JP2015058196A - Mirror device - Google Patents

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JP2015058196A
JP2015058196A JP2013194130A JP2013194130A JP2015058196A JP 2015058196 A JP2015058196 A JP 2015058196A JP 2013194130 A JP2013194130 A JP 2013194130A JP 2013194130 A JP2013194130 A JP 2013194130A JP 2015058196 A JP2015058196 A JP 2015058196A
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mirror
glass
conductive film
base material
metal film
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薫美 中林
Kumi Nakabayashi
薫美 中林
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Abstract

PROBLEM TO BE SOLVED: To provide a mirror device capable of uniformly applying heat.SOLUTION: A mirror device 1 includes a flat rectangular glass substrate 2, a conductive metal film 4 formed on a whole surface of one side of the glass substrate 2, a pair of electrodes 5 electrically connected with the metal film 4 and formed of copper foil, and a mirror glass 3 arranged at a side of the glass substrate 2 where the metal film 4 and the electrodes 5 are provided. The electrodes 5 are arranged on the metal film 4 respectively along the mutually facing longer edges of the glass substrate 2. A power cable 7 is connected to the electrodes 5 for supplying power to the electrodes 5. The metal film 4 and the electrodes 5 are arranged between the glass substrate 2 and the mirror glass 3.

Description

本発明は鏡装置に関する。詳しくは、例えば洗面所や浴室に設置される鏡装置に係るものである。   The present invention relates to a mirror device. Specifically, for example, it relates to a mirror device installed in a bathroom or bathroom.

浴室や洗面所には鏡（ミラー）が設置されている。しかし、浴室に設置された鏡は、湯気によって曇りやすく、また、洗面所に設置された鏡も、浴室から流れてきた湯気によって曇りやすい。
そこで、鏡の曇りを防ぐために様々な技術が提案されている。 Mirrors are installed in bathrooms and washrooms. However, the mirror installed in the bathroom is easily clouded by steam, and the mirror installed in the bathroom is also easily clouded by steam flowing from the bathroom.
Accordingly, various techniques have been proposed to prevent the mirror from fogging.

例えば、特許文献１には、図９に示すような化粧鏡が記載されている。
すなわち、特許文献１に記載の化粧鏡１００は、鏡本体１１１と、鏡本体１１１の上部に設けられた照明器具収容部１１２と、鏡本体１１１の下部に設けられた化粧棚１１３とを備える。 For example, Patent Document 1 describes a makeup mirror as shown in FIG.
That is, the makeup mirror 100 described in Patent Document 1 includes a mirror body 111, a lighting fixture housing portion 112 provided on the upper portion of the mirror body 111, and a makeup shelf 113 provided on the lower portion of the mirror body 111.

また、鏡本体１１１における鏡面部１１１Ａの裏側の略全域にわたって蛇行した形状に電熱線１１４が配線されている。
また、照明器具収容部１１２には、２つの照明ライト１１５が収容されている。
また、鏡本体１１１は、その上端部および下端部において、多数の微細な溝が形成されたヘアライン仕上部（１１１Ｂ、１１１Ｃ）を有する。 Moreover, the heating wire 114 is wired in a meandering shape over substantially the entire back surface of the mirror surface portion 111 </ b> A in the mirror body 111.
In addition, two illumination lights 115 are accommodated in the luminaire accommodation portion 112.
The mirror body 111 has hairline finishes (111B, 111C) in which a large number of fine grooves are formed at the upper end and the lower end.

実開平５−８６２６２号公報Japanese Utility Model Publication No. 5-86262

しかしながら、特許文献１に記載の発明のように電熱線を用いて鏡に熱を加えた場合、電熱線の周辺部から徐々に加熱するので加熱が不均一であった。
また、電熱線の曲げられた箇所が断線するおそれがあった。 However, when heat is applied to the mirror using a heating wire as in the invention described in Patent Document 1, heating is uneven because the heating is performed gradually from the periphery of the heating wire.
Moreover, there existed a possibility that the location where the heating wire was bent might be disconnected.

本発明は、以上の点に鑑みて創案されたものであり、鏡に均一に熱を加えることができる鏡装置を提供することを目的とする。   The present invention has been made in view of the above points, and an object of the present invention is to provide a mirror device that can uniformly apply heat to a mirror.

上記の目的を達成するために、本発明の鏡装置は、基材と、該基材の少なくとも一方の面側の全面に形成された導電性を有する導電膜と、該導電膜と電気的に接続された電極と、前記基材の、前記導電膜が形成された側に配置された鏡体とを備える。   In order to achieve the above object, a mirror apparatus of the present invention includes a base material, a conductive film formed on the entire surface of at least one surface of the base material, and the conductive film electrically A connected electrode; and a mirror disposed on a side of the base material on which the conductive film is formed.

ここで、基材の少なくとも一方の面側の全面に形成された導電性を有する導電膜と、導電膜と電気的に接続された電極とによって、基材の少なくとも一方の面側の全面を電熱することができる。   Here, the entire surface of at least one surface of the substrate is electrically heated by the conductive film having conductivity formed on the entire surface of at least one surface of the substrate and the electrode electrically connected to the conductive film. can do.

また、基材の、導電膜が形成された側に配置された鏡体によって、基材と鏡体とで導電膜を挟む構造となるので、強度が高まり破損し難くなり、また、水分が侵入し難いので防湿性が向上し、さらに、導電膜を保護することができる。   In addition, the mirror disposed on the side of the base material on which the conductive film is formed sandwiches the conductive film between the base material and the mirror body, which increases the strength and makes it difficult to break down. Therefore, moisture resistance is improved and the conductive film can be protected.

また、本発明の鏡装置が、基材と鏡体との間に配置された樹脂フィルムを備える場合、鏡装置の耐水性を向上させることができる。   Moreover, when the mirror apparatus of this invention is equipped with the resin film arrange | positioned between a base material and a mirror body, the water resistance of a mirror apparatus can be improved.

さらに、基材と鏡体との間に配置された樹脂フィルムがＥＶＡ樹脂フィルムである場合、鏡装置の耐水性をより一層向上させることができる。   Furthermore, when the resin film arrange | positioned between a base material and a mirror body is an EVA resin film, the water resistance of a mirror apparatus can be improved further.

また、本発明の鏡装置において、基材および鏡体は、互いに略同じ面積を有する長方形の板状であり、電極は、基材の長辺の縁に沿って導電膜上に設けられたものとすることができる。   Further, in the mirror device of the present invention, the base material and the mirror body are rectangular plate shapes having substantially the same area, and the electrode is provided on the conductive film along the edge of the long side of the base material. It can be.

この場合、基材と鏡体の２層構造となるので堅固になり、破損し難くなる。
また、基材と鏡体とで電極を挟む構造となるので、電極を保護することができ、かつ、電極を隠すことができる。
また、電極が、基材の長辺の縁に沿って導電膜上に設けられているので、抵抗値を小さくできる。 In this case, since it becomes a two-layer structure of a base material and a mirror body, it becomes firm and hardly breaks.
Further, since the electrode is sandwiched between the base material and the mirror body, the electrode can be protected and the electrode can be hidden.
Moreover, since the electrode is provided on the conductive film along the edge of the long side of the substrate, the resistance value can be reduced.

また、本発明の鏡装置において、導電膜の表面抵抗値が３０Ω／ｃｍ２以下である場合、導電膜に電気が流れやすく、低電圧で昇温が可能である。 In the mirror device of the present invention, when the surface resistance value of the conductive film is 30 Ω / cm 2 or less, electricity easily flows through the conductive film, and the temperature can be raised at a low voltage.

また、上記の目的を達成するために、本発明の鏡装置は、鏡面が形成された基材と、該基材の、鏡面が形成された面側とは反対側の全面に形成された導電性を有する導電膜と、該導電膜と電気的に接続された電極とを備える。   In order to achieve the above object, the mirror device of the present invention includes a base material on which a mirror surface is formed and a conductive material formed on the entire surface of the base material opposite to the surface side on which the mirror surface is formed. And an electrode electrically connected to the conductive film.

ここで、基材の、鏡面が形成された面側とは反対側の全面に形成された導電性を有する導電膜と、導電膜と電気的に接続された電極とによって、基材の、鏡面が形成された面側とは反対側の全面を電熱することができる。   Here, the mirror surface of the base material is formed by a conductive film having conductivity formed on the entire surface of the base material opposite to the surface side on which the mirror surface is formed, and an electrode electrically connected to the conductive film. It is possible to electrically heat the entire surface opposite to the surface on which is formed.

本発明に係る鏡装置は、鏡に均一に熱を加えることができる。   The mirror device according to the present invention can uniformly apply heat to the mirror.

本発明を適用した第１の実施態様の鏡装置の一例を示す概略図である。It is the schematic which shows an example of the mirror apparatus of the 1st embodiment to which this invention is applied. 図１のＡ−Ａ線に沿った断面を示す概略断面図である。It is a schematic sectional drawing which shows the cross section along the AA line of FIG. 本発明を適用した第２の実施態様の鏡装置の一例を示す概略正面図（ａ）、および概略正面図（ａ）のＢ−Ｂ線に沿った断面を示す概略断面図（ｂ）である。It is the schematic front view (a) which shows an example of the mirror apparatus of the 2nd embodiment to which this invention is applied, and the schematic sectional drawing (b) which shows the cross section along the BB line of a schematic front view (a). . 比較対象である一般の電熱線付き鏡を示す概略図である。It is the schematic which shows the general mirror with a heating wire which is a comparison object. 本発明を適用した第１の実施態様の鏡装置に電圧を印加して３分後のミラーガラスの温度分布図である。It is a temperature distribution figure of mirror glass 3 minutes after applying a voltage to the mirror apparatus of the 1st embodiment to which the present invention is applied. 本発明を適用した第１の実施態様の鏡装置に電圧を印加して１２分後のミラーガラスの温度分布図である。It is a temperature distribution figure of mirror glass 12 minutes after applying a voltage to the mirror apparatus of the 1st embodiment to which the present invention is applied. 図４に示した電熱線付き鏡に電圧を印加して３分後のミラーガラスの温度分布図である。It is a temperature distribution figure of the mirror glass 3 minutes after applying a voltage to the mirror with a heating wire shown in FIG. 図４に示した電熱線付き鏡に電圧を印加して１２分後のミラーガラスの温度分布図である。It is a temperature distribution figure of the mirror glass 12 minutes after applying a voltage to the mirror with a heating wire shown in FIG. 従来の化粧鏡を示す概略図である。It is the schematic which shows the conventional makeup mirror.

以下、本発明の実施の形態について図面を参照しながら説明し、本発明の理解に供する。
図１は、本発明を適用した第１の実施態様の鏡装置の一例を示す概略図である。また、図２は、図１のＡ−Ａ線に沿った断面を示す概略断面図である。 Hereinafter, embodiments of the present invention will be described with reference to the drawings to facilitate understanding of the present invention.
FIG. 1 is a schematic view showing an example of a mirror device according to a first embodiment to which the present invention is applied. FIG. 2 is a schematic cross-sectional view showing a cross section taken along line AA of FIG.

図１および図２に示す本発明の鏡装置１は、長方形の平板状のガラス基材（基材の一例である。）２を備える。
また、本発明の鏡装置１は、ガラス基材２の一方の面側の全面に形成された導電性を有する金属膜（導電膜の一例である。）４を備える。 The mirror device 1 of the present invention shown in FIGS. 1 and 2 includes a rectangular flat glass substrate (an example of a substrate) 2.
In addition, the mirror device 1 of the present invention includes a conductive metal film (an example of a conductive film) 4 formed on the entire surface of one side of the glass substrate 2.

ここで、金属膜４は、ガラス基材２に金属を蒸着して形成されたものである。
また、金属膜４の形成のために使用される金属としては、例えばインジウム錫酸化物（ＩＴＯ）、Ａｇ、ＺｎＯ、あるいはＳｎＯ２である。 Here, the metal film 4 is formed by vapor-depositing a metal on the glass substrate 2.
The metal used for forming the metal film 4 is, for example, indium tin oxide (ITO), Ag, ZnO, or SnO 2 .

また、金属膜４の厚さは、８００〜１２００オングストローム、さらに具体的には１０００オングストロームである。
また、金属膜４の表面抵抗値は、１００Ω／ｃｍ２以下、好ましくは３０Ω／ｃｍ２以下である。 The thickness of the metal film 4 is 800 to 1200 angstroms, more specifically 1000 angstroms.
The metal film 4 has a surface resistance value of 100 Ω / cm 2 or less, preferably 30 Ω / cm 2 or less.

また、本発明の鏡装置１は、金属膜４と電気的に接続された、かつ、銅箔で構成された一対の電極５を備える。
ここで、電極５は、ガラス基材２の対向する長辺の縁それぞれに沿って金属膜４に設けられている。 Moreover, the mirror device 1 of the present invention includes a pair of electrodes 5 that are electrically connected to the metal film 4 and configured of copper foil.
Here, the electrodes 5 are provided on the metal film 4 along the edges of the opposing long sides of the glass substrate 2.

また、電極５には、電極５に電源（図示せず。）から電力を供給するための電源ケーブル７が接続されている。   The electrode 5 is connected to a power cable 7 for supplying power to the electrode 5 from a power source (not shown).

また、本発明の鏡装置１は、金属膜４と電極５に接して配置されたＥＶＡ（エチレン酢酸ビニル）樹脂フィルム６を備えている。   The mirror device 1 of the present invention includes an EVA (ethylene vinyl acetate) resin film 6 disposed in contact with the metal film 4 and the electrode 5.

また、本発明の鏡装置１は、ガラス基材２の、金属膜４と電極５とＥＶＡ樹脂フィルム６とが設けられた側に配置されたミラーガラス（鏡体の一例である。）３を備える。
すなわち、金属膜４と、電極５と、ＥＶＡ樹脂フィルム６は、ガラス基材２とミラーガラス３との間に位置する。 Moreover, the mirror apparatus 1 of this invention is the mirror glass (an example of a mirror body) 3 arrange | positioned at the side by which the metal film 4, the electrode 5, and the EVA resin film 6 were provided of the glass base material 2. FIG. Prepare.
That is, the metal film 4, the electrode 5, and the EVA resin film 6 are located between the glass substrate 2 and the mirror glass 3.

また、ミラーガラス３は、長方形の平板状である。
また、ガラス基材２とミラーガラス３は、互いに略同じ面積を有する。
また、ガラス基材２の端面からミラーガラス３の端面にまで、例えばブチル化合物を付与して防水することもできる。 Moreover, the mirror glass 3 is a rectangular flat plate shape.
The glass substrate 2 and the mirror glass 3 have substantially the same area.
Further, for example, a butyl compound can be applied to the end surface of the glass substrate 2 to the end surface of the mirror glass 3 for waterproofing.

なお、図１の一部切り欠いた箇所において、ＥＶＡ樹脂フィルムの図示を省略している。   In addition, illustration of the EVA resin film is abbreviate | omitted in the part notched part of FIG.

ここで、導電膜は、必ずしも基材の一方の面側のみに形成されていなくてもよく、基材の両方の面に形成されていてもよい。   Here, the conductive film may not necessarily be formed only on one surface side of the base material, and may be formed on both surfaces of the base material.

また、本発明の鏡装置は、必ずしもＥＶＡ樹脂フィルムを備えていなくてもよく、例えばＰＶＢ（ポリビニルブチラール）樹脂フィルムを備えることもできる。
しかし、ＥＶＡ樹脂フィルムを備えていた方が、鏡装置の耐水性をより一層向上させることができるので好ましい。 Moreover, the mirror apparatus of this invention does not necessarily need to be equipped with the EVA resin film, for example, can also be provided with a PVB (polyvinyl butyral) resin film.
However, it is preferable to provide the EVA resin film because the water resistance of the mirror device can be further improved.

また、本発明の鏡装置は、必ずしも基材と鏡体との間に配置された樹脂フィルムを備えていなくてもよい。
しかし、本発明の鏡装置が樹脂フィルムを備えていれば、鏡装置の耐水性を向上させることができるので好ましい。 Moreover, the mirror apparatus of this invention does not necessarily need to be provided with the resin film arrange | positioned between a base material and a mirror body.
However, if the mirror device of the present invention is provided with a resin film, it is preferable because the water resistance of the mirror device can be improved.

また、基材と鏡体は、必ずしも互いに略同じ面積を有する長方形の板状でなくてもよい。   Further, the base material and the mirror body do not necessarily have to have a rectangular plate shape having substantially the same area.

しかし、基材と鏡体が互いに略同じ面積を有する長方形の板状であれば、本発明の鏡装置は基材と鏡体の２層構造となるので堅固になり、破損し難くなる。
さらに、基材と鏡体が互いに略同じ面積を有する長方形の板状であれば、基材と鏡体とで電極を挟む構造となるので、電極を保護することができ、かつ、電極を隠すことができる。
よって、好ましい。 However, if the base material and the mirror body are rectangular plate shapes having substantially the same area, the mirror device of the present invention has a two-layer structure of the base material and the mirror body, and thus becomes rigid and difficult to break.
Furthermore, if the base and the mirror have a rectangular plate shape having substantially the same area, the electrode is sandwiched between the base and the mirror so that the electrode can be protected and the electrode is hidden. be able to.
Therefore, it is preferable.

また、導電膜の表面抵抗値は、必ずしも１００Ω／ｃｍ２以下でなくてもよい。
しかし、導電膜の表面抵抗値が１００Ω／ｃｍ２以下であれば、導電膜に電気が流れやすく、低電圧で昇温が可能であるので好ましい。 Further, the surface resistance value of the conductive film is not necessarily 100 Ω / cm 2 or less.
However, it is preferable that the surface resistance value of the conductive film is 100 Ω / cm 2 or less because electricity can easily flow through the conductive film and the temperature can be raised at a low voltage.

また、必ずしも電極は、基材の長辺の縁に沿って導電膜上に設けられていなくてもよい。
しかし、電極が基材の長辺の縁に沿って導電膜上に設けられていれば、抵抗値は基材の長さに反比例するので、短辺の縁に沿って導電膜上に電極を設ける場合よりも抵抗値を小さくできるので好ましい。 In addition, the electrode is not necessarily provided on the conductive film along the edge of the long side of the base material.
However, if the electrode is provided on the conductive film along the edge of the long side of the base material, the resistance value is inversely proportional to the length of the base material, so the electrode is placed on the conductive film along the edge of the short side. Since the resistance value can be made smaller than the case of providing, it is preferable.

図３は、本発明を適用した第２の実施態様の鏡装置の一例を示す概略正面図（ａ）、および概略正面図（ａ）のＢ−Ｂ線に沿った断面を示す概略断面図（ｂ）である。   FIG. 3: is a schematic front view (a) which shows an example of the mirror apparatus of the 2nd embodiment to which this invention is applied, and schematic sectional drawing which shows the cross section along the BB line of schematic front view (a) ( b).

図３（ａ）および図３（ｂ）に示す本発明の鏡装置２１は、長方形の平板状のガラス基材２２を備える。
また、ガラス基材２２の一方の面には鏡面２３が形成されている。 The mirror device 21 of the present invention shown in FIGS. 3A and 3B includes a rectangular flat glass substrate 22.
A mirror surface 23 is formed on one surface of the glass substrate 22.

また、本発明の鏡装置２１は、ガラス基材２２の、鏡面２３が形成された面側とは反対側の全面に形成された導電性を有する金属膜２４を備える。
ここで、金属膜２４は、第１の実施態様の金属膜と同様のものである。 Further, the mirror device 21 of the present invention includes a conductive metal film 24 formed on the entire surface of the glass substrate 22 opposite to the surface side on which the mirror surface 23 is formed.
Here, the metal film 24 is the same as the metal film of the first embodiment.

また、本発明の鏡装置２１は、金属膜２４と電気的に接続された、かつ、銅箔で構成された一対の電極２５を備える。
ここで、電極２５は、ガラス基材２２の対向する長辺の縁それぞれに沿って金属膜２４に設けられている。 In addition, the mirror device 21 of the present invention includes a pair of electrodes 25 that are electrically connected to the metal film 24 and made of copper foil.
Here, the electrode 25 is provided on the metal film 24 along each of the opposing edges of the glass substrate 22.

また、電極２５には、電極５に電源（図示せず。）から電力を供給するための電源ケーブル２７が接続されている。   The electrode 25 is connected to a power cable 27 for supplying power to the electrode 5 from a power source (not shown).

［実験例］
次に、本発明の第１の実施態様の鏡装置１と一般の電熱線付き鏡とについて、ミラーガラスを電熱してミラーガラスの複数の箇所の温度を測定した。
また、図４は、比較対象である一般の電熱線付き鏡を示す概略図である。 [Experimental example]
Next, about the mirror apparatus 1 of the 1st embodiment of this invention, and the general mirror with a heating wire, the mirror glass was electrically heated and the temperature of the several location of mirror glass was measured.
FIG. 4 is a schematic view showing a general mirror with a heating wire as a comparison target.

図４に示す電熱線付き鏡２００は、長方形の平板状のミラーガラス２０１と、ミラーガラス２０１の一方の面に取付けられた平板状のヒーター板２０３とを備える。   A heating wire mirror 200 shown in FIG. 4 includes a rectangular flat mirror glass 201 and a flat heater plate 203 attached to one surface of the mirror glass 201.

また、ヒーター板２０３には、蛇行した電熱線２０２が設けられている。
また、電熱線２０２には、電熱線２０２に電源（図示せず。）から電力を供給するための電源ケーブル２０４が、コネクタ２０５を介して接続されている。 The heater plate 203 is provided with a meandering heating wire 202.
In addition, a power cable 204 for supplying power to the heating wire 202 from a power source (not shown) is connected to the heating wire 202 via a connector 205.

また、本発明の鏡装置１のミラーガラス３の面積と、電熱線付き鏡２００のミラーガラス２０１の面積は同じとした。すなわち、どちらも３５０ｍｍ×４００ｍｍとした。   Moreover, the area of the mirror glass 3 of the mirror apparatus 1 of this invention and the area of the mirror glass 201 of the mirror 200 with a heating wire were made the same. That is, both were set to 350 mm × 400 mm.

そして、本発明の鏡装置１の金属膜４に電極５を介して電力を供給してミラーガラス３を１２分間電熱した。
また、電熱線付き鏡２００の電熱線に電力を供給してミラーガラス２０１を１２分間電熱した。 And electric power was supplied to the metal film 4 of the mirror apparatus 1 of this invention through the electrode 5, and the mirror glass 3 was electrically heated for 12 minutes.
Moreover, electric power was supplied to the heating wire of the mirror 200 with a heating wire, and the mirror glass 201 was heated for 12 minutes.

また、本発明の鏡装置１への印加電圧は３０Ｖであり、電熱線付き鏡２００への印加電圧は１００Ｖであった。
結果を、温度分布図として図５〜図８に示す。 Moreover, the applied voltage to the mirror apparatus 1 of this invention was 30V, and the applied voltage to the mirror 200 with a heating wire was 100V.
The results are shown in FIGS. 5 to 8 as temperature distribution diagrams.

すなわち、図５は、本発明を適用した第１の実施態様の鏡装置に電圧を印加して３分後のミラーガラスの温度分布図である。また、図６は、本発明を適用した第１の実施態様の鏡装置に電圧を印加して１２分後のミラーガラスの温度分布図である。   That is, FIG. 5 is a temperature distribution diagram of the mirror glass 3 minutes after the voltage is applied to the mirror device of the first embodiment to which the present invention is applied. FIG. 6 is a temperature distribution diagram of the mirror glass 12 minutes after the voltage is applied to the mirror device of the first embodiment to which the present invention is applied.

また、図７は、図４に示した電熱線付き鏡に電圧を印加して３分後のミラーガラスの温度分布図である。また、図８は、図４に示した電熱線付き鏡に電圧を印加して１２分後のミラーガラスの温度分布図である。   FIG. 7 is a temperature distribution diagram of the mirror glass 3 minutes after applying a voltage to the mirror with heating wire shown in FIG. FIG. 8 is a temperature distribution diagram of the mirror glass 12 minutes after applying a voltage to the mirror with heating wire shown in FIG.

ここで、図５〜図８に示す外形の四角形状は、ミラーガラス全体を示す。   Here, the rectangular shape of the outer shape shown in FIGS. 5 to 8 shows the entire mirror glass.

図５および図６から明らかなように、本発明の鏡装置１に電圧を印加して３分後も１２分後も、ミラーガラス３の温度分布にバラつきはなかった。すなわち、ミラーガラス３に均一に熱を加えることができた。   As is apparent from FIGS. 5 and 6, the temperature distribution of the mirror glass 3 did not vary even after 3 minutes and 12 minutes after the voltage was applied to the mirror device 1 of the present invention. That is, heat could be applied uniformly to the mirror glass 3.

ここで、電圧印加から３分後の本発明の鏡装置１のミラーガラス３の全面は、２８℃以上３０℃未満の領域であり、電圧印加から１２分後の本発明の鏡装置１のミラーガラス３の全面は、３６℃以上３８℃未満の領域であった。   Here, the entire surface of the mirror glass 3 of the mirror device 1 of the present invention 3 minutes after the voltage application is a region of 28 ° C. or more and less than 30 ° C., and the mirror of the mirror device 1 of the present invention 12 minutes after the voltage application. The entire surface of the glass 3 was a region of 36 ° C. or higher and lower than 38 ° C.

これに対し、図７および図８から明らかなように、電熱線付き鏡２００に電圧を印加して３分後も１２分後も、ミラーガラス２０１の温度分布にバラつきがあった。すなわち、ミラーガラス２０１に均一に熱を加えることができなかった。   On the other hand, as apparent from FIGS. 7 and 8, the temperature distribution of the mirror glass 201 varied even after 3 minutes and 12 minutes after the voltage was applied to the mirror 200 with heating wire. That is, the mirror glass 201 could not be heated uniformly.

ここで、電圧印加から３分後の電熱線付き鏡２００のミラーガラス２０１には、２０℃以上２２℃未満の領域Ａと、２６℃以上２８℃未満の領域Ｂと、２８℃以上３０℃未満の領域Ｃと、３０℃以上３２℃未満の領域Ｄが存在した。   Here, in the mirror glass 201 of the mirror 200 with a heating wire 3 minutes after voltage application, a region A of 20 ° C. or higher and lower than 22 ° C., a region B of 26 ° C. or higher and lower than 28 ° C., and 28 ° C. or higher and lower than 30 ° C. Region C and region D of 30 ° C. or higher and lower than 32 ° C. were present.

また、電圧印加から１２分後の電熱線付き鏡２００のミラーガラス２０１には、２０℃以上２２℃未満の領域Ａと、２８℃以上３０℃未満の領域Ｃと、３０℃以上３２℃未満の領域Ｄと、３２℃以上３４℃未満の領域Ｅと、３４℃以上３６℃未満の領域Ｆと、３６℃以上３８℃未満の領域Ｇと、３８℃以上４０℃未満の領域Ｈと、４０℃以上４２℃未満の領域Ｉが存在した。   In addition, the mirror glass 201 of the heating wire mirror 200 12 minutes after the voltage application includes a region A of 20 ° C. or higher and lower than 22 ° C., a region C of 28 ° C. or higher and lower than 30 ° C., and a temperature of 30 ° C. or higher and lower than 32 ° C. Region D, Region E from 32 ° C. to less than 34 ° C., Region F from 34 ° C. to less than 36 ° C., Region G from 36 ° C. to less than 38 ° C., Region H from 38 ° C. to less than 40 ° C., and 40 ° C. Region I below 42 ° C. was present.

また、本発明の鏡装置の方が、電熱線付き鏡よりも低電圧でミラーガラスを約４０℃まで電熱できた。   Further, the mirror device of the present invention was able to heat the mirror glass to about 40 ° C. at a lower voltage than the mirror with heating wire.

また、本発明の鏡装置１への印加電圧を変えて、ミラーガラス３を約４０℃まで電熱した。その結果、本発明の鏡装置１への印加電圧が４０Ｖの場合、ミラーガラス３が約４０℃になるまでの所要時間は約８分であり、本発明の鏡装置１への印加電圧が５０Ｖの場合、ミラーガラス３が約４０℃になるまでの所要時間は約４分であった。   Moreover, the mirror glass 3 was heated to about 40 degreeC by changing the voltage applied to the mirror apparatus 1 of this invention. As a result, when the applied voltage to the mirror device 1 of the present invention is 40V, the time required for the mirror glass 3 to reach about 40 ° C. is about 8 minutes, and the applied voltage to the mirror device 1 of the present invention is 50V. In this case, the time required for the mirror glass 3 to reach about 40 ° C. was about 4 minutes.

以上のように、本発明の鏡装置は、基材の少なくとも一方の面側の全面に形成された導電性を有する導電膜と、導電膜と電気的に接続された電極とを備えているので、基材の少なくとも一方の面側の全面を電熱することができる。   As described above, the mirror device of the present invention includes the conductive film formed on the entire surface on at least one surface side of the base material, and the electrode electrically connected to the conductive film. The entire surface of at least one surface side of the substrate can be heated.

従って、本発明の鏡装置は、従来の電熱線による鏡の電熱よりも、鏡に均一に熱を加えることができる。   Therefore, the mirror device of the present invention can heat the mirror more uniformly than the conventional heating of the mirror by the heating wire.

１ 鏡装置
２ ガラス基材
３ ミラーガラス
４ 金属膜
５ 電極
６ ＥＶＡ樹脂フィルム
７ 電源ケーブル
２１ 鏡装置
２２ ガラス基材
２３ 鏡面
２４ 金属膜
２５ 電極
２７ 電源ケーブル
Ａ ２０℃以上２２℃未満の領域
Ｂ ２６℃以上２８℃未満の領域
Ｃ ２８℃以上３０℃未満の領域
Ｄ ３０℃以上３２℃未満の領域
Ｅ ３２℃以上３４℃未満の領域
Ｆ ３４℃以上３６℃未満の領域
Ｇ ３６℃以上３８℃未満の領域
Ｈ ３８℃以上４０℃未満の領域
Ｉ ４０℃以上４２℃未満の領域 DESCRIPTION OF SYMBOLS 1 Mirror apparatus 2 Glass base material 3 Mirror glass 4 Metal film 5 Electrode 6 EVA resin film 7 Power cable 21 Mirror apparatus 22 Glass base material 23 Mirror surface 24 Metal film 25 Electrode 27 Power cable A Area | region below 20 degreeC or more and less than 22 degreeC B26 C to 28 ° C to less than 30 ° C D 30 ° C to less than 32 ° C D 30 ° C to less than 32 ° C E 32 ° C to less than 34 ° C F 34 ° C to less than 36 ° C G 36 ° C to less than 38 ° C Region H Region of 38 ° C or higher and lower than 40 ° C I Region of 40 ° C or higher and lower than 42 ° C

Claims (6)

基材と、
該基材の少なくとも一方の面側の全面に形成された導電性を有する導電膜と、
該導電膜と電気的に接続された電極と、
前記基材の、前記導電膜が形成された側に配置された鏡体とを備える
鏡装置。 A substrate;
A conductive film having conductivity formed on the entire surface of at least one surface of the substrate;
An electrode electrically connected to the conductive film;
The mirror apparatus provided with the mirror body arrange | positioned at the side in which the said electrically conductive film was formed of the said base material. 前記基材と前記鏡体との間に配置された樹脂フィルムを備える
請求項１に記載の鏡装置。 The mirror device according to claim 1, further comprising a resin film disposed between the base material and the mirror body. 前記樹脂フィルムは、ＥＶＡ樹脂フィルムである
請求項２に記載の鏡装置。 The mirror apparatus according to claim 2, wherein the resin film is an EVA resin film. 前記基材および前記鏡体は、互いに略同じ面積を有する長方形の板状であり、
前記電極は、前記基材の長辺の縁に沿って前記導電膜上に設けられた
請求項１〜３のいずれか１つに記載の鏡装置。 The base material and the mirror body are rectangular plate shapes having substantially the same area.
The mirror device according to claim 1, wherein the electrode is provided on the conductive film along an edge of a long side of the base material. 前記導電膜の表面抵抗値は３０Ω／ｃｍ２以下である
請求項１〜４のいずれか１つに記載の鏡装置。 The mirror device according to claim 1, wherein the conductive film has a surface resistance value of 30 Ω / cm 2 or less. 鏡面が形成された基材と、
該基材の、鏡面が形成された面側とは反対側の全面に形成された導電性を有する導電膜と、
該導電膜と電気的に接続された電極とを備える
鏡装置。 A substrate on which a mirror surface is formed;
A conductive film having conductivity formed on the entire surface of the substrate opposite to the surface on which the mirror surface is formed;
A mirror apparatus comprising: an electrode electrically connected to the conductive film.
JP2013194130A 2013-09-19 2013-09-19 Mirror device Pending JP2015058196A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898261U (en) * 1981-12-25 1983-07-04 三菱自動車工業株式会社 Window glass anti-fog device
JPH03106971U (en) * 1990-02-20 1991-11-05
JPH09405A (en) * 1995-06-16 1997-01-07 Tatsuguchi Kogyo Glass Kk Defogging surface mirror and its production
JP2003321258A (en) * 2002-05-07 2003-11-11 Nakajima Glass Co Inc Laminated glass equipped with heater and manufacturing process therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898261U (en) * 1981-12-25 1983-07-04 三菱自動車工業株式会社 Window glass anti-fog device
JPH03106971U (en) * 1990-02-20 1991-11-05
JPH09405A (en) * 1995-06-16 1997-01-07 Tatsuguchi Kogyo Glass Kk Defogging surface mirror and its production
JP2003321258A (en) * 2002-05-07 2003-11-11 Nakajima Glass Co Inc Laminated glass equipped with heater and manufacturing process therefor

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