JP2015037028A - Charged particle beam device with function cancellation mode and function extension mode - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of setting precise observation conditions in the case where high-level observation is desired, although the charged particle beam device can be easily used even by a beginner for observation without consciousness of complicated observation conditions including a height or inclination of a specimen stage.SOLUTION: The charged particle beam device comprises: an extension cancellation mode for displaying, on an image display part, an operation area for e.g., maintaining a fixed height of the specimen stage, maintaining the horizontal inclination angle of the specimen stage and moving a field of view of a specimen image vertically/horizontally and in a direction of rotation; and a function extension mode for displaying, on the image display part, an operation area for e.g., operating the height and the inclination angle of the specimen stage and moving the field of view of the specimen image vertically/horizontally and in the direction of rotation. For example, the charged particle beam device comprises: the extension cancellation mode in which an interval between an end portion of a charged particle beam optical system and the specimen stage and the inclination of the specimen stage cannot be operated; and the function extension mode in which three-dimensional movement, inclination and rotation of the specimen stage can be arbitrarily operated, and switching between the extension cancellation mode and the function extension mode can be operated.

Description

  The present invention relates to a charged particle beam apparatus such as a scanning electron microscope.

  Conventionally, users of charged particle beam apparatuses have been limited to so-called specialists such as researchers in research institutions or manufacturing managers or analysts in the manufacturing industry. For this reason, the graphic user interface (GUI) used in the conventional charged particle beam apparatus is designed on the assumption that an expert uses it. The charged particle beam apparatus is equipped with a great number of functions in order to meet various needs of specialization (customers) in various technical fields. In many of these functions, fine adjustment parameters (observation conditions) can be set, which contributes to advanced observation.

  On the other hand, in Patent Document 1, due to recent technological advancement, it is possible to realize a charged particle beam apparatus at a very low price for performance, and accordingly, in the past, such as educational sites such as elementary and junior high schools and automobile repair shops, etc. In light of the fact that charged particle beam measures are being introduced to places that could not have been envisaged, an intuitive and easy-to-operate GUI that can be operated even by beginners without specialized knowledge is disclosed. . Patent Document 1 discloses a technique that makes it easy to operate by reducing the user's operation by limiting the observation conditions such as the electro-optic conditions in the charged particle beam apparatus microscope to a fixed value as a table. ing.

JP 2011-1113776 A

  The inventor of the present application can operate even a beginner without specialized knowledge, and a user who has mastered basic operations and deepened their understanding of the charged particle beam device can set advanced observation conditions and perform advanced observations. As a result of intensive studies on a charged particle beam apparatus capable of performing the following, the following knowledge has been obtained.

  The sample stage that enables observation of the sample from various positions and angles enables various adjustments such as horizontal direction (XY axis), height direction (Z axis), tilt (T axis), and rotation (R axis). ing. The sample stage is controlled by a motor, and provides high operability and reproducibility, such as being able to adjust the position on the screen while viewing the observation screen displayed on the PC.

  On the other hand, there are an infinite number of combinations of observation conditions including the position of the sample stage. In particular, the height (Z axis) and tilt (T axis) of the sample stage are set appropriately according to the observation purpose. If it is necessary to set a combination of conditions that is wrong one step, the observation purpose may not be achieved at all. For example, if the height (Z-axis) of the sample stage is not appropriate, astigmatism increases or the focus is lost, and the observation image is blurred or distorted. If the sample stage is too far away, the image observation itself cannot be performed due to a decrease in the yield of signal electrons. In addition, if the sample stage (T-axis) is tilted, part of the sample surface is too close or too far away, and the observation image may be blurred or distorted, or the image observation itself cannot be performed. .

  In order to avoid these, not only the height (Z axis) and tilt (T axis) of the sample stage but also the acceleration voltage, focus, and stigma according to the height (Z axis) and tilt (T axis). It is necessary to adjust such as, but such adjustment is very threshold for beginners.

  On the other hand, the charged particle beam device disclosed in Patent Document 1 basically provides operability specialized for general users including beginners, and the hardware has a simple configuration corresponding to it. Only functions necessary for general users are installed.

  For this reason, the user who mastered basic operation and deepened the understanding to a charged particle beam apparatus cannot learn more advanced operation. It has not been able to meet the specialized needs for advanced observation, such as setting complicated observation conditions.

  The purpose of the present invention is a charged particle beam apparatus that can be observed without being conscious of complicated observation conditions including the height and inclination of the sample stage, and can be used easily even by beginners, but also for advanced observation. The present invention relates to realizing a charged particle beam apparatus capable of setting fine observation conditions.

  The present invention provides, for example, an image display unit that maintains the height of the sample stage at a predetermined level, maintains the tilt angle of the sample stage horizontally, and can move and move the field of view of the sample image in the vertical and horizontal directions and in the rotation direction. Charging with an extended release mode that displays on the image display, and a function expansion mode that can operate the height and tilt angle of the sample stage and display an operation area on the image display unit that can move the visual field of the sample image up, down, left, and right and in the rotation direction The present invention relates to a particle beam apparatus.

  In addition, the present invention provides, for example, an extension release mode in which the distance between the end of the charged particle optical system and the sample stage and the tilt of the sample stage cannot be operated arbitrarily, and the three-dimensional movement, tilt and rotation of the sample stage arbitrarily operated The present invention relates to a charged particle beam apparatus having a function expansion mode capable of switching between an expansion cancellation mode and a function expansion mode.

  According to the present invention, it is possible to observe without being aware of complicated observation conditions including the height and inclination of the sample stage, and even if it is a charged particle beam apparatus that can be used easily even by beginners, even if you want to make advanced observations, A charged particle beam apparatus that can set fine observation conditions can be realized.

1 is a diagram illustrating a basic configuration of an SEM according to Example 1. FIG. 1 is a diagram showing a system configuration of an SEM according to Example 1. FIG. FIG. 10 is a diagram illustrating a specific operation screen example of a GUI in an extended cancellation mode according to the first embodiment. FIG. 10 is a diagram illustrating a specific operation screen example of a GUI in a function expansion mode according to the first embodiment. 6 is an operation flowchart when switching between extension cancellation / function extension according to the first embodiment; It is a figure which shows the observation purpose setting screen structure at the time of the expansion cancellation | release mode concerning Example 1. FIG. It is a figure which shows the table structure which recorded the observation conditions according to the observation purpose concerning Example 1. FIG. It is a figure which shows the screen which sets the sample concerning Example 1. FIG. It is a figure which shows the application assistance screen concerning Example 3. FIG.

  In the embodiment, a charged particle source that emits a charged particle beam, a charged particle optical system that irradiates the sample with a charged particle beam, a detector that detects signal electrons generated from the sample, a sample, an X axis, A sample stage driven by the Y-axis, Z-axis, T-axis and R-axis, an image display unit for displaying a sample image formed from signal electrons, a charged particle source, a charged particle optical system, a detector, a sample stage, and A control unit that controls the image display unit. The control unit maintains the height of the sample stage at a predetermined level, maintains the tilt angle of the sample stage horizontally, and rotates the field of view of the sample image vertically and horizontally. An extension release mode that displays an operation area that can be moved in the direction on the image display unit, an operation area that can operate the height and tilt angle of the sample stage, and move the field of view of the sample image up and down, left and right, and in the rotation direction. It has the extension mode for displaying the radical 113 discloses a charged particle beam apparatus for displaying an operation area for switching the extended release mode and the extension mode to the image display unit.

  In the embodiment, a charged particle source that emits a charged particle beam, a charged particle optical system that irradiates the sample with the charged particle beam, a detector that detects signal electrons generated from the sample, a sample, Sample stage that can be moved, tilted, and rotated, an image display unit that displays a sample image formed from signal electrons, and a control that controls the charged particle source, charged particle optical system, detector, sample stage, and image display unit And an extension release mode in which the interval between the end of the charged particle optical system and the sample stage and the tilt of the sample stage cannot be arbitrarily operated, and the three-dimensional movement, tilt and rotation of the sample stage. There is disclosed a charged particle beam device having a function expansion mode that can be operated on and switching between an expansion cancellation mode and a function expansion mode.

  Further, in the embodiment, the control unit keeps the R axis of the sample stage constant in the extension release mode, and when an instruction to move the sample image field of view in the rotation direction is input from the operation region, the sample rotation is performed by raster rotation. Rotating the field of view of an image is disclosed. Also disclosed is that the control unit rotates the field of view of the sample image by raster rotation when an instruction to move the field of view of the sample image in the rotation direction is input without rotating the sample stage in the extension cancellation mode.

  In the embodiment, the control unit displays an observation condition selection region in which a predetermined observation condition can be selected in the extension cancellation mode on the screen display unit, and controls the height of the sample stage according to the selected observation condition. Is disclosed.

  Moreover, in an Example, when a control part switches from extended cancellation | release mode to function expansion mode, disclosing that observation conditions are taken over.

  Further, in the embodiment, when the control unit switches from the function expansion mode to the expansion cancellation mode, an observation condition selection area in which a predetermined observation condition can be selected is displayed on the screen display unit, and the selected observation condition is reset. , Switching to the extended release mode is disclosed.

  Further, in the embodiment, it is disclosed that when the control unit switches from the function expansion mode to the expansion cancellation mode, a sample holder selection region for setting a sample holder held on the sample stage is displayed on the image display unit.

  In the embodiment, when an instruction to move the view of the sample image up, down, left and right is input from the operation area, the control unit controls the X and Y axes of the sample stage and shifts the image of the sample image. Is moved up, down, left and right, and the image shift is reset when the magnification of the sample is lower than a predetermined magnification.

  In the embodiment, when an instruction to move the view of the sample image up, down, left and right is input from the operation area, the control unit controls the X and Y axes of the sample stage and shifts the image of the sample image. Is moved up, down, left and right, and the image shift is reset a plurality of times in accordance with the movement of the sample stage.

  Further, in the embodiment, it is disclosed that the control unit switches between the extended release mode and the function extended mode according to the input user name or password.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings. Note that a scanning electron microscope (SEM) will be described as an example of a charged particle beam apparatus. However, in addition to the SEM, the present invention includes an appearance inspection apparatus using an electron beam, a focused ion beam (FIB) apparatus, etc. The present invention can be applied to general charged particle beam apparatuses that perform processing.

  FIG. 1 is a diagram illustrating a basic configuration of the SEM according to the present embodiment. In FIG. 1, a primary electron beam 4 (charged particle beam) emitted from an electron gun 1 is controlled and accelerated by an anode 2, converged by a condenser lens 3 and an objective lens 6, and held by a sample stage 10. The sample 8 placed on the table 9 is irradiated.

  The sample stage 10 is disposed in a sample chamber (not shown). In order to open or evacuate the sample chamber, the sample chamber is connected to an evacuation system including a vacuum pump (not shown).

  The primary electron beam 4 is corrected by the stigma lens 19. The main control unit 13 controls the anode 2, the condenser lens 3, the objective lens 6, the stigma lens 19, and the sample stage 10 that constitute the charged particle optical system. The main control unit 13 and the computer 14 constitute an operation control unit.

  A deflector 5 is provided in the path of the primary electron beam 4. A predetermined deflection current is sent from the main control unit 13 to the deflector 5 according to an arbitrary setting magnification set from an input device 17 (command input unit) such as a mouse, a keyboard and / or an operation panel connected to the computer 14. Be paid. As a result, the primary electron beam 4 is deflected, and the surface of the sample 8 is secondarily scanned.

  The main control unit 13 controls the sample stage 10 to move the sample 8 to the observation position. Secondary electrons 7 generated by electron beam irradiation to the observation position of the positioned sample 8 are detected by the secondary electron detector 11, amplified by the amplifier 12, and supplied to the computer 14 via the main controller 13. The

  In addition, the field of view can be changed by image shift or raster rotation. In the image shift, the main control unit 13 controls the deflector 5 to deflect the primary electron beam 4 to change the scanning area vertically and horizontally and move the observation field vertically and horizontally. Although the movable range of the observation visual field is limited to the scannable region, it does not require a mechanical operation, so that the visual field can be moved with high accuracy. In raster rotation, the control unit 13 controls the deflector 5 to deflect the primary electron beam 4, rotate the scanning direction, and rotate the observation field. Unlike the rotation by the sample stage, the observation field can be rotated around the observation field.

  Then, it is stored in the memory 18 of the computer 14. The image signal based on the secondary electrons detected by the secondary electron detector 11 is displayed as an image on the image display device 15. In addition to secondary electrons, reflected electrons and transmitted electrons can be detected and displayed as an image. Furthermore, it is also possible to perform elemental analysis by detecting characteristic X-rays generated from the sample 8 with an X-ray detector.

  A storage device 16 is connected to the computer 14.

  In the configuration described above, an operation program 20 for performing control and data analysis processing is used in the computer 14 for controlling the entire SEM apparatus and analyzing data obtained by the apparatus. This operation program 20 is stored in the memory 18.

  The operation program 20 has a GUI mode, and can visually notify various device states and receive instructions for device control and data analysis processing from the user.

  FIG. 2 is a diagram illustrating a system configuration of the SEM according to the present embodiment. In FIG. 2, an operation program 20 operating on a computer 14 includes a GUI mode (expansion cancellation mode 201) used by general users including beginners, and an advanced observation that requires expert users and detailed observation condition settings. It has a GUI mode (function expansion mode 202) used when The user can switch between the extended release mode 201 and the function extended mode 202 according to his / her application.

  The extended cancellation mode 201 is a mode for a user who wants to observe a sample anyway without thinking about difficulties, and does not display functions that are used only during advanced observation on the GUI (on the image display device 15). The operation is also restricted. This provides simple and easy-to-understand operability for general users.

  Both of the above-described two GUI modes, the extension cancellation mode 201 and the function extension mode 202, have operation screens for setting observation conditions, and hardware control according to user operations can be performed on the operation screens. Made.

  The user designates an operation using an operation button 206 for performing a basic operation, a complicated function button 211, or a function button 214 suitable for the purpose. The operation information designated by the user is converted into command information for controlling the hardware and transmitted to the main control unit 13 via the command transmission / reception unit 203A.

  The main control unit 13 performs control according to the command transmitted from the command transmission / reception unit 203A and received by the command transmission / reception unit 203B, and finally the current voltage via the digital-analog conversion circuit (DAC) 204 and the driver 205. Signals and pulse signals are converted into electronic lenses such as an electron gun 1, an objective movable diaphragm, a condenser lens 3, an objective lens 6 and a stigma lens 19, hardware such as a sample stage motor, a vacuum pump and a detector 11. Control and set various observation conditions. Here, the command is a data format for exchanging information between the main control unit 13 and the computer 14.

  For example, when the user depresses the operation button 206 for performing basic operations by inputting position information, the complicated function button 211, or the function button 214 suitable for the purpose in order to move the observation field of view, a corresponding command Is transmitted to the main control unit 13.

  The main control unit 13 analyzes the received command, and accordingly, the stage XY axis control unit of the control unit group 216 sets parameters for driving the motor in the driver 205. The driver 205 drives the motor by controlling the pulse signal and current voltage for the connected step motor and servo motor.

  Thereby, the sample stage 10 is driven in the XY directions, and the sample 8 on the sample stage 10 moves. As a result, the irradiation position of the primary electron beam 4 irradiated on the sample 8 changes, and an image signal corresponding to the irradiation position is generated. The generated image signal is converted into a digital signal by an analog-digital conversion circuit (ADC) 207 and converted into two-dimensional image data by an image data generation unit 208.

  Since the two-dimensional image data is displayed on the image display unit 210 of the GUI (image display device 15) via the display control unit 209, the user can recognize the movement of the image.

  In the function expansion mode 202, many interfaces are provided so that various observation conditions can be set in detail, and there are many commands corresponding thereto. In contrast, in the extended cancellation mode 201, in order to provide a simple and easy-to-understand interface, the operation buttons 206 for performing basic operations are displayed, but the complicated function buttons 211 for performing complicated settings are not displayed. .

  Instead, in the extended cancellation mode 201, the optimum setting value is combined according to the observation purpose, and the combination is automatically set, so that the observation can be performed with only a simple function.

  For example, when the surface structure of the sample 8 is to be observed, it is desirable to set the acceleration voltage to be low and use the secondary electron detector 11. If the acceleration voltage is determined, it is possible to determine an adjustment value of an electron lens or the like that adjusts the convergence point and the optical axis. Such optimal observation conditions according to the observation purpose are held in advance as the observation condition table 212.

  At the start of observation, when the user determines the observation purpose on the observation purpose setting screen described later, the switching control unit 213 determines from the observation condition table 212, converts it into a plurality of commands, and automatically sets the observation condition. A function 214 suitable for the purpose of observation is determined from the observation condition table 212 and arranged.

  When the user presses the button K from the function 214 suitable for the observation purpose, the optimum control unit 215 for each purpose determines from the observation condition table 212 according to the currently set observation purpose, converts it to a command, and observes it. Set observation conditions suitable for the purpose.

  As a result, the user can easily observe without adjusting particularly difficult parameters. In addition, by combining optimal functions according to the purpose and displaying them as a single function, it is possible to prevent unnecessary functions from being displayed.

  As described above, since the function expansion mode 202 and the expansion cancellation mode 201 are different from each other only in the program that operates on the computer 14, the setting at the time of login and the operation of the switching button can be performed without changing the hardware. You can choose.

  FIG. 3 is a diagram illustrating a specific operation screen example of the GUI in the extended cancellation mode 201. The operation screen shown in FIG. 3 includes an image display screen 210, an extension cancellation / function extension switching button 300, an observation start / stop button 301 for starting and stopping observation, and an observation purpose change button 302 for resetting the observation purpose. A display mode changing area 304 for changing the display mode (Scan), an image saving button 305 for determining image saving, and an auto image adjustment area 306. ing.

  The operation screen of the extended release mode 201 does not have a screen for directly setting the Z-axis (height), R-axis (rotation), and T-axis (tilt) of the sample stage 10, and can be arbitrarily operated by the user. Is limiting.

Note that if the R-axis movement (rotation) of the sample stage 10 and the raster rotation can be used together, a beginner may be confused. Therefore, in the extended release mode 201, the R-axis (rotation) by the user is limited and the raster rotation is performed. Only can be operated. On the other hand, if the sample stage 10 is moved (rotated) along the R axis, the relative positional relationship (direction) between the sample and the detector may change, and the appearance of the sample may change. It is good also as a structure which can be rotated.

  In addition, a general charged particle beam apparatus has a screen for setting an acceleration voltage value and a spot intensity to control an electron beam. However, in the operation screen of the extended cancellation mode 201 in one embodiment of the present invention, In order to control the electron beam, there is no screen area for setting the acceleration voltage value and the spot intensity, and the direct setting by the user is limited.

  As a result, it is possible to prevent a situation in which the observation conditions are erroneously changed and the image cannot be observed or an unintended image, and at the same time, provide a user with a very simple and easy-to-understand GUI.

  For example, if there is a screen for setting the acceleration voltage value, if the user changes to a dark cloud without understanding their intention, the intention is to observe the sample surface structure, but the internal structure is observed. There is also a risk of damaging the sample itself.

  In addition, the yield may be extremely reduced, and even image observation may not be possible. Regarding the sample stage, if the Z-axis (height) or T-axis (tilt) of the sample stage is changed extremely, the resolution and yield may be reduced, and the observation image may be distorted.

  In the present embodiment, the possibility of being in the above state can be completely eliminated. In this embodiment, since a function for automatically setting observation conditions according to the observation purpose described later is provided, the user's observation purpose can be satisfied with only such a simple adjustment screen.

  That is, when the observation purpose change button 302 in FIG. 3 is pressed, the observation purpose setting screen 600 shown in FIG. 6 is displayed. When the user selects one of the observation purposes 601 on the observation purpose setting screen 600, the selected purpose is displayed. Accordingly, the conditions shown in FIG. 7 are automatically set.

  Next, a procedure until the user adjusts and saves an image in the extended cancellation mode 201 will be described.

  When the user presses the observation start / stop button 301 from a state in which an observation purpose to be described later has been set, an acceleration voltage is applied and observation starts. At this time, the optimum acceleration voltage value according to the observation purpose is automatically set, and at the same time, the spot intensity, the focus value, the stigma value, the alignment value, and the stage position are also automatically set. Since the movement of the sample stage 10 may take time until the movement is completed, it can be configured to automatically move simultaneously with setting the observation purpose.

  Next, when the primary electron beam 4 (primary electron beam) is applied to the sample 8 and secondary electrons generated from the sample 8 are detected by the secondary electron detector 11, a sample image is displayed on the image display screen 210. Is done.

  The user adjusts the brightness and contrast using the input device 17 such as a slider or an operation panel while looking at the sample image displayed on the image display screen 210, and similarly adjusts the focus to find the target field of view. Perform image output.

  The brightness, contrast, and focus adjustment may be automatically adjusted by pressing the button of the auto image adjustment area 306, or automatically adjusted in conjunction with the electron beam application process when the observation start button 301 is pressed. Also good. In addition, the autofocus process in this embodiment does not search the entire working distance range, but focuses on the working distance determined by the user's observation purpose and sample setting, and limits the search range to increase the speed. Focus processing may be used.

  Next, magnification adjustment and visual field movement are performed in order to search for a desired observation visual field. The magnification is adjusted using a slider or an operation panel. At this time, it is also possible to configure so that the magnification can be adjusted by mouse drag on the display image or mouse wheel scroll.

  To move the field of view on the image display screen 210 in the up / down / left / right (X / Y) direction, the image display screen 210 is dragged in the direction of movement, for example. It is also possible to specify and move the position to be moved directly on the image, for example, by clicking on the position to be moved to the center.

  At this time, the computer 14 performs image shift by moving the sample stage 10 and controlling the deflector 5 to deflect the primary electron beam 4 based on the input information. If the movement amount of the visual field is within the range in which the image shift is possible, the movement by the image shift is performed, and if the movement amount is not the image shift movement, the stage is moved. Image shift and stage movement are controlled in consideration of raster rotation, and the user need only specify the direction (up / down / left / right) on the observation field.

  As a result, the user can perform visual field movement without being aware of movement due to stage movement and image shift. In the embodiment, in order not to be aware of image shift, there is no screen for directly operating image shift, and direct operation is also restricted.

  Furthermore, when it is desired to rotate the field of view on the image display screen, arbitrary image rotation is performed by pressing the rotation button 308 set on the operation screen display. In the extended cancellation mode 201, since the operation of the stage R axis is restricted, the field of view is rotated by raster rotation.

  At this time, not only the rotation button 308 but also the rotation angle can be directly input, the rotation angle can be input using a slider, and an object drawn by a computer such as a horizontal ruler can be superimposed on the operation screen display to display the horizontal It may be rotated while checking the position of the observation image desired.

  When a desired observation visual field can be displayed, the display mode is switched in the display mode setting area 304, and final adjustment of focus and brightness is performed by scanning with high S / N and excellent image adjustment.

  The display mode change button in the display mode setting area 304 includes “view field search”, “image confirmation”, and “image adjustment”, and these are used for the following purposes.

  First, “field-of-view search” is a mode in which high-speed scanning is performed and the image update speed is increased, but the follow-up property to the movement of the field of view is improved although the image quality is lowered.

  “Image confirmation” is a mode used for final confirmation before recording an image by scanning at a low speed to improve the quality of the image although the image update speed is slow. “Image adjustment” is a mode used to adjust focus and astigmatism. The scan is slow, so the quality of the image is excellent, and the update speed is increased by reducing the scan area. Mode.

  These buttons have easy-to-understand meanings and can be operated intuitively.

  When the adjustment is completed, the user presses the image save button 305 to save the image as electronic data (file) in the storage device 16 connected to the computer 14.

  At this time, the scan speed at the time of image storage and the scan speed in each display mode vary greatly depending on the observation purpose. For example, if an observation purpose for observing the composition of a sample is selected, a BSE detector using a semiconductor detector is automatically set.

  However, since the semiconductor detector and the amplifier are poor in responsiveness, when the display mode for searching the field of view is selected, the scanning speed must be set a little slower than the secondary electron detector.

  Also, in the case of observing a sample that is easily charged, if the scan speed is slow, the image may be distorted due to charging of the sample, or the brightness may be extremely increased. Therefore, when performing “image confirmation” in which observation is performed with good image quality at a reduced scanning speed, the above-described problems are likely to occur. Therefore, a scan mode (CSS) that integrates line units that are not easily affected by charging is used. It is desirable.

  This is automatically determined and set by the observation condition table 212 described above, and although the buttons have the same name, the user can achieve the purpose without worrying about the details by actually assigning different functions. it can.

  FIG. 4 is a diagram illustrating a specific operation screen example of the GUI in the function expansion mode 202. In the function expansion mode 202, in contrast to the above-described expansion cancellation mode 201, all conditions can be set and have various setting screen areas. For example, it has a purpose setting screen area 400 in which the acceleration voltage and pod intensity of the electron optical system can be set with fine numerical values.

  In addition, a screen for adjusting the alignment of the electron beam and a button 401 for opening the screen are provided. It also has a detector switching function button 402. Furthermore, it is possible to display multiple signals at the same time. In addition to observing on one screen, different detectors can be displayed on two or four screens at the same time, allowing observation while comparing images and synthesizing signals. It is.

  Further, regarding the sample stage 10, not only the X axis and Y axis but also the R axis, Z axis, and T axis can be arbitrarily controlled, and the image shift can also be individually controlled. It is also possible to move by directly inputting coordinate values.

  Regarding the display mode change area 304, a total of 17 types or more of scan speeds such as Rapid 1-2, Fast 1-2, CSS 1-5, Slow 1-5, Reduce 1-3 are applied to the illustrated four buttons. Assigned and used.

  FIG. 5 is an operation flowchart in the case of switching extension cancellation / function expansion in this embodiment. Either the extension cancellation mode 201 or the function extension mode 202 is initialized at the time of login. Further, the mode can be switched by a switching button 300 shown in FIG. 3 or FIG. General users including beginners switch to the function expansion mode 202 by pressing the switch button 300 when more advanced observation is necessary while continuing the observation in the expansion cancellation mode 201.

  A table for specifying whether the extension cancellation mode 201 or the function expansion mode 202 is specified for each user (or password) is registered in the memory 18 in advance. When a user name or password is input from the input device 17 of the charged particle beam apparatus, the mode is automatically set. Note that a screen for selecting the extension cancellation mode 201 or the function extension mode 202 may be displayed after login, and may be selected by the user.

  When observation is started, it is determined whether or not a sample is set (step 501). If the sample is not set, the sample is set by the sample setting sequence (step 502). Thereafter, mode determination is performed (step 503).

  If the extended cancellation mode 201 is set, the observation purpose is set (step 504), and the observation conditions are automatically set (step 505). Then, the sample image is observed in the extension cancellation mode 201 (step 506). If the observation purpose is changed in step 506, the process returns to step 504.

  In step 506, when the switching button 300 is pressed and the function expansion mode 202 is selected (step 509), the function expansion mode 202 is switched to and the specimen image is observed in the function expansion mode 202 (step 507).

  When the extended release mode 201 is switched to the extended function mode 202, the extended function mode 202 can reproduce all the observation conditions in the extended release mode 201 because no function is restricted. Therefore, it is possible to smoothly shift from the observation in the extended cancellation mode 201 to the advanced observation in the function expansion mode 202 with reference to the state observed in the extended cancellation mode 201.

  As described above, when the mode is switched to the function expansion mode 202 or when it is determined as the function expansion mode 202 in the mode determination (step 503), the sample image is observed in the function expansion mode 202. In the case of the function expansion mode 202, when the user presses the switching button 300, the transition process to the expansion cancellation mode 201 starts.

  When the extension cancellation mode 201 is selected by the switching button 300, if a special sample holder is set according to the currently set holder, the process proceeds to the sample setting sequence 502, the sample is reset, and the normal sample holder is If set, the process proceeds directly to mode determination 503. Then, the process proceeds to the extended cancellation mode 201.

  When shifting to the extension cancellation mode 201 during observation in the function expansion mode 202, all the observation conditions such as a function restricted in the extension cancellation mode 201 or exceeding the limit range of the set value are set. It may not be possible to reproduce.

  Therefore, after the extension cancel button 300 is pressed, the process proceeds from step 503 to step 504, where an observation purpose setting screen is displayed, and the user is again required to set the observation purpose.

  As a result, the observation conditions that can be reproduced in the extended cancellation mode 201 are reset. In addition, when a special holder is set so that the driving range of the sample stage 10 is greatly limited, there is a possibility that mode transition cannot be performed, for example, the range of the stage limited in the extension cancellation mode 201 is exceeded. is there. Therefore, in order to reset the sample, the process proceeds to the sample setting sequence 502, the sample setting screen is displayed, and the sample is reset.

  At this time, since the observation condition may change greatly, the electron beam application may be automatically turned off in the sense of resetting the observation. In addition, in order to prevent the observation condition from being changed by pressing the extension cancellation button 300 by mistake, a confirmation message may be displayed to confirm the user. Further, login management of a user may be performed by an application, and the transition to the function expansion mode may be prohibited depending on the user, and approval by a password or the like may be performed.

  FIG. 8 is a diagram illustrating a screen 900 for setting a sample according to the present embodiment. In FIG. 8, sample settings are “selection of sample stage”, “adjustment of sample height”, “drawing of sample stage”, “confirmation of sample height / insertion of sample stage”, “evacuation”, etc. You will be guided through a wizard step by step. In particular, in the selection state of the extension cancellation mode 201, it is necessary to prevent a sample stage that cannot be used in the extension cancellation mode 201 from being set in the “selection of sample stage” 901.

  Normally, the sample stage is selected by selecting the sample stage to be used from the displayed sample stage selection list 902, but the items 903 that cannot be used in the extended release mode 201 are hidden from this list and are set erroneously. It prevents that. At this time, the full size of the selected sample stage is displayed on the display area 904 to the user so that it can be compared with the actual product, thereby preventing erroneous setting.

  Here, the observation purpose change screen 600 in the extended cancellation mode 201 shown in FIG. 6 will be described. The observation purpose setting screen 600 is displayed when the observation purpose change button 302 in FIG. 3 is pressed. The screen is also displayed when the extension release button 300 in FIG. 4 is pressed to shift from the function extension mode 202 to the extension release mode 201.

  The observation purpose change screen 600 displays a plurality of observation purposes 601 that match the user's purpose. The observation purpose 601 is easy to understand even for a novice user, and the feature may be expressed by a sentence, an actual image, or a radar chart.

  When the user uniquely selects the observation purpose 601 on the observation purpose setting screen 600 shown in FIG. 6, an appropriate observation condition according to the purpose is automatically set. The automatically set observation conditions are tabulated as shown in FIG. 7, and are stored as an observation condition file in the memory 18 or the storage device 16 connected to the computer 14 in association with the selected observation purpose 601. Yes.

  A record 700 in the table shown in FIG. 7 includes a detector, an acceleration voltage value, a spot intensity, an alignment value, a focus value, a stigma value, a scan mode (display mode), and a stage XYZTR coordinate value. Automatically set according to the purpose.

  Explaining the purpose of high-vacuum observation, the top observation purpose “standard observation” is the default observation purpose, and is the basis of SEM observation. The observation conditions are obtained. In other words, “standard observation” is a condition that allows a beginner who does not know which condition is appropriate for a conductive sample to easily obtain satisfactory data. By using such observation conditions, it is expected that beginners will be able to take pictures easily, and will be motivated to use the apparatus, and further improve their will. The observation conditions that can provide a sharp concavo-convex structure on the surface of the sample even at high magnifications are conditions that provide high resolution. By using such observation conditions, the user can acquire an image at a high magnification, for example, 100,000 times relatively easily without being aware of the magnification. Specific parameter settings include, for example, an acceleration voltage of 15 kV, a sample stage height Z (working distance) of 5 mm, a sample stage tilt T of 0 degrees, a condenser lens with strong excitation, and a small aperture diameter of the objective movable aperture. The degree of vacuum is high vacuum, and the detection signal is secondary electrons. Since secondary electrons have a weak energy of several eV and can be generated only from about 10 nm of the sample surface, using secondary electrons can obtain an image that more reflects the uneven structure of the surface. Theoretically, the resolution becomes higher as the acceleration voltage is higher, and the SEM can usually be observed up to an acceleration voltage of 30 kV. However, if the acceleration voltage is too high, the electron beam from the primary electron beam 2 is generated inside the sample if the acceleration voltage is too high. The depth to invade becomes deeper. As a result, internal information is mixed with secondary electrons emitted by electron beam irradiation, making it difficult to obtain an image reflecting the uneven structure of the sample surface.

  The second observation purpose “observation that emphasizes the surface structure” from the top is an observation condition in which fine unevenness on the sample surface, which is difficult to observe by “standard observation”, can be displayed more three-dimensionally. Specific parameter settings include, for example, an acceleration voltage of 5 kV, a sample stage height Z (working distance) of 5 mm, a sample stage tilt T of 0 degrees, a condenser lens with strong excitation, and a small aperture diameter of the objective movable aperture. The degree of vacuum is high vacuum, and the detection signal is secondary electrons. The difference from the “standard observation” is that the acceleration voltage is changed from 15 kV to 5 kV. When the acceleration voltage is changed from 15 kV to 5 kV, the resolution is lowered, but the depth at which the electron beam from the primary electron beam 4 penetrates into the sample becomes shallow, so that an image in which the uneven structure on the sample surface is further emphasized is obtained. In addition, for the purpose of this observation, a method that makes it difficult to charge up is set. For example, an integration for forming an image by superimposing images taken in a fast scan is used.

  The third observation purpose from the top, “Observation that emphasizes the surface structure and material distribution”, is lower in resolution than the image obtained by “Observation that emphasizes the material distribution”, but displays the difference in material with contrast of light and dark. It is an observation condition that can be. Furthermore, “observation that emphasizes the surface structure and material distribution” is an observation condition in which fine irregularities on the sample surface can be observed more stereoscopically. Specific parameter setting values are, for example, an acceleration voltage of 5 kV, a sample stage height Z (working distance) of 5 mm, a sample stage tilt T of 0 degrees, a condenser lens with medium excitation, and a small aperture diameter of the objective movable diaphragm. The degree of vacuum is high vacuum, and the detection signal is backscattered electrons. The difference from “standard observation” is that the acceleration voltage is changed from 15 kV to 5 kV, the detection signal is backscattered electrons, and the excitation of the condenser lens is slightly weakened. When the acceleration voltage is changed from 15 kV to 5 kV, the resolution is lowered, but an image in which the uneven structure on the sample surface is more emphasized is obtained.

  The fourth observation purpose “observation that emphasizes material distribution” from the top is an observation condition in which a difference in material can be displayed with contrast of light and dark in a sample composed of different materials such as a composite material and foreign matter. Specific parameter setting values include, for example, an acceleration voltage of 15 kV, a sample stage height Z (working distance) of 5 mm, a sample stage tilt T of 0 degree, a condenser lens with medium excitation, and a small aperture diameter of the objective movable diaphragm. The degree of vacuum is high vacuum, and the detection signal is backscattered electrons. The difference from “standard observation” is that the detection signal is backscattered electrons, and the excitation current of the condenser lens is slightly weakened to increase the irradiation current. A feature of backscattered electrons is that the difference in materials can be expressed by a contrast difference. The heavier the material, the higher the reflectivity and the more signals are generated, resulting in a brighter image and the difference in material can be displayed with a contrast of light and dark. On the other hand, since the backscattered electrons have substantially the same energy as the incident electrons, backscattered electrons generated inside the sample are also detected. For this reason, internal information is mixed as compared with secondary electrons, and the resolution is deteriorated.

The bottom observation purpose “observation for analyzing element” is an observation condition for performing EDX analysis by increasing the thickness of the primary electron beam 4 and increasing the irradiation current. In “observation for analyzing elements”, the difference in materials can be displayed with contrast of light and dark. Elemental analysis can be performed by searching for a location for EDX analysis under these observation conditions, adjusting the focus, etc., and then performing an operation on the EDX apparatus side. Specific parameter settings include, for example, an acceleration voltage of 15 kV, a sample stage height Z (working distance) of 10 mm, a sample stage tilt T of 0 degrees, a condenser lens with weak excitation, and a small aperture diameter of the objective movable aperture. The degree of vacuum is high vacuum, and the detection signal is backscattered electrons. The difference from “standard observation” is that the irradiation current is increased by making the excitation of the condenser lens very weak in order to increase the count of X-rays generated from the sample. In addition, since elemental analysis reflects the difference in materials, backscattered electrons are used as detection signals, and the working distance is changed to 10 mm in order to efficiently capture X-rays generated from the sample. However, when the backscattered electron detector is not mounted, secondary electrons may be used as the detection signal.

  At this time, a service person can adjust a focus value, a stigma value, and an alignment value, which may have different optimum values due to a difference in models caused by maintenance such as chip replacement and baking. Moreover, it is possible to replace the value with a value previously adjusted by the user using the automatic calibration function, not limited to the service person. The XY coordinates of the sample stage are not only automatically set, but the current coordinate values may be maintained so that the observation field of view can be continuously observed as long as it is within a settable range.

  It should be noted that an observation purpose for tilting the sample stage, such as analysis of the crystal orientation and crystal structure of the sample using an EBSD (Electron Backscattered Diffraction) detector, is provided, and by selecting the observation purpose, the sample stage becomes a predetermined one. The angle may be inclined.

  According to the present embodiment, it is possible to perform observation without being aware of complicated observation condition settings including the height and inclination of the sample, and even if it is a charged particle beam apparatus that can be used easily even by beginners, it is necessary to perform advanced observation. In addition, it is possible to realize a charged particle beam apparatus that can set fine observation conditions, and even a beginner can easily observe by an intuitive operation.

  Moreover, even when it is desired to perform advanced observation that requires finer settings, advanced observation can be performed seamlessly.

  Although the present embodiment has been described above, the present invention is not limited to the above-described embodiment, and includes various modifications. For example, regarding the field of view movement, the actual movement of the sample stage in the XY axis direction and the movement by image shift that moves the field of view by moving the charged particle beam without actually moving the sample stage, Although a method has been described in which the user is not aware of the difference between the image shift and the actual stage movement, only the image shift may be performed as long as the apparatus does not have hardware for movement in the stage XY axis direction. On the other hand, if the apparatus has a small image shift amount and is frequently used at a low magnification, the convenience of the image shift is small, so that only the movement by the actual stage may be performed.

  Moreover, although what was called single SEM was demonstrated in the said Example, it is good also as what is called FIB-SEM which combined SEM and the FIB apparatus. In the FIB-SEM apparatus in which the FIB apparatus is arranged vertically and the SEM is inclined, the sample stage is inclined so that the mounting surface is perpendicular to the optical axis of the SEM, and the working distance with respect to the SEM is always constant. The sample stage is controlled so that In order to perform processing or observation by the FIB apparatus, the sample stage may be switched horizontally by pressing a predetermined button.

  In general, movement of a minute observation visual field at a high magnification may cause a deviation from the visual field position intended by the user due to the influence of backlash, drift, and the like in the case of visual field movement due to stage movement. Therefore, if the visual field movement distance designated by the user is within the image shift movement range, it is desirable to move the visual field with an image shift having no influence as described above.

  However, the distance that the visual field can be moved by the image shift is very small with respect to the stage movement, and when it is desired to further shift the image in the image shifted direction, the distance can be moved only by subtracting the already moved amount. For this reason, in order to maximize the movable distance by the image shift, the image shift is as possible as the midpoint position of the movable range. It is desirable to be in the center.

  Therefore, a method of automatically setting the image shift to the midpoint position (midpoint reset) will be described. Hereinafter, the difference from the first embodiment will be mainly described.

  In order to set the image shift to the midpoint position, it is necessary to correct the amount of visual field shift caused by the image shift by moving the stage. If the visual field movement method is such that the target position to be moved is specified by clicking or dragging, the movement distance is known in advance, so the image shift is reset to the midpoint position and offset with respect to the reset movement amount. Move the stage to the position. That is, when the movement amount of the visual field is commanded, the stage may be moved to the target position after the image shift to the midpoint position of the movement amount.

  However, in the case of visual field movement using a joystick or trackball that specifies the direction and speed to move and moves for an arbitrary time, the distance to move in advance is indefinite, so the image shift amount is offset and the stage It cannot be moved, and image shift reset cannot be performed.

  However, as described above, the amount of visual field movement due to image shift is very small compared to the amount of movement due to stage movement, and there are conditions that prevent visual field movement due to image shift from being recognized on the screen. For this reason, it is conceivable that the image shift is automatically reset when these conditions are met, that is, when visual field movement cannot be recognized on the screen.

  For example, if the movement width by the image shift is smaller than the width on the sample corresponding to one pixel width on the display, the user cannot recognize the visual field movement by the image shift. Since this condition is satisfied during low-magnification observation, there is no problem even if the image shift is reset. However, if the image shift is automatically reset when the field of view is not moved at all and only the magnification is switched, the field of view is not intended when observing from high magnification to low magnification (automatic image shift reset) to high magnification. May change.

  For this reason, it is desirable to reset the image shift by using this as a trigger when the user instructs to move the XY visual field during low magnification observation. The reset determination condition at this time does not have to be limited to the low-magnification observation in which the visual field movement due to the image shift is a distance of less than one pixel.

  The image shift reset method when the amount of visual field movement is known in advance has been explained. However, when moving the stage after resetting the image shift, or when resetting the image shift after moving the stage, sudden visual field movement by image shift reset is performed. Therefore, the current observation position may be lost.

  In contrast, during the period from the start of the stage movement to the completion of the stage movement, the image shift reset is divided and executed little by little according to the stage movement. By completing the step, it is possible to prevent the observation position from being lost due to sudden visual field movement.

  At this time, the image shift reset process performed by dividing in accordance with the stage movement may be a fixed value as long as the number of divisions is such that the field of view does not move suddenly. However, if the appearance changes greatly depending on conditions such as the observation field update period and stage movement time, the number of divisions may be variable. For example, in order not to lose sight of the visual field position, it is preferable to match the observation image update cycle. If the observation image update cycle is RefreshTime and the stage moving time is StageMoveTime, the number of divisions in the image shift midpoint processing is StageMoveTime / RefreshTime. Therefore, the image shift movement amount performed once at the observation visual field update timing is the movement amount of the entire image shift midpoint processing / (StageMoveTime / RefreshTime).

  In the first embodiment, it is shown that the user can freely switch the mode by pressing the function expansion button or the expansion cancellation button 300 in FIG.

  However, beginners may not be able to grasp that the observation purpose cannot be achieved unless the mode is switched.

  Therefore, it is desirable to check whether there is a problem with an image currently being observed or stored in a wizard format, and if there is a problem, there is a function that leads to problem solving. Hereinafter, a charged particle beam apparatus having an application assist function that prompts the user to switch to the function expansion mode 202 to solve the problem will be described focusing on differences from the first or second embodiment.

  FIG. 9 is a diagram showing a screen of the application assist function 800. In the application assist function, when the user saves an image, the user inquires whether there is dissatisfaction with the image, and when the user replies that the image is dissatisfied, the screen of FIG. 9 is activated.

  Alternatively, the screen of FIG. 9 is also activated when the user is dissatisfied with the currently observed image and directly presses the application assist button 801.

  On the application assist screen 800, buttons such as “image is blurred”, “no stereoscopic effect”, “other” are selected according to the current observation image and the state of the observation image when the image is saved When it is done, it displays a screen that guides its purpose and solution. At this time, an actual characteristic image (for example, a blurred image) is displayed above the buttons such as “blurred image” and “no three-dimensional effect” to facilitate comparison with the current observed image. Also good.

  Then, the purpose and solution are displayed according to the state of the image. When the solution button 802 is displayed while the solution is being displayed, the function expansion mode 202 can be entered.

  With the configuration described above, the user can easily understand that the problem can be solved by changing the mode, and even a beginner can effectively use the charged particle beam apparatus.

  DESCRIPTION OF SYMBOLS 1 ... Electron gun, 2 ... Anode, 3 ... Condenser lens, 4 ... Primary electron beam, 5 ... Deflector, 6 ... Objective lens, 7 ... Secondary electron, 8 ... Sample, 9 ... Sample stand, 10 ... Sample stage, 11 ... Secondary electron detector, 12 ... Amplifier, 13 ... Main control unit, 14 ... Computer unit 15 ... Image display device 16 ... Storage device 17 ... Input device 18 ... Memory 19 ... Stigma lens 20 ... Operation program 201 ... Extension release mode 202 ... Function expansion mode, 203A, 203B ... Command transmission / reception unit, 204 ... Digital-analog conversion circuit (DAC), 205 ... Driver, 206 ... Operation button, 207 ... Analog − Digital conversion circuit (ADC), 208: Image data generation unit, 209: Display control unit, 210: Image display unit, 211: Complex function button, 212: Observation condition table, 213・ ・ ・ Switch control unit, 214 ... Function button suitable for purpose, 215 ... Optimum control unit for each purpose, 300 ... Extension release / function expansion switch button, 301 ... Observation start / stop button, 302 ... Observation purpose change button, 303 ... Field of view setting operation area, 304 ... Display mode change area, 305 ... Image save button, 306 ... Auto image adjustment area, 400 ... Acceleration voltage・ Spod intensity setting screen 401... Beam adjustment button 402. Detector switching function 600. Observation purpose setting screen 01 ... Observation purpose, 700 ... Record, 800 ... Application assist function, 801 ... Application assist button, 802 ... Resolution button, 900 ... Fee setting screen, 901 ... Sample setting Progress of the wizard (selection of the sample stage), 902... The selection table of the charge stage, 903... The sample stage that cannot be set in the tension release mode, and 904.

Claims (18)

A charged particle source that emits a charged particle beam;
A charged particle optical system that irradiates the sample with the charged particle beam; and
A detector for detecting signal electrons generated from the sample;
A sample stage that holds the sample and is driven by the X-axis, Y-axis, Z-axis, T-axis, and R-axis;
An image display unit for displaying a sample image formed from the signal electrons;
A controller that controls the charged particle source, the charged particle optical system, the detector, the sample stage, and the image display unit;
With
The control unit maintains the height of the sample stage at a predetermined level, maintains the tilt angle of the sample stage horizontally, and has an operation area in which the visual field of the sample image can be moved up and down, left and right, and in the rotation direction. An extension cancellation mode to be displayed on the image display unit, an operation area in which the height and tilt angle of the sample stage can be operated, and an operation area in which the field of view of the sample image can be moved up and down, left and right and in the rotation direction are displayed on the image display unit. Has a function expansion mode,
The charged particle beam apparatus characterized by displaying the operation area | region which switches the said expansion cancellation | release mode and the said function expansion mode on the said image display part. The charged particle beam apparatus according to claim 1,
The control unit maintains the R axis of the sample stage constant in the extension release mode, and when an instruction to move the visual field of the sample image in the rotation direction is input from the operation region, the sample rotation is performed by raster rotation. A charged particle beam apparatus characterized by rotating a field of view of an image. In the charged particle beam device according to claim 1 or 2,
The control unit displays an observation condition selection region in which a predetermined observation condition can be selected in the extension cancellation mode on the screen display unit, and controls the height of the sample stage according to the selected observation condition. A charged particle beam device. In the charged particle beam device according to any one of claims 1 to 3,
The charged particle beam apparatus, wherein the control unit takes over the observation conditions when switching from the extended cancellation mode to the functional extended mode. In the charged particle beam device according to any one of claims 1 to 4,
When switching from the function expansion mode to the expansion cancellation mode, the control unit displays an observation condition selection area in which a predetermined observation condition can be selected on the screen display unit, and resets the selected observation condition. A charged particle beam apparatus characterized by switching to an extended release mode. In the charged particle beam device according to any one of claims 1 to 4,
When the control unit switches from the function expansion mode to the expansion cancellation mode, the control unit displays a sample holder selection region for setting a sample holder held on the sample stage on the image display unit. Wire device. In the charged particle beam device according to any one of claims 1 to 6,
When an instruction to move the visual field of the sample image up, down, left, or right is input from the operation area, the control unit controls the visual axis of the sample image by controlling the X axis and the Y axis of the sample stage and image shifting. A charged particle beam apparatus characterized in that the image shift is reset when the sample is moved vertically and horizontally and the magnification of the sample is lower than a predetermined magnification. In the charged particle beam device according to any one of claims 1 to 7,
When an instruction to move the visual field of the sample image up, down, left, or right is input from the operation area, the control unit controls the visual axis of the sample image by controlling the X axis and the Y axis of the sample stage and image shifting. A charged particle beam apparatus characterized in that it is moved up and down and left and right, and the image shift is reset a plurality of times in accordance with the movement of the sample stage. In the charged particle beam device according to any one of claims 1 to 8,
The charged particle beam device, wherein the control unit switches between the extended cancellation mode and the functional extended mode according to an input user name or password. A charged particle source that emits a charged particle beam;
A charged particle optical system that irradiates the sample with the charged particle beam; and
A detector for detecting signal electrons generated from the sample;
A sample stage that holds the sample and is capable of three-dimensional movement, tilting and rotation;
An image display unit for displaying a sample image formed from the signal electrons;
A controller that controls the charged particle source, the charged particle optical system, the detector, the sample stage, and the image display unit;
With
The control unit arbitrarily controls the interval between the end of the charged particle optical system and the sample stage and the extension release mode in which the sample stage tilt cannot be arbitrarily operated, and the three-dimensional movement, tilt and rotation of the sample stage. It has a function expansion mode that can be operated,
A charged particle beam apparatus capable of operating switching between the extension cancellation mode and the function extension mode. The charged particle beam device according to claim 10,
The controller rotates the field of view of the sample image by raster rotation when an instruction to move the field of view of the sample image in the rotation direction is input without rotating the sample stage in the extension cancellation mode. Characterized charged particle beam device. In the charged particle beam device according to claim 10 or 11,
The control unit displays an observation condition selection region in which a predetermined observation condition can be selected in the extension cancellation mode on the screen display unit, and controls the height of the sample stage according to the selected observation condition. A charged particle beam device. In the charged particle beam device according to any one of claims 10 to 12,
The charged particle beam apparatus, wherein the control unit takes over the observation conditions when switching from the extended cancellation mode to the functional extended mode. In the charged particle beam device according to any one of claims 10 to 13,
When switching from the function expansion mode to the expansion cancellation mode, the control unit displays an observation condition selection area in which a predetermined observation condition can be selected on the screen display unit, and resets the selected observation condition. A charged particle beam apparatus characterized by switching to an extended release mode. In the charged particle beam device according to any one of claims 10 to 13,
When the control unit switches from the function expansion mode to the expansion cancellation mode, the control unit displays a sample holder selection region for setting a sample holder held on the sample stage on the image display unit. Wire device. In the charged particle beam device according to any one of claims 10 to 15,
When an instruction to move the visual field of the sample image up, down, left, or right is input from the operation area, the control unit controls the visual axis of the sample image by controlling the X axis and the Y axis of the sample stage and image shifting. A charged particle beam apparatus characterized in that the image shift is reset when the sample is moved vertically and horizontally and the magnification of the sample is lower than a predetermined magnification. In the charged particle beam device according to any one of claims 10 to 16,
When an instruction to move the visual field of the sample image up, down, left, or right is input from the operation area, the control unit controls the visual axis of the sample image by controlling the X axis and the Y axis of the sample stage and image shifting. A charged particle beam apparatus characterized in that it is moved up and down and left and right, and the image shift is reset a plurality of times in accordance with the movement of the sample stage. In the charged particle beam device according to any one of claims 10 to 17,
The charged particle beam device, wherein the control unit switches between the extended cancellation mode and the functional extended mode according to an input user name or password.

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