JP2015056712A5 - - Google Patents
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- JP2015056712A5 JP2015056712A5 JP2013187919A JP2013187919A JP2015056712A5 JP 2015056712 A5 JP2015056712 A5 JP 2015056712A5 JP 2013187919 A JP2013187919 A JP 2013187919A JP 2013187919 A JP2013187919 A JP 2013187919A JP 2015056712 A5 JP2015056712 A5 JP 2015056712A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode fingers
- dielectric film
- piezoelectric substrate
- acoustic wave
- wave device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 claims 16
- 230000001902 propagating Effects 0.000 claims 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N Silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 150000001247 metal acetylides Chemical class 0.000 claims 1
- 150000004767 nitrides Chemical class 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
Claims (16)
前記圧電基板の上面の上方に配置されたIDT電極であって、主要弾性波を励振させるべく構成された複数の電極指を含むIDT電極と、
前記圧電基板の上面の上方に配置されて前記複数の電極指を覆い、前記複数の電極指の隣接する電極指間の位置において前記圧電基板の上面に接触する酸化物製の第1誘電膜と、
前記複数の電極指の上面に、及び前記第1誘電膜と前記複数の電極指それぞれとの間に配置された非酸化物製の第2誘電膜と
を含む弾性波素子。 A piezoelectric substrate having an upper surface ;
An IDT electrode disposed above an upper surface of the piezoelectric substrate, the IDT electrode including a plurality of electrode fingers configured to excite a main acoustic wave;
Wherein arranged above the upper surface of the piezoelectric substrate has covering the plurality of electrode fingers, the first dielectric film made of oxides in contact with the upper surface of the piezoelectric substrate at a position between the adjacent electrode fingers of said plurality of electrode fingers When,
The upper surface of the plurality of electrode fingers, and the non-oxide made of a second dielectric layer disposed between each of the plurality of electrode fingers and the first dielectric layer
An elastic wave device including:
前記第3誘電膜を伝搬する横波の速度は前記圧電基板を伝搬する前記主要弾性波の速度よりも速い請求項1の弾性波素子。The elastic wave device according to claim 1, wherein the velocity of the transverse wave propagating through the third dielectric film is faster than the velocity of the main elastic wave propagating through the piezoelectric substrate.
前記第3誘電膜の誘電率は前記圧電基板の誘電率よりも小さい請求項1の弾性波素子。The elastic wave device according to claim 1, wherein a dielectric constant of the third dielectric film is smaller than a dielectric constant of the piezoelectric substrate.
請求項1の弾性波素子と、
前記弾性波素子に接続された再生装置と
を含む電子機器。 Electronic equipment,
An acoustic wave device according to claim 1 ;
And an electronic device including a reproducing device connected to the acoustic wave element.
前記圧電基板の上面の上方に形成されたIDT電極であって、主要弾性波を励振させるべく構成された複数の電極指を含むIDT電極と、An IDT electrode formed above an upper surface of the piezoelectric substrate, the IDT electrode including a plurality of electrode fingers configured to excite a main acoustic wave;
前記圧電基板の上面の上方に配置されて前記複数の電極指を覆い、前記複数の電極指の隣接する電極指間の位置において前記圧電基板の上面に接触する酸化物製の第1誘電膜と、A first dielectric film made of oxide that is disposed above the upper surface of the piezoelectric substrate, covers the plurality of electrode fingers, and contacts the upper surface of the piezoelectric substrate at a position between adjacent electrode fingers of the plurality of electrode fingers; ,
前記複数の電極指の上面に、及び前記第1誘電膜と前記複数の電極指それぞれとの間に配置された非酸化物製の第2誘電膜と、A non-oxide second dielectric film disposed on an upper surface of the plurality of electrode fingers and between the first dielectric film and each of the plurality of electrode fingers;
前記圧電基板と前記複数の電極指のそれぞれとの間に形成された第3誘電膜とA third dielectric film formed between the piezoelectric substrate and each of the plurality of electrode fingers;
を含む弾性波素子。An elastic wave device including:
前記媒体は、前記媒体を伝搬する横波の速度が、前記圧電基板を伝搬する前記主要弾性波の速度よりも速いことを許容する請求項14の弾性波素子。15. The acoustic wave device according to claim 14, wherein the medium allows a velocity of a transverse wave propagating through the medium to be higher than a velocity of the main elastic wave propagating through the piezoelectric substrate.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013187919A JP6198536B2 (en) | 2013-09-11 | 2013-09-11 | Elastic wave device and electronic device using the same |
US14/176,149 US9496846B2 (en) | 2013-02-15 | 2014-02-10 | Acoustic wave device and electronic apparatus including same |
US15/332,279 US10439585B2 (en) | 2013-02-15 | 2016-10-24 | Acoustic wave device including multiple dielectric films |
US16/545,037 US11863156B2 (en) | 2013-02-15 | 2019-08-20 | Acoustic wave device including multi-layer interdigital transducer electrodes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013187919A JP6198536B2 (en) | 2013-09-11 | 2013-09-11 | Elastic wave device and electronic device using the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015056712A JP2015056712A (en) | 2015-03-23 |
JP2015056712A5 true JP2015056712A5 (en) | 2016-10-27 |
JP6198536B2 JP6198536B2 (en) | 2017-09-20 |
Family
ID=52820806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013187919A Active JP6198536B2 (en) | 2013-02-15 | 2013-09-11 | Elastic wave device and electronic device using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6198536B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102304886B1 (en) * | 2017-02-22 | 2021-09-24 | 가부시키가이샤 무라타 세이사쿠쇼 | surface acoustic wave device |
JP6957306B2 (en) * | 2017-10-17 | 2021-11-02 | 太陽誘電株式会社 | Elastic wave device and its manufacturing method |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS513183A (en) * | 1974-06-24 | 1976-01-12 | Matsushita Electric Ind Co Ltd | Atsudenseisoshi |
JPS51101444A (en) * | 1975-03-04 | 1976-09-07 | Murata Manufacturing Co | Danseihyomenhatoransujuusaa |
JPS529389A (en) * | 1975-07-14 | 1977-01-24 | Toshiba Corp | Surface acoustic wave device |
DE19548051A1 (en) * | 1995-12-21 | 1997-06-26 | Siemens Matsushita Components | Electronic component, in particular component working with surface acoustic waves - SAW component - |
JP3858312B2 (en) * | 1996-11-11 | 2006-12-13 | 松下電器産業株式会社 | Surface acoustic wave device and manufacturing method thereof |
JP2008067289A (en) * | 2006-09-11 | 2008-03-21 | Fujitsu Media Device Kk | Surface acoustic wave device and filter |
JP2008109413A (en) * | 2006-10-25 | 2008-05-08 | Fujitsu Media Device Kk | Elastic wave device and filter |
JP2011135245A (en) * | 2009-12-24 | 2011-07-07 | Panasonic Corp | Elastic wave device, manufacturing method thereof, and electronic device using the same |
JP5713027B2 (en) * | 2011-01-18 | 2015-05-07 | 株式会社村田製作所 | Surface acoustic wave filter device |
JP5671713B2 (en) * | 2011-03-04 | 2015-02-18 | スカイワークス・パナソニック フィルターソリューションズ ジャパン株式会社 | Elastic wave device |
JP5751887B2 (en) * | 2011-03-30 | 2015-07-22 | 京セラ株式会社 | Elastic wave device and elastic wave device using the same |
JP5859355B2 (en) * | 2012-03-23 | 2016-02-10 | 京セラ株式会社 | Elastic wave device and elastic wave device using the same |
-
2013
- 2013-09-11 JP JP2013187919A patent/JP6198536B2/en active Active
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