JP2015056712A5 - - Google Patents

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Publication number
JP2015056712A5
JP2015056712A5 JP2013187919A JP2013187919A JP2015056712A5 JP 2015056712 A5 JP2015056712 A5 JP 2015056712A5 JP 2013187919 A JP2013187919 A JP 2013187919A JP 2013187919 A JP2013187919 A JP 2013187919A JP 2015056712 A5 JP2015056712 A5 JP 2015056712A5
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JP
Japan
Prior art keywords
electrode fingers
dielectric film
piezoelectric substrate
acoustic wave
wave device
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Application number
JP2013187919A
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Japanese (ja)
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JP2015056712A (en
JP6198536B2 (en
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Priority to JP2013187919A priority Critical patent/JP6198536B2/en
Priority claimed from JP2013187919A external-priority patent/JP6198536B2/en
Priority to US14/176,149 priority patent/US9496846B2/en
Publication of JP2015056712A publication Critical patent/JP2015056712A/en
Priority to US15/332,279 priority patent/US10439585B2/en
Publication of JP2015056712A5 publication Critical patent/JP2015056712A5/ja
Application granted granted Critical
Publication of JP6198536B2 publication Critical patent/JP6198536B2/en
Priority to US16/545,037 priority patent/US11863156B2/en
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Claims (16)

上面を有する圧電基板と、
前記圧電基板の上面の上方に配置されたIDT電極であっ主要弾性波を励振させるべく構成された複数の電極指を含むIDT電極と、
前記圧電基板の上面の上方に配置されて前記複数の電極指を覆い、前記複数の電極指の隣接する電極指間の位置において前記圧電基板の上面に接触する酸化物製の第1誘電膜と、
前記複数の電極指の上面、及び前記第1誘電膜と前記複数の電極指それぞれとの間に配置された非酸化物製の第2誘電膜と
を含む弾性波素子。
A piezoelectric substrate having an upper surface ;
An IDT electrode disposed above an upper surface of the piezoelectric substrate, the IDT electrode including a plurality of electrode fingers configured to excite a main acoustic wave;
Wherein arranged above the upper surface of the piezoelectric substrate has covering the plurality of electrode fingers, the first dielectric film made of oxides in contact with the upper surface of the piezoelectric substrate at a position between the adjacent electrode fingers of said plurality of electrode fingers When,
The upper surface of the plurality of electrode fingers, and the non-oxide made of a second dielectric layer disposed between each of the plurality of electrode fingers and the first dielectric layer
An elastic wave device including:
前記第1誘電膜は、前記圧電基板の周波数温度係数と逆符号の周波数温度係数を有する請求項1の弾性波素子。 2. The acoustic wave device according to claim 1, wherein the first dielectric film has a frequency temperature coefficient opposite in sign to the frequency temperature coefficient of the piezoelectric substrate. 前記第1誘電膜は、酸化ケイ素から作られる請求項1の弾性波素子。 The first dielectric film, the elastic wave element according to claim 1, Ru made of silicon oxide. 前記第2誘電膜は、窒化物及び炭化物の一方から作られる請求項1の弾性波素子。 It said second dielectric film, an elastic wave element according to claim 1, Ru made from one of the nitrides and carbides. 前記第2誘電膜は、窒化ケイ素から作られる請求項の弾性波素子。 Said second dielectric film, an elastic wave element according to claim 4 in which Ru is made of silicon nitride. 前記主要弾性波は、レイリー波である請求項1の弾性波素子。 2. The acoustic wave device according to claim 1, wherein the main acoustic wave is a Rayleigh wave. 前記第2誘電膜は、前記複数の電極指の側面に接触する請求項1の弾性波素子。 The acoustic wave device according to claim 1, wherein the second dielectric film is in contact with side surfaces of the plurality of electrode fingers. 前記複数の電極指の上面における前記第2誘電膜の複数部分の膜厚は前記複数の電極指の側面に接触する前記第2誘電膜の複数部分の膜厚より厚い請求項7の弾性波素子。 Wherein the plurality of film thickness of portions of said second dielectric film on the upper surface of the electrode fingers, a plurality of portions of the elasticity of the thick claim 7 than the thickness of the second dielectric layer you contact with the lateral side of the plurality of electrode fingers Wave element. 前記第2誘電膜は、前記複数の電極指の上方から前記複数の電極指の各側面の一部を覆うが前記圧電基板の上面には到達しない請求項7の弾性波素子。The acoustic wave element according to claim 7, wherein the second dielectric film covers a part of each side surface of the plurality of electrode fingers from above the plurality of electrode fingers but does not reach the upper surface of the piezoelectric substrate. 前記圧電基板と前記複数の電極指のそれぞれとの間に配置された第3誘電膜をさらに含み、A third dielectric film disposed between the piezoelectric substrate and each of the plurality of electrode fingers;
前記第3誘電膜を伝搬する横波の速度は前記圧電基板を伝搬する前記主要弾性波の速度よりも速い請求項1の弾性波素子。The elastic wave device according to claim 1, wherein the velocity of the transverse wave propagating through the third dielectric film is faster than the velocity of the main elastic wave propagating through the piezoelectric substrate.
前記第2誘電膜を伝搬する横波の速度は、前記第1誘電膜を伝搬する横波の速度より速い請求項1の弾性波素子。 The elastic wave device according to claim 1, wherein the velocity of the transverse wave propagating through the second dielectric film is faster than the velocity of the transverse wave propagating through the first dielectric film. 前記圧電基板と前記複数の電極指のそれぞれとの間に配置された第3誘電膜をさらに含み、A third dielectric film disposed between the piezoelectric substrate and each of the plurality of electrode fingers;
前記第3誘電膜の誘電率は前記圧電基板の誘電率よりも小さい請求項1の弾性波素子。The elastic wave device according to claim 1, wherein a dielectric constant of the third dielectric film is smaller than a dielectric constant of the piezoelectric substrate.
電子機器であって、
請求項1の弾性波素子と、
前記弾性波素子に接続された再生装置と
含む電子機器。
Electronic equipment,
An acoustic wave device according to claim 1 ;
And an electronic device including a reproducing device connected to the acoustic wave element.
上面を有する圧電基板と、A piezoelectric substrate having an upper surface;
前記圧電基板の上面の上方に形成されたIDT電極であって、主要弾性波を励振させるべく構成された複数の電極指を含むIDT電極と、An IDT electrode formed above an upper surface of the piezoelectric substrate, the IDT electrode including a plurality of electrode fingers configured to excite a main acoustic wave;
前記圧電基板の上面の上方に配置されて前記複数の電極指を覆い、前記複数の電極指の隣接する電極指間の位置において前記圧電基板の上面に接触する酸化物製の第1誘電膜と、A first dielectric film made of oxide that is disposed above the upper surface of the piezoelectric substrate, covers the plurality of electrode fingers, and contacts the upper surface of the piezoelectric substrate at a position between adjacent electrode fingers of the plurality of electrode fingers; ,
前記複数の電極指の上面に、及び前記第1誘電膜と前記複数の電極指それぞれとの間に配置された非酸化物製の第2誘電膜と、A non-oxide second dielectric film disposed on an upper surface of the plurality of electrode fingers and between the first dielectric film and each of the plurality of electrode fingers;
前記圧電基板と前記複数の電極指のそれぞれとの間に形成された第3誘電膜とA third dielectric film formed between the piezoelectric substrate and each of the plurality of electrode fingers;
を含む弾性波素子。An elastic wave device including:
前記第3誘電膜は媒体から作られ、The third dielectric film is made of a medium;
前記媒体は、前記媒体を伝搬する横波の速度が、前記圧電基板を伝搬する前記主要弾性波の速度よりも速いことを許容する請求項14の弾性波素子。15. The acoustic wave device according to claim 14, wherein the medium allows a velocity of a transverse wave propagating through the medium to be higher than a velocity of the main elastic wave propagating through the piezoelectric substrate.
請求項14の弾性波素子を含む電子機器。An electronic device comprising the acoustic wave device according to claim 14.
JP2013187919A 2013-02-15 2013-09-11 Elastic wave device and electronic device using the same Active JP6198536B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013187919A JP6198536B2 (en) 2013-09-11 2013-09-11 Elastic wave device and electronic device using the same
US14/176,149 US9496846B2 (en) 2013-02-15 2014-02-10 Acoustic wave device and electronic apparatus including same
US15/332,279 US10439585B2 (en) 2013-02-15 2016-10-24 Acoustic wave device including multiple dielectric films
US16/545,037 US11863156B2 (en) 2013-02-15 2019-08-20 Acoustic wave device including multi-layer interdigital transducer electrodes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013187919A JP6198536B2 (en) 2013-09-11 2013-09-11 Elastic wave device and electronic device using the same

Publications (3)

Publication Number Publication Date
JP2015056712A JP2015056712A (en) 2015-03-23
JP2015056712A5 true JP2015056712A5 (en) 2016-10-27
JP6198536B2 JP6198536B2 (en) 2017-09-20

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102304886B1 (en) * 2017-02-22 2021-09-24 가부시키가이샤 무라타 세이사쿠쇼 surface acoustic wave device
JP6957306B2 (en) * 2017-10-17 2021-11-02 太陽誘電株式会社 Elastic wave device and its manufacturing method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513183A (en) * 1974-06-24 1976-01-12 Matsushita Electric Ind Co Ltd Atsudenseisoshi
JPS51101444A (en) * 1975-03-04 1976-09-07 Murata Manufacturing Co Danseihyomenhatoransujuusaa
JPS529389A (en) * 1975-07-14 1977-01-24 Toshiba Corp Surface acoustic wave device
DE19548051A1 (en) * 1995-12-21 1997-06-26 Siemens Matsushita Components Electronic component, in particular component working with surface acoustic waves - SAW component -
JP3858312B2 (en) * 1996-11-11 2006-12-13 松下電器産業株式会社 Surface acoustic wave device and manufacturing method thereof
JP2008067289A (en) * 2006-09-11 2008-03-21 Fujitsu Media Device Kk Surface acoustic wave device and filter
JP2008109413A (en) * 2006-10-25 2008-05-08 Fujitsu Media Device Kk Elastic wave device and filter
JP2011135245A (en) * 2009-12-24 2011-07-07 Panasonic Corp Elastic wave device, manufacturing method thereof, and electronic device using the same
JP5713027B2 (en) * 2011-01-18 2015-05-07 株式会社村田製作所 Surface acoustic wave filter device
JP5671713B2 (en) * 2011-03-04 2015-02-18 スカイワークス・パナソニック フィルターソリューションズ ジャパン株式会社 Elastic wave device
JP5751887B2 (en) * 2011-03-30 2015-07-22 京セラ株式会社 Elastic wave device and elastic wave device using the same
JP5859355B2 (en) * 2012-03-23 2016-02-10 京セラ株式会社 Elastic wave device and elastic wave device using the same

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