet irradiation by the xenon lamp was continued for 240 hours. On the other hand, in order to improve the adhesion between the surface of the resin base material and the undercoat layer, the resin glass B subjected to the argon plasma treatment on the surface of the resin base material is irradiated with ultraviolet rays by a xenon lamp. When irradiated for 50 hours, the undercoat layer peeled off from the surface of the resin base material. In addition, in the case of the resin glass C in which no measures for improving the adhesion between the surface of the resin base material and the undercoat layer are taken, the ultraviolet rays are irradiated with a xenon lamp for 24 hours. Further, the undercoat layer was peeled off from the surface of the resin base material. From these things, the resin glass having the structure according to the present invention exhibits characteristics sufficiently superior to conventional products in the adhesion between the resin base material and the undercoat layer, and further in the weather resistance. Can be clearly recognized.

DESCRIPTION OF SYMBOLS 10 Resin glass 12 Resin base material 14 Undercoat layer 16 Topcoat layer 18 Underlayer 22 Plasma CVD apparatus

Claims (2)

An undercoat layer made of polyurethane resin is laminated on the surface of a resin substrate made of a polycarbonate resin molded product, and a topcoat layer made of a silicon compound is further laminated on the undercoat layer. A resin product,
A resin product, wherein a base layer made of an acrylic urethane resin is formed between the undercoat layer and the resin base material. An undercoat layer made of polyurethane resin is laminated on the surface of a resin substrate made of a polycarbonate resin molded product, and a topcoat layer made of a silicon compound is further laminated on the undercoat layer. A resin product manufacturing method comprising:
Preparing the resin substrate;
Forming a base layer made of acrylic urethane resin on the surface of the resin substrate;
Forming an undercoat layer made of the polyurethane resin on the surface of the underlayer;
A step of laminating a topcoat layer made of the silicon compound on the surface of the undercoat layer;
The manufacturing method of the resin product characterized by including.

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