JP2015010900A - Aligning device, vacuum device, and aligning method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain clear images of alignment marks.SOLUTION: Alignment is achieved by imaging a calibration mark 30c on a calibration plate 26c while the calibration plate 26c is being shifted in relative terms between the calibration plate 26c and an imaging device 14 in a direction normal to the calibration plate 26c; measuring the distance between, and the shifting directions of, the respective center points 9and 9of the image of an outside white boundary line 6and that of an inside white boundary line 6in the calibration mark 30c; figuring out the inclination angle θ and the inclining direction between the shifting direction of the calibration plate 26c and an optical axis 3; so making correction as to reduce the inclination angle θ to zero; figuring out the position of a focusing face 35 from a relative position where the magnitude of the boundary line 6or 6gives an extreme value when the calibration plate 26c and the imaging device 14 have shifted in relative terms; and arranging a processing plate and a mask within the range of the field depth.

Description

  The present invention relates to an alignment technique, and more particularly to a technique for clearly imaging an alignment mark.

  As a method of forming a patterned thin film on the surface of the substrate, a thin film is uniformly formed on the entire surface of the substrate, then a resist film is formed on the surface, and the thin film exposed under the opening of the resist film is removed by etching. A method of obtaining a thin film of the pattern (etching method) and a shadow mask having through holes of a predetermined pattern formed on the substrate surface are arranged, and the through holes are passed through the fine particles of the film forming material, and the pattern of the through holes is followed. There are a method for obtaining a thin film (shadow mask method) and a method for obtaining a patterned thin film by discharging droplets of a film forming material and landing on a desired position on a substrate (inkjet method).

The shadow mask method requires maintenance of the shadow mask, but does not require an etching process, and thus is particularly suitable for a substrate whose surface is damaged by an etching solution.
In the shadow mask method, it is said that the accuracy of the pattern to be formed is limited to 130 ppi (pixel per inch). However, in recent organic EL displays used for mobile displays, high definition of 300 to 400 ppi or more is required. Therefore, the alignment accuracy between the substrate and the shadow mask is required to be within 1 μm.

  By the way, when aligning the substrate and the shadow mask, the light reflected by the alignment pattern is incident on the imaging device, optically processed by the lens device inside the imaging device, and an enlarged image is formed on the imaging device. The imaging result converted into the electrical signal is analyzed by a computer and moved so that the substrate and the shadow mask are in a predetermined positional relationship.

  In general, in a lens apparatus, it is possible to obtain a clear image by focusing on an imaging target located within the range of depth of field (depth range) of the lens apparatus, and the boundary of the image is clear. Therefore, highly accurate alignment can be performed.

  However, since the substrate and the shadow mask are relatively moved during alignment, the alignment mark on the substrate and the alignment mark on the shadow mask are separated in the depth direction of the depth of field, It is difficult to place both alignment marks within the depth of field. Therefore, a clear image cannot be obtained, and it is difficult to perform accurate alignment.

JP 2003-306761 A

  The present invention is an invention that solves the above-mentioned problems of the prior art, and provides a technique for obtaining a position where a clear image can be obtained and performing accurate alignment.

In the case where the shape of the imaging target is planar, there is no image distortion and a clear image can be obtained when the surface of the imaging target is perpendicular to the optical axis of the imaging device.
In addition, the imaging device has a focusing plane within the depth of field where the imaging target can be captured most clearly, and the closer the alignment mark is positioned to the focusing plane, the clearer the image. Can be obtained.

In the present invention, a calibration mark having a flat surface is used to determine the tilt angle of the optical axis and the position of the focal plane, the tilt angle of the optical axis is corrected, and the substrate alignment mark and the mask alignment are corrected. The mark is adjusted so that it is arranged at the position of the in-focus surface or a position close to the in-focus surface, and in the present invention, the housing and the mask provided with the mask alignment mark are disposed on the housing. A mask placement portion, a substrate placement portion provided on the housing and disposed so that a processing substrate on which a substrate alignment mark is formed faces the mask placed on the mask placement portion, and the mask placement portion And an arrangement moving device for moving the moving target device with respect to the housing, when one is a moving target device and the other is a stationary target device. An imaging device for imaging the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit and obtaining an imaging result for alignment, and for the alignment A control device to which an imaging result is input, and the control device makes the image of the mask and the image of the processing substrate from the imaging result for alignment while the stationary target device is stationary with respect to the housing. Is an alignment device that operates the alignment moving device and moves the moving target device so that the stationary target device and the imaging device are moved relative to each other. A calibration moving device, and a white portion where light is incident on the imaging device and a black portion where light is not incident on the imaging device with the white portion outside. A calibration board provided with an angle calibration mark having an annular first boundary line in contact and an annular second boundary line in which the white part and the black part are adjacent to each other with the white part inside. Arranged in the target device, the control device moves the stationary target device and the imaging device in a direction perpendicular to a main arrangement plane on which the angle calibration mark is located by the calibration moving device. An angle calibration imaging procedure for obtaining an angle calibration imaging result by imaging the angle calibration mark by the imaging device while relatively moving, and a center of the image of the first boundary line included in the angle calibration imaging result A separation distance and a separation direction between the first center point that is the second center point and the second center point that is the center of the image of the second boundary line, the stationary target device in the angle calibration imaging procedure, and the Movement distance and movement relative to the imaging device And an angle calculation procedure for determining an inclination angle and an inclination direction formed by the optical axis of the imaging apparatus and the main arrangement surface from the direction.
Further, the present invention is an alignment device, wherein at least one of the first and second boundary lines is a position calibration mark, and the control device is connected to the stationary object device by the calibration moving device. A position calibration imaging procedure for obtaining a position calibration imaging result by imaging the position calibration mark by the imaging device while moving the imaging device relative to a direction perpendicular to the main arrangement surface, and the position Based on the size of the image of the position calibration mark included in the calibration imaging result and the relative movement distance and direction of the stationary target device and the imaging device in the position calibration imaging procedure, the position calibration mark The position adjustment device stores a distance calculation procedure for obtaining a relative positional relationship between the stationary target device and the imaging device when the size of an image is an extreme value.
Moreover, this invention is an alignment apparatus, Comprising: Said 1st, 2nd boundary line is a circular alignment apparatus from which a radius differs, and is an alignment apparatus arrange | positioned concentrically.
Further, the present invention is an alignment apparatus, wherein a center of gravity of the image of the first boundary line is set as the first center point, and a center of gravity of the image of the second boundary line is set as the second center point. Is an alignment device.
In addition, the present invention includes any one of the alignment apparatuses described above, and the housing includes a vacuum chamber in which a vacuum atmosphere is formed, and the mask placement unit and the substrate placement unit are the vacuum chambers. It is the vacuum device arrange | positioned inside.
Further, the present invention is a vacuum apparatus, wherein a film forming source is arranged inside the vacuum chamber, and the thin film material discharged from the film forming source passes through the opening of the mask arranged in the mask arranging unit. A vacuum apparatus configured to pass through and reach a surface of the processing substrate disposed in the substrate placement portion.
Further, the present invention provides a main placement step of placing a mask on which a mask alignment mark is formed in a mask placement portion, and placing a processing substrate on which a substrate alignment mark is formed in a substrate placement portion, and the mask placement portion. The mask alignment mark of the mask and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit are imaged by an imaging device to obtain an imaging result for alignment, and the mask arrangement unit And one of the substrate placement portions and the other is a stationary target device, the image of the mask alignment mark and the image of the substrate alignment mark are determined to have a predetermined relative relationship from the alignment imaging result. The moving target device is moved relative to the stationary target device so that the positional relationship is An alignment method comprising: a white part that allows light to enter the imaging device; and a black part that does not allow light to enter the annular first boundary line adjacent to the white part on the outside; and the white part Calibration placement step in which a calibration board provided with an angle calibration mark having an annular second boundary line in which the white portion and the black portion are adjacent to each other is provided on the stationary target device, and the stationary The angle calibration mark is imaged by the imaging device while the target device and the imaging device are moved relative to each other in a direction perpendicular to the main arrangement plane on which the angle calibration mark is located. An angle calibration imaging step for obtaining an imaging result; a first center point that is a center of the image of the first boundary line included in the angle calibration imaging result; and a center of the image of the second boundary line. With a second center point The optical axis of the imaging device and the main arrangement surface are formed by a separation distance and a separation direction of the imaging device, and a relative movement distance and a movement direction of the stationary target device and the imaging device in the angle calibration imaging process. An angle calculation step for obtaining an inclination angle and an inclination direction, and before the positioning step, the inclination angle is perpendicular to the inclination angle and the inclination direction obtained in the angle calculation step. And an angle correction step of relatively moving the imaging device and the stationary target device.
Further, the present invention is an alignment method, wherein at least one of the first and second boundary lines is a position calibration mark, and after the angle correction step and before the alignment step, the stationary object A position calibration imaging step of imaging the position calibration mark by the imaging device to obtain a position calibration imaging result while moving the device and the imaging device relatively in a direction perpendicular to the main arrangement surface; From the relationship between the size of the image of the position calibration mark included in the position calibration imaging result, the relative movement amount and the movement direction of the stationary target device and the imaging device in the position calibration imaging step, A distance calculation step for obtaining a relative positional relationship between the stationary object device and the imaging device when the size of the image of the position calibration mark is an extreme value, and the positional relationship obtained in the distance calculation step Or A position correcting step of positioning the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit within a range of depth of field. And an alignment method.
In addition, the present invention is an alignment method, wherein the first and second boundary lines are circular with different radii and are arranged concentrically.
Further, the present invention provides a housing, a mask placement portion provided on the housing, on which a mask on which a mask alignment mark is formed is placed, a processing substrate on which the substrate alignment mark is formed and disposed in the housing. Of the substrate placement unit arranged to face the mask placed in the mask placement unit, and one of the mask placement unit and the substrate placement unit as a movement target device, the other as a stationary target device, An alignment moving device that moves the device to be moved relative to the housing; the mask alignment mark of the mask arranged in the mask arrangement portion; and the substrate of the processing substrate arranged in the substrate arrangement portion. An imaging device that captures an alignment mark and obtains an alignment imaging result, and the alignment imaging result is input The control device is configured to determine a predetermined distance between the mask image and the processing substrate image based on the alignment imaging result while the stationary target device is stationary with respect to the housing. An alignment device that operates the alignment moving device to move the moving target device so that the positional relationship is satisfied, and includes a calibration moving device that relatively moves the stationary target device and the imaging device. A calibration board provided with a position calibration mark having an annular boundary line between the white part and the black part, which are adjacent to each other, among a white part that has light incident on the imaging device and a black part that does not enter the imaging device Is arranged in the stationary target device, and the control device moves the stationary target device and the imaging device to a sub-placement surface which is a plane on which the position calibration mark is located by the calibration moving device. A position calibration imaging procedure for obtaining a position calibration imaging result by imaging the position calibration mark by the imaging device while relatively moving in the vertical direction, and the position calibration mark included in the position calibration imaging result. When the size of the image of the position calibration mark becomes an extreme value from the size of the image and the relative moving distance and moving direction of the stationary target device and the imaging device in the position calibration imaging procedure. And a distance calculating procedure for determining a relative positional relationship between the stationary object device and the imaging device.
Further, the present invention is an alignment apparatus, wherein the boundary line of the position calibration mark is a circular alignment apparatus.
In addition, the present invention includes any one of the alignment apparatuses described above, and the housing includes a vacuum chamber in which a vacuum atmosphere is formed, and the mask placement unit and the substrate placement unit are the vacuum chambers. It is the vacuum device arrange | positioned inside.
Further, the present invention is a vacuum apparatus, wherein a film forming source is disposed in the vacuum chamber, and the thin film material discharged from the film forming source passes through a through-hole of the mask disposed in the mask arranging portion. A vacuum apparatus configured to pass through and reach a surface of the processing substrate disposed in the substrate placement portion.
Further, the present invention provides a main placement step of placing a mask on which a mask alignment mark is formed in a mask placement portion, and placing a processing substrate on which a substrate alignment mark is formed in a substrate placement portion, and the mask placement portion. The mask alignment mark of the mask and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit are imaged by an imaging device to obtain an imaging result for alignment, and the mask arrangement unit And one of the substrate placement portions and the other is a stationary target device, the image of the mask alignment mark and the image of the substrate alignment mark are determined to have a predetermined relative relationship from the alignment imaging result. The moving target device is moved relative to the stationary target device so that the positional relationship is An alignment method, wherein a position calibration mark having a boundary line between the white part and the black part adjacent to each other among the white part that allows light to enter the imaging device and the black part that does not enter the imaging device is provided. A sub-position calibration placement step of placing the calibration board on the stationary target device, and the stationary target device and the imaging device in a direction perpendicular to a sub-placement plane that is a plane on which the position calibration mark is located. A sub-calibration imaging step of obtaining the position calibration imaging result by imaging the position calibration mark by the imaging device while relatively moving; and the size of the image of the position calibration mark included in the position calibration imaging result; When the size of the image of the position calibration mark becomes an extreme value from the relative moving distance and moving direction of the stationary target device and the imaging device in the sub-position calibration imaging step. The sub-distance calculation step for obtaining a relative positional relationship between the stationary target device and the imaging device, and the mask disposed in the mask placement unit based on the positional relationship obtained in the sub-distance calculation step And a sub-position correction step of positioning the mask alignment mark of the processing substrate and the substrate alignment mark of the processing substrate placed in the substrate placement portion within a range of depth of field.

<Principle for determining the position of the focal plane>
The operation principle of the present invention having the above configuration will be described. First, referring to FIGS. 6 (a) and 6 (b), reference numerals 26a and 26b in FIGS. 6 (a) and 6 (b) indicate calibration marks 30a and 30b. 1 shows a calibration substrate having The calibration marks 30a and 30b reflect and transmit the light emitted to the calibration marks 30a and 30b and enter the imaging apparatus, and black parts 32a and 31b that do not enter the imaging apparatus by reflection, transmission, or absorption. The boundary lines 6a and 6b are formed between the adjacent white portions 31a and 32b and the black portions 32a and 31b.

  The boundary lines 6a and 6b include an annular boundary line 6a in which the white portion 31a surrounds the black portion 32a (FIG. 6A) and an annular boundary line 6b in which the black portion 31b surrounds the white portion 32b (FIG. 6 ( b)), and the calibration marks 30a and 30b composed of the boundary lines 6a and 6b are imaged by the imaging device at an external position within the depth of field range, the calibration marks 30a and 30b in the imaging result In the image, the white portions 31a and 32b swell and erode the black portions 32a and 31b.

If the plane on which the surfaces of the calibration marks 30a and 30b on which an image is formed on the imaging apparatus is located is the arrangement plane, the arrangement plane is with respect to the optical axis of the imaging apparatus (the optical axis of the objective lens of the imaging apparatus, hereinafter the same). When it is vertical, the images of the boundary lines 6a and 6b are uniformly swollen, and as shown in FIG. 6C, the image 30a ′ of the calibration mark 30a consisting of the boundary line 6a of the white portion 31a on the outside. decreases only magnitude portion 7a swollen, the radius is smaller than the radius r _a of the front swelling. On the other hand, as shown in FIG. 6 (d), in the image 30b ′ of the calibration mark 30b, the inside of which is the boundary line 6b of the white portion 32b, the size is increased by the swollen portion 7b, and the radius is the same as before the swelling. It is larger than the radius r _b.

  Of the plane perpendicular to the optical axis, the in-focus plane that best focuses is located at the approximate center in the depth direction of the depth of field, and the arrangement plane (the calibration mark 30a on which an image is formed on the imaging device, When the plane on which the surface 30b is located) is located on the in-focus plane, the white portions 31a and 32b are least swollen in the image of the calibration marks 30a and 30b in the imaging result.

  Swelling occurs both when the calibration marks 30a and 30b to be imaged are located closer to the imaging device than the focusing surface and when they are located on the opposite side of the imaging device from the focusing surface. The amount of swelling increases as the distance between the arrangement surface and the focusing surface increases.

When the arrangement plane is perpendicular to the optical axis of the image pickup device and the image pickup device and the calibration boards 26a and 26b can move relative to each other along the optical axis, the relative movement is performed with the position of the focusing surface as the origin. When the distance is taken on the horizontal axis, the radius of the image of the calibration marks 30a and 30b in the imaging result is taken on the vertical axis, and a graph of the size of the radius with respect to the distance is created, the calibration mark 30a consisting of the boundary line 6a with the white portion 31a on the outside. As shown in FIG. 5A, in the image 30a ′ of FIG. 5A, the radius becomes a maximum value at the position of the origin, and on the other hand, in the image 30b ′ of the calibration mark 30b consisting of the boundary line 6b of the white portion 32b in FIG. As shown in b), the radius becomes a minimum value at the position of the origin.
Therefore, by moving the calibration substrates 26a and 26b in the direction along the optical axis and detecting the positional relationship between the imaging device and the arrangement surface when the extreme value is reached, the position of the in-focus plane can be determined.

Since the calibration marks 30a and 30b are thin, the surfaces of the calibration marks 30a and 30b and the surfaces of the calibration substrates 26a and 26b may be the same surface.
When the calibration marks 30a and 30b are perpendicular to the optical axis of the imaging device, the images of the circular calibration marks 30a and 30b are circular even when swollen. Therefore, the center points 5a and 5b of the calibration marks 30a and 30b are When located on the optical axis, even if the calibration marks 30a and 30b move along the optical axis, the positions of the center points 5a and 5b in the image do not move.
However, if the arrangement surface and the optical axis are not perpendicular, the center of the annular boundary line moves.

<Principle for finding the tilt angle>
Reference numeral 30c in FIG. 7 (a) indicates a calibration mark composed of _two annular boundary lines 6 ₁ and 6 _{2. The} boundary lines 6 ₁ and 6 ₂ are circular and centered on the same center point 5c. is arranged concentrically Te, the outer peripheral shape is formed in the outer border 6 _1, the inner peripheral shape with the boundary line 6 ₂ of the inside is formed.

When the surface of the calibration mark 30c plane also an arrangement surface located, consistent 33 _A in FIG. _{8 (a), 33 O,} 33 B is disposed surface, the placement surface 33 _A, 33 _O, 33 _B is It is perpendicular to the optical axis 3 of the imaging device 14 and is arranged at three different distances from the imaging device 14.

  The calibration substrate 26c and the imaging device 14 are moved relative to each other in a calibration movement direction that is a direction perpendicular to the surface of the calibration substrate 26c. Here, the optical axis 3 and the calibration movement direction are parallel to each other. Assuming that the calibration mark 26c is provided and the imaging device 14, the image sensor 14 moves relative to the optical axis 3 in a relative direction.

Here, out of the three calibration boards 26c shown in FIG. 8A, the arrangement surface 33 _O of the calibration board 26c at the center position is assumed to be coincident with the in-focus plane. The arrangement planes 33 _A and 33 _B are outside the range of the depth of field, and are arranged at positions closer to and farther from the imaging device 14 than the focusing plane.

Of the two concentric border 6 _1, 6 _2, one of the borders 6 ₁ is located white portion 31c is outwardly and Kurobe 32 ₁ positioned inside, figure surrounding the black portion 32 ₁ is formed and, the other border 6 ₂ located white portion 32 ₂ on the inside, and Kurobe 32 ₁ located outside, shapes surrounding the white portion 32 ₂ is formed.

Two border 6 _1, 6 ₂ of the outer white portion 31c, the boundary line ₆₁ of the inner Kurobe 32 _1, referred to as a boundary line ₆₁ of the outer white, white 32 ₂ inner, outer Kurobe 32 ₁ of the boundary line 6 _2, when referred to as a boundary 6 _{and second} inner white, in the calibration mark 30c, the boundary lines 6 ₂ of the inner white located inside the boundary line 6 _first outer white outside Although it is located, it may be a calibration mark arranged in reverse.

The imaging device 14, among the arrangement surface 33 _A, 33 _O, 33 _B, the calibration marks 30c located in any of the placement surface 33 _A, 33 _O, 33 _B have also been to allow imaging, depth of field When the calibration marks 30c located on the arrangement surfaces 33 _A and 33 _B outside the range are imaged, as shown in FIG. 7B, in the image 30c ′ of the calibration mark 30c in the imaging result, white portions 31c and 32 _2. There swell, the radius of the boundary line 6 ₁ of the image of the outer white, smaller than the original radius r _1, the image of the boundary line 6 _first outer white, and moved toward the center, the border of the inner white is the radius of the line 6 ₂ of the image becomes larger than the original radius r _2, the image of the boundary line 6 ₂ of the inner white, moves radially outward, as a result, the image 30c 'in Kurobe 32 ₁ of width The width W ₂ is smaller than the original width W ₁ .
Reference numeral _71, the boundary line ₆₁ of the outer white is swelled portions appear as if moved radially inward, reference numeral 7 _2, appear as border 6 ₂ of the inner white moves radially outward swelling Part.

In the calibration mark 30c, since the placement surface 33 _A, 33 _O, 33 _B and the optical axis 3 is vertical, white portions 31c, 32 ₂ are respectively evenly over the entire circumference of the boundary lines 6 _1, 6 ₂ Since the concentricity of the images of the boundary lines 6 ₁ and 6 ₂ is maintained, the center point 5c ′ (FIG. 7B) is the center point 5c of the image of the calibration mark 30c located on the focal plane. It is observed at the same position as in FIG.

  8A and 8B, the calibration substrate 26c and the imaging device 14 are moved relative to each other in the calibration movement direction that is a direction perpendicular to the surface of the calibration substrate 26c. In FIG. 8A, the moving direction is a direction parallel to the optical axis 3, and the symbol T in FIG. 8B passes through the center point 5c and is parallel to the moving direction, and the surface of the calibration mark 30c. And the relative movement direction between the calibration substrate 26c and the imaging device 14 is the direction along the perpendicular T, and the perpendicular T and the optical axis 3 are not parallel, and the inclination angle θ Assume that they intersect at (θ> 0).

The reference numeral 35 in FIG. 7B indicates a focusing surface, and the arrangement surfaces 34 _A , 34, and 34 _B of the three calibration substrates 26 c shown in FIG. 5B are inclined with respect to the focusing surface 35. The calibration substrate 26c that intersects at an angle θ and has a central arrangement surface 34 is such that the center point 5c of the calibration mark 30c is located on the focusing surface 35 and the center point 5c intersects the optical axis 3. The calibration marks 30c that are arranged and located on the other arrangement surfaces 34 _A and 34 _B are located outside the range of the depth of field, and at positions closer to and farther from the imaging device 14 than the central arrangement surface 34. It is assumed that each is arranged.

Here, focusing on the focusing surface 35, the space that can be imaged by the imaging device 14 can be divided into the imaging device 14 side and the opposite side by the focusing surface 35, and the calibration having the arrangement surface 34 at the center position. The boundary lines 6 ₁ and 6 ₂ of the calibration mark 30c on the substrate 26c have the center point 5c located on the focusing surface 35, and half of the boundary lines 6 ₁ and 6 ₂ (left side in the figure) is on the imaging device 14 side. The other half (right side in the figure) is located on the opposite side.

The plane including the perpendicular line T and the optical axis 3 intersect the boundary line 6 _first outer white and two positions, also intersect the boundary line 6 ₂ both two places of the inner white border 6 _1, 6 _When the entire circumference of ₂ is located on the imaging device 14 side or on the opposite side, one of the intersections 6 ₁ and 6 ₂ is located farthest from the focusing plane 35, and the other The intersection is the most recent position.

When the boundary lines 6 ₁ and 6 ₂ are imaged by the imaging device 14, the white portions 31 c and 32 ₂ are most swollen and observed at the intersections on the left and right sides of the drawing as indicated by an image 30 c ′ in FIG. 9B. in which, opposite the portion and one of the boundary lines 6 ₁ or 6 ₂ of the imaging device 14 side part, the center point 5c (FIG. 7 (a)) from the relation of rotational symmetry around the, in one of the boundary lines 6 ₁ or 6 _2, the distance between the intersection and the focusing surface 35 of the left and right two positions are equal, because the swelling amount is almost the same, the boundary line ₆₁ of the image 30c ', 6 ₂ center (Here the center of gravity) is observed to be at the same position.

Then, the boundary lines 6 _1, 6 ₂ and before the movement when located in the placement surface 34 of the central point 5c intersects the optical axis 3, of the entire circumference of the boundary line 6 _1, 6 _2, before the move, a portion located on the imaging device 14 side to the imaging device side portion, when the portion located on the opposite side of the opposite side portions, to move the entire circumference of the boundary line 6 _1, 6 ₂ is located on the imaging device 14 side when (when calibration mark 30c is located on the placement surface 34 _a closer to the imaging device 14) will become far from the in-focus plane 35 than the imaging device side portion opposite portion, the boundary line 6 _1, 6 ₂ total when the peripheral is located on the opposite side (when the calibration mark 30c is located farther arrangement surface 34 _B to the image pickup device 14), the opposite side portion is far away from the in-focus plane 35 than the imaging device portion.

Since the amount of swelling of the white portions 31c and 32 ₂ increases as the distance from the focusing surface 35 increases, one of the two intersections 6 ₁ or 6 ₂ is in focus. It is located in the part on the side farther from the surface 35, and the other is located in the part closer to the focusing surface than the far part, so there is a difference in the amount of swelling between the two intersections. Arise.

The image boundary line ₆₁ of the outer white, part white portion 31c has swollen, appear to move in a direction toward the center point 5c, the image boundary line 6 ₂ of the inner white, white 32 ₂ The swollen portion appears to have moved away from the center point 5c.

This movement is the image of one of the intersection is moved to the left, around the central point 5c, since will move to the right in the image of the opposite side of the other intersections, one of the boundary lines 6 ₁ or the moving direction of 6 ₂ of two intersections of the image is opposite to each other.
Since the two moving amount of the intersection of one of the boundary lines 6 ₁ or 6 ₂ there is a difference, the overall one border 6 ₁ or 6 _2, the moving direction of the large intersection of the image of the moving amount It will appear to move.

And the outer white border 6 ₁ and the inner white border 6 _2, since the moving direction is opposite to each other, when passing through the center point 5c the optical axis 3, of the border 6 ₁ of the image of the outer white the center point of the center point and border 6 ₂ of the image of the inner white, although located in the same central point 5c, when moved in opposite directions, the central point 9 ₁ border 6 ₁ of the image of the outer white And the center point 9 ₂ of the image of the inner white boundary 6 ₂ are separated from each other.

The distance between the separated center points 9 ₁ and 9 ₂ increases as the amount of swelling increases.
Since the relative positional relationship between the separated center points 9 ₁ and 9 ₂ depends on the relative positional relationship between the boundary lines 6 ₁ and 6 ₂ with respect to the in-focus plane 35, the tilt angle θ, the tilt direction, and the center point 9 ₁ and 9 ₂ are measured in advance and the relative position between the imaging device 14 and the calibration board 26c is measured in advance, and before alignment, the center points 9 ₁ and 9 _{2 are connected.} Is measured in association with the relative position between the imaging device 14 and the calibration substrate 26c, the magnitude of the tilt angle θ and the tilt direction can be obtained.

In order to specify the positions of the boundary lines 6 ₁ and 6 _{2 in} the image from the images of the boundary lines 6 ₁ and 6 ₂ , the white portions 31 c and 32 ₂ and the black portion 32 ₁ when captured by the imaging device 14 are used. It can also be calculated from the difference in the amount of light between them, or can be obtained from the value of the amount of change in the amount of light depending on the position in the image.

When the shape of the image of the boundary lines 6 ₁ and 6 ₂ deformed by the swelling of the white portions 31c and 32 ₂ is determined in the imaging result, the center of gravity of the figure having the shape can be obtained. The center of gravity is obtained as the position of the center points 9 ₁ and 9 ₂ , and the radius is also obtained.

For the focal plane 35, the magnitude and direction of the tilt angle θ are obtained, and either or both of the imaging device 14 and the device (stationary target device) on which the calibration board 26c is arranged are moved, and the tilt angle θ is zero. Can be.
Thereafter, the extreme value of the radius of at least _{one of} the boundary lines 6 ₁ and 6 ₂ is obtained to obtain the position of the focusing surface 35 and the range and position of the depth of field of the imaging device 14. Can do.

Since the tilt angle between the moving direction of the stationary target device and the moving direction of the optical axis can be zero, image distortion can be eliminated.
Since the position of the focal plane can be obtained, the processing substrate and the mask can be arranged within the range of the depth of field and the alignment can be performed.

An example of the vacuum device of the present invention Calibration board placed in the vacuum device (a): State in which the mask and the processing substrate are arranged in the vacuum apparatus (b): State in which the mask and the processing substrate are aligned (c): State in which a thin film is grown on the processing substrate Enlarged view near the mask alignment mark and substrate alignment mark (a): A graph showing the relationship between the distance from the focusing plane of the outer white circular boundary line and the radius (b): A graph showing the relationship between the distance from the focusing plane of the inner white circular boundary line and the radius (a): Calibration mark consisting of outer white circular boundary line (b): Calibration mark consisting of inner white circular boundary line (c): Image of outer white calibration mark (d): Inner white calibration mark Statue of (a): Calibration mark consisting of two concentric boundary lines (b) Image of the calibration mark (a): A state in which a calibration mark perpendicular to the optical axis is imaged by the imaging device (b): A state in which a calibration mark that is not perpendicular to the optical axis is imaged by the imaging device It is an image obtained by imaging a calibration mark that is not perpendicular to the optical axis, (a): imaged in a state closer to the imaging device than the in-focus plane (b): imaged in a state where the center point is located on the in-focus plane ( c): Imaged in a state farther from the imaging device than the focal plane

Reference numeral 10 in FIG. 1 shows the vacuum device of the first example of the present invention, and has a vacuum chamber 11. A substrate placement unit 23 and a mask placement unit 25 are arranged inside the vacuum chamber 11.
A plurality of insertion holes 12 are provided in the ceiling of the vacuum chamber 11 located above the substrate placement portion 23, and each insertion hole 12 is covered with a bellows device 18 and hermetically sealed. Air is prevented from entering the inside of the vacuum chamber 11 through the air.

  Support rods 17 are inserted into each bellows device 18 one by one in an airtight manner so that the upper end is located outside the vacuum chamber 11 and the lower end is located inside the vacuum chamber 11. The external atmosphere of the vacuum chamber 11 and the internal atmosphere of the vacuum chamber 11 are separated by a bellows device 18.

  Each of the bellows devices 18 is composed of a metal bottom plate and a metal expansion / contraction portion (bellows) provided on the bottom plate. One end and the other end of the bellows device 18 are outside the vacuum chamber 11. The support bar 17 is attached to the bottom plate so as to be located on the inner side, the lower part of the support bar 17 is inserted into the insertion hole 12, and the substrate placement portion 23 is placed in the vacuum chamber 11 of the support bar 17. It is provided at the lower end.

A mask support 24 is erected on the bottom surface of the vacuum chamber 11, and the mask placement portion 25 is provided at the upper end of each mask support 24.
The vacuum apparatus 10 is a film forming apparatus, and a film forming source 16 is disposed inside the vacuum chamber 11. Here, the film formation source 16 is disposed on the bottom surface side of the vacuum chamber 11, the substrate placement unit 23 is disposed at a position above the film formation source 16, and the film formation source 16 and the substrate placement unit 23 are The mask placement unit 25 is positioned at a height therebetween. In the state of FIG. 1, the substrate placement unit 23 is stationary with respect to the vacuum chamber 11 at a position above the mask placement unit 25.

  In the vacuum apparatus 10, one of the mask placement unit 25 and the substrate placement unit 23 is a stationary target device and the other is a movement target device, and the movement target device is moved relative to the stationary target device. .

  An alignment moving device 21 is disposed outside the vacuum chamber 11, and each support rod 17 is moved in the vertical direction while the bellows device 18 is expanded or contracted or deformed by the alignment moving device 21. It is configured to be able to move within.

The alignment moving device 21 is connected to the control device 20 and controlled in operation by the control device 20, and moves the support rod 17 in accordance with a signal input from the control device 20.
On the other hand, the mask placement unit 25 is stationary at a position above the film forming source 16, and therefore the mask placement unit 25 is a stationary target device and the substrate placement unit 23 is a movement target device.

  Next, an observation window 13 sealed with transparent glass is airtightly provided on the ceiling of the vacuum chamber 11, and the imaging device 14 disposed on the ceiling of the vacuum chamber 11 passes through the observation window 13. Thus, the inside of the vacuum chamber 11 can be imaged.

An evacuation device 29 is connected to the vacuum chamber 11, and when the vacuum processing is performed by the vacuum device 10, the evacuation device 29 is operated to evacuate the inside of the vacuum chamber 11. A vacuum atmosphere is formed.
Into the inside of the vacuum chamber 11, before or after the formation of the vacuum atmosphere, the mask is carried in, placed on the mask placement unit 25, and the processing substrate is carried into the vacuum chamber 11 in the vacuum atmosphere, It arrange | positions on the board | substrate arrangement | positioning part 23. FIG.

A symbol 28 in FIG. 3A indicates a mask arranged on the mask arrangement unit 25, and a symbol 27 indicates a processing substrate arranged on the substrate arrangement unit 23.
The peripheral portions of the mask 28 and the processing substrate 27 are supported by the mask placement unit 25 and the substrate placement unit 23, respectively. The processing substrate 27 is placed above the film forming source 16, and the mask 28 is formed as a film. It is arranged between the source 16 and the processing substrate 27.

  FIG. 4 is a partial enlarged view of the mask 28 and the processing substrate 27. The processing substrate 27 includes a light shielding portion 48 formed of a light shielding material on the surface of a transparent substrate body 46 such as a glass plate, and a light shielding portion 48. Are formed in a predetermined pattern, and the light-shielding portion 48 and the light-transmitting portion 47 are provided at a position including a portion where the processing substrate 27 and the optical axis 3 intersect each other. Substrate alignment marks 45 arranged in a pattern are respectively formed at two or more spaced apart positions on the rectangular substrate body 46.

  The mask 28 has a mask main body 42 such as a metal thin plate that blocks fine particles of the film forming material and the like, and a through-hole 43 that is formed in the mask main body 42 and allows the fine particles of the film forming material to pass therethrough. A thin film portion 44 made of a light shielding material is arranged in a predetermined pattern on the surface of the mask main body 42 that reflects light, and the mask is formed by the thin film portion 44 and the surface of the mask main body 42 exposed around the thin film portion 44. An alignment mark 41 is configured.

In the imaging device 14, a lens device 53 is disposed inside a cylindrical body 52. In the lens device 53, the front part where the light is incident is directed in the direction in which the processing substrate 27 and the mask 28 to be imaged are arranged.
An imaging element 54 is disposed at a position where the incident light passes through the optical axis 3 of the lens device 53 at a rear portion where the incident light passes while being optically processed. The optically processed light enters the imaging element 54. .

  The imaging element 54 is connected to the signal processing circuit 55, and when an image obtained by projecting the imaging target is formed on the imaging element 54 by the lens device 53, the imaging result is converted into an electrical signal by the imaging element 54. And output to the control device 20 via the signal processing circuit 55.

  The substrate alignment mark 45 and the mask alignment mark 41 are arranged so as to face each other, and the substrate alignment mark 45 and the mask alignment mark 41 are imaged by the imaging device 14 via the transparent substrate body 46. .

  When aligning the mask 28 and the processing substrate 27, the mask placement unit 25 and the substrate placement unit 23 are moved relatively close to each other. First, as shown in FIG. The substrate 27 is disposed so as to be separated by a predetermined distance.

Next, the substrate alignment mark 45 and the mask alignment mark 41 are imaged as imaging objects by the imaging device 14, and the imaging result is output to the control device 20.
The control device 20 recognizes the positional relationship between the image of the substrate alignment mark 45 and the image of the mask alignment mark 41 included in the imaging result.

  When the mask placement unit 25 and the substrate placement unit 23 are relatively moved, the mask placement unit 25 and the substrate are arranged between the mask 28 placed in the mask placement unit 25 and the processing substrate 27 placed in the substrate placement unit 23. The controller 20 performs the same relative movement as the relative movement with respect to the placement unit 23, and the control device 20 determines that the image of the substrate alignment mark 45 and the image of the mask alignment mark 41 in the imaging result are set in advance. Based on the relative position of the image recognized in the imaging result, the mask placement unit 25 and the substrate placement unit 23 are moved relative to each other so that the relationship is established.

  For example, the relative positional relationship between the image of the mask alignment mark 41 and the image of the substrate alignment mark 45 included in the imaging result, and the predetermined positional relationship between the mask alignment mark 41 and the substrate alignment mark 45 are set. The error amount, the error direction, and the error angle are obtained by comparison, and the mask 28 and the processing substrate 27 are relatively moved without changing the distance so as to eliminate the error.

  Here, the mask placement unit 25 is a stationary target device, the substrate placement unit 23 is a movement target device, and the mask 28 is stationary and the processing substrate 27 is moved. The placement unit 23 may be a stationary target device, and the processing substrate 27 may be stationary and the mask 28 may be moved.

  Before performing such alignment, if the positional relationship between the stationary target device and the imaging device 14 is corrected so that the inclination angle θ described above is obtained and the value becomes zero, the alignment is performed. The substrate alignment mark 45 and the mask alignment mark 41 are parallel to each other and are positioned on a plane perpendicular to the optical axis 3, and the relative position is changed while being positioned in the plane. Image blur due to relative movement does not occur.

Further, before the alignment, the position of the focusing surface 35 is obtained as described above, and both the substrate alignment mark 45 and the mask alignment mark 41 are arranged within the range of the depth of field of the imaging device 14. As described above, if the positions of the mask placement unit 25 on which the mask 28 is placed and the substrate placement unit 23 on which the processing substrate 27 is placed are adjusted with respect to the focusing surface 35, the boundary line 6 imaged at the time of alignment is obtained. since _1, 6 ₂ of the image becomes clear, it is possible to perform precise alignment.

  Thus, based on the clear image, the substrate alignment mark 45 and the mask alignment mark 41 are moved relative to each other so as to eliminate the error, and when the error becomes smaller than a predetermined amount, a preset relative positional relationship is obtained. As a result, the alignment process is terminated.

Next, the mask placement unit 25 and the substrate placement unit 23 are brought close to each other while maintaining the relative positional relationship, and the distance between the mask 28 and the processing substrate 27 is reduced.
Here, as shown in FIG. 3C, the mask 28 and the processing substrate 27 are in close contact with each other, and the mask 28 and the processing substrate 27 are positioned relatively below the mask 28 in a relatively stationary state. When particles of the film forming material are released from the film source 16, the particles pass through the through holes 43 of the mask 28, reach the surface of the processing substrate 27 exposed at the bottom of the through holes 43, and a thin film grows.

  The film forming material particles may be vapor of the film forming material, or may be sputtered particles emitted by sputtering the film forming material target. In this case, the film forming source 16 can be arranged on the ceiling side in the vacuum chamber 11, and the mask 28 and the processing substrate 27 can be arranged below the film forming source 16 in this order.

When the thin film has grown to a predetermined thickness, the mask 28 and the processing substrate 27 are separated so that the particles of the film forming material do not reach the surface of the processing substrate 27, and the formed processing substrate 27 is placed in the vacuum chamber 11. Carry it out.
On the other hand, the non-film-formed processing substrate 27 is carried into the vacuum chamber 11 and aligned with the mask 28 to form a thin film.

As described above, when the thin films are continuously formed on the plurality of processing substrates 27, the angle correction step and the position correction step are performed before the first processing substrate 27 and the mask 28 are aligned. The mask 28 and the processing substrate 27 are perpendicular to the optical axis 3 of the imaging device 14, and the mask 28 and the processing substrate 27 are positioned within the range of the depth of field of the imaging device 14. Therefore, when imaging and aligning the substrate alignment mark 45 and the mask alignment mark 41 with the imaging device 14, a clear image of the boundary lines 6 ₁ and 6 ₂ is obtained and accurate alignment is performed. be able to.

In the vacuum apparatus 10 of FIG. 1, as shown in FIG. 2, the processing substrate 27 is not arranged inside the vacuum chamber 11, and a calibration mark 30 c is provided on the stationary target apparatus (here, the mask arrangement unit 25). The calibration board 26c is placed.
At that time, the calibration board 26c is arranged so that the calibration mark 30c is positioned within the imaging range of the imaging device 14, and the imaging device 14 can capture the calibration mark 30c.

At least one of the imaging device 14 and the stationary target device is provided with a calibration moving device 22, and the calibration moving device 22 performs calibration movement between the imaging device 14 and the stationary target device. It is designed to move relative to the direction.
Here, the imaging device 14 is moved in the calibration movement direction with respect to the stationary target device.

In this vacuum apparatus 10, the inclination angle θ, the inclination direction, the distance and positional relationship between the center points 9 ₁ , 9 ₂ of the images of the boundary lines 6 ₁ , 6 ₂ , and between the imaging apparatus 14 and the calibration substrate 26 c. The relative position is measured in advance as described above and stored in the storage device 19 provided in the control device 20.

When the relative position between the imaging device 14 and the stationary target device changes due to maintenance work or the like, as described above, between the center points 9 ₁ and 9 ₂ of the images of the boundary lines 6 ₁ and 6 ₂ . The distance and positional relationship and the relative position between the imaging device 14 and the calibration board 26c are measured from the imaging result of the calibration mark 30c, the inclination angle θ and the inclination direction are obtained, and the calibration moving device 22 is operated. Then, the image pickup device 14 and the stationary target device are relatively rotated to make the tilt angle θ zero.

As described above, the calibration mark 30c including both of the boundary lines 6 ₁ and 6 ₂ is an angle calibration mark for calibrating the angle, whereas one or both of the boundary lines 6 ₁ and 6 ₂ are position calibration. The position calibration mark is picked up by the image pickup device 14 while the relative movement between the mask placement portion 23 and the substrate placement portion 25 is performed by the calibration moving device 22, and the extreme value of the size of the image ( Here, when the distance between the position calibration mark and the imaging device 14 when the extreme value of the radius or diameter) is measured in association with the amount of movement and the extreme value is obtained, the distance is calculated as follows. Since the distance between the focusing surface 35 and the focusing surface 35 is known, the position of the focusing surface 35 with respect to the imaging device 14 can be known, and the substrate alignment mark 45 on the substrate placement unit 23 and the mask placement with the focusing surface 35 as the center Mask door on part 25 And in-placement marks 41, so as to be located within the depth of field, to set the position of the mask arrangement portion 25 and the substrate placement portion 23 when performing alignment.
The range of the depth of field can also be obtained from the position of the focusing surface 35, the size of the image of the position calibration mark, and the amount of movement.

  The circular boundary 6a (FIG. 6A) in which the white portion 31a surrounds the black portion 32a and the circular boundary 6b (FIG. 6B) in which the black portion 31b surrounds the white portion 32b are shown. However, the position calibration mark for determining the position of the focusing surface 35 is not limited to a circular shape as long as it is a boundary line that can determine the extreme value of the size. For example, a cross shape, Square shape may be sufficient.

As for the angle calibration mark, if the angle calibration mark is moved in the calibration movement direction perpendicular to the arrangement plane, a state where the centers of the two boundary lines are located can be formed. and theta, measuring the inclination direction, the distance and positional relationship between the center points of the image of the boundary line 6 _1, 6 _2, the relative position between the imaging device 14 and the calibration substrate 26c, and the relative movement amount Thus, the value of the tilt angle θ and the tilt direction can be obtained. For example, a cross shape or a square shape can be used for the angle calibration mark and the position calibration mark.

  In the above example, at the time of angle calibration or position calibration, the stationary target device is stopped and the imaging device 14 is moved by the calibration moving device 22, but the imaging device 14 is stationary and the stationary target device is moved. You may do it.

  In the above embodiment, a single imaging device 14 is used. However, the calibration marks 30c, the substrate alignment mark 45, and the mask alignment mark 41 arranged at two locations are imaged by the two imaging devices 14. The inclination angle θ and the inclination direction can be obtained from the two imaging results, and the alignment can be performed from the imaging results of the two imaging devices 14.

In the above embodiment, the position of the position calibration mark with respect to the imaging apparatus 14 when the size of one of the boundary lines 6 ₁ or 6 ₂ showed an extreme, but the position of the focusing surface, the boundary line of the outer white 6 ₁ and determined separately the position of the focus plane in both border 6 ₂ of the inner white from extremes may between its two positions as the position of the focusing plane. For example, the positions of two focusing surfaces can be averaged to obtain the focusing surface position.

3 ... Optical axes 6a, 6b, 6 ₁ , 6 ₂ ... Boundary line 10 ... Vacuum device 11 ... Vacuum chamber (housing)
16 ... Film forming source 20 ... Control device 21 ... Alignment moving device 22 ... Calibration moving device 25 ... Mask placement unit 23 ... Substrate placement unit 26a, 26b, 26c ... Calibration substrate 27 ... Processing Substrate 28 ... Mask 30c ... Calibration mark 30c '... Calibration mark images 31b, 32a, 32 ₁ ... Black part 31a, 31c, 32b, 32 ₂ ... White part 35 ... Focusing surface 41 ... Mask alignment Mark 45 …… Substrate alignment mark

Claims (14)

The body,
A mask placement portion on which a mask provided with a mask alignment mark is provided;
A substrate placement portion disposed on the housing and disposed so as to face the mask disposed on the mask placement portion, the processing substrate on which a substrate alignment mark is formed;
Of the mask placement unit and the substrate placement unit, if one is a movement target device and the other is a stationary target device, an alignment moving device that moves the movement target device relative to the housing,
An imaging device that images the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit and obtains an imaging result for alignment;
A control device to which the alignment imaging result is input,
The control device is configured so that the image of the mask and the image of the processing substrate are in a predetermined positional relationship based on the alignment imaging result while the stationary target device is stationary with respect to the housing. An alignment device that operates an alignment moving device and moves the movement target device,
A calibration moving device that relatively moves the stationary target device and the imaging device;
An annular first boundary line adjacent to the white portion where light is incident on the imaging device and the black portion where light is not incident is adjacent to the white portion on the outside,
A calibration board provided with an angle calibration mark having an annular second boundary line in which the white portion and the black portion are adjacent to each other with the white portion inside, is disposed on the stationary target device,
The control device moves the stationary target device and the imaging device relatively in a direction perpendicular to a main arrangement surface that is a plane on which the angle calibration mark is located by the calibration moving device. An angle calibration imaging procedure for obtaining an angle calibration imaging result by imaging the angle calibration mark by the imaging device;
The distance between the first center point, which is the center of the image of the first boundary line, and the second center point, which is the center of the image of the second boundary line, included in the angle calibration imaging result An inclination angle formed by the optical axis of the imaging device and the main arrangement surface from the distance, the separation direction, and the relative moving distance and moving direction of the stationary target device and the imaging device in the angle calibration imaging procedure And an angle calculation procedure for obtaining an inclination direction. At least one of the first and second boundary lines is a position calibration mark,
In the control device, the position calibration mark is moved by the imaging device while moving the stationary target device and the imaging device in a direction perpendicular to the main arrangement surface by the calibration moving device. A position calibration imaging procedure for obtaining a position calibration imaging result by imaging
The position calibration is calculated from the size of the image of the position calibration mark included in the position calibration imaging result and the relative moving distance and moving direction of the stationary target device and the imaging device in the position calibration imaging procedure. The alignment apparatus according to claim 1, wherein a distance calculation procedure for obtaining a relative positional relationship between the stationary object apparatus and the imaging apparatus when the size of the mark image is an extreme value is stored.   3. The alignment device according to claim 1, wherein the first and second boundary lines have circular shapes with different radii and are arranged concentrically. The center of gravity of the image of the first boundary line is made the first center point,
The alignment apparatus according to any one of claims 1 to 3, wherein a center of gravity of the image of the second boundary line is set as the second center point. The alignment apparatus according to any one of claims 1 to 4,
A vacuum chamber in which a vacuum atmosphere is formed is used for the casing,
The said mask arrangement | positioning part and the said board | substrate arrangement | positioning part are the vacuum devices arrange | positioned inside the said vacuum chamber.   A film forming source is arranged inside the vacuum chamber, and the thin film material released from the film forming source passes through the opening of the mask arranged in the mask arranging unit and is arranged in the substrate arranging unit. The vacuum apparatus according to claim 5, wherein the vacuum apparatus is configured to reach a surface of the processing substrate. A main placement step of placing the mask on which the mask alignment mark is formed in the mask placement portion and placing the processing substrate on which the substrate alignment mark is formed in the substrate placement portion;
Main imaging for obtaining an alignment imaging result by imaging the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit by an imaging device Process,
If one of the mask placement unit and the substrate placement unit is a moving target device and the other is a stationary target device, an image of the mask alignment mark and an image of the substrate alignment mark are obtained from the alignment imaging result. A positioning step of moving the moving target device with respect to the stationary target device so as to have a predetermined relative positional relationship;
An alignment method comprising:
An annular first boundary line adjacent to the white portion where light is incident on the imaging device and the black portion where light is not incident is adjacent to the white portion on the outside,
An angle calibration placement step of placing a calibration board provided with an angle calibration mark having an annular second boundary line in which the white portion and the black portion are adjacent to each other with the white portion inside, on the stationary target device;
The angle calibration mark is imaged by the imaging device while moving the stationary target device and the imaging device relatively in a direction perpendicular to a main arrangement plane on which the angle calibration mark is located. An angle calibration imaging step for obtaining an angle calibration imaging result;
The distance between the first center point, which is the center of the image of the first boundary line, and the second center point, which is the center of the image of the second boundary line, included in the angle calibration imaging result An inclination angle formed by the optical axis of the imaging device and the main arrangement surface from the distance, the separation direction, and the relative movement distance and the movement direction of the stationary target device and the imaging device in the angle calibration imaging step And an angle calculating step for obtaining a tilt direction;
Have
Before the positioning step, an angle for relatively moving the imaging device and the stationary target device so that the tilt angle is a right angle from the tilt angle and the tilt direction obtained in the angle calculation step. Correction process;
An alignment method. At least one of the first and second boundary lines is a position calibration mark,
After the angle correction step and before the alignment step,
Position calibration imaging that obtains a position calibration imaging result by imaging the position calibration mark by the imaging device while moving the stationary target device and the imaging device relatively in a direction perpendicular to the main arrangement plane. Process,
From the relationship between the size of the image of the position calibration mark included in the position calibration imaging result, the relative movement amount and the movement direction of the stationary target device and the imaging device in the position calibration imaging step, A distance calculating step for obtaining a relative positional relationship between the stationary object device and the imaging device when the size of the image of the position calibration mark is an extreme value;
Based on the positional relationship obtained in the distance calculating step, the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit are copied. A position correction step for positioning within the depth of field;
The alignment method according to claim 7, comprising:   9. The alignment method according to claim 7, wherein the first and second boundary lines have circular shapes with different radii and are arranged concentrically. The body,
A mask placement portion on which a mask provided with a mask alignment mark is provided;
A substrate placement portion disposed in the housing and disposed so that a processing substrate on which a substrate alignment mark is formed faces the mask disposed in the mask placement portion;
Of the mask placement unit and the substrate placement unit, if one is a movement target device and the other is a stationary target device, an alignment moving device that moves the movement target device relative to the housing;
An imaging device that images the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit and obtains an imaging result for alignment;
A control device to which the alignment imaging result is input,
The control device is configured such that the image of the mask and the image of the processing substrate have a predetermined positional relationship based on the alignment imaging result while the stationary target device is stationary with respect to the housing. An alignment device that operates an alignment moving device and moves the movement target device,
A calibration moving device that relatively moves the stationary target device and the imaging device;
A calibration substrate provided with a position calibration mark having an annular boundary line between the white part and the black part located adjacent to each other among the white part where light is incident on the imaging device and the black part which is not incident is the stationary substrate. Placed in the target device,
The control device moves the stationary target device and the imaging device relative to each other in a direction perpendicular to a sub arrangement surface that is a plane on which the position calibration mark is located by the calibration moving device. A position calibration imaging procedure for capturing a position calibration imaging result by imaging the position calibration mark by the imaging device;
The position calibration is calculated from the size of the image of the position calibration mark included in the position calibration imaging result and the relative moving distance and moving direction of the stationary target device and the imaging device in the position calibration imaging procedure. A registration device that stores a distance calculation procedure for obtaining a relative positional relationship between the stationary object device and the imaging device when the size of the mark image is an extreme value.   The alignment apparatus according to claim 10, wherein the boundary line of the position calibration mark is circular. It has the alignment device of any one of Claim 10 or Claim 11,
A vacuum chamber in which a vacuum atmosphere is formed is used for the casing,
The said mask arrangement | positioning part and the said board | substrate arrangement | positioning part are the vacuum devices arrange | positioned inside the said vacuum chamber.   A film forming source is disposed in the vacuum chamber, and the thin film material discharged from the film forming source passes through the through hole of the mask disposed in the mask disposing portion and is disposed in the substrate disposing portion. The vacuum apparatus according to claim 12, wherein the vacuum apparatus is configured to reach a surface of the processing substrate. A main placement step of placing the mask on which the mask alignment mark is formed in the mask placement portion and placing the processing substrate on which the substrate alignment mark is formed in the substrate placement portion;
Main imaging for obtaining an alignment imaging result by imaging the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit by an imaging device Process,
If one of the mask placement unit and the substrate placement unit is a moving target device and the other is a stationary target device, an image of the mask alignment mark and an image of the substrate alignment mark are obtained from the alignment imaging result. A positioning step of moving the moving target device with respect to the stationary target device so as to have a predetermined relative positional relationship;
An alignment method comprising:
A calibration board provided with a position calibration mark having a boundary line between the white part and the black part adjacent to each other among the white part where light is incident on the imaging device and the black part which is not incident is arranged on the stationary target device. A position calibration placement process;
The position calibration mark is imaged by the imaging device while moving the stationary target device and the imaging device relatively in a direction perpendicular to a sub arrangement surface that is a plane on which the position calibration mark is located. A sub-position calibration imaging step for obtaining a position calibration imaging result;
From the size of the image of the position calibration mark included in the position calibration imaging result, and the relative movement distance and movement direction of the stationary target device and the imaging device in the sub-position calibration imaging step, the position A sub-distance calculation step for obtaining a relative positional relationship between the stationary target device and the imaging device when the size of the image of the calibration mark is an extreme value;
Based on the positional relationship obtained in the sub-distance calculation step, the mask alignment mark of the mask arranged in the mask arrangement unit and the substrate alignment mark of the processing substrate arranged in the substrate arrangement unit are covered. A sub-position correction process for positioning within the depth of field;
An alignment method.

Images