JP2015036731A - Intermediate base material film for touch panel, lamination film for touch panel, and touch panel sensor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an intermediate base material film for a touch panel that can suppress the visual recognition of interference fringes and reduce cloudiness feeling.SOLUTION: There is provided a base material film 11 for supporting a patterned conductive layer, where a first transparent layer 14 is provided on a transparent base material 13 by being laminated on one surface 13A of the transparent base material 13; the first transparent layer 14 includes a first concavo-convex surface 14A on the opposite side of the transparent base material 13; while the first concavo-convex surface 14A of the first transparent layer is irradiated with parallel light advancing in a direction inclined by 10° with respect to the normal direction of the intermediate base material film, in an angle distribution of reflection light intensity measured in a plane including both the normal direction and the advancing direction of the parallel light, a value obtained by subtracting a width of an angle area where a reflection light intensity of half or more the maximum reflection light intensity is measured from a width of an angle area where a reflection light intensity of one-hundredth the maximum reflection light intensity is measured is 0.7° or more and 1.4° or less.

Description

  The present invention relates to an intermediate substrate film for a touch panel, a laminated film for a touch panel, and a touch panel sensor.

  Today, touch panel devices are widely used as input means. The touch panel device includes a touch panel sensor, a control circuit that detects a contact position on the touch panel sensor, wiring, and FPC (flexible print base material). In many cases, touch panel devices are used as input means for various devices (for example, ticket machines, ATM devices, mobile phones, game machines) in which display devices such as liquid crystal displays and plasma displays are incorporated. In such a device, the touch panel sensor is disposed on the display surface of the display device, thereby enabling extremely direct input to the display device.

  Touch panel devices are classified into various types based on the principle of detecting a contact position (approach position) on a touch panel sensor. In recent years, a capacitive touch panel device has attracted attention because it is optically bright, has a design property, has a simple structure, and has excellent functionality. There are a surface type and a projection type in the electrostatic capacity method, but the projection type is attracting attention because it is suitable for multi-touch recognition (multi-point recognition).

  The touch panel sensor used in the projected capacitive touch panel includes a transparent base material, a hard coat layer provided on the transparent base material, and a transparent conductive layer provided on the hard coat layer. There are some (see, for example, Patent Document 1).

JP 2011-98563 A

  However, in such a touch panel sensor, due to the difference in refractive index between the transparent substrate and the hard coat layer, the light reflected at the interface between the transparent substrate and the hard coat layer and the surface of the hard coat layer or the hard coat layer There is a problem in that the light reflected at the interface between the coat layer and the layer provided on the hard coat layer interferes to generate an iridescent uneven pattern called interference fringes. This problem appears remarkably when a polyethylene terephthalate substrate is used as the transparent substrate.

  Here, it may be possible to make the interference fringes invisible by forming irregularities with the same size as the conventional anti-glare film on the surface of the hard coat layer. When the unevenness is formed, the surface haze value is increased, and there is a possibility that a cloudiness may occur. In addition, when a high refractive index layer or a low refractive index layer is formed as a refractive index adjusting layer for making the transparent conductive layer invisible on the hard coat layer, the cloudiness on the surface of the hard coat layer is eliminated. The film thickness of the high refractive index layer and the low refractive index layer is very thin, so the irregularities on the surface of the hard coat layer affect the surface of the high refractive index layer and the low refractive index layer, and the surface of the low refractive index layer There is a risk of cloudiness.

  The present invention has been made to solve the above problems. That is, it aims at providing the intermediate base film for touch panels, the laminated film for touch panels, and a touch panel sensor which can suppress that an interference fringe is visually recognized and can reduce a cloudiness feeling.

  According to one aspect of the present invention, there is provided an intermediate substrate film for a touch panel for supporting a patterned conductive layer, wherein a first transparent layer is laminated on one surface of a transparent substrate, 1 transparent layer has a first concavo-convex surface on the side opposite to the transparent substrate side, and transmits parallel light traveling in a direction inclined by 10 ° from the normal direction of the intermediate substrate film to the first transparent layer. In an angular distribution of reflected light intensity measured in a plane including both the normal direction and the traveling direction of the parallel light in a state where the first uneven surface is irradiated, 1/100 of the maximum reflected light intensity. The value obtained by subtracting the width of the angle region in which the reflected light intensity of 1/2 or more of the maximum reflected light intensity is measured from the width of the angle region in which the reflected light intensity is measured is 0.7 ° or more and 1.4 °. An intermediate substrate film is provided, characterized in that:

  The intermediate substrate film further includes a second transparent layer laminated on the other surface of the transparent substrate, and the second transparent layer has a second uneven surface on the side opposite to the transparent substrate side. You may have.

  According to another aspect of the present invention, there is provided an intermediate substrate film for a touch panel for supporting a patterned conductive layer, wherein a first functional layer is laminated on one surface of a transparent substrate, 1 functional layer has a first concavo-convex surface forming one surface of the intermediate base film, and the parallel light traveling in the direction inclined by 10 ° from the normal direction of the intermediate base film is the first function. In an angular distribution of reflected light intensity measured in a plane including both the normal direction and the traveling direction of the parallel light in a state where the first uneven surface of the layer is irradiated, the highest reflected light intensity is 1 The value obtained by subtracting the width of the angle region where the reflected light intensity of ½ or more of the maximum reflected light intensity is measured from the width of the angle region where the reflected light intensity of 100/100 or more is measured is 0.7 ° or more. An intermediate substrate film is provided, which is characterized by being 4 ° or less.

  The intermediate base film further includes a second functional layer laminated on the other surface of the transparent base, and the second functional layer forms the other surface of the intermediate base film. It may have a surface.

  According to another aspect of the present invention, the intermediate base film and the first conductive layer supported and patterned on the surface of the intermediate base film on the first transparent layer side are laminated. A laminated film for a touch panel is provided.

  According to another aspect of the present invention, the intermediate base film, the first conductive layer supported and patterned on the surface of the intermediate base film on the first transparent layer side, and the intermediate group A laminated film for a touch panel is provided in which a second conductive layer supported and patterned on the surface of the material film on the second transparent layer side is laminated.

  According to the other aspect of this invention, a touch panel sensor provided with said laminated | multilayer film is provided.

  According to the intermediate substrate film for a touch panel, the laminated film for a touch panel, and the touch panel sensor of one aspect of the present invention, parallel light traveling in a direction inclined by 10 ° from the normal direction of the optical film is emitted from the first transparent layer. In an angular distribution of reflected light intensity measured in a plane including both the normal direction and the traveling direction of the parallel light in a state where the first uneven surface is irradiated, 1/100 or more of the maximum reflected light intensity The value obtained by subtracting the width of the angle region in which the reflected light intensity of 1/2 or more of the maximum reflected light intensity is measured from the width of the angle region in which the reflected light intensity is measured is 0.7 ° to 1.4 ° Therefore, it can suppress that an interference fringe is visually recognized, and can reduce a cloudiness feeling.

It is a schematic block diagram of the intermediate base film and laminated film which concern on 1st Embodiment. It is a partial top view of the laminated film which concerns on 1st Embodiment. It is the schematic diagram which showed a mode that the angle distribution of the reflected light intensity in the intermediate | middle base film which concerns on 1st Embodiment was measured with a goniophotometer. It is a schematic block diagram of the other laminated film which concerns on 1st Embodiment. It is a partial top view of the other laminated film which concerns on 1st Embodiment. FIG. 6 is a plan view of a part of another first conductive layer according to the first embodiment. FIG. 6 is a plan view of a part of another first conductive layer according to the first embodiment. 1 is a schematic configuration diagram of a touch panel sensor according to a first embodiment. It is a schematic block diagram of the other touch panel sensor which concerns on 1st Embodiment. It is a schematic block diagram of the intermediate | middle base film and laminated | multilayer film which concern on 2nd Embodiment. It is a schematic block diagram of the touchscreen sensor which concerns on 2nd Embodiment. It is a graph showing angle distribution of the reflected light intensity in the intermediate base film concerning an example and a comparative example.

[First Embodiment]
Hereinafter, the intermediate base film and the laminated film according to the first embodiment of the present invention will be described with reference to the drawings. In the present specification, terms such as “sheet”, “film”, and “plate” are not distinguished from each other only based on the difference in designation. Therefore, for example, “film” is a concept including a member that can also be called a sheet or a plate. As a specific example, the “laminate film” includes members called “laminate sheet”, “laminate plate” and the like. In the present specification, the “weight average molecular weight” is a value obtained by dissolving in a solvent such as tetrahydrofuran (THF) and converting to polystyrene by a conventionally known gel permeation chromatography (GPC) method. FIG. 1 is a schematic configuration diagram of an intermediate substrate film and a laminated film according to this embodiment, FIG. 2 is a plan view of a part of the laminated film according to this embodiment, and FIG. 3 is an intermediate diagram according to this embodiment. It is the schematic diagram which showed a mode that the angle distribution of the reflected light intensity in a base film was measured with a goniophotometer. FIG. 4 is a schematic configuration diagram of another laminated film according to this embodiment, and FIG. 5 is a plan view of a part of another laminated film according to this embodiment. 6 and 7 are plan views of a part of another first conductive layer according to this embodiment.

[Intermediate base film and laminated film for touch panel]
As shown in FIG. 1, the laminated film 10 includes an intermediate base film 11 and a first conductive layer 12 supported by the intermediate base film 11. The laminated film and the intermediate base film are used by being incorporated in a touch panel. The term “intermediate base film” means a base film used inside the touch panel, not the outermost surface of the touch panel.

  The intermediate base film 11 is for supporting the first conductive layer 12. The intermediate base film may directly support the conductive layer, but may indirectly support the conductive layer, for example, via another layer. The intermediate substrate film 11 includes a transparent substrate 13, a first transparent layer 14 provided on one surface 13 </ b> A of the transparent substrate 13, and a first high layer provided on the first transparent layer 14. A refractive index layer 15, a first low refractive index layer 16 provided on the first high refractive index layer 15, and a second transparent layer 17 provided on the other surface 13B of the transparent substrate 13. It has. The intermediate substrate film only needs to include the transparent substrate and the first transparent layer, and does not include the first high refractive index layer, the first low refractive index layer, and the second transparent layer. Good. Moreover, the intermediate base film may include a second high refractive index layer or a second low refractive index layer on the second transparent layer. Specifically, as the intermediate substrate film, in addition to the intermediate substrate film 11 shown in FIG. 1, only the first transparent layer is provided on one surface of the transparent substrate, and the other transparent substrate is provided. An intermediate substrate film in which the second transparent layer is not provided on the surface of the transparent substrate, only the first transparent layer is provided on one surface of the transparent substrate, and the second on the other surface of the transparent substrate. The intermediate substrate film provided with only the transparent layer, the first transparent layer and the first high refractive index layer provided in this order on one surface of the transparent substrate, and the other surface of the transparent substrate An intermediate substrate film not provided with a second transparent layer thereon, a first transparent layer and a first high refractive index layer provided in this order on one surface of the transparent substrate, and a transparent substrate An intermediate substrate film provided with a second transparent layer on the other surface of the first transparent layer, a first transparent layer and a first high layer on one surface of the transparent substrate. One of the intermediate substrate film and the transparent substrate in which the folding layers are provided in this order, and the second transparent layer and the second high refractive index layer are provided in this order on the other surface of the transparent substrate. The first transparent layer, the first high refractive index layer, and the first low refractive index layer are provided in this order on the surface of the transparent substrate, and the second transparent layer is provided on the other surface of the transparent substrate. The intermediate substrate film, the first transparent layer, the first high-refractive index layer, and the first low-refractive index layer are provided in this order on one surface of the intermediate substrate film, the transparent substrate, and the transparent substrate An intermediate substrate film in which a second transparent layer and a second high refractive index layer are provided in this order on the other surface, and a first transparent layer and a first transparent layer on one surface of the transparent substrate. The high refractive index layer and the first low refractive index layer are provided in this order, and the second transparent layer, the second high refractive index layer, and the second low refractive index are provided on the other surface of the transparent substrate. Rate layer may be either intermediate base film provided in this order.

<Transparent substrate>
The transparent substrate 13 is not particularly limited as long as it has optical transparency. For example, a polyolefin substrate, a polycarbonate substrate, a polyacrylate substrate, a polyester substrate, an aromatic polyether ketone substrate, a polyether sulfone can be used. A base material, a polyamide base material, or a glass base material is mentioned.

  As a polyolefin base material, the base material which uses at least 1 sort (s), such as polyethylene, a polypropylene, a cyclic polyolefin base material, for example is mentioned. Examples of the cyclic polyolefin base material include those having a norbornene skeleton.

  Examples of the polycarbonate substrate include aromatic polycarbonate substrates based on bisphenols (bisphenol A and the like), aliphatic polycarbonate substrates such as diethylene glycol bisallyl carbonate, and the like.

  Examples of the polyacrylate substrate include poly (meth) methyl acrylate substrate, poly (meth) ethyl acrylate substrate, (meth) methyl acrylate- (meth) butyl acrylate copolymer substrate, and the like. It is done.

  As a polyester base material, the base material which uses at least 1 sort (s) of a polyethylene terephthalate (PET), a polypropylene terephthalate, a polybutylene terephthalate, and a polyethylene naphthalate (PEN) as an example is mentioned.

  Examples of the aromatic polyether ketone base material include a polyether ether ketone (PEEK) base material.

  The thickness of the transparent substrate 13 is not particularly limited, but can be 5 μm or more and 300 μm or less. The lower limit of the thickness of the transparent substrate 13 is preferably 10 μm or more and more preferably 50 μm or more from the viewpoint of handling properties. . The upper limit of the thickness of the transparent substrate 13 is preferably 200 m or less from the viewpoint of thinning.

  In order to improve the adhesion, the surface of the transparent substrate 13 may be preliminarily coated with a coating called an anchor agent or a primer in addition to physical treatment such as corona discharge treatment and oxidation treatment. Examples of the anchor agent and primer agent include polyurethane resin, polyester resin, polyvinyl chloride resin, polyvinyl acetate resin, vinyl chloride-vinyl acetate copolymer, acrylic resin, polyvinyl alcohol resin, polyvinyl acetal resin, ethylene A copolymer of ethylene and vinyl acetate or acrylic acid, a copolymer of ethylene and styrene and / or butadiene, a thermoplastic resin such as an olefin resin and / or a modified resin thereof, a polymer of a photopolymerizable compound, and It is possible to use at least one of thermosetting resins such as epoxy resins.

<First transparent layer>
The first transparent layer 14 has a first uneven surface 14A on the side opposite to the transparent base material 13 side. In the first transparent layer 14, as shown in FIG. 3, the parallel light traveling in the direction inclined by 10 ° from the normal direction N of the intermediate base film 11 is converted into the first uneven surface 14 </ b> A of the first transparent layer 14. In the angular distribution of the reflected light intensity measured in a plane including both the normal direction N and the parallel light traveling direction T, the reflected light intensity is 1/100 or more of the maximum reflected light intensity. A value obtained by subtracting the width of the angle range in which the reflected light intensity of ½ or more of the maximum reflected light intensity is subtracted from the width of the measured angle range is 0.7 ° or more and 1.4 ° or less ( Hereinafter, “the width of the angle region in which the reflected light intensity of 1/100 or more of the maximum reflected light intensity is measured” is referred to as “1/100 angle width”, and “reflected light intensity of 1/2 or more of the maximum reflected light intensity”. The width of the angle region in which is measured "is referred to as" 1/2 angle width "). The “normal direction of the base intermediate substrate film” refers to a normal direction of a surface that coincides with the plane direction when the target intermediate substrate film is viewed as a whole and globally. Further, “a plane including both the normal direction and the traveling direction of the parallel light” is not limited to a strict meaning and is interpreted including an error. “1/100 angle width” means from one angle at which the reflected light intensity of 1/100 of the maximum reflected light intensity is measured to the other angle at which the reflected light intensity of 1/100 of the maximum reflected light intensity is measured. Similarly, “½ angle width” means that the reflected light intensity that is ½ of the maximum reflected light intensity is measured from one angle at which the reflected light intensity that is ½ of the maximum reflected light intensity is measured. It means the angular width up to the other angle at which the intensity is measured. Note that the reflected light intensity of 1/100 or the reflected light intensity of 1/2 includes a value obtained by interpolation (linear interpolation).

  The lower limit of the value obtained by subtracting the width of 1/2 angle width from 1/100 angle width is preferably 0.8 ° or more, and more preferably 0.9 ° or more. Further, the upper limit of the value obtained by subtracting the width of the 1/2 angle width from the 1/100 angle width is preferably 1.3 ° or less, and more preferably 1.2 ° or less.

  The angular distribution of reflected light intensity can be measured with a known goniophotometer. As shown in FIG. 3, the goniophotometer 100 includes a light source 101 that irradiates parallel light and a detector 102. The goniophotometer 100 emits parallel light from the light source 101 to an intermediate substrate film (transparent substrate 13). Irradiation is performed toward the first uneven surface 14A of the first transparent layer 14 from a direction inclined by 10 ° from the normal direction N, and the reflected light from the first uneven surface 14A is converted into the normal direction N and the parallel light. The angle distribution of the reflected light intensity is obtained by measuring the reflected light intensity at every 0.1 ° with the detector 102 while continuously changing the measurement angle of the detector 102 within a plane including both the traveling directions T. be able to. Examples of such a goniophotometer include a goniophotometer GP-200 manufactured by Murakami Color Research Laboratory.

  The intermediate base film shown in FIG. 3 is a state in which the first high refractive index layer 15 and the first low refractive index layer 16 are not provided on the first transparent layer 14. In the intermediate base film 11 in which the first high-refractive index layer 15 and the first low-refractive index layer 16 are provided on the transparent layer 14, the first high-refractive index layer 15 and the first low-refractive index layer 15 and the first low-refractive index layer 16 are provided. If the thickness of the low refractive index layer 1 is 200 nm or less, the uneven shape of the first uneven surface 14A is reflected on the surface of the intermediate substrate film 11 (first low refractive index layer 16). When the reflected light intensity on the surface of the first low refractive index layer 16 is measured under the same conditions as the above measurement conditions of the reflected light intensity on the first uneven surface 14A, the first low refractive index layer 16 1/100 angle width to 1/2 angle in the angular distribution of reflected light intensity on the surface The value obtained by subtracting the width is substantially the same as the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angular distribution of the reflected light intensity on the first uneven surface 14A of the first transparent layer 14. . Therefore, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surface of the first low refractive index layer 16 becomes 0.7 ° or more and 1.4 ° or less. If it is, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity measured on the first uneven surface 14A of the first transparent layer 14 is 0.7 ° or more. It can be determined that the angle is 1.4 ° or less. However, in the present invention, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity measured on the first uneven surface of the first transparent layer is also 0.7 ° or more. It is only necessary that the angle is 1.4 ° or less, and the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity measured on the surface of the first high refractive index layer is not necessarily The value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity measured on the surface of the first low refractive index layer is not 0.7 ° or more and 1.4 ° or less. Also good.

  In the present invention, the reason why the width is defined by subtracting the width of 1/2 angle width from 1/100 angle width is as follows. When irradiating parallel light from the direction inclined by 10 ° from the normal direction of the film surface of the intermediate base film toward the first uneven surface of the first transparent layer and measuring the angular distribution of the reflected light intensity, Not only the intermediate base film of the present invention but also the conventional antireflection film and the conventional antiglare film used in the image display device, the reflected light intensity in the vicinity of the regular reflection direction (0 °) is the highest, and the regular reflection direction. To a certain angle, the reflected light intensity rapidly decreases, and at a larger angle, the reflected light intensity tends to decrease gently. As a result of intensive studies, the present inventors have found that when the angle distribution of the reflected light intensity shows the above tendency, the size of the 1/100 angle width particularly affects the interference fringes and the cloudiness. Found by experiment. Specifically, it can be said that the larger the 1/100 angle width, the stronger the diffusibility of reflected light. If the diffuseness of the reflected light is strong, the rainbow colors generated by the interference are mixed and reach the observer. Since the amount of reflected light that reaches it increases, it may be recognized as a cloudiness by the human eye. With regard to this point, the present inventor conducted further intensive studies. As a result, if the 1/100 angle width is an appropriate width on the surface of the optical film, the generation of interference fringes can be suppressed and the human eye can be detected. It was found from the ability that it was not recognized that white turbidity was generated as well as regular reflection. However, when the angle distribution of the reflected light intensity is measured in order to obtain the 1/100 angle width, even if the installation angle of the optical film to be measured is slightly shifted (for example, 0.1 °), the optical film Reflected light from the surface becomes difficult to enter the detector, and the measured value (reflected light intensity) changes significantly. Accordingly, stable measurement cannot be performed simply by measuring the angle distribution of the reflected light intensity with a goniophotometer. For this reason, the present inventor tried to widen the light receiving aperture of the detector. With this measurement method, the area on which the reflected light is incident on the detector becomes large, so even if the installation angle of the optical film is slightly deviated, the measurement value does not change significantly and stable measurement is performed. be able to. However, when the light receiving diaphragm of the detector is widened, the measured angular width is widened according to the size of the light receiving diaphragm. Therefore, the present inventor has made measurements with the light receiving aperture of the detector widened, and found that the ½ angle width is subtracted from the 1/100 angle width in the obtained angle distribution of the reflected light intensity. With such a measurement method, since the light receiving aperture is widened, stable measurement can be performed. In addition, even if the angle width measured by widening the light receiving aperture is widened, the angle width increased by widening the light receiving aperture by subtracting the 1/2 angle width from the 1/100 angle width. Minutes can be offset. Moreover, since the 1/2 angle width in the optical film of the present invention and the conventional antiglare film is not so different, the value obtained by subtracting the 1/2 angle width from the 1/100 angle width is substantially 1/100 angle. The width is being evaluated. For this reason, in the present invention, it is defined by a value obtained by subtracting the width of 1/2 angle width from 1/100 angle width.

  In the present invention, the value obtained by subtracting the ½ angle width from the 1/100 angle width is defined as 0.7 ° or more and 1.4 ° or less. If the value obtained by subtracting is within this range, the generation of interference fringes can be suppressed for the reasons described above, and it is not recognized from the human eye's detection ability that the cloudiness is generated.

  In the first uneven surface 14A, when the inclination angle of the first uneven surface 14A with respect to the film surface in the cross section along the normal direction N of the film surface of the intermediate base film 11 is a surface angle, the surface angle is 0. It is preferable that the ratio of the area which is 05 ° or more is 50% or more. When the ratio of the area where the surface angle is 0.05 ° or more is 50% or more, the generation of interference fringes can be further suppressed. The lower limit of the ratio of the region where the surface angle is 0.05 ° or more is preferably 55% or more, and more preferably 60% or more. Further, the upper limit of the ratio of the region where the surface angle is 0.05 ° or more is preferably 95% or less, and more preferably 90% or less.

  The surface angle is obtained by measuring the surface shape of the first uneven surface 14A. Examples of the apparatus for measuring the surface shape include a contact-type surface roughness meter and a non-contact-type surface roughness meter (for example, an interference microscope, a confocal microscope, an atomic force microscope, etc.). Among these, an interference microscope is preferable from the viewpoint of simplicity of measurement. Examples of such an interference microscope include “New View” series manufactured by Zygo.

In order to calculate the ratio of the region where the surface angle is 0.05 ° or more using an interference microscope, for example, the inclination Δi of each point over the entire surface of the concavo-convex surface is obtained, and the inclination Δi is calculated by the following equation (1). Converted to the surface angle θi, the ratio of the region where the absolute value of the surface angle θi is 0.05 ° or more is calculated therefrom. In addition, since inclination (DELTA) i is the same as the local inclination dZi / dXi calculated by following formula (3), it can be calculated | required from following formula (3).
θ _i = tan ⁻¹ Δi (1)

  In the first uneven surface 14A, the root mean square slope RΔq of the roughness curve is preferably 0.003 or less. By setting the root mean square slope RΔq of the roughness curve to 0.003 or less, the cloudiness can be further reduced. The lower limit of RΔq is preferably 0.0005 or more, and more preferably 0.001 or more. Further, the upper limit of RΔq is preferably 0.0025 or less, and more preferably 0.002 or less.

The root mean square slope RΔq of the roughness curve is defined as the root mean square of the local slope dZi / dXi in JIS-B0601: 2001, and is represented by the following formula (2).
Where n is the total measurement point and dZ _i / dX _i is the i th local slope. The local inclination at each point on the measurement surface is obtained by, for example, the following formula (3).
In the equation, when one direction of the measurement surface is an X direction, X _i is a position in the i-th X direction, Z _i is an i-th height, and ΔX is a sampling interval.

  The root mean square slope RΔq is obtained by measuring the surface shape of the first concavo-convex surface 14A, similarly to the surface angle. Examples of the apparatus for measuring the surface shape include a contact-type surface roughness meter and a non-contact-type surface roughness meter (for example, an interference microscope, a confocal microscope, an atomic force microscope, etc.). Among these, an interference microscope is preferable from the viewpoint of simplicity of measurement. Examples of such an interference microscope include “New View” series manufactured by Zygo.

  In the first uneven surface 14A, the average interval Sm of the unevenness constituting the first uneven surface 14A is preferably 0.20 mm or more and 0.60 mm or less, and is 0.22 mm or more and 0.50 mm or less. More preferably. In the first concavo-convex surface 14A, the average inclination angle θa of the concavo-convex constituting the first concavo-convex surface 14A is preferably 0.01 ° or more and 0.1 ° or less, and 0.04 ° or more and 0.0. More preferably, the angle is 08 ° or less.

  In the first uneven surface 14A, the arithmetic average roughness Ra of the unevenness constituting the first uneven surface 14A is preferably 0.02 μm or more and 0.10 μm or less, and 0.04 μm or more and 0.08 μm or less. It is more preferable that In the first uneven surface 14A, the maximum height roughness Ry of the unevenness constituting the first uneven surface 14A is preferably 0.20 μm or more and 0.60 μm or less, and is 0.25 μm or more and 0.40 μm. More preferably, it is as follows. In the first uneven surface 14A, the 10-point average roughness Rz of the unevenness constituting the first uneven surface 14A is preferably 0.15 μm or more and 0.50 μm or less, and is 0.18 μm or more and 0.30 μm. More preferably, it is as follows.

The definitions of the above “Sm”, “Ra”, “Ry” and “Rz” shall conform to JIS B0601-1994. The definition of “θa” is in accordance with the surface roughness measuring instrument: SE-3400 / Kosaka Laboratory Co., Ltd. instruction manual (revised 1995.07.20). Specifically, θa is represented by the following formula (4).
θa = tan ⁻¹ Δa (4)
In the formula, Δa represents the slope as an aspect ratio, and is a value obtained by dividing the total sum of the differences between the minimum and maximum portions of each unevenness (corresponding to the height of each convex portion) by the reference length.

Sm, θa, Ra, Ry, and Rz can be measured under the following measurement conditions using, for example, a surface roughness measuring instrument (model number: SE-3400 / manufactured by Kosaka Laboratory).
1) Stylus of surface roughness detector (trade name SE2555N (2μ standard) manufactured by Kosaka Laboratory Ltd.)
・ Tip radius of curvature 2μm, apex angle 90 degrees, material diamond 2) Measurement conditions of surface roughness measuring instrument ・ Reference length (cutoff value λc of roughness curve): 2.5 mm
Evaluation length (reference length (cutoff value λc) × 5): 12.5 mm
・ Feeding speed of stylus: 0.5mm / s
・ Preliminary length: (cutoff value λc) × 2
・ Vertical magnification: 2000 times ・ Horizontal magnification: 10 times

  The first transparent layer 14 preferably has a hard coat property. When the first transparent layer 14 has a hard coat property, the surface of the first transparent layer 14 is “H” or more in a pencil hardness test (4.9 N load) defined by JIS K5600-5-4 (1999). Of hardness. By setting the pencil hardness to “H” or higher, the hardness of the first transparent layer 14 can be sufficiently reflected on the surface of the first low refractive index layer 16, and the durability can be improved. From the viewpoint of adhesion to the first high refractive index layer 15 formed on the first transparent layer 14, toughness and prevention of curling, the surface of the first transparent layer 14 (first uneven surface 14 </ b> A). The upper limit of the pencil hardness is preferably about 4H. Since the touch panel sensor is repeatedly pressed and requires high adhesiveness and toughness, the upper limit of the pencil hardness of the first transparent layer 14 is set to 4H, so that the intermediate base film 11 is incorporated into the touch panel sensor. When it does, a remarkable effect can be demonstrated.

  The film thickness of the first transparent layer 14 is preferably 1 μm or more and 10 μm or less. If the film thickness of the first transparent layer 14 is within this range, desired hardness can be obtained, and the first transparent layer can be made thinner. Moreover, when the transparent base material 13 is heated when forming the 1st conductive layer 12, an oligomer may precipitate from the transparent base material 13 by this heating, and it may appear white, and it has the film thickness of this range. By forming the first transparent layer 14, precipitation of this oligomer can be suppressed. The film thickness of the first transparent layer 14 can be measured by cross-sectional microscope observation.

  The lower limit of the film thickness of the first transparent layer 14 is more preferably 5 μm or less from the viewpoint of suppressing cracking of the first transparent layer. Further, it is more preferable that the thickness of the first transparent layer 14 is 0.5 μm or more and 5.0 μm or less from the viewpoint of suppressing curling while reducing the thickness of the first transparent layer. However, when the first transparent layer 14 is formed on one surface 13A of the transparent substrate 13 and the second transparent layer 17 is formed on the other surface 13B, as in the intermediate substrate film 11. Since the curl generation can be suppressed by the first transparent layer 14 and the second transparent layer 17, the film thickness of the first transparent layer 14 may exceed 5 μm.

  The refractive index of the first transparent layer 14 may be 1.50 or more and 1.60 or less. The lower limit of the refractive index of the first transparent layer 14 may be 1.52 or more, and the upper limit of the refractive index of the first transparent layer 14 may be 1.56 or less. The refractive index difference between the transparent substrate 13 and the first transparent layer 14 is preferably within 0.10, more preferably within 0.06, from the viewpoint of suppressing interference fringes from being visually recognized. preferable. Here, when an anchor agent or a primer agent is applied to the surface of the transparent substrate 13, the difference in refractive index between the transparent substrate 13 and the first transparent layer 14 is the same as that of the anchor agent or primer agent. The refractive index difference from the transparent layer.

  The refractive index of the first transparent layer 14 can be measured with an Abbe refractometer (NAR-4T manufactured by Atago Co., Ltd.) or an ellipsometer after forming a single layer. Further, as a method of measuring the refractive index after becoming the intermediate substrate film 11, the first transparent layer 14 is scraped off with a cutter or the like to prepare a powder sample, and JIS K7142 (2008) B method (powder) Alternatively, the Becke method (for a granular transparent material) (using a Cargill reagent with a known refractive index, place the powdered sample on a glass slide, drop the reagent on the sample, and immerse the sample in the reagent. This is observed by microscopic observation, and a bright line generated in the sample outline due to the difference in refractive index between the sample and the reagent; a method in which the refractive index of the reagent in which the Becke line cannot be visually observed is used as the refractive index of the sample) is used. be able to.

  In the present invention, in the state in which the parallel light traveling in the direction inclined by 10 ° from the normal direction of the intermediate base film is irradiated to the first uneven surface of the first transparent layer, the normal direction and the parallel light In the angular distribution of reflected light intensity measured in a plane including both directions of travel, the value obtained by subtracting the 1/2 angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less. If it is, it can suppress that an interference fringe is visually recognized in an intermediate | middle base material film, and can reduce a cloudiness feeling. Therefore, if the material is appropriately selected so that the first uneven surface of the first transparent layer satisfies such requirements, the material constituting the first transparent layer is not particularly limited.

  The first transparent layer having the first concavo-convex surface is, for example, (1) a method of applying a first transparent layer resin composition containing a photopolymerizable compound to be a fine particle and a binder resin after polymerization to a transparent substrate. (2) A method in which a first transparent layer composition is applied to a transparent substrate, and then a mold having a reverse groove with an uneven surface is embossed on the first transparent layer composition, or ( 3) The first transparent layer resin composition in which the disk-shaped particles having a concavo-convex shape corresponding to the first concavo-convex surface is dispersed is applied to a transparent substrate, and the disk-shaped particles are formed into the first It can be formed by a method of arranging on the surface of the transparent layer. Among these, the method (1) is preferable because of easy production.

  In the above method (1), when the photopolymerizable compound is polymerized (crosslinked) to become a binder resin, the photopolymerizable compound undergoes curing shrinkage in the portion where fine particles are not present, and thus shrinks as a whole. To do. On the other hand, in the portion where the fine particles are present, since the fine particles do not cause curing shrinkage, only the photopolymerizable compounds existing above and below the fine particles cause curing shrinkage. Thereby, since the film thickness of the first transparent layer is thicker in the portion where the fine particles are present than in the portion where the fine particles are not present, the surface of the first transparent layer becomes uneven. Therefore, the first transparent layer 14 having the first uneven surface 14A can be formed by appropriately selecting the type and particle size of the fine particles and the type of the photopolymerizable compound and adjusting the coating film forming conditions. .

  Hereinafter, an example in which the first transparent layer 14 includes fine particles and a binder resin will be described. For example, the first transparent layer 14 containing such fine particles and a binder resin can be formed by the method (1).

<Fine particles>
The fine particles may be either inorganic fine particles or organic fine particles. Among these, for example, silica (SiO ₂ ) fine particles, alumina fine particles, titania fine particles, tin oxide fine particles, antimony-doped tin oxide (abbreviation: ATO) fine particles. Inorganic oxide fine particles such as zinc oxide fine particles are preferred. The inorganic oxide fine particles can form an aggregate in the first transparent layer, and the first uneven surface 14A can be formed by the degree of aggregation of the aggregate.

  Examples of the organic fine particles include plastic beads. Specific examples of the plastic beads include polystyrene beads, melamine resin beads, acrylic beads, acrylic-styrene beads, silicone beads, benzoguanamine beads, benzoguanamine / formaldehyde condensation beads, polycarbonate beads, polyethylene beads, and the like.

  It is preferable that the organic fine particles have moderately adjusted resistance to curing shrinkage of the fine particles in the curing shrinkage described above. In order to adjust the resistance to shrinkage, a plurality of laminated films containing organic fine particles with different hardnesses prepared in advance by changing the degree of three-dimensional crosslinking are prepared, and the uneven surface of the intermediate substrate film is evaluated. Therefore, it is preferable to select a degree of crosslinking suitable for the first uneven surface.

  When inorganic oxide particles are used as the fine particles, the inorganic oxide particles are preferably subjected to surface treatment. By subjecting the inorganic oxide fine particles to surface treatment, the distribution of the fine particles in the first transparent layer 14 can be suitably controlled, and the chemical resistance of the fine particles themselves can be improved.

  As the surface treatment, a hydrophobizing treatment for making the surface of the fine particles hydrophobic is preferable. Such a hydrophobization treatment can be obtained by chemically reacting the surface of the fine particles with a surface treatment agent such as silanes or silazanes. Specific examples of the surface treatment agent include dimethyldichlorosilane, silicone oil, hexamethyldisilazane, octylsilane, hexadecylsilane, aminosilane, methacrylsilane, octamethylcyclotetrasiloxane, and polydimethylsiloxane. When the fine particles are inorganic oxide fine particles, hydroxyl groups are present on the surface of the inorganic oxide fine particles. However, by performing the hydrophobic treatment as described above, the hydroxyl groups present on the surface of the inorganic oxide fine particles are reduced. In addition, the specific surface area of the inorganic oxide fine particles measured by the BET method can be reduced, the inorganic oxide fine particles can be prevented from excessively agglomerating, and the first transparent layer having the first uneven surface can be formed. it can.

  When inorganic oxide particles are used as the fine particles, the inorganic oxide fine particles are preferably amorphous. This is because when the inorganic oxide particles are crystalline, the Lewis acid salt of the inorganic oxide fine particles becomes strong due to lattice defects contained in the crystal structure, and excessive aggregation of the inorganic oxide fine particles can be controlled. It is because there is a risk of disappearing.

  When inorganic oxide particles are used as the fine particles, the inorganic oxide fine particles preferably form aggregates in the first transparent layer 14. The aggregate of the inorganic oxide fine particles preferably has a structure in which the inorganic oxide fine particles are three-dimensionally connected in the first transparent layer 14. Examples of the structure in which the inorganic oxide fine particles are three-dimensionally connected include a hook shape and a string shape. Aggregates having a structure in which inorganic oxide fine particles are three-dimensionally linked are easily and uniformly crushed when the photopolymerizable compound that becomes the binder resin after curing is cured and contracted. Thereby, the uneven surface can be made a very smooth surface, and as a result, the uneven surface having a steep slope is not formed, and the first transparent layer having the first uneven surface can be formed. . Even when organic fine particles are used as described above, the first transparent layer having the first uneven surface can be formed by appropriately adjusting the degree of crosslinking.

  The content of the fine particles with respect to the first transparent layer 14 is not particularly limited, but is preferably 0.1% by mass or more and 5.0% by mass or less. Since the content of the fine particles is 0.1% by mass or more, the first uneven surface can be more reliably formed, and the content of the fine particles is 5.0% by mass or less. Aggregation does not occur excessively, and internal diffusion and / or generation of large irregularities on the surface of the first transparent layer can be suppressed, thereby suppressing cloudiness. The lower limit of the content of fine particles is more preferably 0.5% by mass or more, and the upper limit of the content of fine particles is more preferably 3.0% by mass or less.

  The fine particles are preferably spherical in shape in a single particle state. When the single particle of the fine particles is spherical, an image having excellent contrast can be obtained when the laminated film is disposed on the image display surface of the image display device. Here, “spherical” means, for example, a true spherical shape, an elliptical spherical shape, etc., but a so-called indeterminate shape is not included.

  When inorganic oxide fine particles are used as the fine particles, the average primary particle size of the inorganic oxide fine particles is preferably 1 nm or more and 100 nm or less. Since the average primary particle size of the fine particles is 1 nm or more, the first transparent layer having the first uneven surface can be more easily formed, and the average primary particle size is 100 nm or less. Therefore, diffusion of light by the fine particles can be suppressed, and excellent dark room contrast can be obtained. The lower limit of the average primary particle size of the fine particles is more preferably 5 nm or more, and the upper limit of the average primary particle size of the fine particles is more preferably 50 nm or less. The average primary particle size of the fine particles is a value measured using an image processing software from an image of a cross-sectional electron microscope (a transmission type such as TEM or STEM and preferably having a magnification of 50,000 times or more).

  When using organic fine particles as the fine particles, the organic fine particles can easily reduce the difference in refractive index from the binder resin by changing the copolymerization ratio of resins having different refractive indexes, for example, less than 0.01. Light diffusion due to fine particles can be suppressed. Therefore, the average primary particle size may be less than 8.0 μm, preferably 5.0 μm or less.

  When inorganic oxide fine particles are used as the fine particles, the average particle size of the aggregates of the inorganic oxide fine particles is preferably 100 nm or more and 2.0 μm or less. If it is 100 nm or more, the first uneven surface can be easily formed, and if it is 2.0 μm or less, diffusion of light due to fine particle aggregates can be suppressed, and a touch panel excellent in dark room contrast can be obtained. Can do. The average particle diameter of the fine particle aggregate is preferably 200 nm or less at the lower limit, and preferably 1.5 μm or less at the upper limit.

  The average particle diameter of the aggregates of the inorganic oxide fine particles was selected from a 5 μm square region containing a large amount of aggregates of the inorganic oxide fine particles based on observation with a cross-sectional electron microscope (about 10,000 to 20,000 times). The particle diameter of the aggregate of inorganic oxide fine particles was measured, and the average particle diameter of the aggregate of the top 10 inorganic oxide fine particles was measured. The “particle diameter of the aggregate of the inorganic oxide fine particles” is the maximum distance between the two straight lines when the cross section of the aggregate of the inorganic oxide fine particles is sandwiched between any two parallel straight lines. It is measured as the distance between straight lines in a combination of two straight lines. The particle diameter of the aggregate of inorganic oxide fine particles may be calculated using image analysis software.

When silica particles are used as the fine particles, among the silica particles, fumed silica fine particles are preferable from the viewpoint that the first transparent layer having the first uneven surface can be easily formed. Fumed silica is amorphous silica having a particle size of 200 nm or less prepared by a dry method, and can be obtained by reacting a volatile compound containing silicon in a gas phase. Specific examples include those produced by hydrolyzing a silicon compound such as silicon tetrachloride (SiCl ₄ ) in a flame of oxygen and hydrogen. Examples of commercially available fumed silica fine particles include AEROSIL R805 manufactured by Nippon Aerosil Co., Ltd.

  Among the fumed silica fine particles, there are those showing hydrophilicity and those showing hydrophobicity. Among these, from the viewpoint of reducing the water absorption amount and facilitating dispersion in the first transparent layer composition. Those exhibiting hydrophobic properties are preferred. Hydrophobic fumed silica can be obtained by chemically reacting the above-mentioned surface treatment agent with silanol groups present on the surface of the fumed silica fine particles. From the viewpoint of easily obtaining the aggregate as described above, the fumed silica is most preferably treated with octylsilane.

  Although the fumed silica fine particles form aggregates, the aggregates of the fumed silica fine particles are not dense aggregates in the first transparent layer composition, and are sufficient like a cocoon or a string shape. Form sparse aggregates. For this reason, the agglomerates of fumed silica fine particles are easily and uniformly crushed when the photopolymerizable compound which becomes the binder resin after curing undergoes curing shrinkage. Thereby, the 1st transparent layer which has the 1st uneven surface can be formed.

The BET specific surface area of the fumed silica fine particles is preferably 100 m ² / g or more and 200 m ² / g or less. By setting the BET specific surface area of the fumed silica fine particles to 100 m ² / g or more, the fumed silica does not disperse excessively and it is easy to form an appropriate aggregate, and the BET specific surface area of the fumed silica fine particles is 200 m ^2. By setting it to / g or less, it becomes difficult for the fumed silica fine particles to form excessively large aggregates. The lower limit of the BET specific surface area of the fumed silica fine particles is more preferably 120 m ² / g, still more preferably 140 m ² / g. The upper limit of the BET specific surface area of the fumed silica fine particles is more preferably 180 m ² / g, still more preferably 165 m ² / g.

<Binder resin>
The binder resin contains a polymerized product (crosslinked product) of a photopolymerizable compound. The binder resin may contain a solvent-drying resin or a thermosetting resin in addition to a polymerized product (crosslinked product) of a photopolymerizable compound. The photopolymerizable compound has at least one photopolymerizable functional group. In the present specification, the “photopolymerizable functional group” is a functional group capable of undergoing a polymerization reaction by light irradiation. Examples of the photopolymerizable functional group include ethylenic double bonds such as a (meth) acryloyl group, a vinyl group, and an allyl group. The “(meth) acryloyl group” means to include both “acryloyl group” and “methacryloyl group”. The light irradiated when polymerizing the photopolymerizable compound includes visible light and ionizing radiation such as ultraviolet rays, X-rays, electron beams, α rays, β rays, and γ rays.

  Examples of the photopolymerizable compound include a photopolymerizable monomer, a photopolymerizable oligomer, and a photopolymerizable polymer, and these can be appropriately adjusted and used. As the photopolymerizable compound, a combination of a photopolymerizable monomer and a photopolymerizable oligomer or photopolymerizable polymer is preferable.

(Photopolymerizable monomer)
The photopolymerizable monomer has a weight average molecular weight of less than 1000. The photopolymerizable monomer is preferably a polyfunctional monomer having two or more photopolymerizable functional groups (that is, bifunctional).

  Examples of the bifunctional or higher monomer include trimethylolpropane tri (meth) acrylate, tripropylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, and pentaerythritol tri (meth). Acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, ditri Methylolpropane tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, tripentaerythritol octa (meth) acrylate, Lapentaerythritol deca (meth) acrylate, isocyanuric acid tri (meth) acrylate, isocyanuric acid di (meth) acrylate, polyester tri (meth) acrylate, polyester di (meth) acrylate, bisphenol di (meth) acrylate, diglycerin tetra ( (Meth) acrylate, adamantyl di (meth) acrylate, isoboronyl di (meth) acrylate, dicyclopentane di (meth) acrylate, tricyclodecane di (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, and these are PO, EO And the like modified.

  Among these, from the viewpoint of obtaining a first transparent layer having high hardness, pentaerythritol triacrylate (PETA), dipentaerythritol hexaacrylate (DPHA), pentaerythritol tetraacrylate (PETTA), dipentaerythritol pentaacrylate (DPPA), etc. Is preferred.

(Photopolymerizable oligomer)
The photopolymerizable oligomer has a weight average molecular weight of 1000 or more and less than 10,000. The photopolymerizable oligomer is preferably a bifunctional or higher polyfunctional oligomer. Polyfunctional oligomers include polyester (meth) acrylate, urethane (meth) acrylate, polyester-urethane (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, melamine (meth) acrylate, and isocyanurate (meth). Examples include acrylate and epoxy (meth) acrylate.

(Photopolymerizable polymer)
The photopolymerizable polymer has a weight average molecular weight of 10,000 or more, and the weight average molecular weight is preferably from 10,000 to 80,000, more preferably from 10,000 to 40,000. When the weight average molecular weight exceeds 80,000, the viscosity is high, so that the coating suitability is lowered, and the appearance of the obtained optical laminated film may be deteriorated. Examples of the polyfunctional polymer include urethane (meth) acrylate, isocyanurate (meth) acrylate, polyester-urethane (meth) acrylate, and epoxy (meth) acrylate.

  The solvent-drying resin is a resin that forms a film only by drying a solvent added to adjust the solid content during coating, such as a thermoplastic resin. When the solvent-drying type resin is added, film defects on the coating surface of the coating liquid can be effectively prevented when the first transparent layer 14 is formed. It does not specifically limit as solvent dry type resin, Generally, a thermoplastic resin can be used.

  Examples of thermoplastic resins include styrene resins, (meth) acrylic resins, vinyl acetate resins, vinyl ether resins, halogen-containing resins, alicyclic olefin resins, polycarbonate resins, polyester resins, polyamide resins. , Cellulose derivatives, silicone resins and rubbers or elastomers.

  The thermoplastic resin is preferably amorphous and soluble in an organic solvent (particularly a common solvent capable of dissolving a plurality of polymers and curable compounds). In particular, from the viewpoint of transparency and weather resistance, styrene resins, (meth) acrylic resins, alicyclic olefin resins, polyester resins, cellulose derivatives (cellulose esters, etc.) and the like are preferable.

  The thermosetting resin is not particularly limited. For example, phenol resin, urea resin, diallyl phthalate resin, melamine resin, guanamine resin, unsaturated polyester resin, polyurethane resin, epoxy resin, aminoalkyd resin, melamine-urea cocondensation Examples thereof include resins, silicon resins, polysiloxane resins, and the like.

  In order to form the first transparent layer 14 by the method (1), first, the first transparent layer composition is applied to the surface of the transparent substrate 13. Examples of the method for applying the first transparent layer composition include known coating methods such as spin coating, dipping, spraying, slide coating, bar coating, roll coating, gravure coating, and die coating. It is done.

<First transparent layer composition>
The first composition for transparent layer contains at least fine particles and a photopolymerizable compound. In addition, you may add the said thermoplastic resin, the said thermosetting resin, a solvent, and a polymerization initiator to the 1st composition for transparent layers as needed. Further, the first transparent layer composition may include conventionally known dispersants and surfactants depending on purposes such as increasing the hardness of the first transparent layer, suppressing curing shrinkage, and controlling the refractive index. , Antistatic agent, silane coupling agent, thickener, anti-coloring agent, coloring agent (pigment, dye), antifoaming agent, leveling agent, flame retardant, UV absorber, adhesion promoter, polymerization inhibitor, antioxidant An agent, a surface modifier, a lubricant, etc. may be added.

<solvent>
Examples of the solvent include alcohols (eg, methanol, ethanol, propanol, isopropanol, n-butanol, s-butanol, t-butanol, benzyl alcohol, PGME, ethylene glycol), ketones (acetone, methyl ethyl ketone (MEK), cyclohexanone. , Methyl isobutyl ketone, diacetone alcohol, cycloheptanone, diethyl ketone, etc.), ethers (1,4-dioxane, dioxolane, diisopropyl ether dioxane, tetrahydrofuran, etc.), aliphatic hydrocarbons (hexane, etc.), alicyclic Hydrocarbons (cyclohexane, etc.), aromatic hydrocarbons (toluene, xylene, etc.), halogenated carbons (dichloromethane, dichloroethane, etc.), esters (methyl formate, methyl acetate, ethyl acetate, vinegar) Propyl, butyl acetate, ethyl lactate, etc.), cellosolves (methyl cellosolve, ethyl cellosolve, butyl cellosolve, etc.), cellosolve acetates, sulfoxides (dimethylsulfoxide etc.), amides (dimethylformamide, dimethylacetamide etc.), etc. A mixture thereof may be used.

<Polymerization initiator>
The polymerization initiator is a component that is decomposed by light irradiation to generate radicals to initiate or advance polymerization (crosslinking) of the photopolymerizable compound.

  The polymerization initiator is not particularly limited as long as it can release a substance that initiates radical polymerization by light irradiation. The polymerization initiator is not particularly limited, and known ones can be used. Specific examples include, for example, acetophenones, benzophenones, Michler benzoylbenzoate, α-amyloxime ester, thioxanthones, propiophenone. , Benzyls, benzoins, acylphosphine oxides. In addition, it is preferable to use a mixture of photosensitizers, and specific examples thereof include n-butylamine, triethylamine, poly-n-butylphosphine, and the like.

  As the polymerization initiator, when the binder resin is a resin system having a radically polymerizable unsaturated group, it is preferable to use acetophenones, benzophenones, thioxanthones, benzoin, benzoin methyl ether or the like alone or in combination. .

  It is preferable that content of the polymerization initiator in the 1st composition for transparent layers is 0.5 to 10.0 mass parts with respect to 100 mass parts of photopolymerizable compounds. By setting the content of the polymerization initiator within this range, the hard coat performance can be sufficiently maintained, and curing inhibition can be suppressed.

  Although it does not specifically limit as a content rate (solid content) of the raw material in the composition for 1st transparent layers, Usually, 5 to 70 mass% is preferable, and it is set to 25 to 60 mass%. More preferred.

<Leveling agent>
As the leveling agent, for example, silicone oil, fluorine-based surfactant, and the like are preferable because the first transparent layer can be prevented from having a Benard cell structure. When a resin composition containing a solvent is applied and dried, a surface tension difference or the like is generated between the coating film surface and the inner surface in the coating film, thereby causing many convections in the coating film. The structure generated by the convection is called a Benard cell structure, and causes a problem such as a skin or coating defect in the first transparent layer to be formed.

  In the Benard cell structure, the unevenness of the surface of the first transparent layer may become too large. When the leveling agent as described above is used, this convection can be prevented, so that not only a first transparent layer free from defects and unevenness can be obtained, but also the uneven shape of the surface of the first transparent layer can be adjusted. It becomes easy.

  The method for preparing the first transparent layer composition is not particularly limited as long as each component can be mixed uniformly. For example, the composition can be performed using a known apparatus such as a paint shaker, a bead mill, a kneader, or a mixer.

  After the first transparent layer composition is applied to the surface of the transparent substrate 13, the film-shaped first transparent layer composition is transported to a heated zone for drying, and various known types are known. The first transparent layer composition is dried by the method to evaporate the solvent. Here, the distribution state of the aggregates of the fine particles can be adjusted by selecting the solvent relative evaporation rate, solid content concentration, coating solution temperature, drying temperature, drying air speed, drying time, solvent atmosphere concentration in the drying zone, and the like. .

  In particular, a method of adjusting the distribution state of fine particle aggregates by selecting drying conditions is simple and preferable. The specific drying temperature is preferably 30 to 120 ° C., and the drying wind speed is preferably 0.2 to 50 m / s. The drying treatment appropriately adjusted within this range is performed once or a plurality of times to thereby form fine particles. The distribution state of the aggregate can be adjusted to a desired state.

  Then, the first transparent layer composition is irradiated with light such as ultraviolet rays to polymerize (crosslink) the photopolymerizable compound, thereby curing the first transparent layer composition, 1 transparent layer 14 is formed.

  When ultraviolet rays are used as the light for curing the first transparent layer composition, ultraviolet rays emitted from ultra-high pressure mercury lamps, high pressure mercury lamps, low pressure mercury lamps, carbon arcs, xenon arcs, metal halide lamps, etc. can be used. . Moreover, as a wavelength of an ultraviolet-ray, the wavelength range of 190-380 nm can be used. Specific examples of the electron beam source include various electron beam accelerators such as a cockcroft-wald type, a bandegraft type, a resonant transformer type, an insulated core transformer type, a linear type, a dynamitron type, and a high frequency type.

<First high refractive index layer>
The first high refractive index layer 15 is a layer having a refractive index higher than that of the first transparent layer 14. Specifically, the refractive index of the first high refractive index layer 15 may be 1.50 or more and 2.00 or less. The lower limit of the refractive index of the first high refractive index layer 15 may be 1.60 or more, and the upper limit of the refractive index of the first high refractive index layer 15 may be 1.75 or less. The refractive index of the first high refractive index layer 15 can be measured by the same method as the refractive index of the first transparent layer 14. The difference in refractive index between the first transparent layer 14 and the first high refractive index layer 15 may be 0.05 or more and 0.25 or less.

  The film thickness of the first high refractive index layer 15 is preferably 200 nm or less. When the film thickness of the first high refractive index layer 15 is 200 nm or less, since the film thickness of the first high refractive index layer 15 is very thin, the surface of the first high refractive index layer 15 has first irregularities. The uneven shape of the surface 14A is reflected. Specifically, the first high refractive index layer 15 has a film thickness of 200 nm or less, and the first high refractive index layer according to the same conditions as the above-described measurement conditions of the reflected light intensity on the first uneven surface 14A. When the reflected light intensity on the surface of 15 is measured, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surface of the first high refractive index layer 15 is: The value is substantially the same as the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the first uneven surface 14A of the first transparent layer 14. Therefore, when the value obtained by subtracting the 1/2 angle width from the 1/100 angle width in the angle distribution of the reflected light intensity in the first high refractive index layer 15 is 0.7 ° or more and 1.4 ° or less. The value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the first uneven surface 14A of the first transparent layer 14 is also 0.7 ° or more and 1.4 °. It can be determined that Further, the range of the region where the surface angle is 0.05 ° or more on the surface of the first high refractive index layer 15 is the range of the region where the preferable surface angle is 0.05 ° or more. The ratio of the region where the surface angle of the first uneven surface 14A is 0.05 ° or more is also the ratio of the region where the preferable surface angle is 0.05 ° or more. It can be judged that it is within the range. “Ratio of the region where the surface angle is 0.05 ° or more” includes RΔq, Sm, θa, Ra, Ry, and Rz in addition to the proportion of the region where the surface angle is 0.05 ° or more. Shall be. In this specification, the “surface of the first high refractive index layer” means a surface of the first high refractive index layer opposite to the surface on the first transparent layer side.

  The lower limit of the film thickness of the first high refractive index layer 15 is preferably 10 nm or more, and more preferably 30 nm or more. The upper limit of the film thickness of the first high refractive index layer 15 is preferably 100 nm or less, and more preferably 70 nm or less.

  The first high-refractive index layer 15 and the first low-refractive index layer 16 transmit light between a region where the first conductive layer 12 is provided and a region where the first conductive layer 12 is not provided. It can function as a refractive index adjustment layer (index matching layer) for reducing the difference between the reflectance and the reflectance.

  The first high refractive index layer 15 is not particularly limited as long as it has a refractive index higher than that of the first transparent layer 14, but the first high refractive index layer 15 is, for example, a fine particle. And a binder resin.

Examples of the fine particles constituting the first high refractive index layer 15 include metal oxide fine particles. Specific examples of the metal oxide fine particles include titanium oxide (TiO ₂ , refractive index: 2.3 to 2.7), niobium oxide (Nb 2 O 5, refractive index: 2.33), and zirconium oxide (ZrO ₂ ). , refractive index: 2.10), antimony oxide (Sb2O5, refractive index: 2.04), tin oxide (SnO _2, refractive index: 2.00), tin-doped indium oxide (ITO, the refractive index: 1.95 to 2 .00), cerium oxide (CeO _2, refractive index: 1.95), aluminum-doped zinc oxide (AZO, refractive index: 1.90 to 2.00), gallium-doped zinc oxide (GZO, refractive index: 1.90 2.00), zinc antimonate (ZnSb ₂ O _6, refractive index: 1.90 to 2.00), zinc oxide (ZnO, refractive index: 1.90), yttrium oxide _(Y 2 _{O 3,} the refractive index 187) , Antimony-doped tin oxide (ATO, refractive index: 185 to 185), phosphorus-doped tin oxide (PTO, refractive index: 185 to 185), and the like. Among these, zirconium oxide is preferable from the viewpoint of refractive index.

  The binder resin constituting the first high refractive index layer 15 is not particularly limited, and a thermoplastic resin can also be used. From the viewpoint of increasing the surface hardness, a thermosetting resin or a photopolymerizable compound, etc. Of these, a polymer (cross-linked product) is preferable, and a photopolymerizable compound is more preferable.

  Examples of the thermosetting resin include resins such as acrylic resin, urethane resin, phenol resin, urea melamine resin, epoxy resin, unsaturated polyester resin, and silicone resin. When curing the thermosetting resin, a curing agent may be used.

  Although it does not specifically limit as a photopolymerizable compound, A photopolymerizable monomer, an oligomer, and a polymer can be used. Examples of the monofunctional photopolymerizable monomer include ethyl (meth) acrylate, ethylhexyl (meth) acrylate, styrene, methylstyrene, and N-vinylpyrrolidone. Examples of the bifunctional or higher photopolymerizable monomer include polymethylolpropane tri (meth) acrylate, hexanediol (meth) acrylate, tripropylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, and pentaerythritol tris. (Meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) Examples include acrylates, compounds obtained by modifying these compounds with ethylene oxide, polyethylene oxide, and the like.

  In addition, these compounds may have a refractive index adjusted to be high by introducing an aromatic ring, a halogen atom other than fluorine, sulfur, nitrogen, phosphorus atoms, or the like. In addition to the above compounds, relatively low molecular weight polyester resins having unsaturated double bonds, polyether resins, acrylic resins, epoxy resins, urethane resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiol polyene resins, etc. Can also be used. When polymerizing (crosslinking) the photopolymerizable compound, the polymerization initiator described in the column of the first transparent layer may be used.

<First low refractive index layer>
The first low refractive index layer 16 is a layer having a refractive index lower than that of the first high refractive index layer 15. Specifically, the refractive index of the first low refractive index layer 16 may be 1.20 or more and 1.50 or less. The lower limit of the refractive index of the first low refractive index layer 16 may be 1.40 or more, and the upper limit of the refractive index of the first low refractive index layer 16 may be 1.49 or less. The refractive index of the first low refractive index layer 16 can be measured by the same method as the refractive index of the first transparent layer 14. The refractive index difference between the first high refractive index layer 15 and the first low refractive index layer 16 may be 0.10 or more and 0.25 or less.

  The film thickness of the first low refractive index layer 16 is preferably 200 nm or less. When the film thickness of the first high refractive index layer 15 and the film thickness of the first low refractive index layer 16 are 200 nm or less, the film thicknesses of the first high refractive index layer 15 and the first low refractive index layer 16 are Since it is very thin, the uneven shape of the first uneven surface 14 </ b> A is reflected not only on the surface of the first high refractive index layer 15 but also on the surface of the first low refractive index layer 16. Specifically, the film thickness of the first high refractive index layer 15 and the first low refractive index layer 16 is 200 nm or less, and the same conditions as the above measurement conditions of the reflected light intensity on the first uneven surface 14A Thus, when the reflected light intensity at the surface of the first low refractive index layer 16 is measured, from the 1/100 angle width in the angular distribution of the reflected light intensity measured at the surface of the first low refractive index layer 16 The value obtained by subtracting the ½ angle width is a value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity measured on the first uneven surface 14A of the first transparent layer 14. And almost the same value. Therefore, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity measured on the surface of the first low refractive index layer 16 is 0.7 ° or more and 1.4 ° or less. In this case, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity measured on the first uneven surface 14A of the first transparent layer 14 is also 0.7. It can be determined that the angle is not less than 1.4 ° and not more than 1.4 °. Further, the value of the region where the surface angle is 0.05 ° or more on the surface of the first low refractive index layer 16 is the range such as the proportion of the region where the preferable surface angle is 0.05 ° or more. The ratio of the region where the surface angle of the first uneven surface 14A is 0.05 ° or more is also the ratio of the region where the preferable surface angle is 0.05 ° or more. It can be judged that it is within the range. In the present specification, the “surface of the first low refractive index layer” is opposite to the surface on the first transparent layer side (surface on the first high refractive index layer side) in the first low refractive index layer. Means the side face.

  The lower limit of the film thickness of the first low refractive index layer 16 is preferably 10 nm or more, and more preferably 15 nm or more. The upper limit of the film thickness of the first low refractive index layer 16 is preferably 100 nm or less, and more preferably 50 nm or less.

  When the first conductive layer is formed using tin-doped indium oxide (ITO) or the like on the surface of the first low-refractive index layer, it is necessary to crystallize tin-doped indium oxide or the like. When the surface of the layer has a large uneven shape, crystallization of tin-doped indium oxide or the like may be hindered. On the other hand, on the surface of the first low refractive index layer 16, the ratio of the region where the surface angle is 0.05 ° or more is 50% or more, and the surface of the first low refractive index layer 16 is Since RΔq is 0.003 or less, it does not have a large uneven shape. Therefore, inhibition of crystallization of tin-doped indium oxide or the like can be suppressed.

  The first low refractive index layer 16 is not particularly limited as long as it has a refractive index lower than that of the first high refractive index layer 15, but the first low refractive index layer 16 is, for example, Further, it can be composed of a low refractive index fine particle and a binder resin, or a low refractive index resin.

  Examples of the low refractive index fine particles include solid or hollow particles made of silica or magnesium fluoride. Among these, hollow silica particles are preferable, and such hollow silica particles can be produced, for example, by the production method described in Examples of JP-A-2005-099778.

  As the low refractive index fine particles, it is preferable to use reactive silica fine particles having a reactive functional group on the silica surface. As the reactive functional group, a photopolymerizable functional group is preferable. Such reactive silica fine particles can be prepared by surface-treating silica fine particles with a silane coupling agent or the like. As a method of treating the surface of the silica fine particles with a silane coupling agent, a dry method in which the silane coupling agent is sprayed on the silica fine particles, or a wet method in which the silica fine particles are dispersed in a solvent and then reacted by adding the silane coupling agent. Etc.

  Examples of the binder resin constituting the first low refractive index layer 16 include the same binder resin as that constituting the first high refractive index layer 15. However, a resin having a low refractive index such as a resin in which a fluorine atom is introduced or an organopolysiloxane may be mixed in the binder resin.

  Examples of the low refractive index resin include a resin into which a fluorine atom is introduced and a resin having a low refractive index such as organopolysiloxane.

  Between the first high refractive index layer 15 and the first low refractive index layer 16, the refractive index of the first low refractive index layer 15 is lower than the refractive index of the first high refractive index layer 15. A medium refractive index layer (not shown) having a higher refractive index may be provided.

  The refractive index of the middle refractive index layer may be 1.50 or more and 1.80 or less. The lower limit of the refractive index of the middle refractive index layer may be 1.55 or more, and the upper limit of the refractive index of the middle refractive index layer may be 1.65 or less. The refractive index of the middle refractive index layer can be measured by the same method as the refractive index of the first transparent layer 14. The refractive index difference between the first high refractive index layer 15 and the middle refractive index layer may be 0.05 or more and 0.15 or less. The rate difference may be 0.05 or more and 0.15 or less.

  The film thickness of the medium refractive index layer is preferably 200 nm or less. The lower limit of the film thickness of the medium refractive index layer is preferably 10 nm or more, and more preferably 30 nm or more. The upper limit of the film thickness of the medium refractive index layer is preferably 100 nm or less, and more preferably 70 nm or less.

  The medium refractive index layer is not particularly limited as long as it is a layer having a refractive index lower than that of the first high refractive index layer 15 and higher than that of the first low refractive index layer 16. The intermediate refractive index layer 4 can be composed of, for example, particles and a binder resin. Examples of the particles include the same particles as the particles constituting the first high refractive index layer 15. In addition, examples of the binder resin include the same resins as the binder resin constituting the first high refractive index layer 15.

<Second transparent layer>
It is preferable that the 2nd transparent layer 17 has 17 A of 2nd uneven surfaces on the opposite side to the transparent base material 13 side. In the second uneven surface 17A, for the same reason as described above, the parallel light traveling in the direction inclined by 10 ° from the normal direction N of the intermediate base film 11 is converted into the second unevenness of the second transparent layer 17. Reflected light of 1/100 or more of the maximum reflected light intensity in the angle distribution of the reflected light intensity measured in a plane including both the normal direction N and the traveling direction T of the parallel light in a state where the surface 17A is irradiated The value obtained by subtracting the width of the angle range in which the reflected light intensity of ½ or more of the maximum reflected light intensity is measured from the width of the angle range in which the intensity is measured is 0.7 ° or more and 1.4 ° or less. Preferably it is.

  The lower limit of the value obtained by subtracting the width of 1/2 angle width from 1/100 angle width is preferably 0.8 ° or more, and more preferably 0.9 ° or more. Further, the upper limit of the value obtained by subtracting the width of the 1/2 angle width from the 1/100 angle width is preferably 1.3 ° or less, and more preferably 1.2 ° or less.

  In the second uneven surface 17A, for the same reason as described above, the inclination angle of the second uneven surface 17A with respect to the film surface in the cross section along the normal direction N of the film surface of the intermediate base film 10 is the surface. In terms of angle, it is preferable that the ratio of the region where the surface angle is 0.05 ° or more is 50% or more. Moreover, 95% or less or 90% or less may be sufficient as the upper limit of the ratio of the area | region whose surface angle is 0.05 degree or more.

  In the second uneven surface 17A, the root mean square slope RΔq of the roughness curve is preferably 0.003 or less for the same reason as described above. The lower limit of RΔq may be 0.0005 or more or 0.001 or more. Further, the upper limit of RΔq is preferably 0.0025 or less, and more preferably 0.002 or less.

  In the second uneven surface 17A, the average interval Sm of the unevenness constituting the second uneven surface 17A is preferably 0.20 mm or more and 0.60 mm or less, and is 0.22 mm or more and 0.50 mm or less. More preferably. In the second uneven surface 17A, it is preferable that the average inclination angle θa of the unevenness constituting the second uneven surface 17A is 0.01 ° or more and 0.1 ° or less, and 0.04 ° or more and 0.0. More preferably, the angle is 08 ° or less.

  In the second uneven surface 17A, the arithmetic average roughness Ra of the unevenness constituting the second uneven surface 17A is preferably 0.02 μm or more and 0.10 μm or less, and 0.04 μm or more and 0.08 μm or less. It is more preferable that In the second uneven surface 17A, the maximum height roughness Ry of the unevenness constituting the second uneven surface 17A is preferably 0.20 μm or more and 0.60 μm or less, and is preferably 0.25 μm or more and 0.40 μm. More preferably, it is as follows. In the second uneven surface 17A, the 10-point average roughness Rz of the unevenness constituting the second uneven surface 17A is preferably 0.15 μm or more and 0.50 μm or less, and is 0.18 μm or more and 0.30 μm. More preferably, it is as follows.

  In the second uneven surface 17A of the second transparent layer 17, when the value obtained by subtracting the width of the 1/2 angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less The second transparent layer 17 can be obtained by the same method as that described in the column of the first transparent layer 14. Specifically, for example, the second transparent layer 17 can be composed of the fine particles described in the column of the first transparent layer 14 and the binder resin described in the first transparent layer 14.

  The second transparent layer 17 preferably has a hard coat property. When the second transparent layer 17 has hard coat properties, the surface of the second transparent layer 17 (second uneven surface 17A) is subjected to a pencil hardness test (4. JIS K5600-5-4 (1999)). It has a hardness of “H” or higher at 9N load). For the same reason as described in the first transparent layer 14, the upper limit of the pencil hardness on the surface of the second transparent layer 17 is preferably about 4H.

  The film thickness of the second transparent layer 17 may be 5 μm or less, but when the second transparent layer 17 is provided on the other surface 13B of the transparent base material 13, Since the first transparent layer 14 is always provided on the one surface 13A, it may exceed 5 μm for the reason described above. When the film thickness of the 1st transparent layer 13 is 0.5 micrometer or more and 5.0 micrometers or less, it is preferable that the film thickness of the 2nd transparent layer 17 is 0.5 micrometer or more and 5.0 micrometers or less.

  The refractive index of the second transparent layer 17 may be 1.50 or more and 1.60 or less for the same reason as described in the column of the first transparent layer 14. The lower limit of the refractive index of the second transparent layer 17 may be 1.52 or more, and the upper limit of the refractive index of the second transparent layer 17 may be 1.56 or less. The difference in refractive index between the transparent substrate 13 and the second transparent layer 17 is preferably within 0.06, more preferably within 0.03, from the viewpoint of suppressing the interference fringes from being visually recognized. preferable. The refractive index of the second transparent layer 17 can be measured by the same method as the refractive index of the first transparent layer 14.

  In the above, the second uneven surface 17A of the second transparent layer 17 has a ratio of the region having a surface angle of 0.05 ° or more from the viewpoint of suppressing the interference fringes from being visually recognized (Requirement 1). It is preferable that the root mean square slope RΔq of the roughness curve is 0.003 or less (requirement 2). However, if the second uneven surface 17A has an uneven shape, The above requirements 1 and 2 may not be satisfied.

<First conductive layer>
The first conductive layer 12 is not particularly limited as long as it is patterned into a desired shape and has conductivity. The first conductive layer 12 is connected to a terminal portion (not shown) through an extraction pattern (not shown). The shape of the first conductive layer 12 is not particularly limited, and examples thereof include a square shape and a stripe shape. The first conductive layer 12 has a square shape as shown in FIG.

  Since the first conductive layer 12 functions as an electrode in the X direction of the touch panel sensor, the pattern shapes constituting the first conductive layer 12 are arranged in the horizontal direction as shown in FIG. In the case where one conductive layer functions as an electrode in the Y direction of the touch panel sensor, the pattern shape constituting the first conductive layer 18 is set vertically as in the laminated film 30 shown in FIGS. 4 and 5. Line up in the direction.

The first conductive layers 12 and 18 are made of a transparent conductive material. Transparent conductive materials include tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), zinc oxide, indium oxide (In ₂ O ₃ ), aluminum-doped zinc oxide (AZO), gallium-doped zinc oxide (GZO), oxidation Examples thereof include metal oxides such as tin, zinc oxide-tin oxide, indium oxide-tin oxide, and zinc oxide-indium oxide-magnesium oxide.

  Although the film thickness of the 1st conductive layers 12 and 18 is suitably set according to the specification of an electrical resistance, etc., it is preferable that they are 10 nm or more and 50 nm or less, for example.

  When the thickness of the first conductive layers 12 and 18 is not less than 10 nm and not more than 50 nm, the first conductive layers 12 and 18 are very thin, so that the first high-refractive index layer 15 and the first low-refractive index are low. The uneven shape of the first uneven surface 14 </ b> A is reflected not only on the surface of the rate layer 16 but also on the surfaces of the first conductive layers 12 and 18. Specifically, the film thickness of the first high refractive index layer 15 and the film thickness of the first low refractive index layer 16 are 200 nm or less, and the film thickness of the first conductive layers 12 and 18 is 10 nm or more and 50 nm. When the reflected light intensity on the surfaces of the first conductive layers 12 and 18 is measured under the same conditions as those described above for the reflected light intensity on the first uneven surface 14A, the first The value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surfaces of the conductive layers 12 and 18 is the reflected light on the first uneven surface 14A of the first transparent layer 14. This is almost the same value as the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angular distribution of intensity. Therefore, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surfaces of the first conductive layers 12 and 18 is 0.7 ° or more and 1.4 ° or less. In the case of the first transparent layer 14, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the first uneven surface 14 A of the first transparent layer 14 is 0.7 ° or more. It can be determined that the angle is 4 ° or less. In addition, the range such as the ratio of the region where the surface angle is 0.05 ° or more on the surface of the first conductive layers 12 and 18 is the range such as the ratio of the region where the preferable surface angle is 0.05 ° or more. The ratio of the region where the surface angle of the first uneven surface 14A is 0.05 ° or more is also the ratio of the region where the preferable surface angle is 0.05 ° or more. It can be judged that it is within the range. In this specification, the “surface of the first conductive layer” means a surface on the opposite side to the surface on the first transparent layer side (surface on the first low refractive index layer side) in the first conductive layer. means.

  The formation method of the first conductive layers 12 and 18 is not particularly limited, and a sputtering method, a vacuum evaporation method, an ion plating method, a CVD method, a coating method, a printing method, or the like can be used. Examples of a method for patterning the first conductive layer include a photolithography method.

  Instead of the first conductive layers 12 and 18 made of a transparent conductive material, the first conductive layer 19 shown in FIG. 6 and the first conductive layer 20 shown in FIG. 7 are used as the first conductive layer. May be used. The first conductive layer 19 functions as an electrode in the X direction of the touch panel sensor, and the first conductive layer 20 functions as an electrode in the Y direction of the touch panel sensor.

  The first conductive layers 19 and 20 are composed of mesh-shaped conductors 19A and 20A. The first conductive layers 19 and 20 configured from the mesh-shaped conductors 19A and 20A may include a plurality of detection patterns 19B and 20B and a plurality of dummy patterns 19C and 20C. Each of the detection patterns 19B and 20B and the dummy patterns 19C and 20C is constituted by mesh-shaped conductors 19A and 20A. The detection patterns 19B and 20B are for detecting an electromagnetic change or a change in capacitance that occurs when the external conductor approaches the touch panel sensor. The dummy patterns 19C and 20C are for preventing variation in luminance between the image light transmitted through the area where the detection patterns 19B and 20B are provided and the image light transmitted through the area where the detection patterns 19B and 20B are not provided. The first conductive layers 19 and 20 are composed of a plurality of detection patterns 19B and 20B and dummy patterns 19C and 20C, but the first conductive layer may be composed of a single detection pattern.

  The detection patterns 19B and 20B are connected to a terminal portion (not shown) through an extraction pattern (not shown), but the dummy patterns 19C and 20C are not connected to the extraction pattern and the terminal portion. Although the detection patterns 19B and 20B and the dummy patterns 19C and 20C are alternately arranged, the detection patterns 19B and 20B and the dummy patterns 19C and 20C are arranged with a predetermined interval in order to electrically insulate them. .

  The interval S between the detection patterns 19B, 20B and the dummy patterns 19C, 20C is appropriately set according to the accuracy of the method of forming the detection patterns 19B, 20B and the dummy patterns 19C, 20C, and is preferably 2 μm or more and 1000 μm or less, for example. It is preferable that they are 10 micrometers or more and 1000 micrometers or less. By setting the interval S in such a range, the electrical insulation between the detection patterns 19B and 20B and the dummy patterns 19C and 20C is ensured, and the detection patterns 19B and 20B and the dummy patterns 19C and 20C are secured. It is possible to prevent the discontinuity between the viewers from being visually recognized.

  Examples of the material constituting the conductive wires 19A and 20A include light-shielding metal materials such as silver, copper, aluminum, or alloys thereof.

  The width W of the conducting wires 19A and 20A is preferably 1 μm or more and 20 μm or less, and more preferably 2 μm or more and 15 μm or less. Thereby, the influence which conducting wire 19A, 20A has with respect to the image which an observer visually recognizes can be made low to a negligible level.

  The detection patterns 19B and 20B and the dummy patterns 19C and 20C have, for example, rectangular openings 19D and 20D formed by the conductive wires 19A and 20A. The aperture ratios of the detection patterns 19B and 20B and the dummy patterns 19C and 20C are appropriately set according to the characteristics of the image light emitted from the display device, but are in the range of 80% to 90%, for example. . Further, the arrangement pitch P of the openings 19D and 20D is appropriately set within a range of 100 μm or more and 1000 μm or less depending on the required aperture ratio and the value of the width W of the conducting wires 19A and 20A.

  The first conductive layers 19 and 20 having the detection patterns 19B and 20B and the dummy patterns 19C and 20C can be formed by, for example, the following photolithography method. First, a light-shielding conductive layer is formed on the first low-refractive index layer 16 by sputtering or the like, and then a photosensitive layer having photosensitivity with respect to light of a specific wavelength, such as ultraviolet rays, is formed on the light-shielding conductive layer. After forming a photosensitive layer on the light-shielding conductive layer, a mask is disposed on the photosensitive layer and exposed through the mask. Here, the mask has a pattern corresponding to the detection pattern and the dummy pattern, and includes a transmission part that transmits the exposure light and a shielding part that blocks the exposure light. After exposure, the photosensitive layer is developed using a developer. Thereby, a portion of the photosensitive layer that is not irradiated with the exposure light is removed, and portions corresponding to the detection pattern and the dummy pattern remain. Then, using the remaining photosensitive layer portion as a mask, the light-shielding conductive layer is etched to pattern the light-shielding conductive layer. Finally, the patterned light-shielding conductive layer is removed. Thereby, the first conductive layers 19 and 20 having the detection patterns 19B and 20B and the dummy patterns 19C and 20C can be formed.

  According to this embodiment, in the state in which the parallel light traveling in the direction inclined by 10 ° from the normal direction N of the intermediate base film 11 is irradiated to the first uneven surface 14A of the first transparent layer 14, the normal direction In the angular distribution of the reflected light intensity measured in a plane including both the N and parallel light traveling directions T, the reflected light intensity that is 1/100 or more of the highest reflected light intensity is the highest from the width of the angle range to be measured. Since the value obtained by subtracting the width of the angle region in which the reflected light intensity of 1/2 or more of the reflected light intensity is measured is 0.7 ° or more and 1.4 ° or less, for the reason described above, Generation can be suppressed and the cloudiness can be reduced. Moreover, since a cloudiness feeling can be reduced, visibility can be improved.

  Conventionally, an intermediate substrate film used for a touch panel is taken up and rolled from the viewpoint of productivity improvement at the time of molding, but a conventional hard coat layer has a high surface smoothness. When this is done, there is a problem that a phenomenon (so-called blocking) occurs in which the overlapped films adhere to each other. When such blocking occurs, the film cannot be smoothly drawn out from the roll, and in the next step, the film is wrinkled or the intermediate base film is meandered. Moreover, when blocking is remarkable, the nonuniformity was produced in the blocked place and the transparency and haze of the manufactured intermediate base film, and also optical uniformity could be impaired. In order to solve such a problem, for example, in JP-A-10-323931 and JP-A-2012-206502, fine particles are contained in the hard coat layer to form irregularities on the surface, thereby blocking resistance and easy slipping. Conventionally, methods for improving the performance have been proposed. However, since the conventional intermediate base film was formed only for the purpose of improving the blocking resistance and the slipperiness, the irregular shape on the surface of the hard coat layer can suppress the interference fringes from being visually recognized. It wasn't. This is because the intermediate substrate film in which fine particles are added to the conventional hard coat layer to improve the blocking resistance and the slipperiness is necessary to maintain the transparency and color tone of the hard coat layer. This is because the minimum irregularity shape capable of exhibiting the blocking resistance and the slipperiness is formed on the surface of the hard coat layer by considerably reducing the addition amount. That is, the surface of the hard coat layer is in a substantially flat state in which the area of the planar portion is much larger than the area of the concavo-convex portion. It was not possible to suppress the interference fringes from being visually recognized. As a result of intensive research on the uneven shape capable of suppressing the interference fringes from being visually recognized and improving the blocking resistance and the slipperiness, the present inventors have found that the angle distribution of reflected light intensity is 1/100. If the uneven surface has a value obtained by subtracting the ½ angle width from the angle width of 0.7 ° or more and 1.4 ° or less, the interference fringes can be suppressed from being visually recognized, and the blocking resistance and easy slipping can be suppressed. It was found that the property can be improved. In the present embodiment, the first uneven surface 14A has a value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity is 0.7 ° or more and 1.4 ° or less. Thus, in addition to suppressing the interference fringes from being visually recognized, blocking resistance and slipperiness can be improved.

  According to the present embodiment, when the root mean square slope RΔq of the roughness curve is 0.003 or less on the first uneven surface 14A of the first transparent layer 14, image quality deterioration is suppressed. Can do. That is, since the first transparent layer exists at a position away from the image display surface of the touch panel device, if irregularities having the same size as the conventional antiglare film are formed on the surface of the first transparent layer, The image light may be blurred due to the diffusion of the image light on the surface of one transparent layer, and image quality may be deteriorated. In contrast, in the first uneven surface 14A of the first transparent layer 14, when the root mean square slope RΔq of the roughness curve is 0.003 or less, excessive diffusion of the image light can be suppressed. Therefore, image quality deterioration can be suppressed.

  According to the present embodiment, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the second uneven surface 17A is 0.7 ° or more and 1.4 ° or less. In the case where the first transparent layer 14 has the first uneven surface 14A, the interface between the transparent substrate 13 and the second transparent layer 17 and the second transparent layer are the same as described above. The interference fringes generated by the interference with the light reflected by the surface 17 can be suppressed and the cloudiness can be reduced.

  According to the present embodiment, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the second uneven surface 17A is 0.7 ° or more and 1.4 ° or less. When it is, it can suppress that an interference fringe is visually recognized, and can further improve blocking resistance and slipperiness.

  In the present embodiment, in the angle distribution of the reflected light intensity on the first uneven surface 14A, the value obtained by subtracting the ½ angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less. An intermediate substrate film comprising a transparent substrate and a first functional layer provided on one surface of the transparent substrate, wherein the first functional layer is one of the intermediate substrate films. In the state where the first uneven surface of the first functional layer is irradiated with parallel light that has a first uneven surface forming the surface of the intermediate substrate film and travels in a direction inclined by 10 ° from the normal direction of the intermediate base film. In the angular distribution of the reflected light intensity measured in a plane including both the normal direction and the traveling direction of the parallel light, the width of the angular region in which the reflected light intensity of 1/100 or more of the maximum reflected light intensity is measured The value obtained by subtracting the width of the angle range where the reflected light intensity that is 1/2 or more of the maximum reflected light intensity is measured 0.7 ° or 1.4 ° may be less. The “functional layer” is a layer intended to exhibit some function in the intermediate base film, and specifically, for example, hard coat properties, antireflection properties, antistatic properties, or antifouling properties. The layer which exhibits the function of these is mentioned. The first functional layer may be not only a single layer but also a laminate of two or more layers. In the present embodiment, the first transparent layer 14, the first high refractive index layer 15 provided on the first transparent layer 15, and the first high refractive index layer 15 provided on the first high refractive index layer 15. The laminated body with the low refractive index layer 16 corresponds to the first functional layer, and the surface of the first low refractive index layer 16 corresponds to the first uneven surface of the first functional layer. However, the first functional layer is not limited to this, and for example, the first functional layer may be composed of only the first transparent layer 14, and in this case, the first functional layer is the first functional layer. The uneven surface is the first uneven surface 14 </ b> A of the first transparent layer 14. In addition, the first functional layer may be composed of the first transparent layer 14 and the first high refractive index layer 15 provided on the first transparent layer. The first uneven surface of the functional layer is the surface of the first high refractive index layer 15. In the angular distribution of the reflected light intensity on the first uneven surface of the first functional layer, the value obtained by subtracting the ½ angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less. For this reason, the generation of interference fringes can be suppressed and the cloudiness can be reduced. In addition, for the reasons described above, blocking resistance and slipperiness can be improved.

  When using an intermediate substrate film comprising a transparent substrate and a first functional layer provided on one surface of the transparent substrate, a second functional layer provided on the other surface of the transparent substrate. And the second functional layer has a second concavo-convex surface forming the other surface of the intermediate base film, and the parallel light traveling in the direction inclined by 10 ° from the normal direction of the intermediate base film is In the angular distribution of the reflected light intensity measured in a plane including both the normal direction and the traveling direction of the parallel light in a state where the second uneven surface of the functional layer 2 is irradiated, the highest reflected light intensity The value obtained by subtracting the width of the angle region where the reflected light intensity of 1/2 or more of the maximum reflected light intensity is subtracted from the width of the angle region where the reflected light intensity of 1/100 or more of the above is measured is 0.7 ° or more. It may be 1.4 ° or less. The second functional layer may be not only a single layer but also a laminate of two or more layers. In the present embodiment, the second transparent layer 17 corresponds to the second functional layer, and the surface of the second transparent layer 17 corresponds to the second uneven surface of the second functional layer. However, the second functional layer is not limited to this. For example, the second functional layer includes a second transparent layer 17 and a second high refractive index layer provided on the second transparent layer 17. In this case, the second uneven surface of the second functional layer is the surface of the second high refractive index layer. The second functional layer includes a second transparent layer 17, a second high refractive index layer provided on the second transparent layer 17, and a second high refractive index layer provided on the second high refractive index layer. In this case, the second uneven surface of the second functional layer is the surface of the second low refractive index layer. In the angular distribution of the reflected light intensity on the second uneven surface of the second functional layer, the value obtained by subtracting the ½ angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less. Therefore, for the reasons described above, the generation of interference fringes can be further suppressed, and the cloudiness can be further reduced. Moreover, for the reasons described above, the blocking resistance and the slipperiness can be further improved.

[Touch panel sensor]
The laminated films 10 and 30 can be used by being incorporated into a touch panel sensor, for example. FIG. 8 is a schematic configuration diagram of a touch panel sensor incorporating the laminated film according to the present embodiment, and FIG. 9 is a schematic configuration diagram of another touch panel sensor incorporating the laminated film according to the present embodiment.

  The touch panel sensor 40 shown in FIG. 8 has a structure in which the laminated film 10 and the laminated film 30 are laminated. A transparent adhesive layer 41 is provided between the laminated film 10 and the laminated film 30, and a transparent adhesive layer 42 is provided on the laminated film 10. That is, the laminated film 10 and the laminated film 30 are affixed by the transparent adhesive layer 41, and the touch panel sensor 40 can be affixed to other members by the transparent adhesive layer 42.

  The first conductive layer 12 of the laminated film 10 functions as an electrode in the X direction in the touch panel sensor 40, and the first conductive layer 18 of the laminated film 30 functions as an electrode in the Y direction in the touch panel sensor 40. Is.

  The laminated film 30 may be incorporated in the touch panel sensor of another aspect. The touch panel sensor 50 shown in FIG. 9 is provided on the laminated film 30, the first conductive layer 18 of the laminated film 30, and the patterned second conductive layer 51, the first conductive layer 18, and the second conductive layer 18. The transparent adhesive layer 52 for attaching the conductive layer 51 is provided. The second conductive layer 51 is formed on one surface of the glass plate 53, and the second conductive layer 51 and the glass plate 53 are integrated.

  The first conductive layer 18 functions as an electrode in the Y direction in the touch panel sensor 50, and the second conductive layer 51 functions as an electrode in the X direction in the touch panel sensor 50.

  The touch panel sensor 40 shown in FIG. 8 includes the first conductive layer 12 and the first conductive layer 18, but uses the first conductive layer 19 instead of the first conductive layer 12, and Instead of the conductive layer 18, the first conductive layer 20 may be used. Although the touch panel sensor 50 shown in FIG. 9 includes the first conductive layer 18 and the second conductive layer 51, the first conductive layer 20 is used instead of the first conductive layer 18, and the second conductive layer 51 is used. Instead of the conductive layer 51, the first conductive layer 19 may be used.

<Second conductive layer>
The second conductive layer 51 preferably has the same configuration as the first conductive layer 12 (film thickness, pattern shape arrangement, etc.). The second conductive layer 51 can be made of the same material as the first conductive layer 12.

<Transparent adhesive layer>
As the transparent pressure-sensitive adhesive layers 41, 42, and 52, known pressure-sensitive adhesive layers and pressure-sensitive adhesive sheets can be mentioned.

[Second Embodiment]
Hereinafter, an intermediate substrate film, a laminated film, and a touch panel sensor according to a second embodiment of the present invention will be described with reference to the drawings. FIG. 10 is a schematic configuration diagram of the intermediate base film and the laminated film according to the present embodiment. In addition, in this embodiment, the member to which the same code | symbol as the member demonstrated in 1st Embodiment is attached | subjected means that it is the same member as the member demonstrated in 1st Embodiment, and The contents overlapping with those of the first embodiment are omitted unless otherwise specified.

[Substrate film for touch panel and laminated film]
A laminated film 60 shown in FIG. 10 includes an intermediate base film 61 and a first conductive layer 12 and a second conductive layer 62 supported by the intermediate base film 61. The intermediate base film 61 is for supporting the first conductive layer 12 and the second conductive layer 62, and is provided on the transparent base 13 and the first surface 13 </ b> A of the transparent base 13. 1 transparent layer 14, a first high refractive index layer 15 provided on the first transparent layer 14, and a first low refractive index layer 16 provided on the first high refractive index layer 15. The second transparent layer 17 provided on the other surface 13B of the transparent substrate 13, the second high refractive index layer 63 provided on the second transparent layer 17, and the second high refractive index. And a second low-refractive index layer 64 provided on the layer 63. That is, the intermediate base film 61 is obtained by providing the second high refractive index layer 63 and the second low refractive index layer 64 on the second transparent layer 17 of the intermediate base film 11.

<Second high refractive index layer>
The second high refractive index layer 63 preferably has the same configuration (film thickness, refractive index, etc.) as the first high refractive index layer 15. Further, the second high refractive index layer 63 can be made of the same material as that of the first high refractive index layer 15.

  Since the second high refractive index layer 63 preferably has the same configuration as that of the first high refractive index layer 15, the film thickness of the second high refractive index layer 63 is 200 nm or less. It is preferable. When the film thickness of the second high refractive index layer 63 is 200 nm or less, the film thickness of the second high refractive index layer 63 is very thin. The uneven shape of the uneven surface 17A is reflected. Specifically, the second high refractive index layer 63 has a film thickness of 200 nm or less and the second high refractive index layer according to the same conditions as the above-described measurement conditions of the reflected light intensity on the second uneven surface 17A. When the reflected light intensity on the surface of 63 is measured, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surface of the second high refractive index layer 63 is: The value is substantially the same as the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the first uneven surface 17A of the second transparent layer 17. Therefore, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surface of the second high refractive index layer 63 is 0.7 ° or more and 1.4 ° or less. In the case of the second transparent layer 17, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the second uneven surface 17A of the second transparent layer 17 is 0.7 ° or more. It can be determined that the angle is 4 ° or less. In addition, the range of the region where the surface angle is 0.05 ° or more on the surface of the second high refractive index layer 63 is the range such as the rate of the region where the preferable surface angle is 0.05 ° or more. The ratio of the region where the surface angle of the second uneven surface 17A is 0.05 ° or more is also the ratio of the region where the preferable surface angle is 0.05 ° or more. It can be judged that it is within the range. In the present specification, the “surface of the second high refractive index layer” means a surface of the second high refractive index layer opposite to the surface on the second transparent layer side.

<Second low refractive index layer>
The second low refractive index layer 64 preferably has the same configuration (film thickness, refractive index, etc.) as the first low refractive index layer 16. The second low refractive index layer 64 can be made of the same material as the first low refractive index layer 16.

  Since the second low refractive index layer 64 preferably has the same configuration as the first low refractive index layer 16, the thickness of the second low refractive index layer 64 is 200 nm or less. It is preferable. When the film thickness of the second high refractive index layer 63 and the film thickness of the second low refractive index layer 64 are 200 nm or less, the film thicknesses of the second high refractive index layer 63 and the second low refractive index layer 64 are Since it is very thin, the uneven shape of the second uneven surface 17A is reflected not only on the surface of the second high refractive index layer 63 but also on the surface of the second low refractive index layer 64. Specifically, the film thickness of the second high refractive index layer 63 and the second low refractive index layer 64 is 200 nm or less, and the same conditions as the above measurement conditions of the reflected light intensity on the second uneven surface 17A Thus, when the reflected light intensity on the surface of the second low refractive index layer 64 is measured, the 1/100 angle width in the angular distribution of the reflected light intensity on the surface of the second low refractive index layer 64 is 1 / The value obtained by subtracting the two angle widths is substantially the same as the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the second uneven surface 17A of the second transparent layer 17. It becomes. Therefore, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surface of the second low refractive index layer 64 is 0.7 ° or more and 1.4 ° or less. In the case of the second transparent layer 17, the value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the second uneven surface 17A of the second transparent layer 17 is 0.7 ° or more. It can be determined that the angle is 4 ° or less. Further, the value of the region where the surface angle is 0.05 ° or more on the surface of the second low refractive index layer 64 is a range such as the proportion of the region where the preferable surface angle is 0.05 ° or more. The ratio of the region where the surface angle of the second uneven surface 17A is 0.05 ° or more is also the ratio of the region where the preferable surface angle is 0.05 ° or more. It can be judged that it is within the range. In this specification, the “surface of the second low refractive index layer” is opposite to the surface on the second transparent layer side (surface on the second high refractive index layer side) in the second low refractive index layer. Means the side face.

<Second conductive layer>
The second conductive layer 62 preferably has the same configuration (thickness, pattern shape arrangement, etc.) as the first conductive layer 18, and the second conductive layer 62 is the same as the first conductive layer 18. It is preferable that it is the structure of this.

  Since the second conductive layer 62 preferably has the same configuration as the first conductive layer 18, the thickness of the second conductive layer 62 is preferably 10 nm or more and 50 nm or less. When the film thickness of the second conductive layer 62 is not less than 10 nm and not more than 50 nm, the film thickness of the second conductive layer 62 is very thin, so that the second high refractive index layer 63 and the second low refractive index layer 64 The uneven shape of the second uneven surface 17 </ b> A is reflected not only on the surface but also on the surface of the second conductive layer 62. Specifically, the film thickness of the second high refractive index layer 63 and the film thickness of the second low refractive index layer 64 are 200 nm or less, and the film thickness of the second conductive layer 62 is 10 nm or more and 50 nm or less. In addition, when the reflected light intensity on the surface of the second conductive layer 62 is measured under the same conditions as the above-described measurement conditions of the reflected light intensity on the second uneven surface 17A, the surface of the second conductive layer 62 is The value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity is 1/100 in the angle distribution of the reflected light intensity on the second uneven surface 17A of the second transparent layer 17. The value is almost the same as the value obtained by subtracting the ½ angle width from the angle width. Therefore, when the value obtained by subtracting the 1/2 angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the surface of the second conductive layer 62 is 0.7 ° or more and 1.4 ° or less. The value obtained by subtracting the ½ angle width from the 1/100 angle width in the angle distribution of the reflected light intensity on the second uneven surface 17A of the second transparent layer 17 is also 0.7 ° or more and 1.4 °. It can be determined that Further, the value of the region where the surface angle on the surface of the second conductive layer 62 is 0.05 ° or more is within the range such as the proportion of the region where the preferable surface angle is 0.05 ° or more. In some cases, a value such as a ratio of a region where the surface angle of the second uneven surface 17A is 0.05 ° or more is also a value such as a ratio of a region where the preferable surface angle is 0.05 ° or more. It can be judged that it is within the range. In this specification, the “surface of the second conductive layer” refers to a surface opposite to the surface on the second transparent layer side (surface on the second low refractive index layer side) in the second conductive layer. means.

  The first conductive layer 12 functions as an electrode in the X direction in the touch panel sensor, and the second conductive layer 62 functions as an electrode in the Y direction in the touch panel sensor. The first conductive layer 19 may be used instead of the first conductive layer 12, and the first conductive layer 20 may be used instead of the second conductive layer 62.

  Since the first conductive layer 12 and the second conductive layer 62 are formed on both surfaces of the laminated film 60, they can be simultaneously patterned by a photolithography method. Therefore, in this case, the positional accuracy of the first conductive layer 12 and the second conductive layer 62 can be increased.

  According to this embodiment, in the state in which the parallel light traveling in the direction inclined by 10 ° from the normal direction N of the intermediate base film 11 is irradiated to the first uneven surface 14A of the first transparent layer 14, the normal direction In the angular distribution of reflected light intensity measured in a plane including both the N and parallel light traveling directions T, the value obtained by subtracting the ½ angle width from the 1/100 angle width is 0.7 ° or more and 1 Since the angle is 4 ° or less, the interference fringes can be suppressed from being visually recognized and the cloudiness can be reduced for the same reason as described in the first embodiment.

  According to the present embodiment, in the first uneven surface 14A of the first transparent layer 14, when the root mean square slope RΔq of the roughness curve is 0.003 or less, the first embodiment For the same reason as described, image quality degradation can be suppressed.

  When the first conductive layer 19 is used instead of the first conductive layer 12 and the first conductive layer 20 is used instead of the second conductive layer 62, the first conductive layers 19 and 20 are both meshed. Therefore, when the laminated film is wound in a roll shape, the conductor 18A and the conductor 19A come into contact with each other. Here, when the conducting wires are in contact with each other, blocking is more likely to occur than when the conducting wire is in contact with the second transparent layer (organic layer), but in the present embodiment, the first transparent layer 14 has the first thickness. In 1 uneven surface 14A, the value obtained by subtracting the 1/2 angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less, so that the blocking resistance and the slipperiness are improved. be able to. Thereby, even if it is a case where conducting wire contacts, blocking in conducting wire 19A and electroconductive 19B can be suppressed. In addition, in the second uneven surface 17A of the second transparent layer 17, when the value obtained by subtracting the 1/2 angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less. Can further suppress blocking in the conductive wire 19A and the conductive wire 19B.

  In the present embodiment, in the second uneven surface 17A of the second transparent layer 17, the value obtained by subtracting the ½ angle width from the 1/100 angle width is 0.7 ° or more and 1.4 ° or less. If there is, for the same reason as described in the first embodiment, the interface between the transparent substrate 13 and the second transparent layer 17 and the light reflected by the surface of the second transparent layer 17 The interference fringes generated by the interference can be suppressed from being visually recognized, and the cloudiness can be reduced.

[Touch panel sensor]
The laminated film 70 can be used by being incorporated into a touch panel sensor, for example. FIG. 11 is a schematic configuration diagram of a touch panel sensor incorporating the laminated film according to the present embodiment.

  The touch panel sensor 70 illustrated in FIG. 11 includes a laminated film 60 and transparent adhesive layers 71 and 72 provided on the first conductive layer 12 and the second conductive layer 62 of the laminated film 60. Although the touch panel sensor 70 includes the transparent adhesive layers 71 and 72, the laminated film 60 may be used as the touch panel sensor.

  In the touch panel sensor 70, the first conductive layer 12 and the second conductive layer 62 are used. However, the first conductive layer 19 is used instead of the first conductive layer 12, and the second conductive layer 62 is used. Instead of the first conductive layer 20, the first conductive layer 20 may be used.

<Transparent adhesive layer>
Examples of the transparent adhesive layers 71 and 72 include known pressure-sensitive adhesive layers and adhesive sheets.

  In order to describe the present invention in detail, examples will be described below, but the present invention is not limited to these descriptions.

<Preparation of composition for transparent layer>
First, each component was mix | blended so that it might become a composition shown below, and the composition for transparent layers was obtained.
(Transparent layer composition 1)
Fumed silica (octylsilane treatment, average particle diameter 12 nm, manufactured by Nippon Aerosil Co., Ltd.): 1 part by mass (Product name: UV1700B, manufactured by Nippon Synthetic Chemical Co., Ltd., weight average molecular weight 2000, functional group number 10): 40 parts by mass / polymerization initiator (Irgacure 184, manufactured by BASF Japan): 5 parts by mass / polyether-modified silicone (product name) : TSF4460, manufactured by Momentive Performance Materials Co., Ltd.): 0.025 parts by mass, toluene: 105 parts by mass, isopropyl alcohol: 30 parts by mass, cyclohexanone: 15 parts by mass Note that the fumed silica is treated with octylsilane (octyl). With silane The silanol group on the surface of the fumed silica was substituted with an octylsilyl group to make it hydrophobic.

(Transparent layer composition 2)
-Fumed silica (octylsilane treatment, average particle size 12 nm, manufactured by Nippon Aerosil Co., Ltd.) 1.5 parts by mass-Pentaerythritol tetraacrylate (PETTA) (Product name: PETA, manufactured by Daicel Cytec Co., Ltd.): 60 parts by mass-Urethane Acrylate (Product name: UV1700B, manufactured by Nippon Synthetic Chemical Co., Ltd., weight average molecular weight 2000, functional group number 10): 40 parts by mass / polymerization initiator (Irgacure 184, manufactured by BASF Japan): 5 parts by mass / polyether modified silicone (TSF4460) Momentive Performance Materials): 0.025 parts by mass Toluene: 105 parts by mass Isopropyl alcohol: 30 parts by mass Cyclohexanone: 15 parts by mass

(Transparent layer composition 3)
Fumed silica (octylsilane treatment, average particle size 12 nm, manufactured by Nippon Aerosil Co., Ltd.): 0.5 part by mass Pentaerythritol tetraacrylate (PETTA) (Product name: PETA, manufactured by Daicel Cytec Co., Ltd.): 60 parts by mass Urethane acrylate (product name: UV1700B, manufactured by Nippon Synthetic Chemical Co., Ltd., weight average molecular weight 2000, functional group number 10): 40 parts by mass / polymerization initiator (Irgacure 184, manufactured by BASF Japan): 5 parts by mass / polyether-modified silicone ( Product name: TSF4460, manufactured by Momentive Performance Materials, Inc.): 0.025 parts by mass, toluene: 105 parts by mass, isopropyl alcohol: 30 parts by mass, cyclohexanone: 15 parts by mass

(Composition 4 for transparent layer)
Pentaerythritol tetraacrylate (PETTA) (Product name: PETA, manufactured by Daicel Cytec): 60 parts by mass Urethane acrylate (Product name: UV1700B, manufactured by Nippon Synthetic Chemical Co., Ltd., weight average molecular weight 2000, functional group number 10): 40 Mass parts / polymerization initiator (Irgacure 184, manufactured by BASF Japan): 5 mass parts / polyether-modified silicone (TSF4460, manufactured by Momentive Performance Materials): 0.025 mass parts / Toluene: 105 mass parts / isopropyl Alcohol: 30 parts by massCyclohexanone: 15 parts by mass

(Composition 5 for transparent layer)
Organic fine particles (hydrophilic treatment acrylic-styrene copolymer particles, average particle size 2.0 μm, refractive index 1.55, manufactured by Sekisui Plastics Co., Ltd.): 3 parts by mass Fumed silica (methylsilane treatment, average particle size 12 nm, manufactured by Nippon Aerosil Co., Ltd .: 1 part by mass, pentaerythritol tetraacrylate (PETTA) (product name: PETA, manufactured by Daicel Cytec): 60 parts by mass, urethane acrylate (product name: UV1700B, manufactured by Nippon Synthetic Chemical Co., Ltd.) Weight average molecular weight 2000, functional group number 10): 40 parts by mass Polymerization initiator (Irgacure 184, manufactured by BASF Japan): 5 parts by mass Polyether-modified silicone (TSF4460, manufactured by Momentive Performance Materials): 0. 025 parts by mass, toluene: 105 parts by mass, isopropyl alcohol 30 parts by weight Cyclohexanone: 15 parts by weight

(Composition 6 for transparent layer)
Organic fine particles (non-hydrophilic treatment acrylic-styrene copolymer particles, average particle size 3.5 μm, refractive index 1.55, manufactured by Sekisui Plastics Co., Ltd.): 8 parts by mass Pentaerythritol triacrylate (PETA) (Product Name: PETIA, manufactured by Daicel-Cytec): 80 parts by mass, isocyanuric acid EO-modified triacrylate (product name: M-315, manufactured by Toagosei Co., Ltd.): 20 parts by mass, polymerization initiator (Irgacure 184, manufactured by BASF Japan) ): 5 parts by mass-polyether-modified silicone (TSF4460, manufactured by Momentive Performance Materials): 0.025 parts by mass-Toluene: 120 parts by mass-cyclohexanone: 30 parts by mass

<Preparation of composition for high refractive index layer>
Each component was mix | blended so that it might become a composition shown below, and the composition for high refractive index layers was obtained.
(Composition for high refractive index layer)
Pentaerythritol triacrylate (PETA) (Product name: PETIA, manufactured by Daicel Cytec): 0.8 part by mass High-refractive index zirconia particles (Product name: MZ-230X, manufactured by Sumitomo Osaka Cement): 4 parts by mass -Polymerization initiator (Irgacure 127, manufactured by BASF Japan): 0.05 parts by mass-Leveling agent (Daiichi Seika Kogyo Co., Ltd., Seika Beam 10-28 (MB)) 0.02 parts by mass- Methyl ethyl ketone (MEK): 38 Parts by mass, methyl isobutyl ketone (MIBK): 38 parts by mass, cyclohexanone: 20 parts by mass

<Preparation of composition for low refractive index layer>
Each component was mix | blended so that it might become the composition shown below, and the composition for low refractive index layers was obtained.
(Composition for low refractive index layer)
Pentaerythritol triacrylate (PETA) (product name: PETIA, manufactured by Daicel-Cytec): 0.6 parts by mass Low-refractive index silica particles (manufactured by Nissan Chemical Industries, MIBK-ST, solid content 30%): 2. 0 parts by mass / polymerization initiator (Irgacure 127, manufactured by BASF Japan): 0.08 parts by mass / leveling agent (manufactured by Dainichi Seika Kogyo Co., Ltd., Seika Beam 10-28 (MB)) 0.02 parts by mass / methyl isobutyl ketone (MIBK): 76 parts by massCyclohexanone: 20 parts by mass

<Example 1>
A 100 μm thick polyethylene terephthalate substrate (product name: A4300, manufactured by Toyobo Co., Ltd.) as a transparent substrate is prepared, and the transparent layer composition 1 is applied to one side of the polyethylene terephthalate substrate to form a coating film. did. Next, 70 ° C. dry air was passed through the formed coating film at a flow rate of 0.2 m / s for 15 seconds, and then 70 ° C. dry air was passed through for 30 seconds at a flow rate of 10 m / s. By evaporating, the solvent in the coating film is evaporated, and the coating film is cured by irradiating ultraviolet rays under a nitrogen atmosphere (oxygen concentration of 200 ppm or less) so that the integrated light quantity becomes 100 mJ / cm ^2. A transparent layer (at the time of curing) was formed to produce an intermediate substrate film according to Example 1.

<Example 2>
In Example 2, an intermediate substrate film was produced in the same manner as in Example 1 except that the transparent layer composition 2 was used instead of the transparent layer composition 1.

<Example 3>
In Example 3, an intermediate substrate film was produced in the same manner as in Example 1 except that the cumulative amount of ultraviolet light was 50 mJ / cm ² .

<Example 4>
In Example 4, an intermediate substrate film was produced in the same manner as in Example 3 except that the transparent layer composition 2 was used instead of the transparent layer composition 1.

<Example 5>
In Example 5, an intermediate substrate film was produced in the same manner as in Example 1 except that the transparent layer composition 3 was used instead of the transparent layer composition 1.

<Comparative Example 1>
In Comparative Example 1, an intermediate substrate film was produced in the same manner as in Example 1 except that the transparent layer composition 4 was used instead of the transparent layer composition 1.

<Comparative example 2>
In Comparative Example 2, an intermediate substrate film was produced in the same manner as in Example 1 except that the transparent layer composition 5 was used instead of the transparent layer composition 1.

<Comparative Example 3>
In Comparative Example 3, an intermediate base material was prepared in the same manner as in Example 1 except that the transparent layer composition 6 was used in place of the transparent layer composition 1 and the thickness of the transparent layer upon curing was 5 μm. A film was prepared.

<Measurement of angular distribution of reflected light intensity>
In order to prevent back surface reflection via a transparent adhesive on the surface opposite to the surface on which the transparent layer is formed in the polyethylene terephthalate substrate of each intermediate substrate film obtained in Examples and Comparative Examples. A black acrylic plate was attached as a sample. The sample was placed on a variable angle photometer (model number: GP-200, manufactured by Murakami Color Research Laboratory Co., Ltd.) with the transparent layer side facing the light source, and the angular distribution of reflected light intensity was measured under the following conditions.
Incident angle: 10 °
Tilt angle: 0 °
Light receiving range: 5 ° to 15 ° (regular reflection direction ± 5 °), data interval: 0.1 °
VS1 (beam stop): 0.5
VS3 (light receiving stop): 4.0
In addition, FIG. 12 is a graph showing the angle distribution of the reflected light intensity of the intermediate base film according to Examples 1, 2, 5 and Comparative Examples 1-3.

  Then, using the obtained angular distribution of reflection intensity, 1/100 angle width and 1/2 angle width were obtained, and a value obtained by subtracting 1/2 angle width from 1/100 angle width was obtained.

<Measurement of surface angle and root mean square slope RΔq>
The surface of each intermediate substrate film obtained in the Examples and Comparative Examples was attached to a glass plate through a transparent adhesive on the surface opposite to the surface on which the transparent layer was formed. (New View 6300, manufactured by Zygo) was used to measure and analyze the surface shape of the optical film under the following conditions. The analysis software used was MicroScope Application 8.3.2 Microscope Application.

[Measurement condition]
Objective lens: 2.5 times Zoom: 2 times Data points: 992 × 992 points Resolution (interval per point): 2.2 μm

[Analysis conditions]
Removed: None
Filter: HighPass
FilterType: GaussSpline
Low wavelength: 300 μm
Under the above conditions, a concavo-convex shape from which a swell component is removed can be obtained with a high-pass filter having a cutoff value of 300 μm.
Remove spikes: on
Spike Height (xRMS): 2.5
Spike-like noise can be removed under the above conditions.

  Next, the above-mentioned analysis software (MetroPro 8.3.2-Microscope Application) displayed a SlopeX MAP screen (display of the inclination in the x direction) to display rms. This rms corresponds to the root mean square slope RΔq.

Further, the slope Δi of each point over the entire surface is obtained, the slope Δi is converted into the surface angle θ _i by the above equation (3), and from there, the absolute value of the surface angle θ _i is 0.05 ° or more. The percentage of was calculated.

<Measurement of Sm, θa, Ra, Ry, and Rz>
Sm, θa, Ra, Ry, and Rz were measured on the surface of the transparent layer of each intermediate substrate film obtained in the examples and comparative examples. The definitions of Sm, Ra, Ry and Rz shall be in accordance with JIS B0601-1994, and θa shall follow the surface roughness measuring instrument: SE-3400 / Kosaka Laboratory Co., Ltd. instruction manual (revised 1995.07.20). Shall.

Specifically, Sm, θa, Ra, Ry, and Rz were measured under the following measurement conditions using a surface roughness measuring instrument (model number: SE-3400 / manufactured by Kosaka Laboratory Ltd.).
1) Stylus of surface roughness detector (trade name SE2555N (2μ standard) manufactured by Kosaka Laboratory Ltd.)
・ Tip radius of curvature 2μm, apex angle 90 degrees, material diamond 2) Measurement conditions of surface roughness measuring instrument ・ Reference length (cutoff value λc of roughness curve): 2.5 mm
Evaluation length (reference length (cutoff value λc) × 5): 12.5 mm
・ Feeding speed of stylus: 0.5mm / s
・ Preliminary length: (cutoff value λc) × 2
・ Vertical magnification: 2000 times ・ Horizontal magnification: 10 times

<Interference fringe observation evaluation>
In order to prevent back surface reflection via a transparent adhesive on the surface opposite to the surface on which the transparent layer is formed in the polyethylene terephthalate substrate of each intermediate substrate film obtained in Examples and Comparative Examples. A black acrylic plate was attached, each optical film was irradiated with light from the transparent layer side, and observed visually. As a light source, an interference fringe inspection lamp (sodium lamp) manufactured by Funatech was used. The occurrence of interference fringes was evaluated according to the following criteria.
(Double-circle): The interference fringe was not confirmed.
○: Interference fringes were slightly confirmed, but were at a level with no problem.
X: Interference fringes were clearly confirmed.

<Observation evaluation of cloudiness>
In each of the intermediate substrate films obtained in Examples and Comparative Examples, a black acrylic plate is pasted on the surface opposite to the surface on which the transparent layer is formed in the polyethylene terephthalate substrate through a transparent adhesive, and a dark room The white turbidity was observed under a table lamp (three-wavelength fluorescent lamp tube) and evaluated according to the following criteria.
○: Whiteness was not observed.
X: Whiteness was observed.

<Evaluation of blocking properties>
Each of the intermediate substrate films obtained in Examples and Comparative Examples, and each of the high refractive index layers having a film thickness of 100 nm formed on the transparent layers of Examples and Comparative Examples using the high refractive index layer composition. A high refractive index layer having a film thickness of 50 nm and a film thickness of 50 nm using the above composition for high refractive index layer and the above composition for low refractive index layer on each transparent layer of the intermediate substrate film, Examples and Comparative Examples. A film thickness of 50 nm using the above composition for high refractive index layer and the above composition for low refractive index layer on each of the intermediate substrate films in which the low refractive index layers are sequentially laminated, and each transparent layer of Examples and Comparative Examples. Each laminated film in which a high refractive index layer and a low refractive index layer having a film thickness of 40 nm are sequentially laminated, and a conductive layer made of tin-doped indium oxide is formed on the low refractive index layer, and Examples And the composition for a high refractive index layer on each transparent layer of the comparative example and the above A high refractive index layer having a thickness of 50 nm and a low refractive index layer having a thickness of 40 nm were sequentially laminated using the composition for refractive index layer, and a conductive layer made of a copper mesh was formed on the low refractive index layer. Each laminated film was evaluated for blocking properties. Evaluation of the blocking property is performed by using a blocking tester in a state in which each film is cut out in a size of 5 cm × 5 cm, and the same film is overlapped so that the surfaces on the transparent layer side are in contact with each other. The pressure condition was 3.0 kgf / cm ² , the test area was 3 cmφ, the wet temperature condition was 40 ° C., 90% RH, and 30 hours, and the blocking state was judged visually. The high refractive index layer and the low refractive index layer were formed by irradiating the coating film of the high refractive index layer composition and the low refractive index layer composition with ultraviolet rays and curing. The formation conditions of the high refractive index layer and the like were the same for all intermediate substrate films.

<Ease of slipperiness>
Each of the intermediate substrate films obtained in Examples and Comparative Examples, and each of the high refractive index layers having a film thickness of 100 nm formed on the transparent layers of Examples and Comparative Examples using the high refractive index layer composition. A high refractive index layer having a film thickness of 50 nm and a film thickness of 50 nm using the above composition for high refractive index layer and the above composition for low refractive index layer on each transparent layer of the intermediate substrate film, Examples and Comparative Examples. A film thickness of 50 nm using the above composition for high refractive index layer and the above composition for low refractive index layer on each of the intermediate substrate films in which the low refractive index layers are sequentially laminated, and each transparent layer of Examples and Comparative Examples. Each laminated film in which a high refractive index layer and a low refractive index layer having a film thickness of 40 nm are sequentially laminated, and a conductive layer made of tin-doped indium oxide is formed on the low refractive index layer, and Examples And the composition for a high refractive index layer on each transparent layer of the comparative example and the above A high refractive index layer having a thickness of 50 nm and a low refractive index layer having a thickness of 40 nm were sequentially laminated using the composition for refractive index layer, and a conductive layer made of a copper mesh was formed on the low refractive index layer. In each laminated film, the slipperiness was evaluated. The evaluation of slipperiness was performed by rubbing the surfaces on the transparent layer side of the film using two identical films and confirming slipperiness. The high refractive index layer and the low refractive index layer were formed by irradiating the coating film of the high refractive index layer composition and the low refractive index layer composition with ultraviolet rays and curing. The formation conditions of the high refractive index layer and the like were the same for all intermediate substrate films.

The results are shown in Table 1.

  As shown in Table 1, in Comparative Examples 1 to 3, the value obtained by subtracting the 1/2 angle width from the 1/100 angle width does not satisfy the requirement of 0.7 ° or more and 1.4 ° or less. Either interference fringes or cloudiness was observed. On the other hand, as shown in Table 1, in Examples 1 to 5, the value obtained by subtracting the 1/2 angle width from the 1/100 angle width satisfies the requirement of 0.7 ° or more and 1.4 ° or less. However, the interference fringes were not confirmed, or the interference fringes were slightly confirmed, but they were at a satisfactory level and no cloudiness was observed.

  Each intermediate substrate film in which a high refractive index layer having a film thickness of 100 nm is formed on each transparent layer of Examples and Comparative Examples using the above composition for high refractive index layer, on each transparent layer of Examples and Comparative Examples Each intermediate substrate film in which a high refractive index layer having a thickness of 50 nm and a low refractive index layer having a thickness of 50 nm are sequentially laminated using the composition for high refractive index layer and the composition for low refractive index layer, A high refractive index layer having a film thickness of 50 nm and a low refractive index layer having a film thickness of 40 nm using the above composition for high refractive index layer and the above composition for low refractive index layer on each transparent layer of Examples and Comparative Examples. And a laminated film in which a conductive layer made of tin-doped indium oxide having a thickness of 20 nm is formed on the low refractive index layer, and the high refractive index layer on each transparent layer of Examples and Comparative Examples. Using the composition and the composition for a low refractive index layer, a high refractive index with a film thickness of 50 nm In each laminated film in which a refractive index layer and a low refractive index layer having a film thickness of 40 nm are sequentially laminated, and a conductive layer made of a copper mesh is formed on the low refractive index layer, the surface angle on the surface of each film is 0.05. When the ratio of the region which is at least ° and the root mean square slope RΔq of the roughness curve were determined by the same method as described above, the values in the intermediate substrate films according to Examples and Comparative Examples (described in Table 1) Value) and the observation results of interference fringes and white turbidity were the same as the results of the intermediate substrate films according to the examples and comparative examples. The high refractive index layer and the low refractive index layer were formed by irradiating the coating film of the high refractive index layer composition and the low refractive index layer composition with ultraviolet rays and curing. The formation conditions of the high refractive index layer and the like were the same for all intermediate substrate films.

  In the intermediate substrate film according to the comparative example and the intermediate substrate film or laminated film in which the high refractive index layer or the like is formed on the transparent layer according to the comparative example, the sticking between the films occurred, so that the blocking resistance was In addition, the slipperiness between the films was also inferior, so the slipperiness was also inferior. On the other hand, in the intermediate base film according to the example and the intermediate base film or laminated film in which the high refractive index layer or the like is formed on the transparent layer according to the example, the sticking between the films does not occur. Therefore, the anti-blocking property was excellent, and the slipperiness between the films was also good, so that the slipperiness was also excellent.

DESCRIPTION OF SYMBOLS 10, 30, 60 ... Laminated film 11, 61 ... Intermediate base film 12, 18-20 ... 1st conductive layer 13 ... Transparent base material 14 ... 1st transparent layer 14A ... 1st uneven surface 15 ... 1st High refractive index layer 16 ... first low refractive index layer 17 ... second transparent layer 17A ... second uneven surface 40, 50, 70 ... touch panel sensor 51, 62 ... second conductive layer

Claims (18)

An intermediate substrate film for a touch panel for supporting a patterned conductive layer,
Laminating a first transparent layer on one side of the transparent substrate;
The first transparent layer has a first uneven surface on the side opposite to the transparent substrate side,
The normal direction and the traveling direction of the parallel light in a state where the first uneven surface of the first transparent layer is irradiated with parallel light traveling in a direction inclined by 10 ° from the normal direction of the intermediate base film. In the angular distribution of the reflected light intensity measured in a plane including both directions, the reflected light intensity of 1/100 or more of the maximum reflected light intensity is 1/2 or more of the maximum reflected light intensity from the width of the angle range where the reflected light intensity is measured. An intermediate substrate film, wherein a value obtained by subtracting the width of an angle region in which the reflected light intensity is measured is 0.7 ° or more and 1.4 ° or less.   The intermediate base film according to claim 1, wherein a first high refractive index layer having a higher refractive index than the refractive index of the first transparent layer is further laminated on the first transparent layer.   In a state where the surface of the first high refractive index layer is irradiated with parallel light traveling in a direction inclined by 10 ° from the normal direction of the intermediate base film, both the normal direction and the traveling direction of the parallel light are In the angular distribution of the reflected light intensity measured in the plane including the reflected light that is 1/2 or more of the maximum reflected light intensity from the width of the angle range in which the reflected light intensity of 1/100 or more of the maximum reflected light intensity is measured The intermediate substrate film according to claim 2, wherein a value obtained by subtracting the width of the angular region where the strength is measured is 0.7 ° or more and 1.4 ° or less.   4. The intermediate according to claim 2, wherein a first low refractive index layer having a refractive index lower than that of the first high refractive index layer is further laminated on the first high refractive index layer. Base film.   In a state where the surface of the first low refractive index layer is irradiated with parallel light traveling in a direction inclined by 10 ° from the normal direction of the intermediate base film, both the normal direction and the traveling direction of the parallel light are In the angular distribution of the reflected light intensity measured in the plane including the reflected light that is 1/2 or more of the maximum reflected light intensity from the width of the angle range in which the reflected light intensity of 1/100 or more of the maximum reflected light intensity is measured The intermediate substrate film according to claim 4, wherein a value obtained by subtracting the width of the angle region where the strength is measured is 0.7 ° or more and 1.4 ° or less.   The second transparent layer is further laminated on the other surface of the transparent base material, and the second transparent layer has a second uneven surface on the side opposite to the transparent base material side. The intermediate base film according to any one of the above.   The normal direction and the traveling direction of the parallel light in a state in which the second uneven surface of the second transparent layer is irradiated with parallel light traveling in a direction inclined by 10 ° from the normal direction of the intermediate base film. In the angular distribution of the reflected light intensity measured in a plane including both directions, the reflected light intensity of 1/100 or more of the maximum reflected light intensity is 1/2 or more of the maximum reflected light intensity from the width of the angle range where the reflected light intensity is measured. The intermediate substrate film according to claim 6, wherein a value obtained by subtracting a width of an angle region in which the reflected light intensity is measured is 0.7 ° or more and 1.4 ° or less.   The intermediate base film according to claim 6 or 7, wherein a second high refractive index layer having a refractive index higher than that of the second transparent layer is further laminated on the second transparent layer.   In a state where the surface of the second high refractive index layer is irradiated with parallel light traveling in a direction inclined by 10 ° from the normal direction of the intermediate base film, both the normal direction and the traveling direction of the parallel light are In the angular distribution of the reflected light intensity measured in the plane including the reflected light that is 1/2 or more of the maximum reflected light intensity from the width of the angle range in which the reflected light intensity of 1/100 or more of the maximum reflected light intensity is measured The intermediate substrate film according to claim 8, wherein a value obtained by subtracting the width of the angle region in which the strength is measured is 0.7 ° or more and 1.4 ° or less.   10. The intermediate according to claim 8, wherein a second low refractive index layer having a lower refractive index than the refractive index of the second high refractive index layer is further laminated on the second high refractive index layer. Base film.   In a state where the surface of the second low refractive index layer is irradiated with parallel light traveling in a direction inclined by 10 ° from the normal direction of the intermediate base film, both the normal direction and the traveling direction of the parallel light are In the angular distribution of the reflected light intensity measured in the plane including the reflected light that is 1/2 or more of the maximum reflected light intensity from the width of the angle range in which the reflected light intensity of 1/100 or more of the maximum reflected light intensity is measured The intermediate substrate film according to claim 10, wherein a value obtained by subtracting the width of the angular region in which the strength is measured is 0.7 ° or more and 1.4 ° or less.   The intermediate substrate film according to any one of claims 1 to 11, wherein the first transparent layer and / or the second transparent layer contains fine particles and a binder resin.   The intermediate substrate film according to claim 12, wherein the fine particles are inorganic oxide fine particles.   The intermediate substrate film according to claim 13, wherein the inorganic oxide fine particles are inorganic oxide fine particles having a surface hydrophobized.   The inorganic oxide fine particles form aggregates in the first transparent layer and / or the second transparent layer, and an average particle diameter of the aggregates is 100 nm or more and 2.0 μm or less. The intermediate substrate film according to 13. The intermediate substrate film according to any one of claims 1 to 15,
A laminated film for a touch panel, comprising a laminated first conductive layer supported and patterned on the surface of the intermediate base film on the first transparent layer side. The intermediate substrate film according to any one of claims 6 to 15,
A first conductive layer supported and patterned on the first transparent layer side surface of the intermediate substrate film;
The laminated film for touch panels which laminated | stacked the 2nd conductive layer supported and patterned by the surface by the side of the 2nd transparent layer in the said intermediate | middle base film.   A touch panel sensor comprising the laminated film according to claim 16.